JP5490959B1 - Rosin for solder flux and solder flux using the same - Google Patents
Rosin for solder flux and solder flux using the same Download PDFInfo
- Publication number
- JP5490959B1 JP5490959B1 JP2013237924A JP2013237924A JP5490959B1 JP 5490959 B1 JP5490959 B1 JP 5490959B1 JP 2013237924 A JP2013237924 A JP 2013237924A JP 2013237924 A JP2013237924 A JP 2013237924A JP 5490959 B1 JP5490959 B1 JP 5490959B1
- Authority
- JP
- Japan
- Prior art keywords
- rosin
- acid
- solder flux
- mass
- solder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 229940037312 stearamide Drugs 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000003784 tall oil Substances 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- RBNWAMSGVWEHFP-WAAGHKOSSA-N terpin Chemical compound CC(C)(O)[C@H]1CC[C@@](C)(O)CC1 RBNWAMSGVWEHFP-WAAGHKOSSA-N 0.000 description 1
- 229950010257 terpin Drugs 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/362—Selection of compositions of fluxes
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
【課題】はんだ飛散を抑制することができ、かつボイドが発生しにくくフラックスに優れた洗浄性を付与し得るはんだフラックス用ロジンを提供する。
【解決手段】本発明のはんだフラックス用ロジンは、メチルデヒドロアビエチン酸と、メチルデヒドロアビエチン酸以外の他の樹脂酸とを含有し、メチルデヒドロアビエチン酸が、ロジン全体に対して20〜70質量%の割合で含まれる。好ましくは、メチルデヒドロアビエチン酸および他の樹脂酸が、ロジン全体に対して合計で99質量%以上の割合で含有される。さらに、本発明のはんだフラックスは、上記はんだフラックス用ロジンを含有する。
【選択図】なしProvided is a rosin for solder flux that can suppress solder scattering and that is less likely to generate voids and can impart excellent cleaning properties to the flux.
The rosin for solder flux of the present invention contains methyl dehydroabietic acid and other resin acid other than methyl dehydroabietic acid, and the methyl dehydroabietic acid is 20 to 70% by mass with respect to the entire rosin. Included in the ratio. Preferably, methyl dehydroabietic acid and other resin acids are contained in a total proportion of 99% by mass or more based on the whole rosin. Further, the solder flux of the present invention contains the above rosin for solder flux.
[Selection figure] None
Description
本発明は、はんだ飛散を抑制することができ、かつボイドが発生しにくくフラックスに優れた洗浄性を付与し得るはんだフラックス用ロジンに関する。 The present invention relates to a rosin for solder flux that can suppress solder scattering and that is less likely to generate voids and can impart excellent cleaning properties to the flux.
ロジンは、松科植物に含まれる松脂の不揮発成分であり、ジテルペンカルボン酸(樹脂酸)の各種異性体を主成分として含んでいる。ロジンは、比較的安価で大量に供給し得る再生可能な植物資源であり、例えば各種誘導体に変換され、粘着付与剤、印刷インキ用樹脂、合成ゴム用乳化剤、製紙用サイズ剤などに利用されている。 Rosin is a non-volatile component of pine resin contained in a pine family plant and contains various isomers of diterpene carboxylic acid (resin acid) as a main component. Rosin is a relatively inexpensive and renewable plant resource that can be supplied in large quantities. For example, it is converted into various derivatives and used as tackifiers, resins for printing inks, emulsifiers for synthetic rubber, sizing agents for papermaking, etc. Yes.
ロジンを誘導体化する方法としては、例えば、ロジンとホルムアルデヒドとを反応させる方法が挙げられる。このロジン誘導体には、メチルデヒドロアビエチン酸が含まれることが知られており(特許文献1および非特許文献1)、その他、樹脂酸の脱水縮合物、原料のロジンに由来する樹脂酸、樹脂酸の分解物や異性体などが含まれる。 Examples of the method for derivatizing rosin include a method of reacting rosin with formaldehyde. This rosin derivative is known to contain methyl dehydroabietic acid (Patent Document 1 and Non-Patent Document 1), in addition to the dehydration condensate of resin acid, resin acid derived from raw material rosin, resin acid Degradation products and isomers.
このようなロジン誘導体に含まれるメチルデヒドロアビエチン酸は、デヒドロアビエチン酸と類似する構造を有しているものの、メチルデヒドロアビエチン酸自体の用途は、ほとんど知られていない。非特許文献1には、メチルデヒドロアビエチン酸の具体的な用途が記載されておらず、特許文献1にも、結晶性熱可塑性樹脂組成物として成形品の製造に供されることしか記載されていない。 Although methyl dehydroabietic acid contained in such rosin derivatives has a structure similar to dehydroabietic acid, the use of methyl dehydroabietic acid itself is hardly known. Non-Patent Document 1 does not describe the specific use of methyl dehydroabietic acid, and Patent Document 1 only describes that it is used for the production of a molded product as a crystalline thermoplastic resin composition. Absent.
本発明者らは、メチルデヒドロアビエチン酸の新規な用途について鋭意検討を行った結果、メチルデヒドロアビエチン酸が、はんだフラックス用樹脂として一般に使用されている水添ロジンおよび不均化ロジンの主成分であるデヒドロアビエチン酸(式(I))ほど強い結晶性を有していないことを見出した。そこで、メチルデヒドロアビエチン酸を、はんだフラックス用樹脂として使用すると、従来用いられている水添ロジンおよび不均化ロジンよりも、はんだ飛散を抑制することができ、かつボイドが発生しにくくフラックスに優れた洗浄性を付与し得ることを見出した。 As a result of intensive studies on novel uses of methyl dehydroabietic acid, the present inventors have found that methyl dehydroabietic acid is a main component of hydrogenated rosin and disproportionated rosin that are generally used as solder flux resins. It has been found that certain dehydroabietic acid (formula (I)) is not as crystalline as it is. Therefore, when methyl dehydroabietic acid is used as a resin for solder flux, it can suppress solder scattering and is excellent in flux because it is less likely to generate voids than conventional hydrogenated rosin and disproportionated rosin. It was found that it was possible to impart a good cleaning property.
すなわち本発明の課題は、はんだ飛散を抑制することができ、かつボイドが発生しにくくフラックスに優れた洗浄性を付与し得るはんだフラックス用ロジン、およびこのロジンを含むはんだフラックスを提供することである。 That is, an object of the present invention is to provide a solder flux rosin that can suppress solder scattering and that is less likely to generate voids and can impart excellent cleaning properties to the flux, and a solder flux containing this rosin. .
本発明者らは、上記課題を解決するべく鋭意検討を行った結果、以下の構成からなる解決手段を見出し、本発明を完成するに至った。
(1)メチルデヒドロアビエチン酸と、メチルデヒドロアビエチン酸以外の他の樹脂酸とを含有するはんだフラックス用ロジンであって、前記メチルデヒドロアビエチン酸が、ロジン全体に対して20〜70質量%の割合で含まれる、はんだフラックス用ロジン。
(2)前記メチルデヒドロアビエチン酸および他の樹脂酸が、ロジン全体に対して合計で99質量%以上の割合で含有される、(1)に記載のはんだフラックス用ロジン。
(3)前記他の樹脂酸が、ジヒドロアビエチン酸およびテトラヒドロアビエチン酸の少なくとも一方を含有する、(1)または(2)に記載のはんだフラックス用ロジン。
(4)上記(1)〜(3)のいずれかに記載のはんだフラックス用ロジンを含有する、はんだフラックス。
(5)はんだ合金粉末と、(4)に記載のはんだフラックスとを含有する、ソルダペースト。
(6)上記(5)に記載のソルダペーストによるはんだ付部を備える、電子回路基板。
(7)上記(1)に記載のはんだフラックス用ロジンを製造する方法であって、ロジンと酸触媒との混合物に、前記ロジン1モルに対して0.4モル以上のホルムアルデヒド供与物質を添加する工程、および前記添加する工程の後、前記混合物を加熱して反応させ反応生成物を得る工程を含む、はんだフラックス用ロジンの製造方法。
(8)前記反応生成物を得る工程の後、前記反応生成物から樹脂酸を精製する工程をさらに含む、(7)に記載の製造方法。
(9)前記反応生成物を得る工程の後、前記反応生成物に含まれる樹脂酸を水素化する工程をさらに含む、(7)または(8)に記載の製造方法。
As a result of intensive studies to solve the above problems, the present inventors have found a solution means having the following configuration, and have completed the present invention.
