JP5567724B2 - Valve and substrate processing apparatus provided with the same - Google Patents

Description

  The present invention relates to a valve and a substrate processing apparatus including the valve. Examples of substrates processed by the substrate processing apparatus include semiconductor wafers, liquid crystal display substrates, plasma display substrates, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, and magneto-optical disk substrates. , Photomask substrates, ceramic substrates, solar cell substrates, and the like.

  In the manufacturing process of a semiconductor device, for example, processing using a processing liquid is performed on a substrate such as a semiconductor wafer. A single wafer processing apparatus that processes substrates one by one includes, for example, a spin chuck that horizontally holds and rotates a substrate, and a processing liquid supply mechanism that supplies a processing liquid to the substrate held by the spin chuck. I have. The processing liquid supply mechanism includes a nozzle that discharges the processing liquid, a supply pipe that supplies the processing liquid to the nozzle, and a valve that is interposed in the supply pipe. The processing liquid flowing through the supply pipe is supplied to the nozzle by opening the valve. As a result, the processing liquid is discharged from the nozzle, and the discharged processing liquid is supplied to the substrate. The valve is closed when the valve body comes into contact with the valve seat, and is opened when the valve body leaves the valve seat.

JP 2009-222189 A

  When the valve is closed, the valve body contacts the valve seat. However, particles may be generated in the valve due to contact between the valve body and the valve seat. In the state where the valve is closed, the processing liquid stays in the valve, so that particles are not discharged. Therefore, the particles are supplied to the nozzle together with the processing liquid when the valve is opened. And the process liquid containing a particle is discharged from a nozzle, and is supplied to a board | substrate. Therefore, the cleanliness of the substrate is lowered.

Accordingly, an object of the present invention is to provide a valve capable of controlling the discharge of particles.
Another object of the present invention is to provide a substrate processing apparatus capable of increasing the cleanliness of a substrate.

  In order to achieve the object, the invention according to claim 1 is characterized in that an inlet (515) to which a liquid is supplied, an outlet (516) for discharging the liquid supplied to the inlet, and a supply to the inlet. Between the discharge port (517, 717) for discharging the liquid, the first flow path (518, 520, 618) connecting the inflow port and the discharge port, and the inflow port and the discharge port The second flow path (519, 619, 719) connected to the first flow path at the provided connection position (CP1) and connecting the first flow path and the discharge port, and the second flow path A first valve body (525, 725) configured to be movable between a closed closed position and an open position where the second flow path is opened, and the first valve body between the closed position and the open position. A first actuator (24) for moving the discharge port, and the discharge port and the second flow channel And a throttle part (545) provided in the first flow path on the discharge port side of the connection position, the first valve body and the throttle part having the flow path area smaller than the product, The flow passage area of the throttle portion is configured to change depending on the position of the first valve body, and the flow passage area of the throttle portion when the first valve body is located in the open position is the discharge port. And the flow passage area of the throttle portion when the first valve body is located at the closed position is smaller than when the first valve body is located at the open position. Is also a large valve (511, 611, 711). In this section, alphanumeric characters in parentheses represent reference numerals of corresponding components in the embodiments described later, but the scope of the claims is not limited by these reference numerals.

  According to this configuration, a plurality of openings (inflow ports, discharge ports, discharge ports) are provided in the valve. The discharge port is connected to the inflow port by the first flow path. The discharge port is connected to the first channel by the second channel. The second flow path is connected to the first flow path at a connection position provided between the inlet and the outlet. The second flow path is opened and closed when the first valve body is moved by the first actuator. Further, the throttle portion is provided in the first flow path on the discharge port side from the connection position. The restricting portion has a channel area smaller than the channel area of the discharge port and the second channel.

  When the first valve body is disposed at the open position and the second flow path is opened, the liquid supplied to the inflow port is discharged from the discharge port and the discharge port through the first flow path and the second flow path. . Since the throttle portion has a channel area smaller than the channel area of the discharge port and the second channel, the liquid flowing from the connection position toward the discharge port is larger than the resistance applied to the liquid toward the discharge port. Resistance is added. For this reason, the flow rate of the liquid supplied to the discharge port is larger than the flow rate of the liquid supplied to the discharge port. Thereby, the flow rate (discharge flow rate) of the liquid discharged from the discharge port is ensured.

  On the other hand, when the first valve body is disposed at the closed position and the second flow path is closed, the liquid supplied to the inflow port is discharged from the discharge port through the first flow path. Therefore, particles generated by closing the second flow path and particles entering the valve when the second flow path is closed are discharged from the discharge port together with the liquid. As described above, when the second flow path is closed, particles generated in the valve and particles entering the valve are discharged from the discharge port and are suppressed or prevented from being discharged from the discharge port. The Thereby, the discharge of particles is controlled.

  Further, the second flow path is opened and closed by the first valve body, and the flow path area of the throttle portion is changed by the first valve body. Specifically, when the first valve body is moved from the closed position to the open position by the first actuator, the second flow path is opened, and the flow path area of the throttle portion is the flow rate of the discharge port and the second flow path. It becomes smaller than the road area. Thereby, the discharge flow rate from a discharge outlet is ensured. Further, when the first valve body is moved from the open position to the closed position by the first actuator, the second flow path is closed and the flow path area of the throttle portion is increased. Therefore, the flow of liquid toward the discharge port becomes faster, and particles are reliably discharged from the discharge port. In this way, the discharge of liquid from the discharge port and the discharge flow rate of liquid from the discharge port are controlled by one valve body (first valve body) and one actuator (first actuator). The increase in the number of parts is suppressed.

  According to a second aspect of the present invention, the first flow path includes a connection flow path (544, 644) and a cylindrical flow path (543, 643), and the connection flow path includes the cylindrical flow path and the flow path. The cylindrical flow path extends in parallel with the second flow path and surrounds the second flow path and the connection position, and the closed position of the first valve body is: 2. The valve according to claim 1, wherein the valve is provided at the connection position, and the first valve body is configured to close the second flow path at the connection position.

  According to this configuration, the connection channel and the cylindrical channel are provided in the first channel. The inflow port and the cylindrical flow path are connected by a connection flow path. Therefore, the liquid supplied to the inflow port is supplied to the cylindrical flow path through the connection flow path. If the liquid is supplied to the inlet at a sufficient flow rate that fills the cylindrical flow path, a cylindrical flow is formed in the cylindrical flow path. Furthermore, since the cylindrical flow path extends in parallel with the second flow path and surrounds the second flow path and the connection position, a cylindrical flow surrounding the second flow path and the connection position is formed at this time. Furthermore, since the second flow path is closed by the first valve body at the connection position, a cylindrical flow surrounding the first valve body is formed when the second flow path is closed.

  Since the cylindrical flow surrounding the first valve body is formed, the liquid stagnation around the first valve body is suppressed or prevented when the second flow path is closed. That is, it is suppressed or prevented that the liquid does not flow and stays around the first valve body, or the liquid flows around the first valve body and does not move from around the first valve body. Therefore, particles drifting around the first valve body when the second flow path is closed flow toward the discharge port while the second flow path is closed, and are discharged from the discharge port. . Therefore, for example, particles generated around the first valve body by closing the second flow path are discharged from the valve while the second flow path is closed. This suppresses or prevents particles floating around the first valve body from being discharged from the discharge port when the second flow path is opened.

According to a third aspect of the present invention, the cylindrical flow path includes a connection point (P1) to which the connection flow path is connected, and the connection flow path is orthogonal to the cylindrical flow path and includes the connection point. The valve according to claim 2, comprising a cross channel (544) extending in a direction intersecting with a straight line (L1) passing through the connection point and the center (C1) of the cylindrical channel in a plane.
According to this configuration, the connection flow path includes the cross flow path. The cross flow path is connected to a connection point provided in the cylindrical flow path. Further, the intersecting flow path extends in a direction intersecting with a straight line passing through the connection point and the center of the cylindrical flow path in a plane perpendicular to the cylindrical flow path and including the connection point. That is, for example, if the cylindrical channel is cylindrical, the intersecting channel extends in a direction intersecting with a straight line including the radius of the cylindrical channel. Therefore, the liquid supplied from the intersecting channel to the cylindrical channel moves in the axial direction of the cylindrical channel while rotating in a certain direction (one of the circumferential directions of the cylindrical channel). That is, the liquid supplied to the cylindrical flow path flows spirally, and a vortex is formed in the cylindrical flow path. Thereby, when the 2nd channel is closed by the 1st valve body, it is controlled or prevented that a liquid stagnates around the 1st valve body. Therefore, the particles floating around the first valve body are discharged from the discharge port together with the liquid while the second flow path is closed.

