JP6320127B2 - Cleaning device - Google Patents

Cleaning device Download PDF

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JP6320127B2
JP6320127B2 JP2014075529A JP2014075529A JP6320127B2 JP 6320127 B2 JP6320127 B2 JP 6320127B2 JP 2014075529 A JP2014075529 A JP 2014075529A JP 2014075529 A JP2014075529 A JP 2014075529A JP 6320127 B2 JP6320127 B2 JP 6320127B2
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cleaning
plate
cleaning brush
brush
brushes
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JP2015198167A (en
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篤史 井上
篤史 井上
智史 小木
智史 小木
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Disco Corp
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Disco Corp
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Description

本発明は、ウエーハの両面を洗浄する洗浄装置に関する。   The present invention relates to a cleaning apparatus for cleaning both surfaces of a wafer.

半導体の製造工程においては、例えば後工程におけるウエーハ研削研磨後にウエーハの両面に付着した研削屑などを洗浄する洗浄工程が各種の洗浄装置で行われる。洗浄装置の一つに、半導体ウエーハの周縁部をローラー等で把持し、ローラーを回転させてウエーハを回転させつつ、両面から回転可能に揺動アームの先端に取り付けられた円形ブラシで挟みこみ、揺動アームをウエーハの径方向に揺動させてウエーハ全面を洗浄を行っている(例えば、特許文献1参照)。   In a semiconductor manufacturing process, for example, cleaning steps for cleaning grinding dust and the like adhering to both surfaces of a wafer after wafer grinding and polishing in a subsequent process are performed by various cleaning apparatuses. In one of the cleaning devices, grip the peripheral edge of the semiconductor wafer with a roller, etc., rotate the roller and rotate the wafer, and sandwich it with a circular brush attached to the tip of the swing arm so that it can rotate from both sides, The entire surface of the wafer is cleaned by swinging the swing arm in the radial direction of the wafer (see, for example, Patent Document 1).

特開2003-017454号公報JP 2003-017454 A

しかし、上記構成の洗浄装置においては、洗浄ブラシが両面からウエーハを同位置で挟みこんで洗浄を行うため、洗浄ブラシがウエーハの外に出た際に間に挟まったコンタミが両ブラシの間に堆積してしまい、洗浄ブラシ自体の洗浄がしにくいという問題がある。   However, in the cleaning apparatus configured as described above, since the cleaning brush sandwiches the wafer from both sides for cleaning, the contamination sandwiched when the cleaning brush goes out of the wafer is between the two brushes. There is a problem that the cleaning brush itself is difficult to clean.

本発明は、上記問題にかんがみなされたもので、その目的は、両洗浄ブラシ間に、コンタミが溜まることを抑制でき、両洗浄ブラシの洗浄も可能な洗浄装置を提供することである。   The present invention has been considered in view of the above problems, and an object of the present invention is to provide a cleaning apparatus that can suppress the accumulation of contaminants between both cleaning brushes and can also clean both cleaning brushes.

上述した課題を解決し、目的を達成するために、本発明の洗浄装置は、円盤形状の板状物の両面を洗浄する洗浄装置であって、板状物の少なくとも3箇所で外周縁を保持して板状物を周方向に回転駆動する板状物保持手段と、該板状物保持手段に保持された板状物の片面及び他面にそれぞれ当接して該片面及び該他面を洗浄する2つの洗浄手段と、該板状物保持手段に保持された板状物の片面及び他面にそれぞれに洗浄液を噴射する洗浄液噴射手段とを備え、該洗浄手段は、洗浄面が円形で板状物に面で当接して板状物を洗浄する洗浄ブラシと、該洗浄ブラシを板状物の片面及び他面と垂直な回転軸線で回転可能に支持する回転支持部と、該回転支持部を保持し該洗浄ブラシを板状物の径方向に揺動させる洗浄ブラシ揺動部とを備え、2つの該洗浄手段は該洗浄ブラシが洗浄面同士を対向させて接触させ且つ2つの該洗浄ブラシの回転中心位置を互いにズラして配設されることを特徴とする。   In order to solve the above-described problems and achieve the object, the cleaning device of the present invention is a cleaning device for cleaning both surfaces of a disk-shaped plate-like object, and holds the outer peripheral edge at at least three places of the plate-like material. The plate-like object holding means for rotating the plate-like object in the circumferential direction and the one surface and the other surface of the plate-like object held by the plate-like object holding means are brought into contact with each other and cleaned. Two cleaning means, and cleaning liquid ejecting means for injecting a cleaning liquid onto one side and the other side of the plate-like object held by the plate-like object holding means, respectively. A cleaning brush for abutting the surface of the plate-like object to clean the plate-like object, a rotation support part for rotatably supporting the cleaning brush with a rotation axis perpendicular to one side and the other side of the plate-like object, and the rotation support part And a cleaning brush rocking portion that rocks the cleaning brush in the radial direction of the plate-like object. Cleaning means, characterized in that it is disposed to Shifts one another the rotational center position of and two of the cleaning brush in contact to face with each other the cleaning brush cleaning surface.

