JP5799592B2 - Optical waveguide, opto-electric hybrid board, and electronic equipment - Google Patents

Description

  The present invention relates to an optical waveguide, an opto-electric hybrid board, and an electronic device.

  In recent years, with the wave of computerization, wideband lines (broadband) capable of communicating a large amount of information at high speed have been spreading. Also, as devices for transmitting information to these broadband lines, transmission devices such as router devices and WDM (Wavelength Division Multiplexing) devices are used. In these transmission apparatuses, a large number of signal processing boards in which arithmetic elements such as LSIs and storage elements such as memories are combined are installed, and each line is interconnected.

  Each signal processing board has a circuit in which arithmetic elements, storage elements, etc. are connected by electrical wiring. However, with the increase in the amount of information to be processed in recent years, each board has a very high throughput. It is required to transmit. However, with the speeding up of information transmission, problems such as generation of crosstalk and high frequency noise and deterioration of electric signals are becoming apparent. For this reason, electrical wiring becomes a bottleneck, making it difficult to improve the throughput of the signal processing board. Similar problems are also becoming apparent in supercomputers and large-scale servers.

  On the other hand, an optical communication technique for transferring data using an optical carrier wave has been developed, and in recent years, an optical waveguide is becoming popular as a means for guiding the optical carrier wave from one point to another point. This optical waveguide has a linear core part and a clad part provided so as to cover the periphery thereof. The core part is made of a material that is substantially transparent to the light of the optical carrier wave, and the cladding part is made of a material having a refractive index lower than that of the core part.

  In the optical waveguide, light introduced from one end of the core portion is conveyed to the other end while being reflected at the boundary with the cladding portion. A light emitting element such as a semiconductor laser is disposed on the incident side of the optical waveguide, and a light receiving element such as a photodiode is disposed on the emission side. Light incident from the light emitting element propagates through the optical waveguide, is received by the light receiving element, and performs communication based on the flickering pattern of the received light or its intensity pattern.

  If the electrical wiring in the signal processing board is replaced by such an optical waveguide, it is expected that the problem of the electrical wiring as described above will be solved and the signal processing board can be further increased in throughput.

  By the way, when the electric wiring is replaced with an optical waveguide, an optical waveguide module that includes a light emitting element and a light receiving element and optically connects the light emitting element and the light receiving element is used.

  For example, Patent Document 1 discloses an optical interface having a printed circuit board, a light emitting element mounted on the printed circuit board, and an optical waveguide provided on the lower surface side of the printed circuit board. The optical waveguide and the light emitting element are optically connected through a through hole, which is a through hole for transmitting an optical signal, formed on the printed board. Further, mirrors for converting the optical path of the optical waveguide are formed at both ends of the optical waveguide.

  However, the optical interface as described above has a problem that the optical coupling loss is large in the optical coupling between the light emitting element and the optical waveguide or in the optical coupling between the light receiving element and the optical waveguide. Specifically, when the signal light emitted from the light emitting portion of the light emitting element passes through the through hole and enters the optical waveguide, the signal light radiates radially, so that all the signal light is incident on the mirror. I can't. Similarly, when the signal light propagating through the optical waveguide and reflected by the mirror passes through the through hole and enters the light receiving element, it is not possible to make all the signal light enter the light receiving element. For this reason, a part of the signal light does not contribute to the optical communication, resulting in an increase in optical coupling loss.

JP 2005-294407 A

  An object of the present invention is to provide an optical waveguide having high optical coupling efficiency with a light emitting / receiving element and capable of high-quality optical communication, and a highly reliable opto-electric hybrid board and electronic device including the optical waveguide. There is.

Such an object is achieved by the present inventions (1) to (10) below.
(1) the core part;
An end surface cladding portion provided on an extension line in the extending direction of the core portion, and having a lower refractive index than the core portion;
A low refractive index layer provided between the core portion and the end surface clad portion on the extension line in the extending direction of the core portion, and having a lower refractive index than the end surface clad portion;
It is provided in the end surface clad part, and is constituted by an interface where a constituent material of the end face clad part and a material having a lower refractive index are adjacent to each other, and the optical path of the core part is directed to the outside of the core part by light reflection. A light reflecting surface to convert ;
Have,
The low refractive index layer has a thickness of 1 to 20 μm,
An optical waveguide , wherein a difference in refractive index between the low refractive index layer and the end surface clad portion is 0.003 to 0.03 .

  (2) The optical waveguide according to (1), wherein the extending direction of the low refractive index layer is an angle of 80 to 100 degrees with respect to the extending direction of the core portion.

  (3) The optical waveguide according to (1) or (2), wherein the light reflecting surface is provided such that an edge thereof is positioned in the vicinity of the low refractive index layer.

  (4) The optical waveguide according to any one of (1) to (3), wherein the core portion includes two or more low refractive index layers.

(5) When the direction orthogonal to the extending direction of the core portion is the width direction, and the length in the width direction of the light reflecting surface is the width of the light reflecting surface,
5. The optical waveguide according to any one of (1) to (4) , wherein a width of the light reflecting surface is wider than a width of the core portion .

(6) The optical waveguide according to any one of (1) to (5), wherein the low refractive index layer is configured such that a change in refractive index in the thickness direction is continuous .

(7) a core layer comprising: the core part; a side clad part adjacent to a side face of the core part; and the end face clad part;
A clad layer laminated on at least one surface of the core layer and having a refractive index lower than that of the core portion;
The optical waveguide according to any one of (1) to (6), wherein the interface is provided so as to penetrate the cladding layer and the end surface cladding portion.

(8) The optical waveguide according to (7), wherein the end surface clad portion and the side surface clad portion are made of materials having the same composition.

(9) An opto-electric hybrid board comprising the optical waveguide according to any one of (1) to (8).
(10) An electronic apparatus comprising the opto-electric hybrid board according to (9).

  According to the present invention, by providing a low refractive index layer having a lower refractive index than the core portion so as to cross the optical path of the core portion in the vicinity of the light reflecting surface, the optical coupling efficiency with the light emitting / receiving element can be increased. An optical waveguide capable of high-quality optical communication can be obtained.

  In addition, an end surface cladding portion having a lower refractive index than that of the core portion is provided on the extension line of the core portion, and the light reflecting surface is formed by processing the recess in the end surface cladding portion. Since the characteristics (for example, the processing rate) can be made uniform, the dimensional accuracy of the processed surface is improved, and a light reflecting surface with high surface accuracy and high optical performance can be obtained. As a result, the optical coupling efficiency between the optical waveguide and the light emitting / receiving element can be further increased.

  Further, according to the present invention, by providing such an optical waveguide, the S / N ratio of optical communication can be increased, and thus a highly reliable opto-electric hybrid board and electronic device can be obtained.

1 is an exploded perspective view showing a first embodiment of an optical waveguide of the present invention and an optical waveguide module including the optical waveguide module (partially shown). FIG. It is the YY sectional view taken on the line of FIG. FIG. 3 is a partially enlarged view of FIG. 2. FIG. 3 is a partially enlarged view of FIG. 2. It is a top view of the core layer of the optical waveguide shown in FIG. It is a disassembled perspective view which shows 2nd Embodiment of the optical waveguide of this invention, and an optical waveguide module containing the same (it shows partially transmitting). It is sectional drawing which shows 3rd Embodiment of the optical waveguide of this invention, and an optical waveguide module containing this. It is a top view of the core layer 132 of the optical waveguide shown in FIG. It is a figure (sectional drawing) for demonstrating the method of manufacturing the optical waveguide shown in FIG. It is a figure (sectional drawing) for demonstrating the method of manufacturing the optical waveguide shown in FIG. It is a figure (sectional drawing) for demonstrating the method of manufacturing the optical waveguide shown in FIG. It is a figure (sectional drawing) for demonstrating the method of manufacturing the optical waveguide shown in FIG. It is a figure for demonstrating a mode that a refractive index difference arises between an irradiation area | region and a non-irradiation area | region, taking the position of the cross section of a layer on a horizontal axis, and refraction when taking the refractive index of a cross section on a vertical axis | shaft. It is a figure which shows rate distribution. It is sectional drawing which shows the optical waveguide obtained by the comparative example.

  Hereinafter, the optical waveguide, the opto-electric hybrid board and the electronic apparatus of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.

<Optical waveguide and optical waveguide module>
<< First Embodiment >>
First, the first embodiment of the optical waveguide of the present invention and the optical waveguide module (the opto-electric hybrid board of the present invention) including the same will be described.

  FIG. 1 is an exploded perspective view showing a first embodiment of an optical waveguide of the present invention and an optical waveguide module including the optical waveguide, and FIG. 2 is a sectional view taken along line YY of FIG. 3 and 4 are partially enlarged views of FIG. 2, respectively. FIG. 5 is a plan view of a core layer in the optical waveguide shown in FIG. In the following description, the upper side of FIGS. 1 to 4 is referred to as “upper” and the lower side is referred to as “lower”. Moreover, in FIGS. 2-4, in order to avoid that a figure becomes complicated, illustration of a support film and a cover film is abbreviate | omitted. In each figure, the vertical direction of the optical waveguide is emphasized.

  An optical waveguide 1 shown in FIG. 1 functions as an optical wiring that transmits signal light from one end to the other end. Here, as an example, signal light from the light incident end 1A shown in FIG. Will be described, and signal light is emitted from the light emitting end 1B.

  An optical waveguide 1 shown in FIG. 1 is formed by laminating a clad layer 111, a core layer 13, and a clad layer 112 in this order from the lower side, and has an elongated strip shape.

  As shown in FIGS. 1 and 2, two core portions 14 extending in parallel from the light incident end portion 1 </ b> A to the light emitting end portion 1 </ b> B are formed in the core layer 13. Of the core layer 13, the part other than the core part 14 is a side clad part 15 a or an end clad part 15 b. Specifically, the core portion 14 is disposed at the center of the width of the core layer 13 and extends along the longitudinal direction of the optical waveguide 1. Further, side clad portions 15 a are respectively disposed on both side surfaces of the core portion 14. Further, end face clad portions 15b are disposed at both ends of the core layer 13, that is, at the light incident end 1A and the light exit end 1B. That is, the end surface clad portion 15 b is disposed on the extension line on both ends of the core portion 14 in the core layer 13. Note that dots are given to each core portion 14 shown in some drawings.

  In such an optical waveguide 1, a mirror (light reflecting surface) 161 is provided in the end surface clad portion 15b provided in the light incident end portion 1A, and a mirror is provided in the end surface clad portion 15b provided in the light emitting end portion 1B. (Light reflection surface) 162 is provided for each core portion 14. These mirrors 161 and 162 convert the optical path of the optical waveguide 1 extending in the left-right direction in FIG. 2 to the outside of the optical waveguide 1. In FIG. 2, the optical waveguide 1 is at the light incident end 1A. The optical path is converted upward by 90 ° so that the optical path is optically connected to the light emitting portion 711 of the light emitting element 71. Similarly, the optical path is converted upward by 90 ° so that the optical path of the optical waveguide 1 is optically connected to the light receiving part 721 of the light receiving element 72 at the light emitting end 1B. Through such mirrors 161 and 162, the signal light emitted from the light emitting element 71 is incident on the core portion 14 of the optical waveguide 1, and the signal light propagated through the core portion 14 is incident on the light receiving element 72. be able to. As a result, optical communication is possible between the light emitting element 71 and the light receiving element 72.

