TW201302620A - Drainage treatment device - Google Patents
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy
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本發明，係為有關於被適用於當從各種之生產設備所排出的排水為該排水中之處理對象成分的濃度會依存於生產工程而改變的情況時之排水處理裝置。 The present invention relates to a drainage treatment device that is applied when the drainage discharged from various production facilities is such that the concentration of the treatment target component in the drainage changes depending on the production process.
從對於有限之水資源的節約以及地球環境保護的觀點來看，在各種產業中，係積極進行有產業排水之再利用。又，由於會依存於所生產之製品而使用有各種之藥品，因此，排水處理係為必要。 From the point of view of the conservation of limited water resources and the environmental protection of the earth, in various industries, it is actively recycling industrial drainage. Further, since various medicines are used depending on the products to be produced, drainage treatment is necessary.
例如，在半導體製造工廠中，為了進行半導體之蝕刻處理，係使用有大量的氟酸，在該處理中，係進行有利用有鈣鹽之凝集沈澱處理。此係為在混入有氟離子之排水中添加鈣鹽而使產生不溶性之氟化鈣產生並使其凝集沈澱，再藉由此來將產業排水中之氟離子除去的處理方法。在此凝集沈澱處理中，由於氟之不溶化係為氟和鈣之化學反應，因此，若是兩者之濃度為濃，則反應速度係為快，而能夠在短時間內而以高效率來除去氟離子。由於氟離子之排放基準值係為8mg/L以下，因此，各生產商係實施有不會超過此基準值之排水處理。 For example, in a semiconductor manufacturing factory, in order to perform semiconductor etching treatment, a large amount of hydrofluoric acid is used, and in this treatment, agglomeration precipitation treatment using a calcium salt is performed. This is a treatment method in which a calcium salt is added to a wastewater containing fluorine ions to generate insoluble calcium fluoride and precipitate and precipitate, thereby removing fluorine ions in industrial drainage. In the agglutination precipitation treatment, since the insolubilization of fluorine is a chemical reaction between fluorine and calcium, if the concentration of both is rich, the reaction rate is fast, and the fluorine can be removed with high efficiency in a short time. ion. Since the emission reference value of the fluoride ion is 8 mg/L or less, each manufacturer has a drainage treatment that does not exceed this reference value.
另一方面，在半導體製造工廠處之半導體的蝕刻處理中，係在進行了由氟酸所致之處理後，進行有由大量之純水所致之洗淨。因此，從生產設備所排出之排水，係成為 可大略分成氟酸濃度為濃之使用後的氟酸、和氟酸濃度為低之洗淨排水。 On the other hand, in the etching treatment of the semiconductor in the semiconductor manufacturing factory, after the treatment by the hydrofluoric acid, the cleaning by a large amount of pure water is performed. Therefore, the drainage discharged from the production equipment is It can be roughly divided into a hydrofluoric acid having a concentrated concentration of hydrofluoric acid and a washing drainage having a low concentration of hydrofluoric acid.
於先前技術中，此從半導體製造工廠所排出的排水，例如係經由如同圖5中所示一般之排水處理裝置1來進行。此排水處理裝置1，係具備有：半導體製造設備2、和對於從該設備所排出之排水進行處理的排水處理手段3、和將在半導體製造裝置2處所產生之排水送至排水處理手段3處之排水路4。半導體製造設備2，係構成為對於基板等之原料，而至少進行蝕刻處理工程A和洗淨處理工程B，而得到製品，經由蝕刻處理工程A所產生之高濃度排水、和經由洗淨處理工程B所產生之低濃度排水，係成為均為通過排水路4而被送至排水處理手段3處。在排水處理手段4處，係在排水中添加鈣鹽或凝集劑，並使氟凝集沈澱，而降低排水中之氟濃度。 In the prior art, this drainage discharged from a semiconductor manufacturing factory is performed, for example, via a drainage treatment apparatus 1 as shown in Fig. 5. The wastewater treatment device 1 includes a semiconductor manufacturing facility 2, a drain treatment means 3 for treating the drain discharged from the apparatus, and a drain generated at the semiconductor manufacturing apparatus 2 to the drain treatment means 3. Drainage road 4. The semiconductor manufacturing equipment 2 is configured to perform at least an etching treatment process A and a cleaning process B for a raw material such as a substrate, to obtain a product, a high-concentration drainage generated by the etching process A, and a cleaning treatment process. The low-concentration drainage generated by B is sent to the drainage treatment means 3 through the drainage path 4. At the drainage treatment means 4, a calcium salt or a coagulant is added to the drainage water, and the fluorine is agglomerated and precipitated to lower the fluorine concentration in the drainage.
然而，從半導體製造設備2所排出之氟酸濃度為低的洗淨排水，由於係較高濃度排水而更大量，因此，在氟之凝集沈澱處理中，係會有必要將鈣鹽或凝集劑作過度的投入。故而，藥品之使用量以及污泥產生量係增大，並導致處理費用之增大以及地球環境之污染。又，亦會有因為處理不良而導致超過氟離子的排水基準之虞。 However, the washing drainage water having a low concentration of hydrofluoric acid discharged from the semiconductor manufacturing equipment 2 is more abundant due to the higher concentration of the drainage, and therefore, in the agglutination and precipitation treatment of fluorine, it is necessary to use a calcium salt or a coagulant. Make excessive investment. As a result, the amount of medicine used and the amount of sludge generated are increased, resulting in an increase in processing costs and pollution of the global environment. In addition, there may be a drainage standard exceeding the fluoride ion due to poor handling.
