JP5512127B2 - 無線周波数電力搬送システム及び方法 - Google Patents

無線周波数電力搬送システム及び方法 Download PDF

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Publication number
JP5512127B2
JP5512127B2 JP2008538090A JP2008538090A JP5512127B2 JP 5512127 B2 JP5512127 B2 JP 5512127B2 JP 2008538090 A JP2008538090 A JP 2008538090A JP 2008538090 A JP2008538090 A JP 2008538090A JP 5512127 B2 JP5512127 B2 JP 5512127B2
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Japan
Prior art keywords
power
load
dynamic load
power amplifier
impedance matching
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JP2008538090A
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English (en)
Japanese (ja)
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JP2009514176A (ja
JP2009514176A5 (enExample
Inventor
ナガルカッティ，シッダース・ピー
キシネフスキー，ミカエル
シャジイ，アリ
カルバイティス，ティモシー・イー
マッキーニー，ウィリアム・エス，ジュニア
グッドマン，ダニエル
ホルバー，ウィリアム・エム
スミス，ジョン・エイ
ビストルヤク，イルヤ
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MKS Instruments Inc
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MKS Instruments Inc
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
JP2008538090A 2005-10-31 2006-10-31 無線周波数電力搬送システム及び方法 Expired - Fee Related JP5512127B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US73179705P 2005-10-31 2005-10-31
US60/731,797 2005-10-31
PCT/US2006/042360 WO2007053569A1 (en) 2005-10-31 2006-10-31 Radio frequency power delivery system

Publications (3)

Publication Number Publication Date
JP2009514176A JP2009514176A (ja) 2009-04-02
JP2009514176A5 JP2009514176A5 (enExample) 2009-07-09
JP5512127B2 true JP5512127B2 (ja) 2014-06-04

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ID=37808345

Family Applications (1)

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JP2008538090A Expired - Fee Related JP5512127B2 (ja) 2005-10-31 2006-10-31 無線周波数電力搬送システム及び方法

Country Status (5)

Country Link
EP (1) EP1952533A1 (enExample)
JP (1) JP5512127B2 (enExample)
KR (3) KR20130139377A (enExample)
CN (1) CN101297480B (enExample)
WO (1) WO2007053569A1 (enExample)

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US20080179948A1 (en) 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
US7764140B2 (en) 2005-10-31 2010-07-27 Mks Instruments, Inc. Radio frequency power delivery system
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CN102347745A (zh) * 2010-08-04 2012-02-08 国基电子（上海）有限公司 自适应阻抗匹配电路
CN102457090A (zh) * 2010-10-14 2012-05-16 朱斯忠 一种感应充电装置
TWI455172B (zh) 2010-12-30 2014-10-01 Semes Co Ltd 基板處理設備、電漿阻抗匹配裝置及可變電容器
JP5946227B2 (ja) * 2011-01-04 2016-07-05 アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
US8576013B2 (en) * 2011-12-29 2013-11-05 Mks Instruments, Inc. Power distortion-based servo control systems for frequency tuning RF power sources
KR20130086825A (ko) * 2012-01-26 2013-08-05 세메스 주식회사 가변커패시터, 임피던스매칭장치 및 기판처리장치
CN102801433A (zh) * 2012-04-19 2012-11-28 汤姆逊广播电视技术(北京)有限公司 中波广播发射天线自适应匹配网络的调谐方法
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
JP6113450B2 (ja) * 2012-09-07 2017-04-12 株式会社ダイヘン インピーダンス調整装置
US9294100B2 (en) * 2012-12-04 2016-03-22 Advanced Energy Industries, Inc. Frequency tuning system and method for finding a global optimum
US10821542B2 (en) * 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
CN103454489B (zh) * 2013-09-12 2016-09-21 清华大学 匹配网络的损耗功率标定方法及系统
TWI668725B (zh) * 2013-10-01 2019-08-11 美商蘭姆研究公司 使用模型化、回授及阻抗匹配之蝕刻速率的控制
CN105097397B (zh) * 2014-05-22 2018-05-08 北京北方华创微电子装备有限公司 阻抗匹配装置及半导体加工设备
CN107112972B (zh) * 2014-12-19 2023-02-14 麻省理工学院 具有相位切换元件的可调谐匹配网络
US10790784B2 (en) 2014-12-19 2020-09-29 Massachusetts Institute Of Technology Generation and synchronization of pulse-width modulated (PWM) waveforms for radio-frequency (RF) applications
US9948265B2 (en) * 2015-05-14 2018-04-17 Mediatek Inc. Inductor capacitor tank for resonator
US10229816B2 (en) * 2016-05-24 2019-03-12 Mks Instruments, Inc. Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network
JP2017073770A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
JP2017073772A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
CN109150132A (zh) * 2017-06-19 2019-01-04 展讯通信（上海）有限公司 阻抗调谐方法、装置及移动终端
KR102504624B1 (ko) 2017-07-07 2023-02-27 어드밴스드 에너지 인더스트리즈 인코포레이티드 플라즈마 전력 전달 시스템을 위한 주기 간 제어 시스템 및 그 동작 방법
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US11076477B2 (en) * 2017-10-03 2021-07-27 Mks Instruments, Inc. Cooling and compression clamp for short lead power devices
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
TWI872423B (zh) 2017-11-17 2025-02-11 新加坡商Aes 全球公司 用於在空間域和時間域上控制基板上的電漿處理之系統和方法，及相關的電腦可讀取媒體
US12505986B2 (en) 2017-11-17 2025-12-23 Advanced Energy Industries, Inc. Synchronization of plasma processing components
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
CN108152696A (zh) * 2017-12-27 2018-06-12 扬州市神州科技有限公司 匹配器动态测试方法
US10672590B2 (en) * 2018-03-14 2020-06-02 Lam Research Corporation Frequency tuning for a matchless plasma source
KR102348338B1 (ko) * 2019-02-07 2022-01-06 엠케이에스코리아 유한회사 펄스형 가변 주파수 rf 발생기의 구동 주파수 제어 방법
US12261029B2 (en) 2020-06-17 2025-03-25 Lam Research Corporation Protection system for switches in direct drive circuits of substrate processing systems
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
US12046448B2 (en) 2022-01-26 2024-07-23 Advanced Energy Industries, Inc. Active switch on time control for bias supply
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply
KR102760483B1 (ko) * 2022-10-21 2025-02-03 전북대학교산학협력단 임피던스 조정 회로

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US7477711B2 (en) * 2005-05-19 2009-01-13 Mks Instruments, Inc. Synchronous undersampling for high-frequency voltage and current measurements

Also Published As

Publication number Publication date
EP1952533A1 (en) 2008-08-06
CN101297480A (zh) 2008-10-29
KR20130139377A (ko) 2013-12-20
CN101297480B (zh) 2012-08-08
KR200476063Y1 (ko) 2015-01-23
KR20080072642A (ko) 2008-08-06
WO2007053569A1 (en) 2007-05-10
JP2009514176A (ja) 2009-04-02
KR20140005091U (ko) 2014-09-25

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