JP5532597B2 - Manufacturing method of polarizing diffractive element and polarizing diffractive element - Google Patents

Description

  The present invention relates to a method for manufacturing a polarizing diffraction element and a polarizing diffraction element.

  An optical disk device is an optical information recording / reproducing device that has been greatly expanded in recent years due to non-contact, a large amount of information per unit volume, high-speed accessibility, low cost, etc., taking advantage of these features, Various recording media have been developed. For example, information can be written only once with a laser, such as a compact disc (CD), laser disc (LD), CD-ROM, DVD-ROM, etc. that reproduces pre-recorded information as sound, images or computer programs. Optical pickup devices have been developed that are compatible with magneto-optical disks (MO), DVD-RAM, DVD-RW, and the like that can repeatedly record and reproduce information, such as CD-R and DVD-R that can reproduce information.

  In such an optical system of an optical pickup device, various optical components are incorporated and used in order to reduce the size and performance of the device. For example, lasers, diffraction gratings, wave plates, half mirrors, polarizing diffractive elements, objective lenses, and the like that are light sources are examples of typical components.

  Among these components, the polarizing diffractive element is an optical component for blocking so-called return light that transmits laser light, which is linearly polarized light, in the forward path but not in the return path. The polarizing diffraction element is conventionally manufactured using a glass substrate or a plastic substrate (see, for example, Patent Documents 1 and 2) or an optically anisotropic crystal substrate such as lithium niobate. Those are known (for example, see Patent Document 3). All of these are manufactured through a photolithography process and an etching process.

  However, in the case of being manufactured through a photolithography process or an etching process as described above, only a single-wafer substrate can be used as a substrate due to device limitations. For this reason, since it can be produced only by so-called batch processing, continuous productivity is poor. In addition, the photolithography process and the etching process are based on the premise that there is a material that can be removed by photoresist or etching, and the manufacturing process of the polarizing diffractive element is complicated. There was a problem.

It is known that a polarizing diffraction element is manufactured by combining an isotropic material and an anisotropic material. Regarding materials having anisotropy, Patent Document 3 describes the use of an optically anisotropic crystal substrate such as lithium niobate, and Patent Documents 1 and 2 use a liquid crystal material. Have been described. The example of Patent Document 1 describes a method of rubbing an alignment film as an alignment method when a liquid crystal material that is an organic material is used. However, when rubbing is performed, the surface of the alignment film is mechanically rubbed with a rubbing cloth, so that fine particles are generated and the substrate is contaminated.
JP-A-11-066415 JP 2004-133074 A JP 11-295524 A

The present invention has been made in view of the above-described problems of the prior art, and is excellent in continuous productivity, excellent in economic efficiency, and excellent in the optical properties of the obtained polarizing diffraction element. An object of the present invention is to provide a production method and to provide a polarizing diffraction element obtained by the production method.

  As a result of intensive studies to achieve the above-mentioned problems, the present inventors filled a concave portion of a substrate on which a pattern in which concave portions and convex portions are continuously formed by a transfer method was formed with a specific compound. The polarizing diffractive element obtained by the method for producing a polarizing diffractive element having a step of orienting a material having optical anisotropy by forming a filling part and further stretching the material different from the convex part and the filling part. It was found that the optical characteristics were excellent by comprising

  In addition, the manufacturing method does not include a rubbing process because it does not include a rubbing process, and is therefore economical, and does not require a photolithography process or an etching process. The present invention was completed by finding that there are few restrictions and excellent in continuous productivity and economy.

  That is, in the method for producing a polarizing diffraction element of the present invention, (I) a pattern in which concave portions and convex portions are continuously formed by transfer is formed on at least one surface of a substrate (a), and a member (b) is formed. (II) filling the recess with at least the compound (C) to obtain a member (c) having a filling portion, and (III) stretching the member (c) to obtain a member (d). One of the part derived from the convex part and the part derived from the filling part has optical isotropy, and the other has optical anisotropy. It is characterized by having.

It is preferable that the pattern in which the concave portion and the convex portion are continuously formed is formed by transferring directly to at least one surface of the substrate (a).
Moreover, the pattern in which the said recessed part and the convex part were formed continuously apply | coated the composition containing a compound (B) on the said board | substrate (a), and the coating film formed from this composition was obtained. It is also preferable that the film is formed after being transferred to the coating film.

  In the polarizing diffraction element obtained by the method for producing a polarizing diffraction element of the present invention, the part derived from the convex part has optical isotropy, and the part derived from the filling part has optical anisotropy. Or a portion derived from the convex portion has optical anisotropy, and a portion derived from the filling portion has optical isotropy.

  In the polarizing diffraction element obtained by the method for producing a polarizing diffraction element of the present invention, the portion derived from the convex portion has optical isotropy, and the portion derived from the filling portion has optical anisotropy The compound (C) is preferably an ultraviolet curable liquid crystal monomer having optical anisotropy, and the compound (B) is preferably an ultraviolet curable (meth) acrylic monomer.

  In the polarizing diffraction element obtained by the method for producing a polarizing diffraction element of the present invention, the part derived from the convex part has optical anisotropy, and the part derived from the filling part has optical isotropy The compound (B) is preferably an ultraviolet curable liquid crystal monomer having optical anisotropy, and the compound (C) is preferably an ultraviolet curable (meth) acrylic monomer.

The substrate (a) is preferably made of a thermoplastic resin.
The substrate (a) is preferably made of a cyclic olefin resin.
The polarizing diffraction element of the present invention is manufactured by the above-described manufacturing method of a polarizing diffraction element.

INDUSTRIAL APPLICABILITY According to the present invention, a method for producing a polarizing diffraction element that is excellent in continuous productivity, excellent in economic efficiency, and excellent in the optical properties of the obtained polarizing diffraction element, and the polarizing diffraction element obtained by the production method Can be provided.

  The polarizing diffraction element can be suitably used as an optical component incorporated in an optical pickup device or the like.

Hereinafter, the present invention will be specifically described.
In the method for producing a polarizing diffraction element of the present invention, (I) a step of obtaining a member (b) by forming a pattern in which concave portions and convex portions are continuously formed by transfer on at least one surface of a substrate (a). (II) A step of filling the recess with at least the compound (C) to obtain a member (c) having a filling portion, and (III) a step of stretching the member (c) to obtain a member (d). In the polarizing diffraction element, one of the part derived from the convex part and the part derived from the filling part has optical isotropy, and the other has optical anisotropy. It is characterized by.

  Note that (I) a step of obtaining a member (b) by forming a pattern in which concave portions and convex portions are continuously formed by transfer on at least one surface of a substrate (a), (I) step, (II) The step of filling the concave portion with at least the compound (C) to obtain a member (c) having a filling portion includes the step (II), the step (III) of stretching the member (c) and obtaining the member (d) ( III) Also referred to as a process.

  In the step (I), a method of forming a pattern in which the concave and convex portions are continuously formed on at least one surface of the substrate (a) by transfer is roughly divided into two modes. That is, a pattern in which the concave and convex portions are continuously formed is formed by transferring directly to at least one surface of the substrate (a), and the concave and convex portions are continuously formed. The pattern is formed by applying a composition containing the compound (B) on the substrate (a), obtaining a coating film formed from the composition, and then transferring the pattern to the coating film. is there.

  In the polarizing diffraction element obtained by the manufacturing method of the present invention as described above, one of the part derived from the convex part and the part derived from the filling part has optical isotropy, and the other is optically anisotropic. Has a direction. That is, in the polarizing diffraction element obtained by the production method of the present invention, the part derived from the convex part has optical isotropy, and the part derived from the filling part has optical anisotropy or the convex part. The part derived from the part has optical anisotropy, and the part derived from the filling part has optical isotropy.

<Process (I)>
The step (I) of the method for producing a polarizing diffraction element of the present invention includes (I) forming a pattern in which concave and convex portions are continuously formed by transfer on at least one surface of a substrate (a), It is a process of obtaining a member (b).

The member (b) obtained in this step is a member having a pattern in which concave portions and convex portions are continuously formed on at least one side. A schematic diagram of the member (b) is shown in FIG.
The substrate (a) used in the present invention is usually made of the following transparent resin (A), preferably made of a thermoplastic resin, more preferably made of a cyclic olefin resin.

(Transparent resin (A))
As said transparent resin (A), if it is transparent in the laser wavelength at the time of using the polarizing diffraction element obtained by the manufacturing method of this invention, it can use without a restriction | limiting especially.

Examples of the transparent resin (A) include triacetyl cellulose (TAC), PMMA, PS
PC, PES, PSU, thermoplastic resins such as cyclic olefin resins, ultraviolet curable resins, and the like can be used. As the transparent resin (A), an optically isotropic material is usually used. In addition, the optically isotropic material in the present invention strictly exhibits a slight optical anisotropy when subjected to the heating and stretching step described later. However, the birefringence value of the optically isotropic material referred to here is 1/10 or less of the birefringence value of the optically anisotropic material described later, and in relative comparison with the optically anisotropic material described later, It can be regarded as an isotropic material.

  In the manufacturing method of the polarizing diffraction element of the present invention, since the stretching is performed in the step (III), the transparent resin (A) is required to stretch according to the set stretching ratio when stretching. In addition, extending | stretching is normally performed under a heating. The stretching performed under heating is also referred to as heating stretching.

