JP6180245B2 - Cleaning device - Google Patents

Cleaning device Download PDF

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JP6180245B2
JP6180245B2 JP2013186894A JP2013186894A JP6180245B2 JP 6180245 B2 JP6180245 B2 JP 6180245B2 JP 2013186894 A JP2013186894 A JP 2013186894A JP 2013186894 A JP2013186894 A JP 2013186894A JP 6180245 B2 JP6180245 B2 JP 6180245B2
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pad portion
diaphragm
pad
cleaning device
cleaning
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JP2015054256A (en
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勇也 宮島
勇也 宮島
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Toray Engineering Co Ltd
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本発明は、超音波振動により基板を浮上させる基板浮上装置を清掃する清掃装置に関するものである。   The present invention relates to a cleaning device for cleaning a substrate floating device that floats a substrate by ultrasonic vibration.

液晶ディスプレイやプラズマディスプレイ等のフラットパネルディスプレイには、基板上にレジスト液が塗布されたもの(塗布基板と称す)が使用されている。この塗布基板は、塗布装置により基板上にレジスト液が均一に塗布されることによって塗布膜が形成され、その後、熱処理装置により塗布膜を乾燥させることにより生産される。   A flat panel display such as a liquid crystal display or a plasma display uses a substrate coated with a resist solution (referred to as a coated substrate). The coated substrate is produced by forming a coating film by uniformly applying a resist solution on the substrate by a coating apparatus, and then drying the coating film by a heat treatment apparatus.

この熱処理装置の一種として、たとえば特許文献1および図4で示すような浮上搬送熱処理装置がある。図4に示すように、浮上搬送熱処理装置90は振動板92および超音波発生部93からなる基板浮上装置91と振動板92を加熱する加熱装置94とを有し、加熱装置94によって加熱された基板浮上装置91が基板Wを超音波振動浮上させることによって、基板Wを非接触で加熱することが可能である。   As one type of this heat treatment apparatus, for example, there is a floating conveyance heat treatment apparatus as shown in Patent Document 1 and FIG. As shown in FIG. 4, the levitation transfer heat treatment apparatus 90 includes a substrate levitation apparatus 91 including a vibration plate 92 and an ultrasonic wave generation unit 93, and a heating device 94 that heats the vibration plate 92, and is heated by the heating device 94. The substrate levitation device 91 allows the substrate W to be heated in a non-contact manner by levitation of the substrate W by ultrasonic vibration.

特開2012−248755号公報JP 2012-248755 A

このような浮上搬送熱処理装置90を使用し続けていると、パーティクルやガラスの微小片などの異物95が装置内の可動部、摺動部で発生したり、周囲環境から吹き込んできたり、搬入された基板Wに付着してきたりなどして、振動板92上に落ちる可能性がある。この異物95が振動板92に残されたままであると、別の基板Wの裏面に付着してしまう。そうすると、その基板Wを用いた最終製品に異物が混入したり、異物95を通じて基板Wに振動板92の振動が伝わることによって基板Wの浮上量に変化が生じて乾燥ムラが生じたり、基板Wが異物95を引きずることによって振動板92に傷が付いたりするおそれがあった。特に、振動板92に傷が付いてしまった場合、傷の形状が基板W上の塗布膜に転写されるように乾燥ムラが生じるおそれがあった。   If such a levitation transfer heat treatment apparatus 90 is continuously used, foreign matter 95 such as particles and fine pieces of glass are generated in the movable part and sliding part in the apparatus, blown from the surrounding environment, or carried in. There is a possibility of falling on the diaphragm 92 due to adhesion to the substrate W. If the foreign matter 95 remains on the diaphragm 92, it adheres to the back surface of another substrate W. Then, foreign matter is mixed into the final product using the substrate W, or the vibration of the vibration plate 92 is transmitted to the substrate W through the foreign matter 95, so that the floating amount of the substrate W is changed and drying unevenness occurs. There is a possibility that the diaphragm 92 may be damaged by dragging the foreign matter 95. In particular, when the vibration plate 92 is scratched, there is a possibility that drying unevenness may occur so that the shape of the scratch is transferred to the coating film on the substrate W.

