JP5699334B2 - Mesh electrode substrate and method of manufacturing mesh electrode substrate - Google Patents

Description

  The present invention relates to a mesh electrode substrate having an effect of preventing a short circuit and excellent in power generation efficiency, and a method for manufacturing a mesh electrode substrate capable of easily manufacturing the mesh electrode substrate.

  In recent years, environmental problems such as global warming caused by an increase in carbon dioxide have become serious, and measures are being taken worldwide. In particular, active research and development on solar cells using solar energy as a clean energy source with a low environmental impact is underway. Among various types of solar cells, organic solar cells such as dye-sensitized solar cells and organic thin-film solar cells are attracting attention and are being researched and developed as solar cells that have low environmental impact and can reduce manufacturing costs. .

In an organic solar cell, a transparent material is usually used as an electrode substrate used on the sunlight receiving side. As such a material, metal oxides such as ITO (indium tin oxide) and FTO (fluorine-doped tin oxide) are preferably used.
However, since such a metal oxide is not sufficiently low in electrical resistance, it has been pointed out that a large current collection loss occurs. As the area increases, the photoelectric conversion efficiency decreases significantly. Had a problem of appearing.

  For such a problem, by forming a mesh-like (mesh-like) conductive layer (hereinafter sometimes referred to as a mesh conductive layer) as an auxiliary electrode so as to be in contact with the electrode layer, photoelectric conversion efficiency Has been disclosed (Patent Documents 1 and 2). A method using an electrode substrate (hereinafter, sometimes referred to as a mesh electrode substrate) on which such a mesh conductive layer is formed is a useful method for improving the photoelectric conversion efficiency of an organic solar cell.

Although the use of such a mesh electrode substrate has improved battery characteristics due to improved conductivity, a new problem has been pointed out that a short circuit between the electrodes is likely to occur due to the thickness of the mesh conductive layer.
Therefore, as a method of preventing a short circuit, when an organic solar cell is manufactured using a mesh electrode substrate, a short circuit prevention layer is provided only on a metal wiring that is likely to cause a short circuit with an electrode formed oppositely. A method (see Patent Document 3) has been proposed.
However, in the above method, since it is necessary to form a short-circuit prevention layer only in a portion where a short circuit is likely to occur, development of a new short-circuit prevention technique is required from the viewpoint of ease of manufacture.

  Such mesh electrode substrates are expected to be applied not only to the organic solar cells described above but also to electrode substrates used in various fields such as various solar cells and displays.

JP 2003-203681 A JP 2004-296669 A Japanese Patent No. 4488034

  The present invention has been made in view of the above circumstances, and uses a mesh conductive layer. The mesh electrode substrate excellent in power generation efficiency capable of preventing a short circuit between electrodes and the mesh electrode substrate can be simply obtained. The main object is to provide a manufacturing method that can be manufactured in a process.

  In order to solve the above problems, the present invention provides a base material, a mesh conductive layer made of a conductive material formed in a mesh shape on the base material, an insulating layer formed only on the mesh conductive layer, A mesh electrode substrate is provided.

According to the present invention, since the insulating layer is formed on the mesh conductive layer, a short circuit can be prevented. Moreover, since the manufacturing method which can form a mesh conductive layer and an insulating layer simultaneously in a mesh form can be used suitably, it can manufacture easily. Therefore, it is possible to obtain a mesh electrode substrate having a short-circuit preventing effect and excellent in power generation efficiency.
Moreover, when using the mesh electrode substrate of this invention for a solar cell, since an insulating layer is not formed in the opening part of a mesh conductive layer, it can prevent that the light reception efficiency of sunlight falls.

  In the said invention, it is preferable to have a transparent electrode layer formed in the opening part of the said mesh conductive layer so that the said mesh conductive layer may be contact | connected. This is because the conductivity can be improved.

  Moreover, in the said invention, it is preferable that the film thickness of the said transparent electrode layer is below the film thickness of the said mesh conductive layer. This is because the height difference between the configurations of the formed mesh electrode substrate is alleviated, so that the short-circuit prevention effect can be improved.

  The present invention provides a solar cell comprising the mesh electrode substrate according to the present invention.

  According to the present invention, by using the mesh electrode substrate according to the present invention, a short circuit can be prevented and a solar cell excellent in power generation efficiency can be obtained.

  The present invention also provides a solar cell module comprising a plurality of solar cells according to the present invention connected together.

  According to the present invention, by using the solar cell, a short circuit can be prevented and a solar cell module excellent in power generation efficiency can be obtained.

  The present invention is a method for producing a mesh electrode substrate, comprising: a base material; a mesh conductive layer made of a conductive material formed in a mesh shape on the base material; and an insulating layer formed on the mesh conductive layer. A conductive material layer forming step for forming a continuous conductive material layer using the conductive material; and an insulating layer for forming a conductive material layer with an insulating layer by forming an insulating layer over the entire surface of the conductive material layer. There is provided a method for manufacturing a mesh electrode substrate, comprising: an attached conductive material layer forming step; and a patterning step of forming the conductive material layer with an insulating layer in a mesh shape.

  According to the present invention, the conductive material layer with an insulating layer is formed in the mesh pattern by the patterning step after the conductive material layer with the insulating layer is formed by the conductive material layer forming step with the insulating layer. Can be simultaneously formed in a mesh shape. Therefore, it is possible to easily manufacture a mesh electrode substrate that is used in solar cells and the like and has excellent power generation efficiency that can prevent a short circuit between electrodes.

  In the mesh electrode substrate of the present invention, since the insulating layer is formed only on the mesh conductive layer, a short circuit that occurs between the mesh electrode substrate and other constituent layers when used in a solar cell or the like is prevented. There is an effect that becomes possible. Moreover, it is possible to prevent a short circuit by using the mesh electrode substrate of the present invention, and it is possible to easily produce a solar cell and a solar cell module excellent in power generation efficiency.

It is a schematic sectional drawing which shows an example of the mesh electrode substrate of this invention. It is a schematic sectional drawing which shows the other example of the mesh electrode substrate of this invention. It is a schematic sectional drawing which shows an example of the solar cell of this invention. It is a schematic sectional drawing which shows the other example of the solar cell of this invention. It is a schematic sectional drawing which shows an example of the solar cell module of this invention. It is process drawing which shows an example of the manufacturing method of the mesh electrode substrate of this invention. It is process drawing which shows the other example of the manufacturing method of the mesh electrode substrate of this invention. It is process drawing which shows the other example of the manufacturing method of the mesh electrode substrate of this invention.

  Hereinafter, the mesh electrode substrate, the solar cell, the solar cell module, and the method for manufacturing the mesh electrode substrate of the present invention will be described in order.

A. Mesh electrode substrate First, the mesh electrode substrate of the present invention will be described. The mesh electrode substrate of the present invention has a base material, a mesh conductive layer made of a conductive material formed in a mesh shape on the base material, and an insulating layer formed only on the mesh conductive layer. It is a feature.

  The mesh electrode substrate of the present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view showing an example of the mesh electrode substrate of the present invention. As illustrated in FIG. 1, the mesh electrode substrate 10 includes a base material 1, a mesh conductive layer 3 formed on the base material 1 via an adhesive layer 2, and an insulation formed only on the mesh conductive layer 3. And layer 4.

FIGS. 2A and 2B are schematic cross-sectional views showing other examples of the mesh electrode substrate of the present invention. As illustrated in FIGS. 2A and 2B, the mesh electrode substrate 10 may have a transparent electrode layer 5.
Specifically, as illustrated in FIG. 2A, in the mesh electrode substrate 10, the transparent electrode layer 5 may be formed only in the openings of the mesh conductive layer 3, and FIG. As illustrated in b), the transparent electrode layer 5 may be formed on the entire surface of the substrate 1 and may be formed in the opening of the mesh conductive layer 3 formed on the formed transparent electrode layer 5.
Here, since the reference numerals not described in FIGS. 2A and 2B can be the same as those in FIG. 1, description thereof is omitted here.

According to the present invention, it is possible to prevent occurrence of a short circuit between the mesh electrode substrate of the present invention and another constituent layer such as an electrode substrate.
For example, when a solar cell is manufactured using the mesh electrode substrate of the present invention, an insulating layer is formed in the mesh electrode substrate of the present invention, so that the mesh electrode substrate and the other constituent layers in the solar cell are interposed. It becomes possible to prevent the short circuit which arises in.
In addition, since the insulating layer is formed only on the mesh conductive layer, that is, the insulating layer is not formed in the opening of the mesh conductive layer, a sufficient area for receiving sunlight can be secured. Furthermore, since the manufacturing method which can form a mesh conductive layer and an insulating layer simultaneously in a mesh form can be used suitably, manufacture becomes easy. Therefore, it is possible to obtain a solar cell that has an effect of preventing a short circuit, has excellent power generation efficiency, and is easy to manufacture.
Hereinafter, each structure of the mesh electrode substrate of this invention is demonstrated.

