JPH11311036A - Clean room building - Google Patents

Clean room building

Info

Publication number
JPH11311036A
JPH11311036A JP11870598A JP11870598A JPH11311036A JP H11311036 A JPH11311036 A JP H11311036A JP 11870598 A JP11870598 A JP 11870598A JP 11870598 A JP11870598 A JP 11870598A JP H11311036 A JPH11311036 A JP H11311036A
Authority
JP
Japan
Prior art keywords
support structure
clean room
external support
area
external
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11870598A
Other languages
Japanese (ja)
Other versions
JP3787599B2 (en
Inventor
Tadahiro Omi
忠弘 大見
Hisakuni Shinohara
壽邦 篠原
Makoto Imai
誠 今井
Takehiko Kato
武彦 加藤
Hisayoshi Ishibashi
久義 石橋
Masayoshi Umeda
正芳 梅田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kumagai Gumi Co Ltd
Original Assignee
Kumagai Gumi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kumagai Gumi Co Ltd filed Critical Kumagai Gumi Co Ltd
Priority to JP11870598A priority Critical patent/JP3787599B2/en
Publication of JPH11311036A publication Critical patent/JPH11311036A/en
Application granted granted Critical
Publication of JP3787599B2 publication Critical patent/JP3787599B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To improve the vibration insulating performance of a clean room. SOLUTION: A clean room building 1 comprises internal support structure 2 and external support structure 3 surrounding the internal support structure 2. Truss beams 5, 6 are respectively laid at the external support structure 3 and internal support structure 2, and the truss beams 6 and truss beams 5 are alternately disposed stage by stage. Manufacturing equipment to be free from the influence of external vibration is installed in a process area 8 between the truss beam 5 of the external support structure 3 and the truss beam 6 of the internal support structure 2. Space between the truss beam 6 to be the floor of the process area 8 and the truss beam 5 below is a utility area 13, and a vibration generating source such as a pump to be attached to the manufacturing equipment in the process area 8 is disposed in the utility area 13. Vibration generated in the utility area 13 is transmitted to the external support structure 3 without being propagated to the internal support structure 2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、クリーンルーム
建築物に関するものであり、特に、防振性能を向上させ
たクリーンルーム建築物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a clean room building, and more particularly to a clean room building with improved vibration proof performance.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】半導体
や光学機械等の精密機械製造工場では、清浄雰囲気が必
要とされる工程をクリーンルーム内で行い、クリーンル
ームの温度・湿度・塵埃量等の室内環境を適正に制御す
るとともに、クリーンルームの振動を軽減する対策を講
じている。特に振動を嫌う工程としては、半導体製造に
おけるパターン露光工程やフォトマスクの検査工程等が
あり、製品の高集積化や微細化に伴って振動の許容値が
小さくなってきている。
2. Description of the Related Art In a factory for manufacturing precision machines such as semiconductors and optical machines, processes requiring a clean atmosphere are performed in a clean room, and the temperature, humidity, amount of dust and the like of the clean room are measured. In addition to properly controlling the environment, measures have been taken to reduce vibrations in the clean room. In particular, processes that dislike vibration include a pattern exposure process and a photomask inspection process in semiconductor manufacturing, and the permissible value of vibration is becoming smaller as products become more highly integrated and miniaturized.

【0003】クリーンルームに生じる振動の原因として
は、交通機関等から地盤を介して伝播される外部振動、
クリーンルームに空気を供給する空調機器や超純水を供
給するためのポンプ等の製造に必要なユーティリティ設
備が発生する振動、クリーンルーム内の製造装置自体が
発生する振動等がある。
[0003] The causes of vibrations generated in a clean room include external vibrations transmitted through the ground from transportation and the like,
There are vibrations generated by utility equipment required for manufacturing an air conditioner for supplying air to the clean room and a pump for supplying ultrapure water, and vibrations generated by the manufacturing apparatus itself in the clean room.