これらの問題が生じないようにするために、振動板92上に異物95が存在することがないように定期的に振動板92の表面を清掃する必要がある。この清掃は、従来、作業員がウェスを用いて異物95を拭き取ることにより行っていたが、この場合、異物95を拭き取る際に異物95を振動板92にこすりつけてしまう可能性があった。このように異物95を振動板92にこすりつけてしまうと、振動板92に傷が付き、以後、基板W上の塗布膜に乾燥ムラが生じてしまうといった問題があった。   In order to prevent these problems from occurring, it is necessary to periodically clean the surface of the diaphragm 92 so that the foreign matter 95 does not exist on the diaphragm 92. Conventionally, this cleaning has been performed by wiping off the foreign matter 95 using a waste cloth, but in this case, the foreign matter 95 may be rubbed against the diaphragm 92 when the foreign matter 95 is wiped off. If the foreign material 95 is rubbed against the diaphragm 92 in this way, there is a problem that the diaphragm 92 is damaged, and thereafter, the coating film on the substrate W is unevenly dried.

本発明は、上記問題点に鑑みてなされたものであり、清掃対象物を傷つけることなく異物を除去することのできる清掃装置を提供することを目的としている。   The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a cleaning device that can remove foreign matter without damaging a cleaning object.

上記課題を解決するために本発明の清掃装置は、清掃対象物と対向する平坦な底面を有し、前記清掃対象物の超音波振動によって前記清掃対象物上で浮上するパッド部と、前記パッド部の上面との間および前記パッド部の側面との間に隙間を有しながら前記パッド部の上面および側面を覆うカバー部と、前記カバー部に接続され、前記パッド部と前記カバー部との隙間の気体を吸引する吸引手段と、を備え、前記カバー部の下端部と前記パッド部の側面との間には開口部が形成され、当該下端部は、前記パッド部の底面よりも高い位置にあることを特徴としている。   In order to solve the above problems, a cleaning device of the present invention has a flat bottom surface facing a cleaning object, and a pad portion that floats on the cleaning object by ultrasonic vibration of the cleaning object; and the pad A cover portion that covers the upper surface and the side surface of the pad portion with a gap between the upper surface of the pad portion and the side surface of the pad portion, and is connected to the cover portion, and the pad portion and the cover portion A suction means for sucking the gas in the gap, and an opening is formed between the lower end portion of the cover portion and the side surface of the pad portion, and the lower end portion is positioned higher than the bottom surface of the pad portion. It is characterized by that.

上記清掃装置によれば、清掃対象物を傷つけることなく異物を除去することが可能である。具体的には、清掃対象物の超音波振動によって清掃対象物上で浮上するパッド部を有することにより、清掃対象物と非接触の状態で清掃対象物上の異物を吸引除去することができるため、清掃対象物を傷つけることなく異物を除去することが可能である。また、カバー部の下端部とパッド部の側面との間には開口部が形成され、当該下端部は、パッド部の底面よりも高い位置にあることにより、パッド部の浮上量よりも大きい寸法の異物もパッド部とカバー部との隙間に吸い込んで吸引除去することができる。   According to the cleaning device, it is possible to remove foreign substances without damaging the object to be cleaned. Specifically, by having a pad portion that floats on the cleaning object by ultrasonic vibration of the cleaning object, foreign matter on the cleaning object can be sucked and removed in a non-contact state with the cleaning object. It is possible to remove foreign substances without damaging the object to be cleaned. In addition, an opening is formed between the lower end portion of the cover portion and the side surface of the pad portion, and the lower end portion is positioned higher than the bottom surface of the pad portion, so that the dimension is larger than the flying height of the pad portion. The foreign matter can also be sucked and removed by sucking it into the gap between the pad portion and the cover portion.

また、前記パッド部は、前記パッド部の上面もしくは側面と底面とを貫通する貫通孔を有し、前記吸引手段は、前記貫通孔を経由して前記パッド部の底面近傍の気体も吸引すると良い。   Further, the pad portion has a through hole penetrating the upper surface or side surface and bottom surface of the pad portion, and the suction means may suck gas near the bottom surface of the pad portion through the through hole. .

こうすることにより、パッド部の底面の直下に位置する異物も吸引除去することができるとともに、清掃対象物とパッド部との間に吸着力が発生し、この吸着力と超音波振動による浮揚力とのバランスによってパッド部の底面と平行な方向への移動に対して適度の抵抗力を持たせることが可能である。   In this way, foreign substances located immediately below the bottom surface of the pad portion can be removed by suction, and an adsorption force is generated between the object to be cleaned and the pad portion. Therefore, it is possible to give an appropriate resistance against movement in a direction parallel to the bottom surface of the pad portion.

