JP5964175B2 - Surface grinding method and coolant supply device for surface grinding machine - Google Patents

Description

  The present invention relates to a surface grinding method and a coolant supply apparatus for a surface grinder, and when grinding a workpiece such as a silicon wafer, the coolant is supplied substantially uniformly from the inside to the entire grinding portion of a grindstone. .

  When performing single-side grinding or simultaneous double-side grinding of a workpiece such as a silicon wafer with a surface grinder, the grindstone is mounted on the grindstone mounting base fixed to the shaft end of the grindstone shaft, while the grindstone is mounted on the inner peripheral side of the grindstone. And a scattering plate arranged at a predetermined interval between the grinding wheel mounting table and the coolant supplied to the center side of the scattering plate from the supply path on the grinding wheel shaft side between the scattering plate and the grinding wheel mounting table. Then, it is scattered to the outer peripheral side, and is supplied from the inner periphery to the grinding portion of the grindstone from the outer periphery of the scattering plate.

  In this type of coolant supply device, conventionally, a blade is provided on the scattering plate so as to face the grindstone mounting base, and coolant is supplied by utilizing a pump action by rotation of the blade (Patent Document 1). A passage is provided radially facing the grinding wheel mounting table, and coolant is supplied by being scattered through each passage by the centrifugal force generated by the rotation of the scattering plate (Patent Document 2). Further, a predetermined amount is provided on the grinding wheel shaft and the scattering plate. (Refer to Patent Documents 3 and 4) in which tapered surfaces facing each other are formed with a gap between them and the coolant is scattered by centrifugal force through the gaps.

Japanese Patent Laid-Open No. 9-38866 JP 2002-11660 A JP 58-45874 A JP-A-11-267773

  In the conventional coolant supply device, the coolant is scattered from the outer periphery of the scattering plate to the grinding portion of the grindstone using the pump action or centrifugal force during the rotation of the grinding wheel shaft, from the center to the outer periphery of the scattering plate. In the coolant flow path, the coolant flow is blocked and the coolant flow rate is not distributed in the circumferential direction.

  For this reason, when there is a variation such as a gap between the scattering plate and the opposing surface of the grindstone mounting table somewhere in the entire circumference of the scattering plate, or when there is a drift in the coolant supplied to the center of the scattering plate In this state, the coolant concentrates on the part where the scattering plate tends to flow, and it is scattered while drawing a fixed trajectory. In this state, the coolant cannot be supplied almost uniformly to the entire circumference of the grinding part of the grindstone. There is a concern that the grinding accuracy may be lowered, such as the flatness of the workpiece is lowered.

  As countermeasures, surroundings including the scattering plate such as making the gap between the scattering plate and the opposite surface of the grindstone mounting table constant around the entire circumference, removing the cause of coolant drift in the center of the scattering plate, etc. Although it is conceivable to strictly control the accuracy of the portion, in this case, it is difficult to manufacture, and there is a disadvantage that the manufacturing cost increases significantly.

  In addition, even if there is a variation in the coolant supply amount, it is conceivable to increase the coolant supply amount to such an extent that it does not affect the workpiece machining accuracy to prevent a decrease in machining accuracy. As a result, there is a problem in that the grinding stones and the grinding stone waste are better discharged, and the self-generating action of the grinding wheel that can sharpen the grinding stones with the grinding waste and the grinding stone waste is reduced.

  In view of such a conventional problem, the present invention can supply coolant substantially evenly to the entire circumference of the grinding portion of the grindstone to improve the processing accuracy of the workpiece, and can be manufactured easily and inexpensively in terms of structure. And it aims at providing the coolant supply apparatus of the surface grinding method and surface grinding machine which can reduce the supply amount of a coolant, and can accelerate | stimulate the self-generated action of a grindstone.

