JP6053246B1 - Electrode manufacturing method - Google Patents
Electrode manufacturing method Download PDFInfo
- Publication number
- JP6053246B1 JP6053246B1 JP2016546110A JP2016546110A JP6053246B1 JP 6053246 B1 JP6053246 B1 JP 6053246B1 JP 2016546110 A JP2016546110 A JP 2016546110A JP 2016546110 A JP2016546110 A JP 2016546110A JP 6053246 B1 JP6053246 B1 JP 6053246B1
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- JP
- Japan
- Prior art keywords
- silver fine
- producing
- electrode according
- fine particles
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920001864 tannin Polymers 0.000 description 1
- 235000018553 tannin Nutrition 0.000 description 1
- 239000001648 tannin Substances 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- YJGJRYWNNHUESM-UHFFFAOYSA-J triacetyloxystannyl acetate Chemical compound [Sn+4].CC([O-])=O.CC([O-])=O.CC([O-])=O.CC([O-])=O YJGJRYWNNHUESM-UHFFFAOYSA-J 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000000230 xanthan gum Substances 0.000 description 1
- 229920001285 xanthan gum Polymers 0.000 description 1
- 235000010493 xanthan gum Nutrition 0.000 description 1
- 229940082509 xanthan gum Drugs 0.000 description 1
Landscapes
- Inks, Pencil-Leads, Or Crayons (AREA)
- Electrodes Of Semiconductors (AREA)
- Thin Film Transistor (AREA)
Abstract
焼成温度が低くても、導電性を阻害しない程度の有機物残渣が少なく、耐熱性の低い基板等に適用でき、更に、TFT等の電極にも好適に利用できる電極の製造方法を提供する。本発明は、金属ナノ粒子を主成分とする導電性インクを印刷又は塗布することにより焼成前被膜を形成する第一工程と、前記焼成前被膜を焼成して導電性被膜を形成する第二工程と、前記導電性被膜の少なくとも一部に酸性溶液を接触させて洗浄する第三工程と、を含むことを特徴とする電極の製造方法である。Provided is an electrode manufacturing method which can be applied to a substrate having low heat resistance and low heat resistance even when the baking temperature is low, and which can be suitably used for an electrode such as a TFT. The present invention includes a first step of forming a pre-firing coating by printing or applying a conductive ink mainly composed of metal nanoparticles, and a second step of firing the pre-firing coating to form a conductive coating. And a third step of cleaning by bringing an acidic solution into contact with at least a part of the conductive coating.
Description
本発明は電極の製造方法に関し、例えば、薄膜トランジスタ(TFT)基板に対する電極として用いられる電極の製造方法に関する。 The present invention relates to an electrode manufacturing method, for example, an electrode manufacturing method used as an electrode for a thin film transistor (TFT) substrate.
従来から、基板の全面にスパッタや蒸着等で金属薄膜を形成させた後、フォトリソグラフィー法によって不要な部分をエッチングして必要な導電膜パターン(導電性被膜)を形成させる方法が知られている。しかしながら、当該方法は工程が煩雑であることに加え、高価な真空装置を用いる必要がある。 Conventionally, a method is known in which a metal thin film is formed on the entire surface of a substrate by sputtering or vapor deposition, and then an unnecessary portion is etched by photolithography to form a necessary conductive film pattern (conductive film). . However, this method requires complicated vacuum processes and an expensive vacuum apparatus.
このため、より簡便かつ安価な導電膜被膜の形成方法が求められており、近年、凸版印刷法、凹版印刷法、スクリーン印刷法、インクジェット印刷法等の印刷法を用いた方法が提案されている。更に、より高精細なパターンが形成できる印刷手法として、反転印刷法やマイクロコンタクト印刷法等を用いた方法が提案されており、これらの印刷法に適した導電性インク、絶縁性インク、及び抵抗インク等の各種インクが開発されている。 Therefore, a simpler and less expensive method for forming a conductive film has been demanded. In recent years, methods using printing methods such as letterpress printing, intaglio printing, screen printing, and inkjet printing have been proposed. . Furthermore, as a printing method capable of forming a higher-definition pattern, a method using a reverse printing method, a microcontact printing method, or the like has been proposed, and conductive ink, insulating ink, and resistance suitable for these printing methods are proposed. Various inks such as ink have been developed.
例えば、特許文献1(WO2008/111484号公報)では、凸版反転印刷法により導電性パターンを形成するための実質的にバインダー成分を含まない導電性インキであって、体積平均粒径(Mv)が10〜700nmの導電性粒子、離型剤、表面エネルギー調整剤、溶剤成分を必須成分とし、前記溶剤成分が25℃での表面エネルギーが27mN/m以上の溶剤と、大気圧下での沸点が120℃以下の揮発性の溶剤との混合物であり、25℃におけるインキの表面エネルギーが10〜21mN/mであることを特徴とする 導電性インキ、が提案されている。 For example, Patent Document 1 (WO2008 / 111484) discloses a conductive ink substantially free of a binder component for forming a conductive pattern by a relief printing method, and has a volume average particle size (Mv). Conductive particles of 10 to 700 nm, a release agent, a surface energy adjusting agent, and a solvent component are essential components, and the solvent component has a solvent having a surface energy of 27 mN / m or more at 25 ° C. and a boiling point under atmospheric pressure. There has been proposed a conductive ink, which is a mixture with a volatile solvent at 120 ° C. or lower and has a surface energy of 10 to 21 mN / m at 25 ° C.
上記特許文献1に記載の導電性インキにおいては、インキ組成の最適化によって転写残りが抑制されるので、完全転写を実現し、高精細な微細パターンの形成を容易化することができ、また、低沸点溶剤の揮発により、インキの付着性が短時間で得られる一方、高表面エネルギー溶剤の残留により、インキの凝集性が持続し、パターンが維持される、としている。 In the conductive ink described in Patent Document 1, since transfer residue is suppressed by optimizing the ink composition, complete transfer can be realized, and formation of a high-definition fine pattern can be facilitated. While the adhesion of ink can be obtained in a short time due to the volatilization of the low boiling point solvent, the cohesiveness of the ink is maintained and the pattern is maintained due to the residual high surface energy solvent.
また、例えば特許文献2(WO2010/113931号公報)においては、マイクロコンタクトプリント法や反転印刷法等、撥液性の転写用基版を用いてパターンを転写することにより有機トランジスタを形成する方法に最適なインキ、すなわち、撥液性の転写用基版表面に均一なインキ塗膜形成ができ、インキ乾燥膜又は半乾燥膜が転写基版より、被転写基材上に容易に転写することが出来る有機半導体インキ組成物、が提案されている。 Further, for example, in Patent Document 2 (WO2010 / 113931), a method for forming an organic transistor by transferring a pattern using a liquid-repellent transfer base plate, such as a microcontact printing method or a reversal printing method. Optimal ink, that is, a uniform ink coating can be formed on the surface of a liquid-repellent transfer base plate, and an ink-dried film or semi-dried film can be easily transferred onto a transfer substrate from the transfer base plate. A possible organic semiconductor ink composition has been proposed.
上記特許文献2に記載の有機半導体インキ組成物においては、形状が自在で部位選択的な精密・微細な有機半導体パターンを形成できると共に、優れた電気特性を有する有機トランジスタを製造でき、例えば、有機TFTを製造する際、回路の必要所用領域にのみ、有機半導体パターンを形成することができる、としている。 In the organic semiconductor ink composition described in Patent Document 2, an organic transistor having excellent electrical characteristics can be produced while forming an organic semiconductor pattern having excellent electrical characteristics while being capable of forming a shape-selective and site-selective. It is said that an organic semiconductor pattern can be formed only in a necessary area of a circuit when manufacturing a TFT.
しかしながら、上記特許文献1及び特許文献2に記載の方法を用いると、導電性被膜を形成させるための焼成温度が175℃以上となり、PET等の耐熱性の低い基板には適用することが困難である。 However, when the methods described in Patent Document 1 and Patent Document 2 are used, the firing temperature for forming the conductive film becomes 175 ° C. or higher, and it is difficult to apply to a substrate having low heat resistance such as PET. is there.
これに対し、本発明者は、耐熱性の低い基板にも適用可能な、焼成温度を低くしても十分な導電性を得ることができる、導電性インクを発明しているが(特願2014−238100及び特願2014−238101)、TFT等の電極に使用する場合、導電性を阻害しない程度の有機物残渣が半導体へのキャリア注入を効率的に行えない場合がある等の点で、未だ改善の余地があった。 On the other hand, the present inventors have invented a conductive ink that can be applied to a substrate having low heat resistance and can obtain sufficient conductivity even when the baking temperature is lowered (Japanese Patent Application No. 2014). -238100 and Japanese Patent Application No. 2014-238101), when used for an electrode such as a TFT, an organic residue that does not hinder the conductivity may not be able to efficiently inject carriers into the semiconductor. There was room for.
即ち、焼成温度を高くすれば有機物残渣を減らすことができるが、焼成温度が低いと有機物残渣を完全に除去できず少なからず有機物が残り、導電性を利用する場合には問題は無いが、電極として利用する場合には問題があるという点で改善の余地があった。 That is, if the firing temperature is increased, the organic residue can be reduced. However, if the firing temperature is low, the organic residue cannot be completely removed, and not a little organic matter remains. There was room for improvement in that there was a problem when using as.
そこで、本発明の目的は、焼成温度が低くても、導電性を阻害しない程度の有機物残渣が少なく、耐熱性の低い基板等に適用でき、更に、TFT等の電極にも好適に利用できる電極の製造方法を提供することにある。 Therefore, an object of the present invention is an electrode that can be applied to a substrate having a low amount of organic residue that does not impair conductivity even at a low baking temperature, and can be applied to an electrode such as a TFT. It is in providing the manufacturing method of.
本発明者は、上記目的を達成すべく鋭意研究を重ねた結果、低い焼成温度で形成した電極表面を特定の溶液に接触させれば、有機物残渣の極めて少ない電極を得ることができ、上記目的を達成する上で極めて有効であることを見出し、本発明に到達した。 As a result of intensive studies to achieve the above object, the present inventor can obtain an electrode with very little organic residue by bringing the electrode surface formed at a low baking temperature into contact with a specific solution. Has been found to be extremely effective in achieving the above, and the present invention has been achieved.
即ち、本発明は、
金属ナノ粒子を主成分とする導電性インクを印刷又は塗布することにより焼成前被膜を形成する第一工程と、
前記焼成前被膜を焼成して導電性被膜を形成する第二工程と、
前記導電性被膜の少なくとも一部に酸性溶液を接触させて洗浄する第三工程と、
を含むことを特徴とする電極の製造方法
を提供する。That is, the present invention
A first step of forming a pre-firing film by printing or applying a conductive ink mainly composed of metal nanoparticles;
A second step of firing the pre-fired coating to form a conductive coating;
A third step of cleaning by bringing an acidic solution into contact with at least a part of the conductive coating;
A method for manufacturing an electrode is provided.
このような構成を有する本発明の電極の製造方法によれば、導電性被膜の少なくとも一部を酸性溶液で洗浄する工程により、焼成温度が低くても、導電性を阻害しない程度の有機物残渣までをも効果的に除去することができ、したがって、TFT等の電極にも好適に利用できる電極が得られる。 According to the method for producing an electrode of the present invention having such a configuration, an organic residue that does not impede conductivity even at a low baking temperature is obtained by washing at least a part of the conductive film with an acidic solution. Therefore, an electrode that can be suitably used for an electrode such as a TFT can be obtained.
上記のような構成を有する本発明の電極の製造方法によれば、前記電極が薄膜トランジスタ(TFT)用の電極であることが好ましい。電極がTFTである場合に、上記のように、本発明の電極の製造方法により得られる電極はより好適に利用することができる。 According to the method for producing an electrode of the present invention having the above-described configuration, the electrode is preferably an electrode for a thin film transistor (TFT). When the electrode is a TFT, as described above, the electrode obtained by the method for producing an electrode of the present invention can be used more suitably.
上記のような構成を有する本発明の電極の製造方法においては、前記酸性溶液が硫酸を含むことが好ましい。 In the method for producing an electrode of the present invention having the above-described configuration, it is preferable that the acidic solution contains sulfuric acid.
このような構成を有する本発明の電極の製造方法によれば、導電性を阻害しない程度の有機物残渣までもより効果的に除去することができる。 According to the method for producing an electrode of the present invention having such a configuration, even an organic residue that does not inhibit conductivity can be more effectively removed.
ここで、本発明の電極の製造方法における前記導電性インクとしては、種々のものを使用することができるが、主として、下記に記述するものを好適に使用することができる。
(1)金属ナノ粒子と、炭素数が5以下である短鎖アミンと、高極性溶媒と、前記金属ナノ粒子を分散させるための酸価を有する分散剤と、を含み、前記短鎖アミンの分配係数logPが−1.0〜1.4である金属ナノ粒子分散体を含む(金属ナノ粒子分散体A)。
(2)金属ナノ粒子と、エタノールを含む溶媒と、水酸基を有する高沸点溶剤0.1〜3.0質量%と、を含む(導電性インクB)。Here, as the conductive ink in the electrode manufacturing method of the present invention, various inks can be used, but mainly those described below can be preferably used.
(1) comprising metal nanoparticles, a short-chain amine having 5 or less carbon atoms, a highly polar solvent, and a dispersant having an acid value for dispersing the metal nanoparticles, A metal nanoparticle dispersion having a partition coefficient logP of −1.0 to 1.4 is included (metal nanoparticle dispersion A).
(2) containing metal nanoparticles, a solvent containing ethanol, and 0.1 to 3.0% by mass of a high boiling point solvent having a hydroxyl group (conductive ink B).
上記金属ナノ粒子分散体Aでは、前記金属ナノ粒子分散体が、更に、酸価を有する保護分散剤を含むこと、が好ましい。
また、前記短鎖アミンがアルコキシアミンであること、が好ましい。
また、前記保護分散剤の酸価が5〜200であること、が好ましい。
更に、前記保護分散剤がリン酸由来の官能基を有すること、が好ましい。
更にまた、前記高極性溶媒がメタノール、エタノール、イソプロピルアルコール又はn−プロピルアルコールであること、が好ましい。In the metal nanoparticle dispersion A, it is preferable that the metal nanoparticle dispersion further contains a protective dispersant having an acid value.
Moreover, it is preferable that the said short chain amine is an alkoxyamine.
Moreover, it is preferable that the acid value of the said protective dispersant is 5-200.
Furthermore, it is preferable that the protective dispersant has a functional group derived from phosphoric acid.
Furthermore, it is preferable that the highly polar solvent is methanol, ethanol, isopropyl alcohol or n-propyl alcohol.
上記導電性インクBでは、前記高沸点溶剤が、1,3−ブチレングリコール、2,4−ジエチル−1,5−ペンタンジオール又はオクタンジオールを含むこと、が好ましい。
また、前記導電性インクBは、更にハイドロフルオロエーテルを含むこと、が好ましい。In the conductive ink B, the high boiling point solvent preferably contains 1,3-butylene glycol, 2,4-diethyl-1,5-pentanediol or octanediol.
Further, it is preferable that the conductive ink B further contains a hydrofluoroether.
本発明の電極の製造方法によれば、焼成温度が低くても、導電性を阻害しない程度の有機物残渣が少なく、耐熱性の低い基板等に適用でき、更に、TFT等の電極にも好適に利用できる電極の製造方法を提供することができる。 According to the method for producing an electrode of the present invention, even if the firing temperature is low, the organic matter residue is small enough not to impede conductivity, and can be applied to a substrate having low heat resistance, and is also suitable for an electrode such as a TFT. An electrode manufacturing method that can be used can be provided.
本発明は、金属ナノ粒子を主成分とする導電性インクを印刷又は塗布することにより焼成前被膜を形成する第一工程と、前記焼成前被膜を焼成して導電性被膜を形成する第二工程と、前記導電性被膜の少なくとも一部に酸性溶液を接触させて洗浄する第三工程と、を含むことを特徴とする。 The present invention includes a first step of forming a pre-firing coating by printing or applying a conductive ink mainly composed of metal nanoparticles, and a second step of firing the pre-firing coating to form a conductive coating. And a third step of cleaning by bringing an acidic solution into contact with at least a part of the conductive film.
