JP6016581B2 - Resin composition, laminate and wiring board - Google Patents

Description

  The present invention relates to a resin composition, a laminate, and a wiring board.

  In recent years, polyimide having excellent heat resistance has been used as a surface protective film of semiconductor elements, an interlayer insulating film, or a protective insulating film for printed wiring boards. In addition, with the reduction in thickness and size of electronic and electrical equipment, printed wiring boards are required to mount electronic components and the like at high density. For this reason, the process which can be electrically connected between the conductive layers of a printed wiring board with high density is required.

  In general, in the manufacturing process of a printed wiring board, via holes and through holes are formed by NC drilling, plasma etching, laser drilling, punching, etc., and the formed via holes and through holes are plated to make conductive layers conductive. However, in laser drilling used when performing microfabrication, it is necessary to form via holes and through holes one by one. For this reason, continuous production by the roll-to-roll method becomes difficult, and it is a major obstacle in terms of cost reduction and productivity improvement.

  On the other hand, proposals have been made to form via holes and through holes by dissolving and removing polyimide used as an interlayer insulating film by chemical etching. However, while chemical etching is suitable for processing by the roll-to-roll method, a strong reducing agent such as hydrazine has to be used for chemical etching of polyimide, which hinders widespread use.

  In general, polyimide has low solubility in a sodium hydroxide solution generally used in the production process of a printed wiring board. Therefore, in order to improve the solubility in an alkaline solution, it is common to use a polyimide precursor or a polyimide having an acidic functional group (see, for example, Patent Document 1).

  In Patent Document 1, as an alkali-soluble resin, from the viewpoint of solubility in an alkaline solution, furthermore, from the viewpoint of heat resistance to heating at 200 ° C. or less in a drying furnace and flexibility of a flexible wiring board, a carboxyl group or It is described that a polyimide having a phenolic hydroxyl group and a polyimide precursor are preferable. Further, it is described that the alkali-soluble resin preferably has a polyalkylene ether structure and / or a siloxane structure from the viewpoint of flexibility and warpage of the flexible wiring board.

  Patent Document 1 discloses a method for manufacturing a multilayer flexible wiring board using blind vias. In this manufacturing method, a resin layer is provided by applying alkali-soluble fats and oils on two copper foils, and then the resin layers provided on the two copper foils are opposed to both main surfaces of the core substrate, respectively. Thus, a resin layer and a copper foil are laminated on both main surfaces of the core substrate. In this lamination process, lamination is performed using a vacuum press at 120 ° C. for 20 minutes under heating conditions of about 2 MPa.

JP 2012-169346 A

  However, as described in Patent Document 1, it has been found that when an alkali-soluble resin is used for a printed wiring board, an embedding defect in which air bubbles enter between circuits occurs during vacuum pressing at 120 ° C. . When such an imbedding failure occurs between the circuits, bubbles between the circuits in the printed wiring board expand in a high temperature environment such as during thermosetting or reflow treatment, and the insulating film is peeled off or the conductor part is exposed. There has been a problem that inconvenience of causing an insulation failure between layers or between layers occurs.

  The present invention has been made to solve such problems, and has a resin composition that is excellent in alkali processability, insulation reliability, heat resistance, and folding resistance, and also excellent in circuit embedding during pressing. It aims at providing a thing, a laminated body, and a wiring board.

  As a result of intensive investigations on the mechanism of occurrence of defective embedding, the present inventors have found that a resin composition containing a resin having a specific structure having a phenolic hydroxyl group and a flexible segment, and a thermal crosslinking agent has an alkali processability and insulation reliability. It has been found that it exhibits excellent inter-circuit embedding during pressing as well as heat resistance, heat resistance, and folding resistance, and has led to the present invention based on this finding. That is, the present invention is as follows.

The resin composition of the present invention comprises (a) a phenolic hydroxyl group and a resin containing a structure represented by the following general formulas (1) and (2), and (b) a compound containing an oxazoline group. Features.

（前記一般式（１）中、Ｒ_１及びＲ_２は、それぞれ独立に炭素数１〜炭素数５のアルキル基、フェニル基又はフェノキシ基を示す。ｍは２以上の整数であり、ｍの繰り返し単位ごとにＲ_１、Ｒ_２は互いに異なってもよい。）

（前記一般式（２）中、Ｑ_１は、炭素数１〜炭素数１８のアルキレン基を示し、ｎは２以上の整数であり、ｎの繰り返し単位ごとにＱ_１は互いに異なってもよい。）

(In the general formula (1), R ₁ and R ₂ each independently represents an alkyl group having 1 to 5 carbon atoms, a phenyl group, or a phenoxy group. M is an integer of 2 or more, and m is repeated. R ₁ and R ₂ may be different for each unit.)

(In the general formula (2), Q ₁ represents an alkylene group having 1 to 18 carbon atoms, n is an integer of 2 or more, and Q ₁ may be different for each repeating unit of n. )

  With this configuration, it is possible to obtain a laminate and a wiring board that are excellent in alkali workability at the time of manufacturing a wiring board, inter-circuit embedding property and heat resistance at the time of pressing, and excellent in folding resistance.

  In the resin composition of the present invention, the resin is preferably a polyimide resin.

  Moreover, in the resin composition of the present invention, the structures represented by the general formulas (1) and (2) are each in the range of 5 to 45% by mass in the total mass of the resin, and the total thereof is 35. It is preferable to be within a range of ˜75 mass%.

  The laminate of the present invention comprises a metal foil and a resin layer provided on the surface of the metal foil and containing the resin composition described above.

  With this configuration, it is possible to obtain a wiring board in which the resin layer is excellent in alkali workability during manufacturing of the wiring board, inter-circuit embedding property and heat resistance during pressing, and excellent in folding resistance.

  In the laminate of the present invention, it is preferable that the metal foil has a thickness in the range of 5 to 50 μm.

The wiring board of the present invention includes a core substrate having a circuit on at least one surface thereof, a resin layer provided on the surface of the core substrate having the circuit, and a metal provided on the surface of the resin layer. Foil, and the resin layer (a) a phenolic hydroxyl group and a resin containing a structure represented by the following general formulas (1) and (2); and (b) a compound containing an oxazoline group , It is formed using the resin composition containing this.

（前記一般式（１）中、Ｒ_１及びＲ_２は、それぞれ独立に炭素数１〜炭素数５のアルキル基、フェニル基又はフェノキシ基を示す。ｍは２以上の整数であり、ｍの繰り返し単位ごとにＲ_１、Ｒ_２は互いに異なってもよい。）

（前記一般式（２）中、Ｑ_１は、炭素数１〜炭素数１８のアルキレン基を示し、ｎは２以上の整数であり、ｎの繰り返し単位ごとにＱ_１は互いに異なってもよい。）

(In the general formula (1), R ₁ and R ₂ each independently represents an alkyl group having 1 to 5 carbon atoms, a phenyl group, or a phenoxy group. M is an integer of 2 or more, and m is repeated. R ₁ and R ₂ may be different for each unit.)

(In the general formula (2), Q ₁ represents an alkylene group having 1 to 18 carbon atoms, n is an integer of 2 or more, and Q ₁ may be different for each repeating unit of n. )

  With this configuration, the resin layer is excellent in alkali workability at the time of manufacturing the wiring board, inter-circuit embedding property at the time of pressing, and heat resistance, so that it is excellent in folding resistance as a wiring board.

  According to the present invention, it is possible to provide a resin composition, a laminate, and a wiring board that are excellent in alkali processability, insulation reliability, heat resistance and folding resistance, and also excellent in embedding between circuits during pressing. Can do.

  Hereinafter, an embodiment of the present invention (hereinafter abbreviated as “embodiment”) will be described in detail. In addition, this invention is not limited to the following embodiment, It can implement by changing variously within the range of the summary.

  The resin composition according to the present embodiment includes (a) a phenolic hydroxyl group and a resin containing a structure represented by the following general formulas (1) and (2), and (b) a thermal crosslinking agent.

（上記一般式（１）中、Ｒ_１及びＲ_２は、それぞれ独立に炭素数１〜炭素数５のアルキル基、フェニル基又はフェノキシ基を示す。ｍは２以上の整数であり、ｍの繰り返し単位ごとにＲ_１、Ｒ_２は互いに異なってもよい。）

（上記一般式（２）中、Ｑ_１は、炭素数１〜炭素数１８のアルキレン基を示し、ｎは２以上の整数であり、ｎの繰り返し単位ごとにＱ_１は互いに異なってもよい。）

(In the general formula (1), R ₁ and R ₂ each independently represents an alkyl group having 1 to 5 carbon atoms, a phenyl group, or a phenoxy group. M is an integer of 2 or more, and m is repeated. R ₁ and R ₂ may be different for each unit.)

(In the general formula (2), Q ₁ represents an alkylene group having 1 to 18 carbon atoms, n is an integer of 2 or more, and Q ₁ may be different for each repeating unit of n. )

  In the resin composition according to the present embodiment, the polysiloxane skeleton represented by the general formula (1) and the polyalkylene skeleton represented by the general formula (2) are skeletons effective for imparting flexibility to the resin. And such skeletons are collectively referred to as flexible segments.

  As the flexible segment, various skeletons are conventionally known. For example, JP 2008-260907 A discloses a resin composition using a polyalkylene oxide skeleton. Japanese Patent Application Laid-Open No. 2010-53223 discloses a resin composition using a polysiloxane skeleton. Furthermore, JP 2010-256881 A discloses a resin composition in which a polysiloxane skeleton and a polyalkylene oxide skeleton are used in combination.

  However, even if the resin compositions described in these prior art documents are adopted, in addition to alkali processability, insulation reliability, heat resistance and folding resistance, a resin excellent in embedding between circuits during pressing The layer cannot be made.

  That is, in the resin composition described in Japanese Patent Application Laid-Open No. 2008-260907, if a large amount of polyalkylene oxide skeleton is introduced to improve flexibility and folding resistance, the water absorption rate of the resin increases and adversely affects insulation reliability. End up.

  Moreover, in the resin composition described in JP 2010-53223 A, it is necessary to introduce a large amount of polysiloxane skeleton in order to improve inter-circuit embedding during pressing, in which case the alkali solubility of the resin Will be damaged. For this reason, it is difficult to achieve both inter-circuit embeddability and alkali solubility during pressing.

  Furthermore, the resin composition described in JP 2010-256881 uses a carboxyl group as the alkali-soluble segment. In this case, the crosslinking reaction between the carboxyl group of the polyimide and the thermal crosslinking agent proceeds at a low temperature. For this reason, after applying the solution of the resin composition to provide a resin layer, the thermoplastic resin and the thermal cross-linking agent react with heat when removing the solvent from the resin layer, and the alkali solubility is lowered. There is a problem that the etching rate decreases.

  In contrast, in the resin composition according to the present embodiment, as the flexible segment, a polysiloxane skeleton represented by the general formula (1) (hereinafter also referred to as the flexible segment (1)) and the general formula (2). In combination with a polyalkylene skeleton represented by the following (hereinafter also referred to as a flexible segment (2)), pressing (embedding between circuits) at a low temperature (for example, 90 ° C. to 120 ° C.) becomes possible. The reaction of the phenolic hydroxyl group in the resin and the reactive functional group in the crosslinking agent can be suppressed under low temperature conditions. On the other hand, the reaction between the phenolic hydroxyl group and the reactive functional group in the crosslinking agent can proceed under high temperature (for example, about 180 ° C.) conditions.

  As a result, according to the resin composition concerning this Embodiment, the following effects are acquired.

Alkali processability In the resin composition according to the present embodiment, since the embedding between circuits at the time of pressing described later is good, the reactivity between the phenolic hydroxyl group in the resin and the reactive functional group in the cross-linking agent is moderate. It is possible to set the press temperature conditions in a low low temperature region (for example, 100 ° C. for 1 minute) and to suppress the crosslinking reaction between the resin and the thermal crosslinking agent when removing the solvent and laminating the resin layer. Moreover, the fall of the alkali solubility of the resin composition before and behind a press can be prevented. In addition, when a large amount of the polysiloxane skeleton represented by the general formula (1) is introduced, the hydrophobicity increases. However, since the polyalkylene skeleton of the general formula (2) is used in a well-balanced manner, the alkali processability is excellent.

