JP6214251B2 - Inspection point setting device and program - Google Patents

Description

  The present invention relates to an inspection point setting device and a program for setting an inspection point at a position suitable for a disconnection inspection for a conductor pattern based on conductor pattern data indicating a conductor pattern of a substrate and resist data indicating a resist. .

  In order to inspect the quality of the conductor pattern formed on the printed circuit board, a disconnection inspection of the conductor pattern is performed. In the disconnection inspection of the conductor pattern, the board inspection device moves the pair of probes to contact a pair of inspection points set in advance on the conductor pattern, measures the resistance value, and the resistance value exceeds a predetermined threshold value. It is determined that the conductor pattern is disconnected (defective), and if the resistance value is equal to or less than a predetermined threshold, it is determined that the conductor pattern is conductive (good). For example, Patent Document 1 describes an inspection system that receives CAD data including the position of an XY coordinate of an inspection point and performs an inspection by bringing a probe into contact with the inspection point.

JP-A-2005-191300

  As described in Patent Document 1, if the inspection point is included in the CAD data, it is not necessary to set the inspection point from the beginning. If the CAD data does not include an inspection point or if it cannot be used as it is, it is necessary to set the inspection point at an appropriate position on the substrate.

  When the inspection point needs to be set, the inspection point is set at a position where the probe can contact the conductor pattern, such as a component mounting land (pad) or a through hole formed on the substrate. In the disconnection inspection, even if lands and through holes are provided in the middle of the conductor pattern, it is preferable to set inspection points for the lands and through holes provided at both ends of the conductor pattern. By setting inspection points at both ends of a series of conductor patterns, it is possible to inspect the presence or absence of disconnection of the entire conductor pattern by a single measurement. If an inspection point is set at a land or the like in the middle of the conductor pattern, the conductor pattern is inspected for each part, and a plurality of measurements are required for the inspection of the entire conductor pattern. For this reason, in order to set the inspection point, it is necessary to identify a land or a through hole located at the end of the conductor pattern.

  For example, as shown in FIG. 14A, when the lands 66, 67, and 68 are conductor patterns 65 connected by a line pattern 69 that is thinner than the lands 66, 67, and 68, the lands 66, 67, and 68 are resist openings 76, It is possible to identify the lands 66 and 68 at the end using the two characteristics that the lands 66 and 67 and 68 are connected by a thin line pattern 69. Conceivable. Specifically, the resist openings 76 and 78 to which one (from one direction) line-like pattern 69 is connected are discriminated as end portions, and inspection points are set on the lands 66 and 68, and two or more patterns are formed. It is only necessary to determine that the resist opening 77 connected to is not an end and not set an inspection point on the land 67.

  However, in the above method, when the width of the conductor pattern 60 is wider than the resist openings 71, 72, 73 as in the conductor pattern 60 shown in FIG. 2, the resist openings 71, 72, 73 are conductors. Since the pattern 60 is solid, it is difficult to determine the number of patterns connected to the resist openings 71, 72, 73, and it is difficult to extract the lands 61, 63 at the ends of the conductor pattern 60. Further, for example, when a wide conductor pattern is expressed in the Gerber data format, the conductor pattern 60 is expressed so as to be filled with a large number of thin line patterns 100 as shown in FIG. ), The conductor pattern 60 may be expressed by area designation with a polygon 110 (polygon). For this reason, it is more difficult to discriminate the number of patterns connected to the resist openings 71, 72, 73, and it is difficult to extract lands and the like at the ends of the conductor pattern 60 by the above method.

  The present invention has been made to solve the above-described problems, and sets inspection points at lands and through holes located at the end of the conductor pattern regardless of the width of the conductor pattern and the representation format of the conductor pattern data. An object of the present invention is to provide an inspection point setting device and a program that can be used.

  The inspection point setting apparatus according to claim 1, which has been made to achieve the above object, includes conductor pattern data indicating a conductor pattern of a substrate to be inspected and resist data indicating a resist. An inspection point setting device for setting an inspection point for the conductor pattern, the data reading means for reading the conductor pattern data and the resist data, and the contour of the conductor pattern based on the conductor pattern data Contour extracting means for extracting the resist opening point, resist opening point setting means for setting a resist opening point, which is a point included in the resist opening based on the resist data, for each of the resist openings, and the resist Radial lines for setting a virtual radial line radiating from the opening point for each resist opening point A pair of opposing lines that are in a reverse opposing relationship from the radial lines based on the lengths, and calculating each length of the radial lines from the resist opening point to the contour of the conductor pattern. In the path connecting the pair of opposing lines of the resist opening point of interest along the contour of the conductor pattern and the opposing line selecting means for selecting each resist opening point Inspection point setting processing means for setting the inspection point in a conductor pattern in the resist opening corresponding to the focused resist opening point when there is a path where the opposing line does not exist generated from a point; Is provided.

