JP5475495B2 - Adjustment method - Google Patents

Adjustment method Download PDF

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JP5475495B2
JP5475495B2 JP2010035426A JP2010035426A JP5475495B2 JP 5475495 B2 JP5475495 B2 JP 5475495B2 JP 2010035426 A JP2010035426 A JP 2010035426A JP 2010035426 A JP2010035426 A JP 2010035426A JP 5475495 B2 JP5475495 B2 JP 5475495B2
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mirror
autocollimator
reflection surface
main body
adjustment
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JP2011170210A (en
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恭一 宮▲崎▼
文靖 大野
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Canon Inc
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Description

本発明は、２つのミラーのそれぞれの反射面の成す角度を調整する調整方法に関する。   The present invention relates to an adjustment method for adjusting the angle formed by the reflecting surfaces of two mirrors.

液晶デバイスを製造するための露光装置においては、マスク（レチクル）のパターンを基板に投影する投影光学系として、カタディオプトリック光学系が用いられている。かかる光学系は、例えば、２つのミラーのそれぞれの反射面の成す角度が目標角度（例えば、９０°）になるように配置されたミラーユニットを含んでいる。このようなミラーユニットにおいては、マスクのパターンを所定の倍率で正確に基板に投影するために、２つのミラーのそれぞれの反射面の成す角度を高精度に調整することが必要となる。そこで、２つのミラーを、調節可能なホルダを介して、ベース部材に装着し、かかるホルダによって、２つのミラーのそれぞれの反射面の成す角度を調整する技術が提案されている（特許文献１参照）。   In an exposure apparatus for manufacturing a liquid crystal device, a catadioptric optical system is used as a projection optical system for projecting a mask (reticle) pattern onto a substrate. Such an optical system includes, for example, a mirror unit arranged so that the angle formed by the reflecting surfaces of the two mirrors becomes a target angle (for example, 90 °). In such a mirror unit, in order to accurately project the mask pattern on the substrate at a predetermined magnification, it is necessary to adjust the angle formed by the reflecting surfaces of the two mirrors with high accuracy. In view of this, a technique has been proposed in which two mirrors are mounted on a base member via an adjustable holder, and the angle formed between the reflecting surfaces of the two mirrors is adjusted by the holder (see Patent Document 1). ).

特開２００２−３３３５７９号公報JP 2002-333579 A

しかしながら、特許文献１には、２つのミラーのそれぞれの反射面の成す角度を調整する調整方法に関して、調節可能なホルダによってなされるという記載があるだけで、具体的にどように調整するのかが開示されていない。また、特許文献１の技術では、近年要求されているような精度（例えば、目標角度に対して数秒レベルの誤差）で２つのミラーのそれぞれの反射面の成す角度を調整できない可能性が高い。   However, in Patent Document 1, there is a description that the adjustment method for adjusting the angle formed by the respective reflecting surfaces of the two mirrors is made by an adjustable holder. Not disclosed. In the technique disclosed in Patent Document 1, there is a high possibility that the angle formed by the reflecting surfaces of the two mirrors cannot be adjusted with accuracy as required in recent years (for example, an error of several seconds with respect to the target angle).

本発明は、このような従来技術の課題に鑑みてなされ、２つのミラーのそれぞれの反射面の成す角度を高精度に調整することができる技術を提供することを例示的目的とする。   The present invention has been made in view of the above-described problems of the prior art, and an object of the present invention is to provide a technique capable of adjusting the angle formed by the reflecting surfaces of the two mirrors with high accuracy.

上記目的を達成するために、本発明の一側面としての調整方法は、第１の基準面と、第２の基準面とを含むベース部材を用いて、第１のミラーの反射面と第２のミラーの反射面との成す角度を目標角度に調整する調整方法であって、前記第１の基準面と前記第２の基準面との成す角度が前記目標角度となるように、前記第１の基準面及び前記第２の基準面を調整する第１の調整ステップと、第１の反射面を有する第１の基準ミラー及び第２の反射面を有する第２の基準ミラーを、前記第１の反射面及び前記第２の反射面のそれぞれが前記第１の調整ステップで調整された前記第１の基準面及び前記第２の基準面に平行になるように配置する配置ステップと、前記配置ステップで配置された第１の基準ミラーの第１の反射面及び第２の基準ミラーの第２の反射面のそれぞれを基準として、第１のオートコリメータの計測軸と第２のオートコリメータの計測軸との成す角度が前記目標角度となるように、前記第１のオートコリメータ及び前記第２のオートコリメータを前記ベース部材に固定する固定ステップと、前記配置ステップで配置された前記第１の基準ミラー及び前記第２の基準ミラーのそれぞれを前記第１の基準面及び前記第２の基準面から取り外す取り外しステップと、前記第１のミラー及び前記第２のミラーを保持する保持部材を、前記第１のミラーの反射面及び前記第２のミラーの反射面のそれぞれが前記第１のオートコリメータの計測軸上及び前記第２のオートコリメータの計測軸上に位置するように前記ベース部材に近接させ、前記第１のオートコリメータ及び前記第２のオートコリメータを用いて、前記第１のミラーの反射面と前記第２のミラーの反射面との成す角度が前記目標角度となるように、前記保持部材に保持された前記第１のミラーの姿勢及び前記第２のミラーの姿勢の少なくとも一方を調整する第２の調整ステップと、を有することを特徴とする。   In order to achieve the above object, an adjustment method according to one aspect of the present invention uses a base member including a first reference surface and a second reference surface, and a reflection surface of the first mirror and a second reference surface. An adjustment method for adjusting an angle formed by the reflecting surface of the mirror to a target angle, wherein the angle formed by the first reference surface and the second reference surface is the target angle. A first adjusting step for adjusting the reference plane and the second reference plane; a first reference mirror having a first reflecting surface; and a second reference mirror having a second reflecting surface; An arrangement step of arranging the reflection surface and the second reflection surface so that each of the reflection surface and the second reflection surface is parallel to the first reference surface and the second reference surface adjusted in the first adjustment step; The first reflecting surface and the second reference mirror of the first reference mirror arranged in steps The first auto-collimator and the first auto-collimator and the second auto-collimator are measured so that the angle formed by the measurement axis of the first auto-collimator and the measurement axis of the second auto-collimator is the target angle. A fixing step of fixing a second autocollimator to the base member, and the first reference mirror and the second reference mirror arranged in the arrangement step are respectively connected to the first reference plane and the second reference mirror. The step of removing from the reference surface, the holding member for holding the first mirror and the second mirror, and the reflecting surface of the first mirror and the reflecting surface of the second mirror, respectively, Proximity to the base member so as to be positioned on the measurement axis of the autocollimator and the measurement axis of the second autocollimator, and the first autocollimator and the The first mirror held by the holding member so that the angle formed by the reflecting surface of the first mirror and the reflecting surface of the second mirror becomes the target angle using the autocollimator of No. 2. And a second adjustment step for adjusting at least one of the attitude of the second mirror and the attitude of the second mirror.

