JP5733034B2 - Wastewater treatment equipment - Google Patents
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- JP5733034B2 JP5733034B2 JP2011127071A JP2011127071A JP5733034B2 JP 5733034 B2 JP5733034 B2 JP 5733034B2 JP 2011127071 A JP2011127071 A JP 2011127071A JP 2011127071 A JP2011127071 A JP 2011127071A JP 5733034 B2 JP5733034 B2 JP 5733034B2
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
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Description
本発明は、各種の生産設備から排出される排水であって、該排水中の処理対象成分の濃度が生産工程によって変化するものに適用される排水処理装置に関する。 The present invention relates to a wastewater treatment apparatus applied to wastewater discharged from various production facilities, in which the concentration of a component to be treated in the wastewater changes depending on a production process.
各種産業において限りある水資源の節約および地球環境保全の観点から産業排水の再利用が積極的に行われている。また、生産している製品により様々な薬品が使用されているため、排水処理が必須である。 Industrial wastewater is actively reused from the viewpoint of conserving limited water resources and protecting the global environment in various industries. In addition, wastewater treatment is essential because various chemicals are used depending on the products being produced.
例えば、半導体製造工場では半導体のエッチング処理のため大量のフッ酸が使用されており、その処理にはカルシウム塩を利用した凝集沈澱処理が行われている。これは、フッ素イオン混入排水にカルシウム塩を添加して不溶性のフッ化カルシウムを生成させ、凝集沈殿させることにより、産業排水中のフッ素イオンを除去する処理方法である。この凝集沈澱処理においてはフッ素の不溶化はフッ素とカルシウムの化学反応であるので、両者の濃度が濃い方が反応速度が早く、短時間で、高効率でフッ素イオンを除去することができる。フッ素イオンの排出基準値は８ｍｇ／Ｌ以下であるので、各メーカーではこの基準値を超えないような排水処理を実施している。 For example, a large amount of hydrofluoric acid is used in a semiconductor manufacturing factory for etching a semiconductor, and a coagulation precipitation process using a calcium salt is performed for the process. This is a treatment method for removing fluorine ions in industrial wastewater by adding calcium salt to fluorine ion-mixed wastewater to produce insoluble calcium fluoride and coagulating it. In this coagulation precipitation treatment, fluorine insolubilization is a chemical reaction between fluorine and calcium. Therefore, the higher the concentration of both, the faster the reaction rate, and fluorine ions can be removed with high efficiency in a short time. Since the emission standard value of fluoride ions is 8 mg / L or less, each manufacturer implements waste water treatment so as not to exceed this standard value.
一方、半導体製造工揚での半導体のエッチング処理ではフッ酸による処理ののち大量の純水による洗浄が行われる。そのため、生産設備から排出される排水には大きく分けて、フッ酸濃度が濃い使用済みフッ酸とフッ酸濃度が薄い洗浄排水が発生することになる。 On the other hand, in a semiconductor etching process at a semiconductor manufacturing factory, cleaning with a large amount of pure water is performed after treatment with hydrofluoric acid. For this reason, wastewater discharged from production facilities is roughly divided into used hydrofluoric acid having a high hydrofluoric acid concentration and cleaning wastewater having a low hydrofluoric acid concentration.
従来、この半導体製造工場から排出される排水は、例えば図５に示すような排水処理装置１によって行われている。この排水処理装置１は、半導体製造設備２と、該設備から排出される排水を処理する排水処理手段３と、半導体製造設備２で発生する排水を排水処理手段３に送る排水路４とを備えている。半導体製造設備２は、基板等の原料に対して、少なくともエッチング処理工程Ａと洗浄処理工程Ｂとを行って、製品を得るように構成されており、エッチング処理工程Ａによって発生する高濃度排水と、洗浄処理工程Ｂによって発生する低濃度排水とは、いずれも排水路４を通って排水処理手段３に送られるようになっている。排水処理手段４では、排水にカルシウム塩や凝集剤を添加して、フッ素を凝集沈殿させて、排水中のフッ素濃度を低減するようにしている。 Conventionally, waste water discharged from this semiconductor manufacturing factory is performed by a waste water treatment apparatus 1 as shown in FIG. 5, for example. The wastewater treatment apparatus 1 includes a semiconductor manufacturing facility 2, a wastewater treatment means 3 for treating wastewater discharged from the equipment, and a drainage channel 4 for sending wastewater generated in the semiconductor production facility 2 to the wastewater treatment means 3. ing. The semiconductor manufacturing facility 2 is configured to obtain a product by performing at least an etching process A and a cleaning process B on a raw material such as a substrate, and a high-concentration waste water generated by the etching process A. The low-concentration wastewater generated by the cleaning process B is sent to the wastewater treatment means 3 through the drainage channel 4. In the waste water treatment means 4, calcium salt or a flocculant is added to the waste water to coagulate and precipitate fluorine, thereby reducing the fluorine concentration in the waste water.
しかしながら、半導体製造設備２から排出されるフッ酸濃度が薄い洗浄排水は、高濃度排水よりも大量であるためフッ素の凝集沈澱処理において、カルシウム塩や凝集剤を過剰に投入する必要がある。そのため、薬品の使用量および汚泥発生量が増大し、処理費用の増大および地球環境の汚染につながっていた。また、処理不良のためフッ素イオンの排水基準を超過したりする恐れがあった。 However, cleaning wastewater having a low hydrofluoric acid concentration discharged from the semiconductor manufacturing facility 2 is larger in volume than high-concentration wastewater, and therefore it is necessary to add an excessive amount of calcium salt and a flocculant in the fluorine aggregation and precipitation treatment. For this reason, the amount of chemicals used and the amount of sludge generated increased, leading to an increase in processing costs and pollution of the global environment. Moreover, there was a risk of exceeding the fluorine ion drainage standards due to poor processing.
