JP5935975B2 - Optical member position adjusting device, projection optical system, adjusting method thereof, and exposure apparatus - Google Patents

Description

  The present invention relates to a position adjusting device that adjusts the position of an optical member, a projection optical system including the optical member position adjusting device, an adjustment method thereof, an exposure apparatus including the projection optical system, and a device manufacturing method using the exposure apparatus.

  During the manufacturing process of thin display devices such as liquid crystal displays, organic EL (Electro-Luminescence) displays, and plasma displays, a mask and a photosensitive film are used to expose a mask pattern image on a panel-like photosensitive substrate such as a glass plate. 2. Description of the Related Art An exposure apparatus (hereinafter referred to as a panel exposure apparatus) that scans and exposes a photosensitive substrate by moving the photosensitive substrate in synchronization with the projection optical system is used.

  Conventionally, a panel exposure apparatus includes a multi-lens projection optical system composed of a plurality of partial projection optical systems in order to efficiently expose a large area pattern while suppressing an increase in the size of the projection optical system. (For example, refer to Patent Document 1).

JP 2001-330964 A

In recent years, the demand for higher definition for thin display devices in TVs, high-function mobile phones, and so-called tablet-type terminals is increasing, and in response to this, panel exposure apparatuses have optical performance such as aberration of projection optical systems. Further improvement is demanded.
In general, in an optical system, it is necessary to adjust the positional relationship (position and angle) of a plurality of optical members with respect to a lens barrel or the like so that a target optical performance can be obtained after assembly. However, in the case of a multi-lens projection optical system, for example, since a plurality of partial projection optical systems are arranged close to each other, the position of the optical member in each partial projection optical system can be adjusted efficiently. It is difficult, adjustment time is long, and if the target optical performance is further increased, there is a possibility that adjustment becomes difficult.

Furthermore, since the variation between the optical performances of the plurality of partial projection optical systems can be a cause of uneven exposure, it is necessary to reduce the variation in the optical performances of the plurality of partial projection optical systems. However, especially when the number of partial projection optical systems is large, it is difficult to make adjustments to reduce variations in optical performance.
In view of such circumstances, it is an object of an aspect of the present invention to easily and efficiently adjust the position of an optical member in an optical system.

According to the first aspect of the present invention, an apparatus for adjusting the position of an optical member is provided. The optical member position adjusting device includes a first annular part having a support part for supporting the optical member, a second annular part different from the first annular part, and a third annular part different from the second annular part. And at two positions in the first direction, a first elastic hinge portion connecting the first annular portion and the second annular portion, and two in the second direction intersecting the first direction. A second elastic hinge portion connecting the second annular portion and the third annular portion at a position, and the second elastic hinge portion is arranged with the first elastic hinge portion; It is provided in a plane perpendicular to the optical axis of the optical member .

  Moreover, according to the 2nd aspect, the apparatus which adjusts the position of an optical member is provided. The optical member position adjusting device includes a first annular portion having a support portion for supporting the optical member, and first and second tiltable portions that are different from the first annular portion and are annularly and tiltably disposed. A second annular portion that is different from the first annular portion and connected to the tiltable portion, and connects the first annular portion and the first tiltable portion at a position in the first direction. A first elastic hinge part that connects the first annular part and the second tiltable part at a position related to the second direction intersecting the first direction; A first drive section for tilting the first tiltable section with respect to the second annular section so as to tilt with respect to the first direction; and the second tiltable section with respect to the second annular section. A second drive unit that tilts the second drive unit so as to tilt with respect to the second direction. It is.

  Moreover, according to the 3rd aspect, the projection optical system which forms the image of the pattern of a 1st surface in a 2nd surface is provided. The projection optical system includes a plurality of optical members arranged along the optical axis, and an optical member position adjustment according to the first or second aspect for supporting an optical member to be adjusted among the plurality of optical members. And a lens barrel to which the third annular portion or the second annular portion of the optical member position adjusting device is fixed.

  Moreover, according to the 4th aspect, the projection optical system which forms the image of the pattern of a 1st surface in a 2nd surface is provided. The projection optical system includes a plurality of optical members arranged along the optical axis, and an optical member position adjustment according to a first aspect for supporting a first optical member to be adjusted among the plurality of optical members. Apparatus (however, the first annular portion, the second annular portion, and the third annular portion are arranged along the optical axis of the optical member) and the adjustment target of the plurality of optical members The optical member position adjusting device according to the first aspect for supporting the second optical member (however, the first annular portion, the second annular portion, and the third annular portion are optical axes of the optical member). , And a lens barrel to which the third annular portion of the first and second optical member position adjusting devices is fixed.

According to a fifth aspect, there is provided a projection optical system adjusting method according to the fourth aspect, wherein the first optical member is adjusted using the first optical member position adjusting device, and the projection optical system is adjusted. Provided is an adjustment method for a projection optical system that performs coarse adjustment of the imaging characteristics of the system, adjusts the second optical member using the second optical member position adjusting device, and finely adjusts the imaging characteristics Is done.
Moreover, according to the 6th aspect, the exposure apparatus which exposes a board | substrate through the pattern of a mask with exposure light is provided. The exposure apparatus includes a mask stage that moves the mask, the projection optical system according to the third or fourth aspect, and a substrate stage that moves the substrate.

  According to a seventh aspect, there is provided a device manufacturing method including exposing a photosensitive substrate using the exposure apparatus according to the sixth aspect, and processing the exposed photosensitive substrate. The

  According to the first aspect of the present invention, the optical member can be easily and accurately rotated around the axis.

1 is a perspective view showing a schematic configuration of an exposure apparatus according to an example of an embodiment. It is a perspective view which shows projection system PS in FIG. It is sectional drawing which shows one partial projection optical system in FIG. It is a perspective view which shows the 1st lens support member in FIG. (A) is sectional drawing along the 1st drive mechanism which shows the 1st adjustment apparatus in FIG. 3, (B) is sectional drawing along the 2nd drive mechanism which shows the 1st adjustment apparatus. (A) is a front view which shows the 2nd lens support member in FIG. 3, (B) is an enlarged view which shows the leaf | plate spring for a connection in FIG. 6 (A). (A) is sectional drawing along the 1st drive mechanism which shows the 2nd adjustment apparatus in FIG. 3, (B) is sectional drawing along the 2nd drive mechanism which shows the 2nd adjustment apparatus. It is a flowchart which shows an example of the adjustment method of a projection system. It is a front view which shows the modification of a 2nd lens support member. It is a perspective view which shows the lens support member of other embodiment. (A) is a diagram showing the first elastic hinge portion of FIG. 10, (B) is a diagram showing the third elastic hinge portion of FIG. 10, (C) is a lens drive mechanism of FIG. 11 (A). It is sectional drawing of the principal part. (A) is a front view which shows the modification of a lens support member, (B) is sectional drawing which shows the lens support member of FIG. 12 (A). It is a flowchart which shows an example of the manufacturing process of a liquid crystal display element.

  An example of an embodiment of the present invention will be described with reference to FIGS. FIG. 1 shows a schematic configuration of an exposure apparatus EX according to the present embodiment. As an example, the exposure apparatus EX has an image of a pattern of a mask M on a plate PT (photosensitive substrate) made of a panel-like flat glass coated with a photoresist used for a thin display panel such as a liquid crystal display or an organic EL display. Is a multi-lens type scanning exposure type panel exposure apparatus. Hereinafter, the Z axis is taken perpendicular to the surface of the plate PT when it is in focus, and the X axis is orthogonal to the X axis along the scanning direction of the mask M and the plate PT during scanning exposure in a plane parallel to the surface. A description will be given taking the Y axis along the direction (non-scanning direction).

