JP6220240B2 - Grinding equipment - Google Patents

Grinding equipment Download PDF

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JP6220240B2
JP6220240B2 JP2013236873A JP2013236873A JP6220240B2 JP 6220240 B2 JP6220240 B2 JP 6220240B2 JP 2013236873 A JP2013236873 A JP 2013236873A JP 2013236873 A JP2013236873 A JP 2013236873A JP 6220240 B2 JP6220240 B2 JP 6220240B2
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cleaning
disk
shaped workpiece
rotation
plate
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JP2015097230A (en
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恒成 清原
恒成 清原
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Disco Corp
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  • Cleaning Or Drying Semiconductors (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
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Description

本発明は、研削装置に関し、特に、研削時にチャックテーブルに保持される被加工物の面をチャックテーブルから搬出する際に洗浄することができる研削装置に関する。   The present invention relates to a grinding apparatus, and more particularly, to a grinding apparatus that can clean a workpiece surface held on a chuck table during grinding when the workpiece surface is unloaded from the chuck table.

一般に、半導体ウェーハなどの円板状ワークは、研削装置のチャックテーブルで一方の面(被保持面)が保持された状態で、他方の面に対して研削砥石により研削が行われる。所望の厚さ寸法に研削された円板状ワークは、搬出手段によりチャックテーブルから搬出される。研削装置においては、搬出手段による円板状ワークの搬出経路上に洗浄手段を配設しておき、円板状ワークの被保持面を洗浄するものがある。   In general, a disk-shaped workpiece such as a semiconductor wafer is ground with a grinding wheel on the other surface in a state where one surface (held surface) is held by a chuck table of a grinding device. The disc-shaped workpiece ground to a desired thickness is carried out from the chuck table by the carrying-out means. In some grinding apparatuses, a cleaning unit is disposed on a carrying-out path of the disc-shaped workpiece by the carrying-out unit, and the held surface of the disc-shaped workpiece is washed.

ところで、数十μm以下の厚さ寸法に研削される円板状ワークを被加工物とする研削装置においては、円板状ワークの外周部を研削せずに厚みを残して環状の補強部とすることが行われている。このように研削される円板状ワークの被保持面の全面を洗浄すべく、円板状ワークの外周縁を保持する一方、洗浄過程で円板状ワークを回転させることで、洗浄手段が備える洗浄部材による洗浄位置を切り替える洗浄方法が提案されている(例えば、特許文献1参照)。   By the way, in a grinding apparatus that uses a disk-shaped workpiece to be ground to a thickness of several tens of μm or less as a workpiece, the annular reinforcing portion is formed by leaving the thickness without grinding the outer periphery of the disk-shaped workpiece. To be done. In order to clean the entire surface to be held of the disk-shaped work to be ground in this way, the cleaning means is provided by rotating the disk-shaped work in the cleaning process while holding the outer peripheral edge of the disk-shaped work. A cleaning method for switching the cleaning position by the cleaning member has been proposed (see, for example, Patent Document 1).

特開2013−105828号公報JP2013-105828A

特許文献1記載の円板状ワークの洗浄方法においては、洗浄後に被保持面に洗浄斑が生じるのを回避するため、円板状ワークの被保持面と洗浄部材の上面とが平行に調整される必要がある。このような円板状ワークの被保持面と洗浄部材の上面との平行度は、円板状ワークを搬出する搬出手段と、洗浄部材を有する洗浄手段との相対位置関係により決定される。   In the method for cleaning a disk-shaped workpiece described in Patent Document 1, the surface to be held of the disk-shaped workpiece and the upper surface of the cleaning member are adjusted in parallel to avoid occurrence of cleaning spots on the surface to be held after cleaning. It is necessary to The parallelism between the held surface of the disk-shaped workpiece and the upper surface of the cleaning member is determined by the relative positional relationship between the unloading means for unloading the disk-shaped workpiece and the cleaning means having the cleaning member.

近年、取得可能な半導体デバイスを増大するために300mmや450mmという大口径の円板状ワークを被加工物とする研削装置が普及している。このような大口径の円板状ワークの被保持面を特許文献1記載の円板状ワークの洗浄方法により洗浄する場合には、搬出手段と洗浄手段との相対位置関係を高精度に維持することが要求される。   In recent years, in order to increase the number of semiconductor devices that can be acquired, a grinding apparatus using a disk-shaped workpiece having a large diameter of 300 mm or 450 mm as a workpiece has become widespread. When cleaning the held surface of such a large-diameter disk-shaped workpiece by the disk-shaped workpiece cleaning method described in Patent Document 1, the relative positional relationship between the carry-out means and the cleaning means is maintained with high accuracy. Is required.

本発明は、このような実情に鑑みてなされたものであり、複雑な構成を必要とすることなく、円板状ワークを搬出する搬出手段と円板状ワークの被保持面を洗浄する洗浄手段との相対位置関係を高精度に維持することができる研削装置を提供することを目的とする。   The present invention has been made in view of such a situation, and without requiring a complicated configuration, a carrying-out means for carrying out a disk-like work and a washing means for washing a held surface of the disk-like work. An object of the present invention is to provide a grinding apparatus capable of maintaining the relative positional relationship with the high accuracy.

本発明の研削装置は、円板状ワークを吸引保持する保持面を有するチャックテーブルと、チャックテーブルに吸引保持された円板状ワークを研削加工する研削手段と、円板状ワークの外周縁を保持する外周縁保持機構及び外周縁保持機構をチャックテーブルに接近/離反させる移動機構で少なくとも構成しチャックテーブルから円板状ワークを搬出する搬出手段と、搬出手段がチャックテーブルから円板状ワークを搬出する搬出経路に配設され円板状ワークの被保持面に洗浄水を供給しながら洗浄する洗浄手段と、を備えた研削装置において、外周縁保持機構は、均等な角度で少なくとも3つ配設され放射方向に移動する保持部と、保持部の下端より下方側に突出して均等な間隔で少なくとも3つ配設されるピンと、を少なくとも備え、洗浄手段は、均等な角度で放射状に少なくとも3方向に延在したプレートの先端に円板状ワークの外周部に摺動して洗浄する洗浄部材を装着した洗浄プレートと、洗浄プレートの中心を回転軸として洗浄プレートを回転させる回転手段と、洗浄部材と搬出手段が保持する円板状ワークとを当接させ回転手段により洗浄部材を回転させる洗浄動作によって円板状ワークが回転するのを防止させる回転防止機構と、を少なくとも備え、回転防止機構は、洗浄プレートと平行で少なくとも3つの回転防止部材を装着する回転防止プレートと、回転防止プレートに円板状ワークの外径より外側に配設される載置台と、で少なくとも構成され、移動機構を用いて外周縁保持機構を下降させ載置台に少なくとも3つのピンを載置させ、外周縁保持機構の少なくとも3つのピンの共通位置を結んだ三角形からなる面と、洗浄手段の少なくとも3つの洗浄部材の共通位置を結んだ三角形からなる面とが平行になることを特徴とする。   A grinding apparatus according to the present invention includes a chuck table having a holding surface for sucking and holding a disk-shaped workpiece, a grinding means for grinding the disk-shaped workpiece sucked and held by the chuck table, and an outer peripheral edge of the disk-shaped workpiece. An outer peripheral edge holding mechanism to be held and a moving mechanism for moving the outer peripheral edge holding mechanism to approach / separate from the chuck table, an unloading means for unloading the disk-shaped workpiece from the chuck table, and the unloading means to remove the disk-shaped workpiece from the chuck table. And a cleaning device that is disposed in the unloading path for cleaning while supplying cleaning water to the surface to be held of the disk-shaped workpiece. At least three outer peripheral edge holding mechanisms are arranged at equal angles. A holding portion that moves in the radial direction, and at least three pins that protrude downward from the lower end of the holding portion and that are arranged at equal intervals. The stage has a cleaning plate in which a cleaning member that slides and cleans the outer periphery of the disk-shaped workpiece at the tip of a plate radially extending in at least three directions at an equal angle, and the center of the cleaning plate as a rotation axis. Rotating means for rotating the cleaning plate, and rotating to prevent the disk-shaped work from rotating by a cleaning operation in which the cleaning member and the unloading means hold the disk-shaped work held in contact with each other to rotate the cleaning member. An anti-rotation plate, and the anti-rotation mechanism is disposed outside the outer diameter of the disk-shaped workpiece on the anti-rotation plate and mounted on the anti-rotation plate in parallel with the cleaning plate. And at least three pins are placed on the mounting table by lowering the outer peripheral edge holding mechanism using the moving mechanism, and the outer peripheral edge holding mechanism is reduced. Also a surface made of connecting it triangular common positions of the three pins, the common position consist connecting it triangular surfaces of at least three cleaning member of the cleaning means is characterized by comprising parallel.

上記研削装置によれば、外周縁保持機構を下降させて載置台に3つのピンを載置させるだけで、外周縁保持機構の3つのピンを結んだ三角形からなる面と、洗浄手段の3つの洗浄部材を結んだ三角形からなる面とを平行に配置できる。これにより、搬出手段及び洗浄手段を個別に位置決めするような構成等を備えることなく両者の相対位置を決定できる。この結果、複雑な構成を必要とすることなく、円板状ワークを搬出する搬出手段と円板状ワークの被保持面を洗浄する洗浄手段との相対位置関係を高精度に維持することが可能となる。   According to the above grinding apparatus, by simply lowering the outer peripheral edge holding mechanism and placing the three pins on the mounting table, the surface formed by the triangle connecting the three pins of the outer peripheral edge holding mechanism and the three cleaning means A triangular surface connecting the cleaning members can be arranged in parallel. Thereby, the relative position of both can be determined without providing the structure etc. which position a carrying-out means and a washing | cleaning means separately. As a result, the relative positional relationship between the unloading means for unloading the disk-shaped workpiece and the cleaning means for cleaning the held surface of the disk-shaped workpiece can be maintained with high accuracy without requiring a complicated configuration. It becomes.