-Circuit embedding during pressing Under low temperature conditions, the reactivity between the phenolic hydroxyl group in the resin and the reactive functional group in the cross-linking agent is moderately reduced, so the general drying conditions (from the resin composition solution) For example, under a normal pressure of 95 ° C. for 30 minutes, under a general press temperature condition (for example, 100 ° C. for 1 minute), the crosslinking reaction between the resin and the thermal crosslinking agent when the resin layer is laminated by removing the solvent Can be suppressed. Thereby, the fluidity | liquidity of a resin composition is not impaired at the time of a press. In addition, even if a large amount of the polysiloxane skeleton represented by the general formula (1) is introduced, the melt viscosity cannot be extremely lowered, but the polyalkylene skeleton of the general formula (2) is used in a well-balanced manner, A resin layer excellent in inter-circuit embedding during pressing can be obtained.

-Heat resistance By introducing the polysiloxane skeleton of the above general formula (1), the gas permeability is improved and the amount of residual solvent in the resin layer after thermosetting can be reduced, so the resin layer after thermosetting is heated. In this case (for example, soldering), swelling of the resin layer due to volatilization of the residual solvent can be reduced, and high heat resistance can be obtained.

Insulation reliability If the exposed resin layer is dissolved or swelled by alkali during the patterning process after thermosetting, the insulation reliability of the resin layer is deteriorated. According to the present embodiment, under the thermosetting conditions of the resin layer (for example, 180 ° C., 1 hour), the phenolic hydroxyl group of the resin reacts with the reactive functional group of the thermal crosslinking agent to form a crosslinked bond. In addition, since the acidic functional group can be sealed, the resin layer after thermosetting has high alkali resistance. Further, when a large amount of the polyalkylene skeleton represented by the general formula (2) is introduced, the hydrophilicity increases. However, since the highly hydrophobic polysiloxane skeleton of the general formula (1) is used in a well-balanced manner, it is an excellent resin. The insulation reliability of the layer can be ensured.

・ Folding resistance When multiple layers of resin layers and metal foil (metal foil with resin) are bent and bent, if the resin layer is cracked and the underlying metal foil is exposed, it is used for flexible wiring boards. Can not do it. In order to obtain folding resistance, the resin layer needs to have flexibility even after the curing treatment. In the resin composition according to the present embodiment, by using a combination of the flexible segments (1) and (2), the elasticity can be lowered and the elongation at break in the tensile test can be improved. Can be secured.

  As explained above, according to the resin composition according to the present embodiment, it is excellent in alkali workability at the time of production of a wiring board, inter-circuit embedding property and heat resistance at the time of pressing, and excellent in bending resistance. A laminated body and a wiring board can be obtained.

  In the resin composition according to the present embodiment, the resin is preferably a polyimide resin. When the resin is a polyimide resin, excellent heat resistance and flame resistance can be imparted to the resin.

  Moreover, in the resin composition which concerns on this Embodiment, flexible segments (1) and (2) are in the range of 5-45 mass% in the total mass of resin, respectively (1) and (2) Is preferably 35 to 75% by mass. When each of the flexible segments (1) and (2) is 5% by mass or more and the total is 35% by mass or more, the flexibility, folding resistance, and inter-circuit embedding property are improved. From this viewpoint, the total of the flexible segments (1) and (2) is more preferably 40% by mass or more, and further preferably 43% by mass or more. When the flexible segments (1) and (2) are 45% by mass or less and the total is 75% by mass or less, alkali solubility, heat resistance, and insulation reliability are improved. From this viewpoint, the total of the flexible segments (1) and (2) is more preferably 70% by mass or less, and further preferably 62% by mass or less.

  The content of the flexible segments (1) and (2) in the total resin mass can be measured using, for example, pyrolysis GC / MS.

  In the resin composition according to the present embodiment, the thermal crosslinking agent is preferably a compound containing an oxazoline group. When the thermal cross-linking agent is a compound containing an oxazoline group, the reactivity with the phenolic hydroxyl group is moderately suppressed in the low temperature range from room temperature to 120 ° C., and the reactivity is remarkably improved in the high temperature range of about 180 ° C. Therefore, the storage stability of the resin composition, the alkali processability and the alkali resistance after curing are excellent.

  The laminate according to the present embodiment is a metal foil with a resin including a metal foil and a resin layer provided on the surface of the metal foil and including the resin composition described above. Hereinafter, the laminate according to the present embodiment is also referred to as a resin-added metal foil. In the resin-coated metal foil according to the present embodiment, the thickness of the metal foil is preferably in the range of 5 to 50 μm.

  Here, the resin layer is, for example, applied to the surface of the metal foil with a resin composition solution (hereinafter also referred to as varnish) obtained by dissolving the resin composition according to the present embodiment described above in a solvent, and subjected to heat treatment. Can be obtained by removing the solvent.

  A wiring board can be created using the metal foil with resin described above. More specifically, the wiring board has a core substrate having a circuit on at least one surface, and the metal foil with resin is laminated on the surface having the circuit of the core substrate so that the resin layer faces the surface. Can be obtained.

  More specifically, the method of manufacturing the wiring board is as follows. First, the metal foil with resin described above is laminated on the surface having the circuit of the core substrate so that the resin layer faces the surface. Next, the laminated core substrate and the metal foil with resin are pressed under a first temperature condition. Next, a resist mask is formed on the surface of the metal foil, and a part of the metal foil is selectively removed using the resist mask to expose a part of the resin layer surface. Next, the resin layer in the region where the resin layer surface is exposed is selectively dissolved and removed with an alkaline solution to expose a part of the circuit on the surface of the core circuit. Then, the above-described wiring board can be obtained by thermosetting the resin layer partially dissolved and removed under a second temperature condition higher than the first temperature condition.

  According to such a method of manufacturing a wiring board, the resin layer contains (a) a phenolic hydroxyl group and a resin containing the structure represented by the general formulas (1) and (2), and (b) a thermal crosslinking agent. Therefore, when the resin layer is removed with an alkaline solution, the resin composition can be easily dissolved in the alkaline solution. Further, the inter-circuit embedding property is excellent at the time of press working under the first temperature condition. In addition, since the amount of residual solvent in the resin layer after thermosetting under the second temperature condition can be reduced, the residual solvent can be volatilized even when the resin layer after thermosetting is heated (for example, soldering). The swelling of the resin layer based on it can be reduced and high heat resistance is obtained. In addition, the resin layer exposed by alkali in another alkali patterning step after thermosetting does not dissolve or swell, and the insulation reliability of the resin layer is ensured. Furthermore, since the resin layer also has sufficient flexibility in the obtained wiring board, the resin layer is not cracked and the underlying metal foil is not exposed when bent multiple times.

  That is, the wiring board according to the present embodiment is provided on the surface of the core substrate having a circuit on at least one surface thereof, the resin layer provided on the surface of the core substrate having the circuit, and the surface of the resin layer. A metal foil, and the resin layer includes (a) a phenolic hydroxyl group and a resin containing the structure represented by the general formulas (1) and (2), and (b) a thermal crosslinking agent. It is formed using a resin composition.

  With this configuration, the resin layer is excellent in alkali workability at the time of manufacturing the wiring board, inter-circuit embedding property at the time of pressing, and heat resistance. Therefore, the wiring board using the resin layer covers a fine conductor circuit. It is possible to form a fine pattern by alkali processing, and it is excellent in heat resistance and folding resistance in a process (for example, reflow in the case of solder bonding) where a heat load is applied during mounting.

  Hereinafter, the resin composition, the laminate, and the wiring board according to the present embodiment will be described in more detail.

<Resin composition>
First, each component of the resin composition according to the present embodiment will be described.

(A) Resin containing phenolic hydroxyl group and the structure represented by the above general formulas (1) and (2) (a) The resin is represented by phenolic hydroxyl group and the above general formulas (1) and (2). As long as the structure contains the flexible segments (1) and (2). Examples of (a) resin include polyimide resin, modified polyurethane, polyamide, phenol resin, resol resin, and novolac resin. Among these, (a-1) polyimide, (a-2) modified polyurethane, (a-3) polyamide and the like are preferable from the viewpoint of flexibility and folding resistance, and from the viewpoint of heat resistance and flame retardancy. (A-1) Polyimide is more preferable.

(A-1) Polyimide A polyimide containing a phenolic hydroxyl group and flexible segments (1) and (2) is synthesized by reacting a tetracarboxylic dianhydride and a diamine.

  There is no restriction | limiting in particular as tetracarboxylic dianhydride, A conventionally well-known tetracarboxylic dianhydride can be used. Examples of the tetracarboxylic dianhydride include pyromellitic anhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride. 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, 2,2 ′, 3,3′-benzophenonetetra Carboxylic dianhydride, 3,3′-oxydiphthalic dianhydride, 4,4′-oxydiphthalic dianhydride (hereinafter also abbreviated as ODPA), bis (3,4-dicarboxyphenyl) sulfone dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride, 1,1-bis (3,4-dicarboxy) Fe E) Ethane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, bis (2,3-dicarboxyphenyl) ) Methane dianhydride, 2,2-bis (4- (4-aminophenoxy) phenyl) propane, 1,3-dihydro-1,3-dioxo-5-isobenzofurancarboxylic acid-1,4-phenylene ester, 4- (2,5-dioxotetrahydrofuran-3-yl) -1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic anhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride 2,3,6,7-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 2,2-bis (4- (3,4-dicarboxyphenoxy) phenyl) hexafluoropropane dianhydride, 2 , 2-bis (4- (3,4-dicarboxybenzoyloxy) phenyl) hexafluoropropane dianhydride, 2,2'-bis (trifluoromethyl) -4,4'-bis (3,4-di Carboxyphenoxy) biphenyl dianhydride, cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 2,3,5,6-cyclohexanetetracarboxylic dianhydride, 5 -(2,5-dioxotetrahydro-3-furanyl) -3-methyl-3-cyclohexene-1,2-dicarboxylic dianhydride, bicyclo [2,2,2] Examples include octo-7-ene-2,3,5,6 tetracarboxylic dianhydride and 1,2,3,4-butanetetracarboxylic dianhydride. These tetracarboxylic dianhydrides may be used alone or in combination of two or more.

  Moreover, X-22-2290AS by Shin-Etsu Chemical Co., Ltd. can be illustrated as an acid dianhydride containing the polysiloxane skeleton (soft segment (1)) represented by the general formula (1). Moreover, as an acid dianhydride containing the polyoxyalkylene skeleton represented by the general formula (2) (flexible segment (2)), both terminal acids obtained by adding alkylene oxide to a bisphenol A skeleton manufactured by Toho Chemical Industry Co., Ltd. Dianhydrides CRD-2 (ethylene oxide 2 mol adduct), CRD-18 (ethylene oxide 18 mol adduct), CRD-30 (ethylene oxide 30 mol adduct), CRD-060 (propylene oxide 6 mol adduct), CRD -101 (propylene oxide 10 mol adduct) CRD-181 (propylene oxide 18 mol adduct) and the like.

  Examples of the diamine containing a phenolic hydroxyl group include 2,4-diaminophenol, 2,5-diaminophenol, 2,6-diaminophenol, 3,5-diaminophenol, and 2,5-diaminobenzene-1,4. -Diol, 4,6-diaminobenzene-1,3-diol, 4,4'-diaminobiphenyl-3,3'-diol, 3,3'-diaminobiphenyl-4,4'-diol, 5,5 ' -Sulfonyl-bis (2-aminophenol), 4,4'-sulfonyl-bis (2-aminophenol), 5,5'-thio-bis (2-aminophenol), 4,4'-thio-bis ( 2-aminophenol), 5,5′-oxy-bis (2-aminophenol), 4,4′-oxy-bis (2-aminophenol), 5,5′-methylene- (2-aminophenol), 4,4′-methylene-bis (2-aminophenol), 5,5 ′-(propane-2,2-diyl) -bis (2-aminophenol), 4,4 ′ -(Propane-2,2-diyl) -bis (2-aminophenol), 5,5'-phenylene-bis (2-aminophenol), and 4,4'-phenylene-bis (2-aminophenol) 2,2′-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (hereinafter also abbreviated as 6FAP).

  Examples of the diamine having a polysiloxane skeleton represented by the general formula (1) (flexible segment (1)) include α, ω-bis (2-aminoethyl) polydimethylsiloxane, α, ω-bis ( 3-aminopropyl) polydimethylsiloxane, α, ω-bis (4-aminobutyl) polydimethylsiloxane, α, ω-bis (4-aminophenyl) polydimethylsiloxane, and α, ω-bis (3-amino) Propyl) polydiphenylsiloxane, and commercially available products include PAM-E, KF-8010, X-22-161A, and X-22-1660B-3 manufactured by Shin-Etsu Chemical Co., Ltd.