對於此種問題，在專利文獻1中，係揭示有相關於在半導體工廠中之排水處理系統的發明。在該排水處理系統中，由於係構成為：藉由根據排水之電導度和氟離子濃度以及pH值間之相關所設定了的電導度，來自動且連續性 地對於將各工程排水在中間槽處進行分離並送水至適當之排水處理設施處的過程作控制，因此，係能夠減輕各處理設施之負載，並且亦有著不需要人手便能夠安全地進行分離之效果(參考專利文獻1之「發明效果」)。 In order to solve such a problem, Patent Document 1 discloses an invention relating to a drainage treatment system in a semiconductor factory. In the drainage treatment system, the system is configured to automatically and continuously by the electrical conductivity set according to the correlation between the conductivity of the drainage and the fluoride ion concentration and the pH value. The ground controls the process of separating the drainage of each project at the intermediate tank and delivering the water to the appropriate drainage treatment facility. Therefore, the load of each treatment facility can be reduced, and the separation can be safely performed without human hands. Effect (refer to "Invention Effect" of Patent Document 1).
又，在專利文獻2中，係揭示有一種相關於能夠將排水處理之負載減輕並降低排水處理成本，並且亦能夠降低工廠設備等之源頭水的使用量之排水處理方法的發明。在該排水處理方法中，係構成為具備有：對於從各種之製造裝置所排出的排水之雜質濃度作測定的工程；和根據前述雜質濃度之測定結果來分離成雜質濃度為基準值以上者以及雜質濃度為較基準值更低者的工程；和對於雜質濃度為基準值以上之排水而施加特定之排水處理並作放流的工程；以及將雜質濃度為較基準值更低之排水作回收的工程(參考專利文獻2之「申請項10」)。 Further, Patent Document 2 discloses an invention relating to a drainage treatment method capable of reducing the load of the wastewater treatment and reducing the cost of the drainage treatment, and also reducing the amount of use of the source water of the plant equipment or the like. In the water treatment method, the method of measuring the impurity concentration of the drainage water discharged from various manufacturing apparatuses, and the separation of the impurity concentration into a reference value or more based on the measurement result of the impurity concentration are included a project in which the impurity concentration is lower than the reference value; and a process in which a specific drainage treatment is applied and discharged for a drainage having an impurity concentration of a reference value or more; and a drainage in which the impurity concentration is lower than a reference value is recovered. (Refer to "Application 10" of Patent Document 2).
〔專利文獻1〕日本特開平1-123685號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 1-123685
〔專利文獻2〕日本特開2000-176434號 [Patent Document 2] Japanese Patent Laid-Open No. 2000-176434
然而，上述先前技術之排水處理方法，由於係對於排水之電導度或者是排水中之處理對象成分或雜質之濃度作測定而進行排水處理之控制，因此，係有必要對於測定器 之相對於高濃度排水的性能面上之耐久度等作考慮。又，係並無法進行與生產設備之各種工程的處理時間、排水之排出時間、抽出量等相對應之有效率的排水處理。 However, in the above-described prior art drainage treatment method, since the drainage treatment is performed for measuring the electrical conductivity of the drainage or the concentration of the treatment target component or the impurity in the drainage, it is necessary to measure the measurement. It is considered in comparison with the durability on the performance surface of high-concentration drainage. Further, it is not possible to perform an efficient drainage treatment corresponding to the processing time of various processes of the production equipment, the discharge time of the drainage, the amount of extraction, and the like.
故而，本發明之目的，係在於提供一種：身為被適用於當從各種之生產設備所排出的排水為該排水中之處理對象成分的濃度會依存於生產工程而改變的情況時之排水處理裝置，並且能夠依據生產工程之處理的狀況而進行有效率的排水處理之排水處理裝置。 Therefore, an object of the present invention is to provide a drainage treatment that is applied when the drainage discharged from various production facilities is such that the concentration of the treatment target component in the drainage changes depending on the production process. A drainage treatment device that can perform efficient drainage treatment according to the conditions of the processing of the production process.
為了達成上述目的，本發明，係為一種排水處理裝置，係為被適用於從各種生產設備所排出的排水為該排水中之處理對象成分的濃度會因生產工程不同而變化的排水之排水處理裝置，其特徵為，具備有：低濃度排水處理手段，係用以處理前述處理對象成分之濃度為低的排水；和高濃度排水處理手段，係用以處理前述處理對象成分之濃度為高的排水；和排水路，係從前述生產設備將排水輸送至前述低濃度排水處理手段和前述高濃度排水處理手段處；和流路切換手段，係將通過前述排水路之排水切換至前述低濃度排水處理手段或者前述高濃度排水處理手段處並進行排水；和製程資料訊號送訊手段，係將包含有前述生產設備處之生產工程的前述處理對象成分濃度資料之製程資料訊號作送訊；和控制手段，係受訊前述製程資料訊號，並根據該製程資料訊號，來對於通過前述排水路之排水的 前述處理對象成分之濃度作判斷，並判定該濃度是高於特定值還是低於特定值，而以當判定該濃度為較特定值更低時，使該排水流動至前述低濃度排水處理手段處，且當判定該濃度為較特定值更高時，使該排水流動至前述高濃度排水處理手段處的方式，來對於前述流路切換手段送出動作訊號。 In order to achieve the above object, the present invention is a drainage treatment apparatus which is a drainage treatment which is applied to discharge from various production facilities and which has a concentration of a treatment target component in the drainage which varies depending on a production process. The apparatus is characterized in that: a low-concentration drainage treatment means for treating a wastewater having a low concentration of the treatment target component; and a high-concentration drainage treatment means for treating a concentration of the treatment target component to be high Drainage; and a drainage path for conveying the drainage from the production equipment to the low-concentration drainage treatment means and the high-concentration drainage treatment means; and the flow path switching means for switching the drainage through the drainage path to the low-concentration drainage The treatment means or the high-concentration drainage treatment means is disposed and drained; and the process data signal transmission means transmits the process data signal containing the concentration information of the processing target component of the production process at the production equipment; and the control Means of receiving the aforementioned process information signal and based on the process data signal Respect to the drain through the drain passage of the Determining the concentration of the treatment target component, and determining whether the concentration is higher than a specific value or lower than a specific value, and when the concentration is determined to be lower than a specific value, causing the drainage to flow to the low-concentration drainage treatment means And when it is determined that the concentration is higher than a specific value, the drainage is caused to flow to the high-concentration drainage treatment means, and the operation signal is sent to the flow path switching means.