本発明の研削装置において、洗浄手段は、回転防止プレートを昇降させる昇降手段を含み、昇降手段で回転防止部材の上面が洗浄部材の上面と略同一高さに位置付けられた回転防止プレートの載置台に外周縁保持機構の保持部を載置させ、少なくとも3つの保持部の共通位置を結んだ三角形からなる面と少なくとも3つの洗浄部材の共通位置を結んだ三角形からなる面とが平行になることが好ましい。この構成によれば、回転防止プレートを昇降させ載置台に外周縁保持機構の保持部を載置させるだけで、外周縁保持機構の3つの保持部を結んだ三角形からなる面と、洗浄手段の3つの洗浄部材を結んだ三角形からなる面とを平行に配置できる。これにより、搬出手段及び洗浄手段を個別に位置決めするような構成等を備えることなく両者の相対位置を決定できる。この結果、複雑な構成を必要とすることなく、円板状ワークを搬出する搬出手段と円板状ワークの被保持面を洗浄する洗浄手段との相対位置関係を高精度に維持することが可能となる。 In the grinding apparatus of the present invention, the cleaning means includes an elevating means for raising and lowering the antirotation plate, and the antirotation plate mounting table in which the upper surface of the antirotation member is positioned at substantially the same height as the upper surface of the cleaning member by the elevating means. outer edge is placed on the holding portion of the holding mechanism, the a surface constituted by the triangle formed by connecting the common position of at least three holding portions of the common position connecting it to the surface with at least three consisting of triangles the cleaning member is parallel to the Is preferred. According to this configuration, by simply moving the anti-rotation plate up and down and placing the holding portion of the outer peripheral edge holding mechanism on the mounting table, the surface formed of the triangle connecting the three holding portions of the outer peripheral edge holding mechanism and the cleaning means A triangular surface connecting three cleaning members can be arranged in parallel. Thereby, the relative position of both can be determined without providing the structure etc. which position a carrying-out means and a washing | cleaning means separately. As a result, the relative positional relationship between the unloading means for unloading the disk-shaped workpiece and the cleaning means for cleaning the held surface of the disk-shaped workpiece can be maintained with high accuracy without requiring a complicated configuration. It becomes.

本発明によれば、複雑な構成を必要とすることなく、円板状ワークを搬出する搬出手段と円板状ワークの被保持面を洗浄する洗浄手段との相対位置関係を高精度に維持することが可能となる。   According to the present invention, the relative positional relationship between the unloading means for unloading the disk-shaped workpiece and the cleaning means for cleaning the held surface of the disk-shaped workpiece is maintained with high accuracy without requiring a complicated configuration. It becomes possible.

本実施の形態に係る研削装置の一例を模式的に示した平面図である。It is the top view which showed typically an example of the grinding device which concerns on this Embodiment. 本実施の形態に係る研削装置の搬出手段の一例を示す斜視図である。It is a perspective view which shows an example of the carrying-out means of the grinding device which concerns on this Embodiment. 本実施の形態に係る研削装置の洗浄手段の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the washing | cleaning means of the grinding device which concerns on this Embodiment. 本実施の形態に係る研削装置の洗浄手段の一例を示す平面図である。It is a top view which shows an example of the washing | cleaning means of the grinding apparatus which concerns on this Embodiment. 本実施の形態に係る研削装置の搬出手段が保持した円板状ワークと洗浄部材が接触した状態の断面模式図である。It is a cross-sectional schematic diagram of the state which the disc-shaped workpiece | work hold | maintained by the carrying-out means of the grinding device which concerns on this Embodiment, and the cleaning member contacted. 本実施の形態に係る研削装置の搬出手段が保持した円板状ワークに回転防止部材が接触した状態の断面模式図である。It is a cross-sectional schematic diagram of the state which the rotation prevention member contacted the disk-shaped workpiece | work which the carrying-out means of the grinding device which concerns on this Embodiment hold | maintained. 本実施の形態に係る研削装置の搬出手段及び洗浄手段の傾きが異なる状態の断面模式図である。It is a cross-sectional schematic diagram in the state from which the inclination of the carrying-out means and the washing | cleaning means of the grinding apparatus which concerns on this Embodiment differs. 本実施の形態に係る研削装置の搬出手段及び洗浄手段の傾きが補正された状態の断面模式図である。It is a cross-sectional schematic diagram of the state by which the inclination of the carrying-out means and the washing | cleaning means of the grinding device which concerns on this Embodiment was correct | amended. 本実施の形態に係る研削装置の洗浄手段によって円板状ワークを洗浄する状態を略示的に示す断面模式図である。It is a cross-sectional schematic diagram which shows schematically the state which wash | cleans a disk-shaped workpiece | work with the washing | cleaning means of the grinding apparatus which concerns on this Embodiment. 本実施の形態に係る研削装置の洗浄手段によって円板状ワークを洗浄する手順の一例を模式的に示す底面図である。It is a bottom view which shows typically an example of the procedure which wash | cleans a disk-shaped workpiece | work with the washing | cleaning means of the grinding apparatus which concerns on this Embodiment. 本実施の形態に係る研削装置の洗浄手段の他の例を示す平面図である。It is a top view which shows the other example of the washing | cleaning means of the grinding device which concerns on this Embodiment. 図11に示す洗浄手段を構成する回転防止部材が、搬出手段が保持した円板状ワークに接触した状態の断面模式図である。It is a cross-sectional schematic diagram of the state which the rotation prevention member which comprises the washing | cleaning means shown in FIG. 11 contacted the disk-shaped workpiece | work which the carrying-out means hold | maintained.

以下、本発明の実施の形態について図面を参照しながら説明する。以下の説明において、本発明に係る研削装置は、例えば、数十μm以下の厚さ寸法に研削される円板状ワークを被加工物とし、円板状ワークの外周部を研削せずに厚みを残して環状の補強部とする研削が可能な研削装置に適用される。しかしながら、本発明が適用される研削装置の構成についてはこれに限定されるものではなく適宜変更が可能である。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, the grinding apparatus according to the present invention uses, for example, a disk-shaped workpiece that is ground to a thickness of several tens of μm or less as a workpiece, and the outer peripheral portion of the disk-shaped workpiece is not ground. The present invention is applied to a grinding apparatus capable of grinding with an annular reinforcing part leaving However, the configuration of the grinding apparatus to which the present invention is applied is not limited to this and can be changed as appropriate.

また、本発明に係る研削装置における被加工物となる円板状ワークについては、後述するチャックテーブル2により保持される被保持面にデバイス保護のための保護テープを貼着したものも含まれる。   Further, the disk-shaped workpiece that is a workpiece in the grinding apparatus according to the present invention includes a workpiece in which a protective tape for device protection is attached to a held surface held by a chuck table 2 described later.

図1は、本実施の形態に係る研削装置の一例を模式的に示す平面図である。なお、以下においては、説明の便宜上、図1に示す下方側を研削装置の前方側と呼び、図1に示す上方側を研削装置の後方側と呼ぶものとする。また、説明の便宜上、図1に示す左右方向を研削装置のX軸方向と呼び、図1に示す上下方向を研削装置のY軸方向と呼ぶものとする。   FIG. 1 is a plan view schematically showing an example of a grinding apparatus according to the present embodiment. In the following, for convenience of explanation, the lower side shown in FIG. 1 is called the front side of the grinding apparatus, and the upper side shown in FIG. 1 is called the rear side of the grinding apparatus. For convenience of explanation, the left-right direction shown in FIG. 1 is called the X-axis direction of the grinding apparatus, and the up-down direction shown in FIG. 1 is called the Y-axis direction of the grinding apparatus.

本実施の形態に係る研削装置1は、図1に示すように、複数(本実施の形態では4つ)のチャックテーブル2と、2つの第1研削手段31及び第2研削手段32と、研磨手段33とを含んで構成されている。複数のチャックテーブル2は、ターンテーブル21上に配置され、ターンテーブル21によって公転及び自転可能に支持される。それぞれのチャックテーブル2は、図示しない吸引源に接続され、被加工物である円板状ワークWを吸引保持する。第1研削手段31、第2研削手段32は、それぞれチャックテーブル2に保持された円板状ワークWに対して研削加工を施す。研磨手段33は、研削手段3によって研削された円板状ワークWを研磨する。   As shown in FIG. 1, the grinding apparatus 1 according to the present embodiment includes a plurality (four in the present embodiment) of chuck tables 2, two first grinding means 31 and second grinding means 32, and polishing. And means 33. The plurality of chuck tables 2 are arranged on the turntable 21 and supported by the turntable 21 so as to be able to revolve and rotate. Each chuck table 2 is connected to a suction source (not shown) and sucks and holds a disk-shaped workpiece W that is a workpiece. The first grinding means 31 and the second grinding means 32 perform grinding on the disk-shaped workpiece W held on the chuck table 2 respectively. The polishing means 33 polishes the disk-shaped workpiece W ground by the grinding means 3.

研削装置1の前方側には、加工前の円板状ワークWを収容する第1カセットC1と、加工後の円板状ワークWを収容する第2カセットC2とが設けられている。これらの第1カセットC1及び第2カセットC2は、複数の円板状ワークWを収容可能に構成されている。これらの第1カセットC1及び第2カセットC2は、例えば、研削装置1の前面側の一部に着脱可能に設けられている。   On the front side of the grinding apparatus 1, a first cassette C <b> 1 that stores a disk-shaped workpiece W before processing and a second cassette C <b> 2 that stores a disk-shaped workpiece W after processing are provided. These 1st cassette C1 and 2nd cassette C2 are comprised so that the some disc-shaped workpiece | work W can be accommodated. The first cassette C1 and the second cassette C2 are detachably provided on a part of the front side of the grinding apparatus 1, for example.

第1カセットC1及び第2カセットC2の近傍には、第1カセットC1からの円板状ワークWの取り出し及び第2カセットC2への円板状ワークWの収容を行うロボット40が設けられている。ロボット40は、円形板状ワークWを吸引保持するハンド部401と、ハンド部401に連結され屈曲可能なアーム部402と、ハンド部401及びアーム部402をX軸方向に移動させる駆動機構403とを備えている。駆動機構403は、例えば、研削装置1のX軸方向に延在して設けられるガイドレール部を備え、ハンド部401及びアーム部402を移動可能に構成される。   In the vicinity of the first cassette C1 and the second cassette C2, a robot 40 is provided for taking out the disk-shaped workpiece W from the first cassette C1 and storing the disk-shaped workpiece W in the second cassette C2. . The robot 40 includes a hand unit 401 that sucks and holds the circular plate-shaped workpiece W, an arm unit 402 that is connected to the hand unit 401 and can be bent, and a drive mechanism 403 that moves the hand unit 401 and the arm unit 402 in the X-axis direction. It has. The drive mechanism 403 includes, for example, a guide rail portion that extends in the X-axis direction of the grinding device 1 and is configured to be able to move the hand portion 401 and the arm portion 402.