第一工程
第一工程においては、金属ナノ粒子を主成分とする導電性インクを印刷又は塗布することにより焼成前被膜を形成する。この第一工程における印刷や塗布の方法については、従来公知の方法を採用することができる。焼成前被膜の形状やパターンについても、従来公知のものでよい。 First Step In the first step, a pre-firing film is formed by printing or applying a conductive ink mainly composed of metal nanoparticles. Conventionally known methods can be employed for the printing and coating methods in the first step. The shape and pattern of the pre-firing film may also be a conventionally known one.
この導電性インクは、本実施形態においては、銀微粒子(銀ナノ粒子)と、炭素数が5以下である短鎖アミンと、高極性溶媒と、前記銀微粒子を分散させるための酸価を有する分散剤と、を含む銀微粒子分散体で構成されている。なかでも、前記短鎖アミンの分配係数logPが−1.0〜1.4であるのが好ましい(上記の金属ナノ粒子分散体A)。 In this embodiment, the conductive ink has silver fine particles (silver nanoparticles), a short-chain amine having 5 or less carbon atoms, a highly polar solvent, and an acid value for dispersing the silver fine particles. And a silver fine particle dispersion containing a dispersant. Especially, it is preferable that the distribution coefficient logP of the said short chain amine is -1.0-1.4 (said metal nanoparticle dispersion A).
上記銀微粒子分散体は、種々の溶媒(特に高極性溶媒)に銀微粒子が均一分散した低温焼結性を有する銀微粒子分散体であり、導電性被膜を当該銀微粒子複合体の焼結によって形成することで、良好な導電性を有する導電性被膜を低温で形成することができる。なかでも、本実施形態に記載の特定の銀ナノ粒子で構成される導電性被膜が好ましいのは、後述するアミン系の分散剤を用いることにより、必ずしも理由は明らかではないが、酸性溶液とアミン系の分散剤がより相互作用しやすく、清浄効果が発揮されるためであると考えている。特に後述する銀ナノ粒子を用いることによって、低温焼成可能で良好なTFT特性を発揮できる電極をより確実に得ることができる。 The above-mentioned silver fine particle dispersion is a silver fine particle dispersion having a low temperature sintering property in which silver fine particles are uniformly dispersed in various solvents (especially highly polar solvents), and a conductive film is formed by sintering the silver fine particle composite. By doing so, a conductive film having good conductivity can be formed at a low temperature. Among these, the conductive film composed of the specific silver nanoparticles described in the present embodiment is preferable because the reason is not always clear by using an amine-based dispersant described later, but an acidic solution and an amine. This is because the dispersant in the system is more likely to interact and the cleaning effect is exhibited. In particular, by using silver nanoparticles described later, an electrode that can be fired at a low temperature and can exhibit good TFT characteristics can be obtained more reliably.
アミンの一分子内におけるアミノ基は、比較的高い極性を有し、水素結合による相互作用を生じ易いが、これら官能基以外の部分は比較的低い極性を有する。更に、アミノ基は、それぞれアルカリ性的性質を示し易い。したがって、アミンは、銀微粒子の表面の少なくとも一部に局在化(付着)すると(即ち、銀微粒子の表面の少なくとも一部を被覆すると)、有機成分と無機粒子とを十分に親和させることができ、銀微粒子同士の凝集を防ぐことができる(分散性を向上させる)。即ち、アミンは官能基が銀微粒子の表面に適度の強さで吸着し、銀微粒子同士の相互の接触を妨げるため、保管状態での銀微粒子の安定性に寄与する。また、加熱によって銀微粒子の表面から移動及び又は揮発することにより、銀微粒子同士の融着を促進するものと考えられる。 An amino group in one molecule of the amine has a relatively high polarity and is likely to cause an interaction due to hydrogen bonding, but a portion other than these functional groups has a relatively low polarity. Furthermore, each amino group tends to exhibit alkaline properties. Accordingly, when the amine is localized (attached) on at least a part of the surface of the silver fine particles (that is, when at least a part of the surface of the silver fine particles is coated), the amine and the inorganic particles can sufficiently have an affinity. And aggregation of silver fine particles can be prevented (dispersibility is improved). That is, the functional group of amine is adsorbed on the surface of the silver fine particles with an appropriate strength and prevents mutual contact between the silver fine particles, thereby contributing to the stability of the silver fine particles in the storage state. Moreover, it is thought that the fusion | melting of silver fine particles is accelerated | stimulated by moving and / or volatilizing from the surface of silver fine particles by heating.
また、銀微粒子分散体を構成するアミンを炭素数が5以下である短鎖アミンとすることで、加熱によって銀微粒子の表面の少なくとも一部に付着したアミンを容易に除去することができ、銀微粒子の良好な低温焼結性(例えば、100〜350℃における焼結性)を担保することができる。 Further, by making the amine constituting the silver fine particle dispersion a short chain amine having 5 or less carbon atoms, the amine attached to at least a part of the surface of the silver fine particles by heating can be easily removed. Good low-temperature sinterability (for example, sinterability at 100 to 350 ° C.) of the fine particles can be ensured.
また、短鎖アミンの分配係数logPを−1.0〜1.4とするのは、分配係数logPが−1.0以下になれば、短鎖アミンの極性が高すぎるため、銀の還元が急速に進んでしまい銀微粒子生成の制御が困難となり、分配係数logPが1.5以上になれば、銀に配位するアミンの極性が低い為に高極性溶媒に分散しづらくなるからである。 Moreover, the distribution coefficient logP of the short-chain amine is set to -1.0 to 1.4. If the distribution coefficient logP is -1.0 or less, the polarity of the short-chain amine is too high. This is because it rapidly proceeds and it becomes difficult to control the formation of silver fine particles, and if the distribution coefficient logP is 1.5 or more, it is difficult to disperse in a highly polar solvent because the polarity of amine coordinated to silver is low.
分配係数logPは、溶媒としてn−オクタノールと水を用いたオクタノール/水分配係数を意味しており、オクタノール中の濃度Coと水中の濃度Cwをそれぞれ求め、濃度比P=Co/Cwの常用対数 logPを分配係数として算出する。そのため、分配係数logPは銀微粒子がどの範囲の極性溶媒で分散させうることが可能かどうかを表す一つの指標であることを意味する。分配係数logPの測定方法は特に限定されず、例えば、フラスコ振盪法、高速液体クロマトグラフィー(HPLC)法、及び定量的構造活性相関アルゴリズムを用いた計算等によって求めることができるが、国立生物工学情報センター等のウェブサイトで公表されている文献値を用いてもよい。 The partition coefficient logP means an octanol / water partition coefficient using n-octanol and water as solvents, and obtains a concentration Co in octanol and a concentration Cw in water, respectively, and a common logarithm of concentration ratio P = Co / Cw. Log P is calculated as a distribution coefficient. Therefore, the distribution coefficient logP means that it is one index that indicates whether or not a range of polar solvent can disperse the silver fine particles. The method for measuring the partition coefficient logP is not particularly limited, and can be determined by, for example, flask shaking method, high performance liquid chromatography (HPLC) method, and calculation using a quantitative structure-activity relationship algorithm. Literature values published on websites such as centers may be used.
更に、銀微粒子分散体は、銀微粒子合成後に添加される酸価を有する分散剤(即ち、銀微粒子を分散させるための酸価を有する分散剤)を含むことを特徴とする。ここでいう「酸価を有する分散剤」とは、吸着基乃至は官能基としてアミン価や水酸基価等を有さない分散剤全てを包含するものである。かかる分散剤を用いることで、溶媒中の銀微粒子の分散安定性を向上させることができる。当該分散剤の酸価は5〜200であることが好ましく、また、当該分散剤がリン酸由来の官能基を有することが好ましい。「酸価を有する分散剤」が好ましい理由は、必ずしも明らかではないが、本発明者らは、金属への吸着作用だけではなく、短鎖アミンと相互作用することによって、より密な形態で吸着することができ、低温焼結性を有しつつ高い分散性を発現させているものと考えている。 Further, the silver fine particle dispersion includes an acid value dispersant added after the synthesis of the silver fine particles (that is, a dispersant having an acid value for dispersing the silver fine particles). The “dispersant having an acid value” as used herein includes all dispersants that do not have an amine value or a hydroxyl value as an adsorbing group or a functional group. By using such a dispersant, the dispersion stability of the silver fine particles in the solvent can be improved. The acid value of the dispersant is preferably 5 to 200, and the dispersant preferably has a functional group derived from phosphoric acid. The reason why the “dispersant having an acid value” is preferable is not necessarily clear, but the present inventors not only adsorb metal, but also adsorb in a denser form by interacting with a short chain amine. It is thought that it exhibits high dispersibility while having low-temperature sinterability.
後述する高極性溶剤に銀微粒子を分散させたい場合は、一般的に極性の高い分散剤を使用することが有効である。例えばlogPがより小さい短鎖アミンを用いることが考えられるが、短鎖アミンは一般的に還元性を発揮して反応速度を適切に保てない場合がある。具体的には、反応速度を過剰に高めてしまい、分散性に優れた銀微粒子を形成できない場合がある。そこで、より高極性な分散剤を銀微粒子合成後に添加することで、銀微粒子はそのままに分散媒に対する相溶性のみを高めること(表面改質)が可能となる。 When it is desired to disperse silver fine particles in a highly polar solvent described later, it is generally effective to use a highly polar dispersant. For example, it is conceivable to use a short-chain amine having a lower log P, but the short-chain amine generally exhibits reducibility and may not keep the reaction rate properly. Specifically, the reaction rate is excessively increased, and silver fine particles having excellent dispersibility may not be formed. Therefore, by adding a more polar dispersant after the synthesis of the silver fine particles, it is possible to improve only the compatibility with the dispersion medium (surface modification) while leaving the silver fine particles intact.
分散剤の酸価が5以上であるとアミンと配位し粒子表面が塩基性となっている金属物への酸塩基相互作用での吸着が起こり始め、200以下であると過度に吸着サイトを有さないため好適な形態で吸着するから好ましい。また、分散剤がリン酸由来の官能基を有することでリンPが酸素Oを介して金属Mと相互作用し引き合うので金属や金属化合物との吸着には最も効果的であり、必要最小限の吸着量で好適な分散性を得ることができるから好ましい。ここで「酸価」とは、試料1g中に含まれる酸性成分を中和するのに要する水酸化カリウムのmg数で表される。酸価の測定法として、指示薬法(p−ナフトールベンゼイン指示薬)や電位差滴定法をあげることができる。
・ISO6618−1997:指示薬滴定法による中和価試験法→指示薬滴定法(酸価)に対応
・ISO6619−1988:電位差滴定法(酸価)→電位差滴定法(酸価)に対応When the acid value of the dispersant is 5 or more, adsorption by an acid-base interaction starts to occur on a metal substance coordinated with an amine and the particle surface is basic, and if it is 200 or less, an adsorption site is excessively formed. Since it does not have, it adsorb | sucks in a suitable form, and is preferable. In addition, since the dispersant has a functional group derived from phosphoric acid, phosphorus P interacts with and attracts the metal M through the oxygen O, and is therefore most effective for adsorption with metals and metal compounds. It is preferable because suitable dispersibility can be obtained by the amount of adsorption. Here, the “acid value” is expressed in mg of potassium hydroxide required to neutralize the acidic component contained in 1 g of the sample. Examples of the acid value measurement method include an indicator method (p-naphtholbenzein indicator) and a potentiometric titration method.
ISO6618-1997: Neutralization titration method by indicator titration method → Corresponding to indicator titration method (acid value) ISO6619-1988: Corresponding to potentiometric titration method (acid value) → Potentiometric titration method (acid value)
銀微粒子分散体は、更に、銀微粒子合成前に添加される保護剤としての酸価を有する分散剤(保護分散剤)を含んでいてもよい。ここでいう「保護分散剤」は、上記の銀微粒子合成後に添加される「酸価を有する分散剤」と同じであってもよい。 The silver fine particle dispersion may further contain a dispersant (protective dispersant) having an acid value as a protective agent added before the synthesis of the silver fine particles. The “protective dispersant” herein may be the same as the “dispersant having an acid value” added after the synthesis of the silver fine particles.
また、銀微粒子分散体においては、溶媒として種々の溶媒、特に高極性溶媒を用いることができる。高極性溶媒とは、一般的に水や炭素数の短いアルコールなど、ヘキサンやトルエンのような低極性溶剤と相溶しにくいものを意味するが、本発明においては炭素数1〜6のアルコールを用いることがより好ましい。高極性溶媒として炭素数1〜6のアルコールとすることで、低極性溶媒を用いた時の不具合、例えば樹脂上で銀微粒子分散体を積層した際に、溶媒が下地の樹脂層を侵すことを回避できる。ここで、アミンにはアルコキシアミンを用いることが好ましい。アミンをアルコキシアミンとすることで、銀微粒子を高極性溶媒に良好に分散させることができる。さらに、必ずしもその機構は明らかではないが、アルコキシアミンのアルコキシ基が水蒸気と効率良く相互作用するために、十分な粒成長を促すことができる点においても好ましい。 In the silver fine particle dispersion, various solvents, particularly high polarity solvents can be used as the solvent. A highly polar solvent means a solvent that is generally incompatible with a low polarity solvent such as hexane or toluene, such as water or an alcohol having a short carbon number. In the present invention, an alcohol having 1 to 6 carbon atoms is used. More preferably, it is used. By using an alcohol having 1 to 6 carbon atoms as a high polarity solvent, it is possible to cause problems when a low polarity solvent is used, for example, when a silver fine particle dispersion is laminated on a resin, the solvent invades the underlying resin layer. Can be avoided. Here, it is preferable to use an alkoxyamine as the amine. By using alkoxyamine as the amine, the silver fine particles can be favorably dispersed in the highly polar solvent. Furthermore, although the mechanism is not necessarily clear, the alkoxy group of alkoxyamine interacts efficiently with water vapor, which is preferable in that sufficient grain growth can be promoted.
銀微粒子分散体を構成する銀微粒子の粒径は、融点降下が生じるようなナノメートルサイズ、望ましくは1〜200nmが適切であるが、必要に応じてミクロンメートルサイズの粒子が含まれていてもよい。 The particle size of the silver fine particles constituting the silver fine particle dispersion is suitably a nanometer size that desirably causes a melting point drop, preferably 1 to 200 nm. However, if necessary, even if particles of a micrometer size are included. Good.
本実施形態において得られる導電性被膜は銀微粒子から形成され、それを外部加熱によって形成した焼結体であり、銀微粒子が本来有する導電性と同程度の良好な導電性を有している。導電性被膜の形成に用いる銀微粒子分散体(導電性インク)について、以下において更に詳細に述べる。 The conductive film obtained in the present embodiment is a sintered body formed from silver fine particles and formed by external heating, and has good conductivity comparable to that inherent in the silver fine particles. The silver fine particle dispersion (conductive ink) used for forming the conductive film will be described in more detail below.
導電性被膜の形成に用いる銀微粒子分散体(導電性インク)は、本発明の効果を損なわない限りにおいて特に限定されず、従来公知の種々の銀微粒子分散体を用いることができるが、銀微粒子と、炭素数が5以下である短鎖アミンと、高極性溶媒と、銀微粒子を分散させるための酸価を有する分散剤と、を含む短鎖アミンの分配係数logPが−1.0〜1.4である銀微粒子分散体を用いることが好ましい。 The silver fine particle dispersion (conductive ink) used for forming the conductive film is not particularly limited as long as the effects of the present invention are not impaired, and various conventionally known silver fine particle dispersions can be used. A short chain amine having a carbon number of 5 or less, a highly polar solvent, and a dispersant having an acid value for dispersing silver fine particles, the partition coefficient log P of the short chain amine is -1.0 to 1 It is preferable to use a silver fine particle dispersion of .4.
上記銀微粒子分散体は、種々の溶媒(特に高極性溶媒)に銀微粒子が均一分散した低温焼結性を有する銀微粒子分散体であり、導電性被膜を当該銀微粒子複合体の焼結によって形成することで、良好な導電性を有する導電性被膜を低温で形成することができる。 The above-mentioned silver fine particle dispersion is a silver fine particle dispersion having a low temperature sintering property in which silver fine particles are uniformly dispersed in various solvents (especially highly polar solvents), and a conductive film is formed by sintering the silver fine particle composite. By doing so, a conductive film having good conductivity can be formed at a low temperature.
