JP5555244B2 - 1,1,1,2,3−ペンタクロロプロパン及びフッ化水素の共沸混合物様組成物 - Google Patents
1,1,1,2,3−ペンタクロロプロパン及びフッ化水素の共沸混合物様組成物 Download PDFInfo
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- JP5555244B2 JP5555244B2 JP2011534737A JP2011534737A JP5555244B2 JP 5555244 B2 JP5555244 B2 JP 5555244B2 JP 2011534737 A JP2011534737 A JP 2011534737A JP 2011534737 A JP2011534737 A JP 2011534737A JP 5555244 B2 JP5555244 B2 JP 5555244B2
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- pentachloropropane
- hydrogen fluoride
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- 239000000203 mixture Substances 0.000 title claims description 63
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims description 29
- 229910000040 hydrogen fluoride Inorganic materials 0.000 title claims description 27
- ZXPCCXXSNUIVNK-UHFFFAOYSA-N 1,1,1,2,3-pentachloropropane Chemical group ClCC(Cl)C(Cl)(Cl)Cl ZXPCCXXSNUIVNK-UHFFFAOYSA-N 0.000 title claims description 14
- 238000000034 method Methods 0.000 claims description 7
- 239000007789 gas Substances 0.000 claims description 3
- 150000002894 organic compounds Chemical class 0.000 claims 2
- 239000012025 fluorinating agent Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 description 13
- 238000009835 boiling Methods 0.000 description 10
- FXRLMCRCYDHQFW-UHFFFAOYSA-N 2,3,3,3-tetrafluoropropene Chemical compound FC(=C)C(F)(F)F FXRLMCRCYDHQFW-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000004615 ingredient Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000000443 aerosol Substances 0.000 description 2
- 150000001875 compounds Chemical group 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000003380 propellant Substances 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000008241 heterogeneous mixture Substances 0.000 description 1
- 229940060367 inert ingredients Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/01—Acyclic saturated compounds containing halogen atoms containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
- C23G5/02806—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing only chlorine as halogen atom
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/191—Hydrogen fluoride
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/093—Preparation of halogenated hydrocarbons by replacement by halogens
- C07C17/20—Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms
- C07C17/202—Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms two or more compounds being involved in the reaction
- C07C17/206—Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms two or more compounds being involved in the reaction the other compound being HX
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/25—Preparation of halogenated hydrocarbons by splitting-off hydrogen halides from halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/30—Materials not provided for elsewhere for aerosols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5036—Azeotropic mixtures containing halogenated solvents
- C11D7/504—Azeotropic mixtures containing halogenated solvents all solvents being halogenated hydrocarbons
- C11D7/5045—Mixtures of (hydro)chlorofluorocarbons
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Dispersion Chemistry (AREA)
- Detergent Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は共沸混合物様組成物に関する。より詳しくは、本発明はヒドロフルオロオレフィン及びフッ化水素を含む共沸混合物様組成物に関する。
