JP6247289B2 - ナノ要素の電界誘導組立てによって調製された３次元結晶性、均一および複合ナノ構造体 - Google Patents
ナノ要素の電界誘導組立てによって調製された３次元結晶性、均一および複合ナノ構造体 Download PDFInfo
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- JP6247289B2 JP6247289B2 JP2015520625A JP2015520625A JP6247289B2 JP 6247289 B2 JP6247289 B2 JP 6247289B2 JP 2015520625 A JP2015520625 A JP 2015520625A JP 2015520625 A JP2015520625 A JP 2015520625A JP 6247289 B2 JP6247289 B2 JP 6247289B2
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Classifications
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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- C25D13/02—Electrophoretic coating characterised by the process with inorganic material
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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- C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
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- C—CHEMISTRY; METALLURGY
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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- C25D13/22—Servicing or operating apparatus or multistep processes
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
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- Metallurgy (AREA)
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- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Thin Film Transistor (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Powder Metallurgy (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Formation Of Insulating Films (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
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| US201261666181P | 2012-06-29 | 2012-06-29 | |
| US61/666,181 | 2012-06-29 | ||
| PCT/US2013/048948 WO2014005147A2 (en) | 2012-06-29 | 2013-07-01 | Three-dimensional crystalline, homogenous, and hybrid nanostructures fabricated by electric field directed assembly of nanoelements |
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| JP2015531816A5 JP2015531816A5 (enExample) | 2016-08-18 |
| JP6247289B2 true JP6247289B2 (ja) | 2017-12-13 |
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| JP (1) | JP6247289B2 (enExample) |
| WO (1) | WO2014005147A2 (enExample) |
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| US10481307B2 (en) | 2014-04-09 | 2019-11-19 | Agency For Science, Technology And Research | Optical antenna |
| GB2526268A (en) * | 2014-05-15 | 2015-11-25 | Richard Stone | Arc discharge assembly of dielectrophoretically aligned conductive particulates |
| US10393933B2 (en) | 2015-08-31 | 2019-08-27 | National Technology & Engineering Solutions Of Sandia, Llc | Rapidly tunable, narrow-band infrared filter arrays |
| US9685765B2 (en) * | 2015-08-31 | 2017-06-20 | Sandia Corporation | High quality-factor fano metasurface comprising a single resonator unit cell |
| US9559240B1 (en) * | 2015-12-17 | 2017-01-31 | International Business Machines Corporation | Nano-pillar-based biosensing device |
| US10507466B2 (en) * | 2016-04-27 | 2019-12-17 | International Business Machines Corporation | Metal assisted chemical etching for fabricating high aspect ratio and straight silicon nanopillar arrays for sorting applications |
| US10777458B2 (en) * | 2016-12-27 | 2020-09-15 | Semes Co., Ltd. | Method of filling a via hole and apparatus for performing the same |
| US10720993B2 (en) * | 2018-05-11 | 2020-07-21 | Government Of The United States Of America, As Represented By The Secretary Of Commerce | Metasurface optical pulse shaper for shaping an optical pulse in a temporal domain |
| EP3935923A1 (en) * | 2019-03-06 | 2022-01-12 | TTM Technologies, Inc. | Methods for fabricating printed circuit board assemblies with high density via array |
| FI129724B (en) * | 2019-03-25 | 2022-07-29 | Teknologian Tutkimuskeskus Vtt Oy | Enhancing the absorption and detection of infrared radiation using plasmonics |
| US11005187B2 (en) | 2019-08-28 | 2021-05-11 | Government Of The United States, As Represented By The Secretary Of The Army | Antenna structure with metamaterial |
| CN110581214B (zh) * | 2019-09-17 | 2021-01-12 | 云南大学 | 复合多层磁性纳米环阵列存储器件及其制备方法和应用 |
| US12174534B2 (en) * | 2019-10-16 | 2024-12-24 | Northeastern University | Fast fluidic assembly method for nanoscale and microscale printing |