Surface grinding method according to the present invention, the coolant supplied to the scattering means of the grinding wheel end of the wheel spindle from the supply passage of the wheel shaft side, grinding abrasive stone by scattered by the centrifugal force generated by the rotation of the wheel spindle In the surface grinding method in which the workpiece is ground by the grindstone while being supplied to the inside from the inside, the scattering means includes a plurality of scattering passages in which the coolant is scattered outward and a plurality of coolants in which the coolant scattered by the centrifugal force collides. The obstacle walls are alternately arranged in the circumferential direction, and a plurality of obstacle portions in which the respective obstacle walls on the outer circumferential side are arranged on the radially outer side of the respective scattering passages on the inner circumferential side are arranged concentrically on the inside and outside. The coolant that splashes outward by centrifugal force collides with the obstacle wall of each obstacle in the scattering means and disperses in the circumferential direction, while the coolant is dispersed from the outer periphery of the scattering means to the grinding part. All around It is intended to supply.

The coolant supply device of the surface grinding apparatus according to the present invention disperses the coolant supplied from the supply passage on the grindstone shaft side to the scattering plate side of the grindstone side end of the grindstone shaft by centrifugal force due to the rotation of the grindstone shaft. scattering the coolant supply unit for a planar grinding machine so as to supply from the inside to the grinding portion of the abrasive stone, between the facing surfaces of the said wheel spindle side facing the splash plate and the scattering plate, the centrifugal force Te A plurality of obstacle portions that disperse the coolant in the circumferential direction are provided substantially concentrically on the inside and outside, and the obstacle portions are a plurality of splash passages through which the coolant scatters outward, and a plurality of coolants that collide with the centrifugal force collide with each other. The obstacle walls are alternately provided in the circumferential direction, and the obstacle walls of the obstacle portion on the outer peripheral side are arranged on the radially outer side of the scattering passages of the obstacle portion on the inner periphery side. .

  The obstacle may be provided on at least one of the scattering plate and the facing surface. A grindstone mounting base fixed to the tip of the grindstone shaft is provided, a base plate having a coolant circulation hole is mounted on the grindstone side of the grindstone mounting base, and the scattering plate is attached to the base plate. You may wear it. The scattering plate may have the obstacle.

  In the present invention, coolant can be supplied substantially uniformly to the entire circumference of the grinding portion of the grindstone, the work processing accuracy can be improved, and the structure can be manufactured easily and inexpensively, and the amount of coolant supply can be reduced, Moreover, there is an advantage that the self-generating action of the grindstone can be accelerated.

1 is a partially cutaway front view of a horizontal double-sided surface grinding machine showing a first embodiment of the present invention. It is a side view of the scattering plate and an obstacle part. It is the sectional view on the AA line of FIG. It is a side view of a scattering plate and an obstacle part showing a 2nd embodiment of the present invention. It is the BB sectional view taken on the line of FIG. It is a side view of a scattering plate and an obstacle part showing a 3rd embodiment of the present invention. It is CC sectional view taken on the line of FIG. It is a side view of a scattering plate and an obstacle part showing a 4th embodiment of the present invention. It is the DD sectional view taken on the line of FIG. It is a side view of a scattering plate and an obstacle part showing a 5th embodiment of the present invention. It is the EE sectional view taken on the line of FIG. It is a partially notched front view of the horizontal double-sided surface grinder which shows the 6th Embodiment of this invention. It is a partially notched front view of the horizontal double-sided surface grinding machine which shows the 7th Embodiment of this invention.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. 1 to 3 exemplify a coolant supply apparatus when employed in a horizontal double-sided surface grinding machine that performs surface grinding on both surfaces of a workpiece such as a silicon wafer. 1 and 2, reference numeral 1 denotes a thin plate-like workpiece such as a silicon wafer. 2 is a horizontal double-sided surface grinding machine, 3 is a grindstone shaft thereof, which are arranged opposite to the left and right sides of the work 1 and are slidable in the left-right direction and a bearing stand 4 on a pair of left and right sliding bases (not shown). Is supported rotatably around the axis.

  Each grindstone shaft 3 has a grindstone mounting table 5 on one end side opposite to each other. The grindstone mounting table 5 includes a ring-shaped grindstone 6 for grinding the workpiece 1 and rotation of the grindstone shaft 3 when the workpiece 1 is ground. Scattering means 7 for dispersing coolant by centrifugal force to supply the entire circumference of the grinding part 27 of the grindstone 6 almost uniformly from the inside is mounted, and the grindstone shaft 3 is rotationally driven around the axis on the other end side. A drive source (not shown) is provided. When the workpiece 1 is ground, the grindstone shaft 3 is rotated around the axis by driving the drive source, both surfaces of the workpiece 1 are ground by the grindstone 6, and the grindstone 6 is ground by the scattering means 7. The coolant is supplied substantially uniformly from the inside to the entire circumference of the portion 27.