若依據本發明之排水處理裝置，則製程資料訊號送訊手段，係送訊在生產設備處之生產工程的製程資料訊號，控制手段，係受訊該製程資料訊號，並根據該製程資料訊號，來判斷通過排水路之排水的處理對象成分之濃度，並判定該濃度為較特定值更低或更高，而以當判定該濃度為較特定值更低時，使該排水流動至低濃度排水處理手段處，且當判定該濃度為較特定值更高時，使該排水流動至高濃度排水處理手段處的方式，來對於流路切換手段送出動作訊號，因此，就算是並不對於排水之電導度或者是排水中之處理對象成分的濃度等作測定，亦能夠因應於排水中之處理對象成分的濃度，來將排水有效率地劃分並流動至低濃度排水處理手段和高濃度排水處理手段處。 According to the drainage treatment device of the present invention, the process data signal transmission means is a process information signal for controlling the production process at the production facility, and the control means is to receive the process data signal, and according to the process data signal, The concentration of the treatment target component of the drainage through the drainage road is determined, and it is determined that the concentration is lower or higher than a specific value, and when the concentration is determined to be lower than a specific value, the drainage is caused to flow to the low concentration drainage At the processing means, and when it is determined that the concentration is higher than a specific value, the drainage is caused to flow to the high-concentration drainage treatment means, and the operation signal is sent to the flow path switching means, so even if it is not for the drainage conductance The degree or the concentration of the component to be treated in the drainage is measured, and the drainage can be efficiently divided and flowed to the low-concentration drainage treatment means and the high-concentration drainage treatment means in accordance with the concentration of the treatment target component in the drainage. .
在本發明之排水處理裝置中，較理想，係構成為：前述製程資料訊號送訊手段所送訊之製程資料，係包含有前述處理對象成分濃度資料、和在前述生產設備處所進行之各處理的處理時間、和經由該處理所產生之排水的排出時間、以及該排水之排水量，前述控制手段，係構成為：當在前述生產設備處所進行之處理被作變更，而進行了前述 處理對象成分之濃度發生了變化的排水時，求取出因該排水而使得通過前述排水路之排水的處理對象成分之濃度出現了變化的時間，並對於該時間作考慮，而對於前述流路切換手段送出動作訊號。 Preferably, in the wastewater treatment device of the present invention, the process data transmitted by the process data signal transmitting means includes the concentration data of the processing target component and the processing performed at the production facility. The processing time, the discharge time of the drainage generated by the processing, and the drainage amount of the drainage, the control means are configured such that the processing performed at the production facility is changed When the concentration of the treatment target component is changed, the time at which the concentration of the treatment target component that has passed through the drainage channel due to the drainage is removed is determined, and the flow path is switched in consideration of the time. Means to send action signals.
若依據上述形態，則由於係能夠根據在生產設備處所進行之各處理的處理時間、和經由該處理所產生之排水的排出時間、以及該排水之排水量，來在進行了使處理對象成分之濃度作了改變的排水時，求取出經由該排水而使通過排水路之排水的處理對象成分之濃度作改變的時間，因此，係能夠對於低濃度排水和高濃度排水正確地作劃分，而使其各別流動至相對應之排水處理手段處。 According to the above aspect, the concentration of the processing target component can be made based on the processing time of each processing performed at the production facility, the discharge time of the drainage generated by the processing, and the drainage amount of the drainage. In the case of the changed drainage, it is possible to take out the time during which the concentration of the treatment target component passing through the drainage of the drainage channel is changed by the drainage. Therefore, it is possible to accurately divide the low-concentration drainage and the high-concentration drainage. Each flow to the corresponding drainage treatment.
在本發明之排水處理裝置中，較理想，係構成為：在前述排水路處，係被設置有對於前述排水中之處理對象成分的濃度作直接性或間接性測定之濃度測定手段，前述控制手段，係構成為：根據前述製程資料訊號、和經由前述濃度測定手段所測定出之濃度，來對於前述流路切換手段送出動作訊號。 In the drainage treatment apparatus of the present invention, preferably, the drainage path is provided with a concentration measuring means for directly or indirectly measuring the concentration of the component to be treated in the drainage, and the control is performed. The means is configured to send an operation signal to the flow path switching means based on the process data signal and the concentration measured by the concentration measuring means.
若依據上述形態，則係能夠根據製程資料訊號，來迅速地判斷通過排水路之排水的處理對象成分之濃度，而有效率地對於流路作切換，並且，就算是當排水中之處理對象成分的濃度作了突發性之改變的情況等時，亦能夠根據藉由濃度測定手段所測定出的濃度，來將流路切換至適當之方向。 According to the above-described form, it is possible to quickly determine the concentration of the treatment target component of the drainage through the drainage path based on the process data signal, and efficiently switch the flow path, and even if it is a treatment target component in the drainage When the concentration is suddenly changed, the flow path can be switched to an appropriate direction based on the concentration measured by the concentration measuring means.
