JP6361086B1 - X-ray diffraction measurement apparatus and X-ray diffraction measurement method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide the same as the case where the housing of an X-ray diffraction measurement apparatus is swung with respect to a measurement object without providing a mechanism for swinging the housing of the X-ray diffraction measurement apparatus with respect to the measurement object. Try to get an effect.
In a configuration in which X-rays emitted from an X-ray emitter 10 pass through a through-hole and irradiate a measurement object OB, an X-ray generation point region in the X-ray emitter 10 is enlarged and the measurement object is measured. An X-ray emission hole 51a is disposed in the vicinity of the object OB. As a result, when the X-rays are viewed as a set of a plurality of X-rays having a minute cross section, the optical paths of the plurality of X-rays until reaching the respective points in the X-ray irradiation position of the measurement object OB are visible parallel light. X-rays are emitted so as to have the same optical path as when the light is condensed by the convex lens.
[Selection] Figure 6

Description

  The present invention relates to an X-ray diffraction measurement apparatus that irradiates a measurement object with X-rays and forms a diffraction ring by X-rays diffracted by the measurement object, and an X-ray diffraction measurement method using the X-ray diffraction measurement apparatus.

  Conventionally, for example, as shown in Patent Document 1, an X-ray diffraction ring (hereinafter referred to as a diffraction ring) is formed by X-rays diffracted by a measurement object by irradiating the measurement object with X-rays at a predetermined incident angle. There is known an X-ray diffraction measurement apparatus that forms a diffraction ring, detects the shape of the formed diffraction ring, performs analysis by a cos α method, and measures a residual stress of a measurement object. The apparatus shown in Patent Document 1 includes an X-ray emitter, a diffraction ring imaging means such as an imaging plate, a diffraction ring reading means such as a laser detection device, a laser scanning means such as a moving mechanism and a rotation mechanism, an LED irradiator, and the like The diffraction ring erasing means or the like is provided in one casing, and the casing is connected to the arm type moving device. When X-ray diffraction measurement is performed with this apparatus, the arm type moving device is installed in the vicinity of the measurement object, and then the arm type moving device is operated to adjust the position and posture of the X-ray diffraction measurement apparatus with respect to the measurement object. The position / orientation adjustment step, the imaging step of imaging the diffraction ring on the imaging plate with the diffracted X-rays generated by irradiating the measurement object with X-rays, and irradiating the imaging plate with the laser light from the laser detector Thus, a reading step for detecting the shape of the diffraction ring, an erasing step for erasing the imaged diffraction ring by irradiation with LED light, and a calculation step for calculating the residual stress from the detected shape of the diffraction ring are successively performed. Thereby, the residual stress of the measurement object can be measured in a short time, and since this X-ray diffraction measurement device can be transported, X-rays can be obtained even when the measurement object cannot be transported or cut out. A diffraction measurement can be performed.

  When measuring the residual stress of a measurement object using such an X-ray diffraction measurement apparatus, a clear diffraction ring may not be detected if the crystal grains of the measurement object are large. Specifically, the detected diffraction ring may be discontinuous or the X-ray intensity distribution in the radial direction of the diffraction ring may not be a normal distribution. Even in such a case, for example, as shown in Patent Document 2 below, a mechanism for swinging the housing of the X-ray diffraction measurement apparatus is provided, and the rotation center of the swing is made to coincide with the X-ray irradiation point. When a diffraction ring is imaged by irradiating X-rays while swinging the housing of the X-ray diffraction measurement device, even if a clear diffraction ring cannot be obtained by a normal method, clear diffraction A ring can be obtained.

Japanese Patent No. 5967394 Japanese Patent No. 5967500

  However, if a mechanism for swinging the housing of the X-ray diffraction measurement apparatus is provided, there are problems that the cost of the apparatus is increased, and that the weight of the apparatus is increased and the burden of transportation is increased. The present invention has been made to solve this problem, and an object of the present invention is to provide an X-ray diffraction measurement apparatus that irradiates a measurement object with X-rays and forms a diffraction ring by X-rays diffracted by the measurement object. An effect similar to that obtained when the housing of the X-ray diffraction measurement apparatus is swung with respect to the measurement object can be obtained without providing a mechanism for swinging the housing of the X-ray diffraction measurement apparatus with respect to the measurement object. That is, it is an object to provide an X-ray diffraction measurement apparatus capable of obtaining a clear diffractive ring even when a clear diffractive ring cannot be obtained by a normal method. And the same effect as the case where the change from the X-ray diffraction measurement apparatus shown in Patent Document 1 of the prior art document is minimized and the casing of the X-ray diffraction measurement apparatus is swung with respect to the measurement object. Is to provide an X-ray diffraction measurement method.

  In order to achieve the above object, the present invention is characterized by X-ray emission means for emitting X-rays toward a target measurement object, and X-rays are emitted from the X-ray emission means toward the measurement object. In this case, the diffracted X-rays generated at the measurement object are received by the imaging surface perpendicular to the optical axis of the X-rays emitted from the X-ray emitting means, and an image of the diffracted X-rays is captured on the imaging surface. In the X-ray diffractometer having the diffractive ring forming means for forming the diffractive ring, the X-ray emitting means has a measurement object when the emitted X-ray is viewed as a set of a plurality of X-rays having a minute cross section. The X-rays are emitted so that the optical paths of the plurality of X-rays until reaching each point in the X-ray irradiation position are the same optical paths as when the visible parallel light is collected by the convex lens. is there.

  According to this, the several X-rays irradiated to each point in the X-ray irradiation location of a measurement object have a certain moderate incident angle. This can be regarded as similar to the case of irradiating X-rays at all incident angles within a certain range by swinging the housing of the X-ray diffraction measurement apparatus with respect to the measurement object. When the inventor irradiates the object to be measured and images the diffraction ring in this way, the case where the diffraction ring is imaged by swinging the housing of the X-ray diffraction measurement apparatus with respect to the object to be measured It was confirmed by experiments that the same effect can be obtained. That is, according to this, the housing of the X-ray diffraction measurement apparatus is swung with respect to the measurement object without providing a mechanism for swinging the housing of the X-ray diffraction measurement apparatus with respect to the measurement object. The same effect as the case can be obtained. If X-rays are emitted so that visible parallel light having a circular cross-section has the same optical path as when it is collected by the convex lens, a plurality of points irradiated to each point at the X-ray irradiation point X-rays have a certain range of all angles with respect to every line on the surface of the measurement object including the respective points. This can be regarded as the same as the case where the casing of the X-ray diffraction measurement apparatus is swung with respect to two directions perpendicular to the optical axis of the emitted X-ray, and is shown in Patent Document 2 of the prior art document. There is an effect that a clear diffraction ring can be obtained as compared with the case where the housing of the apparatus is swung in one direction like the X-ray diffraction measurement apparatus.

  Another feature of the present invention is that the X-ray emission means has an X-ray emission hole that can be arranged in the vicinity of the measurement object, and a cylindrical through-hole having a diameter larger than the diameter of the X-ray emission hole. An X-ray emitter that generates an X-ray by applying an X-ray passing object and an accelerated electron beam to a target, wherein the X-ray is generated by adjusting the cross-sectional diameter or length of the electron beam And the X-ray emitter having a diameter or length larger than the diameter of the X-ray emission hole.

  According to this, when the X-ray emitting means has a simple configuration, a plurality of X-ray optical paths to reach each point in the X-ray irradiation position of the measurement object are obtained when visible parallel light is collected by the convex lens. The optical path can be made similar, and the cost of the apparatus can be hardly increased.

  Another feature of the present invention is that the X-ray emission means has an X-ray emission hole that can be arranged in the vicinity of the measurement object, and a cylindrical through-hole having a diameter larger than the diameter of the X-ray emission hole. An X-ray passing object, an X-ray emitter that generates X-rays by applying an accelerated electron beam to the target, and the intensity of the X-ray emitter changes while the X-ray emitter emits X-rays. X-ray generation point changing means for changing the optical path of the electron beam by applying a magnetic field to change the position of the electron beam hitting the target in a range in which the diameter or length is larger than the diameter of the X-ray emission hole. There is in doing so. According to this, the diameter or length of the point at which X-rays are generated can be obtained by simply providing X-ray generation point changing means without changing the cross-sectional diameter or length of the electron beam of the X-ray emitter. The state can be made the same as the state where the diameter is larger than the diameter of the line exit hole, and this also makes it possible to hardly increase the cost of the apparatus.

