JP2024019041A - Rosin base resin for lead-free solder flux, manufacturing method of rosin base resin for lead-free solder flux, lead-free solder flux and lead-free solder paste - Google Patents
Rosin base resin for lead-free solder flux, manufacturing method of rosin base resin for lead-free solder flux, lead-free solder flux and lead-free solder paste Download PDFInfo
- Publication number
- JP2024019041A JP2024019041A JP2023117369A JP2023117369A JP2024019041A JP 2024019041 A JP2024019041 A JP 2024019041A JP 2023117369 A JP2023117369 A JP 2023117369A JP 2023117369 A JP2023117369 A JP 2023117369A JP 2024019041 A JP2024019041 A JP 2024019041A
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- JP
- Japan
- Prior art keywords
- lead
- rosin
- free solder
- base resin
- solder flux
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 title claims abstract description 114
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- MFHKEJIIHDNPQE-UHFFFAOYSA-N n-nonylnonan-1-amine Chemical compound CCCCCCCCCNCCCCCCCCC MFHKEJIIHDNPQE-UHFFFAOYSA-N 0.000 description 1
- VSINKAWXKJMFTH-UHFFFAOYSA-N n-octan-3-yloctan-3-amine Chemical compound CCCCCC(CC)NC(CC)CCCCC VSINKAWXKJMFTH-UHFFFAOYSA-N 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
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- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
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- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
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- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
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- 229960005323 phenoxyethanol Drugs 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
- 229920006350 polyacrylonitrile resin Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 150000004040 pyrrolidinones Chemical class 0.000 description 1
- GRWFGVWFFZKLTI-UHFFFAOYSA-N rac-alpha-Pinene Natural products CC1=CCC2C(C)(C)C1C2 GRWFGVWFFZKLTI-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- MHVJRKBZMUDEEV-KRFUXDQASA-N sandaracopimaric acid Chemical compound [C@H]1([C@](CCC2)(C)C(O)=O)[C@@]2(C)[C@H]2CC[C@@](C=C)(C)C=C2CC1 MHVJRKBZMUDEEV-KRFUXDQASA-N 0.000 description 1
- YZVSLDRKXBZOMY-KNOXWWKRSA-N sandaracopimaric acid Natural products CC(=C)[C@]1(C)CCC[C@]2(C)[C@H]3CC[C@](C)(C=C)C=C3CC[C@@H]12 YZVSLDRKXBZOMY-KNOXWWKRSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 229940095068 tetradecene Drugs 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- XJPBRODHZKDRCB-UHFFFAOYSA-N trans-alpha-ocimene Natural products CC(=C)CCC=C(C)C=C XJPBRODHZKDRCB-UHFFFAOYSA-N 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/362—Selection of compositions of fluxes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
Abstract
【課題】本発明の目的は、水素化反応を必要とせずとも優れた色調を示し、ソルダペーストとした際に濡れ性、保存安定性及び絶縁抵抗性にも優れる鉛フリーはんだフラックス用ロジン系ベース樹脂及び当該ベース樹脂の製造方法を提供することにある。【解決手段】フマル酸変性ロジン(A)を含み、酸価が200~300mgKOH/gであり、色調がガードナー3以下である鉛フリーはんだフラックス用ロジン系ベース樹脂、当該ベース樹脂の製造方法、鉛フリーはんだフラックス及び鉛フリーソルダペーストに関する。【選択図】なし[Problem] The object of the present invention is to provide a rosin-based base for lead-free solder flux that exhibits excellent color tone without requiring a hydrogenation reaction and also has excellent wettability, storage stability, and insulation resistance when made into a solder paste. An object of the present invention is to provide a resin and a method for producing the base resin. [Solution] A rosin base resin for lead-free solder flux that contains fumaric acid-modified rosin (A), has an acid value of 200 to 300 mgKOH/g, and has a color tone of Gardner 3 or less, a method for producing the base resin, and lead Related to free solder flux and lead-free solder paste. [Selection diagram] None
Description
本発明は、鉛フリーはんだフラックス用ロジン系ベース樹脂、鉛フリーはんだフラックス用ロジン系ベース樹脂の製造方法、鉛フリーはんだフラックス及び鉛フリーソルダペーストに関する。 The present invention relates to a rosin base resin for lead-free solder flux, a method for producing a rosin base resin for lead-free solder flux, a lead-free solder flux, and a lead-free solder paste.
回路基板の表面実装は、回路基板上の電極に、鉛フリーはんだフラックス(以下、“はんだフラックス”又は“フラックス”ともいう。)と鉛フリーはんだ粉末の混合物であるソルダペーストを、スクリーン印刷やディスペンサー吐出等の方法で供給し、その上にコンデンサー等の電子部品を搭載した後、当該回路基板をリフロー炉内で加熱して鉛フリーはんだ粉末を溶融させ、電子部品と電極とを接合させる。 For surface mounting of circuit boards, solder paste, which is a mixture of lead-free solder flux (hereinafter also referred to as "solder flux" or "flux") and lead-free solder powder, is applied to the electrodes on the circuit board using screen printing or a dispenser. After supplying it by a method such as dispensing and mounting electronic components such as a capacitor on it, the circuit board is heated in a reflow oven to melt the lead-free solder powder and join the electronic components and electrodes.
はんだフラックスのベース樹脂としては従来、天然ロジンが汎用されていた。しかしながら、天然ロジンは非常に酸化されやすく、加熱させると容易に変色するなど熱安定性に劣るため、はんだフラックス用ロジン系ベース樹脂として用いた場合、はんだ付けの際の濡れ性が顕著に悪くなりやすい。 Conventionally, natural rosin has been widely used as the base resin for solder flux. However, natural rosin is highly susceptible to oxidation, easily discolors when heated, and has poor thermal stability. Therefore, when used as a rosin-based base resin for solder flux, wettability during soldering becomes significantly poor. Cheap.
また、他のベース樹脂としては、酸変性ロジンの水素化物や、フマル化ロジンを使用したものも公知である(特許文献1、2)。しかしながら、アクリル化水素化ロジンは、製造時に水素化反応を施すために製造コストが高くなり、フマル化ロジンは色調が悪くなる問題があった。また、これらのベース樹脂を用いて、鉛フリーソルダペースト(以下、“ソルダペースト”ともいう)とした際には、経時的に増粘する、絶縁抵抗性に劣りやすいものでもあった。 Furthermore, as other base resins, those using hydrogenated acid-modified rosins and fumarized rosins are also known (Patent Documents 1 and 2). However, acrylated hydrogenated rosin requires a hydrogenation reaction during production, resulting in high production costs, and fumarated rosin has a problem of poor color tone. Furthermore, when lead-free solder pastes (hereinafter also referred to as "solder pastes") are made using these base resins, they tend to increase in viscosity over time and have poor insulation resistance.
本発明の目的は、水素化反応を必要とせずとも優れた色調を示し、ソルダペーストとした際に濡れ性、保存安定性及び絶縁抵抗性にも優れる鉛フリーはんだフラックス用ロジン系ベース樹脂及び当該ベース樹脂の製造方法を提供することにある。 The object of the present invention is to provide a rosin-based resin for lead-free solder flux that exhibits excellent color tone without requiring a hydrogenation reaction, and has excellent wettability, storage stability, and insulation resistance when made into a solder paste. An object of the present invention is to provide a method for producing a base resin.
本発明者は、ロジン系ベース樹脂の組成及び物性について鋭意検討したところ、前記課題を解決することを見出した。すなわち、本発明は、以下の鉛フリーはんだフラックス用ロジン系ベース樹脂、鉛フリーはんだフラックス用ロジン系ベース樹脂の製造方法、鉛フリーはんだフラックス及び鉛フリーソルダペーストに関する。 The inventors of the present invention have conducted extensive studies on the composition and physical properties of rosin base resins, and have found that the above-mentioned problems can be solved. That is, the present invention relates to a rosin base resin for lead-free solder flux, a method for producing a rosin base resin for lead-free solder flux, a lead-free solder flux, and a lead-free solder paste as described below.