ロボット40の駆動機構403の左端部の後方側には、円板状ワークWの仮置きテーブル41が設けられている。仮置きテーブル41は、研削加工前の円板状ワークWを所定の位置に位置合わせする際に利用される。仮置きテーブル41は、ロボット40のハンド部401の可動域に配置されている。仮置きテーブル41の後方は、加工前の円板状ワークWをチャックテーブル2に載置したり、加工後の円形板状ワークWを次の工程に移送するためにチャックテーブル2から取り出したりする領域である搬出入領域42となっている。   On the rear side of the left end portion of the drive mechanism 403 of the robot 40, a temporary placement table 41 for the disk-shaped workpiece W is provided. The temporary placement table 41 is used when the disc-shaped workpiece W before grinding is aligned with a predetermined position. The temporary placement table 41 is disposed in the movable range of the hand unit 401 of the robot 40. Behind the temporary placement table 41, the disk-shaped workpiece W before processing is placed on the chuck table 2, and the circular plate-shaped workpiece W after processing is taken out from the chuck table 2 to be transferred to the next process. It is a carry-in / out area 42 which is an area.

搬出入領域42の近傍には、仮置きテーブル41から搬出入領域42に位置するチャックテーブル2への円板状ワークWの搬入を行う搬入手段43と、搬出入領域42に位置するチャックテーブル2からの円板状ワークWの搬出を行う搬出手段5とが配設されている。搬出手段5は、後述するように、アーム部11の先端に取り付けられ円形板状ワークWを保持する外周縁保持機構10を備えている。外周縁保持機構10は、研削された円板状ワークWの外周縁を保持し、その状態でアーム部11を旋回及びY軸方向に移動させることにより、円板状ワークWをチャックテーブル2から搬出可能に構成されている。   In the vicinity of the loading / unloading area 42, loading means 43 for loading the disk-shaped workpiece W from the temporary placement table 41 to the chuck table 2 positioned in the loading / unloading area 42 and the chuck table 2 positioned in the loading / unloading area 42. And an unloading means 5 for unloading the disk-shaped workpiece W. As will be described later, the carry-out means 5 includes an outer peripheral edge holding mechanism 10 that is attached to the tip of the arm portion 11 and holds the circular plate-like workpiece W. The outer peripheral edge holding mechanism 10 holds the outer peripheral edge of the ground disc-shaped workpiece W, and in this state, the arm portion 11 is turned and moved in the Y-axis direction, so that the disc-shaped workpiece W is removed from the chuck table 2. It is configured to be able to carry out.

搬出手段5による円板状ワークWの搬出経路には、外周縁保持機構10によって保持された円板状ワークWの下面、すなわちチャックテーブル2によって吸引保持されていた被保持面を洗浄する洗浄手段6が配設されている。洗浄手段6の近傍には、円板状ワークWの上面側を洗浄し乾燥する洗浄乾燥手段7が配設されている。なお、図1においては、円板状ワークWの搬出経路として、搬出入領域42から洗浄乾燥手段7までの経路を示している。洗浄手段6の配設位置は、搬出手段5による円板状ワークWの搬出経路上であれば、任意の位置に変更することができる。   In the carry-out path of the disk-like workpiece W by the carry-out means 5, a cleaning means for washing the lower surface of the disk-like workpiece W held by the outer peripheral edge holding mechanism 10, that is, the held surface sucked and held by the chuck table 2. 6 is disposed. In the vicinity of the cleaning means 6, a cleaning / drying means 7 for cleaning and drying the upper surface side of the disk-shaped workpiece W is disposed. In FIG. 1, a path from the carry-in / out area 42 to the cleaning / drying means 7 is shown as the carry-out path of the disk-shaped workpiece W. The arrangement position of the cleaning means 6 can be changed to any position as long as it is on the carry-out path of the disk-like workpiece W by the carry-out means 5.

ここで、本実施の形態に係る研削装置1が備える搬出手段5の構成について、図2を参照しながら説明する。図2は、本実施の形態に係る研削装置1が備える搬出手段5の一例を示す斜視図である。図2においては、説明の便宜上、搬出手段5が備える1つの保持部13及びこれに対応するボルト22を支持プレート14から分離して示している。   Here, the structure of the carrying-out means 5 with which the grinding apparatus 1 which concerns on this Embodiment is provided is demonstrated, referring FIG. FIG. 2 is a perspective view showing an example of the carry-out means 5 provided in the grinding apparatus 1 according to the present embodiment. In FIG. 2, for convenience of explanation, one holding portion 13 provided in the carry-out means 5 and a bolt 22 corresponding to the holding portion 13 are shown separately from the support plate 14.

図2に示すように、搬出手段5は、上述した外周縁保持機構(以下、単に「保持機構」という)10と、この保持機構10を研削装置1の鉛直方向(上下方向)に移動させる移動機構12とを含んで構成されている。保持機構10は、例えば、搬出入領域42に配置された円形板状ワークWの外周縁を保持する。移動機構12は、例えば、円板状ワークWを保持しない状態の保持機構10をチャックテーブル2に接近させ、円板状ワークWを保持した状態の保持機構10をチャックテーブル2から離反させる。   As shown in FIG. 2, the carry-out means 5 includes the outer peripheral edge holding mechanism (hereinafter simply referred to as “holding mechanism”) 10 and a movement for moving the holding mechanism 10 in the vertical direction (vertical direction) of the grinding apparatus 1. The mechanism 12 is comprised. The holding mechanism 10 holds, for example, the outer peripheral edge of the circular plate-like workpiece W arranged in the carry-in / out area 42. For example, the moving mechanism 12 brings the holding mechanism 10 that does not hold the disk-shaped workpiece W closer to the chuck table 2 and moves the holding mechanism 10 that holds the disk-shaped workpiece W away from the chuck table 2.

保持機構10は、円板状ワークWの外周縁に係合して円板状ワークWを保持する複数の保持部13と、保持部13を円板状ワークWの外周縁に対して水平方向に移動可能に支持する支持プレート14と、支持プレート14の上面側において支持プレート14に対して所定範囲回動可能に配設された回動プレート15と、アーム部11の先端に取り付けられ支持プレート14に対して傾斜可能に連結された取り付け板16と、支持プレート14の下面に取り付けられる複数のピン17とを含んで構成されている。   The holding mechanism 10 is engaged with the outer peripheral edge of the disc-shaped workpiece W to hold the disc-shaped workpiece W, and the holding portion 13 is horizontally oriented with respect to the outer peripheral edge of the disc-shaped workpiece W. A support plate 14 that is movably supported on the support plate 14, a rotation plate 15 that is disposed on the upper surface side of the support plate 14 so as to be rotatable within a predetermined range with respect to the support plate 14, and a support plate attached to the tip of the arm portion 11 14 includes an attachment plate 16 that is tiltably connected to the base plate 14 and a plurality of pins 17 that are attached to the lower surface of the support plate 14.

本実施の形態において、保持機構10は、少なくとも3つの保持部13を備えている。3つの保持部13は、それぞれ同一の形状及び構成を有している。これらの保持部13は、支持プレート14の中心を基準に均等な角度で(すなわち120°間隔で)配設されている。これらの保持部13は、放射方向すなわち支持プレート14の径方向に移動可能に構成されている。   In the present embodiment, the holding mechanism 10 includes at least three holding portions 13. The three holding portions 13 have the same shape and configuration. These holding portions 13 are arranged at equal angles (that is, at intervals of 120 °) with respect to the center of the support plate 14. These holding portions 13 are configured to be movable in the radial direction, that is, in the radial direction of the support plate 14.

例えば、保持部13は、フッ素系樹脂等の摩擦抵抗の小さい合成樹脂によって形成され係合凹部130aを備えた係合部材130と、係合部材130から上方に立設された円柱状の被支持部131とから構成される。被支持部131の内周面には、ボルトを螺合させる雌ねじ穴131aが形成されている。3つの保持部13は、係合凹部130aにおいて円形板状ワークWの外周縁を係合させることにより、円板状ワークWを外周面側から保持可能に構成されている。   For example, the holding portion 13 includes an engaging member 130 that is formed of a synthetic resin having a low frictional resistance such as a fluorine-based resin and includes an engaging concave portion 130a, and a column-shaped supported member that is erected upward from the engaging member 130. Part 131. On the inner peripheral surface of the supported portion 131, a female screw hole 131a for screwing a bolt is formed. The three holding portions 13 are configured to be able to hold the disk-shaped workpiece W from the outer peripheral surface side by engaging the outer peripheral edge of the circular plate-shaped workpiece W in the engagement recess 130a.

支持プレート14には、保持部13の個数及び位置に対応して、径方向に長く表裏面を貫通する長孔140が形成されている。長孔140は、保持部13の被支持部131を長孔140の長手方向に移動自在に支持し、3つの保持部13を放射方向に動作させる際の案内部として機能する。長孔140の幅は、被支持部131の直径より僅かに大きく形成されている。また、支持プレート14の上面からは、コイルバネ180が挿嵌された3本の支持柱18が立設されている。支持柱18の上端には図示しない雌ねじ穴が形成されている。これらの支持柱18及びコイルバネ180は、後述する回動プレート15の長孔151を貫通して配置される。   In the support plate 14, corresponding to the number and position of the holding portions 13, elongated holes 140 that are long in the radial direction and penetrate the front and back surfaces are formed. The long hole 140 functions as a guide portion when the supported portion 131 of the holding portion 13 is movably supported in the longitudinal direction of the long hole 140 and the three holding portions 13 are operated in the radial direction. The width of the long hole 140 is slightly larger than the diameter of the supported portion 131. Further, from the upper surface of the support plate 14, three support columns 18 into which a coil spring 180 is inserted are erected. A female screw hole (not shown) is formed at the upper end of the support column 18. These support pillars 18 and coil springs 180 are disposed through a long hole 151 of a rotating plate 15 described later.