  In FIG. 1, an exposure apparatus EX includes a light source 10 including, for example, an ultra-high pressure mercury lamp that generates illumination light EL (exposure light) for exposure, and a plurality of trapezoidal illumination areas on a pattern surface of a mask M using the illumination light EL. An illumination system IS that illuminates IRA or the like with a uniform illuminance distribution, a mask stage 21 that moves while holding the mask M parallel to the XY plane via a mask holder (not shown), and a pattern image of the mask M A projection system PS (projection optical system) composed of a multi-lens projection optical system formed in a plurality of trapezoidal exposure areas PRA and the like on the surface of the PT, and a plate stage 22 that holds and moves the plate PT. Yes. Further, the exposure apparatus EX includes a multi-axis laser interferometer 23A that measures position information of the mask stage 21, a multi-axis laser interferometer 23B that measures position information of the plate stage 22, and laser interferometers 23A and 23B. A driving system (not shown) including a linear motor that drives the mask stage 21 and the plate stage 22 synchronously based on the measurement result, and a wavefront aberration of the projection system PS provided on the plate stage 22, for example, shearing interference And a main control device (not shown) for comprehensively controlling the operation of the entire apparatus.

  The illumination light EL emitted from the light source 10 enters the condensing optical system 11 via an elliptical mirror, a mirror, a shutter (not shown), and a wavelength selection filter (not shown). In the wavelength selection filter, for example, light having one or more wavelengths is selected from i-line (wavelength 365 nm), g-line (wavelength 436 nm), and h-line (wavelength 405 nm). The illumination light EL that has passed through the condensing optical system 11 enters the incident end 12 of the branching optical system 13 and is the same number as the partial projection optical systems PLA to PLG that constitute the projection system PS of the branching optical system 13 (this embodiment). The illumination light EL emitted from the seven emission ends 14A to 14G illuminates the illumination areas IRA to IRG via the corresponding partial illumination systems ILA to ILG, respectively. Each of the partial illumination systems ILA to ILG includes a collimator lens, a fly eye integrator (optical integrator), a condenser lens, and the like. An illumination system IS is configured including optical members from the condensing optical system 11 to the partial illumination systems ILA to ILG. As shown in FIG. 2, the trapezoidal illumination areas IRA to IRG have three illumination areas IRA and IRB in the first row arranged in the Y direction in accordance with the arrangement of partial projection optical systems PLA to PLG described later. , IRC, and four illumination regions IRD, IRE, IRF, and IRG in the second row, which are arranged in the Y direction and shifted by a half cycle in the Y direction.

  In FIG. 1, the illumination light from the illumination areas IRA to IRG of the mask M is a plurality (seven in this embodiment) of partial projection optics arranged in two rows along the Y direction so as to correspond to each illumination area. The light enters a projection system PS composed of systems PLA to PLG. The partial projection optical systems PLA to PLG form pattern images in the illumination areas IRA to IRG in the corresponding exposure areas PRA and the like. In FIG. 1, each partial projection optical system PLA-PLG has shown schematic structure of the optical system inside a lens-barrel. The partial projection optical systems PLA to PLG are telecentric and high-definition imaging optical systems having substantially the same structure and two-stage catadioptric systems arranged in the Z direction as an example. An erect image is formed, and the numerical aperture is about 0.1, for example.

  In this case, when all the illumination areas IRA to IRG are viewed in the X direction, the illumination areas IRA to IRG are arranged without gaps in the Y direction. Therefore, the mask M is moved in the + X direction (or -X direction) with respect to the illumination areas IRA to IRG by the mask stage 21 while exposing the plate PT with the image of the pattern of the illumination areas IRA to IRG by the projection system PS. And the movement of the plate PT in the + X direction (or -X direction) with respect to the exposure area PRA and the like by the plate stage 22 are performed in synchronization with each other so that the pattern on the entire surface of the mask M can be obtained by one scanning exposure. It is possible to expose one pattern formation region (partition region) of the plate PT.

  As shown in FIG. 2, the partial projection optical systems PLA to PLG are arranged in the −X direction so as to face the three partial projection optical systems PLA, PLB, and PLC in the first row arranged in the Y direction. Arranged and divided into four partial projection optical systems PLD, PLE, PLF, and PLG in the second row arranged with a half-cycle shift in the Y direction, and allows illumination light to pass in a flat plate shape indicated by a two-dot chain line It is supported by an optical system frame 26 in which an opening is formed. The optical system frame 26 is supported by a base member (not shown) on which the plate stage 22 is movably mounted. The number and arrangement of the partial projection optical systems PLA to PLG constituting the projection system PS are arbitrary.

  The first to seventh partial projection optical systems PLA to PLG have the same configuration. Hereinafter, the configuration of the first partial projection optical system PLA will be described with reference to FIG. In FIG. 3, the partial projection optical system PLA includes a first catadioptric system G1P that forms a primary image I1 of a pattern in the illumination area IRA of the mask M, and a field stop (not shown) arranged in the vicinity of the primary image I1. A first (upper) lens barrel 50 that houses the first catadioptric system G1P, a second catadioptric system G2P that forms a secondary image I2 of the primary image I1 in the exposure area PRA on the plate PT, And a second (lower) lens barrel 52 that houses the two catadioptric system G2P. The first catadioptric system G1P includes an image shifter 28A (for example, a plurality of parallel plane plates) that shifts light incident in the −Z direction from the mask M, and a first right-angle prism 30A that reflects the light in the + X direction. Then, the lens 32A, the lens 34A, the lens 36A, the lens 38A, and the lens 40A arranged in the + X direction in order from the first right-angle prism 30A side, and the lenses 32A to 40A reflected by the first reflection surface of the right-angle prism 30A. A first concave mirror 42A that reflects the passed light in the -X direction. The optical axis of the optical system composed of the lenses 32A to 40A and the first concave mirror 42A is assumed to be AX1. The light reflected by the first concave mirror 42A passes through the lenses 40A to 32A and is reflected in the −Z direction by the second reflecting surface of the right-angle prism 30A to form the primary image I1.

  The first lens barrel 50 has a prismatic shape, a first lens barrel portion 50a that supports the image shifter 28A and the right-angle prism 30A, a cylindrical shape, a second lens barrel portion 50b that supports the lenses 32A and 34A, and a cylindrical shape. The third lens barrel portion 50c that accommodates the lenses 36A, 38A, 40A and the fourth lens barrel portion 50d that supports the first concave mirror 42A in a short cylindrical shape with the other end closed are bolts B7 and the like (FIG. 7). (See (A)). The first lens barrel 50 is fixed to the upper surface of the optical system frame 26.

  The configuration of the second catadioptric system G2P is substantially the same as that of the first catadioptric system G1P. That is, the second catadioptric system G2P is disposed in the optical path of the light reflected by the second right-angle prism 30B and the second right-angle prism 30B that reflects light incident in the −Z direction from the primary image I1 in the + X direction. Lenses 32B, 34B, 36B, 38B, and 40B, a second concave mirror 42B that reflects light that has passed through the lens 40B in the -X direction, a second concave mirror 42B that is reflected by the second concave mirror 42B, passes through the lenses 40B to 32B, and a right-angle prism 30B And an image shifter 28B for shifting the light reflected in the −Z direction. The optical axis of the optical system composed of the lenses 32B to 40B and the second concave mirror 42B is assumed to be AX2. A secondary image I2 is formed in the exposure area PRA by the light that has passed through the image shifter 28B. The second lens barrel 52 also accommodates the first lens barrel portion 52a that supports the image shifter 28B and the right-angle prism 30B, the second lens barrel portion 52b that supports the lenses 32B and 34B, and the lenses 36B, 38B, and 40B. The third lens barrel portion 52c is connected to the fourth lens barrel portion 52d that supports the second concave mirror 42B. The second lens barrel 52 is fixed to the bottom surface of the optical system frame 26.