【0004】クリーンルームに伝播される振動を抑制す
るための建築構造としては、製造工程を行うクリーンル
ームの建物と、ユーティリティ設備を設置する建物とを
別棟として隣接させて設置し、振動を伝えないエキスパ
ンションジョイントで各棟を接続する構造が知られてい
る。また、工場の構造を二重構造として内部構造にクリ
ーンルームを配置し、内部構造を取り囲む外部構造の上
部にユーティリティ設備を配置したものも提案されてい
る。
[0004] As an architectural structure for suppressing vibration transmitted to a clean room, an expansion joint which does not transmit vibration is provided by installing a clean room building for performing a manufacturing process and a building for installing utility equipment adjacent to each other as separate buildings. There is a known structure that connects each building. There has also been proposed a structure in which a clean room is arranged in an internal structure with a double structure of a factory, and utility equipment is arranged above an external structure surrounding the internal structure.

【0005】しかし、前述したように、クリーンルーム
内に設置される製造装置自体にも電動ポンプなどの振動
発生源を持つものがあり、上記のクリーンルームにおい
ては、外部やユーティリティ設備から伝播される振動は
低下するものの、製造装置が発生する振動が問題になる
場合がある。
However, as described above, some manufacturing apparatuses installed in a clean room have a vibration source such as an electric pump. In the above-mentioned clean room, vibrations transmitted from outside or utility equipment are not generated. Although reduced, vibrations generated by the manufacturing apparatus may be a problem.

【0006】製造装置が発生する振動の影響を解消する
ためには、製造装置に付属する振動発生源と製造工程を
実施するプロセスエリアとを絶縁する必要があるが、従
来の建築構造では同一の建物内にあるプロセスエリアと
製造装置の振動発生源とを構造的に絶縁することは不可
能である。
In order to eliminate the influence of the vibration generated by the manufacturing apparatus, it is necessary to insulate the vibration source attached to the manufacturing apparatus from the process area in which the manufacturing process is performed. It is not possible to structurally isolate the process area in the building from the vibration sources of the manufacturing equipment.

【0007】そこで、クリーンルーム内の製造装置に付
属する振動発生源とプロセスエリアとを絶縁してクリー
ンルームの振動を可及的に低下させ、製造及び検査工程
における不安定要素を解消するために解決すべき技術的
課題が生じてくるのであり、本発明は上記課題を解決す
ることを目的とする。
[0007] In order to solve the problem, the vibration source of the manufacturing equipment in the clean room and the process area are insulated from each other to reduce the vibration of the clean room as much as possible and to eliminate unstable elements in the manufacturing and inspection processes. Therefore, the present invention has an object to solve the above problems.

【0008】[0008]

【課題を解決するための手段】この発明は、上記目的を
達成するために提案するものであり、クリーンルームが
設けられる内部支持構造と、内部支持構造を囲む外部支
持構造とからなり、外部支持構造に内部支持構造内を通
過する複数階の梁を架設し、内部支持構造に外部支持構
造の上下の梁間に位置する複数階の梁を架設して、外部
支持構造の梁と内部支持構造の梁とを上下交互に配した
建築物であって、内部支持構造の梁上を、振動から絶縁
すべき製造機器を配置するプロセスエリアとし、外部支
持構造の梁上を、前記製造機器に付属するポンプ等の振
動発生源を配置するユーティリティエリアとすることに
より、製造機器を外部振動から絶縁できるように構成し
たクリーンルーム建築物を提供するものである。
SUMMARY OF THE INVENTION The present invention is proposed to achieve the above object, and comprises an internal support structure provided with a clean room, and an external support structure surrounding the internal support structure. A beam of a plurality of floors passing through the internal support structure is erected in the internal support structure, and a beam of a plurality of floors located between the upper and lower beams of the external support structure is erected in the internal support structure. And the upper and lower sides of the building are alternately arranged, wherein the beam on the internal support structure is a process area for arranging manufacturing equipment to be insulated from vibration, and the pump on the beam on the external support structure is attached to the manufacturing equipment. The present invention provides a clean room building in which manufacturing equipment is configured to be insulated from external vibration by providing a utility area in which vibration sources such as the above are arranged.

