JP5675184B2 - Polymerization inhibitor composition for vinyl compound and method for preventing polymerization of vinyl compound using the same - Google Patents
Polymerization inhibitor composition for vinyl compound and method for preventing polymerization of vinyl compound using the same Download PDFInfo
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- JP5675184B2 JP5675184B2 JP2010138926A JP2010138926A JP5675184B2 JP 5675184 B2 JP5675184 B2 JP 5675184B2 JP 2010138926 A JP2010138926 A JP 2010138926A JP 2010138926 A JP2010138926 A JP 2010138926A JP 5675184 B2 JP5675184 B2 JP 5675184B2
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- Prior art keywords
- compound
- oxyl
- polymerization
- aromatic
- vinyl compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 vinyl compound Chemical class 0.000 title claims description 42
- 238000006116 polymerization reaction Methods 0.000 title claims description 32
- 239000000203 mixture Substances 0.000 title claims description 28
- 238000000034 method Methods 0.000 title description 24
- 229920002554 vinyl polymer Polymers 0.000 title description 21
- 239000003112 inhibitor Substances 0.000 title description 16
- 230000003405 preventing effect Effects 0.000 title description 8
- 150000001875 compounds Chemical class 0.000 claims description 59
- 239000002904 solvent Substances 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 14
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims description 12
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 9
- UZFMOKQJFYMBGY-UHFFFAOYSA-N 4-hydroxy-TEMPO Chemical group CC1(C)CC(O)CC(C)(C)N1[O] UZFMOKQJFYMBGY-UHFFFAOYSA-N 0.000 claims description 8
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 claims description 7
- SFXHWRCRQNGVLJ-UHFFFAOYSA-N 4-methoxy-TEMPO Chemical group COC1CC(C)(C)N([O])C(C)(C)C1 SFXHWRCRQNGVLJ-UHFFFAOYSA-N 0.000 claims description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 5
- 230000002265 prevention Effects 0.000 claims description 4
- QYTDEUPAUMOIOP-UHFFFAOYSA-N TEMPO Chemical group CC1(C)CCCC(C)(C)N1[O] QYTDEUPAUMOIOP-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 19
- 239000013078 crystal Substances 0.000 description 13
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 12
- 125000003118 aryl group Chemical group 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- WSGDRFHJFJRSFY-UHFFFAOYSA-N 4-oxo-TEMPO Chemical group CC1(C)CC(=O)CC(C)(C)N1[O] WSGDRFHJFJRSFY-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 229960004217 benzyl alcohol Drugs 0.000 description 4
- 235000019445 benzyl alcohol Nutrition 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 229940125810 compound 20 Drugs 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- OSWPMRLSEDHDFF-UHFFFAOYSA-N methyl salicylate Chemical compound COC(=O)C1=CC=CC=C1O OSWPMRLSEDHDFF-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- ITOFPJRDSCGOSA-KZLRUDJFSA-N (2s)-2-[[(4r)-4-[(3r,5r,8r,9s,10s,13r,14s,17r)-3-hydroxy-10,13-dimethyl-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1h-cyclopenta[a]phenanthren-17-yl]pentanoyl]amino]-3-(1h-indol-3-yl)propanoic acid Chemical compound C([C@H]1CC2)[C@H](O)CC[C@]1(C)[C@@H](CC[C@]13C)[C@@H]2[C@@H]3CC[C@@H]1[C@H](C)CCC(=O)N[C@H](C(O)=O)CC1=CNC2=CC=CC=C12 ITOFPJRDSCGOSA-KZLRUDJFSA-N 0.000 description 1
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- WZZBNLYBHUDSHF-DHLKQENFSA-N 1-[(3s,4s)-4-[8-(2-chloro-4-pyrimidin-2-yloxyphenyl)-7-fluoro-2-methylimidazo[4,5-c]quinolin-1-yl]-3-fluoropiperidin-1-yl]-2-hydroxyethanone Chemical compound CC1=NC2=CN=C3C=C(F)C(C=4C(=CC(OC=5N=CC=CN=5)=CC=4)Cl)=CC3=C2N1[C@H]1CCN(C(=O)CO)C[C@@H]1F WZZBNLYBHUDSHF-DHLKQENFSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- FIZTWVVFHOYYOT-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidine-1-carboxylic acid Chemical compound CC1(C)CCCC(C)(C)N1C(O)=O FIZTWVVFHOYYOT-UHFFFAOYSA-N 0.000 description 1
- SLUKQUGVTITNSY-UHFFFAOYSA-N 2,6-di-tert-butyl-4-methoxyphenol Chemical compound COC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SLUKQUGVTITNSY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- ATHRJYUVCZCNQA-UHFFFAOYSA-N 2-(5-bicyclo[2.2.1]hept-2-enyl)ethyl-methoxy-dimethylsilane Chemical compound C1C2C(CC[Si](C)(C)OC)CC1C=C2 ATHRJYUVCZCNQA-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- UDWIZRDPCQAYRF-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C=C UDWIZRDPCQAYRF-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- MRBKEAMVRSLQPH-UHFFFAOYSA-N 3-tert-butyl-4-hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1 MRBKEAMVRSLQPH-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- BESKSSIEODQWBP-UHFFFAOYSA-N 3-tris(trimethylsilyloxy)silylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C BESKSSIEODQWBP-UHFFFAOYSA-N 0.000 description 1
- CYQGCJQJIOARKD-UHFFFAOYSA-N 4-carboxy-TEMPO Chemical group CC1(C)CC(C(O)=O)CC(C)(C)N1[O] CYQGCJQJIOARKD-UHFFFAOYSA-N 0.000 description 1
