JP5610209B2 - Antistatic agent and coating composition using the same - Google Patents
Antistatic agent and coating composition using the same Download PDFInfo
- Publication number
- JP5610209B2 JP5610209B2 JP2010200861A JP2010200861A JP5610209B2 JP 5610209 B2 JP5610209 B2 JP 5610209B2 JP 2010200861 A JP2010200861 A JP 2010200861A JP 2010200861 A JP2010200861 A JP 2010200861A JP 5610209 B2 JP5610209 B2 JP 5610209B2
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- JP
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- Prior art keywords
- antistatic agent
- meth
- acrylate
- compound
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002216 antistatic agent Substances 0.000 title claims description 55
- 239000008199 coating composition Substances 0.000 title claims description 51
- -1 halide ion Chemical class 0.000 claims description 91
- 125000000623 heterocyclic group Chemical group 0.000 claims description 44
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 35
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 26
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 claims description 13
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims description 12
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 9
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 claims description 8
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 claims description 8
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims description 8
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 claims description 8
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 claims description 8
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 claims description 8
- 125000000962 organic group Chemical group 0.000 claims description 8
- AIFRHYZBTHREPW-UHFFFAOYSA-N β-carboline Chemical compound N1=CC=C2C3=CC=CC=C3NC2=C1 AIFRHYZBTHREPW-UHFFFAOYSA-N 0.000 claims description 8
- 150000001450 anions Chemical class 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 4
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 claims description 4
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 claims description 4
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 claims description 4
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims description 4
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 claims description 4
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 4
- 229950000688 phenothiazine Drugs 0.000 claims description 4
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Natural products C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 claims description 4
- VHMICKWLTGFITH-UHFFFAOYSA-N 2H-isoindole Chemical compound C1=CC=CC2=CNC=C21 VHMICKWLTGFITH-UHFFFAOYSA-N 0.000 claims description 3
- WRYCSMQKUKOKBP-UHFFFAOYSA-N Imidazolidine Chemical compound C1CNCN1 WRYCSMQKUKOKBP-UHFFFAOYSA-N 0.000 claims description 3
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 3
- 150000002391 heterocyclic compounds Chemical class 0.000 claims description 3
- USPWKWBDZOARPV-UHFFFAOYSA-N pyrazolidine Chemical compound C1CNNC1 USPWKWBDZOARPV-UHFFFAOYSA-N 0.000 claims description 3
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910020366 ClO 4 Inorganic materials 0.000 claims description 2
- GWVMLCQWXVFZCN-UHFFFAOYSA-N isoindoline Chemical compound C1=CC=C2CNCC2=C1 GWVMLCQWXVFZCN-UHFFFAOYSA-N 0.000 claims description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 95
- 150000001875 compounds Chemical class 0.000 description 75
- 238000000576 coating method Methods 0.000 description 64
- 239000011248 coating agent Substances 0.000 description 60
- 239000010408 film Substances 0.000 description 51
- 238000006243 chemical reaction Methods 0.000 description 45
- 229920005989 resin Polymers 0.000 description 36
- 239000011347 resin Substances 0.000 description 36
- 239000000463 material Substances 0.000 description 34
- 239000000243 solution Substances 0.000 description 32
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 28
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 28
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 24
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 20
- 239000002585 base Substances 0.000 description 20
- 239000011521 glass Substances 0.000 description 19
- 239000000203 mixture Substances 0.000 description 18
- 150000003512 tertiary amines Chemical class 0.000 description 18
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 17
- 239000002904 solvent Substances 0.000 description 17
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 239000000758 substrate Substances 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000003786 synthesis reaction Methods 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 12
- 238000000862 absorption spectrum Methods 0.000 description 12
- 125000003700 epoxy group Chemical group 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- 239000003999 initiator Substances 0.000 description 11
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 10
- 239000003960 organic solvent Substances 0.000 description 10
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- VVHFXJOCUKBZFS-UHFFFAOYSA-N 2-(chloromethyl)-2-methyloxirane Chemical compound ClCC1(C)CO1 VVHFXJOCUKBZFS-UHFFFAOYSA-N 0.000 description 8
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 8
- 239000003973 paint Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- 239000005056 polyisocyanate Substances 0.000 description 7
- 229920001228 polyisocyanate Polymers 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 6
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 239000000976 ink Substances 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical group OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 6
- 150000003335 secondary amines Chemical class 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 5
- 229920002284 Cellulose triacetate Polymers 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 5
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 239000003504 photosensitizing agent Substances 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
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- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
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- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 3
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
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- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
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- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
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- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
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- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
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Description
本発明は、帯電防止剤に関し、さらには、該帯電防止剤を用いたコーティング組成物に関する。 The present invention relates to an antistatic agent, and further relates to a coating composition using the antistatic agent.
近年、映像や文字を鮮明に表示できる液晶ディスプレイ(LCD)、プラズマディスプレイ(PDP)、有機ELディスプレイ等の表示装置を備えたノートパソコンやテレビ等の情報機器が普及している。ここで、例えば、液晶ディスプレイ用偏光板に用いられているトリアセチルセルロース(TAC)フィルム等は、フィルム表面の保護や機能付与を目的として、フィルム表面に活性エネルギー線硬化性組成物や熱硬化性組成物のコーティング組成物を塗布して、指紋や汚れの付着を防止する防汚性、傷付きを防止する耐擦傷性、埃付着を防止する帯電防止性等を有する塗膜をフィルム表面に形成することが行われている。特に、フィルム表面での静電気の発生による埃付着は、表示装置で表示された画像の視認性を低下するものであり、これを防止するためにフィルム表面の帯電防止性能の向上が求められている。 In recent years, information devices such as notebook computers and televisions equipped with display devices such as a liquid crystal display (LCD), a plasma display (PDP), and an organic EL display that can clearly display images and characters have become widespread. Here, for example, a triacetyl cellulose (TAC) film used for a polarizing plate for a liquid crystal display has an active energy ray curable composition or thermosetting on the film surface for the purpose of protecting the film surface or imparting a function. Applying the coating composition of the composition to form a coating film on the film surface that has antifouling properties to prevent fingerprints and dirt, scratch resistance to prevent scratches, antistatic properties to prevent dust adhesion, etc. To be done. In particular, the adhesion of dust due to the generation of static electricity on the film surface lowers the visibility of the image displayed on the display device, and in order to prevent this, an improvement in the antistatic performance of the film surface is required. .
前記コーティング組成物に帯電防止性を付与させる帯電防止剤としては、低分子型帯電防止剤として古くから用いられているカチオン、アニオン、ノニオン系等の種々の界面活性剤や、金属粒子、カーボンブラック、カーボンナノチューブ、導電性ウィスカ等の導電性フィラーや、ポリエチレンオキシド(PEO)とナトリウム、カリウム等のアルカリ金属との錯体であるイオン伝導性ポリマーや、ポリアニリン、ポリチオフェン、ポリアセチレン等の導電性ポリマー等が知られている。これらの帯電防止剤は、直接帯電防止性を付与したい基材表面に塗布するか、基材の内部に配合するか、又はコーティング組成物に添加した後に帯電防止性を付与したい基材に塗布して用いられる。 Antistatic agents for imparting antistatic properties to the coating composition include various surfactants such as cations, anions, and nonionics that have been used for a long time as low molecular weight antistatic agents, metal particles, and carbon black. Conductive fillers such as carbon nanotubes and conductive whiskers, ion conductive polymers that are complexes of polyethylene oxide (PEO) with alkali metals such as sodium and potassium, and conductive polymers such as polyaniline, polythiophene, and polyacetylene. Are known. These antistatic agents can be applied directly to the surface of the substrate to which antistatic properties are to be imparted, blended inside the substrate, or added to the coating composition and then applied to the substrate to which antistatic properties are to be imparted. Used.
上記の帯電防止剤が帯電を防止できる理由としては、例えば、前記界面活性剤の場合は、界面活性剤の化学構造内に親水基と疎水基を有していることから、基材に塗布した際に表面で親水基が空気中の水分を吸着し、基材表面に帯電した静電気を逃すためと考えられている。そのため、帯電防止剤は帯電防止したい基材表面に存在する必要がある。しかしながら、上記帯電防止剤をプラスチック基材に配合する場合、基材中に一旦取り込まれてしまうため、帯電防止効果がすぐに得られず、基材中から帯電防止剤がブリードアウトすることによって基材表面へ移行して初めて帯電防止性能が得られる。そこで、帯電防止剤のブリードアウトを促進する目的で高級アルコール等を併用する方法も提案されているが、透明性が損なわれることになり、透明性を要求される用途には不適であった。また、基材中に取り込まれたまま基材表面へ移行しない帯電防止剤も存在するため、必要以上の配合量が必要となる問題もあった。これらの問題については、帯電防止性を添加したコーティング組成物についても同様であり、十分な帯電防止性を得るためには帯電防止剤の添加量を多くする必要があり、コーティング組成物の塗膜の耐擦傷性、透明性、表面平滑性が損なわれる問題があった。さらに、帯電防止剤とコーティング組成物のベース樹脂との相溶性が低い場合は、これらの問題は顕著であった。 The reason why the above-mentioned antistatic agent can prevent electrification is, for example, in the case of the surfactant, since it has a hydrophilic group and a hydrophobic group in the chemical structure of the surfactant, it was applied to the substrate. At this time, it is considered that the hydrophilic group adsorbs moisture in the air on the surface and releases the static electricity charged on the substrate surface. For this reason, the antistatic agent needs to be present on the surface of the substrate to be antistatic. However, when the antistatic agent is blended into the plastic base material, it is once taken into the base material, so that the antistatic effect cannot be obtained immediately, and the antistatic agent bleeds out from the base material. The antistatic performance can be obtained only after shifting to the material surface. Therefore, a method using a higher alcohol or the like in combination for the purpose of accelerating the bleeding out of the antistatic agent has been proposed, but the transparency is impaired, and it is unsuitable for applications requiring transparency. In addition, there is an antistatic agent that does not migrate to the surface of the base material while being incorporated into the base material. About these problems, it is the same also about the coating composition which added antistatic property, and in order to acquire sufficient antistatic property, it is necessary to increase the addition amount of an antistatic agent, and the coating film of coating composition There was a problem that the scratch resistance, transparency, and surface smoothness of the resin were impaired. Furthermore, when the compatibility between the antistatic agent and the base resin of the coating composition is low, these problems are significant.
そこで、上記の問題を解決する帯電防止剤としては、分子内にパーフルオロアルキル基を有するフッ素化カチオン性界面活性剤が提案されている(例えば、特許文献1参照。)。しかしながら、このフッ素化カチオン性界面活性剤は、フッ素系溶剤に溶解したものをスプレー、ディッピング等の塗布方法でプラスチック基材の表面に塗布する場合には、帯電防止性を付与できるものの、コーティング組成物に添加して使用する場合は、コーティング組成物中のベース樹脂、有機溶剤等に対する溶解性が乏しいため、平滑かつ透明な塗膜が得られない問題があった。 Therefore, as an antistatic agent that solves the above problem, a fluorinated cationic surfactant having a perfluoroalkyl group in the molecule has been proposed (for example, see Patent Document 1). However, this fluorinated cationic surfactant can provide antistatic properties when it is applied to the surface of a plastic substrate by a coating method such as spraying or dipping, but is dissolved in a fluorine-based solvent. When used by adding to a product, there is a problem that a smooth and transparent coating film cannot be obtained due to poor solubility in the base resin, organic solvent, etc. in the coating composition.
また、上記の問題を解決する帯電防止剤として、パーフルオロアルキル基含有4級アンモニウム塩が提案されている(例えば、特許文献2参照。)。このパーフルオロアルキル基含有4級アンモニウム塩は、コーティング組成物に添加して使用する場合、コーティング組成物中のベース樹脂、有機溶剤等に対する溶解性が、特許文献1記載の帯電防止剤よりも帯電防止性能が向上するが、より高い塗膜の透明性、塗膜表面の平滑性が求められた場合、まだ不十分であった。 In addition, a perfluoroalkyl group-containing quaternary ammonium salt has been proposed as an antistatic agent that solves the above problems (see, for example, Patent Document 2). When this perfluoroalkyl group-containing quaternary ammonium salt is used by being added to a coating composition, the solubility in the base resin, organic solvent, etc. in the coating composition is higher than that of the antistatic agent described in Patent Document 1. Although the prevention performance was improved, it was still insufficient when higher transparency of the coating film and smoothness of the coating film surface were required.
本発明が解決しようとする課題は、コーティング組成物に添加した場合、該組成物中の成分である樹脂、各種モノマー類、有機溶剤等に対する溶解性が高く、少量添加で優れた帯電防止性をコーティング組成物に付与できる帯電防止剤及び該帯電防止剤を用いたコーティング組成物を提供することである。 The problem to be solved by the present invention is that, when added to a coating composition, it has high solubility in resins, various monomers, organic solvents, etc., which are components in the composition, and it has excellent antistatic properties when added in a small amount. It is providing the antistatic agent which can be provided to a coating composition, and the coating composition using this antistatic agent.
本発明者等は、上記課題を解決すべく鋭意研究を重ねた結果、フッ素化アルキル基等のフッ素化された有機基及び含窒素複素環を有する4級アンモニウム塩をコーティング組成物に配合する帯電防止剤として用いることで、該帯電防止剤中に存在するフッ素原子特有の表面自由エネルギーを最小にさせようとする作用によって、該組成物を基材に塗布した際に、帯電防止剤が塗膜表面に偏析して、該組成物の塗膜に優れた帯電防止性を付与でき、さらに透明性、表面平滑性に優れた塗膜が得られることを見出し、本発明を完成した。 As a result of intensive studies to solve the above problems, the present inventors have incorporated a quaternary ammonium salt having a fluorinated organic group such as a fluorinated alkyl group and a nitrogen-containing heterocyclic ring into the coating composition. When used as an antistatic agent, the antistatic agent is applied to the coating film when the composition is applied to a substrate by the action of minimizing the surface free energy peculiar to fluorine atoms present in the antistatic agent. It was segregated on the surface, and it was found that an excellent antistatic property could be imparted to the coating film of the composition, and a coating film having excellent transparency and surface smoothness could be obtained, and the present invention was completed.