  Further, the partial projection optical system PLA adjusts the positional relationship of the lenses 36A and 36B with respect to the third lens barrel portions 50c and 52c to perform coarse adjustment of the imaging characteristics, and the first adjustment device 8A and the third adjustment device 8C. And a second adjusting device 8B and a fourth adjusting device 8D that finely adjust the imaging characteristics by adjusting the positional relationship of the lenses 40A and 40B with respect to the third lens barrel portions 50c and 52c. In the present embodiment, the first and third adjusting devices 8A and 8C having the same configuration are provided on metal cylindrical lens support members 54A and 54B that hold the lenses 36A and 36B, respectively, and the optical axes AX1 and AX2. First drive mechanisms 56A and 56B and a second drive for roughly adjusting the eccentric coma aberration by adjusting the rotation angles (tilt angles) of the lenses 36A and 36B around two orthogonal directions in a vertical plane. Mechanisms 57A and 57B. The lens support members 54A and 54B are fixed to the −X direction end face 50c3 and the like in the third lens barrel portion 50c by connecting plates 58A and 58B and bolts B1 (see FIG. 5A) at four locations, respectively. Above the side surface of the third lens barrel 50c (the direction in which the Z-axis is rotated ± 45 ° around the X-axis), a slit 50c1 for projecting the ends of the levers 56A1, 57A1 of the drive mechanisms 56A, 57A to the outer surface , 50c2 are formed. Slit portions 52c1 and 52c2 for projecting the end portions of the levers of the drive mechanisms 56B and 57B to the outer surface are formed symmetrically with the slit portions 50c1 and 50c2 below the side surface of the third lens barrel portion 52c of the second lens barrel 52. ing.

  Similarly, the second and fourth adjusting devices 8B and 8D having the same configuration hold the lenses 40A and 40B, respectively, and are made of a metal cylinder that is shorter than the lens support members 54A and 54B (the outer diameter is the lens support member). The rotation angle (tilt angle) of the lenses 40A and 40B is adjusted around two orthogonal directions in a plane perpendicular to the optical axes AX1 and AX2 and the lens support members 60A and 60B having a larger ring shape than 54A and 54B. The first drive mechanisms 62A and 62B and the second drive mechanisms 63A and 63B for finely adjusting the decentration coma aberration are provided. The outer peripheral portions of the lens support members 60A and 60B are fixed to the end surfaces 50c4 and 52c4 in the + X direction in the third barrel portions 50c and 52c by bolts B11, respectively. The flange portions of the fourth lens barrel portions 50d and 52d are fixed to the end surfaces 50c5 and 52c5 of the third lens barrel portions 50c and 52c by bolts B7. The flange portions of the fourth lens barrel portions 50d and 52d are connected to the drive mechanism 62A, Slit portions 50d1, 50d2 and the like for projecting end portions of the plate springs 64A, 65A, etc. for connecting 63A, 62B, 63B to the outer surface are formed. The decentering coma aberration is expressed as a wavefront aberration by, for example, seventh-order and eighth-order Zernike coefficients (Z7, Z8). In FIG. 3, the sectional views of the third lens barrel portions 50c and 52c and the fourth lens barrel portions 50d and 52d are cross sections along planes obtained by rotating the XZ plane by 45 ° around the optical axes AX1 and AX2, respectively. Represents.

Hereinafter, the first adjusting device 8A in FIG. 3 will be described with reference to FIGS. 4 to 5B. FIG. 4 shows a part of the lens support member 54A of the adjustment device 8A. In FIG. 4, the lens support member 54 </ b> A has an annular first support portion 54 </ b> A <b> 1 having an accommodating portion 54 </ b> A <b> 1 a (see FIG. 5A) that accommodates the outer edge portion of the lens 36 </ b> A, and 1 1 having a shape in which the slits B4A and B4B are rotated by about 90 ° around the optical axis AX1 with respect to the annular second support portion 54A2 and the second support portion 54A2 that are arranged with the pair of slits B4A and B4B being separated from each other. The third support portion 54A3 is formed integrally with the pair of slits B3A and B3B.
The pair of slits B4A and B4B are formed symmetrically with respect to the circumference of the optical axis AX1 and at an angle smaller than 180 ° so as to leave elastic hinge portions 55A and 55B described later.
The ends of the slits B4A and B4B, that is, the vicinity of the elastic hinge portions 55A and 55B have a shape having a bent portion bent in the + X direction.

The pair of slits B3A and B3B are formed symmetrically and at an angle smaller than 180 ° around the optical axis AX1 so as to leave elastic hinge portions 55C and 55D described later. The ends of the slits B3A and B3B, that is, the vicinity of the elastic hinge portions 55C and 55D have a shape having a bent portion bent in the −X direction.
The outer edge portion of the lens 36A is fixed to the housing portion 54A1a (support portion) in the first support portion 54A1 by an annular pressing member B2 (see FIG. 5A), and is flat at four locations on the side surface of the third support portion 54A3. 3rd support part 54A3 is being fixed to the 3rd lens-barrel part 50c of FIG. 3 with the connection board 58A provided in the part. The bent portions and the end portions of the slits B4A, B4B, etc. are formed in a circular shape in order to increase flexibility. The shapes and the like of the bent portions of the slits B4A, B4B, B3A, and B3B can be processed by, for example, a wire cut electric discharge machine.

  A pair of gaps of the slits B4A and B4B are arranged so as to face each other along a first direction R1 in which a Z axis is rotated 45 ° clockwise in a plane perpendicular to the optical axis AX1. The elastic hinge portions 55A and 55B. A pair of spaced portions of the slits B3A and B3B are arranged so as to face each other along a second direction R2 rotated 45 ° counterclockwise about the Z axis in a plane perpendicular to the optical axis AX1. 4 elastic hinge portions 55C and 55D. Since the end portions of the slits B4A and B4B and the end portions of the slits B3A and B3B are on the same plane perpendicular to the optical axis AX1, the rotation axis B5 passing through the center of the elastic hinge portions 55A and 55B and the elastic hinge portion 55C, The rotation axis B6 passing through the center of 55D is orthogonal to the optical axis AX1.

  5A is a cross-sectional view in the direction along the rotation axis B5 in FIG. 4, and FIG. 5B is a cross-sectional view in the direction along the rotation axis B6 in FIG. With respect to the second support portion 54A2, the first support portion 54A1 (lens 36A) is illustrated by the first drive mechanism 56A around the rotation axis B5 along the first direction R1 via the elastic hinge portions 55A and 55B. It is driven to rotate as indicated by a dotted line position D2 in FIG. As shown in FIG. 5 (B), the first drive mechanism 56A is fixed to the lever 56A1 fixed in the vicinity of the elastic hinge portion 55C of the first support portion 54A1 and the outer surface of the third lens barrel portion 50c. A micrometer 56A2 that pushes and pulls the tip of the lever 56A1 in the X direction, and a tension coil spring 56A3 that connects the tip of the lever 56A1 protruding through the slit 50c1 of the third barrel portion 50c and the support of the micrometer 56A2. And have. The tip of the lever 56A1 is bent in the + X direction, and the contact portion between the tip of the micrometer 56A2 (processed into a semispherical surface so as to be relatively slippery) and the flat tip of the lever 56A1 is , And on the plane perpendicular to the optical axis AX1 through the centers of the elastic hinge portions 55A and 55B. For this reason, the first support portion 54A1 (lens 36A) can be easily and accurately rotated around the axis passing through the centers of the elastic hinge portions 55A and 55B by the drive mechanism 56A.