  In addition, another feature of the present invention is an X-ray emitting unit that emits X-rays toward an object to be measured, and an X-ray emitter that emits X-rays generated at an X-ray generation point; X-ray emission means composed of an X-ray passing object having a cylindrical through-hole that allows X-rays emitted from the X-ray emitter to pass through, and X-rays from the X-ray emission means toward the measurement object When irradiated, the diffracted X-rays generated at the measurement object are received by an imaging surface perpendicular to the optical axis of the X-rays emitted from the X-ray emitting means, and are diffracted X-rays on the imaging surface. In the X-ray diffraction measurement method using the X-ray diffraction measurement apparatus provided with a diffraction ring forming means for forming a diffraction ring that is an image of the above, the diameter of the through-hole and An X-ray opaque sheet having an X-ray irradiation hole with a diameter smaller than the diameter or length of the X-ray generation point After the hole is placed so as to coincide, it emits X-rays from the X-ray emitting means, in that the X-ray diffraction measurement method of forming a diffraction ring by the diffractive ring-forming means.

  According to this, instead of providing the X-ray diffraction measurement apparatus with an X-ray emission hole that can be disposed in the vicinity of the measurement object, the X-ray irradiation hole is provided at a position that becomes the X-ray irradiation position of the measurement object. Since the X-ray opaque sheet is placed, the change from the X-ray diffraction measurement apparatus disclosed in Patent Document 1 of the prior art document can be minimized. And even if it does in this way, the effect similar to the case where the housing | casing of a X-ray-diffraction measuring apparatus is rock | fluctuated with respect to a measuring object can be acquired.

1 is an overall schematic diagram showing an X-ray diffraction measurement system including an X-ray diffraction measurement apparatus according to an embodiment of the present invention. It is an enlarged view of the X-ray-diffraction measuring apparatus of FIG. It is a fragmentary sectional view which expands and shows the part through which the X-ray passes in the X-ray-diffraction measuring apparatus of FIG. It is the figure which looked at circular hole vicinity in the X-ray-diffraction measuring apparatus of FIG. 1 from the optical axis direction of the emitted X-ray. It is an expansion perspective view of the plate part of FIG. In the X-ray diffractometer of FIG. 1, the optical axis direction of the X-ray is reduced in the X-ray optical path from the X-ray generation point of the X-ray emitter to the X-ray irradiation point of the measurement object, and the optical axis direction is reduced. FIG. 2A is an enlarged view of the vertical direction of FIG. 2, (a) is an X-ray optical path at the leftmost point of the X-ray irradiation site, and (b) is an X-ray optical path at the rightmost point of the X-ray irradiation site. . In the X-ray diffraction measurement apparatus according to another embodiment of the present invention, the X-ray generation point changing mechanism disposed inside and around the X-ray emitter is viewed in the central axis direction of the X-ray emitter. FIG. It is the figure which looked at the mode when the X-ray impervious sheet | seat which has an X-ray irradiation hole was mounted in the measurement object, and irradiated the X-ray from the horizontal direction and the vertical direction. It is an enlarged view of the X-ray-diffraction measuring apparatus which concerns on another embodiment of this invention. In a conventional X-ray diffraction measurement apparatus, the optical path of the X-ray from the X-ray generation point of the X-ray emitter to the X-ray irradiation point of the measurement object is reduced, and the optical axis direction of the X-ray is reduced. It is the figure which expanded and showed the perpendicular direction.

  A configuration of an X-ray diffraction measurement system including an X-ray diffraction measurement apparatus according to an embodiment of the present invention will be described with reference to FIGS. Note that this X-ray diffraction measurement system is different from the X-ray diffraction measurement system shown in Patent Document 1 of the prior art document in that the arrangement of the unit to which the LED light source 44 is attached and the X-ray emitter 10 are different. The area where the X-rays are generated is enlarged, the diameter of the passage member at the end of the through hole through which the emitted X-rays pass is increased, and the center of the fixture 18 The pipe portion 51 is attached, and the emitted X-ray passes through the through hole and then passes through the inside of the pipe portion 51 and is emitted from the X-ray emission hole 51a at the tip of the pipe portion 51. Therefore, the part already demonstrated by the X-ray-diffraction measurement system shown by patent document 1 is only demonstrated briefly.

  This X-ray diffraction measurement system is transported and set to a place where there is a measurement object OB for measuring residual stress. The position and orientation of the X-ray diffraction measuring apparatus can be adjusted by an arm type moving device, and the X-ray diffraction direction of the measuring object OB is changed by changing the position and orientation of the X-ray diffraction measuring apparatus with respect to the measuring object OB. The distance from the X-ray irradiation point to the imaging surface of the diffraction ring can be set to the intended direction and distance. The measurement object OB may be made of any material as long as X-ray diffraction measurement is possible, but in the present embodiment, it is made of iron. Note that the measurement object OB has a large crystal grain, and therefore, a clear diffraction ring cannot be imaged by the X-ray diffraction measurement apparatus disclosed in Patent Document 1 of the prior art document.

  As shown in FIGS. 1 and 2, the X-ray diffraction measurement apparatus includes an X-ray emitter 10, a table 16 to which an imaging plate 15 is attached, a table driving mechanism 20 for rotating and moving the table 16, and a diffraction ring. And a laser detection device 30 for detecting. The X-ray diffraction measurement system includes an arm type moving device (not shown), a computer device 90, and a high voltage power supply 95 together with the X-ray diffraction measurement device. Various types of circuits that are connected to the above-described devices to control operation and input detection signals are also built in the case 50. A two-dot chain line shown outside the case 50 in FIG. Various circuits surrounded by are enclosed in a two-dot chain line in the housing 50.

  The casing 50 is formed in a substantially rectangular parallelepiped shape, and includes a bottom wall 50a, a front wall 50b, a rear wall 50e, a top wall 50f, a side wall (not shown), and corners of the bottom wall 50a and the front wall 50b. It is formed to have a notch wall 50c and a connecting wall 50d provided so as to be cut out from the front side to the back side of the sheet. The notch wall 50c is composed of a flat plate perpendicular to the bottom wall 50a and a parallel plate, and the connecting wall 50d is perpendicular to the side wall and has a predetermined angle with the bottom wall 50a. This predetermined angle is, for example, 30 to 45 degrees. The notch wall 50c has a circular hole 50c1, and at the time of diffractive ring imaging, the pipe part 51 protrudes outside the housing 50 perpendicularly to the notch wall 50c through the center of the circular hole 50c1. When the X-ray is emitted, the pipe portion 51 is for allowing the X-ray to pass through the inside and exit from the X-ray emission hole 51a at the tip, which will be described in detail later. One of the side walls is provided with a connection portion (not shown) connected to the support arm 52, and the connection portion is rotatable about the vertical direction of the paper surface of FIGS. The support arm 52 is a tip of an arm type moving device, and the case 50 (X-ray diffraction measuring device) can be set to an arbitrary position and posture by operating the arm type moving device.

  The X-ray emitter 10 extends in the left-right direction in the figure at the upper part in the case 50 and is fixed to the case 50. When a high voltage is supplied from the high-voltage power source 95, the X-ray emitter 10 is shown in the figure. The light is emitted downward. The X-ray emitter 10 is an X-ray tube that generates X-rays by accelerating an electron beam and hitting it on a target. The X-ray emitter used in the X-ray diffraction measurement apparatus shown in the prior art document is used. The cross-sectional diameter of the electron beam is larger than that of the device, and the region where X-rays are generated (hereinafter referred to as X-ray generation point) is larger than that of the X-ray emitter. This point will be described in detail later. When a command is input from the controller 91, the X-ray control circuit 71 outputs a driving current supplied to the X-ray emitter 10 from the high voltage power supply 95 so that X-rays with a constant intensity are emitted from the X-ray emitter 10. Control drive voltage. In addition, the X-ray emitter 10 includes a cooling device (not shown), and the X-ray control circuit 71 also controls a drive signal supplied to the cooling device.

  The table driving mechanism 20 is fixed to the housing 50 and includes a moving stage 21 below the X-ray emitter 10. The moving stage 21 is sandwiched between a pair of opposed plate-like guides 25, 25 in the table driving mechanism 20, and is output by a feed motor 22, a screw rod 23, and a bearing portion 24 fixed to the table driving mechanism 20. It moves in a plane parallel to the side wall of the housing 50 including the X-ray optical axis and in a direction perpendicular to the optical axis of the outgoing X-ray. An encoder 22a is incorporated in the feed motor 22, and the encoder 22a outputs a pulse train signal that alternately switches between a high level and a low level each time the feed motor 22 rotates by a predetermined minute rotation angle. And output to the feed motor control circuit 73.