すなわち、本発明は、下記一般式(1)で表される含窒素複素環を有する4級アンモニウム塩を必須成分とすることを特徴とする帯電防止剤及びそれを用いたコーティング組成物に関する。 That is, the present invention relates to an antistatic agent comprising a quaternary ammonium salt having a nitrogen-containing heterocycle represented by the following general formula (1) as an essential component and a coating composition using the same.
本発明の帯電防止剤を配合したコーティング組成物は、基材に塗布して基材上に塗膜を形成することで、基材表面に優れた帯電防止性を付与することができる。また、本発明の帯電防止剤は、コーティング組成物中のベース樹脂、有機溶剤等に対する溶解性が高く、透明性、表面平滑性に優れた塗膜が得られるため、高い透明性や表面平滑性が要求される液晶ディスプレイ用偏光板に用いられているTACフィルム等の光学フィルムの表面に帯電防止性を付与する材料として好適に用いることができる。 The coating composition containing the antistatic agent of the present invention can impart excellent antistatic properties to the substrate surface by coating the substrate and forming a coating film on the substrate. In addition, since the antistatic agent of the present invention has a high solubility in the base resin, organic solvent, etc. in the coating composition, and a coating film excellent in transparency and surface smoothness is obtained, high transparency and surface smoothness are obtained. Can be suitably used as a material for imparting antistatic properties to the surface of an optical film such as a TAC film used for polarizing plates for liquid crystal displays.
本発明の帯電防止剤は、下記一般式(1)で表される含窒素複素環を有する4級アンモニウム塩を必須成分とするものである。 The antistatic agent of the present invention comprises a quaternary ammonium salt having a nitrogen-containing heterocycle represented by the following general formula (1) as an essential component.
前記一般式(1)中のRfは、フッ素化アルキル基であるが、酸素原子によるエーテル結合を有するものも含まれる。このフッ素化アルキル基の具体例としては、下記の(Rf−1)〜(Rf−7)が挙げられる。 Rf in the general formula (1) is a fluorinated alkyl group, but includes those having an ether bond with an oxygen atom. Specific examples of the fluorinated alkyl group include the following (Rf-1) to (Rf-7).
上記のRfの中でも、本発明の帯電防止剤を(Rf−1)においてnが4又は6のものは、本発明の帯電防止剤を樹脂組成物に配合した際、該組成物の塗膜表面への本発明の帯電防止剤の偏析能が高くなるので、より優れた帯電防止性を塗膜に付与できるとともに、該組成物中の他の成分との相溶性が向上することから好ましい。 Among the above Rf, the antistatic agent of the present invention (Rf-1) where n is 4 or 6 is the surface of the coating film of the composition when the antistatic agent of the present invention is blended with the resin composition. Since the segregation ability of the antistatic agent of the present invention is increased, it is preferable because more excellent antistatic properties can be imparted to the coating film and compatibility with other components in the composition is improved.
前記一般式(1)中のAは2価の有機基であるが、具体的には、炭素原子数1〜3のアルキレン基が好ましい。また、アルキレン基の中でも原料の入手が容易であるエチレン基がより好ましい。 A in the general formula (1) is a divalent organic group, and specifically, an alkylene group having 1 to 3 carbon atoms is preferable. Further, among the alkylene groups, an ethylene group from which raw materials are easily available is more preferable.
前記一般式(1)中のR1及びR2は含窒素複素環を形成する炭素原子又は窒素原子を表し、R1及びR2は2価の有機基を介して、R1及びR2が結合している4級窒素原子とともに複素環を形成する。なお、この複素環にさらに他の環が縮合した縮合環となっていてもよい。このような含窒素複素環の具体的としては、ピロール、イミダゾール、ピラゾール、ピロリジン、ピロリン、イミダゾリジン、イミダゾリン、ピラゾリジン、ピラゾリン、ピペリジン、ピペラジン、イソインドール、インドール、1H−インダゾール、プリン、インドリン、イソインドリン、モルホリン、カルバゾール、β−カルボリン、フェノチアジン、フェノキサジン等の含窒素複素環由来のものが好ましく挙げられる。これらの含窒素複素環の中でも、他の樹脂、有機溶剤等の成分への溶解性が向上することから、イミダゾール、イミダゾリンがより好ましい。 In the general formula (1), R 1 and R 2 represent a carbon atom or a nitrogen atom that forms a nitrogen-containing heterocycle, and R 1 and R 2 are divalent organic groups, and R 1 and R 2 are Forms a heterocycle with the quaternary nitrogen atom attached. Note that this heterocyclic ring may be a condensed ring obtained by further condensing another ring. Specific examples of such nitrogen-containing heterocycle include pyrrole, imidazole, pyrazole, pyrrolidine, pyrroline, imidazolidine, imidazoline, pyrazolidine, pyrazoline, piperidine, piperazine, isoindole, indole, 1H-indazole, purine, indoline, iso Preferred are those derived from nitrogen-containing heterocycles such as indoline, morpholine, carbazole, β-carboline, phenothiazine, phenoxazine and the like. Among these nitrogen-containing heterocycles, imidazole and imidazoline are more preferable because solubility in other resins and organic solvents is improved.
前記一般式(1)中のR3は炭素原子数1〜12のアルキル基が好ましく、製造が容易なことからメチル基がより好ましい。 R 3 in the general formula (1) is preferably an alkyl group having 1 to 12 carbon atoms, and a methyl group is more preferable because of easy production.
前記一般式(1)中のX−はアニオンであるが、具体的には、ハロゲン化物イオン、OH−、NO3 −、ClO4 −、CH3SO4 −、CH3CO2 −、CF3SO3 −、C4F9SO3 −、CH3PhSO3 −等が挙げられる。これらのアニオンの中でも、コーティング組成物中のベース樹脂、有機溶剤等に対する溶解性が高く、透明性、表面平滑性に優れた塗膜が得ることができるCH3PhSO3 −がより好ましい。 X − in the general formula (1) is an anion, specifically, halide ion, OH − , NO 3 − , ClO 4 − , CH 3 SO 4 − , CH 3 CO 2 − , CF 3. SO 3 − , C 4 F 9 SO 3 − , CH 3 PhSO 3 — and the like can be mentioned. Among these anions, CH 3 PhSO 3 — is more preferable because it has a high solubility in the base resin and organic solvent in the coating composition and can provide a coating film having excellent transparency and surface smoothness.
本発明の帯電防止剤の必須成分である4級アンモニウム塩の製造方法としては、例えば、下記の工程1〜3を経る方法が挙げられる。 As a manufacturing method of the quaternary ammonium salt which is an essential component of the antistatic agent of this invention, the method through the following processes 1-3 is mentioned, for example.
(工程1)
フッ素化アルキル基及び水酸基を有する化合物と、エピクロルヒドリン又はβ-メチルエピクロルヒドリンとを反応させ、エポキシ基を有する化合物を得る工程。
(工程2)
工程1で得られたエポキシ基を有する化合物と、2級アミンを複素環内に有する含窒素複素環化合物とを反応させ、3級アミンを複素環内に有する含窒素複素環化合物を得る工程。
(工程3)
工程2で得られた3級アミンを複素環内に有する含窒素複素環化合物中の3級アミンを4級アンモニウム化して4級アンモニウム化合物を得る工程。
(Process 1)
A step of reacting a compound having a fluorinated alkyl group and a hydroxyl group with epichlorohydrin or β-methylepichlorohydrin to obtain a compound having an epoxy group.
(Process 2)
A step of reacting the compound having an epoxy group obtained in Step 1 with a nitrogen-containing heterocyclic compound having a secondary amine in the heterocyclic ring to obtain a nitrogen-containing heterocyclic compound having a tertiary amine in the heterocyclic ring.
(Process 3)
A step of obtaining a quaternary ammonium compound by quaternizing the tertiary amine in the nitrogen-containing heterocyclic compound having the tertiary amine obtained in Step 2 in the heterocyclic ring.
上記の工程1において、フッ素化アルキル基及び水酸基を有する化合物と、エピクロルヒドリン又はβ-メチルエピクロルヒドリンとを反応させ、エポキシ基を有する化合物を得る方法について以下に説明する。 A method for obtaining a compound having an epoxy group by reacting a compound having a fluorinated alkyl group and a hydroxyl group with epichlorohydrin or β-methylepichlorohydrin in Step 1 will be described below.
上記の工程1の反応としては、例えば、フッ素化アルキル基及び水酸基を有する化合物と、エピクロルヒドリン又はβ-メチルエピクロルヒドリンとを溶媒の存在下、又は無溶媒で溶液とし、必要に応じて触媒を添加し、塩基を滴下してエポキシ化反応させることによって、エポキシ基を有する化合物を得る方法が挙げられる。このエポキシ化反応を行う際の反応温度としては、0〜80℃の範囲が好ましい。 As the reaction in the above step 1, for example, a compound having a fluorinated alkyl group and a hydroxyl group and epichlorohydrin or β-methylepichlorohydrin are made into a solution in the presence of a solvent or without a solvent, and a catalyst is added as necessary. The method of obtaining the compound which has an epoxy group by dripping a base and making it epoxidize is mentioned. As reaction temperature at the time of performing this epoxidation reaction, the range of 0-80 degreeC is preferable.
前記フッ素化アルキル基及び水酸基を有する化合物としては、下記化学式(2)で表される化合物が挙げられる。 Examples of the compound having a fluorinated alkyl group and a hydroxyl group include a compound represented by the following chemical formula (2).
ここで、前記フッ素化アルキル基及び水酸基を有する化合物と、前記エピクロルヒドリン又はβ-メチルエピクロルヒドリンとの仕込み比率(フッ素化アルキル基及び水酸基を有する化合物/エピクロルヒドリン又はβ-メチルエピクロルヒドリン)が、モル比で1/1〜1/15の範囲が好ましく、1/1.05〜1/10の範囲がより好ましい。 Here, the charge ratio of the compound having a fluorinated alkyl group and a hydroxyl group and the epichlorohydrin or β-methylepichlorohydrin (a compound having a fluorinated alkyl group and a hydroxyl group / epichlorohydrin or β-methylepichlorohydrin) is 1 in molar ratio. The range of 1/1 to 1/15 is preferable, and the range of 1 / 1.05 to 1/10 is more preferable.
上記の工程1の製造において使用する溶媒は、極性溶媒、有機相と水相の2相系の溶媒が挙げられる。前記極性溶媒としては、ベンゼン、トルエン、ジエチルエーテル、テトラヒドロフラン、イソプロピルエーテル、ジメチルスルホキシド、1,4−ビス(トリフルオロメチル)ベンゼン等が挙げられ、前記有機相に使用する溶媒としては、ベンゼン、トルエン、ジエチルエーテル、イソプロピルエーテル、シクロヘキサン、1,4−ビス(トリフルオロメチル)ベンゼン、ジメチルスルホキシド等が挙げられる。 Examples of the solvent used in the production of the above step 1 include a polar solvent and a two-phase solvent of an organic phase and an aqueous phase. Examples of the polar solvent include benzene, toluene, diethyl ether, tetrahydrofuran, isopropyl ether, dimethyl sulfoxide, 1,4-bis (trifluoromethyl) benzene, and the solvent used for the organic phase includes benzene, toluene. , Diethyl ether, isopropyl ether, cyclohexane, 1,4-bis (trifluoromethyl) benzene, dimethyl sulfoxide and the like.
上記の工程1の製造において使用する塩基としては、例えば、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物;リチウム、ナトリウム、カリウム等のアルカリ金属;トリエチルアミン等のアミンなどが挙げられる。これら塩基は水溶液として用いることもできる。また、塩基の使用量は、前記フッ素化アルキル基及び水酸基を有する化合物と、エピクロルヒドリン又はβ-メチルエピクロルヒドリンとの合計量に対して、1.05〜20モル%の範囲で用いることが好ましく、1.1〜10モル%の範囲で用いることがより好ましい。 Examples of the base used in the production of Step 1 above include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, alkali metal hydrides such as sodium hydride and potassium hydride; lithium, sodium, potassium and the like. Alkali metals; amines such as triethylamine. These bases can also be used as an aqueous solution. The amount of the base used is preferably in the range of 1.05 to 20 mol% based on the total amount of the compound having a fluorinated alkyl group and a hydroxyl group and epichlorohydrin or β-methylepichlorohydrin. More preferably, it is used in the range of 1 to 10 mol%.
また、上記の工程1の製造において必要に応じて使用する触媒としては、4級アンモニウム塩が好ましく、4級アンモニウムクロライド、4級アンモニウムブロマイド等の相間移動触媒が挙げられる。この相間移動触媒の具体例としては、ベンジルトリエチルアンモニウムクロライド、ベンジルジメチルフェニルアンモニウムクロライド、硫酸水素テトラ−n−ブチルアンモニウム、テトラメチルアンモニウムブロマイド等が挙げられる。触媒の使用量は、前記フッ素化アルキル基及び水酸基を有する化合物と、エピクロルヒドリン又はβ-メチルエピクロルヒドリンとの合計量に対して、1〜200質量%の範囲が好ましく、3〜100質量%の範囲がより好ましい。 Moreover, as a catalyst used as needed in manufacture of said process 1, a quaternary ammonium salt is preferable and phase transfer catalysts, such as a quaternary ammonium chloride and a quaternary ammonium bromide, are mentioned. Specific examples of this phase transfer catalyst include benzyltriethylammonium chloride, benzyldimethylphenylammonium chloride, tetra-n-butylammonium hydrogen sulfate, tetramethylammonium bromide and the like. The amount of the catalyst used is preferably in the range of 1 to 200% by mass, and in the range of 3 to 100% by mass, based on the total amount of the compound having a fluorinated alkyl group and a hydroxyl group and epichlorohydrin or β-methylepichlorohydrin. More preferred.
上記の工程1の反応により下記一般式(3)で表されるエポキシ基を有する化合物が得られる。 The compound having an epoxy group represented by the following general formula (3) is obtained by the reaction in the above step 1.