  In order to perform heat stretching, a thermoplastic resin having a heat distortion temperature is usually used as the transparent resin (A), but an ultraviolet curable resin having an appropriately prepared structure can be used. As the ultraviolet curable resin, for example, an ultraviolet curable (meth) acrylic resin described later can be used.

  Among these, as the transparent resin (A), a cyclic olefin-based resin is preferable from the viewpoints of heat resistance, durability, and processability. As a cyclic olefin-type resin, the glass transition temperature (Tg) used as the parameter | index of a heat deformation temperature is 90-200 degreeC normally, Preferably it is 100-190 degreeC, More preferably, it is 110-180 degreeC. A Tg of 110 ° C. or higher is preferable because the obtained polarizing diffraction element has excellent heat resistance. When Tg is less than 90 ° C., the heat distortion temperature becomes low, which may cause a problem in heat resistance, and a problem that a change in optical characteristics due to temperature in the obtained film becomes large may occur. is there. On the other hand, when Tg exceeds 200 ° C., there is a problem that coloring due to oxidative degradation occurs when processing into a film shape, resulting in a decrease in optical characteristics, or processing temperature becomes too high during stretching. , (III) The member (c) used when performing a process may deteriorate.

  Here, the glass transition temperature (Tg) is the maximum peak temperature of the differential differential scanning calorimetry curve obtained when measured in a nitrogen atmosphere using a differential scanning calorimeter (DSC) at a heating rate of 20 ° C./min ( A point) and a temperature of −20 ° C. from the maximum peak temperature (B point) are plotted on the differential scanning calorimetry curve, and the intersection of the tangent line on the baseline starting from B point and the tangent line starting from A point Desired.

(Substrate (a))
The substrate (a) used in the present invention is usually made of the transparent resin (A).
The substrate (a) used in the present invention may be in the form of a single wafer or may have an elongated shape in the longitudinal direction. In the case of a so-called roll shape having a long shape in the longitudinal direction, it is more preferable from the viewpoint of continuous productivity, but it is also preferable to cut the shape of the sheet after forming the roll shape. In addition, since the substrate (a) is a substrate made of the transparent resin (A), it is softer than a glass substrate or a crystal substrate and can be easily formed into a roll shape, and is preferably punched into a desired shape. It is preferable because it can be easily processed. In the case of a roll shape, the width of the substrate (a) is not particularly limited, but in view of industrial handling, it is preferably 300 to 2200 mm, more preferably 500 to 1500 mm. If the width is narrower than 300 mm, it is not preferable from the viewpoint of economical productivity, and if the width is wider than 2200 mm, the apparatus used for manufacturing becomes large, which is inefficient as actual production. Further, the thickness of the substrate (a) is not particularly limited as long as the form as an optical component can be maintained, but in the case of a roll shape, it is preferably 10 to 500 μm, more preferably 50 to 300 μm, and most preferably. Is 80-200 μm. If the thickness is less than 30 μm, the rigidity as a substrate is weak, which is not preferable. If the thickness exceeds 300 μm, it is difficult to form a roll shape, and the winding length when the roll shape is formed becomes short. Furthermore, it is not preferable because continuous productivity is lowered. Furthermore, it is not preferable because burrs and cracks are likely to occur when processing such as punching. In the case of a single wafer, the width and length are preferably 3 to 100 cm, more preferably 5 to 80 cm in view of industrial handling. Note that the width and the length do not need to match, and may be set to a size that can be easily processed. For example, when the A4 size is used to form a single wafer, the size is 21 cm × 30 cm. In the case of a single wafer, if the width and length are less than 3 cm, it is not preferable because industrial productivity is lacking, and if the width and length exceeds 100 cm, the apparatus becomes large and lacks workability. On the contrary, it is not preferable because productivity becomes poor.

(Pattern formation method)
In the step (I), a pattern in which concave portions and convex portions are continuously formed by transfer is formed on at least one surface of the substrate (a) to obtain a member (b). As a method for forming the pattern, for example, it may be directly transferred to at least one surface of the substrate (a), and a composition containing the compound (B) is applied on the substrate (a) and formed from the composition. Examples thereof include a method of transferring a pattern to the coating film after obtaining the coating film. That is, a pattern in which the concave and convex portions are continuously formed is formed by transferring directly to at least one surface of the substrate (a), and the concave and convex portions are continuously formed. A pattern formed by applying a composition containing the compound (B) on the substrate (a) to obtain a coating film formed from the composition, and then transferring the pattern to the coating film. There is.

  A schematic view of a member (b) in which a pattern in which concave and convex portions are continuously formed is directly transferred to a substrate (a) made of the transparent resin (A) is shown in FIG. After applying the composition containing the compound (B) on the substrate (a) made of the transparent resin (A) to obtain a coating film formed from the composition, a member ( A schematic diagram of b) is shown in FIG.

  As a method of forming a pattern in which concave portions and convex portions are continuously formed by transfer on at least one surface of the substrate (a), the concave portions and convex portions are continuously formed on the substrate (a) itself. A pattern transfer method (hereinafter referred to as transfer method B) or a composition containing the compound (B) is applied onto the substrate (a), and the coating film formed from the composition has concave and convex portions. There is a method of transferring a continuously formed pattern (hereinafter referred to as transfer method A).

  In addition, the width | variety of the convex part and recessed part of the pattern which the member (b) obtained by (I) process has is represented by L / (L + S) when the width of a convex part is represented by L and the width of a recessed part is represented by S. Is preferably 0.4 ≦ {L / (L + S)} ≦ 0.6, more preferably 0.45 ≦ {L / (L + S)} ≦ 0.55. In particular, the case where L = S, that is, the case where the width of the convex portion and the width of the concave portion coincide is particularly preferable. Further, the width L of the convex portion is preferably 1 μm ≦ L ≦ 10 μm, more preferably 1 μm ≦ L ≦ 5 μm, and most preferably 1 μm ≦ L ≦ 3 μm. The recess width S is also preferably 1 μm ≦ S ≦ 10 μm, more preferably 1 μm ≦ S ≦ 5 μm, and most preferably 1 μm ≦ S ≦ 3 μm. When the width L of the convex part and the width S of the concave part are selected, it is preferable because a desired polarization diffraction ability can be obtained. In addition, the depth of the concave portion of the pattern is generally in the range of 1 to 10 μm, although the design differs depending on the wavelength of the laser used and the material type used.

Transfer method B
In the transfer method B, a pattern in which concave portions and convex portions are continuously formed is transferred to the substrate (a) itself. As a transfer method, a method (press molding method) in which a mold in which concave portions and convex portions prepared in advance are continuously formed while the substrate (a) is heated to a temperature equal to or higher than the thermal deformation temperature is pressed. As a method of pressure bonding, a method of processing a single wafer substrate (a) using a flat plate mold, a method of continuously processing a roll shape substrate (a) using a roll shape mold, or a flat plate mold is used. For example, a method of continuously batch-processing the roll-shaped substrate (a) while intermittently transporting the substrate is preferably used. As the mold, a mold in which a concave portion and a convex portion are continuously formed is preferably used. The material of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as a desired pattern can be produced. However, the material is made of metal such as nickel, silicon, or transparent such as synthetic quartz. A thing etc. are used preferably. In addition, in order to improve mold release after being in close contact with the coating film in order to impart a shape, the mold surface on which concave and convex portions are continuously formed has a fluorine-based or silicone-based release economy. It is also preferable to perform a release treatment by coating or the like. The shape of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as a desired pattern such as a flat plate shape or a roll shape can be produced. When the substrate is in the form of a roll, a plate or a roll-shaped mold may be used.

Transcription method A
In the transfer method A, a composition containing the compound (B) is first applied on the substrate (a). At this time, a known coating method can be employed without limitation as a method of applying. Specific coating methods include, for example, spin coating, lip coating, comma coating, roll coating, die coating, blade coating, dip coating, bar coating, casting film formation, gravure coating Method and printing method. Among these, from the viewpoint of thickness accuracy and mass productivity, a comma coating method, a gravure coating method, or the like is preferably used.

  The thickness of the applied material is not particularly limited as long as a desired pattern can be applied, but is preferably 1 to 30 μm, more preferably 1 to 20 μm, and most preferably 1 to 15 μm for the purpose of ensuring thickness accuracy. The design of the pattern recess depth varies depending on the wavelength of the laser used and the type of material used, but is generally in the range of 1 to 10 μm. Therefore, it is preferable to control the thickness of the applied material within the above-mentioned range because the design can be made economically without using unnecessary materials while ensuring the thickness accuracy.

The applied material becomes a coating film that is used for pattern formation after being appropriately subjected to a treatment such as heating.
As a method for imparting a pattern in which concave and convex portions are continuously formed to the coating film formed of the material, a mold in which concave and convex portions are continuously formed is preferably used. The material of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as a desired pattern can be produced. However, the material is made of metal such as nickel, silicon, or transparent such as synthetic quartz. A thing etc. are used preferably. In addition, in order to improve mold release after being in close contact with the coating film in order to impart a shape, the mold surface on which concave and convex portions are continuously formed has a fluorine-based or silicone-based release economy. It is also preferable to perform a release treatment by coating or the like. The shape of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as a desired pattern such as a flat plate shape or a roll shape can be produced. When the substrate is in the form of a roll, a plate or a roll-shaped mold may be used.