  Examples of diamines having a polyoxyalkylene skeleton (flexible segment (2)) represented by the general formula (2) include Jeffamine ED-600, ED-900, ED-2003, and EDR manufactured by Huntsman. -148, HK-511 and other polyoxyethylenediamines, Jeffamine D-230, D-400, D-2000, D-4000, polyether amine D-230, D-400, D-2000 manufactured by BASF Germany Examples thereof include polyoxypropylenediamines such as those having a polytetramethyleneethylene group such as Jeffamine XTJ-542, XTJ-533, and XTJ-536.

  Furthermore, known diamines can be used in combination with these diamines. Specifically, 1,3-bis (4-aminophenoxy) alkane, 1,4-bis (4-aminophenoxy) alkane, 1, 5-bis (4-aminophenoxy) alkane, 1,4-diaminobenzene, 1,3-diaminobenzene, 2,4-diaminotoluene, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenyl ether, 3, 4'-diaminodiphenyl ether, 3,3'-dimethyl-4,4'-diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl, 2,2'-bis (trifluoromethyl) -4, 4'-diaminobiphenyl, 3,7-diamino-dimethyldibenzothiophene-5,5-dioxide, 4,4'-diaminobenzofe 3,3′-diaminobenzophenone, 4,4′-bis (4-aminophenyl) sulfide, 4,4′-diaminobenzanilide, 1,3-bis (4-aminophenoxy) -2,2-dimethyl Propane, 1,2-bis [2- (4-aminophenoxy) ethoxy] ethane, 9,9-bis (4-aminophenyl) fluorene, 5-amino-1- (4-aminomethyl) -1,3 3-trimethylindane, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene (hereinafter also abbreviated as APB) ), 4,4′-bis (4-aminophenoxy) biphenyl, 4,4′-bis (3-aminophenoxy) biphenyl, 2,2-bis (4-aminophenoxyphe) Propane, trimethylene-bis (4-aminobenzoate), 4-aminophenyl-4-aminobenzoate, 2-methyl-4-aminophenyl-4-aminobenzoate, bis [4- (4-aminophenoxy) phenyl] Sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane, 1-amino-3-aminomethyl-3,5,5 -Trimethylcyclohexane, 1,3-bis (4-aminophenoxybenzene) and the like.

  In the resin composition according to the present embodiment, when the resin is polyimide, the amount of phenolic hydroxyl group per gram of polyimide is preferably 0.20 to 2.50 mmol. When the amount of the phenolic hydroxyl group is 0.20 mmol or more, good alkali solubility can be imparted to the resin composition, and the crosslinking point with the reactive functional group of the thermal crosslinking agent is set to a sufficient amount. Heat resistance can be improved. Since the amount of the phenolic hydroxyl group is 2.50 mmol or less, the residual amount of the phenolic hydroxyl group after the reaction between the thermal crosslinking agent and the phenolic hydroxyl group at the time of curing becomes sufficiently low. Since it can be made good and the amount of crosslinking points is appropriate, the folding resistance can be made good.

  The flexible segments (1) and (2) shown in the general formulas (1) and (2) each occupy 5 to 45% by mass in the total mass of the polyimide. It is preferable in terms of solubility, heat resistance, insulation reliability, and circuit embedding during pressing. It is preferable that the content is 5% by mass or more because flexibility, folding resistance, and circuit embedding during pressing can be improved. More preferably, it is 15 mass% or more, More preferably, it is 18 mass% or more, Most preferably, it is 20 mass% or more. When the content is 45% by mass or less, alkali solubility, heat resistance, and insulation reliability can be improved, which is preferable. More preferably, it is 40 mass% or less, More preferably, it is 35 mass% or less.

  The polyimide containing a hydroxyl group and the flexible segments (1) and (2) represented by the general formulas (1) and (2) can be obtained, for example, by the following method. First, a polyimide precursor having a polyamic acid structure is produced by subjecting a reaction raw material to a polycondensation reaction from room temperature to 80 ° C. Next, this polyimide precursor is thermally imidized by heating at 100 ° C. to 400 ° C., or chemically imidized using an imidizing agent such as acetic anhydride, whereby a polyimide having a repeating unit structure corresponding to polyamic acid is obtained. can get. In the case of imidization by heating, in order to remove by-product water, dehydration is carried out under reflux using a Dean-Stark type dehydrator in the presence of an azeotropic agent (preferably toluene or xylene). Is also preferable.

  Moreover, it is also preferable to obtain a polyimide by carrying out the reaction at 80 ° C. to 220 ° C. to advance both the synthesis of the polyimide precursor and the thermal imidization reaction. For example, after suspending or dissolving a diamine component and an acid dianhydride component in an organic solvent, the reaction is carried out under heating at 80 ° C. to 220 ° C., and both generation of a polyimide precursor and dehydration imidization are performed. By making it, a polyimide can be obtained.

  Moreover, the terminal of the polymer main chain of the polyimide precursor can be end-capped with an end-capping agent made of a monoamine derivative or a carboxylic acid derivative. By sealing the terminal of the polymer main chain of polyimide, the storage stability derived from the terminal functional group is excellent.

  Examples of the end capping agent comprising a monoamine derivative include aniline, o-toluidine, m-toluidine, p-toluidine, 2,3-xylidine, 2,6-xylidine, 3,4-xylidine, and 3,5-xylidine. O-chloroaniline, m-chloroaniline, p-chloroaniline, o-bromoaniline, m-bromoaniline, p-bromoaniline, o-nitroaniline, p-nitroaniline, m-nitroaniline, o-aminophenol P-aminophenol, m-aminophenol, o-anisidine, m-anisidine, p-anisidine, o-phenetidine, m-phenetidine, p-phenetidine, o-aminobenzaldehyde, p-aminobenzaldehyde, m-aminobenzaldehyde, o-aminobenzonitrile, p-aminobenzonitrile Ryl, m-aminobenzonitrile, 2-aminobiphenyl, 3-aminobiphenyl, 4-aminobiphenyl, 2-aminophenylphenyl ether, 3-aminophenylphenyl ether, 4-aminophenylphenyl ether, 2-aminobenzophenone, 3 -Aminobenzophenone, 4-aminobenzophenone, 2-aminophenyl phenyl sulfide, 3-aminophenyl phenyl sulfide, 4-aminophenyl phenyl sulfide, 2-aminophenyl phenyl sulfone, 3-aminophenyl phenyl sulfone, 4-aminophenyl phenyl sulfone , Α-naphthylamine, β-naphthylamine, 1-amino-2-naphthol, 5-amino-1-naphthol, 2-amino-1-naphthol, 4-amino-1-naphthol, 5-amino Aromatic monoamines of 2-naphthol, 7-amino-2-naphthol, 8-amino-1-naphthol, 8-amino-2-naphthol, 1-aminoanthracene, 2-aminoanthracene, and 9-aminoanthracene Of these, derivatives of aniline are preferably used. These may be used alone or in combination of two or more.

  Examples of the terminal blocking agent comprising a carboxylic acid derivative include carboxylic anhydride derivatives, such as phthalic anhydride, 2,3-benzophenone dicarboxylic anhydride, 3,4-benzophenone dicarboxylic anhydride, 2,3- Dicarboxyphenyl phenyl ether anhydride, 3,4-dicarboxyphenyl phenyl ether anhydride, 2,3-biphenyl dicarboxylic acid anhydride, 3,4-biphenyl dicarboxylic acid anhydride, 2,3-dicarboxyphenyl phenyl sulfone anhydride 3,4-dicarboxyphenyl phenyl sulfone anhydride, 2,3-dicarboxyphenyl phenyl sulfide anhydride, 3,4-dicarboxyphenyl phenyl sulfide anhydride, 1,2-naphthalenedicarboxylic acid anhydride, 2, 3-Naphthalenedicarboxylic anhydride, 1,8-naphthalene Carboxylic acid anhydride, 1,2-anthracene dicarboxylic acid anhydride, 2,3-anthracene dicarboxylic acid anhydride, 1,9-aromatic dicarboxylic acid anhydrides such as anthracene dicarboxylic acid anhydride. Of these aromatic dicarboxylic acid anhydrides, phthalic anhydride is preferably used. These may be used alone or in combination of two or more.

  As a solvent used for the synthesis of polyimide, amide solvents such as N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N, N-diethylformamide, N-methyl-2-pyrrolidone, γ -Butyrolactone (hereinafter also abbreviated as "GBL"), lactone solvents such as γ-valerolactone, sulfur-containing solvents such as dimethyl sulfoxide, diethyl sulfoxide and hexamethyl sulfoxide, phenol solvents such as cresol and phenol, diethylene glycol dimethyl ether ( Ether solvents such as diglyme), triethylene glycol dimethyl ether (triglyme), tetraglyme, dioxane, tetrahydrofuran, and ester solvents such as butyl benzoate, ethyl benzoate, and methyl benzoate. I can get lost. These organic solvents may be used alone or in combination.

  Although it does not specifically limit, from the viewpoint of increasing the molecular weight of polyimide and improving heat resistance and folding resistance, the number of moles of acid dianhydride in the polyimide (A) and the number of moles of diamine (B) The ratio (A) / (B) is preferably 0.3 to 2.0, and more preferably 0.5 to 1.3.

  The hydroxyl group-containing polyimide preferably has a weight average molecular weight of 5,000 or more and 500,000 or less. Here, the weight average molecular weight refers to a molecular weight measured by gel permeation chromatography using polystyrene having a known number average molecular weight as a standard. The weight average molecular weight is more preferably from 10,000 to 200,000, and even more preferably from 15,000 to 100,000. When the weight average molecular weight is 5,000 or more and 500,000 or less, the strength and elongation of the protective film obtained using the resin composition solution is improved, and the mechanical properties are excellent. Further, it can be applied without blurring at a desired film thickness at the time of application.

(A-2) Modified polyurethane As a modified polyurethane containing a hydroxyl group and the flexible segments (1) and (2) of the above general formulas (1) and (2), a diamine skeleton is introduced into a urethane bond via a urea bond. Urea-modified polyurethane is exemplified, but polyurethane modified through an imide bond, an amide bond, an amide-imide bond, or the like may be used.

  Urea-modified polyurethane is synthesized by reacting diisocyanate, diol and diamine.

  Specific examples of the diisocyanate compound include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, p-xylene diisocyanate, m-xylene diisocyanate, 4,4′-diphenylmethane diisocyanate (hereinafter also abbreviated as MDI), 1,5-naphthalene diisocyanate, 3,3′-dimethylbiphenyl-4,4′-diisocyanate, hexanemethylene diisocyanate, trimethylhexanemethylene diisocyanate, lysine diisocyanate, isophorone diisocyanate, 4,4′-methylenebis (cyclohexyl isocyanate), Examples thereof include methylcyclohexyl 2,4- (or 2,6) diisocyanate and 1,3-bis (isocyanate methyl) cyclohexane. These may be used alone or in combination.

  Examples of the diol containing the flexible segment (1) include KF-6001, KF-6002, and KF-6003 modified at both ends with a hydroxyl group. Examples of the diol containing the structure of the flexible segment (2) include Ethylene oxide adduct of bisphenol A, propylene oxide adduct of bisphenol A, ethylene oxide adduct of bisphenol F, propylene oxide adduct of bisphenol F, ethylene oxide adduct of hydrogenated bisphenol A, propylene oxide addition of hydrogenated bisphenol A Examples include the body.

  Specific examples of other diol compounds include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, propylene glycol, dipropylene glycol, polyethylene glycol, polypropylene glycol, polyester polyol, polycarbonate diol, neopentyl glycol, 1,3. -Butylene glycol, 1,6-hexanediol, 2,2,4-trimethyl-1,3-pentanediol, 1,4-bis-β-hydroxyethoxycyclohexane, cyclohexanedimethanol, tricyclodecane dimethanol, water Bisphenol A, hydrogenated bisphenol F, hydroquinone dihydroxyethyl ether, p-xylene glycol, dihydroxyethyl sulfone, bis (2 Hydroxyethyl) -2,4-tolylene dicarbamate, 2,4-tolylene-bis- (2-hydroxyethyl) -m-xylene carbamate, bis (2-hydroxyethyl) isophthalate, and commercially available polycarbonate diol and polybutadiene diol And can be used in combination with a diol containing the structure of the flexible segment (1) and / or the flexible segment (2).