- WIYVVIUBKNTNKG-UHFFFAOYSA-N 6,7-dimethoxy-3,4-dihydronaphthalene-2-carboxylic acid Chemical compound C1CC(C(O)=O)=CC2=C1C=C(OC)C(OC)=C2 WIYVVIUBKNTNKG-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical group CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical group NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical group OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- OUYCCCASQSFEME-QMMMGPOBSA-N L-tyrosine Chemical compound OC(=O)[C@@H](N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-QMMMGPOBSA-N 0.000 description 1
- STNJBCKSHOAVAJ-UHFFFAOYSA-N Methacrolein Chemical compound CC(=C)C=O STNJBCKSHOAVAJ-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000005844 Thymol Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229960001867 guaiacol Drugs 0.000 description 1
- KRTXUJQQASWSIK-UHFFFAOYSA-N hex-5-enyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCC=C KRTXUJQQASWSIK-UHFFFAOYSA-N 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229960004337 hydroquinone Drugs 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000006078 metal deactivator Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229960001047 methyl salicylate Drugs 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical group CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical group O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- OUYCCCASQSFEME-UHFFFAOYSA-N tyrosine Natural products OC(=O)C(N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-UHFFFAOYSA-N 0.000 description 1
- 229960004441 tyrosine Drugs 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
- C08F2/40—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation using retarding agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/92—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with a hetero atom directly attached to the ring nitrogen atom
- C07D211/94—Oxygen atom, e.g. piperidine N-oxide
Description
本発明は、Ｎ−オキシル化合物を有効成分として含有するビニル化合物の改善された重合防止剤組成物に関し、低温であっても、Ｎ−オキシル化合物の結晶が析出することのない安定なビニル化合物の重合防止剤組成物およびこれを使用したビニル化合物の重合防止方法に関する。 The present invention relates to an improved polymerization inhibitor composition of a vinyl compound containing an N-oxyl compound as an active ingredient, and a stable vinyl compound in which crystals of the N-oxyl compound do not precipitate even at low temperatures. The present invention relates to a polymerization inhibitor composition and a method for preventing polymerization of a vinyl compound using the same.
ビニル化合物を製造、精製あるいは輸送、貯蔵するプロセスにおいては、プロセス内で該ビニル化合物が熱、微量の酸素、あるいは過酸化物、さらに金属イオンなどが作用してラジカル重合を促進し、装置内に重合物が付着するなど、プロセス内で熱の移動が阻害され、あるいはプロセス流体の流れが悪くなるなど運転上支障を来たし、緊急に運転を停止せざるを得なくなるなど、操業上大きな問題となる。また、重合によりビニル化合物の収率が低下する等の問題がある。 In the process of producing, purifying, transporting or storing vinyl compounds, the vinyl compounds act in the process with heat, trace amounts of oxygen, peroxides, metal ions, etc. to promote radical polymerization, This is a major operational problem, such as polymer adhesion and heat transfer in the process is hindered, or the flow of process fluid is poor, causing operational problems and urgently shutting down the operation. . Moreover, there exists a problem that the yield of a vinyl compound falls by superposition | polymerization.
そのため、その貯蔵、または移送、或いは製造時における重合を防止する手段として種々の重合防止剤が提案されている。中でも、４−ヒドロキシ−２，２，６，６−テトラメチルピペリジン−１−オキシルによって代表されるＮ−オキシル化合物は、その優れた重合防止効果が様々な文献に開示されている。例えば、特許文献１には、アクリル酸の安定化剤として第３級ブチルニトロオキシドまたは４−ヒドロキシ−２，２，６，６−テトラメチルピペリジノオキシルなどのＮ−オキシ化合物を単独で用いることによって、ハイドロキノン、フェノチアジン、塩化第二銅などの従来公知のものよりも優れた重合防止効果が得られることが記載されている。特許文献２には、有機溶媒中で酸素含有ガスを用いてメタクロレインからメタクリル酸を製造する際の重合抑制剤として、４−ヒドロキシ−２，２，６，６−テトラメチルピペリジノオキシルまたは２，２，６
，６−テトラメチルピペリジノオキシルを用いることが記載されている。特許文献３には、３−オキソ−２，２，５，５−テトラメチルピロリジノオキシル、４−アセトキシ−２，２，６，６−テトラメチルピペリジノオキシルなどを用いる方法が記載されている。
Therefore, various polymerization inhibitors have been proposed as means for preventing the storage, transfer, or polymerization during production. Among them, N-oxyl compounds represented by 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl have been disclosed in various literatures for their excellent polymerization preventing effect. For example, Patent Document 1 uses an N-oxy compound such as tertiary butyl nitroxide or 4-hydroxy-2,2,6,6-tetramethylpiperidinooxyl alone as a stabilizer for acrylic acid. It is described that a polymerization preventing effect superior to those conventionally known, such as hydroquinone, phenothiazine, and cupric chloride can be obtained. Patent Document 2 discloses 4-hydroxy-2,2,6,6-tetramethylpiperidinooxyl as a polymerization inhibitor when producing methacrylic acid from methacrolein using an oxygen-containing gas in an organic solvent. 2, 2, 6
The use of 1,6-tetramethylpiperidinooxyl is described. Patent Document 3 describes a method using 3-oxo-2,2,5,5-tetramethylpyrrolidinooxyl, 4-acetoxy-2,2,6,6-tetramethylpiperidinooxyl and the like. Yes.
