TWI594489B - Electrolyte solution purification method and electrolyte solution manufacturing method - Google Patents

Electrolyte solution purification method and electrolyte solution manufacturing method Download PDF

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TWI594489B
TWI594489B TW104136370A TW104136370A TWI594489B TW I594489 B TWI594489 B TW I594489B TW 104136370 A TW104136370 A TW 104136370A TW 104136370 A TW104136370 A TW 104136370A TW I594489 B TWI594489 B TW I594489B
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electrolyte solution
purifying
chloride
mass
fluoride
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TW201624809A (en
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Mikihiro Takahashi
Masataka Fujimoto
Hiroki Matsuzaki
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Central Glass Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/54Electrolytes
    • H01G11/58Liquid electrolytes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0564Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
    • H01M10/0566Liquid materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0564Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
    • H01M10/0566Liquid materials
    • H01M10/0568Liquid materials characterised by the solutes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/54Electrolytes
    • H01G11/58Liquid electrolytes
    • H01G11/62Liquid electrolytes characterised by the solute, e.g. salts, anions or cations therein
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Description

電解質溶液之純化方法及電解質溶液之製造方法 Method for purifying electrolyte solution and method for producing electrolyte solution

本發明係關於一種用作鋰離子電池、鈉離子電池、鋰空氣電池、鋰硫電池、鋰離子電容器等電化學裝置之電解液之電解質溶液之純化方法等。 The present invention relates to a method for purifying an electrolyte solution used as an electrolyte of an electrochemical device such as a lithium ion battery, a sodium ion battery, a lithium air battery, a lithium sulfur battery, or a lithium ion capacitor.

於作為電化學裝置之電池中,近年來,資訊相關機器、通信機器、即電腦、攝錄影機、數位相機、行動電話、智慧型手機等之面向小型、高能量密度用途之蓄電系統,或電動汽車、油電混合車、燃料電池車之輔助電源、電力儲存等之面向大型、功率用途之蓄電系統備受關注。作為其一候補,鋰離子電池、鋰電池、鋰離子電容器等非水電解液電池正被積極開發。 In batteries for electrochemical devices, in recent years, information-related machines, communication devices, such as computers, video cameras, digital cameras, mobile phones, smart phones, etc., are used for small-sized, high-energy-density power storage systems, or Power storage systems for large-scale, power-use applications such as electric vehicles, hybrid electric vehicles, auxiliary power supplies for fuel cell vehicles, and power storage have received much attention. As a candidate, non-aqueous electrolyte batteries such as lithium ion batteries, lithium batteries, and lithium ion capacitors are being actively developed.

如六氟磷酸根陰離子、四氟硼酸根陰離子、六氟砷酸根陰離子之類的路易斯酸與氟離子鍵結而成之離子性錯合物之金屬鹽(Li、Na除外)係就其高溶解性、高離子解離性、以及較廣之電位範圍之觀點而言,被用作電化學裝置之支持電解質。 A metal salt (except Li and Na) in which an ionic complex of a Lewis acid such as a hexafluorophosphate anion, a tetrafluoroborate anion, or a hexafluoroarsenate anion is bonded to a fluoride ion is highly soluble. From the standpoint of properties, high ion dissociation, and a wide range of potentials, it is used as a supporting electrolyte for electrochemical devices.

其中,六氟磷酸鋰(以下稱為LiPF6)由於與六氟砷酸鋰相比毒性較低、且與四氟硼酸鋰相比溶解性較高,故而特別被廣泛使用。 Among them, lithium hexafluorophosphate (hereinafter referred to as LiPF 6 ) is particularly widely used because it is less toxic than lithium hexafluoroarsenate and has higher solubility than lithium tetrafluoroborate.

但是,該LiPF6亦存在熱穩定性較低、因加熱而分解成氟化鋰(以下稱為LiF)及五氟化磷(以下稱為PF5)等較大之缺點。已知有LiF因沈積於電極表面上而成為電阻成分,故而使以鋰離子電池為代表之鋰系電化學裝置之性能下降,PF5因其強路易斯酸性,故而使電解液溶劑 之分解加速。 However, this LiPF 6 also has a disadvantage of being low in thermal stability and decomposing into lithium fluoride (hereinafter referred to as LiF) and phosphorus pentafluoride (hereinafter referred to as PF 5 ) due to heating. LiF is known to be a resistive component deposited on the surface of an electrode, so that the performance of a lithium-based electrochemical device represented by a lithium ion battery is lowered, and PF 5 is accelerated by the Lewis acidity of the electrolyte solution.

因此,業界正積極地開發與六氟砷酸相比毒性較低、與四氟硼酸鋰相比溶解度較高、與LiPF6相比熱穩定性較高之離子性錯合物,例如於專利文獻1中揭示有將LiPF6之氟之一部分取代為氟烷基(CF3、C2F5等)而成之離子性錯合物於電解液中之利用,於專利文獻2、非專利文獻1、2中揭示有將LiPF6之氟之一部分或全部取代為草酸而成之離子性錯合物於電解液中之利用。 Therefore, the industry is actively developing an ionic complex which is less toxic than hexafluoroarsenic acid, has higher solubility than lithium tetrafluoroborate, and has higher thermal stability than LiPF 6 , for example, Patent Document 1 The use of an ionic complex compound obtained by substituting a part of fluorine of LiPF 6 into a fluoroalkyl group (CF 3 , C 2 F 5 , etc.) in an electrolytic solution is disclosed in Patent Document 2 and Non-Patent Document 1. 2 discloses the use of an ionic complex compound in which one or all of the fluorine of LiPF 6 is substituted with oxalic acid in an electrolytic solution.

另一方面,含氟之離子性錯合物存在與空氣中或液體中之水分反應而產生氟化氫之情況。又,於製造含氟之離子性錯合物時,存在殘存過量之氟化氫、或副生成氟化氫之情況。通常,電解液中之氟化氫會引起電極材料之溶解或集電體之腐蝕等,甚至引起電池循環特性之降低,進而亦引起充放電電容、保存穩定性等電池特性之降低,故而氟化氫之含量越低越佳,例如揭示有將電解液中之氟化氫濃度設為未達30質量ppm(專利文獻3)。 On the other hand, the fluorine-containing ionic complex compound may react with moisture in the air or in a liquid to generate hydrogen fluoride. Moreover, when producing a fluorine-containing ionic complex compound, there may be a case where excessive hydrogen fluoride remains or hydrogen fluoride is formed by-product. In general, hydrogen fluoride in the electrolyte causes dissolution of the electrode material or corrosion of the current collector, and even causes a decrease in the cycle characteristics of the battery, which in turn causes a decrease in battery characteristics such as charge and discharge capacitance and storage stability, so the content of hydrogen fluoride is higher. The lower the better, for example, the concentration of hydrogen fluoride in the electrolytic solution is set to be less than 30 ppm by mass (Patent Document 3).

又,揭示有使藉由LiPF6之水解而生成之氟化氫等酸性雜質與除氟化物以外之鹵化物進行反應,轉化成蒸汽壓較高之鹵化氫後將其去除之方法(專利文獻4)。 Further, a method of reacting an acidic impurity such as hydrogen fluoride generated by hydrolysis of LiPF 6 with a halide other than a fluoride to convert it into a hydrogen halide having a high vapor pressure and removing it is disclosed (Patent Document 4).

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本專利特開2003-17118號公報 Patent Document 1: Japanese Patent Laid-Open No. 2003-17118

專利文獻2:日本專利特開2002-110235(日本專利3722685)號公報 Patent Document 2: Japanese Patent Laid-Open Publication No. 2002-110235 (Japanese Patent No. 3722685)

專利文獻3:日本專利特開平10-270074號公報 Patent Document 3: Japanese Patent Laid-Open No. Hei 10-270074

專利文獻4:日本專利特開平10-092468(日本專利3034202)號公報 Patent Document 4: Japanese Patent Laid-Open No. Hei 10-092468 (Japanese Patent No. 3,034,202)

非專利文獻 Non-patent literature

非專利文獻1:ECS Transactions, 2009, 16 (35), 3-11 Non-Patent Document 1: ECS Transactions, 2009, 16 (35), 3-11

非專利文獻2:Chem. Eur. J., 2004, 10, 2451-2458 Non-Patent Document 2: Chem. Eur. J., 2004, 10, 2451-2458

然而,若欲將電解液中之氟化氫減壓去除,則由於氟化氫於氫鍵之影響下會具有19.54℃之較高之沸點,故而氟化氫之去除會耗費時間,而且無法充分地降低氟化氫之濃度。 However, if the hydrogen fluoride in the electrolytic solution is to be removed under reduced pressure, since hydrogen fluoride has a higher boiling point of 19.54 ° C under the influence of hydrogen bonding, the removal of hydrogen fluoride takes time and the concentration of hydrogen fluoride cannot be sufficiently lowered.

又,於專利文獻4之實施例1所記載之添加氯化鋰作為純化劑,使氟化氫與氯化鋰進行反應之方法中,由於藉由反應生成之氟化鋰作為固體而沈澱,故而除必須去除所生成之氯化氫以外,進而必須進行過濾步驟,因此,存在生成步驟變得複雜,而且於過濾步驟中多發生濾布之堵塞,氟化鋰之去除較為困難之問題。於專利文獻4之實施例5所記載之添加乙醯氯作為純化劑,使氟化氫與乙醯氯進行反應之方法中,由於不產生固體之沈澱物,故而於反應後在70℃下流通氮氣,而將由反應生成之氯化氫及過量之乙醯氯去除,但存在反應時間耗費12小時,氮氣之流通耗費4小時,氟化氫之去除耗費時間之問題。 Further, in the method of reacting hydrogen fluoride with lithium chloride by adding lithium chloride as a purifying agent described in Example 1 of Patent Document 4, since lithium fluoride formed by the reaction is precipitated as a solid, it is necessary to In addition to the removal of the generated hydrogen chloride, the filtration step must be performed. Therefore, the production step becomes complicated, and the clogging of the filter cloth often occurs in the filtration step, and the removal of lithium fluoride is difficult. In the method of reacting hydrogen fluoride with ethyl hydrazine by adding ethyl hydrazine chloride as a purifying agent described in Example 5 of Patent Document 4, since no solid precipitate is generated, nitrogen gas is circulated at 70 ° C after the reaction. However, the hydrogen chloride generated by the reaction and the excess ethyl chloroform are removed, but the reaction time takes 12 hours, and the circulation of nitrogen takes 4 hours, and the removal of hydrogen fluoride takes time.

於專利文獻2等所記載之製造能夠利用於電解液之將LiPF6之氟之一部分或全部取代為草酸而成之離子性錯合物時,存在未反應之草酸、或於製造過程中生成之草酸而殘存於溶液中之情況。由於此種草酸亦使電池之循環特性變差等對電池特性造成不良影響,故而必須去除,但於通常之晶析法中,草酸亦與離子性錯合物一併析出,而大多情況下需要進行再純化,從而難以將草酸去除至低濃度。 When the production described in Patent Document 2 or the like can be used in an electrolyte solution in which one or all of the fluorine of LiPF 6 is partially substituted with oxalic acid, there is an unreacted oxalic acid or is produced during the production process. Oxalic acid remains in solution. Since such oxalic acid also adversely affects the battery characteristics due to deterioration of the cycle characteristics of the battery, it is necessary to remove it. However, in the usual crystallization method, oxalic acid is also precipitated together with the ionic complex, and in many cases, it is required. Repurification is performed, making it difficult to remove oxalic acid to a low concentration.

本發明係鑒於上述情況而完成者,其目的在於提供一種能夠以簡單之步驟、與先前相比較短之時間將用作電化學裝置之電解液之電解質溶液中之氟化氫去除至低濃度的電解質溶液之純化方法。進而,更佳為能夠將於製造LiPF6之氟之一部分或全部被取代為草酸而成之離子性錯合物時所殘存之草酸同時去除。 The present invention has been made in view of the above circumstances, and an object thereof is to provide an electrolyte solution capable of removing hydrogen fluoride in an electrolyte solution used as an electrolyte of an electrochemical device in a simple step and in a shorter period of time than before. Purification method. Further, it is more preferable to simultaneously remove oxalic acid remaining when the ionic complex compound in which one or all of the fluorine of LiPF 6 is substituted with oxalic acid is produced.

本發明者為了解決上述問題而反覆進行銳意研究,結果發現,添加氯化物之純化劑,將氟化氫製成氯化氫,而且利用蒸汽壓將氯化氫與經氟化之純化劑或未反應之純化劑一併去除,藉此能夠以簡單之步驟去除氟化氫,進而,若於使氟化氫與純化劑反應時將經氟化之純化劑存留於系統內,則氟化氫與純化劑之反應不會變得足夠快,藉由使用如反應生成物於常溫常壓下成為氣體而排出至反應系統外般之純化劑、或於反應過程中自反應系統去除反應生成物,能夠將包含於溶液中之氟化氫於較短之時間內去除至低濃度,從而完成了本發明。具體而言,於本發明中,提供如下述般之電解質溶液之純化方法。 The present inventors have conducted intensive studies in order to solve the above problems, and as a result, found that a hydrogen chloride-added purifying agent is used to form hydrogen fluoride into hydrogen chloride, and hydrogen sulfide is used together with a fluorinated purifying agent or an unreacted purifying agent by vapor pressure. The removal can thereby remove the hydrogen fluoride in a simple step. Further, if the fluorinated purification agent is retained in the system when the hydrogen fluoride is reacted with the purification agent, the reaction between the hydrogen fluoride and the purification agent does not become fast enough. The hydrogen fluoride contained in the solution can be used in a short period of time by using a purification agent such as a reaction product which is discharged to the reaction system at a normal temperature and a normal pressure, or a reaction product is removed from the reaction system during the reaction. The inside was removed to a low concentration, thereby completing the present invention. Specifically, in the present invention, a method for purifying an electrolyte solution as described below is provided.

本發明之第1態樣係一種電解質溶液之純化方法,其特徵在於包括如下步驟:向至少含有氟化氫作為雜質之於非水溶劑中溶解有電解質之電解質溶液中,添加亞硫醯氯作為純化劑,使上述雜質與上述純化劑進行反應之步驟;以及藉由將作為反應生成物之氯化氫及經氟化之上述純化劑、及未反應之上述純化劑去除,而去除上述雜質之步驟。 A first aspect of the present invention is a method for purifying an electrolyte solution, comprising the steps of: adding a sulfoxide to a solution of an electrolyte containing at least hydrogen fluoride as an impurity in a non-aqueous solvent; a step of reacting the above-mentioned impurities with the above-mentioned purifying agent; and a step of removing the above impurities by removing hydrogen chloride as a reaction product, the above-mentioned purifying agent which is fluorinated, and the above-mentioned unpurified purifying agent.

本發明之第2態樣係一種電解質溶液之純化方法,其特徵在於包括如下步驟:向至少含有氟化氫作為雜質之於非水溶劑中溶解有電解質之電解質溶液中,添加包含選自由羧醯氯、磺醯氯、亞磺醯氯、氯化矽、及羧酸酐所組成之群中之一者或該等之混合物之純化劑,一面將反應生成物抽出至反應系統外一面使上述雜質與上述純化劑進行反應之步驟;以及藉由將作為反應生成物之氯化氫及經氟化之上述純化劑、及未反應之上述純化劑去除,而去除上述雜質之步驟。 A second aspect of the present invention provides a method for purifying an electrolyte solution, comprising the steps of: adding an electrolyte solution containing at least hydrogen fluoride as an impurity to a non-aqueous solvent; One of a group consisting of sulfonium chloride, sulfinium chloride, ruthenium chloride, and a carboxylic acid anhydride or a purification agent of the mixture, and the reaction product is extracted to the outside of the reaction system to make the above impurities and the above purification And a step of removing the impurities by removing hydrogen chloride as a reaction product, the fluorinated purification agent, and the unreacted purification agent.

本發明之第3態樣係一種電解質溶液之製造方法,其特徵在於包含使用第1或第2態樣之電解質溶液之純化方法進行之純化步驟。 A third aspect of the present invention is a method for producing an electrolyte solution, which comprises the step of purifying using a purification method using the electrolyte solution of the first or second aspect.