  Examples of the diamine containing a phenolic hydroxyl group include 2,4-diaminophenol, 2,5-diaminophenol, 2,6-diaminophenol, 3,5-diaminophenol, and 2,5-diaminobenzene-1. , 4-diol, 4,6-diaminobenzene-1,3-diol, 4,4′-diaminobiphenyl-3,3′-diol, 3,3′-diaminobiphenyl-4,4′-diol, 5, 5'-sulfonyl-bis (2-aminophenol), 4,4'-sulfonyl-bis (2-aminophenol), 5,5'-thio-bis (2-aminophenol), 4,4'-thio- Bis (2-aminophenol), 5,5′-oxy-bis (2-aminophenol), 4,4′-oxy-bis (2-aminophenol), 5,5′-methyl Bis (2-aminophenol), 4,4′-methylene-bis (2-aminophenol), 5,5 ′-(propane-2,2-diyl) -bis (2-aminophenol), 4, 4 '-(propane-2,2-diyl) -bis (2-aminophenol), 5,5'-phenylene-bis (2-aminophenol), and 4,4'-phenylene-bis (2-amino) Phenol) 2,2′-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (hereinafter also abbreviated as 6FAP).

  In addition, when the flexible segments (1) and (2) shown in the general formulas (1) and (2) are introduced into the polymer skeleton, they are introduced via urea bonds using diamines containing these structures. Also good.

  Examples of the diamine having a polysiloxane skeleton represented by the general formula (1) (flexible segment (1)) include α, ω-bis (2-aminoethyl) polydimethylsiloxane, α, ω-bis ( 3-aminopropyl) polydimethylsiloxane, α, ω-bis (4-aminobutyl) polydimethylsiloxane, α, ω-bis (4-aminophenyl) polydimethylsiloxane, and α, ω-bis (3-amino) Propyl) polydiphenylsiloxane, and commercially available products include PAM-E, KF-8010, X-22-161A, and X-22-1660B-3 manufactured by Shin-Etsu Chemical Co., Ltd.

  Examples of diamines having a polyoxyalkylene skeleton (flexible segment (2)) represented by the general formula (2) include Jeffamine ED-600, ED-900, ED-2003, and EDR-148 manufactured by Huntsman. , Polyoxyethylenediamine such as HK-511, Jeffamine D-230, D-400, D-2000, D-4000, polyether amine D-230, D-400, D-2000 manufactured by BASF Germany Examples of use include polyoxypropylene diamine and those having polytetramethylene ethylene groups such as Jeffamine XTJ-542, XTJ-533, and XTJ-536.

  The amount of phenolic hydroxyl group per gram of modified polyurethane is preferably 0.20 to 2.50 mmol. When the amount of the phenolic hydroxyl group is 0.20 mmol or more, good alkali solubility can be imparted to the resin composition, and the crosslinking point with the reactive functional group of the thermal crosslinking agent is set to a sufficient amount. Heat resistance can be improved. Since the amount of the phenolic hydroxyl group is 2.50 mmol or less, the residual amount of the phenolic hydroxyl group after the reaction between the thermal crosslinking agent and the phenolic hydroxyl group at the time of curing becomes sufficiently low. Since it can be made good and the amount of crosslinking points is appropriate, the folding resistance can be made good.

  The flexible segments (1) and (2) of the above general formulas (1) and (2) occupy 5 to 45% by mass in the total mass of the modified polyurethane. The flexibility, folding resistance and alkali solubility of the resin composition From the viewpoint of heat resistance, insulation reliability, and circuit embedding property during pressing. It is preferable that the content is 5% by mass or more because flexibility, folding resistance, and circuit embedding during pressing can be improved. More preferably, it is 15 mass% or more, More preferably, it is 18 mass% or more, Most preferably, it is 20 mass% or more. When the content is 45% by mass or less, alkali solubility, heat resistance, and insulation reliability can be improved, which is preferable. More preferably, it is 40 mass% or less, More preferably, it is 35 mass% or less.

  The modified polyurethane containing the phenolic hydroxyl group and the flexible segments (1) and (2) shown in the general formulas (1) and (2) of the present embodiment is a diisocyanate compound, a diamine compound and Although it can also be obtained by reacting the diol compound at a temperature of about 20 to 120 ° C., when a diamine containing a phenolic hydroxyl group is used, the diisocyanate compound and the polyol compound are used in a solvent-free or solvent beforehand at 20 to 120 ° C. A method obtained by reacting at a temperature of about 1 to synthesize a prepolymer, and then adding a diamine compound containing a phenolic hydroxyl group and causing a chain extension reaction at a temperature of about 20 to 120 ° C. is preferable because the reaction can be easily controlled. . The reaction is preferably performed in the presence of a urethanization catalyst.

  Although it does not specifically limit, from the viewpoint of increasing the molecular weight of the modified polyurethane and improving heat resistance and folding resistance, the number of moles of diisocyanate (C), the number of moles of diol (D), and the number of moles of diamine The ratio [(C) / ((D) + (E))] to the sum of (E) is preferably 0.3 to 2.0, more preferably 0.5 to 1.3. is there.

  The solvent used in the reaction in the solvent is not particularly limited, but nitrogen-containing solvents such as N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N, N-diethyl Formamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, and N-methylcaprolactam, a sulfur-containing atomic solvent such as dimethyl sulfoxide, diethyl sulfoxide, dimethyl sulfone, diethyl sulfone, and Hexamethylsulfuramide, as well as oxygen-containing solvents such as phenolic solvents cresol, phenol, xylenol, diglyme solvents diethylene glycol dimethyl ether, ethylene glycol diethyl ether, carbitol Acetate, propylene glycol Ether ether, propylene glycol ethyl ether acetate, dipropylene glycol methyl ether acetate, diethylene glycol ethyl ether acetate, methyl methoxypropionate, ethyl methoxypropionate, methyl ethoxypropionate, ethyl ethoxypropionate, triethylene glycol dimethyl ether, tetra Examples include glyme, ketone solvents such as acetone, acetophenone, propiophenone, cyclohexanone and isophorone, ether solvents such as ethylene glycol, dioxane and tetrahydrofuran, and lactone solvents such as γ-butyrolactone. In particular, γ-butyrolactone, diethylene glycol ethyl ether acetate, triethylene glycol dimethyl ether and the like can be preferably used.

  The urethanization catalyst is not particularly limited as long as it is a compound that promotes the urethanation reaction. Specifically, for example, a tin-based catalyst such as dibutyltin dilaurate, dioctyltin dilaurate, stannous octoate, Ethylenediamine, triethylamine, N, N, N ′, N′-tetramethylpropylenediamine, N, N, N ′, N′-tetrakis (2-hydroxypropyl) ethylenediamine, N-methylmorpholine, 1,2-dimethylimidazole, 1,5-diaza-bicyclo (4,3,0) nonene-5, 1,8-diazabicyclo (5,4,0) -undecene-7 (hereinafter abbreviated as DBU), borane salts of these amine catalysts, Various amine salt catalysts such as DBU phenol salt, DBU octylate, DBU carbonate, naphthenic acid Neshiumu, lead naphthenate, carboxylates such as potassium acetate, triethyl phosphine, trialkylphosphine such as tribenzylphosphine, alkoxides of alkali metals such as sodium methoxide, and, zinc-based organometallic catalysts. An amine-based catalyst such as DBU is preferred from the viewpoint of the insulating properties of the cured product and the environmental load.

  The hydroxyl group-containing polyimide preferably has a weight average molecular weight of 5,000 or more and 500,000 or less. The weight average molecular weight is more preferably from 10,000 to 200,000, and even more preferably from 15,000 to 100,000. When the weight average molecular weight is 5,000 or more and 500,000 or less, the strength and elongation of the protective film obtained using the resin composition solution is improved, and the mechanical properties are excellent. Furthermore, it can apply | coat without a blur with the film thickness desired at the time of application | coating.

(A-3) Polyamide A polyamide containing a phenolic hydroxyl group and flexible segments (1) and (2) can be synthesized by a reaction of a dicarboxylic acid and a diamine.

  Examples of the dicarboxylic acid having a phenolic hydroxyl group include 5-hydroxyisophthalic acid and 4-hydroxyisophthalic acid.

  As the dicarboxylic acid having a polysiloxane skeleton represented by the above general formula (1) (flexible segment (1)), as both-end carboxylic acid group-containing polydimethylsiloxane, BY16-750 manufactured by Toray Dow Corning Silicone, BY16-750C etc. are mentioned.

  Specific examples of other dicarboxylic acids include phthalic acid, isophthalic acid, terephthalic acid, 4,4′-oxydibenzoic acid, 4,4′-biphenyldicarboxylic acid, 3,3′-, methylene dibenzoic acid, 4,4′-methylene dibenzoic acid, 4,4′-thiodibenzoic acid, 3,3′-carbonyl dibenzoic acid, 4,4′-carbonyl dibenzoic acid, 4,4′-sulfonyldibenzoic acid, 1,5-naphthalenedicarboxylic acid, 1,4-naphthalenedicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 1,2-naphthalenedicarboxylic acid, 2,2′-bis (3-carboxyphenyl) hexafluoropropane, 2, Examples thereof include, but are not limited to, 2′-bis (4-carboxyphenyl) hexafluoropropane. Moreover, you may use these 1 type or in mixture of 2 or more types. Moreover, it is preferable to use what made the said dicarboxylic acid into acid chloride from a reactive viewpoint with diamine. A commercially available dicarboxylic acid chloride can be used, but it can also be synthesized by a known method using an acid chloride reagent such as thionyl chloride as the dicarboxylic acid.

  Examples of the diamine containing a phenolic hydroxyl group include 3,5-diaminophenol. In the case of a diamine having a structure in which an amino group and a hydroxyl group are adjacent to each other, ring closure may occur in the curing step, and benzoxazole may be generated. At this time, water is generated as a by-product, which is not suitable from the viewpoint of outgassing.

  Examples of the diamine having a polysiloxane skeleton represented by the general formula (1) (flexible segment (1)) include α, ω-bis (2-aminoethyl) polydimethylsiloxane, α, ω-bis ( 3-aminopropyl) polydimethylsiloxane, α, ω-bis (4-aminobutyl) polydimethylsiloxane, α, ω-bis (4-aminophenyl) polydimethylsiloxane, and α, ω-bis (3-amino) Propyl) polydiphenylsiloxane, and commercially available products include PAM-E, KF-8010, X-22-161A, and X-22-1660B-3 manufactured by Shin-Etsu Chemical Co., Ltd.

  Examples of diamines having a polyoxyalkylene skeleton (flexible segment (2)) represented by the general formula (2) include Jeffamine ED-600, ED-900, ED-2003, and EDR-148 manufactured by Huntsman. , Polyoxyethylenediamine such as HK-511, Jeffamine D-230, D-400, D-2000, D-4000, polyether amine D-230, D-400, D-2000 manufactured by BASF Germany Examples of use include polyoxypropylene diamine and those having polytetramethylene ethylene groups such as Jeffamine XTJ-542, XTJ-533, and XTJ-536.

  The amount of phenolic hydroxyl group per gram of polyamide is preferably 0.20 to 2.50 mmol. When the amount of the phenolic hydroxyl group is 0.20 mmol or more, good alkali solubility can be imparted to the resin composition, and the crosslinking point with the reactive functional group of the thermal crosslinking agent is set to a sufficient amount. Heat resistance can be improved. Since the amount of the phenolic hydroxyl group is 2.50 mmol or less, the residual amount of the phenolic hydroxyl group after the reaction between the thermal crosslinking agent and the phenolic hydroxyl group at the time of curing becomes sufficiently low. Since it can be made good and the amount of crosslinking points is appropriate, the folding resistance can be made good.

  The flexible segments (1) and (2) shown in the general formulas (1) and (2) occupy 5 to 45% by mass in the total mass of the polyamide. The flexibility, folding resistance and alkali solubility of the resin composition From the viewpoint of heat resistance, insulation reliability, and circuit embedding property during pressing. It is preferable that the content is 5% by mass or more because flexibility, folding resistance, and circuit embedding during pressing can be improved. More preferably, it is 15 mass% or more, More preferably, it is 18 mass% or more, Most preferably, it is 20 mass% or more. When the content is 45% by mass or less, alkali solubility, heat resistance, and insulation reliability can be improved, which is preferable. More preferably, it is 40 mass% or less, More preferably, it is 35 mass% or less.

  Although not particularly limited, the ratio of the number of moles of dicarboxylic acid (F) to the number of moles of diamine (G) (F) from the viewpoint of increasing the molecular weight of polyamide and improving heat resistance and folding resistance. ) / (G) is preferably 0.3 or more, and more preferably 0.5 or more. On the other hand, from the viewpoint of controlling the amount of active dicarboxylic acid and improving storage stability, (F) / (G) is preferably 2.0 or less, more preferably 1.3 or less. preferable. Further, when acid chloride is used as a raw material, (F) / (G) is preferably 1.0 or less in order to control the amount of chlorine remaining in the polymer skeleton and to use it suitably as an electronic material.

