JP5685881B2 - Ultrasonic cleaning method - Google Patents
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- JP5685881B2 JP5685881B2 JP2010232482A JP2010232482A JP5685881B2 JP 5685881 B2 JP5685881 B2 JP 5685881B2 JP 2010232482 A JP2010232482 A JP 2010232482A JP 2010232482 A JP2010232482 A JP 2010232482A JP 5685881 B2 JP5685881 B2 JP 5685881B2
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Description
本発明は、各種マスク、ガラス基板、金属板等の基板状の素材に付着した異物を、超音波振動子を用いて除去する超音波洗浄方法及びその装置に関するものである。特にフォトマスクの洗浄方法に関するものである。 The present invention relates to an ultrasonic cleaning method and apparatus for removing foreign matter attached to a substrate-like material such as various masks, glass substrates, and metal plates using an ultrasonic vibrator. In particular, the present invention relates to a photomask cleaning method.
半導体ウェハ、フォトマスク、液晶基板等の基板を洗浄する方法として、例えば洗浄液を収容した槽（洗浄槽）に基板を浸漬し、槽の底部に設けた超音波振動子から超音波を付与して超音波洗浄を行う方法がある。超音波振動子に電圧を印加すると、固有の周波数の超音波が発生する。この超音波振動が洗浄槽内の洗浄液に印加されることにより、洗浄液中の基板を洗浄することができる。 As a method for cleaning a substrate such as a semiconductor wafer, a photomask, or a liquid crystal substrate, for example, the substrate is immersed in a tank (cleaning tank) containing a cleaning liquid, and ultrasonic waves are applied from an ultrasonic vibrator provided at the bottom of the tank. There is a method of performing ultrasonic cleaning. When a voltage is applied to the ultrasonic transducer, an ultrasonic wave having a specific frequency is generated. By applying this ultrasonic vibration to the cleaning liquid in the cleaning tank, the substrate in the cleaning liquid can be cleaned.
また、ノズルに超音波振動子を装着し、ノズル内に供給した洗浄液に超音波振動を
印加した上で洗浄液を基板（被洗浄物）に向けて噴射することにより洗浄する方法がある。さらに、棒状の振動部材を斜めに切断して超音波照射面とし、切断面とは逆の端に超音波振動子を取り付けて、照射面を被洗浄物に対向して微小間隔を保って装着させて側部から洗浄液を流入させて被洗浄物を洗浄する超音波装置が開示されている（特許文献１参照）。
Further, there is a method in which an ultrasonic vibrator is attached to the nozzle, and cleaning is performed by applying ultrasonic vibration to the cleaning liquid supplied into the nozzle and then spraying the cleaning liquid toward the substrate (object to be cleaned). Furthermore, the rod-shaped vibrating member is cut obliquely to form an ultrasonic irradiation surface, and an ultrasonic transducer is attached to the end opposite to the cutting surface, and the irradiation surface is attached to the object to be cleaned with a small interval. An ultrasonic device that cleans an object to be cleaned by allowing a cleaning liquid to flow from a side portion is disclosed (see Patent Document 1).
例えば、従来の超音波洗浄装置として、図３（ａ）に示すように、振動部材１１の一端は斜めに切断されて、超音波照射面５が形成され、従来の振動部材１１の他端に膨大部１１ａが構成されて、この膨大部１１ａに従来の超音波振動子１２が装着され、この超音波振動子１２を覆うように振動子ケース１３が従来の振動部材１１の膨大部１１ａにパッキン１４を介して不図示のネジで固定され、振動子ケース１３の端部をケーブル１５が貫通し、ケーブル１５のコード１５ａが従来の超音波振動子１２に接続され、図３（ｂ）に示すように、洗浄液供給ノズル４の内部に洗浄液を供給し、回転する被洗浄物７の上に洗浄液を供給するとともに、この洗浄液に超音波振動子１２からの超音波を伝播させて被洗浄物７に照射して洗浄するようにした洗浄装置が提案されている。 For example, as a conventional ultrasonic cleaning apparatus, as shown in FIG. 3A, one end of the vibration member 11 is cut obliquely to form an ultrasonic irradiation surface 5, and the other end of the conventional vibration member 11 is The enormous portion 11 a is configured, and the conventional ultrasonic transducer 12 is attached to the enormous portion 11 a, and the vibrator case 13 is packed on the enormous portion 11 a of the conventional vibrating member 11 so as to cover the ultrasonic transducer 12. 14 is fixed with a screw (not shown), the cable 15 passes through the end of the transducer case 13, and the cord 15a of the cable 15 is connected to the conventional ultrasonic transducer 12, as shown in FIG. As described above, the cleaning liquid is supplied into the cleaning liquid supply nozzle 4, the cleaning liquid is supplied onto the rotating object 7 to be cleaned, and the ultrasonic wave from the ultrasonic vibrator 12 is propagated to the cleaning liquid 7 to be cleaned 7. To irradiate and wash Cleaning apparatus has been proposed a.