本発明の更なる目的又はその他の側面は、以下、添付図面を参照して説明される好ましい実施形態によって明らかにされるであろう。   Further objects and other aspects of the present invention will become apparent from the preferred embodiments described below with reference to the accompanying drawings.

本発明によれば、例えば、２つのミラーのそれぞれの反射面の成す角度を高精度に調整する技術を提供することができる。   According to the present invention, for example, it is possible to provide a technique for adjusting the angle formed by the reflecting surfaces of two mirrors with high accuracy.

露光装置の構成を示す概略図である。It is the schematic which shows the structure of exposure apparatus. 図１に示す露光装置の投影光学系の一部を構成する第１のミラー及び第２のミラーを保持する保持部材を説明するための図である。It is a figure for demonstrating the holding member holding the 1st mirror and 2nd mirror which comprise a part of projection optical system of the exposure apparatus shown in FIG. 図１に示す露光装置の投影光学系の一部を構成する第１のミラー及び第２のミラーを保持する保持部材を説明するための図である。It is a figure for demonstrating the holding member holding the 1st mirror and 2nd mirror which comprise a part of projection optical system of the exposure apparatus shown in FIG. 本発明の一側面としての調整方法を説明するための図である。It is a figure for demonstrating the adjustment method as 1 side surface of this invention. 図５に示す調整方法で用いられるベース部材を説明するための図である。It is a figure for demonstrating the base member used with the adjustment method shown in FIG.

以下、添付図面を参照して、本発明の好適な実施の形態について説明する。なお、各図において、同一の部材については同一の参照番号を付し、重複する説明は省略する。   DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described with reference to the accompanying drawings. In addition, in each figure, the same reference number is attached | subjected about the same member and the overlapping description is abbreviate | omitted.

図１を参照して、露光装置１について説明する。露光装置１は、マスクのパターンを液晶デバイス用のガラスプレートなどの大型の基板に転写する投影露光装置である。露光装置１は、スリット状に成形された光でマスク２０を照明する照明光学系１０と、マスク２０及び基板５０に形成されたアライメントマークを検出するアライメントスコープ３０と、マスク２０のパターンを基板５０に投影する投影光学系４０とを有する。投影光学系４０は、本実施形態では、入射側及び射出側の光路上に配置された光学薄膜４１ａ及び４１ｂと、第１のミラー４２と、凹面ミラー４３と、凸面ミラー４４と、第２のミラー４５とを含む。   The exposure apparatus 1 will be described with reference to FIG. The exposure apparatus 1 is a projection exposure apparatus that transfers a mask pattern onto a large substrate such as a glass plate for a liquid crystal device. The exposure apparatus 1 includes an illumination optical system 10 that illuminates the mask 20 with light shaped into a slit, an alignment scope 30 that detects alignment marks formed on the mask 20 and the substrate 50, and a pattern of the mask 20 on the substrate 50. A projection optical system 40 for projecting to the projector. In the present embodiment, the projection optical system 40 includes optical thin films 41a and 41b arranged on the incident-side and emission-side optical paths, a first mirror 42, a concave mirror 43, a convex mirror 44, and a second mirror. And a mirror 45.

露光において、マスク２０を通過してパターンを反映する光は、光学薄膜４１ａ、第１のミラー４２、凹面ミラー４３、凸面ミラー４４、凹面ミラー４３、第２のミラー４５の順に通過して、基板５０に結像する。この際、基板５０をＹ軸方向に走査（スキャン）することで、マスク２０に形成されている全てのパターンが基板５０に転写される。   In the exposure, the light that passes through the mask 20 and reflects the pattern passes through the optical thin film 41a, the first mirror 42, the concave mirror 43, the convex mirror 44, the concave mirror 43, and the second mirror 45 in this order. 50 is imaged. At this time, all the patterns formed on the mask 20 are transferred to the substrate 50 by scanning the substrate 50 in the Y-axis direction.