上記の工程1の反応により得られたエポキシ基を有する化合物は、反応終了後、フッ素化アルキル基及び水酸基を有する化合物、過剰のエピクロルヒドリン又はβ-メチルエピクロルヒドリン及びこれらの未閉環物、その他の副生成物を減圧蒸留等の単離操作を行うことによって除去することが好ましい。 After completion of the reaction, the compound having an epoxy group obtained by the reaction in the above step 1 is a compound having a fluorinated alkyl group and a hydroxyl group, excess epichlorohydrin or β-methylepichlorohydrin, and these unclosed products, and other by-products. It is preferable to remove the product by performing an isolation operation such as distillation under reduced pressure.
次に、上記の工程2において、工程1で得られたエポキシ基を有する化合物に2級アミンを複素環内に有する含窒素複素環化合物を反応させ、3級アミンを複素環内に有する含窒素複素環化合物を得る方法について以下に説明する。 Next, in step 2 above, the compound having an epoxy group obtained in step 1 is reacted with a nitrogen-containing heterocyclic compound having a secondary amine in the heterocyclic ring, and the nitrogen-containing compound having a tertiary amine in the heterocyclic ring. A method for obtaining a heterocyclic compound will be described below.
前記2級アミンを複素環内に有する含窒素複素環化合物としては、例えば、ピロール、イミダゾール、ピラゾール、ピロリジン、ピロリン、イミダゾリジン、イミダゾリン、ピラゾリジン、ピラゾリン、ピペリジン、ピペラジン、イソインドール、インドール、1H−インダゾール、プリン、インドリン、イソインドリン、モルホリン、カルバゾール、β−カルボリン、フェノチアジン、フェノキサジン等が挙げられる。また、これらの2級アミンを複素環内に有する含窒素複素環化合物として、置換基を有する誘導体やこれらの複素環にさらに他の環が縮合して縮合環となった化合物も用いることができる。 Examples of the nitrogen-containing heterocyclic compound having a secondary amine in the heterocyclic ring include pyrrole, imidazole, pyrazole, pyrrolidine, pyrroline, imidazolidine, imidazoline, pyrazolidine, pyrazoline, piperidine, piperazine, isoindole, indole, 1H- Indazole, purine, indoline, isoindoline, morpholine, carbazole, β-carboline, phenothiazine, phenoxazine and the like can be mentioned. In addition, as nitrogen-containing heterocyclic compounds having these secondary amines in the heterocyclic ring, it is also possible to use derivatives having substituents and compounds in which other rings are condensed to these heterocyclic rings to form condensed rings. .
前記2級アミンを複素環内に有する含窒素複素環化合物の中でも、イミダゾール、2−メチルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール等のイミダゾール又はその誘導体;イミダゾリン、2−フェニルイミダゾリン等のイミダゾリン又はその誘導体などが好ましい。 Among the nitrogen-containing heterocyclic compounds having the secondary amine in the heterocyclic ring, imidazole, 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole Imidazole such as 2-phenyl-4-methylimidazole or a derivative thereof; imidazoline such as imidazoline or 2-phenylimidazoline or a derivative thereof is preferable.
上記の工程2の反応としては、例えば、前記2級アミンを複素環内に有する含窒素複素環化合物を溶媒に溶解させ、その溶液に60〜160℃の範囲で加熱しながら、工程1で得られたエポキシ基を有する化合物を滴下し、反応させる方法が挙げられる。 As the reaction in the above step 2, for example, the nitrogen-containing heterocyclic compound having the secondary amine in the heterocyclic ring is dissolved in a solvent, and the solution is heated in the range of 60 to 160 ° C. and obtained in the step 1. The method of dripping the compound which has the obtained epoxy group, and making it react is mentioned.
上記の工程2の反応により下記一般式(4)で表される3級アミンを複素環内に有する含窒素複素環化合物が得られる。 By the reaction in the above step 2, a nitrogen-containing heterocyclic compound having a tertiary amine represented by the following general formula (4) in the heterocyclic ring is obtained.
さらに、上記の工程3において、工程2で得られた3級アミンを複素環内に有する含窒素複素環化合物中の3級アミンを4級アンモニウム化して4級アンモニウム化合物を得る方法について以下に説明する。 Further, in the above step 3, a method for obtaining a quaternary ammonium compound by quaternizing the tertiary amine in the nitrogen-containing heterocyclic compound having the tertiary amine obtained in step 2 in the heterocyclic ring will be described below. To do.
工程2で得られた複素環を有する化合物中のR1及びR2に結合している窒素原子を4級アンモニウム化するために用いる試薬(以下、「4級化剤」と略記する。)としては、例えば、ハロゲン化アルキル、p−トルエンスルホン酸メチル、ジメチル硫酸等が挙げられる。これらの4級化剤の中でも、本発明の帯電防止剤を樹脂組成物に配合した際、該組成物中の樹脂成分との相溶性が向上することからp−トルエンスルホン酸メチルが好ましい。 As a reagent (hereinafter abbreviated as “quaternizing agent”) used to quaternize the nitrogen atom bonded to R 1 and R 2 in the compound having a heterocyclic ring obtained in Step 2. Examples thereof include alkyl halide, methyl p-toluenesulfonate, dimethyl sulfate and the like. Among these quaternizing agents, methyl p-toluenesulfonate is preferable since the compatibility with the resin component in the composition is improved when the antistatic agent of the present invention is added to the resin composition.
前記4級化剤の使用方法としては、4級化剤の性状によって、選択することができる。4級化剤が25℃で気体又は沸点が50℃未満の液体の場合は、ガス状で反応容器に導入することができる。この際、反応容器内の気相部、液相中のいずれにも導入することができ、またその両方に導入することもできる。ここで、4級化剤を液相中にバブリングして導入して液相中に溶解させると、4級化剤の導入効率が高くなることから好ましい。また、4級化剤の液中への溶解効率を向上できることから、加圧状態で4級化剤を導入することが好ましい。4級化剤の導入圧力(ゲージ圧)は0〜1500kPaが好ましく、10〜300kPaがより好ましい。一方、4級化剤が25℃で液体の場合は、反応容器内の液相の液面に滴下すればよい。 The method of using the quaternizing agent can be selected depending on the properties of the quaternizing agent. When the quaternizing agent is a gas having a temperature of 25 ° C. or a gas having a boiling point of less than 50 ° C., it can be introduced into the reaction vessel in a gaseous state. At this time, it can be introduced into either the gas phase portion or the liquid phase in the reaction vessel, or can be introduced into both. Here, it is preferable to introduce the quaternizing agent by bubbling it into the liquid phase and dissolve it in the liquid phase because the introduction efficiency of the quaternizing agent is increased. Further, since the dissolution efficiency of the quaternizing agent in the liquid can be improved, it is preferable to introduce the quaternizing agent in a pressurized state. The introduction pressure (gauge pressure) of the quaternizing agent is preferably 0 to 1500 kPa, more preferably 10 to 300 kPa. On the other hand, when the quaternizing agent is a liquid at 25 ° C., it may be dropped onto the liquid surface of the liquid phase in the reaction vessel.
また、工程3は、上記の工程2で得られた反応溶液に直接4級化剤を導入することも、上記の工程2で得られた反応溶液から溶媒を留去して、複素環を有する化合物を取り出した後に行っても構わない。なお、目的物の純度を高めるためには、工程3は、上記の工程2で得られた反応溶液から溶媒を留去して、複素環を有する化合物を取り出した後に行った方が好ましい。 In Step 3, the quaternizing agent is directly introduced into the reaction solution obtained in Step 2 above, or the solvent is distilled off from the reaction solution obtained in Step 2 above to have a heterocyclic ring. You may carry out after taking out a compound. In order to increase the purity of the target product, step 3 is preferably performed after removing the compound having a heterocyclic ring by distilling off the solvent from the reaction solution obtained in step 2 above.
工程2で得られた反応溶液から溶媒を留去して、複素環を有する化合物を取り出した後に工程3の反応を行う場合、そのまま無溶媒で4級化剤を加えて反応させることもできるが、反応効率が高いことから、複素環を有する化合物を反応溶媒に溶解して、4級化剤を加えて反応させることが好ましい。前記反応溶媒としては、工程2で得られた複素環を有する化合物及び4級化剤が溶解する溶媒を用いればよく、例えば、ケトン類、エステル類、アミド類、スルホキシド類、エーテル類、炭化水素類が好ましく、具体的には、メタノール、エタノール、ブタノール、プロピレングリコールモノメチルエーテル、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、酢酸エチル、酢酸ブチル、プロピレングリコールモノメチルエーテルアセテート、ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン、ジメチルスルホキシド、ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン、ジオキサン、トルエン、キシレン等が挙げられる。これらは、沸点、相溶性を考慮して適宜選択すればよい。 When the reaction of Step 3 is carried out after removing the compound having a heterocyclic ring by distilling off the solvent from the reaction solution obtained in Step 2, the reaction can be carried out by adding a quaternizing agent without solvent. From the viewpoint of high reaction efficiency, it is preferred to dissolve a compound having a heterocyclic ring in a reaction solvent and add a quaternizing agent for reaction. As the reaction solvent, a solvent in which the compound having a heterocyclic ring obtained in Step 2 and a quaternizing agent are dissolved may be used. For example, ketones, esters, amides, sulfoxides, ethers, hydrocarbons More specifically, methanol, ethanol, butanol, propylene glycol monomethyl ether, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl acetate, butyl acetate, propylene glycol monomethyl ether acetate, dimethylformamide, dimethylacetamide, N- Examples include methyl pyrrolidone, dimethyl sulfoxide, diethyl ether, diisopropyl ether, tetrahydrofuran, dioxane, toluene, xylene and the like. These may be appropriately selected in consideration of the boiling point and compatibility.
前記4級化剤の使用量は、工程2で得られた前記3級アミンを複素環内に有する含窒素複素環化合物に対して、4級化剤の仕込みモル比が0.90〜1.10の範囲内が好ましい。 The amount of the quaternizing agent used is such that the charged molar ratio of the quaternizing agent is 0.90 to 1.0.1 with respect to the nitrogen-containing heterocyclic compound having the tertiary amine obtained in Step 2 in the heterocyclic ring. A range of 10 is preferred.
上記の工程2で得られた複素環を有する化合物を4級アンモニウム化する際の反応温度は、0〜100℃の範囲が好ましく、20〜80℃の範囲がより好ましい。この反応温度の制御は、4級アンモニウム化剤の導入前から開始しても、導入後から開始してもよいが、4級アンモニウム化剤の導入後から制御する方が好ましい。 The reaction temperature at the time of quaternizing the compound having a heterocyclic ring obtained in Step 2 above is preferably 0 to 100 ° C, more preferably 20 to 80 ° C. The reaction temperature may be controlled before the introduction of the quaternary ammonium agent or after the introduction, but is preferably controlled after the introduction of the quaternary ammonium agent.
上記の製造方法により得られる4級アンモニウム塩の具体例としては、下記式(1−1)〜(1−6)等が挙げられる。 Specific examples of the quaternary ammonium salt obtained by the above production method include the following formulas (1-1) to (1-6).
上記の製造方法により得られる4級アンモニウム塩は、そのまま又は有機溶剤に溶解した溶液として、基材に塗布することで、基材表面に帯電防止性を付与することができる。また、前記4級アンモニウム塩は、分子内にフッ素化アルキル基を有するため、前記4級アンモニウム塩を含有するコーティング組成物を基材に塗布した際に、フッ素原子特有の表面自由エネルギーを最小にさせようとする作用が働き、前記4級アンモニウム塩が塗膜表面に偏析するため、コーティング組成物への4級アンモニウム塩の添加量が少なくても塗膜表面へ優れた帯電防止性を付与することができる。したがって、前記4級アンモニウム塩を必須成分とする本発明の帯電防止剤は、コーティング組成物に添加して用いることが好ましい。 The quaternary ammonium salt obtained by the above production method can impart antistatic properties to the surface of the substrate by applying it to the substrate as it is or as a solution dissolved in an organic solvent. In addition, since the quaternary ammonium salt has a fluorinated alkyl group in the molecule, the surface free energy peculiar to fluorine atoms is minimized when the coating composition containing the quaternary ammonium salt is applied to a substrate. Since the quaternary ammonium salt segregates on the coating film surface, the antistatic property is imparted to the coating film surface even if the amount of the quaternary ammonium salt added to the coating composition is small. be able to. Therefore, the antistatic agent of the present invention containing the quaternary ammonium salt as an essential component is preferably added to the coating composition.
本発明のコーティング組成物は、帯電防止剤として前記4級アンモニウム塩を必須成分とした本発明の帯電防止剤を添加したものである。コーティング組成物中の該帯電防止剤への添加量は、コーティング組成物中の樹脂の種類、塗工方法、目的とする膜厚等によって異なるが、十分な帯電防止性を塗膜表面に付与するためには、コーティング組成物中の固形分100質量部に対して0.0001〜20質量部が好ましく、0.001〜10質量部がより好ましく、0.01〜5質量部がさらに好ましい。 The coating composition of the present invention is obtained by adding the antistatic agent of the present invention containing the quaternary ammonium salt as an essential component as an antistatic agent. The amount added to the antistatic agent in the coating composition varies depending on the type of resin in the coating composition, the coating method, the target film thickness, etc., but imparts sufficient antistatic properties to the coating surface. Therefore, 0.0001-20 mass parts is preferable with respect to 100 mass parts of solid content in a coating composition, 0.001-10 mass parts is more preferable, and 0.01-5 mass parts is further more preferable.
また、コーティング組成物の種類としては、溶剤可溶性の樹脂をベースとした溶剤を蒸発させることで塗膜を形成する蒸発乾燥型、熱で樹脂の前駆体が重合して塗膜を形成する熱硬化型、紫外線等の活性エネルギー線の照射により樹脂の前駆体が重合して塗膜を形成する活性エネルギー線硬化型等のいずれのものでも構わない。 In addition, the types of coating compositions include evaporation-drying, which forms a coating film by evaporating a solvent based on a solvent-soluble resin, and thermal curing, in which a resin precursor is polymerized by heat to form a coating film Any type of active energy ray curable type in which a resin precursor is polymerized by irradiation with active energy rays such as a mold and ultraviolet rays to form a coating film may be used.