しかし、従来の超音波振動子を用いた洗浄装置では、超音波振動子の有効洗浄範囲が狭いため、被洗浄物の回転中心から外周方向に向かって超音波振動子を揺動させ、これと同時に被洗浄物を高速回転させて、スパイラル状に回転中心部から外周方向へ向かう洗浄方法が採られて来た。
そのため、超音波の照射されていない部分にも洗浄液がさらされることで、例えば、フォトマスクのような被洗浄物に対して、寸法変動および膜ダメージを起こしやすい問題があった。
本発明の課題は、被洗浄物全面に超音波を照射し、洗浄時間を短縮することで洗浄液による被洗浄物へのダメージを低減させる超音波洗浄装置およびその方法の提供にある。
However, since the effective cleaning range of the ultrasonic vibrator is narrow in the conventional cleaning device using the ultrasonic vibrator, the ultrasonic vibrator is swung from the center of rotation of the object to be cleaned toward the outer periphery. At the same time, a cleaning method has been adopted in which an object to be cleaned is rotated at a high speed and spirally directed from the center of rotation toward the outer periphery.
For this reason, there is a problem that the cleaning liquid is also exposed to a portion that is not irradiated with ultrasonic waves, so that, for example, an object to be cleaned such as a photomask is likely to undergo dimensional variation and film damage.
An object of the present invention is to provide an ultrasonic cleaning apparatus and method for reducing damage to an object to be cleaned by a cleaning liquid by irradiating the entire surface of the object to be cleaned with ultrasonic waves and shortening the cleaning time.
上記課題を解決するための本発明の具体的な構成を以下に示す。
（請求項１）
面形状の超音波振動子と、
前記超音波振動子の片面に接着された面形状の振動部材と、
前記超音波振動子と振動部材の双方を貫通するように設けた複数の孔と、
前記複数の孔を通過し、前記振動部材の片面から洗浄液を吐出する複数のノズルとを備えた構成の超音波洗浄装置を用いて、
前記振動部材のうち、前記超音波振動子と接していない面と微小間隙を設けて対向するように被洗浄物を支持し、
被洗浄物全面に超音波を照射し、前記複数のノズルから洗浄液を吐出しながら、前記超音波振動子を振動させて、被洗浄物を洗浄することを特徴とする洗浄方法。
A specific configuration of the present invention for solving the above problems will be described below.
(Claim 1)
A surface-shaped ultrasonic transducer;
A surface-shaped vibrating member bonded to one side of the ultrasonic transducer;
A plurality of holes provided so as to penetrate both the ultrasonic transducer and the vibration member;
Using an ultrasonic cleaning device having a configuration including a plurality of nozzles that pass through the plurality of holes and discharge a cleaning liquid from one surface of the vibration member,
The object to be cleaned is supported so as to be opposed to the surface of the vibrating member that is not in contact with the ultrasonic transducer with a minute gap,
A cleaning method, wherein the object to be cleaned is cleaned by irradiating the entire surface of the object to be cleaned and oscillating the ultrasonic vibrator while discharging the cleaning liquid from the plurality of nozzles.