ここで、投影光学系４０の一部を構成する第１のミラー４２及び第２のミラー４５について説明する。第１のミラー４２及び第２のミラー４５は、図２及び図３に示す保持部材１００に保持される。この際、第１のミラー４２及び第２のミラー４５は、後述する調整方法によって、第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θが目標角度（本実施形態では、９０°）となるように調整されている。図２及び図３は、第１のミラー４２及び第２のミラー４５を保持する保持部材１００を説明するための図である。なお、図２は、保持部材１００の概念的な構成を示す図であって、図２（ａ）は、保持部材１００の側面図であり、図２（ｂ）は、保持部材１００の正面図である。また、図３は、保持部材１００の実際の構成を示す図であって、図３（ａ）は、保持部材１００の正面斜視図であり、図３（ｂ）は、保持部材１００の裏面斜視図であり、図３（ｂ）は、保持部材１００の駆動部１６０の断面図である。   Here, the first mirror 42 and the second mirror 45 that constitute a part of the projection optical system 40 will be described. The first mirror 42 and the second mirror 45 are held by the holding member 100 shown in FIGS. At this time, the first mirror 42 and the second mirror 45 are adjusted so that the angle θ formed by the reflection surface 42a of the first mirror 42 and the reflection surface 45a of the second mirror 45 is a target angle (by an adjustment method described later). In this embodiment, the angle is adjusted to 90 °. 2 and 3 are views for explaining the holding member 100 that holds the first mirror 42 and the second mirror 45. 2A and 2B are diagrams showing a conceptual configuration of the holding member 100. FIG. 2A is a side view of the holding member 100, and FIG. 2B is a front view of the holding member 100. It is. 3 is a diagram illustrating an actual configuration of the holding member 100. FIG. 3A is a front perspective view of the holding member 100, and FIG. 3B is a rear perspective view of the holding member 100. FIG. 3B is a cross-sectional view of the drive unit 160 of the holding member 100.

保持部材１００は、本体部１１０と、第１のミラー４２を保持するための第１の保持部１２０と、第２のミラー４５を保持するための第２の保持部１３０と、回転軸１４０ａ及び１４０ｂと、フレーム１５０と、駆動部１６０とを有する。   The holding member 100 includes a main body part 110, a first holding part 120 for holding the first mirror 42, a second holding part 130 for holding the second mirror 45, a rotating shaft 140a, 140b, a frame 150, and a drive unit 160.

第１の保持部１２０は、本体部１１０に設けられた少なくとも２つの可動部１２２及び少なくとも１つの固定部１２４を含み、第１のミラー４２の裏面（反射面４２ａの反対側の面）において、第１のミラー４２を保持する。可動部１２２は、第１のミラー４２の反射面４２ａに直交する方向（図２に示す矢印方向）に高さ（位置）を調節する構成を有する。一方、固定部１２４は、第１のミラー４２の反射面４２ａに直交する方向に高さ（位置）を調節する構成を有さず、第１のミラー４２を本体部１１０に固定する。このように、第１の保持部１２０は、可動部１２２及び固定部１２４によって、第１のミラー４２の姿勢を変更可能に第１のミラー４２を保持する。   The first holding part 120 includes at least two movable parts 122 and at least one fixed part 124 provided in the main body part 110, and on the back surface of the first mirror 42 (the surface opposite to the reflecting surface 42a), The first mirror 42 is held. The movable portion 122 has a configuration in which the height (position) is adjusted in a direction orthogonal to the reflecting surface 42a of the first mirror 42 (the arrow direction shown in FIG. 2). On the other hand, the fixing unit 124 does not have a configuration in which the height (position) is adjusted in a direction orthogonal to the reflection surface 42 a of the first mirror 42, and fixes the first mirror 42 to the main body 110. As described above, the first holding unit 120 holds the first mirror 42 by the movable unit 122 and the fixed unit 124 so that the posture of the first mirror 42 can be changed.

第２の保持部１３０は、本体部１１０に設けられた少なくとも２つの可動部１３２及び少なくとも１つの固定部１３４を含み、第２のミラー４５の裏面（反射面４５ａの反対側の面）において、第２のミラー４５を保持する。第２の保持部１３０は、第１の保持部１２０の可動部１２２及び固定部１２４のそれぞれと同様な機能を有する可動部１３２及び固定部１３４によって、第２のミラー４５の姿勢を変更可能に第２のミラー４５を保持する。   The second holding part 130 includes at least two movable parts 132 and at least one fixed part 134 provided in the main body part 110, and on the back surface of the second mirror 45 (the surface opposite to the reflecting surface 45a), The second mirror 45 is held. The second holding unit 130 can change the posture of the second mirror 45 by the movable unit 132 and the fixed unit 134 having the same functions as the movable unit 122 and the fixed unit 124 of the first holding unit 120, respectively. The second mirror 45 is held.