  The position detection circuit 72 and the feed motor control circuit 73 operate according to commands from the controller 91. Immediately after turning on the power to the X-ray diffraction measurement apparatus, the feed motor control circuit 73 outputs a drive signal to the feed motor 22 so as to move the moving stage 21 to the feed motor 22 side, and the position detection circuit 72 When the pulse reaches the movement limit position and the pulse train signal is no longer input from the encoder 22a, a signal indicating stop of the drive signal is output to the feed motor control circuit 73, and the count value is set to “0”. Thus, the feed motor control circuit 73 stops outputting the drive signal. This movement limit position becomes the origin position of the moving stage 21, and the position detection circuit 72 thereafter counts the pulse train signal from the encoder 22a every time the moving stage 21 moves, and adds or subtracts the count value depending on the moving direction. The movement distance x from the movement limit position is output as a position signal. When the feed motor control circuit 73 inputs the destination position of the moving stage 21 from the controller 91, the feed motor 22 is driven forward or backward until the position signal input from the position detection circuit 72 becomes equal to the input destination position. To do. The moving limit position of the moving stage 21 is such that when the moving stage 21 moves to the feed motor 22 side, the pipe portion 51 that protrudes from the circular hole 50c1 to the outside of the housing 50 is connected to a part of the circular hole 50c1. It is set with a stopper or the like so as to stop immediately before hitting the edge of the elongated hole 50c2. This point will be described in detail later. Further, when the moving speed of the moving stage 21 is input from the controller 91, the feed motor control circuit 73 calculates the moving speed of the moving stage 21 using the number of pulses per unit time of the pulse train signal input from the encoder 22a. The feed motor 22 is driven so that the calculated movement speed becomes the input movement speed.

  The upper ends of the pair of guides 25, 25 are connected by a plate-like upper wall 26, and a through hole 26 a is provided in the upper wall 26, and the center position of the through hole 26 a is the emission of the X-ray emitter 10. Opposite the center position of the mouth 11, the outgoing X-rays enter the table drive mechanism 20 through the outgoing opening 11 and the through hole 26a. In a state where an imaging plate 15 to be described later is in the diffraction ring imaging position (the state shown in FIGS. 1 to 3), a through hole is formed at a position facing the through hole 26a of the moving stage 21 as shown in an enlarged view in FIG. 21a is formed. The moving stage 21 is assembled with a spindle motor 27 whose center of rotation is the position of the central axis of the emission port 11 and the through holes 26a, 21a. The output shaft 27a of the spindle motor 27 is cylindrical and has a circular cross section. Have A through hole 27b is provided on the opposite side of the output shaft 27a of the spindle motor 27, and a cylindrical passage member 28 for reducing the inner diameter of a part of the through hole 27b is provided on the inner peripheral surface of the through hole 27b. Is fixed.

  An encoder 27c is incorporated in the spindle motor 27. The encoder 27c controls a pulse train signal that alternately switches between a high level and a low level every time the spindle motor 27 rotates by a predetermined minute rotation angle. It outputs to the circuit 74 and the rotation angle detection circuit 75. Furthermore, the encoder 27c outputs an index signal that switches from the low level to the high level for a predetermined short period of time for each rotation of the spindle motor 27 to the controller 91 and the rotation angle detection circuit 75.

  When the rotation speed is input from the controller 91, the spindle motor control circuit 74 outputs a drive signal so that the rotation speed calculated from the number of pulses per unit time of the pulse train signal input from the encoder 27c becomes the input rotation speed. Output to the spindle motor 27. The rotation angle detection circuit 75 counts the number of pulses of the pulse train signal input from the encoder 27c, calculates the rotation angle θp from the count value, and outputs it to the controller 91. In addition, when the index signal is input from the encoder 27c, the rotation angle detection circuit 75 resets the count value to “0”. This is the position at a rotation angle of 0 °. Note that the position of the imaging plate 15 at a rotation angle of 0 ° means that the laser beam is irradiated when an index signal is input when a diffraction ring formed on the imaging plate 15 is read by laser irradiation from a laser detection device 30 described later. It is a position that has been. Since this position is at each radial position of the imaging plate 15, it is a line.

  The table 16 has a circular shape and is fixed to the tip of the output shaft 27 a of the spindle motor 27. The table 16 has a protruding portion 17 that protrudes downward from the central portion of the lower surface, and a thread is formed on the outer peripheral surface of the protruding portion 17. An imaging plate 15 is attached to the lower surface of the table 16. A through hole 15 a is provided in the center of the imaging plate 15, and the projection 17 is passed through the through hole 15 a, and a nut-shaped fixture 18 is screwed onto the outer peripheral surface of the projection 17, thereby imaging plate 15. Is fixed between the fixture 18 and the table 16. The fixture 18 is a cylindrical member, and has a thread corresponding to the thread of the protrusion 17 on the inner peripheral surface, and the pipe 51 is fixed at the center. When the fixture 18 is screwed into the projecting portion 17, the tip portion of the pipe portion 51 enters the through hole 17 a of the projecting portion 17, and the tip 51 b of the pipe portion 51 is in the vicinity of the through hole 16 a of the table 16.

  X-rays emitted from the emission port 11 of the X-ray emitter 10 pass through the through holes 26a and 21a, the holes of the passage member 28, and the through holes 27b, 27a1, 16a, and 17a, and then pipe from the tip 51b of the pipe portion 51. The light enters the inside of the portion 51 and exits from the X-ray exit hole 51 a at the tip on the opposite side of the pipe portion 51. The inner diameter of the pipe portion 51 is approximately the same as the inner diameter of the hole of the passage member 28, and can be regarded as the same as when the tip 51 b of the pipe portion 51 is present at the position of the passage member 28. The X-rays emitted from the emission port 11 are X-rays that travel while spreading, but pass through the inside of the pipe part 51 and are emitted from the X-ray emission hole 51a having a small diameter, thereby being parallel to the axis of the pipe part 51. Become parallel light.

  As will be described later, when the distance from the X-ray irradiation point of the measurement object OB to the imaging plate 15 is set to a set distance, the X-ray emission hole 51a is irradiated with the X-ray of the measurement object OB as shown in FIG. The length of the pipe portion 51 is set so as to be in the vicinity of the point. FIG. 4 is a view of the vicinity of the circular hole 50c1 as seen from the optical axis direction of the emitted X-ray, but the diffracted X-rays generated at the X-ray irradiation point enter the housing 50 from the circular hole 50c1, and the imaging plate 15 And the diffraction ring is imaged on the imaging plate 15. As shown in FIG. 4, a part of the circular hole 50c1 is connected to the elongated hole 50c2, and when the moving stage 21 moves to the feed motor 22 side, the pipe portion 51 passes after passing through the circular hole 50c1. The long hole 50c2 is moved. Then, when the pipe portion 51 is near the end of the elongated hole 50c2, the moving stage 21 reaches the movement limit position and stops.

  The imaging plate 15 is moved to the diffraction ring imaging position shown in FIGS. 1 to 3 together with the moving stage 21, the spindle motor 27, and the table 16 by driving of the feed motor 22, and the diffraction ring for reading the imaged diffraction ring described later. Move to the reading area and the diffractive ring erasing area to erase the diffractive ring. In this movement, the central axis of the imaging plate 15 is maintained in a plane formed by the optical axis of the outgoing X-ray and the position (line) at a rotation angle of 0 ° in the imaging plate 15, and the optical axis of the outgoing X-ray. Move in a direction perpendicular to. Hereinafter, the plane formed by the optical axis of the emitted X-ray and the position (line) at the rotation angle 0 ° in the imaging plate 15 is referred to as a reference plane.

  The laser detection device 30 irradiates the imaging plate 15 that images the diffraction ring with laser light, and detects the intensity of the light emitted from the imaging plate 15. The laser detection device 30 is separated from the imaging plate 15 located at the diffraction ring imaging position toward the feed motor 22, so that X-rays diffracted by the measurement object OB are not blocked by the laser detection device 30. The laser detection device 30 is an optical head including a laser light source 31, a collimating lens 32, a reflecting mirror 33, a dichroic mirror 34, an objective lens 36, and the like, and has the same configuration as that used for recording and reproduction of an optical disc. When a command is input from the controller 91, the laser drive circuit 77 outputs a drive signal to the laser light source 31 so that the intensity of the signal input from the photodetector 42 becomes a predetermined intensity. Laser light with a constant intensity is emitted from the laser light source 31. The photodetector 42 reflects a small amount by a dichroic mirror 34 to be described later, and outputs a signal having an intensity corresponding to the intensity of the laser beam received through the condenser lens 41, but the ratio of reflection at the dichroic mirror 34 is constant. Therefore, it can be considered that a signal having an intensity corresponding to the intensity of the emitted laser light is output. The collimating lens 32 collimates the laser light, the reflecting mirror 33 reflects the laser light toward the dichroic mirror 34, and the dichroic mirror 34 transmits most of the incident laser light (for example, 95%) as it is. The objective lens 36 focuses the laser light on the surface of the imaging plate 15. A focus actuator 37 is assembled to the objective lens 36. The focus of the laser light always matches the surface of the imaging plate 15 by a focus servo described later.

