JP5836395B2 - マルチパス光学装置 - Google Patents

マルチパス光学装置 Download PDF

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Publication number
JP5836395B2
JP5836395B2 JP2013547467A JP2013547467A JP5836395B2 JP 5836395 B2 JP5836395 B2 JP 5836395B2 JP 2013547467 A JP2013547467 A JP 2013547467A JP 2013547467 A JP2013547467 A JP 2013547467A JP 5836395 B2 JP5836395 B2 JP 5836395B2
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Japan
Prior art keywords
reflecting
reflective
concave
optical beam
reflection
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JP2013547467A
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English (en)
Japanese (ja)
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JP2014504744A5 (enExample
JP2014504744A (ja
Inventor
サンドストロム　リチャード　エル
リチャード エル サンドストロム
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ASML Netherlands BV
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ASML Netherlands BV
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Publication of JP2014504744A5 publication Critical patent/JP2014504744A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/004—Systems comprising a plurality of reflections between two or more surfaces, e.g. cells, resonators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1824—Manual alignment
    • G02B7/1825—Manual alignment made by screws, e.g. for laser mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
    • H01S3/076—Folded-path lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013547467A 2010-12-29 2011-10-25 マルチパス光学装置 Active JP5836395B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/980,939 US8810902B2 (en) 2010-12-29 2010-12-29 Multi-pass optical apparatus
US12/980,939 2010-12-29
PCT/US2011/057717 WO2012091786A1 (en) 2010-12-29 2011-10-25 Multi-pass optical apparatus

Publications (3)

Publication Number Publication Date
JP2014504744A JP2014504744A (ja) 2014-02-24
JP2014504744A5 JP2014504744A5 (enExample) 2014-12-18
JP5836395B2 true JP5836395B2 (ja) 2015-12-24

Family

ID=46380543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013547467A Active JP5836395B2 (ja) 2010-12-29 2011-10-25 マルチパス光学装置

Country Status (6)

Country Link
US (1) US8810902B2 (enExample)
EP (1) EP2659297A4 (enExample)
JP (1) JP5836395B2 (enExample)
KR (1) KR101873951B1 (enExample)
TW (1) TWI497108B (enExample)
WO (1) WO2012091786A1 (enExample)

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US9151940B2 (en) * 2012-12-05 2015-10-06 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9380691B2 (en) 2014-02-28 2016-06-28 Asml Netherlands B.V. Adaptive laser system for an extreme ultraviolet light source
US9525265B2 (en) 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
WO2016026523A1 (de) * 2014-08-20 2016-02-25 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Verfahren zum verlängern eines laufwegs eines lichtstrahls, optische verzögerungseinrichtung und treiberlaseranordnung damit
CN105445196A (zh) * 2014-12-17 2016-03-30 邓文平 样品测量池
US10887974B2 (en) 2015-06-22 2021-01-05 Kla Corporation High efficiency laser-sustained plasma light source
TWI739755B (zh) * 2015-08-12 2021-09-21 荷蘭商Ａｓｍｌ荷蘭公司 極紫外線光源中之目標擴張率控制
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
GB201812766D0 (en) * 2018-08-06 2018-09-19 Res & Innovation Uk Optical multi-pass cells
WO2021170815A1 (de) 2020-02-26 2021-09-02 Trumpf Scientific Lasers Gmbh + Co. Kg Optisches system zur kontrasterhöhung von gepulster laser-strahlung, lasersystem und verfahren zur kontrasterhöhung von gepulster laserstrahlung
DE102020204808A1 (de) * 2020-04-16 2021-10-21 Trumpf Laser Gmbh Vorrichtung zur spektralen Verbreiterung von Laserpulsen
FR3137189B1 (fr) * 2022-06-27 2025-03-14 Cailabs Cavite multi passage d’un dispositif optique de manipulation spatiale d’un rayonnement lumineux

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US3895313A (en) * 1973-09-17 1975-07-15 Entropy Conversion Laser systems with diamond optical elements
FR2296288A1 (fr) * 1974-12-23 1976-07-23 Commissariat Energie Atomique Dispositif d'amplification d'impulsions laser
US3942127A (en) * 1975-04-11 1976-03-02 The United States Of America As Represented By The Secretary Of The Navy Aspheric cassegrain laser power amplifier system
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Also Published As

Publication number Publication date
EP2659297A4 (en) 2017-10-25
US8810902B2 (en) 2014-08-19
TWI497108B (zh) 2015-08-21
WO2012091786A1 (en) 2012-07-05
JP2014504744A (ja) 2014-02-24
US20120170112A1 (en) 2012-07-05
EP2659297A1 (en) 2013-11-06
KR20140006821A (ko) 2014-01-16
KR101873951B1 (ko) 2018-07-03
TW201226967A (en) 2012-07-01

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