  An inspection point setting apparatus according to claim 2 is the apparatus according to claim 1, wherein the resist opening point setting means sets the resist opening point at a central portion of the resist opening. To do.

  An inspection point setting device according to a third aspect is the one according to the first or second aspect, wherein the opposing line selecting means has a shortest length to the contour of the conductor pattern in the radial line. And the radial lines that are opposed to the shortest radial line are selected as the pair of opposed lines.

  An inspection point setting device according to a fourth aspect is the one according to the first or second aspect, wherein the opposing line selection means adds a length to the contour of the conductor pattern in the radial line. The set of the radial lines that are shortest and are in an opposing relationship when combined are selected as the pair of opposing lines.

  The program according to claim 5 is a program for setting an inspection point for the conductor pattern based on conductor pattern data indicating a conductor pattern of a substrate to be inspected and resist data indicating a resist. A computer for reading the conductor pattern data and the resist data; a contour extracting unit for extracting a contour of the conductor pattern based on the conductor pattern data; and a resist opening based on the resist data. A resist opening point setting means for setting a resist opening point, which is a point included in each of the resist opening portions, and a virtual radial line radiating from the resist opening point for each of the resist opening points. Radial line setting means for setting, and the conductor pattern from the resist opening point Calculate the length of each of the radial lines to the contour, and based on this length, select a pair of opposing lines in opposite relations from the radial lines for each resist opening point In the path connecting the pair of opposing lines of the resist opening point of interest along the contour of the conductor pattern with the means, the path in which the opposing line generated from the other resist opening point does not exist When there is an inspection point, it is operated as inspection point setting processing means for setting the inspection point to the conductor pattern in the resist opening corresponding to the focused resist opening point.

  A program according to a sixth aspect is the one according to the fifth aspect, wherein the resist opening point setting means sets the resist opening point at a central portion of the resist opening.

  The program according to claim 7 is the program according to claim 5 or 6, wherein the opposed line selection unit is configured to make the radial line having the shortest length to the contour of the conductor pattern in the radial line. The line and the radial line facing the shortest radial line are selected as the pair of opposed lines.

  The program according to claim 8 is the program according to claim 5 or 6, wherein the opposing line selection means adds the length to the contour of the conductor pattern in the radial line. The set of the radial lines that are in the shortest and opposite relation is selected as the pair of opposite lines.

  According to the inspection point setting device and the program of the present invention, it is possible to identify lands (including pads) and through-holes located at the end of the conductor pattern regardless of the width of the conductor pattern, and suitable for disconnection inspection. The inspection point can be automatically set at the specified position. In addition, since the contour of the conductor pattern extracted by the contour extraction unit is used for processing and the resist opening point set by the resist opening point setting means is used for processing, regardless of the data format or expression format of the conductor pattern data and resist data. The inspection point can be set.

  When the resist opening point setting means sets the resist opening point at the center of the resist opening, the inspection point can be set at the center of the land or the through hole.

  When the opposed line selecting means selects the radial line having the shortest length to the contour of the conductor pattern and the radial line facing the shortest radial line as a pair of opposed lines, or the contour of the conductor pattern When the pair of radial lines that are in the shortest and opposite relation when the lengths up to are added are selected as a pair of opposite lines, the ends of the conductor pattern can be detected with high accuracy.

It is a block diagram of the inspection point setting device to which the present invention is applied. It is a partial enlarged view of the board | substrate which shows the conductor pattern and resist which become the setting object of an inspection point. It is a flowchart which shows operation | movement of the test | inspection point setting apparatus and program which apply this invention. It is a schematic diagram which shows the example of expression of the conductor pattern by conductor pattern data. It is a schematic diagram which shows the outline of the conductor pattern which the outline extraction means extracted. It is a schematic diagram which shows the example of expression of the resist opening part by resist pattern data. It is a schematic diagram showing a resist opening point set by a resist opening point setting means. It is a schematic diagram which shows the state which aligned (associated) the outline and resist opening point of the conductor pattern. It is a schematic diagram which shows the radial line which the radial line setting means set. It is a schematic diagram which shows the example of a setting of a pair of corresponding line which the opposing line selection means selected. It is a schematic diagram which shows the path | route which connects a pair of opposing line which an inspection point setting process means searches. It is a schematic diagram which shows the inspection point which the inspection point setting process means set. It is a schematic diagram which shows the path | route which connects another pair of opposing line which an inspection point setting process means searches. It is a schematic diagram which shows the state in the middle of the process of the inspection point setting process with respect to another conductor pattern in order.

  Hereinafter, although the form for implementing this invention is demonstrated in detail, the scope of the present invention is not limited to these examples.

  FIG. 1 shows a configuration of an inspection point setting apparatus 1 to which the present invention is applied. As an example, the inspection point setting device 1 is realized by configuring hardware as a general-purpose computer and operating the computer with the program according to the present invention. The hardware (that is, the computer) of the inspection point setting apparatus 1 includes a CPU 2, a data reading unit 3, a storage unit 4, a display unit 5, and an operation unit 6.