1. Insulating Layer First, the insulating layer in the present invention will be described. The insulating layer used in the present invention is formed only on the mesh conductive layer. By forming the insulating layer, the mesh conductive layer of the present invention can be insulated from other constituent layers. Therefore, it is possible to prevent the occurrence of a short circuit.
Specifically, when a solar cell is formed using the mesh electrode substrate of the present invention, it is possible to prevent occurrence of a short circuit between the mesh conductive layer and other constituent layers of the solar cell.
In addition, since the insulating layer used in the present invention is formed only on the mesh conductive layer, that is, not formed on the opening of the mesh conductive layer, the sunlight receiving area in the mesh electrode substrate of the present invention is reduced. It is to prevent that.

  As the width of the insulating layer used in the present invention, for example, when a solar cell or the like is produced using the mesh electrode substrate of the present invention, the mesh conductive layer and the other electrode layer of the solar cell are sufficiently insulated. Since it is formed at least only on the mesh conductive layer, the width is not particularly limited as long as it does not exceed the width of the mesh conductive layer. Usually, it is formed with the same width as that of the mesh conductive layer, but it may be one in which a part of the formed insulating layer is missing.

  Here, the “same width” means that the difference between the width of the mesh conductive layer and the width of the insulating layer is usually 50% or less of the width of the mesh conductive layer, preferably 20% or less. It is more preferable that it is 10% or less.

In addition, the shape of the insulating layer used in the present invention is not particularly limited as long as it can insulate between the mesh conductive layer and other constituent layers, for example, when used in a solar cell, For example, it may be formed continuously on the mesh conductive layer, or may be partially formed on the mesh conductive layer.
In the present invention, the insulating layer is formed only on the mesh conductive layer, and the insulating layer is not formed on the side surface of the mesh conductive layer.

  As a material for forming an insulating layer used in the present invention, when a solar cell is formed using the mesh electrode substrate of the present invention, an insulating property is provided between a mesh conductive layer described later and other constituent layers of the solar cell. If it can exhibit, it will not specifically limit, The insulating material generally used can be used.

  Examples of such an insulating material include an organic insulating material, an inorganic insulating material, a hybrid insulating material in which both the insulating materials are mixed, and the like.

  The organic insulating material as described above has an advantage of excellent processability, and examples thereof include natural resins, synthetic resins, natural rubbers, synthetic rubbers, and the natural resins and synthetic resins described above. These can be roughly divided into thermoplastic resins and thermosetting resins. In the present invention, a thermoplastic resin can be particularly preferably used from the viewpoint of ease of processing.

Examples of such thermoplastic resins include acrylic resins, methacrylic resins, vinyl resins, olefin resins, and polyester resins.
On the other hand, examples of the thermosetting resin as described above include amino resins, cyanate resins, isocyanate resins, polyimides, epoxy resins, phenol resins, and resins obtained by three-dimensionally cross-linking thermoplastic resins. A resin obtained by three-dimensionally cross-linking the above-described thermoplastic resin can be used more suitably because it has both workability and high hardness.

In addition, the inorganic insulating material as described above generally exhibits high hardness and has an advantage of being excellent in the effect of preventing a short circuit. Examples of such inorganic insulating materials include metal oxides, metal nitrides, metal carbides, metal sulfides, and the like. Among these, ceramics mainly composed of metal oxides are preferably used.
Specific examples of such metal oxides include silicon oxide, aluminum oxide, titanium oxide, and the like. Among these, silicon oxide is preferably used.

The hybrid insulating material as described above is a mixture of an organic insulating material and an inorganic insulating material. Therefore, it has the advantages of an organic insulating material and an inorganic insulating material, and can be more suitably used in the present invention.
An example of such a hybrid insulating material is silica. Specific examples include polysilazane, polysiloxane, polysilane and the like, and polysilazane is particularly preferably used. This is because the thin film can exhibit sufficient insulation.

As the film thickness of the insulating layer used in the present invention, for example, when producing a solar cell using the mesh electrode substrate of the present invention, occurrence of a short circuit between the mesh conductive layer and other constituent layers of the solar cell. The material is not particularly limited as long as it can be prevented, and is appropriately determined according to the kind of the insulating material described above, but is preferably within a range of 10 nm to 100 μm. In particular, it is preferably in the range of 30 nm to 10 μm, and more preferably in the range of 50 nm to 1 μm.
If the thickness of the insulating layer is less than the above range, there is a possibility that sufficient insulation cannot be imparted. On the other hand, if it exceeds the above range, it is difficult to form by a patterning method described later. It is because it may become.

The method for forming the insulating layer used in the present invention is not particularly limited as long as the insulating layer can be formed only on the mesh conductive layer. For example, a conductive material used for the mesh conductive layer is used. A conductive material layer with an insulating layer in which an insulating layer is laminated on the entire surface of a continuously formed layer (hereinafter sometimes referred to as a conductive material layer) is formed and patterned to form an insulating layer. And forming a mesh conductive layer on the base material, forming a mesh conductive layer formed of a conductive material in a mesh shape, and forming a mesh insulating layer only on the mesh conductive layer The method etc. can be mentioned.
Especially, the method etc. which are described in the term of "D. The manufacturing method of a mesh electrode substrate" mentioned later can be used conveniently.

2. Mesh conductive layer Next, the mesh conductive layer used in the present invention will be described. The mesh conductive layer in the present invention is formed by forming a conductive material in a mesh shape on a base material. Further, the above-described insulating layer is formed only on the mesh conductive layer.

  Specifically, as illustrated in FIG. 1, the mesh conductive layer 3 used in the present invention is formed on the base material 1 via the adhesive layer 2, and the insulating layer is formed only on the mesh conductive layer 3. 4 may be formed.

The conductive material used for the mesh conductive layer in the present invention is not particularly limited as long as it has a desired conductivity, and is appropriately selected and used depending on the use of the mesh electrode substrate of the present invention. Examples thereof include metal materials, carbon, metal oxides, and conductive polymers. Especially, in this invention, a metal material is used suitably from a viewpoint that it is excellent in electroconductivity.
Examples of the metal material include titanium, aluminum, iron, nickel, iron-nickel alloy, copper, or copper-nickel alloy, niobium, tungsten, tantalum, chromium, and a stainless alloy.

When the mesh electrode substrate of the present invention is used for a dye-sensitized solar cell, the conductive material used in the present invention preferably has resistance to a redox pair contained in the electrolyte layer. In particular, in an electrolyte layer used in a general dye-sensitized solar cell, a redox couple containing highly corrosive iodine is widely used, and therefore it is preferable that the layer has corrosion resistance. Specific examples include titanium, aluminum, copper, a copper-nickel alloy, and a stainless alloy.
Whether or not the mesh conductive layer has resistance to the redox pair containing iodine can be evaluated by immersing it in an electrolyte solution containing iodine for 500 hours and measuring the change in weight. In this case, when the mesh conductive layer is corroded, the mesh conductive layer is dissolved (ionized), and the weight is reduced.

The film thickness of the mesh conductive layer used in the present invention is appropriately selected according to the type of conductive material and the like, and is not particularly limited as long as it is within a range showing a desired electric resistance value. Usually, it is preferably within a range of 100 nm to 1 mm. Especially, it is preferable to exist in the range of 300 nm-50 micrometers, and it is more preferable to be in the range of 500 nm-30 micrometers especially.
This is because if the thickness of the mesh conductive layer is smaller than the above range, the electrical resistance of the mesh conductive layer becomes too large, and the mesh conductive layer may not function as an electrode substantially. On the other hand, if the thickness is larger than the above range, depending on the type of conductive material forming the mesh conductive layer, the productivity may decrease from the viewpoint of manufacturing efficiency, manufacturing cost, and the like.

  The shape of the opening formed on the mesh electrode substrate by forming the mesh conductive layer is appropriately determined according to the use of the mesh electrode substrate of the present invention, and is not particularly limited. For example, a polygonal shape such as a triangle, a quadrangle, and a hexagon, a circle, an ellipse, and a continuous shape thereof can be given.