本発明の超音波洗浄装置によれば、超音波発生部の振動部材のサイズを被洗浄物のサイズに合うように設計することにより、被洗浄物の移動距離が少なくて済み、かつ、超音波発生部に設けた洗浄液供給口から洗浄液を供給することで洗浄液の交換効率を上げることを可能とし、従来洗浄より短時間で洗浄することが可能となる。 According to the ultrasonic cleaning apparatus of the present invention, by designing the size of the vibration member of the ultrasonic generator to match the size of the object to be cleaned, the moving distance of the object to be cleaned can be reduced, and the ultrasonic wave By supplying the cleaning liquid from the cleaning liquid supply port provided in the generation unit, it is possible to increase the replacement efficiency of the cleaning liquid, and it is possible to perform cleaning in a shorter time than conventional cleaning.
以下、本発明の超音波洗浄装置の具体的構成についてその一例を詳細に説明する。
なお、後述する実施形態は、本発明の具体的な構成例であり、特に指定のない限り、本発明を限定するものではない。
図１は本発明の超音波洗浄装置６を示す概略構成図である。
図で示されるとおり、超音波振動子２と振動部材１は面形状をしており、それぞれの片面で接着されている。そして、前記超音波振動子と振動部材の双方を貫通するように設けた複数の穴３（以下、洗浄液供給口３とも言う）に、複数の洗浄液供給用のノズル４とを備えられている。
洗浄を行う際には、振動部材１のうち、超音波振動子２と接していない面と微小間隙を設けて対向するように被洗浄物７を支持するようになっている。この時、複数のノズル４から洗浄液を吐出しながら、前記超音波振動子２を発振させて、振動部材１を振動させ、被洗浄物７を洗浄する。
Hereinafter, an example of the specific configuration of the ultrasonic cleaning apparatus of the present invention will be described in detail.
The embodiments described below are specific configuration examples of the present invention and do not limit the present invention unless otherwise specified.
FIG. 1 is a schematic configuration diagram showing an ultrasonic cleaning apparatus 6 of the present invention.
As shown in the figure, the ultrasonic transducer 2 and the vibrating member 1 have a surface shape and are bonded to each other. A plurality of cleaning liquid supply nozzles 4 are provided in a plurality of holes 3 (hereinafter also referred to as cleaning liquid supply ports 3) provided so as to penetrate both the ultrasonic vibrator and the vibration member.
When cleaning is performed, the object to be cleaned 7 is supported so as to face the surface of the vibrating member 1 that is not in contact with the ultrasonic transducer 2 with a minute gap. At this time, the ultrasonic vibrator 2 is oscillated while the cleaning liquid is ejected from the plurality of nozzles 4 to vibrate the vibration member 1 to clean the object 7 to be cleaned.
このように構成された本発明の超音波洗浄装置６によれば、超音波振動子２の有効洗浄範囲を広げることにより、被洗浄物７の移動距離を少なくし、かつ、複数個の洗浄液供給口３に設けた洗浄液供給ノズル４から洗浄液を供給することで洗浄液の交換効率を上げ、洗浄時間を短縮することで洗浄液による被洗浄物７へのダメージを低減することが可能となる。
効率的な洗浄を行うために振動部材は、前記被洗浄物の面積に対して、８０％〜１２０％とすることが望ましい。
According to the ultrasonic cleaning apparatus 6 of the present invention configured as described above, the effective cleaning range of the ultrasonic vibrator 2 is expanded, so that the moving distance of the cleaning object 7 is reduced and a plurality of cleaning liquids are supplied. By supplying the cleaning liquid from the cleaning liquid supply nozzle 4 provided in the mouth 3, it is possible to increase the replacement efficiency of the cleaning liquid and shorten the cleaning time, thereby reducing damage to the object 7 to be cleaned by the cleaning liquid.
In order to perform efficient cleaning, the vibration member is desirably 80% to 120% with respect to the area of the object to be cleaned.
