JP6266286B2 - マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法 - Google Patents
マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法 Download PDFInfo
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- JP6266286B2 JP6266286B2 JP2013201579A JP2013201579A JP6266286B2 JP 6266286 B2 JP6266286 B2 JP 6266286B2 JP 2013201579 A JP2013201579 A JP 2013201579A JP 2013201579 A JP2013201579 A JP 2013201579A JP 6266286 B2 JP6266286 B2 JP 6266286B2
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| JP2013201579A JP6266286B2 (ja) | 2013-09-27 | 2013-09-27 | マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法 |
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| JP2013201579A JP6266286B2 (ja) | 2013-09-27 | 2013-09-27 | マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法 |
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| JP2015068919A JP2015068919A (ja) | 2015-04-13 |
| JP2015068919A5 JP2015068919A5 (enExample) | 2016-11-04 |
| JP6266286B2 true JP6266286B2 (ja) | 2018-01-24 |
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| TWI694304B (zh) * | 2015-06-08 | 2020-05-21 | 日商Ａｇｃ股份有限公司 | Ｅｕｖ微影術用反射型光罩基底 |
| WO2017022171A1 (ja) * | 2015-08-05 | 2017-02-09 | 京セラコネクタプロダクツ株式会社 | プラグコネクタ |
| JP6973280B2 (ja) * | 2018-05-08 | 2021-11-24 | 信越化学工業株式会社 | インプリントモールド用合成石英ガラス基板 |
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| JP2010278034A (ja) * | 2009-05-26 | 2010-12-09 | Canon Inc | 露光装置及びデバイス製造方法 |
| JP5296260B2 (ja) * | 2010-03-30 | 2013-09-25 | Ｈｏｙａ株式会社 | マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法及び半導体デバイスの製造方法 |
| JP4819191B2 (ja) * | 2011-04-14 | 2011-11-24 | Ｈｏｙａ株式会社 | マスクブランク用基板、マスクブランク、フォトマスクおよび半導体デバイスの製造方法 |
| US8760188B2 (en) * | 2011-06-30 | 2014-06-24 | Silicon Image, Inc. | Configurable multi-dimensional driver and receiver |
| JP5835968B2 (ja) * | 2011-07-05 | 2015-12-24 | キヤノン株式会社 | 決定方法、プログラム及び露光方法 |
| US9690189B2 (en) * | 2013-06-21 | 2017-06-27 | Hoya Corporation | Mask blank substrate, mask blank, transfer mask, and method of manufacturing semiconductor device |
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