本発明の清掃装置によれば、清掃対象物を傷つけることなく異物を除去することが可能である。   According to the cleaning device of the present invention, foreign matter can be removed without damaging the object to be cleaned.

本発明の一実施形態における清掃装置の概略図である。It is the schematic of the cleaning apparatus in one Embodiment of this invention. 本発明の一実施形態における清掃装置の概略図である。It is the schematic of the cleaning apparatus in one Embodiment of this invention. 本実施形態における清掃装置による清掃形態を示す概略図である。It is the schematic which shows the cleaning form by the cleaning apparatus in this embodiment. 浮上搬送熱処理装置を示す概略図である。It is the schematic which shows a levitation conveyance heat processing apparatus.

本発明に係る実施の形態を図面を用いて説明する。   Embodiments according to the present invention will be described with reference to the drawings.

図1および図2は、本発明の一実施形態における清掃装置の概略図であり、図1は清掃装置による清掃の形態を示す概略図であり、図2(a)は清掃装置の上面図、図2(b)は清掃装置の正面図である。   1 and 2 are schematic views of a cleaning device according to an embodiment of the present invention, FIG. 1 is a schematic view showing a form of cleaning by the cleaning device, and FIG. 2 (a) is a top view of the cleaning device. FIG. 2B is a front view of the cleaning device.

清掃装置1は、パッド部2、カバー部3、および吸引手段4を備えており、浮上搬送熱処理装置90内の基板浮上装置91が有する振動板(清掃対象物)92の表面を清掃する。   The cleaning device 1 includes a pad portion 2, a cover portion 3, and suction means 4, and cleans the surface of a diaphragm (cleaning target) 92 included in the substrate floating device 91 in the floating conveyance heat treatment device 90.

ここで、浮上搬送熱処理装置90は塗布液が塗布された基板を乾燥させる工程に用いられるものであり、その工程において振動板92は超音波振動することによって基板Wを超音波振動浮上させ、この状態において基板の加熱乾燥が実施される。   Here, the levitation transfer heat treatment apparatus 90 is used in a process of drying the substrate on which the coating liquid has been applied. In that process, the vibration plate 92 ultrasonically oscillates the substrate W to levitate the substrate W, and this In the state, the substrate is heated and dried.

この振動板92を清掃装置91が清掃する際にも振動板92は超音波振動しており、パッド部2およびカバー部3は超音波振動浮上した状態で、図示しない移動手段によりたとえば図1に矢印で示すように振動板92上を移動しながら、振動板92の表面(清掃装置1と対向する面)の清掃を実施する。また、パッド部2とカバー部3との間には隙間が設けられており、この隙間の気体を吸引手段4が吸引することにより、この隙間へ振動板92上の異物が吸引されて、清振動板92の表面の清掃が行われる。   When the cleaning device 91 cleans the vibration plate 92, the vibration plate 92 is ultrasonically vibrated, and the pad portion 2 and the cover portion 3 are floated by ultrasonic vibration. While moving on the diaphragm 92 as indicated by the arrow, the surface of the diaphragm 92 (the surface facing the cleaning device 1) is cleaned. In addition, a gap is provided between the pad portion 2 and the cover portion 3, and when the suction means 4 sucks the gas in the gap, the foreign matter on the diaphragm 92 is sucked into the gap and is cleaned. The surface of the diaphragm 92 is cleaned.

なお、以降の説明では、水平方向の一方向をX軸方向、水平面上でX軸方向と直交する方向をY軸方向、X軸方向およびY軸方向の両方と直交する方向、すなわち鉛直方向をZ軸方向とする。   In the following description, one direction in the horizontal direction is the X-axis direction, the direction orthogonal to the X-axis direction on the horizontal plane is the Y-axis direction, the direction orthogonal to both the X-axis direction and the Y-axis direction, that is, the vertical direction. The Z axis direction.

パッド部2は、本実施形態では円柱状の物体であり、底面11が清掃対象物である振動板92と対向する。   The pad portion 2 is a cylindrical object in the present embodiment, and the bottom surface 11 faces the diaphragm 92 that is an object to be cleaned.

ここで、上記の通り、清掃装置1による清掃はパッド部2が振動板92の超音波振動によって浮上した状態の下で実施される。   Here, as described above, the cleaning by the cleaning device 1 is performed under the state where the pad portion 2 is floated by the ultrasonic vibration of the diaphragm 92.