一方、これらのＮ−オキシル化合物は、殆どが室温で固体であるため、対象とするビニル化合物に添加する方法としては、該ビニル化合物や溶剤に溶解して適当な濃度の液体状態とし、一旦、タンク等に貯蔵し、定量ポンプ等により間欠あるいは連続的に添加する方法が一般的である。しかしながら、Ｎ−オキシル化合物は、ビニル化合物やその他の溶剤に溶解して溶液とした場合、安定性の面からは必ずしも充分ではなく、長期間保存するとラジカルが消失してしまい、重合防止効果が低下するという欠点があった。これらの欠点を解消するため、特許文献４には、Ｎ−オキシル化合物に特定のアルコール類（例えば、エチレングリコール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテル等)を加えて安定な組成物を提供する方法が開示されている。また、特許文献５には、水溶性のＮ−オキシル化合物を水に溶解して添加する方法が記載されている。これらの場合、輸送費の観点から、組成物や水溶液中のＮ−オキシル化合物の濃度は、高い方が有利である。
しかしながら、Ｎ−オキシル化合物は融点が高く結晶化しやすいので、１０℃以下の低温状態では、組成物中でＮ−オキシル化合物が結晶析出する場合がある。このように結晶が析出すると、ポンプの詰まりを生じ、注入不具合を起こすといった問題がある。また、プロセスへの送液ラインが低温に曝されることにより、送液ライン内で結晶化してラインが閉塞したり、Ｎ−オキシル化合物の組成物や溶液を貯蔵しておくタンク中で結晶が析出し、組成物中の溶液部分のＮ−オキシル化合物量が減少するという問題がある。これらトラブルによりＮ−オキシル化合物が対象とするプロセスへ適正に添加されないと、前述のように、ラジカル重合を完全に停止することができず、操業上大きな問題となる。これらの結晶化を防止するためには、組成物やその溶液中のＮ−オキシル化合物濃度を極めて低く維持するか、あるいは、該タンクやラインならびにポンプを電気あるいは、水蒸気により加温し、結晶化を防ぐなどの対策が必要であった。しかし、このような対策では、有効濃度のＮ−オキシル化合物をプロセスに添加するために併せて多量の不用な溶剤を添加する、また適切な加温状態を維持するために煩雑な管理が欠かせないなどの問題点があった。
On the other hand, since most of these N-oxyl compounds are solid at room temperature, the method of adding them to the target vinyl compound is to dissolve in the vinyl compound or solvent to obtain a liquid state with an appropriate concentration. A method of storing in a tank or the like and adding intermittently or continuously with a metering pump or the like is common. However, the N-oxyl compound is not necessarily sufficient in terms of stability when dissolved in a vinyl compound or other solvent, and the radical disappears when stored for a long period of time, thus reducing the polymerization prevention effect. There was a drawback of doing. In order to eliminate these drawbacks, Patent Document 4 discloses that N-oxyl compounds have specific alcohols (for example, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether). Etc.) to provide a stable composition. Patent Document 5 describes a method in which a water-soluble N-oxyl compound is dissolved in water and added. In these cases, from the viewpoint of transportation costs, it is advantageous that the concentration of the N-oxyl compound in the composition or aqueous solution is higher.
However, since the N-oxyl compound has a high melting point and is easily crystallized, the N-oxyl compound may crystallize in the composition at a low temperature of 10 ° C. or lower. When crystals are precipitated in this manner, there is a problem that the pump is clogged and an injection failure occurs. Further, when the liquid supply line to the process is exposed to a low temperature, the liquid crystallizes in the liquid supply line and the line is blocked, or crystals are formed in a tank for storing the composition or solution of the N-oxyl compound. There exists a problem that it precipitates and the amount of N-oxyl compounds of the solution part in a composition reduces. If the N-oxyl compound is not properly added to the target process due to these troubles, the radical polymerization cannot be completely stopped as described above, which causes a large operational problem. In order to prevent such crystallization, the concentration of the N-oxyl compound in the composition or its solution is kept very low, or the tank, line and pump are heated by electricity or steam to cause crystallization. Measures such as prevention were necessary. However, such countermeasures require complicated management in order to add an effective concentration of N-oxyl compound to the process, and to add a large amount of unnecessary solvent, and to maintain an appropriate heating state. There were problems such as not.
本発明はかかるＮ−オキシル化合物溶液の低温下での結晶の析出を未然に防ぐためになされたもので、低温で保存しても結晶が析出する虞れのない安定なビニル化合物の重合防止剤組成物並びにこれを用いてなるビニル化合物の重合防止方法を提供することを課題とする。 The present invention was made to prevent the precipitation of crystals of such N-oxyl compound solution at low temperatures, and is a stable vinyl compound polymerization inhibitor composition that does not cause crystals to precipitate even when stored at low temperatures. It is an object of the present invention to provide a method for preventing polymerization of a vinyl compound using the product.
本発明者らは、Ｎ−オキシル化合物溶液の低温安定性の向上について鋭意検討を重ねた結果、芳香族環上に少なくとも１個の水酸基を有する芳香族化合物をＮ−オキシル化合物の溶液に存在させることで、低温安定性が極めて向上することを見出し、本発明をなすに至った。 As a result of intensive studies on improving the low-temperature stability of the N-oxyl compound solution, the present inventors make an aromatic compound having at least one hydroxyl group on the aromatic ring exist in the N-oxyl compound solution. As a result, it was found that the low-temperature stability is extremely improved, and the present invention has been made.
即ち、本願発明は、（Ａ)下記一般式(１)または化学構造式（２）で表されるＮ−オキシル化合物のうちの少なくとも１種、（Ｂ）芳香族環上に少なくとも１個の水酸基を有する芳香族化合物および（Ｃ）Ｎ−オキシル化合物の溶剤を含有することを特徴とするビニル化合物の重合防止剤組成物に係るものであり、
本発明により、Ｎ−オキシル化合物を高濃度で含み、低温であっても晶出する虞れのない安定な重合防止剤組成物並びにこれを用いてなるビニル化合物の重合防止方法を提供することができる。 According to the present invention, it is possible to provide a stable polymerization inhibitor composition containing a high concentration of an N-oxyl compound and having no possibility of crystallization even at low temperatures, and a method for preventing polymerization of a vinyl compound using the composition. it can.