(Composition containing compound (B))
In the step (I), a pattern in which the concave portion and the convex portion are continuously formed is applied on the substrate (a) by applying a composition containing the compound (B), and the coating is formed from the composition. The composition containing the compound (B) in the case of being formed by being transferred to the coating film after obtaining the film is not particularly limited, and the portion derived from the convex portion has optical isotropy. A portion derived from the filling portion has optical anisotropy; a portion derived from the convex portion has optical anisotropy; and a portion derived from the filling portion has optical isotropy and The composition that can be used is different.

  The coating film formed from the composition containing the compound (B) is preferably formed from the transparent resin (B). That is, in the present invention, the transparent resin (B) is formed from a composition containing the compound (B). The transparent resin (B) is transparent at the laser wavelength when using the polarizing diffraction element obtained by the production method of the present invention and has a desired optical isotropy or optical anisotropy. It can be used without particular limitation.

  When manufacturing a polarizing diffraction element using the composition containing a compound (B), the part derived from the said convex part of a polarizing diffraction element originates in the composition containing a compound (B). Hereinafter, the case where the part derived from the convex part has optical isotropy and the case where the part derived from the convex part has optical anisotropy are described separately.

  When the portion derived from the convex portion has optical isotropy, examples of the transparent resin (B) include triacetyl cellulose (TAC), PMMA, PS, PC, PES, PSU, and cyclic olefin resin. These thermoplastic resins, ultraviolet curable resins and thermosetting resins can be used. Silicon-based, epoxy-based, (meth) acrylic-based, oxetane-based, and melamine-based resins can be used as the ultraviolet curable resin or thermosetting resin. The resin is not particularly limited as long as it is an optically isotropic resin. However, from the viewpoint of producing a polarizing diffraction element continuously and economically, it is preferable to include an ultraviolet curable resin, which can be transparent or optical. From the viewpoint of easily obtaining isotropic properties, the ultraviolet curable resin is more preferably a resin composed of an ultraviolet curable (meth) acrylic monomer (also referred to as an ultraviolet curable (meth) acrylic resin).

  As a compound (B), the said transparent resin (B) itself may be sufficient, and the monomer etc. for forming the said transparent resin (B) may be sufficient. Examples of the monomer include ultraviolet curable (meth) acrylic monomers. When the compound (B) is an ultraviolet curable (meth) acrylic monomer, a composition containing the compound (B) is applied onto the substrate (a), and dried as necessary. By irradiating and curing the UV curable (meth) acrylic monomer, a coating film formed from a resin composed of the UV curable (meth) acrylic monomer which is the transparent resin (B) is formed. The

  When the compound (B) itself has fluidity, the composition containing the compound (B) used in the present invention may be a compound (B) alone or a mixture containing two or more compounds (B). In order to further improve the coating property, a solution to which a solvent is added may be used as the composition. When using the solution which added the solvent as a composition containing a compound (B), after apply | coating this composition, it is preferable to volatilize a solvent by heating. In addition, it is preferable to perform volatilization of a solvent before performing ultraviolet curing.

  Although it depends on the type of the compound (B), the heating temperature at the time of volatilization of the solvent is preferably 40 to 150 ° C., more preferably 50, considering the heat resistance of the transparent resin (A). ~ 140 ° C. If the heating temperature exceeds 150 ° C., the substrate (a) coated with the composition containing the compound (B) may be deformed, and conversely, if the heating temperature is less than 40 ° C., the solvent remains without volatilization. This is not preferable. Further, within the above temperature range, the heating temperature may be increased stepwise.

  In order to obtain a resin (ultraviolet curable (meth) acrylic resin) composed of the ultraviolet curable (meth) acrylic monomer, the ultraviolet curable (meth) acrylic monomer is subjected to ultraviolet curing. preferable. An ultraviolet curable (meth) acrylic monomer is used as the compound (b), and a photopolymerization initiator (photo radical generator) described later is added to the composition containing the compound (B) in order to perform the ultraviolet curing. It is preferable to be made.

The ultraviolet curable (meth) acrylic monomer is not particularly limited as long as it is a (meth) acrylate compound having at least one (meth) acryloyl group in the molecule. For example, as a (meth) acrylate compound, a monofunctional (meth) acrylate compound and a polyfunctional (meth) acrylate compound are mentioned.

  In the present invention, the (meth) acrylate compound refers to at least one compound selected from the group consisting of acrylate compounds and methacrylate compounds, and the (meth) acryloyl group refers to a group consisting of acryloyl groups and methacryloyl groups. At least one group selected is shown.

Specific examples of the monofunctional (meth) acrylate compound include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, tert -Butyl (meth) acrylate, pentyl (meth) acrylate, amyl (meth) acrylate, isoamyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate, 2 -Ethylhexyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate , Alkyl (meth) acrylates such as lauryl (meth) acrylate, stearyl (meth) acrylate, isostearyl (meth) acrylate;
Hydroxyalkyl (meth) acrylates such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate and hydroxybutyl (meth) acrylate; phenoxyethyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate and the like Of phenoxyalkyl (meth) acrylates;
Alkoxyalkyl (meth) acrylates such as methoxyethyl (meth) acrylate, ethoxyethyl (meth) acrylate, propoxyethyl (meth) acrylate, butoxyethyl (meth) acrylate, methoxybutyl (meth) acrylate;
Polyethylene glycol (meth) acrylates such as polyethylene glycol mono (meth) acrylate, ethoxydiethylene glycol (meth) acrylate, methoxypolyethylene glycol (meth) acrylate, phenoxypolyethylene glycol (meth) acrylate, nonylphenoxypolyethylene glycol (meth) acrylate;
Polypropylene glycol (meth) acrylates such as polypropylene glycol mono (meth) acrylate, methoxypolypropylene glycol (meth) acrylate, ethoxypolypropylene glycol (meth) acrylate, nonylphenoxy polypropylene glycol (meth) acrylate;
Cyclohexyl (meth) acrylate, 4-butylcyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentadienyl (meth) acrylate, bornyl (meth) acrylate, isobornyl ( Cycloalkyl (meth) acrylates such as (meth) acrylate and tricyclodecanyl (meth) acrylate;
Examples include benzyl (meth) acrylate; tetrahydrofurfuryl (meth) acrylate and the like. These monofunctional (meth) acrylate compounds can be used individually by 1 type or in mixture of 2 or more types.

Specific examples of the polyfunctional (meth) acrylate compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, 1,4 -Alkylene glycol di (meth) acrylates such as butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate;
Trimethylolpropane tri (meth) acrylate, trimethylolpropane trihydroxyethyl tri (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa Poly (meth) acrylates of polyhydric alcohols such as (meth) acrylate and hydroxypivalate neopentyl glycol di (meth) acrylate;
Isocyanurate poly (meth) acrylates such as isocyanurate tri (meth) acrylate, tris (2-hydroxyethyl) isocyanurate di (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate;
Poly (meth) acrylates of cycloalkanes such as tricyclodecanediyldimethyldi (meth) acrylate;
Di (meth) acrylate of bisphenol A ethylene oxide adduct, di (meth) acrylate of propylene oxide adduct of bisphenol A, di (meth) acrylate of alkylene oxide adduct of bisphenol A, ethylene oxide addition of hydrogenated bisphenol A Di (meth) acrylate, di (meth) acrylate of propylene oxide adduct of hydrogenated bisphenol A, di (meth) acrylate of alkylene oxide adduct of hydrogenated bisphenol A, bisphenol A diglycidyl ether and (meth) acrylic (Meth) acrylate derivatives of bisphenol A such as (meth) acrylate obtained from acids;
3,3,4,4,5,5,6,6-octafluorooctanedi (meth) acrylate, 3- (2-perfluorohexyl) ethoxy-1,2-di (meth) acryloylpropane, Nn Fluorine-containing (meth) acrylates such as -propyl-N-2,3-di (meth) acryloylpropyl perfluorooctylsulfonamide;
Urethane (meth) acrylates obtained by reacting polyol (a) having the following bisphenol structure, organic polyisocyanate (b), and hydroxyl group-containing (meth) acrylate (c);
(A) Examples of the polyol having a bisphenol structure include alkylene oxide addition diol of bisphenol A, alkylene oxide addition diol of bisphenol F, alkylene oxide addition diol of hydrogenated bisphenol A, alkylene oxide addition diol of hydrogenated bisphenol F, and the like. . Of these, bisphenol A alkylene oxide addition diols are preferred. Examples of these commercial products include DA-400 and DB-400 manufactured by NOF Corporation.
(B) As organic polyisocyanate, diisocyanate is preferable, for example, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylylene diisocyanate, 1,4-xylylene diisocyanate, 1,5- Naphthalene diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate, 3,3'-dimethyl-4,4'-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-dimethylphenylene diisocyanate, 4,4'- Biphenylene diisocyanate etc. are mentioned. Among these, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylylene diisocyanate, and 1,4-xylylene diisocyanate are particularly preferable.
(C) Hydroxyl group-containing (meth) acrylates include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenyloxypropyl (meth) ) Acrylate, 1,4-butanediol mono (meth) acrylate, 2-hydroxyalkyl (meth) acryloyl phosphate, 4-hydroxycyclohexyl (meth) acrylate, 1,6-hexanediol mono (meth) acrylate, neopentyl glycol Mono (meth) acrylate, trimethylolpropane di (meth) acrylate, trimethylolethane di (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) a And the like can be given Relate. Of these, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and the like are preferable.