(A)銀微粒子
本実施形態の銀微粒子分散体における銀微粒子の平均粒径は、本発明の効果を損なわない範囲であれば特に制限されるものではないが、融点降下が生じるような平均粒径を有するのが好ましく、例えば、1〜200nmであればよい。更には、2〜100nmであるのが好ましい。銀微粒子の平均粒径が1nm以上であれば、銀微粒子が良好な低温焼結性を具備すると共に銀微粒子製造がコスト高とならず実用的である。また、200nm以下であれば、銀微粒子の分散性が経時的に変化しにくく、好ましい。(A) Silver fine particles The average particle size of the silver fine particles in the silver fine particle dispersion of the present embodiment is not particularly limited as long as the effect of the present invention is not impaired. It is preferable to have a diameter, for example, it may be 1 to 200 nm. Furthermore, it is preferable that it is 2-100 nm. If the average particle diameter of the silver fine particles is 1 nm or more, the silver fine particles have good low-temperature sinterability, and the production of silver fine particles is practical without increasing the cost. Moreover, if it is 200 nm or less, the dispersibility of a silver fine particle does not change easily over time, and it is preferable.
銀微粒子分散体を、例えばマイグレーションの問題を考慮して、イオン化列が水素より貴である金属、即ち金、銅、白金、パラジウム等の粒子を添加してもよい。 The silver fine particle dispersion may be added with a metal whose ionization column is more noble than hydrogen, that is, gold, copper, platinum, palladium, or the like in consideration of migration problems.
なお、本実施形態の銀微粒子分散体における銀微粒子の粒径は、一定でなくてもよい。また、銀微粒子分散体が、任意成分として、後述する分散剤等を含む場合、平均粒径が200nm超の金属粒子成分を含む場合があるが、凝集を生じたりせず、本発明の効果を著しく損なわない成分であればかかる200nm超の平均粒径を有する金属粒子成分を含んでもよい。 Note that the particle size of the silver fine particles in the silver fine particle dispersion of the present embodiment may not be constant. In addition, when the silver fine particle dispersion contains a dispersant described later as an optional component, it may contain a metal particle component having an average particle size of more than 200 nm, but it does not cause aggregation, and the effect of the present invention is achieved. A metal particle component having an average particle diameter of more than 200 nm may be included as long as the component is not significantly impaired.
ここで、本実施形態の銀微粒子分散体における銀微粒子の粒径は、動的光散乱法、小角X線散乱法、広角X線回折法で測定することができる。ナノサイズの銀微粒子の融点降下を示すためには、広角X線回折法で求めた結晶子径が適当である。例えば広角X線回折法では、より具体的には、理学電機(株)製のRINT−UltimaIIIを用いて、回折法で2θが30〜80°の範囲で測定することができる。この場合、試料は、中央部に深さ0.1〜1mm程度の窪みのあるガラス板に表面が平坦になるように薄くのばして測定すればよい。また、理学電機(株)製のJADEを用い、得られた回折スペクトルの半値幅を下記のシェラー式に代入することにより算出された結晶子径(D)を粒径とすればよい。
D=Kλ/Bcosθ
ここで、K:シェラー定数(0.9)、λ:X線の波長、B:回折線の半値幅、θ:ブラッグ角である。Here, the particle size of the silver fine particles in the silver fine particle dispersion of the present embodiment can be measured by a dynamic light scattering method, a small-angle X-ray scattering method, and a wide-angle X-ray diffraction method. In order to show the melting point drop of nano-sized silver fine particles, the crystallite diameter determined by the wide-angle X-ray diffraction method is appropriate. For example, in the wide-angle X-ray diffraction method, more specifically, Rθ-UtimaIII manufactured by Rigaku Corporation can be used to measure 2θ in the range of 30 to 80 ° by the diffraction method. In this case, the sample may be measured by extending it thinly so that the surface is flat on a glass plate having a depression of about 0.1 to 1 mm in depth at the center. The crystallite diameter (D) calculated by substituting the half width of the obtained diffraction spectrum into the following Scherrer equation using JADE manufactured by Rigaku Corporation may be used as the particle diameter.
D = Kλ / Bcos θ
Here, K: Scherrer constant (0.9), λ: wavelength of X-ray, B: half width of diffraction line, θ: Bragg angle.
(B)炭素数が5以下である短鎖アミン
本実施形態の銀微粒子分散体において、銀微粒子の表面の少なくとも一部には炭素数が5以下である短鎖アミンが付着している。なお、銀微粒子の表面には、原料に最初から不純物として含まれる微量有機物、後述する製造過程で混入する微量有機物、洗浄過程で除去しきれなかった残留還元剤、残留分散剤等のように、微量の有機物が付着していてもよい。(B) Short-chain amine having 5 or less carbon atoms In the silver fine particle dispersion of this embodiment, a short-chain amine having 5 or less carbon atoms is attached to at least a part of the surface of the silver fine particles. In addition, on the surface of the silver fine particles, a trace amount of organic matter contained as an impurity from the beginning, a trace amount of organic matter mixed in the manufacturing process described later, a residual reducing agent that could not be removed in the cleaning process, a residual dispersant, etc. A trace amount of organic matter may be attached.
炭素数が5以下である短鎖アミンは分配係数logPが−1.0〜1.4であれば特に限定されず、直鎖状であっても分岐鎖状であってもよく、また、側鎖を有していてもよい。当該短鎖アミンとしては、例えば、エチルアミン(−0.3)プロピルアミン(0.5)、ブチルアミン(1.0)、N−(3−メトキシプロピル)プロパン−1,3−ジアミン(−0.6)、1,2−エタンジアミン、N−(3−メトキシプロピル)ホルムアミド(−0.2),2−メトキシエチルアミン(−0.9)、3−メトキシプロピルアミン(−0.5)、3−エトキシプロピルアミン(−0.1)、1,4−ブタンジアミン(−0.9)、1,5−ペンタンジアミン(−0.6)、ペンタノールアミン(−0.3)、アミノイソブタノール(−0.8)等が挙げられるが、なかでもアルコキシアミンを用いることが好ましい。 The short-chain amine having 5 or less carbon atoms is not particularly limited as long as the distribution coefficient logP is −1.0 to 1.4, and may be linear or branched. You may have a chain. Examples of the short chain amine include ethylamine (−0.3) propylamine (0.5), butylamine (1.0), N- (3-methoxypropyl) propane-1,3-diamine (−0. 6), 1,2-ethanediamine, N- (3-methoxypropyl) formamide (-0.2), 2-methoxyethylamine (-0.9), 3-methoxypropylamine (-0.5), 3 -Ethoxypropylamine (-0.1), 1,4-butanediamine (-0.9), 1,5-pentanediamine (-0.6), pentanolamine (-0.3), aminoisobutanol (-0.8) and the like are mentioned, among which alkoxyamine is preferably used.
上記短鎖アミンは、例えば、ヒドロキシル基、カルボキシル基、アルコキシ基、カルボニル基、エステル基、メルカプト基等の、アミン以外の官能基を含む化合物であってもよい。また、上記アミンは、それぞれ単独で用いてもよく、2種以上を併用してもよい。加えて、常圧での沸点が300℃以下、更には250℃以下であることが好ましい。 The short chain amine may be a compound containing a functional group other than an amine, such as a hydroxyl group, a carboxyl group, an alkoxy group, a carbonyl group, an ester group, or a mercapto group. Moreover, the said amine may be used independently, respectively and may use 2 or more types together. In addition, the boiling point at normal pressure is preferably 300 ° C. or lower, more preferably 250 ° C. or lower.
本実施形態の銀粒子分散体は、本発明の効果を損なわない範囲であれば、上記の炭素数が5以下である短鎖アミンに加えて、カルボン酸を含んでいてもよい。カルボン酸の一分子内におけるカルボキシル基が、比較的高い極性を有し、水素結合による相互作用を生じ易いが、これら官能基以外の部分は比較的低い極性を有する。更に、カルボキシル基は、酸性的性質を示し易い。また、カルボン酸は、本実施形態の銀粒子分散体中で、銀微粒子の表面の少なくとも一部に局在化(付着)すると(即ち、銀微粒子の表面の少なくとも一部を被覆すると)、溶媒と銀微粒子とを十分に親和させることができ、銀微粒子同士の凝集を防ぐことができる(分散性を向上させる。)。 The silver particle dispersion of the present embodiment may contain a carboxylic acid in addition to the short-chain amine having 5 or less carbon atoms as long as the effects of the present invention are not impaired. The carboxyl group in one molecule of the carboxylic acid has a relatively high polarity and tends to cause an interaction due to a hydrogen bond, but a portion other than these functional groups has a relatively low polarity. Furthermore, the carboxyl group tends to exhibit acidic properties. In addition, when the carboxylic acid is localized (attached) on at least a part of the surface of the silver fine particles (that is, covers at least a part of the surface of the silver fine particles) in the silver particle dispersion of this embodiment, the solvent And silver fine particles can be made to sufficiently adhere to each other and aggregation of silver fine particles can be prevented (dispersibility is improved).
カルボン酸としては、少なくとも1つのカルボキシル基を有する化合物を広く用いることができ、例えば、ギ酸、シュウ酸、酢酸、ヘキサン酸、アクリル酸、オクチル酸、オレイン酸等が挙げられる。カルボン酸の一部のカルボキシル基が金属イオンと塩を形成していてもよい。なお、当該金属イオンについては、2種以上の金属イオンが含まれていてもよい。 As the carboxylic acid, compounds having at least one carboxyl group can be widely used, and examples thereof include formic acid, oxalic acid, acetic acid, hexanoic acid, acrylic acid, octylic acid, and oleic acid. A part of carboxyl groups of the carboxylic acid may form a salt with a metal ion. In addition, about the said metal ion, 2 or more types of metal ions may be contained.
上記カルボン酸は、例えば、アミノ基、ヒドロキシル基、アルコキシ基、カルボニル基、エステル基、メルカプト基等の、カルボキシル基以外の官能基を含む化合物であってもよい。この場合、カルボキシル基の数が、カルボキシル基以外の官能基の数以上であることが好ましい。また、上記カルボン酸は、それぞれ単独で用いてもよく、2種以上を併用してもよい。加えて、常圧での沸点が300℃以下、更には250℃以下であることが好ましい。また、アミンとカルボン酸はアミドを形成する。当該アミド基も銀微粒子表面に適度に吸着するため、銀微粒子表面にはアミド基が付着していてもよい。 The carboxylic acid may be a compound containing a functional group other than a carboxyl group, such as an amino group, a hydroxyl group, an alkoxy group, a carbonyl group, an ester group, or a mercapto group. In this case, the number of carboxyl groups is preferably equal to or greater than the number of functional groups other than carboxyl groups. Moreover, the said carboxylic acid may be used independently, respectively and may use 2 or more types together. In addition, the boiling point at normal pressure is preferably 300 ° C. or lower, more preferably 250 ° C. or lower. Also, amines and carboxylic acids form amides. Since the amide group also adsorbs moderately on the surface of the silver fine particles, the amide group may adhere to the surface of the silver fine particles.
銀微粒子と当該銀微粒子の表面に付着した有機物(上記炭素数が5以下である短鎖アミン等)によってコロイドが構成される場合、当該コロイド中の有機成分の含有量は、0.5〜50質量%であることが好ましい。有機成分含有量が0.5質量%以上であれば、得られる銀微粒子分散体の貯蔵安定性が良くなる傾向があり、50質量%以下であれば、銀微粒子分散体を加熱して得られる焼成体の導電性が良い傾向がある。有機成分のより好ましい含有量は1〜30質量%であり、更に好ましい含有量は2〜15質量%である。 When the colloid is constituted by silver fine particles and organic substances (such as the short-chain amine having 5 or less carbon atoms) attached to the surface of the silver fine particles, the content of the organic component in the colloid is 0.5 to 50 It is preferable that it is mass%. If the organic component content is 0.5% by mass or more, the storage stability of the resulting silver fine particle dispersion tends to be improved, and if it is 50% by mass or less, the silver fine particle dispersion is obtained by heating. There exists a tendency for the electroconductivity of a sintered body to be good. The more preferable content of the organic component is 1 to 30% by mass, and the more preferable content is 2 to 15% by mass.
(C)高極性溶媒
本実施形態の銀微粒子分散体は、種々の高極性溶媒に銀微粒子が分散したものである。(C) High Polar Solvent The silver fine particle dispersion of the present embodiment is obtained by dispersing silver fine particles in various high polar solvents.
上記溶媒としては、本発明の効果を損なわない範囲で、種々の高極性溶媒を用いることができる。高極性溶媒としては、メタノール、エタノール、プロパノール、イソプロパノール、ブタノール、イソブタノール、2−ブタノール、ペンタノール、ヘキサノール、イソアミルアルコール、フルフリルアルコール、ニトロメタン、アセトニトリル、ピリジン、アセトンクレゾール、ジメチルホルムアミド、ジオキサン、エチレングリコール、グリセリン、フェノール、p−クレゾール、酢酸プロピル、酢酸イソプロピル、tert−ブタノール、1−ペンタノール、2−ペンタノール、4−メチル−2−ペンタノール、3−メチル−1−ペンタノール、3−メチル−2−ペンタノール、2−ブタノール、1−ヘキサノール、2−ヘキサノール2−ペンタノン、2−ヘプタノン、酢酸2−(2−エトキシエトキシ)エチル、酢酸−2−ブトキシエチル、酢酸2−(2−ブトキシエトキシ)エチル、酢酸−2−メトキシエチル、2−ヘキシルオキシエタノール等を例示することができるが、本発明では前記炭素数が5以下の短鎖アミンと相溶性が良好であるため、炭素数1〜6のアルコールを用いることが好ましい。なお、これらの溶媒はそれぞれ単独で用いてもよく、2種以上を併用してもよい。 As the solvent, various highly polar solvents can be used as long as the effects of the present invention are not impaired. High polar solvents include methanol, ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, pentanol, hexanol, isoamyl alcohol, furfuryl alcohol, nitromethane, acetonitrile, pyridine, acetone cresol, dimethylformamide, dioxane, ethylene Glycol, glycerin, phenol, p-cresol, propyl acetate, isopropyl acetate, tert-butanol, 1-pentanol, 2-pentanol, 4-methyl-2-pentanol, 3-methyl-1-pentanol, 3- Methyl-2-pentanol, 2-butanol, 1-hexanol, 2-hexanol 2-pentanone, 2-heptanone, 2- (2-ethoxyethoxy) ethyl acetate, 2-butoxy acetate Examples include chill, 2- (2-butoxyethoxy) ethyl acetate, 2-methoxyethyl acetate, 2-hexyloxyethanol, etc., but the present invention is compatible with the short-chain amine having 5 or less carbon atoms. Is preferable, alcohol having 1 to 6 carbon atoms is preferably used. These solvents may be used alone or in combination of two or more.
(D)分散剤
本実施形態の銀粒子分散体には、更に、銀微粒子を分散させるために銀微粒子合成後に添加される「酸価を有する分散剤」を含む。かかる分散剤を用いることで、溶媒中の銀微粒子の分散安定性を向上させることができる。ここで、当該分散剤の酸価は5〜200であることがより好ましく、また、当該分散剤がリン酸由来の官能基を有することが更に好ましい。(D) Dispersant The silver particle dispersion of the present embodiment further includes a “dispersant having an acid value” added after the synthesis of silver fine particles in order to disperse the silver fine particles. By using such a dispersant, the dispersion stability of the silver fine particles in the solvent can be improved. Here, the acid value of the dispersant is more preferably 5 to 200, and the dispersant further preferably has a functional group derived from phosphoric acid.