回転軸１４０ａ及び１４０ｂは、本体部１１０に取り付けられ、本体部１１０とフレーム１５０とを連結する。回転軸１４０ａ及び１４０ｂは、Ｙ軸周りに回転可能な構成を有し、フレーム１５０に対して本体部１１０をＹ軸周りに回転させる。これにより、本体部１１０に設けられた第１の保持部１２０及び第２の保持部１３０のそれぞれに保持された第１のミラー４２及び第２のミラー４５をＹ軸周りに回転させることが可能となる。   The rotation shafts 140 a and 140 b are attached to the main body 110 and connect the main body 110 and the frame 150. The rotation shafts 140 a and 140 b have a configuration that can rotate around the Y axis, and rotate the main body 110 around the Y axis with respect to the frame 150. As a result, the first mirror 42 and the second mirror 45 held by the first holding unit 120 and the second holding unit 130 provided in the main body 110 can be rotated around the Y axis. It becomes.

駆動部１６０は、図３（ａ）乃至図３（ｃ）に示すように、回転軸１４０ａ及び１４０ｂのそれぞれに対して設けられ、フレーム１５０に対して本体部１１０をＺ軸方向（上下方向）に駆動する。具体的には、フレーム１５０に固定されたベース部１６２と、回転軸１４０ａ及び１４０ｂが取り付けられた駆動ステージ１６４と、ベース部１６２に対して上下方向に駆動ステージ１６４を駆動するアクチュエータ１６６とを含む。駆動部１６０は、アクチュエータ１６６によって駆動ステージ１６４を上下方向に駆動し、駆動ステージ１６４に取り付けられた回転軸１４０ａ及び１４０ｂの上下方向の位置を変位させることによって本体部１１０を駆動する。回転軸１４０ａ及び１４０ｂは、駆動部１６０によって駆動された後（上下方向の位置決めがされた後）、フレーム１５０に固定される。   As shown in FIGS. 3A to 3C, the drive unit 160 is provided for each of the rotation shafts 140 a and 140 b, and the main body 110 is moved in the Z-axis direction (vertical direction) with respect to the frame 150. To drive. Specifically, it includes a base portion 162 fixed to the frame 150, a drive stage 164 to which the rotation shafts 140a and 140b are attached, and an actuator 166 that drives the drive stage 164 in the vertical direction with respect to the base portion 162. . The driving unit 160 drives the main body 110 by driving the driving stage 164 in the vertical direction by the actuator 166 and displacing the vertical positions of the rotating shafts 140 a and 140 b attached to the driving stage 164. The rotary shafts 140a and 140b are fixed to the frame 150 after being driven by the drive unit 160 (after being positioned in the vertical direction).

なお、第１のミラー４２の反射面４２ａ及び第２のミラー４５の反射面４５ａは、保持部材１００（第１の保持部１２０及び第２の保持部１３０）が第１のミラー４２及び第２のミラー４５を保持した状態において、平面であることが好ましい。そこで、保持部材１００が第１のミラー４２及び第２のミラー４５を保持した状態において、第１のミラー４２の反射面４２ａ及び第２のミラー４５の反射面４５ａを干渉計で計測して自重変形量及び自重変形分布を求める。そして、干渉計で計測された自重変形量及び自重変形分布に基づいて、保持部材１００から取り外された第１のミラー４２及び第２のミラー４５を部分的に加工（研磨等）するとよい。   The reflecting surface 42a of the first mirror 42 and the reflecting surface 45a of the second mirror 45 are configured so that the holding member 100 (the first holding unit 120 and the second holding unit 130) is the first mirror 42 and the second mirror 42. In the state where the mirror 45 is held, it is preferably a flat surface. Therefore, in a state where the holding member 100 holds the first mirror 42 and the second mirror 45, the reflection surface 42a of the first mirror 42 and the reflection surface 45a of the second mirror 45 are measured by an interferometer and are self-weighted. A deformation amount and a self-weight deformation distribution are obtained. Then, the first mirror 42 and the second mirror 45 removed from the holding member 100 may be partially processed (polished or the like) based on the self-weight deformation amount and the self-weight deformation distribution measured by the interferometer.

以下、図４を参照して、保持部材１００に保持された第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θを目標角度（９０°）に調整する調整方法について説明する。かかる調整方法では、図５に示すように、第１の突き当て面２１０と、第２の突き当て面２２０とを含むベース部材２００が用いられる。図５は、ベース部材２００の構成を示す図であって、図５（ａ）は、ベース部材２００の正面図であり、図５（ｂ）はベース部材２００の側面図である。第１の突き当て面２１０には、第１の基準ミラーが突き当てられる複数の第１の凸部２１２が取り外し可能に配置されている。本実施形態では、３つの第１の凸部２１２が１２０°間隔で配置され、第１の凸部２１２の表面によって第１の基準面が規定される。同様に、第２の突き当て面２２０には、第２の基準ミラーが突き当てられる複数の第２の凸部２２２が取り外し可能に配置されている。本実施形態では、３つの第２の凸部２２２が１２０°間隔で配置され、第２の凸部２２２の表面によって第２の基準面が規定される。なお、第１の凸部２１２及び第２の凸部２２２のそれぞれの先端部（即ち、第１の基準ミラー及び第２の基準ミラーが突き当てられる面）は、微小な面積を有する形状で構成されることが好ましく、例えば、球形状で構成される。   Hereinafter, referring to FIG. 4, the angle θ formed by the reflection surface 42 a of the first mirror 42 held by the holding member 100 and the reflection surface 45 a of the second mirror 45 is adjusted to a target angle (90 °). The adjustment method will be described. In this adjustment method, as shown in FIG. 5, a base member 200 including a first butting surface 210 and a second butting surface 220 is used. 5A and 5B are diagrams showing the configuration of the base member 200, in which FIG. 5A is a front view of the base member 200, and FIG. 5B is a side view of the base member 200. FIG. A plurality of first protrusions 212 against which the first reference mirror is abutted are detachably disposed on the first abutting surface 210. In the present embodiment, the three first convex portions 212 are arranged at intervals of 120 °, and the first reference surface is defined by the surface of the first convex portion 212. Similarly, a plurality of second convex portions 222 against which the second reference mirror is abutted are detachably disposed on the second abutting surface 220. In the present embodiment, the three second convex portions 222 are arranged at intervals of 120 °, and the second reference plane is defined by the surface of the second convex portion 222. In addition, each front-end | tip part (namely, surface where the 1st reference mirror and the 2nd reference mirror are abutted) of the 1st convex part 212 and the 2nd convex part 222 is constituted in the shape which has a minute area. For example, it is configured in a spherical shape.