この場合、超音波発生部93によって超音波振動する振動板92から発せられる放射音圧をパッド部2の底面11が受けることによりパッド部2は浮上するが、パッド部2が安定して浮上するためには、底面11の全面において均等に放射音圧を受ける必要がある。そのためには、底面11が平坦面であり、底面11の全面において振動板との距離が均一である必要がある。   In this case, the pad portion 2 floats when the bottom surface 11 of the pad portion 2 receives the radiated sound pressure emitted from the vibration plate 92 that is ultrasonically vibrated by the ultrasonic generator 93, but the pad portion 2 stably floats. For this purpose, it is necessary to receive the radiation sound pressure evenly over the entire bottom surface 11. For this purpose, the bottom surface 11 is a flat surface, and the distance from the diaphragm needs to be uniform over the entire bottom surface 11.

また、この振動板92は加熱装置94によって120℃〜140℃に加熱されて用いられているため、このような加熱状態においても清掃動作が可能なように、パッド部2の材質は耐熱温度が高く、熱伝導率が低いことが望ましい。また、パッド部2の温度上昇によりパッド部2が反ってしまい、底面11の平坦度が失われると、パッド部2が安定して超音波振動浮上することが困難となるため、パッド部2は線膨張係数が低く、反りにくいことが望ましい。これらの特徴を踏まえると、パッド部2の素材はフッ素樹脂であることが最も好ましい。また、フッ素樹脂は軟らかく、摩擦係数が少ないため、万が一パッド部2が振動板と接触しても振動板が傷付くおそれはない。   In addition, since the diaphragm 92 is heated to 120 ° C. to 140 ° C. by the heating device 94 and used, the material of the pad portion 2 has a heat resistant temperature so that the cleaning operation can be performed even in such a heated state. High and low thermal conductivity are desirable. Further, if the pad portion 2 warps due to the temperature rise of the pad portion 2 and the flatness of the bottom surface 11 is lost, it becomes difficult for the pad portion 2 to stably float and oscillate. It is desirable that the linear expansion coefficient is low and the warp is difficult. Considering these characteristics, the material of the pad portion 2 is most preferably a fluororesin. In addition, since the fluororesin is soft and has a small coefficient of friction, there is no possibility that the diaphragm is damaged even if the pad portion 2 contacts the diaphragm.

また、パッド部2の上面には、パッド部2とカバー部3とを連結するための連結部材23を取り付けるための機構(取り付け穴など)が同心円上に設けられている。   Further, on the upper surface of the pad portion 2, a mechanism (attachment hole or the like) for attaching a connecting member 23 for connecting the pad portion 2 and the cover portion 3 is provided on a concentric circle.

また、本実施形態では、パッド部2にはその上面と底面11とを貫通する貫通孔12が設けられている。これにより、パッド部2の上面近傍で吸引力が働いている場合は、この貫通孔12を通って底面11の近傍でも吸引力が働く。なお、貫通孔12はパッド部2の側面と底面11とを貫通するものであっても構わない。この場合、パッド部2の側面近傍で吸引力が働いている際に、この貫通孔12を通って底面11の近傍でも吸引力が働く。   In the present embodiment, the pad portion 2 is provided with a through hole 12 that penetrates the top surface and the bottom surface 11. Thereby, when the suction force is working near the upper surface of the pad portion 2, the suction force works also near the bottom surface 11 through the through hole 12. The through hole 12 may penetrate the side surface and the bottom surface 11 of the pad portion 2. In this case, when a suction force is acting in the vicinity of the side surface of the pad portion 2, the suction force also acts in the vicinity of the bottom surface 11 through the through hole 12.

カバー部3は、天板21、側板22、および配管接続口25を有し、パッド部2の上面との間およびパッド部2の側面との間に隙間24を有しながら、パッド部2の上方から被さるようにパッド部2の上面および側面を覆う。このカバー部3により、隙間24は配管接続口25の開口部、側板22とパッド部2との間に形成される開口部28、および貫通孔12の部分でのみ外気と通じた状態となっている。   The cover unit 3 includes a top plate 21, a side plate 22, and a pipe connection port 25, and includes a gap 24 between the upper surface of the pad unit 2 and the side surface of the pad unit 2, while The upper surface and side surfaces of the pad portion 2 are covered so as to cover from above. By this cover portion 3, the gap 24 is in a state of communicating with the outside air only at the opening portion of the pipe connection port 25, the opening portion 28 formed between the side plate 22 and the pad portion 2, and the through hole 12. Yes.