  The CPU 2 performs arithmetic processing and control of each part in accordance with a program, and controls the entire computer in an integrated manner. The CPU 2 operates according to the program, and operates as the contour extraction unit 11, the resist opening point setting unit 12, the radial line setting unit 13, the opposing line selection unit 14, and the inspection point setting processing unit 15 in the present invention.

  The data reading means 3 is controlled by the CPU 2 to read board data from the outside. The data reading unit 3 includes an external I / F (interface) unit 21 and an external recording device 22. The external I / F unit 21 is an interface for connecting an external device. The external I / F unit 21 is, for example, a wireless or wired LAN (local area network), modem, USB (universal serial bus), Bluetooth (registered trademark), or the like. The external recording device 22 is a portable semiconductor memory such as a USB memory or an SD (SD) memory card, or an external recording such as an optical disk memory such as a CD (compact disc) -R (recordable) / RW (rewritable) or DVD. An external storage medium writing / reading device for recording data on a medium or reading data from an external recording medium. As the data reading means 3, only one of the external I / F unit 21 and the external recording device 22 may be provided.

  The storage unit 4 is a rewritable nonvolatile memory, and as an example, is a semiconductor memory such as a flash memory or a hard disk. In this example, the storage means 4 stores a program storage memory for storing an operation program and data such as substrate data, contour data, resist opening point data, radial line data, opposing line data, and inspection point data. It also serves as a data storage memory.

  The display means 5 is, for example, a liquid crystal panel or a CRT (cathode ray tube) having a display screen capable of displaying an image. The operation means 6 is for inputting an operator's operation to the inspection point setting device 1, and is, for example, a keyboard or a mouse. The display unit 5 and the operation unit 6 may be configured with a touch panel.

  Next, the operation of the inspection point setting device 1 will be described.

  Here, an example will be described in which inspection points for disconnection inspection are set for the conductor pattern 60 of the substrate 50 shown in a partially enlarged view in FIG. The conductor pattern 60 formed on the substrate 50 includes lands (pads) 61 for soldering surface mount components, lands 62 for soldering lead components, and lands 63 for soldering other lead components. Have. In this example, the width of the conductor pattern 60 formed in a strip shape is wider than the shape of the lands 61, 62, 63. At the center of the lands 62 and 63, through holes 62a and 63a for inserting leads of lead parts are formed. On the conductor pattern 60, a resist 70 indicated by hatching in FIG. In the resist 70, resist openings 71, 72, 73 that are opened in the same shape as the lands 61, 62, 63 are formed in order to expose the lands 61, 62, 63 of the conductor pattern 60 on the surface of the substrate 50. Yes. That is, the resist openings 71, 72, 73 are formed on the conductor pattern 60, so that the lands 61, 62, 63 are formed in the conductor pattern 60.

  The CPU 2 reads the program from the outside by the data reading means 3 and stores it in the storage means 4 in advance. The CPU 2 reads the program according to the present invention stored in the storage means 4 by the operation of the operator or automatically with the activation, and starts the operation according to the program.

  FIG. 3 is a flowchart showing the operation (inspection point setting process) of the inspection point setting apparatus 1 according to the program of the present invention.

  In step S <b> 1, the CPU 2 reads substrate data from the outside by the data reading means 3. The substrate data is output from the substrate design CAD device as substrate manufacturing data in, for example, a Gerber data format. The data to be read may be selectable by the operation of the operation means 6 by the operator. For example, the CPU 2 may determine that the data is board data by a file name or an extension name and automatically read the data.

  The board data includes conductor pattern data indicating the arrangement (shape and position) of the conductor pattern, resist data indicating the arrangement of the resist (resist opening), and the arrangement of vias (including through holes) necessary for manufacturing the board. Via data to be shown, shape data to show the shape dimensions of the substrate, symbol mark data to show the arrangement of the symbol mark (silk), and the like. The board data may include other data such as net information data indicating net information. In the case of a multilayer substrate, the substrate data preferably includes conductor pattern data for each layer. In the present invention, it is necessary that the substrate data includes at least conductor pattern data and resist data. As the substrate data, the conductor pattern data and the resist data may be created in separate files, and the separate files may be read individually. The CPU 2 stores the read substrate data in the storage unit 4.

  Subsequently, the process proceeds to step S <b> 2, and the CPU 2 operates as the contour extracting unit 11 to extract and contour the conductor pattern based on the conductor pattern data stored in the storage unit 4. The contour extraction unit 11 stores the contour data of the conductor pattern in the storage unit 4.