1.フマル酸変性ロジン(A)を含み、酸価が200~300mgKOH/gであり、色調がガードナー3以下である鉛フリーはんだフラックス用ロジン系ベース樹脂。 1. A rosin base resin for lead-free solder flux that contains fumaric acid-modified rosin (A), has an acid value of 200 to 300 mgKOH/g, and has a color tone of Gardner 3 or less.
2.ロジン類のフマル酸による変性率が、15~60%である前項1に記載の鉛フリーはんだフラックス用ロジン系ベース樹脂。 2. The rosin base resin for lead-free solder flux according to item 1 above, wherein the modification rate of the rosin with fumaric acid is 15 to 60%.
3.ヒンダードフェノール系酸化防止剤、及び硫黄系酸化防止剤から選ばれる1種以上の酸化防止剤の存在下、ロジン類と、フマル酸とを反応させ、酸価が200~300mgKOH/g、及び色調がガードナー3以下であるフマル酸変性ロジン(A)を得る工程を含む、鉛フリーはんだフラックス用ロジン系ベース樹脂の製造方法。 3. In the presence of one or more antioxidants selected from hindered phenolic antioxidants and sulfur-based antioxidants, rosins and fumaric acid are reacted to produce an acid value of 200 to 300 mgKOH/g and a color tone. A method for producing a rosin base resin for lead-free solder flux, comprising the step of obtaining a fumaric acid-modified rosin (A) having a Gardner value of 3 or less.
4.前記酸化防止剤の含有量が、前記ロジン類100重量部に対して、0.01~3重量部である前項3に記載の鉛フリーはんだフラックス用ロジン系ベース樹脂の製造方法。 4. 3. The method for producing a rosin base resin for lead-free solder flux according to item 3, wherein the content of the antioxidant is 0.01 to 3 parts by weight based on 100 parts by weight of the rosin.
5.前項1又は2に記載の鉛フリーはんだフラックス用ロジン系ベース樹脂、活性剤、チキソ剤及び溶剤を含む、鉛フリーはんだフラックス。 5. A lead-free solder flux containing a rosin base resin for lead-free solder flux as described in 1 or 2 above, an activator, a thixotropic agent, and a solvent.
6.前項5に記載の鉛フリーはんだフラックス及び鉛フリーはんだ粉末を含む、鉛フリーソルダペースト。 6. A lead-free solder paste containing the lead-free solder flux and lead-free solder powder described in 5 above.
本発明の鉛フリーはんだフラックス用ロジン系ベース樹脂によれば、優れた色調を示し、ソルダペーストとした際に濡れ性、保存安定性及び絶縁抵抗性にも優れる。また、本発明の製造方法は、水素化反応を必要とせずに、優れた色調を示す樹脂を得ることができる。 The rosin base resin for lead-free solder flux of the present invention exhibits excellent color tone, and when made into a solder paste, has excellent wettability, storage stability, and insulation resistance. Moreover, the production method of the present invention can obtain a resin exhibiting excellent color tone without requiring a hydrogenation reaction.
本発明の鉛フリーはんだフラックス用ロジン系ベース樹脂(以下、“ベース樹脂”という。)は、フマル酸変性ロジン(A)(以下、(A)成分ともいう。)を含む。 The rosin base resin for lead-free solder flux of the present invention (hereinafter referred to as "base resin") contains fumaric acid-modified rosin (A) (hereinafter also referred to as component (A)).
フマル酸変性ロジン(A)は、ロジン類とフマル酸との反応生成物である。 Fumaric acid-modified rosin (A) is a reaction product of rosins and fumaric acid.
ロジン類は、天然ロジン、変性ロジンに分けられる。 Rosins are divided into natural rosins and modified rosins.
天然ロジンとは、マツ科の植物から採取される樹脂酸の混合物であり、生産方法によって、ガムロジン、トール油ロジン、ウッドロジンに分類される。当該樹脂酸としては、アビエチン酸を主とし、それ以外にはネオアビエチン酸、パラストリン酸、デヒドロアビエチン酸、レボピマル酸、ピマル酸、イソピマル酸、サンダラコピマル酸等が含まれる。また、天然ロジンとして、ジヒドロアガチン酸、コムン酸等を含んだものも使用できる。これらは、単独でも2種以上を組み合わせても良い。 Natural rosin is a mixture of resin acids collected from plants of the Pinaceae family, and is classified into gum rosin, tall oil rosin, and wood rosin depending on the production method. The resin acid is mainly abietic acid, and others include neoabietic acid, parastric acid, dehydroabietic acid, levopimaric acid, pimaric acid, isopimaric acid, sandaracopimaric acid, and the like. Furthermore, natural rosins containing dihydroagatic acid, combic acid, etc. can also be used. These may be used alone or in combination of two or more.
また、天然ロジンとして、当該ロジンを精製させたもの(以下、精製ロジンともいう。)も使用できる。 Further, as the natural rosin, a purified rosin (hereinafter also referred to as purified rosin) can also be used.
精製ロジンは、例えば、減圧蒸留法、抽出法、再結晶法等の精製方法により、天然ロジンを精製することにより得られる。また、精製条件としては、特に限定されない。 Purified rosin can be obtained by purifying natural rosin using a purification method such as vacuum distillation, extraction, recrystallization, or the like. Further, the purification conditions are not particularly limited.
減圧蒸留法の場合は、温度が200~300℃程度であり、減圧度が60~3000Paで蒸留を行う。この方法で得られた精製ロジンを蒸留ロジンともいう。 In the case of vacuum distillation, the temperature is about 200 to 300°C and the degree of vacuum is 60 to 3000 Pa. Purified rosin obtained by this method is also called distilled rosin.
抽出法の場合は、天然ロジンをアルカリ水溶液とし、該水溶液中で溶けていない不ケン化物を各種の有機溶剤により抽出した後、残った水層を中和する。 In the case of the extraction method, natural rosin is made into an alkaline aqueous solution, unsaponifiable substances not dissolved in the aqueous solution are extracted with various organic solvents, and then the remaining aqueous layer is neutralized.
再結晶法の場合は、ロジン類を良溶剤としての有機溶剤に溶解し、ついで該有機溶剤を留去して濃厚な溶液とし、更に貧溶剤としての有機溶剤を加えることにより得られる。 In the case of the recrystallization method, the rosin is dissolved in an organic solvent as a good solvent, then the organic solvent is distilled off to obtain a concentrated solution, and an organic solvent as a poor solvent is further added.
良溶剤としては、例えば、ベンゼン、トルエン、キシレン等の芳香族炭化水素;クロロホルム等の有機ハロゲン;アセトン、メチルエチルケトン等のケトン;メタノール、エタノール、イソプロピルアルコール等のアルコール;酢酸メチル、酢酸エチル等のエステル等が挙げられる。これらは単独でも2種以上を組み合わせても良い。 Examples of good solvents include aromatic hydrocarbons such as benzene, toluene, and xylene; organic halogens such as chloroform; ketones such as acetone and methyl ethyl ketone; alcohols such as methanol, ethanol, and isopropyl alcohol; and esters such as methyl acetate and ethyl acetate. etc. These may be used alone or in combination of two or more.
貧溶剤としては、例えば、n-ヘキサン、n-ヘプタン、イソオクタン等の脂肪族炭化水素;シクロヘキサン、デカリン等の脂環族炭化水素等が挙げられる。これらは単独でも2種以上を組み合わせても良い。 Examples of the poor solvent include aliphatic hydrocarbons such as n-hexane, n-heptane, and isooctane; and alicyclic hydrocarbons such as cyclohexane and decalin. These may be used alone or in combination of two or more.