このような問題に対して、特許文献１には、半導体工場における排水処理システムに関する発明が開示されている。その排水処理システムでは、排水の電導度とフッ素イオン濃度及びｐＨ値の相関から設定された電導度により、各工程排水を中間槽に分離し適切な排水処理施設への送水を自動かつ連続で制御できるように構成したので、各処理施設の負荷を軽減でき、また人手が要らず安全に分離を行える効果があるとされている（特許文献１の〔発明の効果〕参照）。 With respect to such a problem, Patent Document 1 discloses an invention relating to a wastewater treatment system in a semiconductor factory. In the wastewater treatment system, wastewater from each process is separated into intermediate tanks based on the electrical conductivity set based on the correlation between the electrical conductivity of the wastewater, the fluorine ion concentration and the pH value, and the water supply to the appropriate wastewater treatment facility is automatically and continuously controlled. Since it is configured so that it can be performed, the load on each processing facility can be reduced, and it is said that there is an effect that the separation can be performed safely without requiring manual labor (see [Effects of the Invention] in Patent Document 1).
また、特許文献２には、排水処理の負担を軽減して排水処理コストを低減することができ、かつ工場設備等の源水の使用量を低減することができる排水処理方法に関する発明が開示されている。その排水処理方法では、各種の製造装置から排出された排水の不純物濃度を測定する工程と、前記不純物濃度の測定結果に基づいて、不純物濃度が基準値以上のものと基準値よりも低いものとに分離する工程と、不純物濃度が基準値以上の排水に所定の排水処理を施して放流する工程と、不純物濃度が基準値よりも低い排水を回収する工程とを具備する構成とされている（特許文献２の〔請求項１０〕参照）。 Patent Document 2 discloses an invention relating to a wastewater treatment method that can reduce wastewater treatment burdens and reduce wastewater treatment costs, and can reduce the amount of source water used in factory facilities and the like. ing. In the wastewater treatment method, based on the process of measuring the impurity concentration of wastewater discharged from various manufacturing apparatuses and the measurement result of the impurity concentration, the impurity concentration is higher than the reference value and lower than the reference value. And a step of discharging the wastewater having an impurity concentration equal to or higher than a reference value by performing a predetermined wastewater treatment, and a step of collecting wastewater having an impurity concentration lower than the reference value. (See claim 10 of Patent Document 2).
しかしながら、上記従来の排水処理方法は、排水の電導度や、排水中の処理対象成分や不純物の濃度を測定して排水処理の制御を行うので、測定器の高濃度排水に対する性能面での耐久性などを考慮する必要があった。また、生産設備の各種工程の処理時間、排水の排出時間、排出量などに応じた効率的な排水処理を行うことができなかった。 However, the above-mentioned conventional wastewater treatment method controls the wastewater treatment by measuring the conductivity of wastewater and the concentration of impurities and impurities to be treated in the wastewater. It was necessary to consider sex. In addition, efficient wastewater treatment according to the processing time of various processes of the production facility, drainage time, discharge amount, etc. could not be performed.
したがって、本発明の目的は、各種の生産設備から排出される排水であって、該排水中の処理対象成分の濃度が生産工程によって変化するものに適用される排水処理装置であって、生産工程の処理の状況に即した効率的な排水処理ができるようにした排水処理装置を提供することにある。 Therefore, an object of the present invention is a wastewater treatment apparatus applied to wastewater discharged from various production facilities, in which the concentration of the component to be treated in the wastewater varies depending on the production process, An object of the present invention is to provide a wastewater treatment apparatus capable of performing an efficient wastewater treatment in accordance with the state of treatment.
上記目的を達成するため、本発明は、各種の生産設備から排出される排水であって、該排水中の処理対象成分の濃度が生産工程によって変化するものに適用される排水処理装置において、
前記処理対象成分の濃度が低い排水を処理するための低濃度排水処理手段と、
前記処理対象成分の濃度が高い排水を処理するための高濃度排水処理手段と、
前記生産設備から前記低濃度排水処理手段と前記高濃度排水処理手段とに排水を送る排水路と、
前記排水路を通る排水を前記低濃度排水処理手段又は前記高濃度排水処理手段に切り替えて排水させる流路切り替え手段と、
前記生産設備での生産工程の前記処理対象成分濃度データを含むプロセスデータ信号を送信するプロセスデータ信号送信手段と、
前記プロセスデータ信号を受信して、該プロセスデータ信号に基づいて、前記排水路を通る排水の前記処理対象成分の濃度を判断して、該濃度が所定値よりも低いか高いかを判定し、該濃度が所定値よりも低いと判定したときは、該排水を前記低濃度排水処理手段に流し、該濃度が所定値よりも高いと判定したときは、該排水を前記高濃度排水処理手段に流すように、前記流路切り替え手段に動作信号を送る制御手段とを備えていることを特徴とする排水処理装置を提供するものである。
In order to achieve the above object, the present invention is a wastewater treatment apparatus applied to wastewater discharged from various production facilities, in which the concentration of the component to be treated in the wastewater varies depending on the production process.
Low concentration wastewater treatment means for treating wastewater having a low concentration of the component to be treated;
High-concentration wastewater treatment means for treating wastewater having a high concentration of the treatment target component;
A drainage channel for sending wastewater from the production facility to the low-concentration wastewater treatment means and the high-concentration wastewater treatment means;
Channel switching means for switching the drainage water passing through the drainage channel to the low-concentration wastewater treatment means or the high-concentration wastewater treatment means,
A process data signal transmitting means for transmitting a process data signal including the processing target component concentration data of the production process in the production facility;
Receiving the process data signal, based on the process data signal, determine the concentration of the treatment target component of the wastewater passing through the drainage channel, determine whether the concentration is lower or higher than a predetermined value, When it is determined that the concentration is lower than a predetermined value, the waste water is caused to flow to the low concentration waste water treatment means. When it is determined that the concentration is higher than a predetermined value, the waste water is passed to the high concentration waste water treatment means. A waste water treatment apparatus is provided that includes control means for sending an operation signal to the flow path switching means.