These polyfunctional (meth) acrylate compounds can be used individually by 1 type or in mixture of 2 or more types.
Among these polyfunctional (meth) acrylate compounds, dipentaerythritol hexaacrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate, trimethylolpropane triacrylate, etc. have many acryloyl groups contained in one molecule, and the crosslinking density A polyfunctional (meth) acrylate compound that can improve the thickness and give excellent film hardness is particularly preferred.

  When the ultraviolet curable (meth) acrylic monomer is used as the compound (B), when the coating film is formed, the ultraviolet curable (meth) acrylic monomer is polymerized (cured), and ultraviolet curable. A resin composed of a type (meth) acrylic monomer is used, but it is preferable to use a photopolymerization initiator (photoradical generator) when performing the polymerization. That is, it is preferable that a photopolymerization initiator (photo radical generator) is contained in the composition containing the compound (B).

  Specific examples of the photopolymerization initiator (photo radical generator) include 1-hydroxycyclohexyl phenyl ketone, 2,2′-dimethoxy-2-phenylacetophenone, xanthone, fluorene, fluorenone, benzaldehyde, anthraquinone, triphenylamine, and carbazole. 3-methylacetophenone, 4-chlorobenzophenone, 4,4′-dimethoxybenzophenone, 4,4′-diaminobenzophenone, Michler's ketone, benzoylpropyl ether, benzoin ethyl ether, benzyldimethyl ketal, 1- (4-isopropylphenyl)- 2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1-phenylpropan-1-one, thioxanthone, diethylthioxanthone, 2-isopropylthiol Xanthone, 2-chlorothioxanthone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2-benzyl-2-dimethyl Examples include amino-1- (4-morpholinophenyl) butan-1-one and 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methylpropan-1-one. These photopolymerization initiators (photo radical generators) can be used alone or in combination of two or more.

  Among these photopolymerization initiators (photo radical generators), 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2,4,6-trimethylbenzoyldiphenylphosphine oxide 1-hydroxycyclohexyl phenyl ketone is preferred.

  Moreover, a commercial item can be used for such a photoinitiator (photoradical generator). For example, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one is Irgacure 907 (manufactured by Ciba Specialty Chemicals Co., Ltd.), and 1-hydroxycyclohexyl phenyl ketone is It can be obtained as Irgacure 184 (manufactured by Ciba Specialty Chemicals).

  The addition amount of the photopolymerization initiator (photo radical generator) is preferably 10% by mass or less, more preferably 5% by mass or less, with respect to 100% by mass of the ultraviolet curable (meth) acrylic monomer. Most preferably, it is 3 mass% or less. When the addition amount exceeds 10% by mass, the unreacted photopolymerization initiator remains and the influence on the physical properties of the polarizing diffraction element cannot be ignored.

  Examples of a light source for performing ultraviolet curing include a metal halide lamp and a high-pressure mercury lamp. In addition, ultraviolet irradiation may be performed from the coating film side (surface on which a pattern is formed, surface having a pattern), or may be performed from the surface side on which no pattern is formed. Moreover, when forming a pattern continuously, it is preferable to irradiate an ultraviolet-ray from the other side of the said mold, ie, the surface side in which the pattern of a board | substrate (a) is not formed.

  When the portion derived from the convex portion has optical anisotropy, for example, a liquid crystal material is preferably used as the transparent resin (B). Among liquid crystal materials, an ultraviolet curable liquid crystal is preferably used from the viewpoint of producing a polarizing diffraction element continuously and economically. The ultraviolet curable liquid crystal is usually obtained by irradiating a composition containing an ultraviolet curable liquid crystal monomer, which will be described later, with ultraviolet rays after appropriately drying.

  The compound (B) may be the transparent resin (B) itself, or a monomer for forming the transparent resin (B). Examples of the monomer include the ultraviolet curable liquid crystal monomer. When the compound (B) is an ultraviolet curable liquid crystal monomer, a composition containing the compound (B) is applied onto the substrate (a), dried as necessary, and then irradiated with ultraviolet rays. By coating the ultraviolet curable liquid crystal monomer with ultraviolet rays, a coating film formed from the ultraviolet curable liquid crystal as the transparent resin (B) is formed.

  When the compound (B) itself has fluidity, the composition containing the compound (B) used in the present invention may be a compound (B) alone or a mixture containing two or more compounds (B). In order to further improve the coating property, a solution to which a solvent is added may be used as the composition. When using the solution which added the solvent as a composition containing a compound (B), after apply | coating this composition, it is preferable to volatilize a solvent by heating. In addition, it is preferable to perform volatilization of a solvent before performing ultraviolet curing.

  Although it depends on the type of the compound (B), the heating temperature at the time of volatilization of the solvent is preferably 40 to 150 ° C., more preferably 50, considering the heat resistance of the transparent resin (A). ~ 140 ° C. If the heating temperature exceeds 150 ° C., the substrate (a) coated with the composition containing the compound (B) may be deformed, and conversely, if the heating temperature is less than 40 ° C., the solvent remains without volatilization. This is not preferable. Further, within the above temperature range, the heating temperature may be increased stepwise.

  In order to obtain the ultraviolet curable liquid crystal, it is preferable to perform ultraviolet curing of the ultraviolet curable liquid crystal monomer. In order to perform the ultraviolet curing using an ultraviolet curable liquid crystal monomer as the compound (B), a composition containing the compound (B) is added with a photopolymerization initiator (photo radical generator) described later. It is preferable to become.

  The ultraviolet curable liquid crystal monomer is not particularly limited, and a monomer obtained by introducing one or more acrylate groups and / or methacrylate groups into a nematic liquid crystal or smectic liquid crystal can be used.

  Examples of such UV curable liquid crystal monomers include azoxy liquid crystals, cyanobiphenyl liquid crystals, Schiff liquid crystals, cyanophenyl ester liquid crystals, cyanophenyl cyclohexane liquid crystals, benzoic acid phenyl ester liquid crystals, cyclohexane carboxylic acid. Examples thereof include ultraviolet curable liquid crystal monomers in which one or more acrylate groups and / or methacrylate groups are introduced into a low molecular liquid crystal such as a phenyl ester liquid crystal, a phenyl pyrimidine liquid crystal, and a phenyl dioxane liquid crystal. These ultraviolet curable liquid crystal monomers may be used alone or in combination of two or more.

  In order to obtain a cured product (ultraviolet curable liquid crystal) of the ultraviolet curable liquid crystal monomer, it is preferable to perform ultraviolet curing. In order to carry out ultraviolet curing, the composition containing the compound (B) is preferably added with a photopolymerization initiator (photo radical generator). In the composition containing the compound (B) in the case where the portion derived from the convex portion has optical isotropy as a photopolymerization initiator, when the ultraviolet curable (meth) acrylic monomer is polymerized (cured) The thing similar to the photoinitiator (photoradical generator) which can be used can be used.

  The addition amount is preferably 10% by mass or less, more preferably 5% by mass or less, and most preferably 3% by mass or less with respect to 100% by mass of the ultraviolet curable liquid crystal monomer of the present invention. When the addition amount exceeds 10% by mass, the influence of the unreacted photopolymerization initiator on the physical properties of the polarizing diffraction element such as the liquid crystal transition temperature cannot be ignored.

  Examples of a light source for performing ultraviolet curing include a metal halide lamp and a high-pressure mercury lamp. In addition, ultraviolet irradiation may be performed from the coating film side (surface on which a pattern is formed, surface having a pattern), or may be performed from the surface side on which no pattern is formed. Moreover, when forming a pattern continuously, it is preferable to irradiate an ultraviolet-ray from the other side of the said mold, ie, the surface side in which the pattern of a board | substrate (a) is not formed.

  The transparent resin (A), the transparent resin (B) and the transparent resin (C) to be described later include an antioxidant, a heat stabilizer, a light stabilizer, an ultraviolet absorber, and an antistatic agent as necessary. In addition, known additives such as an antifoaming agent and a surfactant can be added as long as the effects of the invention are not impaired.

<Process (II)>
The step (II) of the method for producing a polarizing diffraction element of the present invention is a step of filling the concave portion with at least the compound (C) to obtain a member (c) having a filling portion.

  A schematic diagram of the member (c) obtained in the step (II) is shown in FIG. In FIG. 2, as an example of the member (c), the member (c) obtained from the member (b) in which a pattern in which concave portions and convex portions are continuously formed is directly transferred to the substrate (a). The schematic diagram of is shown. In FIG. 2, the drawing direction in the step (III) described later is also shown.

  The method of filling the recesses with at least the compound (C) is not particularly limited, but usually, by applying a composition containing the compound (C) to the surface having the pattern of the member (b). Done. In FIG. 2, only the concave portion is filled, but actually, at the same time as filling the concave portion, the composition containing the compound (C) is applied to the upper portion of the convex portion, and the upper portion of the convex portion. In some cases, compound (C) may be present.

  That is, in the step (II), a composition containing the compound (C) is usually applied so as to fill the concave portion, and the concave portion is filled with at least the compound (C). The method for applying the composition containing the compound (C) is not particularly limited, and a known coating method can be employed without limitation. Specific coating methods include, for example, spin coating, lip coating, comma coating, roll coating, die coating, blade coating, dip coating, bar coating, casting film formation, gravure coating Method and printing method. Among these, from the viewpoint of thickness accuracy and mass productivity, a comma coating method, a gravure coating method, or the like is preferably used. Moreover, you may apply in a pressure-reduced environment in order to make it easier to fill the said recessed part with the composition containing the compound (C).