(B) Thermal crosslinking agent The thermal crosslinking agent is not particularly limited as long as it has a crosslinkable functional group that reacts with a phenolic hydroxyl group in the resin. Examples of the compound having a crosslinkable functional group include (b-1) oxazoline compound, (b-2) epoxy compound, methylol compound, isocyanate compound, benzoxazine compound, acid anhydride compound, melamine resin, urea resin, and And carbodiimide compounds, (b-1) oxazoline compounds and (b-2) epoxy compounds are preferred from the viewpoints of availability, reactivity, storage stability, and the like.

(B-1) Oxazoline Compound An oxazoline compound is a compound having at least one oxazoline group in the molecule. As the oxazoline compound, those having two or more oxazoline groups in the molecule are preferable from the viewpoint of sealing the hydroxyl group of polyimide and forming a cross-link with the polyimide.

  Examples of the oxazoline compound include 1,3-bis (4,5-dihydro-2-oxazolyl) benzene (hereinafter also abbreviated as PBO), K-2010E, K-2020E, K-2030E manufactured by Nippon Shokubai Co., Ltd. 2,6-bis (4-isopropyl-2-oxazolin-2-yl) pyridine, 2,6-bis (4-phenyl-2-oxazolin-2-yl) pyridine, 2,2′-isopropylidenebis (4 -Phenyl-2-oxazoline) and 2,2'-isopropylidenebis (4-tertiarybutyl-2-oxazoline). Also, 2-vinyl-2-oxazoline, 2-vinyl-4-methyl-2-oxazoline, 2-vinyl-5-methyl-2-oxazoline, 2-isopropenyl-2-oxazoline, 2-isopropenyl-4- Mention may be made of copolymers of polymerizable monomers such as methyl-2-oxazoline. These oxazoline compounds may be used alone or in combination of two or more.

(B-2) Epoxy compound As the epoxy compound, it is preferable to use an epoxy compound having two or more epoxy groups in the molecule. Examples of the bifunctional epoxy compound include bisphenol A type epoxy resin, bisphenol S type epoxy resin, bisphenol type epoxy resin such as bisphenol F type epoxy resin, phenol novolac epoxy resin, cresol novolac type epoxy resin, novolak such as bisphenol type novolak. Type epoxy resin, modified novolak type epoxy resin, and dicyclopentadiene type epoxy resin which is an epoxidized product of various dicyclopentadiene modified phenol resins obtained by reacting dicyclopentadiene with various phenols. Among these bifunctional epoxy compounds, bisphenol A type epoxy resin, novolac type epoxy resin, modified novolac type epoxy resin and dicyclopentadiene type epoxy resin are used from the viewpoint of excellent heat resistance, solvent resistance, and plating solution resistance. Is preferred.

  Examples of the bisphenol A type epoxy resin include EPICRON (registered trademark) 840 (hereinafter 840) manufactured by DIC, jER 828EL, jER 1001, and jER 1004 manufactured by Mitsubishi Chemical Corporation.

  Examples of the dicyclopentadiene type epoxy resin include XD-1000 (trade name: manufactured by Nippon Kayaku Co., Ltd.) and HP-7200 (trade name: manufactured by DIC). Examples of the novolak type epoxy resin include NC-7000L (trade name: manufactured by Nippon Kayaku Co., Ltd.) and Epicron N-680 (trade name: manufactured by DIC). Examples of the modified novolac type epoxy resin include NC-3000 (trade name: manufactured by Nippon Kayaku Co., Ltd.). These epoxy compounds (epoxy resins) may be used alone or in admixture of two or more. In addition, it is preferable to use high-purity products in which the impurity ions such as alkali metal ions, alkaline earth metal ions, halogen ions, particularly chlorine ions and hydrolyzable chlorine are reduced to 300 ppm or less for these epoxy resins. This is preferable for prevention of corrosion and corrosion of metal conductor circuits.

  When using the said epoxy compound, a hardening | curing agent can also be used as needed. Examples of the curing agent include phenolic compounds, aliphatic amines, alicyclic amines, aromatic polyamines, polyamides, aliphatic acid anhydrides, alicyclic acid anhydrides, aromatic acid anhydrides, dicyandiamide, and organic acid dihydrazides. , Boron trifluoride amine complexes, imidazoles, and tertiary amines. Among them, phenol compounds are preferable, and phenol compounds having at least two phenolic hydroxyl groups in the molecule are more preferable. Examples of such compounds include phenol novolak resins, cresol novolak resins, t-butylphenol novolak resins, dicyclopentagen cresol novolak resins, dicyclopentagen phenol novolak resins, xylylene-modified phenol novolak resins, naphthol compounds, tris Examples include phenolic compounds, tetrakisphenol novolak resins, bisphenol A novolac resins, poly-p-vinylphenol resins, and phenol aralkyl resins. These compounds preferably have a number average molecular weight in the range of 400-1500. Thereby, the outgas which becomes a cause of contamination of a semiconductor element or a device at the time of assembling and heating the semiconductor device can be effectively reduced.

  As the addition amount of the thermal crosslinking agent, the ratio of the molar amount of the hydroxyl group of the resin to the molar amount of the reactive functional group (for example, oxazoline group, epoxy group) is hydroxyl group / reactive functional group = 2 to 0.5. The range is preferable, and the range of 1.5 to 0.7 is more preferable. When the hydroxyl group / reactive functional group = 2 or less, the alkali processability of the resin composition is improved, and when the hydroxyl group / reactive functional group = 0.5 or more, the flexibility and heat resistance of the resin composition are improved. Will improve.

(C) Flame retardant In the resin composition which concerns on this Embodiment, a flame retardant can also be contained and used from a viewpoint of improving a flame retardance. The type of flame retardant is not particularly limited, and examples thereof include halogen-containing compounds, phosphorus-containing compounds, and inorganic flame retardants. These flame retardants may be used alone or in combination of two or more.

  There is no restriction | limiting in particular as addition amount of a flame retardant, According to the kind of flame retardant to be used, it can change suitably. The amount of the flame retardant added is generally preferably in the range of 5% by mass to 50% by mass based on the polyimide in the resin composition.

  Examples of the halogen-containing compound include organic compounds containing a chlorine atom or a bromine atom. Examples of the halogen-containing compound flame retardant include pentabromodiphenyl ether, octabromodiphenyl ether, decabromodiphenyl ether, tetrabromobisphenol A, and hexabromocyclododecane tetrabromobisphenol A.

  Examples of the phosphorus-containing compound include phosphazene, phosphine, phosphine oxide, phosphate ester, and phosphite ester. In particular, from the viewpoint of compatibility with the resin composition, phosphazene, phosphite oxide, or phosphate ester is preferably used. As the phosphazene, for example, a substituted hexa (phenoxy) cyclotriphosphazene having a cyano group, a hydroxyl group, a methyl group, or the like can be used.

  Examples of inorganic flame retardants include antimony compounds and metal hydroxides. Examples of the antimony compound include antimony trioxide and antimony pentoxide. By using an antimony compound in combination with the above halogen-containing compound, antimony oxide pulls out halogen atoms from the flame retardant to produce antimony halide in the thermal decomposition temperature range of the plastic, thus synergistically increasing the flame retardancy. Can do. Examples of the metal hydroxide include aluminum hydroxide and magnesium hydroxide.

  Inorganic flame retardants do not dissolve in organic solvents. For this reason, as an inorganic flame retardant, it is preferable that the particle size of the powder is 100 micrometers or less. If the particle size of the powder is 100 μm or less, it is preferable because it is easily mixed into the resin composition and the transparency of the cured resin is maintained. Furthermore, from the viewpoint of improving flame retardancy, the particle size of the powder is more preferably 50 μm or less, and even more preferably 10 μm or less.

(D) Others In the resin composition according to the present embodiment, from the viewpoint of preventing oxidation of the resin composition, an antioxidant can be used. As an antioxidant, for example, bis [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionic acid] [ethylene bis (oxyethylene)] (trade name: IRGANOX 245), BASF) can be used.

  Moreover, the resin composition which concerns on this Embodiment can also be made to contain an adhesive material from a viewpoint of improving the adhesiveness of metal foil and a resin layer. Although it does not specifically limit as an adhesive material, A phenol compound, a nitrogen-containing organic compound, an acetylacetone metal complex etc. can be mentioned.

  The resin composition according to the present embodiment is preferably a resin composition solution (varnish) containing an organic solvent from the viewpoint of uniformity during coating. In this case, it is possible to obtain a resin layer by heating and drying after coating and removing the solvent.

  Examples of such an organic solvent include alcohol solvents such as ethanol, methanol, isopropyl alcohol, ethylene glycol, and propylene glycol; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; N, N-dimethylacetamide, N, N- Amide solvents such as diethylacetamide, N, N-dimethylformamide, N, N-diethylformamide, N-methyl-2-pyrrolidone, lactone solvents such as γ-butyrolactone, γ-valerolactone, dimethyl sulfoxide, diethyl sulfoxide, hexamethyl Sulfur-containing solvents such as sulfoxide, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, propylene glycol monomethyl ether, dioxane, tetrahydro Examples include ether solvents such as furan, and ester solvents such as butyl benzoate, ethyl benzoate, and methyl benzoate. These organic solvents may be used alone or in combination.

  As the organic solvent, it is preferable from the viewpoint of production cost that the resin solution containing the organic solvent used in the synthesis of the resin is used as it is without removing the solvent. A portion (for example, solid content of polyimide) may be re-precipitated and dried, and then re-dissolved in the organic solvent described above.

  The content of the organic solvent in the resin composition solution is not particularly limited as long as it is a concentration at which the solution can be applied to form a resin layer. The content of the organic solvent is preferably such that the solid content concentration in the solution is 20% by mass or more and 80% by mass or less from the viewpoint of easily controlling the film thickness of the resin layer to be formed. From the viewpoint of film thickness uniformity of the resin layer, the content is more preferably 30% by mass or more and 70% by mass or less.

  When forming a coating film, the viscosity and thixotropy are adjusted according to the coating method. If necessary, a filler or a thixotropic agent can be added and used. It is also possible to add additives such as known antifoaming agents, leveling agents and pigments.

  When a resin composition solution is applied, the viscosity and thixotropy are adjusted according to the application method. In this case, it is also possible to add and use a filler or a thixotropy imparting agent as necessary. It is also possible to add additives such as known antifoaming agents, leveling agents and pigments. Moreover, you may add antioxidant from a viewpoint which prevents the oxidation in high temperature oxygen atmosphere. Furthermore, it can also be used as a negative photosensitive resin composition by adding an acrylic monomer and a photo radical generator.

<Metal foil with resin (laminate)>
The resin composition according to the present embodiment can be suitably used for a metal foil with a resin. The metal foil with a resin according to the present embodiment includes a metal foil and a resin layer provided on the metal foil and including the resin composition. This metal foil with resin preferably has a thickness in the range of 5 μm to 50 μm.

  Known metal foils and alloy foils can be used as the metal foil, but electrolytic copper foil and rolled copper foil are preferred from the viewpoint of wiring formability. Furthermore, when using for fine wiring formation property and especially a flexible substrate, a copper foil with a thickness of 18 μm or less is preferable from the viewpoint of folding resistance. The copper foil surface may be subjected to a surface treatment such as a roughening treatment, a known plating treatment such as nickel or zinc, a chromate treatment, an aluminum alcoholate treatment, an aluminum chelate treatment, or a silane coupling agent treatment.

  Next, the manufacturing method of resin-coated metal foil will be described. First, the resin composition solution is applied onto the metal foil by any method. Examples of the coating method include bar coating, roller coating, die coating, blade coating, dip coating, doctor knife, spray coating, flow coating, spin coating, slit coating, and brush coating. After coating, a heat drying treatment is performed to remove the solvent in the resin composition applied on the substrate.

  Although it does not specifically limit about the aspect of a heating, In order to make it soluble in alkaline aqueous solution, it is preferable to heat at 50 to 140 degreeC for 1 minute-60 minutes. Further, heating in a high temperature region (for example, 160 ° C. to 200 ° C.) mainly causes sealing of acidic functional groups and a crosslinking reaction, and becomes insoluble in an aqueous alkali solution.

  Moreover, in order to fully remove volatile components, such as a solvent, without impairing alkali solubility, you may heat for 1 minute-60 minutes by 50 degreeC-140 degreeC by a vacuum drying method etc. If a large amount of solvent remains after the drying step, outgas is generated during the subsequent heating step.

  Since the resin composition heated at 50 to 140 ° C. for 1 to 60 minutes is soluble in an alkaline aqueous solution, it eliminates the need for laser drilling or the like used in the manufacture of flexible printed wiring boards. It can be used as an insulating material of resin-coated metal foil type.