上記蒸発乾燥型又は熱硬化型のコーティング組成物のベース樹脂としては、例えば、石油樹脂、セラック樹脂、ロジン系樹脂、セルロース系樹脂、ゴム系樹脂、漆、カシュー樹脂、油性ビヒクル等の天然樹脂を用いた塗料;フェノール樹脂、アルキッド樹脂、不飽和ポリエステル樹脂、アミノ樹脂、エポキシ樹脂、ビニル樹脂、アクリル樹脂、ポリウレタン樹脂、シリコーン樹脂、フッ素樹脂等の合成樹脂などが挙げられる。 Examples of the base resin of the evaporation-drying or thermosetting coating composition include natural resins such as petroleum resins, shellac resins, rosin resins, cellulose resins, rubber resins, lacquers, cashew resins, and oil-based vehicles. Paints used: phenol resins, alkyd resins, unsaturated polyester resins, amino resins, epoxy resins, vinyl resins, acrylic resins, polyurethane resins, silicone resins, fluororesins, and other synthetic resins.
また、活性エネルギー線硬化型のコーティング組成物は、その主成分して、活性エネルギー線硬化型樹脂又は活性エネルギー線硬化性単量体を含有する。なお、これらの活性エネルギー線硬化型樹脂と活性エネルギー線硬化性単量体とは、それぞれ単独で用いてもよいが、併用しても構わない。 The active energy ray curable coating composition contains an active energy ray curable resin or an active energy ray curable monomer as a main component. These active energy ray-curable resins and active energy ray-curable monomers may be used alone or in combination.
前記活性エネルギー線硬化型樹脂は、ウレタン(メタ)アクリレート樹脂、不飽和ポリエステル樹脂、エポキシ(メタ)アクリレート樹脂、ポリエステル(メタ)アクリレート樹脂、アクリル(メタ)アクリレート樹脂、マレイミド基含有樹脂等が挙げられるが、本発明では、特に透明性や低収縮性等の点からウレタン(メタ)アクリレート樹脂が好ましい。なお、本発明において、「(メタ)アクリロイル基」とは、メタクロイル基とアクリロイル基の一方、又は両方をいい、「(メタ)アクリル酸」とは、メタクリル酸とアクリル酸の一方又は両方をいい、「(メタ)アクリレート」とは、メタクリレートとアクリレートの一方又は両方をいう。 Examples of the active energy ray-curable resin include urethane (meth) acrylate resins, unsaturated polyester resins, epoxy (meth) acrylate resins, polyester (meth) acrylate resins, acrylic (meth) acrylate resins, and maleimide group-containing resins. However, in the present invention, a urethane (meth) acrylate resin is particularly preferable from the viewpoint of transparency and low shrinkage. In the present invention, “(meth) acryloyl group” means one or both of methacryloyl group and acryloyl group, and “(meth) acrylic acid” means one or both of methacrylic acid and acrylic acid. , “(Meth) acrylate” refers to one or both of methacrylate and acrylate.
ここで用いるウレタン(メタ)アクリレート樹脂は、脂肪族ポリイソシアネート化合物又は芳香族ポリイソシアネート化合物とヒドロキシ基含有(メタ)アクリレート化合物とを反応させて得られるウレタン結合と(メタ)アクリロイル基とを有する樹脂が挙げられる。 The urethane (meth) acrylate resin used here is a resin having a urethane bond and a (meth) acryloyl group obtained by reacting an aliphatic polyisocyanate compound or an aromatic polyisocyanate compound with a hydroxy group-containing (meth) acrylate compound. Is mentioned.
前記脂肪族ポリイソシアネート化合物としては、例えば、テトラメチレンジイソシアネート、ペンタメチレンジイソシアネート、ヘキサメチレンジイソシアネート、ヘプタメチレンジイソシアネート、オクタメチレンジイソシアネート、デカメチレンジイソシアネート、2−メチル−1,5−ペンタンジイソシアネート、3−メチル−1,5−ペンタンジイソシアネート、ドデカメチレンジイソシアネート、2−メチルペンタメチレンジイソシアネート、2,2,4−トリメチルヘキサメチレンジイソシアネート、2,4,4−トリメチルヘキサメチレンジイソシアネート、イソホロンジイソシアネート、ノルボルナンジイソシアネート、水素添加ジフェニルメタンジイソシアネート、水素添加トリレンジイソシアネート、水素添加キシリレンジイソシアネート、水素添加テトラメチルキシリレンジイソシアネート、シクロヘキシルジイソシアネート等が挙げられ、また、芳香族ポリイソシアネート化合物としては、トリレンジイソシアネート、4,4’−ジフェニルメタンジイソシアネート、キシリレンジイソシアネート、1,5−ナフタレンジイソシアネート、トリジンジイソシアネート、p−フェニレンジイソシアネート等が挙げられる。 Examples of the aliphatic polyisocyanate compound include tetramethylene diisocyanate, pentamethylene diisocyanate, hexamethylene diisocyanate, heptamethylene diisocyanate, octamethylene diisocyanate, decamethylene diisocyanate, 2-methyl-1,5-pentane diisocyanate, 3-methyl- 1,5-pentane diisocyanate, dodecamethylene diisocyanate, 2-methylpentamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, isophorone diisocyanate, norbornane diisocyanate, hydrogenated diphenylmethane diisocyanate , Hydrogenated tolylene diisocyanate, hydrogenated xylile Examples include diisocyanate, hydrogenated tetramethylxylylene diisocyanate, cyclohexyl diisocyanate, and the aromatic polyisocyanate compound includes tolylene diisocyanate, 4,4′-diphenylmethane diisocyanate, xylylene diisocyanate, 1,5-naphthalene diisocyanate, Examples include toridine diisocyanate and p-phenylene diisocyanate.
一方、ヒドロキシ基含有アクリレート化合物としては、例えば、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、1,5−ペンタンジオールモノ(メタ)アクリレート、1,6−ヘキサンジオールモノ(メタ)アクリレート、ネオペンチルグリコールモノ(メタ)アクリレート、ヒドロキシピバリン酸ネオペンチルグリコールモノ(メタ)アクリレート等の2価アルコールのモノ(メタ)アクリレート;トリメチロールプロパンジ(メタ)アクリレート、エトキシ化トリメチロールプロパン(メタ)アクリレート、プロポキシ化トリメチロールプロパンジ(メタ)アクリレート、グリセリンジ(メタ)アクリレート、ビス(2−(メタ)アクリロイルオキシエチル)ヒドロキシエチルイソシアヌレート等の3価のアルコールのモノ又はジ(メタ)アクリレート、あるいは、これらのアルコール性水酸基の一部をε−カプロラクトンで変性した水酸基含有モノ及びジ(メタ)アクリレート;ペンタエリスリトールトリ(メタ)アクリレート、ジトリメチロールプロパントリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート等の1官能の水酸基と3官能以上の(メタ)アクリロイル基を有する化合物、あるいは、該化合物をさらにε−カプロラクトンで変性した水酸基含有多官能(メタ)アクリレート;ジプロピレングリコールモノ(メタ)アクリレート、ジエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート等のオキシアルキレン鎖を有する(メタ)アクリレート化合物;ポリエチレングリコール−ポリプロピレングリコールモノ(メタ)アクリレート、ポリオキシブチレン−ポリオキシプロピレンモノ(メタ)アクリレート等のブロック構造のオキシアルキレン鎖を有する(メタ)アクリレート化合物;ポリ(エチレングリコール−テトラメチレングリコール)モノ(メタ)アクリレート、ポリ(プロピレングリコール−テトラメチレングリコール)モノ(メタ)アクリレート等のランダム構造のオキシアルキレン鎖を有する(メタ)アクリレート化合物等が挙げられる。 On the other hand, examples of the hydroxy group-containing acrylate compound include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 1, Monovalent dihydric alcohols such as 5-pentanediol mono (meth) acrylate, 1,6-hexanediol mono (meth) acrylate, neopentyl glycol mono (meth) acrylate, and hydroxypivalate neopentyl glycol mono (meth) acrylate ( (Meth) acrylate; trimethylolpropane di (meth) acrylate, ethoxylated trimethylolpropane (meth) acrylate, propoxylated trimethylolpropane di (meth) acrylate, glycerin di (meth) Mono- or di (meth) acrylates of trivalent alcohols such as acrylate and bis (2- (meth) acryloyloxyethyl) hydroxyethyl isocyanurate, or hydroxyl groups obtained by modifying some of these alcoholic hydroxyl groups with ε-caprolactone Containing mono- and di (meth) acrylates; monofunctional hydroxyl groups such as pentaerythritol tri (meth) acrylate, ditrimethylolpropane tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, and more than trifunctional (meth) acryloyl groups Or a hydroxyl group-containing polyfunctional (meth) acrylate further modified with ε-caprolactone; dipropylene glycol mono (meth) acrylate, diethylene glycol mono (meth) acrylate, polypropylene (Meth) acrylate compounds having an oxyalkylene chain such as polyethylene glycol mono (meth) acrylate and polyethylene glycol mono (meth) acrylate; polyethylene glycol-polypropylene glycol mono (meth) acrylate, polyoxybutylene-polyoxypropylene mono (meth) (Meth) acrylate compounds having a block structure oxyalkylene chain such as acrylate; random structures such as poly (ethylene glycol-tetramethylene glycol) mono (meth) acrylate and poly (propylene glycol-tetramethylene glycol) mono (meth) acrylate And (meth) acrylate compounds having an oxyalkylene chain.
上記した脂肪族ポリイソシアネート化合物又は芳香族ポリイソシアネート化合物とヒドロキシ基含有アクリレート化合物との反応は、ウレタン化触媒の存在下、常法により行うことができる。ここで使用し得るウレタン化触媒は、具体的には、ピリジン、ピロール、トリエチルアミン、ジエチルアミン、ジブチルアミンなどのアミン類、トリフェニルホスフィン、トリエチルホスフィンなどのホフィン類、ジブチル錫ジラウレート、オクチル錫トリラウレート、オクチル錫ジアセテート、ジブチル錫ジアセテート、オクチル酸錫などの有機錫化合物、オクチル酸亜鉛などの有機金属化合物が挙げられる。 The reaction of the above-mentioned aliphatic polyisocyanate compound or aromatic polyisocyanate compound and the hydroxy group-containing acrylate compound can be carried out by a conventional method in the presence of a urethanization catalyst. Specific examples of urethanization catalysts that can be used here include amines such as pyridine, pyrrole, triethylamine, diethylamine, and dibutylamine, phosphines such as triphenylphosphine and triethylphosphine, dibutyltin dilaurate, octyltin trilaurate, and octyl. Examples thereof include organotin compounds such as tin diacetate, dibutyltin diacetate, and tin octylate, and organometallic compounds such as zinc octylate.
これらのウレタンアクリレート樹脂の中でも特に脂肪族ポリイソシアネート化合物とヒドロキシ基含有(メタ)アクリレート化合物とを反応させて得られるものが硬化塗膜の透明性に優れ、かつ、活性エネルギー線に対する感度が良好で硬化性に優れる点から好ましい。 Among these urethane acrylate resins, those obtained by reacting an aliphatic polyisocyanate compound with a hydroxy group-containing (meth) acrylate compound are excellent in transparency of the cured coating film and have good sensitivity to active energy rays. It is preferable from the viewpoint of excellent curability.
次に、不飽和ポリエステル樹脂は、α,β−不飽和二塩基酸又はその酸無水物、芳香族飽和二塩基酸又はその酸無水物、及び、グリコール類の重縮合によって得られる硬化性樹脂であり、α,β−不飽和二塩基酸又はその酸無水物としては、マレイン酸、無水マレイン酸、フマル酸、イタコン酸、シトラコン酸、クロルマレイン酸、及びこれらのエステル等が挙げられる。芳香族飽和二塩基酸又はその酸無水物としては、フタル酸、無水フタル酸、イソフタル酸、テレフタル酸、ニトロフタル酸、テトラヒドロ無水フタル酸、エンドメチレンテトラヒドロ無水フタル酸、ハロゲン化無水フタル酸及びこれらのエステル等が挙げられる。脂肪族あるいは脂環族飽和二塩基酸としては、シュウ酸、マロン酸、コハク酸、アジピン酸、セバシン酸、アゼライン酸、グルタル酸、ヘキサヒドロ無水フタル酸及びこれらのエステル等が挙げられる。グリコール類としては、エチレングリコール、プロピレングリコール、ジエチレングリコール、ジプロピレングリコール、1,3−ブタンジオール、1,4−ブタンジオール、2−メチルプロパン−1,3−ジオール、ネオペンチルグリコール、トリエチレングリコール、テトラエチレングリコール、1,5−ペンタンジオール、1,6−ヘキサンジオール、ビスフェノールA、水素化ビスフェノールA、エチレングリコールカーボネート、2,2−ジ−(4−ヒドロキシプロポキシジフェニル)プロパン等が挙げられ、その他にエチレンオキサイド、プロピレンオキサイド等の酸化物も同様に使用できる。 Next, the unsaturated polyester resin is a curable resin obtained by polycondensation of α, β-unsaturated dibasic acid or acid anhydride thereof, aromatic saturated dibasic acid or acid anhydride thereof, and glycols. The α, β-unsaturated dibasic acid or its acid anhydride includes maleic acid, maleic anhydride, fumaric acid, itaconic acid, citraconic acid, chloromaleic acid, and esters thereof. As aromatic saturated dibasic acid or acid anhydride thereof, phthalic acid, phthalic anhydride, isophthalic acid, terephthalic acid, nitrophthalic acid, tetrahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, halogenated phthalic anhydride and these Examples include esters. Examples of the aliphatic or alicyclic saturated dibasic acid include oxalic acid, malonic acid, succinic acid, adipic acid, sebacic acid, azelaic acid, glutaric acid, hexahydrophthalic anhydride, and esters thereof. As glycols, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, 1,3-butanediol, 1,4-butanediol, 2-methylpropane-1,3-diol, neopentyl glycol, triethylene glycol, Examples include tetraethylene glycol, 1,5-pentanediol, 1,6-hexanediol, bisphenol A, hydrogenated bisphenol A, ethylene glycol carbonate, 2,2-di- (4-hydroxypropoxydiphenyl) propane, and others. In addition, oxides such as ethylene oxide and propylene oxide can be used in the same manner.