  When the focused laser beam is applied to the portion of the imaging plate 15 where the diffractive ring is imaged, a photo-stimulated luminescence phenomenon occurs, corresponding to the intensity of the diffracted X-ray at the time of diffractive ring imaging. Light is generated. The light generated by the stimulated light emission has a wavelength shorter than that of the laser light and passes through the objective lens 36 together with the reflected light of the laser light, but most of the light is reflected by the dichroic mirror 34, and the reflected light of the laser light is Most are transparent. The light reflected by the dichroic mirror 34 enters the photodetector 40 via the condenser lens 38 and the cylindrical lens 39. The photodetector 40 includes a four-part light receiving element including four light receiving elements having the same square shape, and outputs four light receiving signals (a, b, c, d) to the amplifier circuit 78. The cylindrical lens 39 is used to cause astigmatism.

  The amplification circuit 78 amplifies the four received light signals (a, b, c, d) and outputs them to the focus error signal generation circuit 79 and the SUM signal generation circuit 80. The focus error signal generation circuit 79 generates a focus error signal in the astigmatism method and outputs the focus error signal to the focus servo circuit 81. The focus servo circuit 81 starts to operate when a command is input from the controller 91, generates a focus servo signal based on the input focus error signal, and outputs the focus servo signal to the drive circuit 82. The drive circuit 82 drives the focus actuator 37 in accordance with the input focus servo signal to displace the objective lens 36 in the direction of the optical axis of the laser beam, so that the focal point of the laser beam is always on the surface of the imaging plate 15. Match.

  The SUM signal generation circuit 80 adds the four received light reception signals to generate a SUM signal and outputs it to the A / D conversion circuit 83. The intensity of the SUM signal is equivalent to the intensity of a small amount of laser light reflected by the imaging plate 15 and reflected by the dichroic mirror 34 and the intensity of light generated by the stimulated emission. Since the intensity of the reflected laser beam is substantially constant, the intensity of the SUM signal corresponds to the intensity of the light generated by the stimulated emission. That is, the intensity of the SUM signal corresponds to the intensity of diffracted X-rays in the imaged diffraction ring. When a command is input from the controller 91, the A / D conversion circuit 83 converts the instantaneous value of the input SUM signal into digital data and outputs it to the controller 91.

  Further, an LED light source 43 is provided adjacent to the objective lens 36. The LED light source 43 is controlled by the LED drive circuit 84 to emit visible light and erase the diffraction ring imaged on the imaging plate 15. When the LED drive circuit 84 receives a command from the controller 91, the LED drive circuit 84 supplies the LED light source 43 with a drive signal for generating visible light having a predetermined intensity.

  The X-ray diffraction measurement apparatus has an LED light source 44. As shown in FIGS. 2, 3, and 5, the LED light source 44 is fixed to the lower surface of one end portion of the plate 45 disposed between the moving stage 21 and the lower surface of the upper wall 26 of the table driving mechanism 20. . The plate 45 is fixed to an output shaft 46 a of a motor 46 fixed in the moving stage 21, and rotates in a plane parallel to the lower surface of the upper wall 26 by the rotation of the motor 46. The moving stage 21 is provided with stopper members 47a and 47b. When the plate 45 is rotated in the direction D1 in FIG. 5, the LED light source 44 causes the through hole 26a in the upper wall 26 and the moving stage 21 to move. The rotation of the plate 45 is regulated so that it stops at a position (position A) facing the through hole 21a. On the other hand, the stopper member 47b is a position (B position) where the plate 45 does not block between the through hole 26a of the upper wall 26 and the through hole 21a of the moving stage 21 when the plate 45 is rotated in the direction D2 in FIG. The rotation of the plate 45 is restricted so as to be stationary. In other words, the A position is a position where the plate 45 is in the state shown in FIGS. 2 and 3, and the LED light emitted from the LED light source 44 enters the passage of the passage member 28 provided in the through hole 27 a 1 of the spindle motor 27. This is the incident position. The B position is a position where X-rays emitted from the X-ray emitter 10 are not blocked by the plate 45. The LED light source 44 emits LED light according to a drive signal from an LED drive circuit 85 that is controlled by the controller 91. LED light is visible light that diffuses, but when the plate 45 is at position A, a part of the light is emitted from the X-ray emission hole 51a through the same path as that of the emission X-ray. It becomes parallel light parallel to the axis of the hole 27a1 and the pipe part 51.

  The motor 46 includes an encoder 46b. The encoder 46b outputs a pulse train signal that alternately switches between a high level and a low level to the rotation control circuit 86 every time the motor 46 rotates by a predetermined minute rotation angle. When a rotation direction and a rotation start command are input from the controller 91, the rotation control circuit 86 outputs a drive signal to the motor 46 to rotate the motor 46 in the indicated direction. When the input of the pulse train signal from the encoder 46b is stopped, the output of the drive signal is stopped. Thereby, the plate 45 can be rotated to the A position and the B position, respectively.

  An imaging lens 48 is provided on the notch wall 50 c of the housing 50, and an imager 49 is provided inside the housing 50. The image pickup device 49 is constituted by a CCD light receiver or a CMOS light receiver, and outputs a signal having an intensity corresponding to the light reception intensity of each image pickup device to the sensor signal extraction circuit 87. The imaging lens 48 and the imager 49 function as a digital camera that captures an image of a region around the irradiation point of the LED light on the measurement object OB located at a position set with respect to the imaging plate 15. The position set with respect to the imaging plate 15 is a position where the vertical distance from the irradiation point of the X-ray and LED light on the measurement object OB to the imaging plate 15 becomes a predetermined setting distance. In this case, the depth of field by the imaging lens 48 and the imager 49 is set in a range before and after the irradiation point. The sensor signal extraction circuit 87 outputs the signal intensity data for each image pickup device of the image pickup device 49 to the controller 91 together with data for knowing the position (that is, pixel position) of each image pickup device.

  The optical axis of the imaging lens 48 is included in the reference plane (the plane including the optical axis of the X-ray emitted from the X-ray emitter 10 and the rotation reference position line of the imaging plate 15). The point at which the optical axes of X-rays and LED light irradiated to the measurement object OB intersect with each other is adjusted to be the X-ray and LED light irradiation points on the measurement object OB at a set distance from the imaging plate 15 Has been. Furthermore, when the incident angle of the X-ray and LED light with respect to the measurement object OB is a set value, the optical axis of the imaging lens 48 and the normal direction at the irradiation point of the X-ray and LED light of the measurement object OB are formed. The angle is made equal to the incident angle. Therefore, the distance from the X-ray and LED light irradiation point on the measurement object OB to the imaging plate 15 is set, and the X-ray and LED light are irradiated at the incident angle set on the measurement object OB. In this case, since both the optical axis of the scattered light and the optical axis of the reflected light incident on the imaging lens 48 coincide with the optical axis of the imaging lens 48, the irradiation point of the LED light in the image pickup device 49 and the measurement object The light receiving point of the LED light reflected by the OB is generated at the same position. Since the LED light applied to the measurement object OB is parallel light, the LED light generates scattered light and reflected light that is reflected substantially as parallel light at the irradiation point. The incident light forms an image at the position of the image pickup device 49 to become an irradiation point, and the reflected light incident on the image forming lens 48 is collected by the image forming lens 48 and received by the image pickup device 49 to become a light receiving point. Therefore, the signal intensity data output from the imager 49 when the LED light is irradiated at the incident angle set to the measurement object OB is the distance set from the irradiation point of the LED light to the imaging plate 15. In the captured image created from the above, the image of the irradiation point and the image of the light receiving point are in the same position.

  The computer device 90 includes a controller 91, an input device 92, and a display device 93. The controller 91 is an electronic control unit mainly including a microcomputer including a CPU, ROM, RAM, a large capacity storage device, and the like, and executes various programs stored in the large capacity storage device to perform an X-ray diffraction measurement device. Control the operation of The input device 92 is connected to the controller 91 and is used by an operator to input various parameters, work instructions, and the like. The display device 93 displays on the display screen a photographed image created based on the signal intensity data input from the imager 49, and a cross at a position corresponding to a position where the optical axis of the imaging lens 48 intersects the imager 49. The mark is displayed. The cross point of the cross mark is a distance in which the distance from the irradiation point of the LED light (exit X-ray) to the imaging plate 15 is set, and the LED light (exit X-ray) is incident on the measurement object OB. This is a position where an image of an irradiation point and an image of a light receiving point are generated when irradiation is performed at an angle. The direction in which the vertical direction of the cross mark is projected on the surface of the measurement object OB is the measurement direction of the residual normal stress calculated from the imaged diffraction ring. Further, the display device 93 displays various setting states, operating states, measurement results, and the like of the X-ray diffraction measurement system. The high voltage power supply 95 supplies the X-ray emitter 10 with a high voltage and current for X-ray emission.