  An optional antifouling or protective cover film may be provided on the resin layer of the metal foil with resin. As a cover film, if it is a film which protects resin compositions, such as low density polyethylene, it will not be limited.

<Printed wiring board>
The metal foil with resin according to the present embodiment can be suitably used for a double-sided or single-sided flexible printed wiring board. When a multilayer flexible wiring board is manufactured by laminating the above metal foil with resin on both sides of a core substrate on which circuit formation on both sides has been completed, a resin using the resin composition according to the present embodiment is used as the formation method. Examples of the method include performing a heat press, a heat laminate, a heat vacuum press, a heat vacuum laminate and the like in a state where the cover film on the layer is peeled off and brought into contact with the conductive layers on both sides of the double-sided flexible substrate. Among these, from the viewpoint of adhesiveness with the resin layer and resin embedding properties in the through-hole in which the double-sided flexible substrate of the core substrate is formed and the copper wiring circuit, thermal vacuum press and thermal vacuum lamination are preferable. Furthermore, from the viewpoint of productivity by roll-to-roll, thermal vacuum lamination is particularly preferable.

  The heating temperature at the time of laminating and adhering the resin layer is not limited as long as it can be adhered to the conductive substrate. From the viewpoint of adhesion to the conductive substrate, 50 ° C. or higher and 150 ° C. or lower is preferable. More preferably, it is 70 degreeC or more and 120 degrees C or less.

  Moreover, the pressure at the time of lamination | stacking will not be limited if it is a pressure condition which can control a resin flow in combination with a heating temperature condition. In order not to depend on a vacuum press or a vacuum laminator apparatus, it is preferable that it is 0.3 MPa or more and 4.0 MPa or less. For shortening the production time, a vacuum laminator, a quick press device, or the like is preferably used, and more preferably 0.5 MPa or more and 1.0 MPa or less.

  Next, the blind via forming process for the resin layer will be described. The blind via formation process is disclosed in Patent Document 1.

  After laminating a dry film resist on the metal layer of the laminated metal foil with resin, a conformal mask is formed on the part where the blind via is formed by exposure, development and etching, and the resin layer where the blind via is formed Only expose. At the same time as the dry film resist is peeled off with an alkaline solution, the resin layer is alkali-developed and a blind via is opened. The alkaline solution at this time is not limited as long as it can peel the dry film and dissolve the resin layer. Examples of such a solution include a sodium carbonate aqueous solution, a potassium carbonate aqueous solution, a sodium hydroxide aqueous solution, a potassium hydroxide aqueous solution, and a tetramethylammonium hydroxide aqueous solution. From the viewpoint of generally used production equipment and process conditions, an aqueous sodium carbonate solution and an aqueous sodium hydroxide solution are preferred. Examples of the resin layer development method include spray development, immersion development, and paddle development.

  Next, the alkali-soluble resin layer is heat-cured (cured). The heat curing is preferably 150 ° C. or higher and 200 ° C. or lower, but may be performed in a multi-stage step where a preheating process of 70 ° C. or higher and 120 ° C. or lower is first introduced.

  The reaction atmosphere in heat curing can be carried out in an air atmosphere or an inert gas atmosphere. Although the time required for heat curing varies depending on the reaction conditions, it is usually within 24 hours, particularly preferably 1 to 8 hours. It is necessary to impart alkali resistance to the resin layer after heat curing. This is because if the exposed resin layer is dissolved or swelled by alkali in the subsequent patterning process, the substrate smoothness, insulation reliability, and via connection reliability are adversely affected.

  Next, in accordance with a conventional manufacturing process of a multilayer flexible wiring board, a plating process of a brid via and a patterning of a metal foil layer are performed. Patterning may be performed by either a subtractive method or a semi-additive method. Subsequent processes are the same as those of the conventional multilayer flexible wiring board, and surface treatment such as coverlay formation is performed to manufacture a multilayer flexible substrate.

  When a large amount of solvent remains in the resin layer of the resin-coated copper foil or when a by-product is generated during the crosslinking reaction, outgas is generated during the heat curing process and the reflow process of the multilayer flexible substrate. Since delamination occurs between the conductive layer and the insulating layer, the resin layer of the resin-coated metal foil needs a composition design that reduces outgas.

  As described above, in this embodiment, (a) the flexible segments (1) and (2) in the resin are effective for imparting flexibility to the resin composition, the metal foil with resin, and the printed wiring board. Skeleton. By introducing the structure of the flexible segments (1) and (2) into the resin skeleton, low-temperature pressability and alkali solubility, which are weak points of the flexible segment (1), and heat resistance, which are weak points of the flexible segment (2) In addition, it is possible to impart appropriate flexibility and folding resistance to the resin composition, the resin-attached metal foil, and the printed wiring board without impairing the insulation reliability.

  Next, examples performed for clarifying the effects of the present invention will be described. In addition, this invention is not limited at all by the following examples. In the examples and comparative examples, each evaluation was performed as follows.

<Weight average molecular weight>
The weight average molecular weight was measured by gel permeation chromatography (GPC) under the following conditions. As the solvent, N, N-dimethylformamide (manufactured by Wako Pure Chemical Industries, Ltd., for high performance liquid chromatograph) was used. , Purity 99.5%) and 63.2 mmol / L phosphoric acid (manufactured by Wako Pure Chemical Industries, Ltd., for high performance liquid chromatograph) were used. A calibration curve for calculating the weight average molecular weight was prepared using standard polystyrene (manufactured by Tosoh Corporation).
Column: Shodex KD-806M (manufactured by Showa Denko KK)
Flow rate: 1.0 mL / min Column temperature: 40 ° C
Pump: PU-2080 Plus (manufactured by JASCO)
Detector: RI-2031Plus (RI: differential refractometer, manufactured by JASCO)
UV-2075 Plus (UV-VIS: UV-Visible Absorber, manufactured by JASCO)

<Production of copper foil with resin>
A rough surface side of an electrolytic copper foil having a thickness of 12 μm (F1-WS / Furukawa Circuit Foil) was laid on a coating table (Matsuki Science Co., Ltd.) capable of vacuum adsorption and heating, and the electrolytic copper foil was attached by vacuum adsorption. Then, the resin composition solution was apply | coated on the electrolytic copper foil rough surface using the applicator (made by Matsuki Scientific company) whose gap is 125 micrometers. Thereafter, a dryer (SPHH-10l, manufactured by ESPEC) was heated at 95 ° C. for 30 minutes to remove the solvent, and a resin-coated copper foil having a resin layer thickness of 30 ± 5 μm was obtained.

<Low temperature pressability>
100 mm x 100 mm double-sided flexible substrate (Espanex M, manufactured by Nippon Steel Chemical Co., Ltd., insulation layer thickness 25 μm, conductive layer: copper foil F2-WS (12 μm)) The resin layer of the copper foil with resin is pressed on a substrate patterned with an and space of 50 μm / 50 μm with a vacuum press (made by Kitagawa Seiki Co., Ltd.) at a temperature of 100 to 120 ° C. for 1 minute. And laminated. The laminated body thus obtained was observed under an optical microscope (ECLIPS LV100, manufactured by Nikon Corp.) and transmitted light at 10 times, and it was confirmed whether there were bubbles (embedding defects) between the circuits. The case where bubbles were not confirmed under the temperature condition of 100 ° C., the case where bubbles were not confirmed under the temperature condition of 110 ° C., the case where bubbles were not confirmed under the temperature condition of 120 ° C., The case where the resin was not completely embedded under the temperature condition of 120 ° C. and bubbles were generated was indicated as x.

<Alkali processability evaluation>
Double-sided flexible substrate (Espanex M, manufactured by Nippon Steel Chemical Co., Ltd., insulation layer thickness 25 μm, conductive layer: copper foil F2-WS (12 μm)) with the above resin on one conductive layer washed with a 3% hydrochloric acid aqueous solution The resin layer of copper foil was laminated by pressurizing at 120 ° C. and 1.0 MPa for 1 minute with a vacuum press (manufactured by Kitagawa Seiki Co., Ltd.). Next, a dry film resist (Sanfort AQ2578 manufactured by Asahi Kasei E-Materials Co., Ltd.) is laminated on the conductive layer of the laminate thus obtained to form a circular hole pattern of 200 μmφ, and then circled with a ferric chloride etching solution. The conductive layer in the hole forming part was removed by etching.

  Thereafter, a 3 wt% sodium hydroxide aqueous solution heated to 50 ° C. is sprayed onto the resin composition layer at a pressure of 0.18 MPa, spray water washing with distilled water at 0.18 MPa for 120 seconds and drying with an air gun are performed. A via was formed. A resin layer with a thickness of 30 μm can be removed with an alkali spray time of less than 1 minute, and when the conductive layer of the double-sided flexible board is completely exposed at the bottom of the blind via, the resin layer is removed with a spray time of less than 2 minutes. Yes, when the conductive layer of the double-sided flexible substrate is completely exposed at the bottom of the blind via, and when the resin layer remains on the bottom of the blind via in the spray time of 2 minutes, and sprayed for 3 minutes, The case where the resin layer remained at the bottom of the blind via was marked as x.

<Evaluation of insulation reliability (HAST resistance)>
The insulation reliability evaluation was performed as follows. The resin composition solution is applied to a PET film, and solvent drying is performed at 90 ° C. for 30 minutes in the air using a dryer (SPHH-10L, manufactured by ESPEC) to obtain a PET with a resin having a resin thickness after drying of 25 μm. It was. This was pressed on a comb-type substrate having a copper thickness of 12 μm and a line and space of 20 μm / 20 μm with a vacuum press (made by Kitagawa Seiki Co., Ltd.) at 140 ° C. and 1.0 MPa for 1 minute, and then the PET film was peeled off. Then, it was cured at 180 ° C. for 1 hour in a dryer (SPHH-10 l, manufactured by ESPEC) to obtain a laminate. A migration tester cable was soldered to the laminate thus obtained, and an insulation reliability test was performed under the following conditions.
Insulation degradation evaluation system: SIR-12 (Enomoto Kasei Co., Ltd.)
HAST chamber: EHS-211M (Espec Corp.)
Temperature: 110 ° C
Humidity: 85%
Applied voltage: 2V
Application time: 504 hours

Insulation resistance: 1.0 × × less than 10 ⁶ Omega, less than ^{1.0 × 10 6 Ω~1.0 × 10 7} Ω △, 1.0 × 10 7 Ω~1.0 × less than 10 ⁸ Omega ○, and 1.0 × 10 ⁸ Ω or more as ◎.

<Solder heat resistance evaluation>
The resin-coated copper foil was dehumidified and dried at 80 ° C. for 2 hours with a dryer (SPHH-10 l, manufactured by ESPEC). Next, the resin composition layer of the resin-coated copper foil was placed at 100 ° C. on the glossy surface of the electrolytic copper foil F2-WS (9 μm) that had been acid-washed in advance with a 3% hydrochloric acid aqueous solution using a vacuum press machine (manufactured by Kitagawa Seiki) The laminate was pressed for 1 minute under the condition of 1.0 MPa, and then cured at 180 ° C. for 1 hour using the dryer.

  The cured sample was cut to 10 cm × 10 cm and floated on a 260 ° C. solder bath with the resin-coated copper foil conductive layer down for 120 seconds for testing. The appearance was observed with the naked eye during the test, and it was confirmed whether or not the swelling due to delamination between the resin layer and the conductor layer occurred in the conductive layer, and the evaluation was performed according to the following criteria. The case where no swelling was confirmed with the naked eye was marked ◎, the case where there was no swelling for 60 seconds, the case where it occurred after 60 seconds, ○, the case where swelling occurred within 20 seconds to 60 seconds, △, The case where blistering occurred within a second was taken as x.

<Folding resistance evaluation>
The obtained copper foil with resin was cured at 180 ° C. for 1 hour with a drier (manufactured by ESPEC, SPHH-10 l), and then cut into 1.5 cm × 5 cm. The sample was bent so that the surface of the resin composition side was the outside and the long side direction was divided in half, and a weight of 750 g was put on it and held for 10 seconds. Then, a weight of 750 g was put on and held for 10 seconds. . With this cycle as one time, the appearance of the folded part after the test was observed with a 100 × optical microscope, and the above folding operation was repeated until the resin composition was cracked and the underlying copper was exposed. Examined. The first time when the underlying copper is exposed and the folding resistance is 0, x is marked, the folding resistance is 1 when △, the folding resistance is 2-4, and the folding is 5 times. Even if the underlying copper was not exposed, it was marked ◎.