The valve further includes a diaphragm (26) connected to the first valve body and the first actuator, and the second flow path is configured such that the first reciprocating motion of the diaphragm is caused by the first actuator. It may be opened and closed by a valve body.
The invention according to claim 5 includes the substrate holding mechanism (3, 850) for holding the substrate (W) and the valve according to any one of claims 1 to 4, and is held by the substrate holding mechanism. A substrate processing apparatus (1, 801) includes a processing liquid supply mechanism (4, 804) for supplying a processing liquid to a substrate and a control device (5) for controlling the valve.

  According to this configuration, the processing liquid is supplied from the processing liquid supply mechanism to the substrate held by the substrate holding mechanism by controlling the valve by the control device. As described above, the valve is configured so that a discharge flow rate from the discharge port is ensured and particles are discharged from the discharge port. Therefore, if the processing liquid discharged from the discharge port of the valve is supplied to the substrate held by the substrate holding mechanism, supply of the processing liquid containing particles to the substrate can be suppressed or prevented. Thereby, the cleanliness of the substrate is increased.

  According to a sixth aspect of the present invention, the processing liquid supply mechanism includes a container (6) for storing the processing liquid, a discharge member (7, 851) for discharging the processing liquid, the container, and the inlet of the valve. A first supply pipe (8) for connecting the valve, a second supply pipe (9) for connecting the discharge port of the valve and the discharge member, and a circulation pipe for connecting the container and the discharge port of the valve (10) and a liquid feeding means (12) for sending the processing liquid from the container to the valve via the first supply pipe, and at least one of the first supply pipe and the circulation pipe, and filtering the processing liquid The substrate processing apparatus according to claim 5, further comprising a filter (13) that performs processing.

  According to this structure, the container and the inflow port of the valve are connected by the first supply pipe. Further, the discharge port of the valve and the discharge member are connected by the second supply pipe. Further, the container and the outlet of the valve are connected by a circulation pipe. A filter for filtering the treatment liquid is provided in at least one of the first supply pipe and the circulation pipe. The processing liquid stored in the container is supplied to the inlet of the valve via the first supply pipe by the liquid feeding means. Then, the processing liquid supplied to the valve is discharged from at least one of the discharge port and the discharge port.

  Specifically, in a state where the second flow path of the valve is opened, the processing liquid supplied to the inflow port by the liquid feeding means is discharged from the discharge port and the discharge port. The processing liquid discharged from the discharge port is supplied to the discharge member via the second supply pipe, and is supplied to the substrate held by the substrate holding mechanism. As described above, the valve suppresses or prevents particles from being discharged from the discharge port. Thereby, it is suppressed or prevented that the processing liquid containing particles is supplied to the substrate. Therefore, the cleanliness of the substrate is increased.

  On the other hand, when the second flow path of the valve is closed, the processing liquid supplied to the inflow port by the liquid feeding means is discharged from the discharge port. The processing liquid discharged from the discharge port returns to the container through the circulation pipe. Then, the processing liquid is supplied again to the valve by the liquid feeding means, and is discharged from at least one of the discharge port and the discharge port. Thereby, the processing liquid discharged from the discharge port is effectively used, and the consumption of the processing liquid is reduced. Further, particles contained in the processing liquid discharged from the discharge port are captured by a filter provided in at least one of the first supply pipe and the circulation pipe. Therefore, supply of the processing liquid containing particles to the valve is suppressed or prevented. The liquid feeding means may be a pump or a mechanism that pressurizes the inside of the container.

It is a schematic diagram which shows schematic structure of the substrate processing apparatus which concerns on the 1st reference form of this invention. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on the 1st reference form of this invention. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on the 1st reference form of this invention. It is a timing chart for explaining the 1st example of operation of the 1st valve body and the 2nd valve body. It is a timing chart for explaining the 2nd example of operation of the 1st valve body and the 2nd valve body. It is a figure for demonstrating the flow of the particle when the 2nd operation example is performed. It is a figure for demonstrating the flow of the particle when the 2nd operation example is performed. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on the 2nd reference form of this invention. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on the 3rd reference form of this invention. It is sectional drawing of the valve | bulb in alignment with the XX line in FIG. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on the 4th reference form of this invention. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on 5th Embodiment of this invention. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on 5th Embodiment of this invention. It is sectional drawing of the valve | bulb along the XIV-XIV line | wire in FIG. It is sectional drawing of the valve | bulb along the XV-XV line | wire in FIG. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on 6th Embodiment of this invention. It is sectional drawing of the valve | bulb along the XVII-XVII line | wire in FIG. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on 7th Embodiment of this invention. It is a schematic diagram which shows schematic structure of the substrate processing apparatus which concerns on 8th Embodiment of this invention. It is the schematic for demonstrating the internal structure of the valve | bulb which concerns on the 9th reference form of this invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic diagram showing a schematic configuration of a substrate processing apparatus 1 according to a first reference embodiment of the present invention.
The substrate processing apparatus 1 is a single-wafer type substrate processing apparatus that processes substrates W such as semiconductor wafers one by one with a processing liquid such as a chemical liquid or a rinsing liquid. The substrate processing apparatus 1 includes a spin chuck 3 (substrate holding mechanism) disposed in the processing chamber 2, a processing liquid supply mechanism 4 for supplying a processing liquid to the substrate W held by the spin chuck 3, a spin chuck 3, and the like. And a control device 5 for controlling.

  The spin chuck 3 is configured to hold a single substrate W horizontally and rotate it around a vertical axis passing through the central portion of the substrate W. As shown in FIG. 1, the spin chuck 3 is, for example, a clamping chuck that holds the substrate W horizontally with the substrate W sandwiched from the periphery. The spin chuck 3 is not limited to the clamping chuck, and may be a vacuum chuck that holds the substrate W by sucking the lower surface (back surface) of the substrate W, for example.

  Further, the processing liquid supply mechanism 4 includes a tank 6 (container) for storing the processing liquid, a nozzle 7 (discharge member) disposed in the processing chamber 2, and a plurality of pipes (first supply pipe 8, second supply pipe). 9, a circulation pipe 10) and a valve 11. Further, the processing liquid supply mechanism 4 includes a pump 12 (liquid feeding means) attached to the first supply pipe 8, a filter 13, and a heater 14. The tank 6 is connected to the valve 11 by a first supply pipe 8. The valve 11 is connected to the nozzle 7 by a second supply pipe 9. Further, the valve 11 is connected to the tank 6 by a circulation pipe 10. The processing liquid stored in the tank 6 is supplied to the valve 11 by the pump 12. Further, particles contained in the processing liquid supplied to the valve 11 are removed by the filter 13. Further, the processing liquid supplied to the valve 11 is heated by the heater 14.

  The valve 11 is, for example, a three-way valve. The valve 11 is controlled by the control device 5. When the processing liquid supplied to the valve 11 is supplied to the second supply pipe 9, the processing liquid is discharged from the nozzle 7 and supplied to the substrate W held on the spin chuck 3. Thereby, the substrate W is processed with the processing liquid. Further, when the processing liquid supplied to the valve 11 is supplied to the circulation pipe 10, the processing liquid returns to the tank 6. Therefore, the processing liquid in the tank 6 circulates through the first supply pipe 8, the valve 11, the circulation pipe 10, and the tank 6. The processing liquid in the tank 6 is uniformly heated by the heater 14 by circulating through this circulation path.

2 and 3 are schematic views for explaining the internal structure of the valve 11 according to the first reference embodiment of the present invention. FIG. 2 shows a state where the first valve body 25 is located at the open position and the second valve body 32 is located at the small open position. FIG. 3 shows a state where the first valve body 25 is located at the closed position and the second valve body 32 is located at the large open position.
The valve 11 includes a plurality of openings (inflow port 15, discharge port 16, discharge port 17) and a plurality of flow paths (main flow path 18, discharge flow path 19, and discharge flow path 20). The valve 11 includes a housing 21, an opening / closing mechanism 22, and a discharge flow rate adjusting mechanism 23. The main flow path 18 and the discharge flow path 20 are the first flow paths according to the first reference embodiment of the present invention. Moreover, the discharge flow path 19 is a 2nd flow path which concerns on the 1st reference form of this invention. The inflow port 15, the discharge port 16, the discharge port 17, the main flow path 18, the discharge flow path 19, and the discharge flow path 20 are provided in the housing 21. The housing 21 is made of, for example, a synthetic resin having chemical resistance (resistance to chemicals). The first supply pipe 8, the second supply pipe 9, and the circulation pipe 10 are connected to the housing 21. The 1st supply piping 8, the 2nd supply piping 9, and the circulation piping 10 are connected to the inflow port 15, the discharge port 17, and the discharge port 16, respectively. The processing liquid supplied from the first supply pipe 8 to the inlet 15 is supplied to the discharge flow path 19 and the discharge flow path 20 through the main flow path 18.