  The grindstone shaft 3 includes a flange portion 8 formed integrally with the end portion on the grindstone 6 side, and a supply passage 9 formed in a substantially central portion and extending in the axial direction over the entire length in the axial direction. A grindstone mounting table 5 is detachably mounted by a fixing means 10 such as a plurality of bolts in the circumferential direction. The grindstone 6 is provided with a grinding part 27 and a base 11 that supports the grinding part 27 in a substantially concentric manner, and the base 11 is provided with a plurality of bolts in the circumferential direction on the outer peripheral part of the work 1 side end surface of the grindstone mounting base 5. It is detachably mounted by fixing means 12 such as. A tapered portion 13 for guiding the coolant supplied from the scattering means 7 toward the grinding portion 27 side of the grindstone 6 is provided substantially concentrically on the inner peripheral side of the grindstone 6 of the base 11.

  The supply passage 9 is for supplying coolant, and is connected to a coolant supply source (not shown) via a rotary pipe joint, a supply pipe (all not shown) and the like on the other end side of the grindstone shaft 3. The coolant may be supplied to the supply passage 9 in the middle of the grinding wheel shaft 3 in the axial direction. In that case, the other end side of the supply passage 9 may be closed with a stopper, or the supply passage 9 may be formed on the grindstone shaft 3 from the flange portion 8 side to the middle portion in the axial direction.

  The inner peripheral hole 15 of the grindstone mounting base 5 has a larger diameter than the supply passage 9 of the grindstone shaft 3, and the inside of the inner peripheral hole 15 serves as a coolant storage chamber 16 communicating with the supply passage 9. The scattering means 7 is disposed between the base plate 17 mounted on the grindstone mounting base 5, the scattering plate 14 mounted opposite to the base plate 17, and the base plate 17 and the scattering plate 14. The coolant that has the obstacles 18 to 20 and is supplied from the storage chamber 16 through the flow hole 22 of the base plate 17 is scattered outwardly in the radial direction by the centrifugal force generated by the rotation of the grindstone shaft 3. It is made to collide with the parts 18-20, and is disperse | distributed substantially equally to the perimeter of the circumferential direction.

  The base plate 17 has a flat surface in which the facing surface 23 facing the scattering plate 14 is substantially perpendicular to the axial direction of the grindstone shaft 3, and a flow hole 22 having a smaller diameter than the supply passage 9 and the inner peripheral hole 15 at the substantially central portion thereof. However, tapered portions 24 for guiding the coolant to the grinding portion 27 of the grindstone 6 are formed substantially concentrically on the outer peripheral side. The base plate 17 has a fitting portion 17a opposite to the facing surface 23 fitted in the inner peripheral hole 15 of the grindstone mounting base 5, and a plurality of circumferential bolts arranged in the vicinity of the inside of the taper portion 24. The fixing means 25 is detachably fixed to the end face of the grindstone mounting table 5.

  The scattering plate 14 is disposed substantially parallel to the opposing surface 23 of the base plate 17 at a predetermined interval, and is disposed substantially concentrically on the inner peripheral side of the tapered portion 24 of the base plate 17. The distance between the scattering plate 14 and the base plate 17 is slightly larger than the height of the tapered portion 24 of the base plate 17.

  A plurality of obstacles 18 to 20 are provided substantially concentrically on the scattering plate 14 inside and outside, and the coolant supplied to the center side of the scattering plate 14 receives a centrifugal force due to the rotation of the grindstone shaft 3 to the outer peripheral side. By colliding with the obstacles 18 to 20 a plurality of times while being scattered, the coolant is distributed substantially uniformly over the entire circumference in the circumferential direction.

  For example, as shown in FIGS. 2 and 3, the obstacle portions 18 to 20 of this embodiment include a first obstacle portion 18 that is the innermost peripheral side, a second obstacle portion 19 that is an intermediate side, and an outermost peripheral side. A third obstacle unit 20 is included. The first to third obstacles 18 to 20 collide with a plurality of scattering passages 18a to 20a in the circumferential direction in which the coolant is scattered to the outside, and the coolant that is disposed between the scattering passages 18a to 20a and is scattered by centrifugal force. Then, a plurality of obstacle walls 18b to 20b for dispersing the coolant in the circumferential direction are provided, and the scattering passages 18a to 20a and the obstacle walls 18b to 20b are arranged substantially evenly in the circumferential direction.

