JP5461134B2 - Bonding agent for inorganic material and bonded body of inorganic material - Google Patents
Bonding agent for inorganic material and bonded body of inorganic material Download PDFInfo
- Publication number
- JP5461134B2 JP5461134B2 JP2009222337A JP2009222337A JP5461134B2 JP 5461134 B2 JP5461134 B2 JP 5461134B2 JP 2009222337 A JP2009222337 A JP 2009222337A JP 2009222337 A JP2009222337 A JP 2009222337A JP 5461134 B2 JP5461134 B2 JP 5461134B2
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- metal
- acid
- inorganic material
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- 229910010272 inorganic material Inorganic materials 0.000 title claims description 70
- 239000011147 inorganic material Substances 0.000 title claims description 69
- 239000007767 bonding agent Substances 0.000 title claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 137
- 239000002184 metal Substances 0.000 claims description 137
- -1 aliphatic monocarboxylic acids Chemical class 0.000 claims description 89
- 239000000084 colloidal system Substances 0.000 claims description 83
- 150000002894 organic compounds Chemical class 0.000 claims description 75
- 229920000642 polymer Polymers 0.000 claims description 72
- 239000002270 dispersing agent Substances 0.000 claims description 66
- 239000002245 particle Substances 0.000 claims description 65
- 239000002082 metal nanoparticle Substances 0.000 claims description 63
- 230000001681 protective effect Effects 0.000 claims description 51
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 38
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 27
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 18
- 229910052709 silver Inorganic materials 0.000 claims description 17
- 239000004332 silver Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 238000005304 joining Methods 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 12
- 229910052737 gold Inorganic materials 0.000 claims description 12
- 239000010931 gold Substances 0.000 claims description 12
- 229910000510 noble metal Inorganic materials 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 9
- 239000002612 dispersion medium Substances 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000002253 acid Substances 0.000 description 46
- 150000003839 salts Chemical class 0.000 description 33
- 239000000178 monomer Substances 0.000 description 31
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- 239000000758 substrate Substances 0.000 description 30
- 230000002209 hydrophobic effect Effects 0.000 description 20
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- 238000003860 storage Methods 0.000 description 18
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- 239000000126 substance Substances 0.000 description 16
- 125000000524 functional group Chemical group 0.000 description 15
- 125000001931 aliphatic group Chemical group 0.000 description 14
- 150000001412 amines Chemical class 0.000 description 14
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 14
- 238000010304 firing Methods 0.000 description 14
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- 150000002739 metals Chemical class 0.000 description 13
- 229920001577 copolymer Polymers 0.000 description 12
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- 238000006243 chemical reaction Methods 0.000 description 10
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- 230000015572 biosynthetic process Effects 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 235000011054 acetic acid Nutrition 0.000 description 8
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- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
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- 239000003638 chemical reducing agent Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
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- KXGVEGMKQFWNSR-UHFFFAOYSA-N deoxycholic acid Natural products C1CC2CC(O)CCC2(C)C2C1C1CCC(C(CCC(O)=O)C)C1(C)C(O)C2 KXGVEGMKQFWNSR-UHFFFAOYSA-N 0.000 description 6
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- BHQCQFFYRZLCQQ-UHFFFAOYSA-N (3alpha,5alpha,7alpha,12alpha)-3,7,12-trihydroxy-cholan-24-oic acid Natural products OC1CC2CC(O)CCC2(C)C2C1C1CCC(C(CCC(O)=O)C)C1(C)C(O)C2 BHQCQFFYRZLCQQ-UHFFFAOYSA-N 0.000 description 5
- 239000004380 Cholic acid Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 238000005119 centrifugation Methods 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- BHQCQFFYRZLCQQ-OELDTZBJSA-N cholic acid Chemical compound C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC(O)=O)C)[C@@]2(C)[C@@H](O)C1 BHQCQFFYRZLCQQ-OELDTZBJSA-N 0.000 description 5
- 235000019416 cholic acid Nutrition 0.000 description 5
- 229960002471 cholic acid Drugs 0.000 description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910001092 metal group alloy Inorganic materials 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 229920000768 polyamine Polymers 0.000 description 5
- 239000011164 primary particle Substances 0.000 description 5
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
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- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
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- 125000002723 alicyclic group Chemical group 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
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- 239000011248 coating agent Substances 0.000 description 4
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- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
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- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
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Description
本発明は、金属コロイド粒子を含むペーストで構成された無機素材用接合剤、この接合剤を用いて無機素材を接合した無機素材の接合体及びその製造方法に関する。 The present invention relates to an inorganic material bonding agent composed of a paste containing metal colloidal particles, an inorganic material bonded body obtained by bonding an inorganic material using the bonding agent, and a method for manufacturing the same.
従来から、金属などで構成された無機素材同士を接合する方法としては、溶接棒を介して接合部に電流を流して加熱することにより金属同士を接合する溶接が知られている。しかし、溶接による接合方法は、金属を溶融させるために高い温度で加熱する必要があり、作業性や生産性が低く、微細で複雑な素材や接触面積の大きい素材では接合が困難である。 2. Description of the Related Art Conventionally, as a method for joining inorganic materials made of metal or the like, welding is known in which metals are joined by flowing current through a welding portion and heating through a welding rod. However, the joining method by welding requires heating at a high temperature in order to melt the metal, has low workability and productivity, and is difficult to join with a fine and complicated material or a material with a large contact area.
このような課題を解決するための接合方法として、特許第3772957号公報(特許文献1)には、有機系の物質で被覆された粒径が1〜100nmの金属超微粒子からなる層を2個の金属体の層間に配置し、加熱、加圧又は通電することにより融合層を形成して金属を接合する方法が開示されている。この文献には、有機系の物質として、有機金属化合物又は金属に対して化学吸着性を有する官能基を含む有機物活性が記載されている。また、前記金属超微粒子は、溶媒中に高濃度で分散して配置されたペースト状をなし、ステアリン酸金属塩などの脂肪酸金属塩を200〜600℃程度で加熱分解することにより調製できることが記載されている。さらに、金属超微粒子は、脂肪酸で完全に覆われているため、常温で酸化されるという問題が完全に生じないと記載されている。 As a bonding method for solving such a problem, Japanese Patent No. 3772957 (Patent Document 1) discloses two layers made of ultrafine metal particles having a particle diameter of 1 to 100 nm and coated with an organic substance. Disclosed is a method in which a metal is bonded by forming a fusion layer by placing it between layers of the metal body and heating, pressurizing or energizing. This document describes an organic activity including an organic metal compound or a functional group having a chemical adsorption property to a metal as an organic substance. Further, it is described that the metal ultrafine particles are in the form of a paste dispersed and arranged in a solvent at a high concentration and can be prepared by thermally decomposing a fatty acid metal salt such as a stearic acid metal salt at about 200 to 600 ° C. Has been. Furthermore, since the ultrafine metal particles are completely covered with fatty acids, it is described that the problem of oxidation at room temperature does not occur completely.
しかし、この接合方法で用いられるペースト状金属超微粒子は、単独の脂肪酸金属塩を使用しているため、金属微粒子に対する保護作用が小さい。従って、室温下でのペーストの保存安定性は低く、金属微粒子の粒径や分散における均一性も低下し易い。さらに、金属微粒子の表面が完全に有機物で覆われているため、金属微粒子同士の焼結力も低く、低温及び低圧力で焼成すると、金属体の層間の接合力が低下する。 However, since the paste-like metal ultrafine particles used in this joining method use a single fatty acid metal salt, the protective action against the metal fine particles is small. Accordingly, the storage stability of the paste at room temperature is low, and the particle size and dispersion uniformity of the metal fine particles are likely to decrease. Furthermore, since the surface of the metal fine particles is completely covered with an organic substance, the sintering force between the metal fine particles is low, and when fired at a low temperature and a low pressure, the bonding force between the layers of the metal bodies is reduced.
