JP5517755B2 - Clean room partition unit and clean room partition method - Google Patents

Description

  The present invention relates to a clean room compartment unit and a clean room compartment method, and more specifically, a clean room compartment that defines a processing / processing area for processing / processing precision parts such as electronic devices or precision equipment in a clean environment. It relates to a unit and a clean room partition method.

  Generally, semiconductor devices such as IC and LSI, flat panel displays such as LCD and PDP, or clean room facilities (dust-free rooms) for manufacturing diodes such as LEDs, secondary batteries such as lithium batteries Or, in clean room facilities for manufacturing solar cell panels, etc., relatively strict air conditioning conditions such as maintenance and management of high air cleanliness, processing of a large heat load, or strict temperature and humidity management However, it is required according to the purpose and purpose of each room.

  The configuration of clean room facilities for processing and processing such precision parts or precision equipment in a clean environment has changed in connection with advances in manufacturing technology, manufacturing equipment, and manufacturing equipment of precision parts and equipment.

  For example, in an early semiconductor device manufacturing facility, a wafer is transferred in a highly clean wafer transfer chamber, and various processing apparatuses, processing apparatuses and the like (hereinafter referred to as “manufacturing apparatus”) arranged in relation to the transfer chamber. .) Was processed. A clean room facility having such a configuration is described in, for example, Japanese Utility Model Publication No. 4-99828.

  FIG. 20 is a schematic longitudinal sectional view conceptually and schematically showing the configuration of the clean room facility described in Japanese Utility Model Laid-Open No. 4-99828.

  The clean room facility includes a processing / processing chamber 101 in which the manufacturing apparatus M is accommodated, a work chamber 102 in which an operator or the like operates a control device, and a transfer chamber 103 for transferring an exposed wafer W by the transfer device T. Consists of A large number of processing / processing chambers 101 corresponding to each process or each manufacturing apparatus are provided in association with the transfer path of the transfer chamber 103.

  The clean room facility has a downflow type air conditioning system. The ceiling back space of each room constitutes an air supply plenum chamber 104, and the underfloor space of each room constitutes a return air chamber 105. An air conditioner 107 including a blower and a cooling coil is disposed in the machine room 108, and a filter unit 109 having a high performance filter such as a HEPA (High Efficiency Particulate Air) filter or a ULPA (Ultra Low Penetration Air) filter is provided in the ceiling structure. 110. Air-conditioned air that has been temperature-controlled and humidity-controlled (temperature-controlled and humidity-controlled) by the air conditioner 107 is fed into the air supply plenum chamber 104 and blown into the chambers of each room via the HEPA filter unit 109. The conditioned air flows down from the ceiling surface and returns to the air conditioner 107 through the air permeable flooring 111 and the return air chamber 105.

  The clean room facility is partitioned from the ground or lower floor by the floor slab 112, partitioned from the outside or upper floor by the upper floor slab or roof 113, and partitioned from the outside or adjacent facilities by the wall body 114. The processing / processing chamber 101, the work chamber 102, the transfer chamber 103, and the machine chamber 108 are separated from each other by a partition wall 116.

  In such a clean room facility, the environment in the transfer chamber 103 of the wafer W is set to the highest cleanliness (for example, class 100), and the environment of the processing / processing chamber 101 is set according to the installation conditions and manufacturing conditions of the manufacturing apparatus M. The corresponding cleanliness (for example, class 1000) is set, and the working chamber 102 is set to a relatively low cleanliness (for example, class 10000).

  In the configuration of such a clean room facility, the layout of the manufacturing apparatus and the design or construction plan such as the positions of the processing / processing room and the work room are largely restricted by the position of the transfer room and the transfer route. It is difficult to secure a desired degree of freedom in design.

  On the other hand, in a recent semiconductor device manufacturing facility, a wafer is stored in a transport container such as FOUP (Front-Opening Unified Pod) and is transported in the facility in a sealed state. For this reason, it becomes possible to design a processing / processing area and a work area as a single large space clean room without a high cleanliness transfer chamber and without a partition wall. The degree has greatly improved.

  FIG. 21 is a schematic longitudinal sectional view conceptually and schematically showing a configuration of a clean room facility that does not divide a processing / processing area and a work area and does not include a transfer room. FIGS. 22 and 23 are shown in FIG. It is the longitudinal cross-sectional view and top view which illustrate the structure of the clean room facility shown.

  The clean room 120 shown in FIGS. 21 to 23 includes a single large space that does not have individual processing / processing chambers and work chamber sections, and the wafer W is stored in a transfer container S such as a FOUP, and is transferred to a transfer device. Carried by T. The space in the clean room 120 does not include partition walls such as a partition wall, a partition wall, or a partition, except for a part of a space (not shown) for performing a specific process. Therefore, a desired design freedom can be obtained with respect to the layout of the manufacturing apparatus M and the like.

  This clean room facility also has a down-flow type air conditioning system, similar to the clean room facility shown in FIG. 20, the ceiling back space of the clean room 120 constitutes an air supply plenum chamber 124, and the under floor space of the clean room 120 is returned. A gas chamber 125 is configured. An auxiliary equipment installation space 140 is further disposed below the return air chamber 125. The auxiliary equipment installation space 140 and the return air chamber 125 are horizontally partitioned by the floor structure 131. An auxiliary machine N related to the manufacturing apparatus M is arranged in the auxiliary machine installation space 140, and the manufacturing apparatus M and the auxiliary machine N are connected by a pipe / wiring L.

  An air conditioner 127 incorporating a blower and a cooling coil is disposed in the machine room 128. An FFU (fan filter unit) 129 including a high performance filter and a blower is disposed on the ceiling structure 130. The conditioned air adjusted in temperature and humidity by the air conditioner 127 is fed into the air supply plenum chamber 124 and blown into the clean room 120 via the FFU 129. The conditioned air flows down from the ceiling surface and returns to the air conditioner 127 through the breathable flooring 121 and the return air chamber 125.

  The clean room 120 is partitioned from the ground or lower floor by a floor slab 132 constituting the floor of the auxiliary equipment installation space 140, is partitioned from the outside or upper floor by an upper floor slab or roof 133, and is external or adjacent facilities by a wall 134. It is divided from. The clean room 120 and the machine room 128 are separated from each other by a partition wall 136. The clean room facility includes a detoxifying device 137 (FIGS. 22 and 23) including a blower and an exhaust treatment device in order to exhaust air including pollutants, dust, and the like to the outside. The abatement device 137 is disposed in the machine room 138 adjacent to the clean room 120. The machine room 138 is partitioned from the clean room 120 by a partition wall 136.

  FIG. 24 is a schematic longitudinal sectional view conceptually and schematically showing the configuration of another clean room facility provided with a large clean room.

  The clean room facility shown in FIG. 24 is different from the above-described clean room facility (FIGS. 21 to 23) in that the auxiliary machine N is disposed in the return air chamber 125 and the auxiliary machine installation space 140 (FIG. 21) is omitted. To do. The other configuration of the clean room facility illustrated in FIG. 24 is substantially the same as the above-described clean room facility (FIGS. 21 to 23), and thus the description thereof is omitted.

  The clean room facilities having the configurations shown in FIGS. 21 to 24 are described in, for example, Japanese Patent Application Laid-Open No. 2004-108693, Japanese Patent Application Laid-Open No. 2006-336381, Japanese Patent Application Laid-Open No. 2007-212015, and the like.

Japanese Utility Model Publication No. 4-99828 JP 2004-108693 A JP 2006-336181 A JP 2007-211201 A

  According to the clean room facility having such a large space clean room, the degree of freedom in designing the manufacturing apparatus layout and the like can be greatly improved. On the other hand, the three-layer structure including the clean room, the ceiling back chamber, and the underfloor chamber is provided. Alternatively, the floor height H (FIG. 22) of the four-layered building further provided with an auxiliary machine installation space reaches about 14 to 15 m, so that the construction cost of the clean room facility tends to increase.