  Here, between the core part 14 and the end surface clad part 15b, as shown to FIGS. 3-5, it is comprised with the material whose refractive index is lower than the end surface clad part 15b, and the extension line of the axis line of the core part 14 is used. A thin layered portion is provided so as to cross. This portion is referred to as a low refractive index layer 145. That is, the low refractive index layer 145 is provided adjacent to both end faces of the core portion 14, and the core portion 14 and the end surface clad portion 15 b are separated by the low refractive index layer 145.

  Such a low-refractive index layer 145 acts to return the signal light that would otherwise have been lost to the optical path by reflecting the signal light with the end-face cladding portion 15b. Therefore, by providing the low refractive index layer 145, for example, the incident efficiency of the signal light that is emitted from the light emitting element 71 and incident on the mirror 161 is increased, and the signal light that is emitted from the mirror 162 and incident on the light receiving element 72 is increased. Incident efficiency can be increased. That is, the optical coupling efficiency between the optical waveguide 1 and the light emitting / receiving element can be increased. Further, when the improvement in optical coupling efficiency is sacrificed to some extent, the allowable range of mutual alignment accuracy and surface accuracy of the mirrors 161 and 162 can be relaxed accordingly. For this reason, the mirrors 161 and 162 can be easily formed, and the optical waveguide 1 can be manufactured at low cost.

Hereinafter, each part of the optical waveguide 1 and the optical waveguide module 10 will be described in detail.
(Core layer)
As described above, the core layer 13 includes the two core portions 14, the side clad portion 15a, and the end face clad portion 15b. Of these, the core portion 14 is an elongated portion provided in the central portion of the width of the core layer 13 along the extending direction of the core layer 13, and the side cladding portions 15 a are adjacent to both side surfaces of the core portion 14. The end clad portion 15b is a portion provided adjacent to both end faces of the core portion 14 with the low refractive index layer 145 interposed therebetween.

  In the optical waveguide 1 shown in FIG. 2, the signal light incident through the mirror 161 is totally reflected at the interface between the core part 14 and the cladding part (the cladding layers 111 and 112 and the side cladding parts 15a), Can be propagated to the end of the.

  In order to cause total reflection at the interface between the core part 14 and the clad part, a difference in refractive index needs to exist at the interface. Although the refractive index of the core part 14 should just be larger than the refractive index of a clad part, and the difference is not specifically limited, It is preferable that it is 0.5% or more of the refractive index of a clad part, and it is 0.8% or more. Is more preferable. On the other hand, the upper limit value may not be set, but is preferably about 5.5%. If the difference in refractive index is less than the lower limit, the effect of transmitting light may be reduced, and even if the upper limit is exceeded, no further increase in light transmission efficiency can be expected.

The difference in refractive index is expressed by the following equation, where A is the refractive index of the core portion 14 and B is the refractive index of the cladding portion.
Refractive index difference (%) = | A / B-1 | × 100

  Moreover, in the structure shown in FIG. 1, although the core part 14 is formed in linear form by planar view, you may be curving, branching, etc. in the middle, The shape is arbitrary.

  The cross-sectional shape of the core portion 14 is generally a square such as a square or a rectangle (rectangle), but is not particularly limited, and is not limited to a circle, such as a perfect circle or an ellipse, a rhombus, a triangle, or a pentagon. A polygon such as

  The width and height of the core portion 14 are not particularly limited, but are preferably about 1 to 200 μm, more preferably about 5 to 100 μm, and still more preferably about 20 to 70 μm.

  On the other hand, the refractive index of the end surface cladding portion 15b is not particularly limited as long as it is lower than the refractive index of the core portion 14, but is preferably equal to the refractive index of the side surface cladding portion 15a. That is, it is preferable that the side surface clad part 15a and the end surface clad part 15b are comprised with the material of the same composition. Thereby, when forming the core part 14 and the side surface clad part 15a in the core layer 13, the end surface clad part 15b can also be formed, without increasing an extra process.

  The magnitude relationship between the refractive index of the core portion 14 and the refractive index of the end surface cladding portion 15b is set to be equal to the above-described magnitude relationship between the refractive index of the core portion 14 and the refractive index of the cladding portion.

  As the constituent material (main material) of the core layer 13, acrylic resin, methacrylic resin, polycarbonate, polystyrene, epoxy resin, polyamide, polyimide, polybenzoxazole, polysilane, polysilazane, silicone resin, fluorine resin, polyurethane, In addition to various resin materials such as cyclic olefin resins such as benzocyclobutene resins and norbornene resins, glass materials such as quartz glass and borosilicate glass can be used. The resin material may be a composite material obtained by combining materials having different compositions, and may contain an unpolymerized monomer. In the core layer 13, although the main material is the same, the difference in refractive index between the core portion 14, the side cladding portion 15a and the end surface cladding portion 15b is caused by the difference in the molecular structure of the material, the concentration of the additive, and the like. It is expressed.

  Of these, norbornene resins are particularly preferable. Norbornene-based resins include, for example, ring-opening metathesis polymerization (ROMP), combination of ROMP and hydrogenation reaction, polymerization by radical or cation, polymerization using a cationic palladium polymerization initiator, and other polymerization initiators (for example, It can be obtained by all known polymerization methods such as polymerization using nickel or other transition metal polymerization initiators).

(Clad layer)
The clad layers 111 and 112 are located above and below the core layer 13.

  The average thickness of the clad layers 111 and 112 is preferably about 0.1 to 1.5 times the average thickness of the core layer 13 (average height of each core portion 14). More preferably, the average thickness of the cladding layers 111 and 112 is not particularly limited, but it is usually preferably about 1 to 200 μm, and about 3 to 100 μm. More preferably, it is about 5 to 60 μm. Thereby, the function as a clad layer is suitably exhibited while preventing the optical waveguide 1 from becoming unnecessarily large (thickened).

  Moreover, as a constituent material of each cladding layer 111,112, the material similar to the constituent material of the core layer 13 mentioned above can be used, for example, but norbornene-type resin is especially preferable.

  Further, when selecting the constituent material of the core layer 13 and the constituent materials of the cladding layers 111 and 112, the material may be selected in consideration of the difference in refractive index between the two. Specifically, in order to surely totally reflect light at the boundary between the core layer 13 and the cladding layers 111 and 112, the refractive index of the constituent material of the core layer 13 is compared with the refractive index of the constituent material of the cladding layers 111 and 112. What is necessary is just to select a material so that it may become large enough. Thereby, a sufficient refractive index difference is obtained in the thickness direction of the optical waveguide 1, and light can be prevented from leaking from the core portion 14 to the cladding layers 111 and 112.

  From the viewpoint of suppressing light attenuation, it is also important that the adhesiveness (affinity) between the constituent material of the core layer 13 and the constituent materials of the cladding layers 111 and 112 is high.

(Support film)
A support film 2 as shown in FIG. 1 may be laminated on the lower surface of the optical waveguide 1 as necessary.

  The support film 2 supports the lower surface of the optical waveguide 1 to protect and reinforce it. Thereby, the reliability and mechanical characteristics of the optical waveguide 1 can be improved.

  Examples of the constituent material of the support film 2 include various resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide, and metal materials such as copper, aluminum and silver. It is done. In the case of a metal material, a metal foil is used as the support film 2.

  Moreover, although the average thickness of the support film 2 is not specifically limited, It is preferable that it is about 5-200 micrometers, and it is more preferable that it is about 10-100 micrometers. Thereby, since the support film 2 has moderate rigidity, while supporting the optical waveguide 1 reliably, it becomes difficult to inhibit the softness | flexibility of the optical waveguide 1. FIG.

  The support film 2 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure sensitive adhesive, and the like.

  Among these, as an adhesive layer, various hot-melt-adhesives (polyester type | system | group, modified olefin type | system | group) etc. are mentioned other than an acrylic adhesive, a urethane type adhesive agent, a silicone type adhesive agent, for example. Moreover, as a thing with especially high heat resistance, thermoplastic polyimide adhesive agents, such as a polyimide, a polyimide amide, a polyimide amide ether, a polyester imide, a polyimide ether, are used preferably. Since the adhesive layer made of such a material is relatively flexible, even if the shape of the optical waveguide 1 changes, the change can be freely followed. As a result, it is possible to reliably prevent peeling due to the shape change.

  The average thickness of such an adhesive layer is not particularly limited, but is preferably about 1 to 100 μm, and more preferably about 5 to 60 μm.

(Cover film)
On the other hand, you may make it laminate | stack the cover film 3 as shown in FIG. 1 on the upper surface of the optical waveguide 1 as needed.

  The cover film 3 protects the optical waveguide 1 and supports the optical waveguide 1 from above. Thereby, the optical waveguide 1 is protected from dirt and scratches, and the reliability and mechanical characteristics of the optical waveguide 1 can be improved.

  As a constituent material of such a cover film 3, it is the same as the constituent material of the support film 2. For example, in addition to various resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide, Metal materials, such as copper, aluminum, silver, are mentioned. In the case of a metal material, a metal foil is used as the cover film 3. Further, when the optical path is set so as to penetrate the cover film 3, the constituent material of the cover film 3 is preferably substantially transparent.

  Moreover, although the average thickness of the cover film 3 is not specifically limited, It is preferable that it is about 3-50 micrometers, and it is more preferable that it is about 5-30 micrometers. By setting the thickness of the cover film 3 within the above range, the cover film 3 has sufficient light transmittance in optical communication, and has sufficient rigidity to reliably protect the optical waveguide 1.

  Note that the cover film 3 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure sensitive adhesive, and the like. Of these, the adhesive described above can be used.

(mirror)
Mirrors (light reflecting surfaces) 161 and 162 shown in FIG. 2 are formed in the end surface clad portion 15b of the optical waveguide 1 and in the corresponding clad layer 11 at positions corresponding thereto, and concave portions (spaces) obtained thereby are obtained. It is comprised by a part of 160 inner wall surface. A part of the inner wall surface includes a plane formed so as to cross the core portion 14 at an angle of 45 ° with respect to the optical path, and these planes become the mirrors 161 and 162. In FIG. 2, the digging process is performed only on the cladding layer 111 and the core layer 13, but it may be performed over the cladding layer 112. Although omitted in FIG. 2, the support film 2 and the cover film 3 may also be applied.

In addition, you may make it form a reflective film in the mirrors 161 and 162 as needed. As the reflective film, a metal film such as Au, Ag, or Al is preferably used.
In addition, the shape of the recess is not particularly limited as long as the shape includes the mirrors 161 and 162.