  As described above, the region of the X-ray generation point in the X-ray emitter 10 is larger than that of the X-ray diffraction measuring device shown in the prior art document, and the inner diameter of the through hole of the passage member 28 is the X-ray. It is larger than that of the diffraction measuring apparatus, and the emitted X-rays pass through the through holes 27b, 27a1, 16a, 17a, and then pass through the inside of the pipe portion 51 and are emitted from the minute X-ray emitting hole 51a. . Thereby, when the emitted X-ray is viewed as a set of a plurality of X-rays having a minute cross section, the optical paths of the plurality of X-rays until reaching each point in the X-ray irradiation position of the measurement object OB are visible parallel light. Becomes the same optical path as when the light is condensed by the convex lens. FIG. 6 shows this visually.

  FIG. 6 shows an X-ray optical axis direction reduced from the X-ray generation point in the X-ray emitter 10 to the X-ray irradiation position of the measurement object OB, and the vertical direction is enlarged, and X-ray irradiation is shown. It is the figure which showed the optical path of the X-ray to the one part point of a location. (A) is an X-ray optical path at the left end point of the X-ray irradiation location, and (b) is an X-ray optical path at the right end point of the X-ray irradiation location, but from the left end point to the right end of the X-ray irradiation location. At all points up to the point, the optical path of the X-rays is the same diagram as these. In addition, in order to make FIG. 6 easy to see, the through holes 27b, 27a1, 16a, and 17a are columnar with the same diameter, and the tip 51b of the pipe portion 51 is fixed to a member fixed to the end of the columnar through hole. It ’s like that. The X-ray emitter 10 generates X-rays when the accelerated electron beam E hits the target Ta. However, since the diameter of the electron beam E is increased, the area of the X-ray generation point is large. For this reason, the X-rays emitted from the X-ray emission holes 51a and applied to the measurement object OB have different incident angles depending on the X-ray generation location at each X-ray irradiation location. Like the X-ray optical path shown in FIG. 6, X-rays with a certain range of incident angles are irradiated. Further, FIG. 6 is a plan view, and the X-ray generation point is circular when viewed from the optical axis direction of the outgoing X-ray. Therefore, when viewed three-dimensionally, each point at the X-ray irradiation point is irradiated. The X-rays have a certain range of angles with respect to every line on the surface of the measurement object including the respective points, like the X-ray optical path shown in FIG.

  FIG. 10 shows an X-ray diffraction measurement apparatus in the prior art document, in which the optical axis direction of the X-ray is reduced from the X-ray generation point in the X-ray emitter 10 to the X-ray irradiation point of the measurement object OB. It is the figure which expanded and showed the direction, and showed the optical path of the X-ray to some points of an X-ray irradiation location. In the X-ray diffraction measurement apparatus in the prior art document, if the apparatus and the measurement object OB are fixed, the angle of the X-ray irradiated to the measurement object OB is constant. Then, comparing FIG. 6 with FIG. 10, the present invention increases the region of the X-ray generation point in the target Ta, and arranges the X-ray emission hole 51 a in the vicinity of the measurement location of the measurement object OB. It can be seen that the measurement object OB is irradiated with X-rays having an angle of.

  As a result of the experiment, the inventor irradiates the measurement object OB with X-rays in this manner and images the diffraction ring, even if a clear diffraction ring is not detected by a normal method because the crystal grains are large. It was confirmed that a clear diffractive ring could be imaged. This is because irradiating the measurement object OB with X-rays in this way has the same effect as imaging the diffraction ring by swinging the housing of the X-ray diffraction measurement apparatus with respect to the measurement object. It can be thought of as indicating something. In the case where the housing of the apparatus is swung only in one direction as in the X-ray diffraction measurement apparatus shown in Patent Document 2 of the prior art document, since the incident angle of X-rays only changes, this embodiment It can be considered that irradiating the measurement object OB with the X-ray as in the embodiment is the same as when the housing of the apparatus is swung in two directions that are perpendicular to the optical axis of the emitted X-ray.

  Next, a method for X-ray diffraction measurement of the measurement object OB using the X-ray diffraction measurement system including the X-ray diffraction measurement apparatus configured as described above will be described. However, this method is the same as the method disclosed in Patent Document 1 of the prior art document, and since it has already been described in detail in Patent Document 1, only a brief description will be given. After setting the X-ray diffraction measurement system in the vicinity of the measurement object OB, the operator operates the arm type moving device to move the X-ray diffraction measurement apparatus (housing 50) to the vicinity of the measurement object OB, To activate the X-ray diffraction measurement system. Thereafter, the X-ray diffraction measurement is performed in the order of the position / orientation adjustment process, the diffraction ring imaging process, the diffraction ring reading process, the diffraction ring elimination process, and the calculation process.

  The position and orientation adjustment step is a step of adjusting the position and orientation of the X-ray diffraction measurement apparatus (housing 50) with respect to the measurement object OB. First, the operator operates the arm type moving device to adjust the position and posture of the X-ray diffraction measurement device (housing 50), so that the irradiation point of the X-ray (LED light) is approximately the measurement object OB. So that the normal of the measurement point of the measurement object OB is parallel to the reference plane.

  Next, the operator inputs to adjust the position and orientation from the input device 92. With this input, the controller 91 outputs a command to each circuit, moves the imaging plate 15 to the diffraction ring imaging position (the state shown in FIGS. 1 to 3), and drives the motor 46 to rotate the plate 45 to the A position. The LED light source 44 is turned on. Thereby, LED light which is parallel light is emitted to the outside from the X-ray emission hole 51a, and is irradiated near the measurement location of the measurement object OB. Further, the controller 91 causes the image pickup signal from the image pickup device 49 to be output from the sensor signal extraction circuit 87 to the controller 91 and causes the display device 93 to display a captured image created from this image pickup signal.

  While viewing the image displayed on the display device 93, the operator operates the arm type moving device to adjust the position and posture of the X-ray diffraction measurement device (housing 50), and the irradiation point of the LED light is measured. It becomes a measurement location of the object OB, and the vertical direction of the cross mark becomes the measurement direction of the residual vertical stress, and the irradiation point and the light receiving point of the LED light coincide with the cross point of the cross mark on the screen. Thereby, the distance L from the X-ray irradiation point to the imaging plate 15 becomes a set value, and the X-ray is incident at the set incident angle. At this time, the X-ray emission hole 51a at the tip of the pipe portion 51 is in the vicinity of the measurement object OB. When the adjustment is completed, the operator inputs the end of the position / orientation adjustment from the input device 92. Thus, the controller 91 outputs a command to each circuit, turns off the LED light source 44, stops outputting the imaging signal, drives the motor 46, and rotates the plate 45 to the B position. As a result, the X-rays emitted from the X-ray emitter 10 can enter the through hole 21 a of the moving stage 21.

  In the next diffraction ring imaging step, the operator inputs the material of the measurement object OB (in this embodiment, iron) from the input device 92 and inputs the start of measurement. Accordingly, the controller 91 controls the spindle motor control circuit 74 to rotate the imaging plate 15 at a low speed, and stops the rotation of the imaging plate 15 when the index signal is input from the encoder 27c. Thereby, the diffraction ring is imaged on the imaging plate 15 in a state where the rotation angle is 0 ° at the time of reading the diffraction ring. Next, the controller 91 controls the X-ray control circuit 71 to cause the X-ray emitter 10 to start emitting X-rays. Thereby, the diffraction ring is imaged on the imaging plate 15 by the diffracted X-rays generated at the X-ray irradiation point of the measurement object OB. Then, after a predetermined time has elapsed, the X-ray control circuit 71 is controlled to cause the X-ray emitter 10 to stop emitting X-rays.

  Next, the controller 91 executes a diffraction ring reading process. The controller 91 controls the feed motor control circuit 73 to move the imaging plate 15 to the reading start position in the diffraction ring reading region. The reading start position is a position where the irradiation position of the laser beam is slightly inside the circle with the diffraction ring reference radius Ro. The diffraction ring reference radius Ro is the radius of the diffraction ring formed on the imaging plate 15 when the residual stress of the measurement object OB is “0”, and the X-ray rotation in the material of the measurement object OB. It is calculated by a calculation formula of Ro = L · tan (2Θm) from the folding angle 2Θm (Θm is a Bragg angle) and the distance L from the X-ray irradiation point to the imaging plate 15. The X-ray diffraction angle 2Θm is determined by the material of the measurement object OB, and the distance L is adjusted to a set value. Therefore, if the diffraction angle 2Θm is stored in advance for each material of the measurement object OB, the measurement is performed. The diffraction ring reference radius Ro can be calculated by inputting the material of the object OB. Since the position where the pipe portion 51 is near the end of the elongated hole 50c2 is the movement limit position of the moving stage 21, the irradiation position of the laser beam does not go to the innermost peripheral position of the imaging plate 15. The position of the laser detection device 30 is set so that the irradiation position of the laser beam is located inside the circle having the diffraction ring reference radius Ro regardless of the material of the measurement object OB.

