JP5992059B2 - 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 - Google Patents

感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 Download PDF

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Publication number
JP5992059B2
JP5992059B2 JP2014554443A JP2014554443A JP5992059B2 JP 5992059 B2 JP5992059 B2 JP 5992059B2 JP 2014554443 A JP2014554443 A JP 2014554443A JP 2014554443 A JP2014554443 A JP 2014554443A JP 5992059 B2 JP5992059 B2 JP 5992059B2
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Japan
Prior art keywords
group
resin composition
photosensitive resin
cured film
compound
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Expired - Fee Related
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JP2014554443A
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English (en)
Japanese (ja)
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JPWO2014103997A1 (ja
Inventor
達也 霜山
達也 霜山
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Fujifilm Corp
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Fujifilm Corp
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Publication of JPWO2014103997A1 publication Critical patent/JPWO2014103997A1/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/124—Insulating layers formed between TFT elements and OLED elements

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2014554443A 2012-12-26 2013-12-24 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 Expired - Fee Related JP5992059B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012283317 2012-12-26
JP2012283317 2012-12-26
PCT/JP2013/084444 WO2014103997A1 (ja) 2012-12-26 2013-12-24 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置

Publications (2)

Publication Number Publication Date
JP5992059B2 true JP5992059B2 (ja) 2016-09-14
JPWO2014103997A1 JPWO2014103997A1 (ja) 2017-01-12

Family

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JP2014554443A Expired - Fee Related JP5992059B2 (ja) 2012-12-26 2013-12-24 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置

Country Status (5)

Country Link
JP (1) JP5992059B2 (zh)
KR (1) KR101758115B1 (zh)
CN (1) CN104871089B (zh)
TW (1) TWI610129B (zh)
WO (1) WO2014103997A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108027557B (zh) * 2015-09-28 2019-05-28 东丽株式会社 固化膜及其制造方法
CN107415333A (zh) * 2017-07-17 2017-12-01 武汉华星光电半导体显示技术有限公司 硬化膜及其制备方法、柔性amoled显示装置
US10497899B2 (en) 2017-07-17 2019-12-03 Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Hardening film and method of manufacturing the same, flexible AMOLED display device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012215826A (ja) * 2010-12-13 2012-11-08 Fujifilm Corp ポジ型感光性樹脂組成物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55133030A (en) * 1979-04-03 1980-10-16 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH04340966A (ja) * 1991-05-17 1992-11-27 Mitsubishi Kasei Corp ネガ型感光性組成物
JP3361624B2 (ja) * 1994-08-17 2003-01-07 富士フイルムアーチ株式会社 ポジ型感光性組成物
JP2000275841A (ja) * 1999-03-26 2000-10-06 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JP4687910B2 (ja) * 2004-10-12 2011-05-25 日産化学工業株式会社 硫黄原子を含むリソグラフィー用反射防止膜形成組成物
CN102540726B (zh) * 2010-12-13 2016-07-06 富士胶片株式会社 正型感光性树脂组成物、硬化膜及其形成方法、层间绝缘膜以及显示装置
JP5814012B2 (ja) * 2011-01-19 2015-11-17 富士フイルム株式会社 感光性樹脂組成物、及びパターンの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012215826A (ja) * 2010-12-13 2012-11-08 Fujifilm Corp ポジ型感光性樹脂組成物

Also Published As

Publication number Publication date
KR20150084918A (ko) 2015-07-22
CN104871089B (zh) 2020-01-14
CN104871089A (zh) 2015-08-26
TW201426173A (zh) 2014-07-01
TWI610129B (zh) 2018-01-01
JPWO2014103997A1 (ja) 2017-01-12
KR101758115B1 (ko) 2017-07-14
WO2014103997A1 (ja) 2014-07-03

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