(1) A rosin for solder flux containing methyl dehydroabietic acid and a resin acid other than methyl dehydroabietic acid, wherein the methyl dehydroabietic acid is in a proportion of 20 to 70% by mass with respect to the entire rosin Rosin for solder flux contained in
(2) The rosin for solder flux according to (1), wherein the methyl dehydroabietic acid and other resin acids are contained in a ratio of 99% by mass or more in total with respect to the entire rosin.
(3) The rosin for solder flux according to (1) or (2), wherein the other resin acid contains at least one of dihydroabietic acid and tetrahydroabietic acid.
(4) A solder flux containing the rosin for solder flux according to any one of (1) to (3) above.
(5) A solder paste containing solder alloy powder and the solder flux according to (4).
(6) An electronic circuit board provided with a soldered portion by the solder paste as described in (5) above.
(7) A method for producing a rosin for solder flux as described in (1) above, wherein 0.4 mol or more of a formaldehyde donating substance is added to a mixture of rosin and an acid catalyst with respect to 1 mol of the rosin. A method for producing a rosin for solder flux, comprising a step of heating and reacting the mixture to obtain a reaction product after the step and the step of adding.
(8) The production method according to (7), further comprising a step of purifying a resin acid from the reaction product after the step of obtaining the reaction product.
(9) The process according to (7) or (8), further comprising a step of hydrogenating a resin acid contained in the reaction product after the step of obtaining the reaction product.
本発明のはんだフラックス用ロジンは、はんだ飛散を抑制することができ、かつボイドが発生しにくくフラックスに優れた洗浄性を付与し得る。したがって、本発明のフラックス用ロジンを含むフラックスは、はんだが飛散しにくく、ボイドも発生しにくい上に、優れた洗浄性を有する。 The rosin for solder flux of the present invention can suppress solder scattering and can easily generate voids and can impart excellent cleaning properties to the flux. Therefore, the flux containing the rosin for flux of the present invention is less susceptible to solder scattering and voids, and has excellent cleaning properties.
(はんだフラックス用ロジン)
本発明のはんだフラックス用ロジンは、メチルデヒドロアビエチン酸と、メチルデヒドロアビエチン酸以外の他の樹脂酸(以下、単に「他の樹脂酸」と記載する場合がある)とを含有する。本発明のはんだフラックス用ロジンは、メチルデヒドロアビエチン酸をはんだフラックス用ロジン全体に対して20〜70質量%の割合で含む。メチルデヒドロアビエチン酸がこのような割合で含まれることによって、はんだフラックス用ロジンの結晶性が低くなり、洗浄性に影響を及ぼさずに、はんだ飛散およびボイド発生を抑制することができる。
(Rosin for solder flux)
The rosin for solder flux of the present invention contains methyl dehydroabietic acid and a resin acid other than methyl dehydroabietic acid (hereinafter sometimes simply referred to as “other resin acid”). The rosin for solder flux of the present invention contains methyl dehydroabietic acid in a proportion of 20 to 70% by mass with respect to the entire rosin for solder flux. By including methyl dehydroabietic acid in such a ratio, the crystallinity of the rosin for solder flux becomes low, and it is possible to suppress solder scattering and void generation without affecting the cleaning performance.
酸触媒存在下でロジンおよびホルムアルデヒド供与物質を加熱反応させると、例えば、ロジンの主成分であるアビエチン酸(式(II))の7位にヒドロキシメチル基が生成する。次に、酸触媒による脱水が起こってエキソメチレン基が生成すると同時に、水素原子の移動によって芳香環が形成され、式(III)に示される7−メチルデヒドロアビエチン酸が生成するものと考えられる。また、アビエチン酸の14位にヒドロキシメチル基が生成すると、上述と同様の経路で(III’)に示される14−メチルデヒドロアビエチン酸が生成する。 When the rosin and formaldehyde donating substance are heated and reacted in the presence of an acid catalyst, for example, a hydroxymethyl group is formed at the 7-position of abietic acid (formula (II)) which is the main component of rosin. Next, dehydration by an acid catalyst occurs to generate an exomethylene group, and at the same time, an aromatic ring is formed by movement of a hydrogen atom, and 7-methyldehydroabietic acid represented by the formula (III) is generated. Further, when a hydroxymethyl group is formed at the 14th position of abietic acid, 14-methyldehydroabietic acid shown in (III ') is generated through the same route as described above.
式(III)および(III’)で示されるメチルデヒドロアビエチン酸は、メチル基の一置換体である。しかし、本明細書においては、例えば7位および14位の両方にメチル基が結合した二置換体のような多置換体も、「メチルデヒドロアビエチン酸」に包含される。メチルデヒドロアビエチン酸は、好ましくは25〜60質量%、より好ましくは40〜60質量%の割合で含まれる。 Methyl dehydroabietic acid represented by the formulas (III) and (III ') is a monosubstituted product of the methyl group. However, in the present specification, a polysubstituted product such as a disubstituted product in which a methyl group is bonded to both the 7-position and the 14-position is also encompassed in the “methyl dehydroabietic acid”. Methyl dehydroabietic acid is preferably contained in a proportion of 25 to 60% by mass, more preferably 40 to 60% by mass.
他の樹脂酸は特に限定されず、例えば原料として用いられるロジンに含まれる樹脂酸、これらの樹脂酸の水素化物、脱水素化物、その他異性体が挙げられる。このような樹脂酸としては、例えば、アビエチン酸、パルストリン酸、ネオアビエチン酸、ピマル酸、イソピマル酸、サンダラコピマル酸、デヒドロアビエチン酸、ジヒドロアビエチン酸、テトラヒドロアビエチン酸などが挙げられる。 Other resin acids are not particularly limited, and examples thereof include resin acids contained in rosin used as a raw material, hydrides, dehydrogenates, and other isomers of these resin acids. Examples of such resin acids include abietic acid, pastric acid, neoabietic acid, pimaric acid, isopimaric acid, sandaracopimalic acid, dehydroabietic acid, dihydroabietic acid, and tetrahydroabietic acid.
本発明のはんだフラックス用ロジンは、メチルデヒドロアビエチン酸を特定の割合で含み、さらに他の樹脂酸を含むものであれば、樹脂酸の分解物および縮合物のような他の化合物を含んでいてもよい。色調、洗浄性およびボイド発生の抑制を考慮すると、これらの他の化合物は少量であることが好ましい。したがって、本発明のはんだフラックス用ロジンは、メチルデヒドロアビエチン酸および他の樹脂酸を、はんだフラックス用ロジン全体に対して合計で99質量%以上の割合で含有していることが好ましく、樹脂酸の分解物および縮合物のような他の化合物を含まない(すなわち、メチルデヒドロアビエチン酸および他の樹脂酸の合計が100質量%)ことがより好ましい。 The rosin for solder flux of the present invention contains methyl dehydroabietic acid in a specific ratio, and further contains other compounds such as a decomposition product and a condensate of the resin acid as long as it contains other resin acids. Also good. In consideration of color tone, detergency and suppression of void generation, these other compounds are preferably in small amounts. Therefore, the rosin for solder flux of the present invention preferably contains methyl dehydroabietic acid and other resin acids in a ratio of 99% by mass or more based on the total rosin for solder flux. It is more preferable that other compounds such as decomposition products and condensates are not contained (that is, the total of methyl dehydroabietic acid and other resin acids is 100% by mass).
本発明のはんだフラックス用ロジンは、他の樹脂酸としてジヒドロアビエチン酸およびテトラヒドロアビエチン酸の少なくとも一方を含有することが好ましい。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、例えばアビエチン酸を水素化することによって得られる樹脂酸である。このような樹脂酸が含まれることによって、本発明のはんだフラックス用ロジンは、フラックスに洗浄性を付与し得る効果および酸化安定性が向上し、色調も薄くなる。本発明のはんだフラックス用ロジンは、ジヒドロアビエチン酸およびテトラヒドロアビエチン酸を、合計で10〜65質量%の割合で含有していることが好ましく、15〜35質量%の割合で含有していることがより好ましい。 The rosin for solder flux of the present invention preferably contains at least one of dihydroabietic acid and tetrahydroabietic acid as another resin acid. Dihydroabietic acid and tetrahydroabietic acid are resin acids obtained, for example, by hydrogenating abietic acid. By including such a resin acid, the rosin for solder flux of the present invention improves the effect of imparting detergency to the flux and the oxidation stability, and the color tone becomes thin. The rosin for solder flux of the present invention preferably contains dihydroabietic acid and tetrahydroabietic acid in a proportion of 10 to 65% by mass, and preferably contains 15 to 35% by mass. More preferred.