本発明の排水処理装置によれば、プロセスデータ信号送信手段が、生産設備での生産工程のプロセスデータ信号を送信し、制御手段が、該プロセスデータ信号を受信して、該プロセスデータ信号に基づいて、排水路を通る排水の処理対象成分の濃度を判断して、該濃度が所定値よりも低いか高いかを判定し、該濃度が所定値よりも低いと判定したときは、該排水を低濃度排水処理手段に流し、該濃度が所定値よりも高いと判定したときは、該排水を高濃度排水処理手段に流すように、流路切り替え手段に動作信号を送るので、排水の電導度や、排水中の処理対象成分の濃度等を測定しなくても、排水中の処理対象成分の濃度に応じて、排水を低濃度排水処理手段と高濃度排水処理手段とに効率的に切り分けて流すことができる。 According to the waste water treatment apparatus of the present invention, the process data signal transmission means transmits the process data signal of the production process in the production facility, and the control means receives the process data signal and based on the process data signal Determining the concentration of the component to be treated of the wastewater passing through the drainage channel, determining whether the concentration is lower or higher than a predetermined value, and determining that the concentration is lower than the predetermined value, When it is determined that the concentration is higher than a predetermined value, an operation signal is sent to the flow path switching unit so that the drainage flows to the high-concentration wastewater treatment unit. Even without measuring the concentration of the treatment target component in the wastewater, according to the concentration of the treatment target component in the wastewater, the wastewater is efficiently separated into the low concentration wastewater treatment means and the high concentration wastewater treatment means. It can flow.
本発明の排水処理装置においては、前記プロセスデータ信号送信手段が送信するプロセスデータは、前記処理対象成分濃度データと、前記生産設備でなされる各処理の処理時間と、該処理によって発生する排水の排出時間と、該排水の排水量とを含み、前記制御手段は、前記生産設備でなされる処理が変更されて、前記処理対象成分の濃度が変化した排水がなされるとき、該排水によって前記排水路を通る排水の処理対象成分の濃度が変化する時間を求め、その時間を考慮して前記流路切り替え手段に動作信号を送るように構成されていることが好ましい。 In the wastewater treatment apparatus of the present invention, the process data transmitted by the process data signal transmission means includes the component concentration data to be treated, the treatment time of each treatment performed in the production facility, and the wastewater generated by the treatment. A drainage time and a drainage amount of the drainage, and the control means is configured to change the treatment performed in the production facility, and when the drainage in which the concentration of the component to be treated is changed is performed, the drainage channel causes the drainage channel to flow. It is preferable that a time for changing the concentration of the component to be treated of the waste water passing through the flow is obtained and an operation signal is sent to the flow path switching means in consideration of the time.
上記態様によれば、生産設備でなされる各処理の処理時間と、該処理によって発生する排水の排出時間と、該排水の排水量とによって、処理対象成分の濃度が変化した排水がなされるとき、該排水によって排水路を通る排水の処理対象成分の濃度が変化する時間を求めることができるので、低濃度排水と高濃度排水とを正確に切り分けて、それぞれに対応する排水処理手段に流すことができる。 According to the above aspect, when drainage in which the concentration of the component to be treated is changed by the treatment time of each treatment performed in the production facility, the drainage time of the wastewater generated by the treatment, and the wastewater amount of the wastewater, Since it is possible to determine the time during which the concentration of the component to be treated of the wastewater passing through the drainage path is changed by the wastewater, it is possible to accurately separate the low-concentration wastewater and the high-concentration wastewater and flow them to the corresponding wastewater treatment means it can.
本発明の排水処理装置においては、前記排水路には、前記排水中の処理対象成分の濃度を直接又は間接的に測定する濃度測定手段が設けられており、前記制御手段は、前記プロセスデータ信号と、前記濃度測定手段によって測定された濃度とに基づいて、前記流路切り替え手段に動作信号を送るように構成されていることが好ましい。 In the wastewater treatment apparatus of the present invention, the drainage channel is provided with a concentration measuring means for directly or indirectly measuring the concentration of the component to be treated in the wastewater, and the control means is configured to receive the process data signal. It is preferable that an operation signal is sent to the flow path switching means based on the concentration measured by the concentration measuring means.
上記態様によれば、プロセスデータ信号に基づいて、排水路を通る排水の処理対象成分の濃度を迅速に判断して、流路を効率よく切り替えることができると共に、排水中の処理対象成分の濃度が突発的に変化した場合などでも、濃度測定手段により測定された濃度に基づいて、流路を適正な方向に切り替えることができる。 According to the above aspect, based on the process data signal, it is possible to quickly determine the concentration of the treatment target component of the wastewater passing through the drainage channel, and to efficiently switch the flow path, and the concentration of the treatment target component in the wastewater. Even if, for example, changes suddenly, the flow path can be switched in an appropriate direction based on the concentration measured by the concentration measuring means.
本発明の排水処理装置においては、前記濃度測定手段は、前記流路切り替え手段から前記低濃度排水処理手段に至る排水路の途中に設けられており、前記制御手段は、前記濃度測定手段によって測定される排水中の処理対象成分の濃度が所定値よりも高いときには、該排水を前記高濃度排水処理手段に流すように、前記流路切り替え手段に動作信号を送るように構成されていることが好ましい。 In the wastewater treatment apparatus of the present invention, the concentration measuring means is provided in the middle of the drainage channel from the flow path switching means to the low concentration wastewater treatment means, and the control means is measured by the concentration measuring means. When the concentration of the processing target component in the wastewater is higher than a predetermined value, the operation signal is sent to the flow path switching means so that the wastewater flows to the high concentration wastewater treatment means. preferable.