  In addition, since a large space clean room containing the manufacturing apparatus is set to a relatively high cleanliness (class 1000 or class 100) over the entire area, a large amount of conditioned air is required to maintain air cleanliness in the clean room. Circulates the air conditioning system constantly. For this reason, the air conditioning system requires a large amount of air conveying power or air blowing power for air circulation, and the cross section of the air conveying path is enlarged.

  Furthermore, the downflow type air conditioning system that air-conditions a large clean room is designed to uniformly control or control the temperature of the entire clean room, whereas the heat generation amount of various manufacturing equipment is related to the equipment structure and operating conditions, etc. Therefore, the heat load distribution in the clean room is not uniform. As a result of the uneven heat load distribution, the thermal efficiency of the air conditioning system decreases. Further, in the air conditioning method for uniformly controlling the entire clean room in this way, it is impossible to improve energy efficiency by stopping the air conditioning locally in accordance with the operating state. Moreover, in such a large clean room, the entire clean room is immediately affected by unexpected dust generation, generation of pollutants, gas leakage, fire, etc.

  In addition, the clean room facility of the above method requires a return air chamber that constitutes an underfloor space in the entire clean room as an air conveyance path for circulating a large amount of conditioned air. Steel structure double floor etc. is adopted as floor structure of clean room. For this reason, the floor part that supports precise vibration-proof or earthquake-resistant equipment is locally structured by a high-rigidity frame with a mechanism that prevents external vibration transmission and vibration amplification, a specially structured under-floor strut, etc. You must reinforce your body. However, such reinforcement not only complicates the structure of the floor structure and increases the construction cost of the facility, but also for a very precise vibration isolator, the desired anti-vibration effect or anti-seismic effect. It may be difficult to obtain.

  The present invention has been made in view of such problems, and the object of the present invention is to partition a large space of a clean room facility without impairing the design freedom of the layout of the manufacturing apparatus and the like. An object of the present invention is to provide a clean room compartment unit and a clean room compartment method that can reduce floor height, reduce local air conditioning control, reduce the load on the air conditioning system, prevent the diffusion of contaminants, improve the rigidity of the floor structure, and the like.

In order to achieve the above object, the present invention provides a plurality of processing / processing areas that are arranged in a large space in a building with a space therebetween and in which a manufacturing apparatus for processing / processing precision parts or precision equipment is accommodated in a clean environment. A clean room compartment unit that divides the interior into the large space,
A ceiling structure disposed below the ceiling surface of the large space with a gap, a wall structure that supports the ceiling structure, temperature control, humidity control, air circulation, and air purification of the processing / treatment area And an air conditioner that performs
The wall structure includes a plurality of self-supporting core units disposed on the floor surface of the large space at intervals and supporting the load of the ceiling structure, and an opening formed between the core units. Having a wall constituent material to be closed,
The air conditioner is disposed in the core unit,
An air supply port for supplying the air in the large space outside the partition unit to the air conditioner and a pipe / wiring connection portion to which utility piping / wiring for operating the manufacturing apparatus can be connected are outside the partition unit. The clean room compartment unit is provided on the outer wall surface of the core unit facing the space.

  According to the above configuration of the present invention, the space in each partition unit is air-conditioned by the air conditioner disposed in the core unit, and the temperature, humidity, cleanliness, air pressure, etc. of the environment in the partition unit are controlled by the air conditioning of the core unit. Controlled by machine. Since the air conditioner of the core unit takes in and adjusts the air in the large space, the air conditioner for adjusting the outside air only needs to supply the adjusted outside air to the large space. Therefore, the ceiling back chamber and the underfloor chamber constituting the air conveyance path. The floor height of the clean room facility can be greatly reduced.

  In addition, by eliminating the underfloor chamber, the floor surface of the clean room can be formed by a highly rigid floor slab such as a dirt floor or a concrete structure floor, so that the rigidity of the floor structure of the clean room is improved and vibrations transmitted to the manufacturing apparatus are transmitted. Alternatively, it is possible to reliably insulate seismic behavior and vibration with the manufacturing apparatus as a vibration source using a vibration isolator or the like.

  Furthermore, according to the said structure of this invention, the environment of the space in a division unit can be controlled to an environment different from the environment of the large space outside a division unit. For example, it is possible to control the space in the partition unit to an air cleanliness different from the air cleanliness of the large space to reduce the cleanliness of the large space, thereby reducing the air load of the air conditioning air conditioner. it can. Moreover, the heat load in the partition unit can be processed by the air conditioner of the partition unit, and the heat load of the outside air conditioning air conditioner can be reduced. Furthermore, pollutants, dust, harmful gases, etc. generated in the compartment unit are removed by the air conditioner of the compartment unit or the local exhaust equipment of the compartment unit, so that the contaminant etc. can be diffused into a large space. While preventing, the ventilation load etc. of the air-conditioning apparatus for external air adjustment can be reduced.

  Moreover, according to the partition unit having the above configuration, the form of the partition unit can be arbitrarily set in accordance with the position of the core unit, so that the processing / processing area can be reduced without impairing the design freedom of the manufacturing apparatus layout and the like. Can be partitioned. Also, the track of the transport device for transporting materials such as electronic devices, intermediate products or finished products is arranged in the upper area of the partition units, or between the partition units, and the main piping for utility piping and wiring -By arranging piping / wiring pits for accommodating wiring on the floor in parallel with the track, it is possible to relatively easily realize the arrangement of partition units that do not impair the degree of freedom in designing the manufacturing equipment layout and the like.

From another point of view, the present invention provides a plurality of processing units in which a plurality of partition units are arranged at intervals in a large space in a building, and a manufacturing apparatus for processing and processing precision parts or precision devices in a clean environment is accommodated. A clean room partitioning method in which a processing area is partitioned into the large space by the partition unit,
The outer shell of the core unit is constructed on the floor surface of the large space by a self-supporting rectangular frame obtained by integrally assembling the support and the horizontal member, and a wall material and a top plate attached to the frame.
An air conditioner for air-conditioning the processing / processing area is disposed in the outer shell, and an air supply port for supplying air in the large space outside the partition unit to the air conditioner, and operation of the manufacturing apparatus A piping / wiring connection portion capable of connecting utility piping / wiring for the outer wall surface of the core unit facing the space outside the partition unit,
A ceiling structure is supported by a plurality of the core units, and the ceiling structure is arranged at a position below the ceiling surface of the large space,
A clean room partitioning method is provided, wherein an opening formed between the core units is closed with a wall surface constituent material.

  According to such a partitioning method, the temperature / humidity, cleanliness, air pressure, etc. of the environment in the partition unit are controlled by the air conditioner of the core unit, and the form of the partition unit is arbitrarily set according to the position of the core unit. be able to. Therefore, depending on the air conditioning conditions or air conditioning capacity of the air conditioner of the core unit and the preferred setting or design related to the form and arrangement of the partition unit, the logistics (material, intermediate product or finished product) route of the entire facility, the air conditioning for outside air adjustment Adjusting the flow of outside air by equipment, optimizing the flow of people, the arrangement of equipment and equipment, the route of wiring and piping, etc., avoiding interference of these paths, and omitting the back chamber and underfloor chamber Can do.

  According to the clean room section unit and the clean room section method of the present invention, the large space of the clean room facility is partitioned without impairing the design freedom of the layout of the manufacturing apparatus, the floor height of the clean room facility is reduced, and the local air conditioning control is performed. It is possible to reduce the load on the air conditioning system, prevent the diffusion of pollutants, and improve the rigidity of the floor structure.

FIG. 1 is a schematic longitudinal sectional view (X direction) conceptually and schematically showing a configuration of a clean room facility provided with a partition unit according to a preferred embodiment of the present invention. 2 is a schematic longitudinal sectional view (Y direction) showing the configuration of the clean room facility shown in FIG. 1, and shows a cross section orthogonal to the cross section of FIG. 1. FIG. 3 is a schematic plan view of the clean room upper space constituting the air circulation / conveyance zone. FIG. 4 is a schematic plan view of the lower space of the clean room constituting the manufacturing zone. FIG. 5 is a schematic longitudinal sectional view conceptually and schematically showing the air conditioning system of the clean room facility shown in FIGS. FIG. 6 is a perspective view showing the overall configuration of the partition unit. FIG. 7 is an exploded perspective view showing the overall configuration of the partition unit. FIG. 8 is a partial longitudinal sectional view and a partial transverse sectional view of the partition unit. FIG. 9 is a partial longitudinal sectional view and a partial transverse sectional view showing a modification of the partition unit. FIG. 10 is a longitudinal sectional view showing the structure of the core unit. FIG. 11 is an exploded perspective view showing the structure of the core unit. FIG. 12 is a perspective view showing the configuration of the steel frame of the core unit. FIG. 13 is a perspective view showing a steel frame transfer method or installation method. FIG. 14 is a schematic plan view illustrating various patterns related to the arrangement of the core units. FIG. 15 is a longitudinal sectional view showing a modification of the partition unit. FIG. 16 is a plan view showing a configuration of a clean room facility according to a preferred embodiment of the present invention. FIG. 17 is a longitudinal sectional view of the clean room facility taken along the line II of FIG. 18 is a longitudinal sectional view of the clean room facility taken along line II-II in FIG. FIG. 19 is a perspective view showing the internal configuration of the clean room facility shown in FIGS. FIG. 20 is a schematic longitudinal sectional view conceptually and schematically showing the configuration of a conventional clean room facility having a transfer chamber. FIG. 21 is a schematic longitudinal cross-sectional view conceptually and schematically showing the configuration of a conventional clean room facility that does not divide a processing / processing area and a work area and does not include a transfer chamber. 22 is a longitudinal sectional view illustrating the structure of the clean room facility shown in FIG. FIG. 23 is a plan view of the clean room facility shown in FIG. FIG. 24 is a schematic longitudinal sectional view conceptually and schematically showing the configuration of another clean room facility provided with a large clean room.

  In a preferred embodiment of the present invention, the wall surface component is made of a flexible membrane material that is suspended from the ceiling structure and extends to the floor surface of the clean room, and the flexible membrane material is suspended from the ceiling structure. Due to the differential pressure between the air pressure inside the clean compartment unit and the air pressure outside the compartment unit, the air inside the compartment unit and the air inside the clean room flow through the gap between the lower end of the flexible membrane material and the floor surface.

  In another preferred embodiment of the present invention, the wall surface constituting material is a comparatively highly rigid face material, for example, a hard plate such as a resin molded plate, a glass plate, a metal plate, a gypsum board, a calcium silicate plate, or a plurality of It consists of a composite panel formed by laminating face materials and heat insulating materials. Preferably, the periphery of the face material, the joint between the face materials, and the like are subjected to an airtight treatment with a sealing material, an elastic packing, a gasket, or the like. When such a face material is used as the wall surface constituting material, a differential pressure damper having a differential pressure maintaining function can be disposed at an appropriate position of the face material. In addition, such a face material reliably prevents the deformation of the wall surface component due to the differential pressure, blocks the space inside the partition unit from the entire space, and pollutants generated in the partition unit leak into the entire space. Can be surely prevented.

  According to a preferred embodiment of the present invention, the air blowing port and the return air opening for circulating the conditioned air of the air conditioner to the processing / processing area are disposed on the inner wall surface of the core unit facing the processing / processing area. The

  According to another preferred embodiment of the present invention, an air outlet for blowing the conditioned air of the air conditioner to the processing / processing area is disposed on the lower surface of the ceiling structure, and air circulated through the processing / processing area is air-conditioned. A return air port for refluxing to the machine is disposed on the inner wall surface of the core unit facing the processing / processing area.

  In a preferred embodiment of the present invention, the floor structure of the clean room facility is made of reinforced concrete floor slab or soil concrete, and a piping pit that accommodates utility piping / wiring main piping / main wiring is formed in the floor structure. The The outer shell of the core unit is composed of a rectangular frame obtained by integrally assembling a column and a horizontal member, and a wall surface member and a top plate attached to the frame. The struts constituting the frame are fixed to the floor of the large space. Preferably, the skeleton includes transport means for moving by a lifting machine or a cargo handling device, for example, a bolt hole, a screw hole or the like for attaching a circular ring hook or the like. The frame is transferred by a lifting machine or a cargo handling device and installed on the floor of a large space. The skeleton also has dimensions that can be transported by a transport vehicle or transport such as a transport truck.

In a preferred embodiment of the present invention, a buffer device is arranged in relation to the wall structure, the buffer device receiving precision parts or precision equipment materials, intermediate products or finished products from the transport device and transporting the transport device. a first transfer means to deliver the road, precision parts or precision equipment materials, and transiently storing storage means an intermediate product or finished product, precision parts or precision equipment materials, processing and treatment of the intermediate product or finished product And a second transfer means for transferring to the area and receiving from the processing / processing area.

  If desired, an air shower device for entering the processing / processing area is incorporated in the core unit.

  In a preferred embodiment of the present invention, the air conditioner of each compartment unit controls the environment in the compartment unit to a cleanness and air pressure higher than the cleanness and air pressure of the large space outside the compartment unit.

  In another preferred embodiment of the present invention, the air conditioner of each compartment unit has a cooling ability to remove heat generated by the manufacturing apparatus in the compartment unit.

  In still another preferred embodiment of the present invention, each compartment unit has a local exhaust device that exhausts the air in the compartment unit locally to the outside of the system.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

  FIG.1 and FIG.2 is a schematic longitudinal cross-sectional view which shows notionally and typically the structure of the clean room facility provided with the division unit which concerns on suitable embodiment of this invention.

  The clean room facility shown in FIGS. 1 and 2 is a semiconductor device manufacturing facility for processing semiconductors to manufacture semiconductor devices. The clean room facility includes a single large space clean room 1 formed between the floor 7 and the ceiling 8, and a large number of clean room compartment units 2 (hereinafter referred to as "compartment units 2") that divide processing and processing blocks. Consists of The floor 7 has a configuration in which a floor finishing material is constructed on a highly rigid floor slab such as dirt concrete or reinforced concrete floor slab. The ceiling 8 has a configuration in which a ceiling base material and a ceiling finishing material are installed on the lower side of a beam or a horizontal member of a steel structure or a reinforced concrete structure. The ceiling 8 may be a beam-exposed ceiling in which beams or horizontal members partially protrude downward from the ceiling surface, or direct finishing by directly finishing the lower surface of an upper floor slab or the like by painting or the like It may be a surface.

  The partition unit 2 includes a wall structure 5 disposed on the floor 7 and a ceiling structure 6 supported by the wall structure 5. The space in the partition unit 2 constitutes a processing / processing chamber 10 that houses the manufacturing apparatus M (shown by a broken line). The partition unit 2 includes a self-supporting core unit 20 having facilities (not shown) such as an air conditioner, a switchboard, a control panel, a control valve, and a pipe header, and dust adhering to the human body and clothes of an operator entering the room. And an air shower unit 15 for removing the components by high-speed airflow. The core unit 20 constitutes a part of the wall structure 5. A plurality of core units 20 are arranged at intervals, and support the load of the ceiling structure 6. An air conditioner (not shown) in the core unit 20 adjusts the temperature and humidity of the space in the processing / processing chamber 10 and circulates and purifies the air in the processing chamber 10. The air conditioner in the core unit 20 also pressurizes the environment in the processing / processing chamber 10 having a high cleanliness.

  The area between the ceiling 8 and the ceiling structure 6 constitutes an air circulation / conveyance zone A continuous over the entire area of the clean room 1, and the level K of the ceiling structure 6 (hereinafter referred to as “ceiling structure level K”). The area below that) constitutes the manufacturing zone B. In the air circulation / transport zone A, the transport device 4 is arranged. The transfer device 4 transfers a transfer container (not shown) such as a FOUP containing a wafer. In the manufacturing zone B, a buffer device 12 for transferring the transfer container between the transfer device 4 and the processing / processing chamber 10 is arranged. The buffer device 12 is positioned directly below the transport device 4. In addition, the height of the ceiling structure 6 of each partition unit 2 does not necessarily have to be uniform or the same, and the ceiling structure level K extending across the plurality of partition units 2 is the same as that of each partition unit 2. It may be a non-land surface that changes in the vertical direction in accordance with the difference in height of the ceiling structure 6 (for example, 4 to 6 m).