次に、エポキシビニルエステル樹脂としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂等のエポキシ樹脂のエポキシ基に(メタ)アクリル酸を反応させて得られるものが挙げられる。 Next, as an epoxy vinyl ester resin, (meth) acrylic acid is reacted with an epoxy group of an epoxy resin such as a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a phenol novolac type epoxy resin, or a cresol novolak type epoxy resin. What is obtained is mentioned.
また、マレイミド基含有樹脂としては、N−ヒドロキシエチルマレイミドとイソホロンジイソシアネートとをウレタン化して得られる2官能マレイミドウレタン化合物、マレイミド酢酸とポリテトラメチレングリコールとをエステル化して得られる2官能マレイミドエステル化合物、マレイミドカプロン酸とペンタエリスリトールのテトラエチレンオキサイド付加物とをエステル化して得られる4官能マレイミドエステル化合物、マレイミド酢酸と多価アルコール化合物とをエステル化して得られる多官能マレイミドエステル化合物等が挙げられる。これらの活性エネルギー線硬化型樹脂は、単独で用いることも2種以上併用することもできる。 As the maleimide group-containing resin, a bifunctional maleimide urethane compound obtained by urethanizing N-hydroxyethylmaleimide and isophorone diisocyanate, a bifunctional maleimide ester compound obtained by esterifying maleimide acetic acid and polytetramethylene glycol, Examples thereof include a tetrafunctional maleimide ester compound obtained by esterification of maleimidocaproic acid and a tetraethylene oxide adduct of pentaerythritol, a polyfunctional maleimide ester compound obtained by esterification of maleimide acetic acid and a polyhydric alcohol compound, and the like. These active energy ray-curable resins can be used alone or in combination of two or more.
前記活性エネルギー線硬化性単量体としては、例えば、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、数平均分子量が150〜1000の範囲にあるポリエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、ジプロピレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、数平均分子量が150〜1000の範囲にあるポリプロピレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、1,3−ブタンジオールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート、1,6−ヘキサンジオールジ(メタ)アクリレート、ヒドロキシピバリン酸エステルネオペンチルグリコールジ(メタ)アクリレート、ビスフェノールAジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスルトールトリ(メタ)アクリレート、ジペンタエリスルトールヘキサ(メタ)アクリレート、ペンタエリスルトールテトラ(メタ)アクリレート、トリメチロールプロパンジ(メタ)アクリレート、ジペンタエリスルトールペンタ(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、メチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、t−ブチル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、オクチル(メタ)アクリレート、デシル(メタ)アクリレート、イソデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、イソステアリル(メタ)アクリレート等の脂肪族アルキル(メタ)アクリレート、グリセロール(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレート、3−クロロ−2−ヒドロキシプロピル(メタ)アクリレート、グリシジル(メタ)アクリレート、アリル(メタ)アクリレート、2−ブトキシエチル(メタ)アクリレート、2−(ジエチルアミノ)エチル(メタ)アクリレート、2−(ジメチルアミノ)エチル(メタ)アクリレート、γ−(メタ)アクリロキシプロピルトリメトキシシラン、2−メトキシエチル(メタ)アクリレート、メトキシジエチレングリコール(メタ)アクリレート、メトキシジプロピレングリコール(メタ)アクリレート、ノニルフェノキシポリエチレングリコール(メタ)アクリレート、ノニルフェノキシポリプロピレングリコール(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、フェノキシジプロピレングルリコール(メタ)アクリレート、フェノキシポリプロピレングリコール(メタ)アクリレート、ポリブタジエン(メタ)アクリレート、ポリエチレングリコール−ポリプロピレングリコール(メタ)アクリレート、ポリエチレングリコール−ポリブチレングリコール(メタ)アクリレート、ポリスチリルエチル(メタ)アクリレート、ベンジル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、イソボルニル(メタ)アクリレート、メトキシ化シクロデカトリエン(メタ)アクリレート、フェニル(メタ)アクリレート;マレイミド、N−メチルマレイミド、N−エチルマレイミド、N−プロピルマレイミド、N−ブチルマレイミド、N−ヘキシルマレイミド、N−オクチルマレイミド、N−ドデシルマレイミド、N−ステアリルマレイミド、N−フェニルマレイミド、N−シクロヘキシルマレイミド、2−マレイミドエチル−エチルカーボネート、2−マレイミドエチル−プロピルカーボネート、N−エチル−(2−マレイミドエチル)カーバメート、N,N−ヘキサメチレンビスマレイミド、ポリプロピレングリコール−ビス(3−マレイミドプロピル)エーテル、ビス(2−マレイミドエチル)カーボネート、1,4−ジマレイミドシクロヘキサン等のマレイミド類などが挙げられる。 Examples of the active energy ray-curable monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, and polyethylene having a number average molecular weight in the range of 150 to 1,000. Glycol di (meth) acrylate, propylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, polypropylene glycol di (meth) having a number average molecular weight in the range of 150 to 1000 Acrylate, neopentyl glycol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) ) Acrylate, hydroxypivalate ester neopentyl glycol di (meth) acrylate, bisphenol A di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa ( (Meth) acrylate, pentaerythritol tetra (meth) acrylate, trimethylolpropane di (meth) acrylate, dipentaerythritol penta (meth) acrylate, dicyclopentenyl (meth) acrylate, methyl (meth) acrylate, propyl ( (Meth) acrylate, butyl (meth) acrylate, t-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, octyl (meth) acrylate, decyl (meth) acrylate Rate, isodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, aliphatic alkyl (meth) acrylate such as isostearyl (meth) acrylate, glycerol (meth) acrylate, 2-hydroxyethyl (meth) acrylate , 3-chloro-2-hydroxypropyl (meth) acrylate, glycidyl (meth) acrylate, allyl (meth) acrylate, 2-butoxyethyl (meth) acrylate, 2- (diethylamino) ethyl (meth) acrylate, 2- (dimethyl Amino) ethyl (meth) acrylate, γ- (meth) acryloxypropyltrimethoxysilane, 2-methoxyethyl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, methoxydipropy Glycol (meth) acrylate, nonylphenoxypolyethylene glycol (meth) acrylate, nonylphenoxypolypropylene glycol (meth) acrylate, phenoxyethyl (meth) acrylate, phenoxydipropylene glycolicol (meth) acrylate, phenoxypolypropylene glycol (meth) acrylate, Polybutadiene (meth) acrylate, polyethylene glycol-polypropylene glycol (meth) acrylate, polyethylene glycol-polybutylene glycol (meth) acrylate, polystyrylethyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, dicyclopenta Nyl (meth) acrylate, dicyclopentenyl (meth) acrylate Isobornyl (meth) acrylate, methoxylated cyclodecatriene (meth) acrylate, phenyl (meth) acrylate; maleimide, N-methylmaleimide, N-ethylmaleimide, N-propylmaleimide, N-butylmaleimide, N-hexylmaleimide, N -Octylmaleimide, N-dodecylmaleimide, N-stearylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, 2-maleimidoethyl-ethyl carbonate, 2-maleimidoethyl-propyl carbonate, N-ethyl- (2-maleimidoethyl) Carbamate, N, N-hexamethylene bismaleimide, polypropylene glycol-bis (3-maleimidopropyl) ether, bis (2-maleimidoethyl) carbonate, 1,4-dimale And maleimides such as midcyclohexane.
これらのなかでも特に硬化塗膜の硬度に優れる点からトリメチロールプロパントリ(メタ)アクリレート、ペンタエリスルトールトリ(メタ)アクリレート、ジペンタエリスルトールヘキサ(メタ)アクリレート、ペンタエリスルトールテトラ(メタ)アクリレート等の3官能以上の多官能(メタ)アクリレートが好ましい。これらの活性エネルギー線硬化性単量体は、単独で用いることも2種以上併用することもできる。 Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, pentaerythritol tetra ( A trifunctional or higher polyfunctional (meth) acrylate such as (meth) acrylate is preferred. These active energy ray-curable monomers can be used alone or in combination of two or more.
前記活性エネルギー線硬化型のコーティング組成物は、基材に塗布後、活性エネルギー線を照射することで硬化塗膜とすることができる。この活性エネルギー線とは、紫外線、電子線、α線、β線、γ線のような電離放射線をいう。活性エネルギー線として紫外線を照射して硬化塗膜とする場合には、該含フッ素硬化性樹脂又は活性エネルギー線硬化型のコーティング組成物中に光重合開始剤を添加し、硬化性を向上することが好ましい。また、必要であればさらに光増感剤を添加して、硬化性を向上することもできる。一方、電子線、α線、β線、γ線のような電離放射線を用いる場合には、光重合開始剤や光増感剤を用いなくても速やかに硬化するので、特に光重合開始剤や光増感剤を添加する必要はない。 The said active energy ray hardening-type coating composition can be made into a cured coating film by irradiating an active energy ray after apply | coating to a base material. The active energy rays refer to ionizing radiation such as ultraviolet rays, electron beams, α rays, β rays, and γ rays. When a cured coating film is formed by irradiating ultraviolet rays as active energy rays, a photopolymerization initiator is added to the fluorine-containing curable resin or active energy ray curable coating composition to improve curability. Is preferred. Further, if necessary, a photosensitizer can be further added to improve curability. On the other hand, when ionizing radiation such as electron beam, α ray, β ray, and γ ray is used, it cures quickly without using a photopolymerization initiator or photosensitizer. There is no need to add a photosensitizer.
前記光重合開始剤としては、分子内開裂型光重合開始剤及び水素引き抜き型光重合開始剤が挙げられる。分子内開裂型光重合開始剤としては、例えば、ジエトキシアセトフェノン、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン、ベンジルジメチルケタール、1−(4−イソプロピルフェニル)−2−ヒドロキシ−2−メチルプロパン−1−オン、4−(2−ヒドロキシエトキシ)フェニル−(2−ヒドロキシ−2−プロピル)ケトン、1−ヒドロキシシクロヘキシル−フェニルケトン、2−メチル−2−モルホリノ(4−チオメチルフェニル)プロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−ブタノン等のアセトフェノン系化合物;ベンゾイン、ベンゾインメチルエーテル、ベンゾインイソプロピルエーテル等のベンゾイン類;2,4,6−トリメチルベンゾインジフェニルホスフィンオキシド、ビス(2,4,6−トリメチルベンゾイル)−フェニルホスフィンオキシド等のアシルホスフィンオキシド系化合物;ベンジル、メチルフェニルグリオキシエステル等が挙げられる。 Examples of the photopolymerization initiator include intramolecular cleavage type photopolymerization initiators and hydrogen abstraction type photopolymerization initiators. Examples of the intramolecular cleavage type photopolymerization initiator include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 1- (4-isopropylphenyl) -2-hydroxy. 2-methylpropan-1-one, 4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl-phenylketone, 2-methyl-2-morpholino (4-thio) Acetophenone-based compounds such as methylphenyl) propan-1-one and 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone; benzoins such as benzoin, benzoin methyl ether and benzoin isopropyl ether; 4,6-trimethylbenzoindiphenylphos In'okishido, bis (2,4,6-trimethylbenzoyl) - acyl phosphine oxide-based compounds such as triphenylphosphine oxide; benzyl, and methyl phenylglyoxylate ester.
一方、水素引き抜き型光重合開始剤としては、例えば、ベンゾフェノン、o−ベンゾイル安息香酸メチル−4−フェニルベンゾフェノン、4,4’−ジクロロベンゾフェノン、ヒドロキシベンゾフェノン、4−ベンゾイル−4’−メチル−ジフェニルサルファイド、アクリル化ベンゾフェノン、3,3’,4,4’−テトラ(t−ブチルペルオキシカルボニル)ベンゾフェノン、3,3’−ジメチル−4−メトキシベンゾフェノン等のベンゾフェノン系化合物;2−イソプロピルチオキサントン、2,4−ジメチルチオキサントン、2,4−ジエチルチオキサントン、2,4−ジクロロチオキサントン等のチオキサントン系化合物;ミヒラ−ケトン、4,4’−ジエチルアミノベンゾフェノン等のアミノベンゾフェノン系化合物;10−ブチル−2−クロロアクリドン、2−エチルアンスラキノン、9,10−フェナンスレンキノン、カンファーキノン等が挙げられる。 On the other hand, examples of the hydrogen abstraction type photopolymerization initiator include benzophenone, methyl 4-phenylbenzophenone, o-benzoylbenzoate, 4,4′-dichlorobenzophenone, hydroxybenzophenone, 4-benzoyl-4′-methyl-diphenyl sulfide. Benzophenone compounds such as acrylated benzophenone, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, 3,3′-dimethyl-4-methoxybenzophenone; 2-isopropylthioxanthone, 2,4 A thioxanthone compound such as dimethylthioxanthone, 2,4-diethylthioxanthone, and 2,4-dichlorothioxanthone; an aminobenzophenone compound such as Michler's ketone and 4,4′-diethylaminobenzophenone; 2-chloro acridone, 2-ethyl anthraquinone, 9,10-phenanthrenequinone, camphorquinone, and the like.
上記の光重合開始剤の中でも、活性エネルギー線硬化型のコーティング組成物中の前記活性エネルギー線硬化性樹脂及び活性エネルギー線硬化性単量体との相溶性に優れる点から、1−ヒドロキシシクロヘキシルフェニルケトン、及びベンゾフェノンが好ましく、特に、1−ヒドロキシシクロヘキシルフェニルケトンが好ましい。これらの光重合開始剤は、単独で用いることも、2種以上を併用することもできる。 Among the above photopolymerization initiators, 1-hydroxycyclohexylphenyl is preferable because it has excellent compatibility with the active energy ray-curable resin and the active energy ray-curable monomer in the active energy ray-curable coating composition. Ketones and benzophenones are preferred, and 1-hydroxycyclohexyl phenyl ketone is particularly preferred. These photopolymerization initiators can be used alone or in combination of two or more.
