JP5977489B2 - 散乱防止x線グリッド装置の製造方法 - Google Patents
散乱防止x線グリッド装置の製造方法 Download PDFInfo
- Publication number
- JP5977489B2 JP5977489B2 JP2011140248A JP2011140248A JP5977489B2 JP 5977489 B2 JP5977489 B2 JP 5977489B2 JP 2011140248 A JP2011140248 A JP 2011140248A JP 2011140248 A JP2011140248 A JP 2011140248A JP 5977489 B2 JP5977489 B2 JP 5977489B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- grid
- rays
- scatter
- grid device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000000463 material Substances 0.000 claims description 55
- 239000000758 substrate Substances 0.000 claims description 12
- 229920000642 polymer Polymers 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 239000004593 Epoxy Substances 0.000 claims description 3
- 229920000052 poly(p-xylylene) Polymers 0.000 claims description 3
- 229910052770 Uranium Inorganic materials 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 229920001296 polysiloxane Polymers 0.000 claims description 2
- 230000002265 prevention Effects 0.000 claims description 2
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- 230000005855 radiation Effects 0.000 description 19
- 238000003384 imaging method Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000011358 absorbing material Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 238000009607 mammography Methods 0.000 description 3
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 238000003772 radiology diagnosis Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
Description
QIF=Tp 2/Tt
Tpは、グリッドを通る1次X線透過、Ttは全透過である。この式は、高い1次透過を達成する重要度を示している。1次X線が損失した場合、イメージング情報も失われ、従って、X線量を増大させなければならないか、或いは、画像品質の劣化を受け入れなければならない。QIFが1又はそれ以上であることは、画像品質が改善されたことを示し、QIF<1であることは、グリッドが実際に画像の品質に悪影響を与えていることを示している。
12 X線吸収要素
14 基材/透光材料
16 部分
18 チャンネル
20 側壁
30 線源
32 施工段階
34 第2の材料
36 残存チャンネル
40 供給源
42 第3の材料
44 施工段階
49 上面
50 管体
52 X線
90身体
54 吸収X線
56,58,60 経路
62 感光フィルム
64 増感スクリーン
Claims (10)
- 散乱防止X線グリッド装置(10)の製造方法であって、
X線を実質的に吸収しない第1の材料(16)を含み、複数の溝(18)を内部に有する基材(14)を準備する段階と、
前記複数の溝(18)の側壁(20)上にX線を実質的に吸収しない第2の材料(34)を含む層を施工する段階(32)と、
X線を実質的に吸収する第3の材料(42)を前記複数の溝(18)の一部に施行してこれにより複数のX線吸収要素(12)を形成する段階(44)と
を含む方法。 - 前記第2の材料(34)がコンフォーマルコーティングである、請求項1記載の方法。
- 前記第3の材料(42)が、鉛、タングステン、ウラニウム、金、鉛含有ポリマー、タングステン含有ポリマー及び金含有ポリマーのうちの少なくとも1種を含む、請求項1または2に記載の方法。
- 前記複数のX線吸収要素(12)の幅が約20μm未満である、請求項1乃至3のいずれかに記載の方法。
- 前記複数のX線吸収要素(12)の幅が約5μm〜約10μmである、請求項1乃至3のいずれかに記載の方法。
- 前記コンフォーマルコーティング(34)が、酸化物、窒化物、ポリマー、アクリル、エポキシ、ウレタン、シリコーン及びこれらの組合せを含む、
請求項2記載の方法。 - 前記コンフォーマルコーティング(34)がParylene(登録商標)である、請求項2記載の方法。
- 前記複数のX線吸収要素(12)が角度方向で構成される、請求項1乃至7のいずれか記載の方法。
- 層を施工する段階(32)が、前記複数の溝(18)の両側壁(20)上に層を施工する段階を含む、請求項1乃至8のいずれかに記載の方法。
- 前記グリッド装置(10)の上面(49)を平坦化する段階を更に含む、請求項1乃至9のいずれかに記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/824,811 | 2010-06-28 | ||
US12/824,811 US8265228B2 (en) | 2010-06-28 | 2010-06-28 | Anti-scatter X-ray grid device and method of making same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012005839A JP2012005839A (ja) | 2012-01-12 |
JP2012005839A5 JP2012005839A5 (ja) | 2014-07-31 |
JP5977489B2 true JP5977489B2 (ja) | 2016-08-24 |
Family
ID=45352567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011140248A Active JP5977489B2 (ja) | 2010-06-28 | 2011-06-24 | 散乱防止x線グリッド装置の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8265228B2 (ja) |
JP (1) | JP5977489B2 (ja) |
CN (1) | CN102389320B (ja) |
DE (1) | DE102011050963A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9418022B2 (en) | 2012-07-26 | 2016-08-16 | Kabushiki Kaisha Toshiba | Storage system in which information is prevented |
