JP5477711B2 - Memsデバイスの製造方法 - Google Patents

Memsデバイスの製造方法 Download PDF

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Publication number
JP5477711B2
JP5477711B2 JP2010020657A JP2010020657A JP5477711B2 JP 5477711 B2 JP5477711 B2 JP 5477711B2 JP 2010020657 A JP2010020657 A JP 2010020657A JP 2010020657 A JP2010020657 A JP 2010020657A JP 5477711 B2 JP5477711 B2 JP 5477711B2
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layer
frame
probe
base substrate
opening
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JP2011157596A (ja
JP2011157596A5 (enExample
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哲尚 坂本
昌弘 中谷
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Japan Electronic Materials Corp
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Japan Electronic Materials Corp
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JP2010020657A 2010-02-01 2010-02-01 Memsデバイスの製造方法 Active JP5477711B2 (ja)

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JP2010020657A JP5477711B2 (ja) 2010-02-01 2010-02-01 Memsデバイスの製造方法

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JP2010020657A JP5477711B2 (ja) 2010-02-01 2010-02-01 Memsデバイスの製造方法

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JP2011157596A JP2011157596A (ja) 2011-08-18
JP2011157596A5 JP2011157596A5 (enExample) 2012-12-13
JP5477711B2 true JP5477711B2 (ja) 2014-04-23

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5824878B2 (ja) * 2011-05-31 2015-12-02 大日本印刷株式会社 偽装防止用粒子の製造方法
JP5786459B2 (ja) * 2011-05-31 2015-09-30 大日本印刷株式会社 金属粒子の製造方法
JP6068925B2 (ja) * 2012-10-23 2017-01-25 株式会社日本マイクロニクス プローブの製造方法
JP5930091B2 (ja) * 2015-03-16 2016-06-08 大日本印刷株式会社 金属粒子の製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3842318B2 (ja) * 1994-10-27 2006-11-08 Tdk株式会社 マイクロマシン部品の取り扱い方法
JP2011140101A (ja) * 2010-01-08 2011-07-21 Japan Electronic Materials Corp Memsデバイスの製造方法

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