根據本發明之純化方法,藉由將亞硫醯氯用作純化劑、或於氟化氫與純化劑之反應過程中將反應生成物去除至系統外,能夠以與先 前相比簡單之步驟且較短之時間將用作電化學裝置之電解液之溶液中之氟化氫去除至低濃度。又,特定之純化劑係與氟化氫及草酸兩者進行反應,因此,藉由去除反應生成物及未反應純化劑,可將氟化氫及草酸同時去除。 According to the purification method of the present invention, by using sulphur oxychloride as a purifying agent or removing the reaction product to the outside of the system during the reaction between hydrogen fluoride and a purifying agent, The hydrogen fluoride in the solution used as the electrolyte of the electrochemical device is removed to a low concentration before the simpler step and for a shorter period of time. Further, since the specific purifying agent reacts with both hydrogen fluoride and oxalic acid, hydrogen fluoride and oxalic acid can be simultaneously removed by removing the reaction product and the unreacted purifying agent.

以下,對本發明更詳細地進行說明。 Hereinafter, the present invention will be described in more detail.

(第1實施形態) (First embodiment)

本發明之第1實施形態係一種電解質溶液之純化方法,其特徵在於包括:反應步驟,其向至少含有氟化氫作為雜質之於非水溶劑中溶解有電解質之電解質溶液中,添加亞硫醯氯作為純化劑,使上述雜質與上述純化劑進行反應;以及去除步驟,其藉由將作為反應生成物之氯化氫及經氟化之上述純化劑、及未反應之上述純化劑去除,而去除上述雜質。 According to a first aspect of the present invention, a method for purifying an electrolyte solution, comprising: a reaction step of adding an antimony chloride to an electrolyte solution in which an electrolyte is dissolved in a nonaqueous solvent containing at least hydrogen fluoride as an impurity; The purifying agent reacts the impurities with the purifying agent; and a removing step of removing the impurities by removing hydrogen chloride as a reaction product, the fluorinated purifying agent, and the unreacted purifying agent.

亞硫醯氯由於亦能夠實現草酸之分解、去除,故而於電解質溶液中亦可以雜質之形式包含草酸。 Since sulfinium chloride can also decompose and remove oxalic acid, oxalic acid can also be contained in the form of impurities in the electrolyte solution.

若使亞硫醯氯(沸點76℃)與氟化氫(沸點19.54℃)進行反應,則根據以下之反應式,生成氯化氫(沸點-85℃)及亞硫醯氟(沸點-43.8℃),其等於常溫常壓下均為氣體,故而反應生成物迅速地排出至反應系統外,而無法干預反應。 When sulfinium chloride (boiling point 76 ° C) and hydrogen fluoride (boiling point 19.54 ° C) are reacted, hydrogen chloride (boiling point - 85 ° C) and sulfoxide (boiling point - 43.8 ° C) are produced according to the following reaction formula, which is equal to At normal temperature and pressure, it is a gas, so the reaction product is quickly discharged to the outside of the reaction system, and the reaction cannot be intervened.

[化1]SOCl2+2HF → SOF2+2HCl [Chemical 1] SOCl 2 + 2HF → SOF 2 + 2HCl

又,亦存在根據以下之反應式生成亞硫醯氯氟(沸點約為12℃)代替亞硫醯氟之情形,亞硫醯氯氟直羧排出至反應系統外、或轉化成亞 硫醯氟,故而反應生成物迅速地排出至反應系統外,而無法干預反應。 Further, there is also a case where sulfinium chlorofluoride (boiling point is about 12 ° C) is formed in place of sulfinium fluoride according to the following reaction formula, and sulphur chlorofluorocarbon is discharged to the outside of the reaction system or converted into a sub- Sulfur and fluorene, so the reaction product is quickly discharged to the outside of the reaction system, and the reaction cannot be intervened.

[化2]SOCl2+HF → SOClF+HCl [Chemical 2] SOCl 2 + HF → SOClF + HCl

再者,所謂“經氟化之純化劑”係指亞硫醯氟或亞硫醯氯氟等。 In addition, the "fluorinated purification agent" means sulfoxide or sulfoxide.

又,若使亞硫醯氯與草酸進行反應,則根據以下之反應式,生成氯化氫、二氧化硫(沸點-10℃)、一氧化碳(沸點-192℃)、二氧化碳(沸點-78.5℃),其等於常溫常壓下均為氣體,故而反應生成物迅速地排出至反應系統外,而無法干預反應。 Further, when sulfinium chloride is reacted with oxalic acid, hydrogen chloride, sulfur dioxide (boiling point - 10 ° C), carbon monoxide (boiling point - 192 ° C), and carbon dioxide (boiling point - -78.5 ° C) are produced according to the following reaction formula, which is equal to normal temperature. At normal pressure, it is a gas, so the reaction product is quickly discharged to the outside of the reaction system, and the reaction cannot be intervened.

[化3]SOCl2+(COOH)2 → 2HCl+SO2+CO+CO2 [Chemical 3] SOCl 2 + (COOH) 2 → 2HCl + SO 2 + CO + CO 2

再者,所謂“純化劑與草酸之反應分解物”係指藉由純化劑與草酸之反應而生成之二氧化硫、一氧化碳、二氧化碳等。 In addition, the "reaction decomposition product of a purifying agent and oxalic acid" means sulfur dioxide, carbon monoxide, carbon dioxide, etc. which are produced by the reaction of a purifying agent and oxalic acid.

即,於第1實施形態中,於藉由將亞硫醯氯用作純化劑而與氟化氫進行反應之情形時,反應生成物成為氣體且迅速地排出至反應系統外,而無法干預反應,因此,能夠不進行反應式之逆反應,而使氟化氫與亞硫醯氯之反應即正反應之反應速度提高,使氟化氫之濃度迅速地降低至低濃度。 In other words, in the first embodiment, when sulfite chloride is used as a purifying agent to react with hydrogen fluoride, the reaction product becomes a gas and is quickly discharged to the outside of the reaction system, so that the reaction cannot be intervened. The reaction rate of the reaction of hydrogen fluoride with sulfinium chloride, that is, the reaction rate of the positive reaction can be increased without the reverse reaction of the reaction formula, and the concentration of the hydrogen fluoride can be rapidly lowered to a low concentration.

又,於第1實施形態中,可於去除氯化氫之同時去除反應生成物或未反應之亞硫醯氯,因此無需過濾等另外之步驟,適於工業純化。 Further, in the first embodiment, the reaction product or the unreacted sulfinium chloride can be removed while removing hydrogen chloride. Therefore, it is not necessary to carry out another step such as filtration, and is suitable for industrial purification.

若使用亞硫醯氯,則不僅可去除氟化氫,而且亦可同時去除溶液中之草酸。 If sulphur oxychloride is used, not only the hydrogen fluoride but also the oxalic acid in the solution can be removed.

亞硫醯氯由於在常溫常壓下為液體,故而於添加至純化前之電解質溶液時為液體,因此,與添加氣體之純化劑之情形相比容易添加。 Since sulphur chlorobenzene is a liquid at normal temperature and normal pressure, it is a liquid when it is added to the electrolyte solution before purification, and therefore it is easy to add compared with the case where a gas purifying agent is added.

溶液所包含之電解質為鹽,且鹽之陽離子較佳為包含鋰陽離子、鈉陽離子、鉀陽離子、四級烷基銨陽離子中之一者或該等之混合物。其原因在於:該等陽離子可用作非水電解液電池用電解液所包含之鹽之陽離子。 The electrolyte contained in the solution is a salt, and the cation of the salt preferably comprises one of a lithium cation, a sodium cation, a potassium cation, a quaternary alkyl ammonium cation or a mixture thereof. The reason for this is that the cations can be used as a cation of a salt contained in an electrolyte for a non-aqueous electrolyte battery.

又,鹽之陰離子較佳為包含六氟磷酸根陰離子、四氟硼酸根陰離子、雙(氟磺醯基)醯亞胺陰離子、雙(三氟甲磺醯基)醯亞胺陰離子、雙(二氟磷酸基)醯亞胺陰離子中之一者或該等之混合物。其原因在於:該等陰離子可用作非水電解液電池用電解液所包含之鹽之陰離子。 Further, the anion of the salt preferably comprises a hexafluorophosphate anion, a tetrafluoroborate anion, a bis(fluorosulfonyl) quinone imine anion, a bis(trifluoromethanesulfonyl) quinone imine anion, a double (two One of or a mixture of fluorophosphoryl) quinone imines. The reason for this is that the anions can be used as an anion of a salt contained in an electrolyte for a non-aqueous electrolyte battery.

鹽較佳為包含六氟磷酸鋰、六氟磷酸鈉、六氟磷酸鉀、四氟硼酸鋰、四氟硼酸鈉、四氟硼酸鉀、雙(氟磺醯基)醯亞胺鋰、雙(氟磺醯基)醯亞胺鈉、雙(氟磺醯基)醯亞胺鉀、雙(三氟甲磺醯基)醯亞胺鋰、雙(三氟甲磺醯基)醯亞胺鈉、雙(三氟甲磺醯基)醯亞胺鉀、雙(二氟磷酸基)醯亞胺鋰、雙(二氟磷酸基)醯亞胺鈉、雙(二氟磷酸基)醯亞胺鉀、二氟離子性錯合物(2a)、(2b)、(2c)中之一者或該等之混合物。其原因在於:該等鹽可用作非水電解液電池用電解液所包含之鹽。 The salt preferably comprises lithium hexafluorophosphate, sodium hexafluorophosphate, potassium hexafluorophosphate, lithium tetrafluoroborate, sodium tetrafluoroborate, potassium tetrafluoroborate, lithium bis(fluorosulfonyl) fluorene, bis(fluorosulfonyl) Sodium sulfoxide, potassium bis(fluorosulfonyl) phthalimide, lithium bis(trifluoromethanesulfonyl) phthalimide, sodium bis(trifluoromethanesulfonyl) sulfoxide, bis(trifluoro) Methanesulfonyl) sulfonium imide, lithium bis(difluorophosphate) ruthenium amide, sodium bis(difluorophosphate) ruthenium amide, potassium bis(difluorophosphate) ruthenium iodide, difluoro ionic One of the complexes (2a), (2b), (2c) or a mixture of such. The reason for this is that the salts can be used as a salt contained in an electrolyte solution for a non-aqueous electrolyte battery.

再者,二氟離子性錯合物(2a)、(2b)、(2c)之構成通式(2)之各元素如下所述。再者,將二氟離子性錯合物(2a)之鋰鹽記載為(2a-Li)。 Further, the respective elements of the formula (2) of the difluoroionic complex compounds (2a), (2b), and (2c) are as follows. Further, the lithium salt of the difluoroionic complex (2a) is described as (2a-Li).

(2a)A=Li、Na、K或四級烷基銨,M=P,Y=C,Z=C,p、q及s=1,r=0 (2a) A = Li, Na, K or quaternary alkyl ammonium, M = P, Y = C, Z = C, p, q and s = 1, r = 0

(2b)A=Li、Na、K或四級烷基銨,M=P,W=C(CF3)2,Z=C,p及q=0,r、s=1 (2b) A = Li, Na, K or quaternary alkyl ammonium, M = P, W = C (CF 3 ) 2 , Z = C, p and q = 0, r, s = 1

(2c)A=Li、Na、K或四級烷基銨,M=P,W=C(CF3)2,Z=C, p、q及s=0,r=2 (2c) A = Li, Na, K or quaternary alkyl ammonium, M = P, W = C (CF 3 ) 2 , Z = C, p, q and s = 0, r = 2

又,作為電解質溶液之非水溶劑,可使用與下述第3實施形態之合成法中使用之非水溶劑相同者。 Further, as the nonaqueous solvent of the electrolyte solution, the same as the nonaqueous solvent used in the synthesis method of the third embodiment described below can be used.

雜質與純化劑之反應時間可根據反應速度,於0.1~72小時之範圍內進行適當選擇,但由於長時間佔據裝置會導致生產成本之上升,故而較佳為將反應時間設為12小時以下,更佳為將反應時間設為6小時以下。進而,為了使系統整體之反應進行,較佳為於反應過程中攪拌溶液。 The reaction time of the impurity and the purifying agent can be appropriately selected in the range of 0.1 to 72 hours depending on the reaction rate. However, since the production cost is increased due to the occupation of the device for a long time, it is preferred to set the reaction time to 12 hours or less. More preferably, the reaction time is set to 6 hours or less. Further, in order to carry out the reaction of the entire system, it is preferred to stir the solution during the reaction.

純化劑較佳為於相對於游離酸之莫耳數為10莫耳倍以下之範圍內使用。進而較佳為游離酸與純化劑為1:0.1~1:10之莫耳比之範圍,尤佳為游離酸與純化劑為1:1~1:5之莫耳比之範圍。 The purifying agent is preferably used in a range of 10 mol or less relative to the molar amount of the free acid. Further preferably, the free acid and the purifying agent are in a range of a molar ratio of 1:0.1 to 1:10, and particularly preferably a range of a molar ratio of the free acid and the purifying agent of 1:1 to 1:5.

純化劑之添加、攪拌、以及其後之反應生成物及未反應純化劑之去除較佳為於溫度-60℃~150℃下進行,更佳為於-20℃~120℃下進行。若低於-60℃,則存在因黏度上升導致產生攪拌不足、或反應速度下降之情形,又,若超過150℃,則有溶解之電解質分解之顧慮。特別是去除反應生成物及未反應純化劑時之溫度較佳為加熱或冷卻容易進行之-20℃~120℃。 The addition of the purifying agent, the stirring, and the subsequent removal of the reaction product and the unreacted purifying agent are preferably carried out at a temperature of from -60 ° C to 150 ° C, more preferably from -20 ° C to 120 ° C. If it is less than -60 ° C, there is a case where the stirring is insufficient due to an increase in viscosity, or the reaction rate is lowered, and if it exceeds 150 ° C, there is a concern that the dissolved electrolyte is decomposed. In particular, the temperature at which the reaction product and the unreacted purifying agent are removed is preferably -20 ° C to 120 ° C which is easily carried out by heating or cooling.

再者,關於本發明之第1實施形態中之各處理,為了不使大量之純化劑或溶劑蒸發,較佳為於純化劑或溶劑之沸點中之任一較低之溫 度以下進行。特別是,為了不使溶液中包含之電解質發生分解,純化劑之添加、攪拌、以及其後之反應生成物及未反應純化劑之去除較佳為於50℃以下進行。 Further, in the respective treatments in the first embodiment of the present invention, in order not to evaporate a large amount of the purifying agent or the solvent, it is preferred to use any of the boiling points of the purifying agent or the solvent. The degree is below. In particular, in order not to decompose the electrolyte contained in the solution, the addition of the purifying agent, the stirring, and the subsequent removal of the reaction product and the unreacted purifying agent are preferably carried out at 50 ° C or lower.

反應生成物及未反應純化劑之去除係藉由利用蒸汽壓差之方法而去除,具體而言,可藉由在減壓下進行脫氣之方法、或將惰性氣體導入至溶液中並將其等與惰性氣體一併清除之方法等去除。 The removal of the reaction product and the unreacted purifying agent is removed by a method using a vapor pressure difference, specifically, a method of degassing under reduced pressure, or introducing an inert gas into the solution and It is removed by a method such as removal with an inert gas.

於減壓中,可使用真空泵、吸出器等。減壓係藉由將反應器設為密閉狀態後,再將系統內保持於大氣壓以下之壓力而進行。此時,由於非水溶劑之一部分亦被蒸餾去除,故而電解質之濃度被濃縮。系統內之壓力根據純化對象之液體之溫度及蒸汽壓而改變,因此無法一概而論,但減壓較佳為將槽內之真空度保持於以絕對壓力計為80kPa以下。若保持之壓力超過80kPa,則無法將電解質溶液中之反應生成物、或未反應純化劑等排除至成為所期望之濃度以下、或為了排除至所期望之濃度以下而需要較長時間,故而欠佳。又,若保持之壓力為50kPa以下,則可將未反應純化劑排除至低濃度,故而進而較佳。再者,若考慮裝置之負荷,則較佳為將絕對壓力設為20kPa以上。 In the decompression, a vacuum pump, an aspirator, or the like can be used. The pressure reduction is carried out by setting the reactor to a sealed state and then maintaining the pressure in the system below atmospheric pressure. At this time, since a part of the nonaqueous solvent is also distilled off, the concentration of the electrolyte is concentrated. The pressure in the system varies depending on the temperature of the liquid to be purified and the vapor pressure, and therefore cannot be generalized. However, the pressure reduction is preferably such that the degree of vacuum in the tank is maintained at 80 kPa or less in absolute pressure. When the pressure maintained is more than 80 kPa, it is not possible to exclude the reaction product or the unreacted purification agent in the electrolyte solution to a desired concentration or less, or to remove it to a desired concentration or less, and it takes a long time. good. Further, if the pressure to be maintained is 50 kPa or less, the unreacted purifying agent can be excluded to a low concentration, which is further preferable. Further, in consideration of the load of the device, it is preferable to set the absolute pressure to 20 kPa or more.