(はんだフラックス用ロジンの製造方法)
本発明のはんだフラックス用ロジンを製造する方法は特に限定されない。例えば、原料となるロジンとホルムアルデヒド供与物質とを反応させる方法などが挙げられる。
ロジンとしては特に限定されず、例えばジテルペンモノカルボン酸(例えば、アビエチン酸、パルストリン酸、ネオアビエチン酸、ピマル酸、イソピマル酸、サンダラコピマル酸、デヒドロアビエチン酸などの樹脂酸)を主成分とするガムロジン、トール油ロジン、ウッドロジン、これらの精製品などが挙げられる。精製品とは、例えば高分子化合物や樹脂酸以外の不純物が除去されたロジンなどである。これらの中でも、メチルデヒドロアビエチン酸の前駆体であるアビエチン酸を豊富に含むロジン(例えば、中国馬尾松ガムロジンなど)が好ましい。
(Method for producing rosin for solder flux)
The method for producing the solder flux rosin of the present invention is not particularly limited. For example, a method of reacting rosin as a raw material with a formaldehyde donating substance can be mentioned.
The rosin is not particularly limited, and is mainly composed of, for example, a diterpene monocarboxylic acid (for example, a resin acid such as abietic acid, pultrinic acid, neoabietic acid, pimaric acid, isopimaric acid, sandaracopimalic acid, dehydroabietic acid). Examples include gum rosin, tall oil rosin, wood rosin, and purified products thereof. The purified product is, for example, rosin from which impurities other than a polymer compound and resin acid are removed. Among these, rosins (for example, Chinese horsetail pine gum rosin and the like) that are rich in abietic acid, which is a precursor of methyl dehydroabietic acid, are preferable.
ホルムアルデヒド供与物質とは、ホルムアルデヒド(ホルマリン)以外にも、反応系中で分解などによりホルムアルデヒドを発生する化合物を含む概念である。ホルムアルデヒド供与物質としては、ホルムアルデヒド(ホルマリン)、パラホルムアルデヒド、トリオキサンなどが挙げられる。これらの中でも扱いやすさなどの観点で、パラホルムアルデヒドが好ましい。ホルムアルデヒド供与物質は、ロジン1モルに対して、ホルムアルデヒド換算値で例えば0.4モル以上、好ましくは0.5モル以上、より好ましくは0.9モル以上の割合で用いられ、好ましくは1.5モル以下、より好ましくは1.3モル以下の割合で用いられる。例えば、トリオキサン1モルは、ホルムアルデヒド換算値で3モルに相当する。本明細書において、ロジンの分子量は下記の式で算出される。式中、「56.108」は水酸化カリウム(KOH)の分子量である。
ロジンの分子量=(56.108×1000)/ロジンの酸価(中和価)
Formaldehyde donating substance is a concept including a compound that generates formaldehyde by decomposition or the like in a reaction system in addition to formaldehyde (formalin). Examples of formaldehyde donating substances include formaldehyde (formalin), paraformaldehyde, trioxane and the like. Among these, paraformaldehyde is preferable from the viewpoint of easy handling. The formaldehyde donor is used in a ratio of, for example, 0.4 mol or more, preferably 0.5 mol or more, more preferably 0.9 mol or more, preferably 1.5 mol or more, in terms of formaldehyde, with respect to 1 mol of rosin. It is used in a proportion of not more than mol, more preferably not more than 1.3 mol. For example, 1 mol of trioxane corresponds to 3 mol in terms of formaldehyde. In the present specification, the molecular weight of rosin is calculated by the following formula. In the formula, “56.108” is the molecular weight of potassium hydroxide (KOH).
Molecular weight of rosin = (56.108 × 1000) / acid value of rosin (neutralization value)
ホルムアルデヒド供与物質は、一括投入するよりも、好ましくは2〜4時間程度かけて少量ずつ添加される。少量ずつ添加することによって、メチルデヒドロアビエチン酸の含有量をより高めることができる。 The formaldehyde donor material is preferably added in small portions over about 2 to 4 hours, rather than being charged all at once. By adding little by little, the content of methyl dehydroabietic acid can be further increased.
ロジンとホルムアルデヒド供与物質との反応は、酸触媒の存在下で行われる。酸触媒としては公知の触媒が挙げられ、好ましくは、パラトルエンスルホン酸、メタンスルホン酸、4−スルホフタル酸などのスルホン酸系の触媒が用いられる。酸触媒は、ロジンに対して好ましくは0.02質量%以上、より好ましくは0.05〜0.5質量%の割合で用いられる。 The reaction between rosin and formaldehyde donor is performed in the presence of an acid catalyst. Examples of the acid catalyst include known catalysts. Preferably, sulfonic acid catalysts such as paratoluenesulfonic acid, methanesulfonic acid, and 4-sulfophthalic acid are used. The acid catalyst is preferably used in an amount of 0.02% by mass or more, more preferably 0.05 to 0.5% by mass with respect to rosin.
ロジンとホルムアルデヒド供与物質との反応は、好ましくは150℃以上、より好ましくは170〜220℃で行われる。特に、170〜220℃で反応させると、樹脂酸の分解や縮合などの副反応が生じにくく、未反応の原料も残りにくい。反応は、ホルムアルデヒド供与物質の添加終了後、2〜8時間程度行われる。反応に際して、トルエン、キシレンなどの芳香族炭化水素系溶剤を適宜使用してもよい。 The reaction between the rosin and the formaldehyde donor material is preferably performed at 150 ° C. or higher, more preferably 170 to 220 ° C. In particular, when the reaction is carried out at 170 to 220 ° C., side reactions such as decomposition and condensation of the resin acid are unlikely to occur, and unreacted raw materials are unlikely to remain. The reaction is carried out for about 2 to 8 hours after the addition of the formaldehyde donor material. In the reaction, an aromatic hydrocarbon solvent such as toluene or xylene may be appropriately used.
ロジンとホルムアルデヒド供与物質との反応について、ホルムアルデヒド供与物質としてホルムアルデヒド(パラホルムアルデヒド)を用いた場合を例に説明する。ロジンとホルムアルデヒド(パラホルムアルデヒド)とを酸触媒の存在下で加熱し反応させると、まずロジンに含まれるアビエチン酸(式(II))の少なくとも一部の炭素原子(例えば、7位、12位または14位の炭素原子)にヒドロキシメチル基が生成される。その後、脱水反応によってエキソメチレン基が生成すると同時に水素移動が生じて芳香環が形成されることにより、式(III)および(III’)で示されるメチルデヒドロアビエチン酸が得られる。この反応では、樹脂酸の脱水縮合による高分子量化、樹脂酸類の異性化、分解なども同時に進行していると推察される。 The reaction between rosin and formaldehyde donor will be described by taking as an example the case where formaldehyde (paraformaldehyde) is used as the formaldehyde donor. When rosin and formaldehyde (paraformaldehyde) are heated and reacted in the presence of an acid catalyst, first, at least a part of carbon atoms of abietic acid (formula (II)) contained in rosin (for example, 7-position, 12-position or A hydroxymethyl group is formed at the 14th carbon atom). Thereafter, an exomethylene group is generated by a dehydration reaction, and at the same time, hydrogen transfer occurs to form an aromatic ring, whereby methyl dehydroabietic acid represented by formulas (III) and (III ') is obtained. In this reaction, it is presumed that high molecular weight by dehydration condensation of resin acid, isomerization and decomposition of resin acids, etc. are proceeding simultaneously.
得られた反応生成物中のメチルデヒドロアビエチン酸の含有量は、例えば常法によってメチル化またはトリメチルシリル化した後、ガスクロマトグラフィー/マススペクトロメトリー(GC−MS)、ガスクロマトグラフィーなどで測定することができる。
一方、副反応で得られる不揮発性の脱水縮合物(高分子量化合物)の含有量は、ゲル浸透クロマトグラフィー(GPC)、高速液体クロマトグラフィー(HPLC)などで測定することができる。
The content of methyl dehydroabietic acid in the obtained reaction product should be measured by gas chromatography / mass spectrometry (GC-MS), gas chromatography, etc. after methylation or trimethylsilylation by a conventional method, for example. Can do.