在本發明之排水處理裝置中，較理想，係構成為：前 述濃度測定手段，係被設置在從前述流路切換手段起而直到前述低濃度排水處理手段處的排水路之途中，前述控制手段，係構成為：當經由前述濃度測定手段所測定出的排水中之處理對象成分的濃度為較特定值更高時，係以使該排水流動至前述高濃度排水處理手段處的方式，來對於前述流路切換手段送出動作訊號。 In the drainage treatment device of the present invention, it is preferred that the structure is: The concentration measuring means is provided in the middle of the drainage path from the flow path switching means to the low-concentration drainage processing means, and the control means is configured to be the drainage water measured by the concentration measuring means. When the concentration of the processing target component is higher than a specific value, the operation signal is sent to the flow path switching means so that the drainage flows to the high-concentration drainage treatment means.
若依據上述形態，則濃度測定手段，由於係被設置在從流路切換手段起而直到低濃度排水處理手段處的排水路之途中，因此，係成為盡可能地不使濃度測定手段與高濃度排水作接觸，而能夠將濃度測定手段之耐久性提升，並且，在正將排水送至低濃度排水處理手段的狀態下，當排水之處理對象成分的濃度作了突發性上升的情況時，係能夠以將排水送至高濃度排水處理手段處的方式來作切換。 According to the above aspect, since the concentration measuring means is provided in the middle of the drain path from the flow path switching means to the low-concentration drainage processing means, the concentration measuring means and the high concentration are not made as much as possible. When the drainage is in contact, the durability of the concentration measuring means can be improved, and when the drainage is sent to the low-concentration drainage treatment means, when the concentration of the treatment target component of the drainage is suddenly increased, It is possible to switch by discharging the drainage to the high-concentration drainage treatment means.
在本發明之排水處理裝置中，較理想，前述生產設備係為半導體生產設備，前述處理對象成分係為氟酸。 In the wastewater treatment apparatus of the present invention, it is preferable that the production facility is a semiconductor production facility, and the treatment target component is hydrofluoric acid.
若依據本發明之排水處理裝置，則製程資料訊號送訊手段，係送訊在生產設備處之生產工程的製程資料訊號，控制手段，係受訊該製程資料訊號，並根據該製程資料訊號，來判斷通過排水路之排水的處理對象成分之濃度，並判定該濃度為較特定值更低或更高，而以當判定該濃度為較特定值更低時，使該排水流動至低濃度排水處理手段處，且當判定該濃度為較特定值更高時，使該排水流動至高 濃度排水處理手段處的方式，來對於流路切換手段送出動作訊號，因此，就算是並不對於排水之電導度或者是排水中之處理對象成分的濃度等作測定，亦能夠因應於排水中之處理對象成分的濃度，來將排水有效率地劃分並流動至低濃度排水處理手段和高濃度排水處理手段處。 According to the drainage treatment device of the present invention, the process data signal transmission means is a process information signal for controlling the production process at the production facility, and the control means is to receive the process data signal, and according to the process data signal, The concentration of the treatment target component of the drainage through the drainage road is determined, and it is determined that the concentration is lower or higher than a specific value, and when the concentration is determined to be lower than a specific value, the drainage is caused to flow to the low concentration drainage At the treatment means, and when it is determined that the concentration is higher than a specific value, the drainage is made to flow to a high The method of the concentration drainage treatment means sends the operation signal to the flow path switching means. Therefore, even if it is not measured for the conductivity of the drainage or the concentration of the treatment target component in the drainage, it can also be adapted to the drainage. The concentration of the target component is treated to efficiently divide the drainage and flow to the low-concentration drainage treatment means and the high-concentration drainage treatment means.
以下，參考圖面，對於本發明之排水處理裝置的實施形態作說明。但是，本發明之範圍，係並不被此些之例所限定。 Hereinafter, an embodiment of the drainage treatment apparatus of the present invention will be described with reference to the drawings. However, the scope of the invention is not limited by the examples.
在圖1、2中，係對於將本發明適用在半導體製造設備處的排水處理中的其中一種實施形態作展示。另外，在本發明中之生產設備，係並不被限定於半導體製造裝置，例如亦可適用在液晶製造、太陽電池製造、金屬表面加工等之生產設備的排水處理中。 In Figs. 1 and 2, one embodiment of the drainage treatment in which the present invention is applied to a semiconductor manufacturing facility is shown. Further, the production equipment in the present invention is not limited to the semiconductor manufacturing apparatus, and may be applied to, for example, a drainage process of a production facility such as liquid crystal manufacturing, solar cell manufacturing, or metal surface processing.
如圖1中所示一般，此排水處理裝置10，係為被適用於半導體製造設備2之排水處理中者，半導體製造設備2，係成為進行蝕刻處理工程A和洗淨處理工程B。而，在蝕刻處理工程A時，係成為排出氟酸濃度為高之高濃度排水，在洗淨處理工程B時，係成為排出氟酸濃度為較低之低濃度排水。在此實施形態中，氟酸係成為在本發明中之處理對象成分。此些之排水，係通過配管4而流出。 As shown in FIG. 1, the wastewater treatment apparatus 10 is generally applied to the wastewater treatment of the semiconductor manufacturing equipment 2, and the semiconductor manufacturing equipment 2 is subjected to an etching treatment project A and a cleaning treatment project B. On the other hand, in the etching treatment process A, the high-concentration drainage water having a high concentration of the hydrofluoric acid is discharged, and in the cleaning treatment process B, the low-concentration drainage water having a low concentration of the hydrofluoric acid is discharged. In this embodiment, the hydrofluoric acid is a component to be treated in the present invention. The drainage of these is discharged through the pipe 4.