  The scattering passages 18a to 20a of the first to third obstacles 18 to 20 are arranged at substantially equal intervals in the circumferential direction, and are substantially radially from the center of the scattering plate 14 as a whole for each of the first to third obstacles 18 to 20. It has become. The first obstacle portion 18 is disposed in the vicinity of the outer peripheral side of the flow hole 22 of the base plate 17. Among the plurality of obstacle walls 18b of the first obstacle part 18, fixing of screws or the like inserted through the mounting holes 18c of a part (or four of the eight) of the obstacle walls 18b. The scattering plate 14 is detachably fixed to the base plate 17 by means 26.

  The attachment hole 18c may be provided in the obstacle walls 19b and 20b of the other second obstacle part 19 or the third obstacle part 20. Moreover, you may arrange | position the fixing means 26 in locations other than the obstruction walls 18b-20b of the 1st-3rd obstruction parts 18-20. In that case, the coolant may be provided so as to collide with the shaft portion of the fixing means 26 between the base plate 17 and the scattering plate 14, or the fixing means 26 may be disposed in the vicinity of the outside of the obstacle walls 18b to 20b. Good.

  The obstacle wall 18b of the first obstacle part 18 is also used for mounting the scattering plate 14, and has a larger radial dimension than the obstacle walls 19b and 20b of the other second and third obstacle parts 19 and 20. It is comprised in the substantially trapezoid shape which is. The obstacle walls 19b and 20b of the second and third obstacle parts 19 and 20 are formed in an arc shape. The protruding heights of the obstacle walls 18 b to 20 b of the first to third obstacle portions 18 to 20 are substantially the same, and their tips are in contact with the facing surface 23 of the base plate 17.

The first to third obstacles 18 to 20 include inner-side scattering passages 18a and 19a, outer-side obstacle walls 19b and 20b, inner-side obstacle walls 18b and 19b, and outer-side scattering passages 19a and 20a, respectively. It arrange | positions corresponding to radial direction. For example first, scattering passage 18a of the second fault section 18, 19, 19a and disorders walls 18b, 19b is equal to the circumferential direction, on the outer peripheral side of the scattering path 18a and disorders wall 18b of the first obstruction 18, The obstacle wall 19b of the second obstacle part 19 and the scattering passage 19a are arranged correspondingly.

  The scattering plate 14 is provided with a notch 28 corresponding to the head 25a of the fixing means 25 for attaching the scattering plate 14 in the middle of the obstacle wall 20b of the third obstacle 20 in the circumferential direction. The notch 28 corresponds to the outside of the obstacle wall 19 b of the second obstacle 19. The cutout portion 28 is partially closed by the head portion 25a of the fixing means 25, and a part of the coolant scattering passage 20a is formed by a gap between the head portion 25a and the obstacle wall 20b. . In the cutout portion 28, the head portion 25a of the fixing means 25 also serves as the obstacle wall 20b.

  In this embodiment, three sets of obstacles 18 to 20 are provided in the inner and outer directions, but the number is the radial direction of the scattering plate 14 as long as it is possible to disperse the coolant substantially uniformly over the entire circumference. One set may be sufficient, and two or more sets may be sufficient. Further, the number of the passages 18a to 20a and the obstacle walls 18b to 20b of the first to third obstacles 18 to 20 is arbitrary as long as the coolant can be distributed substantially evenly on the entire circumference in the circumferential direction. Yes, you can increase or decrease.

  When both surfaces of the workpiece 1 are surface ground by the grindstone 6 at the tip of each grindstone shaft 3, coolant is sent from the supply passage 9 of the grindstone shaft 3 to the scattering means 7 while rotating each grindstone shaft 3 by a driving source, The scattering means 7 supplies the coolant to the entire circumference of the grinding part 27 of the grindstone 6 almost uniformly from the inside.