  The main flow path 18 extends, for example, linearly. The discharge flow path 19 and the discharge flow path 20 are each connected to the main flow path 18. The discharge channel 19 and the discharge channel 20 extend in a direction orthogonal to the main channel 18. The discharge channel 19 and the discharge channel 20 are arranged in parallel. The main channel 18 has a channel area larger than the channel areas of the discharge channel 19 and the discharge channel 20. Moreover, the discharge flow path 19 and the discharge flow path 20 have, for example, flow path areas having the same size. The inflow port 15 is provided at one end of the main flow path 18. Further, the discharge port 16 is connected to the main flow path 18 by a discharge flow path 20. Further, the discharge port 17 is connected to the main flow path 18 by a discharge flow path 19. The discharge channel 19 is connected to the main channel 18 at a connection position CP <b> 1 provided between the inlet 15 and the outlet 16.

  The opening / closing mechanism 22 includes a first actuator 24, a first valve body 25, and a first diaphragm 26 (diaphragm). The first actuator 24 is driven by electric power, for example. The first actuator 24 includes, for example, a solenoid. The first actuator 24 is connected to the housing 21. The first actuator 24 is arranged on the opposite side of the main flow path 18 from the discharge flow path 19 and the discharge flow path 20. The first actuator 24 includes a first main body 27 and a first output shaft 28 protruding from the first main body 27. The first output shaft 28 extends in a direction orthogonal to the main flow path 18. The first output shaft 28 is inserted into a first through hole 29 provided in the housing 21. The first output shaft 28 is configured to reciprocate in the direction orthogonal to the main flow path 18 with respect to the first main body 27.

  Further, the first valve body 25 and the first diaphragm 26 are arranged in the main flow path 18. The first diaphragm 26 is disposed between the first valve body 25 and the first output shaft 28. The first diaphragm 26 is connected to the first valve body 25 and the first output shaft 28. The first diaphragm 26 is reciprocated by a first output shaft 28 in a direction orthogonal to the main flow path 18. The first valve body 25 is moved between a closed position (position shown in FIG. 3) and an open position (position shown in FIG. 2) as the first diaphragm 26 reciprocates. When the first valve body 25 is disposed at the closed position, the first valve body 25 is pressed against the first valve seat 30 provided in the housing 21 as shown in FIG. Thereby, the discharge flow path 19 is closed. When the first valve body 25 is moved from the closed position to the open position, the first valve body 25 moves away from the first valve seat 30 as shown in FIG. Thereby, the discharge flow path 19 is opened.

  Further, the discharge flow rate adjusting mechanism 23 includes the same configuration as the opening / closing mechanism 22, for example. That is, the discharge flow rate adjustment mechanism 23 includes a second actuator 31, a second valve body 32, and a second diaphragm 33. The second actuator 31 is driven by electric power, for example. The second actuator 31 includes, for example, a solenoid. The second actuator 31 is connected to the housing 21. The second actuator 31 is disposed on the opposite side of the main flow path 18 from the discharge flow path 19 and the discharge flow path 20. The second actuator 31 includes a second main body 34 and a second output shaft 35 protruding from the second main body 34. The second output shaft 35 extends in a direction orthogonal to the main flow path 18. The second output shaft 35 is inserted into a second through hole 36 provided in the housing 21. The second output shaft 35 is configured to reciprocate in the direction orthogonal to the main flow path 18 with respect to the second main body 34.

  The second valve body 32 and the second diaphragm 33 are disposed in the main flow path 18. The second diaphragm 33 is disposed between the second valve body 32 and the second output shaft 35. The second diaphragm 33 is connected to the second valve body 32 and the second output shaft 35. The second diaphragm 33 is reciprocated by the second output shaft 35 in a direction orthogonal to the main flow path 18. The second valve body 32 is moved between a small opening position (position shown in FIG. 2) and a large opening position (position shown in FIG. 3) in accordance with the reciprocating motion of the second diaphragm 33. The small open position and the large open position are respectively a first open position and a second open position according to the first reference embodiment of the present invention.

  The small open position and the large open position are positions where the second valve body 32 is separated from the second valve seat 37 (throttle portion) provided in the housing 21. As described above, the second valve body 32 is moved between the small open position and the large open position by the second actuator 31. Therefore, the second valve body 32 is moved within a range in which the second valve body 32 does not contact the second valve seat 37. The small open position is closer to the second valve seat 37 than the large open position. Therefore, when the second valve body 32 is moved from the large open position to the small open position, the flow path area of the second valve seat 37 decreases. The flow path area of the second valve seat 37 in a state where the second valve body 32 is located at the small opening position is smaller than the flow path areas of the discharge flow path 19 and the discharge port 17.

FIG. 4 is a timing chart for explaining a first operation example of the first valve body 25 and the second valve body 32.
The control device 5 controls the first actuator 24 and the second actuator 31. The control device 5 moves the second valve body 32 toward the large open position simultaneously with moving the first valve body 25 toward the closed position (see T1). Thereafter, the control device 5 moves the second valve body 32 toward the small open position simultaneously with moving the first valve body 25 toward the open position (see T2). That is, the control device 5 synchronizes the first actuator 24 and the second actuator 31 to simultaneously move the first valve body 25 and the second valve body 32 in the opposite directions.

FIG. 5 is a timing chart for explaining a second operation example of the first valve body 25 and the second valve body 32. FIGS. 6 and 7 are diagrams for explaining the flow of particles when the second operation example is performed.
As shown in FIG. 5, the control device 5 moves the second valve body 32 toward the large open position simultaneously with the movement of the first valve body 25 toward the closed position (see T3). Then, the control device 5 moves the second valve body 32 to the small open position in a state where the first valve body 25 is positioned at the closed position after the second valve body 32 is positioned at the large open position (see T4). ). Thereafter, the control device 5 moves the first valve body 25 to the open position with the second valve body 32 positioned at the small open position (see T5). That is, in this second operation example, the flow passage area of the second valve seat 37 is increased at the same time as the discharge flow passage 19 is closed, and after a certain time has elapsed, the discharge flow passage 19 is closed and the first flow passage 19 is closed. The flow path area of the two-valve seat 37 is reduced.

  As shown in FIG. 6, when the first valve body 25 is disposed at the closed position, the discharge flow path 19 is closed. Further, when the first valve body 25 is disposed at the closed position, the first valve body 25 may come into contact with the first valve seat 30 and particles may be generated in the main flow path 18. However, at this time, since the second valve body 32 is located at the large open position and the second valve seat 37 is opened, the particles are discharged from the discharge port 16 together with the processing liquid as shown in FIG. . Therefore, when the first valve body 25 is disposed again in the open position and the discharge flow path 19 is opened, the particles are suppressed or prevented from being discharged from the discharge port 17 together with the processing liquid.

  As described above, in the first reference embodiment, the second valve body 32 is disposed at the small open position in a state where the first valve body 25 is located at the open position. That is, in a state where the discharge flow path 19 is open, the discharge flow path 20 is maintained in an open state without being closed. Therefore, particles are generated by contact between the second valve body 32 and the second valve seat 37, and the discharge of the particles from the discharge port 17 is suppressed or prevented. In the state where the second valve body 32 is located at the small opening position, the flow passage area of the second valve seat 37 is smaller than the flow passage areas of the discharge port 17 and the discharge flow passage 19. Therefore, in a state where the first valve body 25 is positioned at the open position and the second valve body 32 is positioned at the small open position, a resistance larger than the resistance applied to the processing liquid toward the discharge port 17 is directed toward the discharge port 16. Add to processing solution. Therefore, the flow rate of the processing liquid supplied to the discharge port 17 is larger than the flow rate of the processing liquid supplied to the discharge port 16. Thereby, the flow rate (discharge flow rate) of the processing liquid discharged from the discharge port 17 is ensured, and the processing liquid is discharged from the discharge port 17 at a sufficient flow rate.

