JP5734702B2 - Wire tool - Google Patents

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JP5734702B2
JP5734702B2 JP2011040679A JP2011040679A JP5734702B2 JP 5734702 B2 JP5734702 B2 JP 5734702B2 JP 2011040679 A JP2011040679 A JP 2011040679A JP 2011040679 A JP2011040679 A JP 2011040679A JP 5734702 B2 JP5734702 B2 JP 5734702B2
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wire
abrasive grains
resin layer
fixed
plating layer
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JP2012176459A (en
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彰弘 川原
彰弘 川原
庸市 近藤
庸市 近藤
隆 岩隈
隆 岩隈
高尾 博哲
博哲 高尾
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Noritake Co Ltd
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Description

本発明は、太陽電池シリコン、半導体シリコン、磁性体、サファイヤあるいはSiCなどのインゴットをスライス加工する際に使用されるワイヤ工具に関する。   The present invention relates to a wire tool used when slicing an ingot such as solar cell silicon, semiconductor silicon, magnetic material, sapphire, or SiC.

ワイヤ工具は、レジンワイヤ工具と電着ワイヤ工具とに大別される。図4(a)に示すように、レジンワイヤ工具40は、砥粒41が合成樹脂層42を介してワイヤ43の外周面に固着され、図5(a)に示すように、電着ワイヤ工具50は、砥粒51が鍍金層52を介してワイヤ53の外周面に固着されている。   Wire tools are roughly classified into resin wire tools and electrodeposition wire tools. As shown in FIG. 4A, in the resin wire tool 40, the abrasive grains 41 are fixed to the outer peripheral surface of the wire 43 through the synthetic resin layer 42. As shown in FIG. The abrasive grains 51 are fixed to the outer peripheral surface of the wire 53 through the plating layer 52.

レジンワイヤ工具40は、ワイヤ43の外周面が合成樹脂層42によって被覆されているため、被柔軟性が高く、捩れに起因する断線が発生し難く、加工性能が安定している。また、図4(b)に示すように、矢線40a方向へ進行しながら切削加工を行うレジンワイヤ工具40の砥粒41は、切削加工中に被加工物44から受ける抗力によって矢線41h,41v方向へ微小変位可能であるため、被加工物44の加工面の面粗さが良好で、加工精度も高いなどの点で優れているが、砥粒保持力が弱く、加工効率が低い。   Since the outer peripheral surface of the wire 43 is covered with the synthetic resin layer 42, the resin wire tool 40 has high flexibility, hardly breaks due to twisting, and has stable machining performance. Further, as shown in FIG. 4B, the abrasive grains 41 of the resin wire tool 40 that performs the cutting while proceeding in the direction of the arrow 40a are indicated by the arrows 41h and 41v due to the drag received from the workpiece 44 during the cutting. Since it can be displaced slightly in the direction, it is excellent in that the processed surface of the workpiece 44 has good surface roughness and high processing accuracy, but the abrasive holding power is weak and the processing efficiency is low.

一方、電着ワイヤ工具50は、砥粒51が鍍金層52により強く固着されているため、砥粒保持力が強く、図5(b)に示すように、矢線50a方向へ進行しながら切削加工を行う電着ワイヤ工具50の砥粒51が切削加工中に被加工物44から抗力を受けても、砥粒51が微小変位し難く、加工効率が高いという利点がある。   On the other hand, the electrodeposition wire tool 50 has a strong abrasive grain holding force because the abrasive grains 51 are firmly fixed to the plating layer 52, and as shown in FIG. Even if the abrasive grains 51 of the electrodeposited wire tool 50 to be processed receive a drag force from the workpiece 44 during the cutting process, the abrasive grains 51 are not easily displaced minutely, and there is an advantage that the machining efficiency is high.

単結晶インゴットの切削加工においては、加工面の面粗度が良好であって加工精度が高いことが要請され、多結晶インゴットの切削加工においては、高い加工性能が要請されている。そこで、鍍金層及び樹脂層によって砥粒がワイヤ外周面に固着されたワイヤ工具が提案されている(例えば、特許文献1参照。)。   In the cutting of a single crystal ingot, it is required that the surface roughness is good and the processing accuracy is high, and in the cutting of a polycrystalline ingot, high processing performance is required. In view of this, a wire tool in which abrasive grains are fixed to a wire outer peripheral surface by a plating layer and a resin layer has been proposed (for example, see Patent Document 1).