US8959615B2 (en) | 2013-02-25 | 2015-02-17 | Kabushiki Kaisha Toshiba | Storage system in which fictitious information is prevented |
US8990530B2 (en) | 2013-02-28 | 2015-03-24 | Kabushiki Kaisha Toshiba | Storage system in which fictitious information is prevented |
US9204852B2 (en) | 2013-12-31 | 2015-12-08 | General Electric Company | Systems and methods for increased energy separation in multi-energy X-ray imaging |
DE102014202330B3 (de) * | 2014-02-10 | 2015-06-03 | Siemens Aktiengesellschaft | Single Source DualEnergy mit zwei Filtern zur Röntgenspektrumsdifferenzierung bei Strahlerblenden mit Schlitzplatte |
JP6448206B2 (ja) * | 2014-03-31 | 2019-01-09 | 株式会社フジキン | 積層型x線グリッド、その製造装置及び製法 |
US11259762B2 (en) | 2015-12-25 | 2022-03-01 | Shanghai United Imaging Healthcare Co., Ltd. | Apparatus, system and method for radiation based imaging |
US11211180B2 (en) * | 2017-04-28 | 2021-12-28 | Shanghai United Imaging Healthcare Co., Ltd. | Anti-scatter grid device and method for making the same |
JP6629372B2 (ja) * | 2018-03-15 | 2020-01-15 | 日本信号株式会社 | 放射線検査装置及び手荷物検査装置 |
DE102018107969B3 (de) | 2018-04-04 | 2019-06-19 | Leonhardt e. K. | Verfahren zum Herstellen eines Strahlleitrasters |
KR101997862B1 (ko) * | 2018-12-26 | 2019-07-08 | 제이피아이헬스케어 주식회사 | 격자형 x선 그리드 제조 방법 |
CN110236587B (zh) * | 2019-07-11 | 2024-03-01 | 上海联影医疗科技股份有限公司 | 防散射栅格制备方法、探测器装置及医疗影像设备 |
EP3796335A1 (en) * | 2019-09-18 | 2021-03-24 | Koninklijke Philips N.V. | X-ray anti scatter grid |
CN111337769B (zh) * | 2020-03-11 | 2022-03-29 | 西北核技术研究院 | 一种水平极化有界波电磁脉冲模拟器、线栅极板及线栅布置方法 |
JP7467178B2 (ja) * | 2020-03-16 | 2024-04-15 | キヤノンメディカルシステムズ株式会社 | コリメータ及びコリメータモジュール |
CN112378933B (zh) * | 2020-10-30 | 2023-01-10 | 中建材光芯科技有限公司 | 三维聚焦玻璃基防散射滤线栅及其制造方法 |
CN112409826A (zh) * | 2020-11-11 | 2021-02-26 | 上海酷聚科技有限公司 | 过滤杂射x射线的滤线栅及其制备方法、x射线探测器 |
CN112599283A (zh) * | 2020-12-17 | 2021-04-02 | 上海酷聚科技有限公司 | X射线滤线栅的制备方法、装置及x射线滤线栅 |
DE102022104180A1 (de) * | 2022-02-22 | 2023-08-24 | Schott Ag | Abschirmmaske für ionisierende Streustrahlung und Verfahren zu dessen Herstellung |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5418833A (en) | 1993-04-23 | 1995-05-23 | The Regents Of The University Of California | High performance x-ray anti-scatter grid |
US5581592A (en) * | 1995-03-10 | 1996-12-03 | General Electric Company | Anti-scatter X-ray grid device for medical diagnostic radiography |
IN187505B (ja) * | 1995-03-10 | 2002-05-11 | Gen Electric | |
US5557650A (en) | 1995-03-10 | 1996-09-17 | General Electric Company | Method for fabricating an anti-scatter X-ray grid device for medical diagnostic radiography |
DE19729596A1 (de) * | 1997-07-10 | 1999-01-14 | Siemens Ag | Streustrahlenraster |
US6177237B1 (en) | 1998-06-26 | 2001-01-23 | General Electric Company | High resolution anti-scatter x-ray grid and laser fabrication method |
US6366643B1 (en) * | 1998-10-29 | 2002-04-02 | Direct Radiography Corp. | Anti scatter radiation grid for a detector having discreet sensing elements |
JP2000217812A (ja) * | 1999-01-27 | 2000-08-08 | Fuji Photo Film Co Ltd | 散乱線除去グリッドおよびその製造方法 |
US6408054B1 (en) * | 1999-11-24 | 2002-06-18 | Xerox Corporation | Micromachined x-ray image contrast grids |
US7518136B2 (en) | 2001-12-17 | 2009-04-14 | Tecomet, Inc. | Devices, methods, and systems involving cast computed tomography collimators |
WO2002098624A1 (en) * | 2001-06-05 | 2002-12-12 | Mikro Systems Inc. | Methods for manufacturing three-dimensional devices and devices created thereby |
US7141812B2 (en) | 2002-06-05 | 2006-11-28 | Mikro Systems, Inc. | Devices, methods, and systems involving castings |
