JP5497860B2 - Heat treatment furnace and support for heat treatment furnace - Google Patents

Description

  The present invention relates to a heat treatment furnace and a support for a heat treatment furnace.

  In the manufacture of semiconductor devices, various heat treatment apparatuses are used to perform processes such as oxidation, diffusion, and CVD (Chemical Vapor Deposition) on a semiconductor wafer that is an object to be processed. The general heat treatment apparatus includes a processing container (reaction tube) for housing and heat-treating a semiconductor wafer, a resistance heating element provided around the processing container, and a resistance heating element provided around the resistance heating element. A heat treatment furnace is configured with the heat insulating material, and a resistance heating element is disposed on the inner wall surface of the heat insulating material via a support.

  As the resistance heating element, for example, in the case of a heat treatment apparatus capable of batch processing, a spiral heater wire disposed along the inner wall surface of a cylindrical heat insulating material is used, and the inside of the furnace is, for example, 800 to It can be heated to about 1000 ° C. In addition, as the heat insulating material, for example, a heat insulating material made of a ceramic fiber or the like is fired into a cylindrical shape, and the amount of heat taken as radiant heat and conduction heat is reduced to promote efficient heating. it can. As the support, for example, a ceramic material is used, and the heater wire is supported at a predetermined pitch so as to be capable of thermal expansion and contraction.

  By the way, in the heat treatment furnace, the heater wire is formed in a spiral shape and supported with a clearance from the heat insulating material so as to be capable of thermal expansion and contraction. However, when the heater wire is used at a high temperature, creep distortion occurs, and the wire length gradually increases with time. Further, even during heating, the heater wire causes thermal expansion. Furthermore, there is a type that performs rapid cooling by blowing air to the heater wire when the temperature is lowered. In this way, the heater wire may be deformed by repeating the temperature increase and decrease, and may be short-circuited with the adjacent heater wire to cause disconnection.

  In particular, in the case of a vertical heat treatment furnace, when the heater wire moves within the support body due to repeated thermal expansion and contraction due to temperature rise and fall, the heater wire moves downward little by little due to gravity, and there is a movement amount at the bottom turn. As the heater wire accumulates, the winding diameter increases due to the accumulation of movement of the heater wire, the heater wire that reaches the inner surface of the heat insulating material and cannot expand outward, deforms up and down, and occurs when the adjacent heater wire is short-circuited The heater wire is disconnected by the heat of the spark.

  In order to eliminate such problems, in order to prevent the heater wire from accumulating at one end side due to creep or thermal expansion, a shaft projecting outward in the radial direction of the furnace is formed on the outer side of the resistance heating element. There has also been proposed a structure in which a fixing member such as a shape is attached by welding and the tip of the fixing member is embedded and fixed in a heat insulating material (see Patent Document 1).

Japanese Patent Laid-Open No. 10-233277

  However, as described above, the resistance heating element is fixed by joining the fixing member to the outer portion of the resistance heating element and burying the fixing member in the heat insulating material. It is conceivable that the movement in the radial direction is constrained, the stress tends to concentrate on the joint portion of the fixing member in the resistance heating element, and the durability is lowered (short life). In addition, since the fixing member is in the shape of a rod shaft, it is easy to come off the heat insulating material, and the holding performance is poor, it is difficult to maintain the fixing performance of the resistance heating element, and the durability may be reduced.

  The present invention has been made in consideration of the above circumstances, and can prevent the resistance heating element from moving downward while allowing the resistance heating element to move in the radial direction accompanying the thermal expansion and contraction of the resistance heating element. It is an object of the present invention to provide a heat treatment furnace and a support for heat treatment furnace that can improve durability.