  The clean room facility includes an air conditioner 40 that performs temperature adjustment (cooling or heating) and humidity adjustment (dehumidification or humidification) of circulating air and intake outside air. The air conditioner 40 includes outside air purification means such as a HEPA filter, and pressurizes the entire space 1 ′ of the clean room 1 to a pressure higher than the outside air pressure. The air conditioner 40 supplies the supply air SA to the entire space 1 ′ by the supply air duct 41 and returns the return air RA from the entire space 1 ′ to the air conditioner 40 by the return air duct 42. If desired, a chemical filter such as an activated carbon filter that reduces the concentration of chemical contaminants in the return air RA is incorporated into the air conditioner 40. An outside air intake duct 43 is connected to the air conditioner 40, and the air conditioner 40 takes in an outside air OA corresponding to the exhaust amount of the exhaust system 47 (shown by a broken line) and enters the return air / conveyance zone A together with the circulating air. Supply. If desired, the return air duct 42 constituting the air circulation system can be omitted according to the air conditioning conditions of the entire space 1 ′. The exhaust system 47 is connected to a detoxification device 46 (shown by a broken line) having an exhaust treatment device and a blower, and the exhaust treatment device includes exhaust treatment means such as a scrubber and a chemical filter.

  Clean air purified by the air conditioner 40 and temperature-controlled / humidified circulates in the clean room space outside the partition unit, that is, the entire space 1 '. The cleanness of the entire space 1' is the same as that of a conventional large space clean room. The indoor air cleanliness is set to be lower than the air cleanliness of the conventional ceiling back air plenum chamber. In the present embodiment, the environment (primary environment) of the entire space 1 ′ is set as follows.

Cleanliness: class 10,000
Temperature: 23 ± 2 ° C
Humidity: 45 ± 5%

  The floor 7 is provided with piping / wiring pits (trench) 9. The main piping / main wiring 16 is accommodated in the piping / wiring pit 9 as main piping such as water supply main piping, drainage main piping, gas main piping, chemical liquid main piping, heat medium main piping and the like, and control wiring and power wiring. The main pipe / main wiring 16 is connected to each manufacturing apparatus M via the branch pipe / branch wiring 17.

  Thus, the space in the clean room 1 is zoned into the entire space 1 ′ and the processing / processing chamber 10 by the outer shells (wall structure 5 and ceiling structure 6) of the partition unit 2, and main piping / main wiring. 16 is housed in the piping / wiring pit 9. For this reason, the clean room facility does not include an air supply plenum chamber behind the ceiling, a return air chamber under the floor, or an auxiliary equipment installation space.

  FIG. 3 is a schematic plan view of the upper region of the ceiling structure level K, that is, the air circulation / transport zone A, and FIG. 4 is a schematic plan view of the lower region of the ceiling structure level K, that is, the manufacturing zone B. It is.

  The partition units 2 are aligned and arranged at a predetermined interval in the Y direction. Each partition unit 2 has a rectangular planar shape elongated in the X direction. The core unit 20 is disposed at a corner of each partition unit 2. The manufacturing apparatus M is arranged in the longitudinal direction (X direction) of the partition unit 2, and a walking route indicated by an arrow J in FIG. 4 is secured in the partition unit 2. The air shower unit 15 is disposed at the center of the end surface of the core unit 20 so as to be aligned with the walking path J.

  The buffer device 12 is disposed on a wall portion located on the side opposite to the air shower unit 15. A wafer stocker that transiently stores the FOUP containing the wafer can be suitably used as the buffer device 12. The buffer device 12 receives a transfer container from the transfer device 4 and delivers it to the transfer device 4, a storage means for transiently storing the transfer container, and transfers the transfer container to the processing / processing chamber 10 for processing and processing. Second delivery means for receiving from the processing chamber 10.

  The buffer device 12 enables the transfer container to move between the transfer device 4 and the processing / processing chamber 10, and determines the time between the transfer timing of the transfer container and the progress of the process in the processing / processing chamber 10. Adjust any misalignment by storing the temporary transport container. The buffer device 12 also has a function of preventing cross contamination in which the air in the entire space 1 ′ and the air in the processing / processing chamber 10 flow out and inflow with each other when the transfer container is delivered. The structure of the wafer stocker itself is described in detail in, for example, Japanese Patent Application Laid-Open No. 2005-203498, and further detailed description thereof is omitted.

  As shown in FIG. 3, the air circulation / conveyance zone A is composed of a conveyance zone D extending continuously in the Y direction and an air circulation region C extending continuously over the entire space 1 ′. . A transport device 4 is disposed in the transport band D. As the transfer device 4, an OHT system (Overhead Hoist Transfer, overhead traveling automatic guided vehicle) or an OHS system (Over Head Shuttle, overhead traveling shuttle) that automatically conveys a transport container such as FOUP can be suitably used.

  As shown in FIG. 4, the manufacturing zone B is a zone in a plane in a processing / processing area E in the partition unit 2, an auxiliary machine band F between the partition units 2, and a passage band P extending in the Y direction. It is done. In the auxiliary machine band F, auxiliary machines (not shown) related to the manufacturing apparatus M in the partition unit 2 are arranged, and the piping / wiring band G is arranged in the X direction. The branch pipe / branch line 17 (FIG. 1) connected to the manufacturing apparatus M is arranged on the floor in the pipe / wiring band G. The passage zone P constitutes a passage where workers, operators, etc. can walk. Auxiliaries (not shown) associated with the manufacturing apparatus M are arranged in the passage zone P as necessary. Workers, operators, and the like can enter and leave the processing / processing chamber 10 from the passage zone P through the air shower unit 15.

  The piping / wiring pits 9 (shown by broken lines) under the floor extend in the Y direction along the arrangement of the partition units 2. An end Ga (indicated by hatching) of the piping / wiring band G is located above the piping / wiring pit 9. That is, the piping / wiring band G overlaps with the piping / wiring pit 9 at least partially in plan view. The branch piping / branch wiring 17 (FIG. 1) arranged in the piping / wiring zone G extends into the piping / wiring pit 9 at the end Ga, and the main piping / main wiring 16 ( 1).

  The air circulation / transport zone A, the accessory zone F, and the passage zone P constitute a continuous and integral space, that is, the entire space 1 ', and the environment of the air circulation / transport zone A, the accessory zone F, and the passage zone P Are substantially identical. On the other hand, the space in the partition unit 2 is arbitrarily set to an environment suitable for the manufacturing process and installation conditions of the manufacturing apparatus M arranged in the partition unit 2 and the environment of the work performed in the partition unit 2. can do. That is, the space in the partition unit 2 can be set to an environment (secondary environment) different from the environment (primary environment) of the entire space 1 ′.

  FIG. 5 is a schematic longitudinal sectional view conceptually and schematically showing an air conditioning system of a clean room facility provided with the partition unit 2 shown in FIGS.

  FIG. 5 illustrates three partition units 2 (2a: 2b: 2c) including the core unit 20. The transfer device 4 arranged in the air circulation / transfer zone A transfers the transfer container S such as FOUP containing the wafer W by the track 13. The transfer container S is transferred from the transfer device 4 to the processing / processing chamber 10 in the partition unit 2 (2a: 2b: 2c) or transferred from the processing / processing chamber 10 via the buffer device 12 (FIG. 1). Passed to device 4.

  The air conditioner 90 of each core unit 20 includes a high performance filter 91 such as a HEPA filter or a ULPA filter, a blower 92 for circulating the air in the partition unit space, and a cooling coil 93 for circulating the heat medium fluid. . If desired, a heating coil, a humidifier, and / or a reheat heater or the like is incorporated in the air conditioner 90, or a chemical filter that reduces the concentration of chemical contaminants in the return air is incorporated in the air conditioner 90.