US6625253B1 (en) | 2001-08-21 | 2003-09-23 | The Uab Research Foundation | High ratio, high efficiency mammography grid system |
DE10202987A1 (de) | 2002-01-26 | 2003-07-31 | Philips Intellectual Property | Gitter zur Absorption von Röntgenstrahlung |
DE10241424B4 (de) | 2002-09-06 | 2004-07-29 | Siemens Ag | Streustrahlenraster oder Kollimator sowie Verfahren zur Herstellung |
US7256402B1 (en) | 2004-04-15 | 2007-08-14 | Denny Lee | Flat panel X-ray imager with a grid structure |
DE102004027158B4 (de) | 2004-06-03 | 2010-07-15 | Siemens Ag | Verfahren zur Herstellung eines Streustrahlenrasters oder Kollimators aus absorbierendem Material |
US7463712B2 (en) | 2006-05-18 | 2008-12-09 | The Board Of Trustees Of The Leland Stanford Junior University | Scatter correction for x-ray imaging using modulation of primary x-ray spatial spectrum |
-
2010
- 2010-06-28 US US12/824,811 patent/US8265228B2/en active Active
-
2011
- 2011-06-09 DE DE102011050963A patent/DE102011050963A1/de not_active Withdrawn
- 2011-06-24 JP JP2011140248A patent/JP5977489B2/ja active Active
- 2011-06-28 CN CN201110190671.5A patent/CN102389320B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN102389320A (zh) | 2012-03-28 |
US20110317819A1 (en) | 2011-12-29 |
US8265228B2 (en) | 2012-09-11 |
DE102011050963A1 (de) | 2012-01-12 |
JP2012005839A (ja) | 2012-01-12 |
CN102389320B (zh) | 2017-05-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5977489B2 (ja) | 散乱防止x線グリッド装置の製造方法 | |
US10274610B2 (en) | Structured detectors and detector systems for radiation imaging | |
US10884141B2 (en) | Structured detectors and detector systems for radiation imaging | |
US11073625B2 (en) | Structured detectors and detector systems for radiation imaging | |
US10509136B2 (en) | Detector systems for radiation imaging | |
US6661012B2 (en) | X-ray detector | |
CN107427271B (zh) | X射线摄影装置 | |
US20100246764A1 (en) | Source grating for x-rays, imaging apparatus for x-ray phase contrast image and x-ray computed tomography system | |
US20100127180A1 (en) | Scintillator array and a method of constructing the same | |
KR20170067452A (ko) | 방사선 검출기 및 이를 채용한 방사선 촬영 장치 | |
JP2008510131A (ja) | シンチレータおよび抗散乱グリッドの配置 | |
JP2001194462A (ja) | 微細加工されたx線画像コントラストグリッド | |
US20120051508A1 (en) | Grid for radiography and manufacturing method thereof, and radiation imaging system | |
JP2008224661A (ja) | X線撮像素子、装置及び方法 | |
US20070025519A1 (en) | Arrangement for collimating electromagnetic radiation | |
US20120051509A1 (en) | Grid for radiography and manufacturing method thereof, and radiation imaging system | |
JPWO2004061428A1 (ja) | 空孔または粒子サイズ分布測定装置 | |
EP3538879B1 (en) | Grating-based phase contrast imaging | |
US9213005B2 (en) | X-ray anti-scatter grid | |
JP2005164585A (ja) | 検出器アレイ前での散乱線遮蔽方法 | |
KR100973338B1 (ko) | 부분 화소형 섬광체 엑스선 센서 | |
JP2007511307A (ja) | 特に医療x線装置用の散乱放射線グリッド及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140617 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20140617 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20150318 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150324 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150526 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151201 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160121 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160628 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160722 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5977489 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |