JP5514342B2 - 肌の保湿装置 - Google Patents
肌の保湿装置 Download PDFInfo
- Publication number
- JP5514342B2 JP5514342B2 JP2013052862A JP2013052862A JP5514342B2 JP 5514342 B2 JP5514342 B2 JP 5514342B2 JP 2013052862 A JP2013052862 A JP 2013052862A JP 2013052862 A JP2013052862 A JP 2013052862A JP 5514342 B2 JP5514342 B2 JP 5514342B2
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- water
- discharge electrode
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- air
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- 239000004909 Moisturizer Substances 0.000 title 1
- 230000001333 moisturizer Effects 0.000 title 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 101
- 239000003595 mist Substances 0.000 claims description 43
- 230000003020 moisturizing effect Effects 0.000 claims description 8
- 239000002105 nanoparticle Substances 0.000 claims description 4
- 238000001816 cooling Methods 0.000 description 36
- 150000002500 ions Chemical class 0.000 description 24
- 238000009833 condensation Methods 0.000 description 10
- 230000005494 condensation Effects 0.000 description 10
- 238000007664 blowing Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 9
- 230000017525 heat dissipation Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000005192 partition Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 230000001877 deodorizing effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000014759 maintenance of location Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000000889 atomisation Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
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- 238000005530 etching Methods 0.000 description 1
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- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
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- 239000002245 particle Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Images
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- Devices For Medical Bathing And Washing (AREA)
Description
アンモニア: 2NH3+6・OH→N2+6H2O
アセトアルデヒド: CH3CHO+6・OH+O2→2CO2+5H2O
酢酸: CH3COOH+4・OH+O2→2CO2+4H2O
メタンガス: CH+4・OH+O2→CO2+H2O
一酸化炭素: CO+2・OH→CO2+H2O
一酸化窒素: 2NO+4・OH→N2+2CO2+2H2O
ホルムアルデヒド: HCHO+4・OH→CO2+3H2O
即ち、本例の静電霧化装置は、高い保湿効果や脱臭効果が得られることに加えて、水補給や付着物除去の手間が不要となっている。また、放電極11を冷却して結露水を生成するので、使用を開始してからナノイオンミストMを発生させるまでの時間が短くて済み、全体にコンパクトに形成されるものであることから、加湿器やエステスチーマーや空気清浄機等に用ることは勿論、例えばスタンド照明器具等の室内常設器具や、又はヘアドライヤ、髪質改善器具等の手持ち式電気器具等の、短時間だけ使用する商品にも、問題なく装備させて付加価値を得ることができるものである。
6 冷却部
7 放熱部
11 放電極
13 対向電極
14 高電圧印加部
15 送風部
19 送風制御部
20 冷却制御部
23 印加電流検知部
24 温湿度センサ
25 保水部
R1 放熱流路
R2 冷却流路
M ナノイオンミスト
Claims (1)
- 電極と、空気中の水分を基に前記電極に水を供給する水供給手段と、前記電極に高電圧を印加する電極印加手段と、を備え、前記電極に供給された前記水に高電圧を印加してナノサイズのミストを生成し、前記ナノサイズのミストを人体に曝露することを特徴とする肌の保湿装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013052862A JP5514342B2 (ja) | 2013-03-15 | 2013-03-15 | 肌の保湿装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013052862A JP5514342B2 (ja) | 2013-03-15 | 2013-03-15 | 肌の保湿装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010010006A Division JP5342464B2 (ja) | 2010-01-20 | 2010-01-20 | 電気器具 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013135931A JP2013135931A (ja) | 2013-07-11 |
JP5514342B2 true JP5514342B2 (ja) | 2014-06-04 |
Family
ID=48912163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013052862A Expired - Lifetime JP5514342B2 (ja) | 2013-03-15 | 2013-03-15 | 肌の保湿装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5514342B2 (ja) |
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2013
- 2013-03-15 JP JP2013052862A patent/JP5514342B2/ja not_active Expired - Lifetime
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Publication number | Publication date |
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JP2013135931A (ja) | 2013-07-11 |
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