配管4，係分歧為分歧配管11、12，其中一方之分歧配管11，係被與低濃度排水處理手段13作連結，另外一 方之分歧配管12，係被與高濃度排水處理手段14作連結。此些之配管4、11、12，係構成本發明中之排水路。低濃度排水處理手段13，於此實施形態的情況係成為使用有活性炭處理以及陰離子交換樹脂、陽離子交換樹脂的從排水而進行離子成分之除去的手段，於該處而被作了處理之排水，係能夠作為洗淨水而再利用。又，高濃度排水處理手段14，例如，係由在含有氟酸之排水中添加氯化鈣，並使排水中之氟作為氟化鈣而析出，再進而藉由聚氯化鋁等之凝集劑來使氟化鈣沈積並進行除去的手段所成，被作了處理之排水，係作為下水而被放流。 The piping 4 is divided into the branch pipes 11, 12, and one of the branch pipes 11 is connected to the low-concentration drainage treatment means 13, and the other The square branch pipe 12 is connected to the high-concentration drainage treatment means 14. The pipes 4, 11, and 12 constitute the drainage path in the present invention. In the case of this embodiment, the low-concentration drainage treatment means 13 is a means for removing the ionic components from the drainage by using an activated carbon treatment, an anion exchange resin, or a cation exchange resin, and the treated water is discharged therefrom. It can be reused as washing water. Further, the high-concentration drainage treatment means 14 is, for example, a method in which calcium chloride is added to a wastewater containing hydrofluoric acid, and fluorine in the drainage is precipitated as calcium fluoride, and further, a coagulant such as polyaluminum chloride is used. The calcium fluoride is deposited and removed, and the treated drainage is discharged as sewage.
在分歧配管11處，係被設置有閥15，在分歧配管12處，係被設置有閥16，此些之閥15、16，係成為本發明中之流路切換手段。但是，作為流路切換手段，係並不被限定於上述一般之閥，亦可使用被設置在分歧配管11、12之分歧部處的三方閥等。 At the branch pipe 11, a valve 15 is provided, and at the branch pipe 12, a valve 16 is provided, and the valves 15, 16 are the flow path switching means in the present invention. However, the flow path switching means is not limited to the above-described general valve, and a three-way valve or the like provided at the branching portions of the branch pipes 11 and 12 may be used.
在半導體製造設備2處，係被設置有將該設備處之製程資料訊號作送訊的製程資料訊號送訊手段17。作為此製程資料訊號，例如，係可列舉出：產生排水之各處理的處理時間(開始時間、結束時間等)、經由各處理所產生之排水時間(開始時間、結束時間等)、經由各處理所產生之排水量、在處理中所使用之氟酸液的濃度、在處理中所使用之氟酸液量等。 At the semiconductor manufacturing facility 2, a process data signal transmitting means 17 for transmitting a process data signal at the device is provided. Examples of the process data signal include a processing time (starting time, end time, and the like) of each process for generating drainage, a drainage time (starting time, end time, and the like) generated by each process, and each processing. The amount of water produced, the concentration of the hydrofluoric acid solution used in the treatment, the amount of the hydrofluoric acid solution used in the treatment, and the like.
又，係設置有：受訊從上述製程資料訊號送訊手段17所送訊之製程資料訊號，並對於前述閥15、16送出動作 訊號之控制手段18。控制手段18，係被與身為流路切換手段之閥15、16作連接，並成為根據上述製程資料訊號來對於閥15、16送出動作訊號。 Moreover, the process data signal sent from the processing data signal transmitting means 17 is received, and the action is sent to the valves 15, 16 Signal control means 18. The control means 18 is connected to the valves 15, 16 which are the flow path switching means, and sends an operation signal to the valves 15, 16 based on the process data signal.
若是根據圖2來對於在控制手段18處之控制流程作說明，則首先，係受訊製程資料訊號(步驟S1)，並根據此製程資料訊號來判斷排水中之氟酸濃度(步驟S2)。例如，作為製程資料訊號，當受訊了產生排水之各處理的處理時間(開始時間、結束時間等)、經由各處理所產生之排水時間(開始時間、結束時間等)、經由各處理所產生之排水量的情況時，係基於該些資料，來根據在處理中所使用之氟酸的濃度、氟酸的使用量，而算出排水中之氟酸的總量，再將排水中之氟酸的總量除以所受訊了的排水量，藉由此方法，係能夠對於排水中之氟酸濃度作判斷。 If the control flow at the control means 18 is explained based on Fig. 2, first, the process data signal is received (step S1), and the concentration of the hydrofluoric acid in the drain is judged based on the process data signal (step S2). For example, as a process data signal, the processing time (starting time, end time, etc.) of each process for generating drainage, and the drainage time (starting time, end time, etc.) generated by each process are generated by each process. In the case of the amount of water, based on the data, the total amount of hydrofluoric acid in the drainage is calculated based on the concentration of the hydrofluoric acid used in the treatment and the amount of the hydrofluoric acid used, and the hydrofluoric acid in the drainage is further calculated. The total amount is divided by the amount of water discharged, and by this method, it is possible to judge the concentration of hydrofluoric acid in the drainage.
在進行此判斷時，較理想，當在半導體製造設備2處所進行之處理被變更而進行了氟酸濃度有所改變之排水時，係求取出經由該排水而使通過配管4、11、12之排水的處理對象成分之濃度作改變的時間(換言之，直到在配管4、11、12中所殘留之排水流出而濃度有所改變的排水作流入為止的時間)，並對於該時間作考慮，而對於上述氟酸濃度作判斷。 In the case of performing the above-described determination, it is preferable that when the treatment performed in the semiconductor manufacturing facility 2 is changed and the drainage having the change in the concentration of the hydrofluoric acid is performed, the passage of the pipes 4, 11, 12 through the drainage is performed. The time at which the concentration of the treatment target component of the drainage is changed (in other words, the time until the drainage remaining in the pipes 4, 11, and 12 flows out and the concentration is changed to flow in), and this time is considered, and The above-mentioned concentration of hydrofluoric acid was judged.