(Composition containing compound (C))
The composition containing the compound (C) used in the step (II) is not particularly limited, and the portion derived from the convex portion has optical isotropy, and the portion derived from the filling portion is optically different. The composition that can be used is different between the case where it has anisotropy and the case where the portion derived from the convex portion has optical anisotropy and the portion derived from the filling portion has optical isotropy. .

  The filling part of the member (c) is preferably formed from a transparent resin (C). That is, in the present invention, the transparent resin (C) is formed from a composition containing the compound (C). The transparent resin (C) is transparent at the laser wavelength when using the polarizing diffraction element obtained by the production method of the present invention, and has a desired optical isotropy or optical anisotropy. It can be used without particular limitation.

  When manufacturing a polarizing diffraction element using the composition containing a compound (C), the part derived from the said filling part of a polarizing diffraction element originates in the composition containing a compound (C). Hereinafter, the case where the portion derived from the filling portion has optical isotropy and the case where the portion derived from the convex portion has optical anisotropy are described separately.

  The case where the part derived from the filling part has optical anisotropy is a case where the part derived from the convex part has optical isotropy, and the composition containing the compound (C) includes the convex part. The part similar to the composition containing the compound (B) in the case where the part derived from has optical anisotropy is used.

  Moreover, the case where the part derived from the said filling part has optical isotropy is a case where the part derived from the said convex part has optical anisotropy, As a composition containing a compound (C), The same composition as that containing the compound (B) in the case where the portion derived from the convex portion has optical isotropy is used.

<Process (III)>
The (III) process which the manufacturing method of the polarizing diffraction element of this invention has is a process of extending member (c) and obtaining member (d).

  Since the member (c) can be stretched and the optically anisotropic material can be oriented by the step (III), the member (d) obtained by the step (III) has polarization diffractive power. The polarizing diffraction element obtained by the method for producing a polarizing diffraction element can be imparted with a desired polarization diffraction ability.

  As a method of stretching the member (c), a method of heating and stretching the member (c) is usually used. The heat-drawing method is preferable because it produces less foreign matter and can be produced with high yield. As the stretching, uniaxial stretching is usually used. In addition, the extending | stretching direction in the (III) process was shown in FIG.

  As a method of stretching the member (c), (1) a method of uniaxial stretching in the longitudinal direction of the member (c) under heating (hereinafter also referred to as the method of (1)), (2) a member under heating. The method of uniaxially stretching in the width direction of (c) (hereinafter also referred to as the method of (2)) is preferable.

  When the member (c) is stretched, it is preferable that the heating temperature at the time of stretching is precisely controlled over the entire stretched portion of the member (c). For example, in the uniaxial stretching in the longitudinal direction in the method (1), that is, longitudinal uniaxial stretching, the temperature distribution is within the set temperature ± 0.6 ° C., preferably within the set temperature ± 0.4 ° C., more preferably the set temperature ± It is desirable to carry out in an oven controlled within 0.2 ° C.

Here, the set temperature may be equal in all regions in the oven, or may be a temperature in which distribution is provided stepwise or in a gradient manner. When the set temperature is a temperature having a distribution, the actual temperature distribution in the oven and the set temperature distribution are within ± 0.6 ° C., preferably within ± 0.4 ° C., more preferably It is desirable to be within ± 0.2 ° C.

  The set temperature of the uniaxial stretching in the longitudinal direction is that of each component constituting the member (c) (transparent resin (A), composition containing compound (C), composition containing compound (B) used as necessary). What is necessary is just to set by the kind, the draw ratio and the draw speed, the thickness of the member (c), the desired retardation of the optically anisotropic material after drawing, and the like. When the transparent resin (A) to constitute is a thermoplastic resin, the glass transition temperature (Tg) can be used as a reference as an index of the thermal deformation temperature of the thermoplastic resin. The set temperature is usually in the range of (Tg−10 ° C.) to (Tg + 70 ° C.), preferably in the range of (Tg ± 0 ° C.) to (Tg + 50 ° C.) with reference to this Tg. Such a temperature range is preferable because the member (c) can be stretched without causing thermal degradation and without breaking.

  In the method (1), the stretching ratio of the uniaxial stretching in the longitudinal direction is, for example, 1.03 to 1.5 times, preferably 1.05 to 1.3 times, and particularly preferably 1.1 to 1.2 times. Range. When the draw ratio is less than 1.03, the optically anisotropic material is not preferable because it does not have a desired orientation. When the draw ratio exceeds 1.5, the concave and convex portions formed in the step (I) This is not preferable because defects such as cracks are generated in a pattern in which is continuously formed.

The stretching speed of the uniaxial stretching in the longitudinal direction in the method (1) is, for example, 2 to 100 m / min, preferably 5 to 50 m / min.
In the member (d) obtained in the step (III), the maximum refractive index direction in the surface of the member (d) of the optically anisotropic material uniaxially stretched in the longitudinal direction is usually relative to the longitudinal direction of the member (d). It is in the range of 0 ± 3 degrees, preferably in the range of 0 ± 2 degrees, more preferably in the range of 0 ± 1 degrees, and most preferably in the range of 0 ± 0.5 degrees.

  When the step (III) is performed by the method (2), the member (c) is uniaxially stretched in the width direction. By performing the uniaxial stretching in the width direction, that is, the lateral uniaxial stretching under temperature control more precise than the uniaxial stretching in the longitudinal direction, a polarizing diffractive element that is homogeneous over the entire surface can be suitably obtained. For example, uniaxial stretching in the width direction is performed in an oven in which the temperature distribution is controlled within a set temperature ± 0.5 ° C, preferably within a set temperature ± 0.3 ° C, more preferably within a set temperature ± 0.2 ° C. It is desirable to do it.

  Here, the set temperature of the uniaxial stretching in the width direction may be the same temperature in the whole region in the oven as in the case of the uniaxial stretching in the longitudinal direction, or a temperature in which the distribution is provided stepwise or in a gradient. Also good. When the set temperature is a temperature having a distribution, the actual temperature distribution in the oven and the set temperature distribution are within ± 0.5 ° C, preferably within ± 0.3 ° C, more preferably It is desirable to be within ± 0.2 ° C. The set temperature in the width direction uniaxial stretching may be the same as or different from the set temperature in the longitudinal direction uniaxial stretching process.

  The set temperature of the uniaxial stretching in the width direction is not particularly limited as in the case of uniaxial stretching in the longitudinal direction. For example, when the transparent resin (A) constituting the member (c) is a thermoplastic resin, Based on the glass transition temperature (Tg) of the thermoplastic resin, it is usually in the range of (Tg-10 ° C) to (Tg + 70 ° C), preferably in the range of (Tg ± 0 ° C) to (Tg + 50 ° C).

The draw ratio of the uniaxial stretching in the width direction may be determined according to the desired characteristics of the polarizing diffraction element to be produced. In the case of the method (2), for example, 1.02 to 1.4 times, preferably The range is 1.04 to 1.25 times, particularly preferably 1.05 to 1.2 times. When the draw ratio is less than 1.02, it is not preferable because the optically anisotropic material does not appear well and uniformly, and when the draw ratio exceeds 1.4, the concave and convex portions formed in the step (I) This is not preferable because defects such as cracks occur in a continuously formed pattern.

The stretching speed of the uniaxial stretching in the width direction is, for example, 2 to 100 m / min, preferably 5 to 50 m / min.
In the method (2), the in-plane maximum refractive index direction of the obtained member (d) is usually in the range of 0 ± 3 degrees, preferably in the range of 0 ± 2 degrees with respect to the width direction of the member (d). More preferably, it is in the range of 0 ± 1 degree, and most preferably in the range of 0 ± 0.5 degree.

  In the heating and stretching step of such a polarizing diffraction element, each component constituting the member (c) (transparent resin (A), a composition containing the compound (C), and a compound (B) used as necessary is used. Each of the uniaxial stretching in the longitudinal direction and the uniaxial stretching in the width direction are selected in consideration of characteristics such as polymer species, copolymerization ratio, molecular weight distribution, and heat distortion temperature (glass transition temperature). The properties of the polarizing diffractive element obtained can be controlled by selecting the set temperature in the oven, selecting the draw ratio, and the draw speed. The width of the pattern recesses and protrusions and the depth of the pattern recesses are reduced by the stretching process, but the polarization diffraction is adjusted by adjusting the shape after the stretching process to be in the range described above. The characteristics of the element can be controlled.

  The polarizing optical element obtained by the production method of the present invention is suitably used as an optical component incorporated in an optical pickup device or the like. In such an optical component through which the laser beam passes, the laser beam is not distorted when the laser beam passes through, so that the smoothness of the component is required. As such a smoothness index, transmitted wavefront aberration (entire RMS, λrms) is used. In the polarizing optical element obtained by the manufacturing method of the present invention, a smooth substrate (a) is used. Since a precise material application (filling) step ((II) step) and a precise stretching step ((III) step) have been performed, sufficient smoothness can be secured. The transmitted wavefront aberration of the polarizing optical element obtained by the production method of the present invention is preferably 25 mλ or less, more preferably 20 mλ or less, and most preferably 15 mλ or less as a full-surface RMS value when the light diameter is 2 mmφ at the DVD wavelength. is there. A surface RMS value exceeding 25 mλ is not preferable because the emitted laser light is distorted and the read / write performance of the optical pickup device is degraded.

<Antireflection treatment>
The polarizing diffraction element obtained by the production method of the present invention may be the member (d) itself obtained in the step (III), but usually further has an antireflection layer.

  The polarizing diffraction element obtained by the production method of the present invention preferably has an antireflection layer. The antireflection layer is formed by applying a thermosetting resin composition or a photocurable resin composition by a known coating method such as gravure coating, die coating, or slot coating, drying as necessary, and then curing. can do. It can also be formed by sputtering or vapor deposition. These layers may be provided on one side of the member (d) or on both sides. Moreover, you may provide in the side which does not form the pattern of a board | substrate (a) previously, and may provide in the surface which does not have the pattern of a member (b), or a member (c).

  The antireflection layer is usually composed of a low refractive index layer, and may further have a laminated structure of a low refractive index layer and a high refractive index layer to further improve the antireflection performance, and further ensure scratch resistance. Therefore, you may have a hard-coat layer. The lamination order is preferably from the outermost layer side of the polarizing element, preferably in the order of hard coat layer / high refractive index layer / low refractive index layer. If necessary, an intermediate refractive index layer may be provided between the low refractive index layer and the high refractive index layer, or between the hard coat layer and the high refractive index layer.

  Examples of the composition for forming the low refractive index layer and the high refractive index layer include known curable compositions. For example, the binder resin contains at least one epoxy resin, phenol resin, melamine resin, alkyd resin, cyanate resin, acrylic resin, polyester resin, urethane resin, siloxane resin, and the like, The composition for forming a low refractive index layer contains a fluorine-containing compound, and the composition for forming a high refractive index layer is a high refractive index inorganic particle, for example, a metal such as silica, alumina, titania, zirconia, ceria, scandia, magnesium fluoride, etc. Contains oxide particles.

  The refractive index and thickness of the low refractive index layer and the high refractive index layer are used in a known range, but in order to enhance the antireflection effect at the wavelength used, the refractive index of the low refractive index layer (average at 25 ° C., wavelength 589 nm). (Refractive index) is preferably 1.45 or less, and the thickness of the low refractive index layer is preferably 50 to 300 nm. The refractive index of the high refractive index layer (average refractive index at 25 ° C. and wavelength 589 nm) is preferably a refractive index larger by 0.05 or more than the refractive index of the low refractive index layer, and the thickness is 50 to 10, 000 nm is preferable.

  The polarizing diffraction element of the present invention is an element obtained by the above-described method for manufacturing a polarizing diffraction element. The manufacturing method is an economical manufacturing method, and since the polarization diffraction performance is highly controlled over the entire surface, the polarizing diffraction element obtained by the manufacturing method is an optical component incorporated in an optical pickup device or the like. Can be suitably used.

EXAMPLES Hereinafter, although this invention is demonstrated further more concretely based on an Example, this invention is not limited to these Examples. Each property was measured and evaluated as follows.
(1) Normal light transmittance and extraordinary light transmittance Using RETS-1200VA manufactured by Otsuka Electronics Co., Ltd., the normal light transmittance and the extraordinary light transmittance of the polarizing diffraction element were measured under the condition of a light diameter of 5 mmφ.

(2) Wavefront aberration The entire surface RMS (λrms) was measured as the wavefront aberration of the polarizing diffractive element using a laser interferometer R-10 manufactured by Fujinon Co., Ltd. and using a laser beam having a wavelength of 656 nm and a light diameter of 2 mmφ.

(3) The surface opposite to the surface provided with the reflectance antireflection layer is painted with black spray, and a spectral reflectance measuring device (a spectrophotometer U-3410 incorporating a large sample chamber integrating sphere attachment device 150-09090, (Manufactured by Hitachi, Ltd.), the reflectance of the polarizing diffraction element at wavelengths of 660 nm and 785 nm was measured from the antireflection layer side and evaluated. Specifically, the reflectance was measured at 660 nm and 785 nm, with the reflectance of the deposited aluminum film as a reference (100%).

(4) Glass transition temperature (Tg )
Using a DSC6200 manufactured by Seiko Instruments Inc., the temperature increase rate was measured at 20 ° C. per minute under a nitrogen stream. The Tg of the resin is plotted on the differential scanning calorific value maximum peak temperature (point A) and the temperature at −20 ° C. from the maximum peak temperature (point B) on the differential scanning calorimetry curve. And the intersection of the tangent starting from point A. The Tg of the ultraviolet curable acrylic resin was determined by measuring the glass transition temperature as a cured film using a forced resonance vibration type dynamic viscoelasticity measuring apparatus. Specifically, the loss tangent was measured at a rate of temperature increase of 3 ° C./min while applying vibration with a frequency of 10 Hz to the cured film. The temperature at which the loss tangent showed the maximum value was defined as the glass transition temperature (Tg).

(5) Hydrogenation rate As a nuclear magnetic resonance spectrometer (NMR), AVANCE 500 manufactured by Bruker was used, and ¹ H-NMR was measured using d-chloroform as a measurement solvent. 5.1-5.8 ppm of vinylene groups, 3
. From the integral value of 7 ppm methoxy group and 0.6 to 2.8 ppm aliphatic proton, the composition of the monomer was calculated, and then the hydrogenation rate of the resin was calculated.

(6) Weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn)
Gel permeation chromatography (Tosoh Co., Ltd. HLC-8220GPC, column: Tosoh Co., Ltd. guard column H _XL- H, TSK gel G7000H _XL , TSKgel GMH _XL , TSK gel G2000H _XL , sequentially connected, solvent: Tetrahydrofuran, flow rate: 1 mL / min, sample concentration: 0.7 to 0.8% by mass, injection amount: 70 μL, measurement temperature: 40 ° C., detector: RI (40 ° C.), standard material: manufactured by Tosoh Corporation Using TSK standard polystyrene, the weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn) of the resin were measured. The Mn is a number average molecular weight.

(7) Residual solvent amount A sample (film) was dissolved in methylene chloride, and the resulting solution was analyzed using gas chromatography (Shimadzu GC-7A).

(8) Logarithmic viscosity Using an Ubbelohde viscometer, in chloroform (sample concentration: 0.5 g / dL), 30 ° C.
The logarithmic viscosity of the resin was measured.

(9) Saturated water absorption Based on ASTM D570, the sample (resin) was immersed in water at 23 ° C. for 1 week, and the change in mass before and after immersion was measured and determined.

(10) total light transmittance was using Haze Suga Test Instruments Co. haze meter (HGM-2DP type) measuring the total light transmittance of the film.

[Synthesis Example 1] (Production of Resin (A-1) (Cyclic Olefin Resin))
8-methyl-8-methoxycarbonyltetracyclo [4.4.0.1 ^2,5 . 1 ^7,10 ] −
Using 225 parts by mass of 3-dodecene (DNM) and 25 parts by mass of bicyclo [2.2.1] hept-2-ene (norbornene) as monomers, 27 parts by mass of 1-hexene (molecular weight regulator) , Together with 750 parts by mass of toluene (solvent for ring-opening polymerization reaction), the reaction vessel was purged with nitrogen, and this solution was heated to 60 ° C. Subsequently, 0.62 parts by mass of a toluene solution of triethylaluminum (1.5 mol / liter) as a polymerization catalyst and tungsten hexachloride modified with tert-butanol and methanol (tert-butanol: methanol: Ring addition polymerization reaction was performed by adding 3.7 parts by mass of a toluene solution (concentration 0.05 mol / liter) of tungsten = 0.35 mol: 0.3 mol: 1 mol) and heating and stirring this solution at 80 ° C. for 3 hours. To obtain a ring-opening polymer solution. The polymerization conversion rate in this polymerization reaction was 97%.

1,000 parts by mass of the ring-opening polymer solution thus obtained was charged into an autoclave, and 0.12 mass of RuHCl (CO) [P (C ₆ H ₅ ) ₃ ] ₃ was added to the ring-opening polymer solution. A hydrogenation reaction was carried out by heating and stirring for 3 hours under the conditions of a hydrogen gas pressure of 100 kg / cm ² and a reaction temperature of 165 ° C.

After cooling the obtained reaction solution (hydrogenated polymer solution), the hydrogen gas was released. The reaction solution was poured into a large amount of methanol to separate and recover the coagulated product, and dried to obtain a hydrogenated polymer (hereinafter referred to as “resin (A-1)”).

The hydrogenation rate measured by ¹ H-NMR of the resin (A-1) thus obtained was 9
9.9%, Tg measured by DSC method is 130 ° C., Mn by polystyrene conversion measured by GPC method is 20,800, Mw is 62,000, Mw / Mn is 3.00, and saturated water absorption at 23 ° C. is The logarithmic viscosity in chloroform at 0.21% and 30 ° C. was 0.51 dl / g.

[Synthesis Example 2] (Production of Resin (A-2) (Cyclic Olefin Resin))
Tetracyclo [4.4.0.1 ^2,5 . 1 ^7,10 ] -3-dodecene 53 parts and 8-ethylidenetetracyclo [4.4.0.1 ^2,5 . 1 ^7,10 ] -3-dodecene (46 parts) and tricyclo [
4.3.0.1 ^2,5 ] -deca-3,7-diene and 66 parts of 1-hexene (molecular weight regulator) and toluene as a solvent for the ring-opening polymerization reaction. A hydrogenated polymer (hereinafter referred to as “resin (A-2)”) was obtained in the same manner as in Synthesis Example 1 except that cyclohexane was used instead of.