【0009】[0009]

【発明の実施の形態】以下、この発明の実施の一形態を
図に従って詳述する。図1はクリーンルーム建築物1の
骨組を示し、クリーンルーム建築物1は、内部支持構造
2と、内部支持構造2を取り囲む外部支持構造3とから
なり、内部支持構造2と外部支持構造3はそれぞれ基礎
4から別々に立ち上げて分離されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below in detail with reference to the drawings. FIG. 1 shows a skeleton of a clean room building 1. The clean room building 1 includes an internal support structure 2 and an external support structure 3 surrounding the internal support structure 2, and the internal support structure 2 and the external support structure 3 are respectively foundations. 4 are separately launched.

【0010】外部支持構造3と内部支持構造2にはそれ
ぞれトラス梁5,6が架設され、最上層のトラス梁5は
外部支持構造3に架設されており、以下、下方へ向かっ
て内部支持構造2のトラス梁6と外部支持構造3のトラ
ス梁5とが一段毎に交互に配設されている。内部支持構
造2の空間はクリーンルームとして使用され、外部支持
構造3は空調機器やエレベータ等を設置するユーティリ
ティ棟として使用される。
[0010] Truss beams 5 and 6 are erected on the outer support structure 3 and the inner support structure 2, respectively, and the truss beam 5 of the uppermost layer is erected on the outer support structure 3. The two truss beams 6 and the truss beams 5 of the external support structure 3 are alternately arranged for each stage. The space of the internal support structure 2 is used as a clean room, and the external support structure 3 is used as a utility building for installing an air conditioner, an elevator, and the like.

【0011】クリーンルーム建築物1の構造を上から順
に説明すると、外部支持構造3に架け渡した最上層のト
ラス梁5は屋根Rを支え、このトラス梁5内の空間は、
外部支持構造3から内部支持構造2へ空気を供給する空
気供給チャンバー7として利用される。空気は外部支持
構造3内に設置された空調機器(図示せず)から空気供
給チャンバー7を介してトラス梁5の下のプロセスエリ
ア(製品製造室空間)8へ供給される。
[0011] The structure of the clean room building 1 will be described in order from the top. The truss beam 5 of the uppermost layer spanned over the external support structure 3 supports the roof R, and the space inside the truss beam 5 is:
It is used as an air supply chamber 7 for supplying air from the external support structure 3 to the internal support structure 2. Air is supplied from an air conditioner (not shown) installed in the external support structure 3 to a process area (product manufacturing room space) 8 below the truss beam 5 via an air supply chamber 7.

【0012】プロセスエリア8の天井9は、このトラス
梁5の下弦材の位置に設置され、天井には必要な清浄度
に応じたファンフィルタユニット10もしくは空気フィ
ルタが設置される。天井9とその下のトラス梁6との空
間がプロセスエリア8であり、プロセスエリア8の床と
なるトラス梁6は、内部支持構造2に支持されて外部支
持構造3とは構造的に絶縁されている。プロセスエリア
8には、製造設備のうちで直接製造に関わり、外部振動
の影響を排除すべき機器が設置される。
The ceiling 9 of the process area 8 is installed at the position of the lower chord of the truss beam 5, and a fan filter unit 10 or an air filter according to the required cleanliness is installed on the ceiling. The space between the ceiling 9 and the truss beam 6 thereunder is a process area 8, and the truss beam 6 serving as the floor of the process area 8 is supported by the internal support structure 2 and is structurally insulated from the external support structure 3. ing. In the process area 8, devices that are directly involved in the manufacturing of the manufacturing equipment and that should be excluded from the influence of external vibration are installed.