従って、本発明の目的は、室温下での分散性及び保存安定性が高く、低温及び低圧で焼成しても強固に金属などの無機素材を接合できる無機素材用接合剤、この接合剤を用いて無機素材を接合した無機素材の接合体及びその製造方法を提供することにある。 Accordingly, an object of the present invention is to use a bonding agent for inorganic materials, which has high dispersibility and storage stability at room temperature and can strongly bond inorganic materials such as metals even when fired at low temperature and low pressure. An object of the present invention is to provide an inorganic material joined body obtained by joining inorganic materials and a method for producing the same.
本発明者らは、前記課題を達成するため鋭意検討した結果、金属ナノ粒子を被覆又は保護(又は分散)する保護コロイド(又は分散剤)を、カルボキシル基を有する有機化合物と、高分子分散剤とで構成することにより、室温下での分散性及び保存安定が高く、低温及び低圧で焼成しても強固に金属などの無機素材を接合できることを見出し、本発明を完成した。 As a result of intensive studies to achieve the above-mentioned problems, the inventors of the present invention have disclosed a protective colloid (or dispersant) for coating or protecting (or dispersing) metal nanoparticles, an organic compound having a carboxyl group, and a polymer dispersant. It was found that the dispersibility and storage stability at room temperature are high, and that inorganic materials such as metals can be strongly bonded even when fired at low temperature and low pressure.
すなわち、本発明の無機素材用接合剤は、金属コロイド粒子、及びこの金属コロイド粒子の分散媒を含むペーストで構成された無機素材用接合剤であって、前記金属コロイド粒子が、金属ナノ粒子(A)と、この金属ナノ粒子(A)を被覆又は分散する保護コロイド(B)とで構成され、かつ前記保護コロイド(B)が、カルボキシル基を有する有機化合物(B1)と、高分子分散剤(B2)とで構成されている。前記金属ナノ粒子(A)を構成する金属は、少なくとも貴金属を含む金属であり、有機化合物(B1)は、C1−16脂肪族カルボン酸及び脂肪族ヒドロキシカルボン酸から選択された少なくとも1種(特にC1−6脂肪族カルボン酸)であり、かつ高分子分散剤(B2)は、遊離のカルボキシル基を有していてもよい。前記保護コロイド(B)の割合は、金属ナノ粒子(A)100質量部に対して1.0〜60質量部程度であり、かつ有機化合物(B1)と高分子分散剤(B2)との割合は、前者/後者(質量比)=86/14〜4/96程度である。 That is, the inorganic material bonding agent of the present invention is an inorganic material bonding agent composed of metal colloid particles and a paste containing a dispersion medium of the metal colloid particles, wherein the metal colloid particles are metal nanoparticles ( A) and a protective colloid (B) that coats or disperses the metal nanoparticles (A), and the protective colloid (B) is an organic compound (B1) having a carboxyl group, and a polymer dispersant. (B2). The metal constituting the metal nanoparticles (A) is a metal containing at least a noble metal, and the organic compound (B1) is at least one selected from C 1-16 aliphatic carboxylic acids and aliphatic hydroxycarboxylic acids ( In particular, it is C 1-6 aliphatic carboxylic acid), and the polymer dispersant (B2) may have a free carboxyl group. The ratio of the protective colloid (B) is about 1.0 to 60 parts by mass with respect to 100 parts by mass of the metal nanoparticles (A), and the ratio of the organic compound (B1) and the polymer dispersant (B2). The former / the latter (mass ratio) = about 86/14 to 4/96.
本発明には、無機素材(C1)と無機素材(C2)との間に前記無機素材用接合剤を介在させて、前記無機素材用接合剤を焼結する無機素材の接合方法も含まれる。この方法において、前記無機素材(C1)及び無機素材(C2)の少なくとも一方の接合面に貴金属(例えば、金、銀、パラジウムなど)、銅又はニッケルが存在していてもよい。 The present invention also includes an inorganic material joining method in which the inorganic material bonding agent is interposed between the inorganic material (C1) and the inorganic material (C2), and the inorganic material bonding agent is sintered. In this method, a noble metal (for example, gold, silver, palladium, etc.), copper or nickel may be present on at least one joint surface of the inorganic material (C1) and the inorganic material (C2).
さらに、本発明には、前記方法により得られた無機素材の接合体も含まれる。 Further, the present invention includes an inorganic material joined body obtained by the above method.
本発明では、金属ナノ粒子を被覆又は分散する保護コロイドとして、特定の保護コロイドを使用するので、室温下での分散性及び保存安定が高く、低温及び低圧で焼成しても強固に金属などの無機素材を接合できる。 In the present invention, since a specific protective colloid is used as a protective colloid for coating or dispersing metal nanoparticles, the dispersibility and storage stability at room temperature are high, and even when fired at a low temperature and low pressure, a metal such as a metal Inorganic materials can be joined.
[無機素材用接合剤]
本発明の無機素材用接合剤は、金属コロイド粒子、及びこの金属コロイド粒子の分散媒を含むペーストで構成されている。
[Bonding agent for inorganic materials]
The bonding agent for an inorganic material of the present invention is composed of a metal colloid particle and a paste containing a dispersion medium of the metal colloid particle.
(金属コロイド粒子)
本発明の金属コロイド粒子は、金属ナノ粒子(A)と、この金属ナノ粒子(A)を被覆又は分散する保護コロイド(B)で構成された金属コロイド粒子であって、前記保護コロイド(B)が、特定の化合物の組み合わせで構成されている。
(Metal colloidal particles)
The metal colloid particles of the present invention are metal colloid particles composed of metal nanoparticles (A) and a protective colloid (B) that coats or disperses the metal nanoparticles (A), the protective colloid (B). Is composed of a combination of specific compounds.
(A)金属ナノ粒子
金属ナノ粒子(A)を構成する金属(金属原子)としては、例えば、遷移金属(例えば、チタン、ジルコニウムなどの周期表第4A族金属;バナジウム、ニオブなどの周期表第5A族金属;モリブデン、タングステンなどの周期表第6A族金属;マンガンなどの周期表第7A族金属;鉄、ニッケル、コバルト、ルテニウム、ロジウム、パラジウム、レニウム、イリジウム、白金などの周期表第8族金属;銅、銀、金などの周期表第1B族金属など)、周期表第2B族金属(例えば、亜鉛、カドミウムなど)、周期表第3B族金属(例えば、アルミニウム、ガリウム、インジウムなど)、周期表第4B族金属(例えば、ゲルマニウム、スズ、鉛など)、周期表第5B族金属(例えば、アンチモン、ビスマスなど)などが挙げられる。金属は、周期表第8族金属(鉄、ニッケル、ロジウム、パラジウム、白金など)、周期表第1B族金属(銅、銀、金など)、周期表第3B族金属(アルミニウムなど)及び周期表第4B族金属(スズなど)などであってもよい。なお、金属(金属原子)は、保護コロイドに対する配位性の高い金属、例えば、周期表第8族金属、周期表第1B族金属などである場合が多い。
(A) Metal nanoparticle The metal (metal atom) constituting the metal nanoparticle (A) is, for example, a transition metal (for example, a periodic table group 4A metal such as titanium or zirconium; a periodic table such as vanadium or niobium). Periodic Table Group 6A metals such as molybdenum and tungsten; Group 7A Metals such as manganese; Periodic Table Group 8 such as iron, nickel, cobalt, ruthenium, rhodium, palladium, rhenium, iridium and platinum Metal; periodic table group 1B metals such as copper, silver, gold), periodic table group 2B metals (for example, zinc, cadmium, etc.), periodic table group 3B metals (for example, aluminum, gallium, indium, etc.), Examples include Periodic Table Group 4B metals (eg, germanium, tin, lead, etc.), Periodic Table Group 5B metals (eg, antimony, bismuth, etc.), and the like. It is done. Metals are periodic group 8 metal (iron, nickel, rhodium, palladium, platinum, etc.), periodic table group 1B metal (copper, silver, gold, etc.), periodic table group 3B metal (aluminum, etc.) and periodic table. It may be a Group 4B metal (such as tin). In many cases, the metal (metal atom) is a metal having a high coordination property to the protective colloid, for example, a Group 8 metal of the periodic table, a Group 1B metal of the periodic table, or the like.