ここで、本発明の振動部材として、石英、ダイヤモンド、アルミナ、チタン、窒化珪素、ステンレス等を用いることができるが、これらに限定されるものではない。
また、超音波振動子は各種知られているものを用いることができるが、特に石英を用いることが望ましい。
超音波振動の出力や振動数は、フォトマスクの大きさや異物の種類によって、洗浄が効率的に行われるように設定される。例えば、周波数９５０Ｋ〜２ＭＨz、出力１〜３０Ｗ、時間：３０秒〜１０分の条件下で超音波を付与することにより行うことができる。
Here, quartz, diamond, alumina, titanium, silicon nitride, stainless steel, or the like can be used as the vibrating member of the present invention, but is not limited thereto.
Various known ultrasonic vibrators can be used, and quartz is particularly preferable.
The output and frequency of the ultrasonic vibration are set so that the cleaning is efficiently performed according to the size of the photomask and the type of foreign matter. For example, it can be performed by applying ultrasonic waves under conditions of a frequency of 950 K to 2 MHz, an output of 1 to 30 W, and a time: 30 seconds to 10 minutes.
また、本発明の洗浄方法及び装置に用いることができる洗浄液として、純水、アンモニア過水、硫酸過水、塩酸過水、硫酸、アンモニア水、過酸化水素水、水酸化テトラメチルアンモニウム水、オゾンガス溶解水、水素ガス溶解水、窒素ガス溶解水、炭酸ガス溶解水、ヘリウムガス溶解水、アルゴンガス溶解水を用いることができる。 Further, as cleaning liquids that can be used in the cleaning method and apparatus of the present invention, pure water, ammonia perwater, sulfuric acid / hydrogen peroxide, hydrochloric acid / hydrogen peroxide, sulfuric acid, aqueous ammonia, hydrogen peroxide, tetramethylammonium hydroxide, ozone gas Dissolved water, hydrogen gas-dissolved water, nitrogen gas-dissolved water, carbon dioxide-dissolved water, helium gas-dissolved water, and argon gas-dissolved water can be used.
以下に本発明の実施例を具体的に説明するが、これはあくまで一例であり、本発明はこの実施例に限定されるものではない。
まず、図１に示すような本発明の超音波洗浄装置６を用い、本発明に係る超音波洗浄装置を用いた超音波洗浄方法で図４に示すフォトマスク基板２０（面積２３２ｃｍ２）上にＭｏＳｉ（モリブデンシリコン）パターン２１が形成された評価用フォトマスク２２の洗浄を行った。
この時、振動部材及び超音波振動子の面積は２５０ｃｍ２、洗浄液供給口３として８つの穴を振動部材及び超音波振動子の双方の面に形成した。 フォトマスク基板２０と超音波照射面５の隙間は１ｍｍとし、超音波の発振周波数は２ＭＨｚ、発振出力は４Ｗとした。また、洗浄液供給ノズル４から洗浄液（アンモニア過水）を毎分１．０Ｌで供給したところ、３０秒で洗浄が完了した。
Examples of the present invention will be specifically described below, but this is only an example, and the present invention is not limited to these examples.
First, using the ultrasonic cleaning apparatus 6 of the present invention as shown in FIG. 1, MoSi is formed on the photomask substrate 20 (area 232 cm 2) shown in FIG. 4 by the ultrasonic cleaning method using the ultrasonic cleaning apparatus according to the present invention. The evaluation photomask 22 on which the (molybdenum silicon) pattern 21 was formed was cleaned.
At this time, the area of the vibration member and the ultrasonic vibrator was 250 cm 2, and eight holes were formed on both surfaces of the vibration member and the ultrasonic vibrator as the cleaning liquid supply port 3. The gap between the photomask substrate 20 and the ultrasonic irradiation surface 5 was 1 mm, the ultrasonic oscillation frequency was 2 MHz, and the oscillation output was 4 W. In addition, when the cleaning liquid (ammonia overwater) was supplied from the cleaning liquid supply nozzle 4 at 1.0 L / min, the cleaning was completed in 30 seconds.