On the other hand, the content of the non-volatile dehydration condensate (high molecular weight compound) obtained by the side reaction can be measured by gel permeation chromatography (GPC), high performance liquid chromatography (HPLC) or the like.
得られた反応生成物にメチルデヒドロアビエチン酸が20〜70質量%の割合で含まれ、他の樹脂酸も含まれていれば、そのまま本発明のはんだフラックス用ロジンとして用いることができる。しかし、色調、はんだ飛散およびボイド発生の抑制を考慮すると、例えば、副反応で生じる不揮発性の脱水縮合物は少量であるのが好ましく、反応生成物を精製してもよい。精製としては、蒸留、高速液体クロマトグラフィー、カラムクロマトグラフィー、溶剤抽出などが挙げられる。例えば蒸留は、200〜280℃、5Torr以下の減圧条件下で行われる。 If the resulting reaction product contains methyl dehydroabietic acid in a proportion of 20 to 70% by mass and other resin acids, it can be used as it is as the rosin for solder flux of the present invention. However, considering the suppression of color tone, solder scattering, and void generation, for example, a small amount of non-volatile dehydration condensate generated by side reaction is preferably small, and the reaction product may be purified. Examples of purification include distillation, high performance liquid chromatography, column chromatography, and solvent extraction. For example, distillation is performed under reduced pressure conditions of 200 to 280 ° C. and 5 Torr or less.
さらに、フラックスに洗浄性を付与し得る効果および酸化安定性の向上や、色調を薄くする目的で、得られた反応生成物を水素化してもよい。水素化反応は、パラジウム炭素、ニッケル、ロジウム炭素、白金などの貴金属系触媒を、反応生成物に対して有効成分で0.01質量%以上(好ましくは0.05〜1質量%)添加し、密閉容器を用いて5MPa以上の水素圧(好ましくは7〜10MPa)、200℃以上(好ましくは220〜270℃)で2〜8時間程度撹拌して行われる。水素化に際して、シクロヘキサン、デカリンなどの脂環式炭化水素系溶剤、トルエン、キシレンなどの芳香族炭化水素系溶剤を適宜使用してもよい。 Furthermore, the obtained reaction product may be hydrogenated for the purpose of imparting detergency to the flux, improving oxidation stability, and reducing the color tone. In the hydrogenation reaction, a noble metal catalyst such as palladium carbon, nickel, rhodium carbon, or platinum is added in an amount of 0.01% by mass or more (preferably 0.05 to 1% by mass) as an active ingredient to the reaction product, Using a sealed container, stirring is performed at a hydrogen pressure of 5 MPa or more (preferably 7 to 10 MPa) and 200 ° C. or more (preferably 220 to 270 ° C.) for about 2 to 8 hours. In hydrogenation, alicyclic hydrocarbon solvents such as cyclohexane and decalin, and aromatic hydrocarbon solvents such as toluene and xylene may be used as appropriate.
精製と水素化との両方を行う場合、その順序は特に限定されない。反応生成物を精製した後に水素化を行ってもよく、反応生成物を水素化した後に精製してもよい。精製と水素化との両方を行うことによって、メチルデヒドロアビエチン酸の含有量が50質量%以上であり、250以下のハーゼン色数を有する無色透明に近いはんだフラックス用ロジンが得られる。 When performing both purification and hydrogenation, the order is not particularly limited. The reaction product may be purified and then hydrogenated, or the reaction product may be hydrogenated and purified. By performing both refining and hydrogenation, a rosin for solder flux that is nearly colorless and transparent has a methyldehydroabietic acid content of 50% by mass or more and a Hazen color number of 250 or less.
(はんだフラックス)
本発明のはんだフラックスは、上述のはんだフラックス用ロジンを含む。上述のはんだフラックス用ロジンは、好ましくは20〜60質量%の割合で用いられる。本発明のはんだフラックスは、活性剤、チキソ剤、有機溶剤などの通常はんだフラックスに用いられる成分を含んでいてもよい。
(Solder flux)
The solder flux of the present invention includes the above-described rosin for solder flux. The above-described rosin for solder flux is preferably used at a rate of 20 to 60% by mass. The solder flux of the present invention may contain components usually used for solder flux such as an activator, a thixotropic agent, and an organic solvent.
活性剤としては、例えば、アミン類(ジフェニルグアニジン、ナフチルアミン、ジフェニルアミン、トリエタノールアミン、モノエタノールアミンなど)、アミン塩類(エチレンジアミンなどのポリアミンや、シクロヘキシルアミン、エチルアミン、ジエチルアミン、アリルアミンなどのアミンの有機酸塩や無機酸(塩酸、硫酸などの鉱酸)塩、ハロゲン化水素酸塩など)、有機酸類(コハク酸、アジピン酸、グルタル酸、セバシン酸、マレイン酸などのジカルボン酸;ミリスチン酸、パルミチン酸、ステアリン酸、オレイン酸などの脂肪酸;乳酸、ジメチロールプロピオン酸、リンゴ酸などのヒドロキシカルボン酸;安息香酸、フタル酸、トリメリット酸など)、アミノ酸類(グリシン、アラニン、アスパラギン酸、グルタミン酸、バリンなど)、アニリンのハロゲン化水素酸塩(アニリン臭化水素酸塩など)などが挙げられる。活性剤は、好ましくは1〜25質量%の割合で用いられる。 Examples of the activator include amines (diphenylguanidine, naphthylamine, diphenylamine, triethanolamine, monoethanolamine, etc.), amine salts (polyamines such as ethylenediamine, and organic acids of amines such as cyclohexylamine, ethylamine, diethylamine, and allylamine). Salts, inorganic acids (mineral acids such as hydrochloric acid and sulfuric acid) salts, hydrohalides, etc., organic acids (dicarboxylic acids such as succinic acid, adipic acid, glutaric acid, sebacic acid, maleic acid; myristic acid, palmitic acid , Fatty acids such as stearic acid and oleic acid; hydroxycarboxylic acids such as lactic acid, dimethylolpropionic acid and malic acid; benzoic acid, phthalic acid, trimellitic acid, etc., amino acids (glycine, alanine, aspartic acid, glutamic acid, valine) Etc.), and the like hydrohalide aniline (aniline hydrobromide). The activator is preferably used in a proportion of 1 to 25% by mass.
チキソ剤としては、例えば、硬化ひまし油、蜜ロウ、カルナバワックス、ステアリン酸アミド、ヒドロキシステアリン酸エチレンビスアミドなどが挙げられる。チキソ剤は、好ましくは1〜8質量%の割合で用いられる。 Examples of the thixotropic agent include hydrogenated castor oil, beeswax, carnauba wax, stearamide, hydroxystearic acid ethylenebisamide, and the like. The thixotropic agent is preferably used at a ratio of 1 to 8% by mass.
有機溶剤としては、例えば、アルコール系溶剤(エチルアルコール、イソプロピルアルコール、エチルセロソルブ、ブチルカルビトール、ヘキシルカルビトールなど)、エステル系溶剤(酢酸エチル、酢酸ブチルなど)、炭化水素系溶剤(トルエン、テレピン油など)などが挙げられる。有機溶剤は、好ましくは10〜35質量%の割合で用いられる。 Examples of the organic solvent include alcohol solvents (ethyl alcohol, isopropyl alcohol, ethyl cellosolve, butyl carbitol, hexyl carbitol, etc.), ester solvents (ethyl acetate, butyl acetate, etc.), hydrocarbon solvents (toluene, terpine) Oil). The organic solvent is preferably used at a ratio of 10 to 35% by mass.
さらに、はんだフラックスには、本発明の効果を阻害しない範囲で、他のベース樹脂、酸化防止剤、キレート剤、防錆剤などの添加剤が含まれていてもよい。他のベース樹脂としては、アクリル樹脂、スチレン−マレイン酸樹脂、エポキシ樹脂、ウレタン樹脂、ポリエステル樹脂、フェノキシ樹脂、テルペン樹脂などが挙げられる。添加剤は、フラックスとはんだ合金粉末とを混合する際に添加してもよい。 Furthermore, the solder flux may contain additives such as other base resins, antioxidants, chelating agents, and rust inhibitors as long as the effects of the present invention are not impaired. Examples of other base resins include acrylic resins, styrene-maleic acid resins, epoxy resins, urethane resins, polyester resins, phenoxy resins, and terpene resins. The additive may be added when the flux and the solder alloy powder are mixed.