金属ナノ粒子(A)は、前記金属単体、前記金属の合金、金属酸化物、金属水酸化物、金属硫化物、金属炭化物、金属窒化物、金属ホウ化物などであってもよい。これらの金属ナノ粒子(A)は単独で又は二種以上組み合わせて使用できる。金属ナノ粒子(A)は、通常、金属単体粒子、又は金属合金粒子である場合が多い。なかでも、金属ナノ粒子(A)を構成する金属は、少なくとも銀などの貴金属(特に周期表第1B族金属)を含む金属(金属単体及び金属合金)、特に貴金属単体(例えば、銀単体など)であるのが好ましい。 The metal nanoparticles (A) may be the metal simple substance, the metal alloy, metal oxide, metal hydroxide, metal sulfide, metal carbide, metal nitride, metal boride and the like. These metal nanoparticles (A) can be used alone or in combination of two or more. In many cases, the metal nanoparticles (A) are usually single metal particles or metal alloy particles. Among them, the metal constituting the metal nanoparticles (A) is a metal (metal simple substance and metal alloy) including at least a noble metal such as silver (especially Group 1B metal of the periodic table), particularly a noble metal simple substance (for example, silver simple substance). Is preferred.
金属ナノ粒子(A)はナノメーターサイズである。例えば、本発明の金属コロイド粒子における金属ナノ粒子(A)の平均粒子径(平均一次粒子径)は、1〜100nm、好ましくは1.5〜80nm、さらに好ましくは2〜70nm、特に3〜50nm程度であってもよく、通常1〜40nm(例えば、2〜30nm)程度であってもよい。 The metal nanoparticles (A) are nanometer size. For example, the average particle diameter (average primary particle diameter) of the metal nanoparticles (A) in the metal colloid particles of the present invention is 1 to 100 nm, preferably 1.5 to 80 nm, more preferably 2 to 70 nm, and particularly 3 to 50 nm. It may be about 1 to 40 nm (for example, 2 to 30 nm).
また、本発明の金属コロイド粒子は、粗大粒子をほとんど含んでいなくてもよい。そのため、前記金属ナノ粒子(A)の最大一次粒子径は、例えば、200nm以下、好ましくは150nm以下、さらに好ましくは100nm以下である。さらに、金属ナノ粒子(A)(又は金属コロイド粒子)において、一次粒子径が100nm以上の粒子の割合は、金属(又は金属成分)の質量基準で、例えば、10質量%以下(例えば、0〜8質量%程度)、好ましくは5質量%以下(例えば、0.01〜3質量%)、さらに好ましくは1質量%以下(例えば、0.02〜0.5質量%程度)であってもよい。 Further, the metal colloid particles of the present invention may contain almost no coarse particles. Therefore, the maximum primary particle diameter of the metal nanoparticles (A) is, for example, 200 nm or less, preferably 150 nm or less, and more preferably 100 nm or less. Furthermore, in the metal nanoparticles (A) (or metal colloid particles), the proportion of particles having a primary particle diameter of 100 nm or more is, for example, 10% by mass or less (for example, 0 to 0%) based on the mass of the metal (or metal component). 8 mass%), preferably 5 mass% or less (for example, 0.01 to 3 mass%), more preferably 1 mass% or less (for example, about 0.02 to 0.5 mass%). .
(B)保護コロイド
保護コロイド(B)は、カルボキシル基を有する有機化合物(B1)と、高分子分散剤(B2)とで構成されている。
(B) Protective colloid The protective colloid (B) is composed of an organic compound (B1) having a carboxyl group and a polymer dispersant (B2).
(B1)カルボキシル基を有する有機化合物
有機化合物(B1)は、カルボキシル基を有している。このようなカルボキシル基の数は、有機化合物(B1)1分子あたり、1以上であれば特に限定されず、例えば、1〜10、好ましくは1〜5、さらに好ましくは1〜3程度であってもよい。
(B1) Organic compound having a carboxyl group The organic compound (B1) has a carboxyl group. The number of such carboxyl groups is not particularly limited as long as it is 1 or more per molecule of the organic compound (B1), and is, for example, 1 to 10, preferably 1 to 5, and more preferably about 1 to 3. Also good.
なお、有機化合物(B1)において、一部又は全部のカルボキシル基は、塩(アミンとの塩、金属塩など)を形成していてもよい。特に、本発明では、カルボキシル基(特に、すべてのカルボキシル基)が、塩[特に、塩基性化合物との塩(アミンとの塩又はアミン塩など)]を形成していない有機化合物(すなわち、遊離のカルボキシル基を有する有機化合物)を好適に使用できる。 In the organic compound (B1), some or all of the carboxyl groups may form a salt (a salt with an amine, a metal salt, or the like). In particular, in the present invention, an organic compound in which a carboxyl group (particularly, all carboxyl groups) does not form a salt [particularly, a salt with a basic compound (a salt with an amine or an amine salt)] The organic compound having a carboxyl group can be preferably used.
また、有機化合物(B1)は、カルボキシル基を有している限り、カルボキシル基以外の官能基(又は金属化合物又は金属ナノ粒子に対する配位性基など)を有していてもよい。このようなカルボキシル基以外の官能基(又は配位性基)としては、例えば、ハロゲン原子(フッ素原子、塩素原子、臭素原子、ヨウ素原子など)、窒素原子、酸素原子、及び硫黄原子から選択された少なくとも1種のヘテロ原子を有する基{又は官能基、例えば、窒素原子を有する基[アミノ基、置換アミノ基(ジアルキルアミノ基など)、イミノ基(−NH−)、窒素環基(ピリジル基などの5〜8員窒素環基、カルバゾール基、モルホリニル基など)、アミド基(−CON<)、シアノ基、ニトロ基など]、酸素原子を有する基[ヒドロキシル基、アルコキシ基(例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基などのC1−6アルコキシ基)、ホルミル基、カルボニル基(−CO−)、エステル基(−COO−)、酸素環基(テトラヒドロピラニル基などの5〜8員酸素環基など)など]、硫黄原子を有する基[例えば、チオ基、チオール基、チオカルボニル基(−SO−)、アルキルチオ基(メチルチオ基、エチルチオ基などのC1−4アルキルチオ基など)、スルホ基、スルファモイル基、スルフィニル基(−SO2−)など]など}などが挙げられる。これらの官能基は、単独で又は2種以上組み合わせて有機化合物(B1)が有していてもよい。 Moreover, as long as the organic compound (B1) has a carboxyl group, the organic compound (B1) may have a functional group other than the carboxyl group (or a coordinating group for the metal compound or the metal nanoparticle). The functional group (or coordinating group) other than the carboxyl group is selected from, for example, a halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom, etc.), nitrogen atom, oxygen atom, and sulfur atom. A group having at least one heteroatom {or a functional group such as a group having a nitrogen atom [amino group, substituted amino group (dialkylamino group etc.), imino group (—NH—), nitrogen ring group (pyridyl group) 5-8 membered nitrogen ring group, carbazole group, morpholinyl group, etc.), amide group (—CON <), cyano group, nitro group etc.), group having oxygen atom [hydroxyl group, alkoxy group (for example, methoxy group, etc.) , An ethoxy group, a propoxy group, a butoxy group and other C 1-6 alkoxy groups), a formyl group, a carbonyl group (—CO—), an ester group (—COO—), oxygen A cyclic group (such as a 5- to 8-membered oxygen ring group such as a tetrahydropyranyl group)], a group having a sulfur atom [for example, a thio group, a thiol group, a thiocarbonyl group (—SO—), an alkylthio group (a methylthio group, C 1-4 alkylthio group such as ethylthio group, etc.), sulfo group, sulfamoyl group, sulfinyl group (—SO 2 —) etc.] and the like}. These functional groups may be contained in the organic compound (B1) alone or in combination of two or more.