The heat treatment furnace of the present invention includes a cylindrical heat insulating material that surrounds a processing vessel for housing and heat-treating a target object, and a spiral resistance heating element that is disposed along the inner peripheral surface of the heat insulating material. In the heat treatment furnace provided with a support body that is provided on the inner peripheral surface of the heat insulating material at a predetermined pitch in the axial direction and supports the resistance heating element so as to be capable of thermal expansion and contraction in the radial direction, the support body has a tip at the end A horizontal portion embedded in a heat insulating material and slidably supporting the resistance heating element on the upper surface , and a vertical portion rising from the rear end of the horizontal portion, and a longitudinal direction on the upper surface of the horizontal portion An upper R portion is formed along the lower surface of the horizontal portion, and a groove for reducing the heat capacity of the support is formed along the longitudinal direction , and a lower R portion is formed at both ends of the groove. There characterized that you have been formed.

It is preferable that a protrusion is provided at the tip of the horizontal part to prevent the heat insulating material from coming off, and the support is provided at a predetermined pitch in the axial direction of the inner peripheral surface of the heat insulating material. Preferably, the upper and lower ends of the vertical portion are formed with a concave portion and a convex portion that engage with the vertical portions of the upper and lower supports, and the front surface of the vertical portion is formed in a curved shape. It is preferable that

Further, the support for a heat treatment furnace of the present invention is provided at a predetermined pitch in the axial direction on the inner peripheral surface of a cylindrical heat insulating material that encloses a processing container for accommodating and heat-treating an object to be processed. A support for a heat treatment furnace for supporting a spiral resistance heating element arranged along the inner peripheral surface of the heat treatment furnace in a radial direction so as to be capable of thermal expansion and contraction, a tip embedded in the heat insulating material, A horizontal portion that slidably supports the resistance heating element, and a vertical portion that rises from the rear end of the horizontal portion, and an upper R portion is formed along the longitudinal direction on the upper surface of the horizontal portion. the lower surface of Rutotomoni the horizontal section, the groove in order to reduce the heat capacity of the support is formed along the longitudinal direction, and on both ends of the groove and features that you have lower R portion is formed To do.

  According to the present invention, on the inner peripheral surface of the cylindrical heat insulating material, the support body that supports the spiral resistance heating element in a radial direction so as to be capable of thermal expansion and contraction is provided at a predetermined pitch in the axial direction. The tip is embedded in a heat insulating material, and is formed by a horizontal part that slidably supports the heating element on the upper surface, and a vertical part that rises from the rear end of the horizontal part, and the heat capacity of the support is formed on the lower surface of the horizontal part. By forming the groove for reducing the length along the longitudinal direction, the durability of the heat treatment furnace including the resistance heating element can be improved.

1 is a longitudinal sectional view schematically showing an embodiment of a heat treatment furnace of the present invention. It is a perspective view which shows a part of the heat processing furnace. It is a partial cross-sectional view of the heat treatment furnace. It is a partial longitudinal cross-sectional view of the heat treatment furnace. It is a figure which shows partially the attachment structure of the terminal member in a resistance heating element, (a) is a top view, (b) is a side view. It is a perspective view which shows a support body. It is a figure which shows the relationship between a support body and a movement prevention member. It is a perspective view of a movement prevention member. It is a side view of a resistance heating element. It is explanatory drawing explaining the other example of arrangement | positioning of a movement prevention member. It is explanatory drawing explaining the other example of a shape of a movement prevention member.

  The best mode for carrying out the present invention will be described below in detail with reference to the accompanying drawings. 1 is a longitudinal sectional view schematically showing an embodiment of the heat treatment furnace of the present invention, FIG. 2 is a perspective view showing a part of the heat treatment furnace, FIG. 3 is a partial cross-sectional view of the heat treatment furnace, and FIG. FIG. 2 is a partial longitudinal sectional view of the heat treatment furnace.