本実施形態の調整方法では、まず、図４（ａ）に示すように、第１の凸部２１２で規定される第１の基準面と第２の凸部２２２で規定される第２の基準面との成す角度θ１が目標角度になるように、第１の基準面及び第２の基準面を調整する（第１の調整ステップ）。具体的には、３次元形状計測器を用いて第１の凸部２１２の位置及び第２の凸部２２２の位置を計測する。そして、３次元形状計測器で計測された第１の凸部２１２の位置から決定される面（第１の基準面）と第２の凸部２２２の位置から決定される面（第２の基準面）との成す角度（角度θ１）が目標角度となるようにする。詳細には、第１の突き当て面２１０及び第２の突き当て面２２０から取り外した第１の凸部２１２及び第２の凸部２２２を加工して第１の凸部２１２及び第２の凸部２２２の高さを変更することで、第１の基準面及び第２の基準面を調整する。なお、第１の凸部２１２及び第２の凸部２２２の加工とは、第１の凸部２１２及び第２の凸部２２２を削ったり伸ばしたりすることだけではなく、第１の突き当て面２１０及び第２の突き当て面２２０との間に箔等を挟むことも含む。 In the adjustment method of the present embodiment, first, as shown in FIG. 4A, the first reference surface defined by the first convex portion 212 and the second reference defined by the second convex portion 222. as the angle theta 1 formed between the surface is the target angle, to adjust the first reference plane and the second reference plane (first adjusting step). Specifically, the position of the first convex portion 212 and the position of the second convex portion 222 are measured using a three-dimensional shape measuring instrument. Then, a surface (first reference surface) determined from the position of the first protrusion 212 measured by the three-dimensional shape measuring instrument and a surface (second reference) determined from the position of the second protrusion 222. The angle (angle θ 1 ) formed with the surface) is the target angle. Specifically, the first convex portion 212 and the second convex portion 222 are processed by processing the first convex portion 212 and the second convex portion 222 that are removed from the first abutting surface 210 and the second abutting surface 220. The first reference plane and the second reference plane are adjusted by changing the height of the portion 222. In addition, the process of the 1st convex part 212 and the 2nd convex part 222 is not only cutting and extending the 1st convex part 212 and the 2nd convex part 222, but the 1st abutting surface. It also includes sandwiching a foil or the like between 210 and the second abutting surface 220.

次に、図４（ｂ）に示すように、第１の反射面ＲＭ１ａを有する第１の基準ミラーＲＭ１及び第２の反射面ＲＭ２ａを有する第２の基準ミラーＲＭ２のそれぞれをベース部材２００に配置する（配置ステップ）。具体的には、第１の基準ミラーＲＭ１及び第２の基準ミラーＲＭ２のそれぞれを第１の凸部２１２及び第２の凸部２２２に突き当てて、第１の反射面ＲＭ１ａ及び第２の反射面ＲＭ２ａのそれぞれが第１の基準面及び第２の基準面に平行になるようにする。   Next, as shown in FIG. 4B, the first reference mirror RM1 having the first reflection surface RM1a and the second reference mirror RM2 having the second reflection surface RM2a are arranged on the base member 200, respectively. (Placement step). Specifically, the first reference mirror RM1 and the second reference mirror RM2 are brought into contact with the first convex portion 212 and the second convex portion 222, respectively, so that the first reflective surface RM1a and the second reflective surface are reflected. Each of the surfaces RM2a is parallel to the first reference surface and the second reference surface.