  Further, the second support portion 54A2 (the first support portion 54A1 and the lens 36A) is arranged along the second direction R2 via the elastic hinge portions 55C and 55D with respect to the third support portion 54A3 (the third lens barrel portion 50c). The second drive mechanism 57A is driven to rotate around the rotation axis B6 as indicated by the dotted line position D1 in FIG. As shown in FIG. 5A, the drive mechanism 57A includes a lever 57A1 fixed in the vicinity of the elastic hinge portion 55A of the first support portion 54A1 (or the second support portion 54A2), and a third lens barrel portion. A micrometer 57A2 which is fixed to the outer surface of 50c and pushes and pulls the tip of the lever 57A1 in the X direction; a tip projecting through the slit 50c2 of the third barrel portion 50c of the lever 57A1; and a support of the micrometer 57A2 And a tension coil spring 57A3. The tip of the lever 57A1 is bent in the + X direction, and the contact portion between the tip of the micrometer 57A2 (processed into a semispherical surface so as to be relatively slippery) and the flat tip of the lever 57A1 is And on the plane perpendicular to the optical axis AX1 through the centers of the elastic hinge portions 55C and 55D. Therefore, the drive mechanism 57A can easily and accurately rotate the second support portion 54A2 (lens 36A) around an axis passing through the centers of the elastic hinge portions 55C and 55D.

Next, the second adjusting device 8B in FIG. 3 will be described with reference to FIGS. 6 (A) to 7 (B). FIG. 6A shows a part of the lens support member 60A of the adjustment device 8B. In FIG. 6A, the lens support member 60A has an annular first support portion 60A1 having an accommodating portion 60A1a (see FIG. 7A) for accommodating the lens 40A, and the first support portion 60A1. An annular second support portion 60A2 disposed concentrically with the pair of slits B13 and B14 therebetween, and a third concentrically disposed with a pair of slits B15 and B16 with respect to the second support portion 60A2. The support portion 60A3 is integrally formed.
The pair of slits B13 and B14 are formed substantially symmetrically around the optical axis AX1 at an angle of about 180 ° so as to leave elastic hinges 61A and 61B, which will be described later, and are bent at the ends in the radial direction. The shape has a bent portion.

Further, the pair of slits B15 and B16 has a shape in which the slits B13 and B14 are substantially expanded in the radial direction so as to leave later-described elastic hinge portions 61C and 61D, and this shape is 90 ° around the optical axis AX1. It is a rotated shape. However, the central part of the slits B13 and B14 has a concave bent part that goes in the direction of the optical axis AX1, and the central part of the slits B15 and B16 has a convex bent part that goes in the radial direction with respect to the optical axis AX1.
The outer edge portion of the lens 40A is fixed to the housing portion 60A1a (support portion) in the first support portion 60A1 by an annular pressing member B12 (see FIG. 7A), and the outer peripheral portion of the third support portion 60A3 is a plurality of bolts. It is fixed to the end face 50c4 in the third lens barrel portion 50c by B11. The ends of the slits B13 to B16 are formed in a circular shape in order to increase flexibility. The shapes of the bent portions of the slits B13 to B16 can be processed by, for example, a wire cut electric discharge machine.

  A pair of radial spacing portions of the slits B13 and B14 are arranged so as to face each other along a first direction R1 obtained by rotating the Z axis clockwise by 45 ° in a plane perpendicular to the optical axis AX1. And second elastic hinge portions 61A and 61B. A pair of radially spaced portions of the slits B15 and B16 are arranged so as to face each other along a second direction R2 obtained by rotating the Z axis by 45 ° counterclockwise in a plane perpendicular to the optical axis AX1. 3 and 4th elastic hinge parts 61C and 61D. The elastic hinge portions 61A to 61D are formed so that the thickness in the X direction is considerably thinner than the outer thickness of the lens support member 60A in order to increase flexibility (see FIGS. 7A and 7B). . The slits B13 to B16 are provided with concave portions or convex portions for avoiding mechanical interference with the elastic hinge portions 61D, 61C, 61A, 61B. The rotation axis B17 passing through the centers of the elastic hinge portions 61A and 61B and the rotation axis B18 passing through the centers of the elastic hinge portions 61C and 61D are orthogonal to each other on the optical axis AX1.

  7A is a cross-sectional view in the direction along the rotation axis B18 in FIG. 6A, and FIG. 7B is a cross-sectional view in the direction along the rotation axis B17 in FIG. The first support portion 60A1 (lens 40A) is rotationally driven by the first drive mechanism 62A around the rotation axis B17 along the first direction R1 via the elastic hinge portions 61A and 61B with respect to the second support portion 60A2. Is done. As shown in FIG. 7A, the first drive mechanism 62A includes a connecting leaf spring 64A having one end fixed in the vicinity of the elastic hinge portion 61C of the first support portion 60A1, and a fourth lens barrel portion. Between the outer surface of the support portion 62A1 and the outer surface of the fourth lens barrel portion 50d, the other end portion of the leaf spring 64A fixed to the outer surface of the 50d by the bolt 62A2 and passing through the slit portion 50d1 is fixed by a bolt or the like. And a washer 62A3 having an adjustable thickness. The washer 62A3 is selected from a number of washers having various thicknesses, and the other end of the leaf spring 64A can be pushed and pulled in the X direction by adjusting the thickness of the washer 62A3. Thus, by pushing and pulling the other end portion of the leaf spring 64A in the X direction, the first support portion 60A1 (lens 40A) can be rotated as indicated by a dotted line position D3.

Since a lateral stress is applied to the leaf spring 64A due to the displacement by the second drive mechanism 62B or the like, in order to release the stress, two flexure portions 64Aa and 64Ab are provided as shown in FIG. 6B. Is formed.
In FIG. 6A, the second support portion 60A2 (the first support portion 60A1 and the lens 40A) is connected to the third support portion 60A3 (the third lens barrel portion 50c) via the elastic hinge portions 61C and 61D. The second drive mechanism 63A rotates around the rotation axis B18 along the second direction R2. As shown in FIG. 7B, the second drive mechanism 63A is connected to one end portion fixed in the vicinity of the elastic hinge portion 61A of the second support portion 60A2 (or the first support portion 60A1). A leaf spring 65A, a support portion 63A1 fixed to the outer surface of the fourth lens barrel portion 50d with a bolt 63A2 and the other end portion of the leaf spring 64A passing through the slit portion 50d2 fixed with a bolt or the like, a support portion 63A1, And a washer 63A3 having a thickness adjustable between the outer surface of the four lens barrel portions 50d. By adjusting the thickness of the washer 63A3 and pushing and pulling the other end portion of the leaf spring 65A in the X direction, the second support portion 60A2 (and thus the lens 40A) can be rotated as indicated by the dotted line position D4. Similarly to the leaf spring 64A, the leaf spring 65A has two (or even one) flexure portions as shown in FIG. 6B.