特開2004−50301号公報JP 2004-50301 A

特許文献1記載のワイヤーソーは、電着ワイヤ工具及びレジンワイヤ工具の長所を兼備することを目的として開発されたものであるが、超砥粒は実質的に電着層によってワイヤ外周面に固着されているため、加工面の面粗さが良好でない。また、砥粒が樹脂層で覆われているため、砥粒の突き出し量が減り、加工効率が悪化する場合がある。   The wire saw described in Patent Document 1 was developed for the purpose of combining the advantages of an electrodeposition wire tool and a resin wire tool, but the superabrasive grains are substantially fixed to the outer peripheral surface of the wire by the electrodeposition layer. Therefore, the surface roughness of the processed surface is not good. Moreover, since the abrasive grains are covered with the resin layer, the protruding amount of the abrasive grains may be reduced, and the processing efficiency may be deteriorated.

本発明が解決しようとする課題は、加工効率が高く、加工面の面粗度も良好なワイヤ工具を提供することにある。   The problem to be solved by the present invention is to provide a wire tool having high machining efficiency and good surface roughness.

本発明のワイヤ工具は、ワイヤの外周面を覆う鍍金層で固着されたバックアップ用の粒状体と、前記鍍金層を覆う樹脂層で固着された砥粒と、を備え、前記砥粒はワイヤ進行方向と反対方向に位置する前記粒状体に接触した状態にあり、前記鍍金層と前記砥粒との間に砥粒を含まない緩衝樹脂層を設けたことを特徴とする。 The wire tool of the present invention includes a backup granular material fixed by a plating layer covering an outer peripheral surface of a wire, and abrasive grains fixed by a resin layer covering the plating layer, and the abrasive grains are wire-advancing. A buffer resin layer that is in contact with the granular material located in a direction opposite to the direction and does not include abrasive grains is provided between the plating layer and the abrasive grains .

このような構成とすれば、ワイヤ外周面を覆う鍍金層で粒状体が強固に固着され、鍍金層を覆う樹脂層で砥粒が固着されたことにより、切削加工中、被加工物から受ける抗力によって生じる、ワイヤ進行方向と反対方向への砥粒の微小変位は、鍍金層で固着された粒状体でバックアップされるため、切削力の低下が発生せず、高い加工効率を発揮する。また、被加工物から受ける抗力で生じるワイヤ軸心に接近する方向の砥粒の微小変位は樹脂層によって適度に維持されるため、加工面の面粗度も良好となる。   With such a configuration, the granular material is firmly fixed by the plating layer covering the outer peripheral surface of the wire, and the abrasive force is fixed by the resin layer covering the plating layer, so that the drag received from the workpiece during the cutting process The fine displacement of the abrasive grains in the direction opposite to the wire traveling direction caused by the above is backed up by the granular material fixed by the plating layer, so that the cutting force does not decrease and high processing efficiency is exhibited. Further, since the fine displacement of the abrasive grains in the direction approaching the wire axis caused by the drag received from the workpiece is appropriately maintained by the resin layer, the surface roughness of the processed surface is also improved.

また、前記樹脂層に、無機材料若しくは金属材料のフィラーを混在させた構成とすることもできる。   Moreover, it can also be set as the structure which mixed the filler of the inorganic material or the metal material in the said resin layer.

このような構成とすれば、樹脂層にフィラーが存在することにより、切削加工中、樹脂層で固着された砥粒に加わる荷重をフィラーに分散させることができ、ワイヤ工具によって加工面に持ち込まれる切削液も増えるので、加工面の面粗度向上に有効である。   With such a configuration, since the filler exists in the resin layer, the load applied to the abrasive grains fixed by the resin layer can be dispersed in the filler during the cutting process, and is brought into the processing surface by the wire tool. Since cutting fluid also increases, it is effective in improving the surface roughness of the machined surface.