  The shape of the concave portion 160 shown in FIG. 2 is a shape that includes an extension line of the core portion 14 and that is cut along a surface orthogonal to the upper surface of the optical waveguide 1 so that the cut surface is substantially V-shaped. It is. Since the concave portion 160 having such a shape has a shape in which external light and stray light do not easily enter the mirrors 161 and 162, the mirrors 161 and 162 having high optical coupling efficiency can be formed. Moreover, since it is a left-right symmetric shape, even if a recessed part is formed, the rigidity of the optical waveguide 1 does not easily become uneven. For this reason, even when the optical waveguide 1 is bent, it is possible to prevent the curvature from becoming nonuniform due to the formation of the concave portion, and it is possible to prevent the transmission efficiency from being lowered due to the bending.

  The substantially V shape includes a trapezoid in which the lengths of two oblique sides are equal, as shown in FIG. 2, and an isosceles triangle. The cross-sectional shape of the recess is not limited to these shapes, and for example, the side of the two oblique sides where the mirror is not formed may be perpendicular to the first optical path or the second optical path. Such a shape is also included in a substantially V shape.

  In FIG. 2, the recess 160 is provided in the middle of the optical waveguide 1, but it may be provided at the end of the optical waveguide 1. Specifically, mirrors 161 and 162 may be formed on a cut surface obtained by obliquely cutting off the end of the optical waveguide 1. As shown in FIG. 2, by providing the recess 160 in the middle of the optical waveguide 1, the mirrors 161 and 162 are exposed inside the recess 160, and it is easy to prevent intrusion of external light, so that the stability is excellent. .

  Here, the concave portion 160 is formed by digging the clad layer 11 in the end surface clad portion 15b and at a position corresponding thereto as described above. This portion that forms the recess 160 is composed of the end surface cladding portion 15 b and the cladding layer 11, both of which are composed of a cladding material having a refractive index lower than that of the core portion 14. For this reason, when forming the recess 160, only the cladding material is processed, so that the processing characteristics in the entire processing process can be made uniform. That is, if the core material and the cladding material are mixed in the portion where the recess 160 is formed, the processing characteristics when processing the core material and the processing characteristics when processing the cladding material are different. When a processing method such as laser processing is used, the processing rate varies depending on the material and a step occurs on the processed surface, whereas the entire part is composed only of the cladding material. Does not cause this problem. Therefore, by forming the recess 160 in the end surface clad portion 15b, the dimensional accuracy of the processed surface can be increased, and as a result, the mirrors 161 and 162 having high surface accuracy and high optical performance can be formed.

  The mirrors 161 and 162 formed in this way are constituted by surfaces on which only the cladding material is exposed. For this reason, compared with the case where it comprises with the surface where a core material and a clad material were mixed, a uniform optical characteristic is achieved.

  The recess 160 described above is provided so as to penetrate the clad layer 11 and the core layer 13 (end-face clad portion 15 b) as shown in FIG. 2, but if it is provided at least in the core layer 13. Good.

  Of the length of the recess 160, the length in the direction orthogonal to the longitudinal direction of the core portion 14 (hereinafter referred to as the width of the recess) is preferably wider than the width of the core portion 14. When the concave portion 160 is configured as described above, the width of the mirrors 161 and 162 can be made sufficiently wider than the width of the core portion 14, so that the signal light emitted from the light emitting element 71 is diverging. However, a large amount of signal light can be incident on the mirrors 161 and 162, and the amount of signal light incident on the core portion 14 can be increased. For example, a light source such as a semiconductor laser emits signal light so as to diverge at a predetermined angle because of the structure of the light emitting portion. Therefore, providing the above-described wide mirrors 161 and 162 This is useful from the viewpoint of increasing the coupling efficiency.

  Further, in the case of the conventional optical waveguide, when the width of the concave portion 160 is wider than the width of the core portion 14, the concave portion 160 extends to the side clad portion 15 a. Both clad materials need to be processed. For this reason, in the conventional optical waveguide, a step is sometimes generated between the processed surface of the core portion 14 and the processed surface of the side clad portion 15a. On the other hand, when the concave portion 160 is formed in the end surface clad portion 15b, when the concave portion 160 is formed, either the end surface clad portion 15b or the side surface clad portion 15a is processed. Therefore, it is possible to prevent the processing surface from being stepped.

  In the case of the optical waveguide 1 shown in FIG. 2, a part of the inner wall surface of the recess 160 constitutes mirrors (light reflecting surfaces) 161 and 162. This is because the refractive index of air in the recess 160 is the end surface cladding. This is because the interface has light reflectivity because it is smaller than the refractive index of the constituent material of the portion 15b. Therefore, the structure of the mirror is not limited to this. For example, even when the concave portion 160 is filled with a material having a lower refractive index than the constituent material of the end surface cladding portion 15b, the constituent material and the lower refractive index of the end surface cladding portion 15b are filled. Light reflection occurs at the interface adjacent to the material, and this interface forms a mirror. As the low refractive index material, a material appropriately selected from the constituent materials of the core layer 13 described above is used. Further, the light reflectivity at the mirrors 161 and 162 depends on the difference in refractive index between two adjacent materials, and the larger the difference in refractive index, the better. Therefore, from this viewpoint, the low refractive index material is air. Is preferred. That is, the recess 160 is preferably a cavity.

(Light emitting element and light receiving element)
A light emitting element 71 shown in FIG. 2 includes an element main body 710, a light emitting portion 711 and an electrode 712 provided on the lower surface thereof. Specific examples of such a light emitting element 71 include a semiconductor laser such as a surface emitting laser (VCSEL), a light emitting diode (LED), and the like.

  On the other hand, the light receiving element 72 shown in FIG. 2 has an element main body 720, a light receiving portion 721 and an electrode 722 provided on the lower surface thereof. A specific example of such a light receiving element 72 is a photodiode or the like.

  As the light emitting element 71 and the light receiving element 72, for example, an element having a package specification such as a BGA (Ball Grid Array) type or an LGA (Land Grid Array) type is used. FIG. 2 shows a surface-mount type element as an example.

  An electrical wiring 75 is provided on the upper surface of the optical waveguide 1. The light emitting element 71 and the light receiving element 72 are electrically and mechanically connected to the electrical wiring 75 by bumps 76 made of various solders, various brazing materials, and the like.

  An underfill (sealing material) 79 is filled in the gap between the optical waveguide 1 and the light emitting element 71 and the gap between the optical waveguide 1 and the light receiving element 72. Thereby, the incident efficiency when the signal light emitted from the light emitting element 71 enters the optical waveguide 1 and the incident efficiency when the signal light emitted from the optical waveguide 1 enters the light receiving element 72 can be improved. . At the same time, the light emitting element 71 and the light receiving element 72 can be protected from vibration, external force, foreign matter adhesion, and the like.

  The constituent material of the underfill 79 is not particularly limited as long as it is a transparent material, and examples thereof include an epoxy resin, a polyester resin, a polyurethane resin, and a silicone resin.

  2 shows that the light emitting element 71 and the light receiving element 72 are placed on the optical waveguide 1, but as described above, the cover film 3 is interposed between the optical waveguide 1 and each element. May be inserted.

(Low refractive index layer)
As described above, the low refractive index layer 145 is located at a position adjacent to the end face on the light incident end 1A side of the core 14 and in the vicinity of the mirror 161 so as to cross the extension line of the core 14. Is arranged. By arranging the low refractive index layer 145, the signal light reflected by the mirror 161 is sequentially transmitted through the end surface cladding portion 15 b and the low refractive index layer 145 and is incident on the core portion 14.

  On the other hand, the low refractive index layer 145 is also disposed at a position adjacent to the end surface of the core portion 14 on the light emitting end portion 1B side and in the vicinity of the mirror 162. By disposing such a low refractive index layer 145, the signal light propagating from the left side to the right side of the core portion 14 in FIG. 2 is sequentially transmitted through the low refractive index layer 145 and the end surface clad portion 15b, and the mirror 162. To reach.

  By the way, as described above, these low refractive index layers 145 have an effect of suppressing light loss around the mirrors 161 and 162. Hereinafter, this operation will be described with reference to FIGS.

  FIG. 3 is a partially enlarged view of the vicinity of the mirror 161 in FIG. An arrow L1 illustrated in FIG. 3 is an example of a light trace of the signal light emitted from the light emitting unit 711 of the light emitting element 71.

  The signal light emitted outward from the end of the mirror 161 as in the case of the light trace L1 was lost without being incident on the mirror 161 in the prior art, but the low refractive index layer 145 was provided. Therefore, the path of the signal light is changed so that the signal light is reflected at the interface between the end surface clad portion 15 b and the low refractive index layer 145 shown in FIG. 3 and can enter the mirror 161. As a result, the signal light is reflected by the mirror 161 and propagates in the extending direction of the core portion 14 (right side in FIG. 3) as indicated by the light trace L1 in FIG. Can be light.

  Note that after reflection at the mirror 161, the signal light needs to pass through the low refractive index layer 145, but the signal light reflected by the mirror 161 is incident on the low refractive index layer 145 at a large incident angle. Therefore, it is transmitted with almost no reflection.

  Therefore, by providing the low refractive index layer 145 in the vicinity of the mirror 161, the optical coupling efficiency between the light emitting element 71 and the mirror 161 can be increased without impairing the transmission efficiency in the core portion 14. As a result, the S / N ratio of the entire optical waveguide module 10 is improved, and the quality of optical communication can be improved.

  Further, the low refractive index layer 145 provided in the vicinity of the mirror 161 may be provided so as to interfere with the mirror 161 or may be provided at a slightly separated position, but preferably as shown in FIG. Are provided at a position where the boundary surface of the mirror 161, the core layer 13 and the cladding layer 111 intersects (intersection M1 shown in FIG. 3). This position corresponds to the edge of the mirror 161. By providing the low refractive index layer 145 at this position, the amount of light that cannot be incident on the mirror 161 and is lost is minimized, and the optical coupling efficiency is maximized. be able to. The vicinity of the mirror 161 is a range where the mirror 161 is provided and a range corresponding to a distance of 50% or less of the thickness of the core portion 14 from the intersection M1. If the low refractive index layer 145 is located within this range, the above-described effects can be reliably obtained. Further, as will be described later, a plurality of low refractive index layers 145 may be provided in the vicinity of the mirror 161, and in this case, each low refractive index layer 145 is preferably provided within the above range. In other words, the mirror 161 is preferably provided in the vicinity of the low refractive index layer 145. The vicinity of the low refractive index layer 145 is the thickness of the core portion 14 from the low refractive index layer 145. The range corresponds to a distance of 50% or less.