変性ロジンとしては、フマル酸と反応するものであれば、特に限定されず、例えば、前記天然ロジン又は精製ロジンのエステル化物(ロジンエステル)、水素化物(水素化ロジン)、不均化物(不均化ロジン)、前記水素化ロジンのエステル化物(水素化ロジンエステル)、前記不均化ロジンのエステル化物(不均化ロジンエステル)等が挙げられる。これらは単独でも2種以上を組み合わせても良い。なお、変性ロジン中には、未反応の天然ロジンが含まれていても良い。 The modified rosin is not particularly limited as long as it reacts with fumaric acid, and examples thereof include esterified products (rosin esters), hydrides (hydrogenated rosins), and disproportionated products (disproportioned rosins) of the natural rosin or purified rosin. (hydrogenated rosin ester), an esterified product of the hydrogenated rosin (hydrogenated rosin ester), an esterified product of the disproportionated rosin (disproportionated rosin ester), and the like. These may be used alone or in combination of two or more. Note that the modified rosin may contain unreacted natural rosin.
前記変性ロジンは、変性後に精製したものも使用できる。 The modified rosin that has been purified after modification can also be used.
中でも、ベース樹脂が優れた色調を示す点から、天然ロジン、精製ロジンが好ましく、精製ロジンがより好ましい。 Among these, natural rosin and purified rosin are preferred, and purified rosin is more preferred, since the base resin exhibits excellent color tone.
フマル酸の使用量としては、ソルダペーストが優れた保存安定性を示す点から、固形分重量で、ロジン類100重量部に対して、通常は5~20重量部であり、好ましくは5~15重量部である。 The amount of fumaric acid used is usually 5 to 20 parts by weight, preferably 5 to 15 parts by weight, per 100 parts by weight of rosin based on the solid weight, since the solder paste exhibits excellent storage stability. Parts by weight.
本発明のベース樹脂の製造方法は、ヒンダードフェノール系酸化防止剤、及び硫黄系酸化防止剤から選ばれる1種以上の酸化防止剤の存在下、ロジン類と、フマル酸とを反応させ、酸価が200~300mgKOH/g、及び色調がガードナー3以下であるフマル酸変性ロジン(A)を得る工程を含むものである。 The method for producing the base resin of the present invention involves reacting rosins with fumaric acid in the presence of one or more antioxidants selected from hindered phenolic antioxidants and sulfur-based antioxidants. The method includes a step of obtaining a fumaric acid-modified rosin (A) having a value of 200 to 300 mgKOH/g and a color tone of Gardner 3 or less.
前記の製造方法において、ヒンダードフェノール系酸化防止剤、及び硫黄系酸化防止剤から選ばれる1種以上の酸化防止剤を用いると、優れた色調を示すベース樹脂が得られ、ソルダペーストとした際に濡れ性、保存安定性及び絶縁抵抗性が優れたものとなりやすい。 In the above manufacturing method, when one or more antioxidants selected from hindered phenolic antioxidants and sulfur-based antioxidants are used, a base resin exhibiting excellent color tone can be obtained, and when made into a solder paste, It tends to have excellent wettability, storage stability, and insulation resistance.
前記酸化防止剤の内、ヒンダードフェノール系酸化防止剤としては、例えば、2,5-ジ-tert-ブチルハイドロキノン、アントラキノン、トリエチレングリコールビス{3-(3-t-ブチル-5-メチル-4-ヒドロキシフェニル)プロピオネート}、1,6-ヘキサンジオールビス{3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート}、ペンタエリスリトールテトラキス{3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート}、オクタデシル-3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート、3,9-ビス[2-{3-(3-t-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ}-1,1-ジメチルエチル]-2,4,8,10-テトラオキサスピロ[5.5]ウンデカン、N,N’-ヘキサメチレンビス(3,5-ジ-t-ブチル-4-ヒドロキシ-ヒドロシンナマイド)、1,3,5-トリメチル-2,4,6-トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)ベンゼン、Irganox(登録商標)565等が挙げられる。これらは単独でも2種以上を組み合わせても良い。 Among the antioxidants, examples of hindered phenolic antioxidants include 2,5-di-tert-butylhydroquinone, anthraquinone, triethylene glycol bis{3-(3-t-butyl-5-methyl- 4-hydroxyphenyl)propionate}, 1,6-hexanediol bis{3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate}, pentaerythritol tetrakis{3-(3,5-di- t-butyl-4-hydroxyphenyl)propionate}, octadecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, 3,9-bis[2-{3-(3-t- Butyl-4-hydroxy-5-methylphenyl)propionyloxy}-1,1-dimethylethyl]-2,4,8,10-tetraoxaspiro[5.5]undecane, N,N'-hexamethylenebis( 3,5-di-t-butyl-4-hydroxy-hydrocinnamide), 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl) Examples include benzene, Irganox (registered trademark) 565, and the like. These may be used alone or in combination of two or more.
前記酸化防止剤の内、硫黄系酸化防止剤としては、例えば、4,4’-チオビス(6-t-ブチル-3-メチルフェノール)、2,4-ビス(ドデシルチオメチル)-6-メチルフェノール、4,4’-ビス(フェノール)スルフィド、4,4’-ビス(フェノール)スルホキシド、4,4’-ビス(フェノール)スルホン、4,4’-ビス(フェノール)チオールスルフィナート、4,4’-ビス(フェノール)チオールスルホナート、2,2’-ビス(p-クレゾール)スルフィド、2,2’-ビス(p-クレゾール)スルホキシド、2,2’-ビス(p-クレゾール)スルホン、2,2’-ビス(p-t-ブチルフェノール)スルフィド、2,2’-ビス(p-t-ブチルフェノール)スルホキシド、2,2’-ビス(p-t-ブチルフェノール)スルホン、4,4’-ビス(6-t-ブチル-m-クレゾール)スルホキシド、4,4’-ビス(6-t-ブチル-m-クレゾール)スルフィド、4,4’-ビス(6-t-ブチル-o-クレゾール)スルホキシド、4,4’-ビス(6-t-ブチル-o-クレゾール)スルホン、4,4’-ビス(6-t-ブチル-o-クレゾール)スルフィド、4,4’-ビス(レゾルシノール)スルフィド、4,4’-ビス(レゾルシノール)スルホキシド、4,4’-ビス(レゾルシノール)スルホン、1,1’-ビス(β-ナフトール)スルフィド、1,1’-ビス(β-ナフトール)スルホキシド、1,1’-ビス(β-ナフトール)スルホン、4,4’-ビス(α-ナフトール)スルフィド、4,4’-ビス(α-ナフトール)スルホキシド、4,4’-ビス(α-ナフトール)スルホン、t-アミルフェノールジスルフィドオリゴマー、ノニルフェノールジスルフィドオリゴマー、t-ブチルフェノールジスルフィドオリゴマー等が挙げられる。これらは単独でも2種以上を組み合わせても良い。 Among the antioxidants, examples of sulfur-based antioxidants include 4,4'-thiobis(6-t-butyl-3-methylphenol) and 2,4-bis(dodecylthiomethyl)-6-methyl. Phenol, 4,4'-bis(phenol) sulfide, 4,4'-bis(phenol) sulfoxide, 4,4'-bis(phenol) sulfone, 4,4'-bis(phenol)thiol sulfinate, 4 , 4'-bis(phenol)thiol sulfonate, 2,2'-bis(p-cresol) sulfide, 2,2'-bis(p-cresol) sulfoxide, 2,2'-bis(p-cresol) sulfone , 2,2'-bis(pt-butylphenol) sulfide, 2,2'-bis(pt-butylphenol) sulfoxide, 2,2'-bis(pt-butylphenol) sulfone, 4,4' -Bis(6-t-butyl-m-cresol) sulfoxide, 4,4'-bis(6-t-butyl-m-cresol) sulfide, 4,4'-bis(6-t-butyl-o-cresol) ) sulfoxide, 4,4'-bis(6-t-butyl-o-cresol) sulfone, 4,4'-bis(6-t-butyl-o-cresol) sulfide, 4,4'-bis(resorcinol) Sulfide, 4,4'-bis(resorcinol) sulfoxide, 4,4'-bis(resorcinol) sulfone, 1,1'-bis(β-naphthol) sulfide, 1,1'-bis(β-naphthol) sulfoxide, 1,1'-bis(β-naphthol) sulfone, 4,4'-bis(α-naphthol) sulfide, 4,4'-bis(α-naphthol) sulfoxide, 4,4'-bis(α-naphthol) Examples include sulfone, t-amylphenol disulfide oligomer, nonylphenol disulfide oligomer, and t-butylphenol disulfide oligomer. These may be used alone or in combination of two or more.