また、保持機構10は、少なくとも3つのピン17を備える。3つのピン17は、支持プレート14の中心を基準に均等な間隔(すなわち120°間隔)で配設されている。それぞれのピン17は、同一の形状及び構成を有している。ピン17は、その下端部が保持部13の下端よりも下方側に突出する長さを有している(図5参照)。隣接するピン17と保持部13とは、支持プレート14の中心を基準に60°の角度を挟んで配置されている。これらのピン17は、保持機構10がチャックテーブル2から円板状ワークWを把持する際に保持部13と円板状ワークWの外周縁との高さ方向の位置決めを行うと共に、搬出手段5と洗浄手段6との相対位置関係を一定に維持する役割を果たす。前者の役割によって、3つの保持部13の下端部がチャックテーブル2の上面よりも少し上方側の位置に配置されると共に、3つの保持部13の共通位置を結んだ面とチャックテーブル2の上面とが平行に位置付けられる。   The holding mechanism 10 includes at least three pins 17. The three pins 17 are arranged at equal intervals (that is, 120 ° intervals) with the center of the support plate 14 as a reference. Each pin 17 has the same shape and configuration. The pin 17 has such a length that its lower end protrudes downward from the lower end of the holding portion 13 (see FIG. 5). The adjacent pins 17 and the holding portions 13 are arranged with an angle of 60 ° with respect to the center of the support plate 14. These pins 17 position the holding portion 13 and the outer peripheral edge of the disk-shaped workpiece W in the height direction when the holding mechanism 10 grips the disk-shaped workpiece W from the chuck table 2, and carry-out means 5. And maintaining the relative positional relationship between the cleaning means 6 constant. Due to the former role, the lower end portions of the three holding portions 13 are arranged at positions slightly above the upper surface of the chuck table 2, and the surface connecting the common positions of the three holding portions 13 and the upper surface of the chuck table 2 Are positioned in parallel.

支持プレート14の上面中央には、回動プレート15が支持プレート14に対して回動可能に取り付けられている。回動プレート15は、概して円形状を有している。回動プレート15には、周方向に長く形成され表裏面を貫通する3つの長孔151と、所定間隔をおいて外周方向に突出形成された3つのアーム部152とが設けられている。それぞれのアーム部152の先端には、枢軸153によってアーム部152に対して回動可能にリンク154が連結されている。リンク154の先端には、貫通孔154aが形成されている。3つのアーム部152のうち、1つのアーム部152には、後述するピストンロッド19と連結される連結部155が形成されている。   A rotation plate 15 is attached to the center of the upper surface of the support plate 14 so as to be rotatable with respect to the support plate 14. The rotating plate 15 has a generally circular shape. The rotating plate 15 is provided with three long holes 151 that are long in the circumferential direction and penetrate the front and back surfaces, and three arm portions 152 that are formed to protrude in the outer circumferential direction at a predetermined interval. A link 154 is connected to the tip of each arm portion 152 so as to be rotatable with respect to the arm portion 152 by a pivot 153. A through hole 154 a is formed at the tip of the link 154. Of the three arm portions 152, one arm portion 152 is formed with a connecting portion 155 that is connected to a piston rod 19 described later.

支持プレート14の上面には、ピストンロッド19を出没させるエアシリンダ20が配設されている。ピストンロッド19の先端部には、リング状に形成された連結係合部19aが設けられている。この連結係合部19aは、回動プレート15のアーム部152の連結部155と係合可能に構成されている。   On the upper surface of the support plate 14, an air cylinder 20 that causes the piston rod 19 to appear and disappear is disposed. A connecting engagement portion 19 a formed in a ring shape is provided at the tip of the piston rod 19. The connection engagement portion 19 a is configured to be able to engage with the connection portion 155 of the arm portion 152 of the rotation plate 15.

取り付け板16においては、支持プレート14の上面から立設された3本の支持柱18に対応する位置に図示しない3つの貫通孔が形成されている。これらの貫通孔に挿通するボルト21を支持柱18に形成された雌ねじ穴に螺合させることにより、取り付け板16に支持プレート14が固定される。   In the mounting plate 16, three through holes (not shown) are formed at positions corresponding to the three support pillars 18 erected from the upper surface of the support plate 14. The support plate 14 is fixed to the mounting plate 16 by screwing the bolts 21 inserted through these through holes into the female screw holes formed in the support column 18.

また、回動プレート15は、ボルト22をリンク154の貫通孔154a、スペーサ23及び長孔140に挿通し、係合部材130の雌ねじ穴131aに螺合させることで支持プレート14に連結される。この場合、回動プレート15は、枢軸153を中心としてリンク154が回動することにより、支持プレート14に対して所定範囲回動可能な状態で支持プレート14に連結される。   Further, the rotating plate 15 is connected to the support plate 14 by inserting the bolt 22 into the through hole 154 a of the link 154, the spacer 23 and the long hole 140 and screwing into the female screw hole 131 a of the engaging member 130. In this case, the rotation plate 15 is connected to the support plate 14 in a state where the link 154 rotates about the pivot 153 and can rotate within a predetermined range with respect to the support plate 14.

さらに、アーム部152の連結部155をピストンロッド19の連結係合部19aに係合させると、エアシリンダ20によってピストンロッド19が図2に示す矢印A方向に駆動されることにより、回動プレート15が矢印B方向に回動可能となる。そして、回動プレート15が矢印B方向に回動すると、それにともないリンク154が矢印C方向に動くため、リンク154に連結された保持部13が矢印D方向、すなわち支持プレート14の中心に向かう方向に移動する。   Further, when the connecting portion 155 of the arm portion 152 is engaged with the connecting engaging portion 19a of the piston rod 19, the piston rod 19 is driven in the direction of arrow A shown in FIG. 15 can be rotated in the direction of arrow B. When the rotation plate 15 rotates in the direction of arrow B, the link 154 moves in the direction of arrow C accordingly, so that the holding portion 13 connected to the link 154 moves in the direction of arrow D, that is, the direction toward the center of the support plate 14. Move to.

このように、エアシリンダ20及びピストンロッド19並びに回動プレート15は、3つの保持部13(係合部材130)を、支持プレート14の中心方向に移動させる役割を果たす。搬出手段5においては、これらの構成要素によって駆動されて移動する保持部13を円板状ワークWの外周縁に接触させて円板状ワークWを保持するように構成されている。   As described above, the air cylinder 20, the piston rod 19, and the rotation plate 15 serve to move the three holding portions 13 (engagement members 130) in the center direction of the support plate 14. The unloading means 5 is configured to hold the disk-shaped workpiece W by bringing the holding portion 13 driven and moved by these components into contact with the outer peripheral edge of the disk-shaped workpiece W.

次に、本実施の形態に係る研削装置1が備える洗浄手段6の構成について、図3及び図4を参照しながら説明する。図3は、本実施の形態に係る研削装置1が備える洗浄手段6の一例を示す断面模式図である。図4は、本実施の形態に係る研削装置1が備える洗浄手段6の一例を示す平面図である。なお、図3においては、説明の便宜上、それぞれ2つの洗浄部材611、回転防止部材633及び載置台634を示している。また、図4においては、説明の便宜上、円板状ワークWを破線で示すと共に、搬出手段5の保持部13及びピン17を示している。   Next, the configuration of the cleaning means 6 provided in the grinding apparatus 1 according to the present embodiment will be described with reference to FIGS. 3 and 4. FIG. 3 is a schematic cross-sectional view showing an example of the cleaning means 6 provided in the grinding apparatus 1 according to the present embodiment. FIG. 4 is a plan view showing an example of the cleaning means 6 provided in the grinding apparatus 1 according to the present embodiment. In FIG. 3, two cleaning members 611, an anti-rotation member 633, and a mounting table 634 are shown for convenience of explanation. In FIG. 4, for convenience of explanation, the disk-shaped workpiece W is indicated by a broken line, and the holding portion 13 and the pin 17 of the carry-out means 5 are indicated.

洗浄手段6は、図3及び図4に示すように、洗浄プレート61、回転手段62及び回転防止機構63を含んで構成される。洗浄プレート61は、図4に示すように、均等な角度で放射状に少なくとも3方向に延在したプレート部610を有する。これらのプレート部610は、洗浄プレート61の中心を基準に120°間隔で延在して設けられている。これらのプレート部610の先端の上面には、洗浄部材611が装着されている。それぞれの洗浄部材611は、スポンジのような柔軟な部材であり、例えばアイオン株式会社のソフラスという製品を使用することができる。   As shown in FIGS. 3 and 4, the cleaning unit 6 includes a cleaning plate 61, a rotation unit 62, and a rotation prevention mechanism 63. As shown in FIG. 4, the cleaning plate 61 has plate portions 610 that extend radially in equal directions at least in three directions. These plate portions 610 are provided to extend at 120 ° intervals with the center of the cleaning plate 61 as a reference. A cleaning member 611 is mounted on the upper surface of the tip of these plate portions 610. Each cleaning member 611 is a flexible member such as a sponge, and for example, a product called Sofras manufactured by Aion Co., Ltd. can be used.

洗浄プレート61の所定位置には、図示しない洗浄ノズルが設けられている。この洗浄ノズルは、洗浄水供給源に接続され、洗浄部材611による円板状ワークWの被保持面の洗浄中に、被保持面に対して洗浄水を放出する。すなわち、洗浄手段6は、円板状ワークWの被保持面に洗浄水を供給しながら、被保持面を洗浄部材611によって洗浄可能に構成されている。   A cleaning nozzle (not shown) is provided at a predetermined position of the cleaning plate 61. This cleaning nozzle is connected to a cleaning water supply source, and discharges cleaning water to the held surface while the cleaning member 611 is cleaning the held surface of the disk-shaped workpiece W. That is, the cleaning unit 6 is configured to be able to clean the held surface by the cleaning member 611 while supplying cleaning water to the held surface of the disk-shaped workpiece W.