  Further, the second valve body 32 is arranged at the small open position or the large open position in a state where the first valve body 25 is located at the closed position. That is, in a state where the discharge channel 19 is closed, the discharge channel 20 is maintained in an open state without being closed. Accordingly, at this time, the processing liquid supplied to the inlet 15 of the valve 11 is discharged from the outlet 16. Therefore, the processing liquid flows through the valve 11 even when the discharge flow path 19 is closed. Therefore, particles generated by the contact between the first valve body 25 and the first valve seat 30 and particles entering the valve 11 when the discharge flow path 19 is closed are discharged without staying in the valve 11. Is done. Thereby, it is suppressed or prevented that the processing liquid containing particles is discharged from the discharge port 17. Therefore, supply of the processing liquid containing particles to the substrate W is suppressed or prevented. Therefore, the cleanliness of the substrate W is increased.

  In the first reference embodiment, the first valve body 25 is disposed at the connection position CP <b> 1 provided in the main flow path 18. Therefore, particles generated by the contact between the first valve body 25 and the first valve seat 30 are reliably discharged from the discharge port 16. Specifically, for example, in FIG. 3, a case is considered in which the arrangement of the discharge flow path 19 and the configuration related thereto and the discharge flow path 20 and the configuration related thereto are reversed left and right. In this case, when the discharge flow path 19 is closed, the flow of the processing liquid around the first valve body 25 becomes worse. That is, the processing liquid stagnates around the first valve body 25, or the flow of the processing liquid around the first valve body 25 becomes slow. Therefore, particles generated by the contact between the first valve body 25 and the first valve seat 30 are less likely to flow toward the discharge port 16. On the other hand, in the valve 11 according to the first reference embodiment, the first valve body 25 is disposed in the flow of the processing liquid toward the discharge port 16. Therefore, particles generated by the contact between the first valve body 25 and the first valve seat 30 are caused to flow toward the discharge port 16 by the flow of the processing liquid toward the discharge port 16. Therefore, the particles are reliably discharged from the discharge port 16.

  Further, as described in the first operation example, the first valve body 25 is moved in the direction in which the second valve body 32 is moved closer to the second valve seat 37 and at the same time is moved away from the first valve seat 30. Moved. Further, the first valve body 25 is moved in a direction approaching the first valve seat 30 at the same time as the second valve body 32 is moved away from the second valve seat 37. That is, the operations of the first valve body 25 and the second valve body 32 are synchronized, and the first valve body 25 and the second valve body 32 are simultaneously moved in directions opposite to each other. Therefore, a complicated program for controlling the first actuator 24 and the second actuator 31 is unnecessary.

  Further, as described in the second operation example, the second valve body 32 is moved from the large open position to the small open position in a state where the first valve body 25 is located at the closed position. In the state where the second valve body 32 is located at the large open position, the flow path area of the second valve seat 37 is larger than when the second valve body 32 is located at the small open position. Therefore, the flow of the processing liquid toward the discharge port 16 is faster than when the second valve body 32 is located at the small opening position. Therefore, particles generated by closing the discharge flow path 19 are reliably and promptly discharged from the valve 11 while the second valve body 32 is positioned at the large open position. On the other hand, when the 2nd valve body 32 is arrange | positioned in a small open position, the flow-path area of the 2nd valve seat 37 reduces. Therefore, the flow rate of the processing liquid discharged from the discharge port 16 is reduced. Therefore, for example, when the processing liquid discharged from the discharge port 16 is discarded, the amount of processing liquid discarded is reduced.

  In the first reference embodiment, all or part of the processing liquid supplied to the inflow port 15 is discharged from the discharge port 16 and returns to the tank 6 through the circulation pipe 10. Then, the processing liquid is supplied again to the valve 11 and discharged from at least one of the discharge port 17 and the discharge port 16. Thereby, the processing liquid discharged from the discharge port 16 is effectively used, and the consumption of the processing liquid is reduced. In addition, since the filter 13 is attached to the circulation pipe 10, particles contained in the processing liquid discharged from the discharge port 16 are captured by the filter 13. Thereby, supply of the processing liquid containing particles to the valve 11 is suppressed or prevented. Therefore, supply of the processing liquid containing particles to the substrate W is suppressed or prevented.

Second Reference Embodiment FIG. 8 is a schematic diagram for explaining the internal structure of a valve 211 according to a second reference embodiment of the present invention. 8, the same components as those shown in FIGS. 1 to 7 are given the same reference numerals as those in FIG. 1 and the description thereof is omitted.
The main difference between the second reference embodiment and the first reference embodiment described above is that the valve 211 includes an orifice.

  The valve 211 includes a plurality of openings (inflow port 15, discharge port 216, and discharge port 17) and a plurality of flow paths (main flow path 218, discharge flow path 19, and discharge flow path 220). The valve 211 includes a housing 221 and an opening / closing mechanism 22. The main flow path 218 and the discharge flow path 220 are the first flow paths according to the second reference embodiment of the present invention. Further, the discharge flow path 220 is a throttle portion according to the second reference embodiment of the present invention. The inflow port 15, the discharge port 216, the discharge port 17, the main flow path 218, the discharge flow path 19, and the discharge flow path 220 are provided in the housing 221. The housing 221 is made of, for example, a synthetic resin having chemical resistance. The 1st supply piping 8, the 2nd supply piping 9, and the circulation piping 10 are connected to the inflow port 15, the discharge port 17, and the discharge port 216, respectively. The processing liquid supplied from the first supply pipe 8 to the inlet 15 is supplied to the discharge channel 19 and the discharge channel 220 through the main channel 218.

  The main flow path 218 extends, for example, linearly. The inflow port 15 is provided at one end of the main flow path 218. The discharge channel 220 extends in the direction parallel to the main channel 218 from the other end of the main channel 218. The discharge channel 19 extends from the vicinity of the other end of the main channel 218 in a direction orthogonal to the main channel 218. The discharge port 17 is connected to the main flow path 218 by a discharge flow path 19. Further, the discharge port 216 is connected to the main flow path 218 by a discharge flow path 220. The main channel 218 has a channel area larger than the channel areas of the discharge channel 19 and the discharge channel 220. Further, the discharge channel 19 has a channel area larger than the channel area of the discharge channel 220. The discharge channel 220 is an orifice having a channel area smaller than the channel areas of the discharge channel 19 and the discharge port 17.

  The first actuator 24 is connected to the housing 221. The first actuator 24 is disposed on the opposite side of the main flow path 218 from the discharge flow path 19. The first output shaft 28 extends in a direction orthogonal to the main flow path 218. The first output shaft 28 is inserted into a first through hole 29 provided in the housing 221. The first output shaft 28 is configured to reciprocate in the direction orthogonal to the main flow path 218 with respect to the first main body 27.

  The first valve body 25 and the first diaphragm 26 are disposed in the main flow path 218. The first diaphragm 26 is reciprocated in the direction orthogonal to the main flow path 218 by the first output shaft 28. The first valve body 25 is moved between a closed position (position shown in FIG. 8) and an open position in accordance with the reciprocating motion of the first diaphragm 26. The discharge flow path 19 is opened and closed as the first valve body 25 moves. When the discharge flow path 19 is closed, the processing liquid supplied to the inflow port 15 is discharged from the discharge port 216 through the main flow path 218 and the discharge flow path 220.

  As described above, in the second reference embodiment, when the discharge channel 19 is closed, particles are discharged from the discharge port 216 together with the processing liquid through the orifice (discharge channel 220). Further, when the discharge channel 19 is opened, the processing liquid supplied to the inflow port 15 is discharged from the discharge port 17 and the discharge port 216. Since the orifice (discharge flow path 220) has a flow area smaller than the flow areas of the discharge port 17 and the discharge flow path 19, the treatment liquid directed to the discharge port 216 is treated with a process directed to the discharge port 17. A resistance greater than the resistance applied to the liquid is applied. Therefore, the processing liquid is discharged from the discharge port 17 at a sufficient flow rate. Thus, by providing the orifice (discharge channel 220), it is possible to secure the discharge flow rate from the discharge port 17 and discharge particles from the discharge port 216. Therefore, for example, the configuration of the valve 211 is simpler than when the discharge flow rate adjusting mechanism 23 (see, for example, FIG. 2) is provided. Further, the number of parts of the valve 211 is reduced as compared with the case where the discharge flow rate adjusting mechanism 23 is provided.