前記酸化防止剤の中でも、ロジン類が有する水素原子を速やかに引き抜くことで、ベース樹脂が優れた色調を示す点から、硫黄系酸化防止剤が好ましい。 Among the antioxidants, sulfur-based antioxidants are preferred because they quickly extract hydrogen atoms from rosins, giving the base resin excellent color tone.
前記酸化防止剤の使用量としては、ベース樹脂が優れた色調を示す点から、固形分重量で、ロジン類100重量部に対して、通常は0.01~3重量部であり、0.05~3重量部が好ましく、0.05~0.5重量部がより好ましい。 The amount of the antioxidant used is usually 0.01 to 3 parts by weight, and 0.05 parts by weight, based on solid content, per 100 parts by weight of rosin, since the base resin exhibits excellent color tone. -3 parts by weight is preferred, and 0.05-0.5 parts by weight is more preferred.
なお、ロジン類、フマル酸及び酸化防止剤について、仕込み順序や仕込み方法(例えば、一括仕込み、分割仕込み等)も自由に選択できる。 In addition, regarding the rosin, fumaric acid, and antioxidant, the order and method of preparation (for example, batch preparation, divided preparation, etc.) can be freely selected.
前記の製造方法において、反応温度は、180~250℃が好ましく、180~220℃がより好ましい。さらに、反応時間は、1~5時間が好ましく、1~3時間がより好ましい。 In the above production method, the reaction temperature is preferably 180 to 250°C, more preferably 180 to 220°C. Further, the reaction time is preferably 1 to 5 hours, more preferably 1 to 3 hours.
前記の製造方法は、得られるベース樹脂の色調を高めるために、密閉した反応系内に窒素、アルゴン等の不活性ガスを吹き込みながら行っても良い。 The above manufacturing method may be carried out while blowing an inert gas such as nitrogen or argon into the closed reaction system in order to enhance the color tone of the obtained base resin.
前記の製造方法においては、さらに各種公知の触媒を加えても良い。触媒としては、例えば、塩化亜鉛、塩化鉄、塩化スズ等のルイス酸;パラトルエンスルホン酸、メタンスルホン酸等の有機スルホン酸等が挙げられる。これらは単独でも2種以上を組み合わせても良い。また、触媒の使用量は、ロジン類100重量%に対して通常0.01~10重量%程度である。 In the above production method, various known catalysts may be further added. Examples of the catalyst include Lewis acids such as zinc chloride, iron chloride, and tin chloride; organic sulfonic acids such as para-toluenesulfonic acid and methanesulfonic acid. These may be used alone or in combination of two or more. The amount of catalyst used is usually about 0.01 to 10% by weight based on 100% by weight of the rosin.
また前記の工程が完了した後に、ヒンダードフェノール系酸化防止剤、硫黄系酸化防止剤を追加しても良い。 Further, after the above steps are completed, a hindered phenol antioxidant or a sulfur antioxidant may be added.
ロジン類のフマル酸による変性率は、15~60%である。なお、変性率は、GPC(ゲル浸透クロマトグラフィー)により測定した面積比の値である。前記変性率が15~60%であると、ソルダペーストの良好なはんだ付け性、保存安定性が保たれる傾向がある。また、同様の点から、ロジン類のフマル酸による変性率は、20~55%が好ましく、20~50%がより好ましい。 The modification rate of rosins with fumaric acid is 15 to 60%. Note that the denaturation rate is a value of area ratio measured by GPC (gel permeation chromatography). When the modification rate is 15 to 60%, the solder paste tends to maintain good solderability and storage stability. Further, from the same point of view, the modification rate of rosins with fumaric acid is preferably 20 to 55%, more preferably 20 to 50%.
前記の製造方法で得られたベース樹脂の酸価は、200~300mgKOH/gである。なお、ここでの酸価は、ロジン系ベース樹脂をエタノール/トルエン混合溶媒中で溶解させた後、フェノールフタレイン溶液を少量加えた液を、濃度0.5モル/Lの水酸化カリウムのエタノール溶液で滴定することにより算出した値である(JIS K 0070に準拠)。ベース樹脂の酸価が200mgKOH/g未満であると、ソルダペーストの濡れ性が劣りやすくなり、300mgKOH/gを超えると、ソルダペーストが経時で増粘しやすく、また絶縁抵抗性も劣りやすくなる。 The acid value of the base resin obtained by the above production method is 200 to 300 mgKOH/g. The acid value here is calculated by dissolving the rosin base resin in a mixed solvent of ethanol/toluene, adding a small amount of phenolphthalein solution, and adding a small amount of phenolphthalein solution to ethanol containing potassium hydroxide at a concentration of 0.5 mol/L. This is a value calculated by titration with a solution (based on JIS K 0070). If the acid value of the base resin is less than 200 mgKOH/g, the wettability of the solder paste tends to be poor, and if it exceeds 300 mgKOH/g, the solder paste tends to increase in viscosity over time and the insulation resistance tends to deteriorate.
また、ベース樹脂の色調はガードナー3以下である。ここで、ガードナー色調はJlS K 0071-2に準拠して、ハーゼン色調はJIS K 0071-1に準拠して測定した値をいう。ベース樹脂がガードナー色調3以下を示すことにより、当該ベース樹脂から調製したソルダペーストを実装させた際に、フラックス残渣が高い透明性を示すため、実装後のはんだ検査がしやすくなる。また、色調がガードナー3より濃くなると、ソルダペーストの濡れ性が低下し、また絶縁抵抗性も劣りやすくなる。また、同様の点から、ベース樹脂の色調はガードナー2以下が好ましい。 Further, the color tone of the base resin is Gardner 3 or less. Here, the Gardner color tone refers to a value measured in accordance with JIS K 0071-2, and the Hazen color tone refers to a value measured in accordance with JIS K 0071-1. When the base resin exhibits a Gardner color tone of 3 or less, the flux residue exhibits high transparency when a solder paste prepared from the base resin is mounted, making it easier to inspect the solder after mounting. Moreover, when the color tone becomes darker than Gardner 3, the wettability of the solder paste decreases and the insulation resistance tends to deteriorate. Further, from the same point of view, the color tone of the base resin is preferably Gardner 2 or less.
前記ベース樹脂のその他の物性として、軟化点は、当該ベース樹脂を含むはんだフラックスを用いた際に、適度な粘度を有するソルダペーストを得やすい点から、80~150℃が好ましく、80~140℃がより好ましい。なお、軟化点は、環球法により測定した値である(JIS K 5601-2-2に準拠)。 As for other physical properties of the base resin, the softening point is preferably 80 to 150°C, and 80 to 140°C, since it is easy to obtain a solder paste with an appropriate viscosity when using a solder flux containing the base resin. is more preferable. Note that the softening point is a value measured by the ring and ball method (based on JIS K 5601-2-2).
本発明の鉛フリーはんだフラックス(以下、“はんだフラックス”という。)は、前記ベース樹脂、活性剤、チキソ剤、及び溶剤を含む。 The lead-free solder flux (hereinafter referred to as "solder flux") of the present invention includes the base resin, an activator, a thixotropic agent, and a solvent.
活性剤としては、アミン、酸、ハロゲン化合物等が挙げられる。これらは単独でも2種以上を組み合わせても良い。 Examples of the activator include amines, acids, halogen compounds, and the like. These may be used alone or in combination of two or more.