<Synthesis of phosphazene compound A>
The phosphazene compound A having a cyano group was synthesized by the method described in Synthesis Example 17 of JP-A No. 2002-114981.

  4-cyanophenol 1.32 mol (157.2 g), phenol 2.20 mol (124.2 g), hydroxylation in a 2 liter four-necked flask equipped with a stirrer, heating device, thermometer and dehydrator Sodium 2.64 mol (105.6 g) and 1000 ml toluene were added. This mixture was heated to reflux, water was removed from the system, and a toluene solution of cyanophenol and a sodium salt of phenol was prepared. 580 g of a 20% chlorobenzene solution containing 1 unit mol (115.9 g) of dichlorophosphazene oligomer was added dropwise to the toluene solution of cyanophenol and sodium salt of phenol at an internal temperature of 30 ° C. or lower while stirring. After the mixed solution was refluxed for 12 hours, a 5% aqueous sodium hydroxide solution was added to the reaction mixture and washed twice. Next, the organic layer was neutralized with dilute sulfuric acid, and then washed twice with water. The organic layer was filtered, concentrated, and dried in vacuo to obtain the desired product (phosphazene compound A).

[Synthesis Example 1] Synthesis of (Polyimide A) A three-necked separable flask was equipped with a ball cooling tube equipped with a nitrogen introduction tube, a thermometer, and a water separation trap. Under a dry nitrogen atmosphere, in an oil bath at 60 ° C., 147.1 g of γ-butyrolactone (GBL), 45.0 g of toluene, 2,2′-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (6FAP) 10. 62 g, polyalkyl ether diamine (molecular weight 430, trade name: D400, manufactured by BASF) 19.18 g, silicone diamine (molecular weight 860, trade name: KF-8010, manufactured by Shin-Etsu Chemical) 18.40 g are uniformly added. Until stirred. Furthermore, after adding 31.02 g of 4,4'-oxydiphthalic dianhydride (ODPA) little by little, it heated up to 180 degreeC and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, the product was pressure filtered through a 5 μm filter to obtain a polyimide A varnish. The weight average molecular weight was 22,000. The result of calculating the structure of the flexible segments (1) and (2) represented by the above general formulas (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group in the polymer from the raw material charge ratio Table 1 shows.

  Here, the content mass% of the flexible segments (1) and (2) was calculated as follows. First, the mass content (p1 or p2) of the flexible segments (1) and (2) in the raw material (for example, polyalkyl ether diamine) containing the flexible segments (1) and (2) is determined. Next, a value obtained by subtracting the theoretical mass of the by-product generated by polymerization (water generated by imidization in the case of polyimide) from the total charged amount of each raw material is defined as the total amount (W) of the polymer. The feed amount of the raw material including the flexible segment (1) or (2) is w1 or w2, the content mass% of the flexible segment (1) is (w1 × p1) / W, and the content of the flexible segment (2) is (w2 * It calculated from the formula of p2) / W.

  The millimolar amount of the phenolic hydroxyl group in the polymer was calculated from the formula M / W by first obtaining the millimolar amount (M) of the phenolic hydroxyl group from the charged amount of the raw material containing the phenolic hydroxyl group and the phenol valence of the raw material.

[Synthesis Example 2] Synthesis of (Polyimide B) A three-necked separable flask was equipped with a ball cooling tube equipped with a nitrogen introduction tube, a thermometer, and a water separation trap. GBL176.1g, toluene 45.0g, 6FAP 12.82g, D400 25.80g was put at 60 degreeC of oil baths in dry nitrogen atmosphere, and it stirred until it became uniform. Further, 18.92 g of ODPA and 37.28 g of both terminal acid dianhydride-modified silicone (molecular weight 956, trade name: X-22-2290AS, manufactured by Shin-Etsu Chemical Co., Ltd.) were added little by little, and the temperature was raised to 180 ° C. Heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, the product was subjected to pressure filtration with a 5 μm filter to obtain a polyimide B varnish. The weight average molecular weight was 23,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 3] Synthesis of (Polyimide C) A three-necked separable flask was equipped with a cooling tube with a ball equipped with a nitrogen introduction tube, a thermometer, and a water separation trap. GBL176.1g, toluene 45.0g, 6FAP 21.98g, KF-8010 30.10g was put in oil bath 60 degreeC in dry nitrogen atmosphere, and it stirred until it became uniform. Furthermore, after adding 15.51 g of ODPA and 57.50 g of bisphenol A propylene oxide 10 mol adducts at both ends (molecular weight 1150, trade name: CRD-101, manufactured by Toho Chemical Co., Ltd.) little by little, 180 The temperature was raised to 0 ° C. and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, the product was pressure filtered through a 5 μm filter to obtain a polyimide C varnish. The weight average molecular weight was 27,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 4] Synthesis of (Polyimide D) A three-necked separable flask was equipped with a ball cooling tube equipped with a nitrogen introduction tube, a thermometer, and a water separation trap. 21. GBL 171.0 g, toluene 45.0 g, 6FAP 17.58 g, polyalkyl ether diamine (molecular weight 1000, trade name: Jeffamine (XTJ-542), manufactured by Huntsman) in an oil bath 60 ° C. in a dry nitrogen atmosphere 00 g and 21.50 g of KF-8010 were added and stirred until uniform. Furthermore, after adding 31.02 g of ODPA little by little, it heated up to 180 degreeC and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, the product was pressure-filtered with a 5 μm filter to obtain a polyimide D varnish. The weight average molecular weight was 25,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 5] Synthesis of (Polyimide E) A three-necked separable flask was equipped with a ball cooling tube equipped with a nitrogen introduction tube, a thermometer, and a water separation trap. GBL137.2g, toluene 45.0g, 6FAP 20.03g, D400 11.83g, KF-8010 11.01g was put in oil bath 60 degreeC in dry nitrogen atmosphere, and it became uniform. Furthermore, after adding 31.02 g of ODPA little by little, it heated up to 180 degreeC and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, the product was pressure-filtered with a 5 μm filter to obtain a polyimide E varnish. The weight average molecular weight was 21,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 6] Synthesis of (Polyimide F) A three-necked separable flask was equipped with a ball cooling tube equipped with a nitrogen introduction tube, a thermometer, and a water separation trap. Under a dry nitrogen atmosphere, an oil bath at 60 ° C. was charged with 30 g of GBL, 45.0 g of toluene, 9.52 g of 6FAP, and 69.00 g of XTJ-542 and stirred until uniform. Furthermore, after adding ODPA 3.72g and X-22-2290AS 84.13g little by little, it heated up to 180 degreeC and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, the product was pressure-filtered with a 5 μm filter to obtain a polyimide F varnish. The weight average molecular weight was 24,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 7] (Polyurethane A) Synthesis A three-necked separable flask equipped with a nitrogen inlet tube and a thermometer was prepared, and GBL 100.0 g, propylene oxide adduct of bisphenol A was added at 90 ° C. in an oil bath under a dry nitrogen atmosphere. Diol (molecular weight 580, trade name: Adeka polyol (BPX-33), manufactured by Asahi Denka Co., Ltd.) was added and stirred until uniform. Further, 24.77 g of 4,4-diphenylmethane diisocyanate (MDI) was added and dissolved, and then stirred at 90 ° C. for 2 hours. 17.20 g of KF-8010 was added to this solution and reacted at 90 ° C. for 2 hours, and then cooled to 40 ° C. Further, 10.99 g of 6FAP and 52.2 g of GBL were stirred at 40 ° C. for 10 hours. . Next, the product was pressure filtered through a 5 μm filter to obtain a polyurethane A varnish. The weight average molecular weight was 30,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 8] (Polyamide A) Synthesis A three-necked separable flask equipped with a nitrogen introduction tube and a thermometer was prepared, and 115.81 g of N-methyl-2-pyrrolidone, 3,5-diaminophenol was prepared in a dry nitrogen atmosphere. 6.21 g, XTJ-542 23.00 g, and KF-8010 23.22 g were added and stirred until uniform. Further, a solution prepared by dissolving 19.69 g of terephthalic acid dichloride in 19.69 g of N-methyl-2-pyrrolidone in an ice bath at 0 to 5 ° C. was slowly added dropwise over 30 minutes and reacted at room temperature for 3 hours. To this solution, 0.84 g of benzoyl chloride was slowly added dropwise and stirred for 3 hours. After completion of the reaction, this solution was added to 1000 g of distilled water, and the precipitate was filtered off and dried under reduced pressure to obtain polyamide A powder. The weight average molecular weight was 29,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Example 1]
The polyimide A varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, the solid content of polyimide A is 53.6% by mass, and the compound containing two oxazoline groups is 1, 4.4% by mass of 3-bis (4,5-dihydro-2-oxazolyl) benzene (hereinafter referred to as PBO), 40.0% by mass of composite magnesium hydroxide MGZ-5R (manufactured by Sakai Chemical Industry Co., Ltd.) as a flame retardant A resin-coated copper foil was prepared using a resin composition solution prepared so that Irganox 245 (manufactured by BASF) (hereinafter, IRG245) was 2.0% by mass as an antioxidant, and the evaluation was performed. . As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◯, the HAST resistance was ◎, the solder heat resistance was ◎, and the folding resistance was ○. The evaluation results are shown in Table 2.

[Example 2]
Polyimide A varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 55.8% by mass of polyimide A and 2 oxazoline groups. Resin-coated copper using a resin composition solution prepared such that 2.2% by mass, composite magnesium hydroxide MGZ-5R is 40.0% by mass as a flame retardant, and IRG245 is 2.0% by mass as an antioxidant A foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◯, the HAST resistance was ◯, the solder heat resistance was ◯, and the folding resistance was ◯. The evaluation results are shown in Table 2.

[Example 3]
Using polyimide A varnish as it is, it is diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 50.0% by mass of polyimide A and 2 oxazoline groups. Resin-coated copper using a resin composition solution prepared so that 8.0% by mass, 40.0% by mass of composite magnesium hydroxide MGZ-5R as a flame retardant, and 2.0% by mass of IRG245 as an antioxidant A foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◯, the HAST resistance was ◯, the solder heat resistance was ◯, and the folding resistance was ◯. The evaluation results are shown in Table 2.

[Example 4]
Polyimide B varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 53.6% by mass of polyimide B and 2 oxazoline groups. Resin-coated copper using a resin composition solution prepared to be 4.4% by mass, 40.0% by mass of composite magnesium hydroxide MGZ-5R as a flame retardant, and 2.0% by mass of IRG245 as an antioxidant A foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◎, the HAST resistance was ◎, the solder heat resistance was ◎, and the folding resistance was ○. The evaluation results are shown in Table 2.

[Example 5]
Using polyimide C varnish as it is, it is diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 52.4% by mass of polyimide C and 2 oxazoline groups. Copper with resin using a solution of a resin composition prepared so that 5.6% by mass, composite magnesium hydroxide MGZ-5R is 40.0% by mass as a flame retardant, and IRG245 is 2.0% by mass as an antioxidant A foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◎, the HAST resistance was ◎, the solder heat resistance was ◎, and the folding resistance was ○. The evaluation results are shown in Table 2.

[Example 6]
Polyimide D varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 52.0% by mass of polyimide D and 2 oxazoline groups. Copper with resin using a resin composition solution prepared so that 6.0% by mass, 40.0% by mass of composite magnesium hydroxide MGZ-5R as a flame retardant, and 2.0% by mass of IRG245 as an antioxidant A foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◎, the HAST resistance was ○, the solder heat resistance was ◎, and the folding resistance was ◎. The evaluation results are shown in Table 2.

[Example 7]
Using polyimide D varnish as it is, it is diluted with GBL so that the solid content of the resin composition is 45% by mass, the solid content of polyimide D is 48.3% by mass, and contains two epoxy groups of bisphenol A type Epoxy compound C EPICRON (registered trademark) 840 (hereinafter 840) 9.7% by mass, composite magnesium hydroxide MGZ-5R is 40.0% by mass as a flame retardant, and IRG245 is 2.0 as an antioxidant. Resin-coated copper foil was prepared using a resin composition solution prepared so as to have a mass%, and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◎, the HAST resistance was ◯, the solder heat resistance was ◎, and the folding resistance was ◯. The evaluation results are shown in Table 2.

[Example 8]
Polyimide E varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 49.8% by mass of polyimide E and 2 oxazoline groups. Resin-coated copper using a resin composition solution prepared such that 8.2% by mass, composite magnesium hydroxide MGZ-5R is 40.0% by mass as a flame retardant, and IRG245 is 2.0% by mass as an antioxidant A foil was prepared and evaluated. The evaluation results were Δ for low-temperature pressability, ◎ for alkali workability, ◎ for HAST resistance, ◎ for solder heat resistance, and △ for folding resistance. The evaluation results are shown in Table 2.