  Next, the controller 91 controls the spindle motor control circuit 74 to rotate the spindle motor 27 at a predetermined rotation speed, and controls the laser drive circuit 77 to irradiate the imaging plate 15 with laser light from the laser detection device 30. The focus servo circuit 81 is controlled to start focus servo. Further, the rotation angle detection circuit 75 is controlled to start the output of the rotation angle θp of the spindle motor 27 (imaging plate 15), and the A / D conversion circuit 83 is controlled to output the data of the instantaneous value I of the SUM signal. , And the feed motor control circuit 73 is controlled to rotate the feed motor 22 to move the imaging plate 15 from the reading start position in the lower right direction in FIGS. 1 and 2 at a constant speed. Thereby, the irradiation position of the laser beam starts to rotate relatively spirally on the imaging plate 15. Thereafter, every time the imaging plate 15 rotates by a predetermined small angle, the controller 91 outputs the data of the instantaneous value I of the SUM signal output from the A / D conversion circuit 83 and the rotation angle θp output from the rotation angle detection circuit 75. And the data of the movement distance x output from the position detection circuit 72 are input and stored in correspondence with each other. The moving distance x is stored after being converted into a radial distance r (radius value r) of the laser beam irradiation position. Accordingly, data representing the instantaneous value I, the rotation angle θp, and the radius value r of the SUM signal is sequentially stored for each predetermined rotation angle corresponding to the irradiation position of the laser beam that rotates in a spiral.

  In parallel with the storing operation for each predetermined rotation angle of the data representing the instantaneous value I, the rotation angle θp, and the radius value r of the SUM signal, the controller 91 sets the instantaneous value I of the SUM signal with respect to the radius value r for each rotation angle θp. A curve is created, and a radius value rα and a SUM signal intensity value Iα corresponding to the peak of the curve are stored. This is a process of obtaining the intensity distribution of the diffracted X-rays in the radial direction for each rotation angle α of the diffraction ring, and obtaining the radius value rα at the location where the intensity of the diffracted X-rays peaks and the intensity Iα corresponding to the intensity of the diffracted X-rays. It is. Then, the radius value rα and the intensity Iα are acquired at all the rotation angles θp (rotation angle α), and when the instantaneous value I of the SUM signal to be detected becomes sufficiently smaller than the intensity Iα, the data storage is finished. . As a result, the intensity distribution corresponding to the intensity of the diffracted X-rays in the diffraction ring is detected by the data group of the instantaneous value I, the rotation angle θp and the radius value r, and the shape of the diffraction ring is detected by the radius value rα for each rotation angle α. It will be done. Thereafter, the controller 91 outputs a command to each circuit, stops the focus servo, stops the irradiation of the laser beam, stops the operation of the A / D conversion circuit 83 and the rotation angle detection circuit 75, and Stop operation. The rotation of the imaging plate 15 is continued.

  Next, the controller 91 executes a diffraction ring elimination process. The controller 91 controls the feed motor control circuit 73 to move the imaging plate 15 to the erase start position in the diffraction ring erase region. The erasure start position of the imaging plate 15 is a position where the center of the LED light output from the LED light source 43 is further inside than the reading start position with respect to the circle having the diffraction ring reference radius Ro. Next, the controller 91 controls the LED drive circuit 84 to irradiate the imaging plate 15 with the LED light from the LED light source 43 and controls the feed motor control circuit 73 so that the imaging plate 15 is moved from the erasing start position. The feed motor 22 is rotated so as to move at a constant speed in the lower right direction in FIGS. 1 and 2 to the erase end position. The erase end position is a position where the center of the LED light is outside the diffraction ring reference radius Ro by the same distance as the erase start position. Thereby, LED light is irradiated spirally on the imaging plate 15, and the imaged diffraction ring is erased.

  When the imaging plate 15 reaches the erasing end position, the controller 91 controls the feed motor control circuit 73 to stop the movement of the imaging plate 15 and controls the LED drive circuit 84 to stop the irradiation of the LED light to detect the position. The operation of the circuit 72 is stopped, and the spindle motor control circuit 74 is controlled to stop the rotation of the spindle motor 27 (imaging plate 15).

  Next, the controller 91 executes a calculation process. This is the data of the radius value rα for each rotation angle α which is the shape of the diffraction ring, the distance L from the X-ray irradiation point to the imaging plate 15, the set value of the X-ray incident angle ψ, and the material of the measurement object OB (this In this embodiment, the residual stress is calculated by calculation using the cos α method using constants such as diffraction angle, Young's modulus, Poisson's ratio, etc., which are known values. This calculation uses a known technique, and is described in detail in, for example, [0026] to [0044] of Japanese Patent Application Laid-Open No. 2005-241308. When the calculation is completed, the controller 91 displays the residual stress value on the display device 93.

In addition to the residual stress, the measurement conditions such as the distance L from the X-ray irradiation point to the imaging plate 15 and the X-ray incident angle ψ may be displayed. The shape curve of the diffraction rings (curve obtained from the radius value r _alpha of each rotation angle alpha), the intensity distribution image (instantaneous value I of the diffraction ring in terms of brightness, corresponding to the instantaneous value I brightness, rotation angle θp And an image created from the data group of the radius value r) or the like. The operator can evaluate the characteristics such as the fatigue level of the measurement object OB by looking at the displayed result.

  As can be understood from the above description, in the above-described embodiment, measurement is performed from an X-ray emitting means including the X-ray emitter 10 that emits X-rays toward the target measurement object OB, and the X-ray emitting means. When the X-ray is irradiated toward the object OB, the imaging plate 15 that intersects the diffracted X-ray generated at the measurement object OB perpendicularly to the optical axis of the X-ray emitted from the X-ray emitting means. The X-ray diffractometer includes a diffractive ring forming means for forming a diffractive ring that is an image of a diffracted X-ray on the imaging plate 15. When viewed with a set of a plurality of X-rays, the optical paths of the plurality of X-rays until reaching each point in the X-ray irradiation position of the measurement object OB are the same as when visible parallel light is collected by the convex lens. X-rays are emitted so as to be an optical path I have to so that.

  According to this, the plurality of X-rays irradiated to the respective points in the X-ray irradiation position of the measurement object have all incident angles within a certain range, and the casing 50 of the X-ray diffraction measurement apparatus is measured with the measurement object. It is possible to obtain the same effect as in the case of irradiating X-rays at any incident angle within a certain range by swinging with respect to OB. That is, according to this, the housing 50 of the X-ray diffraction measurement apparatus is moved relative to the measurement object OB without providing a mechanism for swinging the housing 50 of the X-ray diffraction measurement apparatus with respect to the measurement object OB. It is possible to obtain the same effect as in the case of swinging. In addition, since several X-rays irradiated to each point in X-ray irradiation location become the optical path similar to when visible parallel light with a circular cross section is condensed by a convex lens, each in X-ray irradiation location The plurality of X-rays irradiated to the points of the angle have any angle within a certain range with respect to every line on the surface of the measurement object including the points. This can be regarded as similar to the case where the casing 50 of the X-ray diffraction measurement device is swung with respect to two directions perpendicular to the optical axis of the emitted X-ray. There is an effect that a clear diffractive ring can be obtained as compared with the case of swinging in one direction.

  In the above embodiment, the X-ray emission means includes an X-ray emission hole 51a that can be disposed in the vicinity of the measurement object OB and a cylindrical through-hole having a diameter larger than the diameter of the X-ray emission hole 51a. A spindle motor 27 and a pipe portion 51, and an X-ray emitter 10 that generates X-rays by applying an accelerated electron beam E to a target Ta. The X-ray is adjusted by adjusting the cross-sectional diameter of the electron beam E. An X-ray emitter 10 having a diameter of a generated point larger than a diameter of the X-ray emission hole 51a is configured.

  According to this, when the X-ray emitting means has a simple configuration and the optical paths of a plurality of X-rays until reaching each point in the X-ray irradiation position of the measurement object OB, when visible parallel light is collected by the convex lens The optical path can be made similar to that of the apparatus, and the cost of the apparatus can be hardly increased.

(Modification)
In the above embodiment, by increasing the cross-sectional diameter of the accelerated electron beam E applied to the target Ta in the X-ray emitter 10, the diameter of the X-ray generation point is made larger than the diameter of the X-ray emission hole 51a. The position of the accelerated electron beam E hitting the target Ta may be changed at a high speed so that the diameter of the X-ray generation point region is larger than the diameter of the X-ray emission hole 51a. In this case, in order to change the position of the electron beam E, two magnetic fields perpendicular to each other are applied to the direction perpendicular to the central axis of the X-ray emitter 10, and the strength of the magnetic field and the direction of the magnetic pole are changed. It is good to. FIG. 7 is a view of the inside of the X-ray emitter 10 and the periphery of the X-ray emitter 10 in the direction of the central axis of the X-ray emitter 10. In order to apply two magnetic fields to the X-ray emitter 10. As shown in FIG. 7, in order to make the permanent magnets 61 and 65 face the magnetic bodies 64 and 68 and change the strength of the magnetic field and the direction of the magnetic poles, the permanent magnets 61 and 65 can be rotated by the motors 63 and 67. That's fine. The directions from the permanent magnets 61 and 65 toward the magnetic bodies 64 and 68 are perpendicular to each other and perpendicular to the central axis of the X-ray emitter 10. In addition, since the optical axis of the electron beam E is substantially coincident with the central axis of the X-ray emitter 10, the direction of the magnetic field generated by the permanent magnets 61 and 65 and the magnetic bodies 64 and 68 is set in the X-ray emitter 10. It is substantially perpendicular to the optical axis of the electron beam E.

