KR101873951B1 - 멀티패스 광학 장치 - Google Patents

멀티패스 광학 장치 Download PDF

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Publication number
KR101873951B1
KR101873951B1 KR1020137017020A KR20137017020A KR101873951B1 KR 101873951 B1 KR101873951 B1 KR 101873951B1 KR 1020137017020 A KR1020137017020 A KR 1020137017020A KR 20137017020 A KR20137017020 A KR 20137017020A KR 101873951 B1 KR101873951 B1 KR 101873951B1
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KR
South Korea
Prior art keywords
reflective surfaces
concave
reflective
light beam
reflection
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English (en)
Korean (ko)
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KR20140006821A (ko
Inventor
리차드 엘. 샌드스트롬
Original Assignee
에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/004—Systems comprising a plurality of reflections between two or more surfaces, e.g. cells, resonators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1824—Manual alignment
    • G02B7/1825—Manual alignment made by screws, e.g. for laser mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
    • H01S3/076—Folded-path lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020137017020A 2010-12-29 2011-10-25 멀티패스 광학 장치 Active KR101873951B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/980,939 2010-12-29
US12/980,939 US8810902B2 (en) 2010-12-29 2010-12-29 Multi-pass optical apparatus
PCT/US2011/057717 WO2012091786A1 (en) 2010-12-29 2011-10-25 Multi-pass optical apparatus

Publications (2)

Publication Number Publication Date
KR20140006821A KR20140006821A (ko) 2014-01-16
KR101873951B1 true KR101873951B1 (ko) 2018-07-03

Family

ID=46380543

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137017020A Active KR101873951B1 (ko) 2010-12-29 2011-10-25 멀티패스 광학 장치

Country Status (6)

Country Link
US (1) US8810902B2 (enExample)
EP (1) EP2659297A4 (enExample)
JP (1) JP5836395B2 (enExample)
KR (1) KR101873951B1 (enExample)
TW (1) TWI497108B (enExample)
WO (1) WO2012091786A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9793673B2 (en) 2011-06-13 2017-10-17 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9151940B2 (en) * 2012-12-05 2015-10-06 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9380691B2 (en) 2014-02-28 2016-06-28 Asml Netherlands B.V. Adaptive laser system for an extreme ultraviolet light source
US9525265B2 (en) 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
WO2016026523A1 (de) * 2014-08-20 2016-02-25 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Verfahren zum verlängern eines laufwegs eines lichtstrahls, optische verzögerungseinrichtung und treiberlaseranordnung damit
CN105445196A (zh) * 2014-12-17 2016-03-30 邓文平 样品测量池
US10887974B2 (en) 2015-06-22 2021-01-05 Kla Corporation High efficiency laser-sustained plasma light source
TWI739755B (zh) * 2015-08-12 2021-09-21 荷蘭商Ａｓｍｌ荷蘭公司 極紫外線光源中之目標擴張率控制
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
GB201812766D0 (en) * 2018-08-06 2018-09-19 Res & Innovation Uk Optical multi-pass cells
WO2021170814A1 (de) 2020-02-26 2021-09-02 Trumpf Scientific Lasers Gmbh + Co. Kg Lasersystem mit optischem system zur spektralen verbreiterung von gepulster laserstrahlung und verfahren zur spektralen verbreiterung von gepulster laserstrahlung
DE102020204808A1 (de) * 2020-04-16 2021-10-21 Trumpf Laser Gmbh Vorrichtung zur spektralen Verbreiterung von Laserpulsen
FR3137189B1 (fr) * 2022-06-27 2025-03-14 Cailabs Cavite multi passage d’un dispositif optique de manipulation spatiale d’un rayonnement lumineux

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006337861A (ja) * 2005-06-03 2006-12-14 Nippon Telegr & Teleph Corp <Ntt> 光可変遅延器
JP2007052428A (ja) * 2005-08-15 2007-03-01 Asml Netherlands Bv ビーム修正装置