(ソルダペースト)
本発明のソルダペーストは、はんだ合金粉末と上述のはんだフラックスとを含有する。はんだ合金粉末は特に限定されず、例えば、Sn−Pb合金や、Sn−Pb合金に銀、ビスマス、インジウムなどを添加した合金、Sn−Ag系合金、Sn−Cu系合金、Sn−Ag−Cu系合金などが挙げられる。環境への影響を考慮すると、Sn−Ag系合金、Sn−Cu系合金、Sn−Ag−Cu系合金などの鉛フリー合金が好ましい。はんだ合金粉末の平均粒子径は特に限定されず、例えば10〜40μm程度が好ましい。
(Solder paste)
The solder paste of the present invention contains solder alloy powder and the above-described solder flux. The solder alloy powder is not particularly limited. For example, an Sn—Pb alloy, an alloy obtained by adding silver, bismuth, indium or the like to an Sn—Pb alloy, an Sn—Ag alloy, an Sn—Cu alloy, an Sn—Ag—Cu Based alloys. Considering the influence on the environment, lead-free alloys such as Sn—Ag alloys, Sn—Cu alloys, Sn—Ag—Cu alloys are preferable. The average particle diameter of the solder alloy powder is not particularly limited, and is preferably about 10 to 40 μm, for example.
フラックスとはんだ合金粉末との質量比(フラックス:はんだ合金粉末)は、はんだペーストの用途などに応じて適宜設定すればよく特に限定されない。例えば、10:90〜15:85程度が好ましい。 The mass ratio between the flux and the solder alloy powder (flux: solder alloy powder) is not particularly limited as long as it is appropriately set according to the application of the solder paste. For example, about 10:90 to 15:85 is preferable.
本発明のソルダペーストは、電子機器部品などをはんだ接続する際に、ディスペンサーやスクリーン印刷などによって基板上に塗布される。塗布後、例えば金属組成がSn−3Ag−0.5Cuのはんだ合金粉末を用いた場合、140〜190℃程度でプリヒートを行い、最高温度230〜245℃程度でリフローを行う。このようにして、電子機器部品が搭載された電子回路基板が得られる。 The solder paste of the present invention is applied onto a substrate by a dispenser, screen printing or the like when soldering an electronic device component or the like. For example, when a solder alloy powder having a metal composition of Sn-3Ag-0.5Cu is used, preheating is performed at about 140 to 190 ° C, and reflow is performed at a maximum temperature of about 230 to 245 ° C. In this way, an electronic circuit board on which electronic device components are mounted is obtained.
以上のように、本発明によれば、従来用いられている水添ロジンおよび不均化ロジンよりも、はんだ飛散を抑制することができ、かつボイドが発生しにくくフラックスに優れた洗浄性を付与し得るはんだフラックス用ロジンが得られる。 As described above, according to the present invention, solder scattering can be suppressed and voids are less likely to be generated than the conventionally used hydrogenated rosin and disproportionated rosin, and excellent cleaning performance is imparted to the flux. Can be obtained.
以下、実施例および比較例を挙げて本発明を具体的に説明するが、本発明はこれらの実施例に限定されるものではない。 EXAMPLES Hereinafter, although an Example and a comparative example are given and this invention is demonstrated concretely, this invention is not limited to these Examples.
(実施例1)
撹拌機、温度計、冷却器、水抜き管および窒素導入管を備えた四つ口フラスコに、1000gの中国産ガムロジン(酸価:165、軟化点:87℃、ガードナー色数:7)を入れて、窒素雰囲気下、150℃で溶融させた。次に、撹拌しながら0.5gのパラトルエンスルホン酸を入れ、109gのパラホルムアルデヒド(濃度92質量%)を少量ずつ2時間かけて添加した。用いたパラホルムアルデヒドは、ロジン1モルに対して1.1モルであった。添加後、180℃まで昇温して4時間反応を行い、1021gのはんだフラックス用ロジンを得た(酸価:150、軟化点:90℃、ガードナー色数:12)。
Example 1
Place 1000 g of Chinese gum rosin (acid number: 165, softening point: 87 ° C., Gardner color number: 7) into a four-necked flask equipped with a stirrer, thermometer, condenser, drain tube and nitrogen inlet tube And melted at 150 ° C. in a nitrogen atmosphere. Next, 0.5 g of paratoluenesulfonic acid was added while stirring, and 109 g of paraformaldehyde (concentration 92 mass%) was added in small portions over 2 hours. The paraformaldehyde used was 1.1 moles per mole of rosin. After the addition, the temperature was raised to 180 ° C. and reacted for 4 hours to obtain 1021 g of rosin for solder flux (acid value: 150, softening point: 90 ° C., Gardner color number: 12).
得られたはんだフラックス用ロジンをGPC分析およびGC−MS分析に供した。GPC分析およびGC−MS分析は、下記の装置を用いて行った。
(GPC分析)
装置 :Shodex社製、GPC101
カラム:Shodex社製、KF803、KF802およびKF801
溶媒 :テトラヒドロフラン
(GC−MS分析)
装置 :Agilent Technologies社製、Agilent 7890GC/5975MSD
カラム:Agilent Technologies社製、DB-5
The obtained solder flux rosin was subjected to GPC analysis and GC-MS analysis. GPC analysis and GC-MS analysis were performed using the following apparatus.
(GPC analysis)
Device: GPC101, manufactured by Shodex
Column: manufactured by Shodex, KF803, KF802 and KF801
Solvent: Tetrahydrofuran (GC-MS analysis)
Equipment: Agilent Technologies, Agilent 7890GC / 5975MSD
Column: Agilent Technologies, DB-5
得られたはんだフラックス用ロジンについてGPC分析を行うと、不揮発性の脱水縮合物が16質量%の割合で含まれていた。さらに、GC−MS分析を行うと、メチルデヒドロアビエチン酸が55質量%の割合で含まれていた。但し、GC−MS分析では不揮発性の物質は検出されないので、この割合は、不揮発性の物質(脱水縮合物)を除く他の成分の合計を100質量%とした場合の割合である。したがって、はんだフラックス用ロジン中のメチルデヒドロアビエチン酸の含有量をこれらの値から算出すると、約46質量%(55質量%×0.84)であった。 When the GPC analysis was performed about the obtained rosin for solder flux, the non-volatile dehydration condensate was contained in the ratio of 16 mass%. Furthermore, when GC-MS analysis was performed, methyl dehydroabietic acid was contained at a ratio of 55% by mass. However, since a non-volatile substance is not detected by GC-MS analysis, this ratio is a ratio when the total of other components excluding the non-volatile substance (dehydration condensate) is 100% by mass. Therefore, when the content of methyl dehydroabietic acid in the solder flux rosin was calculated from these values, it was about 46% by mass (55% by mass × 0.84).
(実施例2)
実施例1で得られたはんだフラックス用ロジン700gを、窒素雰囲気下、減圧蒸留(1Torr)に供して、主留を回収した(406g、酸価:168、軟化点:84℃、ガードナー色数:6)。GPC分析の結果、回収した主留(はんだフラックス用ロジン)中には不揮発性の脱水縮合物は検出されなかった。さらに主留をGC−MS分析に供して、定性・定量を行った。得られたはんだフラックス用ロジンには、57質量%のメチルデヒドロアビエチン酸および43質量%の他の樹脂酸が含まれていた。他の樹脂酸は、アビエチン酸、デヒドロアビエチン酸、ピマル酸などの原料の中国産ガムロジンに由来する樹脂酸、および反応中に異性化して生成した樹脂酸であった。
(Example 2)
700 g of the rosin for solder flux obtained in Example 1 was subjected to vacuum distillation (1 Torr) under a nitrogen atmosphere to recover the main fraction (406 g, acid value: 168, softening point: 84 ° C., Gardner color number: 6). As a result of GPC analysis, no non-volatile dehydration condensate was detected in the recovered main fraction (rosin for solder flux). Further, the main fraction was subjected to GC-MS analysis for qualitative and quantitative analysis. The obtained solder flux rosin contained 57% by mass of methyl dehydroabietic acid and 43% by mass of other resin acids. Other resin acids were resin acids derived from Chinese gum rosin as a raw material such as abietic acid, dehydroabietic acid, and pimaric acid, and resin acids produced by isomerization during the reaction.
