JP5735226B2 - 蒸着装置及び蒸着方法 - Google Patents
蒸着装置及び蒸着方法 Download PDFInfo
- Publication number
- JP5735226B2 JP5735226B2 JP2010161679A JP2010161679A JP5735226B2 JP 5735226 B2 JP5735226 B2 JP 5735226B2 JP 2010161679 A JP2010161679 A JP 2010161679A JP 2010161679 A JP2010161679 A JP 2010161679A JP 5735226 B2 JP5735226 B2 JP 5735226B2
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- JP
- Japan
- Prior art keywords
- vapor
- evaporation
- diffusion
- steam
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000007740 vapor deposition Methods 0.000 title claims description 54
- 238000000034 method Methods 0.000 title claims description 11
- 238000001704 evaporation Methods 0.000 claims description 190
- 230000008020 evaporation Effects 0.000 claims description 174
- 239000000463 material Substances 0.000 claims description 157
- 238000009792 diffusion process Methods 0.000 claims description 92
- 239000010408 film Substances 0.000 claims description 55
- 238000004891 communication Methods 0.000 claims description 48
- 239000002019 doping agent Substances 0.000 claims description 42
- 230000015572 biosynthetic process Effects 0.000 claims description 23
- 239000003086 colorant Substances 0.000 claims description 22
- 238000005192 partition Methods 0.000 claims description 20
- 239000010409 thin film Substances 0.000 claims description 13
- 239000011368 organic material Substances 0.000 claims description 8
- 239000011364 vaporized material Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- 238000007599 discharging Methods 0.000 claims description 4
- 238000009834 vaporization Methods 0.000 claims 2
- 230000008016 vaporization Effects 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 46
- 239000012044 organic layer Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
Images
Landscapes
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010161679A JP5735226B2 (ja) | 2010-07-16 | 2010-07-16 | 蒸着装置及び蒸着方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010161679A JP5735226B2 (ja) | 2010-07-16 | 2010-07-16 | 蒸着装置及び蒸着方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012021209A JP2012021209A (ja) | 2012-02-02 |
| JP2012021209A5 JP2012021209A5 (enExample) | 2013-07-04 |
| JP5735226B2 true JP5735226B2 (ja) | 2015-06-17 |
Family
ID=45775695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010161679A Active JP5735226B2 (ja) | 2010-07-16 | 2010-07-16 | 蒸着装置及び蒸着方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5735226B2 (enExample) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2595744Y2 (ja) * | 1992-05-12 | 1999-06-02 | 宮城沖電気株式会社 | 半導体製造装置 |
| CH687258A5 (de) * | 1993-04-22 | 1996-10-31 | Balzers Hochvakuum | Gaseinlassanordnung. |
| JP4239520B2 (ja) * | 2002-08-21 | 2009-03-18 | ソニー株式会社 | 成膜装置およびその製造方法、並びにインジェクタ |
| JP4450589B2 (ja) * | 2003-09-09 | 2010-04-14 | 株式会社アルバック | 成膜装置 |
| JP2006111926A (ja) * | 2004-10-15 | 2006-04-27 | Hitachi Zosen Corp | 蒸着装置 |
| JP2006225758A (ja) * | 2005-01-21 | 2006-08-31 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| JP4797438B2 (ja) * | 2005-05-17 | 2011-10-19 | ソニー株式会社 | 有機電界発光素子および表示装置 |
| JP5043394B2 (ja) * | 2006-09-29 | 2012-10-10 | 東京エレクトロン株式会社 | 蒸着装置およびその運転方法 |
| JP2008184666A (ja) * | 2007-01-30 | 2008-08-14 | Phyzchemix Corp | 成膜装置 |
| JP5081710B2 (ja) * | 2008-04-28 | 2012-11-28 | 株式会社アルバック | 成膜装置 |
-
2010
- 2010-07-16 JP JP2010161679A patent/JP5735226B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012021209A (ja) | 2012-02-02 |
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