また、上記洗浄装置は、2つの該洗浄手段は、片側の洗浄ブラシの外縁が他側の洗浄ブラシの回転中心を通る位置にズラして配設されているものとすることができる。   In the cleaning apparatus, the two cleaning units may be arranged so that the outer edge of the cleaning brush on one side is shifted to a position passing through the rotation center of the cleaning brush on the other side.

本発明は、洗浄用ブラシをズラして配置することにより板状物洗浄中も洗浄したコンタミを洗浄ブラシの間に堆積させず、洗浄しながらコンタミを排出できるという効果を奏する。   The present invention has an effect that by disposing the cleaning brush, the contaminated contaminants are not deposited between the cleaning brushes even during the plate-like object cleaning, and the contaminants can be discharged while cleaning.

図1は、実施形態に係る洗浄装置の構成例の斜視図である。FIG. 1 is a perspective view of a configuration example of a cleaning device according to an embodiment. 図2は、実施形態に係る洗浄装置の要部示す断面図である。FIG. 2 is a cross-sectional view illustrating a main part of the cleaning device according to the embodiment. 図3(a)は、実施形態に係る洗浄装置の洗浄中の状態を示す斜視図であり、図3(b)は、実施形態に係る洗浄装置の洗浄中の他の状態を示す斜視図である。FIG. 3A is a perspective view illustrating a state during cleaning of the cleaning device according to the embodiment, and FIG. 3B is a perspective view illustrating another state during cleaning of the cleaning device according to the embodiment. is there. 図4は、実施形態に係る洗浄装置の洗浄ブラシと板状物との位置関係を示す平面図である。FIG. 4 is a plan view showing a positional relationship between the cleaning brush and the plate-like object of the cleaning device according to the embodiment. 図5は、実施形態の変形例に係る洗浄装置の洗浄ブラシと板状物との位置関係を示す平面図である。FIG. 5 is a plan view showing a positional relationship between a cleaning brush and a plate-like object of a cleaning device according to a modification of the embodiment.

本発明を実施するための形態(実施形態)につき、図面を参照しつつ詳細に説明する。以下の実施形態に記載した内容により本発明が限定されるものではない。また、以下に記載した構成要素には、当業者が容易に想定できるもの、実質的に同一のものが含まれる。さらに、以下に記載した構成は適宜組み合わせることが可能である。また、本発明の要旨を逸脱しない範囲で構成の種々の省略、置換又は変更を行うことができる。   DESCRIPTION OF EMBODIMENTS Embodiments (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited by the contents described in the following embodiments. The constituent elements described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. Furthermore, the structures described below can be combined as appropriate. Various omissions, substitutions, or changes in the configuration can be made without departing from the scope of the present invention.

〔実施形態〕
本発明の実施形態に係る洗浄装置を図面に基いて説明する。図1は、実施形態に係る洗浄装置の構成例の斜視図である。図2は、実施形態に係る洗浄装置の要部示す断面図である。図3は、実施形態に係る洗浄装置の洗浄中の状態を示す斜視図である。図4は、実施形態に係る洗浄装置の洗浄ブラシと板状物との位置関係を示す平面図である。
Embodiment
A cleaning apparatus according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view of a configuration example of a cleaning device according to an embodiment. FIG. 2 is a cross-sectional view illustrating a main part of the cleaning device according to the embodiment. FIG. 3 is a perspective view illustrating a state during cleaning of the cleaning device according to the embodiment. FIG. 4 is a plan view showing a positional relationship between the cleaning brush and the plate-like object of the cleaning device according to the embodiment.

実施形態にかかる洗浄装置1は、円盤形状の板状物Wの両面Wa,Wbを洗浄する洗浄装置である。   The cleaning device 1 according to the embodiment is a cleaning device that cleans both surfaces Wa and Wb of a disk-shaped plate-like object W.

なお、洗浄装置1により両面Wa,Wbが洗浄される板状物Wは、本実施形態では、シリコン、サファイア、ガリウムなどを母材とする円板状の半導体ウエーハや光デバイスウエーハであり、研削、研磨などの各種の加工が施された後に洗浄装置1により洗浄される。板状物Wは、例えば、両面Wa,Wbのうちの片面Wa及び他面Wbの一方に複数の分割予定ラインによって区画された各領域にデバイスが形成され、分割予定ラインに沿って切削されて、個々のデバイスに分割される。   In this embodiment, the plate-like object W whose both surfaces Wa and Wb are cleaned by the cleaning apparatus 1 is a disk-shaped semiconductor wafer or optical device wafer having silicon, sapphire, gallium or the like as a base material, and is ground. Then, after various processing such as polishing is performed, the cleaning device 1 performs cleaning. The plate-like object W is formed by, for example, forming a device in each region defined by a plurality of division lines on one side Wa and the other side Wb of both surfaces Wa and Wb, and cutting along the division lines. Divided into individual devices.