回転手段62は、図3に示すように、洗浄プレート61の中心を回転軸として洗浄プレート61を回転させる。例えば、回転手段62は、洗浄プレート61の中心を通過して鉛直方向に延びる回転軸612を回転させる駆動モータで構成される。回転軸612の軸心は、搬出手段5を構成する保持機構10が保持する円板状ワークWの被保持面に対して垂直となっている。ここで、被保持面は、研削時に図1に示したチャックテーブル2に保持される面である。洗浄部材611は、円板状ワークWの被保持面に接触して回転することにより、被保持面の外周部を洗浄することができる。言い換えると、洗浄部材611は、円板状ワークWの外周部に摺動して被保持面を洗浄する。   As shown in FIG. 3, the rotating means 62 rotates the cleaning plate 61 about the center of the cleaning plate 61 as a rotation axis. For example, the rotation means 62 is configured by a drive motor that rotates a rotation shaft 612 that passes through the center of the cleaning plate 61 and extends in the vertical direction. The axis of the rotation shaft 612 is perpendicular to the surface to be held of the disk-like workpiece W held by the holding mechanism 10 constituting the unloading means 5. Here, the surface to be held is a surface held by the chuck table 2 shown in FIG. 1 during grinding. The cleaning member 611 can clean the outer peripheral portion of the held surface by rotating in contact with the held surface of the disk-shaped workpiece W. In other words, the cleaning member 611 slides on the outer peripheral portion of the disk-shaped workpiece W and cleans the held surface.

回転防止機構63は、図3及び図4に示すように、洗浄プレート61の下方に配置される。回転防止機構63は、洗浄プレート61によって洗浄される円板状ワークWが回転するのを防止する役割を果たす。より具体的には、洗浄プレート61の洗浄部材611と保持機構10(搬出手段5)が保持する円板状ワークWとを当接させ、回転手段62により洗浄部材611を回転させる洗浄動作によって円板状ワークWが回転するのを防止させる。回転防止機構63は、図4に示すように、均等な角度で放射状に少なくとも3方向に延在する回転防止プレート631と、これらの回転防止プレート631の先端部を連結する環状部632とを有する。なお、回転防止プレート631は、回転防止機構63の中心を基準に120°間隔で延在して設けられている。   As shown in FIGS. 3 and 4, the rotation prevention mechanism 63 is disposed below the cleaning plate 61. The rotation prevention mechanism 63 serves to prevent the disk-shaped workpiece W cleaned by the cleaning plate 61 from rotating. More specifically, the cleaning member 611 of the cleaning plate 61 and the disk-like workpiece W held by the holding mechanism 10 (the unloading means 5) are brought into contact with each other, and the cleaning member 611 is rotated by the rotating means 62 to perform a circular operation. The plate-like workpiece W is prevented from rotating. As shown in FIG. 4, the rotation prevention mechanism 63 includes a rotation prevention plate 631 that extends radially at equal angles at least in three directions, and an annular portion 632 that connects the tips of these rotation prevention plates 631. . The anti-rotation plate 631 is provided to extend at 120 ° intervals with the center of the anti-rotation mechanism 63 as a reference.

回転防止プレート630は、洗浄プレート61(より具体的には、プレート部610)と平行に配置される。環状部632に対する回転防止プレート631の連結部分の上面には、3つの回転防止部材633が固着されている。3つの回転防止部材633は、搬出手段5が洗浄手段6の上方に位置する状態において、搬出手段5の3つの保持部13を結ぶ円弧よりも内側位置に配置されている(図4参照)。環状部632は、搬出手段5の保持部13により保持された円板状ワークWの外径よりも外側に配置されている。また、環状部632の所定位置には、ピン17を載置するための3つの載置台634が設けられている。これらの載置台634は、回転防止プレート630の中心を基準に120°間隔で設けられている。   The rotation prevention plate 630 is disposed in parallel with the cleaning plate 61 (more specifically, the plate portion 610). Three anti-rotation members 633 are fixed to the upper surface of the connection portion of the anti-rotation plate 631 to the annular portion 632. The three anti-rotation members 633 are arranged at positions inside the arc connecting the three holding portions 13 of the unloading means 5 in a state where the unloading means 5 is located above the cleaning means 6 (see FIG. 4). The annular portion 632 is disposed outside the outer diameter of the disc-shaped workpiece W held by the holding portion 13 of the carry-out means 5. Further, three mounting tables 634 for mounting the pins 17 are provided at predetermined positions of the annular portion 632. These mounting tables 634 are provided at intervals of 120 ° with reference to the center of the rotation prevention plate 630.

回転防止機構63は、図3に示すように、回転防止プレート631の中心に配置され、洗浄プレート61の回転軸612の周囲に配置された筒状部635を備える。筒状部635の外周側には、回転防止プレート631を昇降させる昇降手段636が設けられている。昇降手段636は、筒状部635の外周部に連結されるピストン636aと、このピストン636aを駆動するシリンダ636bとを含んで構成される。昇降手段636は、回転防止機構63の位置を、洗浄プレート61に対して相対的に上下動させる。   As shown in FIG. 3, the rotation prevention mechanism 63 includes a cylindrical portion 635 that is disposed at the center of the rotation prevention plate 631 and is disposed around the rotation shaft 612 of the cleaning plate 61. On the outer peripheral side of the cylindrical portion 635, lifting means 636 that lifts and lowers the rotation preventing plate 631 is provided. The lifting / lowering means 636 includes a piston 636a connected to the outer peripheral portion of the cylindrical portion 635, and a cylinder 636b that drives the piston 636a. The lifting / lowering means 636 moves the position of the rotation prevention mechanism 63 up and down relatively with respect to the cleaning plate 61.

以下、本実施の形態に係る研削装置1における動作について説明する。本実施の形態に係る研削装置1においては、ロボット40によって第1カセットC1から加工前の円板状ワークWが取り出され、仮置きテーブル41に搬送される。仮置きテーブル41において、円板状ワークWは、所定の位置に位置決めされる。その後、搬入手段43によって搬出入領域42に位置するチャックテーブル2に搬送されて保持される。   Hereinafter, the operation of the grinding apparatus 1 according to the present embodiment will be described. In the grinding apparatus 1 according to the present embodiment, the disk-shaped workpiece W before processing is taken out from the first cassette C1 by the robot 40 and conveyed to the temporary placement table 41. In the temporary placement table 41, the disk-shaped workpiece W is positioned at a predetermined position. Thereafter, it is transported and held by the loading means 43 to the chuck table 2 located in the loading / unloading area 42.

ターンテーブル21が回転することによりチャックテーブル2に保持された円板状ワークWが第1研削手段31、第2研削手段32、研磨手段33の下方に順次移送される。これにより、円板状ワークWの露出面(上面)に対してそれぞれの手段による加工(研削加工、研磨加工)が行われる。研磨手段33による加工が行われた後、ターンテーブル21の回転によって加工後の円板状ワークWが搬出入領域42に移送される。そして、搬出入領域42において、搬出手段5によって加工後の円板状ワークWが保持される。   As the turntable 21 rotates, the disk-shaped workpiece W held on the chuck table 2 is sequentially transferred below the first grinding means 31, the second grinding means 32, and the polishing means 33. Thereby, processing (grinding processing, polishing processing) by each means is performed on the exposed surface (upper surface) of the disk-shaped workpiece W. After the processing by the polishing means 33 is performed, the processed disk-shaped workpiece W is transferred to the carry-in / out area 42 by the rotation of the turntable 21. In the carry-in / out region 42, the processed disk-like workpiece W is held by the carry-out means 5.

搬出手段5を構成する保持機構10においては、3つの保持部13が円板状ワークWの外周縁に接触して保持する(図5参照)。加工後の円板状ワークWが保持機構10によって保持されると、アーム部11のY軸方向の移動及び旋回により、円板状ワークWが、搬出経路に位置する洗浄手段6の直上に移動し停止する。このとき、搬出手段5に保持された円板状ワークWの位置は、その中心が洗浄手段6の回転軸612と一致するワーク洗浄位置となる。   In the holding mechanism 10 constituting the unloading means 5, the three holding portions 13 are held in contact with the outer peripheral edge of the disk-shaped workpiece W (see FIG. 5). When the processed disk-shaped workpiece W is held by the holding mechanism 10, the disk-shaped workpiece W moves immediately above the cleaning means 6 positioned in the carry-out path by the movement and turning of the arm portion 11 in the Y-axis direction. Then stop. At this time, the position of the disc-shaped workpiece W held by the unloading means 5 is a workpiece cleaning position whose center coincides with the rotation shaft 612 of the cleaning means 6.

円板状ワークWがワーク洗浄位置に位置した状態で、移動機構12により保持機構10を下降させることにより、円板状ワークWの下面(被保持面)に洗浄部材611が接触する。図5は、本実施の形態に係る研削装置1の搬出手段5が保持した円板状ワークWと洗浄部材611が接触した状態の断面模式図である。搬出手段5を構成する保持機構10においては、図5に示すように、3つの保持部13が円形板状ワークWの外周縁に接触して保持する。また、図5に示すように、洗浄手段6において、回転防止機構63が初期位置に配置されており、回転防止部材633が円板状ワークWの被保持面から離間している。   With the disc-shaped workpiece W positioned at the workpiece cleaning position, the moving mechanism 12 lowers the holding mechanism 10 to bring the cleaning member 611 into contact with the lower surface (held surface) of the disc-shaped workpiece W. FIG. 5 is a schematic cross-sectional view of the state in which the disc-shaped workpiece W held by the carry-out means 5 of the grinding apparatus 1 according to the present embodiment and the cleaning member 611 are in contact with each other. In the holding mechanism 10 constituting the unloading means 5, the three holding portions 13 are in contact with and hold the outer peripheral edge of the circular plate-like workpiece W as shown in FIG. 5. Further, as shown in FIG. 5, in the cleaning unit 6, the rotation prevention mechanism 63 is disposed at the initial position, and the rotation prevention member 633 is separated from the held surface of the disk-shaped workpiece W.