之後，判斷上述氟酸濃度是否為特定值以上(步驟S3)，當氟酸濃度為特定值以上的情況時，關閉閥15，並開啟閥16(步驟S4)，而結束慣常程序(routine)。 其結果，排水，係被送至高濃度排水處理手段14處，於該處，係接受在含有氟酸之排水中添加氯化鈣，並使排水中之氟作為氟化鈣而析出，再進而藉由聚氯化鋁等之凝集劑來使氟化鈣沈積並進行除去的處理，而使氟酸濃度降低，再被放流至下水處。 Thereafter, it is determined whether or not the concentration of the hydrofluoric acid is equal to or greater than a specific value (step S3). When the concentration of the hydrofluoric acid is equal to or greater than a specific value, the valve 15 is closed, and the valve 16 is opened (step S4), and the routine is terminated. As a result, the drainage is sent to the high-concentration drainage treatment means 14 where calcium chloride is added to the wastewater containing the hydrofluoric acid, and the fluorine in the drainage is precipitated as calcium fluoride, and then borrowed. The calcium fluoride is deposited and removed by an aggregating agent such as polyaluminum chloride, and the concentration of the hydrofluoric acid is lowered, and then discharged to the sewage.
又，當氟酸濃度為未滿特定值的情況時，係開啟閥15，並關閉閥16(步驟S5)，而結束慣常程序(routine)。其結果，排水，係被送至低濃度排水處理手段13處，並於該處，接受活性炭處理以及使用有陰離子交換樹脂、陽離子交換樹脂之從排水而除去離子成分之處理，再作為洗淨水而作再利用。 Further, when the concentration of the hydrofluoric acid is less than a specific value, the valve 15 is opened, and the valve 16 is closed (step S5), and the routine is terminated. As a result, the drainage is sent to the low-concentration drainage treatment means 13, where the activated carbon treatment and the treatment of removing the ionic components from the drainage using the anion exchange resin and the cation exchange resin are used as the washing water. For reuse.
如此這般，若依據此排水處理裝置10，則係構成為：根據半導體製造設備2之製程資料訊號，而判斷排水係為氟酸濃度為低之低濃度排水或者是氟酸濃度為高之高濃度排水，當低濃度排水的情況時，係送至低濃度排水處理手段13處，當高濃度排水的情況時，係送至高濃度排水處理手段14處，因此，係能夠經由簡單的裝置來有效率地進行流路切換，而能夠盡可能地減輕排水處理手段之負載，並謀求洗淨水之再利用。另外，低濃度排水，係亦可在藉由低濃度排水處理手段13而作了處理之後，直接放流至下水處。 In this way, according to the wastewater treatment apparatus 10, it is determined that the drainage system is a low-concentration drainage having a low concentration of hydrofluoric acid or a high concentration of hydrofluoric acid according to the process data signal of the semiconductor manufacturing equipment 2. The concentration drainage is sent to the low-concentration drainage treatment means 13 when the low-concentration drainage is performed, and is sent to the high-concentration drainage treatment means 14 when the high-concentration drainage is performed. Therefore, it is possible to have a simple device. By efficiently switching the flow path, the load of the drainage treatment means can be reduced as much as possible, and the reuse of the washing water can be sought. In addition, the low-concentration drainage may be directly discharged to the sewage after being treated by the low-concentration drainage treatment means 13.
在圖3、4中，係對於將本發明適用在半導體製造設備處的排水處理中的另外一種實施形態作展示。另外，在圖中，對於與圖1、2中所示之實施形態實質性相同的部 分，係附加相同的符號，並省略其說明。 In Figures 3 and 4, another embodiment of the drainage process in which the present invention is applied to a semiconductor manufacturing facility is shown. In addition, in the figure, the parts substantially the same as the embodiment shown in Figs. The same symbols are attached and the description thereof is omitted.
如圖3中所示一般，此排水處理裝置10a，基本上，係成為與圖1、2中所示之排水處理裝置10相同的構成。但是，在分歧管11之閥15和低濃度排水處理手段13之間，係被設置有對於排水中之氟酸濃度作直接性或間接性測定之濃度測定手段19，此濃度測定手段19，係被與控制手段18作連接，控制手段18，係根據從製程資料訊號送訊手段17所送訊而來之製程資料訊號和從濃度測定手段19所送訊而來之氟酸濃度的雙方，來對於閥15、16作控制，在此點上，係為相異。 As shown in Fig. 3, generally, the drainage treatment device 10a basically has the same configuration as the drainage treatment device 10 shown in Figs. However, between the valve 15 of the branch pipe 11 and the low-concentration drainage treatment means 13, a concentration measuring means 19 for directly or indirectly measuring the concentration of the hydrofluoric acid in the drainage is provided, and the concentration measuring means 19 is It is connected to the control means 18, and the control means 18 is based on both the process data signal sent from the process data signal transmitting means 17 and the concentration of the hydrofluoric acid sent from the concentration measuring means 19. Control of the valves 15, 16 is different at this point.