【0013】トラス梁6にはグレーチング(穴あきパネ
ル)11が床として敷設され、プロセスエリア8には、
パーティションで仕切られて床下空間と天井裏をつなぐ
ローカルリターンスペース(図示せず)が設けられてい
る。
A grating (perforated panel) 11 is laid on the truss beam 6 as a floor.
A local return space (not shown) is provided which is partitioned by a partition and connects the space under the floor and the space above the ceiling.

【0014】天井9のファンフィルタユニット10から
プロセスエリア8へ供給された清浄空気は、プロセスエ
リア8内を下降してグレーチング11から床下へ流れ、
トラス梁6内の空間である空気還流チャンバ12からロ
ーカルリターンスペースを通じて天井裏に向かって上昇
し、天井9のファンフィルタユニット10によりプロセ
スエリアへ再度吹き出される。また、外部支持構造3内
の空調機器を運転している際は、プロセスエリア8内の
空気の一部は空気還流チャンバ12を通じて外部支持構
造3内の空調機器へ還流する。
The clean air supplied from the fan filter unit 10 on the ceiling 9 to the process area 8 descends in the process area 8 and flows from the grating 11 under the floor.
It rises from the air return chamber 12 which is a space in the truss beam 6 toward the ceiling through the local return space, and is blown out to the process area again by the fan filter unit 10 on the ceiling 9. When the air conditioner in the external support structure 3 is operating, a part of the air in the process area 8 is returned to the air conditioner in the external support structure 3 through the air return chamber 12.

【0015】トラス梁6とその下のトラス梁5との間の
空間はユーティリティエリア13であり、その床14は
外部支持構造3のトラス梁5に支持される。ユーティリ
ティエリア13には、プロセスエリア8内に配置される
製造設備に付帯するポンプ等の振動発生源や振動の影響
を受けない機器を配置する。
The space between the truss beam 6 and the truss beam 5 thereunder is a utility area 13, the floor 14 of which is supported by the truss beam 5 of the external support structure 3. In the utility area 13, vibration sources such as a pump attached to the manufacturing equipment disposed in the process area 8 and devices which are not affected by the vibration are arranged.

【0016】したがって、ユーティリティエリア13で
発生する振動は外部支持構造3へ伝わり、内部支持構造
2には有害な振動は伝播しない。このユーティリティエ
リア13の床14を支えるトラス梁5は、下のプロセス
エリア8の天井裏の梁となり、以下、上記の4層構造を
繰り返すことにより、多層のクリーンルームを構築する
ことができる。
Therefore, the vibration generated in the utility area 13 is transmitted to the external support structure 3, and no harmful vibration is transmitted to the internal support structure 2. The truss beam 5 supporting the floor 14 of the utility area 13 becomes a beam above the ceiling of the lower process area 8, and a multilayer clean room can be constructed by repeating the above four-layer structure.

【0017】また、同図に示すように、グレーチング1
1を支えるトラス梁6の底部に、プロセスエリア8と下
のユーティリティエリア13とを区画する水平隔壁15
を配置すれば、ユーティリティエリア13内に清浄空気
を供給する必要はなくなる。これにより、清浄空気の供
給量を削減できるとともに、ユーティリティエリア13
内の機器や排気ダクト、廃液ライン等の設備のメインテ
ナンスの際にプロセスエリア8内の清浄空気を汚染する
ことがなく、また作業者がクリーンウェアを着衣しなく
とも支障がないのでメインテナンスの作業性が向上す
る。尚、水平隔壁15は空気を遮断することが目的であ
り、装置荷重を支える必要はないものである。
Further, as shown in FIG.
At the bottom of the truss beam 6 that supports the horizontal partition 1, a horizontal partition 15 that partitions the process area 8 and the utility area 13 below.
Is disposed, there is no need to supply clean air into the utility area 13. As a result, the supply amount of clean air can be reduced, and the utility area 13
When the maintenance of the equipment, exhaust ducts, waste liquid lines and other equipment in the interior is performed, the clean air in the process area 8 is not contaminated, and there is no problem even if the worker does not wear cleanware. Is improved. The purpose of the horizontal partition 15 is to block air, and it is not necessary to support the load of the device.