(実施例3)
実施例2で得られたはんだフラックス用ロジン200gを、誘導撹拌式オートクレーブに入れて溶融させた。次に、2gの5質量%パラジウム炭素(50%含水)を添加して、反応系内の酸素を除去した。次に、反応系内に水素を導入して10MPaに加圧し、撹拌しながら250℃まで昇温して4時間水素化反応を行った。反応後、反応混合物を加圧ろ過に供して触媒を除去し、はんだフラックス用ロジンを得た(191g、酸価:167、軟化点:82℃、ハーゼン色数:220)。このはんだフラックス用ロジンはほぼ無色のため、ガードナー色数ではなくハーゼン色数を採用した。
得られたはんだフラックス用ロジンをGC−MS分析に供して、定性・定量を行った。得られたはんだフラックス用ロジンには、55質量%のメチルデヒドロアビエチン酸および45質量%の他の樹脂酸が含まれていた。他の樹脂酸は、デヒドロアビエチン酸、水素化反応によって生成したジヒドロアビエチン酸およびテトラヒドロアビエチン酸であった。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で25質量%の割合で含まれていた。
(Example 3)
200 g of rosin for solder flux obtained in Example 2 was put into an induction stirring autoclave and melted. Next, 2 g of 5 mass% palladium carbon (containing 50% water) was added to remove oxygen in the reaction system. Next, hydrogen was introduced into the reaction system, pressurized to 10 MPa, heated to 250 ° C. with stirring, and a hydrogenation reaction was performed for 4 hours. After the reaction, the reaction mixture was subjected to pressure filtration to remove the catalyst to obtain a rosin for solder flux (191 g, acid value: 167, softening point: 82 ° C., Hazen color number: 220). Since the solder flux rosin is almost colorless, the Hazen color number is used instead of the Gardner color number.
The obtained solder flux rosin was subjected to GC-MS analysis for qualitative and quantitative determination. The obtained solder flux rosin contained 55% by weight of methyl dehydroabietic acid and 45% by weight of other resin acids. Other resin acids were dehydroabietic acid, dihydroabietic acid and tetrahydroabietic acid produced by the hydrogenation reaction. Dihydroabietic acid and tetrahydroabietic acid were contained in a total proportion of 25% by mass.
(実施例4)
四つ口フラスコの代わりに、撹拌機付きオートクレーブを用いた以外は、実施例1と同様の手順で反応を行い、1025gのはんだフラックス用ロジンを得た(酸価:154、軟化点:94℃、ガードナー色数:11)。
得られたはんだフラックス用ロジンをGPC分析およびGC−MS分析に供した。得られたはんだフラックス用ロジンには、不揮発性の脱水縮合物が10質量%(GPC分析)の割合で含まれていた。GC−MS分析では、メチルデヒドロアビエチン酸が68質量%の割合で含まれていた。したがって、実施例1と同様にして、はんだフラックス用ロジン中のメチルデヒドロアビエチン酸の含有量を算出すると61質量%(68質量%×0.9)であった。
(Example 4)
A reaction was carried out in the same manner as in Example 1 except that an autoclave equipped with a stirrer was used instead of the four-necked flask to obtain 1025 g of rosin for solder flux (acid value: 154, softening point: 94 ° C. Gardner color number: 11).
The obtained solder flux rosin was subjected to GPC analysis and GC-MS analysis. The obtained rosin for solder flux contained 10% by mass (GPC analysis) of a non-volatile dehydration condensate. In the GC-MS analysis, methyl dehydroabietic acid was contained at a ratio of 68% by mass. Therefore, in the same manner as in Example 1, the content of methyl dehydroabietic acid in the solder flux rosin was calculated to be 61% by mass (68% by mass × 0.9).
(実施例5)
実施例4で得られたはんだフラックス用ロジンを用いた以外は、実施例2と同様の手順で減圧蒸留を行い、主留を回収した(455g、酸価:171、軟化点:82℃、ガードナー色数:5)。GPC分析の結果、回収した主留(はんだフラックス用ロジン)中には不揮発性の脱水縮合物は検出されなかった。さらに主留をGC−MS分析に供して、定性・定量を行った。得られたはんだフラックス用ロジンには、65質量%のメチルデヒドロアビエチン酸および35質量%の他の樹脂酸が含まれていた。他の樹脂酸は、アビエチン酸、デヒドロアビエチン酸、ピマル酸などの原料の中国産ガムロジンに由来する樹脂酸、および反応中に異性化して生成した樹脂酸であった。
(Example 5)
Except for using the solder flux rosin obtained in Example 4, vacuum distillation was performed in the same procedure as in Example 2 to recover the main fraction (455 g, acid value: 171; softening point: 82 ° C; Gardner Number of colors: 5). As a result of GPC analysis, no non-volatile dehydration condensate was detected in the recovered main fraction (rosin for solder flux). Further, the main fraction was subjected to GC-MS analysis for qualitative and quantitative determination. The obtained solder flux rosin contained 65% by mass of methyl dehydroabietic acid and 35% by mass of other resin acids. Other resin acids were resin acids derived from Chinese gum rosin as a raw material such as abietic acid, dehydroabietic acid, and pimaric acid, and resin acids produced by isomerization during the reaction.
(実施例6)
実施例5で得られたはんだフラックス用ロジンを用いた以外は、実施例3と同様の手順で水素化反応を行い、はんだフラックス用ロジンを得た(190g、酸価:170、軟化点:81℃、ハーゼン色数:210)。
得られたはんだフラックス用ロジンをGC−MS分析に供して、定性・定量を行った。得られたはんだフラックス用ロジンには、67質量%のメチルデヒドロアビエチン酸および33質量%の他の樹脂酸が含まれていた。他の樹脂酸は、デヒドロアビエチン酸、水素化反応によって生成したジヒドロアビエチン酸およびテトラヒドロアビエチン酸であった。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で20質量%の割合で含まれていた。
(Example 6)
Except for using the solder flux rosin obtained in Example 5, a hydrogenation reaction was performed in the same procedure as in Example 3 to obtain a solder flux rosin (190 g, acid value: 170, softening point: 81). ° C, Hazen color number: 210).
The obtained solder flux rosin was subjected to GC-MS analysis for qualitative and quantitative determination. The obtained solder flux rosin contained 67% by mass of methyl dehydroabietic acid and 33% by mass of other resin acids. Other resin acids were dehydroabietic acid, dihydroabietic acid and tetrahydroabietic acid produced by the hydrogenation reaction. Dihydroabietic acid and tetrahydroabietic acid were included in a proportion of 20% by mass in total.
(実施例7)
実施例1で得られたはんだフラックス用ロジンと市販の不均化ロジン(商品名:ハリマ化成(株)製、バンディスG−100F、酸価:158、軟化点:80℃、ガードナー色数:7)とを、質量比で1:1の割合で混合した。得られたはんだフラックス用ロジンには、計算上、23質量%のメチルデヒドロアビエチン酸および69質量%の他の樹脂酸が含まれる。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で20質量%の割合で含まれる。
(Example 7)
Solder flux rosin obtained in Example 1 and commercially available disproportionated rosin (trade name: manufactured by Harima Chemicals, Bandis G-100F, acid value: 158, softening point: 80 ° C., Gardner color number: 7 ) Was mixed at a mass ratio of 1: 1. The obtained rosin for solder flux contains, in calculation, 23% by mass of methyl dehydroabietic acid and 69% by mass of other resin acids. Dihydroabietic acid and tetrahydroabietic acid are contained in a proportion of 20% by mass in total.
(実施例8)
実施例2で得られたはんだフラックス用ロジンと実施例7で用いた不均化ロジンとを、質量比で1:1の割合で混合した。得られたはんだフラックス用ロジンには、計算上、29質量%のメチルデヒドロアビエチン酸および71質量%の他の樹脂酸が含まれる。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で20質量%の割合で含まれる。
(Example 8)
The solder flux rosin obtained in Example 2 and the disproportionated rosin used in Example 7 were mixed at a mass ratio of 1: 1. The obtained solder flux rosin includes 29% by mass of methyl dehydroabietic acid and 71% by mass of other resin acids in calculation. Dihydroabietic acid and tetrahydroabietic acid are contained in a proportion of 20% by mass in total.
(実施例9)
実施例3で得られたはんだフラックス用ロジンと実施例7で用いた不均化ロジンとを、質量比で1:1の割合で混合した。得られたはんだフラックス用ロジンには、計算上、28質量%のメチルデヒドロアビエチン酸および72質量%の他の樹脂酸が含まれる。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で32質量%の割合で含まれる。
Example 9
The solder flux rosin obtained in Example 3 and the disproportionated rosin used in Example 7 were mixed at a mass ratio of 1: 1. The obtained solder flux rosin includes 28% by mass of methyl dehydroabietic acid and 72% by mass of other resin acids in calculation. Dihydroabietic acid and tetrahydroabietic acid are contained in a proportion of 32% by mass in total.