本発明におけるＡ成分のＮ−オキシル化合物は、前記一般式(１)または化学構造式（２）で表され、Ｎ−オキシルラジカルに隣接して立体障害性の置換基を有する立体障害性Ｎ−オキシル化合物である。式中Ｒ５は水素原子、水酸基、炭素数１〜３のアルキル基、炭素数１〜３のアルコキシ基、炭素数１〜３のカルボン酸基、炭素数１〜３のアミド基である。炭素数１〜３のアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基があり、炭素数１〜３のアルコキシ基としてはメトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基があり、炭素数１〜３のカルボン酸基としては蟻酸基、酢酸基、プロピオン酸基があり、炭素数１〜３のアミド基としては蟻酸アミド基、酢酸アミド基、プロピオン酸アミド基等がある。化学構造式（２）で表される化合物は４−オキソ−２，２，６，６−テトラメチルピペリジン−１−オキシルである。具体的なＮ−オキシル化合物の例は、４−ヒドロキシ−２，２，６，６−テトラメチルピペリジン−１−オキシル、２，２，６，６−テトラメチルピペリジン−１−オキシル、４−オキソ−２，２，６，６−テトラメチルピペリジン−１−オキシル、４−メトキシ−２，２，６，６−テトラメチルピペリジン−１−オキシル、４−エトキシ−２，２，６，６−テトラメチルピペリジン−１−オキシル、４−カルボキシ−２，２，６，６−テトラメチルピペリジン−１−オキシル、４−カルバモイル−２，２，６，６−テトラメチルピペリジン−１−オキシル等があげられ、好ましくは４−ヒドロキシ−２，２，６，６−テトラメチルピペリジン−１−オキシル、２，２，６，６−テトラメチルピペリジン−１−オキシル、４−オキソ−２，２，６，６−テトラメチルピペリジン−１−オキシル、および４−メトキシ−２，２，６，６−テトラメチルピペリジン−１−オキシルである。これらのN−オキシル化合物は、対象となるビニル化合物の種類や、プロセスの状況、条件を考慮し、１種、あるいは２種以上を組み合わせて用いることができる。 The N-oxyl compound of component A in the present invention is represented by the general formula (1) or chemical structural formula (2), and has a sterically hindered N— having a sterically hindered substituent adjacent to the N-oxyl radical. It is an oxyl compound. In the formula, R 5 is a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a carboxylic acid group having 1 to 3 carbon atoms, or an amide group having 1 to 3 carbon atoms. Examples of the alkyl group having 1 to 3 carbon atoms include a methyl group, an ethyl group, a propyl group, and an isopropyl group. Examples of the alkoxy group having 1 to 3 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, and an isopropoxy group. Examples of the carboxylic acid group having 1 to 3 carbon atoms include a formic acid group, an acetic acid group, and a propionic acid group. Examples of the amide group having 1 to 3 carbon atoms include a formic acid amide group, an acetic acid amide group, and a propionic acid amide group. The compound represented by the chemical structural formula (2) is 4-oxo-2,2,6,6-tetramethylpiperidine-1-oxyl. Specific examples of N-oxyl compounds include 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl, 2,2,6,6-tetramethylpiperidine-1-oxyl, 4-oxo -2,2,6,6-tetramethylpiperidine-1-oxyl, 4-methoxy-2,2,6,6-tetramethylpiperidine-1-oxyl, 4-ethoxy-2,2,6,6-tetra Examples include methylpiperidine-1-oxyl, 4-carboxy-2,2,6,6-tetramethylpiperidine-1-oxyl, 4-carbamoyl-2,2,6,6-tetramethylpiperidine-1-oxyl, and the like. Preferably 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl, 2,2,6,6-tetramethylpiperidine-1-oxyl, 4-oxo-2,2 6,6-tetramethylpiperidine-1-oxyl, and 4-methoxy-2,2,6,6-tetramethylpiperidine-1-oxyl. These N-oxyl compounds can be used singly or in combination of two or more in consideration of the type of vinyl compound to be used, the status of the process, and the conditions.
本発明におけるＢ成分の芳香族化合物は、芳香族環上に直接少なくとも1つの水酸基を有する化合物であれば、特に制限はなく、フェノール、メトキシフェノール、ハイドロキノン、カテコール、４−ｔ−ブチルカテコール、３，５−ジ−ｔ−ブチル−４−ヒドロキシトルエン、３，５−ジ−ｔ−ブチル−４−ヒドロキシアニソール、３−ｔ−ブチル−４−ヒドロキシアニソール、ビスフェノールＡ、クレゾール、没食子酸、フェノールフタレイン、グアイアコール、チモール、チロシン、サリチル酸、サリチル酸メチル、ナフトール等が挙げられ、好ましくは、フェノール、メトキシフェノール、ハイドロキノン、カテコール、４−ｔ−ブチルカテコールを用いることが出来る。これらの芳香族化合物はＮ−オキシル化合物の割合や、対象となるビニル化合物の種類や、プロセスの状況、条件を考慮し、１種あるいは、２種以上を組み合わせて用いることができる。中でも、メトキシフェノールやハイドロキノン、４−ｔ−ブチルカテコールは、これら自体が重合禁止効果を有するため、本発明に好適に使用することができる。 The aromatic compound of component B in the present invention is not particularly limited as long as it is a compound having at least one hydroxyl group directly on the aromatic ring, such as phenol, methoxyphenol, hydroquinone, catechol, 4-t-butylcatechol, 3 , 5-di-t-butyl-4-hydroxytoluene, 3,5-di-t-butyl-4-hydroxyanisole, 3-t-butyl-4-hydroxyanisole, bisphenol A, cresol, gallic acid, phenolphthal Rain, guaiacol, thymol, tyrosine, salicylic acid, methyl salicylate, naphthol and the like can be mentioned, and phenol, methoxyphenol, hydroquinone, catechol and 4-t-butylcatechol can be preferably used. These aromatic compounds can be used singly or in combination of two or more in consideration of the ratio of the N-oxyl compound, the type of vinyl compound to be used, the status of the process, and the conditions. Among these, methoxyphenol, hydroquinone, and 4-t-butylcatechol can be suitably used in the present invention because they themselves have a polymerization inhibiting effect.