  In FIG. 1, reference numeral 1 denotes a vertical heat treatment apparatus which is one of semiconductor manufacturing apparatuses. This heat treatment apparatus 1 accommodates a large number of semiconductor wafers w to be processed at one time, for example, oxidation, diffusion and decompression. A vertical heat treatment furnace 2 capable of performing heat treatment such as CVD is provided. The heat treatment furnace 2 includes a processing container (also referred to as a reaction tube) 3 for storing wafers w in multiple stages and performing a predetermined heat treatment, a cylindrical heat insulating material 4 surrounding the processing container 3, and the heat insulating material. 4 is mainly provided with a spiral resistance heating element (also referred to as a heater wire) 5 arranged along the inner peripheral surface. A heater (heating device) 6 is constituted by the heat insulating material 4 and the resistance heating element 5.

  The heat treatment apparatus 1 includes a base plate 7 for installing the heater 6. The base plate 7 is formed with an opening 8 for inserting the processing container 3 from below to above. The opening 8 is a heat insulating material (not shown) so as to cover the gap between the base plate 7 and the processing container 3. Material is provided.

The processing vessel 3 is also referred to as a process tube and is made of quartz, and is formed in a vertically long cylindrical shape with the upper end closed and the lower end opened. An outward flange 3a is formed at the open end of the processing container 3, and the flange 3a is supported by the base plate 7 via a flange presser (not shown). The processing container 3 in the illustrated example has an introduction port (introduction port) 9 for introducing a processing gas, an inert gas or the like into the processing container 3 on the lower side, and an exhaust port (not shown) for exhausting the gas in the processing container 2. (Exhaust port) is provided. The introduction port 9 is connected to a gas supply source, and the exhaust port is an exhaust equipped with a vacuum pump capable of pressure reduction control to about 10 to 10 ⁻⁸ Torr (1.3 to 1.3 × 10 ⁻⁹ kPa), for example. The system is connected.

  Below the processing container 3, a lid 10 that can be opened and closed in the vertical direction for closing the lower end opening (furnace port) of the processing container 3 is provided so as to be movable up and down by a lifting mechanism (not shown). On the top of the lid body 10, for example, a heat retaining cylinder 11 as a heat retaining means for the furnace opening is placed. On the heat retaining cylinder 11, for example, a large number of wafers w having a diameter of 300 mm, for example, about 100 to 150 wafers are vertically moved. A quartz boat 12 which is a holder mounted at a predetermined interval in the direction is placed. The lid 10 is provided with a rotation mechanism 55 that rotates the boat 12 about its axis. The boat 12 is unloaded from the processing container 3 into the lower loading area by the downward movement of the lid body 10, and is transferred into the processing container 3 by the upward movement of the lid body 10 after the wafer w is transferred ( Loaded).

  5A and 5B are views partially showing the attachment structure of the terminal member in the resistance heating element. FIG. 5A is a plan view, FIG. 5B is a side view, FIG. 6 is a perspective view showing the support, and FIG. FIG. 8 is a perspective view of the movement blocking member, and FIG. 9 is a side view of the resistance heating element.

  As shown in FIGS. 2 to 5, the heater 6 includes the heat insulating material 4, a spiral resistance heating element 5 disposed along the inner periphery of the heat insulating material 4, and the inner periphery of the heat insulating material 4. A support 13 that supports the resistance heating element 5 is provided on the surface in a predetermined pitch in the axial direction, and is arranged outside the resistance heating element 5 at an appropriate interval in the axial direction and penetrates the heat insulating material 4 in the radial direction. A plurality of terminal plates 14 extended to the outside and the resistance heating element 5 are provided for every predetermined turn (for example, every 1.5 turns), abutting against one side of the support 13 and the resistance heating element 5 And a movement preventing member (stopper) 15 for preventing downward movement.

  The resistance heating element 5 is made of, for example, Kanthal wire (Kantal is a registered trademark) which is an alloy wire of iron (Fe), chromium (Cr) and aluminum (Al). Although the thickness of the resistance heating element 5 varies depending on the specifications of the heat treatment furnace 2, for example, a diameter of about 4 mm is used.

