JP5489002B2 - Duv透過マッピングのための方法と装置 - Google Patents
Duv透過マッピングのための方法と装置 Download PDFInfo
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- JP5489002B2 JP5489002B2 JP2010515658A JP2010515658A JP5489002B2 JP 5489002 B2 JP5489002 B2 JP 5489002B2 JP 2010515658 A JP2010515658 A JP 2010515658A JP 2010515658 A JP2010515658 A JP 2010515658A JP 5489002 B2 JP5489002 B2 JP 5489002B2
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- 230000005540 biological transmission Effects 0.000 title claims description 73
- 238000000034 method Methods 0.000 title claims description 62
- 238000013507 mapping Methods 0.000 title claims description 18
- 238000005259 measurement Methods 0.000 claims description 120
- 230000005855 radiation Effects 0.000 claims description 75
- 238000002834 transmittance Methods 0.000 claims description 48
- 230000003287 optical effect Effects 0.000 claims description 32
- 230000008859 change Effects 0.000 claims description 26
- 238000006073 displacement reaction Methods 0.000 claims description 12
- 238000006731 degradation reaction Methods 0.000 claims description 9
- 230000015556 catabolic process Effects 0.000 claims description 8
- 238000003384 imaging method Methods 0.000 claims description 8
- 238000012545 processing Methods 0.000 claims description 7
- 230000001427 coherent effect Effects 0.000 claims description 5
- 238000012544 monitoring process Methods 0.000 claims description 3
- 238000001514 detection method Methods 0.000 description 23
- 239000000758 substrate Substances 0.000 description 20
- 230000007547 defect Effects 0.000 description 17
- 230000008569 process Effects 0.000 description 14
- 238000000206 photolithography Methods 0.000 description 13
- 239000000356 contaminant Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 10
- 238000011109 contamination Methods 0.000 description 10
- 230000000750 progressive effect Effects 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 239000010409 thin film Substances 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000013519 translation Methods 0.000 description 8
- 229910016006 MoSi Inorganic materials 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 7
- 230000010363 phase shift Effects 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 239000011651 chromium Substances 0.000 description 4
- 230000001186 cumulative effect Effects 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 238000013508 migration Methods 0.000 description 3
- 230000005012 migration Effects 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 230000008439 repair process Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229910001430 chromium ion Inorganic materials 0.000 description 2
- 229910052805 deuterium Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- -1 ammonium ions Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013480 data collection Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 238000012625 in-situ measurement Methods 0.000 description 1