The ratio of the openings on the mesh electrode substrate of the present invention is appropriately selected according to the use of the mesh electrode substrate of the present invention and is not particularly limited, but is usually 50% to 95. % Is preferable.
When the ratio of the openings is less than the above range, for example, in a solar cell manufactured using the mesh electrode substrate of the present invention, it may be difficult to sufficiently receive sunlight from the mesh electrode substrate side. This is because the power generation efficiency may decrease. On the other hand, when the above range is exceeded, it may be difficult for the mesh conductive layer to exhibit its function as an electrode.

Further, the individual sizes of the openings are appropriately determined according to the use of the mesh electrode substrate of the present invention, but the opening width is preferably in the range of 1 μm to 2000 μm. Especially, it is preferable to exist in the range of 10 micrometers-1000 micrometers, and it is especially more preferable that it exists in the range of 100 micrometers-500 micrometers.
Here, the said opening width shows the distance of the widest part in each opening part formed on the mesh electrode substrate.

  Furthermore, the line width of the mesh conductive layer is preferably in the range of 0.02 μm to 10 mm, more preferably in the range of 1 μm to 2 mm, and more preferably in the range of 10 μm to 1 mm. preferable.

  The method for forming the mesh conductive layer used in the present invention is appropriately selected according to the type of conductive material for forming the mesh-like conductive layer, and is particularly limited as long as it can be formed into a desired shape. Although not performed, for example, a mesh-shaped conductive layer is separately formed in advance, and this is bonded to a base material (hereinafter referred to as method A) or a conductive material layer is formed and then patterned. And the like (hereinafter referred to as method B).

Examples of the method for forming the mesh conductive layer in the method A include a photolithography method using a resist.
Moreover, as a method of sticking the formed mesh conductive layer to the base material, a method of forming an adhesive layer on the mesh conductive layer or the base material and sticking it can be exemplified.

  In the method A as described above, when a mesh conductive layer is separately formed, the insulating layer may be patterned at the same time and bonded to the base material as a mesh conductive layer with an insulating layer.

On the other hand, as a method for forming the conductive material layer in the above-mentioned method B, for example, vacuum deposition (resistance heating, dielectric heating, EB heating), chemical vapor deposition, thermal chemical vapor deposition, photochemical vapor deposition Examples thereof include chemical vapor deposition methods (chemical vapor deposition method, CVD method), physical vapor deposition methods (physical vapor deposition method, PVD method) such as sputtering method and ion plating method.
In addition, when it is necessary to form a thicker mesh conductive layer, a method in which a conductive material layer separately prepared in advance is bonded via an adhesive layer or the like can be used.
Furthermore, examples of a method for forming a mesh conductive layer having a desired shape by forming an opening in the conductive material layer include dry etching and wet etching.

  In the method B as described above, a conductive material layer may be formed on the entire surface of the substrate, an insulating layer may be formed on the entire surface of the conductive material layer, and then patterned simultaneously with the insulating layer. A conductive material layer may be formed on the entire upper surface and patterned to form a mesh conductive layer, and then an insulating layer may be formed only on the mesh conductive layer.

As a formation method of the mesh conductive layer in the present invention, a formation method other than the above-described A method and B method may be used, and examples thereof include a method of directly forming in a mesh shape.
Examples of such a method include a method of directly drawing and forming a mesh-like conductive layer by an ink jet method or the like.

3. Next, the substrate used in the present invention will be described. The base material used for this invention will not be specifically limited if the other structure of the mesh electrode substrate of this invention can be supported, For example, a resin material, glass, etc. can be used.
As such a base material, a resin material is particularly preferably used from the viewpoint of good flexibility.

In addition, the substrate used in the present invention may be transparent or may not have, for example, the mesh electrode substrate of the present invention is a solar cell or the like. It is preferable that it is transparent when used.
As the transparency, when the mesh electrode substrate of the present invention is used in a dye-sensitized solar cell, the dye sensitizer carried by the metal oxide semiconductor fine particles contained in the porous layer absorbs light. Although it will not specifically limit if it has the transparency which can permeate | transmit sunlight which can produce an electromotive force, It should be 80% or more of total light transmittance. preferable.
In addition, the said total light transmittance can use the value measured by the measuring method based on JISK7361-1: 1997.

  The resin material having such transparency is not particularly limited as long as it exhibits desired transparency. For example, polyolefin (polyethylene, polypropylene, etc.), polyester (polyethylene terephthalate (PET), polybutylene) A substrate made of terephthalate, polyethylene naphthalate (PEN), polyamide (nylon-6, nylon-66, etc.), polyvinyl chloride, polyimide, polycarbonate, or a copolymer of these polymers can be used. .

Further, the thickness of the substrate is not particularly limited as long as it can provide the necessary self-supporting property to the mesh electrode substrate of the present invention, and is appropriately selected according to the material constituting the substrate. Usually, it is preferably in the range of 10 μm to 2000 μm. In particular, it is preferably in the range of 50 μm to 1800 μm, and more preferably in the range of 100 μm to 1500 μm.
If the substrate is thinner than the above range, the desired self-supporting property may not be obtained. On the other hand, if the substrate is thicker than the above range, it may be difficult to exhibit flexibility, This is because it may be difficult to reduce the thickness of the mesh electrode substrate of the invention and a solar cell including the mesh electrode substrate.

4). Other constituent layers The mesh electrode substrate of the present invention includes at least the insulating layer, the mesh conductive layer, and the base material described above, and has other constituent layers according to the use of the mesh electrode substrate. Also good. Examples thereof include a transparent electrode layer, an adhesive layer, a catalyst layer, a light scattering layer, a water vapor barrier layer, and a UV cut layer.
Hereinafter, other constituent layers will be described.

(1) Transparent electrode layer First, the transparent electrode layer used for this invention is demonstrated. The transparent electrode layer used for this invention will not be specifically limited if it has transparency and desired electroconductivity.

(I) Material for forming transparent electrode layer The transparent electrode layer used in the present invention is not particularly limited as long as it has transparency and functions as an electrode. Examples thereof include materials and metal oxides.

Examples of such a conductive polymer material having transparency include polythiophene, polyethylenedioxythiophene (PEDOT), polyaniline (PA), polypyrrole, or derivatives thereof.
Examples of such metal oxides include SnO ₂ , ZnO, a compound in which tin is added to indium oxide (ITO), fluorine-doped SnO ₂ (hereinafter referred to as FTO), and zinc oxide in indium oxide. The added compound (IZO) etc. can be mentioned.
These materials may be used alone or in combination of two or more.

In addition, the forming material as described above may have catalytic performance or may not have catalytic performance, but it is particularly preferable to have catalytic performance. This is because it is not necessary to separately form a catalyst layer, and therefore the mesh electrode substrate can be made thinner and lighter, and the manufacturing process can be simplified.
In addition, when the formation material of the said transparent electrode layer is a thing which does not have catalyst performance, it is preferable to form a catalyst layer separately from a viewpoint of electroconductivity improvement.

  Examples of the material for forming the transparent electrode layer having catalytic performance as described above include polyethylene dioxythiophene derivatives, polyaniline derivatives, polypyrrole derivatives, and the like.

  Further, the transparent electrode layer in the present invention may be composed of a single layer or may be composed of a plurality of layers laminated.

(Ii) Formation position of transparent electrode layer As a formation position of the transparent electrode layer used for this invention, it is preferable to form so that a mesh conductive layer may be contacted. It is because it can be made excellent in conductivity.
As the formation position of such a transparent electrode layer, for example, it is formed only on the mesh conductive layer opening (see FIG. 2A), or on the mesh conductive layer opening and the insulating layer. A mode in which a transparent electrode layer is formed on the entire surface of the substrate, and a mesh conductive layer and an insulating layer are formed on the transparent electrode layer. A transparent electrode layer is formed on the entire surface of the substrate, and the mesh conductive layer and the insulating layer. And a transparent electrode layer is formed in the opening of the mesh conductive layer (see FIG. 2B).
In addition, when a transparent electrode layer is formed on the opening part and insulating layer of a mesh conductive layer, it forms so that the transparent electrode layer formed on the opening part and insulating layer of a mesh conductive layer may not mutually contact There is a need. For example, there is a possibility that a short circuit occurs when used in a solar cell.