さらに、本発明のワイヤ工具では、前記鍍金層と前記砥粒との間に砥粒を含まない緩衝樹脂層を設けている。
Furthermore, a wire tool of the present invention, Ru Tei provided buffer resin layer containing no abrasive grain between the abrasive grains and the plating layer.

このような構成とすれば、樹脂層で固着された砥粒が、被加工物から受ける抗力によって生じるワイヤ軸心に接近する方向の微小変位を、緩衝樹脂層によって増加させることができるため、加工面の面粗度向上に有効である。   With such a configuration, the buffer resin layer can increase the minute displacement in the direction in which the abrasive grains fixed on the resin layer approach the wire axis caused by the drag received from the workpiece. Effective for improving surface roughness.

一方、前記ワイヤの長手方向に隣り合う前記粒状体と前記砥粒との隙間を前記砥粒の外径より小とすることができる。   On the other hand, the clearance gap between the said granular material adjacent to the longitudinal direction of the said wire and the said abrasive grain can be made smaller than the outer diameter of the said abrasive grain.

このような構成とすれば、切削加工中に、砥粒が被加工物から受ける抗力によって生じる、ワイヤ進行方向の砥粒の微小変位を抑制することができるので、加工効率の向上に有効である。   With such a configuration, it is possible to suppress minute displacement of the abrasive grains in the wire traveling direction caused by the drag that the abrasive grains receive from the workpiece during cutting, which is effective in improving machining efficiency. .

また、前記鍍金層で固着された粒状体の個数より、前記樹脂層で固着された砥粒の個数を大とすることもできる。   Further, the number of abrasive grains fixed by the resin layer can be made larger than the number of granules fixed by the plating layer.

このような構成とすれば、樹脂層で固着された砥粒による切削が主となるため、加工面の面粗度の向上に有効である。   With such a configuration, cutting with abrasive grains fixed by the resin layer is mainly performed, which is effective in improving the surface roughness of the processed surface.

さらに、前記鍍金層で固着された粒状体の粒径より、前記樹脂層で固着された砥粒の粒径を小とすることもできる。   Furthermore, the particle size of the abrasive grains fixed by the resin layer can be made smaller than the particle size of the granular material fixed by the plating layer.

このような構成とすれば、樹脂層で固着された砥粒の先端を揃えることができるので、加工面の面粗度の向上に有効である。   With such a configuration, the tips of the abrasive grains fixed by the resin layer can be aligned, which is effective in improving the surface roughness of the processed surface.

本発明により、加工効率が高く、加工面の面粗度も良好なワイヤ工具を提供することができる。   According to the present invention, it is possible to provide a wire tool having high machining efficiency and good surface roughness.

本発明の第一実施形態であるワイヤ工具を示す一部省略断面図である。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a partially omitted cross-sectional view illustrating a wire tool that is a first embodiment of the present invention. 本発明の第二実施形態であるワイヤ工具を示す一部省略断面図である。It is a partially-omission sectional drawing which shows the wire tool which is 2nd embodiment of this invention. 本発明の第三実施形態であるワイヤ工具を示す一部省略断面図である。It is a partially abbreviated sectional view showing a wire tool which is a third embodiment of the present invention. 従来のレジンワイヤ工具を示す一部省略断面図である。It is a partially omitted sectional view showing a conventional resin wire tool. 従来の電着ワイヤ工具を示す一部省略断面図である。It is a partially omitted sectional view showing a conventional electrodeposition wire tool.

図1に基づいて、本発明の第一実施形態であるワイヤ工具10について説明する。図1に示すように、ワイヤ工具10は、ワイヤ11の外周面を覆う鍍金層12で固着されたバックアップ用の粒状体13と、鍍金層12を覆う合成樹脂層14で固着された砥粒15とを備えている。鍍金層12と砥粒15との間には、砥粒15を含まない緩衝樹脂層16が設けられている。   Based on FIG. 1, the wire tool 10 which is 1st embodiment of this invention is demonstrated. As shown in FIG. 1, the wire tool 10 includes a backup granule 13 fixed with a plating layer 12 covering the outer peripheral surface of the wire 11, and abrasive grains 15 fixed with a synthetic resin layer 14 covering the plating layer 12. And. Between the plating layer 12 and the abrasive grains 15, a buffer resin layer 16 that does not include the abrasive grains 15 is provided.