  The extending direction of the low refractive index layer 145 is appropriately set according to the optical path connecting the light emitting element 71 and the mirror 161. Specifically, it is preferably set in a direction that forms an angle of 80 to 100 ° with respect to the extending direction (optical path) of the core portion 14 of the optical waveguide 1, and is set in a direction that forms an angle of 85 to 95 °. More preferably. In the case of FIG. 3, the angle of the mirror 161 is 45 °, and the optical path of the signal light emitted from the core portion 14 is converted by 90 ° by the mirror 161 and connected to the light emitting element 71. The extending direction of the layer 145 is also set to a direction orthogonal to the extension line of the core portion 14. Note that the conversion angle of the optical path is preferably about 80 to 100 ° as in the extending direction of the low refractive index layer 145, but more preferably 90 ° from the viewpoint of optical coupling efficiency. This is because if the conversion angle is 90 °, the optical path connecting the light emitting element 71 and the mirror 161 can be minimized. In this case, there is also an advantage that the light emitting element 71 can be easily placed. Furthermore, if the extending direction of the low refractive index layer 145 is orthogonal to the extending direction of the optical waveguide 1 (the optical path of the core portion 14), an exposure process is involved when an exposure process is involved in manufacturing the optical waveguide 1. There is also an advantage that becomes easier.

  On the other hand, FIG. 4 is a partially enlarged view of the vicinity of the mirror 162 in FIG. An arrow L <b> 2 illustrated in FIG. 4 is an example of a light trace of the signal light that propagates through the core portion 14 and is reflected by the mirror 162 and then enters the light receiving element 72.

  The signal light propagating through the core portion 14 sequentially passes through the low refractive index layer 145 and the end surface cladding portion 15b, enters the mirror 162, is reflected, and then travels toward the light receiving portion 721 of the light receiving element 72. When the light is reflected at an angle such as L2, the signal light is lost without being incident on the light receiving portion 721 in the conventional case. On the other hand, by providing the low refractive index layer 145 in the vicinity of the mirror 162, the signal light is reflected at the interface between the end clad portion 15b and the low refractive index layer 145 shown in FIG. The course is changed so that it is possible. As a result, loss light can be used as signal light.

  In order for the signal light propagating through the core part 14 to enter the mirror 162, it is necessary to pass through the low refractive index layer 145, but the propagation angle of the signal light propagating through the core part 14 is the core Since it is substantially parallel to the optical path of the portion 14 or at an angle close to it, the light enters the low refractive index layer 145 at a large incident angle, and transmits almost without being reflected.

  Therefore, by providing the low refractive index layer 145 in the vicinity of the mirror 162, the optical coupling efficiency between the mirror 162 and the light receiving element 72 can be increased without impairing the transmission efficiency in the core portion 14. As a result, the S / N ratio of the entire optical waveguide module 10 is improved, and the quality of optical communication can be improved.

  The low refractive index layer 145 provided in the vicinity of the mirror 162 may be provided so as to interfere with the mirror 162 or may be provided at a slightly separated position, but preferably as shown in FIG. Are provided at a position where the boundary surface of the mirror 162, the core layer 13 and the cladding layer 111 intersects (intersection M1 shown in FIG. 4). By providing at this position, the amount of light that cannot be incident on the light receiving portion 721 and lost can be minimized, and the optical coupling efficiency can be maximized. The vicinity of the mirror 162 is a range where the mirror 162 is provided and a range corresponding to a distance of 50% or less of the thickness of the core portion 14 from the intersection M1. If the low refractive index layer 145 is positioned within this range, the above-described effects can be obtained. In other words, the mirror 162 is preferably provided in the vicinity of the low refractive index layer 145, and the vicinity of the low refractive index layer 145 is the thickness of the core portion 14 from the low refractive index layer 145. The range corresponds to a distance of 50% or less.

  Note that the number of the low refractive index layers 145 provided in the vicinity of the mirror 162 is not particularly limited, and may be two or more per core portion. By providing the plurality of low refractive index layers 145 apart from each other, the probability that the signal light follows the same light trace as the light trace L2 as described above is increased, and the optical coupling efficiency can be further increased. As a result, by increasing the number of low refractive index layers, the optical coupling efficiency can be increased accordingly. Also, one or more low refractive index layers may be provided in the vicinity of the mirror 161.

  The thickness of the low refractive index layer 145 as described above (the length of the component parallel to the extension line of the core portion 14) is a thickness that can cause light reflection at the interface between the end surface cladding portion 15b and the low refractive index layer 145. If it is, it will not specifically limit, Preferably it is about 0.5-50 micrometers, More preferably, it is about 1-20 micrometers. By setting the thickness of the low refractive index layer 145 within the above range, light can be reliably reflected at the interface, and loss when signal light passes through the low refractive index layer 145 can be suppressed.

  The refractive index of the low refractive index layer 145 is not particularly limited as long as it is lower than the refractive index of the end surface clad portion 15b. Specifically, the difference in refractive index from the end face cladding portion 15b is preferably about 0.001 to 0.05, more preferably about 0.002 to 0.03, and 0.003 to 0. More preferably, it is about 0.02. By setting the refractive index of the low-refractive index layer 145 within the above range, light is reliably reflected at the interface between the end-face cladding portion 15b and the low-refractive index layer 145, and signal light is transmitted through the low-refractive index layer 145. Loss when doing so can be suppressed.

  As described above, since the optical waveguide 1 has the low refractive index layer 145, the optical coupling efficiency with the light emitting / receiving element can be increased. Further, when the improvement in optical coupling efficiency is sacrificed to some extent, the tolerance of alignment accuracy and surface accuracy (processing accuracy) of the mirrors 161 and 162 is relaxed.

  Further, as described above, in the optical waveguide 1, the mirrors 161 and 162 are formed in the end surface clad portion 15b. For this reason, for example, the signal light emitted from the light emitting element 71 sequentially passes through the cladding layer 112 and the end surface cladding portion 15 b and reaches the mirror 161. Similarly, the signal light reflected by the mirror 162 sequentially passes through the end surface clad portion 15 b and the clad layer 112 and reaches the light receiving element 72. In such an optical path of signal light, all of the light passes through the clad material, so that the difference in refractive index is very small at the interface of each part through which light passes. Therefore, Fresnel reflection when passing through the interface is smaller than when signal light is transmitted through the interface between the portion made of the core material and the portion made of the cladding material. As a result, the optical coupling efficiency between the optical waveguide 1 and the light emitting / receiving element can be further increased.

<< Second Embodiment >>
Next, a second embodiment of the optical waveguide of the present invention will be described.

  FIG. 6 is an exploded perspective view showing a second embodiment of the optical waveguide of the present invention and an optical waveguide module including the optical waveguide module (partially shown).

  Hereinafter, although 2nd Embodiment etc. are described, in the following description, it demonstrates centering around difference with 1st Embodiment etc., The description is abbreviate | omitted about the same matter.

  This embodiment is the same as the first embodiment except that it has a mating hole 18 for an optical fiber connector that opens on the upper surface. An optical waveguide module 10 shown in FIG. 6 is an optical fiber connector such as a light-emitting optical fiber connector 73 and a light-receiving optical fiber connector 74, and an optical fiber 70 connected thereto, instead of a surface-mounted light receiving / emitting element. 1 is the same as the optical waveguide module 10 shown in FIG.

  The light-emitting optical fiber connector 73 shown in FIG. 6 has a connector body 731, two through holes 732 that penetrate the connector body 731, and two mating pins 733 that protrude from the lower surface of the connector body 731. . Further, an optical fiber 70 is inserted into each through-hole 732, and the end face of each optical fiber 70 is configured to be exposed on the lower surface of the connector main body 731.

  Similarly, the light-receiving optical fiber connector 74 shown in FIG. 6 has a connector main body 741, two through holes 742 that penetrate the connector main body 741, and two engagement pins 743 that protrude from the lower surface of the connector main body 741. doing. Further, the optical fibers 70 are inserted into the respective through holes 742, and the end face of each optical fiber 70 is configured to be exposed on the lower surface of the connector main body 741.

  On the other hand, the optical waveguide 1 shown in FIG. 6 has four mating holes 18 on its upper surface. These mating holes 18 are configured to be mated with the mating pins 733 and 743 described above, and by this mating, the optical fiber connector for light emission 73 and the optical fiber connector for light reception 74 are fixed to the optical waveguide 1 and Alignment can be performed.

  Each through-hole 732 provided in the light-emitting optical fiber connector 73 is formed so that the end face of each optical fiber 70 inserted into the through-hole 732 is positioned above the mirror 161 of the optical waveguide 1. Similarly, each through-hole 742 provided in the optical fiber connector for light reception 74 is formed such that the end face of each optical fiber 70 inserted into the optical fiber connector 74 is positioned above the mirror 162 of the optical waveguide 1.

  According to the optical waveguide 1 having such a configuration, the same operation and effect as in the first embodiment can be obtained, and the optical fiber (only by engaging the engagement pins 733 and 743 of each connector into the engagement hole 18. Since the optical coupling with the light emitting / receiving element) can be performed, the optical coupling and the release thereof can be easily performed.

«Third embodiment»
Next, a third embodiment of the optical waveguide of the present invention will be described.

  FIG. 7 is a cross-sectional view showing a third embodiment of the optical waveguide of the present invention and an optical waveguide module including the same. In FIG. 7, the support film and the cover film are not shown in order to avoid the drawing from becoming complicated.

  Hereinafter, although 3rd Embodiment etc. are demonstrated, in the following description, it demonstrates centering around difference with 1st Embodiment, 2nd Embodiment, etc., and the description is abbreviate | omitted about the same matter.

  This embodiment is the same as the second embodiment except that it has two core layers and three cladding layers.

  The optical waveguide 1 shown in FIG. 7 is formed by laminating a clad layer 111, a core layer 131, a clad layer 112, a core layer 132, and a clad layer 113 in this order from the lower side. The number of layers is not particularly limited, and may be three or more.

  In the core layer 131 and the core layer 132, the same pattern as that of the core layer 13 described above is formed. Therefore, in the third embodiment, although the number of layers is increased as compared with the second embodiment, since the pattern of each layer is the same, the exposure process is only once, and the manufacturing process is simplified. It is.

  In addition, since the core layer 131 and the core layer 132 are each formed with two core portions 14, the optical waveguide 1 shown in FIG. 7 has a total of four core portions (4 channels). . By increasing the number of layers in this way, it is possible to increase the density of the optical waveguide 1 without complicating the manufacturing process.

  Here, on the light incident end 1A side of the optical waveguide 1 shown in FIG. 7, a recess 1601 is formed by digging each layer located below the clad layer 113. Of the inner wall surface of the recess 1601, the exposed surface of the core layer 132 is a mirror 1611. In addition, a recess 1602 is formed by digging each layer located below the cladding layer 112 so as to be adjacent to the light emitting end 1B side of the recess 1601. Of the inner wall surface of the recess 1602, the exposed surface of the core layer 131 is a mirror 1612.