分散剤の酸価が5以上であるとアミンと配位し粒子表面が塩基性となっている金属物への酸塩基相互作用での吸着が起こり始めるからであり、200以下であると過度に吸着サイトを有さないため好適な形態で吸着するからである。また、分散剤がリン酸由来の官能基を有することでリンPが酸素Oを介して金属Mと相互作用し引き合うので金属や金属化合物との吸着には最も効果的であり、必要最小限の吸着量で好適な分散性を得ることができるからである。 If the acid value of the dispersant is 5 or more, adsorption with an acid-base interaction starts to occur on a metal substance that coordinates with the amine and the particle surface is basic. This is because it does not have an adsorption site and adsorbs in a suitable form. In addition, since the dispersant has a functional group derived from phosphoric acid, phosphorus P interacts with and attracts the metal M through the oxygen O, and is therefore most effective for adsorption with metals and metal compounds. This is because suitable dispersibility can be obtained by the amount of adsorption.
なお、酸価が5〜200の高分子分散剤としては、例えば、ルーブリゾール社のSOLSPERSEシリーズではSOLSPERSE−16000、21000、41000、41090、43000、44000、46000、54000等が挙げられ、ビックケミー社DISPERBYKシリーズではDISPERBYK−102、110、111、170、190.194N、2015.2090、2096等が挙げられ、エボニック社のTEGO Dispersシリーズでは610、610S、630、651、655、750W、755W等が挙げられ、楠本化成(株)製のディスパロンシリーズではDA−375、DA−1200等が挙げられ、共栄化学工業(株)製のフローレンシリーズではWK−13E、G−700、G−900、GW−1500、GW−1640、WK−13Eを例示することができる。 Examples of the polymer dispersant having an acid value of 5 to 200 include SOLPERSE-16000, 21000, 41000, 41090, 43000, 44000, 46000, 54000, etc. in the SOLPERSE series of Lubrizol Corporation. In the series, DISPERBYK-102, 110, 111, 170, 190.194N, 2015.2090, 2096 and the like are listed, and in Evonik's TEGO Dispers series, 610, 610S, 630, 651, 655, 750W, 755W and the like are listed. In the Dispalon series manufactured by Enomoto Kasei Co., Ltd., DA-375, DA-1200 and the like are listed. In the Floren series manufactured by Kyoei Chemical Industry Co., Ltd., WK-13E, G-700, G- 900, GW-1500, GW-1640, and WK-13E.
本実施形態の銀微粒子分散体に分散剤を含有させる場合の含有量は、粘度などの所望の特性によって調整すれば良いが、例えば、銀微粒子分散体を銀インクとして用いる場合は、分散剤の含有量を0.5〜20質量%とすることが好ましく、銀ペーストとして用いる場合は、分散剤の含有量を0.1〜10質量%とすることが好ましい。 The content when the dispersant is contained in the silver fine particle dispersion of the present embodiment may be adjusted according to desired properties such as viscosity. For example, when the silver fine particle dispersion is used as a silver ink, The content is preferably 0.5 to 20% by mass, and when used as a silver paste, the content of the dispersant is preferably 0.1 to 10% by mass.
高分子分散剤の含有量は0.1〜15質量%であることが好ましい。高分子分散剤の含有量が0.1%以上であれば得られる銀微粒子分散体の分散安定性が良くなるが、含有量が多過ぎる場合は低温焼結性が低下することとなる。このような観点から、高分子分散剤のより好ましい含有量は0.3〜10質量%であり、更に好ましい含有量は0.5〜8質量%である。 The content of the polymer dispersant is preferably 0.1 to 15% by mass. When the content of the polymer dispersant is 0.1% or more, the dispersion stability of the obtained silver fine particle dispersion is improved. However, when the content is too large, the low-temperature sinterability is lowered. From such a viewpoint, the more preferable content of the polymer dispersant is 0.3 to 10% by mass, and the more preferable content is 0.5 to 8% by mass.
本実施形態の分散体は、更に、熱分析によって室温から200℃まで加熱したときの重量減少率が20質量%以下であり、かつ、200℃から500℃まで加熱したときの重量減少率が10質量%以下であることが好ましい。ここで、200℃までの重量減少率は主として低温焼結性に寄与する低温成分である短鎖アミンの含有量を示し、200〜500℃での高温性分の重量減少率は主として分散安定性に寄与する酸価の分散剤の含有量を示す。短鎖アミンや高温成分が過剰になると低温焼結性が損なわれる。即ち、室温から200℃まで加熱したときの重量減少率が20質量%以下で、200℃から500℃まで加熱したときの重量減少率が10質量%以下であれば低温焼結性がより優れる。 The dispersion of this embodiment further has a weight reduction rate of 20% by mass or less when heated from room temperature to 200 ° C. by thermal analysis, and a weight reduction rate of 10% when heated from 200 ° C. to 500 ° C. It is preferable that it is below mass%. Here, the weight reduction rate up to 200 ° C. mainly indicates the content of the short-chain amine, which is a low-temperature component contributing to low-temperature sinterability, and the weight reduction rate of the high-temperature property at 200 to 500 ° C. is mainly dispersion stability. The content of the dispersant having an acid value that contributes to If the short-chain amine or the high temperature component is excessive, the low temperature sintering property is impaired. That is, if the weight reduction rate when heated from room temperature to 200 ° C. is 20% by mass or less and the weight reduction rate when heated from 200 ° C. to 500 ° C. is 10% by mass or less, the low temperature sinterability is more excellent.
(E)保護剤(保護分散剤)
本実施形態の銀微粒子分散体は、更に、銀微粒子合成前に添加される保護剤としての酸価を有する分散剤(保護分散剤)を含んでいてもよい。ここでいう「保護分散剤」は、上記の銀微粒子合成後に添加される「酸価を有する分散剤」と同じ種類のものでも異なる種類のものであってもよい。(E) Protective agent (protective dispersant)
The silver fine particle dispersion of this embodiment may further contain a dispersant (protective dispersant) having an acid value as a protective agent added before the synthesis of the silver fine particles. The “protective dispersant” referred to here may be of the same type or different type as the “dispersant having an acid value” added after the synthesis of the silver fine particles.
(F)その他の成分
本実施形態の銀微粒子分散体には、上記の成分に加えて、本発明の効果を損なわない範囲で、使用目的に応じた適度な粘性、密着性、乾燥性又は印刷性等の機能を付与するために、例えばバインダーとしての役割を果たすオリゴマー成分、樹脂成分、有機溶剤(固形分の一部を溶解又は分散していてよい。)、界面活性剤、増粘剤又は表面張力調整剤等の任意成分を添加してもよい。かかる任意成分としては、特に限定されない。(F) Other components In addition to the above components, the silver fine particle dispersion of the present embodiment has an appropriate viscosity, adhesion, drying property or printing depending on the purpose of use within a range not impairing the effects of the present invention. For example, an oligomer component, a resin component, an organic solvent (a part of the solid content may be dissolved or dispersed), a surfactant, a thickener, You may add arbitrary components, such as a surface tension regulator. Such optional components are not particularly limited.
樹脂成分としては、例えば、ポリエステル系樹脂、ブロックドイソシアネート等のポリウレタン系樹脂、ポリアクリレート系樹脂、ポリアクリルアミド系樹脂、ポリエーテル系樹脂、メラミン系樹脂又はテルペン系樹脂等を挙げることができ、これらはそれぞれ単独で用いてもよく、2種以上を併用してもよい。 Examples of the resin component include polyester resins, polyurethane resins such as blocked isocyanate, polyacrylate resins, polyacrylamide resins, polyether resins, melamine resins, and terpene resins. May be used alone or in combination of two or more.
増粘剤としては、例えば、クレイ、ベントナイト又はヘクトライト等の粘土鉱物、例えば、ポリエステル系エマルジョン樹脂、アクリル系エマルジョン樹脂、ポリウレタン系エマルジョン樹脂又はブロックドイソシアネート等のエマルジョン、メチルセルロース、カルボキシメチルセルロース、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロース、ヒドロキシプロピルメチルセルロースのセルロース誘導体、キサンタンガム又はグアーガム等の多糖類等が挙げられ、これらはそれぞれ単独で用いてもよく、2種以上を併用してもよい。 Examples of the thickener include clay minerals such as clay, bentonite or hectorite, for example, emulsions such as polyester emulsion resins, acrylic emulsion resins, polyurethane emulsion resins or blocked isocyanates, methyl cellulose, carboxymethyl cellulose, and hydroxyethyl cellulose. , Hydroxypropylcellulose, cellulose derivatives of hydroxypropylmethylcellulose, polysaccharides such as xanthan gum or guar gum, etc., and these may be used alone or in combination of two or more.
上記有機成分とは異なる界面活性剤を添加してもよい。多成分溶媒系の無機コロイド分散液においては、乾燥時の揮発速度の違いによる被膜表面の荒れ及び固形分の偏りが生じ易い。本実施形態の銀微粒子分散体に界面活性剤を添加することによってこれらの不利益を抑制し、均一な導電性被膜を形成することができる銀微粒子分散体が得られる。 A surfactant different from the organic component may be added. In a multi-component solvent-based inorganic colloidal dispersion, the coating surface becomes rough and the solid content tends to be uneven due to the difference in volatilization rate during drying. By adding a surfactant to the silver fine particle dispersion of this embodiment, a silver fine particle dispersion capable of suppressing these disadvantages and forming a uniform conductive film can be obtained.
本実施形態において用いることのできる界面活性剤としては、特に限定されず、アニオン性界面活性剤、カチオン性界面活性剤、ノニオン性界面活性剤の何れかを用いることができ、例えば、アルキルベンゼンスルホン酸塩、4級アンモニウム塩等が挙げられる。なかでも、少量の添加量で効果が得られるので、フッ素系界面活性剤、シリコーン系界面活性剤が好ましい。 The surfactant that can be used in the present embodiment is not particularly limited, and any of an anionic surfactant, a cationic surfactant, and a nonionic surfactant can be used. For example, alkylbenzene sulfonic acid Salt, quaternary ammonium salt and the like. Of these, fluorine-based surfactants and silicone-based surfactants are preferred because an effect can be obtained with a small amount of addition.
本実施形態の銀微粒子分散体に含まれる銀微粒子は、表面の少なくとも一部に分配係数logPが−1.0〜1.4であり炭素数が5以下であるアルコキシアミンが付着した銀微粒子であるのが好ましい。 The silver fine particles contained in the silver fine particle dispersion of the present embodiment are silver fine particles in which an alkoxyamine having a distribution coefficient log P of −1.0 to 1.4 and a carbon number of 5 or less is attached to at least a part of the surface. Preferably there is.
銀微粒子の表面の少なくとも一部に分配係数logPが−1.0〜1.4である炭素数が5以下のアルコキシアミンを付着させることで、銀微粒子に種々の溶媒(特に高極性溶媒)に対する優れた分散性と低温焼結性とを付与することができる。 By attaching an alkoxyamine having a partition coefficient logP of −1.0 to 1.4 and having 5 or less carbon atoms to at least a part of the surface of the silver fine particles, the silver fine particles can be applied to various solvents (particularly highly polar solvents). Excellent dispersibility and low-temperature sinterability can be imparted.
上記溶媒としては、本発明の効果を損なわない範囲で、種々の溶媒を用いることができ、SP値(溶解パラメーター)が7.0〜15.0である溶媒を用いることができる。ここで、高極性溶媒中においても銀微粒子が均一に分散していることが本発明の銀微粒子分散体の特徴の一つであり、本発明では前記炭素数が5以下の短鎖アミンと相溶性が良好であるため、炭素数1〜6のアルコールを用いることが好ましい。なお、これらの溶媒はそれぞれ単独で用いてもよく、2種以上を併用してもよい。 As said solvent, a various solvent can be used in the range which does not impair the effect of this invention, and the solvent whose SP value (solubility parameter) is 7.0-15.0 can be used. Here, it is one of the characteristics of the silver fine particle dispersion of the present invention that the silver fine particles are uniformly dispersed even in a highly polar solvent. In the present invention, the phase is combined with the short-chain amine having 5 or less carbon atoms. Since solubility is favorable, it is preferable to use a C1-C6 alcohol. These solvents may be used alone or in combination of two or more.
SP値(溶解パラメーター)が7.0〜15.0である溶媒としては、例えば、ヘキサン(7.2)、トリエチルアミン(7.3)、エチルエーテル(7.7)、n−オクタン(7.8)、シクロヘキサン(8.3)、n−アミルアセテート(8.3)、酢酸イソブチル(8.3)、メチルイソプロピルケトン(8.4)、アミルベンゼン(8.5)酢酸ブチル(8.5)、四塩化炭素(8.6)、エチルベンゼン(8.7)、p−キシレン(8.8)、トルエン(8.9)、メチルプロピルケトン(8.9)酢酸エチル(8.9)、テトラヒドロフラン(9.2)、メチルエチルケトン(9.3)、クロロホルム(9.4)、アセトン(9.8)、ジオキサン(10.1)、ピリジン(10.8)、イソブタノール(11.0)、n−ブタノール(11.1)、ニトロエタン(11.1)イソプロピルアルコール(11.2)、m−クレゾール(11.4)、アセトニトリル(11.9)、n−プロパノール(12.1)、フルフリルアルコール(12.5)、ニトロメタン(12.7)、エタノール(12.8)、クレゾール(13.3)、エチレングリコール(14.2)、メタノール(14.8)フェノール、p−クレゾール、酢酸プロピル、酢酸イソプロピル、tert−ブタノール、1−ペンタノール、2−ペンタノール、4−メチル−2−ペンタノール、3−メチル−1−ペンタノール、3−メチル−2−ペンタノール、2−ブタノール、1−ヘキサノール、2−ヘキサノール2−ペンタノン、2−ヘプタノン、酢酸2−(2−エトキシエトキシ)エチル、酢酸−2−ブトキシエチル、酢酸2−(2−ブトキシエトキシ)エチル、酢酸−2−メトキシエチル、2−ヘキシルオキシエタノール等を例示することができる。 Examples of the solvent having an SP value (solubility parameter) of 7.0 to 15.0 include hexane (7.2), triethylamine (7.3), ethyl ether (7.7), and n-octane (7. 8), cyclohexane (8.3), n-amyl acetate (8.3), isobutyl acetate (8.3), methyl isopropyl ketone (8.4), amyl benzene (8.5) butyl acetate (8.5) ), Carbon tetrachloride (8.6), ethylbenzene (8.7), p-xylene (8.8), toluene (8.9), methylpropylketone (8.9) ethyl acetate (8.9), Tetrahydrofuran (9.2), methyl ethyl ketone (9.3), chloroform (9.4), acetone (9.8), dioxane (10.1), pyridine (10.8), isobutanol (11.0), n-pig (11.1), nitroethane (11.1) isopropyl alcohol (11.2), m-cresol (11.4), acetonitrile (11.9), n-propanol (12.1), furfuryl alcohol (12.5), nitromethane (12.7), ethanol (12.8), cresol (13.3), ethylene glycol (14.2), methanol (14.8) phenol, p-cresol, propyl acetate, Isopropyl acetate, tert-butanol, 1-pentanol, 2-pentanol, 4-methyl-2-pentanol, 3-methyl-1-pentanol, 3-methyl-2-pentanol, 2-butanol, 1- Hexanol, 2-hexanol 2-pentanone, 2-heptanone, 2- (2-ethoxyethoxy) ethyl acetate, acetic acid-2 Butoxyethyl, 2- (2-butoxyethoxy) ethyl acetate, acetic acid-2-methoxyethyl, can be exemplified 2-hexyloxy ethanol.
本実施形態の銀微粒子の粒径は、融点降下が生じるようなナノメートルサイズ、望ましくは1〜200nmが適切であるが、必要に応じてミクロンメートルサイズの粒子が含まれていてもよい。 The particle size of the silver fine particles of this embodiment is a nanometer size that desirably causes a melting point drop, preferably 1 to 200 nm, but may contain micrometer size particles as necessary.
ここで、本実施形態における導電性インクとして転写印刷用導電性インクを用いる場合、当該転写印刷用導電性インクは、より具体的には、金属ナノ粒子と、エタノールを含む溶媒と、水酸基を有する高沸点溶剤0.1〜3.0質量%と、を含むことを特徴とする(上記の導電性インクB)。また、金属粒子と有機成分とからなる金属粒子分散体(換言すれば金属コロイド粒子)を主成分とする固形分と、これら固形分を分散する分散媒とを含むものである。ただし、上記コロイド液において、「分散媒」は上記固形分の一部を溶解していても構わない。 Here, when the conductive ink for transfer printing is used as the conductive ink in the present embodiment, more specifically, the conductive ink for transfer printing has a metal nanoparticle, a solvent containing ethanol, and a hydroxyl group. And 0.1 to 3.0% by mass of a high-boiling solvent (the conductive ink B). Moreover, the solid content which has the metal particle dispersion (in other words, metal colloid particle) which consists of a metal particle and an organic component as a main component, and the dispersion medium which disperse | distributes these solid content are included. However, in the colloid liquid, the “dispersion medium” may dissolve a part of the solid content.