  FIG. 4 shows some expression examples of the conductor pattern data indicating the conductor pattern 60 read in step S1. FIG. 4A shows the conductor pattern 60 in a region (solid region) arranged so as to be filled with a large number of thin line patterns 100, and the lands 61, 62, and 63 have a predetermined round shape, This is an example represented by flashes 101, 102, 103 having a square shape or the like. In some cases, the line pattern 100 and the flashes 101, 102, 103 are recorded in one file (data), or the land 61 is created by superimposing the data of both files created in separate files. A conductor pattern 60 including 62 and 63 may be expressed. In FIG. 4B, the outline (outer edge) of the conductor pattern 60 is represented by a polygon 110, and the lands 61, 62, and 63 are represented by a large number of thin line patterns 111, 112, and 113, respectively. This is an example. The polygon 110 and the line patterns 111, 112, and 113 may be recorded in one file (data), or may be created in separate files. The expression examples of the conductor pattern data indicating the conductor pattern 60 are not limited to these examples, and the expression format is not limited.

  FIG. 5 shows a contour 60a of the conductor pattern 60 contoured in step S2. For example, in the case of FIG. 4A, the outline 60a is extracted by calculating the logical sum of the line pattern 100 and the flashes 101, 102, 103 and then extracting the outer edge. The contour 60a can be extracted by various known methods.

The outline 60a is configured by connecting the sides L ₁ , L ₂ , L ₃ , and L ₄ counterclockwise in this order. When the inside of a closed closed figure is filled with a conductor (conductor pattern 60) as in the outline 60a, the sides L ₁ , L ₂ , L ₃ , and L ₄ in FIG. 5 are indicated with arrows. In addition, the orientation (vectorization) may be performed so that the relationship between the start points and end points of the sides L ₁ , L ₂ , L ₃ , and L ₄ constituting the contour 60a is counterclockwise (or clockwise). This is preferable because subsequent processing becomes easy. Although not shown, for example, when the inside of a closed closed figure is not filled with a conductor so as to provide a portion (extraction window) in which no conductor is formed in the conductor pattern, the starting point of the side constituting the extraction window portion It is preferable to orient the sides so that the end point relationship is clockwise (or counterclockwise). Each side may be a straight line or a curved line.

  Subsequently, the process proceeds to step S3 (see FIG. 3), and the CPU 2 operates as the resist opening point setting means 12 to set a resist opening point, which is a point included in the resist opening based on the resist data, to a conductor pattern. 60 for each resist opening on 60. The resist opening point may be set at any position within the resist opening, but is preferably set at the center of the resist opening, particularly at the center point. Note that the resist opening point setting unit 12 may set all the resist openings on the substrate 50 without determining whether or not the resist openings are positioned on the conductor pattern 60. The resist opening point setting unit 12 stores the resist opening data in the storage unit 4. The order in which step S2 and step S3 are performed may be reversed.

  FIG. 6 shows some expression examples of the resist data indicating the resist 70 read in step S1. FIG. 6A is an example in which resist openings 71, 72, and 73 of the resist 70 are represented by flashes 201, 202, and 203, respectively. FIG. 4B shows an example in which the portions of the resist openings 71, 72, 73 are filled with a large number of thin line patterns 211, 212, 213, respectively. 6A and 6B are examples in which the resist 70 is expressed in reverse (negative display). In some cases, the resist 70 other than the resist openings 71, 72, 73 is filled with a line pattern and expressed (positive display). The expression examples of the resist data are not limited to these examples, and the expression format is not limited.

  FIG. 7 shows the resist opening points A, B, and C set in step S3. The resist opening point setting means 12 extracts and outlines the contours 71a, 72a, 73a of the resist opening portions 71, 72, 73 shown in FIG. 6, for example. Subsequently, the resist opening point setting means 12 calculates the center points (centers of gravity) of the contours 71a, 72a, 73a, and sets the calculated center points as resist opening points A, B, C.

  Subsequently, proceeding to step S4 (see FIG. 3), the CPU 2 operates as the radial line setting means 13, and aligns the contour 60a with the resist opening points A, B, and C as shown in FIG. Associate like so.

Subsequently, the process proceeds to step S5 (see FIG. 3), and the radial line setting means 13 converts the virtual radial lines radiated from the resist opening points A, B, C to the resist opening points A, B as shown in FIG. , Set for each C. The radial line is set with a length that reaches at least the contour 60a. Radial lines are set to radiate at equiangular intervals. The radial lines are set with an even number (even direction) and preferably set with at least four (4 directions) or more, and here, an example is shown in which eight (8 directions) are set. The number of radial lines is not limited, but is preferably about 8 in consideration of the amount of calculation. In addition, it is preferable to set the number of radial lines by a multiple of 4 so that the radial lines having an angle of 90 degrees are included. As shown in the figure, radial lines A _{1 to} A ₈ are set for the resist opening point A, radial lines B _{1 to} B ₈ are set for the resist opening point B, and the radial line C is set for the resist opening point C. setting the _{1 ~C 8.}

Next, it progresses to step S6 (refer FIG. 3), and CPU2 operate | moves as the opposing line selection means 14. FIG. The opposing line selection means 14 calculates the length of each of the radial lines A _{1 to} A ₈ from the resist opening point A to the contour 60a, and based on this length, reverses the radial lines A _{1 to} A ₈ from the opposite direction. A pair of opposing lines A ₃ and A ₇ (see FIG. 10) having an opposing (diagonal) relationship are selected. Similarly, the opposing line selection unit 14 selects a pair of opposing lines B ₃ and B ₇ (see FIG. 10) from the radial lines B _{1 to} B ₈ for the resist opening point B, and the resist opening point C is selected. Also, a pair of opposing lines C ₃ and C ₇ (see FIG. 10) is selected from the radial lines C _{1 to} C ₈ .