【0018】水平隔壁15を設置した場合は、ユーティ
リティエリア13からプロセスエリア8への配管や配線
が水平隔壁15を貫通することになるが、配管と水平隔
壁15の穴との間隙をシールするか、または、水平隔壁
15にホースジョイントやコンセントを埋め込んで、隔
壁の上下両側からそれぞれ接続する方法によって空気漏
れを防ぐ。
When the horizontal partition 15 is installed, the pipes and wiring from the utility area 13 to the process area 8 penetrate the horizontal partition 15, and it is necessary to seal the gap between the pipe and the hole of the horizontal partition 15. Alternatively, a hose joint or an outlet is buried in the horizontal partition 15 and air leaks are prevented by a method of connecting the partition from the upper and lower sides of the partition.

【0019】外部支持構造3には、空調機器や超純水の
ポンプ等のユーティリティ機器(図示せず)を設置する
ユーティリティ室が設けられる他、製造工程におけるウ
ェハ等のストックエリア、上下のプロセスエリア8を結
ぶ搬送系、作業員の出入り口やエレベータ、事務室等が
設置される。外部支持構造3が内部支持構造2を取り囲
むことにより、内部支持構造2は風から遮蔽され、内部
構造2が風によって揺れることが防止できる。また、外
部支持構造3自体は振動に関する制限が厳しくないの
で、経済的な構造とすることができる。外部支持構造3
内のストックエリアと搬送系のみは、シリコンウェハ等
の製品基材の表面が空気汚染されることを防止するため
に、隔壁により他と区画して局所的に清浄空気を供給し
なければならないが、これ以外の空間には清浄空気を常
時供給する必要はないので運転コストの面でも経済的で
ある。
The external support structure 3 is provided with a utility room for installing utility equipment (not shown) such as an air conditioner and a pump for ultrapure water, as well as a stock area for wafers and the like in the manufacturing process, and an upper and lower process area. A transport system connecting the 8, entrances and exits of workers, elevators, offices, and the like are installed. Since the external support structure 3 surrounds the internal support structure 2, the internal support structure 2 is shielded from the wind, and the internal structure 2 can be prevented from swinging by the wind. In addition, since the external support structure 3 itself is not strictly limited with respect to vibration, the structure can be economical. External support structure 3
In order to prevent the surface of the product substrate such as silicon wafer from being contaminated with air, only the stock area inside and the transfer system must be separated from the others by partition walls to supply clean air locally. Since there is no need to constantly supply clean air to other spaces, the operation cost is economical.

【0020】図2及び図3はクリーンルーム建築物1に
おける基礎の他の実施形態を示し、図2は内部支持構造
2の基礎16と、外部支持構造3の基礎17を分離した
ものであり、図3は、外部支持構造3を潜函形コンクリ
ート基礎18で支持し、潜函形コンクリート基礎18上
の地盤に内部支持構造2の基礎19を形成したものであ
る。このように基礎を分離した場合は、図に示すよう
に、1階のユーティリティエリア13も外部支持構造3
に架設したトラス梁5上に設けて、ユーティリティエリ
ア13から内部支持構造2の基礎16,19への振動の
伝播を遮断すれば、一体形基礎のものよりもさらに防振
性能の向上が期待できる。
FIGS. 2 and 3 show another embodiment of the foundation in the clean room building 1. FIG. 2 shows the foundation 16 of the internal support structure 2 and the foundation 17 of the external support structure 3 separated. Reference numeral 3 denotes a structure in which the external support structure 3 is supported by a latent concrete base 18, and the foundation 19 of the internal support structure 2 is formed on the ground on the latent concrete base 18. When the foundation is separated in this way, as shown in the figure, the utility area 13 on the first floor also has the external support structure 3.
If it is provided on the truss beam 5 erected in the area, and the propagation of vibration from the utility area 13 to the foundations 16 and 19 of the internal support structure 2 is cut off, the vibration isolation performance can be expected to be further improved as compared with that of the integrated foundation. .