惰性氣體之向溶液中之導入係藉由利用氮氣、氦氣、氖氣、氬氣、氪氣、氙氣使溶液起泡而進行。再者,反應系統之減壓及向溶液中之惰性氣體之導入亦可同時進行。 The introduction of the inert gas into the solution is carried out by bubbling the solution with nitrogen, helium, neon, argon, helium or neon. Further, the pressure reduction of the reaction system and the introduction of the inert gas into the solution can also be carried out simultaneously.

(第2實施形態) (Second embodiment)

本發明之第2實施形態係一種電解質溶液之純化方法,其特徵在於包括:反應步驟,其向至少含有氟化氫作為雜質之於非水溶劑中溶解有電解質之電解質溶液中,添加包含選自由羧醯氯、磺醯氯、亞磺醯氯、氯化矽、及羧酸酐所組成之群中之一者或該等之混合物之純化劑,一面將反應生成物抽出至反應系統外一面使上述雜質與上述純化劑進行反應;以及去除步驟,其藉由將作為反應生成物之氯化氫及經 氟化之上述純化劑、及未反應之上述純化劑去除,而去除上述雜質。 A second embodiment of the present invention provides a method for purifying an electrolyte solution, comprising: a reaction step of adding an electrolyte solution containing at least hydrogen fluoride as an impurity to a non-aqueous solvent in which an electrolyte is dissolved; One of a group consisting of chlorine, sulfonium chloride, sulfinium chloride, ruthenium chloride, and carboxylic acid anhydride or a purification agent of the mixture, and the reaction product is extracted to the outside of the reaction system to make the impurities and The above-mentioned purifying agent is subjected to a reaction; and a removing step by using hydrogen chloride as a reaction product and The above-mentioned purifying agent which is fluorinated and the above-mentioned unpurified purifying agent are removed to remove the above impurities.

作為於第2實施形態中進行純化之電解質溶液,可使用與第1實施形態相同者。 As the electrolyte solution purified in the second embodiment, the same as in the first embodiment can be used.

於第2實施形態中,藉由一面將反應生成物抽出至系統外一面進行溶液中之氟化氫與純化劑、或氟化氫及草酸與純化劑之反應,能夠更有效地使氟化氫或草酸反應分解而去除。所謂將該生成之反應生成物抽出至系統外之方法係對反應系統進行減壓、或向溶液中導入惰性氣體。減壓或惰性氣體之導入可與上述方法同樣地進行。 In the second embodiment, by reacting hydrogen fluoride with a purifying agent or hydrogen fluoride and oxalic acid with a purifying agent while extracting the reaction product to the outside of the system, hydrogen fluoride or oxalic acid can be more efficiently decomposed and removed. . The method of extracting the generated reaction product out of the system is to decompress the reaction system or introduce an inert gas into the solution. The introduction of reduced pressure or an inert gas can be carried out in the same manner as the above method.

其原因在於:氟化氫與純化劑之反應為可逆,故而藉由利用減壓或惰性氣體導入,將所生成之氯化氫或經氟化之純化劑自系統內連續地去除,藉此可限制逆反應之進行,使純化劑之氟化反應加速。再者,草酸與純化劑之反應係產生一氧化碳、二氧化碳並排出至系統外之不可逆反應,即便存在藉由減壓或惰性氣體導入而反應加速之情況,亦不存在被減速之情況。 The reason is that the reaction between hydrogen fluoride and the purifying agent is reversible, so that the generated hydrogen chloride or the fluorinated purifying agent is continuously removed from the system by using a reduced pressure or an inert gas introduction, thereby restricting the reverse reaction. To accelerate the fluorination reaction of the purifying agent. Further, the reaction between oxalic acid and the purifying agent produces an irreversible reaction of carbon monoxide and carbon dioxide and is discharged to the outside of the system, and even if there is a case where the reaction is accelerated by introduction of a reduced pressure or an inert gas, there is no case where the reaction is decelerated.

再者,於使用亞硫醯氯之第1實施形態中,亦可藉由一面將反應生成物抽出至系統外一面使反應進行,而使亞硫醯氯之氟化反應加速,從而進行氟化氫之去除。 Further, in the first embodiment in which ruthenium oxychloride is used, the reaction product may be taken out while the reaction product is extracted outside the system, and the fluorination reaction of sulfinium chloride may be accelerated to carry out hydrogen fluoride. Remove.

作為純化劑,可使用:羧醯氯、磺醯氯、亞磺醯氯、氯化矽、羧酸酐等。其中,作為純化劑,較佳為草醯氯、氯甲酸甲酯、氯甲酸乙酯、乙醯氯、三氟乙醯氯、三氟甲磺醯氯、甲磺醯氯、亞硫醯氯、氯化三甲基矽烷、乙酸酐、三氟乙酸酐,由於容易去除反應生成物及未反應純化劑,故而進而較佳為草醯氯、氯甲酸甲酯、乙醯氯、三氟甲磺醯氯、甲磺醯氯、亞硫醯氯、氯化三甲基矽烷。 As the purifying agent, carboxy guanidine chloride, sulfonium chloride, sulfinium chloride, ruthenium chloride, carboxylic anhydride or the like can be used. Among them, as the purifying agent, grass chloroform, methyl chloroformate, ethyl chloroformate, ethyl hydrazine chloride, trifluoroacetamidine chloride, trifluoromethanesulfonium chloride, methylsulfonium chloride, sulfinium chloride, and the like are preferred. Trimethyl decane chloride, acetic anhydride, and trifluoroacetic anhydride are preferably grassy chlorinated, methyl chloroformate, ethyl chloroform, trifluoromethanesulfonate because of easy removal of the reaction product and unreacted purifying agent. Chlorine, methanesulfonium chloride, sulfoxide chloride, trimethylnonane chloride.

羧醯氯、磺醯氯、亞磺醯氯及氯化矽係與氟化氫進行反應,分別生成羧醯氟、磺醯氟、亞磺醯氟、氟化矽、及氯化氫。各氟化物由於氟之原子量較小,故而具有低於氯化物之沸點,於減壓或起泡環境 下易被去除。又,由於氯化氫之沸點為非常低之-85℃,故而容易被去除。同樣地,羧酸酐亦藉由與氟化氫進行反應,而獲得羧醯氟及羧酸,因此分別於減壓或起泡環境下揮發而被去除。 Carboxymethyl chloride, sulfonium chloride, sulfinium chloride and ruthenium chloride are reacted with hydrogen fluoride to form carboxyfluorene fluoride, sulfonium fluoride, sulfinium fluoride, cesium fluoride, and hydrogen chloride, respectively. Each fluoride has a lower atomic weight than the chloride, and has a lower boiling point than the chloride, in a reduced pressure or foaming environment. The next is easy to remove. Further, since the boiling point of hydrogen chloride is very low -85 ° C, it is easily removed. Similarly, the carboxylic acid anhydride is also reacted with hydrogen fluoride to obtain carboxyfluorene fluoride and a carboxylic acid, and thus is removed by volatilization under reduced pressure or a foaming environment.

例如,若乙醯氯(沸點51℃)與氟化氫進行反應,則根據以下之反應式,生成氯化氫(沸點-85℃)及乙醯氟(沸點20℃),其等均於減壓或起泡環境下被去除。 For example, if ethyl chloroform (boiling point: 51 ° C) is reacted with hydrogen fluoride, hydrogen chloride (boiling point - 85 ° C) and acetamidine fluoride (boiling point: 20 ° C) are formed according to the following reaction formula, and the like are all under reduced pressure or foaming. It is removed under the environment.

[化5]CH3COCl+HF → CH3COF+HCl [Chemical 5] CH 3 COCl + HF → CH 3 COF + HCl

再者,於將乙醯氯用作純化劑之情形時,所謂“經氟化之純化劑”係指乙醯氟等。 In the case where acetoin is used as a purifying agent, the term "fluorinated purifying agent" means acetamidine fluoride or the like.

於純化劑為草醯氯、氯甲酸甲酯、氯甲酸乙酯、乙醯氯、三氟乙醯氯、三氟甲磺醯氯、甲磺醯氯、亞硫醯氯之情形時,不僅可去除氟化氫,而且可使草酸分解並去除。 When the purifying agent is grass chloroform, methyl chloroformate, ethyl chloroformate, ethyl chloroform, trifluoroacetamidine chloride, trifluoromethanesulfonium chloride, methanesulfonate chloride or sulfoxide, it is not only The hydrogen fluoride is removed and the oxalic acid is decomposed and removed.

例如,若使乙醯氯與草酸進行反應,則根據以下之反應式,生成氯化氫、乙酸(沸點118℃)、一氧化碳(沸點-192℃)、二氧化碳(沸點-78.5℃),其等均於減壓或起泡環境下被去除。 For example, when ethyl chloroform is reacted with oxalic acid, hydrogen chloride, acetic acid (boiling point: 118 ° C), carbon monoxide (boiling point - 192 ° C), and carbon dioxide (boiling point - -78.5 ° C) are produced according to the following reaction formula, and the like is reduced. Removed under pressure or blistering conditions.

[化6]CH3COCl+(COOH)2 → HCl+CH3COOH+CO+CO2 [Chemical 6] CH 3 COCl + (COOH) 2 → HCl + CH 3 COOH + CO + CO 2

再者,於將乙醯氯用作純化劑之情形時,所謂“純化劑與草酸之反應分解物”係指由純化劑與草酸之反應而生成之乙酸、一氧化碳、二氧化碳等。 In the case where acetoin is used as a purifying agent, the term "reactive decomposition product of a purifying agent and oxalic acid" means acetic acid, carbon monoxide, carbon dioxide or the like which is formed by a reaction between a purifying agent and oxalic acid.

於第2實施形態中,一面將反應生成物抽出至系統外一面使反應 進行,因此,可使氟化氫與純化劑之反應加速,可將氟化氫迅速地去除至低濃度。 In the second embodiment, the reaction product is extracted to the outside of the system to cause a reaction. This is carried out so that the reaction of hydrogen fluoride with the purifying agent can be accelerated, and the hydrogen fluoride can be quickly removed to a low concentration.

第2實施形態中之反應步驟或去除步驟之方法、條件係與第1實施形態相同。 The method and conditions of the reaction step or the removal step in the second embodiment are the same as those in the first embodiment.

(第3實施形態) (Third embodiment)

本發明之第3實施形態係一種電解質溶液之製造方法,其特徵在於包含使用第1或第2實施形態之電解質溶液之純化方法進行之純化步驟。 A third embodiment of the present invention provides a method for producing an electrolyte solution, which comprises the step of purifying using the purification method of the electrolyte solution of the first or second embodiment.

即,於合成LiPF6等含氟之離子性錯合物時,存在殘存過量氟化氫、或副生成氟化氫之情況,而且存在含氟之離子性錯合物與空氣中或液體中之水分進行反應而產生氟化氫之情況,因此,藉由在合成含氟之離子性錯合物後等、製造包含含氟之離子性錯合物之電解質溶液之步驟中,併入第1或第2實施形態之電解質溶液之純化方法,可獲得氟化氫等雜質較少之電解質溶液。 In other words, when a fluorine-containing ionic complex such as LiPF 6 is synthesized, excessive hydrogen fluoride or by-product hydrogen fluoride may remain, and the fluorine-containing ionic complex may react with moisture in the air or in the liquid. In the case where hydrogen fluoride is generated, the electrolyte of the first or second embodiment is incorporated in the step of producing an electrolyte solution containing a fluorine-containing ionic complex after synthesizing a fluorine-containing ionic complex or the like. As a method of purifying the solution, an electrolyte solution having less impurities such as hydrogen fluoride can be obtained.

特別是,於將通式(1)所表示之六配位離子性錯合物(1)於非水溶劑中藉由氟化劑進行氟化,而製造通式(2)所表示之二氟離子性錯合物(2)之步驟中,副生成草酸,故而將氟化氫及草酸兩者去除,因此,藉由在製造二氟離子性錯合物(2)後,將使用第1或第2實施形態之電解質溶液之純化方法之純化步驟加以組合,可製造包含酸性雜質較少之二氟離子性錯合物(2)之電解質溶液。 In particular, the hexa-coordinate ionic complex (1) represented by the formula (1) is fluorinated in a nonaqueous solvent by a fluorinating agent to produce a difluoro group represented by the formula (2). In the step of the ionic complex compound (2), oxalic acid is formed as a by-product, so that both hydrogen fluoride and oxalic acid are removed. Therefore, after the preparation of the difluoro-ionic complex (2), the first or second is used. The purification steps of the purification method of the electrolyte solution of the embodiment are combined to produce an electrolyte solution containing the difluoro-ionic complex (2) having less acidic impurities.

於製造二氟離子性錯合物(2)之步驟中,藉由向下述通式(1)所表示之配位有3分子雙牙配位基而成之六配位離子性錯合物(以下有時稱為六配位離子性錯合物(1))中導入氟,而製造下述通式(2)所表示之二氟離子性錯合物(以下有時稱為二氟離子性錯合物(2))。 In the step of producing the difluoroionic complex (2), a hexacoordinate ionic complex formed by coordinating a 3-molecular bidentate ligand represented by the following formula (1) (hereinafter, referred to as a hexa-coordinate ionic complex (1)), fluorine is introduced to produce a difluoro-ionic complex represented by the following formula (2) (hereinafter sometimes referred to as difluoro ion) Sexual complex (2)).

[化7] [Chemistry 7]

於通式(1)、(2)中,A+為選自由金屬離子、質子及鎓離子所組成之群中之任一者,就發揮有助於非水電解液電池中之離子傳導之作用之觀點而言,較佳為鋰離子、鈉離子、鉀離子、或四級烷基銨離子。作為四級烷基銨離子,並無特別限定,例如可列舉三甲基丙基銨、或1-丁基-1-甲基吡咯烷鎓。 In the general formulae (1) and (2), A + is selected from the group consisting of metal ions, protons, and strontium ions, and functions to contribute to ion conduction in a nonaqueous electrolyte battery. From the viewpoint, lithium ion, sodium ion, potassium ion or quaternary alkyl ammonium ion is preferred. The quaternary alkyl ammonium ion is not particularly limited, and examples thereof include trimethylpropylammonium or 1-butyl-1-methylpyrrolidinium.

又,於通式(1)、(2)中,M為選自由P、As及Sb所組成之群中之任一者。F為氟原子。O為氧原子。Y為碳原子或硫原子。於Y為碳原子之情形時,q為1。於Y為硫原子之情形時,q為1或2。W表示碳數1~10之可具有雜原子或鹵素原子之烴基(於碳數為3以上之情形時,亦可使用支鏈或環狀結構者)、或-N(R1)-。此時,R1表示氫原子、鹼金屬、碳數1~10之可具有雜原子或鹵素原子之烴基。於碳數為3以上之情形時,R1亦可取支鏈或環狀結構。Z為碳原子。p表示0或1,q表示0~2之整數,r表示0~2之整數,s表示0或1,且為p+r≧1。 Further, in the general formulae (1) and (2), M is any one selected from the group consisting of P, As, and Sb. F is a fluorine atom. O is an oxygen atom. Y is a carbon atom or a sulfur atom. When Y is a carbon atom, q is 1. In the case where Y is a sulfur atom, q is 1 or 2. W represents a hydrocarbon group having a carbon number of 1 to 10 which may have a hetero atom or a halogen atom (in the case where the carbon number is 3 or more, a branched or cyclic structure may be used) or -N(R 1 )-. In this case, R 1 represents a hydrogen atom, an alkali metal, or a hydrocarbon group having 1 to 10 carbon atoms which may have a hetero atom or a halogen atom. When the carbon number is 3 or more, R 1 may take a branched or cyclic structure. Z is a carbon atom. p represents 0 or 1, q represents an integer from 0 to 2, r represents an integer from 0 to 2, s represents 0 or 1, and is p+r≧1.