  The air conditioner 90 is individually controlled by a control system different from the control system of the air conditioner 40. The heat medium pipe that conveys the heat medium fluid is disposed in the pipe / wiring zone G and is connected to the heat medium main pipe constituting the main pipe / wiring group 16 (FIG. 1). For example, the air conditioner 90 includes a water-cooled heat pump air conditioner, and heat source water is supplied to the air conditioner 90 through a heat medium pipe. As the air conditioner 90, an air-cooled heat pump type air conditioner is adopted, and the heat medium gas or the heat medium liquid circulated through the outdoor unit (not shown) may be supplied to the air conditioner 90 through the heat medium pipe. A cold water circulation type air conditioner may be adopted as 90, and the cold water may be supplied to the cooling coil 93 by a heat medium pipe. If desired, a hot water circulation heating coil capable of circulating hot water may be further incorporated in the air conditioner 90, or an electric heater may be further incorporated in the air conditioner 90 as a heating coil and a reheating coil to supply power to the heating coil and the reheating coil. It is also possible to do.

  The air conditioner 90 of the partition unit 2a located on the right side in FIG. 5 maintains the environment in the partition unit 2a at a very high cleanliness. For example, the environment in the partition unit 2a is set as follows.

Cleanliness: Class 1000, 100 or 10
Temperature: 23 ± 2 ° C
Humidity: 45 ± 5%

  The air conditioner 90 of the core unit 20 circulates the air in the partition unit 2a in order to maintain the cleanliness of the environment in the partition unit. The air conditioner 90 also includes a resistor (not shown) such as a damper in the return air flow path of the air in the compartment unit in order to control the air pressure in the compartment unit 2a to be higher than the air pressure of the entire space 1 ′. Alternatively, a blower (not shown) for supplying and pushing air is provided. Due to the differential pressure between the environment in the partition unit 2a and the entire space 1 ', the air in the partition unit 2a is changed to a gap between the partition units 2a or a differential pressure damper or the like (not shown) disposed at an appropriate position of the partition unit 2. To the entire space 1 ′. Such a differential pressure maintaining means can reliably maintain a high cleanliness in the environment inside the partition unit 2a. The air conditioner 90 of the core unit 20 sucks air of an air amount corresponding to the leaked air amount from the surrounding space of the partition unit 2a, that is, the entire space 1 ′ (auxiliary device zone F or passage zone P).

  The partition unit 2b located in the center in FIG. 5 partitions a region that accommodates a manufacturing apparatus having a high calorific value. The air conditioner 90 has a cooling capacity corresponding to the sensible heat load of the manufacturing apparatus. If desired, the partition unit 2b includes a local exhaust system 48 (shown by a broken line) that exhausts hot indoor air out of the system by an exhaust system 47. The heat generated by the manufacturing apparatus is completely or partially removed by the heat removal action of the air conditioner 90 (and the local exhaust of the local exhaust system 48). Since the heat generated by the manufacturing apparatus exhausted outside the system by the air conditioner 90 (and the local exhaust system 48) does not require heat removal by the temperature-controlled / humidified air of the air-conditioning apparatus 40, the cooling load of the air-conditioning apparatus 40 is reduced. To do. In addition, when setting the environment in the partition unit 2b to a cleanliness level lower than the cleanliness of the entire space 1 ′, the air conditioner 90 (and the local exhaust system 48) changes the air pressure in the partition unit 2a to the entire space 1 ′. Control to a pressure lower than the air pressure. The air in the entire space 1 ′ flows into the partition unit 2 c through the clearance of the partition unit 2 c, the differential pressure damper, and the like as indicated by solid arrows. On the other hand, when the environment in the partition unit 2b is set to a cleanliness higher than the cleanness of the entire space 1 ′, the air conditioner 90 controls the air pressure in the partition unit 2a to a pressure higher than the air pressure of the entire space 1 ′. To do. The air in the partition unit 2a leaks into the entire space 1 'through the gaps in the partition unit 2a, the differential pressure damper, and the like, as indicated by broken line arrows.

  The partition unit 2c located on the left side in FIG. 5 partitions a space in which a process involving dust generation or generation of pollutants or pollutants is performed. The environment in the partition unit 2c is set to a cleanliness lower than the air cleanliness of the entire space 1 ', for example, class 100,000.

  The local dust generation region or the contamination region in the partition unit 2c communicates with the abatement device 46 through the exhaust system 47, and the exhaust system 47 exhausts indoor air containing dust, contaminants, and the like out of the system. To do. The air conditioner 90 and the exhaust system 47 control the air pressure in the partition unit 2c to a pressure lower than the air pressure in the entire space 1 '. Due to the differential pressure between the air pressure in the partition unit 2c and the air pressure in the entire space 1 ′, the air in the entire space 1 ′ flows into the partition unit 2c via the gap, the differential pressure damper, etc. of the partition unit 2c. 1 'cleanliness can be maintained.

  If desired, the environment in the partition unit 2 can be shielded from the entire space and the illumination in the partition unit 2 can be controlled. In this case, the wall structure 5 and the ceiling structure 6 of the partition unit 2 are constructed of a light shielding material.

  6 and 7 are a perspective view and an exploded perspective view showing the overall configuration of the partition unit 2, and FIGS. 8A and 8B are a partial vertical sectional view and a partial cross-sectional view of the partition unit 2. It is.

  As described above, the partition unit 2 includes the wall structure 5, the ceiling structure 6, the air shower unit 15, and the buffer device 12 (FIG. 7), and the load of the ceiling structure 6 configures the wall structure 5. Supported by the core unit 20. An airtight flexible membrane material 50 such as a transparent antistatic vinyl curtain made of a noncombustible material is used as a wall constituting material, an opening between the core unit 20, and an opening between the core unit 20 and the air shower unit 15. Furthermore, it is stretched at the opening between the core unit 20 and the buffer device 12. The flexible membrane material 50 constitutes the wall structure 5 together with the core unit 20.

  Each core unit 20 includes a pipe / wiring connection board 21 having a large number of ports, pipe joints, and the like that can connect the end of the branch pipe / branch wiring 17 and an air supply port (air intake) that sucks room air in the clean room 1 Mouth) 22. As shown in FIG. 7, an air outlet 26 that blows air-conditioned air into the processing / processing chamber 10 and a return air inlet 27 that sucks indoor air in the processing / processing chamber 10 are provided in the core unit 20 on the processing / processing chamber 10 side. It is arranged on the wall surface. The core unit 20 is disposed at a corner of the partition unit 2 and functions as a column that supports the ceiling structure 6 while standing on the floor 7.

  The air shower unit 15 has a structure in which an air shower device is incorporated in a self-standing structure composed of a steel structure frame (not shown), a wall surface material 15a, and a top plate 15b, and includes an outer door 15c and an inner door ( (Not shown) is disposed on the wall surface of the air shower unit 15. An operator or the like can enter the processing / processing chamber 10 in the partition unit 2 or leave the processing / processing chamber 10 through the outer door 15c and the inner door of the air shower device. The upper end portion of the steel structure frame (not shown) of the air shower unit 15 is connected to the ceiling structure 6.

  As shown in FIGS. 7 and 8A, the ceiling structure 6 includes a steel structure truss beam 30 arranged on the outer periphery, an outer surface member 31 and an inner surface member attached to the outer surface and the inner surface of the beam 30. 32 (FIG. 8A), a lattice-shaped metal T-shaped bar member 33 supported by the beam 30, and a ceiling member 34 supported by a support portion 35 of the bar member 33 (FIG. 8A). It consists of. If desired, the upper surface of the ceiling structure 6 may be covered with a covering material 36 (shown by a broken line in FIG. 8A) such as a face material or a flexible membrane material.

  As shown in FIG. 8, an upper locking tool 51 (FIG. 8A) in the form of a horizontal rail capable of locking the upper edge of the flexible membrane material 50 is fixed to the lower surface of the beam 30, and the flexible membrane material The side latches 52 (FIG. 8B) in the form of vertical rails that can latch the 50 side edges are arranged at the corners of the core unit 20. The flexible membrane material 50 is suspended by the upper locking member 51, and the side edge portion is restrained by the side locking member 52. A chain-shaped or wire-shaped weight 53 is attached to the lower end of the flexible membrane material 50. Since the weight of the weight 53 always acts on the flexible membrane material 50, the position of the flexible membrane material 50 is stabilized. The vicinity of the lower end of the side locking member 52 on both sides and the lower end of both side edges of the flexible membrane material 50 are tightened so as to be releasable by a locking tool or the like so that the position of the flexible membrane material 50 is stabilized under tension. Anyway.