作為上述濃度測定手段19，例如，係可使用像是利用有氟離子電極之氟離子測定裝置一般的對於氟酸濃度直接作測定之裝置、或者是對於排水中之鹽濃度、電性傳導度、pH等作測定並間接性地對於氟酸濃度作測定之裝置等。作為此種測定裝置，例如，氟酸濃度監測器(堀場製作所)係為週知。 As the concentration measuring means 19, for example, a device which directly measures the concentration of hydrofluoric acid, such as a fluoride ion measuring device using a fluoride ion electrode, or a salt concentration and electrical conductivity in the drainage, A device such as pH or the like for measuring and indirectly measuring the concentration of hydrofluoric acid. As such a measuring device, for example, a hydrofluoric acid concentration monitor (Hakoto Manufacturing Co., Ltd.) is known.
若是根據圖4來對於在控制手段18處之控制流程作說明，則首先，係受訊製程資料訊號(步驟S1)，並根據此製程資料訊號，來與前述實施形態相同的，判斷排水中之氟酸濃度(步驟S2)。 If the control flow at the control means 18 is described with reference to FIG. 4, firstly, the process data signal is received (step S1), and according to the process data signal, the same as the foregoing embodiment, the drainage is determined. Fluoric acid concentration (step S2).
在進行此判斷時，較理想，當在半導體製造設備2處所進行之處理被變更而進行了氟酸濃度有所改變之排水時，係求取出經由該排水而使通過配管4、11、12之排水的處理對象成分之濃度作改變的時間(換言之，直到在配管 4、11、12中所殘留之排水流出而濃度有所改變的排水作流入為止的時間)，並對於該時間作考慮，而對於上述氟酸濃度作判斷。 In the case of performing the above-described determination, it is preferable that when the treatment performed in the semiconductor manufacturing facility 2 is changed and the drainage having the change in the concentration of the hydrofluoric acid is performed, the passage of the pipes 4, 11, 12 through the drainage is performed. The time at which the concentration of the component to be treated in the drain is changed (in other words, until the pipe is in the pipe) 4, 11, and 12, the time when the drain is discharged and the concentration of the drain is changed as the inflow, and the time is considered, and the concentration of the above-mentioned hydrofluoric acid is judged.
之後，判斷上述氟酸濃度是否為特定值以上(步驟S3)，當氟酸濃度為特定值以上的情況時，關閉閥15，並開啟閥16(步驟S4)，而結束慣常程序(routine)。其結果，排水，係被送至高濃度排水處理手段14處，並使氟酸濃度降低，再放流至下水處。 Thereafter, it is determined whether or not the concentration of the hydrofluoric acid is equal to or greater than a specific value (step S3). When the concentration of the hydrofluoric acid is equal to or greater than a specific value, the valve 15 is closed, and the valve 16 is opened (step S4), and the routine is terminated. As a result, the drainage is sent to the high-concentration drainage treatment means 14, and the concentration of the hydrofluoric acid is lowered, and then discharged to the sewage.
又，當氟酸濃度為未滿特定值的情況時，係受訊濃度測定手段19之訊號，並判斷該氟酸濃度是否為特定值以上(步驟S6)。而，當氟酸濃度為特定值以上的情況時，係與在步驟S3中而判斷氟酸濃度為特定值以上的情況時相同的，關閉閥15，並開啟閥16(步驟S4)。其結果，排水，係被送至高濃度排水處理手段14處，並使氟酸濃度降低，再放流至下水處。 When the concentration of the hydrofluoric acid is less than a specific value, it is signaled by the concentration measuring means 19, and it is judged whether or not the concentration of the hydrofluoric acid is a specific value or more (step S6). On the other hand, when the concentration of the hydrofluoric acid is equal to or greater than the specific value, the valve 15 is closed and the valve 16 is opened (step S4), similarly to the case where the concentration of the hydrofluoric acid is determined to be a specific value or more in the step S3. As a result, the drainage is sent to the high-concentration drainage treatment means 14, and the concentration of the hydrofluoric acid is lowered, and then discharged to the sewage.
又，當氟酸濃度為未滿特定值的情況時，係開啟閥15，並關閉閥16(步驟S7)。其結果，排水，係被送至低濃度排水處理手段13處，並於該處接受再生處理，而作為洗淨水被作再利用。 Further, when the concentration of the hydrofluoric acid is less than a specific value, the valve 15 is opened and the valve 16 is closed (step S7). As a result, the drainage is sent to the low-concentration drainage treatment means 13, where it is subjected to regeneration treatment, and is reused as washing water.
故而，在此實施形態中，係成為僅有當根據製程資料訊號所判斷的氟酸濃度和經由濃度測定手段19所測定之氟酸濃度的雙方均為未滿特定值時，才會使排水流動至低濃度排水處理手段13處。故而，當在排水被流動至低濃度排水處理手段13處的狀態下，而突發性地流動有含有 高濃度之氟酸之排水時，由於流路係成為立即被作切換，並流動至高濃度排水處理手段14處，因此，係成為能夠更加安全且確實地進行排水處理。 Therefore, in this embodiment, the drainage flow is caused only when both the concentration of the hydrofluoric acid determined based on the process data signal and the concentration of the hydrofluoric acid measured by the concentration measuring means 19 are less than a specific value. To the low concentration drainage treatment means 13. Therefore, when the drainage is carried to the low-concentration drainage treatment means 13, the sudden flow is contained. In the case of the drainage of the high-concentration fluoric acid, the flow path is immediately switched and flows to the high-concentration drainage treatment means 14, so that the drainage treatment can be performed more safely and surely.
又，濃度測定手段14，由於係被配置在分歧管11之閥15和低濃度排水處理手段13之間，因此，通常而言係不會有被暴露在高濃度排水中的情況，而能夠保護其免於受到由於高濃度之氟酸排水所導致的腐蝕之傷害。又，在性能面上，就算是無法使用於高濃度排水中的測定器，亦能夠作使用。 Further, since the concentration measuring means 14 is disposed between the valve 15 of the branch pipe 11 and the low-concentration drainage treatment means 13, it is generally protected from exposure to high-concentration drainage. It is protected from corrosion caused by high concentrations of hydrofluoric acid drainage. Moreover, even on a performance surface, it can be used even if it is not used in a high-concentration drainage.