ワイヤ11の長手方向に隣り合う粒状体13と砥粒15との隙間17は砥粒15の外径より小さく設定され、特に、本実施形態では粒状体13と砥粒15とが接触しているため隙間17がほぼゼロに等しい。ワイヤ11はピアノ線であり、鍍金層12はニッケル鍍金で形成され、合成樹脂層14は熱硬化性樹脂で形成され、粒状体13及び砥粒15はダイヤモンド粒であるが、これらに限定するものではない。   A gap 17 between the granular material 13 adjacent to the longitudinal direction of the wire 11 and the abrasive grain 15 is set to be smaller than the outer diameter of the abrasive grain 15. In particular, in this embodiment, the granular body 13 and the abrasive grain 15 are in contact with each other. Therefore, the gap 17 is almost equal to zero. The wire 11 is a piano wire, the plating layer 12 is formed of nickel plating, the synthetic resin layer 14 is formed of a thermosetting resin, and the granular body 13 and the abrasive grains 15 are diamond grains, but are not limited thereto. is not.

図1に示すように、ワイヤ工具10を矢線X方向に移動させながら被加工物18を切削加工するとき、砥粒15は被加工物18から矢線Xと反対方向への抗力を受けるが、ワイヤ11の外周面を覆う鍍金層12で粒状体13が強固に固着され、鍍金層12を覆う合成樹脂層14で砥粒15が固着され、且つ、各砥粒15はワイヤ進行方向(矢線X方向)と反対方向に位置する粒状体13に接触した状態にあるため、ワイヤ進行方向と反対方向への各砥粒15の微小変位が発生し難い。   As shown in FIG. 1, when the workpiece 18 is cut while moving the wire tool 10 in the direction of the arrow X, the abrasive grains 15 receive a drag force in the direction opposite to the arrow X from the workpiece 18. The granular material 13 is firmly fixed by the plating layer 12 covering the outer peripheral surface of the wire 11, the abrasive grains 15 are fixed by the synthetic resin layer 14 covering the plating layer 12, and each abrasive grain 15 has a wire traveling direction (arrow). Since it is in a state of being in contact with the granular material 13 located in the direction opposite to the direction of the line X), it is difficult for minute displacement of each abrasive grain 15 in the direction opposite to the wire traveling direction.

即ち、切削加工中、被加工物18から砥粒15が受ける抗力によって生じる、ワイヤ進行方向(矢線X方向)と反対方向への砥粒15の微小変位は、鍍金層12で固着された粒状体13でバックアップされることによって、最小限に抑制されるため、切削力の低下が発生せず、ワイヤ工具10は高い加工効率を発揮する。   That is, during the cutting process, the minute displacement of the abrasive grains 15 in the direction opposite to the wire traveling direction (arrow X direction) caused by the drag received by the abrasive grains 15 from the workpiece 18 is the granularity fixed by the plating layer 12. By being backed up by the body 13, it is suppressed to the minimum, so that the cutting force does not decrease, and the wire tool 10 exhibits high machining efficiency.

一方、切削加工中、被加工物18から砥粒15が受ける抗力によって生じるワイヤ11軸心に接近する方向(矢線Y方向)への砥粒15の微小変位は合成樹脂層14によって適度に維持されるため、被加工物18の加工面の面粗度は良好となる。   On the other hand, during the cutting process, the minute displacement of the abrasive grains 15 in the direction approaching the axis of the wire 11 (in the direction of the arrow Y) generated by the drag received by the abrasive grains 15 from the workpiece 18 is appropriately maintained by the synthetic resin layer 14. Therefore, the surface roughness of the processed surface of the workpiece 18 is good.