As the drive mechanisms 62A and 63A, a micrometer-type push / pull mechanism may be used similarly to the drive mechanisms 56A and 57A. As the drive mechanisms 56A and 62A, an automatic push / pull mechanism using a drive element such as an electric micrometer, an ultrasonic motor, or a piezoelectric element may be used.
Next, an example of a method for adjusting the optical characteristics or the imaging characteristics of the projection system PS of the present embodiment will be described with reference to the flowchart of FIG. First, in step 102 in FIG. 8, manufacture of each member of the plurality of partial projection optical systems PLA to PLG of the projection system PS, assembly adjustment of each member, and attachment to the optical system frame 26 are performed. In the next step 104, rough adjustment of the first catadioptric system G1P in the first lens barrel 50 of FIG. 3 is performed using the first adjusting device 8A of each of the partial projection optical systems PLA to PLG. Coarse adjustment of the second catadioptric system G2P in the second lens barrel 52 is performed using the adjusting device 8C. In the next step 106, the first catadioptric system using the second adjusting device 8B of each of the partial projection optical systems PLA to PLG while measuring the wavefront aberration using, for example, a wavefront aberration measuring device (not shown) or the like. Fine adjustment of G1P is performed, and fine adjustment of the second catadioptric system G2P is performed using the fourth adjustment device 8D. During these adjustments, the operation units (micrometer 56A2, washer 62A3, etc.) of the adjusting devices 8A to 8D are on the outer surfaces of the first lens barrel 50 and the second lens barrel 52. Even in this case, it is possible to adjust the imaging characteristics (wavefront aberration) very easily and efficiently.

  Thereafter, in step 108, the single adjusted projection system PS is mounted between the mask stage 21 and the plate stage 22 of the exposure apparatus main body as shown in FIG. In the next step 110, coarse adjustment of the first catadioptric system G1P is performed using the first adjusting device 8A of each of the partial projection optical systems PLA to PLG. At this time, the first catadioptric system G1P is housed in the first lens barrel 50, and the operation unit (micrometers 56A2 and 57A2) of the adjusting device 8A is fixed to the outer surface of the oblique upper portion of the first lens barrel 50. Therefore, even if a plurality of partial projection optical systems PLA to PLG are arranged close to each other, rough adjustment of the first catadioptric system G1P of each partial projection optical system PLA to PLG can be performed very easily and efficiently. .

  In the next step 112, for example, the wavefront aberration is measured on-body using the wavefront aberration measuring device 24 of FIG. Fine adjustment of the refractive system G1P is performed. Also in this case, the first catadioptric system G1P is accommodated in the first lens barrel 50, and the operation portions (washers 62A3 and 63A3) of the adjusting device 8B are fixed to the lateral outer surface of the first lens barrel 50. Therefore, even if the plurality of partial projection optical systems PLA to PLG are arranged close to each other, fine adjustment of the first catadioptric system G1P of each partial projection optical system PLA to PLG can be performed very easily and efficiently. . Further, for example, the adjustment for matching the imaging characteristics of the other partial projection optical systems PLB to PLG with the imaging characteristics of a predetermined partial projection optical system PLA is very easy and efficient using the adjusting devices 8A to 8D. Can be done automatically.

The effects and the like of this embodiment are as follows.
The projection system PS (multi-lens projection optical system) of the exposure apparatus EX of the present embodiment includes a plurality of partial projection optical systems PLA to PLG, and each partial projection optical system PLA to PLG is a first adjustment for coarse adjustment. A device 8A and a second adjusting device 8B for fine adjustment are provided.
The first adjustment device 8A that adjusts the positional relationship of the lens 36A in the first catadioptric system G1P such as the partial projection optical system PLA with respect to the first lens barrel 50 is an annular first support portion that supports the lens 36A. 54A1 is connected to the first support portion 54A1 via a pair of elastic hinge portions 55A and 55B arranged so as to face each other along a first direction R1 perpendicular to the optical axis AX1. A pair of elastic hinge portions 55C disposed so as to face the second support portion 54A2 and the second support portion 54A2 along a second direction R2 perpendicular to the optical axis AX1 and perpendicular to the first direction R1; The first support portion 54A1 (lens 36A) is rotated around the first direction R1 with respect to the annular third support portion 54A3 connected via 55D and the third support portion 54A3 (first lens barrel 50). First drive mechanism 56A Includes a second drive mechanism 57A for rotating the second support portion relative to the third support portion 54A3 54A2 (lens 36A) about the second direction R2, the. The first to third support portions 54A1 to 54A3 are connected in a substantially cylindrical shape as a whole along the optical axis AX1.

  The second adjustment device 8B that adjusts the positional relationship of the lens 40A in the first catadioptric system G1P with respect to the first lens barrel 50 includes an annular first support 60A1 that supports the lens 40A, and a first support. An annular second support 60A2 connected to 60A1 via elastic hinges 61A and 61B, and an annular third support connected to the second support 60A2 via elastic hinges 61C and 61D. Part 60A3, first drive mechanism 62A for rotating first support part 60A1 (lens 40A) around first direction R1 relative to third support part 60A3 (first lens barrel 50), and third support part A second drive mechanism 63A that rotates the second support 60A2 (lens 40A) around the second direction R2 with respect to 60A3. The first to third support portions 60A1 to 60A3 are connected substantially concentrically around the optical axis AX1.

  According to the present embodiment, the first support portions 54A1 and 60A1 (lenses 36A and 40A) are rotated around the first direction R1 with respect to the third support portions 54A3 and 60A3 by the first drive mechanisms 56A and 62A. The second drive mechanisms 57A and 63A move the second support portions 54A2 and 60A2 (the first support portions 54A1 and 60A1 and the lenses 36A and 40A) around the second direction R2 with respect to the third support portions 54A3 and 60A3. By rotating, the positional relationship of the lenses 36A and 40A in the first catadioptric system G1P (partial projection optical systems PLA to PLG) with respect to the first lens barrel 50 (the member to which the third support portions 54A3 and 60A3 are fixed) is established. Can be adjusted easily and efficiently.

Note that the first direction R1 and the second direction R2 may intersect at an angle other than 90 °.
Further, since the first to third support portions 54A1 to 54A3 and the first to third support portions 60A1 to 60A3 are integrally formed, the lenses 36A and 40A can be driven stably. At least one portion of the three support portions 54A1 to 54A3 and the first to third support portions 60A1 to 60A3 is formed from a separate member, and the separate member is connected to another portion via an elastic hinge mechanism. May be.

In addition, since the projection system PS includes a plurality of partial projection optical systems PLA to PLG that respectively form images of a part of the pattern of the mask M on the surface of the plate PT, the exposure area is formed using a small projection optical system as a whole. Since it can be widened, for example, the image of the pattern of the mask M can be exposed to the large-area plate PT with high accuracy by one scanning exposure.
The projection system PS of the present embodiment is a projection optical system that forms an image of the pattern surface (first surface) of the mask M on the surface (second surface) of the plate PT. The first and second surfaces are arranged in order and along the second surface (so that the optical axes AX1 and AX2 extend in the X direction along the surface of the plate PT) to form intermediate images. 1 and second catadioptric optical systems G1P and G2P are provided. Further, the projection system PS includes first and second adjustment devices 8A for supporting the lens 36A (first optical member) and the lens 40A (second optical member) in the first catadioptric optical system G1P. And 8B, and third and fourth adjusting devices 8C and 8D for supporting the lens 36B (third optical member) and the lens 40B (fourth optical member) in the second catadioptric optical system G2P, The first lens barrel 50 and the second lens barrel 52 to which the third support portions 54A3, 60A3, etc. of the adjusting devices 8A to 8D are fixed are provided.