本発明におけるＣ成分のＮ−オキシル化合物の溶剤としては、水、アルコール化合物、脂肪族あるいは芳香族炭化水素などが選択でき、その１種、あるいはこれら２種を組み合わせて用いても良い。その選択にあたっては、対象となるビニル化合物に対する影響を考慮して適宜、選択することができ、例えば、スチレン製造プロセスなどでは特に製品への混入を嫌って、水やアルコール化合物を選択せずにプロセス液中に含まれる芳香族炭化水素であるエチルベンゼンを選択することがある。 As the solvent for the N-oxyl compound of component C in the present invention, water, alcohol compounds, aliphatic or aromatic hydrocarbons and the like can be selected, and one of them or a combination of these two may be used. The selection can be made as appropriate in consideration of the impact on the target vinyl compound. For example, in the styrene production process, it is particularly preferable to avoid mixing into the product without selecting water or alcohol compounds. In some cases, ethylbenzene, which is an aromatic hydrocarbon contained in the liquid, is selected.
本発明におけるＣ成分の溶剤の水としては、通常の工業用水、軟化水、イオン交換水などを用いることができる。アルコール化合物としては、エチレングリコール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテルなどが挙げられる。また、脂肪族あるいは芳香族炭化水素としては、ベンゼン、トルエン、キシレン、エチルベンゼン、その他芳香族化合物、ナフテン系炭化水素化合物、鉱油、パラフィン系炭化水素化合物、重合抑制を対象とするビニル化合物などが挙げられる。 As water of the solvent of component C in the present invention, normal industrial water, softened water, ion-exchanged water and the like can be used. Examples of the alcohol compound include ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, and ethylene glycol monobutyl ether. Examples of aliphatic or aromatic hydrocarbons include benzene, toluene, xylene, ethylbenzene, other aromatic compounds, naphthene hydrocarbon compounds, mineral oil, paraffin hydrocarbon compounds, vinyl compounds targeted for polymerization inhibition, and the like. It is done.
本発明の重合防止剤組成物のＢ成分の芳香族化合物を０．５重量％以上配合することによって、該組成物におけるＣ成分として水を選択した場合は、該Ａ成分のＮ−オキシル化合物を４０〜８０重量％配合することができ、Ｃ成分としてアルコール化合物を選択した場合は、Ｎ−オキシル化合物を４０〜８０重量％配合することができ、さらに、Ｃ成分として芳香族炭化水素を選択した場合は、Ｎ−オキシル化合物を１０〜３０重量％配合することができる。
本発明の重合防止剤組成物におけるＢ成分の芳香族化合物の配合量が０．５重量％より低いと充分な低温安定化効果が得られず、また、５０重量％より多く配合しても、結晶析出防止にはさほど寄与せず、経済的に不利である。
When water is selected as the C component in the composition by blending 0.5% by weight or more of the B compound aromatic compound of the polymerization inhibitor composition of the present invention, the N-oxyl compound of the A component is 40 to 80% by weight can be blended, and when an alcohol compound is selected as the C component, an N-oxyl compound can be blended in an amount of 40 to 80% by weight, and an aromatic hydrocarbon is selected as the C component. In the case, 10 to 30% by weight of the N-oxyl compound can be blended.
When the blending amount of the aromatic compound of the component B in the polymerization inhibitor composition of the present invention is lower than 0.5% by weight, a sufficient low-temperature stabilizing effect cannot be obtained, and even when blending more than 50% by weight, It does not contribute much to the prevention of crystal precipitation and is economically disadvantageous.
好ましい組成物の配合の一例を挙げると、Ｃ成分として水を選択した場合は、Ｎ−オキシル化合物を６０重量％、芳香族化合物２０重量％、及び水２０重量％、Ｃ成分としてアルコール化合物を選択した場合は、Ｎ−オキシル化合物を６０重量％、芳香族化合物２０重量％、及びアルコール化合物２０重量％、Ｃ成分として芳香族炭化水素を選択した場合は、Ｎ−オキシル化合物を３０重量％、芳香族化合物重量２０％、及び芳香族炭化水素重量５０％である。 As an example of a preferred composition, when water is selected as the C component, the N-oxyl compound is 60% by weight, the aromatic compound is 20% by weight, and the water is 20% by weight, and the alcohol compound is selected as the C component. In the case where N-oxyl compound is 60% by weight, aromatic compound 20% by weight and alcohol compound 20% by weight, and aromatic hydrocarbon is selected as C component, N-oxyl compound 30% by weight, aromatic Group compound weight 20% and aromatic hydrocarbon weight 50%.
Ｎ−オキシル化合物の溶液に芳香族化合物を存在させることによりＮ−オキシル化合物の結晶化が抑制される理由については明らかではないが、恐らくＮ−オキシル化合物とフェノール化合物等の芳香族化合物が錯体状の複合体が形成されることにより、これがＮ−オキシル化合物の結晶化を抑制しているものと考えられる。 The reason why the crystallization of the N-oxyl compound is suppressed by the presence of the aromatic compound in the solution of the N-oxyl compound is not clear, but the N-oxyl compound and the aromatic compound such as a phenol compound are probably in a complex form. This is considered to suppress the crystallization of the N-oxyl compound.
本発明の重合防止剤組成物の製造は、例えばＮ−オキシル化合物を融点以上に加熱して液状とした後、芳香族化合物を混合して攪拌し、最後に水などのＮ−オキシル化合物の溶剤を加えることにより達せられる。溶解する順について特に制限はなく、各々の成分の物性により混合する順や混合温度を変更するなどの工夫についてなんら制限を加えるものではない。 The polymerization inhibitor composition of the present invention can be produced, for example, by heating an N-oxyl compound to a melting point or higher to form a liquid, mixing and stirring an aromatic compound, and finally a solvent of the N-oxyl compound such as water. Reached by adding There is no restriction | limiting in particular about the order which melt | dissolves, and there is no restriction | limiting about what kind of devices, such as changing the mixing order and mixing temperature, by the physical property of each component.