  With respect to the obtained resin (A-2), the hydrogenation rate was 99.9%, the glass transition temperature (Tg) was 125 ° C., Mn was 30,000, Mw was 122,000, and the molecular weight distribution (Mw / Mn) was 4.07 and logarithmic viscosity was 0.63 dl / g.

[Synthesis Example 3] (Synthesis of Resin (A-3) (Cyclic Olefin Resin))
A reaction vessel purged with nitrogen using 71 parts by weight of DNM, 15 parts by weight of dicyclopentadiene (DCP), and 1 part by weight of norbornene as a monomer, together with 18 parts by weight of molecular weight regulator 1-hexene and 200 parts by weight of toluene And heated to 100 ° C.

To this, 0.005 parts by mass of triethylaluminum and 0.005 parts by mass of methanol-modified WCl ₆ (anhydrous methanol: PhPOCl ₂ : WCl ₆ = 103: 630: 427 mass ratio) were added and reacted for 1 minute, and then 10 parts by mass of DCP. And 5 parts by mass of NB were added in 5 minutes, and the reaction was further continued for 45 minutes to obtain a copolymer of DNM / DCP / NB = 69.77 / 26.01 / 4.23 (wt%). .

Next, the obtained copolymer solution was placed in an autoclave, and 200 parts of toluene was further added. Next, 1 part by mass of octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate as a reaction modifier and RuHCl (CO) [
After adding 0.006 parts by mass of P (C ₆ H ₅ )] ₃ and heating to 155 ° C., hydrogen gas was charged into the reactor, and the pressure was adjusted to 10 MPa. Thereafter, the reaction was carried out at 165 ° C. for 3 hours while maintaining the pressure at 10 MPa. After completion of the reaction, 100 parts by mass of toluene, 3 parts by mass of distilled water, 0.72 parts by mass of lactic acid, and 0.00214 parts by mass of hydrogen peroxide were added and heated at 60 ° C. for 30 minutes. Thereafter, 200 parts by mass of methanol was added and heated at 60 ° C. for 30 minutes. When this was cooled to 25 ° C., it was separated into two layers. Remove 500 parts by mass of the supernatant, again add 350 parts by mass of toluene and 3 parts by mass of water and heat at 60 ° C. for 30 minutes, then add 240 parts by mass of methanol and heat at 60 ° C. for 30 minutes to cool to 25 ° C. Separated into two layers. Remove 500 parts by mass of the supernatant, further add 350 parts by mass of toluene and 3 parts by mass of water, heat at 60 ° C. for 30 minutes, then add 240 parts by mass of methanol and heat at 60 ° C. for 30 minutes to cool to 25 ° C. Separated into two layers. Finally, after removing 500 parts by mass of the supernatant, the remaining polymer solution was filtered using 2.0 μm, 1.0 μm, and 0.2 μm filters. Thereafter, the solid content of the polymer was concentrated to 55%, the solvent was removed at 250 ° C., 4 torr, and the residence time of 1 hour, and the polymer was passed through a 10 μm polymer filter to obtain a copolymer (hereinafter referred to as “resin (A -3) ").

The hydrogenation rate measured by ¹ H-NMR of the resin (A-3) thus obtained was 9
9.9%, Tg measured by DSC method is 131 ° C., Mn by polystyrene conversion measured by GPC method is 16,000, Mw is 61,000, Mw / Mn is 3.81, and saturated water absorption at 23 ° C. is The logarithmic viscosity in chloroform at 0.18% and 30 ° C. was 0.52 dl / g.

[Synthesis Example 4] (Synthesis of urethane acrylate)
In a reaction vessel equipped with a stirrer, 49.96 parts by mass of 2-phenoxyethyl acrylate, 0.01 parts by mass of 2,6-di-t-butyl-p-cresol, di-n-butyltin dilaurate 04 parts by mass and 17.74 parts by mass of tolylene diisocyanate were added and cooled to 5 to 15 ° C. When the temperature reached 10 ° C. or lower, 11.84 parts by mass of 2-hydroxyethyl acrylate was added dropwise with stirring, and the mixture was stirred for 1 hour while controlling the liquid temperature at 20 to 35 ° C. Thereafter, 20.40 parts by mass of bisphenol A alkylene oxide-added diol (DA-400 manufactured by Nippon Oil & Fats Co., Ltd.) was charged, and the reaction was continued at 55 to 65 ° C. for 3 hours. The reaction was terminated and urethane acrylate was obtained.

[Adjustment Example 1] (Preparation of UV curable acrylic resin)
Each component was charged into a reaction vessel equipped with a stirrer at the following blending ratio (parts by mass), and stirred at 50 ° C. for 1 hour to obtain a liquid composition. The specific blending ratio was 9.8 parts by mass of urethane acrylate obtained in Synthesis Example 6, 13.7 parts by mass of trimethylolpropane triacrylate, 29.4 parts by mass of tris (2-hydroxyethyl) isocyanuric acid acrylate, 32.3 parts by mass of polyoxyalkylene bisphenol A diacrylate, 4.9 parts by mass of a mixture of dipentaerythritol hexaacrylate / dipentaerythritol pentaacrylate, 7.8 parts by mass of N-vinyl-2-pyrrolidone, 1-hydroxycyclohexyl phenyl 1.5 parts by weight of ketone, 0.3 parts by weight of thiodiethylenebis (3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate), 0.1 part by weight of diethylamine, polyoxyalkylene alkyl ether phosphorus 0.3 parts by mass of an acid ester, It was 100.1 parts by weight on the total. The viscosity of the ultraviolet curable acrylic material as the obtained liquid composition was 540 mPa · s at 25 ° C. using a rotational viscometer according to JIS K7117, and the Tg of the resin after UV curing was 120 ° C. It was.

[Production Example 1] (Production of substrate (a-1))
Resin (A-1) obtained in Synthesis Example 1 and pentaerythrityl tetrakis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate] as an antioxidant were mixed with a twin-screw extruder (Toshiba). Extruded using Machine Co., Ltd .; TEM-48), the resin strand discharged from the strand die was cooled in a cooling water tank, then sent to a strand cutter, cut into rice granules, and granulated resin (transparent resin (A- 1)) was obtained. The addition amount of the antioxidant was 0.1 part by mass with respect to 100 parts by mass of the resin.

This granulated resin was dried at 100 ° C. for 4 hours in a nitrogen atmosphere, then sent to a single-screw extruder (90 mmΦ), and melted at 260 ° C., and quantitative extrusion was performed with a gear pump, with a nominal opening of 10 μm. Using a metal fiber sintered filter manufactured by Nippon Seisen Co., Ltd., melt filtration is performed, and a coat hanger die (1700 mm width) is used to form a film at 260 ° C. with a gap at the coat hanger die outlet of 0.5 mm. Extruded. The die land length (the length of the parallel part of the die exit) of the die used at this time was 20 mm. The distance from the die exit to the roll crimping point is set to 65 mm, and the extruded film is sandwiched between a 250 mmφ mirror surface roll with a surface roughness of 0.1 S and a metal belt with a thickness of 0.3 mm to gloss the film surface. Transferred to the surface. The metal belt (width 1650 mm) is held by a rubber-coated roll (the diameter of the roll to be held is 150 mmΦ) and a cooling roll (roll diameter 150 mm), and a commercially available sleeve type transfer roll (manufactured by Chiba Machine Industry) is used. And transcribed. The roll interval during transfer was 0.35 mm, and the transfer pressure was 0.35 MPa.

  The peripheral speed of the outer periphery of the mirror surface roll at this time was 10 m / min. At this time, the temperature of the mirror surface roll was set to 125 ° C. using an oil temperature controller, and the temperature of the rubber coating roll was set to 115 ° C.

  On the downstream side of the mirror roll, a cooling roll having a diameter of 250 mm was arranged, and the film peeled off from the mirror roll was cooled for 2.1 seconds until it was pressure-bonded to the cooling roll set at 115 ° C. Thereafter, the film was peeled off at a peeling tension of 0.4 MPa · cm, a masking film was bonded to one surface, and wound up with a winder to obtain a resin film having a thickness of 130 μm (hereinafter referred to as “substrate (a-1)”. ) "). The residual solvent amount of the obtained film was 0.1%, the total light transmittance was 93%, and the glass transition temperature (Tg) was 130 ° C.

[Production Example 2] (Production of substrate (a-2))
In Production Example 1, a resin film having a thickness of 100 μm was obtained in the same manner as in Production Example 1 except that the resin (A-2) obtained in Synthesis Example 2 was used instead of the resin (A-1) ( Hereinafter, referred to as “substrate (a-2)”. The film obtained had a residual solvent amount of 0.1%, a total light transmittance of 93%, and a glass transition temperature (Tg) of 124 ° C.

[Production Example 3] (Production of substrate (a-3))
In Production Example 1, a resin film having a thickness of 130 μm was obtained in the same manner as in Production Example 1 except that the resin (A-3) obtained in Synthesis Example 3 was used instead of the resin (A-1). (Hereinafter referred to as “substrate (a-3)”). The film obtained had a residual solvent amount of 0.1%, a total light transmittance of 93%, and a glass transition temperature (Tg) of 131 ° C.