洗浄装置1は、板状物Wを周方向に回転させながら洗浄液(図示せず)を片面Wa及び他面Wbにそれぞれ噴射することで、板状物Wを洗浄するものである。洗浄装置1は、図1に示すように、板状物保持手段10と、2つの洗浄手段20a,20bと、2つの洗浄液噴射手段40a,40bとを備える。なお、板状物保持手段10と、2つの洗浄手段20a,20bと、2つの洗浄液噴射手段40a,40bは、図示しない洗浄チャンバー内に収容される。   The cleaning device 1 cleans the plate-like object W by spraying a cleaning liquid (not shown) onto the one surface Wa and the other surface Wb while rotating the plate-like object W in the circumferential direction. As shown in FIG. 1, the cleaning apparatus 1 includes a plate-like object holding unit 10, two cleaning units 20a and 20b, and two cleaning liquid ejecting units 40a and 40b. The plate-like object holding means 10, the two cleaning means 20a and 20b, and the two cleaning liquid ejecting means 40a and 40b are accommodated in a cleaning chamber (not shown).

板状物保持手段10は、板状物Wの少なくとも3箇所で外周縁を保持して板状物Wを周方向に回転駆動するものである。板状物保持手段10は、第1可動支持体11と、第2可動支持体12とを備える。第1可動支持体11は、図示しないモータを内蔵し、モータの駆動力により軸心回りに回転する一対の第1保持ローラ13を上面に設けている。第1保持ローラ13は、大径部13aと、大径部13a上に大径部13aと同軸に設けられた小径部13bとを備えている。大径部13aと小径部13bは、ともに厚手の円盤状に形成されている。また、小径部13bの外周縁は、大径部13aに近づくのにしたがって徐々に小径となるように逆テーパ状に形成されている。   The plate-like object holding means 10 holds the outer peripheral edge at at least three locations of the plate-like object W and rotationally drives the plate-like object W in the circumferential direction. The plate-like object holding means 10 includes a first movable support 11 and a second movable support 12. The first movable support 11 incorporates a motor (not shown), and has a pair of first holding rollers 13 that rotate around the axis by the driving force of the motor. The first holding roller 13 includes a large-diameter portion 13a and a small-diameter portion 13b provided on the large-diameter portion 13a and coaxially with the large-diameter portion 13a. Both the large diameter portion 13a and the small diameter portion 13b are formed in a thick disc shape. Further, the outer peripheral edge of the small diameter portion 13b is formed in a reverse taper shape so as to gradually decrease in diameter as it approaches the large diameter portion 13a.

第2可動支持体12は、図示しないモータを内蔵し、モータの駆動力により軸心回りに回転する一つの第2保持ローラ14を上面に設けている。第2保持ローラ14の構成は、第1保持ローラ13の構成と等しいので、同一部分に同一符号を付して説明を省略する。   The second movable support 12 incorporates a motor (not shown), and has a single second holding roller 14 that rotates around the axis by the driving force of the motor. Since the configuration of the second holding roller 14 is the same as the configuration of the first holding roller 13, the same portions are denoted by the same reference numerals and description thereof is omitted.

また、第2可動支持体12は、図示しないエアシリンダにより第1可動支持体11に近づいたり、第1可動支持体11から離される。第2可動支持体12が第1可動支持体11に近づいて、保持ローラ13,14が、大径部13a上に板状物Wを載置し、小径部13bの外周縁が板状物Wの外周縁に当接した状態で、板状物保持手段10は、保持ローラ13,14の大径部13aと小径部13bとの境界部分で板状物Wの外周縁の3箇所を保持する。なお、板状物保持手段10が、板状物Wを保持すると、保持ローラ13,14は、板状物Wを中心として周方向に等間隔(120度おき)に配置されている。板状物保持手段10は、モータにより保持ローラ13,14を軸心回りに回転することで、板状物Wを周方向に回転駆動する。   Further, the second movable support 12 approaches the first movable support 11 or is separated from the first movable support 11 by an air cylinder (not shown). The second movable support 12 approaches the first movable support 11, the holding rollers 13 and 14 place the plate-like object W on the large-diameter portion 13a, and the outer peripheral edge of the small-diameter portion 13b is the plate-like object W. The plate-like object holding means 10 holds the three outer peripheral edges of the plate-like object W at the boundary between the large-diameter portion 13a and the small-diameter portion 13b of the holding rollers 13 and 14. . When the plate-like object holding means 10 holds the plate-like object W, the holding rollers 13 and 14 are arranged at equal intervals (every 120 degrees) in the circumferential direction around the plate-like object W. The plate-like object holding means 10 rotates the plate-like object W in the circumferential direction by rotating the holding rollers 13 and 14 around the axis by a motor.