  In the adjustment method of the projection system PS of this embodiment, the lenses 36B and 40B of the second catadioptric system G2P are adjusted using the adjusting devices 8C and 8D when adjusting the projection system PS alone (steps 104 and 106). In the state where the projection system PS is incorporated in the exposure apparatus, the adjustment of the lenses 36A and 40A of the first catadioptric optical system G1P is performed using the adjustment apparatuses 8A and 8B (steps 110 and 112). According to this adjustment method, in the state where the projection system PS is incorporated in the exposure apparatus, the first catadioptric system G1P in the upper first lens barrel 50 with sufficient space is adjusted, so that the projection system PS Is easy to adjust.

In addition, you may adjust the positional relationship of other optical members, such as the concave mirror 42A, with the adjustment apparatus similar to adjustment apparatus 8A, 8B.
Further, the exposure apparatus EX of the present embodiment is an exposure apparatus that exposes the plate PT with the illumination light EL through the pattern of the mask M, and the mask stage 21 that moves the mask M and the projection system PS (projection) of the present embodiment. An optical system) and a plate stage 22 that moves the plate PT. According to the exposure apparatus EX, since the imaging characteristics of the projection system PS can be adjusted with high accuracy, the pattern image of the mask M can be exposed with high accuracy onto the large-area plate PT.

Next, the following modifications can be made to the above embodiment.
First, instead of the lens support member 60A of FIG. 6A, the lens support member 60C of the first modified example of FIG. 9 may be used. In FIG. 9, the lens support member 60 </ b> C is formed by elastic hinge portions 61 </ b> E and 61 </ b> F that connect the first support portion 60 </ b> C <b> 1 that supports the lens 40 </ b> A and the second support portion 60 </ b> C 2 on the outer side thereof. The elastic hinge portions 61G and 61H that connect the second support portion 60C2 and the third support portion 60C3 outside thereof are also simply located between the ends of the semicircular slit. Even if this simple lens support member 60C is used, a drive mechanism having leaf springs 64A and 65A around a rotation axis B17 passing through the elastic hinge portions 61E and 61F and a rotation axis B18 passing through the elastic hinge portions 61G and 61H. Thus, the lens 40A can be rotated.

  Next, another embodiment will be described with reference to FIGS. 10 to 11C. The adjusting device of this embodiment can be used in place of the adjusting device 8A of the lens 36A shown in FIG. FIG. 10 shows the lens support member 54C of the adjustment device of the present embodiment. In FIG. 10, the lens support member 54C is disposed with an annular first support portion 54C1 (first annular portion) that accommodates the lens 36A and a pair of slits E1 and E2 with respect to the first support portion 54C1. An annular second support portion 54C2, an annular third support portion 54C3 disposed with four slits E3, E4, E5, E6 spaced from the second support portion 54C2, and a third support portion 54C3. On the other hand, the four slits E7, E8, E9, E10 and the annular fourth support portion 54C4 (second annular portion) arranged with the two slits E11, E12 apart are integrated in the direction of the optical axis AX1. Are connected in a cylindrical shape. The fourth support portion 54C4 is fixed to the end surface 50c3 in the third lens barrel portion 50c of FIG. 5A using the connecting plate 58A.

  The pair of slits E1 and E2 is formed at an angle slightly smaller than 180 ° symmetrically around the optical axis AX1 so as to leave a linear hinge portion 75Cb and the like to be described later, and in the + X direction at the end portion. It is the shape which has the bending part bent. The four slits E3, E4, E5, E6 are formed at an angle slightly smaller than 90 ° around the optical axis AX1 so as to leave the linear hinge portions 75Ca, 75Ab and the like to be described later, and + X It is a shape which has the bending part bent in the direction. Further, the four slits E7, E8, E9, E10 are slightly less than 90 ° around the optical axis AX1 so as to leave areas in the vicinity of the linear hinge portion 75Aa and the like, which will be described later, and the linear hinge portion 75Ca. Are formed at a small angle, and have a bent portion bent at the end in the X direction. The slits E11 and E12 are formed in parallel with the linear hinge portion 75Ca and the like.

  A pair of elastic hinge portions 75A and 75B are formed symmetrically between the slits E3 and E4 and between the slits E5 and E6 so as to face each other along a straight line E13 parallel to the first direction R1, and between the slits E1 and E2 and A pair of elastic hinge portions 75C and 75D are formed symmetrically between the slits E6 and E3 so as to face each other along a straight line E14 parallel to the second direction R2 orthogonal to the first direction R1. As shown in FIG. 11 (A), the elastic hinge portion 75A is formed between the slits E3 and E4 and between the slits E7 and E8 and is parallel to each other, and the linear hinge portions 75Aa and 75Ab (parallel link portions) are thin. , And slit-like hinge portions 75Ac and 75Ad (first elastic hinge portions that perform point connection) formed between the slits E3 and E7 and between the slits E4 and E8, and the linear hinge portions 75Aa and 75Ab. The lever 56C1 of the first drive mechanism 56C is fixed to the tiltable portion 54C31 (a part of the third support portion 54C3) that can be tilted therebetween. The elastic hinge portion 75B facing the elastic hinge portion 75A also has a tiltable portion 54C32 so as to face the tiltable portion 54C31.

  Further, as shown in FIG. 11B, the elastic hinge portion 75C is formed between the slits E1 and E2 and between the slits E4 and E5, and the linear hinge portions 75Ca and 75Cb that are parallel to each other and have a small thickness. It has point-like hinge portions 75Cc and 75Cd (second elastic hinge portions for point connection) formed between E1 and E4 and between the slits E2 and E4 and inclined between the linear hinge portions 75Ca and 75Cb. The lever 57C1 of the second drive mechanism 57C is fixed to the possible tiltable portion 54C33 (a part of the third support portion 54C3). The elastic hinge portion 75D that faces the elastic hinge portion 75C also has a tiltable portion 54C34 that faces the tiltable portion 54C33. The drive mechanisms 56C and 57C include a micrometer 57C2 that pushes and pulls the distal ends of the levers 56C1 and 57C1 in the X direction, respectively. A micrometer (not shown) that pushes and pulls the tip of the lever 56C1 of the first drive mechanism 56C in the X direction is fixed to the outer surface of the third lens barrel 50c in FIG. On the other hand, a micrometer 57C2 that pushes and pulls the tip of the lever 57C1 of the second drive mechanism 57C in the X direction is, for example, a fourth support portion in the vicinity of the tiltable portion 54C33 as shown in FIG. A tension coil spring 57C3 is provided between the support portion of the micrometer 57C2 and the tip end portion of the lever 57C1. The micrometer 57C2 can also be operated outside the lens barrel portion 50c. By fixing the micrometer 57C2 to the fourth support portion 54C4 (lens support member 54C) in this way, the tilt angle of the tiltable portion 54C33 does not change when the lever 56C1 is driven by the first drive mechanism 56C.