天板21は、本実施形態では後述する配管接続口25の開口部の径と略同一の径の貫通穴を中心部に有する円盤状の板状体であり、天板21の外径はパッド部2の径よりも大きい。なお、天板21を含め、カバー部3を構成する部材には、たとえばステンレスなどが用いられている。   The top plate 21 is a disk-like plate-like body having a through hole having a diameter substantially the same as the diameter of the opening of the pipe connection port 25 described later in this embodiment, and the outer diameter of the top plate 21 is a pad. It is larger than the diameter of the part 2. In addition, stainless steel etc. are used for the member which comprises the cover part 3 including the top plate 21, for example.

また、天板21の下面には、連結部材23を取り付けるための機構(取り付け穴など)が、パッド部2に設けられたそれと同じ径の同心円上に設けられている。この機構を用いて、連結部材23により天板21とパッド部2の中心がZ軸方向に並んだ状態で天板21がパッド部2とが連結される。そして、天板21とパッド部2との間には、隙間が確保される。なお、本実施形態では、この隙間の寸法(図2(b)における寸法d1)は5mm〜10mmに設定している。   Further, on the lower surface of the top plate 21, a mechanism (mounting hole or the like) for attaching the connecting member 23 is provided on a concentric circle having the same diameter as that provided in the pad portion 2. Using this mechanism, the top plate 21 and the pad portion 2 are connected by the connecting member 23 with the center of the top plate 21 and the pad portion 2 aligned in the Z-axis direction. A gap is secured between the top plate 21 and the pad portion 2. In the present embodiment, the dimension of the gap (dimension d1 in FIG. 2B) is set to 5 mm to 10 mm.

側板22は、外径が天板21の外径と略同一であり、内径がパッド部2の径よりも大きい管状体であり、天板21の外周部と側板22の外周部の位置が一致するように天板21の下面と側板22の上端部とが突き合わされた状態で溶接などにより側板22は天板21と接合される。なお、この接合部は気密性を有している。   The side plate 22 is a tubular body whose outer diameter is substantially the same as the outer diameter of the top plate 21 and whose inner diameter is larger than the diameter of the pad portion 2, and the positions of the outer peripheral portion of the top plate 21 and the outer peripheral portion of the side plate 22 are the same. Thus, the side plate 22 is joined to the top plate 21 by welding or the like in a state where the lower surface of the top plate 21 and the upper end portion of the side plate 22 are in contact with each other. In addition, this junction part has airtightness.

このように側板22が接合された天板21が連結部材23を介してパッド部2に連結されることにより、パッド部2の上面および側面との間に隙間24を有しながら、パッド部2の上方から被さるようにパッド部2の上面および側面を覆う形態をとる。そして、側板22の下端部27において、側板22とパッド部2との間に開口部28が形成される。なお、本実施形態では、開口部28はパッド部2の全周にわたって形成されており、側板22とパッド部2の隙間の寸法および開口部28の幅(図2(b)における寸法d2)は2mm〜3mmに設定している。   The top plate 21 to which the side plate 22 is bonded in this way is connected to the pad portion 2 via the connecting member 23, so that the pad portion 2 has a gap 24 between the upper surface and the side surface of the pad portion 2. The upper surface and the side surface of the pad portion 2 are covered so as to cover from above. An opening 28 is formed between the side plate 22 and the pad portion 2 at the lower end portion 27 of the side plate 22. In the present embodiment, the opening portion 28 is formed over the entire circumference of the pad portion 2, and the size of the gap between the side plate 22 and the pad portion 2 and the width of the opening portion 28 (dimension d2 in FIG. 2B) are as follows. It is set to 2 mm to 3 mm.

また、側板22の高さは、側板22が接合された天板21が連結部材23を介してパッド部2に連結された状態において側板22の下端部27が所定の寸法分パッド部2の底面11よりも高い位置にあるように設定されている。なお、本実施形態では、下端部27と底面11の高さの差(図2(b)における寸法d3)は2mm〜3mmとし、上記寸法d2と略同一の寸法に設定している。   Further, the height of the side plate 22 is such that the lower end 27 of the side plate 22 is the bottom surface of the pad portion 2 by a predetermined dimension when the top plate 21 to which the side plate 22 is joined is connected to the pad portion 2 via the connecting member 23. 11 is set to be higher than 11. In the present embodiment, the difference in height between the lower end portion 27 and the bottom surface 11 (dimension d3 in FIG. 2B) is set to 2 mm to 3 mm, and is set to be approximately the same as the dimension d2.