  That is, when the coolant is supplied from the supply passage 9 to the central portion between the base plate 17 and the scattering plate 14 through the storage chamber 16 and the circulation hole 22, the coolant moves in the outer circumferential direction by the centrifugal force generated by the rotation of the grindstone shaft 3. Then, while splashing outward from the first obstacle part 18 through the second obstacle part 19 and the third obstacle part 20, the obstacle parts 18 to 20 are sequentially collided and are substantially evenly distributed on the entire circumference. Go distributed.

  For example, the coolant supplied to the central portion of the scattering plate 14 collides with the obstacle wall 18b of the first obstacle portion 18 on the innermost peripheral side or directly passes through the scattering passage 18a of the first obstacle portion 18 as indicated by an arrow a in FIG. It passes in the direction and collides with the obstacle wall 19b of the second obstacle part 19 in the middle of the outside to block the flow. The coolant that has collided with the obstacle wall 19b of the intermediate second obstacle portion 19 sticks to the inner peripheral surface of the obstacle wall 19b of the second obstacle portion 19 due to centrifugal force, and is pushed by the coolant that scatters afterward to cause the second obstacle. 2 moves backward in the direction indicated by the arrow b in FIG. 2 along the inner peripheral surface of the obstacle wall 19b of the unit 19 in the direction indicated by the arrow b in FIG. 2 Passes in the direction of the arrow c in FIG. 2 through the scattering passage 19a of the obstacle 19 and collides with the obstacle wall 20b of the third obstacle 20 on the outermost periphery.

  The coolant that has collided with the obstacle wall 20b of the third obstacle part 20 is rotated along the inner peripheral surface of the obstacle wall 20b of the third obstacle part 20 by the centrifugal action as in the second obstacle part 19 (indicated by the arrow X). 2) in the direction indicated by the arrow d in FIG. 2, and from the scattering passage 20a of the third obstacle 20 on the rear side to the outside of the scattering plate 14 and in the direction indicated by the arrow e in FIG. And scatter.

  The coolant supplied to the central portion of the scattering plate 14 in this way sequentially passes outside between the base plate 17 and the scattering plate 14 while following the flow paths shown by arrows a to d in FIG. It is diffused in the circumferential direction as it scatters. Since the diffusion of the coolant is performed all around the scattering plate 14, as long as the coolant continues to be supplied to the central portion of the scattering plate 14, there is a slight drift in the coolant at the central portion, Even if there is some variation in the distance between the base plate 17 and the scattering plate 14 at the portion, the coolant can be distributed substantially evenly over the entire circumference of the scattering plate 14 regardless of them.

  Accordingly, the coolant dispersed substantially uniformly around the entire circumference between the scattering plate 14 and the base plate 17 is scattered from the scattering plate 14 to the outer side, so that it is substantially even over the entire circumference of the grinding portion 27 of the grindstone 6. Can be supplied to. For this reason, the fall of the grinding precision of the workpiece | work 1 by the partial deviation of a coolant, etc. can be prevented, and the flatness of the workpiece | work 1 after a process can be improved. Further, since the coolant can be supplied almost evenly over the entire circumference of the grindstone 6 without requiring more coolant than necessary, the amount of coolant supplied can be reduced and the self-generated action of the grindstone 6 can be stabilized by reducing the coolant supply amount. .

  Moreover, since the dispersion effect of the coolant on the scattering plate 14 side is large, even when the set amount of the coolant is small at a low rotational speed at which the influence of the centrifugal force is weakened, the entire surface of the grinding portion 27 of the grindstone 6 is applied. The coolant can be supplied substantially evenly. In addition, the dispersion | distribution effect which a coolant is interrupted | blocked by obstacle wall 18b-20b and disperse | distributes in the circumferential direction by changing suitably the circumferential length of obstacle wall 18b-20b of the 1st-3rd obstacle part 18-20. It can be adjusted as appropriate.

  Although the coolant scatters from the outer periphery of the scattering plate 14, most of the coolant is guided to the taper portion 24 of the base plate 17 and supplied to the entire periphery of the grinding portion 27 of the grindstone 6 or is disposed on the outer periphery thereof. It collides with the base 11 of the grindstone 6 and becomes a mist, etc., and is supplied substantially evenly to the entire circumference of the grinding portion 27 of the grindstone 6 by the guide of the tapered portion 13 of the base 11. Some of the coolant is scattered from the scattering plate 14 to the outside air.