上述六配位離子性錯合物(1)、以及二氟離子性錯合物(2)之陰離 子部分之各元素較佳為選自(a)、(b)、(c)中之至少一者之組合。 The above-mentioned six-coordinate ionic complex (1) and the diion-ionic complex (2) Each element of the sub-portion is preferably selected from the group consisting of at least one of (a), (b), and (c).

(a)M=P,Y=C,p、q、s=1,r=0草酸 (a) M = P, Y = C, p, q, s = 1, r = 0 oxalic acid

(b)M=P,W=C(CF3)2,p、q=0,r、s=1六氟羥基異丁酸 (b) M=P, W=C(CF 3 ) 2 , p, q=0, r, s=1 hexafluorohydroxyisobutyric acid

(c)M=P,W=C(CF3)2,p、q、s=0,r=2全氟頻那醇 (c) M=P, W=C(CF 3 ) 2 , p, q, s=0, r=2 perfluoropinacol

於使六配位離子性錯合物(1)溶解或懸浮於非水溶劑中後,使用相對於六配位離子性錯合物(1)為1.5倍莫耳以上且50莫耳倍以下之氟化劑選擇性地進行氟化,藉此獲得二氟離子性錯合物(2)。此時,氟化劑之使用量較佳為1.8~40莫耳倍,進而較佳為2.0~20莫耳倍。 After dissolving or suspending the hexacoordinate ionic complex (1) in a nonaqueous solvent, it is used in an amount of 1.5 times or more and 50 moles or less relative to the hexacoordinate ionic complex (1). The fluorinating agent is selectively fluorinated, whereby a difluoroionic complex (2) is obtained. At this time, the amount of the fluorinating agent to be used is preferably 1.8 to 40 moles, and more preferably 2.0 to 20 moles.

作為氟化劑,可使用於添加至非水溶劑中時,產生氟化物離子之離子性氟化劑,其中,較佳為酸性氟化鉀、酸性氟化鈉、酸性氟化銨、氟化氫過量之有機胺氟化氫鹽、氟化氫等酸性者,就反應速度較快之方面而言,進而較佳為氟化氫。 As the fluorinating agent, an ionic fluorinating agent which generates fluoride ions when added to a nonaqueous solvent can be used, and among them, acidic potassium fluoride, acidic sodium fluoride, acidic ammonium fluoride, and hydrogen fluoride are preferably used in excess. The acidity such as an organic amine hydrogen fluoride salt or hydrogen fluoride is preferably hydrogen fluoride in terms of a faster reaction rate.

於氟化時,除氟化劑以外亦可添加酸或路易斯酸。藉由添加酸、或路易斯酸,能夠使反應液中之質子濃度上升,使進行使用氟化 劑之氟導入時之反應速度提高。於此,作為除氟化劑以外之酸(質子酸或布忍斯特酸),可使用硫酸、氟磺酸、氯化氫、甲磺酸、三氟甲磺酸、三氟乙酸、硝酸、對甲苯磺酸,作為除氟化劑以外之路易斯酸,可使用三氟化硼、五氟化磷、三氯化鋁、五氯化鈮、三氟甲磺酸金屬鹽(陽離子為Li、Na、K、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Y)。特別是使用三氟甲磺酸、甲磺酸、三氟乙酸提高反應速度之效果較大,故而較佳。 In the case of fluorination, an acid or a Lewis acid may be added in addition to the fluorinating agent. By adding an acid or a Lewis acid, the proton concentration in the reaction liquid can be increased, and fluorination can be performed. The reaction rate of the agent when fluorine is introduced is increased. Here, as the acid other than the fluorinating agent (protonic acid or blister acid), sulfuric acid, fluorosulfonic acid, hydrogen chloride, methanesulfonic acid, trifluoromethanesulfonic acid, trifluoroacetic acid, nitric acid, p-toluene may be used. As the Lewis acid other than the fluorinating agent, boron trifluoride, phosphorus pentafluoride, aluminum trichloride, antimony pentachloride, and metal triflate (cations of Li, Na, K, etc.) may be used. La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Y). In particular, it is preferred to use trifluoromethanesulfonic acid, methanesulfonic acid or trifluoroacetic acid to increase the reaction rate.

除氟化劑以外之酸或路易斯酸之當量相對於六配位離子性錯合物(1),較佳為0.001~2.0莫耳當量。若除氟化劑以外之酸或路易斯酸之量過少,則提高反應速度之效果較小,若量過多,則不僅成本上升,而且進行生成物之分解。 The equivalent of the acid or Lewis acid other than the fluorinating agent is preferably 0.001 to 2.0 mol equivalents based on the hexacoordinate ionic complex (1). When the amount of the acid or the Lewis acid other than the fluorinating agent is too small, the effect of increasing the reaction rate is small, and if the amount is too large, not only the cost is increased but also the decomposition of the product proceeds.

藉由添加酸、或路易斯酸,亦可使用除上述酸性之氟化劑以外之氟化劑,於該情形時,可使用氟化鉀、氟化鈉、氟化鋰、氟化銫、氟化鎳、氟化鈣、氟化銻、氟化鐵、氟化鋅、氟化錳、氟化鏡、氟化鉿、氟化鈷、氟化銨、氟化四丁基銨等,其中,較佳為氟化鉀、氟化鈉、氟化鋰、氟化銫、氟化鈣、氟化鎳、氟化鈷、氟化鐵、氟化鋅、氟化錳、氟化銨,進而,就選擇性之觀點而言,較佳為氟化鋰、氟化鈉、氟化鉀、氟化銫、氟化鈣、氟化鎳、氟化鐵、氟化鋅、氟化銨。 A fluorinating agent other than the above acidic fluorinating agent may also be used by adding an acid or a Lewis acid. In this case, potassium fluoride, sodium fluoride, lithium fluoride, cesium fluoride, fluorination may be used. Nickel, calcium fluoride, barium fluoride, iron fluoride, zinc fluoride, manganese fluoride, fluorinated mirror, barium fluoride, cobalt fluoride, ammonium fluoride, tetrabutylammonium fluoride, etc., among which, It is potassium fluoride, sodium fluoride, lithium fluoride, barium fluoride, calcium fluoride, nickel fluoride, cobalt fluoride, iron fluoride, zinc fluoride, manganese fluoride, ammonium fluoride, and further, selectivity From the viewpoint, lithium fluoride, sodium fluoride, potassium fluoride, cesium fluoride, calcium fluoride, nickel fluoride, iron fluoride, zinc fluoride, or ammonium fluoride is preferable.

用於以上所述之合成法中之非水溶劑係即便為極微量亦可使成為原料之六配位離子性錯合物(1)溶解者,宜為不與系統內之化合物進行反應者,較佳為相對介電常數為2以上者。於此,於使用完全無溶解度之非水溶劑之情形時,由於氟化變得非常緩慢,故而欠佳。只要有稍許溶解度,則由於目標二氟離子性錯合物(2)之溶解度較高,故而進行反應。例如可使用碳酸酯類、酯類、酮類、內酯類、醚類、腈類、醯胺類、碸類等,不僅可為單一之溶劑,亦可為兩種以上之混合溶劑。 The nonaqueous solvent used in the above-mentioned synthesis method may dissolve the hexacoordinate ionic complex (1) which is a raw material even if it is in a very small amount, and it is preferred that it does not react with a compound in the system. It is preferred that the relative dielectric constant is 2 or more. Here, in the case of using a non-aqueous solvent having no solubility at all, the fluorination becomes very slow, which is not preferable. As long as there is a slight solubility, the reaction is carried out because the solubility of the target difluoroionic complex (2) is high. For example, carbonates, esters, ketones, lactones, ethers, nitriles, guanamines, anthracenes, and the like can be used, and they may be a single solvent or a mixed solvent of two or more kinds.

作為非水溶劑之具體例,可列舉:碳酸二甲酯、碳酸甲酯乙酯、碳酸二乙酯、碳酸甲酯丙酯、碳酸乙酯丙酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、丙酸甲酯、丙酸乙酯、丙酸丁酯、丙酮、甲基乙基酮、二乙基酮、γ-丁內酯、γ-戊內酯、四氫呋喃、四氫吡喃、二丁醚、二異丙醚、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷、乙腈、丙腈、N,N-二甲基甲醯胺、二甲基亞碸、環丁碸等,其中,較佳為沸點為120℃以下之溶劑,進而較佳為碳酸二甲酯、碳酸甲酯乙酯、碳酸二乙酯、乙酸乙酯、丙酸甲酯、丙酸乙酯、丙酮、四氫呋喃、1,2-二甲氧基乙烷、乙腈。 Specific examples of the nonaqueous solvent include dimethyl carbonate, ethyl methyl carbonate, diethyl carbonate, methyl propyl carbonate, ethyl propyl carbonate, ethyl acetate, propyl acetate, and butyl acetate. , methyl propionate, ethyl propionate, butyl propionate, acetone, methyl ethyl ketone, diethyl ketone, γ-butyrolactone, γ-valerolactone, tetrahydrofuran, tetrahydropyran, dibutyl Ether, diisopropyl ether, 1,2-dimethoxyethane, 1,2-diethoxyethane, acetonitrile, propionitrile, N,N-dimethylformamide, dimethyl alum And cyclodextrin, etc., among them, a solvent having a boiling point of 120 ° C or lower is preferred, and further preferably dimethyl carbonate, methyl carbonate, diethyl carbonate, ethyl acetate, methyl propionate, propionic acid Ethyl ester, acetone, tetrahydrofuran, 1,2-dimethoxyethane, acetonitrile.

進行使用氟化劑之氟導入時之反應溫度為-60℃~150℃,較佳為-20~120℃。若為低於-60℃之溫度,則存在氟導入未充分地進行之可能性,若為150℃以上,則存在引起成為原料之六配位離子性錯合物(1)、或作為生成物之二氟離子性錯合物(2)之分解之可能性。為了獲得充分之氟導入速度,並且不引起分解,-20~120℃之範圍最佳。 The reaction temperature at the time of introducing fluorine using a fluorinating agent is -60 ° C to 150 ° C, preferably -20 to 120 ° C. When the temperature is lower than -60 ° C, the fluorine introduction may not be sufficiently performed. When the temperature is 150 ° C or higher, the hexa-coordinate ionic complex (1) which is a raw material may be present or may be produced as a product. The possibility of decomposition of the difluoro-ionic complex (2). In order to obtain a sufficient fluorine introduction speed and not cause decomposition, the range of -20 to 120 ° C is optimal.

又,反應時間可根據反應速度而進行適當選擇,但長時間佔據裝置會導致生產成本之上升,故而現實中較佳為設為72小時以下。進而,為了使系統整體之反應進行,較佳為於反應過程中攪拌溶液。 Further, the reaction time can be appropriately selected depending on the reaction rate. However, if the device is occupied for a long period of time, the production cost is increased. Therefore, in practice, it is preferably 72 hours or less. Further, in order to carry out the reaction of the entire system, it is preferred to stir the solution during the reaction.

較佳為於進行氟化後,為了降低殘留游離酸濃度而進行減壓操作,進而視需要藉由過濾去除析出物。此時,非水溶劑之一部分亦被蒸餾去除,故而作為生成物之二氟離子性錯合物(2)之濃度被濃縮。於減壓操作中,可使用真空泵、吸出器等。減壓操作係藉由在將使反應器設為密閉狀態後,再將系統內保持於大氣壓以下之壓力而進行。系統內之壓力係根據純化對象之液體之溫度及蒸汽壓而變化,因此無法一概而論,但減壓較佳為使槽內之真空度保持於絕對壓力80kPa以下。若保持之壓力超過80kPa,則進行排除直至使殘留游離酸濃度成為所期望之濃度以下為止需要較長時間,故而欠佳。又,若保持之壓 力為50kPa以下,則可將反應生成物及未反應純化劑排除至低濃度,故而進而較佳。再者,若考慮裝置之負擔,則較佳為將絕對壓力設為20kPa以上。特別是於上述六配位離子性錯合物(1)及上述二氟離子性錯合物(2)之配位基為草酸之情形時,較佳為於進行氟化後進行減壓操作,將溶劑之一部分蒸餾去除而使二氟離子性錯合物(2)濃縮,此時藉由過濾而分離所析出之草酸。 It is preferred to carry out a pressure reduction operation in order to reduce the residual free acid concentration after the fluorination, and to remove the precipitate by filtration as necessary. At this time, part of the nonaqueous solvent is also distilled off, so that the concentration of the difluoroionic complex (2) as a product is concentrated. In the decompression operation, a vacuum pump, an aspirator, or the like can be used. The pressure reduction operation is carried out by maintaining the pressure in the system at a pressure equal to or lower than atmospheric pressure after the reactor is sealed. The pressure in the system varies depending on the temperature of the liquid to be purified and the vapor pressure, and therefore cannot be generalized. However, the pressure reduction is preferably such that the degree of vacuum in the tank is maintained at an absolute pressure of 80 kPa or less. When the pressure to be maintained exceeds 80 kPa, it is not preferable until the residual free acid concentration is equal to or lower than the desired concentration, and it takes a long time. Again, if the pressure is maintained When the force is 50 kPa or less, the reaction product and the unreacted purifying agent can be excluded to a low concentration, which is further preferable. Further, in consideration of the burden on the device, it is preferable to set the absolute pressure to 20 kPa or more. In particular, when the ligand of the above-mentioned six-coordinate ionic complex (1) and the above-mentioned difluoro-ionic complex (2) is oxalic acid, it is preferred to carry out a pressure reduction operation after fluorination. One part of the solvent was distilled off to concentrate the difluoroionic complex (2), and the precipitated oxalic acid was separated by filtration.

[實施例] [Examples]

以下,藉由實施例對本發明具體地進行說明,但本發明不受該實施例限定。 Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited by the examples.

任一原料或生成物之處理均於露點為-50℃以下之氮氣氛圍下進行。又,所使用之玻璃製反應器、氟樹脂製反應器係使用以150℃乾燥12小時以上後,於露點為-50℃以下之氮氣氣流下冷卻至室溫者。 The treatment of any of the raw materials or products was carried out under a nitrogen atmosphere having a dew point of -50 ° C or lower. Further, the glass reactor and the fluororesin reactor used were each dried at 150 ° C for 12 hours or more, and then cooled to room temperature under a nitrogen gas stream having a dew point of -50 ° C or lower.

[試驗液之製備] [Preparation of test solution]

藉由以下之程序,製備表1所示之用於脫游離酸處理試驗中之試驗液,作為至少含有氟化氫作為雜質之溶解有電解質之溶液。再者,游離酸值係由將酸之莫耳濃度換算成HF之質量且以鹽(例如於試驗液A中為(2a-Li))作為基準之值表示。 The test liquid used in the deacidification treatment test shown in Table 1 was prepared by the following procedure as a solution in which an electrolyte was dissolved containing at least hydrogen fluoride as an impurity. Further, the free acid value is represented by a value obtained by converting the molar concentration of the acid into the mass of HF and using a salt (for example, (2a-Li) in the test liquid A) as a reference.

[試驗液A] [Test solution A]

按照非專利文獻2所揭示之方法,獲得作為配位有3分子草酸之六配位離子性錯合物之三草酸基磷酸鋰(1a-Li)。於500mL氟樹脂製反應器中,添加作為電解質之(1a-Li)(30g、99.4mmol),並追加作為非水溶劑之碳酸甲酯乙酯(以下稱為EMC)(120mL)並使其溶解後,添加作為氟化劑之氟化氫(以下稱為HF)(11.9g、596.2mmol、6.0莫耳當量)。於25℃下攪拌24小時後,於減壓下進行殘留之HF之去除及濃縮。藉由過濾去除所析出之草酸後,利用F、P-NMR(nuclear magnetic resonance,核磁共振)求出轉化率及選擇率,藉由硝酸銀滴定求出殘 留氯濃度,藉由游離酸滴定求出殘留游離酸濃度,結果為,向目標之配位有2分子草酸之二氟離子性錯合物(2a-Li)之轉化率為71.0%,選擇率為95.4%,以二氟離子性錯合物(2a-Li)作為基準,殘留氯濃度未達100質量ppm,殘留游離酸濃度為2000質量ppm。 According to the method disclosed in Non-Patent Document 2, lithium oxalate lithium phosphate (1a-Li) as a hexacoordinate ionic complex compound having three molecules of oxalic acid is obtained. Into a 500 mL fluororesin reactor, (1a-Li) (30 g, 99.4 mmol) as an electrolyte was added, and methyl carbonate (hereinafter referred to as EMC) (120 mL) as a nonaqueous solvent was added and dissolved. Thereafter, hydrogen fluoride (hereinafter referred to as HF) (11.9 g, 596.2 mmol, 6.0 mol equivalent) as a fluorinating agent was added. After stirring at 25 ° C for 24 hours, the residual HF was removed and concentrated under reduced pressure. After the precipitated oxalic acid was removed by filtration, the conversion rate and the selectivity were determined by F, P-NMR (nuclear magnetic resonance), and the residue was determined by silver nitrate titration. The residual chlorine concentration was determined by free acid titration. As a result, the conversion ratio of the dichloro ionic complex (2a-Li) having 2 molecules of oxalic acid to the target was 71.0%, and the selectivity was selected. 95.4%, based on the difluoroionic complex (2a-Li), the residual chlorine concentration was less than 100 ppm by mass, and the residual free acid concentration was 2000 ppm by mass.

轉化率[%]=目標物莫耳% Conversion rate [%] = target mole %

選擇率[%]=轉化率/(100-殘留原料莫耳%)×100 Selection rate [%] = conversion rate / (100 - residual raw material mole %) × 100

將所獲得之(2a-Li)/EMC溶液調整為鹽濃度約25質量%,而製成試驗液A。藉由離子層析法測定試驗液A中之游離酸(陰離子側)之明細,結果氟化物陰離子與草酸根陰離子之莫耳比為1:1.5。由此可知,2000質量ppm之游離酸係源自HF之500質量ppm、及源自草酸之1500質量ppm(換算成HF)。 The obtained (2a-Li)/EMC solution was adjusted to have a salt concentration of about 25% by mass to prepare Test Solution A. The details of the free acid (anion side) in the test liquid A were determined by ion chromatography, and as a result, the molar ratio of the fluoride anion to the oxalate anion was 1:1.5. From this, it is understood that the free acid of 2000 ppm by mass is derived from 500 ppm by mass of HF and 1500 ppm by mass derived from oxalic acid (in terms of HF).

再者,確認出於將氟化氫之添加量設為2.0莫耳當量,添加作為用以使反應加速之酸之三氟甲磺酸(以下稱為TfOH)0.02莫耳當量,並於0℃下攪拌24小時之情形時,向二氟離子性錯合物(2a-Li)之轉化率為94.2%,選擇率為95.2%,且藉由在TfOH存在下進行氟化反應,而提高反應速度。 In addition, it was confirmed that the addition amount of hydrogen fluoride was 2.0 mol equivalent, and trifluoromethanesulfonic acid (hereinafter referred to as TfOH) as an acid for accelerating the reaction was added at 0.02 mol equivalent, and stirred at 0 ° C. At 24 hours, the conversion to the difluoroionic complex (2a-Li) was 94.2%, the selectivity was 95.2%, and the reaction rate was increased by carrying out a fluorination reaction in the presence of TfOH.

[試驗液B] [Test solution B]

將試驗液A濃縮至鹽濃度約50質量%,並藉由過濾去除所析出之固體。於溫度25℃下一面進行攪拌,一面相對於所獲得之濃縮液之質量添加6質量倍之氯仿,而使固體析出。藉由過濾回收所析出之(2a-Li)。於此,所回收之(2a-Li)所含之游離酸濃度係以(2a-Li)作為基準而未達20質量ppm。使該(2a-Li)溶解於EMC,製備25質量%之EMC溶液。對該EMC溶液100g添加草酸(0.11g、1.3mmol),製成包含以(2a-Li)作為基準且以HF換算為2000質量ppm之草酸之試驗液B。 The test liquid A was concentrated to a salt concentration of about 50% by mass, and the precipitated solid was removed by filtration. While stirring at a temperature of 25 ° C, 6 times by mass of chloroform was added to the mass of the obtained concentrate to precipitate a solid. The precipitated (2a-Li) was recovered by filtration. Here, the concentration of the free acid contained in the recovered (2a-Li) was less than 20 ppm by mass based on (2a-Li). This (2a-Li) was dissolved in EMC to prepare a 25% by mass EMC solution. Oxalic acid (0.11 g, 1.3 mmol) was added to 100 g of the EMC solution to prepare a test liquid B containing oxalic acid in an amount of 2,000 ppm by mass based on (2a-Li).

[試驗液C] [Test solution C]

將試驗液A濃縮至鹽濃度約50質量%,並藉由過濾去除所析出之 固體。於溫度25℃下一面進行攪拌,一面相對於所獲得之濃縮液之質量添加6質量倍之氯仿而使固體析出。藉由過濾回收所析出之(2a-Li)。於此,所回收之(2a-Li)所含之游離酸濃度係以(2a-Li)作為基準而未達20質量ppm。使該(2a-Li)溶解於EMC,製備25質量%之EMC溶液。對該EMC溶液100g添加HF(0.05g、2.5mmol),製成包含以(2a-Li)作為基準為2000質量ppm之HF之試驗液C。 The test solution A was concentrated to a salt concentration of about 50% by mass, and the precipitate was removed by filtration. solid. The mixture was stirred at a temperature of 25 ° C, and 6 mass times of chloroform was added to the mass of the obtained concentrate to precipitate a solid. The precipitated (2a-Li) was recovered by filtration. Here, the concentration of the free acid contained in the recovered (2a-Li) was less than 20 ppm by mass based on (2a-Li). This (2a-Li) was dissolved in EMC to prepare a 25% by mass EMC solution. HF (0.05 g, 2.5 mmol) was added to 100 g of the EMC solution to prepare a test liquid C containing HF of 2000 mass ppm based on (2a-Li).

[試驗液D] [Test solution D]

對試驗液A(100g)進行減壓濃縮(50℃、1.3kPa),去除EMC。若於殘留之固體殘渣(30g)中添加碳酸二甲酯(以下稱為DMC)(70g)而製備鹽濃度約25質量%之(2a-Li)/DMC溶液,並測定游離酸濃度,則以(2a-Li)作為基準為1750質量ppm。藉由離子層析法測定該游離酸(陰離子側)之明細,結果氟化物陰離子與草酸根陰離子之莫耳比為1:3。由此可知,1750質量ppm之游離酸係源自HF之250質量ppm、及源自草酸之1500質量ppm(換算成HF)。於該(2a-Li)/DMC溶液中添加HF(0.006g),製成包含以(2a-Li)作為基準為500質量ppm之HF、及以HF換算為1500質量ppm之草酸之試驗液D。 Test solution A (100 g) was concentrated under reduced pressure (50 ° C, 1.3 kPa) to remove EMC. When a dimethyl carbonate (hereinafter referred to as DMC) (70 g) is added to the residual solid residue (30 g) to prepare a (2a-Li)/DMC solution having a salt concentration of about 25% by mass, and the free acid concentration is measured, (2a-Li) was 1750 mass ppm as a standard. The details of the free acid (anion side) were determined by ion chromatography, and the molar ratio of the fluoride anion to the oxalate anion was 1:3. From this, it was found that 1750 ppm by mass of the free acid was derived from 250 ppm by mass of HF and 1500 ppm by mass derived from oxalic acid (in terms of HF). HF (0.006 g) was added to the (2a-Li)/DMC solution to prepare a test liquid D containing HF of 500 mass ppm based on (2a-Li) and oxalic acid of 1500 mass ppm in terms of HF. .

[試驗液E] [Test solution E]

根據上述試驗液C之製備程序,並將EMC變更為DMC,藉此獲得包含以(2a-Li)作為基準為2000質量ppm之HF之試驗液E。 According to the preparation procedure of the test liquid C described above, the EMC was changed to DMC, thereby obtaining a test liquid E containing HF of 2000 mass ppm based on (2a-Li).

[試驗液F] [Test solution F]

根據上述試驗液D之製備程序,並將DMC變更為碳酸二乙酯(以下稱為DEC),藉此獲得包含以(2a-Li)作為基準為500質量ppm之HF、及以HF換算為1500質量ppm之草酸之試驗液F。 According to the preparation procedure of the test liquid D, DMC was changed to diethyl carbonate (hereinafter referred to as DEC), thereby obtaining HF containing 500 mass ppm based on (2a-Li) and 1500 in terms of HF. Test solution F of oxalic acid of mass ppm.

[試驗液G] [Test solution G]

根據上述試驗液C之製備程序,並將EMC變更為DEC,藉此獲得包含以(2a-Li)作為基準為2000質量ppm之HF之試驗液G。 According to the preparation procedure of the test liquid C described above, the EMC was changed to DEC, whereby the test liquid G containing HF of 2000 mass ppm based on (2a-Li) was obtained.

[試驗液H] [Test solution H]

根據上述試驗液D之製備程序,並將DMC變更為四氫呋喃(以下稱為THF),藉此獲得包含以(2a-Li)作為基準為500質量ppm之HF、及以HF換算為1500質量ppm之草酸之試驗液H。 According to the preparation procedure of the test liquid D, the DMC was changed to tetrahydrofuran (hereinafter referred to as THF), thereby obtaining HF of 500 ppm by mass based on (2a-Li) and 1500 ppm by mass in terms of HF. Oxalic acid test solution H.

[試驗液I] [Test solution I]

根據上述試驗液C之製備程序,並將EMC變更為THF,藉此獲得包含以(2a-Li)作為基準為2000質量ppm之HF之試驗液I。 According to the preparation procedure of the test liquid C described above, EMC was changed to THF, thereby obtaining a test liquid I containing HF of 2000 mass ppm based on (2a-Li).

[試驗液J] [Test solution J]

根據上述試驗液D之製備程序,並將DMC變更為乙酸乙酯(以下稱為AcOEt),藉此獲得包含以(2a-Li)作為基準為500質量ppm之HF、及以HF換算為1500質量ppm之草酸之試驗液J。 According to the preparation procedure of the test liquid D described above, DMC was changed to ethyl acetate (hereinafter referred to as AcOEt), thereby obtaining HF of 500 ppm by mass based on (2a-Li) and 1500 mass in terms of HF. Phenolic acid test solution J.

[試驗液K] [Test solution K]

根據上述試驗液C之製備程序,並將EMC變更為AcOEt,藉此獲得包含以(2a-Li)作為基準為2000質量ppm之HF之試驗液K。 According to the preparation procedure of the test liquid C described above, EMC was changed to AcOEt, thereby obtaining a test liquid K containing HF of 2000 mass ppm based on (2a-Li).

[試驗液L] [Test solution L]

根據上述試驗液D之製備程序,並將DMC變更為乙腈(以下稱為CH3CN),藉此獲得包含以(2a-Li)作為基準為500質量ppm之HF、及以HF換算為1500質量ppm之草酸之試驗液L。 According to the preparation procedure of the test liquid D described above, DMC was changed to acetonitrile (hereinafter referred to as CH 3 CN), thereby obtaining HF of 500 ppm by mass based on (2a-Li) and 1500 mass in terms of HF. Test solution L of oxalic acid of ppm.

[試驗液M] [Test solution M]

根據上述試驗液C之製備程序,並將EMC變更為CH3CN,藉此獲得包含以(2a-Li)作為基準為2000質量ppm之HF之試驗液M。 According to the preparation procedure of the test liquid C described above, the EMC was changed to CH 3 CN, whereby the test liquid M containing HF of 2000 mass ppm based on (2a-Li) was obtained.

[試驗液N] [Test solution N]

按照非專利文獻2所揭示之方法,獲得作為配位有3分子草酸之六配位離子性錯合物之三草酸基磷酸鋰(1a-Li)。稱取Dow Chemical製造之強酸性陽離子交換樹脂252(以下稱為離子交換樹脂)500g,將其浸漬於0.1當量濃度之氫氧化鈉水溶液(2.5kg)中,並於25℃下攪拌6小 時。藉由過濾回收離子交換樹脂,並利用純水充分地洗淨直至洗液之pH值成為8以下。其後,藉由12小時之減壓乾燥(120℃、1.3kPa)去除水分。使(1a-Li)(30g、99.4mmol)溶解於EMC(270mL),於此添加150g之經乾燥過之上述離子交換樹脂,並於25℃下攪拌6小時。其後,藉由過濾去除離子交換樹脂,藉此,獲得陽離子自Li+轉化為Na+之(1a-Na)/EMC溶液。若藉由離子層析法進行陽離子之定量,則Na+/Li+之比率為99.4。 According to the method disclosed in Non-Patent Document 2, lithium oxalate lithium phosphate (1a-Li) as a hexacoordinate ionic complex compound having three molecules of oxalic acid is obtained. 500 g of a strongly acidic cation exchange resin 252 (hereinafter referred to as an ion exchange resin) manufactured by Dow Chemical was weighed and immersed in a 0.1 equivalent aqueous sodium hydroxide solution (2.5 kg), and stirred at 25 ° C for 6 hours. The ion exchange resin was recovered by filtration, and sufficiently washed with pure water until the pH of the washing liquid became 8 or less. Thereafter, the water was removed by drying under reduced pressure (120 ° C, 1.3 kPa) for 12 hours. (1a-Li) (30 g, 99.4 mmol) was dissolved in EMC (270 mL), and 150 g of the dried ion exchange resin was added thereto, and stirred at 25 ° C for 6 hours. Thereafter, the ion exchange resin was removed by filtration, whereby a (1a-Na)/EMC solution in which a cation was converted from Li + to Na + was obtained. When performed by ion chromatography of cations quantitative, the Na + / Li + ratio of 99.4.

進行減壓濃縮直至(1a-Na)/EMC溶液之鹽濃度成為約20質量%。其後,添加HF(4.0g、198.7mmol、2.0莫耳當量)、及三氟甲磺酸(以下稱為TfOH)(0.03g、0.2mmol、0.002莫耳當量)。於溫度25℃下攪拌72小時後,於減壓下進行殘留之HF及添加之酸之去除及濃縮。於藉由過濾去除所析出之草酸後,利用F、P-NMR求出轉化率及選擇率,藉由硝酸銀滴定求出殘留氯濃度,藉由游離酸滴定求出殘留游離酸濃度,結果為,向目標二氟離子性錯合物(2a-Na)之轉化率為94.8%,選擇率為96.0%,以二氟離子性錯合物(2a-Na)作為基準,殘留氯濃度未達100質量ppm,殘留游離酸濃度為2000質量ppm。 The concentration under reduced pressure was adjusted until the salt concentration of the (1a-Na)/EMC solution became about 20% by mass. Thereafter, HF (4.0 g, 198.7 mmol, 2.0 mol equivalent) and trifluoromethanesulfonic acid (hereinafter referred to as TfOH) (0.03 g, 0.2 mmol, 0.002 molar equivalent) were added. After stirring at a temperature of 25 ° C for 72 hours, the residual HF and the added acid were removed and concentrated under reduced pressure. After removing the precipitated oxalic acid by filtration, the conversion ratio and the selectivity were determined by F and P-NMR, and the residual chlorine concentration was determined by silver nitrate titration, and the residual free acid concentration was determined by free acid titration. The conversion rate to the target difluoro-ionic complex (2a-Na) was 94.8%, the selectivity was 96.0%, and the residual chlorine concentration was less than 100% based on the difluoro-ionic complex (2a-Na). The residual free acid concentration was 2,000 ppm by mass.

將所獲得之(2a-Na)/EMC溶液調整為鹽濃度約25質量%,製成試驗液N。藉由離子層析法測定試驗液N中之游離酸(陰離子側)之明細,結果氟化物陰離子與草酸根陰離子之莫耳比為1:2。由此可知,2000質量ppm之游離酸係源自HF之400質量ppm、及源自草酸之1600質量ppm(換算成HF)。 The obtained (2a-Na)/EMC solution was adjusted to have a salt concentration of about 25% by mass to prepare a test liquid N. The details of the free acid (anion side) in the test liquid N were determined by ion chromatography, and the molar ratio of the fluoride anion to the oxalate anion was 1:2. From this, it is understood that the free acid of 2000 ppm by mass is derived from 400 ppm by mass of HF and 1600 ppm by mass derived from oxalic acid (in terms of HF).