【0021】また、図4は図1に示すクリーンルーム建
築物1を単位基本セルとし、平面上に複数の基本セルを
並設した構成を示し、隣接する同一階の内部支持構造2
は、外部支持構造3の構造材間を通過するエキスパンシ
ョンジョイント(図示せず)によって連絡される。すな
わち、構造的には二重構造を持つ複数の建築物が隣接し
て建設された状態であるが、クリーンスペースとしては
一つの部屋として機能することが特徴である。
FIG. 4 shows a configuration in which the clean room building 1 shown in FIG. 1 is used as a unit basic cell, and a plurality of basic cells are arranged side by side on a plane.
Are connected by an expansion joint (not shown) passing between the structural members of the external support structure 3. In other words, structurally, a plurality of buildings having a double structure are constructed adjacent to each other, but are characterized by functioning as one room as a clean space.

【0022】空気の流れからみると、一つの基本セルを
拡大して広いクリーンスペースを構成した場合は、中央
部と外周部の圧力が不均等になり、リターンスペースを
配置した外周部のみエアが循環して中央部は滞留してし
まう現象が生じるが、単位基本セルを隣接させて広いク
リーンスペースを構成することにより、図示例ではリタ
ーンスペースである外部支持構造が6つのブロックに分
かれることになる。このような連結構造をとることで、
広いクリーンエリアを構成しても局所的に空気が滞留す
ることがなく、大面積のクリーンルーム建築物を構築す
ることができる。
From the viewpoint of the flow of air, when one basic cell is enlarged to form a wide clean space, the pressures at the central portion and the outer peripheral portion become uneven, and the air only flows at the outer peripheral portion where the return space is arranged. Although a phenomenon occurs in which the central portion circulates and stays in the central portion, the external support structure, which is a return space in the illustrated example, is divided into six blocks by forming a large clean space by adjoining the unit basic cells. . By taking such a connection structure,
Even if a large clean area is formed, air does not stay locally and a large-sized clean room building can be constructed.

【0023】尚、この発明は上記の実施形態に限定する
ものではなく、この発明の技術的範囲内において種々の
改変が可能であり、この発明がそれらの改変されたもの
に及ぶことは当然である。
The present invention is not limited to the above embodiment, and various modifications are possible within the technical scope of the present invention, and it is natural that the present invention extends to those modifications. is there.

【0024】[0024]

【発明の効果】以上、説明したように、本発明のクリー
ンルーム建築物は、プロセスエリアが設けられる内部支
持構造と、空調機器等のユーティリティ設備を配置する
外部支持構造との2重構造とするとともに、プロセスエ
リア内の製造装置に付帯する電動ポンプなどの振動発生
源を外部支持構造に架設した梁にて支持するので、プロ
セスエリアが全ての振動発生源から構造的に絶縁されて
プロセスエリアの振動が可及的に低下し、半導体等の製
造及び検査工程における不安定要素が解消されて生産性
の向上に寄与できる。また、防振性能が高いことから、
クリーンルームを多層化した高層クリーンルーム建築物
を構築することが可能となり、土地の有効利用が図られ
る等、諸種の効果を奏する発明である。
As described above, the clean room building of the present invention has a double structure including an internal support structure in which a process area is provided and an external support structure in which utility equipment such as an air conditioner is arranged. Since the vibration source such as an electric pump attached to the manufacturing equipment in the process area is supported by the beam erected on the external support structure, the process area is structurally insulated from all the vibration sources and Is reduced as much as possible, and unstable factors in manufacturing and inspection processes of semiconductors and the like are eliminated, which can contribute to improvement in productivity. In addition, because of high anti-vibration performance,
This is an invention that has various effects, for example, it is possible to construct a high-rise clean room building having a multi-layered clean room, and effective use of land is achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態を示し、クリーンルーム建築
物の構造解説図。
FIG. 1 shows an embodiment of the present invention and is a structural explanatory view of a clean room building.