また、前記光増感剤としては、例えば、脂肪族アミン、芳香族アミン等のアミン類、o−トリルチオ尿素等の尿素類、ナトリウムジエチルジチオホスフェート、s−ベンジルイソチウロニウム−p−トルエンスルホネート等の硫黄化合物などが挙げられる。 Examples of the photosensitizer include amines such as aliphatic amines and aromatic amines, ureas such as o-tolylthiourea, sodium diethyldithiophosphate, s-benzylisothiuronium-p-toluenesulfonate, and the like. And sulfur compounds.
これらの光重合開始剤及び光増感剤の使用量は、活性エネルギー線硬化型のコーティング組成物中の不揮発成分100質量部に対し、各々0.01〜20質量部が好ましく、0.1〜15質量%がより好ましく、0.3〜7質量部がさらに好ましい。 The amount of these photopolymerization initiator and photosensitizer used is preferably 0.01 to 20 parts by mass with respect to 100 parts by mass of the non-volatile component in the active energy ray-curable coating composition, 15 mass% is more preferable, and 0.3-7 mass parts is further more preferable.
また、本発明のコーティング組成物中には必要に応じて、有機溶剤;顔料、染料、カーボン等の着色剤;シリカ、酸化チタン、酸化亜鉛、酸化アルミニウム、酸化ジルコニウム、酸化カルシウム、炭酸カルシウム等の無機粉末;高級脂肪酸、アクリル樹脂、フェノール樹脂、ポリエステル樹脂、ポリスチレン樹脂、ウレタン樹脂、尿素樹脂、メラミン樹脂、アルキド樹脂、エポキシ樹脂、ポリアミド樹脂、ポリカーボネート樹脂、石油樹脂、フッ素樹脂(PTFE(ポリテトラフルオロエチレン)等)、ポリエチレン、ポリプロピレン等の各種樹脂微粉末;帯電防止剤、消泡剤、粘度調整剤、耐光安定剤、耐候安定剤、耐熱安定剤、酸化防止剤、防錆剤、スリップ剤、シリコーン系、フッ素系、その他のレベリング剤、ワックス、艶調整剤、離型剤、相溶化剤、導電調整剤、分散剤、分散安定剤、増粘剤、沈降防止剤、シリコーン系又は炭化水素系界面活性剤等の各種添加剤を適宜添加することが可能である。 Further, in the coating composition of the present invention, an organic solvent; a colorant such as a pigment, a dye, or carbon; if necessary, silica, titanium oxide, zinc oxide, aluminum oxide, zirconium oxide, calcium oxide, calcium carbonate, or the like. Inorganic powder: Higher fatty acid, acrylic resin, phenol resin, polyester resin, polystyrene resin, urethane resin, urea resin, melamine resin, alkyd resin, epoxy resin, polyamide resin, polycarbonate resin, petroleum resin, fluororesin (PTFE (polytetrafluoro) Ethylene) etc.), various resin fine powders such as polyethylene and polypropylene; antistatic agent, antifoaming agent, viscosity modifier, light stabilizer, weather stabilizer, heat stabilizer, antioxidant, rust inhibitor, slip agent, Silicone type, fluorine type, other leveling agents, wax, gloss adjusting agent, Type agents, compatibilizers, conductive modifiers, dispersants, dispersion stabilizers, thickeners, anti-settling agents can be appropriately added various additives such as a silicone-based or hydrocarbon-based surfactants.
前記有機溶剤は、本発明のコーティング組成物の粘度を適宜調製する上で有用であり、特に薄膜コーティングを行うためには、膜厚を調整することが容易となる。ここで使用できる有機溶媒としては、例えば、トルエン、キシレン等の芳香族炭化水素;メタノール、エタノール、イソプロパノール、t−ブタノール等のアルコール類;酢酸エチル、プロピレングリコールモノメチルエーテルアセテート等のエステル類;メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類などが挙げられる。これらの溶剤は、単独で用いることも、2種以上を併用することもできる。 The organic solvent is useful in appropriately adjusting the viscosity of the coating composition of the present invention. In particular, in order to perform thin film coating, it is easy to adjust the film thickness. Examples of the organic solvent that can be used here include aromatic hydrocarbons such as toluene and xylene; alcohols such as methanol, ethanol, isopropanol, and t-butanol; esters such as ethyl acetate and propylene glycol monomethyl ether acetate; Examples thereof include ketones such as methyl isobutyl ketone and cyclohexanone. These solvents can be used alone or in combination of two or more.
また、本発明のコーティング組成物の塗工方法は用途により異なるが、例えば、グラビアコーター、ロールコーター、コンマコーター、ナイフコーター、エアナイフコーター、カーテンコーター、キスコーター、シャワーコーター、ホイーラーコーター、スピンコーター、ディッピング、スクリーン印刷、スプレー、アプリケーター、バーコーター、静電塗装等を用いた塗布方法、あるいは各種金型を用いた成形方法等が挙げられる。 Further, the coating method of the coating composition of the present invention varies depending on the application, for example, gravure coater, roll coater, comma coater, knife coater, air knife coater, curtain coater, kiss coater, shower coater, wheeler coater, spin coater, dipping , Screen printing, spraying, applicator, bar coater, coating method using electrostatic coating, or molding methods using various molds.
本発明のコーティング組成物を用いて防汚性(撥インク性、耐指紋性等)を付与できる物品としては、TACフィルム等の液晶ディスプレイ(LCD)の偏光板用フィルム;プラズマディスプレイ(PDP)、有機ELディスプレイ等の各種ディスプレイ画面;タッチパネル;携帯電話筐体又は携帯電話の画面;CD、DVD、ブルーレイディスク等の光学記録媒体;インサートモールド(IMD、IMF)用転写フィルム;コピー機、プリンター等のOA機器用ゴムローラー;コピー機、スキャナー等のOA機器の読み取り部のガラス面;カメラ、ビデオカメラ、メガネ等の光学レンズ;腕時計等の時計の風防、ガラス面;自動車、鉄道車輌等の各種車輌のウインドウ;化粧板等の各種建材;住宅の窓ガラス;家具等の木工材料、人工・合成皮革、家電の筐体等の各種プラスチック成形品、FRP浴槽などが挙げられる。これらの物品表面に本発明のコーティング組成物を塗布して塗膜を形成することで、物品表面に帯電防止性を付与することができる。また、本発明の帯電防止剤を各物品に適した各種塗料に添加し、塗布・乾燥することで、物品表面に帯電防止性を付与することも可能である。 Examples of articles that can be imparted with antifouling properties (ink repellency, fingerprint resistance, etc.) using the coating composition of the present invention include TAC film and other liquid crystal display (LCD) polarizing film; plasma display (PDP), Various display screens such as organic EL displays; touch panels; mobile phone cases or mobile phone screens; optical recording media such as CDs, DVDs, and Blu-ray discs; transfer films for insert molds (IMD, IMF); copiers, printers, etc. Rubber rollers for OA equipment; Glass surfaces of reading parts of OA equipment such as copiers and scanners; Optical lenses such as cameras, video cameras, and glasses; Windshields and glass surfaces of watches such as watches; Various vehicles such as automobiles and railway vehicles Windows; various building materials such as decorative panels; window glass for houses; woodwork materials such as furniture; Leather, home appliances of the housing or the like of various plastic molded products, such as FRP bathtubs and the like. By applying the coating composition of the present invention to these article surfaces to form a coating film, antistatic properties can be imparted to the article surfaces. Further, the antistatic property of the present invention can be imparted to the surface of the article by adding the antistatic agent to various paints suitable for each article, and applying and drying.
また、本発明の帯電防止剤の必須成分は、フッ素化アルキル基等のフッ素化された有機基を有するため、レベリング効果も有しており、各種塗材の塗膜に優れた帯電防止性を付与するとともにレベリング性も付与することができる。本発明の帯電防止剤を適用できる塗材としては、TACフィルム等のLCDの偏光板用フィルムのハードコート材、アンチグレア(AG:防眩)コート材又は反射防止(LR)コート材;プラズマディスプレイ(PDP)、有機ELディスプレイ等の各種ディスプレイ画面用ハードコート材;タッチパネル用ハードコート材;液晶ディスプレイ用カラーフィルター(以下、「CF」という。)に使用されるRGBの各画素を形成するためのカラーレジスト、印刷インク、インクジェットインク又は塗料;CFのブラックマトリックス用のブラックレジスト、印刷インク、インクジェットインク又は塗料;プラズマディスプレイ(PDP)、有機ELディスプレイ等の画素隔壁用樹脂組成物;携帯電話筐体用塗料又はハードコート材;携帯電話の画面用ハードコート材;CD、DVD、ブルーレイディスク等の光学記録媒体用ハードコート材;インサートモールド(IMD、IMF)用転写フィルム用ハードコート材;コピー機、プリンター等のOA機器用ゴムローラー用コート材;コピー機、スキャナー等のOA機器の読み取り部のガラス用コート材;カメラ、ビデオカメラ、メガネ等の光学レンズ用コート材;腕時計等の時計の風防、ガラス用コート材;自動車、鉄道車輌等の各種車輌のウインドウ用コート材;化粧板等の各種建材用印刷インキ又は塗料;住宅の窓ガラス用コート材;家具等の木工用塗料;人工・合成皮革用コート材;家電の筐体等の各種プラスチック成形品用塗料又はコート材;FRP浴槽用塗料又はコート材などが挙げられる。 In addition, since the essential component of the antistatic agent of the present invention has a fluorinated organic group such as a fluorinated alkyl group, it also has a leveling effect, and has excellent antistatic properties for coating films of various coating materials. In addition to imparting, leveling properties can also be imparted. Examples of the coating material to which the antistatic agent of the present invention can be applied include a hard coating material for an LCD polarizing plate such as a TAC film, an anti-glare (AG) coating material or an anti-reflection (LR) coating material; a plasma display ( PDP), hard coating materials for various display screens such as organic EL displays; hard coating materials for touch panels; colors for forming RGB pixels used in color filters for liquid crystal displays (hereinafter referred to as “CF”) Resist, printing ink, inkjet ink or paint; black resist for CF black matrix, printing ink, inkjet ink or paint; resin composition for pixel partition such as plasma display (PDP), organic EL display; Paint or hard coat material; mobile phone Hard coating materials for screens; Hard coating materials for optical recording media such as CDs, DVDs, Blu-ray discs; Hard coating materials for transfer films for insert molds (IMD, IMF); Coated for rubber rollers for OA equipment such as copiers and printers Materials: Glass coating materials for reading parts of OA equipment such as copiers, scanners, etc .; Coating materials for optical lenses such as cameras, video cameras and glasses; Windshields for watches such as watches; Glass coating materials; Automobiles, railway vehicles, etc. Coating materials for windows of various vehicles; printing inks or paints for various building materials such as decorative panels; coating materials for window glass of houses; wood coating materials for furniture, etc .; coating materials for artificial and synthetic leather; Various plastic molded article paints or coating materials; FRP bathtub paints or coating materials, and the like.
特に、液晶ディスプレイ(LCD)用偏光板の保護フィルム用コート材用途のうち、アンチグレアコート材として本発明のコーティング組成物を用いる場合、上記した各組成のうち、シリカ微粒子、アクリル樹脂微粒子、ポリスチレン樹脂微粒子等の無機又は有機微粒子を、本発明の活性エネルギー線硬化型塗料組成物中の硬化成分の全質量の0.1〜0.5倍量となる割合で配合することで防眩性に優れたものとなるため好ましい。 In particular, when the coating composition of the present invention is used as an anti-glare coating material among coating materials for protective films of polarizing plates for liquid crystal displays (LCD), among the above-mentioned compositions, silica fine particles, acrylic resin fine particles, polystyrene resin Excellent anti-glare properties by blending inorganic or organic fine particles such as fine particles at a ratio of 0.1 to 0.5 times the total mass of the curing component in the active energy ray-curable coating composition of the present invention. This is preferable.
また、本発明のコーティング組成物を、液晶ディスプレイ(LCD)用偏光板の保護フィルム用アンチグレアコート材に用いる場合、コート材を硬化させる前に凹凸の表面形状の金型に接触させた後、金型と反対側から活性エネルギー線を照射して硬化し、コート層の表面をエンボス加工して防眩性を付与する転写法にも適用できる。 When the coating composition of the present invention is used as an antiglare coating material for a protective film of a polarizing plate for a liquid crystal display (LCD), after the coating material is brought into contact with a mold having an uneven surface shape before curing, It can also be applied to a transfer method in which an active energy ray is irradiated from the opposite side of the mold and cured, and the surface of the coat layer is embossed to impart antiglare properties.
以下に本発明を具体的な実施例を挙げてより詳細に説明する。なお、下記の合成例又は実施例で製造した化合物の赤外線吸収スペクトル及びNMRスペクトルの測定方法は下記の通りである。 Hereinafter, the present invention will be described in more detail with reference to specific examples. In addition, the measuring method of the infrared absorption spectrum and NMR spectrum of the compound manufactured by the following synthesis example or Example is as follows.
[赤外線吸収スペクトル測定方法]
株式会社島津製作所製「IRPrestige−21」の測定装置を用いて、試料溶液をKBr板に極少量滴下して溶剤を乾燥後、測定を行った。
[Infrared absorption spectrum measurement method]
Using a measuring device of “IR Prestige-21” manufactured by Shimadzu Corporation, a very small amount of the sample solution was dropped on a KBr plate and the solvent was dried, and then the measurement was performed.
[1H−NMR及び13C−NMRスペクトル測定方法]
日本電子株式会社製「AL−400」を用いて、試料のアセトン−d6溶液を分析して構造解析を行った。
[Method for measuring 1 H-NMR and 13 C-NMR spectrum]
Using “AL-400” manufactured by JEOL Ltd., the acetone-d 6 solution of the sample was analyzed for structural analysis.