[試驗液O] [Test solution O]

稱取離子交換樹脂500g,浸漬於0.1當量濃度之氫氧化鈉水溶液(2.5kg)中,並於25℃下攪拌6小時。藉由過濾回收離子交換樹脂,並利用純水充分地洗淨直至洗液之pH成為8以下。其後,藉由12小時之減壓乾燥(120℃、1.3kPa)去除水分。 500 g of an ion exchange resin was weighed, immersed in a 0.1 N aqueous solution of sodium hydroxide (2.5 kg), and stirred at 25 ° C for 6 hours. The ion exchange resin was recovered by filtration and sufficiently washed with pure water until the pH of the washing liquid became 8 or less. Thereafter, the water was removed by drying under reduced pressure (120 ° C, 1.3 kPa) for 12 hours.

將試驗液A濃縮至鹽濃度約50質量%,並藉由過濾去除所析出之固體。於溫度25℃下一面進行攪拌,一面相對於所獲得之濃縮液之質量添加6質量倍之氯仿,而使固體析出。藉由過濾回收所析出之(2a-Li)。於此,所回收之(2a-Li)所含之游離酸濃度係以(2a-Li)作為基準而未達20質量ppm。使該(2a-Li)(25g、99.4mmol)溶解於EMC(275mL),於此添加150g之經乾燥過之上述離子交換樹脂,並於25℃下攪拌6小時。其後,藉由過濾去除離子交換樹脂,藉此,獲得陽離子自Li+轉化為Na+之(2a-Na)/EMC溶液。若藉由離子層析法進行陽離子之定量,則Na+/Li+之比率為99.3。於製備成鹽濃度約25質量%後,對該EMC溶液100g添加HF(0.05g、2.5mmol),獲得包含以(2a-Na)作為基準為2000質量ppm之HF之試驗液O。 The test liquid A was concentrated to a salt concentration of about 50% by mass, and the precipitated solid was removed by filtration. While stirring at a temperature of 25 ° C, 6 times by mass of chloroform was added to the mass of the obtained concentrate to precipitate a solid. The precipitated (2a-Li) was recovered by filtration. Here, the concentration of the free acid contained in the recovered (2a-Li) was less than 20 ppm by mass based on (2a-Li). This (2a-Li) (25 g, 99.4 mmol) was dissolved in EMC (275 mL), and 150 g of the dried ion exchange resin was added thereto, and stirred at 25 ° C for 6 hours. Thereafter, the ion exchange resin was removed by filtration, whereby a (2a-Na)/EMC solution in which a cation was converted from Li + to Na + was obtained. If the cation is quantified by ion chromatography, the ratio of Na + /Li + is 99.3. After preparing a salt concentration of about 25% by mass, HF (0.05 g, 2.5 mmol) was added to 100 g of the EMC solution to obtain a test liquid O containing HF of 2000 mass ppm based on (2a-Na).

[試驗液P] [Test solution P]

使LiPF6(25g)溶解於EMC(75g)後,添加HF(0.05g、2.5mmol),製成包含以LiPF6作為基準為2000質量ppm之HF之試驗液P。 After dissolving LiPF 6 (25 g) in EMC (75 g), HF (0.05 g, 2.5 mmol) was added to prepare a test liquid P containing HF of 2000 ppm by mass based on LiPF 6 .

[試驗液Q] [Test solution Q]

使NaPF6(25g)溶解於EMC(75g)後,添加HF(0.05g、2.5mmol),製成包含以NaPF6作為基準為2000質量ppm之HF之試驗液Q。 After dissolving NaPF 6 (25 g) in EMC (75 g), HF (0.05 g, 2.5 mmol) was added to prepare a test liquid Q containing HF of 2000 mass ppm based on NaPF 6 .

[試驗液R] [Test solution R]

使LiBF4(25g)溶解於EMC(75g)後,添加HF(0.05g、2.5mmol),製成包含以LiBF4作為基準為2000質量ppm之HF之試驗液R。 After LiBF 4 (25 g) was dissolved in EMC (75 g), HF (0.05 g, 2.5 mmol) was added to prepare a test liquid R containing HF of 2000 mass ppm based on LiBF 4 .

[試驗液S] [Test solution S]

使LiFSI(25g)溶解於EMC(75g)後,添加HF(0.05g、2.5mmol),製成包含以LiFSI作為基準為2000質量ppm之HF之試驗液S。 After dissolving LiFSI (25 g) in EMC (75 g), HF (0.05 g, 2.5 mmol) was added to prepare a test liquid S containing HF of 2000 mass ppm based on LiFSI.

[試驗液T] [Test solution T]

使LiDFPI(25g)溶解於EMC(75g)後,添加HF(0.05g、2.5mmol),製成包含以LiDFPI作為基準為2000質量ppm之HF之試驗液 T。 After dissolving LiDFPI (25 g) in EMC (75 g), HF (0.05 g, 2.5 mmol) was added to prepare a test liquid containing HF of 2000 ppm by mass based on LiDFPI. T.

將各試驗液之組成示於表1。表1中,PF6表示六氟磷酸根陰離子,BF4表示四氟硼酸根陰離子,FSI表示雙(氟磺醯基)醯亞胺陰離子,DFPI表示雙(二氟磷酸基)醯亞胺陰離子。 The composition of each test liquid is shown in Table 1. In Table 1, PF 6 represents a hexafluorophosphate anion, BF 4 represents a tetrafluoroborate anion, FSI represents a bis(fluorosulfonyl) quinone imine anion, and DFPI represents a bis(difluorophosphate) quinone imine anion.

通常要求電解液中之游離酸濃度以氟化氫換算約為200質量ppm以下之品質者。由於大多在電解液中包含數%~十數%之離子性錯合物,故而為了達成此種氟化氫濃度,包含離子性錯合物之各試驗液必須設為以將離子性錯合物作為基準之氟化氫濃度計約1000質量ppm以下。 The concentration of the free acid in the electrolytic solution is usually required to be about 200 ppm by mass or less in terms of hydrogen fluoride. Since most of the ionic complexes are contained in the electrolytic solution in an amount of several to ten percent, in order to achieve such a hydrogen fluoride concentration, each test liquid containing an ionic complex must be used as a reference for the ionic complex. The hydrogen fluoride concentration is about 1000 ppm by mass or less.

[實施例1-1] [Example 1-1]

對試驗液A(100g)添加作為純化劑之亞硫醯氯(0.36g、3.0mmol,相對於HF換算游離酸2000質量ppm為1.2eq.),並於溫度25℃下攪拌6小時。藉此,氟化氫及亞硫醯氯係藉由反應而轉化為揮發性較高之氯化氫、亞硫醯氟。其後,於溫度20~40℃、壓力以絕對壓力計為50~80kPa下,進行減壓,而去除反應生成物,同時蒸餾去除EMC 25g,從而將離子性錯合物濃縮。對游離酸濃度進行測定,結果以將(2a-Li)作為基準之HF換算之值為200質量ppm。 To the test liquid A (100 g), sulfoxide (0.36 g, 3.0 mmol, 1.2 eq. of 2000 mass ppm of free acid with respect to HF) was added as a purifying agent, and the mixture was stirred at a temperature of 25 ° C for 6 hours. Thereby, hydrogen fluoride and sulphur-thin chloride are converted into highly volatile hydrogen chloride and sulfoxide by reaction. Thereafter, at a temperature of 20 to 40 ° C and a pressure of 50 to 80 kPa under an absolute pressure, the pressure was reduced to remove the reaction product, and at the same time, 25 g of EMC was distilled off to concentrate the ionic complex. When the free acid concentration was measured, the value in terms of HF in terms of (2a-Li) was 200 ppm by mass.

[實施例1-2] [Example 1-2]

將溫度自25℃變更為40℃,除此以外,藉由與實施例1-1相同之程序進行處理,結果游離酸濃度未達100質量ppm。 The treatment was carried out in the same manner as in Example 1-1 except that the temperature was changed from 25 ° C to 40 ° C. As a result, the free acid concentration was less than 100 ppm by mass.

[實施例1-3] [Example 1-3]

將溫度自25℃變更為40℃,將攪拌時間自6小時變更為3小時,並於攪拌中將乾燥氮氣(10mL/min)連續地吹入至溶液中,除此以外,藉由與實施例1-1相同之程序進行處理,結果游離酸濃度未達100質量ppm。 The temperature was changed from 25 ° C to 40 ° C, the stirring time was changed from 6 hours to 3 hours, and dry nitrogen gas (10 mL / min) was continuously blown into the solution while stirring, except for the examples. The same procedure as in 1-1 was carried out, and as a result, the free acid concentration was less than 100 ppm by mass.

[實施例1-4] [Example 1-4]

對試驗液A(100g)添加亞硫醯氯(0.36g、3.0mmol,相對於HF換算游離酸2000質量ppm為1.2eq.),於溫度40℃下減壓至壓力以絕對壓力計為50~80kPa,並進行3小時攪拌。藉由氮氣恢復至大氣壓,添加EMC 5g而恢復至初始試驗液重量100g。其後,於溫度20~40℃、壓力以絕對壓力計為50~80kPa下,進行減壓濃縮,蒸餾去除EMC 25g。對游離酸濃度進行測定,結果以將(2a-Li)作為基準之HF換算之值未達100質量ppm。 To the test liquid A (100 g), ruthenium chloride (0.36 g, 3.0 mmol, 1.2 eq. per 2,000 ppm by mass of HF in terms of HF) was added, and the pressure was reduced to a pressure at a temperature of 40 ° C to an absolute pressure of 50 Å. 80 kPa and stirring for 3 hours. The pressure was returned to atmospheric pressure by nitrogen, and 5 g of EMC was added to return to the initial test liquid weight of 100 g. Thereafter, the pressure was concentrated at a temperature of 20 to 40 ° C and the pressure was 50 to 80 kPa under absolute pressure, and 25 g of EMC was distilled off. When the free acid concentration was measured, the value in terms of HF converted to (2a-Li) was less than 100 ppm by mass.

[實施例1-5] [Example 1-5]

使用試驗液B,將攪拌時間自6小時變更為3小時,除此以外,藉由與實施例1-2相同之程序進行處理,結果游離酸濃度未達100質量 ppm。 The test solution B was used to change the stirring time from 6 hours to 3 hours, except that the same procedure as in Example 1-2 was carried out, and the free acid concentration was less than 100%. Ppm.

[實施例1-6] [Example 1-6]

使用試驗液C,將攪拌時間自6小時變更為3小時,除此以外,藉由與實施例1-2相同之程序進行處理,結果游離酸濃度為600質量ppm。 The test solution C was used to carry out the treatment in the same manner as in Example 1-2 except that the stirring time was changed from 6 hours to 3 hours. As a result, the free acid concentration was 600 ppm by mass.

[實施例1-7] [Examples 1-7]

將亞硫醯氯之添加量變更為0.59g、5.0mmol(相對於HF換算游離酸2000質量ppm為2.0eq.),除此以外,藉由與實施例1-6相同之程序進行處理,結果游離酸濃度為200質量ppm。 The same procedure as in Example 1-6 was carried out, except that the amount of the addition of the sulphur sulphate was changed to 0.59 g and 5.0 mmol (2.0 eq. per 2,000 ppm by mass of the free acid in terms of HF). The free acid concentration was 200 ppm by mass.

[實施例1-8] [Examples 1-8]

使用試驗液C,將亞硫醯氯之添加量變更為0.59g、5.0mmol,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度未達100質量ppm。 In the same manner as in Example 1-4 except that the amount of the sulfite chloride was changed to 0.59 g and 5.0 mmol, the free acid concentration was less than 100 ppm by mass.

[比較例1-1] [Comparative Example 1-1]

對試驗液A(100g)於溫度40℃下,一面將乾燥氮氣(10mL/min)連續地吹入至溶液中一面攪拌3小時。其後,於溫度20~40℃下進行減壓濃縮,蒸餾去除EMC 25g。對游離酸濃度進行測定,結果為2000質量ppm。 The test liquid A (100 g) was stirred while being continuously blown into the solution at a temperature of 40 ° C for 3 hours while continuously blowing dry nitrogen gas (10 mL/min). Thereafter, the mixture was concentrated under reduced pressure at a temperature of 20 to 40 ° C, and 25 g of EMC was distilled off. The free acid concentration was measured and found to be 2000 ppm by mass.

[比較例1-2] [Comparative Example 1-2]

對試驗液A(100g)於溫度40℃下,將容器內之壓力保持為減壓(50~80kPa)並攪拌3小時。其後,於溫度20~40℃下進行減壓濃縮,蒸餾去除EMC 25g。對游離酸濃度進行測定,結果以將(2a-Li)作為基準之HF換算之值為1900質量ppm。 The test solution A (100 g) was kept at a reduced pressure (50 to 80 kPa) at a temperature of 40 ° C and stirred for 3 hours. Thereafter, the mixture was concentrated under reduced pressure at a temperature of 20 to 40 ° C, and 25 g of EMC was distilled off. When the free acid concentration was measured, the value in terms of HF in terms of (2a-Li) was 1900 ppm by mass.

[比較例1-3] [Comparative Example 1-3]

對包含氟化氫但幾乎不含草酸之試驗液C(100g)於溫度40℃下,將容器內之壓力保持為減壓(50~80kPa)並攪拌3小時。其後,於溫度 20~40℃下進行減壓濃縮,蒸餾去除EMC 25g。對游離酸濃度進行測定,結果以將(2a-Li)作為基準之HF換算之值為1700質量ppm。 The test solution C (100 g) containing hydrogen fluoride but containing almost no oxalic acid was kept at a reduced pressure (50 to 80 kPa) at a temperature of 40 ° C and stirred for 3 hours. Thereafter, at temperature Concentrated under reduced pressure at 20 to 40 ° C, and distilled to remove 25 g of EMC. When the free acid concentration was measured, the value in terms of HF in terms of (2a-Li) was 1,700 ppm by mass.

[比較例1-4] [Comparative Example 1-4]

使用乙醯氯(0.24g、3.0mmol、相對於游離酸為1.2eq.)代替亞硫醯氯,除此以外,藉由與實施例1-1相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為1300質量ppm。 The free acid concentration was determined by the same procedure as in Example 1-1 except that acetamidine chloride (0.24 g, 3.0 mmol, 1.2 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as described above was 1300 ppm by mass.

[比較例1-5] [Comparative Example 1-5]

使用乙醯氯(0.39g、5.0mmol,相對於游離酸為2.0eq.)代替亞硫醯氯,除此以外,藉由與實施例1-6相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為1100質量ppm。 The free acid concentration was determined by the same procedure as in Example 1-6 except that acetamidine chloride (0.39 g, 5.0 mmol, 2.0 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as described above was 1100 ppm by mass.

[實施例2-1] [Example 2-1]

對試驗液D(100g)添加亞硫醯氯(0.36g、3.0mmol,相對於HF換算游離酸2000質量ppm為1.2eq.),於溫度40℃下減壓至壓力50~80kPa,並攪拌3小時。藉由氮氣恢復至大氣壓,添加相當於操作中被蒸餾去除而減少之重量之程度之DMC,而恢復至初始試驗液重量100g。其後,於溫度20~40℃下進行減壓濃縮,蒸餾去除DMC 25g。對游離酸濃度進行測定,結果以將(2a-Li)作為基準之HF換算之值未達100質量ppm。 To the test liquid D (100 g), ruthenium chloride (0.36 g, 3.0 mmol, 1.2 eq. per 2,000 ppm by mass of HF in terms of HF) was added, and the pressure was reduced to 50 to 80 kPa at a temperature of 40 ° C, and stirred. hour. The nitrogen gas was returned to atmospheric pressure, and DMC, which is equivalent to the weight which was reduced by distillation during the operation, was added, and returned to the initial test liquid weight of 100 g. Thereafter, the mixture was concentrated under reduced pressure at a temperature of 20 to 40 ° C, and 25 g of DMC was distilled off. When the free acid concentration was measured, the value in terms of HF converted to (2a-Li) was less than 100 ppm by mass.

[實施例2-2] [Example 2-2]

對試驗液E(100g)添加亞硫醯氯(0.59g、5.0mmol,相對於HF換算游離酸2000質量ppm為2.0eq.),於溫度40℃下減壓至壓力50~80kPa,並攪拌3小時。藉由氮氣恢復至大氣壓,添加相當於操作中被蒸餾去除而減少之重量之程度之DMC,而恢復至初始試驗液重量100g。其後,於溫度20~40℃下進行減壓濃縮,蒸餾去除DMC 25g。對游離酸濃度進行測定,結果以將(2a-Li)作為基準之HF換算之值未達100質量ppm。 To the test liquid E (100 g), ruthenium chloride (0.59 g, 5.0 mmol, 2.0 eq. of 2000 mass ppm of free acid in terms of HF) was added, and the pressure was reduced to 50 to 80 kPa at a temperature of 40 ° C, and stirred. hour. The nitrogen gas was returned to atmospheric pressure, and DMC, which is equivalent to the weight which was reduced by distillation during the operation, was added, and returned to the initial test liquid weight of 100 g. Thereafter, the mixture was concentrated under reduced pressure at a temperature of 20 to 40 ° C, and 25 g of DMC was distilled off. When the free acid concentration was measured, the value in terms of HF converted to (2a-Li) was less than 100 ppm by mass.