  Further, on the light emitting end 1B side of the optical waveguide 1 shown in FIG. 7, a recess 1603 is formed by digging each layer located below the cladding layer 113. Of the inner wall surface of the recess 1603, the exposed surface of the core layer 132 is a mirror 1613. In addition, a recess 1604 is formed by digging each layer located below the cladding layer 112 so as to be adjacent to the light incident end 1A side of the recess 1603. Of the inner wall surface of the recess 1604, the exposed surface of the core layer 131 is a mirror 1614.

  By the way, these mirrors 1611, 1612, 1613, and 1614 are configured by inner walls of concave portions (cavities) 1601, 1602, 1603, and 1604 formed in the end surface clad portion 15b, as in the first embodiment. . For this reason, the portion where the concave portion is formed has a structure in which variations in processing characteristics hardly occur when the concave portion is formed, and as a result, mirrors 1611, 1612, 1613, and 1614 having high surface accuracy and high optical performance can be obtained.

  Further, since the core layer 132 is located between the mirror 1612 and the light emitting optical fiber connector 73 and between the mirror 1614 and the light receiving optical fiber connector 74, when optically coupling between them, The optical signal needs to pass through the core layer 132.

  Here, since the same pattern is formed in the core layer 131 and the core layer 132 as described above, the low refractive index layer 145 and the end surface clad portion 15b are also formed in the core layer 132. The core layer 132 is also provided with another low refractive index layer 145 so as to sandwich the end clad portion 15b.

  With such a configuration, the end surface clad portion 15b formed in the core layer 132 becomes a region sandwiched between the two low-refractive index layers 145, and can be a waveguide that propagates an optical signal in the vertical direction of FIG. . For this reason, in the optical waveguide 1 shown in FIG. 7, by providing the low refractive index layer 145 in both the core layer 131 and the core layer 132, even when a plurality of core layers are stacked, the optical coupling efficiency with respect to the light receiving and emitting elements is increased. Can be increased. In addition, since the formed mirrors 1611, 1612, 1613, and 1614 all have high optical performance, the optical coupling efficiency can be particularly improved.

  In addition, the optical waveguide 1 shown in FIG. 7 has a recess formed including a layer (core layer) on which a mirror is to be formed and a layer below the layer. The structure is such that all mirrors can be formed by digging. That is, in the structure of the optical waveguide 1 shown in FIG. 7, once the processing reference position for the core portion 14 is determined at the time of digging, the reference position is used until all the mirrors are formed thereafter. Therefore, it can be said that the structure can minimize the positional deviation between the mirrors. On the other hand, when each core layer is subjected to a process of digging only the core layer, each layer must be laminated while the mirrors are aligned after the core layer is digged. However, it is disadvantageous in that the positional deviation between the mirrors is likely to occur.

  Therefore, the optical waveguide 1 shown in FIG. 7 has high positional accuracy between the mirrors, and aligns with high accuracy with respect to the light emitting / receiving element including a plurality of light emitting units and light receiving units in one element, It can be combined with high efficiency.

FIG. 8 is a plan view of the core layer 132 in the optical waveguide 1 shown in FIG.
A low refractive index layer 145 is provided on the light incident end 1A side of the upper surface of the core layer 132 shown in FIG. 8, and this increases the transmission characteristics in the thickness direction of the optical waveguide 1 at this portion. Therefore, the optical coupling efficiency between the light-emitting optical fiber 70 and the mirror 1611 can be increased by arranging the light-emitting optical fiber 70 according to this portion.

  Similarly, a low refractive index layer 145 is provided on the light emitting end portion 1B side of the upper surface of the core layer 132, so that the transmission characteristics in the thickness direction of the optical waveguide 1 at this portion are enhanced. Therefore, the optical coupling efficiency between the mirror 1613 and the light receiving optical fiber 70 can be increased by arranging the light receiving optical fiber 70 in accordance with this portion.

  In many cases, the optical fiber connector for light emission 73 and the optical fiber connector for light reception 74 are arranged so that the end faces of the optical fiber 70 are line-symmetric with respect to the mating pins. For this reason, it is preferable that the optical waveguide 1 is also arranged so that the portion with high transmission characteristics is in a line-symmetrical positional relationship with the mating hole 18 in accordance therewith. That is, it is preferable that a mirror and a low refractive index layer are disposed so as to satisfy this positional relationship. Thereby, the optical waveguide 1 can be connected to a general-purpose optical fiber connector.

  The arrangement of the optical fibers in the light-emitting optical fiber connector 73 and the light-receiving optical fiber connector 74 is not limited to the grid-like arrangement as shown in FIG. The arrangement may be shifted. In this case, the arrangement of the mirror and the low refractive index layer formed in the optical waveguide 1 is also adjusted accordingly.

<Optical waveguide manufacturing method>
Next, an example of a method for manufacturing the optical waveguide 1 will be described. Here, a method for manufacturing the optical waveguide 1 shown in FIG. 2 is taken as an example.

  9 to 12 are views (sectional views) for explaining a method of manufacturing the optical waveguide shown in FIG.

  The optical waveguide 1 includes a laminate formed by laminating the clad layer 111, the core layer 131, and the clad layer 112 in this order from below, and concave portions 1601 and 1602 formed by removing a part of the laminate. ,have.

  In such an optical waveguide 1, after each layer is manufactured individually and a recess is formed in each layer, a method of stacking the layers or after manufacturing each layer individually and stacking the layers to obtain a laminate Although manufactured by a method of forming a recess in the laminate, the latter method will be described here.

  Hereinafter, the manufacturing method of the optical waveguide, [1] a step of manufacturing a base material for forming a laminate, [2] a step of forming a refractive index difference by irradiating a part of the base material with active radiation, [3] The process for forming the recess will be described separately.

  [1] The base material 960 for forming the laminate is manufactured by, for example, a method in which the layers 911 and 912 are individually formed on the support substrate, and then separated from the support substrate and bonded to each other. .

  Specifically, each layer-forming composition 901, 902 is applied onto a support substrate 951 to form a liquid film, and then the liquid film is homogenized and volatile components are removed (see FIG. 9).

  Examples of the coating method include a doctor blade method, a spin coating method, a dipping method, a table coating method, a spray method, an applicator method, a curtain coating method, and a die coating method.

  In order to remove volatile components in the liquid film, a method of heating the liquid film, placing the liquid film under reduced pressure, or spraying a dry gas is used. Thereby, the layers 911 and 912 are obtained.

  Next, the layers 911 and 912 are peeled from the support substrate 951 and stacked. Thereby, the base material 960 shown in FIG. 10 is obtained. Note that the base material 960 can also be formed by removing the volatile components after sequentially coating the compositions 901 and 902 on the support substrate 951.

  Examples of the composition for forming the layers 911 and 912 include solutions (dispersions) obtained by dissolving or dispersing the constituent materials of the respective layers in various solvents.

  Among these, the composition 901 for forming the core layer includes a polymer 915 and an additive 920 such as a monomer and a polymerization initiator. In the layers 911 and 912 formed from such a composition, the monomer reacts by irradiation with actinic radiation, and accordingly, the abundance ratio of the polymer 915 and the monomer is biased, so that the active radiation irradiation region and the non-irradiation are not irradiated. A refractive index difference can be formed between the regions. Therefore, by using such a composition 901, the core part 14, the side clad part 15a, and the end face clad part 15b can be formed in the core layers 131 and 132.

  On the other hand, the composition 902 for forming the cladding layer is mainly composed of the constituent material of the cladding layer described above, and has a lower refractive index than the highest refractive index included when a refractive index difference occurs in the core layer. The composition is used. Note that the composition 902 for forming the clad layer does not contain the monomer as described above, and therefore, no refractive index difference is formed even when irradiated with actinic radiation.

  Therefore, the base material 960 for manufacturing the optical waveguide 1 is obtained by alternately laminating the layers 911 formed from the composition 901 and the layers 912 formed from the composition 902.

Here, the components of the composition 901 for forming the core layer will be described.
(polymer)
The polymer 915 serves as a base polymer for the core layer.

  The polymer 915 has sufficiently high transparency (colorless and transparent) and is compatible with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later. There are preferably used those having sufficient transparency even after the monomer is polymerized.

  Here, “having compatibility” means that the monomer is at least mixed and does not cause phase separation with the polymer 915 in the composition 901 or the layer 911.

  Examples of such polymers 915 include cyclic olefin resins such as norbornene resins and benzocyclobutene resins, acrylic resins, methacrylic resins, polycarbonates, polystyrenes, epoxy resins, polyamides, polyimides, polybenzoxazoles, Examples thereof include silicone resins, polyurethanes, fluorine resins, and the like, and one or two or more of these can be used (polymer alloy, polymer blend (mixture), copolymer, etc.).

  Among these, those mainly composed of cyclic olefin resins are preferable. By using a cyclic olefin resin as the polymer 915, a core layer having excellent optical transmission performance and heat resistance can be obtained.

  As cyclic olefin resin, what was described in Unexamined-Japanese-Patent No. 2010-090328 is used, for example.

  Note that the refractive index of each part of the core layer is determined according to the relative magnitude relationship between the refractive index of the polymer 915 and the refractive index of the monomer in each part and the abundance ratio thereof, so that the polymer 915 depends on the type of monomer used. You may make it adjust the refractive index of this suitably.

  For example, in order to obtain a polymer 915 having a relatively high refractive index, a monomer having an aromatic ring (aromatic group), a nitrogen atom, a bromine atom or a chlorine atom in the molecular structure is generally selected, A polymer 915 is synthesized (polymerized). On the other hand, in order to obtain a polymer 915 having a relatively low refractive index, a monomer having an alkyl group, a fluorine atom or an ether structure (ether group) is generally selected in the molecular structure, and the polymer 915 is synthesized ( Polymerization).

  Further, the polymer 915 as described above has a leaving group (leaving pendant group) that is branched from the main chain and at least a part of the molecular structure of which can be detached from the main chain upon irradiation with actinic radiation. Also good. Since the refractive index of the polymer 915 decreases due to the removal of the leaving group, the polymer 915 can form a refractive index difference depending on the presence or absence of irradiation with actinic radiation.

  Examples of the polymer 915 having such a leaving group include a polymer having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in a molecular structure. Such a leaving group is released relatively easily by the action of a cation.

  Among these, as the leaving group that causes a decrease in the refractive index of the resin by leaving, at least one of the -Si-diphenyl structure and the -O-Si-diphenyl structure is preferable.

  Specific examples of the polymer 915 having a leaving group in the side chain include those described in JP 2010-090328 A.

  On the other hand, examples of another leaving group include a substituent having an acetophenone structure at the terminal. This leaving group is released relatively easily by the action of free radicals.

  The content of the leaving group is not particularly limited, but is preferably 10 to 80% by weight, more preferably 20 to 60% by weight in the polymer 915 having a leaving group in the side chain. . When the content is within the above range, both flexibility and refractive index modulation function (effect of changing the refractive index difference) are particularly excellent.

  For example, the width for changing the refractive index can be expanded by increasing the content of the leaving group.