有機化合物(B1)は、これらの官能基のうち、カルボキシル基と塩を形成可能な塩基性基(特に、アミノ基、置換アミノ基、イミノ基、アンモニウム塩基など)を有していない化合物であるのが好ましい。 The organic compound (B1) is a compound that does not have a basic group (in particular, an amino group, a substituted amino group, an imino group, or an ammonium base) that can form a salt with a carboxyl group among these functional groups. Is preferred.
代表的な有機化合物(B1)には、カルボン酸が含まれる。このようなカルボン酸としては、例えば、モノカルボン酸、ポリカルボン酸、ヒドロキシカルボン酸(又はオキシカルボン酸)などが挙げられる。 Representative organic compounds (B1) include carboxylic acids. Examples of such carboxylic acid include monocarboxylic acid, polycarboxylic acid, and hydroxycarboxylic acid (or oxycarboxylic acid).
モノカルボン酸としては、例えば、脂肪族モノカルボン酸[飽和脂肪族モノカルボン酸(例えば、ギ酸、酢酸、プロピオン酸、酪酸、カプリル酸、カプロン酸、ヘキサン酸、カプリン酸、ラウリン酸、ミリスチン酸、ステアリン酸、シクロヘキサンカルボン酸、デヒドロコール酸、コラン酸などのC1−34脂肪族モノカルボン酸、好ましくはC1−30脂肪族モノカルボン酸など)、不飽和脂肪族モノカルボン酸(例えば、オレイン酸、エルカ酸、リノール酸、アビエチン酸などのC4−34不飽和脂肪族カルボン酸、好ましくはC10−30不飽和脂肪族カルボン酸)]、芳香族モノカルボン酸(安息香酸、ナフトエ酸などのC7−12芳香族モノカルボン酸など)などが挙げられる。 Examples of monocarboxylic acids include aliphatic monocarboxylic acids [saturated aliphatic monocarboxylic acids (eg, formic acid, acetic acid, propionic acid, butyric acid, caprylic acid, caproic acid, hexanoic acid, capric acid, lauric acid, myristic acid, C 1-34 aliphatic monocarboxylic acid such as stearic acid, cyclohexanecarboxylic acid, dehydrocholic acid, colanic acid, preferably C1-30 aliphatic monocarboxylic acid), unsaturated aliphatic monocarboxylic acid (for example, olein) C4-34 unsaturated aliphatic carboxylic acid such as acid, erucic acid, linoleic acid, and abietic acid, preferably C10-30 unsaturated aliphatic carboxylic acid)], aromatic monocarboxylic acid (benzoic acid, naphthoic acid, etc.) C 7-12 aromatic monocarboxylic acid, etc.).
ポリカルボン酸としては、例えば、脂肪族ポリカルボン酸[例えば、脂肪族飽和ポリカルボン酸(例えば、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、アゼライン酸、セバシン酸、シクロヘキサンジカルボン酸などのC2−14脂肪族飽和ポリカルボン酸、好ましくはC2−10脂肪族飽和ポリカルボン酸など)、脂肪族不飽和ポリカルボン酸(例えば、マレイン酸、フマル酸、イタコン酸、ソルビン酸、テトラヒドロフタル酸などのC4−14脂肪族不飽和ポリカルボン酸、好ましくはC4−10脂肪族不飽和ポリカルボン酸など)など]、芳香族ポリカルボン酸(例えば、フタル酸、トリメリット酸などのC8−12芳香族ポリカルボン酸など)などが挙げられる。 Examples of polycarboxylic acids include aliphatic polycarboxylic acids [for example, aliphatic saturated polycarboxylic acids (for example, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, azelaic acid, sebacic acid, cyclohexanedicarboxylic acid, etc. C 2-14 aliphatic saturated polycarboxylic acid, preferably C 2-10 aliphatic saturated polycarboxylic acid, etc., aliphatic unsaturated polycarboxylic acid (eg maleic acid, fumaric acid, itaconic acid, sorbic acid, tetrahydro C 4-14 aliphatic unsaturated polycarboxylic acid such as phthalic acid, preferably C 4-10 aliphatic unsaturated polycarboxylic acid etc.], aromatic polycarboxylic acid (eg phthalic acid, trimellitic acid etc.) C 8-12 aromatic polycarboxylic acid and the like).
ヒドロキシカルボン酸としては、ヒドロキシモノカルボン酸[脂肪族ヒドロキシモノカルボン酸(例えば、グリコール酸、乳酸、オキシ酪酸、グリセリン酸、6−ヒドロキシヘキサン酸、コール酸、デオキシコール酸、ケノデオキシコール酸、12−オキソケノデオキシコール酸、グリココール酸、リトコール酸、ヒオデオキシコール酸、ウルソデオキシコール酸、アポコール酸、タウロコール酸などのC2−50脂肪族ヒドロキシモノカルボン酸、好ましくはC2−34脂肪族ヒドロキシモノカルボン酸、さらに好ましくはC2−30脂肪族ヒドロキシモノカルボン酸など)、芳香族ヒドロキシモノカルボン酸(サリチル酸、オキシ安息香酸、没食子酸などのC7−12芳香族ヒドロキシモノカルボン酸など)など]、ヒドロキシポリカルボン酸[脂肪族ヒドロキシポリカルボン酸(例えば、タルトロン酸、酒石酸、クエン酸、リンゴ酸などのC2−10脂肪族ヒドロキシポリカルボン酸など)など]などが挙げられる。 Hydroxycarboxylic acids include hydroxymonocarboxylic acids [aliphatic hydroxymonocarboxylic acids (eg, glycolic acid, lactic acid, oxybutyric acid, glyceric acid, 6-hydroxyhexanoic acid, cholic acid, deoxycholic acid, chenodeoxycholic acid, 12-oxo C 2-50 aliphatic hydroxymonocarboxylic acids, preferably C 2-34 aliphatic hydroxymonocarboxylic acids such as chenodeoxycholic acid, glycocholic acid, lithocholic acid, hyodeoxycholic acid, ursodeoxycholic acid, apocholic acid, taurocholic acid More preferably, C 2-30 aliphatic hydroxy monocarboxylic acid, etc.), aromatic hydroxy monocarboxylic acid (eg, C 7-12 aromatic hydroxy monocarboxylic acid such as salicylic acid, oxybenzoic acid, gallic acid, etc.)], hydroxy Polica Rubonic acid [aliphatic hydroxypolycarboxylic acid (for example, C 2-10 aliphatic hydroxypolycarboxylic acid such as tartronic acid, tartaric acid, citric acid, malic acid and the like)] and the like.