The opposing line selection means 14 is a radial line A ₃ having the shortest length to the contour 60a and the radial line A ₃ facing the shortest radial line A ₃ among the radial lines A _{1 to} A ₈ . line _{a 7,} is selected as a pair of opposed line _a 3, _{a 7.} When there are a plurality of radial lines having the shortest length, any of the radial lines may be selected as the radial line having the shortest length. Similarly, the opposing line selection means 14 selects a pair of opposing lines B ₃ and B ₇ and a pair of opposing lines C ₃ and C ₇ .

The counter line selection unit 14, in step S6, in radial lines A ₁ to A _8, radial lines A ₃ that is the shortest, and opposed relationship when the sum of the length to the contour 60a , a set of _{a 7,} may be selected as a pair of opposed line _a 3, _{a 7.} When there are a plurality of pairs of opposing relations that have the shortest combined length, any pair may be selected as a pair of opposing lines. The pair of opposing lines B ₃ and B ₇ and the pair of opposing lines C ₃ and C ₇ may be selected in the same manner. In this way, by selecting the pair of opposing lines A ₃ and A ₇ having the shortest combined length, the resist opening point A is located near the end of the contour 60a and the radial line A ₅ When the length is the shortest, the radial lines A ₅ and A ₁ can be prevented from being selected as the pair of opposing lines.

  Subsequently, the process proceeds to step S7 (see FIG. 3), in which the CPU 2 operates as the inspection point setting processing means 15 and sets a resist opening point of interest from among the plurality of resist opening points A, B, C. Select one. As an example, the inspection point setting processing means 15 selects the resist opening point A. The order of selecting from the resist opening points A, B, and C may be set in any way.

Subsequently, the process proceeds to step S8 (see FIG. 3), and the inspection point setting processing means 15 is in a path connecting the pair of opposed lines A ₃ and A ₇ of the resist opening point A of interest along the contour 60a. Then, it is determined whether there is a path in which neither of the opposing lines B ₃ and B ₇ and the opposing lines C ₃ and C ₇ generated from the other resist opening points B and C exist. The path connecting a pair of opposed line _A 3, _{A 7} along the contour 60a, connecting the intersection of the contour 60a and the counter line _{A 3,} and the intersection of the contour 60a and the counter line _{A 7,} along the contour 60a It is a route.

Among the paths along the contour 60a, what can be considered as a path connecting the opposing lines A ₃ and A ₇ is a path from the opposing line A ₃ to the opposing line A ₇ in the clockwise direction and from the opposing line A _{3 in the} counterclockwise direction. path to the opposite line a _7, the path from the opposite line a ₇ to the opposite line a ₃ clockwise, and, there is a path of four different path from opposite line a ₇ to the opposite line a ₃ counterclockwise. Among the path from opposite line A ₃ to the opposite line A ₇ clockwise, the path to the opposite line A ₃ from the counter line A ₇ counterclockwise, the difference that the direction is the reverse direction is but overlap Yes. In addition, the path from the counter line A ₃ to the counter line A ₇ counterclockwise and the path from the counter line A ₇ to the counter line A ₃ clockwise are overlapped, although the direction is opposite. . Therefore, the inspection point setting processing means 15 may determine two routes that do not overlap among the above four routes. Here, the inspection point setting processing means 15 makes a determination on a path that travels in the counterclockwise direction pre-directed in step S2 to the sides L ₁ , L ₂ , L ₃ , and L ₄ constituting the contour 60a. .

Figure 11 illustrates an example of a path along the contour 60a connecting the opposite line _A 3, _{A 7.} The test point setting processing unit 15 performs the determination was oriented at step S2, the path leading to the opposite line A ₇ from counter line A ₃ counterclockwise R _AL, and, from the opposite line A ₇ counterclockwise _These are two routes R _AR that reach the opposing line A ₃ . The inspection point setting processing means 15 determines that the opposing lines B ₃ , B ₇ , C ₃ , C ₇ do not exist in the route R _AL . Further, the inspection point setting processing means 15 determines that the opposing lines B ₃ , B ₇ , C ₃ , C ₇ exist in the route R _AR .