また、ワイヤ工具10において、鍍金層12と砥粒15との間に砥粒15を含まない緩衝樹脂層16を設けたことにより、合成樹脂層14で固着された砥粒15が、被加工物18から受ける抗力によって生じるワイヤ11軸心に接近する方向(矢線Y方向)の微小変位を、緩衝樹脂層16によって増加させることができるため、被加工物18の加工面の面粗度向上に有効である。   Further, in the wire tool 10, by providing the buffer resin layer 16 that does not include the abrasive grains 15 between the plating layer 12 and the abrasive grains 15, the abrasive grains 15 fixed by the synthetic resin layer 14 can be processed. The minute displacement in the direction approaching the axis of the wire 11 (arrow Y direction) generated by the drag received from 18 can be increased by the buffer resin layer 16, so that the surface roughness of the processed surface of the workpiece 18 is improved. It is valid.

さらに、前述したように、ワイヤ11の長手方向に隣り合う粒状体13と砥粒15との隙間17を砥粒15の外径より小(ほぼゼロ)としたことにより、切削加工中に、砥粒15が被加工物18から受ける抗力によって生じる、ワイヤ11の進行方向(矢線X方向)と反対方向への砥粒15の微小変位が抑制されるので、加工効率の向上に有効である。   Further, as described above, the gap 17 between the granular material 13 adjacent to the longitudinal direction of the wire 11 and the abrasive grains 15 is made smaller (almost zero) than the outer diameter of the abrasive grains 15, so Since the fine displacement of the abrasive grains 15 in the direction opposite to the traveling direction (arrow X direction) of the wire 11 caused by the drag force that the grains 15 receive from the workpiece 18 is suppressed, it is effective in improving the processing efficiency.

ワイヤ工具10においては、鍍金層12で固着された粒状体13の個数と、合成樹脂層14で固着された砥粒15の個数とを略同数としているが、これに限定しないので、鍍金層12で固着された粒状体13の個数より、合成樹脂層14で固着された砥粒15の個数を大とすることもできる。粒状体13の個数よりも砥粒15の個数を大とすれば、切削加工中、合成樹脂層14で固着された砥粒15による切削が主となるため、被加工物の加工面の面粗度の向上に有効である。   In the wire tool 10, the number of the granular bodies 13 fixed by the plating layer 12 and the number of the abrasive grains 15 fixed by the synthetic resin layer 14 are substantially the same, but the present invention is not limited to this. The number of the abrasive grains 15 fixed by the synthetic resin layer 14 can be made larger than the number of the granular bodies 13 fixed by. If the number of the abrasive grains 15 is larger than the number of the granular bodies 13, since the cutting with the abrasive grains 15 fixed by the synthetic resin layer 14 is mainly performed during the cutting process, the surface roughness of the processed surface of the workpiece is increased. It is effective in improving the degree.

次に、図2に基づいて本発明の第二実施形態であるワイヤ工具20について説明する。図2に示すように、ワイヤ工具20は、ワイヤ21の外周面を覆う鍍金層22で固着されたバックアップ用の粒状体23と、鍍金層22を覆う合成樹脂層24で固着された砥粒25とを備え、合成樹脂層24にフィラー26が混在している。   Next, the wire tool 20 which is 2nd embodiment of this invention is demonstrated based on FIG. As shown in FIG. 2, the wire tool 20 includes a backup granule 23 fixed by a plating layer 22 covering the outer peripheral surface of the wire 21, and abrasive grains 25 fixed by a synthetic resin layer 24 covering the plating layer 22. The filler 26 is mixed in the synthetic resin layer 24.

ワイヤ21の長手方向に隣り合う粒状体23と砥粒25との隙間27は砥粒15の外径より小さく、ほぼゼロに設定されている。ワイヤ21はピアノ線であり、鍍金層22はニッケル鍍金で形成され、合成樹脂層24は熱硬化性樹脂で形成され、粒状体23は及び砥粒25はダイヤモンド粒であり、フィラー26はシリカ(酸化ケイ素)であるが、これらに限定するものではない。   A gap 27 between the granular material 23 adjacent to the longitudinal direction of the wire 21 and the abrasive 25 is smaller than the outer diameter of the abrasive 15 and is set to almost zero. The wire 21 is a piano wire, the plating layer 22 is formed of nickel plating, the synthetic resin layer 24 is formed of a thermosetting resin, the granular material 23 and the abrasive grains 25 are diamond grains, and the filler 26 is silica ( Silicon oxide), but is not limited thereto.