上記態様によれば、濃度測定手段が、流路切り替え手段から低濃度排水処理手段に至る排水路の途中に設けられているので、濃度測定手段が高濃度排水とできるだけ接触しないようにして、濃度測定手段の耐久性を向上させることができると共に、排水が低濃度排水処理手段へ送られている状態で、排水の処理対象成分の濃度が突発的に上昇した場合には排水を高濃度排水処理手段に送るように切り替えることができる。 According to the above aspect, since the concentration measuring means is provided in the middle of the drainage channel from the flow path switching means to the low-concentration wastewater treatment means, the concentration measuring means is kept from contacting the high-concentration wastewater as much as possible. In addition to improving the durability of the measurement means, if the concentration of the wastewater treatment target component suddenly increases while the wastewater is sent to the low-concentration wastewater treatment means, the wastewater is treated with high-concentration wastewater. Can be switched to send to means.
本発明の排水処理装置においては、前記生産設備が半導体生産設備であり、前記処理対象成分がフッ酸であることが好ましい。 In the wastewater treatment apparatus of the present invention, it is preferable that the production facility is a semiconductor production facility and the treatment target component is hydrofluoric acid.
本発明の排水処理装置によれば、プロセスデータ信号送信手段が、生産設備での生産工程のプロセスデータ信号を送信し、制御手段が、該プロセスデータ信号を受信して、該プロセスデータ信号に基づいて、排水路を通る排水の処理対象成分の濃度を判断して、該濃度が所定値よりも低いか高いかを判定し、該濃度が所定値よりも低いと判定したときは、該排水を低濃度排水処理手段に流し、該濃度が所定値よりも高いと判定したときは、該排水を高濃度排水処理手段に流すように、流路切り替え手段に動作信号を送るので、排水の電導度や、排水中の処理対象成分の濃度等を測定しなくても、排水中の処理対象成分の濃度に応じて、排水を低濃度排水処理手段と高濃度排水処理手段とに効率的に切り分けて流すことができる。 According to the waste water treatment apparatus of the present invention, the process data signal transmission means transmits the process data signal of the production process in the production facility, and the control means receives the process data signal and based on the process data signal Determining the concentration of the component to be treated of the wastewater passing through the drainage channel, determining whether the concentration is lower or higher than a predetermined value, and determining that the concentration is lower than the predetermined value, When it is determined that the concentration is higher than a predetermined value, an operation signal is sent to the flow path switching unit so that the drainage flows to the high-concentration wastewater treatment unit. Even without measuring the concentration of the treatment target component in the wastewater, according to the concentration of the treatment target component in the wastewater, the wastewater is efficiently separated into the low concentration wastewater treatment means and the high concentration wastewater treatment means. It can flow.
以下、図面を参照して、本発明の排水処理装置の実施形態を説明する。ただし、これらの例は本発明の範囲を限定するものではない。 Hereinafter, an embodiment of a wastewater treatment apparatus of the present invention will be described with reference to the drawings. However, these examples do not limit the scope of the present invention.
図１，２には、本発明を半導体製造設備における排水処理に適用した一実施形態が示されている。なお、本発明における生産設備は、半導体製造設備に限らず、例えば液晶製造、太陽電池製造、金属表面加工等の生産設備の排水処理にも適用することができる。 1 and 2 show an embodiment in which the present invention is applied to wastewater treatment in a semiconductor manufacturing facility. The production equipment in the present invention is not limited to semiconductor production equipment, and can be applied to wastewater treatment of production equipment such as liquid crystal production, solar cell production, and metal surface processing.
図１に示すように、この排水処理装置１０は、半導体製造設備２の排水処理に適用されるものであり、半導体製造設備２は、エッチング処理工程Ａ、洗浄処理工程Ｂを行うようになっている。そして、エッチング処理工程Ａ時には、フッ酸濃度の高い高濃度排水を排出し、洗浄処理工程Ｂ時には、フッ酸濃度が比較的低い低濃度排水を排出するようになっている。この実施形態では、フッ酸が本発明における処理対象成分となる。これらの排水は、配管４を通して流出する。 As shown in FIG. 1, this waste water treatment apparatus 10 is applied to waste water treatment of a semiconductor manufacturing facility 2, and the semiconductor manufacturing facility 2 performs an etching process A and a cleaning process B. Yes. In the etching process A, high-concentration wastewater having a high hydrofluoric acid concentration is discharged. In the cleaning process B, low-concentration wastewater having a relatively low hydrofluoric acid concentration is discharged. In this embodiment, hydrofluoric acid is a component to be treated in the present invention. These waste water flows out through the pipe 4.
配管４は、分岐配管１１、１２に分岐し、一方の分岐配管１１は低濃度排水処理手段１３に連結され、他方の分岐配管１２は高濃度排水処理手段１４に連結されている。これらの配管４，１１，１２が、本発明における排水路を構成している。低濃度排水処理手段１３は、この実施形態の場合、活性炭処理および陰イオン交換樹脂、陽イオン交換樹脂を用いた排水からイオン成分の除去を行う手段からなっており、そこで処理された排水は、洗浄水として再利用することができる。また、高濃度排水処理手段１４は、例えば、フッ酸を含む排水に塩化カルシウムを加え、排水中のフッ素をフッ化カルシウムとして析出させ、さらにポリ塩化アルミニウムなどの凝集剤によりフッ化カルシウムを沈降させ除去を行う手段からなっており、処理された排水は下水として放流される。 The pipe 4 branches into branch pipes 11 and 12, one branch pipe 11 is connected to the low concentration waste water treatment means 13, and the other branch pipe 12 is connected to the high concentration waste water treatment means 14. These pipes 4, 11, and 12 constitute the drainage channel in the present invention. In this embodiment, the low-concentration wastewater treatment means 13 is composed of means for removing the ionic components from wastewater using activated carbon treatment, anion exchange resin, and cation exchange resin. It can be reused as washing water. The high-concentration waste water treatment means 14 adds, for example, calcium chloride to waste water containing hydrofluoric acid, precipitates fluorine in the waste water as calcium fluoride, and precipitates calcium fluoride with a flocculant such as polyaluminum chloride. It consists of means for removal, and the treated waste water is discharged as sewage.