2つの洗浄液噴射手段40a,40bは、板状物保持手段10に保持された板状物Wの片面Wa及び他面Wbにそれぞれに洗浄液を噴射するものである。一方の洗浄液噴射手段40aは、板状物保持手段10に保持された板状物Wの片面Waに対向する噴射口41aを備え、他方の洗浄液噴射手段40bは、板状物保持手段10に保持された板状物Wの他面Wbに対向する噴射口41bを備える。洗浄液噴射手段40a,40bは、先端の噴射口41a,41bから板状物保持手段10に保持された板状物Wに向かって、図示しない供給源から供給された洗浄液を噴射する。   The two cleaning liquid ejecting units 40 a and 40 b eject the cleaning liquid onto one side Wa and the other side Wb of the plate-like object W held by the plate-like object holding unit 10. One cleaning liquid ejecting means 40 a includes an ejection port 41 a that faces one surface Wa of the plate-like object W held by the plate-like object holding means 10, and the other cleaning liquid ejecting means 40 b is held by the plate-like object holding means 10. The injection port 41b which opposes the other surface Wb of the plate-shaped object W made is provided. The cleaning liquid ejecting means 40a, 40b ejects the cleaning liquid supplied from a supply source (not shown) from the tip ejection ports 41a, 41b toward the plate-like object W held by the plate-like object holding means 10.

2つの洗浄手段20a,20bは、板状物保持手段10に保持された板状物Wの片面Wa及び他面Wbにそれぞれ当接して片面Wa及び他面Wbを洗浄するものである。2つの洗浄手段20a,20bは、それぞれ、図1及び図2などに示すように、洗浄ブラシ21と、回転支持部22と、洗浄ブラシ揺動部23とを備えている。洗浄ブラシ21は、洗浄面21aが円形で板状物Wの片面Wa又は他面Wbに面で当接して板状物Wの片面Wa又は他面Wbを洗浄する。洗浄ブラシ21は、PVA(PolyvinylAlcohol)などの合成樹脂で構成され、かつ円盤状に形成されたスポンジである。   The two cleaning means 20a and 20b are in contact with the one surface Wa and the other surface Wb of the plate-like object W held by the plate-like object holding means 10, respectively, and clean the one surface Wa and the other surface Wb. Each of the two cleaning means 20a and 20b includes a cleaning brush 21, a rotation support portion 22, and a cleaning brush swinging portion 23, as shown in FIGS. The cleaning brush 21 has a circular cleaning surface 21a and comes into contact with the one surface Wa or the other surface Wb of the plate-like object W to clean the one surface Wa or the other surface Wb of the plate-like object W. The cleaning brush 21 is a sponge made of a synthetic resin such as PVA (PolyvinylAlcohol) and formed in a disk shape.

回転支持部22は、洗浄ブラシ21を板状物保持手段10に保持された板状物Wの片面Wa及び他面Wbと垂直な回転軸心で回転可能に支持するものである。回転支持部22は、図2に示すように、洗浄ブラシ21を支持する円盤状の支持部材24と、洗浄ブラシ21を回転軸心回りに回転するモータ25などを備えている。モータ25は、洗浄ブラシ揺動部23のケース28などに固定されている。モータ25の出力軸25aは、ボールスプライン26を介して支持部材24に取り付けられている。モータ25の出力軸25aが、ボールスプライン26のスプラインナット26aに取り付けられ、スプラインナット26に対して軸心方向に移動自在なスプライン軸26bが支持部材24に取り付けられている。   The rotation support unit 22 supports the cleaning brush 21 so as to be rotatable about a rotation axis perpendicular to one side Wa and the other side Wb of the plate-like object W held by the plate-like object holding means 10. As shown in FIG. 2, the rotation support unit 22 includes a disk-shaped support member 24 that supports the cleaning brush 21, a motor 25 that rotates the cleaning brush 21 around the rotation axis, and the like. The motor 25 is fixed to the case 28 of the cleaning brush swinging portion 23 and the like. An output shaft 25 a of the motor 25 is attached to the support member 24 via a ball spline 26. An output shaft 25 a of the motor 25 is attached to the spline nut 26 a of the ball spline 26, and a spline shaft 26 b that is movable in the axial direction with respect to the spline nut 26 is attached to the support member 24.

また、ボールスプライン26のスプラインナット26aと支持部材24との間には、支持部材24即ち洗浄ブラシ21を板状物Wの片面Wa又は他面Wbに向かって押圧するばね27が設けられている。回転支持部22は、モータ25が、出力軸25aを回転することで、スプラインナット26aとスプライン軸26bとが一体に回転して、洗浄ブラシ21を板状物Wの片面Wa及び他面Wbに押し付けながら回転軸心回りに回転する。また、2つの洗浄手段20a,20bの回転支持部22は、洗浄ブラシ21を回転軸心回りに同方向に回転する。   A spring 27 is provided between the spline nut 26 a of the ball spline 26 and the support member 24 to press the support member 24, that is, the cleaning brush 21 toward one side Wa or the other side Wb of the plate-like object W. . The rotation support portion 22 is configured such that the motor 25 rotates the output shaft 25a, so that the spline nut 26a and the spline shaft 26b rotate integrally, and the cleaning brush 21 is moved to one side Wa and the other side Wb of the plate-like object W. It rotates around the rotation axis while pressing. Further, the rotation support portions 22 of the two cleaning means 20a and 20b rotate the cleaning brush 21 around the rotation axis in the same direction.