次いで、図４（ｃ）に示すように、第１の基準ミラーＲＭ１及び第２の基準ミラーＲＭ２のそれぞれに対して第１のオートコリメータＡＣ１及び第２のオートコリメータＡＣ２を正対させてベース部材２００に固定する（固定ステップ）。この際、第１の反射面ＲＭ１ａ及び第２の反射面ＲＭ２ａのそれぞれを基準として、第１のオートコリメータＡＣ１の計測軸ＭＡ１と第２のオートコリメータＡＣ２の計測軸ＭＡ２との成す角度θ２が目標角度となるようにする。なお、第１のオートコリメータＡＣ１及び第２のオートコリメータＡＣ２のそれぞれは、ベース部材２００に対する姿勢を変更可能な機構を介して、ベース部材２００に固定される。従って、第１のオートコリメータＡＣ１の姿勢及び第２のオートコリメータＡＣ２の姿勢を変更することで、計測軸ＭＡ１と計測軸ＭＡ２との成す角度θ２を調整することができる。 Next, as shown in FIG. 4C, the first autocollimator AC1 and the second autocollimator AC2 are opposed to the first reference mirror RM1 and the second reference mirror RM2, respectively. 200 is fixed (fixing step). At this time, the angle θ 2 formed by the measurement axis MA1 of the first autocollimator AC1 and the measurement axis MA2 of the second autocollimator AC2 is determined based on each of the first reflection surface RM1a and the second reflection surface RM2a. Make the target angle. Note that each of the first autocollimator AC1 and the second autocollimator AC2 is fixed to the base member 200 via a mechanism capable of changing the attitude relative to the base member 200. Therefore, by changing the attitude and orientation of the second autocollimator AC2 of the first autocollimator AC1, it is possible to adjust the angle theta 2 formed by the measurement axis MA1 and the measurement axis MA2.

次に、図４（ｄ）に示すように、第１の基準ミラーＲＭ１及び第２の基準ミラーＲＭ２のそれぞれを第１の基準面（第１の突き当て面２１０）及び第２の基準面（第２の突き当て面２２０）から取り外す（取り外しステップ）。また、第１のミラー４２及び第２のミラー４５を保持する保持部材１００を、ベース部材２００に近接させる。この際、第１のミラー４２の反射面４２ａ及び第２のミラー４５の反射面４５ａのそれぞれが第１のオートコリメータＡＣ１の計測軸上及び第２のオートコリメータＡＣ２の計測軸上に位置するように、保持部材１００を近接させる。そして、第１のオートコリメータＡＣ１及び第２のオートコリメータＡＣ２を用いて、反射面４２ａと反射面４５ａとの成す角度θが目標角度となるように第１のミラー４２の姿勢及び第２のミラー４５の姿勢の少なくとも一方を調整する（第２の調整ステップ）。具体的には、第１の保持部１２０の可動部１２２及び第２の保持部１３０の可動部１３２を介して第１のミラー４２の姿勢及び第２のミラー４５の姿勢を変更することによって、第１のミラー４２の姿勢及び第２のミラー４５の姿勢を調整する。   Next, as shown in FIG. 4D, the first reference mirror RM1 and the second reference mirror RM2 are respectively connected to the first reference surface (first abutting surface 210) and the second reference surface ( Remove from the second abutting surface 220) (removal step). Further, the holding member 100 that holds the first mirror 42 and the second mirror 45 is brought close to the base member 200. At this time, the reflecting surface 42a of the first mirror 42 and the reflecting surface 45a of the second mirror 45 are positioned on the measurement axis of the first autocollimator AC1 and the measurement axis of the second autocollimator AC2, respectively. Next, the holding member 100 is brought close. Then, using the first autocollimator AC1 and the second autocollimator AC2, the posture of the first mirror 42 and the second mirror so that the angle θ formed by the reflecting surface 42a and the reflecting surface 45a becomes the target angle. At least one of the 45 postures is adjusted (second adjustment step). Specifically, by changing the attitude of the first mirror 42 and the attitude of the second mirror 45 via the movable part 122 of the first holding part 120 and the movable part 132 of the second holding part 130, The attitude of the first mirror 42 and the attitude of the second mirror 45 are adjusted.

本実施形態の調整方法による第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θの調整精度を具体的に示す。
（第１の調整ステップ）
三次元形状計測器の計測精度：１μｍ
第１の突き当て面２１０と第２の突き当て面２２０との距離：２００ｍｍ
３つの第１の凸部２１２のそれぞれ及び３つの第２の凸部２２２のそれぞれを結んだ円の直径：約２３０ｍｍ
→目的角度からの第１の基準面と第２の基準面との成す角度θ１の誤差：２秒（第１の基準面及び第２の基準面のそれぞれで１秒）
（固定ステップ）
→目的角度からの第１のオートコリメータＡＣ１の計測軸ＭＡ１と第２のオートコリメータＡＣ２の計測軸ＭＡ２との成す角度θ２の誤差：２秒（第１のオートコリメータＡＣ１の計測軸ＭＡ１及び第２のオートコリメータＡＣ２の計測軸ＭＡのそれぞれで１秒）
（第２の調整ステップ）
→目的角度からの第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θの誤差：２秒（第１のミラー４２及び第２のミラー４５のそれぞれで１秒）
従って、本実施形態の調整方法によれば、目的角度±６秒の誤差の範囲内において、第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θを調整することができる。換言すれば、目標角度に対して数秒レベルの誤差で、第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θを高精度に調整することができる。 The adjustment precision of angle (theta) which the reflective surface 42a of the 1st mirror 42 and the reflective surface 45a of the 2nd mirror 45 by the adjustment method of this embodiment show concretely is shown.
(First adjustment step)
Measuring accuracy of 3D shape measuring instrument: 1μm
Distance between first butting surface 210 and second butting surface 220: 200 mm
Diameter of a circle connecting each of the three first protrusions 212 and each of the three second protrusions 222: about 230 mm
→ Error of angle θ 1 formed by the first reference surface and the second reference surface from the target angle: 2 seconds (1 second for each of the first reference surface and the second reference surface)
(Fixed step)
→ object measurement axis MA1 of the first autocollimator AC1 from the angle and the second auto-collimator AC2 measuring axis MA2 and the angle formed theta 2 of the error: 2 seconds (measurement axis MA1 and the first autocollimator AC1 2 seconds for each of the measuring axes MA of the autocollimator AC2)
(Second adjustment step)
→ Error of angle θ formed by reflection surface 42a of first mirror 42 and reflection surface 45a of second mirror 45 from the target angle: 2 seconds (1 for each of first mirror 42 and second mirror 45) Seconds)
Therefore, according to the adjustment method of the present embodiment, the angle θ formed by the reflection surface 42a of the first mirror 42 and the reflection surface 45a of the second mirror 45 is adjusted within the error range of the target angle ± 6 seconds. can do. In other words, the angle θ formed by the reflecting surface 42a of the first mirror 42 and the reflecting surface 45a of the second mirror 45 can be adjusted with high accuracy with an error of several seconds with respect to the target angle.