配管接続口25は、内径が天板21の穴の径と略同一の管状体であり、他端が吸引手段4と連結された配管26の端部がこの配管接続口25に連結される。   The pipe connection port 25 is a tubular body whose inner diameter is substantially the same as the diameter of the hole of the top plate 21, and the end of the pipe 26 whose other end is connected to the suction means 4 is connected to the pipe connection port 25.

この配管接続口25は、天板21の内周部と配管接続口25の内周部の位置が一致するように天板21の上面と配管接続口25の下端部とが突き合わされた状態で、天板21と溶接などにより接合される。なお、この接合部は気密性を有している。   The pipe connection port 25 is in a state where the upper surface of the top plate 21 and the lower end portion of the pipe connection port 25 are abutted so that the positions of the inner periphery of the top plate 21 and the inner periphery of the pipe connection port 25 coincide. The top plate 21 is joined by welding or the like. In addition, this junction part has airtightness.

吸引手段4は、吸引力を発生する手段であり、工場真空、市販の掃除機などがこれに相当する。   The suction means 4 is a means for generating a suction force, such as a factory vacuum or a commercially available vacuum cleaner.

この吸引手段4は配管26と連結しており、配管26を介して吸引手段4がカバー部3に接続されることにより、吸引手段4が動作することにより隙間24に存在する気体を吸引する。   The suction means 4 is connected to the pipe 26, and the suction means 4 is connected to the cover portion 3 through the pipe 26, whereby the gas present in the gap 24 is sucked by the operation of the suction means 4.

なお、配管26は樹脂ホースなどであり、可撓性を有する。そのため、パッド部2およびカバー部3の移動が配管26によって妨げられることは無く、清掃対象物全面の清掃が可能となる。   The pipe 26 is a resin hose or the like and has flexibility. Therefore, the movement of the pad portion 2 and the cover portion 3 is not hindered by the pipe 26, and the entire surface of the cleaning object can be cleaned.

次に、本実施形態における清掃装置による異物の吸引形態を図3に示す。   Next, FIG. 3 shows a suction form of foreign matter by the cleaning device in the present embodiment.

本発明の清掃装置1による清掃対象物は、先述の通り主に浮上搬送熱処理装置が有する振動板92であり、清掃装置1による清掃は、パッド部2が振動板92の超音波振動によって浮上した状態の下で図示しない移動手段により振動板92上を移動しながら実施される。   As described above, the object to be cleaned by the cleaning device 1 of the present invention is mainly the vibration plate 92 included in the levitation conveyance heat treatment device, and the cleaning by the cleaning device 1 causes the pad portion 2 to float by the ultrasonic vibration of the vibration plate 92. It is carried out while moving on the diaphragm 92 by a moving means (not shown) under the state.

このようにパッド部2が浮上した状態で吸引手段4を動作させて配管26および配管接続口25を通って隙間24に吸引力が発生した際、隙間24に通じる開口部28および貫通孔12において下から上に向かう気流が発生する。これにより、異物95はこの開口部28と貫通孔12を通って吸引され、清掃される。   When the suction means 4 is operated in a state where the pad portion 2 is lifted in this way and suction force is generated in the gap 24 through the pipe 26 and the pipe connection port 25, in the opening 28 and the through hole 12 leading to the gap 24. An air flow from the bottom to the top is generated. As a result, the foreign matter 95 is sucked through the opening 28 and the through hole 12 and cleaned.

ここで、振動板92は超音波発生部からの振動を浮上させる物体(清掃装置1、基板Wなど)へ効率良く伝達することが要求されるため、通常は振動の伝達率の良いアルミで形成されている。そのため、振動板92は比較的軟らかく、ガラス微小片などの異物95を引きずってしまうと、振動板92に容易に傷が付いてしまうおそれがあるが、本発明の清掃装置1は振動板92の振動によって超音波振動浮上した状態で振動板92の表面の清掃を行う、すなわち、非接触の状態で清掃を行うため、清掃装置1自身が振動板92を傷付けることは無く、また、清掃装置1が異物95を引きずる可能性も少ない。   Here, since the diaphragm 92 is required to efficiently transmit the vibration from the ultrasonic generator to an object (such as the cleaning apparatus 1 or the substrate W) that floats, it is usually formed of aluminum having a good vibration transmission rate. Has been. For this reason, the vibration plate 92 is relatively soft, and if the foreign matter 95 such as a small glass piece is dragged, the vibration plate 92 may be easily scratched. Since the surface of the diaphragm 92 is cleaned in a state where the ultrasonic vibration is levitated by vibration, that is, cleaning is performed in a non-contact state, the cleaning apparatus 1 itself does not damage the diaphragm 92, and the cleaning apparatus 1 Is less likely to drag the foreign matter 95.