(比較例1)
パラホルムアルデヒド(濃度92質量%)を27g用いた以外は、実施例1と同様の手順で反応を行い、980gのはんだフラックス用ロジンを得た(酸価:155、軟化点:88℃、ガードナー色数:11)。用いたパラホルムアルデヒドは、ロジン1モルに対して0.28モルであった。
得られたはんだフラックス用ロジンをGPC分析およびGC−MS分析に供した。得られたはんだフラックス用ロジンには、不揮発性の脱水縮合物が7質量%(GPC分析の割合で含まれていた。GC−MS分析では、メチルデヒドロアビエチン酸が13質量%の割合で含まれていた。したがって、実施例1と同様にして、はんだフラックス用ロジン中のメチルデヒドロアビエチン酸の含有量を算出すると12質量%(13質量%×0.93)であった。
(Comparative Example 1)
Except for using 27 g of paraformaldehyde (concentration 92 mass%), the reaction was performed in the same procedure as in Example 1 to obtain 980 g of rosin for solder flux (acid value: 155, softening point: 88 ° C., Gardner color) Number: 11). The paraformaldehyde used was 0.28 mole per mole of rosin.
The obtained solder flux rosin was subjected to GPC analysis and GC-MS analysis. The obtained rosin for solder flux contained 7% by mass of a non-volatile dehydration condensate (in proportion of GPC analysis. In GC-MS analysis, methyl dehydroabietic acid was contained in a proportion of 13% by mass. Therefore, when the content of methyl dehydroabietic acid in the rosin for solder flux was calculated in the same manner as in Example 1, it was 12% by mass (13% by mass × 0.93).
(比較例2)
比較例1で得られたはんだフラックス用ロジンを用いた以外は、実施例2と同様の手順で減圧蒸留を行い、主留を回収した(504g、酸価:170、軟化点:85℃、ガードナー色数:6)。GPC分析の結果、回収した主留(はんだフラックス用ロジン)中には不揮発性の脱水縮合物は検出されなかった。さらに主留をGC−MS分析に供して、定性・定量を行った。得られたはんだフラックス用ロジンには、13質量%のメチルデヒドロアビエチン酸および87質量%の他の樹脂酸が含まれていた。他の樹脂酸は、アビエチン酸、デヒドロアビエチン酸、ピマル酸などの原料の中国産ガムロジンに由来する樹脂酸、および反応中に異性化して生成した樹脂酸であった。
(Comparative Example 2)
Except for using the solder flux rosin obtained in Comparative Example 1, vacuum distillation was performed in the same procedure as in Example 2 to recover the main fraction (504 g, acid value: 170, softening point: 85 ° C., Gardner Number of colors: 6). As a result of GPC analysis, no non-volatile dehydration condensate was detected in the recovered main fraction (rosin for solder flux). Further, the main fraction was subjected to GC-MS analysis for qualitative and quantitative analysis. The obtained solder flux rosin contained 13% by weight of methyl dehydroabietic acid and 87% by weight of other resin acids. Other resin acids were resin acids derived from Chinese gum rosin as a raw material such as abietic acid, dehydroabietic acid, and pimaric acid, and resin acids produced by isomerization during the reaction.
(比較例3)
比較例2で得られたはんだフラックス用ロジンを300g用い、5質量%パラジウム炭素(50%含水)を3g用いた以外は、実施例3と同様の手順で水素化反応を行い、はんだフラックス用ロジンを得た(290g、酸価:169、軟化点:81℃、ハーゼン色数:200)。
得られたはんだフラックス用ロジンをGC−MS分析に供して、定性・定量を行った。得られたはんだフラックス用ロジンには、14質量%のメチルデヒドロアビエチン酸および86質量%の他の樹脂酸が含まれていた。他の樹脂酸は、デヒドロアビエチン酸、水素化反応によって生成したジヒドロアビエチン酸およびテトラヒドロアビエチン酸であった。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で55質量%の割合で含まれていた。
(Comparative Example 3)
A rosin for solder flux was obtained by performing a hydrogenation reaction in the same manner as in Example 3 except that 300 g of the rosin for solder flux obtained in Comparative Example 2 was used and 3 g of 5 mass% palladium carbon (containing 50% water) was used. (290 g, acid value: 169, softening point: 81 ° C., Hazen color number: 200).
The obtained solder flux rosin was subjected to GC-MS analysis for qualitative and quantitative determination. The obtained solder flux rosin contained 14% by mass of methyl dehydroabietic acid and 86% by mass of other resin acids. Other resin acids were dehydroabietic acid, dihydroabietic acid and tetrahydroabietic acid produced by the hydrogenation reaction. Dihydroabietic acid and tetrahydroabietic acid were contained in a total amount of 55% by mass.
(比較例4)
市販の水素化ロジン(商品名:イーストマンケミカル製、フォーラルAX−E、酸価:165、軟化点:80℃、ハーゼン色数:230)をはんだフラックス用ロジンとして用いた。この水素化ロジンをGC−MS分析に供したところ、メチルデヒドロアビエチン酸は含まれておらず、他の樹脂酸のみで構成されていた。ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で74質量%の割合で含まれていた。これら以外の樹脂酸(デヒドロアビエチン酸など)は、合計で26質量%含まれていた。
(Comparative Example 4)
Commercially available hydrogenated rosin (trade name: manufactured by Eastman Chemical, Foral AX-E, acid value: 165, softening point: 80 ° C., Hazen color number: 230) was used as a rosin for solder flux. When this hydrogenated rosin was subjected to GC-MS analysis, methyl dehydroabietic acid was not contained, and it was composed only of other resin acids. Dihydroabietic acid and tetrahydroabietic acid were contained in a total amount of 74% by mass. Resin acids other than these (dehydroabietic acid and the like) were contained in a total of 26% by mass.
(比較例5)
実施例7で用いた不均化ロジンをはんだフラックス用ロジンとして用いた。この不均化ロジンをGC−MS分析に供したところ、メチルデヒドロアビエチン酸は含まれておらず、他の樹脂酸のみで構成されていた。不均化生成物であるデヒドロアビエチン酸が58質量%の割合で含まれ、ジヒドロアビエチン酸およびテトラヒドロアビエチン酸は、合計で39質量%の割合で含まれていた。
(Comparative Example 5)
The disproportionated rosin used in Example 7 was used as a rosin for solder flux. When this disproportionated rosin was subjected to GC-MS analysis, methyl dehydroabietic acid was not contained, and it was composed only of other resin acids. The disproportionation product dehydroabietic acid was contained in a proportion of 58% by mass, and dihydroabietic acid and tetrahydroabietic acid were contained in a proportion of 39% by mass in total.
実施例および比較例で得られたはんだフラックス用ロジンを用いて、(1)ボイドの発生、(2)はんだの飛散数および(3)洗浄性を評価した。まず、これらの評価を行うために、はんだペースト組成物を調製した。
得られたはんだフラックス用ロジン、チキソ剤、酸化防止剤および溶剤を混合して加熱し、溶解させた。次に、溶解させた混合物にハロゲン系化合物および有機酸を添加して、フラックスを得た。得られたフラックスとはんだ合金粉末とを11.2:88.8の割合(質量比)で混合してはんだペースト組成物を調製した。用いたはんだ合金粉末の組成はSn−3Ag−0.5Cuであった。
(フラックス組成)
はんだフラックス用ロジン:54質量%
酸化防止剤(ヒンダードフェノール系):2質量%
溶剤(テレピン油):38.6質量%
ハロゲン系化合物(アリルアミン臭化水素酸塩):0.4質量%
有機酸(コハク酸):1質量%
チキソ剤(硬化ひまし油):4質量%
Using the rosin for solder flux obtained in Examples and Comparative Examples, (1) generation of voids, (2) the number of scattered solder, and (3) detergency were evaluated. First, in order to perform these evaluations, a solder paste composition was prepared.
The obtained solder flux rosin, thixotropic agent, antioxidant and solvent were mixed and heated to be dissolved. Next, a halogen compound and an organic acid were added to the dissolved mixture to obtain a flux. The obtained flux and solder alloy powder were mixed at a ratio (mass ratio) of 11.2: 88.8 to prepare a solder paste composition. The composition of the solder alloy powder used was Sn-3Ag-0.5Cu.