  In addition, the formation position of the transparent electrode layer is not particularly limited as long as it is formed so as to be in contact with the mesh conductive layer. In particular, the transparent electrode layer is formed in the opening of the mesh conductive layer. It is preferable. It is because it can be set as the mesh electrode substrate excellent in electroconductivity. Further, it is possible to prevent other constituent layers laminated thereafter from being peeled due to poor adhesion between the transparent electrode layer and the mesh conductive layer.

(Iii) Formation method of transparent electrode layer As a formation method of the transparent electrode layer used for this invention, vapor deposition methods, such as sputtering method and a vapor deposition method, etc., For transparent electrode layer formation containing the material mentioned above, for example Examples include a method of applying and drying a coating solution.
Specifically, in an embodiment in which the transparent electrode layer is formed only in the openings of the mesh conductive layer (see FIG. 2A), a method of performing sputtering using a metal mask can be suitably used. Moreover, in the aspect in which the transparent electrode layer is formed on the opening of the mesh conductive layer and the insulating layer, the method of applying the transparent electrode layer forming coating liquid after forming the mesh conductive layer and the insulating layer on the base material Etc. can be used. Further, in the embodiment in which the transparent electrode layer is formed on the entire surface of the substrate and the mesh conductive layer and the insulating layer are formed on the substrate, the method is particularly limited as long as the transparent electrode layer can be formed on the entire surface of the substrate. Instead, known methods can be used.

(Iv) Others The thickness of the transparent electrode layer used in the present invention is preferably not more than the thickness of the mesh conductive layer. This is because the height difference between the configurations of the formed mesh electrode substrate is alleviated, so that the short-circuit prevention effect can be improved.
The film thickness of such a transparent electrode layer is usually preferably in the range of 5 nm to 2000 nm, and more preferably in the range of 10 nm to 1000 nm. If the film thickness is thicker than the above range, it may be difficult to form a homogeneous transparent electrode layer, and the total light transmittance is lowered, making it difficult to obtain good photoelectric conversion efficiency. This is because there is a possibility. On the other hand, if the thickness is smaller than the above range, the conductivity of the transparent electrode layer may be insufficient.
In addition, the said film thickness shows the total film thickness which totaled the film thickness of all the layers to comprise, when a transparent electrode layer is comprised from several layers.

(2) Adhesive layer The adhesive layer in this invention is demonstrated. The adhesive layer used in the present invention is used when arbitrary constituent layers are bonded to each other, and specifically, can be suitably used for a base material-mesh conductive layer or the like.
The adhesive material used for such an adhesive layer is not particularly limited as long as it can exhibit adhesion between the layers on which the adhesive layer is formed. For example, a resin material or the like can be used, and specific examples include polyurethane, polyimide, polyethylene, polystyrene, and ionomer resin.

(3) Catalyst layer The catalyst layer in this invention is demonstrated. The catalyst layer used in the present invention has a function of improving the conductivity of the mesh electrode substrate of the present invention.
As described above, the catalyst layer used in the present invention is particularly preferably used from the viewpoint of improving conductivity when the material for forming the transparent electrode layer does not have catalytic performance.
As such a catalyst layer, the thing similar to the catalyst layer used in a general electrode substrate for solar cells can be used.

(4) Others The mesh electrode substrate of the present invention may contain arbitrary layers such as a light scattering layer, a water vapor barrier layer, and a UV cut layer in addition to the constituent layers described above. As such a light-scattering layer, water vapor | steam barrier layer, and UV cut layer, the thing similar to what is used for a general electrode substrate can be used suitably.

5. Mesh electrode substrate Examples of the use of the mesh electrode substrate of the present invention include organic solar cells such as dye-sensitized solar cells and organic thin film solar cells, and inorganic solar cells such as amorphous solar cells and compound semiconductor solar cells. Examples thereof include various solar batteries having flexibility such as batteries, displays using organic electroluminescence (organic EL) elements, and illumination.

B. Next, the solar cell of the present invention will be described. The solar cell of the present invention has the mesh electrode substrate according to the present invention.
Here, as a solar cell, it can divide roughly into an organic type solar cell and an inorganic type solar cell. For example, the organic solar cell is not particularly limited as long as an organic substance is used in a portion having a photoelectric conversion function, and specific examples include a dye-sensitized solar cell and an organic thin film type. A solar cell etc. can be mentioned.
Hereinafter, each solar cell will be described.

1. First, the dye-sensitized solar cell of the present invention will be described. The dye-sensitized solar cell of the present invention has the mesh electrode substrate according to the present invention.
Specifically, the dye-sensitized solar cell of the present invention is disposed at a position facing the mesh electrode substrate and the mesh conductive layer of the mesh electrode substrate, and has a function as a counter electrode. Contains metal oxide semiconductor fine particles formed on one of the electrode substrate for solar cell and the mesh electrode substrate or the electrode substrate for dye-sensitized solar cell and carrying a dye sensitizer. A porous layer and an electrolyte layer formed between the mesh electrode substrate and the dye-sensitized solar cell electrode substrate and containing a redox pair may be included.
Here, as a configuration other than the mesh electrode substrate used in the dye-sensitized solar cell of the present invention, components used in the dye-sensitized solar cell can be generally used.
Such a dye-sensitized solar cell of the present invention has two modes depending on whether the porous layer is formed on the mesh electrode substrate or the electrode substrate for the dye-sensitized solar cell. It can be divided roughly.

Each aspect of the dye-sensitized solar cell of the present invention will be described with reference to the drawings. 3 (a) and 3 (b) are schematic cross-sectional views showing an example of the dye-sensitized solar cell of the present invention.
In the dye-sensitized solar cell 20 illustrated in FIG. 3A, the porous layer 12 is formed on the electrode substrate 11 for the dye-sensitized solar cell, and the porous layer 12 and the mesh electrode substrate 10 face each other. Are arranged so as to sandwich the electrolyte layer 13.
In addition, in the dye-sensitized solar cell 20 illustrated in FIG. 3B, the porous layer 12 is formed on the mesh electrode substrate 10, and the porous layer 12 and the electrode for the dye-sensitized solar cell are provided. The substrate 11 is disposed so as to face the substrate 11 and is formed so as to sandwich the electrolyte layer 13.
Note that each configuration of the mesh electrode substrate 10 is the same as that described in the above section “A. Mesh electrode substrate”, and thus description thereof is omitted here.

According to the present invention, by using the mesh electrode substrate according to the present invention, it is possible to prevent a short circuit between the electrodes in the mesh electrode substrate and the dye-sensitized solar cell electrode substrate.
Further, since the insulating layer is formed only on the mesh conductive layer of the mesh electrode substrate, that is, the insulating layer is not formed in the opening of the mesh conductive layer, the sunlight reception in the mesh electrode substrate according to the present invention is performed. It is possible to prevent the area from decreasing and to obtain a dye-sensitized solar cell excellent in power generation efficiency.
Moreover, also from the viewpoint of the production method, a dye-sensitized solar that can be easily produced by forming the mesh electrode substrate by the formation method described in the section “D. Production method of mesh electrode substrate” described later. It can be a battery.
Hereinafter, each structure of the dye-sensitized solar cell of this invention is demonstrated.

(1) Mesh electrode substrate The mesh electrode substrate in this invention is demonstrated. The mesh electrode substrate used in the present invention is related to the present invention. Therefore, the configuration and the like of the mesh electrode substrate used in the present invention are the same as those described in the above section “A. Mesh electrode substrate”, and thus the description thereof is omitted here.

(2) Dye-sensitized solar cell electrode substrate Next, the dye-sensitized solar cell electrode substrate used in the present invention will be described. The dye-sensitized solar cell electrode substrate in the present invention is arranged to face the side of the mesh electrode substrate on which the mesh conductive layer is formed, and in the dye-sensitized solar cell of the present invention, It functions as a counter electrode facing the mesh electrode substrate.
Such a dye-sensitized solar cell electrode substrate may or may not have transparency, and is appropriately selected according to the mesh electrode substrate described above. It is. That is, at least one of the mesh electrode substrate and the dye-sensitized solar cell electrode substrate is selected so as to have transparency.

  When the dye-sensitized solar cell electrode substrate has transparency, the dye-sensitized solar cell electrode substrate is not particularly limited as long as it has conductivity, and is generally known transparent. An electrode base material can be used, for example, the mesh electrode substrate mentioned above can be used conveniently.