  Due to the differential pressure between the indoor air pressure in the processing / processing chamber 10 and the air pressure in the entire space 1 ′, the processing / processing chamber 10 passes through a slight gap formed between the lower end of the flexible membrane material 50 and the floor surface 7 a. Indoor air flows out into the entire space 1 ′, or indoor air in the entire space 1 ′ flows into the processing / processing chamber 10. That is, the flexible membrane material 50 functions as a differential pressure maintaining unit that maintains the internal pressure (positive pressure or negative pressure) of the processing / processing chamber 10.

  As shown in FIG. 8B, an air conditioner 90 is disposed in one half of the core unit 20, and a facility area 28 such as piping and wiring is disposed in the other half of the core unit 20. The The equipment area 28 includes gas relay equipment, chemical relay equipment, water supply / drainage equipment, power wiring relay equipment, control system wiring relay equipment, heat medium control equipment, control valves, storage containers, piping headers, switchboards, control panels Etc. are arranged. Disaster prevention facilities, special gas sources, and the like may be arranged in the facility area 28. If desired, a local clean booth having an extremely high level of cleanliness of class 1 is incorporated at the position of the equipment area 28, or a part or all of the equipment area 28 is set as an open space inside or outside the processing / processing chamber 10 It is also possible to open it.

  FIG. 9 is a partial longitudinal sectional view and a partial transverse sectional view showing a modification of the partition unit 2.

  The opening of the partition unit 2 is made of a comparatively highly rigid face material, for example, a hard plate such as a resin molded plate, a glass plate, a metal plate, a gypsum board, a calcium silicate plate, or a plurality of face materials, a heat insulating material, or the like. You may block | close with the composite panel formed by laminating | stacking. Preferably, the periphery of the face material, the joint between the face materials, and the like are subjected to an airtight treatment with a sealing material, an elastic packing, a gasket, or the like. If desired, a differential pressure damper having a differential pressure maintaining function is disposed at an appropriate position of the face material.

  9A and 9B show a configuration in which the opening between the core units 20 is closed by the panel 54. FIG. The panel 54 is a metal sandwich panel in which a core material of a hard resin foam such as hard urethane foam is sandwiched between metal plates such as painted steel plates. Rail-like lower frame 55a, upper frame 55b, and vertical frames 55c and 55d are fixed to floor 7, beam 30 and core unit 20 along the edge of the opening. The panel 54 has a width dimension of about 450 to 900 mm and a height dimension corresponding to the height of the opening. The panel 54 is inserted into the rails of the lower frame 55a, the upper frame 55b, and the vertical frames 55c and 55d, and is slid vertically along the upper and lower frames 55a and 55b. If desired, a differential pressure damper 56 (shown in broken lines) is disposed in place on the panel 54. As shown in FIG. 9B, the panels 54 are connected to each other by a longitudinal seam of an actual joint structure that fits the protrusion 54a and the concave groove 54b. An airtight treatment material (not shown) such as urethane rubber or EDPM is inserted between the panels 54 and between the panels 54 and the frames 55a, 55b, 55c, and 55d. As a further modification, it is possible to construct the panel 54 horizontally.

  As shown in FIG. 9C, a metal sandwich panel 57 that does not have a seam of an actual joint structure may be built by vertically supporting the column 55h between the upper and lower frames 55a and 55b. The support column 55h and the panel 57 are slidably built along the upper and lower frames 55a and 55b. An airtight treatment material (not shown) is interposed between the panel 57, the frames 55a, 55b, 55c, and 55d and the column 55h.

  FIG. 9D shows a configuration in which the opening is closed by a plate material 58 made of acrylic resin or glass. The lower frame 55e is fixed to the floor, and the horizontal rail 55f and the upper frame 55g are installed between the vertical frames (not shown) of the openings, or the columns (Fig. (Not shown). The plate member 58 is sequentially dropped in a sliding manner along the column or the vertical frame, and is inserted between the frames 55e, 55f, and 55g. An airtight treatment material (not shown) is interposed between the plate material 58 and the frames 55e, 55f, and 55g. An airtight treatment material (not shown) is also inserted between the plate material 58 and the vertical frame (and the support column).

  In FIG. 9E, a configuration in which the opening between the core units 20 is closed by the aluminum alloy panel 59 is shown as still another modification. The panel 59 is made of a rectangular aluminum alloy plate to which a handle 59a that can be grasped with fingers is attached. On the four sides of the panel 59, connecting portions 59b formed by bending the edge of the plate body at right angles are formed. The panel 59 is abutted against the core unit 20 as shown in FIG. The connecting portion 59b is integrally connected to each other by a locking tool 59c such as a bolt or a screw, or is fixed to the core unit 20, the floor 7, or the beam 30. Preferably, an airtight treatment material (not shown) is inserted around the panel 59, or a sealing material or the like is filled in a joint portion around the panel 59. If desired, an upper frame, a lower frame, and a vertical frame are disposed around the opening.

  10 and 11 are a longitudinal sectional view and an exploded perspective view of the core unit 20 showing the structure of the core unit 20, and FIG. 12 is a perspective view showing the structure of the steel frame of the core unit 20.

  The outer shell of the core unit 20 has a structure in which a wall material 24 is attached to the side surface of the steel framework 23 and a top plate 25 is attached to the upper surface of the steel framework 23. The steel frame 23 is composed of vertical columns 23a arranged at a predetermined interval and horizontal horizontal members 23b installed on the top and bottom of the columns 23a. A steel base plate 23c is fixed to the lower end of the column 23a. The base plate 23c is fixed to the floor 7 by anchor bolts 23d.

  In this embodiment, the support | pillar 23a and the horizontal member 23b consist of a square steel pipe. As the support 23a and the horizontal member 23b, H-shaped steel, circular steel pipe, angle-shaped steel, or the like, or an alloy member such as an aluminum alloy may be used.

  An air conditioner 90 is disposed in the framework 23. As described above, the air conditioner 90 includes the high-performance filter 91, the blower 92, and the cooling coil 93. If desired, the air conditioner 90 includes a heating coil, a humidifier, a reheat heater, and the like. The air conditioner 90 is connected to the air inlet 22 via an air supply duct (air intake duct) 96, connected to the air outlet 26 via an air duct 94, and connected to the return air port 27 via a return air duct 95. Connected. For example, an HS type suction port or the like is attached to the air supply port 22 and the return air port 27, and a VHS type air outlet or the like is attached to the air blowing port 26.

  FIG. 13 is a perspective view showing a transfer method or installation method of the steel frame 23.

  The steel frame 23 can be fixed to the floor 7 or removed from the floor 7 relatively easily by driving or removing the anchor bolt 23d. The upper horizontal member 23b has a transfer means to which a mooring tool 86 such as a round ring hook can be attached for movement by a lifting machine or a cargo handling device, for example, a bolt hole, a screw hole or the like that can fix the mooring tool 86 ( (Not shown) is provided at a predetermined position, and the end portion of the rope 87 is moored to the mooring tool 86 attached to the horizontal member 23b. The rope 87 is locked to a hook 85 of a lifting machine such as a crane. The steel frame 87 is lowered onto the floor 7 or removed from the floor 7 by operating the lifting machine.

  The lower horizontal member 23b is spaced from the floor 7, and a fork portion or lifter portion 88 (shown by a broken line) of a forklift or a lifted carriage can be inserted below the horizontal member 23b. The steel frame 23 can be transferred by operating a forklift or a lift truck.

  The steel frame 23 has a size that can be transported by a transport vehicle such as a transport truck or a transport mechanism, and is easy to transport and convey during construction of the facility. Further, the unused steel frame 23 can be moved or diverted to other clean room facilities relatively easily.