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3436665A (en) * 1965-05-28 1969-04-01 Bell Telephone Labor Inc Multiple pass optical cell for laser amplifier
US3625585A (en) * 1968-08-05 1971-12-07 Columbia Broadcasting Systems Periodic scan magnification for laser beam deflection
US3895313A (en) * 1973-09-17 1975-07-15 Entropy Conversion Laser systems with diamond optical elements
FR2296288A1 (fr) * 1974-12-23 1976-07-23 Commissariat Energie Atomique Dispositif d'amplification d'impulsions laser
US3942127A (en) * 1975-04-11 1976-03-02 The United States Of America As Represented By The Secretary Of The Navy Aspheric cassegrain laser power amplifier system
US4156852A (en) * 1978-01-11 1979-05-29 The United States Of America As Represented By The United States Department Of Energy Multipass laser amplification with near-field far-field optical separation
US4345212A (en) * 1980-11-10 1982-08-17 The United States Of America As Represented By The United States Department Of Energy Efficient optical pulse stacker system
US4734911A (en) * 1986-03-14 1988-03-29 Hughes Aircraft Company Efficient phase conjugate laser
DE8816615U1 (de) * 1988-04-26 1990-03-01 W.C. Heraeus Gmbh, 6450 Hanau Laser mit einem Multipass-Resonator
US4982166A (en) * 1989-03-01 1991-01-01 Morrow Clifford E Method and apparatus for combining two lower power laser beams to produce a combined higher power beam
US5309456A (en) 1992-10-30 1994-05-03 The United States Of America As Represented By The United States Department Of Energy Pulse stretcher
US5615043A (en) * 1993-05-07 1997-03-25 Lightwave Electronics Co. Multi-pass light amplifier
US5440143A (en) 1994-02-25 1995-08-08 On-Line Technologies, Inc. Folded-path optical analysis gas cell
US5751472A (en) 1996-02-08 1998-05-12 Massachusetts Institute Of Technology Multi-pass optical parametric generator
US5867329A (en) * 1996-05-31 1999-02-02 The United States Of America As Represented By The Secretary Of The Navy Multiple-pass reflection filter
JP2002040627A (ja) * 2000-07-24 2002-02-06 Nec Corp レーザパターン修正方法並びに修正装置
US7897947B2 (en) 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7405416B2 (en) 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7916388B2 (en) 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US6928093B2 (en) 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US20060255298A1 (en) 2005-02-25 2006-11-16 Cymer, Inc. Laser produced plasma EUV light source with pre-pulse
JP2003060274A (ja) * 2001-08-16 2003-02-28 Sumitomo Heavy Ind Ltd 炭酸ガスレーザの出力増加方法及び光遅延装置
US7006283B2 (en) * 2002-01-15 2006-02-28 Jds Uniphase Corporation Three-dimensional optical amplifier structure
US7187820B1 (en) 2003-11-12 2007-03-06 Wavefront Research, Inc. Optical time delay system
US7087914B2 (en) 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7164144B2 (en) 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7307716B2 (en) 2004-07-21 2007-12-11 Southwest Sciences Incorporated Near re-entrant dense pattern optical multipass cell
US7477377B2 (en) 2004-07-21 2009-01-13 Southwest Sciences Incorporated Dense pattern optical multipass cell
US7440478B2 (en) * 2004-09-13 2008-10-21 Mitsubishi Electric Corporation Laser beam path length difference detector, laser phase controller, and coherent optical coupler
AT414285B (de) * 2004-09-28 2006-11-15 Femtolasers Produktions Gmbh Mehrfachreflexions-verzögerungsstrecke für einen laserstrahl sowie resonator bzw. kurzpuls-laservorrichtung mit einer solchen verzögerungsstrecke
JP2006127963A (ja) * 2004-10-29 2006-05-18 Hitachi Ltd 配光制御デバイス
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US8018981B2 (en) 2006-04-12 2011-09-13 Li-Cor, Inc. Multi-pass optical cell with actuator for actuating a reflective surface
DE102007014518B3 (de) 2007-03-27 2008-11-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Photoakustische Multipass-Zelle mit konzentrierenden Reflexionsmitteln
TWM337917U (en) * 2008-03-13 2008-08-01 Young Optics Inc Laser module
US7872245B2 (en) 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
JP2010034345A (ja) * 2008-07-30 2010-02-12 Omron Corp 固体レーザ装置
JP5474576B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 レーザ光増幅器及びそれを用いたレーザ装置
JP5376366B2 (ja) * 2009-05-18 2013-12-25 独立行政法人理化学研究所 電磁波発生装置および電磁波発生方法
CN101872062B (zh) * 2010-06-02 2012-07-25 清华大学 一种采用复用结构的反射池

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006337861A (ja) * 2005-06-03 2006-12-14 Nippon Telegr & Teleph Corp <Ntt> 光可変遅延器
JP2007052428A (ja) * 2005-08-15 2007-03-01 Asml Netherlands Bv ビーム修正装置

Also Published As

Publication number Publication date
JP2014504744A (ja) 2014-02-24
TWI497108B (zh) 2015-08-21
EP2659297A4 (en) 2017-10-25
US20120170112A1 (en) 2012-07-05
JP5836395B2 (ja) 2015-12-24
US8810902B2 (en) 2014-08-19
KR20140006821A (ko) 2014-01-16
WO2012091786A1 (en) 2012-07-05
TW201226967A (en) 2012-07-01
EP2659297A1 (en) 2013-11-06

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