洗浄ブラシ揺動部23は、回転支持部22を保持し、洗浄ブラシ21を板状物Wの径方向に揺動させるものである。洗浄ブラシ揺動部23は、板状物保持手段10に保持された板状物Wの片面Wa及び他面Wbと平行に直線状に延び、かつ、板状物保持手段10に保持された板状物Wの外周に配置された一端部28aを中心として揺動されるケース28と、ケース28を一端部28aを中心として揺動する図示しないモータなどを備えている。ケース28は、一端部28aを中心として揺動されると、他端部28bが板状物保持手段10に保持された板状物Wの中心を通る位置に配置されている。   The cleaning brush swinging part 23 holds the rotation support part 22 and swings the cleaning brush 21 in the radial direction of the plate-like object W. The cleaning brush oscillating portion 23 extends linearly in parallel with one surface Wa and the other surface Wb of the plate-like object W held by the plate-like object holding means 10 and is a plate held by the plate-like object holding means 10. A case 28 that swings around one end 28a disposed on the outer periphery of the object W and a motor (not shown) that swings the case 28 around one end 28a are provided. When the case 28 is swung around the one end 28 a, the other end 28 b is disposed at a position passing through the center of the plate W held by the plate holding means 10.

また、ケース28は、他端部28b内にモータ25を固定し、他端部28bから洗浄ブラシ21を露出させて、回転支持部22を保持している。なお、ケース28は、モータ25の本体部25bを固定ケース29を介して、他端部28bに固定している。また、本実施形態では、図3(a)及び図3(b)などに示すように、2つの洗浄手段20a,20bの洗浄ブラシ揺動部23のケース28の長さが等しく配置され、かつ一端部28a同士が回転軸心と平行な方向に重なる位置に配置されている。   Further, the case 28 holds the rotation support part 22 by fixing the motor 25 in the other end part 28b, exposing the cleaning brush 21 from the other end part 28b. The case 28 fixes the main body 25b of the motor 25 to the other end 28b via a fixed case 29. Further, in this embodiment, as shown in FIGS. 3A and 3B, the lengths of the cases 28 of the cleaning brush swinging portions 23 of the two cleaning means 20a and 20b are equally arranged, and The one end portions 28a are arranged at positions overlapping each other in a direction parallel to the rotation axis.

また、2つの洗浄手段20a,20bは、図3(a)及び図3(b)などに示すように、洗浄ブラシ21が洗浄面21a同士を対向させて接触させて配置されている。また、2つの洗浄ブラシ21は、2つの洗浄ブラシ21の回転中心C(図4に示す)位置を互いにズラして配設されている。本実施形態では、図3(a)及び図3(b)などに示すように、洗浄ブラシ揺動部23のケース28の他端部28bが、洗浄ブラシ揺動部23の揺動方向にズラして配設されている。また、洗浄ブラシ21の洗浄面21aの半径をrとし、2つの洗浄ブラシ21の回転中心C間の距離をLとすると、2つの洗浄ブラシ21の回転中心Cは、0≦L≦rを満たす位置に配設されている。   Further, as shown in FIGS. 3A and 3B, the two cleaning means 20a and 20b are arranged with the cleaning brush 21 in contact with the cleaning surfaces 21a facing each other. Further, the two cleaning brushes 21 are arranged such that the rotational centers C (shown in FIG. 4) of the two cleaning brushes 21 are shifted from each other. In the present embodiment, as shown in FIGS. 3A and 3B, the other end portion 28b of the case 28 of the cleaning brush swinging portion 23 is displaced in the swinging direction of the cleaning brush swinging portion 23. Arranged. Further, if the radius of the cleaning surface 21a of the cleaning brush 21 is r and the distance between the rotation centers C of the two cleaning brushes 21 is L, the rotation centers C of the two cleaning brushes 21 satisfy 0 ≦ L ≦ r. Arranged in position.

なお、本実施形態では、2つの洗浄ブラシ21の回転中心CはL=rを満たす位置に配設されて、2つの洗浄手段20a,20bは、片側の洗浄ブラシ21の外縁が他側の洗浄ブラシ21の回転中心Cを通す位置にズラして配設されている。   In the present embodiment, the rotation center C of the two cleaning brushes 21 is disposed at a position satisfying L = r, and the two cleaning units 20a and 20b are configured such that the outer edge of the cleaning brush 21 on one side is the other side. The brush 21 is disposed at a position where the rotation center C of the brush 21 passes.

次に、実施形態に係る洗浄装置1を使用した洗浄方法を説明する。まず、板状物保持手段10の第2可動支持体12と第1可動支持体11から離した状態で、図示しない搬送手段により板状物Wを保持ローラ13,14間の所定の位置に配置する。そして、第2可動支持体12を第1可動支持体11に近づけて、保持ローラ13,14で板状物Wの外周縁を保持する。   Next, a cleaning method using the cleaning device 1 according to the embodiment will be described. First, in a state where the plate-like object holding means 10 is separated from the second movable support body 12 and the first movable support body 11, the plate-like object W is arranged at a predetermined position between the holding rollers 13 and 14 by a conveying means (not shown). To do. Then, the second movable support 12 is brought close to the first movable support 11 and the outer peripheral edge of the plate-like object W is held by the holding rollers 13 and 14.