分岐配管１１には、バルブ１５が設けられ、分岐配管１２には、バルブ１６が設けられており、これらのバルブ１５，１６が、本発明における流路切り替え手段をなしている。ただし、流路切り替え手段としては、上記のようなバルブに限らず、分岐配管１１、１２の分岐部に設けられた三方弁などを用いることもできる。 The branch pipe 11 is provided with a valve 15, and the branch pipe 12 is provided with a valve 16, and these valves 15, 16 constitute the flow path switching means in the present invention. However, the flow path switching means is not limited to the valve as described above, and a three-way valve provided at a branch portion of the branch pipes 11 and 12 can also be used.
半導体製造設備２には、該設備におけるプロセスデータ信号を送信するプロセスデータ信号送信手段１７が設けられている。このプロセスデータ信号としては、例えば、排水を生じる各処理の処理時間（開始時間、終了時間等）、各処理によって生じる排水時間（開始時間、終了時間等）、各処理によって生じる排水量、処理に使用するフッ酸液の濃度、処理に使用するフッ酸液量などが挙げられる。 The semiconductor manufacturing facility 2 is provided with process data signal transmission means 17 for transmitting process data signals in the facility. As this process data signal, for example, the processing time (start time, end time, etc.) of each process that generates waste water, the drain time (start time, end time, etc.) generated by each process, the amount of waste water generated by each process, and used for processing The concentration of the hydrofluoric acid solution to be used, the amount of the hydrofluoric acid solution used for the treatment, etc.
また、上記プロセスデータ信号送信手段１７から送信されるプロセスデータ信号を受信して、前記バルブ１５，１６に作動信号を送る制御手段１８が設けられている。制御手段１８は、流路切り替え手段であるバルブ１５，１６に接続されており、上記プロセスデータ信号に基づいて、バルブ１５、１６に作動信号を送るようになっている。 Further, there is provided control means 18 for receiving a process data signal transmitted from the process data signal transmitting means 17 and sending an operation signal to the valves 15 and 16. The control means 18 is connected to valves 15 and 16 which are flow path switching means, and sends an operation signal to the valves 15 and 16 based on the process data signal.
制御手段１８における制御フローを図２に基づいて説明すると、まず、プロセスデータ信号を受信し（ステップＳ１）、このプロセスデータ信号に基づいて排水中のフッ酸濃度を判断する（ステップＳ２）。例えば、プロセスデータ信号として、排水を生じる各処理の処理時間（開始時間、終了時間等）、各処理によって生じる排水時間（開始時間、終了時間等）、各処理によって生じる排水量が受信された場合、それらに基づいて、処理に使用するフッ酸の濃度、フッ酸の使用量から排水中のフッ酸の総量を算出し、排水中のフッ酸の総量を受信された排水量で除算する方法で、排水中のフッ酸濃度を判断することができる。 The control flow in the control means 18 will be described with reference to FIG. 2. First, a process data signal is received (step S1), and the hydrofluoric acid concentration in the waste water is determined based on the process data signal (step S2). For example, when a process data signal is received as the process time (start time, end time, etc.) of each process that generates drainage, the drainage time (start time, end time, etc.) generated by each process, and the amount of drainage generated by each process, Based on these, the total amount of hydrofluoric acid in the wastewater is calculated from the concentration of hydrofluoric acid used in the treatment and the amount of hydrofluoric acid used, and the total amount of hydrofluoric acid in the wastewater is divided by the received amount of wastewater. The concentration of hydrofluoric acid can be determined.
この判断の際、半導体製造設備２でなされる処理が変更されて、フッ酸濃度が変化した排水がなされるとき、該排水によって配管４，１１，１２を通る排水の処理対象成分の濃度が変化する時間、言い換えると、配管４，１１，１２に残っている排水が流出して濃度が変化した排水が流入するまでの時間を求め、その時間を考慮して上記フッ酸濃度を判断することが好ましい。 At the time of this judgment, when the treatment performed in the semiconductor manufacturing facility 2 is changed and wastewater having a changed hydrofluoric acid concentration is made, the concentration of the component to be treated of the wastewater passing through the pipes 4, 11, and 12 is changed by the wastewater. To calculate the hydrofluoric acid concentration in consideration of this time, and in other words, the time until the wastewater remaining in the pipes 4, 11, 12 flows out and the wastewater whose concentration has changed flows in. preferable.
そして、上記フッ酸濃度が所定以上か否かを判断し（ステップＳ３）、フッ酸濃度が所定以上の場合には、バルブ１５を閉じ、バルブ１６を開き（ステップＳ４）、ルーチンを終了する。その結果、排水は、高濃度排水処理手段１４に送られ、そこでフッ酸を含む排水に塩化カルシウムを加え、排水中のフッ素をフッ化カルシウムとして析出させ、さらにポリ塩化アルミニウムなどの凝集剤によりフッ化カルシウムを沈降させ除去する処理を受けて、フッ酸濃度を低減されて下水に放流される。 Then, it is determined whether or not the hydrofluoric acid concentration is higher than a predetermined value (step S3). If the hydrofluoric acid concentration is higher than a predetermined value, the valve 15 is closed and the valve 16 is opened (step S4), and the routine is terminated. As a result, the wastewater is sent to the high-concentration wastewater treatment means 14, where calcium chloride is added to the wastewater containing hydrofluoric acid, and the fluorine in the wastewater is precipitated as calcium fluoride. In response to the treatment to settle and remove calcium fluoride, the hydrofluoric acid concentration is reduced and discharged into sewage.