  The permanent magnets 61 and 65 are attached to the fixtures 62 and 66. The fixtures 62 and 66 are connected to the output shafts of the motors 63 and 67. When the motors 63 and 67 are rotated, the magnetic poles of the permanent magnets 61 and 65 are rotated. The direction changes. As a result, the strength and direction of the magnetic field generated by the permanent magnets 61 and 65 and the magnetic bodies 64 and 68 change. However, since the permanent magnets 61 and 65 are smaller than the X-ray emitter 10, the motors 63 and 67 are rotated. However, the direction from the permanent magnets 61 and 65 toward the magnetic bodies 64 and 68 does not change greatly, and it can be considered that only the direction of the magnetic poles of the permanent magnets 61 and 65 changes. Therefore, when the motors 63 and 67 are rotated, the change in the magnetic field generated by the permanent magnets 61 and 65 and the magnetic bodies 64 and 68 is in the direction of the line connecting the centers of the permanent magnets 61 and 65 and the centers of the magnetic bodies 64 and 68. It can be regarded as a change in the direction of the magnetic field and a change in the magnetic field strength. Hereinafter, the permanent magnets 61 and 65, the fixtures 62 and 66, the motors 63 and 67, and the magnetic bodies 64 and 68 are referred to as an X-ray generation point changing mechanism.

  Since the Lorentz force generated when the magnetic field generated by the permanent magnet 61 and the magnetic body 64 is changed is generated in the vertical direction of FIG. 7, the electron beam E changes in the vertical direction of FIG. Further, since the Lorentz force generated when the magnetic field generated by the permanent magnet 65 and the magnetic body 68 is changed is generated in the horizontal direction of FIG. 7, the electron beam E changes in the horizontal direction of FIG. When the permanent magnets 61 and 65 are rotated at a constant speed, the intensity of the magnetic field changes in a sine wave shape, so that the position where the electron beam E hits the target Ta changes in a sine wave shape in both the vertical and horizontal directions when viewed on the time axis. To do. When the position where the electron beam E hits the target Ta changes in a sine wave shape at the same speed in both the vertical and horizontal directions and the phase is changed by 90 degrees, the position where the electron beam E hits the target Ta is a circle when viewed in a plane. It changes to draw a lap. When the rotational speed of one of the permanent magnets 61 and 65 is set to an integral multiple of one, the position where the electron beam E hits the target Ta, that is, the X-ray generation point, changes sinusoidally, that is, zigzag as shown in FIG. To do. Although FIG. 7 is drawn so as to change in a zigzag shape upward, it changes in a zigzag shape downward after reaching the upper limit position. FIG. 7 shows a case where the rotational speed of the permanent magnet 65 is set to 8 times the rotational speed of the permanent magnet 61. To increase the number of zigzags, the multiple of the rotational speed may be further increased. When the X-ray generation points are changed in a zigzag shape, the existence ratio of the X-ray generation points in the respective regions in the X-ray generation region becomes nearly equal, and a clearer diffraction ring can be obtained.

  An overall schematic diagram corresponding to FIG. 1 of the X-ray diffraction measurement system including the X-ray diffraction measurement apparatus in the above modification is obtained by adding a rotation control circuit for rotating the motors 63 and 67 to the rotational speed set in FIG. Except for this, the description of the above embodiment can be applied as it is. According to this modification, the X-ray emitter 10 does not change the conventional one shown in the prior art document, and the X-ray generation point changing mechanism is newly provided, and the diameter of the point at which X-rays are generated is set to X. The state can be made the same as the state where the diameter is larger than the diameter of the line exit hole 51a, and this also makes it possible to hardly increase the cost of the apparatus.

  The X-ray generation point changing mechanism of the above modification is a mechanism for rotating the permanent magnets 61 and 65 by causing the permanent magnets 61 and 65 and the magnetic bodies 64 and 68 to face each other. However, the magnetic field strength and the magnetic pole direction are changed. If possible, the X-ray generation point changing mechanism may be another mechanism. For example, if the current supplied to the two electromagnets is AC and the AC intensity and frequency are appropriate, the X-ray generation point can be changed in a zigzag manner as in FIG. In this case, the X-ray generation point can be changed in a spiral shape by equalizing the frequency of the AC supplied to the two electromagnets and shifting the phase by 90 degrees to change the AC intensity.

  Furthermore, in carrying out the present invention, the present invention is not limited to the above-described embodiments and modifications, and various modifications can be made without departing from the object of the present invention.

  In the above embodiment, the pipe part 51 is attached to the fixture 18 that fixes the imaging plate 15 to the table 16, and the X-ray emission hole 51 a is provided at the tip of the pipe part 51. An X-ray emission hole 51a is arranged in the vicinity of the object OB. However, since it is sufficient that a small-diameter hole can be arranged in the vicinity of or on the surface of the measurement object OB, instead of attaching the pipe portion 51 to the fixture 18 of the X-ray diffraction measurement apparatus, the operator can remove the measurement object OB. An X-ray impermeable sheet having an X-ray irradiation hole at the measurement location may be placed so that the X-ray irradiation hole matches. That is, in the X-ray diffraction measurement apparatus, the cross-sectional diameter of the electron beam E applied to the target Ta in the X-ray emitter 10 is increased, and the through holes of the passage member 28 and the fixture 18 are increased. The X-ray diffraction measuring apparatus shown in FIG. 1 is used, and as shown in FIG. 8, an X-ray impermeable sheet Sh having an X-ray irradiation hole Ap is placed at the measurement location of the measurement object OB. X-ray diffraction measurement may be performed as in the embodiment. In this case, the X-ray impermeable sheet Sh is placed so that the X-ray irradiation hole Ap matches the measurement location, and in the position and orientation adjustment process of the above embodiment, the X-ray irradiation hole Ap and the LED light irradiation point match. In this way, the position and orientation of the housing 50 of the X-ray diffraction measurement apparatus may be adjusted. According to this, the change from the X-ray-diffraction measuring apparatus shown by patent document 1 of a prior art document can be minimized.

  Moreover, in the said embodiment and modification, the X-ray emitter 10 hits the target Ta with the electron beam E with a large cross-sectional diameter, or the position which hits the target Ta is the electron beam E which changes in zigzag shape. did. That is, the X-ray generation point or the X-ray generation region is circular or square when viewed from the optical axis direction of the emitted X-ray. However, if the incident angle of the X-rays irradiated to the measurement object OB is any angle within a certain range, the degree of the effect is reduced, but the same effect as the above embodiment can be obtained. 6 can be reduced, the electron beam E hitting the target Ta is made a straight line whose cross section is long in the vertical direction of FIG. 6, and the X-ray generation point is long in the horizontal direction of FIG. 6 when viewed from the optical axis direction of the emitted X-ray. You may make it be linear. In the above modification, the X-ray generation point changing mechanism is only the permanent magnet 61, the fixture 62, the motor 63, and the magnetic body 64, and the X-ray generation point is changed only in the vertical direction of FIG. Good. Thus, the term visible parallel light in the claims refers to everything from a circular cross section to a straight cross section.

  Moreover, in the said embodiment and modification, the X-ray generation | occurrence | production point in the X-ray emitter 10 is enlarged or the area | region of an X-ray generation | occurrence | production point is enlarged, X-rays are penetrated through the passage member 28 and through-holes 27b, 27a1, After passing through 16a and 17a, the light is emitted from the X-ray emission hole 51a having a diameter smaller than that of the through hole of the passage member 28 through the pipe portion 51. The optical paths of a plurality of X-rays to reach the same optical path as when visible parallel light is collected by a convex lens. However, if the optical path of a plurality of X-rays until reaching each point in the X-ray irradiation location can be made the same optical path as when visible parallel light is collected by the convex lens, what kind of X-ray irradiation means is used? It may be configured. For example, by eliminating the pipe portion 51 and providing the X-ray condenser lens in the through hole of the fixture 18, the optical paths of a plurality of X-rays until reaching each point in the X-ray irradiation location are set as described above. It may be. However, in this case, as in the above embodiment, when the LED light having the same optical axis as that of the X-ray is irradiated, the LED light diffuses, so that the X-ray is transmitted through the circular hole 50c1, but the LED light is mostly blocked. It is necessary to take measures such that a minute hole is formed at a location where the optical axis of the emitted X-ray is crossed.