洗浄手段6において、回転防止機構63の昇降手段636が回転防止プレート631を上昇させることにより、回転防止部材633が円板状ワークWの被保持面に接触する。図6は、本実施の形態に係る研削装置1の搬出手段5が保持した円板状ワークWに回転防止部材633が接触した状態の断面模式図である。回転防止部材633が円板状ワークWの被保持面に接触した状態において、回転防止部材633の上面は、洗浄部材611の上面と略同一の高さに位置付けられる。より具体的には、円板状ワークWの被保持面に接触した状態において、回転防止部材633の上面は、洗浄部材611の上面よりも0.5mmほど高い位置に配置される。これにより、回転防止部材633は、洗浄部材611よりも強く円板状ワークWの被保持面を押圧する。このようにして、回転防止部材633が円板状ワークWの回転を阻止する。   In the cleaning means 6, the lifting / lowering means 636 of the rotation prevention mechanism 63 raises the rotation prevention plate 631, so that the rotation prevention member 633 comes into contact with the held surface of the disk-shaped workpiece W. FIG. 6 is a schematic cross-sectional view of a state in which the rotation preventing member 633 is in contact with the disk-shaped workpiece W held by the carry-out means 5 of the grinding apparatus 1 according to the present embodiment. In a state where the rotation preventing member 633 is in contact with the held surface of the disk-shaped workpiece W, the upper surface of the rotation preventing member 633 is positioned at substantially the same height as the upper surface of the cleaning member 611. More specifically, the upper surface of the rotation preventing member 633 is arranged at a position higher by about 0.5 mm than the upper surface of the cleaning member 611 in a state where it contacts the held surface of the disk-shaped workpiece W. Thereby, the rotation preventing member 633 presses the held surface of the disk-shaped workpiece W more strongly than the cleaning member 611. In this way, the rotation prevention member 633 prevents the rotation of the disk-shaped workpiece W.

上述したようにピン17の下端部は、保持部13の下端よりも下方側に突出している。このため、回転防止プレート631を上昇させると、図6に示すように、ピン17が環状部632に設けられた載置台634に載置される。この場合、搬出手段5及び洗浄手段6においては、3本のピン17の共通位置(例えば、下端部)を結んだ三角形からなる面P1(図6に示す一点鎖線で示される面P1)と、3つの洗浄部材611の共通位置(例えば、上面部)を結んだ三角形からなる面P2(図6に示す一点鎖線で示される面P2)とが平行に配置される。そして、これらの面P1と面P2とが平行に配置される結果、円板状ワークWの被保持面と、3つの洗浄部材611の共通位置を結んだ三角形からなる面P2とが平行に配置されると共に、洗浄部材611が円板状ワークWの洗浄に適した高さに位置付けられる。   As described above, the lower end portion of the pin 17 projects downward from the lower end of the holding portion 13. For this reason, when the rotation prevention plate 631 is raised, the pin 17 is placed on the placing table 634 provided in the annular portion 632 as shown in FIG. In this case, in the unloading means 5 and the cleaning means 6, a surface P1 (a surface P1 indicated by a one-dot chain line shown in FIG. 6) formed of a triangle connecting the common positions (for example, lower end portions) of the three pins 17; A plane P2 made of a triangle connecting the common positions (for example, the upper surface portion) of the three cleaning members 611 (a plane P2 indicated by a one-dot chain line shown in FIG. 6) is arranged in parallel. And as a result of arrange | positioning these surfaces P1 and P2 in parallel, the to-be-held surface of the disk-shaped workpiece | work W and the surface P2 which consists of a triangle which connected the common position of the three washing | cleaning members 611 are arrange | positioned in parallel. At the same time, the cleaning member 611 is positioned at a height suitable for cleaning the disk-shaped workpiece W.

このようにして、円板状ワークWの回転を防止すべく、回転防止プレート631を上昇させると、ピン17が載置台634に載置されることによって支持プレート14と回転防止機構63とが一定の位置関係を有した状態で配置される。これにより、これらを構成部品として含む搬出手段5と洗浄手段6との相対位置関係が高精度に維持される。   In this way, when the rotation prevention plate 631 is raised to prevent the rotation of the disk-shaped workpiece W, the support plate 14 and the rotation prevention mechanism 63 are fixed by placing the pins 17 on the mounting table 634. It is arrange | positioned in the state which had this positional relationship. As a result, the relative positional relationship between the unloading means 5 and the cleaning means 6 including these as components is maintained with high accuracy.

仮に、図7に示すように、搬送手段5(保持機構10)が洗浄手段6に対して傾いた状態で搬送されているものとする。図7においては、洗浄手段6の回転軸612の軸中心を通過する直線L1と、搬送手段5(保持機構10)の中心を通過する直線L2とが角度θだけ傾いている場合について示している。   It is assumed that the transport unit 5 (holding mechanism 10) is transported in an inclined state with respect to the cleaning unit 6, as shown in FIG. FIG. 7 shows a case where a straight line L1 passing through the center of the rotation shaft 612 of the cleaning means 6 and a straight line L2 passing through the center of the transport means 5 (holding mechanism 10) are inclined by an angle θ. .

このように搬送手段5(保持機構10)の傾きと、洗浄手段6の傾きとが一致しない場合においても、移動機構12により保持機構10を下降させると共に、昇降手段636で回転防止プレート631を上昇させると、3つのピン17が載置台634に載置される。この場合、3つのピン17は、最も下方側に配置されるピン17(図7においては、右方側のピン17)から載置台634に接触していく。そして、既に接触したピン17は、最も上方側に配置されるピン17(図7においては、左方側のピン17)が接触するまで回転防止プレート631(載置台634)により押し上げられる。   Thus, even when the inclination of the conveying means 5 (holding mechanism 10) and the inclination of the cleaning means 6 do not coincide with each other, the holding mechanism 10 is lowered by the moving mechanism 12 and the rotation preventing plate 631 is raised by the elevating means 636. Then, the three pins 17 are mounted on the mounting table 634. In this case, the three pins 17 come into contact with the mounting table 634 from the pin 17 arranged on the lowermost side (the pin 17 on the right side in FIG. 7). The pin 17 already in contact is pushed up by the anti-rotation plate 631 (mounting table 634) until the pin 17 arranged on the uppermost side (the pin 17 on the left side in FIG. 7) comes into contact.

押し上げられたピン17に対応する支持プレート14の部分は、リンク154、アーム部152及び回動プレート15を介して上方側に移動する。このような支持プレート14の上方移動は、支持柱18に挿嵌されたコイルバネ180により吸収される。このように支持プレート14が情報移動する過程において、図8に示すように、搬送手段5(保持機構10)と洗浄手段6との傾き量の差(θ)が補正される。この結果、搬送手段5(保持機構10)と洗浄手段6とが平行に配置される。   The portion of the support plate 14 corresponding to the pushed up pin 17 moves upward via the link 154, the arm portion 152, and the rotating plate 15. Such upward movement of the support plate 14 is absorbed by the coil spring 180 inserted into the support column 18. Thus, in the process of the information movement of the support plate 14, as shown in FIG. 8, the difference (θ) in the tilt amount between the transport unit 5 (holding mechanism 10) and the cleaning unit 6 is corrected. As a result, the conveying means 5 (holding mechanism 10) and the cleaning means 6 are arranged in parallel.

また、図6に示すように、洗浄部材611及び回転防止部材633を円板状ワークWの被保持面に接触させた状態においては、洗浄部材611と回転防止部材633とが重ならない位置に配置されている。そして、図9Aに示すように、回転手段62の駆動により洗浄プレート61を矢印P方向に回転させる。具体的には、洗浄プレート61は、1つの洗浄部材611が2つの回転防止部材633に衝突しない範囲で回転させてから停止させる。   Further, as shown in FIG. 6, when the cleaning member 611 and the rotation prevention member 633 are in contact with the held surface of the disk-shaped workpiece W, the cleaning member 611 and the rotation prevention member 633 are arranged at positions where they do not overlap. Has been. Then, as shown in FIG. 9A, the cleaning plate 61 is rotated in the direction of arrow P by driving the rotating means 62. Specifically, the cleaning plate 61 is stopped after rotating in a range where one cleaning member 611 does not collide with the two rotation preventing members 633.

このように洗浄部材611が円板状ワークWの被保持面に接触した状態で回転することにより、図10Aに示すように、被保持面の外周部のうち、回転防止部材633が接触している箇所以外の部分である第1領域100が洗浄される。洗浄中は、回転手段62が洗浄部材611を回転させることによって円板状ワークWが回転するのを回転防止機構63が防止するため、洗浄を確実に行うことができる。この段階では、隣り合う第1領域100間に、未洗浄領域である第2領域101が残されている。なお、図10においては、洗浄済みの領域を斜線部で示している。   By rotating the cleaning member 611 in contact with the held surface of the disk-shaped workpiece W as described above, the rotation preventing member 633 comes into contact with the outer peripheral portion of the held surface as shown in FIG. 10A. The first region 100, which is a portion other than the portion where it is, is cleaned. During cleaning, the rotation preventing mechanism 63 prevents the disk-like workpiece W from rotating by rotating the cleaning member 611 by the rotating means 62, so that cleaning can be performed reliably. At this stage, the second region 101 that is an uncleaned region is left between the adjacent first regions 100. In FIG. 10, the cleaned region is indicated by a hatched portion.

次に、回転防止プレート631を下降させることにより回転防止部材633と円板状ワークWの被保持面との接触状態を解除した後、図9Bに示すように、洗浄プレート61を矢印Q方向に回転させる。この場合、円板状ワークWの被保持面が回転防止部材633と接触していないため、洗浄部材611と一緒に円板状ワークWも矢印Q方向に回転する。これにより、図10Bに示すように、円板状ワークWの被保持面のうち回転防止部材633が接触していた部分である未洗浄の第2領域101が露出する。   Next, after the anti-rotation plate 631 is lowered to release the contact state between the anti-rotation member 633 and the held surface of the disk-shaped workpiece W, the cleaning plate 61 is moved in the direction of the arrow Q as shown in FIG. 9B. Rotate. In this case, since the held surface of the disk-shaped workpiece W is not in contact with the rotation preventing member 633, the disk-shaped workpiece W also rotates in the direction of the arrow Q together with the cleaning member 611. As a result, as shown in FIG. 10B, the uncleaned second region 101, which is the portion of the surface to be held of the disk-shaped workpiece W where the rotation preventing member 633 is in contact, is exposed.