なお、本実施形態では、第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θを調整するために、第１のミラー４２の姿勢及び第２のミラー４５の姿勢を変更させている。但し、以下に説明するようにして、第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θを調整してもよい。まず、第２のオートコリメータＡＣ２に対して第２のミラーＭＲ２の反射面ＭＲ２ａが正対するように（即ち、計測軸ＭＡ２に対して反射面ＭＲ２ａが直交するように）駆動部１６０によって本体部１１０を駆動させる。そして、第２のミラーＭＲ２の姿勢は変更させずに、第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θが目標角度となるように、第１の保持部１２０の可動部１２２を介して第１のミラー４２の姿勢を変更する。このような調整方法によっても、上述したように、第１のミラー４２の反射面４２ａと第２のミラー４５の反射面４５ａとの成す角度θを高精度に調整することができる。   In the present embodiment, the attitude of the first mirror 42 and the second mirror 45 are adjusted in order to adjust the angle θ formed by the reflection surface 42 a of the first mirror 42 and the reflection surface 45 a of the second mirror 45. The posture is changed. However, as described below, the angle θ formed by the reflective surface 42a of the first mirror 42 and the reflective surface 45a of the second mirror 45 may be adjusted. First, the main body 110 is driven by the drive unit 160 so that the reflection surface MR2a of the second mirror MR2 faces the second autocollimator AC2 (that is, the reflection surface MR2a is orthogonal to the measurement axis MA2). Drive. Then, without changing the attitude of the second mirror MR2, the first angle 42 formed by the reflecting surface 42a of the first mirror 42 and the reflecting surface 45a of the second mirror 45 is set to the target angle. The posture of the first mirror 42 is changed via the movable part 122 of the holding part 120. Also by such an adjustment method, as described above, the angle θ formed by the reflection surface 42a of the first mirror 42 and the reflection surface 45a of the second mirror 45 can be adjusted with high accuracy.

以上、本発明の好ましい実施形態について説明したが、本発明はこれらの実施形態に限定されないことはいうまでもなく、その要旨の範囲内で種々の変形及び変更が可能である。   As mentioned above, although preferable embodiment of this invention was described, it cannot be overemphasized that this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

Claims (5)