  Further, if there is no base plate 17 facing the scattering plate 14 on the side of the grindstone mounting table 5, the inner peripheral hole 15 of the grindstone mounting table 5 is large, and therefore a plurality of first to third in the radial direction of the scattering plate 14. In order to arrange the obstacles 18 to 20, it is necessary to increase the diameter of the scattering plate 14. However, there is a base plate 17 facing the scattering plate 14 on the side of the grindstone mounting base 5, and the flow hole 22 at the center of the base plate 17 is smaller than the inner diameter of the inner peripheral hole 15 of the grindstone mounting base 5. Therefore, there is an advantage that a plurality of obstacles 18 to 20 can be arranged in the radial direction between the scattering plate 14 and the base plate 17 while keeping the diameter of the scattering plate 14 small compared to the case without the base plate 17. .

  Furthermore, since the obstacle portions 18 to 20 are provided on the scattering plate 14, each of the base plate 17 and the scattering plate 14 is compared with the case where the obstacle portions 18 to 20 are provided on the base plate 17 side having the fitting portion 17a and the like. Can be easily manufactured.

  Further, since the scattering plate 14 has a notch 28 corresponding to the fixing means 25 for fixing the base plate 17 to the grindstone mounting base 5, the base plate 17 is operated by operating the fixing means 25 from the notch 28. It can be attached to and detached from the grindstone mounting base 5. Therefore, it is not necessary to remove the scattering plate 14 from the base plate 17 each time the base plate 17 is attached to or detached from the grindstone mounting base 5, and handling when the base plate 17 is attached or detached is easy.

  Further, since the obstacle wall 19b of the second obstacle 19 is inside the notch 28 and the head 25a of the fixing means 25 is in the notch 28, it passes through the scattering passage 19a of the second obstacle 19. The coolant first collides with the obstacle wall 20b of the third obstacle part 20, and then moves in the direction of the arrow d in FIG. After colliding with the head 25a, it will fly outside through the scattering passage 20a between the notch 28 and the head 25a of the fixing means 25.

  For this reason, the coolant does not scatter to the outside of the scattering plate 14 as it is through the notch 28, and the dispersibility of the coolant is improved. In addition, since the gap between the notch portion 28 and the head portion 25a of the fixing means 25 is one scattering passage 20a of the third obstacle portion 20, the complexity of providing a dedicated scattering passage 20a in the vicinity of the notch portion 28. Can be avoided at the same time.

  Further, the obstacle wall 20b of the third obstacle part 20 has a length in the circumferential direction depending on the presence or absence of the notch part 28, and the long obstacle wall 20b and the short obstacle wall 20b are alternately arranged, and the short obstacle wall 20b. Although the distribution of the scattering passages 20a is denser on both sides of the long obstacle wall 20b than on both sides, the scattering passages 20a are alternately arranged in the circumferential direction at predetermined coarse and dense intervals. There is no bias.

  4 and 5 illustrate a second embodiment of the present invention. In this embodiment, the scattering plate 14 includes first to third obstacles 18 to 20, and the scattering passages 18a to 20a and the obstacle walls 18b to 20b are arranged at substantially equal intervals in the circumferential direction. In particular, in the third obstacle portion 20, a scattering passage 20 a is formed between the normal scattering passage 20 a and the notch 28 and the head 25 a of the fixing means 25. Other configurations are the same as those of the first embodiment.

  If it does in this way, in the 1st-3rd obstruction parts 18-20, the scattering channel | paths 18a-20a will be distributed substantially equally on the perimeter of the circumferential direction, and it is substantially the circumference of the circumferential direction in the scattering board 14. The coolant can be uniformly dispersed. Accordingly, the coolant can be evenly supplied from the outer periphery of the third obstacle portion 20 on the outermost peripheral side by the grinding portion 27 of the grindstone 6.