【図2】本発明の他の実施形態を示し、クリーンルーム
建築物の構造解説図。
FIG. 2 is a structural explanatory view of a clean room building, showing another embodiment of the present invention.

【図3】本発明の他の実施形態を示し、クリーンルーム
建築物の構造解説図。
FIG. 3 is a structural explanatory view of a clean room building according to another embodiment of the present invention.

【図4】複数個のクリーンルーム建築物を並設した平面
解説図。
FIG. 4 is a plan explanatory view in which a plurality of clean room buildings are juxtaposed.

【符号の説明】[Explanation of symbols]

1 クリーンルーム建築物 2 内部支持構造 3 外部支持構造 4 基礎 5,6 トラス梁 7 空気供給チャンバー 8 プロセスエリア 10 ファンフィルタユニット 12 空気還流チャンバー 13 ユーティリティエリア 15 水平隔壁 DESCRIPTION OF SYMBOLS 1 Clean room building 2 Internal support structure 3 External support structure 4 Foundation 5, 6 Truss beam 7 Air supply chamber 8 Process area 10 Fan filter unit 12 Air recirculation chamber 13 Utility area 15 Horizontal bulkhead

───────────────────────────────────────────────────── フロントページの続き (72)発明者 篠原 壽邦 宮城県仙台市青葉区荒巻字青葉(無番地) 東北大学工学部電子工学科内 (72)発明者 今井 誠 宮城県仙台市青葉区荒巻字青葉(無番地) 東北大学工学部電子工学科内 (72)発明者 加藤 武彦 茨城県つくば市大字鬼ケ窪1043 株式会社 熊谷組技術研究所内 (72)発明者 石橋 久義 茨城県つくば市大字鬼ケ窪1043 株式会社 熊谷組技術研究所内 (72)発明者 梅田 正芳 東京都新宿区津久戸町2番1号 株式会社 熊谷組東京本社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Toshino Shinohara Aoba, Aoba-ku, Aoba-ku, Sendai City, Miyagi Prefecture (No address) Within the Department of Electronic Engineering, Tohoku University (72) Inventor Makoto Imai Aoba-Aoba, Aramaki-ku, Aoba-ku, Sendai City, Miyagi Prefecture (No address) Tohoku University, Faculty of Engineering, Department of Electronic Engineering (72) Inventor Takehiko Kato, Ogakikubo, Tsukuba, Ibaraki Prefecture 1043 Kumagaya Gumi Technical Research Institute Co., Ltd. Inside the research institute (72) Inventor Masayoshi Umeda 2-1 Tsukudo-cho, Shinjuku-ku, Tokyo Kumagaya Gumi Tokyo head office