  Moreover, in the said embodiment and modification, an X-ray-diffraction measuring apparatus is attached to an arm type moving apparatus, and an X-ray-diffraction measuring apparatus (housing 50) with respect to the measuring object OB by operating an arm type moving apparatus. ) Position and posture. However, according to the present invention, the X-ray diffraction measurement apparatus is fixed to a stand or the like, the measurement object OB is placed on a stage whose position and posture can be adjusted, and the stage is operated, whereby the X-ray diffraction measurement apparatus ( The present invention can be applied even when the position and orientation of the measurement object OB are set with respect to the housing 50). In this case, it is unnecessary to provide a swing mechanism on the stage, and an effect similar to that obtained when the stage is swung can be obtained.

  In the embodiment and the modification, the X-ray diffraction measurement device images the diffraction ring on the imaging plate 15 and scans while irradiating the laser beam from the laser detection device 30 to detect the irradiation position and light intensity. An apparatus for reading a diffraction ring was obtained. However, the present invention can be applied to any type of apparatus as long as the diffraction ring can be imaged and the diffraction ring can be read. For example, an X-ray CCD having a plane as wide as the imaging plate 15 is provided, and when X-ray irradiation from the X-ray emitter 10 is performed, the intensity distribution of diffracted X-rays is generated by an electrical signal output from each pixel of the X-ray CCD. It may be a device for detecting. Further, instead of the X-ray CCD having the same plane as the imaging plate 15, the X-ray CCD having a small size is scanned while detecting the position, and the electric signal output from each pixel of the X-ray CCD and the X-ray CCD. An apparatus that detects the intensity distribution of the diffracted X-rays from the scanning position may be used. In addition, an apparatus using a scintillation counter that detects fluorescence emitted from the scintillator by a photomultiplier tube (PMT) instead of the X-ray CCD may be used.

  In the case where the apparatus is provided with an X-ray CCD having a plane as wide as the imaging plate 15, the table drive mechanism 20 in the X-ray diffraction measurement apparatus of the above embodiment is not necessary, and as shown in FIG. The X-ray CCD 54 attached to the table 16 can be disposed near the X-ray emitter 10. Thereby, since the distance between the exit port 11 of the X-ray emitter 10 and the X-ray exit hole 51a of the pipe portion 51 can be shortened, the diameter of the X-ray generation point of the X-ray emitter 10 can be made smaller than before. The present invention can be realized with a slightly larger size. In this case, since it is difficult to irradiate LED light having the same optical axis as that of the X-ray and to take a camera image, the laser light emitted from the laser light sources 55 and 56 as shown in FIG. The distance from the X-ray irradiation point to the diffraction ring imaging surface (X-ray CCD 54) may be set to a set value by adjusting the position of the X-ray diffraction measurement device so that the same spot is irradiated. In addition, the X-ray incident angle with respect to the measurement object OB may be calculated by calculating from the read diffraction ring using the method disclosed in Japanese Patent No. 5967491.

  In the embodiment and the modification, the controller 91 is installed with a program for calculating the residual normal stress. However, if the measurement efficiency is not important, the X-ray diffraction measurement apparatus may detect the X-ray diffraction image until the residual stress is calculated by another apparatus. In this case, as a method for inputting X-ray diffraction image data to another apparatus, various methods such as a method using a recording medium and a method using a net line or the like can be considered. Further, if it may take more time, a part or all of the residual stress calculation may be performed manually without using an arithmetic program.

  Moreover, in the said embodiment and modification, although the X-ray-diffraction measuring apparatus was set as the apparatus which can form a diffraction ring (imaging) and can read a diffraction ring, if measurement efficiency is not regarded as important, X-ray-diffraction measuring apparatus Is a device that only forms a diffraction ring, removes the imaging plate 15 on which the diffraction ring is formed from the table 16 and sets it in another device, reads the diffraction ring, erases the diffraction ring, and calculates residual stress. You may make it carry out with an apparatus. As described above, if an X-ray CCD or scintillation counter is used, the formation and reading of a diffraction ring can be performed simultaneously. Therefore, when an X-ray CCD or scintillation counter is used, the formation of a diffraction ring in the scope of claims is performed. Refers to the formation and reading of a diffractive ring.

DESCRIPTION OF SYMBOLS 10 ... X-ray emitter, 15 ... Imaging plate, 15a, 16a, 17a, 18a, 21a, 26a, 27a1, 27b ... Through-hole, 16 ... Table, 17 ... Projection part, 18 ... Fixing tool, 20 ... Table drive mechanism , 21 ... Moving stage, 22 ... Feed motor, 23 ... Screw rod, 27 ... Spindle motor, 28 ... Passage member, 30 ... Laser detector, 31 ... Laser light source, 36 ... Objective lens, 44 ... LED light source, 45 ... Plate , 46: Motor, 47a, 47b ... Stopper member, 48 ... Imaging lens, 49 ... Imager, 50 ... Housing, 50a ... Bottom wall, 50c ... Notch wall, 50c1 ... Circular hole, 50c2 ... Long hole 50d: Connecting wall, 51: Pipe portion, 51a: X-ray emission hole, 52: Support arm, 55, 56: Laser light source, 61: Permanent magnet, 62: Fixed 63 ... Motor, 64 ... Magnetic material, 65 ... Permanent magnet, 66 ... Fixing tool, 67 ... Motor, 68 ... Magnetic material, 90 ... Computer device, 91 ... Controller, 92 ... Input device, 93 ... Display device, 95 ... High voltage power supply, OB ... Measurement object, E ... Electron beam, Ta ... Target

Claims (4)

X-ray emitting means for emitting X-rays toward the measurement target object;
When X-rays are irradiated from the X-ray emitting means toward the measurement object, diffracted X-rays generated at the measurement object are made to the optical axis of the X-rays emitted from the X-ray emission means. In an X-ray diffraction measurement apparatus comprising: a diffraction ring forming means that receives light on imaging surfaces that intersect perpendicularly and forms a diffraction ring that is an image of the diffraction X-rays on the imaging surface;
The X-ray emission means has a plurality of X-ray optical paths to reach each point in the X-ray irradiation position of the measurement object when the emitted X-ray is viewed as a set of a plurality of X-rays having a minute cross section. An X-ray diffraction measurement apparatus that emits X-rays so that visible parallel light has an optical path similar to that when it is collected by a convex lens. The X-ray diffraction measurement apparatus according to claim 1, wherein the X-ray emitting means is
An X-ray exit hole that can be disposed in the vicinity of the measurement object;
An X-ray passing object having a cylindrical through-hole having a diameter larger than the diameter of the X-ray exit hole;
An X-ray emitter that generates X-rays by applying an accelerated electron beam to a target, and adjusts the cross-sectional diameter or cross-sectional length of the electron beam so that the diameter or length of the point at which X-rays are generated An X-ray diffraction measurement apparatus comprising: an X-ray emitter having a diameter larger than that of the X-ray emission hole. The X-ray diffraction measurement apparatus according to claim 1, wherein the X-ray emitting means is
An X-ray exit hole that can be disposed in the vicinity of the measurement object;
An X-ray passing object having a cylindrical through-hole having a diameter larger than the diameter of the X-ray exit hole;
An X-ray emitter that generates X-rays by hitting an accelerated electron beam against the target;
While the X-ray emitter emits X-rays, the position of the electron beam hitting the target is changed by changing the optical path of the electron beam by applying a magnetic field whose intensity changes to the X-ray emitter. An X-ray diffraction measurement apparatus comprising: X-ray generation point changing means for changing the diameter or length within a range larger than the diameter of the X-ray exit hole. X-ray emitting means for emitting X-rays toward an object to be measured, an X-ray emitter for emitting X-rays generated at an X-ray generation point, and an X-ray emitted from the X-ray emitter An X-ray emitting means composed of an X-ray passing object having a cylindrical through-hole through which a line passes;
When X-rays are irradiated from the X-ray emitting means toward the measurement object, diffracted X-rays generated at the measurement object are made to the optical axis of the X-rays emitted from the X-ray emission means. An X-ray diffraction measurement method using an X-ray diffraction measurement apparatus that includes a diffraction ring forming unit that receives light on imaging surfaces that intersect perpendicularly and forms a diffraction ring that is an image of the diffraction X-rays on the imaging surface. In
An X-ray-opaque sheet having an X-ray irradiation hole having a diameter smaller than the diameter of the through-hole and the diameter or length of the X-ray generation point at a position to be an X-ray irradiation position of the measurement object An X-ray diffraction measurement method, comprising: placing the irradiation holes so as to coincide with each other; and then emitting X-rays from the X-ray emitting unit and forming a diffraction ring by the diffraction ring forming unit.

Images