Third Reference Embodiment FIG. 9 is a schematic diagram for explaining the internal structure of a valve 311 according to a third reference embodiment of the present invention. FIG. 10 is a cross-sectional view of the valve 311 taken along line XX in FIG. 9 and 10, the same components as those shown in FIGS. 1 to 8 are given the same reference numerals as those in FIG. 1 and the description thereof is omitted.

The main difference between the third reference embodiment and the second reference embodiment described above is that the flow passage area of the main flow passage 318 continuously decreases toward the discharge port 216.
The valve 311 includes a main channel 318 and a discharge channel 320. The main flow path 318 and the discharge flow path 320 are the first flow paths according to the third reference embodiment of the present invention. Moreover, the discharge flow path 320 is a throttle part which concerns on the 2nd reference form of this invention. The inflow port 15, the discharge port 216, the discharge port 17, the main flow path 318, the discharge flow path 19, and the discharge flow path 320 are provided in the housing 321. The housing 321 is made of, for example, a synthetic resin having chemical resistance. The 1st supply piping 8, the 2nd supply piping 9, and the circulation piping 10 are connected to the inflow port 15, the discharge port 17, and the discharge port 216, respectively. The inflow port 15 is provided at one end of the main flow path 318. The discharge channel 320 extends from the other end of the main channel 318 in a direction parallel to the main channel 318. The discharge port 216 is connected to the main flow path 318 by a discharge flow path 320.

  Moreover, the main flow path 318 includes a conical portion 318a disposed on the discharge port 216 side with respect to the connection position CP1. The discharge channel 320 is connected to the top of the conical portion 318a. Accordingly, the diameter of the conical portion 318a continuously decreases toward the discharge port 216. That is, the flow path area of the conical portion 318a continuously decreases toward the discharge port 216. The minimum channel area of the conical portion 318a is equal to the channel area of the discharge channel 320, for example. The discharge channel 320 is an orifice having a channel area smaller than the channel areas of the discharge channel 19 and the discharge port 17. As shown in FIG. 10, the conical portion 318a, the discharge flow path 320, and the discharge port 216 are arranged on the same axis.

  As described above, in the third reference embodiment, the main flow path 318 includes the conical portion 318a disposed on the discharge port 216 side with respect to the connection position CP1. The flow path area of the conical portion 318a continuously decreases toward the discharge port 216. Therefore, the processing liquid flows smoothly from the connection position CP1 toward the discharge port 216. Thereby, generation | occurrence | production of the stagnation of the process liquid between connection position CP1 and the discharge port 216 is suppressed or prevented. That is, the treatment liquid does not flow and stays between the connection position CP1 and the discharge port 216, or the treatment liquid flows between the connection position CP1 and the discharge port 216 and from between the connection position CP1 and the discharge port 216. It is suppressed or prevented from moving. Therefore, for example, particles generated by closing the discharge flow path 19 are suppressed or prevented from accumulating at a position where the processing liquid is stagnant. Therefore, the particles accumulated at the position where the processing liquid is stagnant are suppressed or prevented from being discharged from the discharge port 17 when the discharge flow path 19 is opened. Therefore, supply of the processing liquid containing particles to the substrate W is suppressed or prevented. Thereby, the cleanliness of the substrate W is increased.

Fourth Reference Embodiment FIG. 11 is a schematic view for explaining the internal structure of a valve 411 according to a fourth reference embodiment of the present invention. In FIG. 11, the same components as those shown in FIGS. 1 to 10 described above are denoted by the same reference numerals as those in FIG. 1 and the description thereof is omitted.
The main difference between the fourth reference embodiment and the first reference embodiment described above is that the valve 411 is divided into a plurality of portions arranged at a distance.

  The valve 411 includes a main channel 418, a housing 421, and a connection pipe 440. The main flow path 418, the discharge flow path 20, and the connection pipe 440 are the first flow paths according to the fourth reference embodiment of the present invention. The housing 421 includes a first housing 438 and a second housing 439. The first housing 438 and the second housing 439 are each formed of, for example, a synthetic resin having chemical resistance. The main flow path 418 includes a first main flow path 441 provided in the first housing 438 and a second main flow path 442 provided in the second housing 439. Each of the first main channel 441 and the second main channel 442 extends linearly. The first main flow path 441 passes through the first housing 438. The inflow port 15 is provided at one end of the first main flow path 441. Further, the connection pipe 440 is connected to the other end of the first main flow path 441. Further, the connection pipe 440 is connected to one end of the second main flow path 442. The first main channel 441 and the second main channel 442 are connected to each other by a connection pipe 440. The processing liquid supplied to the inflow port 15 is supplied to the second main flow path 442 through the first main flow path 441 and the connection pipe 440.

  Further, the discharge channel 19 and the discharge channel 20 are provided in the first housing 438 and the second housing 439, respectively. The opening / closing mechanism 22 and the discharge flow rate adjusting mechanism 23 are connected to the first housing 438 and the second housing 439, respectively. The discharge channel 19 extends in a direction orthogonal to the first main channel 441. The discharge port 17 is connected to the first main flow path 441 by the discharge flow path 19. Further, the discharge channel 20 extends in a direction orthogonal to the second main channel 442. The discharge port 16 is connected to the second main flow path 442 by the discharge flow path 20. The first supply pipe 8 and the second supply pipe 9 are connected to the first housing 438. The first supply pipe 8 and the second supply pipe 9 are connected to the inflow port 15 and the discharge port 17, respectively. In addition, the circulation pipe 10 is connected to the second housing 439. The circulation pipe 10 is connected to the discharge port 16.

Fifth Embodiment FIGS. 12 and 13 are schematic views for explaining the internal structure of a valve 511 according to a fifth embodiment of the present invention. 14 is a cross-sectional view of the valve 511 along the line XIV-XIV in FIG. FIG. 15 is a cross-sectional view of the valve 511 taken along line XV-XV in FIG. FIG. 12 shows a state where the first valve body 525 is located at the closed position. Moreover, in FIG. 13, the state which the 1st valve body 525 is located in an open position is shown. 12 to 15, the same components as those shown in FIGS. 1 to 11 described above are denoted by the same reference numerals as those in FIG. 1 and the description thereof is omitted.

The main difference between the fifth embodiment and the first reference embodiment described above is that the discharge of the processing liquid from the discharge port 517 and the discharge flow rate of the processing liquid from the discharge port 516 have one valve body (first It is controlled by the valve body 525) and one actuator (first actuator 24).
The valve 511 includes a main channel 518, a discharge channel 519, and a discharge channel 520. The valve 511 includes a housing 521 and an opening / closing mechanism 522. The main flow path 518 and the discharge flow path 520 are the first flow paths according to the fifth embodiment of the present invention. Moreover, the discharge flow path 519 is a 2nd flow path which concerns on 5th Embodiment of this invention. The inflow port 515, the discharge port 516, the discharge port 517, the main flow channel 518, the discharge flow channel 519, and the discharge flow channel 520 are provided in the housing 521. The housing 521 is made of, for example, a synthetic resin having chemical resistance. The first body 27 of the first actuator 24 is disposed below the housing 521. The first actuator 24 is connected to the lower part of the housing 521. The first supply pipe 8, the second supply pipe 9, and the circulation pipe 10 are connected to an inlet 515, a discharge port 517, and a discharge port 516, respectively. The processing liquid supplied from the first supply pipe 8 to the inlet 515 is supplied to the discharge flow path 519 and the discharge flow path 520 through the main flow path 518.

  The main flow path 518 is substantially cylindrical, for example. The valve 511 is disposed so that the main flow path 518 extends vertically. The discharge flow path 519 extends in a direction parallel to the main flow path 518 from the outer surface of the housing 521 (the upper surface in FIGS. 12 and 13) toward the inside of the housing 521. The discharge channel 519 has, for example, a cylindrical shape. The main flow path 518 and the discharge flow path 519 are arranged coaxially. A part of the discharge channel 519 (other than the upper end) is disposed inside the main channel 518. The main flow path 518 and the discharge flow path 519 are concentrically partitioned by the cylindrical portion 521a of the housing 521. The discharge channel 519 is connected to the main channel 518 at a connection position CP1 provided between the inlet 515 and the outlet 516.