(合成例1)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に2−(パーフルオロヘキシル)エタノール350質量部、エピクロルヒドリン534質量部及びベンジルトリエチルアンモニウムクロライドの50質量%水溶液176質量部を仕込み、攪拌させた。次いで、空気気流下にて攪拌を開始し、フラスコ内温度を40℃に昇温させ、水酸化ナトリウムの49質量%水溶液23.6質量部を2時間かけて滴下した。滴下終了後、60℃まで昇温し、1時間攪拌させた。その後、水酸化ナトリウムの49質量%水溶液94質量部を4時間かけて滴下し、滴下後5時間反応させた。反応終了後、生成した塩をろ別してろ液を静置させ、上層に分離した水層を除去した。残った反応溶液に500質量部の水を加えて水洗を行い、この水洗を合計3回行った。水洗後、120℃にセットしたオイルバスとロータリーエバポレーターを用いてアスピレーターで濃縮しながらエピクロルヒドリンを留去した。次いで、温度120〜130℃、圧力1.3kPaの条件下で留出する成分を取り出すことにより、エポキシ基を有する化合物(3−1)を得た。得られた化合物(3−1)について、赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルを測定することにより、下記式(3−1)で表される化合物であることを同定した。なお、この化合物(3−1)の赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルのチャート図は図1〜3に示す。
(Synthesis Example 1)
In a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device, 350 parts by mass of 2- (perfluorohexyl) ethanol, 534 parts by mass of epichlorohydrin and 176 parts by mass of a 50% by mass aqueous solution of benzyltriethylammonium chloride were charged. Stir. Next, stirring was started under an air stream, the temperature in the flask was raised to 40 ° C., and 23.6 parts by mass of a 49% by mass aqueous solution of sodium hydroxide was added dropwise over 2 hours. After completion of dropping, the temperature was raised to 60 ° C. and stirred for 1 hour. Thereafter, 94 parts by mass of a 49% by mass aqueous solution of sodium hydroxide was added dropwise over 4 hours, followed by reaction for 5 hours. After completion of the reaction, the produced salt was filtered off, the filtrate was allowed to stand, and the aqueous layer separated into the upper layer was removed. To the remaining reaction solution, 500 parts by mass of water was added to perform water washing, and this water washing was performed three times in total. After washing with water, epichlorohydrin was distilled off while concentrating with an aspirator using an oil bath set at 120 ° C. and a rotary evaporator. Subsequently, the compound (3-1) which has an epoxy group was obtained by taking out the component distilled off on conditions with a temperature of 120-130 degreeC, and a pressure of 1.3 kPa. About the obtained compound (3-1), the infrared absorption spectrum, < 1 > H-NMR, and < 13 > C-NMR spectrum were measured, and it identified that it was a compound represented by following formula (3-1). In addition, the charts of the infrared absorption spectrum, 1 H-NMR and 13 C-NMR spectrum of this compound (3-1) are shown in FIGS.
(合成例2)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に2−(パーフルオロブチル)エタノール344質量部、エピクロルヒドリン710質量部及びベンジルトリエチルアンモニウムクロライドの50質量%水溶液105質量部を仕込み、攪拌させた。次いで、空気気流下にて攪拌を開始し、フラスコ内温度を40℃に昇温させ、水酸化ナトリウムの49質量%水溶液69.2質量部を2時間かけて滴下させた。滴下終了後、60℃まで昇温し、1時間攪拌させた。その後、水酸化ナトリウムの49質量%水溶液65質量部を4時間かけて滴下し、滴下後5時間反応させた。反応終了後、生成した塩をろ別してろ液を静置し、上部に分離した水層を除去した。残った反応溶液に500質量部の水を加えて水洗を行い、この水洗を合計3回行った。水洗後、108℃のオイルバスとロータリーエバポレーターを用いて濃縮しながらエピクロルヒドリンを留去した。次いで、温度118〜135℃、アスピレーターを用いて留出する成分を取り出すことにより、下記式(3−2)で表されるエポキシ基を有する化合物(3−2)を得た。合成例1同様にして、下記式(3−2)で表される化合物であることを同定した。
(Synthesis Example 2)
In a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device, 344 parts by mass of 2- (perfluorobutyl) ethanol, 710 parts by mass of epichlorohydrin and 105 parts by mass of a 50% by mass aqueous solution of benzyltriethylammonium chloride were charged. Stir. Next, stirring was started under an air stream, the temperature in the flask was raised to 40 ° C., and 69.2 parts by mass of a 49% by mass aqueous solution of sodium hydroxide was added dropwise over 2 hours. After completion of dropping, the temperature was raised to 60 ° C. and stirred for 1 hour. Thereafter, 65 parts by mass of a 49% by mass aqueous solution of sodium hydroxide was added dropwise over 4 hours, followed by reaction for 5 hours. After completion of the reaction, the produced salt was filtered off, the filtrate was allowed to stand, and the aqueous layer separated at the top was removed. To the remaining reaction solution, 500 parts by mass of water was added to perform water washing, and this water washing was performed three times in total. After washing with water, epichlorohydrin was distilled off while concentration using an oil bath at 108 ° C. and a rotary evaporator. Subsequently, the compound (3-2) which has an epoxy group represented by the following formula (3-2) was obtained by taking out the component distilled out using aspirator at the temperature of 118-135 degreeC. In the same manner as in Synthesis Example 1, the compound represented by the following formula (3-2) was identified.
(実施例1)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内にイミダゾール6質量部及びトルエン65質量部を入れ、攪拌しながら、フラスコ内温度85℃でイミダゾールをトルエンに溶解させた。次いで、合成例1で得られた化合物(3−1)37質量部を1時間かけて滴下した。さらに2時間攪拌した後、フラスコ内温度106℃で3時間反応させた。反応後、トルエンを減圧留去して、3級アミンを複素環内に有する含窒素複素環化合物(4−1)の粘稠液体を得た。前記化合物(4−1)について、赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルを測定することにより、下記式(4−1)で表される化合物であることを同定した。なお、この化合物(4−1)の赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルのチャート図は図4〜6に示す。
Example 1
6 parts by mass of imidazole and 65 parts by mass of toluene were placed in a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device, and imidazole was dissolved in toluene at 85 ° C. in the flask while stirring. Subsequently, 37 mass parts of compounds (3-1) obtained by the synthesis example 1 were dripped over 1 hour. After further stirring for 2 hours, the reaction was carried out at a temperature in the flask of 106 ° C. for 3 hours. After the reaction, toluene was distilled off under reduced pressure to obtain a viscous liquid of a nitrogen-containing heterocyclic compound (4-1) having a tertiary amine in the heterocyclic ring. The compound (4-1) was identified as a compound represented by the following formula (4-1) by measuring an infrared absorption spectrum, 1 H-NMR and 13 C-NMR spectrum. In addition, the charts of the infrared absorption spectrum, 1 H-NMR, and 13 C-NMR spectrum of this compound (4-1) are shown in FIGS.
次に、前記化合物(4−1)20質量部にメチルエチルケトン40質量部を加え溶解させた後、40℃にてp−トルエンスルホン酸メチル7.6質量部を15分かけて滴下し、滴下終了後60℃で3時間反応させた。反応終了後、反応溶液をろ過した後、メチルエチルケトンを加えて、下記式(1−1)で表される化合物(4−1)の4級アンモニウム塩の30質量%メチルエチルケトン溶液を得た。 Next, 40 parts by mass of methyl ethyl ketone was added to 20 parts by mass of the compound (4-1) and dissolved, and then 7.6 parts by mass of methyl p-toluenesulfonate was added dropwise at 40 ° C. over 15 minutes. Thereafter, the reaction was carried out at 60 ° C. for 3 hours. After completion of the reaction, the reaction solution was filtered, and then methyl ethyl ketone was added to obtain a 30% by mass methyl ethyl ketone solution of a quaternary ammonium salt of the compound (4-1) represented by the following formula (1-1).
(実施例2)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に2−エチル−4−メチルイミダゾール10質量部及びメチルイソブチルケトン72質量部を入れ、攪拌しながら、フラスコ内温度90℃で2−エチル−4−メチルイミダゾールをメチルイソブチルケトンに溶解させた。次いで、合成例1で得られた化合物(3−1)38質量部を1時間かけて滴下した。さらに2時間攪拌させた後、フラスコ内温度110℃で3時間反応させ、3級アミンを複素環内に有する含窒素複素環化合物(4−2)の30質量%メチルイソブチルケトン溶液になるように調製した。前記化合物(4−2)について、赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルを測定することにより、下記式(4−2)で表される化合物であることを同定した。
(Example 2)
10 parts by mass of 2-ethyl-4-methylimidazole and 72 parts by mass of methyl isobutyl ketone were placed in a glass flask equipped with a stirrer, thermometer, condenser, and dropping device. -Ethyl-4-methylimidazole was dissolved in methyl isobutyl ketone. Subsequently, 38 mass parts of compounds (3-1) obtained by the synthesis example 1 were dripped over 1 hour. The mixture was further stirred for 2 hours, and reacted at a flask internal temperature of 110 ° C. for 3 hours so that a 30% by mass methyl isobutyl ketone solution of a nitrogen-containing heterocyclic compound (4-2) having a tertiary amine in the heterocyclic ring was obtained. Prepared. The compound (4-2) was identified as a compound represented by the following formula (4-2) by measuring an infrared absorption spectrum, 1 H-NMR and 13 C-NMR spectrum.
次に、撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に前記3級アミンを複素環内に有する含窒素複素環化合物(4−2)の30質量%メチルイソブチルケトン溶液60質量部を40℃に加熱して、p−トルエンスルホン酸メチル6.3質量部を10分かけて滴下し、滴下終了後60℃で3時間反応させた。反応終了後、反応溶液をろ過した後、メチルイソブチルケトンを加えて、下記式(1−2)で表される化合物(4−2)の4級アンモニウム塩の30質量%メチルイソブチルケトン溶液を得た。 Next, a 30 mass% methyl isobutyl ketone solution 60 of a nitrogen-containing heterocyclic compound (4-2) having the tertiary amine in the heterocyclic ring in a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device. The mass part was heated to 40 ° C., and 6.3 parts by mass of methyl p-toluenesulfonate was added dropwise over 10 minutes, followed by reaction at 60 ° C. for 3 hours. After completion of the reaction, the reaction solution is filtered, and then methyl isobutyl ketone is added to obtain a 30% by mass methyl isobutyl ketone solution of a quaternary ammonium salt of the compound (4-2) represented by the following formula (1-2). It was.
(実施例3)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコに、2−フェニルイミダゾール6質量部及びメチルイソブチルケトン72質量部を入れ、攪拌しながら、フラスコ内温度95℃で2−フェニルイミダゾールをメチルイソブチルケトンに溶解させた。次いで、合成例1で得られた化合物(3−1)17.2質量部を1時間かけて滴下した。さらに2時間攪拌させた後、フラスコ内温度110℃で3時間反応させ、3級アミンを複素環内に有する含窒素複素環化合物(4−3)の30質量%メチルイソブチルケトン溶液になるように調製した。前記化合物(4−3)について、赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルを測定することにより、下記式(4−3)で表される化合物であることを同定した。
(Example 3)
6 parts by mass of 2-phenylimidazole and 72 parts by mass of methyl isobutyl ketone are placed in a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device, and 2-phenylimidazole is added at a temperature of 95 ° C. while stirring. Dissolved in methyl isobutyl ketone. Next, 17.2 parts by mass of the compound (3-1) obtained in Synthesis Example 1 was added dropwise over 1 hour. The mixture was further stirred for 2 hours, and then reacted at a temperature in the flask of 110 ° C. for 3 hours so that a 30% by mass methyl isobutyl ketone solution of a nitrogen-containing heterocyclic compound (4-3) having a tertiary amine in the heterocyclic ring was obtained. Prepared. The compound (4-3) was identified as a compound represented by the following formula (4-3) by measuring an infrared absorption spectrum, 1 H-NMR and 13 C-NMR spectrum.
次に、撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に前記3級アミンを複素環内に有する含窒素複素環化合物(4−3)の30質量%メチルイソブチルケトン溶液60質量部を40℃に加熱して、p−トルエンスルホン酸メチル5.9質量部を10分かけて滴下し、滴下終了後60℃で3時間反応させた。反応終了後、反応溶液をろ過した後、メチルイソブチルケトンを加えて、下記式(1−3)で表される化合物(4−3)の4級アンモニウム塩の30質量%メチルイソブチルケトン溶液を得た。 Next, a 30% by mass methyl isobutyl ketone solution 60 of a nitrogen-containing heterocyclic compound (4-3) having the tertiary amine in the heterocyclic ring in a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device. The mass part was heated to 40 ° C., and 5.9 parts by mass of methyl p-toluenesulfonate was added dropwise over 10 minutes, followed by reaction at 60 ° C. for 3 hours. After completion of the reaction, the reaction solution is filtered, and then methyl isobutyl ketone is added to obtain a 30% by mass methyl isobutyl ketone solution of a quaternary ammonium salt of the compound (4-3) represented by the following formula (1-3). It was.
(実施例4)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコに、2−フェニルイミダゾリン6質量部及びメチルイソブチルケトン35質量部を入れ、攪拌しながら、フラスコ内温度95℃で2−フェニルイミダゾリンをメチルイソブチルケトンに溶解させた。次いで、合成例1で得られた化合物(3−1)17.2質量部を1時間かけて滴下した。さらに2時間攪拌させた後、フラスコ内温度106℃で3時間反応させ、3級アミンを複素環内に有する含窒素複素環化合物(4−4)の30質量%メチルイソブチルケトン溶液になるように調製した。前記化合物(4−4)について、赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルを測定することにより、下記式(4−4)で表される化合物であることを同定した。
Example 4
Put 6 parts by mass of 2-phenylimidazoline and 35 parts by mass of methyl isobutyl ketone in a glass flask equipped with a stirrer, thermometer, condenser, and dropping device, and stir 2-phenylimidazoline at 95 ° C in the flask while stirring. Dissolved in methyl isobutyl ketone. Next, 17.2 parts by mass of the compound (3-1) obtained in Synthesis Example 1 was added dropwise over 1 hour. The mixture was further stirred for 2 hours, and then reacted at a temperature in the flask of 106 ° C. for 3 hours so that a 30% by mass methyl isobutyl ketone solution of a nitrogen-containing heterocyclic compound (4-4) having a tertiary amine in the heterocyclic ring was obtained. Prepared. The compound (4-4) was identified as a compound represented by the following formula (4-4) by measuring an infrared absorption spectrum, 1 H-NMR and 13 C-NMR spectrum.