また、フッ酸濃度が所定値未満の場合には、バルブ１５を開き、バルブ１６を閉じ（ステップＳ５）、ルーチンを終了する。その結果、排水は、低濃度排水処理手段１３に送られ、そこで活性炭処理および陰イオン交換樹脂、陽イオン交換樹脂を用いた排水からイオン成分を除去する処理を受けて、洗浄水として再利用される。 When the hydrofluoric acid concentration is less than the predetermined value, the valve 15 is opened, the valve 16 is closed (step S5), and the routine is terminated. As a result, the wastewater is sent to the low-concentration wastewater treatment means 13 where it is subjected to activated carbon treatment and a treatment for removing ionic components from the wastewater using the anion exchange resin and cation exchange resin, and is reused as washing water. The
このように、この排水処理装置１０によれば、半導体製造設備２のプロセスデータ信号に基づいて、排水が、フッ酸濃度の低い低濃度排水か、フッ酸濃度が高い高濃度排水かを判断し、低濃度排水の場合は、低濃度排水処理手段１３に送り、高濃度排水の場合は、高濃度排水処理手段１４に送るようにしたので、簡単な装置によって流路切り替えを効率よく行い、排水処理手段の負荷をできるだけ軽減できると共に、洗浄水の再利用を図ることができる。なお、低濃度排水は、低濃度排水処理手段１３で処理した後、そのまま下水に放流してもよい。 As described above, according to the wastewater treatment apparatus 10, based on the process data signal of the semiconductor manufacturing facility 2, it is determined whether the wastewater is a low concentration wastewater having a low hydrofluoric acid concentration or a high concentration wastewater having a high hydrofluoric acid concentration. In the case of low-concentration wastewater, it is sent to the low-concentration wastewater treatment means 13, and in the case of high-concentration wastewater, it is sent to the high-concentration wastewater treatment means 14. The load on the processing means can be reduced as much as possible, and the reuse of the washing water can be achieved. The low-concentration wastewater may be discharged into sewage as it is after being treated by the low-concentration wastewater treatment means 13.
図３，４には、本発明を半導体製造設備における排水処理に適用した他の実施形態が示されている。なお、図中、図１，２に示した実施形態と実質的に同一部分には、同符号を付してその説明を省略することとする。 3 and 4 show another embodiment in which the present invention is applied to wastewater treatment in a semiconductor manufacturing facility. In the figure, parts that are substantially the same as those of the embodiment shown in FIGS.
図３に示すように、この排水処理装置１０ａは、基本的に、図１，２に示した排水処理装置１０と同様な構成をなしている。ただし、分岐管１１のバルブ１５と低濃度排水処理手段１３との間に、排水中のフッ酸濃度を直接又は間接的に測定する濃度測定手段１９が設けられており、この濃度測定手段１９は、制御手段１８に接続されていて、制御手段１８は、プロセスデータ信号送信手段１７から送信されるプロセスデータ信号と、濃度測定手段１９から送信されるフッ酸濃度との両方に基づいて、バルブ１５，１６を制御するようになっている点が相違する。 As shown in FIG. 3, the waste water treatment apparatus 10a basically has the same configuration as the waste water treatment apparatus 10 shown in FIGS. However, a concentration measuring means 19 for directly or indirectly measuring the concentration of hydrofluoric acid in the waste water is provided between the valve 15 of the branch pipe 11 and the low concentration waste water treatment means 13. The control means 18 is connected to the control means 18, and the control means 18 is based on both the process data signal transmitted from the process data signal transmission means 17 and the hydrofluoric acid concentration transmitted from the concentration measurement means 19. , 16 is different.
上記濃度測定手段１９としては、例えばフッ素イオン電極を用いたフッ素イオン測定装置のようなフッ酸濃度を直接測定する装置や、排水中の塩濃度、電気伝導度、ｐＨなどを測定して、フッ酸濃度を間接的に測定する装置などが用いられる。このような測定装置としては、例えばフッ酸濃度モニタ（堀場製作所）が知られている。 Examples of the concentration measuring means 19 include a device that directly measures the hydrofluoric acid concentration, such as a fluorine ion measuring device using a fluorine ion electrode, or a salt concentration, electrical conductivity, pH, and the like in the waste water. An apparatus for indirectly measuring the acid concentration is used. As such a measuring apparatus, for example, a hydrofluoric acid concentration monitor (Horiba Seisakusho) is known.
制御手段１８における制御フローを図４に基づいて説明すると、まず、プロセスデータ信号を受信し（ステップＳ１）、このプロセスデータ信号に基づいて、前記実施形態と同様に、排水中のフッ酸濃度を判断する（ステップＳ２）。 The control flow in the control means 18 will be described with reference to FIG. 4. First, a process data signal is received (step S1). Based on this process data signal, the hydrofluoric acid concentration in the waste water is determined in the same manner as in the above embodiment. Determination is made (step S2).