次に、清掃装置1で清掃することのできる異物の大きさについて述べる。   Next, the size of foreign matter that can be cleaned by the cleaning device 1 will be described.

まず、貫通孔12を通って吸引される異物95は、浮上しているパッド部2の底面11と振動板92との間をくぐり抜けてから吸引されるため、貫通孔12で吸引できる異物95の大きさは、径がパッド部2の浮上量(振動板92と底面11との距離。本実施形態では、50um〜100um)よりも小さいものに限られる。したがって、貫通孔12からは比較的大きな異物は吸引することができない。   First, the foreign matter 95 sucked through the through-hole 12 is sucked after passing through the space between the bottom surface 11 of the floating pad portion 2 and the diaphragm 92, and therefore the foreign matter 95 that can be sucked through the through-hole 12. The size is limited to a diameter smaller than the flying height of the pad portion 2 (distance between the diaphragm 92 and the bottom surface 11; in this embodiment, 50 μm to 100 μm). Accordingly, a relatively large foreign object cannot be sucked from the through hole 12.

これに対し、前述の通りカバー部3の下端部27の高さはパッド部2の底面11よりも高い位置にあるため、パッド部2の浮上量よりも径の大きい異物、たとえば図3に示す異物96であっても、下端部27と振動板92の間を通り抜けて開口部28の直下に到達することができ、このような異物96も開口部28を通じて清掃装置1内に吸引して清掃することが可能である。   On the other hand, since the height of the lower end portion 27 of the cover portion 3 is higher than the bottom surface 11 of the pad portion 2 as described above, a foreign matter having a diameter larger than the flying height of the pad portion 2, for example, shown in FIG. Even the foreign matter 96 can pass between the lower end portion 27 and the diaphragm 92 and reach directly below the opening portion 28. Such foreign matter 96 is also sucked into the cleaning device 1 through the opening portion 28 and cleaned. Is possible.

なお、本実施形態では、前述の通り下端部27は底面11よりも2mm〜3mm高い位置にあり、また、隙間24の幅もこの寸法以上であるため、清掃装置1は2mm〜3mm程度の径の異物96も吸引清掃することが可能である。ここで、振動板92上の2mm〜3mmを超える径の異物はクリーンルーム内のイエローランプ環境下であっても目視で容易に確認することができて手で除去するのも可能であるのに対し、2mm〜3mm以下の微小異物やパーティクルは目視での確認が難しくなる。これに対し、本発明の清掃装置1は目視で確認することが難しい異物95および異物96を全て吸引することを可能とし、振動板92全面を容易に清掃することが可能である。   In the present embodiment, as described above, the lower end portion 27 is at a position 2 mm to 3 mm higher than the bottom surface 11, and the width of the gap 24 is equal to or larger than this dimension, so that the cleaning device 1 has a diameter of about 2 mm to 3 mm. The foreign matter 96 can also be suction-cleaned. Here, foreign matter having a diameter exceeding 2 mm to 3 mm on the diaphragm 92 can be easily confirmed visually even in a yellow lamp environment in a clean room, and can be removed by hand. It is difficult to visually confirm minute foreign matters and particles of 2 mm to 3 mm or less. On the other hand, the cleaning device 1 of the present invention can suck all foreign matter 95 and foreign matter 96 that are difficult to visually confirm, and can easily clean the entire surface of the diaphragm 92.

また、本実施形態ではパッド部2に貫通孔12が設けられているが、この貫通孔12は異物95を吸引するだけでなく、清掃装置1のがたつきを抑え、清掃装置1の移動の制御を容易にする効果を有する。   In the present embodiment, the through-hole 12 is provided in the pad portion 2, but this through-hole 12 not only sucks the foreign matter 95, but also suppresses the rattling of the cleaning device 1 and prevents the movement of the cleaning device 1. It has the effect of facilitating control.