図2に示すように、ワイヤ工具20を矢線X方向に移動させながら被加工物28を切削加工するとき、図1に示すワイヤ工具10の場合と同様、砥粒25は被加工物28から矢線Xと反対方向への抗力を受けるが、ワイヤ21の外周面を覆う鍍金層22で粒状体23が強固に固着され、鍍金層22を覆う合成樹脂層24で砥粒25が固着され、且つ、各砥粒25はワイヤ進行方向(矢線X方向)と反対方向に位置する粒状体23に接触した状態にあるため、各砥粒25はワイヤ進行方向(矢線X方向)と反対方向へ微小変位し難い。このため、ワイヤ工具20は、切削力の低下が発生せず、高い加工効率を発揮する。   As shown in FIG. 2, when cutting the workpiece 28 while moving the wire tool 20 in the direction of the arrow X, the abrasive grains 25 are separated from the workpiece 28 as in the case of the wire tool 10 shown in FIG. 1. Although subjected to a drag in the direction opposite to the arrow X, the granular material 23 is firmly fixed by the plating layer 22 covering the outer peripheral surface of the wire 21, and the abrasive grains 25 are fixed by the synthetic resin layer 24 covering the plating layer 22, And since each abrasive grain 25 exists in the state which contacted the granular material 23 located in the opposite direction to a wire advancing direction (arrow X direction), each abrasive grain 25 is a direction opposite to a wire advancing direction (arrow X direction). Difficult to move slightly. For this reason, the wire tool 20 exhibits high machining efficiency without causing a reduction in cutting force.

一方、切削加工中、被加工物28から砥粒25が受ける抗力によって生じるワイヤ21軸心に接近する方向(矢線Y方向)への砥粒25の微小変位は合成樹脂層24によって適度に維持されるため、被加工物28の加工面の面粗度は良好となる。   On the other hand, during the cutting process, the minute displacement of the abrasive grains 25 in the direction approaching the axis of the wire 21 (arrow Y direction) generated by the drag received by the abrasive grains 25 from the workpiece 28 is appropriately maintained by the synthetic resin layer 24. Therefore, the surface roughness of the processed surface of the workpiece 28 is good.

さらに、ワイヤ工具20においては、合成樹脂層24にフィラー26を混在させたことにより、切削加工中、合成樹脂層24によって固着された砥粒25に加わる荷重を多数のフィラー26に分散させることができるだけでなく、ワイヤ工具20によって加工面に持ち込まれる切削液も増えるので、加工面の面粗度が向上する。なお、フィラー26としては、前記シリカ(酸化ケイ素)のほかに、SiC,Al,ダイヤモンド、cBN、ガラスなどの無機材料あるいは金属材料を使用することもできる。 Further, in the wire tool 20, the filler 26 is mixed in the synthetic resin layer 24, whereby the load applied to the abrasive grains 25 fixed by the synthetic resin layer 24 can be dispersed in a large number of fillers 26 during the cutting process. Not only can the cutting fluid brought into the machining surface by the wire tool 20 increase, but the surface roughness of the machining surface is improved. In addition to the silica (silicon oxide), the filler 26 may be made of an inorganic material such as SiC, Al 2 O 3 , diamond, cBN, glass, or a metal material.

次に、図3に基づいて本発明の第三実施形態であるワイヤ工具30について説明する。図3に示すように、ワイヤ工具30は、ワイヤ31の外周面を覆う鍍金層32で固着されたバックアップ用の粒状体33と、鍍金層32を覆う合成樹脂層34で固着された砥粒35とを備え、鍍金層32で固着された粒状体33の粒径より、合成樹脂層34で固着された砥粒35の粒径を小としている。   Next, the wire tool 30 which is 3rd embodiment of this invention is demonstrated based on FIG. As shown in FIG. 3, the wire tool 30 includes a backup granule 33 fixed by a plating layer 32 covering the outer peripheral surface of the wire 31 and an abrasive grain 35 fixed by a synthetic resin layer 34 covering the plating layer 32. The particle size of the abrasive grains 35 fixed by the synthetic resin layer 34 is smaller than the particle size of the granular material 33 fixed by the plating layer 32.