この判断の際、半導体製造設備２でなされる処理が変更されて、フッ酸濃度が変化した排水がなされるとき、該排水によって配管４，１１，１２を通る排水の処理対象成分の濃度が変化する時間、言い換えると、配管４，１１，１２に残っている排水が流出して濃度が変化した排水が流入するまでの時間を求め、その時間を考慮して上記フッ酸濃度を判断することが好ましい。 At the time of this judgment, when the treatment performed in the semiconductor manufacturing facility 2 is changed and wastewater having a changed hydrofluoric acid concentration is made, the concentration of the component to be treated of the wastewater passing through the pipes 4, 11, and 12 is changed by the wastewater. To calculate the hydrofluoric acid concentration in consideration of this time, and in other words, the time until the wastewater remaining in the pipes 4, 11, 12 flows out and the wastewater whose concentration has changed flows in. preferable.
そして、上記フッ酸濃度が所定以上か否かを判断し（ステップＳ３）、フッ酸濃度が所定以上の場合には、バルブ１５を閉じ、バルブ１６を開き（ステップＳ４）、ルーチンを終了する。その結果、排水は、高濃度排水処理手段１４に送られ、フッ酸濃度を低減されて下水に放流される。 Then, it is determined whether or not the hydrofluoric acid concentration is higher than a predetermined value (step S3). If the hydrofluoric acid concentration is higher than a predetermined value, the valve 15 is closed and the valve 16 is opened (step S4), and the routine is terminated. As a result, the wastewater is sent to the high-concentration wastewater treatment means 14, where the hydrofluoric acid concentration is reduced and discharged into the sewage.
また、フッ酸濃度が所定値未満の場合には、濃度測定手段１９の信号を受信して、そのフッ酸濃度が所定値以上か否かを判断する（ステップＳ６）。そして、フッ酸濃度が所定値以上の場合には、ステップＳ３でフッ酸濃度が所定値以上と判断された場合と同様に、バルブ１５を閉じ、バルブ１６を開く（ステップＳ４）。その結果、排水は、高濃度排水処理手段１４に送られ、フッ酸濃度を低減されて下水に放流される。 If the hydrofluoric acid concentration is less than the predetermined value, a signal from the concentration measuring means 19 is received to determine whether the hydrofluoric acid concentration is equal to or higher than the predetermined value (step S6). If the hydrofluoric acid concentration is equal to or higher than the predetermined value, the valve 15 is closed and the valve 16 is opened (step S4), as in the case where the hydrofluoric acid concentration is determined to be higher than the predetermined value in step S3. As a result, the wastewater is sent to the high-concentration wastewater treatment means 14, where the hydrofluoric acid concentration is reduced and discharged into the sewage.
また、フッ酸濃度が所定未満の場合には、バルブ１５を開き、バルブ１６を閉じる（ステップＳ７）。その結果、排水は、低濃度排水処理手段１３に送られ、そこで再生処理を受けて、洗浄水として再利用される。 If the hydrofluoric acid concentration is less than the predetermined value, the valve 15 is opened and the valve 16 is closed (step S7). As a result, the wastewater is sent to the low-concentration wastewater treatment means 13, where it undergoes a regeneration treatment and is reused as washing water.
したがって、この実施形態では、プロセスデータ信号に基づいて判断されるフッ酸濃度と、濃度測定手段１９によって測定されるフッ酸濃度との両方が所定値未満のときだけ、低濃度排水処理手段１３に排水が流されるようになっている。したがって、低濃度排水処理手段１３に排水が流されている状態で、突発的に高濃度のフッ酸を含有する排水が流されてきたときには、直ちに流路が切り替えられて、高濃度排水処理手段１４に流れるようになるので、排水処理をより安全かつ確実に行うことが可能となる。 Therefore, in this embodiment, only when both the hydrofluoric acid concentration determined based on the process data signal and the hydrofluoric acid concentration measured by the concentration measuring means 19 are less than a predetermined value, the low concentration wastewater treatment means 13 is provided. The drainage is made to flow. Therefore, when the wastewater containing the high concentration hydrofluoric acid is suddenly flowed in the state where the wastewater is being flowed to the low concentration wastewater treatment means 13, the flow path is immediately switched to the high concentration wastewater treatment means. 14, the wastewater treatment can be performed more safely and reliably.
また、濃度測定手段１４は、分岐管１１のバルブ１５と低濃度排水処理手段１３との間に配置されているので、通常は高濃度排水に曝されることはなく、高濃度のフッ酸排水による腐食から保護することができる。また性能面で高濃度排水には使用できない測定器であっても使用することができる。 Further, since the concentration measuring means 14 is disposed between the valve 15 of the branch pipe 11 and the low-concentration waste water treatment means 13, the high-concentration hydrofluoric acid waste water is not usually exposed to the high-concentration waste water. Can be protected from corrosion by. Moreover, it can be used even if it is a measuring instrument which cannot be used for high concentration waste water in terms of performance.