Further, when the dye-sensitized solar cell electrode substrate does not have transparency, the dye-sensitized solar cell electrode substrate is not particularly limited as long as it has a function as an electrode. For example, a metal electrode base material etc. can be mentioned.
Such a metal electrode base material may be composed only of a metal layer made of a metal material, or may have a structure in which a metal layer is formed on an arbitrary base material. However, among these, it is preferable that the layer is composed only of a metal layer (for example, a metal foil). This is because the metal layer is made of a metal material, and thus has excellent heat resistance, and can be fired when forming a porous layer described later.

Examples of the metal material used for the metal layer include copper, aluminum, titanium, chromium, tungsten, molybdenum, platinum, tantalum, niobium, zirconium, zinc, various stainless steels, and alloys thereof.
Moreover, it does not specifically limit as thickness of a metal layer, Usually, it is preferable to exist in the range of 100 nm-1000 micrometers. Especially, it is preferable to exist in the range of 500 nm-500 micrometers, and it is more preferable to be in the range of 1 micrometer-200 micrometers especially.

(3) Porous layer The porous layer used in the present invention contains metal oxide semiconductor fine particles carrying a dye sensitizer. Further, as described above, the porous layer is formed on one of the mesh electrode substrate and the dye-sensitized solar cell electrode substrate.
Hereinafter, the configuration of the porous layer will be described.

(I) Metal oxide semiconductor fine particles The metal oxide semiconductor fine particles used in the present invention are not particularly limited as long as they have semiconductor characteristics. For example, TiO ₂ , ZnO, SnO ₂ , ITO, ZrO include _{2, SiO 2, MgO, Al} 2 O 3, CeO 2, Bi 2 O 3, Mn 3 O 4, Y 2 O 3, WO 3, Ta 2 O 5, Nb 2 O 5, La 2 O 3 , etc. be able to. These metal oxide semiconductor fine particles are suitable for forming a porous porous layer, and can improve energy conversion efficiency and reduce manufacturing costs. Among them, in the present invention, it is preferable to use those made of TiO ₂ as the metal oxide semiconductor fine particles. This is because the semiconductor characteristics are particularly excellent.

  The metal oxide semiconductor fine particles used in the present invention may be all made of the same metal oxide, or two or more kinds of metal oxide semiconductor particles may be used. good.

(Ii) Dye sensitizer The dye sensitizer used in the present invention is not particularly limited as long as it can absorb light and generate an electromotive force. As such a dye sensitizer, for example, an organic dye or a metal complex dye can be used.
Examples of organic dyes include acridine dyes, azo dyes, indigo dyes, quinone dyes, coumarin dyes, merocyanine dyes, phenylxanthene dyes, indoline dyes, squalium dyes, and carbazole dyes. In the present invention, indoline dyes and carbazole dyes are particularly preferably used.
Further, as the metal complex dye, for example, a ruthenium dye is preferably used, and in particular, a ruthenium bipyridine dye and a ruthenium terpyridine dye, which are ruthenium complexes, are preferably used. This is because such a dye sensitizer has a wide wavelength range of light that can be absorbed, and thus, by supporting the fine particle on metal oxide semiconductor particles, the wavelength range of light that can be photoelectrically converted can be greatly expanded. .

(Iii) Arbitrary component As said porous layer, arbitrary components may contain other than the metal oxide semiconductor fine particle and dye-sensitizer which were mentioned above. Examples of such optional components include resin materials. This is because the brittleness of the porous layer can be improved by containing the resin material in the porous layer.
Examples of such resin materials include polyvinyl pyrrolidone, ethyl cellulose, caprolactan and the like.

(Iv) Porous layer The thickness of the porous layer is usually preferably in the range of 1 μm to 100 μm, and more preferably in the range of 3 μm to 30 μm.

The position at which the porous layer used in the present invention is formed is not particularly limited as long as it allows the dye-sensitized solar cell of the present invention to exhibit desired battery characteristics, and the dye of the present invention. It is appropriately selected depending on the function and application of the sensitized solar cell, and specifically, it may be formed on the mesh electrode substrate, and the electrode substrate for the dye-sensitized solar cell. It may be formed on the top.
Especially, it is preferable to form on the electrode substrate for dye-sensitized solar cells. As described above, since the electrode substrate for dye-sensitized solar cell used in the present invention can use various electrode base materials, the electrode substrate for dye-sensitized solar cell comprises a metal electrode base material. In this case, the porous layer can be fired at the time of forming the porous layer, the bondability between the metal oxide semiconductor fine particles contained in the porous layer is increased, and a porous layer having excellent strength can be obtained. is there.

The method for forming a porous layer in the present invention is not particularly limited as long as it can form a porous layer having a desired form, and a commonly used method can be used.
As such a method, for example, after forming the porous layer forming layer by applying and baking the porous layer forming coating solution containing the metal oxide semiconductor fine particles described above, the dye sensitizer is used. The method of forming by immersing in the dye sensitizer solution to contain and making it dry is mentioned.
In the above method, by firing the porous layer forming layer, the bonding property between the metal oxide semiconductor fine particles contained in the porous layer forming coating liquid is increased, and the porous layer having excellent strength and It has the advantage of being able to.

(4) Electrolyte layer The electrolyte layer used for this invention contains a redox couple.
The oxidation-reduction pair is not particularly limited as long as it is generally used as an electrolyte layer of a dye-sensitized solar cell. Among these, a redox couple of iodine or a redox couple of bromine is preferably used.

  The electrolyte layer may have components other than the redox couple, and may contain additives such as a crosslinking agent, a photopolymerization initiator, a thickener, and a room temperature molten salt. The electrolyte layer may be an electrolyte layer in any form of gel, solid, or liquid, but more preferably a solid electrolyte layer (solid electrolyte layer). This is because the solid electrolyte layer is less likely to cause problems such as liquid leakage and is easy to handle.

The thickness of the electrolyte layer in the present invention is not particularly limited as long as it is a thickness generally employed in the electrolyte layer.
As the film thickness of such an electrolyte layer, for example, in the case of a solid electrolyte layer, it is preferably in the range of 0.5 μm to 100 μm, particularly preferably in the range of 2 μm to 50 μm.

The method for forming an electrolyte layer in the present invention is not particularly limited as long as an electrolyte layer having a desired form can be formed, and a commonly used method can be used.
Examples of such a forming method include a method of preparing a solid electrolyte layer by preparing a resin electrolyte solution comprising an electrolyte solution containing a redox pair and a resin solution as a solidifying agent, and applying and drying. It is done.

(5) Dye-sensitized solar cell As the dye-sensitized solar cell of the present invention, the above-described mesh electrode substrate and dye-sensitized solar cell are used according to the use of the dye-sensitized solar cell of the present invention. You may have structures other than an electrode substrate, a porous layer, and an electrolyte layer.

The dye-sensitized solar cell of the present invention may be modularized. The modularization of the dye-sensitized solar cell of the present invention is not particularly limited as long as a plurality of the dye-sensitized solar cells of the present invention are connected, and a pair of mesh electrode substrates and A plurality of dye-sensitized solar cells may be formed between the electrode substrates for the dye-sensitized solar cells, or a plurality of the dye-sensitized solar cells of the present invention are connected. There may be.
Since such a dye-sensitized solar cell module is described in the section of “C. Solar cell module” described later, description thereof is omitted here.

2. Organic thin film solar cell Next, the organic thin film solar cell of the present invention will be described. The organic thin film solar cell of the present invention has the mesh electrode substrate according to the present invention.
Specifically, the organic thin-film solar cell of the present invention is arranged on the mesh electrode substrate described above and the mesh electrode substrate on the side where the mesh conductive layer is formed, and has a function as a counter electrode. It has a battery electrode substrate and a photoelectric conversion layer sandwiched between the two substrates.
Here, about structures other than the mesh electrode substrate which concerns on this invention, what is used for a general organic thin film type solar cell can be used.

The organic thin film solar cell of the present invention will be described with reference to the drawings. FIG. 4 is a schematic cross-sectional view showing an example of the organic thin film solar cell of the present invention.
The organic thin film solar cell 30 illustrated in FIG. 4 is an organic thin film solar cell electrode formed so as to face the mesh electrode substrate 10 described above and the side on which the mesh conductive layer 3 of the mesh electrode substrate 10 is formed. A substrate 34 and a photoelectric conversion layer 32 sandwiched between the mesh electrode substrate 10 and the organic thin-film solar cell electrode substrate 34, and a hole extraction between the mesh electrode substrate 10 and the photoelectric conversion layer 32. The electron extraction layer 33 may be formed between the layer 31, the organic thin film solar cell electrode substrate 34, and the photoelectric conversion layer 32.
Although not shown, the organic thin film solar cell of the present invention has an electron extraction layer between the mesh electrode substrate and the photoelectric conversion layer, and a hole extraction between the electrode substrate for the organic thin film solar cell and the photoelectric conversion layer. Each layer may be formed.
Here, each configuration of the mesh electrode substrate 10 is the same as that described in the above section “A. Mesh electrode substrate”, and thus the description thereof is omitted here.