  The resistance heating element 5 is spirally formed along the inner wall surface of the heat insulating material 4 with a predetermined winding diameter and a predetermined pitch that do not contact the heat insulating material 4. The inner diameter of the heat insulating material is 600 mm, for example. The resistance heating element 5 has a predetermined arrangement pitch capable of securing a predetermined amount of heat inside the cylindrical heat insulating material 4 via a support 13 made of a heat-resistant and electrically insulating material such as ceramic and a heat insulating material 4 It is supported so as to be capable of thermal expansion and contraction (movable in the radial direction and circumferential direction of the helix) with a predetermined gap s, for example, s = 10 mm, from the inner wall surface.

  As shown in FIGS. 3 and 6 to 7, the support 13 has a horizontal portion 13a whose tip is embedded in the heat insulating material 4, and a vertical portion 13b that rises from the rear end of the horizontal portion 13a. ing. In this case, in order to reduce the frictional resistance when the resistance heating element 5 slides due to thermal expansion and contraction, at least the upper surface of the horizontal portion 13a and the front surface of the vertical portion 13b, that is, the portion that can come into contact with the resistance heating element 5 is a curved surface. It is preferable that it is formed in a shape. In the illustrated example, an upper R portion 16 is formed on the upper surface of the horizontal portion 13a, and a core direction R portion 17 is formed on the front surface of the vertical portion 13b. In order to reduce the heat capacity of the support 13, a groove 18 is provided along the longitudinal direction on the lower surface of the horizontal portion 13a.

  Further, lower R portions 19 are formed on both sides of the groove 18 on the lower surface of the horizontal portion 13a, so that even if the resistance heating element 5 contacts the lower surface of the horizontal portion 13a, the frictional resistance can be reduced. It has become. Protrusions 20 projecting on both sides are provided at the front end of the horizontal portion 13a in order to prevent the heat insulating material 4 from coming off. A concave portion 21 and a convex portion 22 that can be engaged with each other are formed at the upper end portion and the lower end portion of the vertical portion 13b of the support body 13, and the concave portion 21 and the convex portion 22 are engaged with each other as shown in FIG. Thus, the support 13 is arranged in series at a predetermined pitch in the axial direction of the heat insulating material 4 by vertically arranging the vertical portions 13b of the support 13 on the upper and lower sides. The support 13 is disposed on the inner peripheral surface of the heat insulating material 4 at a predetermined interval, for example, an interval of 30 degrees in the circumferential direction. The distance t between the inner wall surface of the heat insulating material 4 and the front surface of the vertical portion 13b of the support 13 is, for example, 10 mm, and the gap h between the groove portions 23 formed between the horizontal portions 13a of the upper and lower supports 13 is, for example, 5 mm. The

  As shown in FIGS. 4 to 9, the resistance heating element 5 is provided with terminal plates 14 for electrode connection that extend through the heat insulating material 4 to the outside at appropriate intervals in the axial direction of the heat insulating material 4. In the heat treatment furnace 2, the inside of the processing vessel 3 is divided into a plurality of zones in the vertical direction so that the temperature can be controlled. The terminal plate 14 is made of the same material as the resistance heating element 5 and is formed in a plate shape having a required cross-sectional area from the viewpoint of preventing fusing and suppressing heat dissipation.

  In order to attach the terminal plate 14, the resistance heating element 5 is cut at the attachment portion of the terminal plate 14 at an intermediate position as shown in FIG. 5, and the cut ends 5a are radially outward of the heat insulating material 4. The bent both ends 5a are fixed to both surfaces of the terminal board 14 by welding. In particular, in order to alleviate the stress concentration on the welded joint, the bent portions 24 of the both ends 5a of the resistance heating element 5 cut are R-bent.

  Although the spiral resistance heating element 5 arranged in the vertical direction is fixed to the heat insulating material 4 through the terminal plate 14 for each zone, it is supported through the support 13 so as to be capable of thermal expansion and contraction. Therefore, in this state, when elongation occurs due to creep, thermal expansion, or the like, the elongation tends to accumulate below each zone due to gravity. Therefore, in order to prevent the resistance heating element 5 from accumulating below each zone due to gravity due to creep, thermal expansion, or the like, the resistance heating element 5 includes the support body as shown in FIGS. 13, a movement preventing member 15 that contacts the one side surface (the left side surface in FIG. 7 because the resistance heating element is inclined downward to the right) and prevents the resistance heating element 5 from moving downward is provided every predetermined turn. Is provided.