そして、モータを駆動して、保持ローラ13,14を軸心回りに回転して、板状物Wを周方向に回転駆動するとともに、洗浄液噴射手段40a,40bの噴射口41a,41bから洗浄液を板状物Wの片面Wa及び他面Wbにそれぞれ噴射させる。さらに、モータ25を駆動して、2つの洗浄手段20a,20bの洗浄ブラシ21を同方向に回転するとともに、図示しないモータを駆動して洗浄ブラシ揺動部23のケース28を一端部28aを中心として揺動させる。なお、洗浄ブラシ揺動部23のケース28は、例えば、図4に二点鎖線で示すように、上側に配置された洗浄ブラシ21が板状物Wに当接する位置間で揺動されるのが望ましい。   Then, the motor is driven to rotate the holding rollers 13 and 14 around the center of the shaft to rotationally drive the plate-like object W in the circumferential direction and to supply the cleaning liquid from the injection ports 41a and 41b of the cleaning liquid injection means 40a and 40b. It sprays on the one side Wa and the other side Wb of the plate-shaped object W, respectively. Further, the motor 25 is driven to rotate the cleaning brushes 21 of the two cleaning means 20a and 20b in the same direction, and the motor (not shown) is driven to center the case 28 of the cleaning brush rocking portion 23 around the one end 28a. Swing as. Note that the case 28 of the cleaning brush oscillating portion 23 is oscillated between positions where the cleaning brush 21 disposed on the upper side contacts the plate-like object W, for example, as shown by a two-dot chain line in FIG. Is desirable.

すると、洗浄ブラシ21の洗浄面21aが板状物Wに付着したコンタミを板状物Wから剥離させ、洗浄液の流れにより、コンタミが板状物Wから洗浄液とともに落下する。コンタミを含んだ洗浄液は、洗浄チャンバーの図示しない排出口などから洗浄装置1外に排出される。   Then, the contamination that the cleaning surface 21a of the cleaning brush 21 adheres to the plate-like object W is peeled from the plate-like object W, and the contaminant falls from the plate-like object W together with the cleaning liquid by the flow of the cleaning liquid. The cleaning liquid containing contamination is discharged out of the cleaning apparatus 1 through a discharge port (not shown) of the cleaning chamber.

そして、洗浄ブラシ揺動部23の揺動を所定時間行った後、洗浄ブラシ揺動部23を板状物Wの外周縁から離間する位置に停止し、モータ25を停止し、洗浄液噴射手段40a,40bの噴射口41a,41bからの洗浄液の噴射を停止させ、保持ローラ13,14の回転を停止させる。その後、第2可動支持体12を第1可動支持体11から離すとともに、搬送手段などにより板状物Wを次工程に搬送する。   Then, after the cleaning brush oscillating portion 23 is oscillated for a predetermined time, the cleaning brush oscillating portion 23 is stopped at a position away from the outer peripheral edge of the plate-like object W, the motor 25 is stopped, and the cleaning liquid ejecting means 40a. , 40b, the spraying of the cleaning liquid from the spray ports 41a, 41b is stopped, and the rotation of the holding rollers 13, 14 is stopped. Thereafter, the second movable support 12 is separated from the first movable support 11 and the plate-like object W is transported to the next step by a transport means or the like.

以上のように、実施形態に係る洗浄装置1によれば、2つの洗浄手段20a,20bの洗浄ブラシ21の洗浄面21aを互いにズラして配設しているので、洗浄ブラシ21の洗浄面21a同士が重なる部分の板状物Wとの接触圧力よりも、重ならない部分の板状物Wとの接触圧力が弱くなる。このために、洗浄ブラシ21の回転により板状物Wから剥離されたパーティクルなどのコンタミが、洗浄面21a同士が重ならない部分に位置すると、洗浄ブラシ21の回転による遠心力や洗浄ブラシ揺動部23の揺動による遠心力により、洗浄ブラシ21間から排出されることとなる。   As described above, according to the cleaning device 1 according to the embodiment, the cleaning surfaces 21a of the cleaning brushes 21 of the two cleaning units 20a and 20b are arranged so as to be displaced from each other. The contact pressure with the plate-like object W in the non-overlapping portion is weaker than the contact pressure with the plate-like object W in the overlapping portion. For this reason, when contamination such as particles peeled off from the plate-like object W due to the rotation of the cleaning brush 21 is located in a portion where the cleaning surfaces 21a do not overlap with each other, the centrifugal force generated by the rotation of the cleaning brush 21 and the cleaning brush swinging portion. It is discharged from between the cleaning brushes 21 due to the centrifugal force generated by the swinging of 23.