次に、撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に前記3級アミンを複素環内に有する含窒素複素環化合物(4−3)の30質量%メチルイソブチルケトン溶液60質量部を加えた後、40℃にてp−トルエンスルホン酸メチル5.9質量部を10分かけて滴下し、滴下終了後60℃で3時間反応させた。反応終了後、反応溶液をろ過した後、メチルイソブチルケトンを加えて、下記式(1−4)で表される化合物(4−4)の4級アンモニウム塩の30質量%メチルイソブチルケトン溶液を得た。 Next, a 30% by mass methyl isobutyl ketone solution 60 of a nitrogen-containing heterocyclic compound (4-3) having the tertiary amine in the heterocyclic ring in a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device. After adding a mass part, 5.9 mass parts of methyl p-toluenesulfonate was dripped at 40 degreeC over 10 minutes, and it was made to react at 60 degreeC after completion | finish of dripping. After completion of the reaction, the reaction solution is filtered, and then methyl isobutyl ketone is added to obtain a 30% by mass methyl isobutyl ketone solution of a quaternary ammonium salt of the compound (4-4) represented by the following formula (1-4). It was.
(実施例5)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコに、イミダゾール8質量部及びメチルイソブチルケトン69質量部を入れ、攪拌しながら、フラスコ内温度90℃でイミダゾールをメチルイソブチルケトンに溶解させた。次いで、合成例2で得られた化合物(3−2)38質量部を1時間かけて滴下した。さらに2時間攪拌させた後、フラスコ内温度110℃で3時間反応させ、3級アミンを複素環内に有する含窒素複素環化合物(4−5)の30質量%メチルイソブチルケトン溶液になるように調製した。前記化合物(4−5)について、赤外線吸収スペクトル、1H−NMR及び13C−NMRスペクトルを測定することにより、下記式(4−5)で表される化合物であることを同定した。
(Example 5)
Put 8 parts by mass of imidazole and 69 parts by mass of methyl isobutyl ketone in a glass flask equipped with a stirrer, thermometer, condenser, and dropping device, and dissolve the imidazole in methyl isobutyl ketone at 90 ° C. in the flask while stirring. It was. Next, 38 parts by mass of the compound (3-2) obtained in Synthesis Example 2 was added dropwise over 1 hour. The mixture was further stirred for 2 hours, and then reacted at a temperature in the flask of 110 ° C. for 3 hours so that a 30% by mass methyl isobutyl ketone solution of a nitrogen-containing heterocyclic compound (4-5) having a tertiary amine in the heterocyclic ring was obtained. Prepared. The compound (4-5) was identified as a compound represented by the following formula (4-5) by measuring an infrared absorption spectrum, 1 H-NMR and 13 C-NMR spectrum.
次に、撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に前記3級アミンを複素環内に有する含窒素複素環化合物(4−5)の30質量%メチルイソブチルケトン溶液60質量部を加えた後、40℃にてヨウ化メチル6.5質量部を10分かけて滴下し、滴下終了後60℃で3時間反応させた。反応終了後、反応溶液をろ過した後、メチルイソブチルケトンを加えて、下記式(1−5)で表される化合物の4級アンモニウム塩の30質量%メチルイソブチルケトン溶液を得た。 Next, a 30% by mass methyl isobutyl ketone solution 60 of a nitrogen-containing heterocyclic compound (4-5) having the tertiary amine in the heterocyclic ring in a glass flask equipped with a stirrer, a thermometer, a condenser, and a dropping device. After adding mass part, 6.5 mass parts of methyl iodide was dripped at 40 degreeC over 10 minutes, and it was made to react at 60 degreeC after completion | finish of dripping for 3 hours. After completion of the reaction, the reaction solution was filtered, and then methyl isobutyl ketone was added to obtain a 30% by mass methyl isobutyl ketone solution of a quaternary ammonium salt of a compound represented by the following formula (1-5).
(実施例6)
実施例5で得られた撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内に前記3級アミンを複素環内に有する含窒素複素環化合物(4−5)の30質量%メチルイソブチルケトン溶液60質量部を加えた後、40℃にてp−トルエンスルホン酸メチル8.5質量部を1時間かけて滴下し、滴下終了後60℃で3時間反応させた。反応終了後、反応溶液をろ過した後、メチルイソブチルケトンを加えて、下記式(1−6)で表される化合物(4−5)の4級アンモニウム塩の30質量%メチルイソブチルケトン溶液を得た。
(Example 6)
30% by mass methyl of the nitrogen-containing heterocyclic compound (4-5) having the tertiary amine in the heterocyclic ring in the glass flask equipped with the stirrer, thermometer, condenser, and dropping device obtained in Example 5 After adding 60 parts by mass of an isobutyl ketone solution, 8.5 parts by mass of methyl p-toluenesulfonate was added dropwise at 40 ° C. over 1 hour, and reacted at 60 ° C. for 3 hours after completion of the addition. After completion of the reaction, the reaction solution is filtered, and then methyl isobutyl ketone is added to obtain a 30% by mass methyl isobutyl ketone solution of a quaternary ammonium salt of the compound (4-5) represented by the following formula (1-6). It was.
(比較例1)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコ内にジエタノールアミン10.5質量部を入れ、40℃で攪拌しながら、合成例1で得られた化合物(3−1)42.2質量部を滴下させ、3時間反応させた。更に110℃で1時間反応させて、下記式(C1’−1)で表される化合物を得た。
(Comparative Example 1)
10.5 parts by mass of diethanolamine was placed in a glass flask equipped with a stirrer, thermometer, condenser, and dropping device, and the compound (3-1) 42.2 obtained in Synthesis Example 1 was stirred at 40 ° C. A part by mass was dropped and reacted for 3 hours. Furthermore, it was made to react at 110 degreeC for 1 hour, and the compound represented by a following formula (C1'-1) was obtained.
次いで、イソプロパノール50質量部を加えて均一な溶液とした後、p−トルエンスルホン酸メチル18.2質量部を30分かけて滴下し、さらに60℃で2時間反応させた。反応終了後、イソプロパノールを減圧留去、乾燥させて下記式(C1−1)で表される4級アンモニウム塩を得た。 Next, 50 parts by mass of isopropanol was added to obtain a uniform solution, and then 18.2 parts by mass of methyl p-toluenesulfonate was added dropwise over 30 minutes, and the mixture was further reacted at 60 ° C. for 2 hours. After completion of the reaction, isopropanol was distilled off under reduced pressure and dried to obtain a quaternary ammonium salt represented by the following formula (C1-1).
[評価用コーティング組成物のベース組成物の調製]
評価用コーティング組成物として、5官能無黄変型ウレタンアクリレート50質量部、ジペンタエリスリトールヘキサアクリレート50質量部、酢酸ブチル25質量部、光重合開始剤(BASFジャパン株式会社製「イルガキュア184」;1−ヒドロキシシクロヘキシルフェニルケトン)5質量部、溶剤としてトルエン54質量部、2−プロパノール28質量部、酢酸エチル28質量部及びプロピレングリコールモノメチルエーテル28質量部を均一に混合して、紫外線硬化型のコーティング組成物のベース組成物を得た。
[Preparation of Base Composition for Evaluation Coating Composition]
As a coating composition for evaluation, pentafunctional non-yellowing urethane acrylate 50 parts by mass, dipentaerythritol hexaacrylate 50 parts by mass, butyl acetate 25 parts by mass, photopolymerization initiator (“Irgacure 184” manufactured by BASF Japan Ltd .; 1- (Hydroxycyclohexyl phenyl ketone) 5 parts by weight, 54 parts by weight of toluene as a solvent, 28 parts by weight of 2-propanol, 28 parts by weight of ethyl acetate and 28 parts by weight of propylene glycol monomethyl ether are uniformly mixed to form a UV curable coating composition. A base composition was obtained.
[評価用コーティング組成物の調製]
上記で得られたベース組成物268質量部に、実施例1〜12及び比較例1〜2で得られた4級アンモニウム塩を固形分で1質量部(1phr)、又は3質量部(3phr)をそれぞれ加え、均一に混合、溶解させた後、0.1μmのポリテトラフルオロエチレン(PTFE)製フィルターで精密濾過して評価用コーティング組成物を得た。また、何も添加せずベース組成物のみのものを用意し比較例3とした。
[Preparation of coating composition for evaluation]
To 268 parts by mass of the base composition obtained above, the quaternary ammonium salt obtained in Examples 1 to 12 and Comparative Examples 1 to 2 is 1 part by mass (1 phr), or 3 parts by mass (3 phr). Were mixed and dissolved uniformly, followed by microfiltration with a 0.1 μm polytetrafluoroethylene (PTFE) filter to obtain a coating composition for evaluation. Further, nothing was added and only a base composition was prepared and used as Comparative Example 3.
[評価用塗膜の作製]
上記で得られた評価用コーティング組成物をバーコーターNo.13を用いて、厚さ188μmのポリエチレンテレフタレート(PET)フィルムに塗布した後、60℃の乾燥機に5分間入れて溶剤を揮発させた。次に、乾燥した塗膜に紫外線硬化装置(窒素雰囲気下、高圧水銀灯、紫外線照射量2kJ/m2)で紫外線(UV)を照射して硬化させた。
[Preparation of coating film for evaluation]
The coating composition for evaluation obtained above was measured using a bar coater No. 13 was applied to a polyethylene terephthalate (PET) film having a thickness of 188 μm, and then placed in a dryer at 60 ° C. for 5 minutes to volatilize the solvent. Next, the dried coating film was cured by irradiating with ultraviolet rays (UV) using an ultraviolet curing device (under a nitrogen atmosphere, a high-pressure mercury lamp, an ultraviolet irradiation amount of 2 kJ / m 2 ).
[ヘイズ値の測定]
上記で得られた評価用塗膜について、濁度計(日本電色工業株式会社製、型式:NDH5000)を用いて、ヘイズ値を測定した。
[Measurement of haze value]
About the coating film for evaluation obtained above, the haze value was measured using a turbidimeter (Nippon Denshoku Industries Co., Ltd., model: NDH5000).
[表面平滑性の評価]
上記で得られた評価用塗膜の表面の外観を目視で観察して、下記の基準にしたがい表面平滑性を評価した。
○:表面が平滑である。
△:表面にわずか凸凹がある。
×:平滑でなく、白化、曇りが観察される。
[Evaluation of surface smoothness]
The surface appearance of the coating film for evaluation obtained above was visually observed, and surface smoothness was evaluated according to the following criteria.
○: The surface is smooth.
Δ: Slightly uneven on the surface.
X: Not smooth, but whitening and cloudiness are observed.
[表面固有抵抗値の測定]
上記で得られた評価用塗膜の表面固有抵抗値を温度23℃、湿度50%の条件下で、装置にデジタル超絶縁計/微少電流計(日置電機株式会社製、型式:DSM−8103)、及び電極として平板試料用電極(日置電機株式会社製、型式:SME−8311)を用いて測定した。
[Measurement of surface resistivity]
A digital superinsulator / microammeter (manufactured by Hioki Electric Co., Ltd., model: DSM-8103) was used in the apparatus under the conditions of the surface resistivity of the coating film for evaluation obtained above at a temperature of 23 ° C. and a humidity of 50%. , And an electrode for a flat plate sample (manufactured by Hioki Electric Co., Ltd., model: SME-8311).
上記の測定及び評価結果を表1に示す。 The measurement and evaluation results are shown in Table 1.
本発明の帯電防止剤である実施例1〜6で得られた含窒素複素環を有する4級アンモニウム塩を添加したコーティング組成物の硬化塗膜は、コーティング組成物中の樹脂成分との相溶性が良好なため、透明性が非常に高いことがわかった。また、表面平滑性も非常に高いことがわかった。これは、帯電防止剤も添加しなかった硬化塗膜(比較例3)より表面平滑性が高いことから、本発明の帯電防止剤はレベリング剤としても作用していると考えられる。また、帯電防止剤も添加しなかった硬化塗膜(比較例3)の表面固有抵抗値が1.2×1017Ω/□であったのに対し、1phrの少量添加でも1010〜1012Ω/□オーダーまで低下し、優れた帯電防止性を硬化塗膜に付与できることがわかった。 The cured coating film of the coating composition to which the quaternary ammonium salt having a nitrogen-containing heterocycle obtained in Examples 1 to 6, which is the antistatic agent of the present invention, is compatible with the resin component in the coating composition. It was found that the transparency was very high. It was also found that the surface smoothness was very high. This is because the surface smoothness is higher than that of the cured coating film (Comparative Example 3) to which no antistatic agent was added, and thus it is considered that the antistatic agent of the present invention also acts as a leveling agent. Further, the surface specific resistance value of the cured coating film (Comparative Example 3) to which no antistatic agent was added was 1.2 × 10 17 Ω / □, whereas 10 10 to 10 12 even when a small amount of 1 phr was added. It was found that the resistance was reduced to the order of Ω / □, and excellent antistatic properties could be imparted to the cured coating film.
一方、比較例1で得られた含窒素複素環を有しない4級アンモニウム塩を用いた例では、表面固有抵抗値の低下は見られたものの、コーティング組成物中の各成分との相溶性が悪く、硬化塗膜が白濁して透明性に劣ることがわかった。 On the other hand, in the example using the quaternary ammonium salt having no nitrogen-containing heterocycle obtained in Comparative Example 1, although the surface resistivity was decreased, the compatibility with each component in the coating composition was It was bad and it turned out that a cured coating film becomes cloudy and is inferior to transparency.
帯電防止剤を加えなかった比較例3は、表面固有抵抗値が1.2×1017Ω/□と高く、硬化塗膜の表面平滑性も不十分であることがわかった。 It was found that Comparative Example 3 in which no antistatic agent was added had a high surface resistivity of 1.2 × 10 17 Ω / □ and the surface smoothness of the cured coating film was insufficient.
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