The inspection point setting processing means 15 is a path in which the opposing lines B ₃ , B ₇ , C ₃ , C ₇ of the other resist opening points B, C do not exist in the two paths R _AL , R _AR (this If at least one route R _AL ) is found, the next step S9 is performed without determining the presence of the opposing lines B ₃ , B ₇ , C ₃ , C _{7 for} the other route (in this case, the route R _AR ). You may go on. In addition, when the inspection point setting processing means 15 searches along the route R _AR , one of the opposing lines B ₃ , B ₇ , C ₃ , C ₇ of the other resist opening points B, C (this In this case, when it is determined that the counter line B ₇ ) also exists, it is not necessary to search for the rest of the route. By doing in this way, the process which the inspection point setting process means 15 performs can be decreased.

As is clear from the figure, the path R _AL where the other opposing lines B ₃ , B ₇ , C ₃ , C ₇ do not exist includes the end of the contour 60a (conductor pattern 60), and the resist opening point A exists at the end of the contour 60a. Therefore, by performing the determination as described above, the resist opening 71 (see FIG. 2) located at the end of the conductor pattern 60 can be extracted. The inspection point setting processing means 15 may determine that the side L ₃ where the opposing lines B ₃ , B ₇ , C ₃ , and C ₇ do not exist is the side of the end of the contour 60a (conductor pattern 60). it can.

Test point setting processing unit 15, at step S8 (see FIG. 3), the other opposite line _{B 3,} B _7, C 3, since _{the C 7} has determined that there is non-existent path _{R AL,} the process proceeds to step S9 .

As shown in FIG. 12, in step S9 (see FIG. 3), the inspection point setting processing means 15 applies the land 61 (conductor pattern 60) in the resist opening 71 corresponding to the resist opening point A of interest. to set the inspection point _{P a.} Test point setting means 15 may set an inspection point P _A to the position of the resist opening point A is the center point of the land 61 may be set to any position within the lands 61. Test point setting processing unit 15, a test point data indicating the inspection points P _A set, for example, in association with the XY coordinates relative to the substrate 50, is stored in the memory means 4.

  Subsequently, the process proceeds to step S10 (see FIG. 3), and the inspection point setting processing means 15 has completed processing (steps S7 to S8) for all the resist opening points A, B, and C corresponding to the contour 60a. If NO in step S7, the process returns to step S7. If completed, the inspection point setting process ends. In this example, since only the process for the resist opening point A has been performed, the process returns to step S7.

In step S7 (see FIG. 3), the inspection point setting processing means 15 selects the resist opening point B of interest as an example from the resist opening points B and C that have not been selected. Subsequently, the process proceeds to step S8, where the inspection point setting processing means 15 includes another resist opening in the path connecting the pair of opposing lines B ₃ and B ₇ of the resist opening point B of interest along the contour 60a. It is determined whether there is a path in which neither of the opposing lines A ₃ and A ₇ and the opposing lines C ₃ and C ₇ generated from the points A and C exist.

Figure 13 illustrates an example of a path along the contour 60a connecting the opposite line _B 3, _{B 7.} The inspection point setting processing means 15 determines whether there is a path where the opposing lines A ₃ , A ₇ , C ₃ , C ₇ do not exist in the paths R _BL , R _BR connecting the pair of opposing lines B ₃ , B _7. To do. In this example, the opposing lines A ₃ and A ₇ exist in the route R _BL , and the opposing lines C ₃ and C ₇ exist also in the route R _BR . Therefore, the inspection point setting processing means 15 proceeds from step S8 to step S10 and does not set the inspection point.

As is clear from the figure, the resist opening point B where the opposing lines A ₃ , A ₇ , C ₃ , C ₇ are present in the route R _BL and the route R _BR is at the end of the contour 60 a (conductor pattern 60). Not located.

In step S10 (see FIG. 3), since the process for the resist opening point C has not been completed, the process returns to step S7. Although the resist opening point C will not be described in detail, the inspection point setting processing means 15 performs steps S7 to S9 that are substantially the same as the resist opening point A, and sets the inspection point P _C (see FIG. 12) to the resist opening point C. Set. Resist opening point C, since those that are set to the center point of the land 63 having a through hole 63a (see FIG. 2), the inspection point P _C is set to the center point of the through hole 63a.

  This completes the inspection point setting process. When a plurality of conductor patterns are formed on the substrate, the inspection point setting process may be performed on each conductor pattern. When a plurality of conductor patterns are formed, steps S2 to S6 may be executed for all the conductor patterns, and steps S7 to S10 may be executed for each conductor pattern. Steps S2 to S6 may be executed every time.

  Next, an inspection point setting process when another conductor pattern 65 shown in FIG. 14A is formed on the substrate 50 will be described. The conductor pattern 65 is formed in a shape in which lands 66, 67 and 68 are connected by a thin line pattern 69. A resist 70 is formed on the conductor pattern 65, and resist openings 76, 77, 78 are formed at the positions of the lands 66, 67, 68. The diameters of the resist openings 76, 77, 78 are usually larger than the diameters of the lands 66, 67, 68.