（比較例）
また、図３（ｂ）に示す従来の超音波洗浄装置１６を用い、従来の超音波洗浄方法で実施例１と同じ評価用フォトマスク２２の洗浄を行ったところ、２分で洗浄が完了した。
この際、フォトマスク基板７と振動部材１１は接触するようにし、超音波の発振周波数は２ＭＨｚ、発振出力は４Ｗとした。また、洗浄液供給ノズル４から洗浄液（アンモニア過水）を毎分１．０Ｌで供給した。
(Comparative example)
Moreover, when the conventional ultrasonic cleaning apparatus 16 shown in FIG. 3B was used to clean the same evaluation photomask 22 as in Example 1 using the conventional ultrasonic cleaning method, the cleaning was completed in 2 minutes. .
At this time, the photomask substrate 7 and the vibrating member 11 were in contact with each other, the ultrasonic oscillation frequency was 2 MHz, and the oscillation output was 4 W. Moreover, the cleaning liquid (ammonia overwater) was supplied from the cleaning liquid supply nozzle 4 at 1.0 L / min.
以上の通り、本発明の超音波洗浄装置６を用いた超音波洗浄方法では従来の超音波洗浄装置１６を用いた超音波洗浄方法と比較して洗浄時間が２分から３０秒に短縮され、基板のダメージは減少した。 As described above, in the ultrasonic cleaning method using the ultrasonic cleaning apparatus 6 of the present invention, the cleaning time is shortened from 2 minutes to 30 seconds as compared with the ultrasonic cleaning method using the conventional ultrasonic cleaning apparatus 16, and the substrate Damage reduced.
１・・・振動部材
２・・・超音波振動子
３・・・洗浄液供給口
４・・・洗浄液供給ノズル
５・・・超音波照射面
６・・・本発明の超音波洗浄装置
７・・・被洗浄物（フォトマスク基板）
１１・・・従来の振動部材
１１ａ・・・膨大部
１２・・・従来の超音波振動子
１３・・・振動子ケース
１４・・・パッキン
１５・・・ケーブル
１５ａ・・・コードａ
１６・・・従来の超音波洗浄装置
２０・・・フォトマスク基板
２１・・・ＭｏＳｉパターン
２２・・・評価用フォトマスク
DESCRIPTION OF SYMBOLS 1 ... Vibration member 2 ... Ultrasonic vibrator 3 ... Cleaning liquid supply port 4 ... Cleaning liquid supply nozzle 5 ... Ultrasonic irradiation surface 6 ... Ultrasonic cleaning apparatus 7 of this invention ... -Object to be cleaned (photomask substrate)
DESCRIPTION OF SYMBOLS 11 ... Conventional vibration member 11a ... Enormous part 12 ... Conventional ultrasonic vibrator 13 ... Vibrator case 14 ... Packing 15 ... Cable 15a ... Cord a
16 ... Conventional ultrasonic cleaning device 20 ... Photomask substrate 21 ... MoSi pattern 22 ... Photomask for evaluation
Claims (1)
前記超音波振動子の片面に接着された面形状の振動部材と、
前記超音波振動子と振動部材の双方を貫通するように設けた複数の孔と、
前記複数の孔を通過し、前記振動部材の片面から洗浄液を吐出する複数のノズルとを備えた構成の超音波洗浄装置を用いて、
前記振動部材のうち、前記超音波振動子と接していない面と微小間隙を設けて対向するように被洗浄物を支持し、
被洗浄物全面に超音波を照射し、前記複数のノズルから洗浄液を吐出しながら、前記超音波振動子を振動させて、被洗浄物を洗浄することを特徴とする洗浄方法。 A surface-shaped ultrasonic transducer;
A surface-shaped vibrating member bonded to one side of the ultrasonic transducer;
A plurality of holes provided so as to penetrate both the ultrasonic transducer and the vibration member;
Using an ultrasonic cleaning device having a configuration including a plurality of nozzles that pass through the plurality of holes and discharge a cleaning liquid from one surface of the vibration member ,
The object to be cleaned is supported so as to be opposed to the surface of the vibrating member that is not in contact with the ultrasonic transducer with a minute gap,
A cleaning method, wherein the object to be cleaned is cleaned by irradiating the entire surface of the object to be cleaned and oscillating the ultrasonic vibrator while discharging the cleaning liquid from the plurality of nozzles.
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| JP2010232482A JP5685881B2 (en) | 2010-10-15 | 2010-10-15 | Ultrasonic cleaning method |
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