  As shown in FIGS. 12 and 13, the main flow path 518 includes a cylindrical flow path 543, a connection flow path 544 (cross flow path), a throttle flow path 545 (throttle section), and a storage flow path 546. Including. The cylindrical channel 543, the throttle channel 545, and the accommodation channel 546 are arranged vertically in this order from above. The cylindrical flow path 543 and the accommodation flow path 546 are connected to each other via the throttle flow path 545. The cylindrical channel 543 is connected to the inflow port 515 by the connection channel 544. In addition, the storage channel 546 is connected to the discharge port 516 by the discharge channel 520. The cylindrical flow path 543 is, for example, cylindrical. The cylindrical flow path 543 extends in a direction parallel to the discharge flow path 519 from the upper portion of the housing 521 to the connection position CP1. The cylindrical channel 543 surrounds a part of the discharge channel 519 (other than the upper end) and the connection position CP1.

  Further, the upper end portion of the cylindrical channel 543 is disposed at the same height as the inflow port 515. The upper end portion of the cylindrical channel 543 is connected to the inlet 515 by the connection channel 544. The treatment liquid is supplied to the inflow port 515 at a sufficient flow rate that fills the cylindrical flow path 543. As shown in FIGS. 12 and 13, the connection channel 544 extends in the direction perpendicular to the cylindrical channel 543 at the same height as the inflow port 515. Further, as shown in FIG. 14, the connection flow path 544 is relative to a straight line L1 passing through the connection point P1 and the center C1 of the cylindrical flow path 543 on a plane that includes the connection point P1 and orthogonal to the cylindrical flow path 543. Extending in the crossing direction. More specifically, the connection channel 544 extends, for example, along a tangent line of the cylindrical channel 543. The connection point P1 is, for example, the center of an intersection line (arc) between the cylindrical flow path 543 and the connection flow path 544.

  Further, as shown in FIG. 15, the throttle channel 545 has, for example, a cylindrical shape. The throttle channel 545 and the cylindrical channel 543 are arranged coaxially. The diameter of the throttle channel 545 is smaller than the outer diameter of the cylindrical channel 543. Further, the first diaphragm 26 is accommodated in the accommodation flow path 546. The first diaphragm 26 is disposed directly below the connection position CP1. The first diaphragm 26 is reciprocated up and down by the first output shaft 28. The first valve body 525 is disposed between the cylindrical portion 521a and the first diaphragm 26. The first diaphragm 26 is connected to the first valve body 525 and the first output shaft 28. The first valve body 525 includes a first cylindrical portion 525a. The first columnar part 525a, the cylindrical part 521a, and the throttle channel 545 are arranged coaxially. The diameter of the first cylindrical portion 525a is equal to the outer diameter of the cylindrical portion 521a. Further, as shown in FIG. 15, the diameter of the first cylindrical portion 525 a is smaller than the diameter of the throttle channel 545.

  The first valve body 525 is moved between a closed position (position shown in FIG. 12) and an open position (position shown in FIG. 13) as the first diaphragm 26 reciprocates. When the first valve body 525 is disposed at the closed position, the end surface of the first columnar part 525a is pressed against the lower end (corresponding to the first valve seat 530) of the cylindrical part 521a at the connection position CP1. Thereby, the discharge flow path 519 is closed. Further, when the first valve body 525 is moved from the closed position to the open position, the first cylindrical portion 525a is separated from the first valve seat 530. Thereby, the discharge flow path 519 is opened. Further, when the first valve body 525 is disposed in the open position, the first cylindrical portion 525a is disposed in the throttle channel 545. Thereby, the channel area of the throttle channel 545 is reduced. The flow passage area of the throttle flow passage 545 in a state where the first valve body 525 is located at the open position is smaller than the flow passage areas of the discharge flow passage 519 and the discharge port 517.

  As described above, in the fifth embodiment, the discharge flow path 519 is opened and closed by the first valve body 525 and the flow path area of the throttle flow path 545 is changed by the first valve body 525. When the first valve body 525 is moved from the closed position to the open position by the first actuator 24, the discharge flow path 519 is opened, and the flow path area of the throttle flow path 545 is the flow of the discharge port 517 and the discharge flow path 519. It becomes smaller than the road area. Thereby, the discharge flow rate from the discharge outlet 517 is ensured. Further, when the first valve body 525 is moved from the open position to the closed position by the first actuator 24, the discharge flow path 519 is closed and the flow path area of the throttle flow path 545 is increased. Therefore, the flow of the processing liquid toward the discharge port 516 becomes faster, and particles are reliably and quickly discharged from the inside of the valve 511. As described above, the discharge of the processing liquid from the discharge port 517 and the discharge flow rate of the processing liquid from the discharge port 516 are performed by one valve body (first valve body 525) and one actuator (first actuator 24). Since it is controlled, an increase in the number of parts of the valve 511 is suppressed.

  In the fifth embodiment, the connection channel 544 extends in a direction intersecting the straight line L1 including the radius of the cylindrical channel 543. Therefore, as shown in FIGS. 12 and 13, the processing liquid supplied from the connection channel 544 to the cylindrical channel 543 rotates in a certain direction (one of the circumferential directions of the cylindrical channel 543) while rotating. It moves in the axial direction of the flow channel 543. That is, the processing liquid supplied to the cylindrical flow path 543 flows spirally, and a vortex is formed in the cylindrical flow path 543. Further, when the discharge flow path 519 is closed by the first valve body 525, a vortex flow surrounding the first valve body 525 is formed in the cylindrical flow path 543. Thus, the stagnation of the processing liquid around the first valve body 525 is suppressed or prevented when the discharge flow path 519 is closed by the first valve body 525. Therefore, particles drifting around the first valve body 525 are discharged from the discharge port 516 together with the processing liquid while the discharge flow path 519 is closed. Thereby, it is suppressed or prevented that the processing liquid containing particles is discharged from the discharge port 517 and supplied to the substrate W.

  In the fifth embodiment, the cylindrical channel 543 extends vertically. The connection channel 544 is disposed above the connection position CP1. The processing liquid supplied from the connection channel 544 to the cylindrical channel 543 flows downward toward the connection position CP1. Therefore, the particles drifting in the cylindrical flow channel 543 are caused to flow downward by gravity in addition to the flow of the processing liquid. Therefore, particles are reliably removed from around the first valve body 525. Thereby, it is suppressed or prevented that the processing liquid containing particles is discharged from the discharge port 517 and supplied to the substrate W.

Sixth Embodiment FIG. 16 is a schematic view for explaining the internal structure of a valve 611 according to a sixth embodiment of the present invention. FIG. 17 is a sectional view of the valve 611 taken along the line XVII-XVII in FIG. 16 and 17, the same components as those shown in FIGS. 1 to 15 are given the same reference numerals as those in FIG. 1 and the description thereof is omitted.

The main difference between the sixth embodiment and the fifth embodiment described above is that the cylindrical flow path 643, the discharge flow path 619, and the cylindrical portion 621a are extended vertically.
The valve 611 includes a main channel 618, a discharge channel 619, and a housing 621. The main flow path 618 and the discharge flow path 520 are the first flow paths according to the sixth embodiment of the present invention. Moreover, the discharge flow path 619 is a 2nd flow path which concerns on 6th Embodiment of this invention. The main channel 618 includes a cylindrical channel 643 and a connection channel 644. The upper end portion of the cylindrical flow path 643 is connected to the inflow port 515 by the connection flow path 644. The treatment liquid is supplied to the inflow port 515 at a sufficient flow rate that fills the cylindrical flow path 643. The housing 621 is made of, for example, a synthetic resin having chemical resistance. The housing 621 includes a cylindrical portion 621a that concentrically partitions the cylindrical flow path 643 and the discharge flow path 619.

  As shown in FIG. 16, the connection channel 644 extends in a direction orthogonal to the cylindrical channel 643. As shown in FIG. 17, the connection flow path 644 is along a straight line L1 passing through the connection point P1 and the center C1 of the cylindrical flow path 643 on a plane that includes the connection point P1 and is orthogonal to the cylindrical flow path 643. It extends. That is, the connection channel 644 extends along the straight line L1 including the radius of the cylindrical channel 643. As shown in FIG. 17, the processing liquid flowing through the connection flow path 644 toward the cylindrical flow path 643 is divided into two substantially evenly at the connection point P <b> 1, for example.