  As described above, the clean room facility according to the present embodiment has the partition unit 2 having the wall structure 5 and the ceiling structure 6 arranged in the clean room 1, and the space in the clean room 1 is distributed by the ceiling structure level K. Zone the transport zone A and the production zone B up and down, zone the transport zone D in the air circulation / transport zone A, and make the production zone B into the processing / processing area E, auxiliary zone F and passage zone P It has a configuration zoned in a plane. The clean room 1 has a configuration in which the conventional air supply plenum chamber and the return air chamber are substantially incorporated in the space of the large space clean room by such three-dimensional or three-dimensional zoning. In the clean room facility of the present embodiment, the auxiliary machines of the manufacturing apparatus M are arranged in the auxiliary machine band F (and the passage band P), and the piping / wiring pits 9 are arranged in the Y direction along the arrangement of the partition units 2. By arranging and partially overlapping the piping / wiring band G of the auxiliary machinery band F and the piping / wiring pit 9 vertically, the conventional underfloor auxiliary machine space is incorporated into the space of a large clean room. It has a configuration. Thus, according to the configuration of such a clean room facility, the air supply plenum chamber behind the ceiling, the return air chamber under the floor, and the underfloor auxiliary machine space can be omitted, and the floor height of the clean room facility can be greatly reduced.

  Moreover, the clean room facility of this embodiment divides the environment that requires high cleanliness, or the dust generation environment or the contaminated environment by the partition unit 2 so that the environment of the entire clean room 1 is cleaned of the entire conventional clean room. The degree of cleanliness (class 10000) is lower than the degree (class 1000 or 100). Thereby, the amount of circulating air in the air conditioning system including the air conditioner 40 can be reduced, the air conveyance power or the air blowing power of the air conditioner 40 can be reduced, and the cross section of the air conveyance path can be greatly reduced.

  Further, dust, contaminants, high temperature indoor air, etc. in the partition unit 2 are exhausted outside the system by the exhaust system 47 and the local exhaust system 48, so that the dust, contaminants, high temperature indoor air, etc. are diffused throughout the clean room. Can be prevented and the heat load of the air conditioner 40 can be reduced.

  In addition, the partition unit 2 having the above configuration can be transported and transported relatively easily, and can be installed in the facility or removed from the facility by a relatively simple operation. Good workability.

  FIG. 14 is a schematic plan view illustrating various patterns related to the arrangement of the core unit 20.

  As described above, the partition unit 2 of the present embodiment is formed by the wall structure 5 and the ceiling structure 6, and the wall structure 5 includes the core unit 20 and the flexible membrane material 50 (or the face materials 54, 57, 58). 59). The core units 20 can be arranged in an arbitrary pattern as illustrated in FIGS. 14 (A) to 14 (G). Therefore, according to the partition unit 2 configured as described above, the processing / processing chamber 10 having a plane size and a plane shape corresponding to the layout of the manufacturing apparatus M is partitioned, or the layout change or model change of the manufacturing apparatus M is performed. Thus, the planar dimensions and planar shape of the processing / processing chamber 10 can be changed relatively easily. However, such a pattern of the partition units 2 is provided on the condition that the piping / wiring band G and the piping / wiring pits 9 arranged between the partitioning units 2 can be arranged at positions that at least partially overlap each other. It is a thing.

  FIG. 15 is a longitudinal sectional view showing a modification of the partition unit 2.

  In the above-described embodiment, the core unit 20 includes both the air blowing port 26 and the return air port 27 on the wall surface on the processing / processing chamber 10 side, and the partition unit 2 has a wall blowing type air flow circulation system. However, the partition unit 2 of the present embodiment has a configuration including a ceiling-blowing airflow circulation system as shown in FIG.

  15 includes a blower duct or blower chamber 97 disposed on the upper surface of the core unit 20 and a blower duct 98 connected to the blower duct 97. The blower ducts 98 are disposed at intervals. And it has many air outlets 99 which blow off air below. The blower duct or blower chamber 97 is continuous over the entire length of the core unit 20 and extends across the plurality of core units 20 as desired.

  The air duct 98 is composed of a tube having a circular cross section or a rectangular cross section disposed in parallel to the ceiling portion. The ceiling structure 6 can be formed by the air duct 98 by arranging a large number of air ducts 98 over the entire ceiling surface without gaps.

  The air duct 98 in the form of an air supply chamber may be formed by a flat plate or the like extending over the entire ceiling and spaced vertically, and the ceiling structure 6 may be formed by such an air duct 98.

  The other configuration of the core unit 20 is substantially the same as that of the above-described embodiment.

  FIG. 16 is a plan view showing a configuration of a clean room facility according to a preferred embodiment of the present invention. 17 and 18 are cross-sectional views taken along lines I-I and II-II in FIG. 16, and FIG. 19 is a perspective view showing a configuration in the clean room.

  As shown in FIG. 16, the clean room facility has a double-structured and highly rigid outer shell 60 composed of an inner wall 61 surrounding the clean room 1 and an outer wall 62 arranged outside the inner wall 61. Machine rooms 45 and 49 arranged between the inner wall 61 and the outer wall 62 are arranged opposite to both sides of the clean room 1. An air conditioner 40 is disposed in the machine room 45, and an abatement device 46 is disposed in the machine room 49. The position of the transfer device 4 is shown in FIG. 16 by a solid arrow indicating the transfer direction, and the piping / wiring pit 9 under the floor is shown by a broken line in FIG. The transport device 4 and the piping / wiring pits 9 both extend in the Y direction and are substantially parallel. If desired, the clean room 1 further includes transfer devices 65 and 66 (broken arrows indicating the transfer direction are shown in FIG. 16) for transferring the transfer container in association with the transfer device 4.

  A large number of partition units 2 are aligned in the X direction and the Y direction. The manufacturing apparatus M is disposed in each partition unit 2.

  As shown in FIGS. 17 and 18, a steel truss structure beam 80 extending in the X direction is installed between the inner wall 61 and the central column 64. The beam 80 supports the roofing material 81 and supports the ceiling base material and the ceiling finishing material that constitute the ceiling 8. The clean room facility does not have an air supply plenum chamber behind the ceiling, so the ceiling base material and the ceiling finishing material are not of an expensive system ceiling type that can incorporate FFU etc. It has a conventional structure that supports the material. For this reason, the construction cost of ceiling construction can be reduced.

  The clean room 1 is formed between the floor 7 and the ceiling 8. The clean room facility does not have an underfloor return air chamber or auxiliary equipment installation space. Therefore, the floor 7 is formed by the surface finishing material 71 and the soil concrete 72 as partially enlarged in FIGS. 17 and 18. The soil concrete 72 is supported by the ground 75 via the discarded concrete 73 and the split chestnut 74. The manufacturing apparatus M includes precision equipment that needs to strictly regulate vibration transmission, vibration amplification, seismic behavior, etc., but the floor 7 is a conventional free access floor or steel frame with low rigidity of the floor structure itself. Since it is formed by soil concrete 72 supported directly on the ground 75, not a floor with a double floor structure, it is necessary to reliably insulate vibrations or seismic behavior, etc. transmitted to such precision equipment with a vibration isolator or the like. Can do.

  The floor height H of the clean room facility is about 11 m, and the ceiling height H1 of the clean room 1 is about 7 m. Moreover, the height H2 of the partition unit 2 is about 4 m, and the height of the air circulation / conveyance zone A is about 3 m. Therefore, the superiority of the clean room facility according to the present invention is remarkable as compared with the fact that the conventional clean room facility of the same scale requires a floor height H of about 15 m (FIG. 22).

  The preferred embodiments and examples of the present invention have been described in detail above. However, the present invention is not limited to the above-described embodiments and examples, and is within the scope of the present invention described in the claims. It is needless to say that various changes or modifications can be made in the above, and such changes or modifications are also included in the scope of the present invention.

  For example, although the said Example is a thing of the structure which has arrange | positioned the division unit of this invention in the clean room facility of a single floor, you may install a division unit in the clean room facility of a multi-story or a multilayer floor structure. In this case, the floor of the clean room facility consists of a highly rigid floor slab such as a reinforced concrete floor slab.

  Moreover, in the said embodiment, although the division unit is provided with the air shower unit incorporating the air shower apparatus, an air shower apparatus may be integrated in the said core unit, or an air shower unit may be comprised as a core unit. good.