このような金属コロイド液によれば、有機成分を含んでいるため、金属コロイド液中での金属コロイド粒子の分散性を向上させることができ、したがって、金属コロイド液中の金属成分の含有量を増やしても金属コロイド粒子が凝集しにくく、良好な分散安定性を保つことができる。なお、ここでいう「分散性」とは、金属コロイド液を調製した直後において、当該金属コロイド液中での金属粒子の分散状態が優れているか否か(均一か否か)を示すものであり、「分散安定性」とは、金属コロイド液を調製して所定の時間を経過した後において、当該金属コロイド液中での金属粒子の分散状態が維持されているか否かを示すものであり、「低沈降凝集性」ともいえる。 According to such a metal colloid liquid, since it contains an organic component, the dispersibility of the metal colloid particles in the metal colloid liquid can be improved. Therefore, the content of the metal component in the metal colloid liquid can be reduced. Even if it is increased, the colloidal metal particles are less likely to aggregate and good dispersion stability can be maintained. The “dispersibility” as used herein indicates whether or not the dispersion state of the metal particles in the metal colloid liquid is excellent immediately after the metal colloid liquid is prepared (whether it is uniform or not). , "Dispersion stability" indicates whether or not the dispersion state of the metal particles in the metal colloid liquid is maintained after a predetermined time has elapsed after preparing the metal colloid liquid, It can also be said to be “low sedimentation aggregation”.
ここで、上記の金属コロイド液において、金属コロイド粒子中の「有機成分」は、上記金属成分とともに実質的に金属コロイド粒子を構成する有機物のことである。当該有機成分には、金属中に最初から不純物として含まれる微量有機物、後述する製造過程で混入した微量の有機物が金属成分に付着した有機物、洗浄過程で除去しきれなかった残留還元剤、残留分散剤等のように、金属成分に微量付着した有機物等は含まれない。なお、上記「微量」とは、具体的には、金属コロイド粒子中1質量%未満が意図される。
本実施形態における金属コロイド粒子は、有機成分を含んでいるため、金属コロイド液中での分散安定性が高い。そのため、金属コロイド液中の金属成分の含有量を増大させても金属コロイド粒子が凝集しにくく、その結果、良好な分散性が保たれる。Here, in the metal colloid liquid, the “organic component” in the metal colloid particle is an organic substance that substantially constitutes the metal colloid particle together with the metal component. The organic component includes trace organic substances contained in the metal as impurities from the beginning, organic substances adhering to the metal component from trace organic substances mixed in the manufacturing process described later, residual reducing agent that could not be removed in the cleaning process, residual dispersion It does not include organic substances that adhere to trace amounts of metal components such as agents. The “trace amount” is specifically intended to be less than 1% by mass in the metal colloid particles.
Since the metal colloid particles in this embodiment contain an organic component, the dispersion stability in the metal colloid liquid is high. Therefore, even if the content of the metal component in the metal colloid liquid is increased, the metal colloid particles are less likely to aggregate, and as a result, good dispersibility is maintained.
また、本実施形態における金属コロイド液の「固形分」とは、シリカゲル等を用いて金属コロイド液から分散媒を取り除いた後、例えば、30℃以下の常温(例えば25℃)で24時間乾燥させたときに残存する固形分のことをいい、通常は、金属粒子、残存有機成分及び残留還元剤等を含むものである。なお、シリカゲルを用いて金属コロイド液から分散媒を取り除く方法としては、種々の方法を採用することが可能であるが、例えばガラス基板上に金属コロイド液を塗布し、シリカゲルを入れた密閉容器に塗膜付ガラス基板を24時間以上放置することにより分散媒を取り除けばよい。 In addition, the “solid content” of the metal colloid liquid in the present embodiment means that after removing the dispersion medium from the metal colloid liquid using silica gel or the like, for example, it is dried at room temperature of 30 ° C. or lower (for example, 25 ° C.) for 24 hours. In general, the solid content that remains is usually contained metal particles, residual organic components, residual reducing agent, and the like. Various methods can be employed as a method of removing the dispersion medium from the metal colloid liquid using silica gel. For example, a metal colloid liquid is applied on a glass substrate and placed in a sealed container containing silica gel. What is necessary is just to remove a dispersion medium by leaving a glass substrate with a coating film for 24 hours or more.
本実施形態の金属コロイド液において、好ましい固形分の濃度は1〜60質量%である。固形分の濃度が1質量%以上であれば、転写印刷用導電性インクにおける金属の含有量を確保することができ、導電効率が低くならない。また、固形分の濃度が60質量%以下であれば、金属コロイド液の粘度が増加せず取り扱いが容易で、工業的に有利であり、平坦な薄膜を形成することができる。より好ましい固形分の濃度は5〜40質量%である。 In the metal colloid liquid of the present embodiment, a preferable solid content concentration is 1 to 60% by mass. When the solid content concentration is 1% by mass or more, the metal content in the conductive ink for transfer printing can be secured, and the conductive efficiency does not decrease. In addition, when the solid content concentration is 60% by mass or less, the viscosity of the metal colloid liquid does not increase, the handling is easy, it is industrially advantageous, and a flat thin film can be formed. A more preferable solid content concentration is 5 to 40% by mass.
転写印刷用導電性インクは、水酸基を有する高沸点溶剤を0.1〜3.0質量%含むことを特徴とする。水酸基を有する高沸点溶剤は、1,3−ブチレングリコール(沸点:203℃)、2,4−ジエチル−1,5−ペンタンジオール(沸点:150℃/5mmHg、1気圧では200℃以上)又はオクタンジオール(沸点:243℃)から選択されるのが好ましい。 The conductive ink for transfer printing contains 0.1 to 3.0% by mass of a high boiling point solvent having a hydroxyl group. The high boiling point solvent having a hydroxyl group is 1,3-butylene glycol (boiling point: 203 ° C.), 2,4-diethyl-1,5-pentanediol (boiling point: 150 ° C./5 mmHg, 200 ° C. or more at 1 atm) or octane. It is preferably selected from diols (boiling point: 243 ° C.).
「高沸点溶剤」とは、200℃以上の沸点を有する溶剤のことをいう。また、水酸基を有することによって水に対して適度な親和性を有し、空気中の水分を吸収乃至は吸着等して保湿する傾向があるため、少ない添加量で転写印刷法に好適なインクとすることができる。更に、高沸点溶剤の添加量を必要最小限とすることで、シリコーンブランケット上に塗布したインクを短時間に半乾燥させることができ、印刷タクトを短くすることができるという効果を奏する。 “High boiling point solvent” refers to a solvent having a boiling point of 200 ° C. or higher. In addition, since it has a suitable affinity for water by having a hydroxyl group and tends to absorb or absorb moisture in the air and moisturize it, an ink suitable for transfer printing with a small addition amount can be obtained. can do. Furthermore, by minimizing the amount of the high-boiling solvent added, the ink applied on the silicone blanket can be semi-dried in a short time, and the printing tact can be shortened.
水酸基を有する高沸点溶剤の添加量は、0.1〜3.0質量%である。0.1質量%未満であると、量が少なすぎて転写印刷法に好適なインク状になりにくく、3.0質量%を超えると、転写印刷法に好適な半乾燥状態に到達する時間が長くなり印刷タクトの面で不利となる。水酸基を有する高沸点溶剤の添加量は、0.3〜2.0質量%であるのが、より確実に、転写印刷法に好適なインク状になり易く、転写印刷法に好適な半乾燥状態に到達する時間を短くでき印刷タクトの面で有利となるという観点から、特に好ましい。 The addition amount of the high boiling point solvent having a hydroxyl group is 0.1 to 3.0% by mass. If the amount is less than 0.1% by mass, the amount is too small to easily form an ink suitable for the transfer printing method. If the amount exceeds 3.0% by mass, the time to reach a semi-dry state suitable for the transfer printing method is reached. It becomes longer and disadvantageous in terms of printing tact. The amount of the high-boiling solvent having a hydroxyl group added is 0.3 to 2.0% by mass, but it is more sure that the ink is suitable for the transfer printing method, and it is a semi-dry state suitable for the transfer printing method. This is particularly preferable from the viewpoint of shortening the time required to reach the position and being advantageous in terms of printing tact.
また、転写印刷用導電性インクにおいては、インクの乾燥性を高めるためにエタノール等の高揮発性溶剤を添加する。当該溶剤を添加することにより、転写印刷用導電性インクを素早く印刷に適した粘度に調整することができる。高揮発性溶剤としては、エタノールの他、メタノール、プロピルアルコール、イソプロピルアルコール、アセトン、n−ブタノール、sec−ブタノール、tert−ブタノール等の沸点100℃未満の溶剤の群から選ばれる1又は2以上の低沸点溶剤を用いることができる。 In addition, in the conductive ink for transfer printing, a highly volatile solvent such as ethanol is added to improve the drying property of the ink. By adding the solvent, the transfer printing conductive ink can be quickly adjusted to a viscosity suitable for printing. As the highly volatile solvent, in addition to ethanol, one or two or more selected from the group of solvents having a boiling point of less than 100 ° C. such as methanol, propyl alcohol, isopropyl alcohol, acetone, n-butanol, sec-butanol, tert-butanol and the like Low boiling solvents can be used.
更に、転写印刷用導電性インクにおいては、ハイドロフルオロエーテル等のフッ素溶剤を含んでいることが好ましい。フッ素溶剤は、表面張力が低いためにシリコーンブランケットに対し良好な濡れ性を発揮させることができ、沸点が比較的低いために良好な乾燥性を付与することができる。なかでも、オゾン破壊係数の観点から、ハロゲン原子を含むフッ素溶剤よりもハイドロフルオロエーテルのほうが好ましい。 Further, the conductive ink for transfer printing preferably contains a fluorine solvent such as hydrofluoroether. Since the fluorine solvent has a low surface tension, it can exhibit good wettability with respect to the silicone blanket, and since the boiling point is relatively low, it can provide good drying properties. Of these, hydrofluoroethers are more preferable than fluorine solvents containing halogen atoms from the viewpoint of the ozone depletion coefficient.
また、ハイドロフルオロエーテルは、ハイドロフルオロカーボン類よりもエーテル結合を有しているために極性が高く、シリコーンブランケットをほとんど膨潤させないという利点を有しており、エタノール等のアルコールとの相溶性が良く、アルコールに分散した金属粒子との相溶性にも優れるという効果を奏するため、より好ましい。 In addition, hydrofluoroether has an ether bond than hydrofluorocarbons, so it has a high polarity and has the advantage of hardly causing the silicone blanket to swell, and has good compatibility with alcohols such as ethanol, This is more preferable because it has an effect of being excellent in compatibility with metal particles dispersed in alcohol.
転写印刷用導電性インクにおいては、シリコーンブランケットに対する濡れ性を向上させる目的で、フッ素原子を有するフッ素系界面活性剤を添加してもよい。ただし、この場合、添加量が多過ぎると転写印刷用導電性インクを用いて作製した導電性被膜の導電性が低下し、添加量が少な過ぎると濡れ性改善の効果が不十分であるため、0.01〜2質量%であるのが好適である。 In the conductive ink for transfer printing, a fluorine-based surfactant having a fluorine atom may be added for the purpose of improving the wettability with respect to the silicone blanket. However, in this case, if the addition amount is too large, the conductivity of the conductive film produced using the conductive ink for transfer printing is lowered, and if the addition amount is too small, the effect of improving the wettability is insufficient. It is suitable that it is 0.01-2 mass%.
転写印刷用導電性インクにおいては、表面張力が22mN/m以下である。表面張力を22mN/m以下と十分に下げることで、シリコーン樹脂等のブランケットへの転写印刷用導電性インクの濡れ性を十分に担保することができる。表面張力を22mN/m以下にすることは、上記の本発明の転写印刷用導電性インクの成分比を調整することによって実現できる。表面張力の下限は13mN/m程度であればよい。なお、本発明においていう表面張力とは、プレート法(Wilhelmy法)という原理で測定して得られるものであり、例えば、協和界面科学(株)製の全自動表面張力計CBVP−Z等により測定することができる。 In the conductive ink for transfer printing, the surface tension is 22 mN / m or less. By sufficiently lowering the surface tension to 22 mN / m or less, the wettability of the conductive ink for transfer printing onto a blanket such as a silicone resin can be sufficiently ensured. The surface tension of 22 mN / m or less can be realized by adjusting the component ratio of the conductive ink for transfer printing according to the present invention. The lower limit of the surface tension may be about 13 mN / m. The surface tension referred to in the present invention is obtained by measurement based on the principle of the plate method (Wilhelmy method), and is measured by, for example, a fully automatic surface tension meter CBVP-Z manufactured by Kyowa Interface Science Co., Ltd. can do.
次に、本実施形態の銀微粒子及び銀微粒子分散体の製造方法は、銀微粒子を生成する工程と、前記銀微粒子に、前記銀微粒子を分散させるための酸価を有する分散剤を添加・混合する工程と、を有するものであるが、更に、還元により分解して金属銀を生成しうる銀化合物と、分配係数logPが−1.0〜1.4である短鎖アミンと、の混合液を調製する第1前工程と、当該混合液中の前記銀化合物を還元することで表面の少なくとも一部に炭素数が5以下である短鎖アミンが付着した銀微粒子を生成する第2前工程と、を含んでいる。 Next, the method for producing silver fine particles and the silver fine particle dispersion according to the present embodiment includes a step of producing silver fine particles, and a dispersant having an acid value for dispersing the silver fine particles is added to and mixed with the silver fine particles. A mixed solution of a silver compound that can be decomposed by reduction to form metallic silver and a short-chain amine having a partition coefficient log P of -1.0 to 1.4. And a second pre-process for generating silver fine particles in which a short-chain amine having 5 or less carbon atoms is attached to at least a part of the surface by reducing the silver compound in the mixed solution. And.
上記第1前工程においては、短鎖アミンを金属銀1molに対して2mol以上添加すること、が好ましい。短鎖アミンの添加量を金属銀1molに対して2mol以上とすることで、還元によって生成される銀微粒子の表面に短鎖アミンを適量付着させることができ、当該銀微粒子に種々の溶媒(特に高極性溶媒)に対する優れた分散性と低温焼結性とを付与することができる。 In the first pre-process, it is preferable to add 2 mol or more of short chain amine to 1 mol of metallic silver. By setting the addition amount of the short chain amine to 2 mol or more with respect to 1 mol of metallic silver, an appropriate amount of the short chain amine can be attached to the surface of the silver fine particles produced by the reduction, and various solvents (particularly, Excellent dispersibility and low-temperature sinterability with respect to a highly polar solvent) can be imparted.
なお、上記第1前工程における混合液の組成及び上記第2前工程における還元条件(例えば、加熱温度及び加熱時間等)によって、得られる銀微粒子の粒径を融点降下が生じるようなナノメートルサイズとすることが好ましく、1〜200nmとすることがより好ましい。ここで、必要に応じてミクロンメートルサイズの粒子が含まれていてもよい。 It should be noted that the particle size of the silver fine particles obtained is a nanometer size that causes a melting point drop depending on the composition of the liquid mixture in the first pre-process and the reduction conditions (for example, heating temperature, heating time, etc.) in the second pre-process. Preferably, the thickness is 1 to 200 nm. Here, particles of micrometer size may be included as necessary.
上記第2前工程で得られる銀微粒子分散体から銀微粒子を取り出す方法は特に限定されないが、例えば、その銀微粒子分散体の洗浄を行う方法等が挙げられる。 The method for taking out the silver fine particles from the silver fine particle dispersion obtained in the second pre-process is not particularly limited, and examples thereof include a method for washing the silver fine particle dispersion.