(Flux composition)
Rosin for solder flux: 54% by mass
Antioxidant (hindered phenol): 2% by mass
Solvent (Terpin oil): 38.6% by mass
Halogen compound (allylamine hydrobromide): 0.4% by mass
Organic acid (succinic acid): 1% by mass
Thixotropic agent (cured castor oil): 4% by mass
(1)ボイドの発生
FR4製基板の銅電極上に、得られたはんだペースト組成物を0.15mmの厚みで塗布し、12×8mmのパワートランジスタ部品を搭載した。次に、窒素雰囲気下、140±5℃で100±5秒間プリヒートして、最高温度235±5℃で溶融させてはんだ付けを行った。はんだ付け後の基板を、軟X線透視装置(名古屋電機工業(株)製、NLX-3500F2)で観察して、写真撮影を行った。撮影した写真を画像解析ソフト(旭エンジニアリング(株)製、Azo君)で解析して、はんだ金属中に占めるボイドの面積率(%)を測定した。図1に、はんだ付け後の基板を軟X線透視装置で観察した際の写真を示す。灰色の斑点がボイドであり、図1(A)〜(D)の基板は、およそ下記に示すボイド面積率を有している。
(A)は約5%のボイド面積率。
(B)は約15%のボイド面積率。
(C)は約30%のボイド面積率。
(D)は約40%のボイド面積率。
(1) Generation | occurrence | production of a void On the copper electrode of FR4 board | substrates, the obtained solder paste composition was apply | coated with the thickness of 0.15 mm, and the power transistor component of 12x8 mm was mounted. Next, preheating was performed at 140 ± 5 ° C. for 100 ± 5 seconds in a nitrogen atmosphere, and melting was performed at a maximum temperature of 235 ± 5 ° C. to perform soldering. The substrate after soldering was observed with a soft X-ray fluoroscope (NLX-3500F2 manufactured by Nagoya Denki Kogyo Co., Ltd.) and photographed. The photograph taken was analyzed with image analysis software (Azo-kun, manufactured by Asahi Engineering Co., Ltd.), and the void area ratio (%) in the solder metal was measured. FIG. 1 shows a photograph when the substrate after soldering is observed with a soft X-ray fluoroscope. Gray spots are voids, and the substrates of FIGS. 1A to 1D have void area ratios shown below.
(A) is a void area ratio of about 5%.
(B) is a void area ratio of about 15%.
(C) is a void area ratio of about 30%.
(D) is a void area ratio of about 40%.
ボイドの規格を面積率30%以下として、ボイドの工程能力指数(Cpk)を算出し、下記の基準で評価した。「◎」、「○」および「△」評価であれば、程度に差はあるもののボイドの発生を抑制していると評価でき、実用上問題はない。結果を表1に示す。
◎:2.00超
○:1.33〜2.00
△:1〜1.33
×:1未満
Void process capability index (Cpk) was calculated by setting the void standard to an area ratio of 30% or less, and evaluated according to the following criteria. If “評 価”, “◯” and “Δ” are evaluated, it can be evaluated that the generation of voids is suppressed although there is a difference in degree, and there is no practical problem. The results are shown in Table 1.
A: More than 2.00 B: 1.33-2.00
Δ: 1-1.33
×: Less than 1
(2)はんだの飛散数
銅板(50mm×50mm×0.3mm)の中央部に、得られたはんだペースト組成物を直径6.5mm、200μmの厚みで印刷した。次に、窒素雰囲気下、140±5℃で100±5秒間プリヒートして、最高温度235±5℃で溶融させてはんだ付けを行った。はんだ付け後の銅板において、はんだ付け部の周囲25mm範囲を顕微鏡(倍率20倍)で観察し、フラックスおよびはんだの合計飛散数をカウントした。「◎」、「○」および「△」評価であれば、程度に差はあるもののはんだ飛散を抑制していると評価でき、実用上問題はない。結果を表1に示す。
◎:10個以下
○:11〜15個
△:16〜20個
×:21個以上
(2) Number of scattered solder The obtained solder paste composition was printed with a diameter of 6.5 mm and a thickness of 200 μm on the center of a copper plate (50 mm × 50 mm × 0.3 mm). Next, preheating was performed at 140 ± 5 ° C. for 100 ± 5 seconds in a nitrogen atmosphere, and melting was performed at a maximum temperature of 235 ± 5 ° C. to perform soldering. In the copper plate after soldering, the range of 25 mm around the soldered portion was observed with a microscope (magnification 20 times), and the total number of fluxes and solder scattered was counted. If “評 価”, “◯” and “Δ” are evaluated, it can be evaluated that solder scattering is suppressed although there is a difference in degree, and there is no practical problem. The results are shown in Table 1.
◎: 10 or less ○: 11-15 △: 16-20 ×: 21 or more
(3)洗浄性
上記はんだの飛散数で用いたはんだ付け後の銅板を、グリコールエーテル系溶剤(旭化成(株)製、クリンスルー750HS)で洗浄した。洗浄後の基板を顕微鏡(倍率20倍)で観察し、下記の基準で評価した。「◎」、「○」および「△」評価であれば、程度に差はあるものの洗浄性に優れていると評価でき、実用上問題はない。結果を表1に示す。
◎:金属表面が、十分な金属光沢を有する場合。
○:残渣は存在しないが、金属表面がくすんでいる場合。
△:少量の残渣が存在する場合。
×:多量の残渣が存在する場合。
(3) Detergency The copper plate after soldering used in the number of scattered solder was washed with a glycol ether solvent (Clinthru 750HS, manufactured by Asahi Kasei Corporation). The washed substrate was observed with a microscope (magnification 20 times) and evaluated according to the following criteria. If “評 価”, “◯” and “Δ” are evaluated, it can be evaluated that the cleaning property is excellent although there is a difference in degree, and there is no practical problem. The results are shown in Table 1.
A: When the metal surface has a sufficient metallic luster.
○: There is no residue, but the metal surface is dull.
Δ: A small amount of residue is present.
X: When a large amount of residue exists.
表1に示すように、実施例で得られたはんだフラックス用ロジンを用いると、はんだ飛散を抑制することができ、かつボイドが発生しにくくフラックスに優れた洗浄性を付与していることがわかる。 As shown in Table 1, when the solder flux rosin obtained in the examples is used, it is understood that solder scattering can be suppressed, and voids are hardly generated, and the flux has excellent cleaning properties. .
Claims (9)
前記メチルデヒドロアビエチン酸が、ロジン全体に対して20〜70質量%の割合で含まれる、はんだフラックス用ロジン。 A solder flux rosin containing methyl dehydroabietic acid and a resin acid other than methyl dehydroabietic acid,
A rosin for solder flux, wherein the methyl dehydroabietic acid is contained in a proportion of 20 to 70% by mass with respect to the whole rosin.
ロジンと酸触媒との混合物に、前記ロジン1モルに対して0.4モル以上のホルムアルデヒド供与物質を添加する工程、および
前記添加する工程の後、前記混合物を加熱して反応させ反応生成物を得る工程
を含む、はんだフラックス用ロジンの製造方法。 A method for producing a solder flux rosin according to claim 1,
A step of adding 0.4 mol or more of a formaldehyde donating substance to 1 mol of the rosin to the mixture of rosin and an acid catalyst, and after the adding step, the mixture is heated to react to react the reaction product. The manufacturing method of the rosin for solder flux including the process to obtain.
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JPH05337688A (en) * | 1992-06-10 | 1993-12-21 | Harima Chem Inc | Solder paste |
JP2004231584A (en) * | 2003-01-31 | 2004-08-19 | Arakawa Chem Ind Co Ltd | Method for producing resin acid composition, crystal-nucleating agent for crystalline thermoplastic resin, and crystalline thermoplastic resin composition |
JP2008062242A (en) * | 2006-09-04 | 2008-03-21 | Harima Chem Inc | Flux for soldering, and solder paste composite |
WO2010087316A1 (en) * | 2009-01-27 | 2010-08-05 | 荒川化学工業株式会社 | Flux composition for lead-free solder, lead-free solder composition, and resin flux cored solder |
WO2010113833A1 (en) * | 2009-03-30 | 2010-10-07 | 荒川化学工業株式会社 | Flux composition for lead-free solder, and lead-free solder composition |
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