本発明における重合防止剤組成物は、Ｎ−オキシル化合物の結晶化を防止して安定に存在せしめるために特定の芳香族化合物を共存させたものであるが、必要により、その他の溶剤、アルコール類、さらに必要であればその他公知の重合防止剤、酸化防止剤、金属不活性化剤、分散剤等を加えても良い。 The polymerization inhibitor composition in the present invention is a composition in which a specific aromatic compound is allowed to coexist in order to prevent crystallization of the N-oxyl compound and make it stably exist. If necessary, other solvents, alcohols If necessary, other known polymerization inhibitors, antioxidants, metal deactivators, dispersants and the like may be added.
本発明の重合防止剤組成物の適用は、特に限定されるものではないが、例えば、石油化学工程、各種ビニル化合物の製造、精製工程、輸送、貯蔵に際し、ビニル化合物の重合による汚れを抑制し、重合によるビニル化合物の収率低下を抑制する場合には、重合が発生する設備、例えば熱交換器、リボイラー、配管、貯蔵タンクの中、及び／又はその上流部に添加することが好ましい。この際、本発明の重合防止剤組成物の添加量は、ビニル化合物の種類やプロセス条件により異なるので一律に決めることは出来ないが、Ｎ−オキシル化合物として、該プロセス流体に対して０．１〜１０００ｐｐｍとなるように添加するのが一般的である。 The application of the polymerization inhibitor composition of the present invention is not particularly limited. For example, during the petrochemical process, the production, purification process, transportation, and storage of various vinyl compounds, contamination due to polymerization of the vinyl compound is suppressed. In order to suppress the decrease in the yield of the vinyl compound due to polymerization, it is preferable to add to the equipment where polymerization occurs, for example, in a heat exchanger, reboiler, piping, storage tank, and / or upstream thereof. At this time, the amount of addition of the polymerization inhibitor composition of the present invention varies depending on the type of vinyl compound and process conditions and cannot be determined uniformly. However, as an N-oxyl compound, 0.1% of the process fluid is used. It is common to add so that it may become -1000ppm.
本発明の重合防止剤組成物の添加方法は一般的には原液あるいは溶媒で希釈し、薬品注入ポンプを使用して、対象のビニル化合物の種類やプロセス条件に合わせて連続あるいは間欠添加を選択することができる。希釈用に用いられる溶媒は重合剤組成物に用いた溶剤やその溶剤と親和性のある溶剤であれば制限なく使用できるが、一般的には、対象プロセスのプロセス液を用いて希釈することが行われる。 In general, the polymerization inhibitor composition of the present invention is added by diluting with a stock solution or a solvent, and using a chemical injection pump, continuous or intermittent addition is selected according to the type of vinyl compound and process conditions. be able to. The solvent used for dilution can be used without limitation as long as it is a solvent used for the polymerizing agent composition or a solvent that is compatible with the solvent, but in general, it may be diluted with the process liquid of the target process. Done.
また、適用しうるビニル化合物の種類に制限はなく、エチレン、プロピレン、ブチレン、イソブチレン等のオレフィン化合物、ブタジエン、イソプレン、クロロプレン等の置換、あるいは非置換の共役ジオレフィン化合物、スチレン、α−メチルスチレン、ジビニルベンゼンなどの芳香族ビニル化合物、メチルメタクリレート、エチルメタクリレート、ブチルメタクリレート、２−エチルヘキシルメタクリレート、アリルメタクリレート、２−ヒドロキシエチルメタクリレート、２−（ジメチルアミノ）エチルメタクリレートなどのメタクリル酸エステルおよびメタクリル酸化合物、メチルアクリレート、エチルアクリレート、ブチルアクリレートなどのアクリル酸エステルおよびアクリル酸化合物、アクリロニトリル、メタクリルニトリルなどのシアン化ビニル化合物、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス（２−メトキシエトキシ）シラン、２−（５−ノルボルネニル）エチル（ジメチル）メトキシシラン、５−ヘキセニルメチルジメトキシシラン、３−アクリロキシプロピルメチルジエトキシシラン、３−メタクリロキシプロピルトリメトキシシラン、３−メタクリロキシプロピルメチルジメトキシシラン、３−メタクリロキシプロピルトリス（トリメチルシロキシ）シラン、４−エテニルフェニルトリメトキシシラン、２−（４−エテニルフェニル）エチルトリエトキシシランなどのエチレン性不飽和基含有シランないしシロキサン化合物、酢酸ビニルなどのビニルエステル化合物、塩化ビニル、塩化ビニリデン、フッ化ビニリン、テトラフルオロエチレン、ヘキサフルオロプロピレンなどのハロゲン化オレフィン等を例示することができる。 There are no restrictions on the types of vinyl compounds that can be used, olefin compounds such as ethylene, propylene , butylene, and isobutylene, substituted or unsubstituted conjugated diolefin compounds such as butadiene, isoprene, and chloroprene, styrene, and α-methylstyrene. , Aromatic vinyl compounds such as divinylbenzene, methacrylic acid esters and methacrylic acid compounds such as methyl methacrylate, ethyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, allyl methacrylate, 2-hydroxyethyl methacrylate, 2- (dimethylamino) ethyl methacrylate Acrylates and acrylic compounds such as methyl acrylate, ethyl acrylate, butyl acrylate, acrylonitrile, methacrylonitrile Any cyanide vinyl compound, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 2- (5-norbornenyl) ethyl (dimethyl) methoxysilane, 5-hexenylmethyldimethoxysilane, 3-acryloxy Propylmethyldiethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltris (trimethylsiloxy) silane, 4-ethenylphenyltrimethoxysilane, 2- (4- Ethenyl unsaturated group-containing silane or siloxane compounds such as ethyltriethoxysilane, vinyl ester compounds such as vinyl acetate, vinyl chloride, vinylidene chloride, vinyline fluoride, tetrafluoro Examples thereof include halogenated olefins such as fluoroethylene and hexafluoropropylene.