- 238000009533 lab test Methods 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NRNCYVBFPDDJNE-UHFFFAOYSA-N pemoline Chemical compound O1C(N)=NC(=O)C1C1=CC=CC=C1 NRNCYVBFPDDJNE-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007430 reference method Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000001275 scanning Auger electron spectroscopy Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95676—Masks, reticles, shadow masks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Spectrometry And Color Measurement (AREA)
Description
102 コリメーティングレンズ
103 リダイレクト光学系
104 DUV放射線
105 集束レンズ
106 XYステージ
107 フォトマスク
108 収集レンズ
109 DUV検出器
110 CCDカメラ
111 チューブ−レンズ
112 リダイレクト光学系
113 対物レンズ
114 集光レンズ
115 光源
116 コンピュータユニット
117、118 接続
119 データリンク
120 領域
122 スポット
124 検出器並進ステージ
201 パラメータ
202 測定値
203 データベース
204 検出しきい値
205 セット内分析
206 セット間分析
207 透過率劣化情報
208 アラート
209 予測
301 DUVビーム
302 基板
303 マスク表面
304 保護ペリクル
305 ビーム
401 曇り汚染物質
402 DUVビーム
501 マスク表面
502 ビーム
Claims (11)
- 深紫外線を少なくとも部分的に透過するパターン化されたフォトマスクの透過率マッピングのための方法であって、前記方法が、
前記フォトマスクの連続領域の配列の異なる領域を照明するように、180nmないし290nmの波長の範囲を含む広帯域深紫外線非コヒーレント照射を方向付けるステップと、
前記放射線源に対して前記フォトマスクの反対側に配置される、3桁以上の広ダイナミックレンジを有する非画像形成光学式検出器を使用して前記フォトマスクを透過し、前記フォトマスクの反対側から出てくる前記広帯域深紫外線を検出するステップと、
前記光学式検出器からの信号を処理して、前記フォトマスクの前記連続領域の配列の前記異なる領域を通して前記放射線の前記透過率を測定するステップと、
前記フォトマスクの劣化を監視するために、前記透過率の測定を定期的に繰り返し、前記透過率の変化を測定するステップと、を含む方法。 - 請求項1に記載の方法であって、前記フォトマスクがパターン化されたフォトマスクを備え、および前記連続領域の配列の前記異なる領域の横方向寸法が、これらの異なる領域の前記パターン化されたフォトマスク上の前記パターンの細部の横方向寸法より少なくとも2桁大きい、ことを特徴とする方法。
- 請求項1に記載の方法であって、さらに、前記検出器と前記フォトマスクとの間の相対的変位を与えるステップを含む方法。
- 請求項1に記載の方法であって、さらに、前記フォトマスクと前記放射線との間の相対的変位を与えるステップを含む方法。
- 請求項1に記載の方法であって、前記放射線が180nmないし290nmの範囲内の波長の放射線を備える、ことを特徴とする方法。
- 請求項1に記載の方法であって、さらに、既知の座標に対して前記フォトマスクを整列配置するために前記フォトマスクを画像形成するステップを含む方法。
- 請求項1に記載の方法であって、前もって得られる前記フォトマスクの前記連続領域の配列の前記異なる領域に対する透過率測定の基準セットが、測定の前記基準セットと前記異なる領域を通しての現在の透過率を比較するために使われる、ことを特徴とする方法。
- 請求項7に記載の方法であって、さらに、前記少なくとも一つの異なる領域を通しての前記透過率が所定の閾値より下であるときに、アラートを出すステップを含む方法。
- 請求項7に記載の方法であって、さらに、前記フォトマスクの前記連続領域の配列の前記異なる領域を通しての前記放射線の前記透過率が所定の閾値より下であるときに、アラートを出すステップを含む方法。
- 請求項7に記載の方法であって、前記透過率測定の基準セットが、前記フォトマスクの他の領域で繰り返される光学的フィーチャーを有する前記フォトマスクの領域の測定を含む、ことを特徴とする方法。
- 請求項1に記載の方法であって、さらに、大気較正を実行するステップを含む方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US92978307P | 2007-07-12 | 2007-07-12 | |
US60/929,783 | 2007-07-12 | ||
US3009308P | 2008-02-20 | 2008-02-20 | |
US61/030,093 | 2008-02-20 | ||
PCT/IL2008/000960 WO2009007977A2 (en) | 2007-07-12 | 2008-07-10 | Method and apparatus for duv transmission mapping |
Publications (2)
Publication Number | Publication Date |
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JP2010533309A JP2010533309A (ja) | 2010-10-21 |
JP5489002B2 true JP5489002B2 (ja) | 2014-05-14 |
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Application Number | Title | Priority Date | Filing Date |
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JP2010515658A Expired - Fee Related JP5489002B2 (ja) | 2007-07-12 | 2008-07-10 | Duv透過マッピングのための方法と装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8592770B2 (ja) |
EP (1) | EP2171539B1 (ja) |
JP (1) | JP5489002B2 (ja) |
KR (1) | KR101387071B1 (ja) |
WO (1) | WO2009007977A2 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20100042924A (ko) * | 2008-10-17 | 2010-04-27 | 삼성전자주식회사 | 포토 마스크의 헤이즈 모니터링 시스템 및 모니터링 방법 |