清掃装置1が振動板92上で超音波振動浮上した状態だと、振動板92の面と平行な方向(図3におけるXY平面と平行な方向)への移動に対して抵抗がほとんど無くなるため、僅かな外力によって清掃装置1が大きく移動し、かえって清掃装置1の移動の制御が困難になるおそれがある。これに対し、パッド部2に貫通孔12が設けられ、この貫通孔12を通して底面11近傍の外気が吸引されることにより、振動板92と底面11との間に吸着力が発生し、清掃装置1を振動板92に押さえつける効果が生じる。この吸着力と超音波振動による浮揚力(放射音圧)とのバランスによって振動板92の面と平行な方向への移動に対して適度の抵抗力を持たせることが可能である。これにより、清掃装置1の移動の制御が容易になる。   When the cleaning device 1 is in the state of ultrasonic vibration levitation on the diaphragm 92, there is almost no resistance to movement in a direction parallel to the plane of the diaphragm 92 (direction parallel to the XY plane in FIG. 3). The cleaning device 1 may move greatly due to a slight external force, and it may be difficult to control the movement of the cleaning device 1. On the other hand, the through-hole 12 is provided in the pad portion 2, and the outside air in the vicinity of the bottom surface 11 is sucked through the through-hole 12, whereby an adsorption force is generated between the diaphragm 92 and the bottom surface 11, and the cleaning device The effect of pressing 1 against the diaphragm 92 is produced. It is possible to give an appropriate resistance against movement in a direction parallel to the surface of the diaphragm 92 by a balance between the attraction force and the levitation force (radiated sound pressure) due to ultrasonic vibration. Thereby, control of movement of cleaning device 1 becomes easy.

一方、貫通孔12が無い場合でも、開口部28から外気を吸引することにより上記押さえつけの効果を得ることができるが、貫通孔12が設けられることにより、その効果を強化することができる。   On the other hand, even if there is no through-hole 12, the effect of pressing down can be obtained by sucking outside air from the opening 28, but the effect can be enhanced by providing the through-hole 12.

以上の清掃装置により、清掃対象物を傷つけることなく異物を除去することが可能である。   With the above cleaning device, foreign substances can be removed without damaging the object to be cleaned.

1 清掃装置
2 パッド部
3 カバー部
4 吸引手段
11 底面
12 貫通孔
21 天板
22 側板
23 連結部材
24 隙間
25 配管接続口
26 配管
27 下端部
28 開口部
90 浮上搬送熱処理装置
91 基板浮上装置
92 振動板
93 超音波発生部
94 加熱装置
95 異物
96 異物
W 基板
DESCRIPTION OF SYMBOLS 1 Cleaning apparatus 2 Pad part 3 Cover part 4 Suction means 11 Bottom surface 12 Through-hole 21 Top plate 22 Side plate 23 Connecting member 24 Gap 25 Pipe connection port 26 Pipe 27 Lower end part 28 Opening part 90 Levitation conveyance heat treatment apparatus 91 Substrate floating apparatus 92 Vibration Plate 93 Ultrasonic wave generator 94 Heating device 95 Foreign material 96 Foreign material W Substrate

Claims (2)

清掃対象物と対向する平坦な底面を有し、前記清掃対象物の超音波振動によって前記清掃対象物上で浮上するパッド部と、
前記パッド部の上面との間および前記パッド部の側面との間に隙間を有しながら前記パッド部の上面および側面を覆うカバー部と、
前記カバー部に接続され、前記パッド部と前記カバー部との隙間の気体を吸引する吸引手段と、
を備え、
前記カバー部の下端部と前記パッド部の側面との間には開口部が形成され、当該下端部は、前記パッド部の底面よりも高い位置にあることを特徴とする、清掃装置。
A pad portion that has a flat bottom surface facing the object to be cleaned, and floats on the object to be cleaned by ultrasonic vibration of the object to be cleaned;
A cover portion covering the upper surface and the side surface of the pad portion with a gap between the upper surface of the pad portion and the side surface of the pad portion;
A suction means connected to the cover part, for sucking a gas in a gap between the pad part and the cover part;
With
An opening is formed between the lower end part of the cover part and the side of the pad part, and the lower end part is in a position higher than the bottom face of the pad part.
前記パッド部は、前記パッド部の上面もしくは側面と底面とを貫通する貫通孔を有し、前記吸引手段は、前記貫通孔を経由して前記パッド部の底面近傍の気体も吸引することを特徴とする、請求項1に記載の清掃装置。   The pad portion has a through hole penetrating the top surface or side surface and bottom surface of the pad portion, and the suction means also sucks gas near the bottom surface of the pad portion through the through hole. The cleaning apparatus according to claim 1.
JP2013186894A 2013-09-10 2013-09-10 Cleaning device Expired - Fee Related JP6180245B2 (en)

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