(Additive)
Additive 920 contains a monomer and a polymerization initiator.

((monomer))
The monomer reacts in the irradiation region of the actinic radiation to form a reactant by irradiation with actinic radiation, which will be described later, and the monomer diffuses and moves with it, so that the layer 911 is refracted between the irradiation region and the non-irradiation region. It is a compound that can cause a rate difference.

  As a reaction product of the monomer, a polymer (polymer) formed by polymerizing the monomer in the polymer 915, a cross-linked structure in which the monomer cross-links the polymers 915, and a polymer 915 obtained by polymerizing the monomer to the polymer 915. At least one of the branched structures branched from.

  By the way, since the refractive index difference generated between the irradiated region and the non-irradiated region is generated based on the difference between the refractive index of the polymer 915 and the refractive index of the monomer, the monomer contained in the additive 920 is the polymer 915. Is selected in consideration of the magnitude relationship with the refractive index.

  Specifically, in the layer 911, when it is desired that the refractive index of the irradiated region be high, a polymer 915 having a relatively low refractive index and a monomer having a high refractive index with respect to the polymer 915 are added. Used in combination. On the other hand, when it is desired that the refractive index of the irradiated region be low, a polymer 915 having a relatively high refractive index and a monomer having a low refractive index with respect to the polymer 915 are used in combination.

  Note that “high” or “low” in the refractive index does not mean an absolute value of the refractive index but means a relative relationship between certain materials.

  When the refractive index of the irradiated region in the layer 911 decreases due to the monomer reaction (reactant generation), the portion becomes the side cladding portion and the low refractive index layer of the core layer, and the refractive index of the irradiated region increases. In this case, the portion becomes the core portion of the core layer.

  As the monomer, a monomer having compatibility with the polymer 915 and having a refractive index difference with the polymer 915 of 0.01 or more is preferably used.

  Such a monomer is not particularly limited as long as it is a compound having a polymerizable site, and examples thereof include norbornene monomers, acrylic acid (methacrylic acid) monomers, epoxy monomers, oxetane monomers, and vinyl ether monomers. , A styrene monomer, etc., and one or more of these can be used in combination.

  Among these, it is preferable to use a monomer or oligomer having a cyclic ether group such as an oxetanyl group or an epoxy group, or a norbornene monomer as the monomer. By using a monomer or oligomer having a cyclic ether group, the cyclic ether group is likely to be opened, so that a monomer capable of reacting quickly can be obtained. Moreover, by using a norbornene-based monomer, a core layer (optical waveguide 1) having excellent optical transmission performance and excellent heat resistance and flexibility can be obtained.

  Among these, the molecular weight (weight average molecular weight) of the monomer having a cyclic ether group or the molecular weight (weight average molecular weight) of the oligomer is preferably 100 or more and 400 or less, respectively.

  Examples of the monomer having an oxetanyl group and the oligomer having an oxetanyl group include those described in JP 2010-090328 A. Among these, those represented by the following formula (20) are particularly preferable.

  Examples of the monomer having an epoxy group and the oligomer having an epoxy group include those described in JP 2010-090328 A.

  The addition amount of these monomers is preferably 1 part by weight or more and 50 parts by weight or less, and more preferably 2 parts by weight or more and 20 parts by weight or less with respect to 100 parts by weight of the polymer. Thereby, refractive index modulation can be performed, and there is an effect that both flexibility and heat resistance can be achieved.

((Polymerization initiator))
The polymerization initiator acts on the monomer with irradiation of actinic radiation to promote the reaction of the monomer, and is added as necessary in consideration of the reactivity of the monomer.

  The polymerization initiator to be used is appropriately selected according to the type of monomer polymerization reaction or crosslinking reaction. For example, radical polymerization initiators are preferably used exclusively for acrylic acid (methacrylic acid) monomers and styrene monomers, and cationic polymerization initiators are preferably used exclusively for epoxy monomers, oxetane monomers, and vinyl ether monomers.

  Examples of the radical polymerization initiator include benzophenones and acetophenones.

  On the other hand, examples of the cationic polymerization initiator include a Lewis acid generating type such as a diazonium salt, and a Bronsted acid generating type such as an iodonium salt and a sulfonium salt.

  In particular, when a monomer having a cyclic ether group is used as the monomer, the following cationic polymerization initiator (photoacid generator) is preferably used. Specifically, what was described in Unexamined-Japanese-Patent No. 2010-090328 is mentioned.

  The content of the polymerization initiator is preferably 0.01 parts by weight or more and 0.3 parts by weight or less, more preferably 0.02 parts by weight or more and 0.2 parts by weight or less with respect to 100 parts by weight of the polymer. . Thereby, there exists an effect of a reactive improvement.

In addition, when the reactivity of a monomer is remarkably high, you may abbreviate | omit addition of a polymerization initiator.
Further, the additive 920 may contain a sensitizer and the like in addition to the monomer and the polymerization initiator.

  Among these, the sensitizer increases the sensitivity of the polymerization initiator to light and is suitable for the function of reducing the time and energy required for the activation (reaction or decomposition) of the polymerization initiator and for the activation of the polymerization initiator. It has a function of changing the wavelength of light to a wavelength. Specifically, what was described in Unexamined-Japanese-Patent No. 2010-090328 is mentioned.

  The content of the sensitizer in the composition 901 is preferably 0.01% by weight or more, more preferably 0.5% by weight or more, and further preferably 1% by weight or more. In addition, it is preferable that an upper limit is 5 weight% or less.

  In addition to the above as additive 920, composition 901 includes a catalyst precursor, a cocatalyst, an antioxidant, an ultraviolet absorber, a light stabilizer, a silane coupling agent, a coating surface improver, and a thermal polymerization inhibitor. , Leveling agents, surfactants, colorants, storage stabilizers, plasticizers, lubricants, fillers, inorganic particles, deterioration inhibitors, wettability improvers, antistatic agents, and the like.

  The layer 911 obtained from the composition 901 as described above has a predetermined refractive index due to the action of the additive 920 that is uniformly dispersed in the polymer 915. Then, the refractive index is partially modulated by irradiation with actinic radiation, which will be described later, and the refractive index is biased.

  [2] Next, a mask (masking) 935 in which an opening (window) 9351 is formed is prepared, and the base material 960 is irradiated with active radiation 930 through the mask 935 (see FIG. 10).

  Hereinafter, the case where a monomer having a refractive index lower than that of the polymer 915 is used as the monomer contained in the composition 901 will be described as an example.

  That is, in the example shown here, the irradiation region 925 of the active radiation 930 is mainly a side cladding portion, an end surface cladding portion, and a low refractive index layer.

  Therefore, in the example shown here, the mask 935 is mainly formed with openings (windows) 9351 equivalent to the patterns of the side cladding portion and the low refractive index layer to be formed. This opening 9351 forms a transmission part through which the active radiation 930 to be irradiated passes.

  The mask 935 may be formed in advance (separately formed) (for example, plate-shaped) or formed on the base material 960 by, for example, a vapor deposition method or a coating method.

  Preferred examples of the mask 935 include a photomask made of quartz glass or a PET base material, a stencil mask, a metal thin film formed by a vapor deposition method (evaporation, sputtering, etc.), etc. Among these, it is particularly preferable to use a photomask or a stencil mask. This is because a fine pattern can be formed with high accuracy, and handling is easy, which is advantageous in improving productivity.

  Further, in FIG. 11, the opening (window) 9351 of the mask 935 is shown by partially removing the mask along the pattern of the irradiation region 925 of the active radiation 930. However, the quartz glass, the PET base material, etc. In the case of using the photomask manufactured in (1), it is also possible to use a photomask provided with a shielding portion of active radiation 930 made of a shielding material made of metal such as chromium. In this mask, the part other than the shielding part is the window (transmission part).

  The actinic radiation 930 to be used is not particularly limited as long as it can cause a photochemical reaction (change) with respect to the polymerization initiator and can release the leaving group contained in the polymer 915. For example, visible light, In addition to ultraviolet light, infrared light, and laser light, electron beams, X-rays, and the like can also be used.

  Among these, the actinic radiation 930 is appropriately selected depending on the type of the sensitizer when it contains a polymerization initiator, a leaving group type, and a sensitizer, and is not particularly limited, but has a wavelength of 200 to 450 nm. It is preferable to have a peak wavelength in the range. As a result, the polymerization initiator can be activated relatively easily and the leaving group can be removed relatively easily.

The irradiation dose of the actinic radiation 930 is preferably in the range of about 0.05~9J / cm ^2, more preferably about ^{0.1~6J / cm 2, 0.1~3J / cm} 2 of about More preferably.

  When the base material 960 is irradiated with the active radiation 930 through the mask 935, the following phenomenon occurs in the layer 911 formed of the composition 901 in the base material 960. First, the polymerization initiator is activated in the irradiated region 925 of the layer 911. Thereby, the monomer is polymerized in the irradiation region 925. When the monomer is polymerized, the amount of the monomer in the irradiated region 925 decreases, and accordingly, the monomer in the non-irradiated region 940 diffuses and moves to the irradiated region 925. As described above, since the polymer 915 and the monomer are appropriately selected so that a difference in refractive index occurs between them, a difference in refractive index occurs between the irradiated region 925 and the non-irradiated region 940 as the monomer diffuses and moves.

  FIG. 13 is a diagram for explaining a state in which a refractive index difference is generated between the irradiated region 925 and the non-irradiated region 940 in the base material 960. The horizontal cross-sectional position of the layer 911 is taken along the horizontal axis. It is a figure which shows refractive index distribution when taking the refractive index of this on the vertical axis | shaft.

  In this embodiment, since a monomer having a refractive index smaller than that of the polymer 915 is used as the monomer, the refractive index of the non-irradiated region 940 increases and the refractive index of the irradiated region 925 decreases as the monomer diffuses and moves ( (See FIG. 13 (a)).

  It is considered that the monomer diffusion movement is caused by the consumption of the monomer in the irradiation region 925 and the concentration gradient of the monomer formed accordingly. For this reason, the monomers in the entire non-irradiated region 940 do not move toward the irradiated region 925 all at once, but gradually move from a portion close to the irradiated region 925 and outward from the center of the non-irradiated region 940 to compensate for this. Monomer migration also occurs. As a result, as shown in FIG. 13A, the high refractive index region H on the non-irradiation region 940 side and the low refractive index region L on the irradiation region 925 side across the boundary between the irradiation region 925 and the non-irradiation region 940. Is formed. Since the high refractive index region H and the low refractive index region L are formed in accordance with the diffusion movement of the monomer as described above, they are necessarily constituted by smooth curves. Specifically, the high refractive index region H has, for example, a substantially U shape that protrudes upward, and the low refractive index region L has, for example, a substantially U shape that protrudes downward.

  The refractive index of the polymer obtained by polymerizing the monomers as described above is almost the same as the refractive index of the monomer before polymerization (the difference in refractive index is about 0 to 0.001). As the polymerization proceeds, the refractive index decreases according to the amount of the monomer and the amount of the substance derived from the monomer.