有機物(分配係数logPが−1.0〜1.4である短鎖アミン)で被覆された銀微粒子を得るための出発材料としては、種々の公知の銀化合物(金属塩又はその水和物)を用いることができ、例えば、硝酸銀、硫酸銀、塩化銀、酸化銀、酢酸銀、シュウ酸銀、ギ酸銀、亜硝酸銀、塩素酸銀、硫化銀等の銀塩が挙げられる。これらは還元可能なものであれば特に限定されず、適当な溶媒中に溶解させても、溶媒中に分散させたまま使用してもよい。また、これらは単独で用いても複数併用してもよい。 Various known silver compounds (metal salts or hydrates thereof) are used as starting materials for obtaining silver fine particles coated with an organic substance (short chain amine having a partition coefficient log P of −1.0 to 1.4). Examples of the silver salt include silver salts such as silver nitrate, silver sulfate, silver chloride, silver oxide, silver acetate, silver oxalate, silver formate, silver nitrite, silver chlorate, and silver sulfide. These are not particularly limited as long as they can be reduced, and may be dissolved in an appropriate solvent or may be used as dispersed in a solvent. These may be used alone or in combination.
また、上記原料液においてこれらの銀化合物を還元する方法は特に限定されず、例えば、還元剤を用いる方法、紫外線等の光、電子線、超音波又は熱エネルギーを照射する方法、加熱する方法等が挙げられる。なかでも、操作の容易の観点から、還元剤を用いる方法が好ましい。 In addition, the method for reducing these silver compounds in the raw material liquid is not particularly limited. For example, a method using a reducing agent, a method of irradiating light such as ultraviolet rays, an electron beam, ultrasonic waves or thermal energy, a method of heating, etc. Is mentioned. Among these, a method using a reducing agent is preferable from the viewpoint of easy operation.
上記還元剤としては、例えば、ジメチルアミノエタノール、メチルジエタノールアミン、トリエタノールアミン、フェニドン、ヒドラジン等のアミン化合物;例えば、水素化ホウ素ナトリウム、ヨウ素化水素、水素ガス等の水素化合物;例えば、一酸化炭素、亜硫酸等の酸化物;例えば、硫酸第一鉄、酸化鉄、フマル酸鉄、乳酸鉄、シュウ酸鉄、硫化鉄、酢酸スズ、塩化スズ、二リン酸スズ、シュウ酸スズ、酸化スズ、硫酸スズ等の低原子価金属塩;例えば、エチレングリコール、グリセリン、ホルムアルデヒド、ハイドロキノン、ピロガロール、タンニン、タンニン酸、サリチル酸、D−グルコース等の糖等が挙げられるが、分散媒に溶解し上記金属塩を還元し得るものであれば特に限定されない。上記還元剤を使用する場合は、光及び/又は熱を加えて還元反応を促進させてもよい。 Examples of the reducing agent include amine compounds such as dimethylaminoethanol, methyldiethanolamine, triethanolamine, phenidone, and hydrazine; for example, hydrogen compounds such as sodium borohydride, hydrogen iodide, and hydrogen gas; for example, carbon monoxide. Oxides such as sulfurous acid; for example, ferrous sulfate, iron oxide, iron fumarate, iron lactate, iron oxalate, iron sulfide, tin acetate, tin chloride, tin diphosphate, tin oxalate, tin oxide, sulfuric acid Low valent metal salts such as tin; for example, sugars such as ethylene glycol, glycerin, formaldehyde, hydroquinone, pyrogallol, tannin, tannic acid, salicylic acid, D-glucose, etc. There is no particular limitation as long as it can be reduced. When the reducing agent is used, light and / or heat may be added to promote the reduction reaction.
上記金属塩、有機成分、溶媒及び還元剤を用いて、有機物で被覆された銀微粒子を調製する具体的な方法としては、例えば、上記金属塩を有機溶媒(例えばトルエン等)に溶かして金属塩溶液を調製し、当該金属塩溶液に分散剤としての短鎖アミンや酸価をもつ保護分散剤を添加し、ついで、ここに還元剤が溶解した溶液を徐々に滴下する方法等が挙げられる。 As a specific method for preparing silver fine particles coated with an organic substance using the above metal salt, organic component, solvent and reducing agent, for example, the above metal salt is dissolved in an organic solvent (for example, toluene) to form a metal salt. Examples of the method include preparing a solution, adding a short-chain amine as a dispersant or a protective dispersant having an acid value to the metal salt solution, and then gradually dropping a solution in which the reducing agent is dissolved.
上記のようにして得られた短鎖アミンや酸価をもつ保護分散剤で被覆された銀微粒子を含む分散液には、銀微粒子の他に、金属塩の対イオン、還元剤の残留物や分散剤が存在しており、液全体の電解質濃度や有機物濃度が高い傾向にある。このような状態の液は、電導度が高い等の理由で銀微粒子の凝析が起こり、沈殿し易い。あるいは、沈殿しなくても、金属塩の対イオン、還元剤の残留物、又は分散に必要な量以上の過剰な分散剤が残留していると、導電性を悪化させるおそれがある。そこで、上記銀微粒子を含む溶液を洗浄して余分な残留物を取り除くことにより、有機物で被覆された銀微粒子を確実に得ることができる。 In the dispersion containing silver fine particles coated with the short-chain amine and the protective dispersant having an acid value obtained as described above, in addition to the silver fine particles, a metal ion counter ion, a reducing agent residue, There is a dispersant, and the concentration of the electrolyte and the organic matter in the whole liquid tend to be high. In the liquid in such a state, the silver fine particles are agglomerated due to high electrical conductivity, etc., and are easily precipitated. Alternatively, even if precipitation does not occur, the conductivity of the metal salt may deteriorate if the counter ion of the metal salt, the residue of the reducing agent, or an excessive amount of dispersant remaining in the amount necessary for dispersion remains. Therefore, by washing the solution containing silver fine particles to remove excess residues, silver fine particles coated with an organic substance can be obtained with certainty.
上記洗浄方法としては、例えば、有機成分で被覆された銀微粒子を含む分散液を一定時間静置し、生じた上澄み液を取り除いた上で、銀微粒子を沈殿させる溶媒(例えば、水、メタノール、メタノール/水混合溶媒等)を加えて再度撹枠し、更に一定期間静置して生じた上澄み液を取り除く工程を幾度か繰り返す方法、上記の静置の代わりに遠心分離を行う方法、限外濾過装置やイオン交換装置等により脱塩する方法等が挙げられる。このような洗浄によって余分な残留物を取り除くと共に有機溶媒を除去することにより、本実施形態の「短鎖アミンや酸価をもつ分散剤」で被覆された銀微粒子を得ることができる。 As the washing method, for example, a dispersion containing silver fine particles coated with an organic component is allowed to stand for a certain period of time, and after removing the resulting supernatant, a solvent for precipitating silver fine particles (for example, water, methanol, Methanol / water mixed solvent, etc.) is added and stirred again, and the method of removing the supernatant liquid after standing for a certain period of time is repeated several times, the method of performing centrifugation instead of the above standing, Examples thereof include a desalting method using a filtration device, an ion exchange device, and the like. By removing excess residue and removing the organic solvent by such washing, silver fine particles coated with the “short-chain amine or the dispersant having an acid value” of the present embodiment can be obtained.
本実施形態のうち、金属コロイド分散液は、上記において得た短鎖アミンや酸価をもつ保護分散剤で被覆された銀微粒子と、上記本実施形態で説明した分散媒と、を混合することにより得られる。かかる「短鎖アミンや酸価をもつ保護分散剤」で被覆された銀微粒子と分散媒との混合方法は特に限定されるものではなく、攪拌機やスターラー等を用いて従来公知の方法によって行うことができる。スパチュラのようなもので撹拌したりして、適当な出力の超音波ホモジナイザーを当ててもよい。 Among the present embodiments, the metal colloid dispersion liquid is a mixture of the silver fine particles coated with the short-chain amine obtained in the above or the protective dispersant having an acid value and the dispersion medium described in the present embodiment. Is obtained. The method of mixing the silver fine particles coated with the “short-chain amine or the protective dispersant having an acid value” and the dispersion medium is not particularly limited, and is performed by a conventionally known method using a stirrer or a stirrer. Can do. An ultrasonic homogenizer with an appropriate output may be applied by stirring with a spatula or the like.
複数の金属を含む金属コロイド分散液を得る場合、その製造方法としては特に限定されず、例えば、銀とその他の金属とからなる金属コロイド分散液を製造する場合には、上記の有機物で被覆された銀微粒子の調製において、銀微粒子を含む分散液と、その他の金属粒子を含む分散液とを別々に製造し、その後混合してもよく、銀イオン溶液とその他の金属イオン溶液とを混合し、その後に還元してもよい。 When obtaining a metal colloid dispersion liquid containing a plurality of metals, the production method is not particularly limited. For example, when producing a metal colloid dispersion liquid composed of silver and other metals, the metal colloid dispersion liquid is coated with the above organic substance. In the preparation of silver fine particles, a dispersion containing silver fine particles and a dispersion containing other metal particles may be produced separately and then mixed, or a silver ion solution and other metal ion solution may be mixed. Thereafter, reduction may be performed.
還元により分解して金属銀を生成しうる銀化合物と、分配係数logPが−1.0〜1.4である短鎖アミンと、の混合液を調製する第1工程と、当該混合液中の前記銀化合物を還元することで表面の少なくとも一部に炭素数が5以下である短鎖アミンが付着した銀微粒子を生成する第2工程により、銀微粒子を製造してもよい。 A first step of preparing a mixed solution of a silver compound that can be decomposed by reduction to form metallic silver and a short-chain amine having a partition coefficient log P of -1.0 to 1.4; Silver fine particles may be produced by the second step of producing silver fine particles in which a short-chain amine having 5 or less carbon atoms is attached to at least a part of the surface by reducing the silver compound.
例えば、銀を含むシュウ酸銀等の金属化合物と短鎖アミンから生成される錯化合物を加熱して、当該錯化合物に含まれるシュウ酸イオン等の金属化合物を分解して生成する原子状の銀を凝集させることにより、短鎖アミンの保護膜に保護された銀微粒子を製造することができる。 For example, atomic silver produced by heating a complex compound generated from a metal compound such as silver oxalate containing silver and a short-chain amine and decomposing the metal compound such as oxalate ion contained in the complex compound By agglomerating, silver fine particles protected by a short-chain amine protective film can be produced.
このように、金属化合物の錯化合物をアミンの存在下で熱分解することで、アミンにより被覆された銀微粒子を製造する金属アミン錯体分解法においては、単一種の分子である金属アミン錯体の分解反応により原子状金属が生成するため、反応系内に均一に原子状金属を生成することが可能であり、複数の成分間の反応により金属原子を生成する場合に比較して、反応を構成する成分の組成揺らぎに起因する反応の不均一が抑制され、特に工業的規模で多量の銀微粒子を製造する際に有利である。 Thus, in the metal amine complex decomposition method for producing silver fine particles coated with amine by thermally decomposing a complex compound of a metal compound in the presence of amine, decomposition of the metal amine complex which is a single kind of molecule is performed. Since the atomic metal is generated by the reaction, it is possible to generate the atomic metal uniformly in the reaction system, and the reaction is configured as compared with the case where the metal atom is generated by the reaction between multiple components. Inhomogeneity of the reaction due to fluctuations in the composition of the components is suppressed, which is particularly advantageous when producing a large amount of silver fine particles on an industrial scale.
また、金属アミン錯体分解法においては、生成する金属原子に短鎖アミン分子が配位結合しており、当該金属原子に配位した短鎖アミン分子の働きにより凝集を生じる際の金属原子の運動がコントロールされるものと推察される。この結果として、金属アミン錯体分解法によれば非常に微細で、粒度分布が狭い銀微粒子を製造することが可能となる。 In the metal amine complex decomposition method, a short chain amine molecule is coordinated to the metal atom to be generated, and the movement of the metal atom when aggregation occurs due to the action of the short chain amine molecule coordinated to the metal atom. Is assumed to be controlled. As a result, it is possible to produce silver fine particles that are very fine and have a narrow particle size distribution according to the metal amine complex decomposition method.
更に、製造される銀微粒子の表面にも多数の短鎖アミン分子が比較的弱い力の配位結合を生じており、これらが銀微粒子の表面に緻密な保護被膜を形成するため、保存安定性に優れる表面の清浄な被覆銀微粒子を製造することが可能となる。また、当該被膜を形成する短鎖アミン分子は加熱等により容易に脱離可能であるため、非常に低温で焼結可能な銀微粒子を製造することが可能となる。 In addition, many short-chain amine molecules have a relatively weak coordination bond on the surface of the silver fine particles to be produced, and these form a dense protective film on the surface of the silver fine particles. It is possible to produce coated silver fine particles having an excellent surface and excellent surface. In addition, since the short-chain amine molecules forming the film can be easily detached by heating or the like, it is possible to produce silver fine particles that can be sintered at a very low temperature.
また、固体状の金属化合物とアミンを混合して錯化合物等の複合化合物が生成する際に、被覆銀微粒子の被膜を構成する酸価をもつ分散剤に対して、炭素数が5以下である短鎖アミンを混合して用いることにより、錯化合物等の複合化合物の生成が容易になり、短時間の混合で複合化合物を製造可能となる。また、当該短鎖アミンを混合して用いることにより、各種の用途に応じた特性を有する被覆銀微粒子の製造が可能である。 In addition, when a solid metal compound and an amine are mixed to produce a complex compound such as a complex compound, the number of carbon atoms is 5 or less with respect to the dispersant having an acid value constituting the coating of the coated silver fine particles. By mixing and using a short-chain amine, it becomes easy to produce a complex compound such as a complex compound, and the complex compound can be produced by mixing in a short time. Further, by mixing and using the short chain amine, it is possible to produce coated silver fine particles having characteristics according to various uses.
以上のようにして得られる本実施形態の分散体は、そのままの状態で使用することができるが、導電インク、導電性ペーストの分散安定性及び低温焼結性を損なわない範囲で種々の無機成分や有機成分を添加することができる。 The dispersion of the present embodiment obtained as described above can be used as it is, but various inorganic components can be used as long as the dispersion stability and low-temperature sinterability of the conductive ink and conductive paste are not impaired. And organic components can be added.
第二工程
ついで、前記第一工程で形成した焼成前被膜を焼成する。この焼成は従来公知の方法及び条件で実施すればよい。例えば従来公知のギアオーブン等を用いて、上記の第一工程及び第二工程を経た焼成前被膜をそ温度が300℃以下(好ましくは180℃未満)となるように焼成することによって導電性被膜(導電膜パターン)を形成することができる。Then the second step, firing the pre-fired film formed in the first step. This firing may be performed by a conventionally known method and conditions. For example, by using a conventionally known gear oven or the like, the conductive film is baked by baking the pre-fired film that has undergone the first and second steps so that the temperature is 300 ° C. or less (preferably less than 180 ° C.). (Conductive film pattern) can be formed.
上記焼成の温度の下限は必ずしも限定されず、基材上に導電膜パターンを形成できる温度であって、かつ、本発明の効果を損なわない範囲で上記有機成分等を蒸発又は分解により除去できる温度であることが好ましい(本発明の効果を損なわない範囲で一部が残存していてもよいが、望ましくは全て除去されるのが好ましい。)。 The lower limit of the firing temperature is not necessarily limited, and is a temperature at which a conductive film pattern can be formed on a substrate, and a temperature at which the organic components and the like can be removed by evaporation or decomposition within a range not impairing the effects of the present invention. (A part may remain within a range that does not impair the effects of the present invention, but it is desirable that all be removed desirably).
本実施形態の導電性インクによれば、100℃程度の低温加熱処理でも高い導電性を発現する導電膜パターンを形成することができるため、比較的熱に弱い基材上にも導電膜パターンを形成することができる。また、焼成時間は特に限定されるものではなく、焼成温度に応じて、基材上に導電膜パターンを形成できる。 According to the conductive ink of the present embodiment, a conductive film pattern exhibiting high conductivity can be formed even by a low-temperature heat treatment at about 100 ° C. Therefore, the conductive film pattern can be formed on a relatively heat-sensitive substrate. Can be formed. Moreover, baking time is not specifically limited, A conductive film pattern can be formed on a base material according to baking temperature.