第１の基準面と、第２の基準面とを含むベース部材を用いて、第１のミラーの反射面と第２のミラーの反射面との成す角度を目標角度に調整する調整方法であって、
前記第１の基準面と前記第２の基準面との成す角度が前記目標角度となるように、前記第１の基準面及び前記第２の基準面を調整する第１の調整ステップと、
第１の反射面を有する第１の基準ミラー及び第２の反射面を有する第２の基準ミラーを、前記第１の反射面及び前記第２の反射面のそれぞれが前記第１の調整ステップで調整された前記第１の基準面及び前記第２の基準面に平行になるように配置する配置ステップと、
前記配置ステップで配置された第１の基準ミラーの第１の反射面及び第２の基準ミラーの第２の反射面のそれぞれを基準として、第１のオートコリメータの計測軸と第２のオートコリメータの計測軸との成す角度が前記目標角度となるように、前記第１のオートコリメータ及び前記第２のオートコリメータを前記ベース部材に固定する固定ステップと、
前記配置ステップで配置された前記第１の基準ミラー及び前記第２の基準ミラーのそれぞれを前記第１の基準面及び前記第２の基準面から取り外す取り外しステップと、
前記第１のミラー及び前記第２のミラーを保持する保持部材を、前記第１のミラーの反射面及び前記第２のミラーの反射面のそれぞれが前記第１のオートコリメータの計測軸上及び前記第２のオートコリメータの計測軸上に位置するように前記ベース部材に近接させ、前記第１のオートコリメータ及び前記第２のオートコリメータを用いて、前記第１のミラーの反射面と前記第２のミラーの反射面との成す角度が前記目標角度となるように、前記保持部材に保持された前記第１のミラーの姿勢及び前記第２のミラーの姿勢の少なくとも一方を調整する第２の調整ステップと、
を有することを特徴とする調整方法。 This is an adjustment method that uses a base member including a first reference surface and a second reference surface to adjust the angle formed by the reflection surface of the first mirror and the reflection surface of the second mirror to a target angle. And
A first adjustment step of adjusting the first reference surface and the second reference surface so that an angle formed by the first reference surface and the second reference surface becomes the target angle;
The first reference mirror having the first reflection surface and the second reference mirror having the second reflection surface are the first reflection surface and the second reflection surface respectively in the first adjustment step. An arrangement step of arranging the first reference plane and the second reference plane so as to be parallel to the adjusted first reference plane;
The measurement axis of the first autocollimator and the second autocollimator are based on each of the first reflection surface of the first reference mirror and the second reflection surface of the second reference mirror arranged in the arrangement step. A fixing step of fixing the first autocollimator and the second autocollimator to the base member so that an angle formed with the measurement axis is the target angle;
Removing each of the first reference mirror and the second reference mirror arranged in the arrangement step from the first reference plane and the second reference plane;
The holding member that holds the first mirror and the second mirror is configured such that each of the reflection surface of the first mirror and the reflection surface of the second mirror is on the measurement axis of the first autocollimator and The first autocollimator and the second autocollimator are used in proximity to the base member so as to be positioned on the measurement axis of the second autocollimator, and the reflective surface of the first mirror and the second autocollimator are used. A second adjustment that adjusts at least one of the attitude of the first mirror and the attitude of the second mirror held by the holding member so that the angle formed by the reflecting surface of the mirror becomes the target angle. Steps,
The adjustment method characterized by having. 前記ベース部材は、複数の第１の凸部と、複数の第２の凸部と、を含み、
前記第１の基準面は、前記複数の第１の凸部の表面によって規定され、
前記第２の基準面は、前記複数の第２の凸部の表面によって規定され、
前記第１の基準ミラーは、前記複数の第１の凸部に固定され、
前記第２の基準ミラーは、前記複数の第２の凸部に固定され、
前記第１の調整ステップでは、前記複数の第１の凸部及び前記複数の第２の凸部のそれぞれの高さを変更することによって、前記第１の基準面及び前記第２の基準面を調整することを特徴とする請求項１に記載の調整方法。 The base member includes a plurality of first protrusions and a plurality of second protrusions,
The first reference plane is defined by the surfaces of the plurality of first convex portions,
The second reference plane is defined by the surfaces of the plurality of second convex portions,
The first reference mirror is fixed to the plurality of first protrusions,
The second reference mirror is fixed to the plurality of second convex portions,
In the first adjustment step, the first reference plane and the second reference plane are changed by changing the heights of the plurality of first protrusions and the plurality of second protrusions. The adjustment method according to claim 1, wherein adjustment is performed. 前記保持部材は、
本体部と、
前記本体部に設けられ、前記第１のミラーの姿勢を変更可能に前記第１のミラーを保持する第１の保持部と、
前記本体部に設けられ、前記第２のミラーの姿勢を変更可能に前記第２のミラーを保持する第２の保持部と、
を含み、
前記第２の調整ステップでは、前記第１の保持部及び前記第２の保持部のそれぞれによって前記第１のミラーの姿勢及び前記第２のミラーの姿勢を変更することで前記保持部材に保持された前記第１のミラーの姿勢及び前記第２のミラーの姿勢を調整することを特徴とする請求項１又は２に記載の調整方法。 The holding member is
The main body,
A first holding part that is provided in the main body part and holds the first mirror so that the posture of the first mirror can be changed;
A second holding part that is provided in the main body part and holds the second mirror so that the posture of the second mirror can be changed;
Including
In the second adjustment step, the posture of the first mirror and the posture of the second mirror are changed by the first holding portion and the second holding portion, respectively, thereby being held by the holding member. The adjustment method according to claim 1, wherein the attitude of the first mirror and the attitude of the second mirror are adjusted. 前記保持部材は、
本体部と、
前記本体部に設けられ、前記第１のミラーの姿勢を変更可能に前記第１のミラーを保持する保持部と、
前記本体部を駆動する駆動部と、
を含み、
前記第２の調整ステップでは、前記固定ステップで固定された前記第２のオートコリメータの計測軸に対して前記第２のミラーの反射面が直交するように前記駆動部によって前記本体部を駆動すると共に、前記保持部によって前記第１のミラーの姿勢を変更することで前記保持部材に保持された前記第１のミラーの姿勢を調整することを特徴とする請求項１又は２に記載の調整方法。 The holding member is
The main body,
A holding portion that is provided in the main body portion and holds the first mirror so that the posture of the first mirror can be changed;
A drive unit for driving the main body unit;
Including
In the second adjustment step, the main body is driven by the drive unit so that the reflection surface of the second mirror is orthogonal to the measurement axis of the second autocollimator fixed in the fixing step. The adjustment method according to claim 1, wherein the posture of the first mirror held by the holding member is adjusted by changing the posture of the first mirror by the holding portion. . 前記第１のミラー及び前記第２のミラーは、マスクのパターンを基板に投影する光学系の一部を構成するミラーであることを特徴とする請求項１乃至４のうちいずれか１項に記載の調整方法。   5. The device according to claim 1, wherein the first mirror and the second mirror are mirrors that constitute a part of an optical system that projects a mask pattern onto a substrate. 6. Adjustment method.
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