ワイヤ31の長手方向に隣り合う粒状体33と砥粒35との隙間37は砥粒35の外径より小さく、ほぼゼロに設定されている。ワイヤ31はピアノ線であり、鍍金層32はニッケル鍍金で形成され、合成樹脂層34は熱硬化性樹脂で形成され、粒状体33及び砥粒35はダイヤモンドであるが、これらに限定するものではない。   A gap 37 between the granular material 33 adjacent to the longitudinal direction of the wire 31 and the abrasive grain 35 is smaller than the outer diameter of the abrasive grain 35 and is set to almost zero. The wire 31 is a piano wire, the plating layer 32 is formed of nickel plating, the synthetic resin layer 34 is formed of a thermosetting resin, and the granular material 33 and the abrasive grains 35 are diamond. However, the present invention is not limited to these. Absent.

図3に示すように、ワイヤ工具30を矢線X方向に移動させながら被加工物38を切削加工するとき、図1,図2に示すワイヤ工具10,20の場合と同様、砥粒35は被加工物38から矢線Xと反対方向への抗力を受けるが、ワイヤ31の外周面を覆う鍍金層32で粒状体33が強固に固着され、鍍金層32を覆う合成樹脂層34で砥粒35が固着され、且つ、各砥粒35はワイヤ進行方向(矢線X方向)と反対方向に位置する粒状体33に接触した状態にあるため、各砥粒35はワイヤ進行方向(矢線X方向)と反対方向へ微小変位し難い。このため、ワイヤ工具30は、切削力の低下が発生せず、高い加工効率を発揮する。   As shown in FIG. 3, when the workpiece 38 is cut while moving the wire tool 30 in the direction of the arrow X, the abrasive grains 35 are the same as in the case of the wire tools 10 and 20 shown in FIGS. 1 and 2. While receiving a drag in the direction opposite to the arrow X from the workpiece 38, the granular material 33 is firmly fixed by the plating layer 32 covering the outer peripheral surface of the wire 31, and the abrasive grains are formed by the synthetic resin layer 34 covering the plating layer 32. Since each of the abrasive grains 35 is in contact with the granular material 33 positioned in the opposite direction to the wire traveling direction (arrow X direction), each abrasive grain 35 is in the wire traveling direction (arrow X). It is difficult to make a slight displacement in the opposite direction. For this reason, the wire tool 30 exhibits high machining efficiency without causing a reduction in cutting force.

一方、切削加工中、被加工物38から砥粒35が受ける抗力によって生じるワイヤ31軸心に接近する方向(矢線Y方向)への砥粒35の微小変位は合成樹脂層34によって適度に維持されるため、被加工物38の加工面の面粗度は良好となる。   On the other hand, during the cutting process, the minute displacement of the abrasive grains 35 in the direction approaching the axis of the wire 31 (the arrow Y direction) generated by the drag received by the abrasive grains 35 from the workpiece 38 is appropriately maintained by the synthetic resin layer 34. Therefore, the surface roughness of the processed surface of the workpiece 38 is good.

さらに、ワイヤ工具30において、鍍金層32で固着された粒状体33の粒径より、合成樹脂層34で固着された砥粒35の粒径を小としたことにより、図3に示すように、合成樹脂層34で固着された砥粒35の先端を揃えることができるので、被加工物38の加工面の面粗度向上に有効である。   Further, in the wire tool 30, by reducing the particle size of the abrasive grains 35 fixed by the synthetic resin layer 34 from the particle size of the granular material 33 fixed by the plating layer 32, as shown in FIG. Since the tips of the abrasive grains 35 fixed by the synthetic resin layer 34 can be aligned, it is effective for improving the surface roughness of the processed surface of the workpiece 38.