本実施形態における上記の第一工程を経て得られる焼成前被膜は銀微粒子から形成され、それを外部加熱によって形成した焼結体であり、銀微粒子が本来有する導電性と同程度の良好な導電性を有しており、適度なラフネス及び反射率を有している。 The pre-firing film obtained through the first step in the present embodiment is a sintered body formed from silver fine particles and formed by external heating, and has good conductivity equivalent to the conductivity inherent to the silver fine particles. Have moderate roughness and reflectivity.
第三工程
次に、上記の第二工程で形成した導電性被膜の少なくとも一部に、酸性溶液を接触させて洗浄する第三工程を実施する。当該第三工程により、本実施形態の電極を得る。 Third Step Next, a third step is performed in which at least a part of the conductive coating formed in the second step is contacted with an acidic solution for cleaning. The electrode of this embodiment is obtained by the third step.
この第三工程においては、導電性被膜の少なくとも一部に酸性溶液を接触させればよく、この「接触」は「浸漬」や「噴霧」等をも含む概念である。また、酸性溶液を導電性被膜に滴下することも含む概念である。 In this third step, an acidic solution may be brought into contact with at least a part of the conductive coating, and this “contact” is a concept including “dipping”, “spraying” and the like. Moreover, it is the concept also including dripping an acidic solution on a conductive film.
ここで、本実施形態において用いる酸性溶液は、硫酸又は塩酸を含み、導電性被膜を効果的に洗浄できるものであればよいが、例えば1〜50質量%、好ましくは5〜30質量%の酸濃度の酸性溶液が望ましい。酸濃度が、1質量%以上であれば、洗浄の効果が得られ、50質量%以下であれば、導電性被膜を形成するフィルム基材や他の部材の劣化を抑制することができる。また、5質量%以上であれば、洗浄の効果がより確実に得られ、30質量%以下であれば、導電性被膜を形成するフィルム基材や他の部材の劣化をより確実に抑制することができる。 Here, the acidic solution used in the present embodiment may contain any sulfuric acid or hydrochloric acid and can effectively wash the conductive film. For example, the acidic solution is 1 to 50% by mass, preferably 5 to 30% by mass. An acidic solution with a concentration is desirable. When the acid concentration is 1% by mass or more, a cleaning effect is obtained, and when the acid concentration is 50% by mass or less, deterioration of the film base material and other members forming the conductive film can be suppressed. Moreover, if it is 5 mass% or more, the effect of washing | cleaning will be acquired more reliably, and if it is 30 mass% or less, deterioration of the film base material and other member which form a conductive film will be suppressed more reliably. Can do.
また、酸性溶液は、導電性被膜の表面への濡れ性を向上させるために、界面活性剤や水溶性溶剤を含んでいてもよい。界面活性剤としては、特に限定されず、例えば、アニオン性界面活性剤、カチオン性界面活性剤、ノニオン性界面活性剤の何れを用いることができ、例えば、アルキルベンゼンスルホン酸塩、4級アンモニウム塩等が挙げられ、少量の添加で十分に表面自由エネルギーを低下させることができるフッ素系界面活性剤を好適に用いることができる。水溶性溶剤としては、例えば、メタノール、エタノール、イソプロピルアルコール、n−プロピルアルコール等が挙げられる。市販の界面活性剤としては、例えば、AGCセイミケミカル(株)製のフッ素系界面活性剤(サーフロン)を好適に使用することができる。 The acidic solution may contain a surfactant or a water-soluble solvent in order to improve the wettability to the surface of the conductive film. The surfactant is not particularly limited, and for example, any of an anionic surfactant, a cationic surfactant, and a nonionic surfactant can be used. For example, an alkylbenzene sulfonate, a quaternary ammonium salt, and the like. A fluorine-based surfactant that can sufficiently reduce the surface free energy with a small amount of addition can be suitably used. Examples of the water-soluble solvent include methanol, ethanol, isopropyl alcohol, n-propyl alcohol, and the like. As a commercially available surfactant, for example, a fluorosurfactant (Surflon) manufactured by AGC Seimi Chemical Co., Ltd. can be suitably used.
上記の酸性溶液として好適に使用できるものとして、例えば、奥野製薬工業(株)製のDPクリーン320等を例示することができる。また、この第三工程における接触による洗浄の環境温度は、室温でもよく、必要に応じて加温してもよい。また、酸性溶液による洗浄後は、水又は水溶性溶剤によって洗浄するのが好ましい。 As what can be used suitably as said acidic solution, the DP clean 320 etc. by Okuno Pharmaceutical Co., Ltd. can be illustrated, for example. Moreover, the environmental temperature of the cleaning by contact in the third step may be room temperature or may be heated as necessary. In addition, after washing with an acidic solution, washing with water or a water-soluble solvent is preferable.
また、第三工程を経た後の導電性被膜(即ち、電極)の厚さについては、特に制限はなく、得られた電極の用途によって適宜決定すればよいが、例えば、0.05〜1μmであるのが好ましく、0.1〜0.5μmであるのが特に好ましい。0.05μm以上であれば好適な導通が得られ、1μm以下であれば所望の性能が得られかつ余分な材料を必要とせずコスト面でも好ましい。 Moreover, there is no restriction | limiting in particular about the thickness of the electroconductive film (namely, electrode) after passing through a 3rd process, What is necessary is just to determine suitably by the use of the obtained electrode, For example, it is 0.05-1 micrometer. It is preferable that it is 0.1 to 0.5 μm. If it is 0.05 micrometer or more, suitable conduction | electrical_connection will be obtained, and if it is 1 micrometer or less, desired performance will be obtained, and an extra material is not required and it is preferable also in terms of cost.
本実施形態においては、第三工程の導電性被膜の洗浄の後に得られた電極を、電極のキャリア注入性をより高める目的でSAM(自己組織化膜)による表面修飾(後工程)を行ってもよい。SAMとしては、例えばペンタフルオロベンゼンチオール(PFBT)、ホスホン酸、又はこれらの誘導体等を好適に使用することができる。 In this embodiment, the electrode obtained after the cleaning of the conductive film in the third step is subjected to surface modification (post-step) by SAM (self-assembled film) for the purpose of further improving the carrier injection property of the electrode. Also good. As SAM, for example, pentafluorobenzenethiol (PFBT), phosphonic acid, or a derivative thereof can be suitably used.
以上、本発明の代表的な実施形態について説明したが、特に記載していない内容については従来公知の技術を援用すればよく、また、種々の設計変更が可能であり、それらは全て本発明の技術的範囲に含まれる。 The exemplary embodiments of the present invention have been described above. However, conventionally known techniques may be used for the contents that are not particularly described, and various design changes are possible. Included in the technical scope.
なお、導電性インクを印刷又は塗布するのに用いることのできる基材としては、導電性インクを印刷又は塗布して加熱により焼成して導電膜パターンを搭載することのできる、少なくとも1つの主面を有するものであれば、特に制限はないが、耐熱性に優れた基材であるのが好ましい。また、先に述べたように、本実施形態の導電性インクは、従来の導電性インクに比較して低い温度で加熱して焼成しても十分な導電性を有する導電膜パターンを得ることができるため、この低い焼成温度よりも高い温度範囲で、従来よりも耐熱温度の低い基材を用いることが可能である。 In addition, as a base material that can be used to print or apply the conductive ink, at least one main surface on which the conductive ink can be printed or applied and baked by heating to be mounted with a conductive film pattern If it has, there will be no restriction | limiting in particular, However, It is preferable that it is a base material excellent in heat resistance. In addition, as described above, the conductive ink of this embodiment can obtain a conductive film pattern having sufficient conductivity even when heated and baked at a lower temperature than the conventional conductive ink. Therefore, it is possible to use a base material having a lower heat-resistant temperature than the conventional one in a temperature range higher than this low firing temperature.
このような基材を構成する材料としては、例えば、ポリアミド(PA)、ポリイミド(PI)、ポリアミドイミド(PAI)、ポリエチレンテレフタレート(PET)、ポリブチレンテレフタレート(PBT)、ポリエチレンナフタレート(PEN)等のポリエステル、ポリカーボネート(PC)、ポリエーテルスルホン(PES)、ビニル樹脂、フッ素樹脂、液晶ポリマー、セラミックス、ガラス又は金属等を挙げることができる。また、基材は、例えば板状又はストリップ状等の種々の形状であってよく、リジッドでもフレキシブルでもよい。基材の厚さも適宜選択することができる。接着性若しくは密着性の向上又はその他の目的ために、表面層が形成された基材や親水化処理等の表面処理を施した基材を用いてもよい。 Examples of the material constituting such a base material include polyamide (PA), polyimide (PI), polyamideimide (PAI), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN), and the like. Polyester, polycarbonate (PC), polyethersulfone (PES), vinyl resin, fluororesin, liquid crystal polymer, ceramics, glass or metal can be used. Further, the substrate may have various shapes such as a plate shape or a strip shape, and may be rigid or flexible. The thickness of the substrate can also be selected as appropriate. In order to improve adhesiveness or adhesion, or for other purposes, a substrate on which a surface layer is formed or a substrate that has been subjected to a surface treatment such as a hydrophilic treatment may be used.
本実施形態においては、上記基材と導電膜パターン(導電性被膜乃至は電極)との密着性を更に高めるため、上記基材の表面処理を行ってもよい。上記表面処理方法としては、例えば、コロナ処理、プラズマ処理、UV処理、電子線処理等のドライ処理を行う方法、基材上にあらかじめプライマー層や導電性インク受容層を設ける方法等が挙げられる。 In this embodiment, in order to further improve the adhesion between the substrate and the conductive film pattern (conductive film or electrode), the substrate may be subjected to a surface treatment. Examples of the surface treatment method include a method of performing a dry treatment such as a corona treatment, a plasma treatment, a UV treatment, and an electron beam treatment, and a method of previously providing a primer layer and a conductive ink receiving layer on a substrate.
好適なプライマー層としては、例えばポリウレタン、ポリイミド、ポリアミドイミド、ポリビニルアルコール、ポリビニルフェノール、ポリエステル、ポリエチレン、ポリフェニレンスルフィド、無置換またはハロゲン原子置換ポリパラキシリレン、ポリアクリロニトリル、シアノエチルプルラン、ポリメチルメタクリレート、シルセスキオキサン、ポリビニルブチラール等を用いることができる。 Suitable primer layers include, for example, polyurethane, polyimide, polyamideimide, polyvinyl alcohol, polyvinylphenol, polyester, polyethylene, polyphenylene sulfide, unsubstituted or halogen atom-substituted polyparaxylylene, polyacrylonitrile, cyanoethyl pullulan, polymethyl methacrylate, silyl. Sesquioxane, polyvinyl butyral, and the like can be used.
上記のポリウレタンとしては、例えば特願2015−060183号明細書に記載の、−COO−H、−COOR、−COO−NH+R2及び−COO−NH4+(但し、R、R2はそれぞれ独立して、直鎖もしくは分岐の、置換基を有しても良いアルキル基、同シクロアルキル基、同アルキレン基、同オキシアルキレン基、同アリール基、同アラルキル基、同複素環基、同アルコキシ基、同アルコキシカルボニル基、同アシル基を示す。)のうちのいずれかの官能基を有し、破断伸度が600%以上であるポリウレタン樹脂が好ましい。Examples of the polyurethane include -COO-H, -COOR, -COO-NH + R 2 and -COO-NH 4+ described in Japanese Patent Application No. 2015-060183, wherein R and R 2 are respectively Independently, a linear or branched alkyl group, the same cycloalkyl group, the same alkylene group, the same oxyalkylene group, the same aryl group, the same aralkyl group, the same heterocyclic group, the same alkoxy group which may have a substituent Group, the same alkoxycarbonyl group, and the same acyl group), and a polyurethane resin having a breaking elongation of 600% or more is preferable.
以下、実施例及び比較例を挙げて本発明の電極の製造方法について更に説明するが、本発明はこれらの実施例に何ら限定されるものではない。 Hereinafter, although the manufacturing method of the electrode of this invention is further demonstrated with an Example and a comparative example, this invention is not limited to these Examples at all.
≪調製例1≫
3−メトキシプロピルアミン(和光純薬工業(株)製試薬一級、炭素数:4、logP:−0.5)8.9gと、高分子分散剤であるDISPERBYK−102を0.3gと、を混合し、マグネティックスターラにてよく撹拌してアミン混合液を生成した(添加したアミンのモル比は銀に対して5)。次いで、撹拌を行いながら、シュウ酸銀3.0gを添加した。シュウ酸銀の添加後、室温で攪拌を続けることでシュウ酸銀を粘性のある白色の物質へと変化させ、当該変化が外見的に終了したと認められる時点で撹拌を終了した。<< Preparation Example 1 >>
8.9 g of 3-methoxypropylamine (Wako Pure Chemical Industries, Ltd., first grade reagent, carbon number: 4, log P: -0.5) and 0.3 g of DISPERBYK-102, which is a polymer dispersant, The mixture was mixed and stirred well with a magnetic stirrer to form an amine mixture (molar ratio of added amine was 5 with respect to silver). Next, 3.0 g of silver oxalate was added while stirring. After the addition of silver oxalate, stirring was continued at room temperature to change the silver oxalate to a viscous white substance, and stirring was terminated when the change was found to be apparently finished.
得られた混合液をオイルバスに移し、120℃で加熱撹拌を行った。撹拌の開始直後に二酸化炭素の発生を伴う反応が開始し、その後、二酸化炭素の発生が完了するまで撹拌を行うことで、銀微粒子がアミン混合物中に懸濁した懸濁液を得た。 The obtained mixed solution was transferred to an oil bath and heated and stirred at 120 ° C. Immediately after the start of stirring, a reaction involving the generation of carbon dioxide started, and then stirring was performed until the generation of carbon dioxide was completed, thereby obtaining a suspension in which silver fine particles were suspended in the amine mixture.
次に、当該懸濁液の分散媒を置換するため、メタノール/水の混合溶媒10mLを加えて撹拌した後、遠心分離により銀微粒子を沈殿させて分離し、分離した銀微粒子に対して再度メタノール/水の混合溶媒10mLを加え、撹拌、遠心分離を行うことで銀微粒子を沈殿させて分離し、SOLSPERSE41000(日本ルーブリゾール(株)製)0.06gを含むエタノール2.1gを加えることで固形分濃度48質量%の銀微粒子分散体aを得た。 Next, in order to replace the dispersion medium of the suspension, 10 mL of a mixed solvent of methanol / water is added and stirred, and then silver fine particles are precipitated and separated by centrifugation, and methanol is again added to the separated silver fine particles. 10 mL of a mixed solvent of water / water is added, and silver fine particles are precipitated and separated by stirring and centrifuging, and then solidified by adding 2.1 g of ethanol containing 0.06 g of SOLPERSE 41000 (manufactured by Nippon Lubrizol Co., Ltd.). A silver fine particle dispersion a having a partial concentration of 48% by mass was obtained.
上記のようにして得た銀微粒子分散体aと、表1に示すその他の成分を添加・混合して、導電性インクaを調製した。なお、表1に示す成分の量は質量%で示している。
≪調製例2≫
10N−NaOH水溶液を3mL添加してアルカリ性にした水50mLに、クエン酸3ナトリウム2水和物17g、タンニン酸0.36gを溶解した。得られた溶液に対して3.87mol/L硝酸銀水溶液3mLを添加し、2時間攪拌を行い銀コロイド水溶液を得た。得られた銀コロイド水溶液に対し、導電率が30μS/cm以下になるまで透析することで脱塩を行った。透析後、2100rpm(920G)、10分の条件で遠心分離を行うことで、粗大銀コロイド粒子を除去し、銀微粒子分散体bを得た。<< Preparation Example 2 >>
17 mL of trisodium citrate dihydrate and 0.36 g of tannic acid were dissolved in 50 mL of water made alkaline by adding 3 mL of 10N-NaOH aqueous solution. To the obtained solution, 3 mL of 3.87 mol / L silver nitrate aqueous solution was added and stirred for 2 hours to obtain a silver colloid aqueous solution. The obtained silver colloid aqueous solution was desalted by dialysis until the electric conductivity became 30 μS / cm or less. After dialysis, coarse silver colloidal particles were removed by centrifuging at 2100 rpm (920 G) for 10 minutes to obtain a silver fine particle dispersion b.