このために、洗浄装置1は、板状物Wの洗浄中も洗浄したコンタミを、対面して配設された洗浄ブラシ21の間に堆積させることを抑制でき、洗浄しながらコンタミを排出できる。したがって、洗浄装置1は、洗浄ブラシ21間にコンタミが溜まることを抑制でき、洗浄液などにより洗浄ブラシ21の洗浄も可能とすることができる。   For this reason, the cleaning apparatus 1 can suppress the contamination that has been cleaned even during the cleaning of the plate-like object W from being deposited between the cleaning brushes 21 that are disposed facing each other, and can discharge the contamination while cleaning. Therefore, the cleaning device 1 can suppress the accumulation of contamination between the cleaning brushes 21 and can also clean the cleaning brush 21 with a cleaning liquid or the like.

また、2つの洗浄ブラシ21の回転中心Cは、0≦L≦rを満たす位置、即ち、L=rを満たす位置に配設されて、2つの洗浄手段20a,20bは、片側の洗浄ブラシ21の外縁が他側の洗浄ブラシ21の回転中心Cを通す位置にズラして配設されている。このために、洗浄装置1は、2つの洗浄ブラシ21の洗浄面21a間に板状物Wを挟んで、2つの洗浄ブラシ21の洗浄面21aがコンタミを板状物Wから確実に剥離することができる。したがって、洗浄装置1は、洗浄ブラシ21間にコンタミが溜まることを抑制でき、洗浄液などにより洗浄ブラシ21の洗浄も可能としながらも、板状物Wを確実に洗浄することができる。   Further, the rotation center C of the two cleaning brushes 21 is disposed at a position satisfying 0 ≦ L ≦ r, that is, a position satisfying L = r, and the two cleaning means 20a and 20b are arranged on one side of the cleaning brush 21. The outer edge of the cleaning brush 21 is shifted to a position where the rotation center C of the cleaning brush 21 on the other side passes. For this reason, the cleaning apparatus 1 sandwiches the plate-like object W between the cleaning surfaces 21a of the two cleaning brushes 21, and the cleaning surfaces 21a of the two cleaning brushes 21 reliably separate the contamination from the plate-like object W. Can do. Therefore, the cleaning apparatus 1 can suppress the accumulation of contaminants between the cleaning brushes 21 and can clean the plate-like object W while allowing the cleaning brush 21 to be cleaned with a cleaning liquid or the like.

さらに、洗浄装置1は、2つの洗浄手段20a,20bが洗浄ブラシ21を同方向に回転する。このために、洗浄装置1は、洗浄ブラシ21の洗浄面21a同士が重なる部分の外縁部では、図4中に矢印で示すように、洗浄面21a同士が同方向に回転することとなる。このために、洗浄装置1は、2つの洗浄手段20a,20bが洗浄ブラシ21の回転により、各洗浄ブラシ21が板状物Wから剥離したパーティクルなどのコンタミを洗浄ブラシ21間から速やかに排出することができる。   Further, in the cleaning apparatus 1, the two cleaning means 20a and 20b rotate the cleaning brush 21 in the same direction. Therefore, in the cleaning apparatus 1, the cleaning surfaces 21 a rotate in the same direction as indicated by arrows in FIG. 4 at the outer edge portion where the cleaning surfaces 21 a of the cleaning brush 21 overlap each other. For this purpose, in the cleaning apparatus 1, the two cleaning means 20 a and 20 b quickly discharge contaminants such as particles separated from the plate-like object W from between the cleaning brushes 21 by the rotation of the cleaning brush 21. be able to.

また、洗浄装置1は、ボールスプライン26のスプラインナット26aがモータ25により回転され、スプライン軸26bが洗浄ブラシ21を支持した支持部材24に取り付けられている。さらに、スプラインナット26aと支持部材24との間にばね27を設けている。このために、洗浄装置1は、洗浄ブラシ21が過度な力で板状物Wに押し付けられることを抑制することができる。   In the cleaning device 1, the spline nut 26 a of the ball spline 26 is rotated by the motor 25, and the spline shaft 26 b is attached to the support member 24 that supports the cleaning brush 21. Further, a spring 27 is provided between the spline nut 26 a and the support member 24. For this reason, the cleaning device 1 can suppress the cleaning brush 21 from being pressed against the plate-like object W with an excessive force.

〔変形例〕
本発明の実施形態の変形例に係る洗浄装置を図面に基いて説明する。図5は、実施形態の変形例に係る洗浄装置の洗浄ブラシと板状物との位置関係を示す平面図である。なお、図5において、前述した実施形態と同一部分には、同一符号を付して説明を省略する。
[Modification]
A cleaning apparatus according to a modification of the embodiment of the present invention will be described with reference to the drawings. FIG. 5 is a plan view showing a positional relationship between a cleaning brush and a plate-like object of a cleaning device according to a modification of the embodiment. In FIG. 5, the same parts as those of the above-described embodiment are denoted by the same reference numerals and description thereof is omitted.