実施例によって、本発明をさらに詳細に説明する。 The examples illustrate the invention in more detail.
１．試験に用いた化合物
[Ｎ−オキシル化合物]
Ａ−１：４−ヒドロキシ−２，２，６，６−テトラメチルピペリジン−１−オキシル
Ａ−２：２，２，６，６−テトラメチルピペリジン−１−オキシル
Ａ−３：４−オキソ−２，２，６，６−テトラメチルピペリジン−１−オキシル
Ａ−４：４−メトキシ−２，２，６，６−テトラメチルピペリジン−１−オキシル
1. Compounds used for testing
[N-oxyl compound]
A-1: 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl A-2: 2,2,6,6-tetramethylpiperidine-1-oxyl A-3: 4-oxo- 2,2,6,6-tetramethylpiperidine-1-oxyl A-4: 4-methoxy-2,2,6,6-tetramethylpiperidine-1-oxyl
[芳香族化合物]
Ｂ−１：フェノール
Ｂ−２：ハイドロキノン
Ｂ−３：４−メトキシフェノール
Ｂ−４：カテコール
Ｂ−５：４−ｔ−ブチルカテコール
[Aromatic compounds]
B-1: Phenol B-2: Hydroquinone B-3: 4-Methoxyphenol B-4: Catechol B-5: 4-t-butylcatechol
[溶剤]
Ｃ−１：水(軟化水)
Ｃ−２：エチレングリコールモノブチルエーテル
Ｃ−３：エチルベンゼン
[solvent]
C-1: Water (softened water)
C-2: Ethylene glycol monobutyl ether C-3: Ethylbenzene
[比較化合物]
Ｂ−６：ベンジルアルコール
Ｂ−７：シクロヘキサノール
（以上、水以外はすべて東京化成工業製試薬）
[Comparative compound]
B- 6 : Benzyl alcohol B- 7 : Cyclohexanol (all reagents other than water are manufactured by Tokyo Chemical Industry Co., Ltd.)
２．試験方法
Ｎ−オキシル化合物、芳香族化合物、及び溶剤を表１〜３に示した重量％で混合調製した組成物を−５℃の恒温槽で７日間放置し結晶の析出の有無を目視で確認した。結果を表１〜３に示した。
2. Test method A composition prepared by mixing N-oxyl compound, aromatic compound, and solvent at the weight percentages shown in Tables 1 to 3 was allowed to stand in a thermostatic bath at -5 ° C for 7 days and visually confirmed for crystal precipitation. did. The results are shown in Tables 1-3.
溶剤として水を用いた場合、比較例１〜３に示すとおり、−５℃で結晶析出しないＮ−オキシル化合物の上限濃度は１０％であるのに対し、本発明では、Ｎ−オキシル化合物の濃度が４０〜８０％であっても液体状態を保持し、かつＮ−オキシル化合物の結晶が析出しないことが確認された。また、芳香族環上に直接水酸基を有しないベンジルアルコールや芳香族ではないアルコール化合物を用いた場合には、結晶析出の抑制効果が見られないことが比較例４、５から明らかであり、本発明を達成するには、水酸基を芳香族環上に有する芳香族化合物の存在が必要であることが理解されよう。 When water is used as the solvent, as shown in Comparative Examples 1 to 3, the upper limit concentration of the N-oxyl compound that does not crystallize at −5 ° C. is 10%, whereas in the present invention, the concentration of the N-oxyl compound is Even if it is 40 to 80%, it was confirmed that the liquid state was maintained and the crystal of the N-oxyl compound was not precipitated. In addition, it is clear from Comparative Examples 4 and 5 that when benzyl alcohol having no hydroxyl group directly on the aromatic ring or an alcohol compound that is not aromatic is used, the effect of suppressing crystal precipitation is not observed. It will be appreciated that the presence of an aromatic compound having a hydroxyl group on the aromatic ring is necessary to achieve the invention.
溶剤としてアルコール化合物を用いた場合、比較例６〜８に示すとおり、−５℃で結晶析出しないＮ−オキシル化合物の上限濃度は２０％であるのに対し、本発明では、Ｎ−オキシル化合物の濃度が４０〜８０％であっても液体状態を保持し、かつＮ−オキシル化合物の結晶が析出しないことが確認された。また、芳香族環上に直接水酸基を有しないベンジルアルコールや芳香族ではないアルコール化合物を用いた場合には、結晶析出の抑制効果が見られないことが比較例９、１０から明らかであり、本発明を達成するには、水酸基を芳香族環上に有する芳香族化合物の存在が必要であることが理解されよう。 When an alcohol compound is used as the solvent, as shown in Comparative Examples 6 to 8, the upper limit concentration of the N-oxyl compound that does not crystallize at −5 ° C. is 20%. It was confirmed that the liquid state was maintained even when the concentration was 40 to 80%, and crystals of the N-oxyl compound were not precipitated. Further, it is clear from Comparative Examples 9 and 10 that when benzyl alcohol having no hydroxyl group directly on the aromatic ring or a non-aromatic alcohol compound is used, the effect of suppressing crystal precipitation is not observed. It will be appreciated that the presence of an aromatic compound having a hydroxyl group on the aromatic ring is necessary to achieve the invention.