２ 半導体製造設備
４ 配管
１０，１０ａ 排水処理装置
１１，１２ 分岐管
１３ 低濃度排水処理手段
１４ 高濃度排水処理手段
１５，１６ バルブ
１７ プロセス信号送信手段
１８ 制御手段
１９ 濃度測定手段
Ａ エッチング処理工程
Ｂ 洗浄処理工程
2 Semiconductor manufacturing equipment 4 Pipe 10, 10a Waste water treatment device 11, 12 Branch pipe 13 Low concentration waste water treatment means 14 High concentration waste water treatment means 15, 16 Valve 17 Process signal transmission means 18 Control means 19 Concentration measurement means A Etching process B Cleaning process
Claims (5)
前記処理対象成分の濃度が低い排水を処理するための低濃度排水処理手段と、
前記処理対象成分の濃度が高い排水を処理するための高濃度排水処理手段と、
前記生産設備から前記低濃度排水処理手段と前記高濃度排水処理手段とに排水を送る排水路と、
前記排水路を通る排水を前記低濃度排水処理手段又は前記高濃度排水処理手段に切り替えて排水させる流路切り替え手段と、
前記生産設備での生産工程の前記処理対象成分濃度データを含むプロセスデータ信号を送信するプロセスデータ信号送信手段と、
前記プロセスデータ信号を受信して、該プロセスデータ信号に基づいて、前記排水路を通る排水の前記処理対象成分の濃度を判断して、該濃度が所定値よりも低いか高いかを判定し、該濃度が所定値よりも低いと判定したときは、該排水を前記低濃度排水処理手段に流し、該濃度が所定値よりも高いと判定したときは、該排水を前記高濃度排水処理手段に流すように、前記流路切り替え手段に動作信号を送る制御手段とを備えていることを特徴とする排水処理装置。 In wastewater treatment equipment applied to wastewater discharged from various production facilities, in which the concentration of components to be treated in the wastewater varies depending on the production process,
Low concentration wastewater treatment means for treating wastewater having a low concentration of the component to be treated;
High-concentration wastewater treatment means for treating wastewater having a high concentration of the treatment target component;
A drainage channel for sending wastewater from the production facility to the low-concentration wastewater treatment means and the high-concentration wastewater treatment means;
Channel switching means for switching the drainage water passing through the drainage channel to the low-concentration wastewater treatment means or the high-concentration wastewater treatment means,
A process data signal transmitting means for transmitting a process data signal including the processing target component concentration data of the production process in the production facility;
Receiving the process data signal, based on the process data signal, determine the concentration of the treatment target component of the wastewater passing through the drainage channel, determine whether the concentration is lower or higher than a predetermined value, When it is determined that the concentration is lower than a predetermined value, the waste water is caused to flow to the low concentration waste water treatment means. When it is determined that the concentration is higher than a predetermined value, the waste water is passed to the high concentration waste water treatment means. A wastewater treatment apparatus comprising: control means for sending an operation signal to the flow path switching means so as to flow.
前記制御手段は、前記プロセスデータ信号と、前記濃度測定手段によって測定された濃度とに基づいて、前記流路切り替え手段に動作信号を送るように構成されている請求項１又は２記載の排水処理装置。 The drainage channel is provided with a concentration measuring means for directly or indirectly measuring the concentration of the component to be treated in the wastewater,
The waste water treatment according to claim 1 or 2, wherein the control means is configured to send an operation signal to the flow path switching means based on the process data signal and the concentration measured by the concentration measuring means. apparatus.
The wastewater treatment apparatus according to any one of claims 1 to 4, wherein the production facility is a semiconductor production facility, and the processing target component is hydrofluoric acid.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011127071A JP5733034B2 (en) | 2011-06-07 | 2011-06-07 | Wastewater treatment equipment |
| CN201210177292.7A CN102815816B (en) | 2011-06-07 | 2012-05-31 | Drainage processing device |
| TW101120134A TW201302620A (en) | 2011-06-07 | 2012-06-05 | Drainage treatment device |
| MYPI2012002550A MY155451A (en) | 2011-06-07 | 2012-06-07 | Drainage water treatment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011127071A JP5733034B2 (en) | 2011-06-07 | 2011-06-07 | Wastewater treatment equipment |
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| Publication Number | Publication Date |
|---|---|
| JP2012250218A JP2012250218A (en) | 2012-12-20 |
| JP5733034B2 true JP5733034B2 (en) | 2015-06-10 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011127071A Expired - Fee Related JP5733034B2 (en) | 2011-06-07 | 2011-06-07 | Wastewater treatment equipment |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5733034B2 (en) |
| CN (1) | CN102815816B (en) |
| MY (1) | MY155451A (en) |
| TW (1) | TW201302620A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6093071B1 (en) * | 2016-05-19 | 2017-03-08 | 株式会社スイレイ | Wastewater treatment method |
| JP6821530B2 (en) * | 2016-12-09 | 2021-01-27 | 株式会社堀場製作所 | Fluid analyzer and fluid analysis method |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01123685A (en) * | 1987-11-07 | 1989-05-16 | Mitsubishi Electric Corp | Waste water treatment system |
| JP3141785B2 (en) * | 1996-08-02 | 2001-03-05 | 日本電気株式会社 | Wastewater transfer device |
| JPH11238716A (en) * | 1998-02-19 | 1999-08-31 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
| JPH11300370A (en) * | 1998-04-21 | 1999-11-02 | Japan Organo Co Ltd | Device for treating fluorine-containing waste water |
| JP4583520B2 (en) * | 1998-12-11 | 2010-11-17 | 東京エレクトロン株式会社 | Waste water treatment apparatus and method |
| JP2003327487A (en) * | 2002-05-08 | 2003-11-19 | Kurita Water Ind Ltd | Apparatus for manufacturing matured compost-like material |
| JP4312016B2 (en) * | 2003-09-30 | 2009-08-12 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP2006061779A (en) * | 2004-08-25 | 2006-03-09 | Japan Organo Co Ltd | Method and apparatus for treating and separating waste water |
| CN201765510U (en) * | 2010-09-17 | 2011-03-16 | 中冶东方工程技术有限公司 | Intelligent integration system and regional system of industrial circulation water treatment |
-
2011
- 2011-06-07 JP JP2011127071A patent/JP5733034B2/en not_active Expired - Fee Related
-
2012
- 2012-05-31 CN CN201210177292.7A patent/CN102815816B/en not_active Expired - Fee Related
- 2012-06-05 TW TW101120134A patent/TW201302620A/en unknown
- 2012-06-07 MY MYPI2012002550A patent/MY155451A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012250218A (en) | 2012-12-20 |
| MY155451A (en) | 2015-10-15 |
| CN102815816A (en) | 2012-12-12 |
| TW201302620A (en) | 2013-01-16 |
| CN102815816B (en) | 2015-01-21 |
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