  As described above, in the sixth embodiment, the connection flow path 644 extends along the straight line L1 including the radius of the cylindrical flow path 643. Therefore, as shown in FIG. 16, the processing liquid supplied from the connection channel 644 to the cylindrical channel 643 flows, for example, in the axial direction of the cylindrical channel 643 without forming a vortex. Thereby, a cylindrical flow toward the connection position CP1 is formed. Further, since the position at which the processing liquid is supplied from the connection flow path 644 to the cylindrical flow path 643 is sufficiently separated from the connection position CP1, stagnation of the processing liquid is generated in the upstream portion of the cylindrical flow path 643. Even so, a stable flow of the processing liquid is formed at the connection position CP1. That is, a cylindrical laminar flow surrounding the connection position CP1 is formed by the processing liquid.

  Since a cylindrical laminar flow surrounding the connection position CP1 is formed in the cylindrical flow path 643, in a state where the discharge flow path 619 is closed by the first valve body 525, a laminar flow surrounding the first valve body 525 is generated. Formed by treatment liquid. As a result, the stagnation of the processing liquid around the first valve body 525 is suppressed or prevented when the discharge flow path 619 is closed by the first valve body 525. Accordingly, particles drifting around the first valve body 525 are discharged from the discharge port 516 together with the processing liquid while the discharge flow path 619 is closed. Therefore, it is suppressed or prevented that the processing liquid containing particles is discharged from the discharge port 517 and supplied to the substrate W.

7th Embodiment FIG. 18: is the schematic for demonstrating the internal structure of the valve | bulb 711 which concerns on 7th Embodiment of this invention. FIG. 18 shows a state where the first valve body 725 is located at the closed position and the second valve body 732 is located at the large open position. In FIG. 18, the same components as those shown in FIGS. 1 to 17 described above are denoted by the same reference numerals as those in FIG.

The main difference between the seventh embodiment and the fifth embodiment described above is that a dedicated opening / closing mechanism 722 that opens and closes the discharge flow path 719 and a dedicated flow rate change of the processing liquid discharged from the discharge port 516 are used. A discharge flow rate adjusting mechanism 723 is provided.
The valve 711 includes a discharge channel 719 (second channel). The valve 711 includes a housing 721, an opening / closing mechanism 722, and a discharge flow rate adjusting mechanism 723. The inflow port 515, the discharge port 516, the discharge port 717, the main flow path 518, the discharge flow path 719, and the discharge flow path 520 are provided in the housing 721. The housing 721 is made of a synthetic resin having chemical resistance, for example. The first body 27 of the first actuator 24 is disposed on the housing 721. The second body 34 of the second actuator 31 is disposed below the housing 721. The first actuator 24 and the second actuator 31 are connected to the upper part and the lower part of the housing 721, respectively. The first supply pipe 8, the second supply pipe 9, and the circulation pipe 10 are connected to an inlet 515, a discharge port 717, and a discharge port 516, respectively. The processing liquid supplied from the first supply pipe 8 to the inlet 515 is supplied to the discharge flow path 719 and the discharge flow path 520 through the main flow path 518.

  The discharge channel 719 includes an accommodation channel 747 and a cylindrical channel 748. The storage channel 747 is disposed above the main channel 518. The housing flow path 747 extends from the outer surface of the housing 721 toward the inside of the housing 721 in a direction orthogonal to the cylindrical flow path 543. The accommodation channel 747 is connected to the cylindrical channel 748 above the main channel 518. The cylindrical channel 748 extends downward from the accommodation channel 747. The cylindrical flow path 543 and the cylindrical flow path 748 are arranged coaxially. A part of the cylindrical channel 748 (other than the upper end) is surrounded by the cylindrical channel 543. The cylindrical channel 543 and the column channel 748 are concentrically partitioned by the cylindrical portion 521a of the housing 721. The cylindrical channel 748 is connected to the main channel 518 at the connection position CP1.

  Further, the first diaphragm 26 is accommodated in the accommodation flow path 747. The first diaphragm 26 is reciprocated in a direction parallel to the cylindrical flow path 543 by the first output shaft 28 of the first actuator 24. Further, the first valve body 725 is disposed under the first diaphragm 26. The first valve body 725 includes a shaft portion 725b and a first cylindrical portion 725a. The shaft portion 725b is inserted into the cylindrical portion 521a. The upper end portion of the shaft portion 725b protrudes from the cylindrical portion 521a. The upper end portion and the lower end portion of the shaft portion 725b are connected to the first diaphragm 26 and the first cylindrical portion 725a, respectively. The first columnar portion 725a is disposed below the cylindrical portion 521a. The first columnar portion 725a, the cylindrical portion 521a, and the throttle channel 545 are arranged coaxially. The outer diameter of the first cylindrical portion 725a is equal to the outer diameter of the cylindrical portion 521a.

  The first valve body 725 is moved between a closed position (position shown in FIG. 18) and an open position as the first diaphragm 26 reciprocates. When the first valve body 725 is disposed at the closed position, the end surface of the first columnar part 725a is pressed against the lower end (corresponding to the first valve seat 530) of the cylindrical part 521a at the connection position CP1. Thereby, the discharge flow path 719 is closed. Further, when the first valve body 725 is moved from the closed position to the open position, the first cylindrical portion 725a is separated from the first valve seat 530. Thereby, the discharge flow path 719 is opened.

  Further, the second diaphragm 33 is accommodated in the accommodation flow path 546. The second diaphragm 33 is reciprocated in a direction parallel to the cylindrical flow path 543 by the second output shaft 35 of the second actuator 31. The second valve body 732 is disposed between the cylindrical portion 521a and the second diaphragm 33. The second diaphragm 33 is connected to the second valve body 732 and the second output shaft 35. The second valve body 732 includes a second cylindrical portion 732a. The second columnar part 732a, the cylindrical part 521a, and the throttle channel 545 are arranged coaxially. The outer diameter of the second cylindrical portion 732a is equal to the outer diameter of the cylindrical portion 521a. Further, the outer diameter of the second cylindrical portion 732a is smaller than the diameter of the throttle channel 545.

  The second valve body 732 is moved between a small open position and a large open position (position shown in FIG. 18) as the second diaphragm 33 reciprocates. The small open position and the large open position are respectively a first open position and a second open position according to the seventh embodiment of the present invention. The small opening position is a position where the second cylindrical portion 732a is disposed in the throttle channel 545. The large open position is a position where the second cylindrical portion 732a is disposed above the throttle channel 545. When the second valve body 732 is disposed at the small opening position, the second cylindrical portion 732a is disposed in the throttle channel 545. Thereby, the channel area of the throttle channel 545 is reduced. The flow passage area of the throttle flow passage 545 in a state where the second valve body 732 is located at the small opening position is smaller than the flow passage areas of the discharge flow passage 719 and the discharge port 717.

  As described above, in the seventh embodiment, the discharge flow rate adjustment mechanism 723 that changes the flow channel area of the throttle flow channel 545 is provided. The discharge flow rate adjusting mechanism 723 can move the second valve body 732 between the small open position and the large open position independently of the first valve body 725. Accordingly, the discharge flow rate adjustment mechanism 723 moves the second valve body 732 from the large open position to the small open position while the discharge flow path 719 is closed, thereby reducing the flow area of the throttle flow path 545. Can do. Thus, particles generated by closing the discharge flow path 719 can be reliably discharged, and the amount of processing liquid discharged from the discharge port 516 (discharge amount) can be reduced.

Eighth Embodiment FIG. 19 is a schematic diagram showing a schematic configuration of a substrate processing apparatus 801 according to an eighth embodiment of the present invention. In FIG. 19, the same components as those shown in FIGS. 1 to 18 are given the same reference numerals as those in FIG. 1 and the description thereof is omitted.
The main difference between the eighth embodiment and the first reference embodiment described above is that the substrate processing apparatus 801 is a batch type substrate processing apparatus that collectively processes a plurality of substrates W with a processing liquid. is there.

  The substrate processing apparatus 801 includes a processing tank 849 that stores processing liquid, a holding arm 850 (substrate holding mechanism) that holds a plurality of substrates W at once, and a processing liquid supply mechanism that supplies the processing liquid to the processing tank 849. 804. The processing tank 849 has a size that can accommodate a plurality of substrates W. The holding arm 850 is configured to be able to hold a plurality of substrates W at once in a vertical posture. The upper end of the treatment tank 849 is open. The holding arm 850 is between a processing position where the plurality of substrates W held by the holding arm 850 are immersed in the processing liquid in the processing tank 849 and a retreat position where the holding arm 850 is retracted above the processing tank 849. Is lifted up and down.