According to the present invention, by using the mesh electrode substrate according to the present invention, similarly to the dye-sensitized solar cell described above, an organic material that can prevent short circuit and has excellent power generation efficiency and can be easily manufactured. A thin film solar cell can be obtained.
Hereinafter, each structure of the organic thin film type solar cell of this invention is demonstrated.

(1) Mesh electrode substrate First, the mesh electrode substrate in the present invention will be described. The mesh electrode substrate used in the present invention is related to the present invention. Therefore, the configuration and the like of the mesh electrode substrate used in the present invention are the same as those described in the above section “A. Mesh electrode substrate”, and thus the description thereof is omitted here.

(2) Electrode substrate for organic thin film solar cell Next, the electrode substrate for organic thin film solar cell used in the present invention will be described. As described above, the organic thin film solar cell electrode substrate in the present invention is disposed at a position facing the mesh conductive layer of the mesh electrode substrate and has a function as a counter electrode.
Such an organic thin film solar cell electrode substrate is generally composed of a counter electrode layer and a substrate. Depending on the use of the organic thin film solar cell of the present invention, the counter electrode layer And it may have a configuration other than the substrate.
Hereinafter, each structure of the electrode substrate for organic thin film type solar cells will be described.

(I) Counter electrode layer The counter electrode layer used for the electrode substrate for organic thin film solar cells in the present invention is not particularly limited as long as it has a function as an electrode. It can select suitably according to the magnitude of the work function with respect to the electrode layer used.

  As such a counter electrode layer, when the work function of the counter electrode layer is smaller than that of the electrode layer used in the mesh electrode substrate described above, an electrode for extracting electrons generated in the photoelectric conversion layer (electron extraction electrode) On the other hand, when the work function of the counter electrode layer is larger than that of the electrode layer used for the mesh electrode substrate, an electrode (positive electrode) for taking out holes generated in the photoelectric conversion layer is used. It functions as a hole extraction electrode).

  The material for forming such a counter electrode layer is not particularly limited as long as it has conductivity, and is appropriately selected according to a desired work function. What is used as an electrode base material in a battery can be used, for example, a transparent electrode layer, a metal electrode layer, etc. can be mentioned.

In addition, the counter electrode layer as described above may or may not have transparency, but may be appropriately selected depending on whether or not the mesh electrode substrate described above has transparency. It is what is done.
In the present invention, when the counter electrode layer has transparency, the same materials as those used for the transparent electrode layer described in the section “A. Mesh electrode substrate” can be used. Description of is omitted.
Further, when the counter electrode layer does not have transparency, it is not particularly limited as long as it has a desired function. For example, a metal electrode layer made of a metal layer is preferably used. Can be used.

  Moreover, as a counter electrode layer in this invention, it may be formed in the whole surface on a photoelectric converting layer, and may be formed in pattern shape.

  The counter electrode layer used in the present invention may be a single layer or may be laminated using materials having different work functions.

As the film thickness of the counter electrode layer used in the present invention, when it is a single layer, the film thickness is within a range of 0.1 nm to 500 nm when the total film thickness of each layer is composed of a plurality of layers. It is preferable that it is in the range of 1 nm to 300 nm.
When the thickness of the counter electrode layer in the present invention is thinner than the above range, the sheet resistance of the counter electrode layer becomes too large, and thus the generated charge may not be sufficiently transmitted to the external circuit. This is because if it is thick, the total light transmittance is lowered, and the photoelectric conversion efficiency may be lowered.

  As a method for forming the counter electrode layer in the present invention, a general electrode layer forming method can be used. For example, a dry coating method such as a vacuum deposition method, a sputtering method, a PVD method such as an ion plating method, or a CVD method. A construction method can be mentioned. Moreover, the wet coating method apply | coated using the metal paste etc. containing metal colloids, such as Ag, can also be used.

  Further, the method for patterning the counter electrode layer is not particularly limited as long as a desired pattern can be accurately formed, and examples thereof include a photolithography method.

(Ii) Substrate Next, the substrate used for the organic thin film solar cell electrode substrate in the present invention will be described. The substrate used in the present invention supports the counter electrode layer described above.
Such a substrate is not particularly limited as long as the above-described counter electrode layer can be formed on the surface, and may be transparent as in the case of the counter electrode layer. Although it may not be, it is appropriately selected depending on whether or not the mesh electrode substrate described above is transparent.

When the substrate used in the present invention has transparency, the same materials as those used for the transparent substrate described in the above section “A. Mesh electrode substrate” can be used. Is omitted.
In addition, when the substrate used in the present invention is not transparent, it is not particularly limited as long as it can support the above-described counter electrode layer, and a substrate used as a general substrate. Can be used.

(Iii) Others As the electrode substrate for an organic thin film solar cell in the present invention, the mesh electrode substrate of the present invention described above may be used.

(3) Photoelectric conversion layer Next, the photoelectric conversion layer in the present invention will be described. The photoelectric conversion layer used in the present invention is sandwiched between the mesh electrode substrate and the organic thin film solar cell electrode substrate described above.
The photoelectric conversion layer generally refers to a member that contributes to charge separation of an organic thin film solar cell and has a function of transporting generated electrons and holes toward electrodes in opposite directions.

  The photoelectric conversion layer used in the present invention may be a single layer having both electron-accepting and electron-donating functions, and may have an electron-accepting layer and an electron-donating function. The electron donating layer may be laminated.

(4) Arbitrary Constituent Layer The organic thin film type solar cell of the present invention is the organic thin film type of the present invention as long as it has the mesh electrode substrate, the organic thin film type solar cell electrode substrate, and the photoelectric conversion layer described above. Depending on the function, use, etc. of the solar cell, it may have an arbitrary constituent layer. Examples thereof include a hole extraction layer and an electron extraction layer.
The organic thin film solar cell of the present invention includes a protective sheet, a filler layer, a barrier layer, a protective hard coat layer, a strength support layer, an antifouling layer, and a high light reflection as necessary in addition to the constituent layers described above. A functional layer such as a layer, a light containment layer, or a sealing material layer may be included. In addition, an adhesive layer may be formed between the functional layers depending on the layer configuration.
In addition, about each of these layers, it can be made to be the same as that of what is described in Unexamined-Japanese-Patent No. 2007-73717 etc.

(5) Organic thin film type solar cell The organic thin film type solar cell of this invention may be modularized like the dye-sensitized solar cell mentioned above.
Since such an organic thin film type solar cell module is described in the section of “C. Solar cell module” described later, description thereof is omitted here.

C. Next, the solar cell module of the present invention will be described. The solar cell module of the present invention is characterized in that a plurality of the solar cells according to the present invention are connected.

The solar cell module of the present invention will be described with reference to the drawings. 5A and 5B are schematic cross-sectional views showing an example of the solar cell module of the present invention.
As illustrated in FIG. 5 (a), the solar cell module 40 of the present invention has a plurality of dye-sensitized solar cells 20 connected in parallel. As shown in FIG. 5A, the end of the solar cell module 40 is normally sealed with a sealing material 14 or the like, and a partition wall 15 is formed between the dye-sensitized solar cells 20. .
On the other hand, as illustrated in FIG. 5 (b), the solar cell module 40 of the present invention has a plurality of organic thin-film solar cells 30 connected in parallel. Similarly to FIG. 5A, the end of the solar cell module 40 is sealed with a sealing material 14 or the like, and a partition wall 15 is formed between each organic thin film solar cell 30.
In addition, about each structure of the mesh electrode substrate 10, the dye-sensitized solar cell 20, and the organic thin film type solar cell 30 in Fig.5 (a), (b), said "A. Mesh electrode substrate" and "B. Since it was described in the section of “Solar cell”, description thereof is omitted here.

The connection of a plurality of solar cells in the solar cell module of the present invention is not particularly limited as long as a desired electromotive force can be obtained, and may be only in series or only in parallel. It may be a combination of serial and parallel.
In addition, since it described in the said "B. solar cell" about the solar cell, description here is abbreviate | omitted.