  When the movement preventing member 15 is arranged for each turn of the resistance heating element 5, since the movement preventing member 15 is adjacent to the upper and lower sides, there is a risk of short-circuiting due to contact with each other. For example, FIG. ), It is preferable to dispose the movement preventing member 15 by shifting the position by one pitch or several pitches of the support 13 in the circumferential direction so as not to be adjacent vertically. Thereby, it can prevent that the movement prevention members 15 contact and short-circuit.

  The movement blocking member 15 is made of the same material as the resistance heating element 5. As shown in FIG. 8, the movement preventing member 15 is fixed to the resistance heating element 5 by welding 25 so as not to protrude toward the heat insulating material (radially outward) from the resistance heating element 5 and to protrude in the vertical direction. . In the illustrated example, the movement preventing member 15 has a shape (half ring shape or substantially C shape) in which a ring that can be fitted to the outer periphery of the resistance heating element 5 is cut in half, and moves to the inner peripheral side of the resistance heating element. It is preferable that the groove 15a of the blocking member 15 is fixed by two welds 25 at the top and bottom in a state where the groove 15a is engaged. By providing in this way, the movement preventing member 15 can be prevented from coming into contact with the heat insulating material 4 to ensure free movement of the resistance heating element 5 in the radial direction, and moment and stress can be applied to the resistance heating element 5 at the time of movement inhibition. Concentration can be prevented from occurring.

  FIG. 11 shows another example of the shape of the movement preventing member. As shown in FIG. 11 (a), the movement blocking member 15 may have a rectangular parallelepiped shape that is long in the vertical direction and has a groove 15a formed in the middle in the vertical direction, or as shown in FIG. 11 (b). Alternatively, a round bar shaft may be fixed to the top and bottom of the resistance heating element 5, or a rectangular shaft may be fixed to the top and bottom of the resistance heating element 5 as shown in FIG. .

  In order to maintain the shape of the heat insulating material 4 and reinforce the heat insulating material 4, as shown in FIG. 1, the outer periphery of the heat insulating material 4 is covered with a metal outer skin (outer shell) 26. In addition, the outer periphery of the outer skin 26 is covered with a water cooling jacket 27 in order to suppress the thermal influence on the outside of the heater. An upper heat insulating material 28 that covers the top of the heat insulating material 4 is provided, and a stainless steel top plate 29 that covers the top (upper end) of the outer skin 26 is provided on the upper heat insulating material 28.

  In order to rapidly cool the wafer after the heat treatment and improve the processing speed or improve the throughput, the heater 6 includes an exhaust heat system 31 for exhausting the atmosphere in the space 30 between the heater 6 and the processing container 3 to the outside. Cooling means 32 for forcibly cooling the space 30 by introducing a cooling fluid (for example, air) is provided. The exhaust heat system 31 is mainly composed of, for example, an exhaust port 33 provided in the upper part of the heater 6 and an unshown exhaust heat pipe connecting the exhaust port 33 and a factory exhaust system (not shown). The exhaust heat pipe is provided with an exhaust blower and a heat exchanger (not shown).

  The cooling means 32 includes a plurality of annular flow paths 34 formed in the height direction between the heat insulating material 28 and the outer skin 26, and a heat insulating material 4 for blowing cooling fluid from each annular flow path 34 to the space 30. It has a blowout hole 35 provided.

  On the outer surface of the outer skin 26, a common supply duct (not shown) for distributing and supplying the cooling fluid to each annular flow path 34 is provided along the height direction. A communication port that communicates with the annular flow path 34 is formed. A cooling fluid supply source (for example, a blower) (not shown) that sucks air in the clean room as a cooling fluid and supplies it by pressure is connected to the supply duct via an open / close valve.