なお、これらのカルボン酸は、塩を形成していてもよく、無水物、水和物などであってもよい。なお、カルボン酸は、前記と同様に、塩(特に、アミンとの塩などの塩基性化合物との塩)を形成していない場合が多い。 These carboxylic acids may form a salt, and may be anhydrides, hydrates, and the like. As described above, the carboxylic acid often does not form a salt (in particular, a salt with a basic compound such as a salt with an amine).
有機化合物(B1)は、単独で又は2種以上組み合わせてもよい。 The organic compound (B1) may be used alone or in combination of two or more.
これらの有機化合物(B1)のうち、脂肪族カルボン酸(例えば、C1−24脂肪族カルボン酸、好ましくはC1−20脂肪族カルボン酸、さらに好ましくはC1−18脂肪族カルボン酸)や、脂肪族ヒドロキシカルボン酸(脂肪族ヒドロキシモノカルボン酸および脂肪族ヒドロキシポリカルボン酸、例えば、C2−34脂肪族ヒドロキシカルボン酸)などのヒドロキシカルボン酸が好ましい。また、脂肪族ヒドロキシカルボン酸の中でも、さらに、脂環族ヒドロキシカルボン酸(又は脂環族骨格を有するヒドロキシカルボン酸、例えば、コール酸などのC6−34脂環族ヒドロキシカルボン酸、好ましくはC10−34脂環族ヒドロキシカルボン酸、さらに好ましくはC16−30脂環族ヒドロキシカルボン酸)が好ましい。 Of these organic compounds (B1), aliphatic carboxylic acid (for example, C 1-24 aliphatic carboxylic acid, preferably C 1-20 aliphatic carboxylic acid, more preferably C 1-18 aliphatic carboxylic acid) or Hydroxy carboxylic acids such as aliphatic hydroxy carboxylic acids (aliphatic hydroxy monocarboxylic acids and aliphatic hydroxy polycarboxylic acids such as C2-34 aliphatic hydroxy carboxylic acids) are preferred. Among the aliphatic hydroxycarboxylic acids, alicyclic hydroxycarboxylic acids (or hydroxycarboxylic acids having an alicyclic skeleton, for example, C 6-34 alicyclic hydroxycarboxylic acids such as cholic acid, preferably C 10-34 alicyclic hydroxycarboxylic acid, more preferably C16-30 alicyclic hydroxycarboxylic acid) is preferable.
また、コール酸などの多環式脂肪族ヒドロキシカルボン酸(例えば、縮合多環式脂肪族ヒドロキシカルボン酸、好ましくはC10−34縮合多環式脂肪族ヒドロキシカルボン酸、好ましくはC14−34縮合多環式脂肪族ヒドロキシカルボン酸、さらに好ましくはC18−30縮合多環式脂肪族ヒドロキシカルボン酸)、デヒドロコール酸、コラン酸などの多環式脂肪族カルボン酸(例えば、縮合多環式脂肪族カルボン酸、好ましくはC10−34縮合多環式脂肪族カルボン酸、好ましくはC14−34縮合多環式脂肪族ヒドロキシカルボン酸、さらに好ましくはC18−30縮合多環式脂肪族カルボン酸)などの多環式脂肪族カルボン酸(例えば、C10−50縮合多環式脂肪族カルボン酸、好ましくはC12−40縮合多環式脂肪族カルボン酸、さらに好ましくはC14−34縮合多環式脂肪族カルボン酸、特にC18−30縮合多環式脂肪族カルボン酸)は、嵩高い構造を有しており、金属ナノ粒子の焼結を抑制する効果が大きい点から好ましい。 In addition, polycyclic aliphatic hydroxycarboxylic acids such as cholic acid (for example, condensed polycyclic aliphatic hydroxycarboxylic acids, preferably C10-34 condensed polycyclic aliphatic hydroxycarboxylic acids, preferably C14-34 condensed). Polycyclic aliphatic hydroxycarboxylic acids, more preferably C18-30 condensed polycyclic aliphatic hydroxycarboxylic acids), dehydrocholic acid, colanic acid, and other polycyclic aliphatic carboxylic acids (eg, condensed polycyclic aliphatic acids) Aliphatic carboxylic acids, preferably C 10-34 condensed polycyclic aliphatic carboxylic acids, preferably C 14-34 condensed polycyclic aliphatic hydroxy carboxylic acids, more preferably C 18-30 condensed polycyclic aliphatic carboxylic acids ) polycyclic aliphatic carboxylic acids (e.g., C 10-50 condensed polycyclic aliphatic carboxylic acids such as, preferably C 12-40 condensed polycyclic aliphatic Carboxylic acid, more preferably C 14-34 condensed polycyclic aliphatic carboxylic acids, particularly C 18-30 condensed polycyclic aliphatic carboxylic acids), has a bulky structure, sintering of the metal nanoparticles This is preferable because it has a large effect of suppressing the above.
さらに、これらの有機化合物(B1)のうち、焼成温度で金属粒子から脱離又は消失し、焼結サイトを形成することにより無機素材の接合力を向上できる点から、遊離のカルボキシル基を有する比較的低分子の飽和脂肪族カルボン酸が好ましく、例えば、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸などのC1−16アルカン酸(アルカンカルボン酸)、好ましくはC1−12アルカン酸(例えば、C1−6アルカン酸)、さらに好ましくはC1−4アルカン酸、特にC1−3アルカン酸(例えば、C1−2アルカン酸)であってもよい。 Furthermore, among these organic compounds (B1), a comparison with a free carboxyl group from the point that it can desorb or disappear from the metal particles at the firing temperature and improve the bonding strength of the inorganic material by forming a sintering site. Low molecular weight saturated aliphatic carboxylic acids, for example, C 1-16 alkanoic acids (alkane carboxylic acids) such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, preferably C 1-12 alkanoic acids (for example, C 1-6 alkanoic acid), more preferably C 1-4 alkanoic acid, in particular C 1-3 alkanoic acid (eg C 1-2 alkanoic acid).
なお、有機化合物(B1)の分子量は、例えば、1000以下(例えば、46〜900程度)、好ましくは800以下(例えば、50〜700程度)、さらに好ましくは600以下(例えば、100〜500程度)であってもよい。 The molecular weight of the organic compound (B1) is, for example, 1000 or less (for example, about 46 to 900), preferably 800 or less (for example, about 50 to 700), and more preferably 600 or less (for example, about 100 to 500). It may be.
また、有機化合物(B1)のpKa値は、例えば、1以上(例えば、1〜10程度)、好ましくは2以上(例えば、2〜8程度)程度であってもよい。 Further, the pKa value of the organic compound (B1) may be, for example, about 1 or more (for example, about 1 to 10), preferably about 2 or more (for example, about 2 to 8).
(B2)高分子分散剤
本発明では、保護コロイドを、前記有機化合物(B1)と高分子分散剤(B2)とで組み合わせて構成する。このような組み合わせで保護コロイドを構成することにより、粗大粒子が著しく少ない金属ナノ粒子を含む金属コロイド粒子が得られる。特に、本発明では、前記特定の保護コロイドの組み合わせにより、粗大粒子が少ないにもかかわらず、金属ナノ粒子の割合を大きくでき、ペースト中における金属コロイド粒子(およびその分散液)の保存安定性にも優れている。前記組み合わせによりこのような優れた金属コロイド粒子となる理由は定かではないが、以下のような理由が考えられる。
(B2) Polymer Dispersant In the present invention, the protective colloid is constituted by combining the organic compound (B1) and the polymer dispersant (B2). By forming the protective colloid in such a combination, metal colloid particles containing metal nanoparticles with extremely few coarse particles can be obtained. In particular, in the present invention, the combination of the specific protective colloids can increase the proportion of metal nanoparticles even though the number of coarse particles is small, thereby improving the storage stability of the metal colloid particles (and dispersions thereof) in the paste. Is also excellent. The reason why such an excellent colloidal metal particle is obtained by the combination is not clear, but the following reasons are conceivable.