アミンとしては、例えば、n-ブチルアミン、n-ペンチルアミン、n-ヘキシルアミン、n-へプチルアミン、n-オクチルアミン等のモノアルキルアミン;
ジn-ブチルアミン、ジn-ペンチルアミン、ジn-ヘキシルアミン、ジn-ヘプチルアミン、ジn-オクチルアミン、ジn-ノニルアミン、ジn-デシルアミン、ジ(1-エチルヘキシル)アミン、ジ(2-エチルヘキシル)アミン等のジアルキルアミン;
トリn-ブチルアミン、トリn-ペンチルアミン、トリn-ヘキシルアミン、トリn-ヘプチルアミン、トリn-オクチルアミン、N,N-ジエチルメチルアミン等のトリアルキルアミン;
モノエタノールアミン、ジエタノールアミン、トリエタノールアミン等のアルカノールアミン;
シクロヘキシルアミン、ジシクロヘキシルアミン等の脂環族アミン;
ジフェニルアミン、トリフェニルアミン等の芳香族アミン;
N,N’-ビス(4-アミノブチル)-1,2-エタンジアミン、トリエチレンテトラミン、N,N’-ビス(3-アミノプロピル)エチレンジアミン、N,N’-ビス(3-アミノプロピル)ピペラジン等が挙げられる。これらは単独でも2種以上を組み合わせても良い。
Examples of amines include monoalkylamines such as n-butylamine, n-pentylamine, n-hexylamine, n-heptylamine, and n-octylamine;
Di-n-butylamine, di-n-pentylamine, di-n-hexylamine, di-n-heptylamine, di-n-octylamine, di-n-nonylamine, di-n-decylamine, di(1-ethylhexyl)amine, di(2 - dialkylamines such as ethylhexyl)amine;
Trialkylamines such as tri-n-butylamine, tri-n-pentylamine, tri-n-hexylamine, tri-n-heptylamine, tri-n-octylamine, N,N-diethylmethylamine;
Alkanolamines such as monoethanolamine, diethanolamine, triethanolamine;
Alicyclic amines such as cyclohexylamine and dicyclohexylamine;
Aromatic amines such as diphenylamine and triphenylamine;
N,N'-bis(4-aminobutyl)-1,2-ethanediamine, triethylenetetramine, N,N'-bis(3-aminopropyl)ethylenediamine, N,N'-bis(3-aminopropyl) Examples include piperazine. These may be used alone or in combination of two or more.
酸としては、例えば、カプリン酸、ラウリン酸、ミリスチン酸、パルミチン酸、マルガリン酸、ステアリン酸、ピコリン酸等の非ハロゲン系脂肪族一塩基酸;
コハク酸、マロン酸、アジピン酸、グルタル酸、スベリン酸、アゼライン酸、セバシン酸、ドデカン二酸等の非ハロゲン系二塩基酸;
シクロヘキサンカルボン酸、1,3-シクロヘキサンジカルボン酸、1,4-シクロヘキサンジカルボン酸等の非ハロゲン系脂環族二塩基酸;
ダイマー酸(リノレン酸やトール油脂肪酸、オレイン酸、リノール酸等の不飽和脂肪酸の二量化物)等が挙げられる。これらは単独でも2種以上を組み合わせても良い。
Examples of acids include non-halogen aliphatic monobasic acids such as capric acid, lauric acid, myristic acid, palmitic acid, margaric acid, stearic acid, and picolinic acid;
Non-halogen dibasic acids such as succinic acid, malonic acid, adipic acid, glutaric acid, suberic acid, azelaic acid, sebacic acid, dodecanedioic acid;
Non-halogen alicyclic dibasic acids such as cyclohexanecarboxylic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid;
Examples include dimer acids (dimerized products of unsaturated fatty acids such as linolenic acid, tall oil fatty acids, oleic acid, and linoleic acid). These may be used alone or in combination of two or more.
ハロゲン化合物としては、例えば、メチルアミン臭化水素酸塩、エチルアミン臭化水素酸塩、ジエチルアミン臭化水素酸塩、シクロヘキシルアミン臭化水素酸塩、ジフェニルグアニジン臭化水素酸塩等の臭化水素酸塩;
3-ブロモプロピオン酸、2-ブロモペンタン酸、3-ブロモペンタン酸、5-ブロモペンタン酸、2-ブロモイソペンタン酸、2,3-ジブロモコハク酸、2-ブロモコハク酸、2,2-ジブロモアジピン酸等のブロモカルボン酸;
1-ブロモ-2-ブタノール、1-ブロモ-2-プロパノール、3-ブロモ-1-プロパノール、3-ブロモ-1,2-プロパンジオール、1,4-ジブロモ-2-ブタノール、1,3-ジブロモ-2-プロパノール、2,3-ジブロモ-1-プロパノール、1,4-ジブロモ-2,3-ブタンジオール、2,3-ジブロモ-1,4-ブテンジオール、2,3-ジブロモ-2-ブテン-1,4-ジオール等のブロモアルコール;
1,2,3,4-テトラブロモブタン、1,2-ジブロモ-1-フェニルエタン等のブロモアルカン;
1-ブロモ-3-メチル-1-ブテン、1,4-ジブロモブテン、1-ブロモ-1-プロペン、2,3-ジブロモプロペン、1,2-ジブロモスチレン、trans-2,3-ジブロモ-2-ブテン-1,4-ジオール等のブロモアルケン等が挙げられる。これらは単独でも2種以上を組み合わせても良い。
Examples of halogen compounds include hydrobromic acids such as methylamine hydrobromide, ethylamine hydrobromide, diethylamine hydrobromide, cyclohexylamine hydrobromide, and diphenylguanidine hydrobromide. salt;
3-bromopropionic acid, 2-bromopentanoic acid, 3-bromopentanoic acid, 5-bromopentanoic acid, 2-bromoisopentanoic acid, 2,3-dibromosuccinic acid, 2-bromosuccinic acid, 2,2-dibromoadipic acid Bromocarboxylic acids such as;
1-bromo-2-butanol, 1-bromo-2-propanol, 3-bromo-1-propanol, 3-bromo-1,2-propanediol, 1,4-dibromo-2-butanol, 1,3-dibromo -2-propanol, 2,3-dibromo-1-propanol, 1,4-dibromo-2,3-butanediol, 2,3-dibromo-1,4-butenediol, 2,3-dibromo-2-butene Bromo alcohols such as -1,4-diol;
Bromo alkanes such as 1,2,3,4-tetrabromobutane and 1,2-dibromo-1-phenylethane;
1-bromo-3-methyl-1-butene, 1,4-dibromobutene, 1-bromo-1-propene, 2,3-dibromopropene, 1,2-dibromostyrene, trans-2,3-dibromo-2 Bromo alkenes such as -butene-1,4-diol and the like can be mentioned. These may be used alone or in combination of two or more.
チキソ剤としては、例えば、硬化ひまし油、蜜ロウ、カルナバワックス等の動植物系チキソ剤;ステアリン酸アミド、12-ヒドロキシステアリン酸エチレンビスアミド等のアミド系チキソ剤が挙げられる。これらは単独でも2種以上を組み合わせても良い。 Examples of thixotropic agents include animal and vegetable thixotropic agents such as hydrogenated castor oil, beeswax and carnauba wax; and amide thixotropic agents such as stearic acid amide and ethylene bisamide 12-hydroxystearate. These may be used alone or in combination of two or more.