  6 and 7 illustrate a third embodiment of the present invention. In this embodiment, the scattering plate 14 is provided with first to fourth obstacle portions 18 to 21. The 4th obstruction part 21 exists in the outermost periphery side of the scattering board 14, and has the scattering channel | path 21a and the obstruction wall 21b similarly to the other 1st-3rd obstruction parts 18-20. Each obstacle wall 18b-21b is formed in the circular arc shape long in the circumferential direction, and the notch part 28 is provided in the middle of the obstacle wall 21b similarly to 1st Embodiment. Other configurations are the same as those of the first embodiment.

  By increasing the number of obstacles 18 to 21 such as providing four sets of first to fourth obstacles 18 to 21 on the scattering plate 14 in this way, the coolant scatters while following a more complicated flow path. Further, the dispersibility in the circumferential direction of the coolant can be further improved.

  8 and 9 illustrate a fourth embodiment of the present invention. In this embodiment, among the first to third obstacle portions 18 to 20 of the scattering plate 14, the first obstacle portion 18 has the scattering passage 18a and the obstacle wall 18b arranged at substantially equal intervals in the circumferential direction. In the second obstacle part 19, like the third obstacle part 20, obstacle walls 19b having different circumferential lengths are alternately arranged. Other configurations are the same as those of the first embodiment.

  Thus, even when the obstacle wall 19b of the second obstacle part 19 is long and short like the third obstacle part 20 and the distribution of the scattering passages 19a is dense, each of the first to third obstacle parts 18 to 20 As long as the scattering passages 18a to 20a do not correspond to the radial direction, the coolant can be supplied substantially uniformly to the entire circumference of the grinding part 27 of the grindstone 6 through the scattering passage 20a on the outer periphery by the rotation of the scattering plate 14.

  10 and 11 illustrate a fifth embodiment of the present invention. In this embodiment, the scattering plate 14 is provided with first to fourth obstacle portions 18 to 21 in the radial direction, and an attachment hole 29 for the fixing means 26 is provided on the outer peripheral side of the scattering plate 14.

  Thus, by providing the attachment hole 29 on the outer peripheral side of the scattering plate 14, the radial dimension of the obstacle wall 18b of the first obstacle 18 can be made smaller than in the other embodiments. Accordingly, it is possible to increase the number of obstacles 18 to 21 while keeping the diameter of the scattering plate 14, such as providing the first to fourth obstacles 18 to 21 on the scattering plate 14. Other configurations are the same as those of the first embodiment.

  FIG. 12 illustrates a sixth embodiment of the present invention. In this embodiment, it forms integrally with the 1st-3rd obstruction part 18-20 of the flow hole 22 and the taper part 24 of the base board 17, and the notch part is formed in the 1st-3rd obstruction part 18-20. A disk-shaped scattering plate 14 having 28 is detachably fixed by fixing means 26. Other configurations are the same as those of the first embodiment.

  As described above, when the obstacles 18 to 20 are provided between the base plate 17 and the scattering plate 14, they can be provided on the base plate 17 in addition to the scattering plate 14. In this case, the base plate 17 is structurally complicated, but the scattering plate 14 can be simplified.

  The obstacles 18 to 20 may be provided on any one of the base plate 17 and the scattering plate 14, or may be provided on both the base plate 17 and the scattering plate 14. Further, the obstacles 18 to 20 may be separated from the base plate 17 and the scattering plate 14, and the obstacles 18 to 20 may be sandwiched between the base plate 17 and the scattering plate 14 from both sides.

  FIG. 13 illustrates a seventh embodiment of the present invention. In this embodiment, the end face of the grindstone mounting base 5 is used as a facing surface 23 that faces the scattering plate 14, and obstacles 18 to 20 are provided between the facing surface 23 and the scattering plate 14. The obstacles 18 to 20 are provided on the scattering plate 14 as in the first embodiment. A tapered guide body 30 is provided on the outer peripheral side of the scattering plate 14 to guide the coolant scattered from the scattering plate 14 to the grinding portion 27 of the grindstone 6. The tapered guide body 30 has a ring shape, is fitted into the mounting groove 31 of the grindstone mounting base 5, and is fixed by being pressed by the third obstacle portion 20 of the scattering plate 14 fixed to the grindstone mounting base 5. Other configurations are the same as those of the first embodiment.