溶剤として芳香族炭化水素であるエチルベンゼンを用いた場合、比較例１１〜１４に示すとおり、−５℃で結晶析出しないＮ−オキシル化合物の上限濃度は５％であるのに対し、本発明では、Ｎ−オキシル化合物の濃度が１０〜３０％であっても液体状態を保持し、かつＮ−オキシル化合物の結晶が析出しないことが確認された。また、芳香族環上に直接水酸基を有しないベンジルアルコールや芳香族ではないアルコール化合物を用いた場合には、結晶析出の抑制効果が見られないことが比較例１５、１６から明らかであり、本発明を達成するには、水酸基を芳香族環上に有する芳香族化合物の存在が必要であることが理解されよう。
Ｃ成分として芳香族炭化水素（エチルベンゼン）を選択した場合、Ｂ成分の水酸基を有する芳香族化合物を配合しないと、−５℃で結晶析出しないＡ成分のＮ−オキシル化合物の上限濃度は５％であり、Ｃ成分が水の場合（１０％）やアルコール化合物の場合（２０％）に比べて低いが、このような厳しい条件においても本発明の組成物ではＮ−オキシル化合物を１０％以上配合できることを示している。
When ethylbenzene which is an aromatic hydrocarbon is used as the solvent, as shown in Comparative Examples 11 to 14, the upper limit concentration of the N-oxyl compound which does not crystallize at −5 ° C. is 5%, whereas in the present invention, It was confirmed that the liquid state was maintained even when the concentration of the N-oxyl compound was 10 to 30%, and crystals of the N-oxyl compound were not precipitated. In addition, it is clear from Comparative Examples 15 and 16 that when benzyl alcohol having no hydroxyl group directly on the aromatic ring or an alcohol compound that is not aromatic is used, the effect of suppressing crystal precipitation is not observed. It will be appreciated that the presence of an aromatic compound having a hydroxyl group on the aromatic ring is necessary to achieve the invention.
When aromatic hydrocarbon (ethylbenzene) is selected as the C component, the upper limit concentration of the N-oxyl compound of the A component that does not crystallize at -5 ° C is 5% unless an aromatic compound having a hydroxyl group of the B component is blended. Yes, it is lower than the case where the C component is water (10%) or the alcohol compound (20%), but the N-oxyl compound can be blended in an amount of 10% or more even in such severe conditions. Is shown.
本発明は、以上のように構成されており、また本発明はその基本思想または主要な特徴から逸脱することなく、他のいろいろな形で実施することができ、上記実施例はあらゆる点で単なる例示にすぎず、限定的に解釈されるものではない。また、本発明は、特許請求の範囲によって特徴付けられるものであって、明細書本文には、なんら拘束されない。さらに、特許請求の範囲の均等範囲に属する変形や変更は、全て本発明の技術範囲内に包含される。 The present invention is configured as described above, and the present invention can be implemented in various other forms without departing from the basic idea or main features thereof. It is only an example and should not be construed as limiting. Further, the present invention is characterized by the scope of claims, and is not restricted to the text of the specification. Further, all modifications and changes belonging to the equivalent scope of the claims are included in the technical scope of the present invention.
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| PCT/JP2011/003398 WO2011158499A1 (en) | 2010-06-18 | 2011-06-15 | Polymerization inhibitor composition for vinyl compounds and method for inhibiting the polymerization of vinyl compounds which includes using same |
| KR1020127032787A KR101538836B1 (en) | 2010-06-18 | 2011-06-15 | Polymerization inhibitor composition for vinyl compounds and method for inhibiting the polymerization of vinyl compounds which includes using same |
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| CA3055126A1 (en) * | 2017-03-09 | 2018-09-13 | Ecolab Usa Inc. | Polymerization inhibitor compositions |
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| JPH01165534A (en) * | 1987-12-22 | 1989-06-29 | Mitsubishi Petrochem Co Ltd | Polymerization inhibitor for styrenes |
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| US5322960A (en) * | 1993-04-15 | 1994-06-21 | Nippon Shokubai Co., Ltd. | Method for inhibiting polymerization of (meth) acrylic acid and esters thereof |
| US5728872A (en) * | 1994-06-27 | 1998-03-17 | Lutz Riemenschneider | Stabilized acrylic acid compositions |
| ES2126185T3 (en) * | 1994-08-19 | 1999-03-16 | Huels Chemische Werke Ag | INHIBITION OF THE POLYMERIZATION OF STYRENE. |
| JP3207144B2 (en) * | 1997-12-10 | 2001-09-10 | 伯東株式会社 | Polymerization inhibitor composition |
| KR100417098B1 (en) * | 1998-07-27 | 2004-02-05 | 니폰 쇼쿠바이 컴파니 리미티드 | Method for inhibiting polymerization of a vinyl compound |
| JP2002524430A (en) * | 1998-09-09 | 2002-08-06 | ベイカー ヒューズ インコーポレイテッド | Styrene monomer polymerization inhibition using substituted dihydroxyarenes and nitroxides |
| WO2000036052A1 (en) * | 1998-12-17 | 2000-06-22 | Nalco/Exxon Energy Chemicals, L.P. | Inhibiting polymerization of vinyl aromatic monomers using synergistic mixtures containing nitroxide stabilizers |
| KR100763663B1 (en) * | 1999-12-03 | 2007-10-04 | 유니로얄 캐미칼 캄파니, 인크. | Composition and method for inhibiting polymerization and polymer growth |
| JP3960508B2 (en) * | 2000-07-10 | 2007-08-15 | 伯東株式会社 | Method for inhibiting polymerization of styrenes |
| US7045647B2 (en) * | 2000-10-16 | 2006-05-16 | Uniroyal Chemical Company, Inc. | Blends of quinone alkide and nitroxyl compounds and polymerization inhibitors |
| US7696290B2 (en) * | 2004-12-03 | 2010-04-13 | Crompton Corporation | Aromatic sulfonic acids, amines, and nitrophenols in combination with nitroxyl radical-containing compounds or C-nitrosanilines as polymerization inhibitors |
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| KR20130027532A (en) | 2013-03-15 |
| CN102947260A (en) | 2013-02-27 |
| WO2011158499A1 (en) | 2011-12-22 |
| JP2012001501A (en) | 2012-01-05 |
| KR101538836B1 (en) | 2015-07-22 |
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