  As shown in FIG. 11A, by pushing and pulling the lever 57C1 of the second drive mechanism in the direction of the optical axis AX1 (X direction), the linear hinge portions 75Ca and 75Cb in FIG. The tiltable portion 54C33 (and the tiltable portion 54C34 opposite to the tiltable portion) is tilted, and the point-like hinge portions 75Cc and 75Cd are bent so as to cancel the tilt angle, so that the third position as shown by the dotted line position D5 is obtained. The distal end portion of the second support portion 54C2 shifts in the lateral direction (second direction R2) with respect to the support portion 54C3, and the first support portion 54C1 (lens 36A) shifts by the same amount parallel to that direction. Similarly, as shown in FIG. 11B, by pushing and pulling the lever 56C1 of the first drive mechanism in the direction of the optical axis AX1 (X direction), the linear hinge portions 75Aa, The tiltable portion 54C31 between 75Ab (and the tiltable portion 54C32 opposite to the tiltable portion) is tilted, and the dotted hinge portions 75Ac and 75Ad are bent so as to cancel the tilt angle, as shown by a dotted line position D6. The distal end portion of the third support portion 54C3 is shifted in the lateral direction (first direction R1) with respect to the fourth support portion 54C4, and the second support portion 54C2 and the first support portion 54C1 (lens 36A) are moved in that direction. Shift by the same amount in parallel.

Thus, according to the adjusting device having the lens support member 54C and the drive mechanisms 56C and 57C of the present embodiment, the lens 36A is shifted in the first direction R1 by driving the lever 56C1, and the lens 36A is driven by driving the lever 57C1. Shifting in the second direction R2 can correct the decentration coma aberration of the optical system.
Note that, instead of the adjustment device for the lens 36A of the present embodiment, an adjustment device of a modification shown in FIGS. 12A and 12B may be used. FIG. 12A shows a lens support member 54D of the adjusting device. In FIG. 12A, the lens support member 54D includes an annular first support portion 54D1 (first annular portion) that houses the lens 36A, and 120 ° around the optical axis AX1 with respect to the first support portion 54D1. Of the annular second support portion 54C3 (second annular portion) disposed concentrically with three arc-shaped slits F1, F2, F3 formed at a slightly smaller angle, and the second support portion 54C3. The three tiltable portions 54D2A, 54D2B, and 54D2C having the same shape and disposed at 120 ° intervals are integrally connected to each other.

  The first tiltable portion 54D2A includes slits F1a and F2b extending in parallel in the radial direction from the vicinity of the ends of the slits F1 and F2, and two slits F4 and F5 formed substantially parallel to the circumferential direction of the optical axis AX1. The second support portion 54D2A and the first elastic hinge portion 76A are provided in the vicinity thereof. The elastic hinge portion 76A is formed between the slits F4 and F1a and between the slits F5 and F1a, and is thin with linear hinge portions 76Aa and 76Ab (first parallel link portions) that are parallel to each other and between the slits F4 and F2b. The linear hinge portions 76Ac and 76Ad (second parallel link portions) formed between F5 and F2b and parallel to each other and having a small thickness, and the thickness formed between the end of the slit F1 and the end of the slit F2. The lever 56D1 of the first drive mechanism 56D is fixed to the tiltable portion 54D2A between the slits F4 and F5. The point-like hinge portion 76Ae (first elastic hinge portion that performs point connection) is thin.

  Further, as shown in FIG. 12B, which is a cross-sectional view passing through the center of the tiltable portion 54D2A in FIG. 12A, the linear hinge portions 76Aa to 76Ad (second parallel link portions) are formed by the lens support member 54D. The point-like hinge portion 76Ae (point connection portion) is located on the + X direction side of the lens support member 54D, and is located on the −X direction side of the second parallel link portion and the point connection portion. Are different in position in the direction of the optical axis AX1.

  In FIG. 12A, the second tiltable portion 54D2B and a second elastic hinge portion 76B having two parallel link portions and one point connecting portion are provided in the vicinity of the second tiltable portion 54D2B. The lever 56E1 of the second drive mechanism 56E is fixed to D2B. Further, the third tiltable portion 54D2C and a third elastic hinge portion 76C having two parallel link portions and one point connecting portion in the vicinity thereof are also provided, and the third tiltable portion 54D2C includes a third tiltable portion 54D2C. The lever 56F1 of the drive mechanism 56F is fixed.

  In FIG. 12B, the outer peripheral portion of the second support portion 54D3 is fixed to the end surface of the lens barrel 77 of the optical system by bolts (not shown). The first drive mechanism 56D includes a micrometer 56D2 fixed to the outer surface of the lens barrel 77 in order to push and pull the tip of the lever 56D1 in the X direction, and a tip of the lever 56D1 and a support of the micrometer 56D2. And a tension coil spring 56D3 to be coupled. The other drive mechanisms 56E and 56F are configured similarly.

  By pushing and pulling the lever 56D1 in the X direction parallel to the optical axis AX1 by the micrometer 56D2, the linear hinge portions 76Ab and 76Ad are X with respect to the linear hinge portions 76Aa and 76Ac as indicated by a dotted line position D7. The second tiltable portion 54D2A tilts so as to move in the direction. At this time, since the other elastic hinge portions 76B and 76C do not move, the first support portion 54D1 (lens 36A) rotates (tilts) around the Y axis as indicated by a dotted line position D8. Also, the lever 56E1 of the second drive mechanism 56E in FIG. 12A is pushed in the + X direction, and the lever 56F1 of the third drive mechanism 56F is pulled in the −X direction, whereby the first support portion 54D1 (lens 36A). Rotates (tilts) around the Z axis. Further, the first support portion 54D1 (lens 36A) can be shifted in the X direction by pushing and pulling the three levers 56D1, 56E1, and 56F1 in the X direction by the same amount.

As described above, according to this modified example, by using the driving mechanisms 56D to 56F arranged at three equal angular intervals, the two axes (Y axis and Z axis) perpendicular to the first support portion 54D1 (lens 36A) are used. It is possible to correct the decentered coma aberration by adjusting the rotation angle around the lens, and to correct the focus state of the optical system by adjusting the position of the first support portion 54D1 (lens 36A) in the X direction.
In addition, a large number of liquid crystal displays as electronic devices (microdevices) are formed by forming predetermined patterns (circuit patterns, electrode patterns, etc.) on the plate PT using the exposure apparatus EX or the exposure method of the above embodiment. Alternatively, a liquid crystal display panel (liquid crystal display element) can be obtained. Hereinafter, an example of this manufacturing method will be described with reference to the flowchart of FIG.

  In step S401 (pattern formation process) in FIG. 13, first, a coating process for preparing a photosensitive substrate (plate PT) by applying a photoresist on a plate to be exposed, and a liquid crystal display panel using the above exposure apparatus. An exposure process for transferring and exposing a pattern of a mask (including mask M, for example) to a large number of pattern formation areas (partition areas) on the photosensitive substrate, and a developing process for developing the photosensitive substrate are performed. A predetermined resist pattern is formed on the plate by a lithography process including the coating process, the exposure process, and the development process. Following this lithography process, a predetermined pattern including a large number of electrodes and the like is formed on the plate through an etching process using the resist pattern as a mask, a resist stripping process, and the like. The lithography process or the like is executed a plurality of times according to the number of layers on the plate.

  In the next step S402 (color filter forming step), a large number of three fine filter sets corresponding to red R, green G, and blue B are arranged in a matrix, or red R, green G, and blue B are arranged. A color filter is formed by arranging a set of three stripe-shaped filters in the horizontal scanning line direction. In the next step S403 (cell assembly process), for example, liquid crystal is injected between the plate having the predetermined pattern obtained in step S401 and the color filter obtained in step S402, and a liquid crystal panel (liquid crystal cell) is obtained. ).

In subsequent step S404 (module assembling process), a liquid crystal display panel is mounted by attaching components such as an electric circuit and a backlight for causing a large number of liquid crystal panels (liquid crystal cells) thus assembled to perform a display operation. Complete as.
According to the above-described method for manufacturing a liquid crystal display panel (liquid crystal display element), the process of transferring the pattern of the mask M onto the substrate (plate PT) using the exposure apparatus or exposure method of the above embodiment (part of step S401). ) And a step of processing (developing, etching, etc.) the plate PT on which the pattern has been transferred in this step based on the pattern (the other part of step S401).