  FIG. 14B includes the outline 65a of the conductor pattern 65 extracted based on the conductor pattern data (step S2) and the resist openings 76, 77, and 78 set based on the resist data (step S3). FIG. 6 is a diagram showing resist opening points D, E, and F, which are points to be registered, associated with each other so as to be aligned (step S4). The contour 65a is preferably oriented counterclockwise (or clockwise) as indicated by an arrow in the figure. Since the diameters of the resist openings 76, 77, 78 are larger than the diameters of the lands 66, 67, 68, the resist opening points D, E, F can be set in the lands 66, 67, 68 (in the contour 65a). is necessary. It is preferable to set the resist opening points D, E, and F at the center (for example, the center point) of the resist openings 76, 77, and 78 because the resist opening points D, E, and F are surely set within the contour 65a. .

In FIG. 14C, radial lines D _{1 to} D ₈ are set at the resist opening point D, radial lines E _{1 to} E ₈ are set at the resist opening point E, and radial lines F ₁ to F are set at the resist opening point F. _In this example, ₈ is set (step S5).

In FIG. 14D, a pair of opposing lines D ₂ and D ₆ are set for the resist opening point D, a pair of opposing lines E ₂ and E ₆ are set for the resist opening point E, and the resist opening point is set. This is an example in which a pair of opposing lines F ₄ and F ₈ is set for F (step S6). When there are a plurality of sets of radial lines that can form a pair of opposing lines, any set may be selected. For example, since the resist opening point D is located at the center of the circular land 66, a set of radial lines D ₂ and D _6, a set of radial lines D ₃ and D _{7, and} a set of radial lines D ₄ and D ₈ are included. Although it can be a pair of opposing lines, any of these sets may be set as a pair of opposing lines.

In FIG. 14E, when attention is paid to the resist opening point D (step S7), the other resist opening points E and F in the path along the contour 65a connecting the pair of opposing lines D ₂ and D ₆ are shown. The route R _DL (step S8) in which the opposing lines E ₂ , E ₆ , F ₄ , and F ₈ do not exist is shown. Also, in the same figure, when attention is paid to the resist opening point F, the opposing line D of the other resist opening points D and E in the path along the contour 65a connecting the pair of opposing lines F ₄ and F _{8. 2} , D ₆ , E ₂ , E ₆ indicates a path R _FR that does not exist. Since routes R _DL and R _FR exist, inspection points P _D and P _F are set at the resist opening points D and F, respectively (step S9).

FIG. 14F shows two paths R _EL and R _ER along the contour 65a that connects the pair of opposing lines E ₂ and E ₆ when attention is paid to the resist opening point E (step S7). . Since the opposite lines D ₂ and D ₆ of the other resist opening points D exist on the route R _EL and the opposite lines F ₄ and F ₈ of the other resist opening points F exist on the route R _ER (steps). S8) No inspection point is set.

  As described above, according to the inspection point setting apparatus 1 and the program of the present invention, the conductor patterns 65 connected by the thin line pattern 69 are also formed in the lands 66 and 68 (through holes 66a and 68a) at the end portions. Inspection points can be set automatically.

  In addition, although the example which was set as the test | inspection point setting apparatus 1 by operating a general purpose computer with the program which concerns on this invention was demonstrated, the test | inspection point setting apparatus 1 was not used by a general purpose computer, but the general purpose computer. May be configured. The CPU 2 preferably displays images such as those shown in FIGS. 2 and 4 to 14 on the display means 5. In other words, conductor pattern, conductor pattern contour, resist, resist opening point, radial line, pair of opposing lines, path along the contour line, path where the opposing line of other resist opening point does not exist and path, inspection point Is preferably displayed on the display means 5. It is preferable that the image to be displayed can be arbitrarily switched by operating the operation means 6. Further, it is preferable that the display position on the substrate and the display magnification can be changed by operating the operation means 6. Further, the inspection point setting process may be executed for all of the plurality of conductor patterns included in the substrate, or may be executed for one of the attention, or for example, a plurality of conductor patterns selected in the region. Also good. Further, it is preferable that the operation means 6 can be manually operated to erase the set inspection point or add an inspection point at an arbitrary position.

  In addition, an example in which the opposing line selecting unit 14 selects a radial line having the shortest length to the contour of the conductor pattern and a radial line that is in a facing relationship with the shortest radial line as a pair of opposing lines, or a conductor pattern The example of selecting the pair of radial lines that are the shortest and opposite to each other as the pair of opposing lines when the lengths to the outlines of the conductor patterns are added has been described. Alternatively, the short radiation and the radial line facing the second shortest radial line may be selected as a pair of opposed lines. The method by which the opposed line selection unit selects a pair of opposed lines may be changed as appropriate. Moreover, although the example which the radial line setting means set the number of radial lines with the even number was demonstrated, you may set with an odd number. When set with an odd number, the radial line closest to the opposite facing relationship may be selected as the pair of radial lines having the opposite facing relationship.