  According to this invention, since the solar cell provided with the mesh electrode substrate which concerns on the said invention is used, it can be set as the solar cell module which was provided with the short circuit prevention effect and was excellent in electric power generation efficiency.

D. Next, a method for manufacturing a mesh electrode substrate according to the present invention will be described.
The method for producing a mesh electrode substrate of the present invention includes a base material, a mesh conductive layer made of a conductive material formed in a mesh shape on the base material, and an insulating layer formed on the mesh conductive layer. A method of manufacturing a mesh electrode substrate, comprising: a conductive material layer forming step of forming a continuous conductive material layer using the conductive material; and forming an insulating layer on the entire surface of the conductive material layer, A manufacturing method comprising: a conductive material layer with insulating layer forming step of forming a material layer; and a patterning step of forming the conductive material layer with insulating layer in a mesh shape.

Such a method for producing a mesh electrode substrate of the present invention will be described with reference to the drawings. FIG. 6 is a process diagram showing an example of a method for producing a mesh electrode substrate of the present invention. The manufacturing method of the mesh electrode substrate 10 shown in this example includes a conductive material layer forming step (FIG. 6A) for forming a conductive material layer 3 ′ on the entire surface of the base material 1, and the surface of the conductive material layer 3 ′. The insulating layer 4 is formed on the entire upper surface, the conductive material layer with insulating layer forming step (FIG. 6B) for forming the conductive material layer 6 with insulating layer, and the conductive material layer 6 with insulating layer is formed in a mesh shape. This is a method of manufacturing a mesh electrode substrate 10 having a conductive material layer 6 ′ with an insulating layer formed in a mesh shape on the base material 1 by a patterning step (FIG. 6C).
Moreover, as illustrated in FIG. 7, as the conductive material layer forming step in the method for manufacturing a mesh electrode substrate of the present invention, an adhesive layer 2 is formed on the base material 1 (FIG. 7A), and the adhesive layer 2 is formed. The conductive material layer 3 ′ may be bonded via (FIG. 7B). Here, reference numerals not described in FIG. 7 are the same as those in FIG.

FIG. 8 is a process diagram showing another example of the method for producing a mesh electrode substrate of the present invention. The manufacturing method of the mesh electrode substrate 10 shown in this example includes a conductive material layer forming step (FIG. 8 (a)) in which a separate conductive material layer 3 ′ is prepared in advance, and an insulating layer 4 on the entire surface of the conductive material layer 3 ′. And forming a conductive material layer with insulating layer (FIG. 8B), and a patterning step of patterning the conductive material layer with insulating layer 6 (FIG. 8C). The conductive material layer 6 ′ with an insulating layer formed in a mesh shape through the adhesive layer 2 is bonded to the substrate 1.
Although not shown, the patterning step may be performed after the conductive material layer with an insulating layer is formed in the same manner as in FIG. 8 described above and then bonded to the base material via the adhesive layer.

According to the present invention, the conductive material layer with an insulating layer is formed in the mesh pattern by the patterning step after the conductive material layer with the insulating layer is formed by the conductive material layer forming step with the insulating layer. Can be simultaneously formed in a mesh shape. Therefore, it is possible to easily manufacture a mesh electrode substrate having an excellent short-circuit prevention effect.
In addition, since a conductive material layer is separately formed in the conductive material layer forming step, conductive material layers having various film thicknesses can be obtained according to the use of the mesh electrode substrate manufactured according to the present invention. A mesh conductive layer having a large film thickness and high conductivity can be formed.
Therefore, when used in a solar cell or the like, a short circuit between the electrodes can be prevented, and a mesh electrode substrate having excellent power generation efficiency can be easily manufactured.
Hereinafter, each process used for this invention is demonstrated.

1. Conductive Material Layer Forming Step First, the conductive material layer forming step in the present invention will be described. This step is a step of forming a continuous conductive material layer using a conductive material.

  The conductive material layer formed by this step is formed continuously using a conductive material. As the conductive material for forming the conductive material layer, the same conductive material as that used for the mesh electrode substrate described above can be suitably used.

  The method for forming such a conductive material layer is appropriately determined depending on the type of the conductive material and the like, and is not particularly limited as long as the conductive material layer having a desired function can be formed. For example, the aspect (refer FIG. 6 and FIG. 7) which forms a conductive material layer on a base material, the aspect (refer FIG. 8) which prepares a conductive material layer separately, etc. can be mentioned. In addition, about the formation method of the electrically conductive material layer in such each aspect, since it can be set as the method similar to the method described in the term of the said "A. mesh electrode substrate", description here is abbreviate | omitted.

2. Next, the conductive material layer forming step with an insulating layer in the present invention will be described. This step is a step of forming an insulating layer on the entire surface of the conductive material layer described above to form a conductive material layer with an insulating layer.

  The conductive material layer with an insulating layer formed in this step is one in which an insulating layer is formed on the entire surface of the conductive material layer.

  The method for forming such a conductive material layer with an insulating layer is not particularly limited as long as the insulating layer can be formed on the entire surface of the conductive material layer formed by the above-described conductive material layer forming step. For example, a method of preparing and applying a coating solution for forming an insulating layer containing a material for forming an insulating layer can be used.

  As an insulating layer used in this step, the mesh conductive layer and other constituent layers of the solar cell can be insulated when a solar cell including the mesh electrode substrate manufactured according to the present invention is manufactured. The insulating layer is not particularly limited as long as it is the same as the insulating layer described in the above section “A. Mesh electrode substrate”.

3. Patterning Step Next, the patterning step in the present invention will be described. This step is a step of forming the above-described conductive material layer with an insulating layer in a mesh shape.

The patterning method in this step is not particularly limited as long as the conductive material layer with an insulating layer formed by the above-described conductive material layer with insulating layer formation step can be formed in a mesh shape. For example, a method of forming a conductive material layer and an insulating layer in a mesh simultaneously by forming a conductive material layer with an insulating layer on a substrate by various methods and performing patterning in this step (see FIGS. 6 and 7). It is also possible to form a conductive material layer with an insulating layer separately, and then form a conductive material layer with an insulating layer in a mesh shape and paste it onto a substrate (see FIG. 8). Alternatively, a method of forming a conductive material layer with an insulating layer in a mesh after forming a conductive material layer with an insulating layer separately and pasting on a substrate may be used.
In addition, as a patterning method in this process, the method similar to the method used for the mesh electrode substrate mentioned above can be used.

  Further, the shape of the openings of the mesh conductive layer formed by this step, the ratio of the openings, the size of each opening, and the line width of the mesh conductive layer are described in the above section “A. Mesh electrode substrate”. Since it is the same as that of what was described in (1), description here is abbreviate | omitted.

4). Other Steps The method for manufacturing a mesh electrode substrate of the present invention may include other steps other than the above-described conductive material layer forming step, insulating layer-attached conductive material layer forming step, and patterning step.
The other steps in the present invention can be appropriately determined according to the use of the mesh electrode substrate produced by the present invention, and examples thereof include a transparent electrode layer forming step.

  The transparent electrode layer formed in the transparent electrode layer forming step is not particularly limited as long as it has transparency and desired conductivity, and a general transparent electrode layer forming material is used. For example, the same transparent electrode layer used for the mesh electrode substrate described above can be used.

Moreover, as a method of forming such a transparent electrode layer, the method of preparing the coating liquid for transparent electrode layer formation containing the formation material of a transparent electrode layer, apply | coating and drying etc. can be mentioned, for example. Specifically, when formed only on the opening of the mesh conductive layer (see FIG. 2A), for example, a method of performing a sputtering method using a metal mask can be used. Further, when formed on the opening of the mesh conductive layer and the insulating layer, for example, after forming the mesh electrode layer having the insulating layer formed on the surface on the base material, the transparent containing the forming material of the transparent electrode layer An electrode layer forming coating solution can be prepared, applied, and dried.
In the case where the transparent electrode layer is formed on the entire surface of the substrate and the mesh conductive layer and the insulating layer are formed on the transparent electrode layer, the transparent electrode layer can be formed on the entire surface of the substrate. If it does not specifically limit.
In the case where the transparent electrode layer is formed on the entire surface of the substrate, the mesh conductive layer and the insulating layer are formed, and the transparent electrode layer is formed in the opening of the mesh conductive layer (see FIG. 2B). The method is not particularly limited as long as a desired transparent electrode layer can be formed.
Here, as the material for forming the transparent electrode layer, the same material as that described in the above section “A. Mesh electrode substrate” can be used, and therefore, description thereof is omitted here.