JP5114367B2 (ja) * | 2008-11-21 | 2013-01-09 | Hoya株式会社 | フォトマスクの製造方法及びそのフォトマスクを用いたパターン転写方法 |
WO2011104617A1 (en) * | 2010-02-23 | 2011-09-01 | Carl Zeiss Sms Ltd. | Analyses of measurement data |
DE102010015884B4 (de) * | 2010-03-09 | 2015-05-28 | Kla-Tencor Mie Gmbh | Verfahren zur reproduzierbaren Bestimmung der Position von Strukturen auf einer Maske mit Pellicle-Rahmen |
TWI497055B (zh) * | 2010-07-30 | 2015-08-21 | Hoya Corp | 透過率測定裝置、光罩之透過率檢查裝置、透過率檢查方法、光罩製造方法、圖案轉印方法、光罩製品 |
US8869076B2 (en) * | 2010-10-07 | 2014-10-21 | Carl Zeiss Sms Ltd. | Global landmark method for critical dimension uniformity reconstruction |
US9213003B2 (en) | 2010-12-23 | 2015-12-15 | Carl Zeiss Sms Gmbh | Method for characterizing a structure on a mask and device for carrying out said method |
KR20120077330A (ko) * | 2010-12-30 | 2012-07-10 | 삼성코닝정밀소재 주식회사 | 패턴드 유리기판 투과율 측정장치 |
JP5869347B2 (ja) * | 2011-02-03 | 2016-02-24 | Hoya株式会社 | 透過率測定装置、及び透過率測定方法 |
KR101940843B1 (ko) * | 2011-07-20 | 2019-01-21 | 칼 짜이스 에스엠에스 엘티디 | 포토리소그래픽 마스크의 임계 치수 변동을 결정하기 위한 방법 및 장치 |
DE102011113940A1 (de) | 2011-09-12 | 2013-03-14 | Carl Zeiss Sms Gmbh | Verfahren und Vorrichtung zur Ermittlung vonDosis-Änderungen zur Anpassung von Strukturgrößen einer Maske |
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DE102012011315B4 (de) | 2012-06-04 | 2018-12-27 | Carl Zeiss Ag | Mikroskop und Verfahren zur Charakterisierung von Strukturen auf einem Objekt |
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JP2005300884A (ja) * | 2004-04-12 | 2005-10-27 | Sony Corp | マスク検査装置およびマスク検査方法 |
US7251033B1 (en) | 2004-06-02 | 2007-07-31 | Advanced Micro Devices, Inc. | In-situ reticle contamination detection system at exposure wavelength |
US7300729B2 (en) * | 2005-04-13 | 2007-11-27 | Kla-Tencor Technologies Corporation | Method for monitoring a reticle |
DE102006027429A1 (de) * | 2005-06-14 | 2006-12-28 | Samsung Electronics Co., Ltd., Suwon | An einer Halbleitervorrichtung eine gleichmäßige kritische Abmessung vorsehende Photomaske und Verfahren zum Herstellen derselben |
EP2044418B1 (en) * | 2006-07-07 | 2014-12-03 | 002134761 Ontario Ltd. | Multiple path length transmittance measuring device |
JP2010517093A (ja) * | 2007-01-29 | 2010-05-20 | トッパン、フォウタマスクス、インク | フォトマスク内の欠陥を処理するための方法およびシステム |
-
2008
- 2008-07-10 EP EP08776600.2A patent/EP2171539B1/en not_active Not-in-force
- 2008-07-10 US US12/281,059 patent/US8592770B2/en active Active
- 2008-07-10 KR KR1020107003147A patent/KR101387071B1/ko active IP Right Grant
- 2008-07-10 JP JP2010515658A patent/JP5489002B2/ja not_active Expired - Fee Related
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JP2010533309A (ja) | 2010-10-21 |
KR101387071B1 (ko) | 2014-04-18 |
EP2171539A2 (en) | 2010-04-07 |
WO2009007977A3 (en) | 2010-02-25 |
US8592770B2 (en) | 2013-11-26 |
KR20100063003A (ko) | 2010-06-10 |
EP2171539A4 (en) | 2013-01-09 |
EP2171539B1 (en) | 2014-09-03 |
WO2009007977A2 (en) | 2009-01-15 |
US20110101226A1 (en) | 2011-05-05 |
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