[實施例2-3] [Example 2-3]

將使用之試驗液變更為F,將DMC變更為DEC,除此以外,藉由與實施例2-1相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to F, DMC was changed to DEC, and the same procedure as in Example 2-1 was carried out. As a result, the free acid concentration (the same HF conversion value as described above) was less than 100%. Ppm.

[實施例2-4] [Example 2-4]

將使用之試驗液變更為G,將DMC變更為DEC,除此以外,藉由與實施例2-2相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to G, and the DMC was changed to DEC. Otherwise, the free acid concentration (the same HF conversion value as described above) was less than 100% by the same procedure as in Example 2-2. Ppm.

[實施例2-5] [Example 2-5]

將使用之試驗液變更為H,將DMC變更為THF,除此以外,藉由與實施例2-1相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration (the same HF conversion value as described above) was less than 100%, except that the test solution used was changed to H and the DMC was changed to THF, except that the same procedure as in Example 2-1 was carried out. Ppm.

[實施例2-6] [Example 2-6]

將使用之試驗液變更為I,將DMC變更為THF,除此以外,藉由與實施例2-2相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration (the same HF conversion value as described above) was less than 100 mass, except that the test liquid used was changed to I, and DMC was changed to THF, and the same procedure as in Example 2-2 was carried out. Ppm.

[實施例2-7] [Examples 2-7]

將使用之試驗液變更為J,將DMC變更為AcOEt,除此以外,藉由與實施例2-1相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to J, DMC was changed to AcOEt, and the same procedure as in Example 2-1 was carried out. As a result, the free acid concentration (the same HF conversion value as described above) was less than 100%. Ppm.

[實施例2-8] [Example 2-8]

將使用之試驗液變更為K,將DMC變更為AcOEt,除此以外,藉由與實施例2-2相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to K, the DMC was changed to AcOEt, and the same procedure as in Example 2-2 was carried out. As a result, the free acid concentration (the same HF conversion value as described above) was less than 100%. Ppm.

[實施例2-9] [Embodiment 2-9]

將使用之試驗液變更為L,將DMC變更為CH3CN,除此以外,藉 由與實施例2-1相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration (the same HF conversion value as described above) was not obtained by changing the test liquid to L and changing the DMC to CH 3 CN, except that the same procedure as in Example 2-1 was carried out. 100 mass ppm.

[實施例2-10] [Example 2-10]

將使用之試驗液變更為M,將DMC變更為CH3CN,除此以外,藉由與實施例2-2相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為100質量ppm。 The free acid concentration (the same HF converted value as described above) was 100, except that the test liquid used was changed to M and the DMC was changed to CH 3 CN. The same procedure as in Example 2-2 was carried out. Mass ppm.

將實施例1-1~1-8、比較例1-1~1-5、實施例2-1~2-10之結果示於表2。表2中,SOCl2表示亞硫醯氯,AcCl表示乙醯氯。 The results of Examples 1-1 to 1-8, Comparative Examples 1-1 to 1-5, and Examples 2-1 to 2-10 are shown in Table 2. In Table 2, SOCl 2 represents thiophosphorus chloride, and AcCl represents ethyl hydrazine chloride.

藉由25℃下利用亞硫醯氯1.2莫耳當量進行之6小時之處理,使游離酸降低至200質量ppm(實施例1-1),進而藉由使溫度上升至40℃, 游離酸降低至未達100質量ppm(實施例1-2)。又,藉由在減壓下進行利用亞硫醯氯之處理操作、或導入氮氣,而提高脫游離酸速度,於40℃下3小時內,游離酸未達100質量ppm(實施例1-3、1-4)。 The free acid was reduced to 200 ppm by mass (Example 1-1) by treatment with a ruthenium chloride 1.2 molar equivalent at 25 ° C for 6 hours, and then the temperature was raised to 40 ° C. The free acid was reduced to less than 100 ppm by mass (Examples 1-2). Further, by performing a treatment operation using sulphur oxychloride chlorine under reduced pressure or introducing nitrogen gas, the rate of free acid removal is increased, and the free acid is less than 100 ppm by mass in 3 hours at 40 ° C (Examples 1-3) 1-4).

游離酸濃度雖同為2000質量ppm,但於其主成分為草酸之情形時,於亞硫醯氯1.2莫耳當量、40℃下3小時之條件下,殘留游離酸濃度下降至未達100ppm(實施例1-5),相對於此,於游離酸濃度2000質量ppm之主成分為HF之情形時,於亞硫醯氯1.2莫耳當量、40℃下3小時之條件下,游離酸僅降至600質量ppm(實施例1-6)。藉由將亞硫醯氯增加至2.0莫耳當量,可使游離酸降低至200質量ppm(實施例1-7),進而,藉由使用2.0莫耳當量之亞硫醯氯並於減壓下進行處理,可使游離酸降至未達100質量ppm(實施例1-8)。 Although the free acid concentration is 2000 ppm by mass, when the main component is oxalic acid, the residual free acid concentration drops to less than 100 ppm under the conditions of 1.2 mol% of sulfoxide, and 3 hours at 40 °C ( In the case of Example 1-5), in the case where the main component of the free acid concentration of 2000 ppm by mass is HF, the free acid is only lowered under the conditions of 1.2 mol% of sulfinium chloride and 3 hours at 40 °C. Up to 600 ppm by mass (Examples 1-6). The free acid can be reduced to 200 ppm by mass (Examples 1-7) by increasing the sulfinium chloride to 2.0 molar equivalents, and further, by using 2.0 molar equivalents of sulfoxide and under reduced pressure. Treatment can reduce the free acid to less than 100 ppm by mass (Examples 1-8).

可推測其原因在於:相對於草酸與亞硫醯氯之反應為不可逆(產生一氧化碳、二氧化碳並排出至系統外),HF與亞硫醯氯之反應為可逆。但是,生成之亞硫醯氟等係即便不進行減壓等亦作為氣體而排出至反應系統外,故而與如比較例1-5般將乙醯氯用作純化劑之情形相比,能夠快速地去除HF。可認為藉由減壓或氮氣導入,將生成之HCl、亞硫醯氟或亞硫醯氟氯自系統內連續地去除,藉此,逆反應之進行受到限制,亞硫醯氯之氟化之反應被加速,結果為脫游離酸速度變快。 It is presumed that the reaction is that the reaction between HF and sulphur oxychloride is reversible relative to the reaction of oxalic acid with sulphide chloride being irreversible (carbon monoxide, carbon dioxide is produced and discharged outside the system). However, the produced sulfoxide or the like is discharged as a gas to the outside of the reaction system without being subjected to a reduced pressure or the like. Therefore, compared with the case where acetonitrile is used as a purifying agent as in Comparative Example 1-5, it can be quickly Ground removal of HF. It is considered that the generated HCl, sulfinium fluoride or sulfinium fluorochloride is continuously removed from the system by pressure reduction or nitrogen introduction, whereby the reaction of the reverse reaction is restricted, and the fluorination reaction of sulfinium chloride It is accelerated, and as a result, the rate of free acid removal becomes faster.

使用2種HF換算游離酸濃度2000質量ppm之試驗液(源自HF之500質量ppm+源自草酸之1500質量ppm、及源自HF之2000質量ppm),於DMC、DEC、THF、AcOEt、CH3CN之系統內,進行利用亞硫醯氯之脫游離酸研究,結果幾乎未見因溶劑而導致之差異,除使用CH3CN之實施例2-10以外,所有(實施例2-1~2-9)殘留游離酸濃度均未達100質量ppm。 Test liquid having a free acid concentration of 2000 mass ppm (500 mass ppm derived from HF + 1500 mass ppm derived from oxalic acid and 2000 mass ppm derived from HF) in two kinds of HF, in DMC, DEC, THF, AcOEt, CH 3 In the system of CN, the de-free acid using sulphur sulphur chloride was studied, and as a result, almost no difference due to the solvent was observed, except for Example 2-10 using CH 3 CN (Example 2-1~) 2-9) The residual free acid concentration was less than 100 ppm by mass.

僅藉由減壓操作或氮氣導入操作而不使用亞硫醯氯,幾乎無法 使游離酸濃度(與上述相同之HF換算值)降低(比較例1-1、1-2、1-3)。又,於使用乙醯氯而非亞硫醯氯作為純化劑之情形時,殘留游離酸濃度超過1000質量ppm,藉由25℃下6小時或40℃下3小時之反應溫度及反應時間,無法將氟化氫去除至足夠低之濃度。可認為其原因在於:由於乙醯氯經氟化而成之乙醯氟之沸點為20℃左右,且於反應系統中無減壓操作或氮氣導入,故而乙醯氟存留於反應系統內,氟化氫與純化劑之反應速度未充分地提高(比較例1-4、1-5)。 It is almost impossible to use sulphur dioxide without pressure reduction or nitrogen introduction. The free acid concentration (the same HF converted value as described above) was lowered (Comparative Examples 1-1, 1-2, 1-3). Further, in the case where ethyl ruthenium chloride is used instead of ruthenium chloride as a purifying agent, the residual free acid concentration exceeds 1000 ppm by mass, and the reaction temperature and reaction time at 6 hours at 25 ° C or 3 hours at 40 ° C cannot be used. The hydrogen fluoride is removed to a sufficiently low concentration. It can be considered that the reason is that since the boiling point of the ethyl fluorinated fluorinated acetonitrile is about 20 ° C, and there is no decompression operation or nitrogen introduction in the reaction system, acetonitrile is retained in the reaction system, and hydrogen fluoride is stored. The reaction rate with the purifying agent was not sufficiently improved (Comparative Examples 1-4, 1-5).

[實施例3-1] [Example 3-1]

將使用之試驗液變更為N,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 When the test liquid to be used was changed to N, the treatment was carried out in the same manner as in Example 1-4, and as a result, the free acid concentration (the same HF conversion value as described above) was less than 100 ppm by mass.

[實施例3-2] [Example 3-2]

將使用之試驗液變更為O,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 When the test liquid to be used was changed to O, the treatment was carried out in the same manner as in Example 1-8, and as a result, the free acid concentration (the same HF conversion value as described above) was less than 100 ppm by mass.

[實施例3-3] [Example 3-3]

將使用之試驗液變更為P,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to P, and the treatment was carried out in the same manner as in Example 1-8. As a result, the free acid concentration (the same HF conversion value as described above) was less than 100 ppm by mass.

[實施例3-4] [Example 3-4]

將使用之試驗液變更為Q,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to Q, and the treatment was carried out in the same manner as in Example 1-8. As a result, the free acid concentration (the same HF conversion value as described above) was less than 100 ppm by mass.

[實施例3-5] [Example 3-5]

將使用之試驗液變更為R,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質 量ppm。 The test solution was changed to R, and the same procedure as in Example 1-8 was carried out, and as a result, the free acid concentration (the same HF conversion value as described above) was less than 100. The amount is ppm.

[實施例3-6] [Examples 3-6]

將使用之試驗液變更為S,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to S, and the treatment was carried out in the same manner as in Example 1-8. As a result, the free acid concentration (the same HF conversion value as described above) was less than 100 ppm by mass.

[實施例3-7] [Examples 3-7]

將使用之試驗液變更為T,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The test solution was changed to T, and the same procedure as in Example 1-8 was carried out, and as a result, the free acid concentration (the same HF conversion value as described above) was less than 100 ppm by mass.

將實施例3-1~3-7之結果示於表3。 The results of Examples 3-1 to 3-7 are shown in Table 3.

於將溶解於試驗液中之鹽之陰離子種自二氟離子性錯合物(2a)更換成PF6、BF4、FSI、DFPI,將陽離子種自Li更換成Na之情形時,包含於試驗液中之游離酸(僅HF、或者HF及草酸)之利用亞硫醯氯所進行之反應亦無問題地進行,處理後之殘留游離酸濃度均未達100質量ppm。再者,於實施例3-1中游離酸之明細主要集中於草酸,故而將亞硫醯氯之莫耳當量設為1.2,於實施例3-2~3-7中游離酸之主成分為HF,故而使用2.0莫耳當量之亞硫醯氯。 When the anion species of the salt dissolved in the test solution is changed from the difluoro ion complex (2a) to PF 6 , BF 4 , FSI, DFPI, and the cationic species is replaced with Li from Li, it is included in the test. The reaction of the free acid (only HF, or HF and oxalic acid) in the liquid with sulfoxide was carried out without any problem, and the residual free acid concentration after the treatment was less than 100 ppm by mass. Furthermore, in the example 3-1, the details of the free acid are mainly concentrated on oxalic acid, so the molar equivalent of thiocyanine chloride is 1.2, and the main components of the free acid in the examples 3-2 to 3-7 are HF, so 2.0 molar equivalents of sulfinium chloride were used.

[實施例4-1] [Example 4-1]

使用乙醯氯(0.24g、3.0mmol、相對於游離酸為1.2eq.)代替亞硫醯氯,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration was determined by the same procedure as in Example 1-4 except that acetamidine chloride (0.24 g, 3.0 mmol, 1.2 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as described above is less than 100 ppm by mass.

[實施例4-2] [Example 4-2]

使用乙醯氯(0.39g、5.0mmol,相對於游離酸為2.0eq.)代替亞硫醯氯,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration was determined by the same procedure as in Example 1-8 except that acetaminophen (0.39 g, 5.0 mmol, 2.0 eq. relative to the free acid) was used instead of sulphur. The same HF conversion value as described above is less than 100 ppm by mass.

[實施例4-3] [Example 4-3]

使用草醯氯(0.38g、3.0mmol,相對於游離酸為1.2eq.)代替亞硫醯氯,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration was determined by the same procedure as in Example 1-4 except that chloroform (0.38 g, 3.0 mmol, 1.2 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as described above is less than 100 ppm by mass.

[實施例4-4] [Example 4-4]

使用草醯氯(0.63g、5.0mmol,相對於游離酸為2.0eq.)代替亞硫醯氯,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為150質量ppm。 The free acid concentration was determined by the same procedure as in Example 1-8 except that grass chlorobenzene (0.63 g, 5.0 mmol, 2.0 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as described above was 150 ppm by mass.

[實施例4-5] [Example 4-5]

使用氯甲酸甲酯(0.28g、3.0mmol,相對於游離酸為1.2eq.)代替亞硫醯氯,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration was obtained by the same procedure as in Example 1-4 except that methyl chloroformate (0.28 g, 3.0 mmol, 1.2 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as above is less than 100 ppm by mass.

[實施例4-6] [Examples 4-6]

使用氯甲酸甲酯(0.47g、5.0mmol,相對於游離酸為2.0eq.)代替亞硫醯氯,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為100質量ppm。 The free acid concentration was obtained by the same procedure as in Example 1-8 except that methyl chloroformate (0.47 g, 5.0 mmol, 2.0 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as described above is 100 ppm by mass.

[實施例4-7] [Examples 4-7]

使用三氟甲磺醯氯(0.51g、3.0mmol,相對於游離酸為1.2eq.)代 替亞硫醯氯,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 Trifluoromethanesulfonium chloride (0.51 g, 3.0 mmol, 1.2 eq. relative to the free acid) was used. In the same manner as in Example 1-4, the free acid concentration (the same HF conversion value as described above) was less than 100 ppm by mass.

[實施例4-8] [Examples 4-8]

使用三氟甲磺醯氯(0.84g、5.0mmol,相對於游離酸為2.0eq.)代替亞硫醯氯,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為100質量ppm。 The free acid was obtained by the same procedure as in Example 1-8 except that trifluoromethanesulfonium chloride (0.84 g, 5.0 mmol, 2.0 eq. relative to the free acid) was used instead of sulfinium chloride. The concentration (the same HF converted value as described above) was 100 ppm by mass.