なお、前述したワイヤ工具10,20,30においては、ワイヤ11,21,31の長手方向に隣り合う粒状体13,23,33と砥粒15,25,35との隙間17,27,37は、ほぼゼロに設定されているが、これらに限定するものではないので、隙間17,27,37はゼロより大きく砥粒15,25,35の外径より小さい値の範囲内で変更することが可能である。   In the wire tools 10, 20, 30 described above, the gaps 17, 27, 37 between the granules 13, 23, 33 adjacent to the longitudinal direction of the wires 11, 21, 31 and the abrasive grains 15, 25, 35 are The gaps 17, 27, and 37 can be changed within a range of values that are larger than zero and smaller than the outer diameter of the abrasive grains 15, 25, and 35. Is possible.

前記範囲内で隙間17,27,37を変化させることにより、切削加工中に被加工物18,28,38から砥粒15,25,35が受けるワイヤ進行方向(X方向)と反対方向への微小変位量を調整することができるので、切削性能及び被加工物18,28,38の面精度を調整することができる。   By changing the gaps 17, 27, and 37 within the above range, the direction of the wire traveling direction (X direction) that the abrasive grains 15, 25, and 35 receive from the workpieces 18, 28, and 38 during the cutting process is changed. Since the minute displacement amount can be adjusted, the cutting performance and the surface accuracy of the workpieces 18, 28, 38 can be adjusted.

本発明のワイヤ工具は、太陽電池シリコン、半導体シリコン、磁性体、サファイヤあるいはSiCなどのインゴットをスライス加工する産業分野において広く利用することができる。   The wire tool of the present invention can be widely used in the industrial field of slicing an ingot such as solar cell silicon, semiconductor silicon, magnetic material, sapphire, or SiC.

10,20,30 ワイヤ工具
11,21,31 ワイヤ
12,22,32 鍍金層
13,23,33 粒状体
14,24,34 合成樹脂層
15,25,35 砥粒
16 緩衝樹脂層
17,27,37 隙間
18,28,38 被加工物
26 フィラー
X,Y 矢線
10, 20, 30 Wire tool 11, 21, 31 Wire 12, 22, 32 Plating layer 13, 23, 33 Granular body 14, 24, 34 Synthetic resin layer 15, 25, 35 Abrasive grain 16 Buffer resin layer 17, 27, 37 Clearance 18, 28, 38 Workpiece 26 Filler X, Y Arrow line

Claims (5)

ワイヤの外周面を覆う鍍金層で固着されたバックアップ用の粒状体と、前記鍍金層を覆う樹脂層で固着された砥粒と、を備え、前記砥粒はワイヤ進行方向と反対方向に位置する前記粒状体に接触した状態にあり、前記鍍金層と前記砥粒との間に砥粒を含まない緩衝樹脂層を設けたことを特徴とするワイヤ工具。 A backup granular material fixed by a plating layer covering the outer peripheral surface of the wire; and abrasive grains fixed by a resin layer covering the plating layer, the abrasive particles being positioned in a direction opposite to the wire traveling direction. A wire tool comprising a buffer resin layer that is in contact with the granular material and does not include abrasive grains between the plating layer and the abrasive grains . 前記樹脂層に、無機材料若しくは金属材料のフィラーを混在させた請求項1記載のワイヤ工具。   The wire tool according to claim 1, wherein a filler of an inorganic material or a metal material is mixed in the resin layer. 前記ワイヤの長手方向に隣り合う前記粒状体と前記砥粒との隙間が前記砥粒の外径より小である請求項1または2記載のワイヤ工具。 The wire tool according to claim 1 or 2, wherein a gap between the granular material adjacent to the longitudinal direction of the wire and the abrasive is smaller than an outer diameter of the abrasive. 前記鍍金層で固着された粒状体の個数より、前記樹脂層で固着された砥粒の個数が大である請求項1〜のいずれかに記載のワイヤ工具。 The wire tool according to any one of claims 1 to 3 , wherein the number of abrasive grains fixed by the resin layer is larger than the number of granular bodies fixed by the plating layer. 前記鍍金層で固着された粒状体の粒径より、前記樹脂層で固着された砥粒の粒径が小である請求項1〜のいずれかに記載のワイヤ工具。 The wire tool according to any one of claims 1 to 4 , wherein the particle size of the abrasive grains fixed by the resin layer is smaller than the particle size of the granular material fixed by the plating layer.
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