  Furthermore, it is possible to incorporate a core unit into devices such as a pass box and a differential pressure damper.

  In addition to a transparent antistatic vinyl curtain, an opaque or light-shielding flexible resin sheet or the like may be used as the airtight flexible membrane material that closes the openings between the core units.

  In addition, in the above-described embodiment, the air cleanliness of the space outside the partition unit (that is, the entire space) is reduced to a cleanness of about class 10000 by installing the partition unit. It is also possible to further reduce the cleanliness of (space), for example, to set the cleanliness of class 100,000 or less.

  Furthermore, in the above-described embodiment, the transport band for transporting precision parts or precision equipment materials, intermediate products or finished products is arranged in a height range above the ceiling structure of the partition unit. Alternatively, the conveyance band may be disposed adjacent to the area between adjacent partition units or the wall structure of the partition unit.

  The clean room compartment unit and the clean room compartment method of the present invention include processing / processing area compartments for processing / processing precision parts or precision equipment in a clean environment, for example, electronic devices such as semiconductor devices, flat panel displays, and diodes. It is preferably applied to a clean room facility for manufacturing, a clean room facility for manufacturing a secondary battery such as a lithium battery, or a clean room facility for manufacturing a solar cell panel or the like. According to the present invention, the floor height of a clean room facility is reduced, the local air conditioning control, the load of the air conditioning system is reduced, the diffusion of pollutants, etc. is prevented without impairing the design flexibility of the manufacturing equipment layout and the like. Not only can rigidity be improved, but also change the usage of facilities by exchanging partition units or dismantling / reconstructing, for example, changing the usage of buildings that convert semiconductor device manufacturing facilities to flat panel display manufacturing facilities. Therefore, the practical value of the present invention is remarkable.

DESCRIPTION OF SYMBOLS 1 Clean room 1 'whole space 2 Compartment unit 4 Conveying device 5 Wall structure 6 Ceiling structure 7 Floor 8 Ceiling 9 Piping / wiring pit 10 Processing / processing chamber 12 Buffer device 13 Track 15 Air shower unit 16 Main piping / main wiring 17 Branch piping / branch wiring 20 Core unit 21 Piping / wiring connection panel 22 Air supply port (air intake port)
23 Steel frame 24 Wall material 25 Top plate 26 Air outlet 27 Return air outlet 28 Equipment area 40 Air conditioner 50 Flexible membrane material 90 Air conditioner 91 High performance filter 92 Air blower 93 Cooling coil A Air distribution / conveyance zone B Manufacturing zone C Air flow zone D Transport zone E Processing / treatment zone F Auxiliary zone G Piping / wiring zone K Ceiling structure level M Manufacturing equipment P Passage zone S Transport container W Wafer

Claims (17)

A clean room partition unit that is arranged in a large space in a building with a space and partitions a plurality of processing / processing areas in the large space in which a manufacturing apparatus for processing / processing precision parts or precision equipment is housed in a clean environment. Because
A ceiling structure disposed below the ceiling surface of the large space with a gap, a wall structure that supports the ceiling structure, temperature control, humidity control, air circulation, and air purification of the processing / treatment area And an air conditioner that performs
The wall structure includes a plurality of self-supporting core units disposed on the floor surface of the large space at intervals and supporting the load of the ceiling structure, and an opening formed between the core units. Having a wall constituent material to be closed,
The air conditioner is disposed in the core unit,
An air supply port for supplying the air in the large space outside the partition unit to the air conditioner and a pipe / wiring connection portion to which utility piping / wiring for operating the manufacturing apparatus can be connected are outside the partition unit. A clean room compartment unit, which is disposed on the outer wall surface of the core unit facing the space.   The blower port and the return air port for circulating the conditioned air of the air conditioner to the processing / processing region are disposed on the inner wall surface of the core unit facing the processing / processing region. Item 4. The clean room compartment unit according to item 1.   A return port for returning air circulated through the processing / processing area to the air-conditioning apparatus, wherein a blower opening for supplying the air-conditioned air of the air-conditioning apparatus to the processing / processing area is disposed on the lower surface of the ceiling structure. The clean room compartment unit according to claim 1, wherein a mouth is disposed on an inner wall surface of the core unit facing the processing / processing region.   The wall surface constituent material is made of a flexible film material that is suspended from the ceiling structure and extends to the floor surface of the clean room, and the differential pressure between the air pressure inside the compartment unit and the air pressure outside the compartment unit, The air in a partition unit and the air in the said clean room distribute | circulate the clearance gap between the lower end of the said flexible membrane material, and the said floor surface, The one of Claim 1 thru | or 3 characterized by the above-mentioned. Clean room compartment unit. A buffer device is disposed in association with the wall structure, and the buffer device receives a material, an intermediate product, or a finished product of the precision part or precision device from the transport device and delivers it to the transport path of the transport device. Transfer means, storage means for transiently storing the material, intermediate product or finished product, and a second means for delivering the material, intermediate product or finished product to the processing / processing area and receiving from the processing / processing area. It has a delivery means, The clean room division unit of any one of the Claims 1 thru | or 4 characterized by the above-mentioned.   The clean room compartment unit according to any one of claims 1 to 5, wherein an air shower device for entering the processing / treatment region is incorporated in the core unit.   The outer shell of the core unit is composed of a rectangular frame obtained by integrally assembling a column and a horizontal member, a wall surface member and a top plate attached to the frame, and the column is mounted on the floor of the large space. The clean room section unit according to any one of claims 1 to 6, wherein the clean room section unit is fixed.   The clean room section unit according to claim 7, wherein the frame has a transfer means for moving by a lifting machine or a cargo handling device, and has a size that can be transported by a transport vehicle.   The said air conditioner controls the environment in the said division unit to the cleanliness and air pressure higher than the cleanliness and air pressure of the large space outside the division unit. Clean room compartment unit as described.   The clean room compartment unit according to any one of claims 1 to 8, wherein the air conditioner has a cooling ability to remove heat generated by the manufacturing apparatus in the compartment unit.   The clean room compartment unit according to any one of claims 1 to 8, wherein the compartment unit further includes a local exhaust device that exhausts the air in the compartment unit locally to the outside of the system. A plurality of partition units are arranged at large intervals in a large space in a building, and a plurality of processing / processing areas in which a manufacturing apparatus for processing / processing precision parts or precision equipment in a clean environment is accommodated by the partition units. A clean room partitioning method for partitioning into a large space,
The outer shell of the core unit is constructed on the floor surface of the large space by a self-supporting rectangular frame obtained by integrally assembling the support and the horizontal member, and a wall material and a top plate attached to the frame.
An air conditioner for air-conditioning the processing / processing area is disposed in the outer shell, and an air supply port for supplying air in the large space outside the partition unit to the air conditioner, and operation of the manufacturing apparatus A piping / wiring connection portion capable of connecting utility piping / wiring for the outer wall surface of the core unit facing the space outside the partition unit,
A ceiling structure is supported by a plurality of the core units, and the ceiling structure is arranged at a position below the ceiling surface of the large space,
A clean room partitioning method, wherein an opening formed between the core units is closed with a wall surface constituent material.   The blower port and the return air port for circulating the conditioned air of the air conditioner to the processing / processing region are disposed on the inner wall surface of the core unit facing the processing / processing region. 12. The clean room partitioning method according to 12.   A return port for sending air conditioned air of the air conditioner to the lower surface of the ceiling structure in the processing / treatment area and returning the air circulated in the partition unit to the air conditioner The clean room partitioning method according to claim 12, wherein: is disposed on an inner wall surface of the core unit facing the processing / processing region.   15. The clean room partitioning method according to claim 12, wherein a flexible membrane material extending to the floor surface of the clean room is suspended from the ceiling structure as the wall surface constituting material.   The clean room partitioning method according to any one of claims 12 to 15, wherein the frame is transferred by a lifting machine or a cargo handling device and installed on a floor surface of the clean room.   The clean room partitioning method according to any one of claims 12 to 16, wherein an air shower device for entering the processing / processing region is incorporated in the core unit.

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