[實施例4-9] [Examples 4-9]

使用甲磺醯氯(0.34g、3.0mmol,相對於游離酸為1.2eq.)代替亞硫醯氯,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)未達100質量ppm。 The free acid concentration was obtained by the same procedure as in Example 1-4 except that methanesulfonium chloride (0.34 g, 3.0 mmol, 1.2 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as above is less than 100 ppm by mass.

[實施例4-10] [Examples 4-10]

使用甲磺醯氯(0.57g、5.0mmol,相對於游離酸為2.0eq.)代替亞硫醯氯,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為100質量ppm。 The free acid concentration was obtained by the same procedure as in Example 1-8 except that methanesulfonium chloride (0.57 g, 5.0 mmol, 2.0 eq. relative to the free acid) was used instead of sulfinium chloride. The same HF conversion value as described above is 100 ppm by mass.

[實施例4-11] [Examples 4-11]

使用氯化三甲基矽烷(0.33g、3.0mmol,相對於游離酸為1.2eq.)代替亞硫醯氯,除此以外,藉由與實施例1-4相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為1000質量ppm。 The free acid was treated by the same procedure as in Example 1-4 except that trimethyl decane chloride (0.33 g, 3.0 mmol, 1.2 eq. relative to the free acid) was used instead of sulfinium chloride. The concentration (the same HF converted value as described above) was 1000 ppm by mass.

[實施例4-12] [Examples 4-12]

使用氯化三甲基矽烷(0.54g、5.0mmol,相對於游離酸為2.0eq.)代替亞硫醯氯,除此以外,藉由與實施例1-8相同之程序進行處理,結果游離酸濃度(與上述相同之HF換算值)為100質量ppm。 The free acid was obtained by the same procedure as in Example 1-8 except that trimethyl decane chloride (0.54 g, 5.0 mmol, 2.0 eq. relative to the free acid) was used instead of sulphur. The concentration (the same HF converted value as described above) was 100 ppm by mass.

將實施例4-1~4-12之結果示於表4。表4中,AcCl表示乙醯氯,(COCl)2表示草醯氯,ClCO2Me表示氯甲酸甲酯,TfCl表示三氟甲磺醯氯、MsCl表示甲磺醯氯,TMSCl表示氯化三甲基矽烷。 The results of Examples 4-1 to 4-12 are shown in Table 4. Table 4, AcCl represents acetyl chloride, (COCl) 2 oxalyl represents acyl chloride, ClCO 2 Me represents methyl chloroformate, TfCl represents trifluoromethanesulfonic acyl chloride, MsCl represents methanesulfonyl acyl chloride, TMSCl represents three chloride Base decane.

[表4] [Table 4]

於將乙醯氯用作純化劑之情形時,藉由在與純化劑之反應過程中進行減壓,可使生成後之殘留游離酸濃度減少至100質量ppm,和在與純化劑之反應過程中不進行減壓之情形時相比,可使殘留游離酸濃度大幅降低(實施例4-1、4-2與比較例1-4、1-5之比較)。 In the case where acetoin is used as a purifying agent, the residual free acid concentration after the formation can be reduced to 100 ppm by mass by performing a pressure reduction during the reaction with the purifying agent, and in the reaction with the purifying agent. The residual free acid concentration can be greatly reduced as compared with the case where the pressure is not reduced (comparison of Examples 4-1 and 4-2 with Comparative Examples 1-4 and 1-5).

於以上之將純化劑自亞硫醯氯變更為其他之研究中,於草酸成為游離酸之主成分之系統中,於使用除TMSCl以外之純化劑之情形時,可使殘留游離酸濃度降低至未達100質量ppm。相對於此(實施例4-1、4-3、4-5、4-7、4-9),於純化劑為TMSCl之實施例4-11之情形時,處理後之游離酸濃度為1000質量ppm。其原因在於:TMSCl與草酸之反應速度較慢。於游離酸僅由HF構成之情形時,若使用AcCl則能夠達成處理後之游離酸濃度未達100質量ppm,相對於此,若使用(COCl)2或ClCO2Me、TfCl、MsCl、TMSCl,則成為100~150質量ppm,可確認到效果稍微降低。 In the above study, the purification agent was changed from sulfinium chloride to other studies. In the system where oxalic acid became the main component of the free acid, the residual free acid concentration was reduced to the case where a purification agent other than TMSCl was used. Less than 100 ppm by mass. Relative to this (Examples 4-1, 4-3, 4-5, 4-7, 4-9), in the case of Example 4-11 where the purifying agent was TMSCl, the free acid concentration after the treatment was 1000. Mass ppm. The reason is that the reaction rate of TMSCl with oxalic acid is slow. In the case where the free acid is composed only of HF, the use of AcCl can achieve a concentration of free acid of less than 100 ppm by mass, whereas (COCl) 2 or ClCO 2 Me, TfCl, MsCl, TMSCl, Then, it was 100 to 150 mass ppm, and it was confirmed that the effect was slightly lowered.

Claims (13)

一種電解質溶液之純化方法,其特徵在於包括如下步驟:向至少含有氟化氫及草酸作為雜質之於非水溶劑中溶解有電解質之電解質溶液中,添加包含選自由草醯氯、氯甲酸甲酯、氯甲酸乙酯、乙醯氯、三氟乙醯氯、三氟甲磺醯氯、甲磺醯氯、及亞硫醯氯所組成之群中之一者或該等之混合物之純化劑,使上述雜質與上述純化劑進行反應,一面將反應生成物抽出至反應系統外;以及藉由將反應生成物氯化氫、經氟化之上述純化劑及上述純化劑與草酸之反應分解物、以及未反應之上述純化劑去除,而去除上述雜質。 A method for purifying an electrolyte solution, comprising the steps of: adding an electrolyte solution containing at least hydrogen fluoride and oxalic acid as an impurity to an electrolyte dissolved in a nonaqueous solvent, comprising: selected from the group consisting of grass chloroform, methyl chloroformate, and chlorine One of a group consisting of ethyl formate, ethyl chloroform, trifluoroacetamidine chloride, trifluoromethanesulfonium chloride, methanesulfonyl chloride, and sulfinium chloride, or a purifying agent of the mixture, The impurities are reacted with the above-mentioned purifying agent to extract the reaction product out of the reaction system; and the reaction product hydrogen chloride, the fluorinated above-mentioned purifying agent, and the reaction product of the above-mentioned purifying agent with oxalic acid, and unreacted The above purifying agent is removed to remove the above impurities. 如請求項1之電解質溶液之純化方法,其中將上述反應生成物抽出至反應系統外之方法為減壓、或向溶液中導入惰性氣體。 The method for purifying an electrolyte solution according to claim 1, wherein the method of extracting the reaction product to the outside of the reaction system is a pressure reduction or introduction of an inert gas into the solution. 如請求項1或2之電解質溶液之純化方法,其中去除上述反應生成物及未反應之上述純化劑之方法為減壓、或向溶液中導入惰性氣體。 The method for purifying an electrolyte solution according to claim 1 or 2, wherein the method of removing the above reaction product and the unreacted purification agent is a method of depressurizing or introducing an inert gas into the solution. 如請求項1或2之電解質溶液之純化方法,其中上述電解質為鹽,且上述鹽之陽離子包含選自由鋰陽離子、鈉陽離子、鉀陽離子、及四級烷基銨陽離子所組成之群中之一者或該等之混合物。 The method for purifying an electrolyte solution according to claim 1 or 2, wherein the electrolyte is a salt, and the cation of the salt comprises one selected from the group consisting of a lithium cation, a sodium cation, a potassium cation, and a quaternary alkyl ammonium cation. Or a mixture of such. 如請求項1或2之電解質溶液之純化方法,其中上述電解質為鹽,且上述鹽之陰離子包含選自由六氟磷酸根陰離子、四氟硼酸根陰離子、雙(氟磺醯基)醯亞胺陰離子、雙(三氟甲磺醯基)醯亞胺 陰離子、及雙(二氟磷酸基)醯亞胺陰離子所組成之群中之一者或該等之混合物。 The method for purifying an electrolyte solution according to claim 1 or 2, wherein the electrolyte is a salt, and the anion of the salt comprises an anion selected from the group consisting of an hexafluorophosphate anion, a tetrafluoroborate anion, and a bis(fluorosulfonyl) quinone anion Bis(trifluoromethanesulfonyl) fluorene One of a group consisting of an anion, and an bis(difluorophosphate) quinone imine anion or a mixture thereof. 如請求項1或2之電解質溶液之純化方法,其中上述電解質為鹽,且上述鹽包含選自由六氟磷酸鋰、六氟磷酸鈉、六氟磷酸鉀、四氟硼酸鋰、四氟硼酸鈉、四氟硼酸鉀、雙(氟磺醯基)醯亞胺鋰、雙(氟磺醯基)醯亞胺鈉、雙(氟磺醯基)醯亞胺鉀、雙(三氟甲磺醯基)醯亞胺鋰、雙(三氟甲磺醯基)醯亞胺鈉、雙(三氟甲磺醯基)醯亞胺鉀、雙(二氟磷酸基)醯亞胺鋰、雙(二氟磷酸基)醯亞胺鈉、雙(二氟磷酸基)醯亞胺鉀、及通式(2)所表示之二氟離子性錯合物(2a)、(2b)、(2c)所組成之群中之一者或該等之混合物;再者,二氟離子性錯合物(2a)、(2b)、(2c)係構成之各元素分別如下所述之通式(2)所表示之二氟離子性錯合物,(2a)A=Li、Na、K或四級烷基銨,M=P,Y=C,Z=C,p、q及s=1,r=0(2b)A=Li、Na、K或四級烷基銨,M=P,W=C(CF3)2,Z=C,p及q=0,r及s=1(2c)A=Li、Na、K或四級烷基銨,M=P,W=C(CF3)2,Z=C,p、q及s=0,r=2 The method for purifying an electrolyte solution according to claim 1 or 2, wherein the electrolyte is a salt, and the salt comprises a salt selected from the group consisting of lithium hexafluorophosphate, sodium hexafluorophosphate, potassium hexafluorophosphate, lithium tetrafluoroborate, sodium tetrafluoroborate, and tetrafluoroboric acid. Potassium, lithium bis(fluorosulfonyl) phthalimide, sodium bis(fluorosulfonyl) phthalimide, potassium bis(fluorosulfonyl) phthalimide, bis(trifluoromethanesulfonyl) quinone Lithium, sodium bis(trifluoromethanesulfonyl) sulfoximine, potassium bis(trifluoromethanesulfonyl) phthalimide, lithium bis(difluorophosphate) ruthenium hydride, bis(difluorophosphate) ruthenium One of a group consisting of sodium imide, potassium bis(difluorophosphate) phthalimide, and difluoroionic complexes (2a), (2b), and (2c) represented by the formula (2) And a mixture of the above; in addition, each element of the difluoroionic complex (2a), (2b), and (2c) is difluoroionic represented by the following formula (2) Complex, (2a) A = Li, Na, K or quaternary alkyl ammonium, M = P, Y = C, Z = C, p, q and s = 1, r = 0 (2b) A = Li , Na, K or quaternary alkyl ammonium, M = P, W = C (CF 3 ) 2 , Z = C, p and q = 0, r and s = 1 (2c) A = Li, Na, K or four alkylammonium, M = P, W = C (CF 3 2 , Z=C, p, q and s=0, r=2 如請求項1或2之電解質溶液之純化方法,其中使氟化氫與上述純化劑、或氟化氫及草酸與上述純化劑進行反應之溫度為-60℃以上且150℃以下。 The method for purifying an electrolyte solution according to claim 1 or 2, wherein a temperature at which hydrogen fluoride and the above-mentioned purifying agent or hydrogen fluoride and oxalic acid are reacted with the above-mentioned purifying agent is -60 ° C or more and 150 ° C or less. 如請求項1或2之電解質溶液之純化方法,其中將上述反應生成物及上述未反應純化劑去除時之溫度為-20℃~120℃。 The method for purifying an electrolyte solution according to claim 1 or 2, wherein a temperature at which the reaction product and the unreacted purification agent are removed is -20 ° C to 120 ° C. 如請求項1或2之電解質溶液之純化方法,其中反應前之溶液中之游離酸之莫耳數與上述純化劑之莫耳數為1:0.1~1:10之比之範圍。 The method for purifying an electrolyte solution according to claim 1 or 2, wherein the molar amount of the free acid in the solution before the reaction and the molar number of the above-mentioned purifying agent are in the range of 1:0.1 to 1:10. 一種電解質溶液之製造方法,其特徵在於包含純化步驟,其使用如請求項1至9中任一項之電解質溶液之純化方法。 A method of producing an electrolyte solution, characterized by comprising a purification step using a purification method of the electrolyte solution according to any one of claims 1 to 9. 一種電解質溶液之製造方法,其係製造包含通式(2)所表示之二氟離子性錯合物(2)之電解質溶液之方法,該方法之特徵在於包含:使通式(1)所表示之六配位離子性錯合物(1)於非水溶劑中藉由氟化劑氟化,而製造通式(2)所表示之二氟離子性錯合物(2)之步驟;以及純化步驟,其使用如請求項1之電解質溶液之純化方法; [化13] 於通式(1)、(2)中,A+為選自由金屬離子、質子及鎓離子所組成之群中之任一者,M為選自由P、As及Sb所組成之群中之任一者;F為氟原子;O為氧原子;Y為碳原子或硫原子;於Y為碳原子之情形時q為1;於Y為硫原子之情形時q為1或2;W表示碳數1~10之可具有雜原子或鹵素原子之烴基(於碳數為3以上之情形時,亦可使用支鏈或環狀結構者)、或-N(R1)-;此時,R1表示氫原子、鹼金屬、碳數1~10之可具有雜原子或鹵素原子之烴基;於碳數為3以上之情形時,R1亦可取支鏈或環狀結構;Z為碳原子;p表示0或1,q表示0~2之整數,r表示0~2之整數,s表示0或1,且為p+r≧1。 A method for producing an electrolyte solution, which is a method for producing an electrolyte solution comprising a difluoro-ionic complex (2) represented by the formula (2), which method comprises: expressing the formula (1) a six-coordinated ionic complex (1) in which a fluorinating agent is fluorinated in a nonaqueous solvent to produce a difluoroionic complex (2) represented by the formula (2); and purification a step of using a purification method of the electrolyte solution of claim 1; [Chemistry 13] In the general formulae (1) and (2), A + is selected from the group consisting of metal ions, protons, and cesium ions, and M is selected from the group consisting of P, As, and Sb. One is; F is a fluorine atom; O is an oxygen atom; Y is a carbon atom or a sulfur atom; q is 1 when Y is a carbon atom; q is 1 or 2 when Y is a sulfur atom; W is carbon a hydrocarbon group having 1 to 10 which may have a hetero atom or a halogen atom (in the case where the carbon number is 3 or more, a branched or cyclic structure may be used), or -N(R 1 )-; 1 represents a hydrogen atom, an alkali metal, or a hydrocarbon group having 1 to 10 carbon atoms which may have a hetero atom or a halogen atom; when the carbon number is 3 or more, R 1 may also take a branched or cyclic structure; Z is a carbon atom; p represents 0 or 1, q represents an integer from 0 to 2, r represents an integer from 0 to 2, s represents 0 or 1, and is p+r≧1. 如請求項11之電解質溶液之製造方法,其中上述氟化劑為選自由酸性氟化鉀、酸性氟化鈉、酸性氟化銨、氟化氫過量之有機胺氟化氫鹽、及氟化氫所組成之群中之一者以上。 The method for producing an electrolyte solution according to claim 11, wherein the fluorinating agent is selected from the group consisting of acidic potassium fluoride, acidic sodium fluoride, acidic ammonium fluoride, hydrogen fluoride excess organic amine hydrogen fluoride, and hydrogen fluoride. More than one. 如請求項11之電解質溶液之製造方法,其中於氟化時,將除上述氟化劑以外之酸或路易斯酸添加至非水溶劑中,上述氟化劑為氟化氫,且除上述氟化劑以外之酸為選自由三氟甲磺酸、甲磺酸、及三氟乙酸所組成之群中之一者以上。 The method for producing an electrolyte solution according to claim 11, wherein, in the case of fluorination, an acid other than the above fluorinating agent or a Lewis acid is added to the nonaqueous solvent, the fluorinating agent is hydrogen fluoride, and in addition to the fluorinating agent The acid is one or more selected from the group consisting of trifluoromethanesulfonic acid, methanesulfonic acid, and trifluoroacetic acid.
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