  In this way, the scattering plate 14 may be mounted on the grindstone mounting table 5, and the obstacles 18 to 20 may be provided between the scattering plate 14 and the facing surface 23 of the grindstone mounting table 5. In this way, the base plate 17 can be omitted. Even if the base plate 17 is omitted, the coolant that scatters from the scattering plate 14 is guided to the grinding portion 27 of the grindstone 6 by providing the tapered guide body 30 on the outer peripheral side of the scattering plate 14 on the grindstone mounting base 5 side. be able to.

  As mentioned above, although each embodiment of the present invention was described, the present invention is not limited to this embodiment. For example, in the embodiment, the horizontal double-sided surface grinder 2 is illustrated, but it can be similarly applied to a single-head type, and can also be similarly applied to a vertical surface grinder regardless of whether double-headed or single-headed. is there. Moreover, although the silicon wafer is specifically illustrated as the workpiece | work 1, when grind | polishing various workpiece | work 1 other than a silicon wafer, it can implement similarly to the above-mentioned.

  The obstacle walls 18b-20b of the obstacles 18-20 need only have a structure in which coolant splashing outward from the scattering passages 18a-20a collides, and the shape is other than the trapezoidal shape and the arc shape exemplified in the embodiment. You may employ | adopt suitably. Further, the scattering passages 18a to 20a of the obstacles 18 to 20 are generally arranged in the radial direction from the middle of the scattering plate 14, but may be arranged in a direction in which the coolant can be scattered to the outside by centrifugal force. It does not necessarily have to be radial from the middle.

DESCRIPTION OF SYMBOLS 1 Work 3 Grinding wheel axis | shaft 5 Grinding wheel mounting base 6 Grinding stone 7 Scattering means 9 Supply passage 17 Base board 18 1st obstruction part 19 2nd obstruction part 20 3rd obstruction part 21 4th obstruction part 18a-21a Scattering passage 18b-21b Obstruction wall 27 Grinding part 28 Notch part

Claims (5)

The coolant supplied to the scattering means of the grinding wheel end of the wheel spindle from the supply passage of the wheel shaft side, while by scattered by the centrifugal force generated by the rotation of the wheel spindle is supplied from inside the grinding unit of the grinding stone, the In the surface grinding method of grinding a workpiece with a grindstone,
The scattering means includes a plurality of scattering passages in which coolant is scattered outward and a plurality of obstacle walls in which coolant that is scattered by centrifugal force collides alternately in the circumferential direction, and each of the obstacles on the outer peripheral side is arranged. The wall is provided with a plurality of obstacle portions arranged substantially concentrically inside and outside, arranged on the radially outer side of each scattering passage on the inner peripheral side,
Supplying coolant from the outer periphery of the scattering means to the entire periphery of the grinding part while causing the coolant that scatters to the outside by centrifugal force to collide with the obstacle wall of each obstacle part in the scattering means and disperse in the circumferential direction. A surface grinding method characterized by: The coolant supplied to the scattering plate side of the grinding wheel end of the wheel spindle from the supply passage of the wheel shaft side, is scattered by the centrifugal force generated by the rotation of the grinding wheel shaft so as to supply from the inside to the grinding portion of the abrasive stone In the coolant supply device of the surface grinder
Between the scattering plate and the surface facing the grinding wheel shaft side facing the scattering plate, a plurality of obstacle portions that disperse the coolant scattered by the centrifugal force in the circumferential direction are provided substantially concentrically inside and outside ,
The obstruction part includes a plurality of scattering passages in which the coolant scatters outward and a plurality of obstruction walls in which the coolant that scatters due to centrifugal force collides in the circumferential direction,
The coolant supply device for a surface grinder , wherein each of the obstacle walls of the obstacle portion on the outer peripheral side is disposed on a radially outer side of each of the scattering passages of the obstacle portion on the inner periphery side thereof . The coolant supply device for a surface grinder according to claim 2, wherein the obstacle is provided on at least one of the scattering plate and the facing surface. A grindstone mounting base fixed to the tip of the grindstone shaft,
A base plate having a coolant circulation hole in a substantially central portion is mounted on the grinding wheel side of the grinding wheel mounting base,
The coolant supply device for a surface grinding machine according to claim 2 or 3, wherein the scattering plate is attached to the base plate. The coolant supply device for a surface grinding machine according to any one of claims 2 to 4, wherein the scattering plate has the obstacle.

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