本発明の他の形態においては、フッ化水素を1,1,1,2,3−ペンタクロロプロパンと約0℃〜約60℃の温度及び約7psia〜約58psiaの圧力においてブレンドして、約1〜約95重量%のフッ化水素及び約5〜約99重量%の1,1,1,2,3−ペンタクロロプロパンから実質的に構成される共沸混合物様混合物を製造することを含む、共沸性又は共沸混合物様組成物を形成する方法が提供される。
本発明の他の形態においては、1,1,1,2,3−ペンタクロロプロパン及びフッ化水素から実質的に構成される共沸混合物様組成物を含む噴霧可能な組成物が提供される。
共沸混合物様組成物の成分に関してここで用いる「実質的に構成される」という用語は、組成物が、示されている成分を共沸混合物様の比で含み、更なる成分が新しい共沸混合物様の系を形成しないならば更なる成分を含んでいてもよいことを意味する。例えば、2種類の化合物から実質的に構成される共沸混合物様混合物は、二元共沸混合物を形成し、更なる成分が混合物を非共沸性にせず、化合物のいずれか又は両方と共沸混合物を形成しない(例えば3元共沸混合物を形成しない)ならば1以上の更なる成分を含んでいてもよいものである。
ここで用いる「分配形態」という用語は、それを一定の領域の上又は一定の体積に展開、分散、及び/又は拡散させた際の流体の物理的形態を指す。分配形態の例としては、エアロゾル及びスプレーが挙げられる。
実施例1:
約15gの1,1,1,2,3−ペンタクロロプロパン(HFC−240db)を、約23℃及び約14.4psiaにおいて85gのHF中にブレンドした。不均一な共沸混合物様の組成物の形成が観察された。
HFC−240db及びHFをブレンドして、異なる組成の不均一共沸混合物を形成した。混合物の蒸気圧を、約0、25、及び60℃において測定した。これらの測定の結果を表1に与える。
実施例3:
本実施例は、気−液−液平衡(VLLE)によるHFC−240db/HF混合物の共沸混合物様の特性を示す。
Claims (3)
- 23.09〜89.94重量%の1,1,1,2,3−ペンタクロロプロパン及び10.06〜76.91重量%のフッ化水素から構成される共沸混合物様混合物を含む組成物。
- 該共沸混合物様混合物が17.02〜54.10重量%のフッ化水素及び45.90〜82.98重量%の1,1,1,2,3−ペンタクロロプロパンから構成される、請求項1に記載の組成物。
- a.23.09〜89.94重量%の1,1,1,2,3−ペンタクロロプロパン及び10.06〜76.91重量%のフッ化水素から構成される共沸混合物様組成物を準備し;
b.1,1,1,2,3−ペンタクロロプロパンの少なくとも一部を気相中においてフッ素化剤と反応させて少なくとも1種類のフッ素化有機化合物を製造する;
ことを含む、有機化合物をフッ素化する方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11021608P | 2008-10-31 | 2008-10-31 | |
US61/110,216 | 2008-10-31 | ||
US12/607,851 | 2009-10-28 | ||
US12/607,851 US8410040B2 (en) | 2008-10-31 | 2009-10-28 | Azeotrope-like compositions of 1,1,1,2,3-pentachloropropane and hydrogen fluoride |
PCT/US2009/062481 WO2010051340A2 (en) | 2008-10-31 | 2009-10-29 | Azeotrope-like compositions of 1,1,1,2,3-pentachloropropane and hydrogen fluoride |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012507604A JP2012507604A (ja) | 2012-03-29 |
JP5555244B2 true JP5555244B2 (ja) | 2014-07-23 |
Family
ID=42129545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011534737A Active JP5555244B2 (ja) | 2008-10-31 | 2009-10-29 | 1,1,1,2,3−ペンタクロロプロパン及びフッ化水素の共沸混合物様組成物 |
Country Status (10)
Country | Link |
---|---|
US (1) | US8410040B2 (ja) |
EP (2) | EP2344433B1 (ja) |
JP (1) | JP5555244B2 (ja) |
KR (1) | KR101696639B1 (ja) |
CN (1) | CN102203038B (ja) |
ES (1) | ES2895300T3 (ja) |
MX (1) | MX2011004301A (ja) |
PL (1) | PL2344433T3 (ja) |
PT (1) | PT2344433T (ja) |
WO (1) | WO2010051340A2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8999909B2 (en) * | 2012-02-23 | 2015-04-07 | Honeywell International Inc. | Azeotropic compositions of 1,1,1,3,3-pentachloropropane and hydrogen fluoride |
KR102433757B1 (ko) * | 2020-10-20 | 2022-08-19 | 주식회사 제이에이치씨 | 비수용성 세정제 조성물 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69426837T2 (de) * | 1993-12-22 | 2001-07-19 | Daikin Industries, Ltd. | Verfahren zur reinigung von 1,1,1,3,3-pentafluoro-2,3-dichloropropan |
US6001796A (en) * | 1996-07-03 | 1999-12-14 | Alliedsignal Inc. | Azeotrope-like compositions of 1,1,1,3,3-pentafluoropropane and hydrogen fluoride |
US5710352A (en) * | 1996-09-19 | 1998-01-20 | Alliedsignal Inc. | Vapor phase process for making 1,1,1,3,3-pentafluoropropane and 1-chloro-3,3,3-trifluoropropene |
JP3518321B2 (ja) * | 1998-03-23 | 2004-04-12 | ダイキン工業株式会社 | 1,1,1,3,3−ペンタフルオロプロパンの製造方法 |
CA2333470C (en) * | 1998-06-02 | 2008-08-26 | E.I. Du Pont De Nemours And Company | Process for the production of hexafluoropropylene from cc1f2cc1fcf3 and azeotropes of cclf2cc1fcf3 with hf |