[Example 1]
On the board | substrate (a-1) obtained by manufacture example 1, the ultraviolet curable acrylic material obtained by the adjustment example 1 was apply | coated using the 200-mesh small diameter gravure roll with the INVEX laboratory coater by Inoue Metal Industry. Subsequently, the pattern in which the recessed part and the convex part were continuously formed was transcribe | transferred on the coating surface using the transfer roll prepared so that the pattern in which the concave part and the convex part were continuously formed was transcribe | transferred. At the same time as transferring, ultraviolet rays are irradiated from the side having no pattern with an energy amount of 500 mJ / cm 2 to form a pattern in which concave portions and convex portions are continuously formed, and a member ( b-1) was obtained. The width of the convex portion was 2.5 μm, the width of the concave portion was 2.5 μm, and the depth of the concave portion was 2.6 μm. Next, RMS03-013C, which is an ultraviolet curable liquid crystal material manufactured by Merck Co., Ltd., is applied to the formed recess using an INVEX lab coater manufactured by Inoue Metal Industry using a 200-mesh small-diameter gravure roll, and passes through a drying path. Allowed to dry. RMS03-013C is commercially available from Merck as a mixture containing an ultraviolet curable liquid crystal monomer, a photopolymerization initiator, a solvent, and the like.

After drying, the filled portion is formed by irradiating and curing ultraviolet rays with an energy amount of 500 mJ / cm @ 2 from the side having no pattern using a high-pressure mercury lamp, and forming a filling part (c-
1) was obtained.

Next, a film (member (c-1) that does not fix the width direction of the film (member (c-1)) at a drawing speed of 5 m / min and a draw ratio of 1.1 times in a tank at a temperature of 130 ° C. in a drawing machine furnace. )) Uniaxial stretching in the longitudinal direction was performed to obtain a member (d-1). Antireflection treatment was performed on both surfaces of the obtained member (d-1) to obtain a polarizing diffraction element (1). The polarizing diffraction element (1) thus obtained has an ordinary light transmittance of 98.5% at a wavelength of 660 nm and 98.4% at a wavelength of 785 nm, and an extraordinary light transmittance of 1.5% at a wavelength of 660 nm and a wavelength of 785 nm. And 3.2%. The reflectance is 660 n on the surface having the pattern and the filling portion (pattern side).
It was 0.1% at m, 0.2% at a wavelength of 785 nm, 0.2% at 660 nm on the substrate (a-1) side (substrate side) surface, and 0.2% at a wavelength of 785 nm. As a result of measuring the wavefront aberration, it was found that λrms = 12 mλ and a flat surface was formed.

[Example 2]
While intermittently transporting the substrate (a-2) obtained in Production Example 2, using a nickel mold having a transfer area of 20 cm square, pressing is performed at a temperature of 230 ° C., so that the concave portion and the convex portion are continuous. The pattern thus formed was transferred to the substrate (a-2) to obtain a member (b-2). The width of the convex portion was 2.5 μm, the width of the concave portion was 2.5 μm, and the depth of the concave portion was 2.6 μm. Next, RMS03-013C, which is an ultraviolet curable liquid crystal material manufactured by Merck Co., Ltd., is applied to the formed recess using an INVEX lab coater manufactured by Inoue Metal Industry using a 200-mesh small-diameter gravure roll, and passes through a drying path. Allowed to dry.

After drying, the filled portion is formed by irradiating and curing ultraviolet rays with an energy amount of 500 mJ / cm @ 2 from the side having no pattern using a high-pressure mercury lamp, and forming a filling part (c-
2) was obtained.

  Next, the film (member (c-2)) which does not fix the width direction of the film (member (c-2)) at a drawing speed of 5 m / min and a draw ratio of 1.1 times in a tank having a temperature in a drawing machine furnace of 130 ° C. )) Uniaxial stretching in the longitudinal direction was performed to obtain a member (d-2). Antireflection treatment was performed on both surfaces of the obtained member (d-2) to obtain a polarizing diffraction element (2). The polarizing diffraction element (2) thus obtained has an ordinary light transmittance of 98.2% at a wavelength of 660 nm and 98.3% at a wavelength of 785 nm, and an extraordinary light transmittance of 1.7% at a wavelength of 660 nm and a wavelength of 785 nm. It was 3.6%. The reflectance is 0.2% at 660 nm on the surface having the pattern and the filling portion (pattern side), 0.1% at the wavelength of 785 nm, and 660 nm on the substrate (a-2) side (substrate side) surface. And 0.2% at a wavelength of 785 nm. As a result of measuring the wavefront aberration, it was found that λrms = 10 mλ and a flat surface was formed.

[Example 3]
On the substrate (a-3) obtained in Production Example 3, RMS03-013C, an ultraviolet curable liquid crystal material manufactured by Merck Co., Ltd., was prepared using an INVEX lab coater manufactured by Inoue Metal Industry using a 200-mesh small-diameter gravure roll. The ultraviolet curable acrylic material obtained in Example 1 was applied and dried by passing through a drying path. Subsequently, the pattern in which the recessed part and the convex part were continuously formed was transcribe | transferred on the coating surface using the transfer roll prepared so that the pattern in which the concave part and the convex part were continuously formed was transcribe | transferred. At the same time as transferring, ultraviolet rays are irradiated from the side having no pattern with an energy amount of 500 mJ / cm 2 to form a pattern in which concave portions and convex portions are continuously formed, and a member ( b-3) was obtained. The width of the convex portion was 2.5 μm, the width of the concave portion was 2.5 μm, and the depth of the concave portion was 2.6 μm. Next, the ultraviolet curable acrylic material obtained in Preparation Example 1 was applied to the formed recess using an INVEX laboratory coater manufactured by Inoue Metal Industry using a 200-mesh small-diameter gravure roll. After coating, the filled part was formed by irradiating and curing ultraviolet rays with an energy amount of 500 mJ / cm ² from the side having no pattern using a high-pressure mercury lamp to obtain a member (c-3). .

Next, the film (member (c-3) which does not fix the width direction of the film (member (c-3)) at a drawing speed of 5 m / min and a draw ratio of 1.1 times in a tank having a temperature in a drawing machine furnace of 130 ° C. )) Uniaxial stretching in the longitudinal direction was performed to obtain a member (d-3). Antireflection treatment was performed on both surfaces of the obtained member (d-3) to obtain a polarizing diffraction element (3). The polarizing diffraction element (3) thus obtained has an ordinary light transmittance of 99.0% at a wavelength of 660 nm and 98.8% at a wavelength of 785 nm, and an abnormal light transmittance of 1.1% at a wavelength of 660 nm and a wavelength of 785 nm. It was 3.4%. The reflectance is 0.3% at 660 nm on the surface having the pattern and the filling portion (pattern side), 0.2% at the wavelength of 785 nm, and 660 nm on the substrate (a-3) side (substrate side) surface. And 0.3% at a wavelength of 785 nm. As a result of measuring the wavefront aberration, it was found that λrms = 9 mλ and a flat surface was formed.

A schematic diagram (a) of a member (b) in which a pattern in which concave portions and convex portions are continuously formed is directly transferred to the substrate (a), and a pattern in which concave portions and convex portions are continuously formed. The schematic diagram (b) of the member (b) transferred to the coating film formed of the transparent resin (B) is shown. The schematic diagram of a member (c) is shown.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Concave part 3 ... Convex part 5 ... Transparent resin (A)
7 ... Coating film 9 formed with transparent resin (B) ... Filling portion 11 ... Stretching direction in step (III)

Claims (11)

(I) A step of obtaining a member (b) by forming a pattern in which concave portions and convex portions are continuously formed by transfer on at least one surface of the substrate (a),
(II) filling the concave portion with at least the compound (C) to obtain a member (c) having a filled portion; and (III) the member (c) in the longitudinal direction of the concave portion and the convex portion. It is a method for producing a polarizing diffraction element having a step of drawing and obtaining a member (d),
In the polarizing diffraction element, one of the part derived from the convex part and the part derived from the filling part has optical isotropy, and the other has optical anisotropy. Production method.   2. The manufacturing method for a polarizing diffraction element according to claim 1, wherein the pattern in which the concave portion and the convex portion are continuously formed is directly transferred onto at least one surface of the substrate (a). Method.   After the pattern in which the concave portion and the convex portion are continuously formed is applied on the substrate (a) with a composition containing the compound (B) to obtain a coating film formed from the composition, The method for producing a polarizing diffraction element according to claim 1, wherein the polarizing diffraction element is formed by being transferred to the coating film.   4. The polarizing diffraction element according to claim 2, wherein a portion derived from the convex portion has optical isotropy, and a portion derived from the filling portion has optical anisotropy. A method for producing a polarizing diffraction element.   4. The polarizing property according to claim 3, wherein in the polarizing diffraction element, a portion derived from the convex portion has optical anisotropy, and a portion derived from the filling portion has optical isotropy. A method for manufacturing a diffraction element.   The method for producing a polarizing diffraction element according to claim 4, wherein the compound (C) is an ultraviolet curable liquid crystal monomer having optical anisotropy.   The method for producing a polarizing diffraction element according to claim 5, wherein the compound (B) is an ultraviolet curable liquid crystal monomer having optical anisotropy.   The method for producing a polarizing diffraction element according to claim 5, wherein the compound (C) is an ultraviolet curable (meth) acrylic monomer. The method for producing a polarizing diffraction element according to any one of claims 1 to 8 , wherein the substrate (a) is made of a thermoplastic resin. The method for producing a polarizing diffraction element according to any one of claims 1 to 9 , wherein the substrate (a) is made of a cyclic olefin resin. The polarizing diffraction element manufactured with the manufacturing method of the polarizing diffraction element in any one of Claims 1-10 .

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