  The processing liquid supply mechanism 804 includes a tank 6 for storing the processing liquid, a plurality of ejection pipes 851 (discharge members) attached to the processing tank 849, and a plurality of pipes (first supply pipe 8, second supply). A pipe 9, a circulation pipe 10), and a valve 11 are included. Further, the processing liquid supply mechanism 804 includes a pump 12, a filter 13, and a heater 14 provided in the first supply pipe 8. The tank 6 is connected to the valve 11 by a first supply pipe 8. The valve 11 is connected to each ejection pipe 851 by the second supply pipe 9. Further, the valve 11 is connected to the tank 6 by a circulation pipe 10. The processing liquid stored in the tank 6 is supplied to the valve 11 by the pump 12. Further, particles contained in the processing liquid supplied to the valve 11 are removed by the filter 13. Further, the processing liquid supplied to the valve 11 is heated by the heater 14.

  The valve 11 is controlled by the control device 5. When the processing liquid supplied to the valve 11 is supplied to the second supply pipe 9, the processing liquid is ejected from the ejection pipes 851 into the processing tank 849 and a plurality of substrates disposed in the processing tank 849. Supplied to W. Thereby, the plurality of substrates W are processed with the processing liquid. Further, when the processing liquid supplied to the valve 11 is supplied to the circulation pipe 10, the processing liquid returns to the tank 6. Therefore, the processing liquid in the tank 6 circulates through the first supply pipe 8, the valve 11, the circulation pipe 10, and the tank 6. Thereby, the processing liquid in the tank 6 is uniformly heated by the heater 14.

  Although the embodiments of the present invention have been described above, the present invention is not limited to the contents of the first to eighth embodiments or the reference embodiments described above, and various modifications can be made within the scope of the claims. Is possible. For example, in the first to eighth embodiments or reference embodiments, the case where the discharge flow path is opened and closed by the first valve body has been described. However, the discharge flow path may be opened and closed by the first diaphragm. That is, like the valve 911 according to the ninth reference embodiment of the present invention shown in FIG. 20, the first diaphragm 26 may be configured to function as a valve body. Similarly, the 2nd diaphragm 33 may be comprised so that it may function as a valve body. The valve 911 includes a main channel 918 and a housing 921. The main flow path 918 and the discharge flow path 20 are the first flow paths according to the ninth reference embodiment of the present invention.

  In the first to ninth embodiments or the reference embodiments, the case where the first actuator 24 and the second actuator 31 are each driven by electric power has been described. However, the first actuator 24 and the second actuator 31 are not limited to electric power, and may be driven by air pressure or hydraulic pressure. That is, the first actuator 24 and the second actuator 31 may be air cylinders or hydraulic cylinders.

  In the fifth and sixth embodiments described above (see FIGS. 12 and 16), the processing liquid is discharged from the discharge port 516 at a constant flow rate when the discharge flow paths 519 and 619 are closed. Explained. However, a flow rate adjustment valve that adjusts the discharge flow rate from the discharge port 516 may be connected to the discharge port 516. Examples of the flow rate adjusting valve include a needle valve, a ball valve, and a butterfly valve.

In the first to ninth embodiments or reference embodiments, the case where the valve includes a diaphragm has been described. However, the valve according to the first to ninth embodiments or the reference embodiment may not include the diaphragm. Specifically, the valve according to the first to ninth embodiments or the reference embodiment may be a valve that does not include a diaphragm such as a needle valve, a ball valve, or a butterfly valve.
In the first and eighth embodiments or the reference embodiment, the case where the filter 13 is attached to the circulation pipe 10 has been described. However, the filter 13 may be attached to the first supply pipe 8 or may be attached to both the first supply pipe 8 and the circulation pipe 10.

In the first and eighth embodiments or the reference embodiment, the case where the substrate processing apparatus 1 or 801 includes the valve 11 according to the first reference embodiment has been described. However, the substrate processing apparatuses 1 and 801 may include a valve according to another embodiment.
In addition, various design changes can be made within the scope of matters described in the claims.

1. Substrate processing apparatus 3. Spin chuck (substrate holding mechanism)
4 Processing liquid supply mechanism 5 Control device 6 Tank (container)
7 Nozzle (Discharge member)
8 First supply pipe 9 Second supply pipe 10 Circulation pipe 11 Valve 12 Pump (liquid feeding means)
13 Filter 15 Inlet 16 Discharge port 17 Discharge port 18 Main channel (first channel)
19 Discharge channel (second channel)
20 Discharge channel (first channel)
24 1st actuator 25 1st valve body 26 1st diaphragm (diaphragm)
31 2nd actuator 32 2nd valve body 37 2nd valve seat (throttle part)
211 Valve 218 Main channel (first channel)
220 Discharge channel (first channel, throttle, orifice)
216 Discharge port 311 Valve 318 Main channel (first channel)
320 discharge channel (first channel, throttle, orifice)
411 Valve 418 Main channel (first channel)
440 Connection piping (first flow path)
511 Valve 515 Inlet 516 Discharge port 517 Discharge port 518 Main channel (first channel)
519 Discharge channel (second channel)
520 discharge channel (first channel)
525 First valve body 543 Tubular channel 544 Connection channel (cross channel)
545 Restricted flow path (restricted part)
611 Valve 618 Main channel (first channel)
619 Discharge flow path (second flow path)
643 Tubular channel 644 Connection channel 711 Valve 717 Discharge port 719 Discharge channel (second channel)
725 First valve body 732 Second valve body 801 Substrate processing apparatus 804 Processing liquid supply mechanism 850 Holding arm (substrate holding mechanism)
851 Jet pipe (discharge member)
911 Valve 918 Main channel (first channel)
C1 Center CP1 Connection position L1 Straight line P1 Connection point W Substrate

Claims (6)

An inlet to which liquid is supplied;
An outlet for discharging the liquid supplied to the inlet;
A discharge port for discharging the liquid supplied to the inflow port;
A first flow path connecting the inlet and the outlet;
A second flow path connected to the first flow path at a connection position provided between the inflow port and the discharge port, and connecting the first flow path and the discharge port;
A first valve body configured to be movable between a closed position where the second flow path is closed and an open position where the second flow path is opened;
A first actuator that moves the first valve body between the closed position and the open position;
A flow passage area that is smaller than the flow passage area of the discharge port and the second flow passage, including a throttle portion provided in the first flow passage on the discharge outlet side from the connection position,
The first valve body and the throttle portion are configured such that the flow path area of the throttle portion varies depending on the position of the first valve body,
The flow passage area of the throttle portion when the first valve body is located at the open position is smaller than the flow passage areas of the discharge port and the second flow passage,
The flow path area of the throttle portion when the first valve body is located at the closed position is larger than that when the first valve body is located at the open position. The first flow path includes a connection flow path and a cylindrical flow path,
The connection channel connects the cylindrical channel and the inflow port,
The cylindrical flow path extends in parallel with the second flow path and surrounds the second flow path and the connection position;
The valve according to claim 1, wherein the closed position of the first valve body is provided at the connection position, and the first valve body is configured to close the second flow path at the connection position. . The cylindrical flow path includes a connection point to which the connection flow path is connected,
The connection flow path includes a cross flow path extending in a direction intersecting with a straight line passing through the connection point and the center of the cylindrical flow path in a plane perpendicular to the cylindrical flow path and including the connection point. The valve according to claim 2. A diaphragm connected to the first valve body and the first actuator;
4. The valve according to claim 1, wherein the second flow path is opened and closed by the first valve body when the diaphragm is reciprocated by the first actuator. 5. A substrate holding mechanism for holding the substrate;
A processing liquid supply mechanism that includes the valve according to claim 1 and supplies a processing liquid to a substrate held by the substrate holding mechanism;
A substrate processing apparatus including a control device for controlling the valve. The treatment liquid supply mechanism is
A container for storing the processing liquid;
A discharge member for discharging the treatment liquid;
A first supply pipe connecting the container and the inlet of the valve;
A second supply pipe connecting the discharge port of the valve and the discharge member;
A circulation pipe connecting the container and the outlet of the valve;
A liquid feeding means for sending a processing liquid from the container to the valve via the first supply pipe;
The substrate processing apparatus according to claim 5, further comprising a filter that is provided in at least one of the first supply pipe and the circulation pipe and filters the processing liquid.

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