[Example 9]
Polyimide E varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 58.4% by mass of polyimide E and 2 oxazoline groups. 9.6% by mass, phosphazene compound A having a cyano group as a flame retardant is 30.0% by mass, and IRG245 is 2.0% by mass as an antioxidant. A copper foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◎, the HAST resistance was Δ, the solder heat resistance was ◎, and the folding resistance was ◯. The evaluation results are shown in Table 2.

[Example 10]
Using polyimide F varnish as it is, it is diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 56.0% by mass of polyimide F and 2 oxazoline groups. Copper with resin using a solution of a resin composition prepared so that 2.0 mass%, composite magnesium hydroxide MGZ-5R is 40.0 mass% as a flame retardant, and IRG245 is 2.0 mass% as an antioxidant A foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was Δ, the HAST resistance was Δ, the solder heat resistance was ◯, and the folding resistance was ◎. The evaluation results are shown in Table 2.

[Example 11]
Polyurethane A varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 53.6% by mass of polyurethane A and 2 oxazoline groups. Resin-coated copper using a resin composition solution prepared to be 4.4% by mass, 40.0% by mass of composite magnesium hydroxide MGZ-5R as a flame retardant, and 2.0% by mass of IRG245 as an antioxidant A foil was prepared and evaluated. As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◯, the HAST resistance was ◯, the solder heat resistance was ◯, and the folding resistance was ◯. The evaluation results are shown in Table 2.

[Example 12]
Polyamide A powder 53.9% by mass, PBO 4.1% by mass as a compound containing two oxazoline groups, composite magnesium hydroxide MGZ-5R 40.0% by mass as a flame retardant, antioxidant It diluted with GBL so that IRG245 might be 2.0 mass% and the solid content of a resin composition might be 45 mass%, produced the copper foil with resin using the solution of the prepared resin composition, and performed the evaluation . As a result of the evaluation, the low-temperature pressability was ◯, the alkali workability was ◯, the HAST resistance was ◯, the solder heat resistance was ◯, and the folding resistance was ◯. The evaluation results are shown in Table 2.

[Synthesis Example 9] Synthesis of (Polyimide G) A polyimide containing a short-chain siloxane (m = 1 in the structure of the above general formula (1)) and a polyalkylene oxide skeleton of the above general formula (2) was synthesized.

  A three-necked separable flask was equipped with a nitrogen condenser, a thermometer, and a ball condenser equipped with a moisture separation trap. Under a dry nitrogen atmosphere, oil bath at 60 ° C., GBL 165.9 g, toluene 45.0 g, 6FAP 10.99 g, D400 17.20 g, 1,3-bis (3-aminopropyl) tetramethyldisiloxane (Tokyo Chemical Industry Co., Ltd.) (Made) 30.10 g was added and stirred until uniform. Furthermore, after adding 31.02 g of ODPA little by little, it heated up to 180 degreeC and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, polyimide G varnish was obtained by carrying out pressure filtration of the product with a 5 micrometers filter. The weight average molecular weight was 18,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 10] Synthesis of (Polyimide H) A polyimide not containing the flexible segment (2) represented by the general formula (2) was synthesized.

  A three-necked separable flask was equipped with a nitrogen condenser, a thermometer, and a ball condenser equipped with a moisture separation trap. Under a dry nitrogen atmosphere, an oil bath at 60 ° C. was charged with 162.1 g of GBL, 45.0 g of toluene, 20.14 g of 6FAP, and 36.12 g of KF-8010, and stirred until uniform. Furthermore, after adding 31.02 g of ODPA little by little, it heated up to 180 degreeC and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, polyimide H varnish was obtained by carrying out pressure filtration of the product with a 5 micrometers filter. The weight average molecular weight was 20,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Synthesis Example 11] Synthesis of (Polyimide I) A polyimide not containing a phenolic hydroxyl group was synthesized.

  A three-necked separable flask was equipped with a nitrogen condenser, a thermometer, and a ball condenser equipped with a moisture separation trap. Under a dry nitrogen atmosphere, oil bath at 60 ° C., GBL 143.4 g, toluene 45.0 g, D400 19.35 g, KF-8010 18.49 g, 1,3-bis (3-aminophenoxy) benzene (trade name; APB- N, made by Mitsui Chemicals) was added and stirred until uniform. Furthermore, after adding 31.02 g of ODPA little by little, it heated up to 180 degreeC and heated for 2 hours. During the reaction, by-product water was azeotroped with toluene and dehydrated under reflux using a ball-mounted condenser equipped with a water separation trap. After draining by-product water, the reflux was stopped and toluene was completely drained over 3 hours and cooled to room temperature. Next, the product was subjected to pressure filtration with a 5 μm filter to obtain a polyimide I varnish. The weight average molecular weight was 26,000. Table 1 shows the results of calculating the structure of the flexible segments (1) and (2), the number of repeating units, the content mass%, and the mmol amount of the phenolic hydroxyl group from the raw material charging ratio in the same manner as in Synthesis Example 1.

[Comparative Example 1]
Polyimide G varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 54.0% by mass of polyimide G and 2 oxazoline groups. A resin-coated copper foil was prepared using a resin composition solution prepared so that 4.0% by mass, MGZ-5R as a flame retardant was 40.0% by mass, and IRG245 was 2.0% by mass as an antioxidant. The evaluation was performed. The evaluation results were x for low-temperature pressability, ○ for alkali workability, Δ for HAST resistance, ◎ for solder heat resistance, and x for folding resistance. The evaluation results are shown in Table 3.

[Comparative Example 2]
Polyimide G varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 63.3% by mass of polyimide G and 2 oxazoline groups. A copper foil with a resin was prepared using a resin composition solution prepared to be 4.7% by mass, 30.0% by mass of phosphazene compound A as a flame retardant, and 2.0% by mass of IRG245 as an antioxidant. The evaluation was performed. The evaluation results were Δ for low-temperature pressability, ○ for alkali workability, × for HAST resistance, ◎ for solder heat resistance, and Δ for folding resistance. The evaluation results are shown in Table 3.

[Comparative Example 3]
Polyimide H varnish is used as it is, diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 50.8% by mass of polyimide H and 2 oxazoline groups. A copper foil with resin was prepared using a resin composition solution prepared so that 7.2 mass%, MGZ-5R as flame retardant was 40.0 mass%, and IRG245 was 2.0 mass% as an antioxidant. The evaluation was performed. The evaluation results were x for low-temperature pressability, x for alkali workability, ◎ for HAST resistance, ◎ for solder heat resistance, and 折 for folding resistance. The evaluation results are shown in Table 3.

[Comparative Example 4]
Using polyimide H varnish as it is, it is diluted with GBL so that the solid content of the resin composition is 45% by mass, the solid content of polyimide H is 46.7% by mass, and contains two epoxy groups of bisphenol A type 840 as an epoxy compound, 11.3% by mass, MGZ-5R as a flame retardant, 40.0% by mass, and IRG245 as an antioxidant, 2.0% by mass. A copper foil was prepared and evaluated. The evaluation results were x for low-temperature pressability, x for alkali workability, ◎ for HAST resistance, ◎ for solder heat resistance, and △ for folding resistance. The evaluation results are shown in Table 3.

[Comparative Example 5]
Using polyimide I varnish as it is, it is diluted with GBL so that the solid content of the resin composition is 45% by mass, PBO is a compound containing 53.0% by mass of polyimide I and 2 oxazoline groups. A copper foil with resin was prepared using a solution of a resin composition prepared so that 5.0 mass%, MGZ-5R as flame retardant was 40.0 mass%, and IRG245 was 2.0 mass% as an antioxidant. The evaluation was performed. As a result of the evaluation, the low-temperature pressability was ○, the alkali workability was ×, the HAST resistance was ×, the solder heat resistance was ×, and the folding resistance was ○. The evaluation results are shown in Table 3.

[Comparative Example 6]
Using polyimide A varnish as it is, it is diluted with GBL so that the solid content of the resin composition is 45% by mass, the solid content of polyimide A is 58.0% by mass, and MGZ-5R is 40.0% by mass as a flame retardant. %, A resin-coated copper foil was prepared using a resin composition solution prepared so that IRG245 was 2.0 mass% as an antioxidant, and evaluated. As a result of the evaluation, the low-temperature pressability was ○, the alkali workability was ○, the HAST resistance was ×, the solder heat resistance was Δ, and the folding resistance was ◎. The evaluation results are shown in Table 3.

The following points could be confirmed from the above examples and comparative examples.
As can be seen from Table 2, the polyimides having both skeletons of the general formulas (1) and (2) have good low-temperature pressability, alkali workability, HAST resistance, solder heat resistance, and folding resistance. Yes (see Examples 1 to 10). Moreover, since good results are obtained with respect to polyurethane and polyamide having both skeletons of the above general formulas (1) and (2) (see Examples 11 and 12), the effect is not limited by the type of resin. I understand that I play. On the other hand, as can be seen from Table 3, when a short-chain siloxane that does not satisfy the general formula (1) is introduced into the resin skeleton, sufficient flexibility cannot be imparted. Inferior to HAST resistance and folding resistance (Comparative Examples 1 and 2). When the structure of the general formula (2) is not introduced, the structure of the general formula (1) is inferior in low-temperature pressability even when the structure of the general formula (1) is sufficiently introduced, and the structure of the general formula (1) is hydrophobic. Since it is high, it is inferior to alkali workability (Comparative Examples 3 and 4).

  From the above results, it is important to introduce both the general formulas (1) and (2) into the skeleton in order to achieve both low-temperature pressability, alkali workability, HAST resistance, solder heat resistance and folding resistance. I understand.

  Moreover, when there is no phenolic hydroxyl group in the resin, alkali processability cannot be imparted, but it is found that the resin is inferior in HAST resistance and heat resistance (Comparative Example 5), and even if the resin contains a phenolic hydroxyl group. It can be seen that the HAST resistance is inferior when no cross-linking agent is added (Comparative Example 6).

  From this result, by introducing a reactive functional group such as phenolic hydroxyl group into the resin and adding a thermal crosslinking agent, the three-dimensional network formed in the resin composition at the time of curing is HAST resistant and heat resistant. It is thought that it contributes to improvement.

  In addition, this invention is not limited to the said embodiment, It can change and implement variously.

  The resin composition, laminate and wiring board of the present invention are suitably used, for example, as a surface protection film for semiconductor elements, an interlayer insulating film, a bonding sheet, a protective insulating film for printed wiring boards, and a printed wiring board substrate. Can do.

Claims (6)

A resin composition comprising (a) a phenolic hydroxyl group and a resin containing a structure represented by the following general formulas (1) and (2), and (b) a compound containing an oxazoline group .

(In the general formula (1), R ₁ and R ₂ each independently represents an alkyl group having 1 to 5 carbon atoms, a phenyl group, or a phenoxy group. M is an integer of 2 or more, and m is repeated. R ₁ and R ₂ may be different for each unit.)

(In the general formula (2), Q ₁ represents an alkylene group having 1 to 18 carbon atoms, n is an integer of 2 or more, and Q ₁ may be different for each repeating unit of n. )   The resin composition according to claim 1, wherein the resin is a polyimide resin.   The structures represented by the general formulas (1) and (2) are in the range of 5 to 45% by mass in the total mass of the resin, respectively, and the total thereof is in the range of 35 to 75% by mass. The resin composition according to claim 1 or 2, wherein   A laminate comprising: a metal foil; and a resin layer that is provided on a surface of the metal foil and includes the resin composition according to any one of claims 1 to 3.   The laminate according to claim 4, wherein the thickness of the metal foil is in the range of 5 to 50 μm. A core substrate having a circuit on at least one surface, a resin layer provided on the surface of the core substrate having the circuit, and a metal foil provided on the surface of the resin layer,
A resin composition in which the resin layer contains (a) a phenolic hydroxyl group and a resin containing a structure represented by the following general formulas (1) and (2), and (b) a compound containing an oxazoline group is used. A wiring board characterized by being formed.

(In the general formula (1), R ₁ and R ₂ each independently represents an alkyl group having 1 to 5 carbon atoms, a phenyl group, or a phenoxy group. M is an integer of 2 or more, and m is repeated. R ₁ and R ₂ may be different for each unit.)

(In the general formula (2), Q ₁ represents an alkylene group having 1 to 18 carbon atoms, n is an integer of 2 or more, and Q ₁ may be different for each repeating unit of n. )