JP2000063302A (ja) * | 1998-08-18 | 2000-02-29 | Central Glass Co Ltd | フッ素化プロパンの製造方法 |
CN101284757A (zh) * | 1998-12-18 | 2008-10-15 | 索尔维公司 | 含有至少一种含氢氟烷和氟化氢的混合物的分离方法,含氢氟烷的制备方法和共沸组合物 |
ATE404513T1 (de) * | 2001-01-25 | 2008-08-15 | Honeywell Int Inc | Verfahren zur herstellung von fluorkohlenwasserstoffen |
US6524496B2 (en) * | 2001-03-21 | 2003-02-25 | Honeywell International Inc. | Azeotrope-like composition of 1,1,1,3,3-pentafluoropropane and 1-chloro-1,1,3,3,3-pentafluoropropane |
JP2004529198A (ja) * | 2001-06-01 | 2004-09-24 | ハネウェル・インターナショナル・インコーポレーテッド | 共沸混合物様組成物およびペンタフルオロエタン及び塩化水素を分離する方法 |
US9005467B2 (en) * | 2003-10-27 | 2015-04-14 | Honeywell International Inc. | Methods of replacing heat transfer fluids |
US6759381B1 (en) * | 2003-05-06 | 2004-07-06 | Honeywell International Inc. | Azeotrope-like compositions of 1-chloro-1,3,3,3-tetrafluoropropane and 1,2-dichloro-3,3,3-trifluoropropene |
CA2564991C (en) * | 2004-04-29 | 2013-03-19 | Honeywell International Inc. | Processes for synthesis of 1,3,3,3-tetrafluoropropene and 2,3,3,3-tetrafluoropropene |
US8058486B2 (en) * | 2004-04-29 | 2011-11-15 | Honeywell International Inc. | Integrated process to produce 2,3,3,3-tetrafluoropropene |
US7265082B2 (en) * | 2004-08-04 | 2007-09-04 | Honeywell International Inc. | Azeotrope-like compositions of 1,1,1,3,3-pentachloropropane and carbon tetrachloride |
WO2007079431A2 (en) * | 2006-01-03 | 2007-07-12 | Honeywell International Inc. | Method for producing fluorinated organic compounds |
CN103553871A (zh) | 2006-10-31 | 2014-02-05 | 纳幕尔杜邦公司 | 氟丙烷、卤代丙烯以及2-氯-3,3,3-三氟-1-丙烯与hf的共沸组合物和1,1,1,2,2-五氟丙烷与hf的共沸组合物的制备方法 |
US7795480B2 (en) * | 2007-07-25 | 2010-09-14 | Honeywell International Inc. | Method for producing 2-chloro-3,3,3,-trifluoropropene (HCFC-1233xf) |
-
2009
- 2009-10-28 US US12/607,851 patent/US8410040B2/en active Active
- 2009-10-29 KR KR1020117011431A patent/KR101696639B1/ko active IP Right Grant
- 2009-10-29 JP JP2011534737A patent/JP5555244B2/ja active Active
- 2009-10-29 EP EP09824112.8A patent/EP2344433B1/en active Active
- 2009-10-29 CN CN200980143596.8A patent/CN102203038B/zh active Active
- 2009-10-29 PT PT98241128T patent/PT2344433T/pt unknown
- 2009-10-29 ES ES09824112T patent/ES2895300T3/es active Active
- 2009-10-29 EP EP21201049.0A patent/EP3974407A1/en active Pending
- 2009-10-29 MX MX2011004301A patent/MX2011004301A/es active IP Right Grant
- 2009-10-29 WO PCT/US2009/062481 patent/WO2010051340A2/en active Application Filing
- 2009-10-29 PL PL09824112T patent/PL2344433T3/pl unknown
Also Published As
Publication number | Publication date |
---|---|
ES2895300T3 (es) | 2022-02-18 |
US8410040B2 (en) | 2013-04-02 |
CN102203038A (zh) | 2011-09-28 |
WO2010051340A2 (en) | 2010-05-06 |
CN102203038B (zh) | 2014-12-31 |
JP2012507604A (ja) | 2012-03-29 |
WO2010051340A3 (en) | 2010-07-22 |
EP2344433A4 (en) | 2015-12-30 |
KR20110090937A (ko) | 2011-08-10 |
EP2344433A2 (en) | 2011-07-20 |
EP3974407A1 (en) | 2022-03-30 |
PT2344433T (pt) | 2021-11-05 |
US20100113323A1 (en) | 2010-05-06 |
WO2010051340A4 (en) | 2010-09-10 |
KR101696639B1 (ko) | 2017-01-16 |
MX2011004301A (es) | 2011-05-30 |
PL2344433T3 (pl) | 2022-01-31 |
EP2344433B1 (en) | 2021-10-06 |
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