| KR102832733B1 (ko) * | 2019-11-22 | 2025-07-11 | 엘지전자 주식회사 | 반도체 발광소자를 이용한 디스플레이 장치의 제조방법 및 이에 사용되는 자가조립 장치 |
| CN113275555B (zh) * | 2021-04-13 | 2022-04-19 | 南京航空航天大学 | 一种阵列结构的金属纳米框及其制备方法与应用 |
| CN113333735A (zh) * | 2021-05-07 | 2021-09-03 | 东南大学 | 一种交变电场循环诱导形貌转变提纯银纳米颗粒的方法 |
| US12456659B2 (en) | 2021-05-28 | 2025-10-28 | Northeastern University | Printed micro and nanostructured arrays for thermal management of electronic devices |
| US12488524B2 (en) | 2021-11-15 | 2025-12-02 | Disney Enterprises, Inc. | Synthesizing sequences of 3D geometries for movement-based performance |
| US12243140B2 (en) | 2021-11-15 | 2025-03-04 | Disney Enterprises, Inc. | Synthesizing sequences of images for movement-based performance |
| KR102787294B1 (ko) * | 2023-01-18 | 2025-03-26 | 고려대학교 세종산학협력단 | 유전영동과 전기영동을 활용한 나노라드 자가정렬 장치 |
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| US6569382B1 (en) * | 1991-11-07 | 2003-05-27 | Nanogen, Inc. | Methods apparatus for the electronic, homogeneous assembly and fabrication of devices |
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| JP2001207288A (ja) * | 2000-01-27 | 2001-07-31 | Canon Inc | 細孔内への電着方法及び構造体 |
| JP2003013287A (ja) * | 2001-03-13 | 2003-01-15 | Takeshi Yao | 電気泳動堆積法により電気絶縁性基材に粒子を堆積させる方法及びそれから得られる複合体 |
| US7252749B2 (en) * | 2001-11-30 | 2007-08-07 | The University Of North Carolina At Chapel Hill | Deposition method for nanostructure materials |
| WO2004034421A2 (en) | 2002-05-10 | 2004-04-22 | The Trustees Of Columbia University In The City Of New York | Method for electric field assisted deposition of films of nanoparticles |
| US7534488B2 (en) * | 2003-09-10 | 2009-05-19 | The Regents Of The University Of California | Graded core/shell semiconductor nanorods and nanorod barcodes |
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| JP4269864B2 (ja) * | 2003-09-25 | 2009-05-27 | 株式会社村田製作所 | セラミック薄膜の製造方法および積層セラミック電子部品の製造方法 |
| US7223611B2 (en) * | 2003-10-07 | 2007-05-29 | Hewlett-Packard Development Company, L.P. | Fabrication of nanowires |
| CN102351169B (zh) * | 2004-04-30 | 2013-11-27 | 纳米系统公司 | 纳米线生长和获取的体系和方法 |
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| US8703501B2 (en) * | 2005-06-07 | 2014-04-22 | Northeastern University | Directed assembly of a conducting polymer |
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| WO2008051248A2 (en) | 2005-12-21 | 2008-05-02 | Trustees Of The University Of Pennsylvania | System and method for controlling nanoparticles using dielectrophoretic forces |
| US20090278556A1 (en) * | 2006-01-26 | 2009-11-12 | Nanoselect, Inc. | Carbon Nanostructure Electrode Based Sensors: Devices, Processes and Uses Thereof |
| DE102006010808B4 (de) * | 2006-03-07 | 2009-08-13 | BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG | Vorrichtung, System, Verfahren, Computerprogramm und Datenträger zur elektrophoretischen Abscheidung mit einer beweglichen Elektrode |
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| IE20090856A1 (en) * | 2008-11-05 | 2010-05-12 | Univ Limerick | Deposition of materials |
| JP5463052B2 (ja) * | 2009-02-17 | 2014-04-09 | 富士フイルム株式会社 | 金属部材 |
| WO2010102024A2 (en) | 2009-03-03 | 2010-09-10 | The Johns Hopkins University | System and method for precision transport, positioning, and assembling of longitudinal nano-structures |
| WO2011041682A1 (en) * | 2009-10-01 | 2011-04-07 | Northeastern University | Nanoscale interconnects fabricated by electrical field directed assembly of nanoelements |
| GB201006520D0 (en) * | 2010-04-19 | 2010-06-02 | Univ Nottingham | Nano fabrication of hybrid materials |
| WO2012075006A2 (en) | 2010-11-29 | 2012-06-07 | Northeastern University | High rate electric field driven nanoelement assembly on an insulated surface |
| TWI513650B (zh) | 2010-12-15 | 2015-12-21 | Hon Hai Prec Ind Co Ltd | 電連接器及其製造方法 |
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| EP2867018A2 (en) | 2015-05-06 |
| JP2015531816A (ja) | 2015-11-05 |
| WO2014005147A2 (en) | 2014-01-03 |
| EP3680213A1 (en) | 2020-07-15 |
| US20190017190A1 (en) | 2019-01-17 |
| US11220756B2 (en) | 2022-01-11 |
| WO2014005147A3 (en) | 2014-05-01 |
| EP2867018B1 (en) | 2019-05-01 |
| US20150322589A1 (en) | 2015-11-12 |
| EP2867018A4 (en) | 2016-06-08 |
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