2‧‧‧半導體製造設備 2‧‧‧Semiconductor manufacturing equipment
4‧‧‧配管 4‧‧‧Pipe
10、10a‧‧‧排水處理裝置 10, 10a‧‧‧Drainage treatment device
11、12‧‧‧分歧管 11, 12‧‧ ‧ branch pipe
13‧‧‧低濃度排水處理手段 13‧‧‧Low concentration drainage treatment
14‧‧‧高濃度排水處理手段 14‧‧‧High concentration drainage treatment
15、16‧‧‧閥 15, 16‧‧‧ valve
17‧‧‧製程訊號送訊手段 17‧‧‧Process signal transmission means
18‧‧‧控制手段 18‧‧‧Control means
19‧‧‧濃度測定手段 19 ‧ ‧ concentration determination means
A‧‧‧蝕刻處理工程 A‧‧‧ etching treatment engineering
B‧‧‧洗淨處理工程 B‧‧‧Washing treatment works
〔圖1〕對於本發明之排水處理裝置的第1實施形態作展示之概略構成圖。 Fig. 1 is a schematic view showing a first embodiment of a wastewater treatment apparatus according to the present invention.
〔圖2〕係為在該排水處理裝置中之控制手段的流程圖。 Fig. 2 is a flow chart showing the control means in the drainage treatment apparatus.
〔圖3〕對於本發明之排水處理裝置的第2實施形態作展示之概略構成圖。 Fig. 3 is a schematic configuration view showing a second embodiment of the wastewater treatment apparatus of the present invention.
〔圖4〕係為在該排水處理裝置中之控制手段的流程圖。 Fig. 4 is a flow chart showing the control means in the drainage treatment apparatus.
〔圖5〕先前技術之排水處理裝置的概略構成圖。 Fig. 5 is a schematic configuration diagram of a prior art drainage treatment device.
2‧‧‧半導體製造設備 2‧‧‧Semiconductor manufacturing equipment
4‧‧‧配管 4‧‧‧Pipe
10‧‧‧排水處理裝置 10‧‧‧Drainage treatment unit
11、12‧‧‧分歧管 11, 12‧‧ ‧ branch pipe
13‧‧‧低濃度排水處理手段 13‧‧‧Low concentration drainage treatment
14‧‧‧高濃度排水處理手段 14‧‧‧High concentration drainage treatment
15、16‧‧‧閥 15, 16‧‧‧ valve
17‧‧‧製程訊號送訊手段 17‧‧‧Process signal transmission means
18‧‧‧控制手段 18‧‧‧Control means
A‧‧‧蝕刻處理工程 A‧‧‧ etching treatment engineering
B‧‧‧洗淨處理工程 B‧‧‧Washing treatment works
Claims (5)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011127071A JP5733034B2 (en) | 2011-06-07 | 2011-06-07 | Wastewater treatment equipment |
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|---|---|
| TW201302620A true TW201302620A (en) | 2013-01-16 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101120134A TW201302620A (en) | 2011-06-07 | 2012-06-05 | Drainage treatment device |
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| JP (1) | JP5733034B2 (en) |
| CN (1) | CN102815816B (en) |
| MY (1) | MY155451A (en) |
| TW (1) | TW201302620A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6093071B1 (en) * | 2016-05-19 | 2017-03-08 | 株式会社スイレイ | Wastewater treatment method |
| JP6821530B2 (en) * | 2016-12-09 | 2021-01-27 | 株式会社堀場製作所 | Fluid analyzer and fluid analysis method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH01123685A (en) * | 1987-11-07 | 1989-05-16 | Mitsubishi Electric Corp | Waste water treatment system |
| JP3141785B2 (en) * | 1996-08-02 | 2001-03-05 | 日本電気株式会社 | Wastewater transfer device |
| JPH11238716A (en) * | 1998-02-19 | 1999-08-31 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
| JPH11300370A (en) * | 1998-04-21 | 1999-11-02 | Japan Organo Co Ltd | Device for treating fluorine-containing waste water |
| JP4583520B2 (en) * | 1998-12-11 | 2010-11-17 | 東京エレクトロン株式会社 | Waste water treatment apparatus and method |
| JP2003327487A (en) * | 2002-05-08 | 2003-11-19 | Kurita Water Ind Ltd | Apparatus for manufacturing matured compost-like material |
| JP4312016B2 (en) * | 2003-09-30 | 2009-08-12 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP2006061779A (en) * | 2004-08-25 | 2006-03-09 | Japan Organo Co Ltd | Method and apparatus for treating and separating waste water |
| CN201765510U (en) * | 2010-09-17 | 2011-03-16 | 中冶东方工程技术有限公司 | Intelligent integration system and regional system of industrial circulation water treatment |
-
2011
- 2011-06-07 JP JP2011127071A patent/JP5733034B2/en not_active Expired - Fee Related
-
2012
- 2012-05-31 CN CN201210177292.7A patent/CN102815816B/en not_active Expired - Fee Related
- 2012-06-05 TW TW101120134A patent/TW201302620A/en unknown
- 2012-06-07 MY MYPI2012002550A patent/MY155451A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN102815816A (en) | 2012-12-12 |
| CN102815816B (en) | 2015-01-21 |
| MY155451A (en) | 2015-10-15 |
| JP5733034B2 (en) | 2015-06-10 |
| JP2012250218A (en) | 2012-12-20 |
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