このようにして第2領域101が露出した後、再び回転防止部材633を上昇させて円板状ワークWの被保持面に接触させ、図9Cに示すように、洗浄部材611の矢印R方向の回転動作によって第2領域101を洗浄する。これにより、図10Cに示すように、第2領域101にも洗浄部材611が接触して洗浄され、外周部が全周にわたって洗浄される。なお、2回目の洗浄を行う場合は、回転防止部材633が接触していた第3領域102が未洗浄となっているため、第3領域102が露出するようにしてから洗浄を行えばよい。   After the second region 101 is exposed in this way, the anti-rotation member 633 is again raised and brought into contact with the held surface of the disk-shaped workpiece W, and as shown in FIG. 9C, the cleaning member 611 is moved in the direction of the arrow R. The second region 101 is cleaned by the rotation operation. As a result, as shown in FIG. 10C, the cleaning member 611 also comes into contact with the second region 101 and is cleaned, and the outer peripheral portion is cleaned over the entire circumference. When performing the second cleaning, since the third region 102 with which the rotation preventing member 633 is in contact is not cleaned, the cleaning may be performed after the third region 102 is exposed.

以上説明したように、本実施の形態に係る研削装置1においては、搬出手段5を構成する保持機構10に設けられた3つのピン17を、洗浄手段6を構成する回転防止機構63に設けられた載置台634に載置させ、これらのピン17の共通位置を結んだ三角形からなる面P1と、洗浄手段6を構成する洗浄プレート61に設けられた洗浄部材611の共通位置を結んだ三角形からなる面P2とを平行に配置している。したがって、搬出手段5及び洗浄手段6を個別に位置決めするような構成等を備えることなく両者の相対位置を決定できる。これにより、複雑な構成を必要とすることなく、円板状ワークWを搬出する搬出手段5と円板状ワークWの被保持面を洗浄する洗浄手段6との相対位置関係を高精度に維持することが可能となる。この結果、搬出手段5が保持する円板状ワークWの被保持面と洗浄手段6の洗浄部材611の上面とを平行に位置付けることができ、円板状ワークWの被保持面に洗浄斑を生じることなく洗浄することが可能となる。   As described above, in the grinding apparatus 1 according to the present embodiment, the three pins 17 provided on the holding mechanism 10 constituting the carry-out means 5 are provided on the rotation prevention mechanism 63 constituting the cleaning means 6. From the triangle that connects the common position of the cleaning member 611 provided on the cleaning plate 61 constituting the cleaning means 6 and the surface P1 that is mounted on the mounting table 634 and connects the common positions of these pins 17. The plane P2 is arranged in parallel. Accordingly, the relative positions of the unloading means 5 and the cleaning means 6 can be determined without providing a configuration for individually positioning the unloading means 5 and the cleaning means 6. Accordingly, the relative positional relationship between the unloading means 5 for unloading the disk-shaped workpiece W and the cleaning means 6 for cleaning the held surface of the disk-shaped workpiece W is maintained with high accuracy without requiring a complicated configuration. It becomes possible to do. As a result, the held surface of the disk-shaped workpiece W held by the unloading means 5 and the upper surface of the cleaning member 611 of the cleaning means 6 can be positioned in parallel, and cleaning spots are formed on the held surface of the disk-shaped workpiece W. It becomes possible to wash without occurring.

なお、以上の説明では、洗浄手段6の昇降手段636により回転防止プレート631を上昇させることで保持機構10に設けられた3つのピン17を、回転防止機構63に設けられた載置台634に載置させる場合について説明している。しかしながら、載置台634にピン17を載置させる際の動作についてはこれに限定されるものではない。予め回転防止部材633の上面が洗浄部材611の上面よりも僅かに上方側に位置するように配置しておき、移動機構12による保持機構10の下降動作に応じて載置台634にピン17を載置させるようにしてもよい。この場合には、保持機構10を下降させて載置台634に3つのピン17を載置させるだけで、保持機構10のピン17を結んだ三角形からなる面P1と、洗浄手段6の洗浄部材611を結んだ三角形からなる面P2とを平行に配置できる。これにより、複雑な構成を必要とすることなく、円板状ワークWを搬出する搬出手段5と円板状ワークWの被保持面を洗浄する洗浄手段6との相対位置関係を高精度に維持することが可能となる。なお、この場合、回転防止機構63の昇降手段636は、洗浄プレート61によって円板状ワークWを回転させる際に回転防止プレート631を下降させる役割を果たす。   In the above description, the three pins 17 provided in the holding mechanism 10 by raising the rotation prevention plate 631 by the lifting / lowering means 636 of the cleaning means 6 are mounted on the mounting table 634 provided in the rotation prevention mechanism 63. The case where it is placed is explained. However, the operation when placing the pins 17 on the placing table 634 is not limited to this. The rotation preventing member 633 is disposed in advance so that the upper surface of the rotation preventing member 633 is slightly above the upper surface of the cleaning member 611, and the pin 17 is mounted on the mounting table 634 according to the lowering operation of the holding mechanism 10 by the moving mechanism 12. You may make it place. In this case, by simply lowering the holding mechanism 10 and placing the three pins 17 on the mounting table 634, the triangular surface P <b> 1 connecting the pins 17 of the holding mechanism 10 and the cleaning member 611 of the cleaning unit 6. Can be arranged in parallel with a plane P2 made of a triangle connecting the two. Accordingly, the relative positional relationship between the unloading means 5 for unloading the disk-shaped workpiece W and the cleaning means 6 for cleaning the held surface of the disk-shaped workpiece W is maintained with high accuracy without requiring a complicated configuration. It becomes possible to do. In this case, the lifting / lowering means 636 of the rotation prevention mechanism 63 plays a role of lowering the rotation prevention plate 631 when the disc-like workpiece W is rotated by the cleaning plate 61.

なお、本発明は上記実施の形態に限定されず、種々変更して実施することが可能である。上記実施の形態において、添付図面に図示されている大きさや形状などについては、これに限定されず、本発明の効果を発揮する範囲内で適宜変更することが可能である。その他、本発明の目的の範囲を逸脱しない限りにおいて適宜変更して実施することが可能である。   In addition, this invention is not limited to the said embodiment, It can change and implement variously. In the above-described embodiment, the size, shape, and the like illustrated in the accompanying drawings are not limited to this, and can be appropriately changed within a range in which the effect of the present invention is exhibited. In addition, various modifications can be made without departing from the scope of the object of the present invention.

例えば、上記実施の形態の洗浄手段6においては、回転防止機構63を構成する環状部632に載置台634を設け、この載置台634に搬出手段5を構成する保持機構10に設けられた3つのピン17を載置させる構成について説明している。しかしながら、回転防止機構63に設けられる載置台634の構成及びこの載置台634に載置させる保持機構10の構成については、これに限定されるものではなく適宜変更が可能である。   For example, in the cleaning means 6 of the above-described embodiment, the mounting table 634 is provided in the annular portion 632 that constitutes the rotation prevention mechanism 63, and the three holding mechanisms 10 that constitute the carry-out means 5 are provided on this mounting table 634. A configuration for placing the pins 17 is described. However, the configuration of the mounting table 634 provided in the rotation prevention mechanism 63 and the configuration of the holding mechanism 10 to be mounted on the mounting table 634 are not limited to this, and can be appropriately changed.

以下、本実施の形態に係る研削装置1の洗浄手段6の他の例について図11及び図12を参照しながら説明する。図11は、本実施の形態に係る研削装置1の洗浄手段6の他の例を示す平面図である。図12は、図11に示す洗浄手段6を構成する回転防止部材633が、搬出手段5が保持した円板状ワークWに接触した状態の断面模式図である。図11及び図12において、上記実施の形態と共通の構成要素については、同一の符号を付与し説明を省略する。なお、図11においては、説明の便宜上、円板状ワークWを破線で示すと共に、搬出手段5の保持部13及びピン17を示している。また、図12においては、説明の便宜上、それぞれ2つの洗浄部材611、回転防止部材633及び載置台634aを示している。   Hereinafter, another example of the cleaning means 6 of the grinding apparatus 1 according to the present embodiment will be described with reference to FIGS. 11 and 12. FIG. 11 is a plan view showing another example of the cleaning means 6 of the grinding apparatus 1 according to the present embodiment. FIG. 12 is a schematic cross-sectional view of a state in which the rotation preventing member 633 constituting the cleaning unit 6 shown in FIG. 11 is in contact with the disk-shaped workpiece W held by the carry-out unit 5. In FIG. 11 and FIG. 12, the same reference numerals are given to the same components as those in the above embodiment, and the description is omitted. In FIG. 11, for convenience of explanation, the disk-shaped workpiece W is indicated by a broken line, and the holding portion 13 and the pin 17 of the carry-out means 5 are indicated. In FIG. 12, for convenience of explanation, two cleaning members 611, a rotation preventing member 633, and a mounting table 634a are shown.

図11に示す洗浄手段6においては、回転防止プレート631の先端部を外側に延長して3つの載置台634aが設けられる点において、上記実施の形態と相違する。これらの載置台634aは、上記実施の形態と異なり、ピン17ではなく保持部13を載置するために設けられている。   The cleaning means 6 shown in FIG. 11 is different from the above-described embodiment in that three mounting tables 634a are provided by extending the distal end portion of the rotation prevention plate 631 outward. Unlike the above-described embodiment, these mounting bases 634a are provided for mounting the holding portion 13 instead of the pins 17.

上記実施の形態と同様に、図11に示す洗浄手段6においても、回転防止機構63の昇降手段636が回転防止プレート631を上昇させることにより、回転防止部材633が円板状ワークWの被保持面に接触する。このとき、回転防止部材633の上面は、洗浄部材611の上面と略同一の高さに位置付けられる。より具体的には、円板状ワークWの被保持面に接触した状態において、回転防止部材633の上面は、洗浄部材611の上面よりも0.5mmほど高い位置に配置される。これにより、回転防止部材633は、洗浄部材611よりも強く円板状ワークWの被保持面を押圧する。このようにして、回転防止部材633が円板状ワークWの回転を阻止する。   Similarly to the above embodiment, in the cleaning means 6 shown in FIG. 11, the anti-rotation member 633 holds the disc-shaped workpiece W by the elevating means 636 of the anti-rotation mechanism 63 ascending the anti-rotation plate 631. Touch the surface. At this time, the upper surface of the rotation preventing member 633 is positioned at substantially the same height as the upper surface of the cleaning member 611. More specifically, the upper surface of the rotation preventing member 633 is arranged at a position higher by about 0.5 mm than the upper surface of the cleaning member 611 in a state where it contacts the held surface of the disk-shaped workpiece W. Thereby, the rotation preventing member 633 presses the held surface of the disk-shaped workpiece W more strongly than the cleaning member 611. In this way, the rotation prevention member 633 prevents the rotation of the disk-shaped workpiece W.