1 is an inspection point setting device, 2 is a CPU, 3 is data reading means, 4 is storage means, 5 is display means, 6 is operation means, 11 is contour extraction means, 12 is a resist opening point setting means, and 13 is a radial line Setting means, 14 is a counter line selection means, 15 is an inspection point setting processing means, 21 is an external I / F unit, 22 is an external recording device, 50 is a substrate, 60 is a conductor pattern, 60a is a contour, 61 · 62 · 63 Is a through hole, 65 is a conductor pattern, 65a is a contour, 66, 67 and 68 are lands, 69 is a line pattern, 70 is a resist, 71, 72 and 73 are resist openings, 71a and 72a 73a is an outline, 76, 77 and 78 are resist openings, 100 is a line pattern, 101, 102 and 103 are flashes, 110 is a polygon, 111, 112 and 1 3 line patterns, 201, 202, 203 flash, the line pattern 211 · 212 · 213, A · B · C · D · E · F resist opening _{point, A 1 ~A 8 · B 1} ~B ₈ · C _{1 to} C ₈ · D _{1 to} D ₈ · E _{1 to} E ₈ · F _{1 to} F ₈ are radial lines, A ₃ · A ₇ · B ₃ · B ₇ · C ₃ · C ₇ · D ₂ · D ₆ , E ₂ , E ₆ , F _4, and F ₈ are opposing lines (radial lines), L ₁ , L ₂ , L ₃ , and L ₄ are sides, P _A , P _D, and P _F are inspection points, and R _AL R _AR , R _BL , R _BR , R _DL , R _FR , R _EL , R _ER are routes.

Claims (8)

An inspection point setting device that sets an inspection point for the conductor pattern based on conductor pattern data indicating a conductor pattern of a substrate to be inspected and resist data indicating a resist,
Data reading means for reading the conductor pattern data and the resist data;
Contour extracting means for extracting a contour of the conductor pattern based on the conductor pattern data;
A resist opening point setting means for setting a resist opening point, which is a point included in the resist opening based on the resist data, for each of the resist openings;
Radial line setting means for setting a virtual radial line radiating from the resist opening point for each resist opening point;
The length of each of the radial lines from the resist opening point to the contour of the conductor pattern is calculated, and based on this length, a pair of opposing lines in a reverse facing relationship from the radial lines are defined as the resist lines. Opposing line selection means for selecting for each opening point;
When the path connecting the pair of opposing lines of the resist opening point of interest along the contour of the conductor pattern is a path where the opposing line generated from another resist opening point does not exist In addition, inspection point setting processing means for setting the inspection point in the conductor pattern in the resist opening corresponding to the resist opening point of interest,
An inspection point setting device comprising:   The inspection point setting apparatus according to claim 1, wherein the resist opening point setting unit sets the resist opening point at a central portion of the resist opening.   The opposed line selection means includes the radial line having the shortest length to the contour of the conductor pattern in the radial line, and the radial line that is opposed to the shortest radial line. 3. The inspection point setting device according to claim 1, wherein the inspection point setting device is selected as a pair of opposing lines.   When the opposing line selection means adds the length to the contour of the conductor pattern among the radial lines, the pair of the radial lines that are in the shortest and opposing relation is defined as the pair of opposing lines. 3. The inspection point setting device according to claim 1, wherein the inspection point setting device is selected as a line. Based on conductor pattern data indicating a conductor pattern of a substrate to be inspected and resist data indicating a resist, a program for setting an inspection point for the conductor pattern,
Computer
Data reading means for reading the conductor pattern data and the resist data;
Contour extracting means for extracting a contour of the conductor pattern based on the conductor pattern data;
A resist opening point setting means for setting a resist opening point, which is a point included in the resist opening based on the resist data, for each of the resist openings;
Radial line setting means for setting a virtual radial line radiating from the resist opening point for each resist opening point;
The length of each of the radial lines from the resist opening point to the contour of the conductor pattern is calculated, and based on this length, a pair of opposing lines in a reverse facing relationship from the radial lines are defined as the resist lines. Opposing line selection means for selecting for each opening point;
When the path connecting the pair of opposing lines of the resist opening point of interest along the contour of the conductor pattern is a path where the opposing line generated from another resist opening point does not exist In addition, as inspection point setting processing means for setting the inspection point in the conductor pattern in the resist opening corresponding to the resist opening point of interest,
A program characterized by being operated.   6. The program according to claim 5, wherein the resist opening point setting means sets the resist opening point at a central portion of the resist opening.   The opposed line selection means includes the radial line having the shortest length to the contour of the conductor pattern in the radial line, and the radial line that is opposed to the shortest radial line. The program according to claim 5 or 6, wherein the program is selected as a pair of opposing lines.   When the opposing line selection means adds the length to the contour of the conductor pattern among the radial lines, the pair of the radial lines that are in the shortest and opposing relation is defined as the pair of opposing lines. The program according to claim 5 or 6, wherein the program is selected as a line.

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