実施形態の変形例にかかる洗浄装置1−1は、図5に示すように、2つの洗浄手段20a,20bの洗浄ブラシ揺動部23のケース28の長さを異ならせるとともに、洗浄ブラシ揺動部23のケース28同士を平行に配置し、ケース28の一端部28a同士を回転軸心と平行な方向に重ねて、2つの洗浄ブラシ21の回転中心C位置を互いにズラして配設されている。   As shown in FIG. 5, the cleaning apparatus 1-1 according to the modification of the embodiment varies the length of the case 28 of the cleaning brush swinging portion 23 of the two cleaning means 20a and 20b, and swings the cleaning brush. The cases 28 of the portion 23 are arranged in parallel, and the end portions 28a of the case 28 are overlapped with each other in a direction parallel to the rotation axis, so that the rotational centers C of the two cleaning brushes 21 are displaced from each other. Yes.

実施形態の変形例にかかる洗浄装置1−1は、実施形態と同様に、洗浄装置1は、洗浄ブラシ21間にコンタミが溜まることを抑制でき、洗浄液などにより洗浄ブラシ21の洗浄も可能とすることができる。   As in the embodiment, the cleaning device 1-1 according to the modification of the embodiment can suppress the accumulation of contamination between the cleaning brushes 21, and can also clean the cleaning brush 21 with a cleaning liquid or the like. be able to.

前述した実施形態では、保持ローラ13,14を3つ設けたが、本発明では、これに限定されることなく、保持ローラ13,14を3つ以上設けて、板状物Wの少なくとも3箇所で外周縁を保持してもよい。   In the embodiment described above, the three holding rollers 13 and 14 are provided. However, the present invention is not limited to this, and at least three holding rollers 13 and 14 are provided to provide at least three portions of the plate-like object W. You may hold | maintain an outer periphery.

なお、本発明は上記実施形態、変形例に限定されるものではない。即ち、本発明の骨子を逸脱しない範囲で種々変形して実施することができる。   In addition, this invention is not limited to the said embodiment and modification. That is, various modifications can be made without departing from the scope of the present invention.

1 洗浄装置
10 板状物保持手段
20a,20b 洗浄手段
21 洗浄ブラシ
21a 洗浄面
22 回転支持部
23 洗浄ブラシ揺動部
40a,40b 洗浄液噴射手段
C 回転中心
W 板状物
Wa 片面
Wb 他面
DESCRIPTION OF SYMBOLS 1 Cleaning apparatus 10 Plate-shaped object holding means 20a, 20b Cleaning means 21 Cleaning brush 21a Cleaning surface 22 Rotation support part 23 Cleaning brush rocking | swiveling part 40a, 40b Cleaning liquid injection means C Rotation center W Plate-like object Wa Single side Wb Other side

Claims (2)

円盤形状の板状物の両面を洗浄する洗浄装置であって、
板状物の少なくとも3箇所で外周縁を保持して板状物を周方向に回転駆動する板状物保持手段と、該板状物保持手段に保持された板状物の片面及び他面にそれぞれ当接して該片面及び該他面を洗浄する2つの洗浄手段と、
該板状物保持手段に保持された板状物の片面及び他面にそれぞれに洗浄液を噴射する洗浄液噴射手段とを備え、
該洗浄手段は、洗浄面が円形で板状物に面で当接して板状物を洗浄する洗浄ブラシと、該洗浄ブラシを板状物の片面及び他面と垂直な回転軸線で回転可能に支持する回転支持部と、該回転支持部を保持し該洗浄ブラシを板状物の径方向に揺動させる洗浄ブラシ揺動部とを備え、
2つの該洗浄手段は該洗浄ブラシが洗浄面同士を対向させて接触させ且つ2つの該洗浄ブラシの回転中心位置を互いにズラして配設されること、を特徴とする洗浄装置。
A cleaning device for cleaning both sides of a disk-shaped plate,
A plate-like object holding means for holding the outer periphery at at least three locations of the plate-like object and rotationally driving the plate-like object in the circumferential direction, and one side and the other side of the plate-like object held by the plate-like object holding means Two cleaning means for abutting and cleaning the one side and the other side respectively;
Cleaning liquid injection means for injecting the cleaning liquid onto one side and the other side of the plate-like object held by the plate-like object holding means,
The cleaning means includes a cleaning brush having a circular cleaning surface and abutting the surface of the plate-shaped object to clean the plate-shaped object, and the cleaning brush being rotatable about a rotation axis perpendicular to one side and the other surface of the plate-shaped object. A rotation support unit for supporting, and a cleaning brush rocking unit that holds the rotation support unit and rocks the cleaning brush in the radial direction of the plate-like object,
The two cleaning means are characterized in that the cleaning brushes are disposed so that the cleaning surfaces are in contact with each other and the rotational center positions of the two cleaning brushes are shifted from each other.
2つの該洗浄手段は、片側の洗浄ブラシの外縁が他側の洗浄ブラシの回転中心を通る位置にズラして配設されていること、を特徴とする請求項1記載の洗浄装置。   2. The cleaning apparatus according to claim 1, wherein the two cleaning means are arranged so that an outer edge of the cleaning brush on one side is shifted to a position passing through a rotation center of the cleaning brush on the other side.
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