図11に示す洗浄手段6においては、回転防止プレート631を上昇させると、図12に示すように、保持部13が回転防止プレート631の先端に設けられた載置台634aに載置される。この場合、搬出手段5及び洗浄手段6においては、保持部13の共通位置(例えば、下端部)を結んだ三角形からなる面P3(図12に示す一点鎖線で示される面P3)と、3つの洗浄部材611の共通位置(例えば、上面部)を結んだ三角形からなる面P4(図12に示す一点鎖線で示される面P4)とが平行に配置される。   In the cleaning means 6 shown in FIG. 11, when the rotation prevention plate 631 is raised, the holding portion 13 is placed on a placement table 634 a provided at the tip of the rotation prevention plate 631 as shown in FIG. 12. In this case, in the unloading means 5 and the cleaning means 6, a surface P3 (surface P3 indicated by a one-dot chain line shown in FIG. 12) connecting the common position (for example, the lower end portion) of the holding portion 13 and three A plane P4 made of a triangle connecting the common positions (for example, the upper surface portion) of the cleaning member 611 (a plane P4 indicated by a one-dot chain line shown in FIG. 12) is arranged in parallel.

このようにして、図11に示す洗浄手段6においても、円板状ワークWの回転を防止すべく、回転防止プレート631を上昇させると、保持部13が載置台634に載置されることによって支持プレート14と回転防止機構63とが一定の位置関係を有した状態で配置される。これにより、搬出手段5及び洗浄手段6を個別に位置決めするような構成等を備えることなく両者の相対位置を決定できる。この結果、複雑な構成を必要とすることなく、円板状ワークWを搬出する搬出手段5と円板状ワークWの被保持面を洗浄する洗浄手段6との相対位置関係を高精度に維持することが可能となる。   In this way, also in the cleaning means 6 shown in FIG. 11, when the rotation prevention plate 631 is raised to prevent the rotation of the disk-shaped workpiece W, the holding unit 13 is mounted on the mounting table 634. The support plate 14 and the rotation prevention mechanism 63 are arranged with a certain positional relationship. Thereby, the relative position of both can be determined without providing the structure etc. which position the carrying-out means 5 and the washing | cleaning means 6 separately. As a result, the relative positional relationship between the unloading means 5 for unloading the disk-shaped workpiece W and the cleaning means 6 for cleaning the surface to be held of the disk-shaped workpiece W is maintained with high accuracy without requiring a complicated configuration. It becomes possible to do.

また、支持プレート14から下方側に延びる長さを、保持部13及びピン17で共通の長さとし、上記実施の形態に係る回転防止機構63の環状部632に保持部13及びピン17の双方を載置するようにしてもよい。   Further, the length extending downward from the support plate 14 is a length common to the holding portion 13 and the pin 17, and both the holding portion 13 and the pin 17 are attached to the annular portion 632 of the rotation prevention mechanism 63 according to the above embodiment. You may make it mount.

以上説明したように、本発明によれば、複雑な構成を必要とすることなく、円板状ワークWを搬出する搬出手段5と円板状ワークWの被保持面を洗浄する洗浄手段6との相対位置関係を高精度に維持することができるという効果を有し、特に、大口径を有する円板状ワークWの被保持面を洗浄する機能を有する研削装置に有用である。   As described above, according to the present invention, the unloading means 5 for unloading the disk-shaped workpiece W and the cleaning means 6 for cleaning the held surface of the disk-shaped workpiece W without requiring a complicated configuration. The relative positional relationship can be maintained with high accuracy, and is particularly useful for a grinding apparatus having a function of cleaning a held surface of a disk-shaped workpiece W having a large diameter.

W 円板状ワーク
2 チャックテーブル
31 第1研削手段
32 第2研削手段
5 搬出手段
6 洗浄手段
61 洗浄プレート
610 プレート部
611 洗浄部材
612 回転軸
62 回転手段
63 回転防止機構
631 回転防止プレート
632 環状部
633 回転防止部材
634、634a 載置台
635 筒状部
636 昇降手段
636a ピストン
636b シリンダ
7 洗浄乾燥手段
10 外周縁保持機構(保持機構)
11 アーム部
12 移動機構
13 保持部
14 支持プレート
17 ピン
W disk work 2 chuck table 31 first grinding means 32 second grinding means 5 carry-out means 6 cleaning means 61 cleaning plate 610 plate portion 611 cleaning member 612 rotating shaft 62 rotating means 63 anti-rotation mechanism 631 anti-rotation plate 632 annular portion 633 Anti-rotation member 634, 634a Mounting table 635 Cylindrical portion 636 Lifting means 636a Piston 636b Cylinder 7 Washing and drying means 10 Outer peripheral edge holding mechanism (holding mechanism)
11 Arm part 12 Movement mechanism 13 Holding part 14 Support plate 17 Pin

Claims (2)

円板状ワークを吸引保持する保持面を有するチャックテーブルと、該チャックテーブルに吸引保持された円板状ワークを研削加工する研削手段と、円板状ワークの外周縁を保持する外周縁保持機構及び該外周縁保持機構を該チャックテーブルに接近/離反させる移動機構で少なくとも構成し該チャックテーブルから円板状ワークを搬出する搬出手段と、該搬出手段が該チャックテーブルから円板状ワークを搬出する搬出経路に配設され円板状ワークの被保持面に洗浄水を供給しながら洗浄する洗浄手段と、を備えた研削装置において、
該外周縁保持機構は、均等な角度で少なくとも3つ配設され放射方向に移動する保持部と、該保持部の下端より下方側に突出して均等な間隔で少なくとも3つ配設されるピンと、を少なくとも備え、
該洗浄手段は、均等な角度で放射状に少なくとも3方向に延在したプレートの先端に円板状ワークの外周部に摺動して洗浄する洗浄部材を装着した洗浄プレートと、該洗浄プレートの中心を回転軸として該洗浄プレートを回転させる回転手段と、該洗浄部材と該搬出手段が保持する円板状ワークとを当接させ該回転手段により該洗浄部材を回転させる洗浄動作によって円板状ワークが回転するのを防止させる回転防止機構と、を少なくとも備え、
該回転防止機構は、該洗浄プレートと平行で少なくとも3つの回転防止部材を装着する回転防止プレートと、該回転防止プレートに円板状ワークの外径より外側に配設される載置台と、で少なくとも構成され、
該移動機構を用いて該外周縁保持機構を下降させ該載置台に該少なくとも3つの該ピンを載置させ、該外周縁保持機構の該少なくとも3つの該ピンの共通位置を結んだ三角形からなる面と、該洗浄手段の該少なくとも3つの洗浄部材の共通位置を結んだ三角形からなる面とが平行になることを特徴とする研削装置。
A chuck table having a holding surface for sucking and holding a disk-shaped work, a grinding means for grinding the disk-shaped work sucked and held by the chuck table, and an outer peripheral edge holding mechanism for holding the outer peripheral edge of the disk-shaped work And at least a moving mechanism for moving the outer peripheral edge holding mechanism toward / separates from the chuck table, and unloading means for unloading the disk-shaped work from the chuck table; and the unloading means unloads the disk-shaped work from the chuck table. In a grinding device provided with a cleaning means that is disposed in the carry-out path and performs cleaning while supplying cleaning water to the held surface of the disk-shaped workpiece,
The outer peripheral edge holding mechanism includes at least three holding portions arranged at an equal angle and moving in a radial direction; and pins arranged at an equal interval protruding downward from the lower end of the holding portion; Comprising at least
The cleaning means includes a cleaning plate having a cleaning member attached to a front end of a plate radially extending in at least three directions at an equal angle and mounted on the outer peripheral portion of the disk-shaped workpiece for cleaning, and a center of the cleaning plate A disk-shaped workpiece by a cleaning operation in which the rotating member that rotates the cleaning plate with the rotating shaft as a rotation axis, and the disk-shaped workpiece held by the cleaning member and the carry-out means are brought into contact with each other to rotate the cleaning member An anti-rotation mechanism that prevents the rotation of
The anti-rotation mechanism includes: an anti-rotation plate that is mounted with at least three anti-rotation members parallel to the cleaning plate; and a mounting table that is disposed on the anti-rotation plate outside the outer diameter of the disk-shaped workpiece. At least composed,
The outer peripheral edge holding mechanism is lowered using the moving mechanism, the at least three pins are placed on the mounting table, and the outer peripheral edge holding mechanism is composed of a triangle connecting the common positions of the at least three pins. A grinding apparatus, wherein a surface and a surface made of a triangle connecting the common positions of the at least three cleaning members of the cleaning means are parallel to each other.
該洗浄手段は、該回転防止プレートを昇降させる昇降手段を含み、
該昇降手段で該回転防止部材の上面が該洗浄部材の上面と略同一高さに位置付けられた該回転防止プレートの該載置台に該外周縁保持機構の該保持部を載置させ、該少なくとも3つの該保持部の共通位置を結んだ三角形からなる面と該少なくとも3つの洗浄部材の共通位置を結んだ三角形からなる面とが平行になることを特徴とする請求項1記載の研削装置。
The cleaning means includes elevating means for elevating and lowering the rotation prevention plate,
Upper surface of the rotation preventing member elevating means is placed on the holding portion of the cleaning member of the upper surface and substantially the same height located was the anti-rotation plate mounting table in the outer periphery holding mechanism, said at least 2. The grinding apparatus according to claim 1, wherein a surface made of a triangle connecting the common positions of the three holding portions is parallel to a surface made of a triangle connecting the common positions of the at least three cleaning members.
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