溶剤としては、例えば、エチレングリコールモノn-ブチルエーテル、エチレングリコールモノn-ヘキシルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノn-ブチルエーテル、エチレングリコールモノフェニルエーテル、プロピレングリコールモノフェニルエーテル、エチレングリコールモノベンジルエーテル、ジエチレングリコールモノベンジルエーテル、トリプロピレングリコールモノメチルエーテル、ジエチレングリコールモノn-ブチルエーテル、ジエチレングリコールモノn-へキシルエーテル、ジエチレングリコール2-エチルヘキシルエーテル、トリプロピレングリコールモノメチルエーテル等のモノアルキルエーテル;
ベンジルアルコール、1,3-ブタンジオール、1,4-ブタンジオール、オクタンジオール等のアルコール;
安息香酸ブチル、アジピン酸ジエチル、2-(2-n-ブトキシエトキシ)エチルアセテート等のエステル;
α-テルピネン、ミルセン、アロオシメン、リモネン、ジペンテン、α-ピネン、β-ピネン、カルボン、オシメン、フェランドレン等のテルペン系溶剤;
α-テルピネオール、ターピネオール等のテルピネオール類;
ドデカン、テトラデセン等の炭化水素;N-メチル-2-ピロリドン等のピロリドン類等が挙げられる。これらは単独でも2種以上を組み合わせても良い。
Examples of the solvent include ethylene glycol mono-n-butyl ether, ethylene glycol mono-n-hexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, ethylene glycol monophenyl ether, and propylene glycol monophenyl ether. , monoalkyl ethers such as ethylene glycol monobenzyl ether, diethylene glycol monobenzyl ether, tripropylene glycol monomethyl ether, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-hexyl ether, diethylene glycol 2-ethylhexyl ether, tripropylene glycol monomethyl ether;
Alcohols such as benzyl alcohol, 1,3-butanediol, 1,4-butanediol, octanediol;
Esters such as butyl benzoate, diethyl adipate, 2-(2-n-butoxyethoxy)ethyl acetate;
Terpene solvents such as α-terpinene, myrcene, alloocimene, limonene, dipentene, α-pinene, β-pinene, carvone, ocimene, phellandrene;
Terpineols such as α-terpineol and terpineol;
Examples include hydrocarbons such as dodecane and tetradecene; and pyrrolidones such as N-methyl-2-pyrrolidone. These may be used alone or in combination of two or more.
本発明のはんだフラックスにおける前記ベース樹脂、活性剤、チキソ剤及び溶剤の含有量としては、特に限定されず、ソルダペーストの濡れ性及び長期保管時の保存安定性を考慮すると、以下の通りである。
ベース樹脂: 通常25~50重量%程度、好ましくは30~50重量%
活性剤 : 通常5~20重量%程度、好ましくは5~15重量%
チキソ剤 : 通常3~10重量%程度、好ましくは5~10重量%
溶剤 : 通常30~50重量%程度、好ましくは35~50重量%
The contents of the base resin, activator, thixotropic agent, and solvent in the solder flux of the present invention are not particularly limited, and are as follows in consideration of the wettability of the solder paste and the storage stability during long-term storage. .
Base resin: Usually about 25 to 50% by weight, preferably 30 to 50% by weight
Activator: Usually about 5 to 20% by weight, preferably 5 to 15% by weight
Thixotropic agent: Usually about 3 to 10% by weight, preferably 5 to 10% by weight
Solvent: Usually about 30 to 50% by weight, preferably 35 to 50% by weight
本発明のはんだフラックスには、前記のベース樹脂の樹脂酸組成を満たす限り、例えば、前記天然ロジン、前記精製ロジン、当該天然ロジン又は精製ロジンの水素化物、当該天然ロジン又は精製ロジンの不均化物、アクリル酸変性ロジン、アクリル酸変性ロジンの水素化物、イタコン酸変性ロジン、イタコン酸変性ロジンの水素化物、マレイン酸変性ロジン、マレイン酸変性ロジンの水素化物、フマル酸変性ロジンの水素化物、ホルミル化ロジン、ホルミル化ロジンの水素化物、重合ロジン、重合ロジンの水素化物、前記これらのロジンのエステル化物等を含ませても良い(以下、“(A)成分以外のロジン系樹脂”という)。これらは単独でも2種以上を組み合わせても良い。 As long as the solder flux of the present invention satisfies the resin acid composition of the base resin, for example, the natural rosin, the purified rosin, the hydride of the natural rosin or purified rosin, the disproportionated product of the natural rosin or purified rosin, etc. , acrylic acid modified rosin, acrylic acid modified rosin hydride, itaconic acid modified rosin, itaconic acid modified rosin hydride, maleic acid modified rosin, maleic acid modified rosin hydride, fumaric acid modified rosin hydride, formylation Rosin, a hydride of formylated rosin, a polymerized rosin, a hydride of a polymerized rosin, an esterified product of these rosins, etc. may be included (hereinafter referred to as "rosin resin other than component (A)"). These may be used alone or in combination of two or more.
本発明のはんだフラックスには、非ロジン系ベース樹脂、添加剤を含んでも良い。 The solder flux of the present invention may also contain a non-rosin base resin and additives.
非ロジン系ベース樹脂としては、例えば、エポキシ樹脂、アクリル樹脂、ポリイミド樹脂、ポリアミド樹脂(ナイロン樹脂)、ポリエステル樹脂、ポリアクリロニトリル樹脂、塩化ビニル樹脂、酢酸ビニル樹脂、ポリオレフイン樹脂、フッ素系樹脂、ABS樹脂等の合成樹脂等が挙げられる。これらは単独でも2種以上を組み合わせても良い。 Non-rosin base resins include, for example, epoxy resins, acrylic resins, polyimide resins, polyamide resins (nylon resins), polyester resins, polyacrylonitrile resins, vinyl chloride resins, vinyl acetate resins, polyolefin resins, fluorine resins, and ABS resins. Synthetic resins such as These may be used alone or in combination of two or more.
添加剤としては、例えば、酸化防止剤、防黴剤、艶消し剤等が挙げられる。 Examples of additives include antioxidants, antifungal agents, matting agents, and the like.
なお、本発明のはんだフラックスにおける(A)成分以外のロジン系樹脂、非ロジン系ベース樹脂及び添加剤の含有量も特に限定されず、以下の通りである。
(A)成分以外のロジン系樹脂:通常30重量%未満、好ましくは25重量%未満
非ロジン系ベース樹脂:通常5重量%未満、好ましくは1重量%未満
添加剤:通常5重量%未満、好ましくは1重量%未満
Note that the contents of the rosin resin, non-rosin base resin, and additives other than the component (A) in the solder flux of the present invention are not particularly limited, and are as follows.
Rosin resin other than component (A): Usually less than 30% by weight, preferably less than 25% by weight Non-rosin base resin: Usually less than 5% by weight, preferably less than 1% by weight Additive: Usually less than 5% by weight, preferably is less than 1% by weight
本発明のはんだフラックスは、その製造法は、特に限定されず、例えば、前記ベース樹脂、活性剤、チキソ剤及び溶剤、必要に応じて、(A)成分以外のロジン系樹脂、非ロジン系ベース樹脂、添加剤を混合しながら、加熱下で溶融させることで得られる。 The method for producing the solder flux of the present invention is not particularly limited, and includes, for example, the base resin, an activator, a thixotropic agent and a solvent, a rosin resin other than the component (A), and a non-rosin base, if necessary. It is obtained by melting the resin and additives under heating while mixing them.
本発明の鉛フリーソルダペーストは、本発明のはんだフラックス及び鉛フリーはんだ粉末を含むものである。 The lead-free solder paste of the present invention contains the solder flux and lead-free solder powder of the present invention.
鉛フリーはんだ粉末としては、Snはんだ粉末、Sn-Ag系、Sn-Cu系、Sn-Zn系、Sn-Sb系、Sn-Ag-Cu系、Sn-Ag-Bi系、Sn-Ag-Cu-Bi系、Sn-Ag-Cu-In系、Sn-Ag-Cu-S系、Sn-Ag-Cu-Ni-Ge系等が挙げられる。 Examples of lead-free solder powder include Sn solder powder, Sn-Ag series, Sn-Cu series, Sn-Zn series, Sn-Sb series, Sn-Ag-Cu series, Sn-Ag-Bi series, and Sn-Ag-Cu. -Bi system, Sn-Ag-Cu-In system, Sn-Ag-Cu-S system, Sn-Ag-Cu-Ni-Ge system, etc.