  On the other hand, in the non-irradiated region 940, the monomer is not polymerized because the polymerization initiator and the monomer are not activated.

  In addition, in the irradiation region 925, the ease of monomer diffusion transfer gradually decreases as the polymerization of the monomer proceeds. As a result, in the irradiated region 925, the closer to the non-irradiated region 940, the higher the monomer concentration, and the greater the amount of decrease in the refractive index. As a result, the distribution shape of the low refractive index region L formed in the irradiation region 925 is likely to be asymmetrical left and right, and the gradient on the non-irradiation region 940 side becomes steeper.

  Further, the polymer 915 may have a leaving group as described above. This leaving group is released upon irradiation with actinic radiation 930 and decreases the refractive index of the polymer 915. Therefore, when the irradiation region 925 is irradiated with the actinic radiation 930, in the layer 911, the diffusion movement of the monomer described above is started, the leaving group is released from the polymer 915, and the refractive index of the irradiation region 925 is equal to that before irradiation. (See FIG. 13B).

  Since this decrease in refractive index occurs uniformly in the entire irradiation region 925, the above-described difference in refractive index between the high refractive index region H and the low refractive index region L is further expanded. As a result, a graded index type refractive index distribution W shown in FIG. 13B is obtained. The graded index type refractive index distribution refers to a distribution having a maximum value of the refractive index and continuously decreasing so that the refractive index is tailed on both sides of the maximum value.

  Note that, in the core layer manufactured using the composition 901, the refractive index distribution of the core portion is a graded index type. Such a distribution has a stronger confinement effect of signal light propagating through the core portion than a step index type distribution in which the refractive index changes stepwise. For this reason, a core part with high transmission efficiency is obtained.

  In addition, the refractive index difference to be formed can be controlled by adjusting the irradiation amount of the active radiation 930. For example, the refractive index difference can be increased by increasing the irradiation amount.

  In addition, the formation of the refractive index difference as described above occurs simultaneously with one irradiation of the active radiation 930 in the plurality of layers 911 included in the base material 960. For this reason, it is not necessary to individually irradiate the plurality of layers 911, and the manufacturing process can be greatly simplified. In particular, in the third embodiment, the patterns formed on each core layer are the same except for the presence or absence of a mirror. For this reason, it can be said that each embodiment is a structure suitable for forming simultaneously by one irradiation. Furthermore, since the positional relationship between the layers of the patterns formed between the layers 911 is almost completely the same, the positional deviation is extremely small compared with the case of individually irradiating, and the optical coupling efficiency between the layers can be improved.

  On the other hand, in the present embodiment, the formation of the refractive index difference as described above does not occur in the layer 912 formed from the composition 902.

  Next, the base material 960 is subjected to heat treatment. In this heat treatment, the monomer in the irradiation region 925 irradiated with light is further polymerized. On the other hand, in this heating step, the monomer in the non-irradiated region 940 is volatilized. Thereby, in the non-irradiated region 940, the monomer is further reduced, the refractive index is increased, and the refractive index is close to that of the polymer 915.

  The heating temperature in this heat treatment is not particularly limited, but is preferably about 30 to 180 ° C, and more preferably about 40 to 160 ° C.

Further, the heating time is preferably set so that the polymerization reaction of the monomer in the irradiation region 925 is almost completed. Specifically, the heating time is preferably about 0.1 to 2 hours, preferably 0.1 to 1 hour. More preferred is the degree.
Note that this heat treatment may be performed as necessary and may be omitted.

  Based on the principle as described above, in the base material 960, a portion having a relatively high refractive index and a portion having a low refractive index are formed in the layer 911. As a result, the layer 911 becomes the core layer 13 and the layer 912 becomes the respective clad layers 111 and 112, and a laminated body 970 in which these are laminated is obtained (see FIG. 12).

  Here, in the core layer 13, in the vicinity of the boundary between the irradiation region 925 and the non-irradiation region 940, a portion having a particularly low refractive index derived from the low refractive index region L is formed. This portion is a portion having a lower refractive index than the side cladding portion 15a and the end surface cladding portion 15b, and is formed so as to separate the core portion 14 from the side surface cladding portion 15a and the end surface cladding portion 15b. In this way, the low refractive index layer 145 described above is formed. That is, in the core layer 13, the non-irradiation region 940 shown in FIG. 12B is mainly the core portion 14, and the irradiation region 925 is mainly the side cladding portion 15 a and the end surface cladding portion 15 b. A low refractive index layer 145 is formed at the interface with the non-irradiated region 940. Therefore, with the manufacturing method as described above, the low refractive index layer 145 is naturally formed at the boundary between the high refractive index region H and the low refractive index region L. This is useful in the production of the optical waveguide of the present invention.

  When the low refractive index layer 145 is formed according to such a principle, the change in the refractive index in the thickness direction of the low refractive index layer 145 is continuous as described above. For this reason, when the signal light is transmitted through the low refractive index layer 145 in the thickness direction, the transmission efficiency is increased. This is because when the change in the refractive index in the traveling direction of the signal light is continuous, the transmission loss can be suppressed as compared with the case where the change in the refractive index is discontinuous. Therefore, the optical waveguide 1 manufactured by the method as described above has high transmission efficiency.

  Although not shown in FIG. 11, according to the above formation principle, the low refractive index layer is formed not only near both end faces in the longitudinal direction of the core portion 14 but also near both side faces. That is, the low refractive index layer is formed so as to surround the core portion 14 in the core layer 13. By providing the low refractive index layer in this manner, the optical signal confinement effect in the core portion 14 is enhanced, and the transmission efficiency of the optical waveguide 1 can be further increased.

  In the case where a monomer having a higher refractive index than that of the polymer 915 is used, the refractive index of the movement destination becomes higher with the diffusion movement of the monomer, contrary to the above. The irradiation area 940 may be set.

  In addition, when light having high directivity such as laser light is used as the active radiation 930, the use of the mask 935 may be omitted.

  [3] Next, recesses 1601, 1602, 1603, and 1604 are formed in the laminate 970.

  These concave portions 1601, 1602, 1603, and 1604 are formed by a digging process that removes a part from the lower surface side of the stacked body 970. This digging process can be performed by, for example, a laser processing method, a dicing method using a dicing saw, or the like.

  In each of the above-described embodiments, since the concave portion is formed so that all the concave portions can be formed after the stacked body 970 is formed, the reference position can be once determined when performing the digging process. For example, the reference position can be continuously used until all the recesses are formed. Therefore, the interval between the recesses can be reproduced with high accuracy, and the occurrence of optical coupling loss due to positional deviation can be suppressed.

Further, when determining the reference position, it is easy to determine the reference position as follows.
First, a recess (mirror) is formed for one of the core portions 14. Next, light is incident on the core portion 14 on which the mirror is formed from the end opposite to the portion on which the recess is formed. Thereby, incident light is reflected by the mirror, and the mirror forming position emits light. By capturing this light emission and using the light emission position as a reference position for subsequent processing, the reference position for processing can be accurately aligned with the position of the core portion 14. Thereafter, if other concave portions (mirrors) are formed together while using the light emission position as the origin, the positional relationship and the separation distance between the mirrors can be accurately formed as designed.
The optical waveguide 1 is obtained as described above.

<Electronic equipment>
The optical waveguide of the present invention as described above has high optical coupling efficiency with other optical elements (light emitting / receiving elements and the like). For this reason, by providing the optical waveguide of the present invention, a highly reliable electronic device (electronic device of the present invention) capable of performing high-quality optical communication between two points can be obtained.

  Examples of the electronic device including the optical waveguide of the present invention include electronic devices such as a mobile phone, a game machine, a router device, a WDM device, a personal computer, a television, and a home server. In any of these electronic devices, it is necessary to transmit a large amount of data at high speed between an arithmetic device such as an LSI and a storage device such as a RAM. Therefore, by providing such an electronic device with the optical waveguide of the present invention, problems such as noise and signal degradation peculiar to electrical wiring are eliminated, and a dramatic improvement in performance can be expected.

  In addition, the amount of heat generated in the optical waveguide portion is greatly reduced compared to electrical wiring. For this reason, the electric power required for cooling can be reduced and the power consumption of the whole electronic device can be reduced.

  The optical waveguide, the opto-electric hybrid board, and the electronic device according to the present invention have been described above. However, the present invention is not limited to this, and for example, an arbitrary component may be added to the optical waveguide. .

  In addition, the method for producing an optical waveguide is not limited to the above-described ones. For example, a method in which molecular bonds are cut by irradiation with actinic radiation to change the refractive index (photo bleaching method), a composition is photoisomerized or photodimerized. A method that includes a photocrosslinkable polymer having a possible unsaturated bond and irradiates it with actinic radiation to change the molecular structure and change the refractive index (photoisomerization method / photodimerization method), film formation technology, It is also possible to use a method such as combining each part with a different material by combining a photolithography technique and an etching technique.

Further, the refractive index distribution of the optical waveguide may be a step index type distribution or the like.
Further, the form of the optical waveguide does not have to be a laminated structure as described in each of the above embodiments, and may be a structure in which a tubular clad portion is provided so as to cover the core portion, for example.

Next, examples of the present invention will be described.
1. Production of optical waveguide (Example 1)
(1) Synthesis of norbornene-based resin having a leaving group In a glove box where both moisture and oxygen concentrations are controlled to 1 ppm or less and filled with dry nitrogen, 7.2 g (40.1 mmol) of hexylnorbornene (HxNB) ), 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane was weighed into a 500 mL vial, 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the top was sealed with a silicon sealer.

  Next, 1.56 g (3.2 mmol) of Ni catalyst represented by the following chemical formula (A) and 10 mL of dehydrated toluene are weighed in a 100 mL vial, put a stirrer chip, tightly plugged, and thoroughly agitate the catalyst. Dissolved in.

  When 1 mL of the Ni catalyst solution represented by the following chemical formula (A) is accurately weighed with a syringe and quantitatively injected into the vial bottle in which the above two types of norbornene are dissolved and stirred at room temperature for 1 hour, a marked increase in viscosity occurs. Was confirmed. At this point, the stopper was removed, 60 g of tetrahydrofuran (THF) was added, and the mixture was stirred to obtain a reaction solution.

  In a 100 mL beaker, 9.5 g of acetic anhydride, 18 g of hydrogen peroxide (concentration 30%) and 30 g of ion-exchanged water were added and stirred to prepare an aqueous solution of peracetic acid on the spot. Next, the total amount of this aqueous solution was added to the above reaction solution and stirred for 12 hours to reduce Ni.