まず、高分子分散剤は、その構造から、比較的大きな粒子を分散安定化する効果に優れているが、比較的小さな粒子の安定化効果が十分ではないため、金属ナノ粒子原料の濃度を大きくすると、生成する粒子を十分に安定化できなくなる。一方、このようなナノ粒子の合成初期段階に生成する比較的小さい粒子を、前記有機化合物が分散安定化する。このような有機化合物(B1)と高分子分散剤(B2)との相乗的な作用により、金属ナノ粒子の原料が高濃度であっても粗大粒子の生成を抑えて金属ナノ粒子を生成できるものと考えられる。 First, the polymer dispersant is excellent in the effect of stabilizing the dispersion of relatively large particles due to its structure, but since the stabilization effect of relatively small particles is not sufficient, the concentration of the metal nanoparticle raw material is increased. Then, the generated particles cannot be sufficiently stabilized. On the other hand, the organic compound disperses and stabilizes relatively small particles generated at the initial synthesis stage of such nanoparticles. A synergistic action of the organic compound (B1) and the polymer dispersant (B2) that can generate metal nanoparticles while suppressing the formation of coarse particles even when the concentration of the metal nanoparticles is high. it is conceivable that.
また、保護コロイドは、短いタイムスケールでは、金属ナノ粒子表面に対して吸着、脱離を繰り返しているが、高分子分散剤で保護した場合、吸着した部分が瞬間的に脱離した場合であっても、立体障害が大きく、また、脱離しても、吸着に関与していた基に代わり他の基が金属ナノ粒子表面に吸着するため、粒子間の凝集や焼結が生じにくい。従って、良好な保存安定性を示す一方、その高い保護能力及び分解温度のため、焼成温度も高温でなければ金属ナノ粒子の焼結は起こらず、高分子分散剤のみでは、無機素材の接合力を向上できない。一方、カルボキシル基を有する有機化合物は、通常、金属ナノ粒子表面に対する吸着力は弱く、また、気化温度が低い場合が多い。そのため、低温焼成により金属ナノ粒子表面から脱離又は消失し、無機素材の接合力を向上しやすいが、室温のような低温においても金属ナノ粒子の凝集、焼結が生じやすく、保存安定性が十分でないため、無機素材間の層面において安定した金属膜を形成することが困難である。 In addition, the protective colloid repeatedly adsorbs and desorbs on the surface of the metal nanoparticles on a short time scale. However, when the protective colloid is protected with a polymer dispersant, the adsorbed portion is desorbed momentarily. However, the steric hindrance is large, and even when desorbed, other groups are adsorbed on the surface of the metal nanoparticles instead of the groups involved in the adsorption, so that aggregation and sintering between the particles hardly occur. Therefore, while exhibiting good storage stability, due to its high protective ability and decomposition temperature, the sintering of the metal nanoparticles does not occur unless the firing temperature is high. Cannot be improved. On the other hand, an organic compound having a carboxyl group usually has a weak adsorptive power on the surface of metal nanoparticles and often has a low vaporization temperature. For this reason, it is easy to improve the bonding strength of inorganic materials due to desorption or disappearance from the surface of the metal nanoparticles by low-temperature firing, but the metal nanoparticles tend to aggregate and sinter even at low temperatures such as room temperature, and storage stability is improved. Since it is not sufficient, it is difficult to form a stable metal film on the layer surface between inorganic materials.
そこで、本発明では、高分子分散剤とカルボキシル基を有する有機化合物とを組み合わせる。このような組み合わせにより、金属ナノ粒子表面には高分子分散剤が吸着した部分、前記有機化合物が吸着した部分が形成されている。そして、前記高分子分散剤が吸着した部分は、強い表面保護能力により安定化されて、保存安定性が向上されている一方、前記有機化合物が吸着した部分は金属ナノ粒子表面から脱離しやすく、低温焼結の反応サイトとしての役割を担う。このような反応サイトは、室温程度の雰囲気においては高分子分散剤の作用により保護されているが、比較的低温での焼成温度(例えば、数十度以上)において焼結反応を開始し、結果として低温焼成でも無機素材を強固に接合できるようである。特に、焼成温度が高くなれば、さらに高分子分散剤の保護能力よりも粒子間衝突や焼結性が高くなるため、さらに接合力は向上する。また、高分子分散剤は、基材に対する密着性を向上させる効果があり、しかも、本発明の接合体においてはこのような高分子分散剤の残存量を小さくでき、無機素材の層間において、体積収縮が小さい緻密かつ密着性の高い膜を形成できるため、無機素材に対する密着性に優れるとともに無機素材同士を強固に固定できる。 Therefore, in the present invention, a polymer dispersant and an organic compound having a carboxyl group are combined. By such a combination, a portion where the polymer dispersant is adsorbed and a portion where the organic compound is adsorbed are formed on the surface of the metal nanoparticles. And, the portion where the polymer dispersant is adsorbed is stabilized by strong surface protection ability, and the storage stability is improved, while the portion where the organic compound is adsorbed is easily detached from the surface of the metal nanoparticles, It plays a role as a reaction site for low-temperature sintering. Such a reaction site is protected by the action of the polymer dispersant in an atmosphere of about room temperature, but starts a sintering reaction at a relatively low firing temperature (for example, several tens of degrees or more). It seems that the inorganic material can be firmly joined even by low-temperature firing. In particular, the higher the firing temperature, the higher the interparticle collision and sinterability than the protective ability of the polymer dispersant, so that the bonding force is further improved. Further, the polymer dispersant has an effect of improving the adhesion to the substrate, and in the joined body of the present invention, the residual amount of such a polymer dispersant can be reduced, and the volume between the inorganic material layers can be reduced. Since a dense and highly adhesive film with small shrinkage can be formed, the adhesiveness to the inorganic material is excellent and the inorganic materials can be firmly fixed.
高分子分散剤(又は高分子型分散剤)(B2)としては、金属ナノ粒子(A)を被覆可能であれば特に限定されないが、両親媒性の高分子分散剤(又はオリゴマー型分散剤)を好適に使用できる。 The polymer dispersant (or polymer type dispersant) (B2) is not particularly limited as long as it can coat the metal nanoparticles (A), but the amphiphilic polymer dispersant (or oligomer type dispersant). Can be suitably used.