本発明のソルダペースト中の各成分の配合割合は、特に限定されず、重量換算で、はんだフラックス/鉛フリーはんだ粉末=5/95~30/70程度、好ましくは8/92~20/80程度である。 The blending ratio of each component in the solder paste of the present invention is not particularly limited, and in terms of weight, solder flux/lead-free solder powder = about 5/95 to 30/70, preferably about 8/92 to 20/80. It is.
以下に、実施例を挙げて本発明を具体的に説明するが、本発明はこれら各例に限定されるものではない。なお、各例中、%は特記しない限り全て重量基準である。 The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. In addition, in each example, all percentages are based on weight unless otherwise specified.
<色調>
ハーゼン色調をJIS K 0071-1に準拠して、またガードナー色調をJIS K 0071-2に準拠して測定した。
<Color tone>
Hazen color tone was measured in accordance with JIS K 0071-1, and Gardner color tone was measured in accordance with JIS K 0071-2.
<酸価>
JIS K 0070に準拠して測定した。
<Acid value>
Measured in accordance with JIS K 0070.
<軟化点>
JIS K 5601-2-2に準拠して測定した。
<Softening point>
Measured in accordance with JIS K 5601-2-2.
<変性率>
市販のゲルパーメーションクロマトグラフィー装置(東ソー(株)製、HLC-8320GPC)、市販のカラム(東ソー(株)製、TSK-GELカラム)、および標準物質として、ポリスチレン、展開溶媒としてテトラヒドロフラン(THF)、検出器として示差屈折計を使用して、濃度0.30%のベース樹脂のTHF溶液40μLを注入し、流量1.0μL/分で測定した。ポリスチレン換算値の分子量150~2000の範囲で検出される全てのピーク面積の合計を分母に、その内、ロジン類とフマル酸との反応生成物に由来するピーク面積の和を分子にとって計算した値を100倍して変性率を求めた。
<Denaturation rate>
A commercially available gel permeation chromatography device (manufactured by Tosoh Corporation, HLC-8320GPC), a commercially available column (manufactured by Tosoh Corporation, TSK-GEL column), polystyrene as a standard substance, and tetrahydrofuran (THF) as a developing solvent. Using a differential refractometer as a detector, 40 μL of a THF solution of base resin with a concentration of 0.30% was injected and measured at a flow rate of 1.0 μL/min. A value calculated using the sum of all peak areas detected in the polystyrene equivalent molecular weight range of 150 to 2000 as the denominator, and the sum of the peak areas derived from the reaction products of rosins and fumaric acid as the numerator. The denaturation rate was determined by multiplying by 100.
実施例1
撹拌機、温度計、窒素導入管及び冷却器を備えた4つ口フラスコに、蒸留ロジン(色調:100H)150gと、ヒンダードフェノール系酸化防止剤(商品名:「IRGANOX1010」、BASFジャパン(株)製)及び硫黄系酸化防止剤(商品名:「Rosinox」、アルケマ社製)をそれぞれ0.15gとを仕込み、200℃まで昇温して加熱溶融させた。そのまま3時間保温した後、フマル酸30.0gを加えて2時間反応させることにより、フラックス用ロジン系ベース樹脂(A-1)を得た。ベース樹脂(A-1)の物性を表1に示す(以下同様)。
Example 1
In a four-necked flask equipped with a stirrer, a thermometer, a nitrogen inlet tube, and a condenser, add 150 g of distilled rosin (color tone: 100H) and a hindered phenolic antioxidant (product name: "IRGANOX1010", manufactured by BASF Japan Co., Ltd.). ) and 0.15 g of a sulfur-based antioxidant (trade name: "Rosinox", manufactured by Arkema) were added, and the temperature was raised to 200° C. to melt them. After keeping the temperature as it was for 3 hours, 30.0 g of fumaric acid was added and reacted for 2 hours to obtain a rosin base resin for flux (A-1). The physical properties of the base resin (A-1) are shown in Table 1 (the same applies below).
実施例2
実施例1において、フマル酸の仕込み量を22.5gに変更して同様に行い、フラックス用ロジン系ベース樹脂(A-2)を得た。
Example 2
The same procedure as in Example 1 was carried out except that the amount of fumaric acid charged was changed to 22.5 g to obtain a rosin base resin for flux (A-2).
実施例3
実施例1において、フマル酸の仕込み量を10.5gに変更して同様に行い、フラックス用ロジン系ベース樹脂(A-3)を得た。
Example 3
The same procedure as in Example 1 was carried out except that the amount of fumaric acid charged was changed to 10.5 g to obtain a rosin base resin for flux (A-3).
実施例4
実施例1において、フマル酸の仕込み量を7.5gに変更して同様に行い、フラックス用ロジン系ベース樹脂(A-4)を得た。
Example 4
The same procedure as in Example 1 was carried out except that the amount of fumaric acid charged was changed to 7.5 g to obtain a rosin base resin for flux (A-4).
実施例5
実施例1において、原料に蒸留ロジン(色調:2G)を用いて同様に行い、フラックス用ロジン系ベース樹脂(A-5)を得た。
Example 5
The same procedure as in Example 1 was carried out using distilled rosin (color tone: 2G) as the raw material to obtain a rosin-based base resin for flux (A-5).
実施例6
実施例1において、Rosinoxを硫黄系酸化防止剤(商品名:「スミライザーWX-R」、住友化学(株)製)に変更して同様に行い、フラックス用ベース樹脂(A-6)を得た。
Example 6
The same procedure as in Example 1 was carried out by changing Rosinox to a sulfur-based antioxidant (trade name: "Sumilizer WX-R", manufactured by Sumitomo Chemical Co., Ltd.) to obtain a base resin for flux (A-6). .
実施例7
実施例1において、ヒンダードフェノール系酸化防止剤(IRGANOX1010)を0.08g、硫黄系酸化防止剤(Rosinox)を0.08gに変更して同様に行い、フラックス用ロジン系ベース樹脂(A-7)を得た。
Example 7
In Example 1, the same procedure was carried out except that the hindered phenolic antioxidant (IRGANOX1010) was changed to 0.08g and the sulfur-based antioxidant (Rosinox) was changed to 0.08g. ) was obtained.
実施例8
実施例1において、ヒンダードフェノール系酸化防止剤(IRGANOX1010)を0.03g、硫黄系酸化防止剤(Rosinox)を0.03gに変更して同様に行い、フラックス用ロジン系ベース樹脂(A-8)を得た。
Example 8
In Example 1, the same procedure was carried out except that the hindered phenol antioxidant (IRGANOX1010) was changed to 0.03 g, and the sulfur-based antioxidant (Rosinox) was changed to 0.03 g. ) was obtained.
市販のロジン系樹脂であるフマル酸変性ロジン(商品名:「マルキード No.33」、荒川化学工業(株)製)、アクリル酸変性ロジンの水素化物(商品名:「パインクリスタル KE-604」、荒川化学工業(株)製)をフラックス用ロジン系ベース樹脂(B-1)~(B-2)として用いた。 Commercially available rosin-based resins such as fumaric acid-modified rosin (product name: "Marquid No. 33", manufactured by Arakawa Chemical Industry Co., Ltd.), hydride of acrylic acid-modified rosin (product name: "Pine Crystal KE-604", Arakawa Chemical Industries, Ltd.) was used as the rosin base resin for flux (B-1) to (B-2).
比較例1
実施例1において、フマル酸の仕込み量を40.5gに変更して同様に行い、フラックス用ロジン系ベース樹脂(B-3)を得た。
Comparative example 1
The same procedure as in Example 1 was carried out except that the amount of fumaric acid charged was changed to 40.5 g to obtain a rosin base resin for flux (B-3).
比較例2
実施例1において、フマル酸の仕込み量を1.5gに変更して同様に行い、フラックス用ロジン系ベース樹脂(B-4)を得た。
Comparative example 2
The same procedure as in Example 1 was carried out except that the amount of fumaric acid charged was changed to 1.5 g to obtain a rosin base resin for flux (B-4).