5. Mesh electrode substrate The mesh electrode substrate manufactured by the present invention will be described.
The mesh electrode substrate manufactured by the present invention has a base material, a mesh conductive layer formed on the base material, and an insulating layer formed only on the mesh conductive layer.
As a use of the mesh electrode substrate manufactured by the present invention, various solar cells, organic EL, lighting, and the like can be mentioned as described in the above section “A. Mesh electrode substrate”.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the technical idea described in the claims of the present invention has substantially the same configuration and exhibits the same function and effect regardless of the case. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.

[Example]
(Mesh part production)
A PEN plate (Q-65FA, manufactured by Teijin DuPont) with a 50 mm square and a thickness of 125 μm is prepared as a base material, and an ionomer resin material (High Milan, Mitsui DuPont Chemical Co., Ltd.) with a 50 mm square and a film thickness of 30 μm as an adhesive layer on the base material. And a SUS plate (SUS304, manufactured by Takeuchi Metal Foil Powder Co., Ltd.) having a 50 mm square and a thickness of 20 μm was prepared as a conductive material layer.
The base material and the SUS plate were bonded via the adhesive layer by a vacuum laminating method (100 ° C., 10 min, 0.1 MPa condition).
Thereafter, a 2% polysilazane coating solution (Aquamica NP140, manufactured by Kyowa) was applied onto the SUS plate, dried and cured to form an insulating layer having a thickness of 150 nm (in terms of dry film thickness).
Next, a mesh electrode substrate was fabricated using a photoetching method so that the SUS plate had a honeycomb structure with a line width of 50 μm, an opening width of 450 μm, and an opening ratio of 80% within a 3 cm square range.
On the mesh electrode substrate, a PEDOT / PSS 2% aqueous dispersion was applied as a transparent electrode layer and a catalyst layer so that the coating amount was 0.3 g / m ² (solid content) and dried (120 ° C., 10 min). As a result, a transparent electrode layer was formed to obtain a mesh electrode substrate.

(Dye-sensitized solar cell production)
Next, 0.5% of titanium oxide particles (P25, manufactured by Nippon Aerosil Co., Ltd.) in ethanol on a 50 μm thick Ti foil (made by Takeuchi Metal Foil Powder Co., Ltd.) as an electrode substrate for a dye-sensitized solar cell. A paste mixed with ethyl cellulose (STD-100, manufactured by Nisshin Kasei Kogyo Co., Ltd.) was applied and dried, and then fired (500 ° C., 30 min) to form a porous layer forming layer having a thickness of 5 μm.
Thereafter, a dye sensitizer solution in which 0.3 mM of N719 dye (manufactured by Dyesol) was dissolved in an acetonitrile / t-butanol = 1/1 (volume ratio) solution was prepared, and the dye sensitizer solution was porous. The electrode substrate for a dye-sensitized solar cell on which the layer for forming a quality layer was laminated was immersed for 20 hours. Next, after rinsing with acetonitrile, the porous layer was formed on the dye-sensitized solar cell electrode substrate by drying at room temperature.

Next, 6 mol / L hexyl methyl imidazolum iodide (manufactured by Toyama Pharmaceutical Co., Ltd.), 0.6 mol / L I2 (manufactured by Merck), 0.45 mol / L n-methyl benzoimidazole (manufactured by Aldorich) were added to hexyl methyl imidazolum tetracyano borate ( An electrolyte solution dissolved in Merck) was prepared.
Subsequently, a resin solution in which 10% by mass of ethyl cellulose (STD-100, manufactured by Nisshin Kasei Kogyo Co., Ltd.) was dissolved in ethanol was prepared and mixed in the above-described electrolyte solution: resin solution = 1: 6 (weight ratio). Thus, a resin electrolyte solution was obtained. This was coated on the porous layer on the dye-sensitized solar cell electrode substrate with a Miya bar and heated (120 ° C., 10 min) to obtain a solid electrolyte layer.
Thereafter, the mesh electrode substrate and the dye-sensitized solar cell electrode substrate were bonded together and laminated at 120 ° C., 10 min, 0.1 MPa to obtain a dye-sensitized solar cell.

[Comparative example]
A PEN plate (Q-65FA, manufactured by Teijin DuPont) with a 50 mm square and a thickness of 125 μm is prepared as a base material, and an ionomer resin material (High Milan, Mitsui DuPont Chemical Co., Ltd.) with a 50 mm square and a film thickness of 30 μm as an adhesive layer on the base material. And a SUS plate (SUS304, manufactured by Takeuchi Metal Foil Powder Co., Ltd.) having a 50 mm square and a thickness of 20 μm was prepared as a conductive material layer.
The said base material and the said electrically-conductive material layer were bonded by the vacuum lamination method (100 degreeC, 10 min, 0.1 MPa conditions) through the said contact bonding layer.
Next, a mesh electrode substrate having a honeycomb structure with a line width of 50 μm, an opening width of 450 μm, and an opening ratio of 80% was manufactured by using a photoetching method in the range of 3 cm × 3 cm.
Then, the dye-sensitized solar cell was produced similarly to the Example.

[Evaluation]
About the dye-sensitized solar cell produced by the said Example and the said comparative example, the photoelectric conversion characteristic was measured for each 5 pieces each.
As a result, in the dye-sensitized solar cell of the example, battery performance could be confirmed in all of the five dye-sensitized solar cells. The performance was as follows: average value of 5 cells: J _SC = 5 mA / cm ² , V _OC = 0.65 V, FF = 0.65, η = 2.1%.
On the other hand, in the dye-sensitized solar cell of the comparative example, a short circuit was confirmed in 3 out of 5 dye-sensitized solar cells. The average value of the two cells in which no short circuit occurred was J _SC = 5.1 mA / cm ² , V _OC = 0.63 V, FF = 0.6, and η = 1.9%.
In addition, the said measurement result is the value which measured IV characteristic on the conditions of 100 mW / cm < ² > and 1SUN in the spectral sensitivity measuring apparatus CEP2000 (made by spectrometer).
In addition, the dye-sensitized solar cells prepared in Examples and Comparative Examples were placed in an oven adjusted to 65 ° C., and IV characteristics after 1000 hours were measured to evaluate the performance maintenance rate.
As a result, the cell average value of the performance maintenance ratio in each dye-sensitized solar cell was 60% in the example and 45% in the comparative example. From this, since the Example showed a higher value than the comparative example, it was suggested that it was excellent in durability.

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Adhesive layer 3 ... Mesh conductive layer 3 '... Conductive material layer 4 ... Insulating layer 5 ... Transparent electrode layer 6 ... Conductive material layer with insulating layer 6' ... Patterned conductive material layer with insulating layer 10 ... Mesh electrode substrate 11 ... Electrode substrate for dye-sensitized solar cell 12 ... Porous layer 13 ... Electrolyte layer 14 ... Sealing material 15 ... Partition 20 ... Dye-sensitized solar cell 30 ... Organic thin film solar cell 31 ... Hole extraction Layer 32 ... Photoelectric conversion layer 33 ... Electron extraction layer 34 ... Electrode substrate for organic thin film solar cell

Claims (6)

A substrate;
A mesh conductive layer made of a conductive material formed in a mesh shape on the substrate;
An insulating layer formed only on the mesh conductive layer;
A transparent electrode layer formed in contact with the mesh conductive layer at the opening of the mesh conductive layer;
A mesh electrode substrate comprising: The mesh electrode substrate according to claim 1, wherein a film thickness of the transparent electrode layer is equal to or less than a film thickness of the mesh conductive layer. A substrate;
A mesh conductive layer made of a conductive material formed in a mesh shape on the substrate;
An insulating layer formed only on the mesh conductive layer;
A solar cell comprising: a mesh electrode substrate having: The solar cell according to claim 3, further comprising a transparent electrode layer formed so as to be in contact with the mesh conductive layer at an opening of the mesh conductive layer. A solar cell module comprising a plurality of the solar cells according to claim 3 connected to each other. A method for producing a mesh electrode substrate, comprising: a base material; a mesh conductive layer made of a conductive material formed in a mesh shape on the base material; and an insulating layer formed on the mesh conductive layer.
A conductive material layer forming step of forming a continuous conductive material layer using the conductive material;
Forming an insulating layer over the entire surface of the conductive material layer, and forming a conductive material layer with an insulating layer to form a conductive material layer with an insulating layer; and
A patterning step of forming the conductive material layer with an insulating layer in a mesh shape;
A method for producing a mesh electrode substrate, comprising:

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