高分子分散剤としては、通常、塗料、インキ分野などで着色剤の分散に用いられている高分子分散剤が例示できる。このような分散剤には、スチレン系樹脂(スチレン−(メタ)アクリル酸共重合体、スチレン−無水マレイン酸共重合体など)、アクリル系樹脂((メタ)アクリル酸メチル−(メタ)アクリル酸共重合体、ポリ(メタ)アクリル酸などの(メタ)アクリル酸系樹脂など)、水溶性ウレタン樹脂、水溶性アクリルウレタン樹脂、水溶性エポキシ樹脂、水溶性ポリエステル系樹脂、セルロース誘導体(ニトロセルロース;エチルセルロースなどのアルキルセルロース、エチルヒドロキシエチルセルロースなどのアルキル−ヒドロキシアルキルセルロース、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロースなどのヒドロキシアルキルセルロース、カルボキシメチルセルロースなどのカルボキシアルキルセルロースなどのセルロースエーテル類など)、ポリビニルアルコール、ポリアルキレングリコール(液状のポリエチレングリコール、ポリプロピレングリコールなど)、天然高分子(ゼラチン、デキストリン、アラビヤゴム、カゼインなどの多糖類など)、ポリエチレンスルホン酸又はその塩、ポリスチレンスルホン酸又はその塩、ナフタレンスルホン酸のホルマリン縮合物、窒素原子含有高分子化合物[例えば、ポリアルキレンイミン(ポリエチレンイミンなど)、ポリビニルピロリドン、ポリアリルアミン、ポリエーテルポリアミン(ポリオキシエチレンポリアミンなど)などのアミノ基を有する高分子化合物]などが含まれる。 Examples of the polymer dispersant include polymer dispersants usually used for dispersing colorants in the paint and ink fields. Such dispersants include styrene resins (styrene- (meth) acrylic acid copolymers, styrene-maleic anhydride copolymers, etc.), acrylic resins ((meth) methyl acrylate- (meth) acrylic acid). Copolymers, (meth) acrylic acid resins such as poly (meth) acrylic acid), water-soluble urethane resins, water-soluble acrylic urethane resins, water-soluble epoxy resins, water-soluble polyester resins, cellulose derivatives (nitrocellulose; Cellulose ethers such as alkyl celluloses such as ethyl cellulose, alkyl-hydroxyalkyl celluloses such as ethyl hydroxyethyl cellulose, hydroxyalkyl celluloses such as hydroxyethyl cellulose and hydroxypropyl cellulose, and carboxyalkyl celluloses such as carboxymethyl cellulose. Tel, etc.), polyvinyl alcohol, polyalkylene glycol (liquid polyethylene glycol, polypropylene glycol, etc.), natural polymer (polysaccharides such as gelatin, dextrin, arabic gum, casein), polyethylene sulfonic acid or salt thereof, polystyrene sulfonic acid Or a salt thereof, a formalin condensate of naphthalenesulfonic acid, a nitrogen atom-containing polymer compound [for example, an amino group such as polyalkyleneimine (polyethyleneimine, etc.), polyvinylpyrrolidone, polyallylamine, polyether polyamine (polyoxyethylene polyamine, etc.) And the like.
代表的な高分子分散剤(両親媒性の高分子分散剤)としては、親水性モノマーで構成された親水性ユニット(又は親水性ブロック)を含む樹脂(又は水溶性樹脂、水分散性樹脂)が含まれる。 As a typical polymer dispersant (amphiphilic polymer dispersant), a resin (or water-soluble resin, water-dispersible resin) containing a hydrophilic unit (or hydrophilic block) composed of a hydrophilic monomer. Is included.
前記親水性モノマーとしては、例えば、カルボキシル基又は酸無水物基含有単量体(アクリル酸、メタクリル酸などの(メタ)アクリル系単量体、マレイン酸などの不飽和多価カルボン酸、無水マレイン酸など)、ヒドロキシル基含有単量体(2−ヒドロキシエチル(メタ)アクリレートなどのヒドロキシアルキル(メタ)アクリレート、ビニルフェノールなど)などの付加重合系モノマー;アルキレンオキシド(エチレンオキシドなど)などの縮合系モノマーなどが例示できる。前記縮合系モノマーは、ヒドロキシル基などの活性基(例えば、前記ヒドロキシル基含有単量体など)との反応により、親水性ユニットを形成していてもよい。親水性モノマーは、単独で又は2種以上組み合わせて親水性ユニットを形成していてもよい。 Examples of the hydrophilic monomer include carboxyl group or acid anhydride group-containing monomers ((meth) acrylic monomers such as acrylic acid and methacrylic acid, unsaturated polycarboxylic acids such as maleic acid, and maleic anhydride. Acid), hydroxyl group-containing monomers (hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl (meth) acrylate, vinylphenol, etc.) and other addition polymerization monomers; condensation monomers such as alkylene oxide (ethylene oxide, etc.) Etc. can be exemplified. The condensed monomer may form a hydrophilic unit by a reaction with an active group such as a hydroxyl group (for example, the hydroxyl group-containing monomer). The hydrophilic monomers may form a hydrophilic unit alone or in combination of two or more.
高分子分散剤は、少なくとも親水性ユニット(又は親水性ブロック)を含んでいればよく、親水性モノマーの単独又は共重合体(例えば、ポリアクリル酸又はその塩など)であってもよく、前記例示のスチレン系樹脂やアクリル系樹脂などのように、親水性モノマーと疎水性モノマーとのコポリマーであってもよい。疎水性モノマー(非イオン性モノマー)としては、(メタ)アクリル酸エステル[(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n−ブチル、(メタ)アクリル酸2−エチルヘキシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸ステアリルなどの(メタ)アクリル酸C1−20アルキル、(メタ)アクリル酸シクロヘキシルなどの(メタ)アクリル酸シクロアルキル、(メタ)アクリル酸フェニルなどの(メタ)アクリル酸アリール、(メタ)アクリル酸ベンジル、(メタ)アクリル酸2−フェニルエチルなどの(メタ)アクリル酸アラルキルなど]などの(メタ)アクリル系モノマー;スチレン、α−メチルスチレン、ビニルトルエンなどのスチレン系モノマー;α−C2−20オレフィン(エチレン、プロピレン、1−ブテン、イソブチレン、1−ヘキセン、1−オクテン、1−ドデセンなど)などのオレフィン系モノマー;酢酸ビニル、酪酸ビニルなどのカルボン酸ビニルエステル系モノマーなどが挙げられる。疎水性モノマーは、単独で又は2種以上組み合わせて疎水性ユニットを構成していてもよい。 The polymer dispersant only needs to contain at least a hydrophilic unit (or hydrophilic block), and may be a homopolymer or a copolymer of a hydrophilic monomer (for example, polyacrylic acid or a salt thereof). It may be a copolymer of a hydrophilic monomer and a hydrophobic monomer, such as an exemplary styrene resin or acrylic resin. Examples of hydrophobic monomers (nonionic monomers) include (meth) acrylic acid esters [methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate. , (Meth) acrylic acid lauryl, (meth) acrylic acid C 1-20 alkyl such as stearyl (meth) acrylate, (meth) acrylic acid cycloalkyl such as cyclohexyl, (meth) acrylic acid phenyl, etc. (Meth) acrylic monomers such as aryl (meth) acrylate, benzyl (meth) acrylate, aralkyl (meth) acrylate such as 2-phenylethyl (meth) acrylate, etc .; styrene, α-methylstyrene, styrenic monomers such as vinyl toluene; α-C 2-20 olefin (ethylene , Propylene, 1-butene, isobutylene, 1-hexene, 1-octene, 1-dodecene, etc.) olefin monomers such as, vinyl acetate, and the like carboxylic acid vinyl ester monomers such as vinyl butyrate. Hydrophobic monomers may constitute a hydrophobic unit alone or in combination of two or more.
高分子分散剤がコポリマー(例えば、親水性モノマーと疎水性モノマーとのコポリマー)である場合、コポリマーは、ランダムコポリマー、交互共重合体、ブロックコポリマー(例えば、親水性モノマーで構成された親水性ブロックと、疎水性モノマーで構成された疎水性ブロックとで構成されたコポリマー)、星型ポリマー(又は星型ブロックコポリマー)、くし型コポリマー(又はくし型グラフトコポリマー)などであってもよい。前記ブロックコポリマーの構造は、特に限定されず、ジブロック構造、トリブロック構造(ABA型、BAB型)などであってもよい。また、前記くし型コポリマーにおいて、主鎖は、前記親水性ブロックで構成してもよく、前記疎水性ブロックで構成してもよく、親水性ブロックおよび疎水性ブロックで構成してもよい。 When the polymeric dispersant is a copolymer (eg, a copolymer of a hydrophilic monomer and a hydrophobic monomer), the copolymer can be a random copolymer, an alternating copolymer, a block copolymer (eg, a hydrophilic block composed of hydrophilic monomers). And a copolymer composed of a hydrophobic block composed of a hydrophobic monomer), a star polymer (or a star block copolymer), a comb copolymer (or a comb graft copolymer), and the like. The structure of the block copolymer is not particularly limited, and may be a diblock structure, a triblock structure (ABA type, BAB type), or the like. In the comb copolymer, the main chain may be composed of the hydrophilic block, the hydrophobic block, or the hydrophilic block and the hydrophobic block.