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 クリーンルームが設けられる内部支持構
造と、内部支持構造を囲む外部支持構造とからなり、外
部支持構造に内部支持構造内を通過する複数階の梁を架
設し、内部支持構造に外部支持構造の上下の梁間に位置
する複数階の梁を架設して、外部支持構造の梁と内部支
持構造の梁とを上下交互に配した建築物であって、 内部支持構造の梁上を、振動から絶縁すべき製造機器を
配置するプロセスエリアとし、外部支持構造の梁上を、
前記製造機器に付属するポンプ等の振動発生源を配置す
るユーティリティエリアとすることにより、製造機器を
外部振動から絶縁できるように構成したクリーンルーム
建築物。
1. An internal support structure provided with a clean room, and an external support structure surrounding the internal support structure. A beam of a plurality of floors passing through the internal support structure is erected on the external support structure, and an external support structure is provided on the internal support structure. A building in which beams of multiple floors located between the upper and lower beams of the support structure are erected, and the beams of the external support structure and the beams of the internal support structure are alternately arranged up and down. A process area where manufacturing equipment to be insulated from vibration is placed, and on the beams of the external support structure,
A clean room building having a utility area for arranging a vibration source such as a pump attached to the manufacturing equipment so that the manufacturing equipment can be insulated from external vibration.
【請求項2】 上記外部支持構造に架設した梁に、内部
支持構造内のクリーンルームの空気を循環させて浄化す
るファンフィルタユニットを配置するとともに、外部支
持構造に空調機器等のユーティリティ設備を配置し、空
調機器から前記プロセスエリアの天井を通じてプロセス
エリアへ清浄空気を供給し、プロセスエリアの床下空間
を通じて内部支持構造から外部支持構造の空調機器へ空
気を還流させるように構成した請求項1記載のクリーン
ルーム建築物。
2. A fan filter unit for circulating and purifying air in a clean room in the internal support structure is disposed on a beam erected on the external support structure, and utility equipment such as an air conditioner is disposed on the external support structure. 2. The clean room according to claim 1, wherein clean air is supplied from the air conditioner to the process area through the ceiling of the process area, and the air is returned from the internal support structure to the air conditioner of the external support structure through the underfloor space of the process area. Building.
【請求項3】 上記内部支持構造の梁上のプロセスエリ
アと、外部支持構造の梁上のユーティリティエリアとを
隔壁にて遮断し、外部支持構造内の空調機器からプロセ
スエリアへのみ清浄空気を供給するように構成した請求
項2記載のクリーンルーム建築物。
3. A process area on the beam of the internal support structure and a utility area on the beam of the external support structure are blocked by a partition wall, and clean air is supplied only from the air conditioner in the external support structure to the process area. 3. The clean room building according to claim 2, wherein the clean room building is configured to perform the following.
【請求項4】 上記外部支持構造に、プロセスエリアが
必要とする空調機器や給水設備、並びに上下のプロセス
エリアを連絡する搬送系や製品のストックエリア等の諸
設備を配置し、空調機器からストックエリア並びに搬送
系もしくはその周辺へ局所的に清浄空気を供給するよう
に構成した請求項1、2または3記載のクリーンルーム
建築物。
4. An external support structure is provided with air conditioning equipment and water supply equipment required by the process area, as well as various equipment such as a transfer system for connecting the upper and lower process areas and a product stock area. 4. The clean room building according to claim 1, wherein the clean air is locally supplied to the area and the transport system or its periphery.
JP11870598A 1998-04-28 1998-04-28 Clean room building Expired - Fee Related JP3787599B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11870598A JP3787599B2 (en) 1998-04-28 1998-04-28 Clean room building

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11870598A JP3787599B2 (en) 1998-04-28 1998-04-28 Clean room building

Publications (2)

Publication Number Publication Date
JPH11311036A true JPH11311036A (en) 1999-11-09
JP3787599B2 JP3787599B2 (en) 2006-06-21

Family

ID=14743098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11870598A Expired - Fee Related JP3787599B2 (en) 1998-04-28 1998-04-28 Clean room building

Country Status (1)

Country Link
JP (1) JP3787599B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003240290A (en) * 2002-02-14 2003-08-27 Taisei Corp Air conditioning system for multi-layered clean room
JP2007255071A (en) * 2006-03-23 2007-10-04 Kumagai Gumi Co Ltd Compound building
JP2009293295A (en) * 2008-06-05 2009-12-17 Takenaka Komuten Co Ltd Building structure
JP2011196671A (en) * 2010-02-24 2011-10-06 Takenaka Komuten Co Ltd High-load air conditioning system
JP2013155994A (en) * 2012-01-31 2013-08-15 Taisei Corp Air conditioning system and clean room

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003240290A (en) * 2002-02-14 2003-08-27 Taisei Corp Air conditioning system for multi-layered clean room
JP2007255071A (en) * 2006-03-23 2007-10-04 Kumagai Gumi Co Ltd Compound building
JP2009293295A (en) * 2008-06-05 2009-12-17 Takenaka Komuten Co Ltd Building structure
JP2011196671A (en) * 2010-02-24 2011-10-06 Takenaka Komuten Co Ltd High-load air conditioning system
JP2013155994A (en) * 2012-01-31 2013-08-15 Taisei Corp Air conditioning system and clean room

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