  According to the heat treatment furnace 2 configured as described above, the support 13 for supporting the spiral resistance heating element 5 on the inner peripheral surface of the cylindrical heat insulating material 4 so as to be thermally expandable and contractable in the radial direction is provided in the axial direction. In addition to being provided at a predetermined pitch, a resistance member 15 is provided for each predetermined turn to prevent the resistance heating element 5 from moving downward by contacting the resistance heating element 5 to one side surface of the support 13. It is possible to prevent a phenomenon in which elongation due to creep or thermal expansion of the heating element 5 accumulates to one end side. Therefore, the winding diameter on one end side of the resistance heating element 5 increases and does not come into contact with the inner peripheral surface of the heat insulating material 4, so that the resistance heating element 5 may be deformed such as buckling or broken due to a short circuit. The durability of the resistance heating element 5 can be improved. In addition, the resistance heating element itself is not fixed as in the conventional fixing member, but the thermal expansion / contraction movement in the radial direction of the resistance heating element 5 can be allowed. Thus, the resistance heating element 5 and thus the durability of the heat treatment furnace 2 can be improved (long life).

  In addition, this invention is not limited to the said embodiment, A various design change is possible within the range of the summary of this invention. For example, the processing container may be formed by connecting a cylindrical manifold made of a heat-resistant metal such as stainless steel having an introduction pipe part and an exhaust pipe part to the lower end part, and has a double pipe structure. May be.

w Semiconductor wafer (object to be processed)
DESCRIPTION OF SYMBOLS 2 Heat treatment furnace 3 Processing container 4 Heat insulating material 5 Resistance heating element 13 Support body 13a Horizontal part 13b Vertical part 14 Terminal board 15 Movement prevention member 18 Groove

Claims (5)

A cylindrical heat insulating material that surrounds a processing container for housing and heat-treating the object to be processed, a spiral resistance heating element disposed along the inner peripheral surface of the heat insulating material, and the inner peripheral surface of the heat insulating material The support body is provided at a predetermined pitch in the axial direction and includes a support body that supports the resistance heating element in a radial direction so as to be capable of thermal expansion and contraction. And a horizontal portion that slidably supports the resistance heating element, and a vertical portion that rises from the rear end of the horizontal portion, and an upper R portion along the longitudinal direction on the upper surface of the horizontal portion. the lower surface of the horizontal portion while being formed, a groove for reducing the heat capacity of the support is formed along the longitudinal direction, and the Rukoto at both ends of the groove is lower R unit is formed A heat treatment furnace characterized.   The heat treatment furnace according to claim 1, wherein a protrusion for preventing the heat insulating material from coming off is provided at a tip of the horizontal portion.   When the support is provided at a predetermined pitch in the axial direction of the inner peripheral surface of the heat insulating material, the upper end portion and the lower end portion of the vertical portion include a recess in which the vertical portions of the upper and lower support members engage with each other. The heat treatment furnace according to claim 1, wherein a convex portion is formed. The heat treatment furnace according to claim 1, wherein a front surface of the vertical portion is formed in a curved shape. A spiral provided at a predetermined pitch in the axial direction on the inner peripheral surface of a cylindrical heat insulating material that encloses a processing container for housing and heat-treating the object to be processed, and arranged along the inner peripheral surface of the heat insulating material A support for a heat treatment furnace for supporting a cylindrical resistance heating element in a radial direction so as to be capable of thermal expansion and contraction, a tip embedded in the heat insulating material, and horizontally supporting the resistance heating element slidably on an upper surface And a vertical portion rising from the rear end of the horizontal portion, and an upper R portion is formed along the longitudinal direction on the upper surface of the horizontal portion, and the lower surface of the horizontal portion is grooves in order to reduce the heat capacity of the support is formed along the longitudinal direction, and a heat treatment furnace for support on both ends of the groove, characterized that you have lower R portion is formed.