According to this manufacturing method, since the imaging characteristics of the projection system PS of the exposure apparatus EX can be maintained in a highly accurate state, the liquid crystal display panel can be manufactured efficiently and with high accuracy.
Note that the adjusting devices 8A to 8D for adjusting the lens of the above-described embodiment can also be applied to a projection optical system including only one imaging optical system. In this case, the illumination system IS can be composed of one optical system that illuminates one illumination area as a whole.

Although the exposure apparatus EX performs scanning exposure, a projection optical system having adjustment devices 8A to 8D and the like can also be used for a stepper type exposure apparatus.
In the above-described embodiment, an ultrahigh pressure mercury lamp is used as the light source, but the present invention is not limited to this, and other appropriate light sources can be used.
In addition, this invention is not limited to the above-mentioned embodiment, A various structure can be taken in the range which does not deviate from the summary of this invention.

  EX ... exposure device, M ... mask, PS ... projection system, PLA to PLG ... partial projection optical system, G1P ... first catadioptric system, G2P ... second catadioptric system, PT ... plate, 8A-8D ... adjuster, 26 ... Optical system frame, 36A, 36B ... Lens, 40A, 40B ... Lens, 50 ... Upper barrel, 52 ... Lower barrel, 54A, 54B ... Lens support member, 56A, 56B, 57A, 57B ... Drive mechanism, 60A , 60B ... Lens support member, 62A, 62B, 63A, 63B ... Drive mechanism

Claims (17)

In the device for adjusting the position of the optical member,
A first annular part having a support part for supporting the optical member;
A second annular portion different from the first annular portion;
A third annular portion different from the second annular portion;
A first elastic hinge portion connecting the first annular portion and the second annular portion at two positions in a first direction;
A second elastic hinge portion connecting the second annular portion and the third annular portion at two positions related to the second direction intersecting the first direction ;
The optical member position adjusting device according to claim 1, wherein the second elastic hinge portion is provided in a plane perpendicular to the optical axis of the optical member, on which the first elastic hinge portion is disposed .   The optical member position adjusting device according to claim 1, wherein the first annular portion, the second annular portion, and the third annular portion are integrally formed. A first drive section for rotating the first annular section about the first direction relative to the third annular section;
  The optical member position adjusting apparatus according to claim 1, further comprising: a second driving unit that rotates the second annular part around the second direction with respect to the third annular part. The third annular portion is fixed in the lens barrel,
The first drive unit includes a first lever portion having one end fixed to the first annular portion and the other end disposed outside the lens barrel through an opening provided in the lens barrel. A displacement part fixed to the lens barrel and displacing the other end of the first lever part,
The second drive unit includes one end fixed to the second annular part or the first annular part and the other end arranged outside the lens barrel through an opening provided in the lens barrel. the a second lever portion, any one of claims 1 to 3, characterized in that it comprises a displacement unit for displacing the other end of the fixed second lever portion to the barrel with An optical member position adjusting device according to claim 1. The said 1st annular part, the said 2nd annular part, and the said 3rd annular part are arranged along the optical axis of the said optical member, It is any one of Claims 1-4 characterized by the above-mentioned. The optical member position adjusting device as described. The first annular portion, the second annular portion, and the third annular portion are partitioned by a slit that communicates an outer surface and an inner surface of a cylindrical member,
The first elastic hinge portion is a portion sandwiched between two slits provided between the first annular portion and the second annular portion, and the second elastic hinge portion is the second annular portion. the optical member position adjusting apparatus according to any one of claims 1 to 5, characterized in that the portions of sandwiched by two slits provided between the third annular portion and an annular portion . Said first annular portion, said second annular portion, and the third annular section, any one of claims 1 to 4, characterized in that arranged concentrically around the optical axis of the optical member The optical member position adjusting device according to one item. The first annular portion, the second annular portion, and the third annular portion are partitioned by a plurality of slits that communicate one end surface and the other end surface of a cylindrical member,
The first elastic hinge portion is a portion sandwiched between two slits provided between the first annular portion and the second annular portion, and the second elastic hinge portion is the second annular portion. optical according to any one of claims 4 and 7 of claims 1 to be a portion sandwiched between the two slits provided and wherein between the annular portion third annulus Member position adjusting device. In the projection optical system for forming an image of the pattern on the first surface on the second surface,
A plurality of optical members arranged along the optical axis;
The optical member position adjusting device according to any one of claims 1 to 8 , for supporting an optical member to be adjusted among the plurality of optical members,
A lens barrel to which the third annular portion or the second annular portion of the optical member position adjusting device is fixed;
A projection optical system comprising: In the projection optical system for forming an image of the pattern on the first surface on the second surface,
A plurality of optical members arranged along the optical axis;
The first optical member position adjusting device according to claim 5 or 6 , for supporting a first optical member to be adjusted among the plurality of optical members,
The second optical member position adjusting device according to claim 7 or 8 , for supporting a second optical member to be adjusted among the plurality of optical members,
A lens barrel to which the third annular portion of the first and second optical member position adjusting devices is fixed;
A projection optical system comprising: In the projection optical system for forming an image of the pattern on the first surface on the second surface,
First and second catadioptric optical systems that are arranged in sequence between the first surface and the second surface and along the second surface to form intermediate images, respectively;
The first optical member position adjusting device according to claim 5 or 6 , for supporting the first optical member in the first catadioptric optical system,
The second optical member position adjusting device according to claim 7 or 8 , for supporting the second optical member in the first catadioptric optical system,
The third optical member position adjusting device according to claim 5 or 6 , for supporting a third optical member in the second catadioptric optical system,
The fourth optical member position adjusting device according to claim 7 or 8 , for supporting the fourth optical member in the second catadioptric optical system,
A lens barrel to which the third annular portion of the first to fourth optical member position adjusting devices is fixed;
A projection optical system comprising: In the projection optical system for forming an image of the pattern on the first surface on the second surface,
A projection optical system comprising a plurality of partial projection optical systems comprising the projection optical system according to any one of claims 9 to 11 . A method for adjusting a projection optical system,
The projection optical system is the projection optical system according to claim 10 ,
Adjusting the first optical member using the first optical member position adjusting device to perform rough adjustment of the imaging characteristics of the projection optical system;
A method for adjusting a projection optical system, wherein the second optical member is adjusted using the second optical member position adjusting device to finely adjust the imaging characteristics. A method for adjusting a projection optical system,
The projection optical system is a projection optical system according to claim 11 ,
Adjusting the second catadioptric optical system using the third and fourth optical member position adjusting devices when adjusting the projection optical system alone;
An adjustment method for a projection optical system, wherein the first catadioptric optical system is adjusted using the first and second optical member adjustment devices in a state where the projection optical system is incorporated in an exposure apparatus. . In an exposure apparatus that exposes a substrate through a mask pattern with exposure light,
A mask stage for moving the mask;
A projection optical system according to any one of claims 9 to 12 ,
An exposure apparatus comprising: a substrate stage that moves the substrate. 16. The exposure apparatus according to claim 15 , wherein the mask stage and the substrate stage are moved synchronously in the scanning direction with respect to the projection optical system. Exposing the photosensitive substrate using the exposure apparatus according to claim 15 or 16 , and
Processing the exposed photosensitive substrate.

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