  Next, the treated reaction solution was transferred to a separatory funnel, the lower aqueous layer was removed, and then 100 mL of a 30% aqueous solution of isopropyl alcohol was added and vigorously stirred. The aqueous layer was removed after standing and completely separating the two layers. After repeating this water washing process three times in total, the oil layer was dropped into a large excess of acetone to reprecipitate the polymer produced, separated from the filtrate by filtration, and then in a vacuum dryer set at 60 ° C. Polymer # 1 was obtained by heating and drying for 12 hours. The molecular weight distribution of the polymer # 1 was Mw = 100,000 and Mn = 40,000 by GPC measurement. The molar ratio of each structural unit in polymer # 1 was 50 mol% for the hexylnorbornene structural unit and 50 mol% for the diphenylmethylnorbornenemethoxysilane structural unit, as determined by NMR.

(2) Manufacture of composition (2-1) Manufacture of composition for core layer formation 10 g of the above-mentioned polymer # 1 was weighed into a 100 mL glass container, and 40 g of mesitylene and an antioxidant Irganox 1076 (manufactured by Ciba Geigy) ) 0.01 g, cyclohexyl oxetane monomer (monomer represented by the formula (20), manufactured by Toa Gosei CHOX, CAS # 483303-25-9, molecular weight 186, boiling point 125 ° C./1.33 kPa) 2 g, polymerization initiator (photoacid) Generating Agent) Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS # 178233-72-2) (1.36E-2 g in 0.1 mL of ethyl acetate) was added and dissolved uniformly, and then filtered through a 0.2 μm PTFE filter. A clean photosensitive resin composition was obtained.

(2-2) Manufacture of the composition for clad layer formation As the composition for clad layer formation, the photosensitive norbornene resin composition (Avatrel 2000P varnish by Promeras) was prepared.

(3) Manufacture of optical waveguide (manufacture of base material)
A composition for forming a clad layer was uniformly applied on a polyethersulfone (PES) film by a doctor blade, and then placed in a dryer at 45 ° C. for 15 minutes to form a clad layer forming layer. The formed cladding layer forming layer had a thickness of 5 μm and was colorless and transparent.

  Next, the core layer forming composition was uniformly applied on the formed clad layer forming layer with a doctor blade, and then placed in a dryer at 45 ° C. for 15 minutes to completely remove the solvent.

  The base material for manufacturing the optical waveguide was obtained by alternately coating the clad layer forming layer and the core layer forming layer as described above. The core layer forming layer had a thickness of 50 μm.

  The refractive index of the core part is 1.553, the refractive index of the cladding part (average of the refractive index of the side cladding part and the refractive index of the cladding layer) is 1.530, the refractive index of the end cladding part is 1.540, low. The refractive index of the refractive index layer was 1.536.

(exposure)
Next, a photomask was pressed on the upper surface of the base material, and ultraviolet rays were selectively irradiated at 500 mJ / cm ² . The mask was removed, and heating was performed at 150 ° C. in a dryer for 1.5 hours. Note that a photomask having an opening corresponding to a low refractive index region such as a side clad portion and an end clad portion shown in FIGS. Thereby, the laminated body for manufacturing an optical waveguide was obtained. In the core layer in the obtained laminate, the width of the side cladding portion was 80 μm, and the thickness of the low refractive index layer was 5 μm. The width of the core portion was 50 μm.

(Concave processing)
Subsequently, the recessed part shown in FIG. 2 was formed with respect to the laminated body by laser processing. As a result, an optical waveguide with a mirror that converts the optical path by 90 degrees was obtained. In addition, the length of the obtained optical waveguide was 10 cm, and the length between mirrors was made the same about any optical waveguide mentioned later.

(Example 2)
An optical waveguide was obtained in the same manner as in Example 1 except that the thickness of the low refractive index layer was changed to 1 μm.

(Example 3)
An optical waveguide was obtained in the same manner as in Example 1 except that the thickness of the low refractive index layer was changed to 10 μm.

Example 4
An optical waveguide was obtained in the same manner as in Example 1 except that the thickness of the low refractive index layer was changed to 20 μm.

(Example 5)
An optical waveguide was obtained in the same manner as in Example 1 except that the thickness of the low refractive index layer was changed to 25 μm.

(Example 6)
An optical waveguide was obtained in the same manner as in Example 1 except that the thickness of the low refractive index layer was changed to 0.5 μm.

(Examples 7 to 11)
An optical waveguide was obtained in the same manner as in Example 1 except that exposure was performed by changing the amount of ultraviolet irradiation. As a result, the refractive index of each part of the optical waveguide could be changed from that in Example 1. Specifically, the refractive index difference between the end surface cladding portion and the low refractive index layer can be reduced by reducing the amount of ultraviolet irradiation, and the end surface cladding portion and the low refractive index can be reduced by increasing the amount of ultraviolet irradiation. The difference in refractive index from the refractive index layer could be increased.

(Comparative example)
An optical waveguide was obtained in the same manner as in Example 1 except that the formation of the compensation layer and the low refractive index layer were omitted. A cross-sectional view of the obtained optical waveguide is shown in FIG. In the optical waveguide 8 shown in FIG. 14, a clad layer 81, a core layer 83, and a clad layer 82 are laminated in this order from the lower side, and the core layer 83 has the same conditions as the optical waveguide obtained in the first embodiment. The core part and the side cladding part are formed. Moreover, the recessed part 84 is formed similarly to the optical waveguide obtained in Example 1. FIG.

(Reference Example 1)
An optical waveguide was obtained in the same manner as in the comparative example, except that the same low refractive index layer as in Example 1 was added to the optical waveguide 8 shown in FIG.

(Reference Example 2)
An optical waveguide was obtained in the same manner as in the comparative example except that the same end face cladding as in Example 1 was added to the core layer 83 of the optical waveguide 8 shown in FIG.

2. Evaluation of optical waveguide 2.1. Evaluation of insertion loss of optical waveguide Light emitted from an 850 nm VCSEL (surface emitting laser) is introduced into the optical waveguide obtained in Examples, Comparative Examples and Reference Example via a 50 μmφ optical fiber, and received by an optical fiber of 200 μmφ. The light intensity was measured. The insertion loss method was used for the measurement. And the relative value when the insertion loss of the optical waveguide obtained by the comparative example was set to 1 was calculated | required, and this was evaluated according to the following evaluation criteria.

<Evaluation criteria for insertion loss>
AA: The relative value of insertion loss is less than 0.3 A: The relative value of insertion loss is 0.3 or more and less than 0.5 B: The relative value of insertion loss is 0.5 or more and less than 0.7 C: Relative value of insertion loss is 0.7 or more and less than 0.9 D: Relative value of insertion loss is 0.9 or more and less than 1 E: Relative value of insertion loss is 1 or more

2.2. Evaluation of Transmission Loss of Optical Waveguide After evaluating the insertion loss, the optical waveguide transmission loss (unit: dB / cm) was measured by the cut-back method by cutting off the vicinity of the mirror of the optical waveguide and making them all the same length.
The results are shown in Table 1.

  As is clear from Table 1, it was confirmed that the optical waveguides obtained in each example had a lower insertion loss than the optical waveguides obtained in the comparative examples.

  Further, the transmission loss was almost the same except for the optical waveguides obtained in Examples 1, 4, 5 and the comparative example. In addition, the transmission loss of the optical waveguides obtained in Examples 4 and 5 and the comparative example was about 20% larger than the other ones. In addition, the transmission loss of the optical waveguide obtained in Example 1 was about 20% smaller than the other ones.

  From the above results, even if the difference in transmission loss is subtracted, the optical waveguide obtained in each example has a lower loss at the coupling portion with the optical fiber than the optical waveguide obtained in the comparative example and the reference example. It is inferred that Therefore, it can be said that the optical waveguide obtained in each example has high optical coupling efficiency with respect to the light receiving and emitting elements.

DESCRIPTION OF SYMBOLS 1 Optical waveguide 10 Optical waveguide module 111, 112, 113 Clad layer 13, 131, 132 Core layer 14 Core part 145 Low refractive index layer 15a Side surface clad part 15b End surface clad part 160, 1601, 1602, 1603, 1604 Recessed part 161, 162 , 1611, 1612, 1613, 1614 Mirror 18 mating hole 70 optical fiber 71 light emitting element 710 element body 711 light emitting part 712 electrode 72 light receiving element 720 element body 721 light receiving part 722 electrode 73 light emitting optical fiber connector 731 connector body 732 through hole 733 Joint pin 74 Optical fiber connector for light reception 741 Connector body 742 Through hole 743 Mating pin 75 Electrical wiring 76 Bump 79 Underfill 8 Optical waveguide 81, 82 Clad layer 8 Core layer 84 Recess 901, 902 Composition 911, 912 Layer 915 Polymer 920 Additive 925 Irradiation area 930 Actinic radiation 935 Mask 9351 Opening 940 Non-irradiation area 951 Support substrate 960 Base material 970 Laminate 2 Support film 3 Cover film 1A Light incidence End 1B Light exit end M1 Intersection L1, L2 Light trace H High refractive index region L Low refractive index region W Refractive index distribution

Claims (10)

The core,
An end surface cladding portion provided on an extension line in the extending direction of the core portion, and having a lower refractive index than the core portion;
A low refractive index layer provided between the core portion and the end surface clad portion on the extension line in the extending direction of the core portion, and having a lower refractive index than the end surface clad portion;
It is provided in the end surface clad part, and is constituted by an interface where a constituent material of the end face clad part and a material having a lower refractive index are adjacent to each other, and the optical path of the core part is directed to the outside of the core part by light reflection. A light reflecting surface to convert ;
Have,
The low refractive index layer has a thickness of 1 to 20 μm,
An optical waveguide , wherein a difference in refractive index between the low refractive index layer and the end surface clad portion is 0.003 to 0.03 .   2. The optical waveguide according to claim 1, wherein the extension direction of the low refractive index layer is an angle of 80 to 100 ° with respect to the extension direction of the core portion.   The optical waveguide according to claim 1, wherein the light reflecting surface is provided such that an edge thereof is positioned in the vicinity of the low refractive index layer. The optical waveguide according to any one of claims 1 to 3 has the low refractive index layer of two or more per one said core portion. When the direction orthogonal to the extending direction of the core portion is the width direction, and the length in the width direction of the light reflection surface is the width of the light reflection surface,
5. The optical waveguide according to claim 1, wherein a width of the light reflecting surface is wider than a width of the core portion. The optical waveguide according to claim 1, wherein the low refractive index layer is configured such that a change in refractive index in the thickness direction is continuous. A core layer comprising: the core portion; a side cladding portion adjacent to a side surface of the core portion; and the end surface cladding portion;
A clad layer laminated on at least one surface of the core layer and having a refractive index lower than that of the core portion;
Said interface, said cladding layer and the optical waveguide according to any one of the end surface cladding portion claims 1 is provided so as to penetrate the 6. The optical waveguide according to claim 7, wherein the end surface clad portion and the side surface clad portion are made of materials having the same composition. Opto-electric hybrid board, characterized in that it comprises an optical waveguide according to any one of claims 1 to 8.   An electronic apparatus comprising the opto-electric hybrid board according to claim 9.

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