上記のようにして得た銀微粒子分散体bと、表2に示すその他の成分を添加・混合して、導電性インクbを調製した。なお、表2に示す成分の量は質量%で示している。
≪実施例1≫
本実施例においては、図1に示すトップゲートボトムコンタクト型構造を有するTFTを作製した。
PEN(ポリエチレンナフタレート)基板1上に、下地2としてDIC社製の「ハイドランHW−312B」をエタノールで3倍希釈することで樹脂層形成インクを、スピンコーターを用いて、ガラス基板上に樹脂層形成インクを2000rpm、30秒の条件で成膜した。その後、120℃で30分加熱することで樹脂層を形成させた。次いで、導電性インクaをシリコーン製ブランケット上にバーコーター(No.7)で塗布し、ガラス凸版を押圧し、非画像部(不要部分)を転写して除去した。更に、ブランケット材に基材を押圧することでS−D(ソース−ドレイン)電極パターンを基材1上の下地2に転写した(第一工程)。
得られたS−D電極パターンを120℃×30分の条件で焼成し導電性被膜積層体(1,2,3)を形成した(第二工程)。
次に、上記導電性被膜を奥野製薬工業(株)製の「DPクリーン320(100g/水1L)に45℃で30秒間浸漬した後、純水にてリンスし、本発明の電極3を得た(第三工程)。Example 1
In this example, a TFT having a top gate bottom contact type structure shown in FIG. 1 was produced.
On a PEN (polyethylene naphthalate) substrate 1, “Hydran HW-312B” manufactured by DIC as a base 2 is diluted 3 times with ethanol, and a resin layer forming ink is applied on a glass substrate using a spin coater. The layer forming ink was deposited at 2000 rpm for 30 seconds. Then, the resin layer was formed by heating at 120 degreeC for 30 minutes. Next, the conductive ink a was applied on a silicone blanket with a bar coater (No. 7), the glass relief was pressed, and the non-image part (unnecessary part) was transferred and removed. Furthermore, the SD (source-drain) electrode pattern was transferred to the base 2 on the substrate 1 by pressing the substrate against the blanket material (first step).
The obtained SD electrode pattern was baked under the conditions of 120 ° C. × 30 minutes to form a conductive film laminate (1, 2, 3) (second step).
Next, the conductive film was immersed in “DP Clean 320 (100 g / 1 L of water) manufactured by Okuno Pharmaceutical Co., Ltd. for 30 seconds at 45 ° C. and then rinsed with pure water to obtain the electrode 3 of the present invention. (Third step).
次いで、Sigma−Aldrich社製の半導体F8T2(Poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-bithiophene])をテトラリンに溶解させたものをインクジェットにより、S−D電極パターンからなる電極3間に塗布を行った。その後、チッ素雰囲気中で100℃×5分の条件で加熱することで半導体層4を形成した。
その後、スピンコーターを用いて、3000rpm×30秒の条件でフッ素系の絶縁膜5を形成した。その後、100℃×5分の条件で形成した。
次いで、上記のS−D電極パターンと同様に、G(ゲート)電極パターンを印刷した。得られたG電極パターンを120℃×30分の条件で焼成し、G電極6を形成することで図1に示す構造のTFT(トップゲートボトムコンタクト型)を作製した。Next, a semiconductor F8T2 (Poly [(9,9-dioctylfluorenyl-2,7-diyl) -co-bithiophene]) manufactured by Sigma-Aldrich is dissolved in tetralin to form an SD electrode pattern by inkjet. Application was performed between the electrodes 3. Thereafter, the semiconductor layer 4 was formed by heating in a nitrogen atmosphere under conditions of 100 ° C. × 5 minutes.
Thereafter, a fluorine-based insulating film 5 was formed using a spin coater under conditions of 3000 rpm × 30 seconds. Then, it formed on the conditions of 100 degreeC x 5 minutes.
Next, a G (gate) electrode pattern was printed in the same manner as the SD electrode pattern. The obtained G electrode pattern was baked under the conditions of 120 ° C. × 30 minutes, and the G electrode 6 was formed to produce a TFT (top gate bottom contact type) having the structure shown in FIG.
≪比較例1≫
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」を用いなかったこと以外は実施例1と同様にして、TFTを作製した。≪Comparative example 1≫
A TFT was produced in the same manner as in Example 1 except that “DP Clean 320 (100 g / 1 L of water)” manufactured by Okuno Pharmaceutical Co., Ltd. was not used.
≪実施例2≫
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」の代わりに、硫酸10%、IPA10%水溶液を用い、室温で1分浸漬させた以外は実施例1と同様にして、TFTを作製した。<< Example 2 >>
Instead of “DP Clean 320 (100 g / 1 L of water)” manufactured by Okuno Pharmaceutical Co., Ltd., a 10% sulfuric acid, 10% IPA aqueous solution was used, and the sample was immersed in room temperature for 1 minute. A TFT was produced.
≪実施例3≫
実施例1と同様に、電極3の表面を洗浄した後、ペンタフルオロベンゼンチオール(PFBT)のIPA溶液に基板を1分浸漬し、その後IPAに浸漬・洗浄した後、60℃、1分の条件で基板を乾燥させた以外は、実施例1と同様にして、TFTを作製した。Example 3
As in Example 1, after cleaning the surface of the electrode 3, the substrate was immersed in an IPA solution of pentafluorobenzenethiol (PFBT) for 1 minute, then immersed and washed in IPA, and then at 60 ° C. for 1 minute. A TFT was produced in the same manner as in Example 1 except that the substrate was dried in the same manner as in Example 1.
≪実施例4≫
導電性インクaの代わりに導電性インクbを用いたこと以外は実施例1と同様にして、TFTを作製した。
≪実施例5≫
硫酸10%水溶液を用いたこと以外は、実施例2と同様にして、TFTを作製した。Example 4
A TFT was produced in the same manner as in Example 1 except that the conductive ink b was used instead of the conductive ink a.
Example 5
A TFT was produced in the same manner as in Example 2 except that a 10% aqueous solution of sulfuric acid was used.
≪比較例2≫
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」の代わりに、奥野製薬工業(株)製の「OPC−180クリーナー(200g/水1L)」を用い、60℃で1分浸漬させた以外は実施例1と同様にして、TFTを作製した。≪Comparative example 2≫
Instead of “DP Clean 320 (100 g / water 1 L)” manufactured by Okuno Pharmaceutical Industry Co., Ltd., “OPC-180 Cleaner (200 g / water 1 L)” manufactured by Okuno Pharmaceutical Industry Co., Ltd. was used. A TFT was produced in the same manner as in Example 1 except that the immersion was performed.
≪比較例3≫
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」の代わりに、奥野製薬工業(株)製の「OPCクリーン65(500g/水1L)」を用い、室温で1分浸漬させた以外は実施例1と同様にして、TFTを作製した。«Comparative Example 3»
Instead of “DP Clean 320 (100 g / water 1 L)” manufactured by Okuno Pharmaceutical Industry Co., Ltd., “OPC Clean 65 (500 g / water 1 L)” manufactured by Okuno Pharmaceutical Industry Co., Ltd. was used for 1 minute at room temperature. A TFT was produced in the same manner as in Example 1 except for the above.
[評価試験1]
上記の実施例1〜4及び比較例1〜3において得られたTFT素子の特性を、Agilent社製のB1500Aを用いて評価した。ゲート電圧を0Vから80Vまで、ドレイン電圧を0Vから80Vまで走査したときの出力特性を測定し、ドレイン電圧が−80Vの時のゲート電圧とドレイン電流の関係より、移動度とON−OFF比を算出した。結果を表3に示した。[Evaluation Test 1]
The characteristics of the TFT elements obtained in Examples 1 to 4 and Comparative Examples 1 to 3 were evaluated using B1500A manufactured by Agilent. Measure the output characteristics when the gate voltage is scanned from 0V to 80V and the drain voltage from 0V to 80V. From the relationship between the gate voltage and the drain current when the drain voltage is -80V, the mobility and the ON-OFF ratio are calculated. Calculated. The results are shown in Table 3.
また、実施例1におけるTFTの出力特性を示すグラフ及び比較例1におけるTFTの出力特性を示すグラフを、それぞれ図2及び図3に示した。 Also, a graph showing the output characteristics of the TFT in Example 1 and a graph showing the output characteristics of the TFT in Comparative Example 1 are shown in FIGS. 2 and 3, respectively.
図2及び図3並びに表1から、実施例1及び2で洗浄した場合は 良好なTFT特性を示したが、比較例1(洗浄なし)、比較例2(アルカリ性)及び比較例3(中性)では、相対的にTFT特性が劣ることがわかる。
また、実施例3から、PFBTによってS−D電極表面が適切に修飾されており、良好なTFT特性を示していることが伺える。実施例4は、インクbを用いることで、移動度とON−OFF比がインクaを用いた実施例1の結果よりもやや劣るものの、比較的良好な結果である。更に、実施例5では、目視で、S−D電極表面上の処理ムラが認められるが、比較的良好なTFT特性を示していることがわかる。2 and FIG. 3 and Table 1, when cleaned in Examples 1 and 2, good TFT characteristics were shown, but Comparative Example 1 (without cleaning), Comparative Example 2 (alkaline) and Comparative Example 3 (neutral) ) Shows that the TFT characteristics are relatively inferior.
In addition, it can be seen from Example 3 that the surface of the S-D electrode is appropriately modified by PFBT and exhibits good TFT characteristics. Example 4 is a relatively good result by using ink b, although the mobility and the ON-OFF ratio are slightly inferior to those of Example 1 using ink a. Furthermore, in Example 5, although the process nonuniformity on the surface of SD electrode is recognized visually, it turns out that the comparatively favorable TFT characteristic is shown.
[評価試験2]
次に、上記の導電性インクを用いて得られた電極の洗浄効果について、実施例1及び比較例1に相当する実験を行って、追加的に評価試験を行った。
(1)導電性インクaをシリコーン製ブランケット上にバーコーター(No.7)で塗布し、ブランケット材に基材を押圧することでベタ膜を基材に転写した。得られたベタ膜を120℃×30分の条件で焼成し導電性被膜を形成した。次いで、奥野製薬工業(株)製の「DPクリーン320(100g/水1L)に45℃で30秒間浸漬した後、純水にてリンスした。これにより、本発明の電極を得た。
(2)奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」を用いなかったこと以外は上記(1)と同様とし、比較用電極を得た。[Evaluation Test 2]
Next, an experiment corresponding to Example 1 and Comparative Example 1 was performed and an additional evaluation test was performed on the cleaning effect of the electrode obtained using the conductive ink.
(1) The conductive ink a was applied on a silicone blanket with a bar coater (No. 7), and the solid film was transferred to the substrate by pressing the substrate against the blanket material. The obtained solid film was baked under the conditions of 120 ° C. × 30 minutes to form a conductive film. Subsequently, after being immersed in “DP Clean 320 (100 g / water 1 L)” manufactured by Okuno Pharmaceutical Co., Ltd. for 30 seconds at 45 ° C., it was rinsed with pure water. Thus, the electrode of the present invention was obtained.
(2) A comparative electrode was obtained in the same manner as in (1) above except that “DP Clean 320 (100 g / water 1 L)” manufactured by Okuno Pharmaceutical Co., Ltd. was not used.
上記(1)及び(2)で得た電極及び比較用電極の仕事関数を、理研計器(株)製のAC−2を用いて測定した。得られた結果を図4に示した。図4は、実施例1及び比較例1で得た電極において、導電性被膜の洗浄効果を評価した結果を示すグラフである。 The work functions of the electrodes obtained in (1) and (2) above and the comparative electrode were measured using AC-2 manufactured by Riken Keiki Co., Ltd. The obtained results are shown in FIG. FIG. 4 is a graph showing the results of evaluating the cleaning effect of the conductive film in the electrodes obtained in Example 1 and Comparative Example 1.
図4から、AC−2により算出される仕事関数はそれぞれ、4.4eV(実施例1)及び4.8eV(比較例1)となり、実施例1のほうがバルクの銀(4.3eV)に近い値となっており、かつ、Yield(縦軸)が上昇していることから、同じエネルギーを与えても放出される光電子がより多く、その結果として効率的なキャリア注入が行われたものと判断される。 From FIG. 4, the work functions calculated by AC-2 are 4.4 eV (Example 1) and 4.8 eV (Comparative Example 1), respectively, and Example 1 is closer to bulk silver (4.3 eV). And the yield (vertical axis) has risen, so even if the same energy is applied, more photoelectrons are emitted, and as a result, efficient carrier injection has been determined. Is done.
Claims (14)
前記焼成前被膜を焼成して導電性被膜を形成する第二工程と、
前記導電性被膜の少なくとも一部に酸性溶液を接触させて洗浄する第三工程と、
を含み、
前記導電性インクが、
金属ナノ粒子と、炭素数が5以下である短鎖アミンと、高極性溶媒と、前記金属ナノ粒子を分散させるための酸価を有する分散剤と、を含み、前記短鎖アミンの分配係数logPが−1.0〜1.4である金属ナノ粒子分散体を含むこと、
を特徴とする電極の製造方法。 A first step of forming a pre-firing film by printing or applying a conductive ink mainly composed of metal nanoparticles;
A second step of firing the pre-fired coating to form a conductive coating;
A third step of cleaning by bringing an acidic solution into contact with at least a part of the conductive coating;
Including
The conductive ink is
A metal nanoparticle, a short-chain amine having 5 or less carbon atoms, a highly polar solvent, and a dispersant having an acid value for dispersing the metal nanoparticle, the partition coefficient logP of the short-chain amine Including a metal nanoparticle dispersion in which -1.0 to 1.4
An electrode manufacturing method characterized by the above.
を特徴とする請求項1に記載の電極の製造方法。 The electrode is an electrode for a thin film transistor (TFT);
The method for producing an electrode according to claim 1.
を特徴とする請求項1又は2に記載の電極の製造方法。 The acidic solution contains sulfuric acid;
The method for producing an electrode according to claim 1 or 2.
を特徴とする請求項1〜3のいずれかに記載の電極の製造方法。 The acidic solution contains a surfactant or a water-soluble solvent;
The method for producing an electrode according to any one of claims 1 to 3.
を特徴とする請求項1〜5のいずれかに記載の電極の製造方法。 The metal nanoparticles are silver nanoparticles,
The method for producing an electrode according to any one of claims 1 to 5.
を特徴とする請求項6に記載の電極の製造方法。 The metal nanoparticle dispersion further comprises a protective dispersant having an acid value;
The method for producing an electrode according to claim 6 .
を特徴とする請求項6又は7に記載の電極の製造方法。 The short chain amine is an alkoxyamine;
The method for producing an electrode according to claim 6 or 7 .
を特徴とする請求項6〜8のいずれかに記載の電極の製造方法。 The acid value of the protective dispersant is 5 to 200,
The method for producing an electrode according to any one of claims 6 to 8 .
を特徴とする請求項6〜9のいずれかに記載の電極の製造方法。 The protective dispersant has a functional group derived from phosphoric acid,
The method for producing an electrode according to any one of claims 6 to 9 .
を特徴とする請求項6〜10のいずれかに記載の電極の製造方法。 The highly polar solvent is methanol, ethanol, isopropyl alcohol or n-propyl alcohol;
The method for producing an electrode according to any one of claims 6 to 10 .
金属ナノ粒子と、
エタノールを含む溶媒と、
水酸基を有する高沸点溶剤0.1〜3.0質量%と、を含むこと、
を特徴とする請求項1〜11のいずれかに記載の電極の製造方法。 The conductive ink is
Metal nanoparticles,
A solvent comprising ethanol;
Containing 0.1 to 3.0% by mass of a high boiling point solvent having a hydroxyl group,
Method of manufacturing an electrode according to any one of claims 1 to 11, wherein.
を特徴とする請求項12に記載の電極の製造方法。 The high boiling point solvent comprises 1,3-butylene glycol, 2,4-diethyl-1,5-pentanediol or octanediol;
The method for producing an electrode according to claim 12 .
を特徴とする請求項12又は13に記載の電極の製造方法。 The conductive ink further contains a hydrofluoroether;
The method for producing an electrode according to claim 12 or 13 , wherein:
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