比較例3
実施例3において、蒸留ロジンをガムロジン(商品名:「CG-WW」、荒川化学工業(株)製)に変更して同様に行い、フラックス用ロジンベース樹脂(B-5)を得た。
Comparative example 3
The same procedure as in Example 3 was carried out except that the distilled rosin was replaced with gum rosin (trade name: "CG-WW", manufactured by Arakawa Chemical Industries, Ltd.) to obtain a rosin base resin for flux (B-5).
<はんだフラックスの調製>
評価例1
ビーカーにロジン系ベース樹脂(A-1)を40g、活性剤として、ダイマー酸を8.5g、グルタル酸を1g、セバシン酸を5g、ジブロモコハク酸を1g、トリn-ブチルアミンを3g、チキソ剤として、12-ヒドロキシステアリン酸エチレンビスアミド(商品名:「MAWAXO」、KFトレーディング(株)製)を6g、酸化防止剤として、ヒンダードフェノール系酸化防止剤(商品名:「Irganox1010」、BASFジャパン(株)製)0.5g、及び溶剤として、ジエチレングリコールモノn-ヘキシルエーテル(HeDG)を35g入れ、混合しながら加熱溶解させて、はんだフラックスを調製した。
<Preparation of solder flux>
Evaluation example 1
In a beaker, 40 g of rosin base resin (A-1), 8.5 g of dimer acid, 1 g of glutaric acid, 5 g of sebacic acid, 1 g of dibromosuccinic acid, 3 g of tri-n-butylamine, and thixotropic agent as activators. As an antioxidant, 6 g of 12-hydroxystearic acid ethylene bisamide (trade name: "MAWAXO", manufactured by KF Trading Co., Ltd.), and as an antioxidant, a hindered phenolic antioxidant (trade name: "Irganox 1010", manufactured by BASF Japan (trade name: "Irganox 1010") Co., Ltd.) and 35 g of diethylene glycol mono-n-hexyl ether (HeDG) as a solvent were added and heated and dissolved while mixing to prepare a solder flux.
評価例2~9、比較評価例1~5
表2に示す組成で、評価例1と同様にはんだフラックスをそれぞれ調製した。
Evaluation examples 2 to 9, comparative evaluation examples 1 to 5
Solder fluxes were prepared in the same manner as in Evaluation Example 1 with the compositions shown in Table 2.
<ソルダペーストの調製>
評価例1のはんだフラックス11g及び鉛フリーはんだ粉末(Sn-Ag-Cu合金;96.5%/3%/0.5%、平均粒子径25~38μm)89gをソルダペースト混練機(商品名:「SPS-2」、(株)マルコム製)で10分間撹拌してソルダペーストを調製した。評価例2~9、比較評価例1~5のはんだフラックスについても同様に調製した。なお、比較評価例4のソルダペーストはベース樹脂(B-4)が結晶化したため、以下の評価を行わなかった。
<Preparation of solder paste>
11 g of the solder flux of Evaluation Example 1 and 89 g of lead-free solder powder (Sn-Ag-Cu alloy; 96.5%/3%/0.5%, average particle size 25 to 38 μm) were mixed in a solder paste kneader (product name: A solder paste was prepared by stirring for 10 minutes using "SPS-2" (manufactured by Malcolm Co., Ltd.). The solder fluxes of Evaluation Examples 2 to 9 and Comparative Evaluation Examples 1 to 5 were prepared in the same manner. Note that in the solder paste of Comparative Evaluation Example 4, the base resin (B-4) was crystallized, so the following evaluation was not performed.
<濡れ性>
JIS Z 3284-4に準拠してディウェッテイング試験により、大気雰囲気下での加熱、リフローにおける銅板に対する各ソルダペーストの濡れ性を目視にて評価した。評価基準は以下の通りである。評価結果を表2に示す(以下同様)。
(評価基準)
○:銅電極に対して塗布した部分が全て濡れ広がる
×:銅電極基板に対して全く濡れない
<Wettability>
In accordance with JIS Z 3284-4, the wettability of each solder paste to a copper plate during heating and reflow was visually evaluated by a dewetting test. The evaluation criteria are as follows. The evaluation results are shown in Table 2 (the same applies below).
(Evaluation criteria)
○: The entire area applied to the copper electrode gets wet and spread. ×: The copper electrode substrate does not get wet at all.
<保存安定性>
各ソルダペーストの調製直後の粘度、及び該ペーストを温度40℃の恒温槽中で24時間保温した後の粘度をスパイラル方式粘度計(商品名:「PCU-205」、共軸二重円筒形回転型、(株)マルコム製)を用いてそれぞれ測定し、以下に示す計算式に基づき、当該ソルダペーストの増粘率を算出した。
<Storage stability>
The viscosity of each solder paste immediately after preparation and the viscosity after keeping the paste in a constant temperature bath at a temperature of 40°C for 24 hours were measured using a spiral viscometer (product name: "PCU-205", coaxial double cylindrical rotating type). The thickening rate of the solder paste was calculated based on the formula shown below.
増粘率(%)=〔{(ソルダペーストを40℃、24時間保温した後の10rpmでの粘度)-(ソルダペーストを調製した直後の10rpmでの粘度)}÷(ソルダペーストを調製した直後の10rpmでの粘度)〕×100 Thickening rate (%) = [{(Viscosity at 10 rpm after keeping the solder paste at 40°C for 24 hours) - (Viscosity at 10 rpm immediately after preparing the solder paste)} ÷ (Immediately after preparing the solder paste) viscosity at 10 rpm)]×100
なお、保温条件は温度加速試験を意図したものであり、本試験における増粘率は、0~10℃での6ヵ月以上保管した後の増粘率を概ね再現している。そして、増粘率が10%未満である場合は、測定誤差も考慮して、保存安定性が良好であるとみなした。以下に評価基準を示す。 Note that the heat retention conditions are intended for temperature accelerated testing, and the thickening rate in this test roughly reproduces the thickening rate after storage at 0 to 10°C for 6 months or more. When the viscosity increase rate was less than 10%, the storage stability was considered to be good, taking measurement errors into account. The evaluation criteria are shown below.
(評価基準)
○:粘度の増粘率が10%未満
×:粘度の増粘率が10%以上
(Evaluation criteria)
○: Viscosity increase rate is less than 10% ×: Viscosity increase rate is 10% or more
<絶縁抵抗性>
JIS Z3284に準拠して、各ソルダペーストをそれぞれリフローし、温度85℃、湿度85%の環境下で7日間曝した後のフラックス残渣の絶縁抵抗値を測定し、1×108Ω以上のものを良好(“○”)とした。
<Insulation resistance>
In accordance with JIS Z3284, each solder paste was reflowed and the insulation resistance value of the flux residue was measured after being exposed for 7 days in an environment of 85°C and 85% humidity, and the insulation resistance value was 1 x 10 8 Ω or more. was rated as good (“○”).
表2の英語表記は以下の化合物を表す。
・CRW-300:水素化ロジン(商品名:「CRW-300」、酸価:170mgKOH/g、軟化点:84℃、荒川化学工業(株)製)
・MAWAXO:12-ヒドロキシステアリン酸エチレンビスアミド(商品名:「MAWAXO」、KFトレーディング(株)製)
・Irganox1010:ヒンダードフェノール系酸化防止剤(商品名:「Irganox1010」、BASFジャパン(株)製)
・HeDG:ジエチレングリコールモノn-ヘキシルエーテル
The English notations in Table 2 represent the following compounds.
・CRW-300: Hydrogenated rosin (product name: “CRW-300”, acid value: 170 mgKOH/g, softening point: 84°C, manufactured by Arakawa Chemical Industry Co., Ltd.)
・MAWAXO: 12-hydroxystearic acid ethylene bisamide (product name: "MAWAXO", manufactured by KF Trading Co., Ltd.)
・Irganox1010: Hindered phenol antioxidant (product name: "Irganox1010", manufactured by BASF Japan Ltd.)
・HeDG: diethylene glycol mono-n-hexyl ether
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