なお、前記のように、親水性ユニットは、アルキレンオキシド(エチレンオキシドなど)で構成された親水性ブロック(ポリエチレンオキシド、ポリエチレンオキシド−ポリプロピレンオキシドなどのポリアルキレンオキシド)などの縮合系ブロックで構成することもできる。親水性ブロック(ポリアルキレンオキシドなど)と疎水性ブロック(ポリオレフィンブロックなど)とは、エステル結合、アミド結合、エーテル結合、ウレタン結合などの連結基を介して結合していてもよい。これらの結合は、例えば、疎水性ブロック(ポリオレフィンなど)を変性剤[不飽和カルボン酸又はその無水物((無水)マレイン酸など)、ラクタム又はアミノカルボン酸、ヒドロキシルアミン、ジアミンなど]で変性した後、親水性ブロックを導入することにより形成してもよい。また、ヒドロキシル基やカルボキシル基などの親水性基を有するモノマー(前記ヒドロキシアルキル(メタ)アクリレートなど)から得られるポリマーと、前記縮合系の親水性モノマー(エチレンオキシドなど)とを反応(又は結合)させることにより、くし型コポリマー(主鎖が疎水性ブロックで構成されたくし型コポリマー)を形成してもよい。 As described above, the hydrophilic unit may be composed of a condensation block such as a hydrophilic block (polyalkylene oxide such as polyethylene oxide or polyethylene oxide-polypropylene oxide) composed of alkylene oxide (such as ethylene oxide). it can. The hydrophilic block (such as polyalkylene oxide) and the hydrophobic block (such as polyolefin block) may be bonded via a linking group such as an ester bond, an amide bond, an ether bond, or a urethane bond. For example, the hydrophobic block (polyolefin, etc.) is modified with a modifying agent [unsaturated carboxylic acid or its anhydride ((anhydrous) maleic acid), lactam or aminocarboxylic acid, hydroxylamine, diamine, etc.]. Later, it may be formed by introducing a hydrophilic block. In addition, a polymer obtained from a monomer having a hydrophilic group such as a hydroxyl group or a carboxyl group (such as the hydroxyalkyl (meth) acrylate) is reacted (or bonded) with the condensed hydrophilic monomer (such as ethylene oxide). By doing so, a comb-type copolymer (comb-type copolymer having a main chain composed of a hydrophobic block) may be formed.
さらに、共重合成分として、親水性の非イオン性モノマーを使用することにより、親水性と疎水性とのバランスを調整してもよい。このような成分としては、2−(2−メトキシエトキシ)エチル(メタ)アクリレート、ポリエチレングリコールモノメタクリレート(例えば、数平均分子量200〜1000程度)などのアルキレンオキシ(特にエチレンオキシ)ユニットを有するモノマー又はオリゴマーなどを例示できる。また、親水性基(カルボキシル基など)を変性(例えば、エステル化)することにより親水性と疎水性とのバランスを調整してもよい。 Furthermore, the balance between hydrophilicity and hydrophobicity may be adjusted by using a hydrophilic nonionic monomer as a copolymerization component. Examples of such components include monomers having alkyleneoxy (particularly ethyleneoxy) units such as 2- (2-methoxyethoxy) ethyl (meth) acrylate and polyethylene glycol monomethacrylate (for example, a number average molecular weight of about 200 to 1,000). An oligomer etc. can be illustrated. Further, the balance between hydrophilicity and hydrophobicity may be adjusted by modifying (for example, esterifying) a hydrophilic group (such as a carboxyl group).
高分子分散剤(B2)は、官能基を有していてもよい。このような官能基としては、例えば、酸基(又は酸性基、例えば、カルボキシル基(又は酸無水物基)、スルホ基(スルホン酸基)など)、塩基性基(例えば、アミノ基など)、ヒドロキシル基などが挙げられる。これらの官能基は、単独で又は2種以上組み合わせて高分子分散剤(B2)が有していてもよい。 The polymer dispersant (B2) may have a functional group. Examples of such functional groups include acid groups (or acidic groups such as carboxyl groups (or acid anhydride groups) and sulfo groups (sulfonic acid groups)), basic groups (such as amino groups), A hydroxyl group etc. are mentioned. These functional groups may be contained in the polymer dispersant (B2) alone or in combination of two or more.
これらの官能基のうち、高分子分散剤(B2)は、酸基又は塩基性基、特に、遊離のカルボキシル基を有しているのが好ましい。 Among these functional groups, the polymer dispersant (B2) preferably has an acid group or a basic group, particularly a free carboxyl group.
また、高分子分散剤(B2)が、酸基(カルボキシル基など)を有している場合、少なくとも一部又は全部の酸基(カルボキシル基など)は、塩(アミンとの塩、金属塩など)を形成していてもよいが、特に、本発明では、カルボキシル基(特に、すべてのカルボキシル基)などの酸基が、塩[特に、塩基性化合物との塩(アミンとの塩又はアミン塩など)]を形成していない高分子分散剤[すなわち、遊離の酸基(特にカルボキシル基)を有する高分子分散剤]を好適に使用できる。 Further, when the polymer dispersant (B2) has an acid group (such as a carboxyl group), at least a part or all of the acid group (such as a carboxyl group) is a salt (a salt with an amine, a metal salt, or the like). In particular, in the present invention, an acid group such as a carboxyl group (especially all carboxyl groups) is a salt [especially a salt with a basic compound (a salt with an amine or an amine salt). Etc.]] [that is, a polymer dispersant having a free acid group (particularly a carboxyl group)] can be suitably used.
酸基(特に遊離のカルボキシル基)を有する高分子分散剤(B2)において、酸価は、ナノ粒子を製造する際に生成したナノ粒子表面を保護可能である限り下限はないが、より低い方が好ましい。酸価が高すぎると、高分子由来の官能基がナノ粒子表面に多数吸着又は存在しているため、焼結ポイントが少なくなり、ナノ粒子間の焼結を阻害する虞がある。酸価は、例えば、1mgKOH/g以上(例えば、2〜1500mgKOH/g程度)、特に10mgKOH/g以上(例えば、12〜900mgKOH/g程度)の範囲から選択できる。特に、酸基(特にカルボキシル基)を有する高分子分散剤(B2)が、親水性ユニットおよび疎水性ユニットを有する化合物などである場合、酸価は、1mgKOH/g以上(例えば、2〜100mgKOH/g程度)、好ましくは3mgKOH/g以上(例えば、4〜90mgKOH/g程度)、さらに好ましくは5mgKOH/g以上(例えば、6〜80mgKOH/g程度)、特に7mgKOH/g以上(例えば、8〜70mgKOH/g程度)であってもよく、通常3〜50mgKOH/g(例えば、5〜30mgKOH/g)程度であってもよい。酸基を有する高分子分散剤(B2)において、アミン価は0(又はほぼ0)であってもよい。 In the polymer dispersant (B2) having an acid group (especially a free carboxyl group), the acid value has no lower limit as long as it can protect the surface of the nanoparticle produced when the nanoparticle is produced, but the lower one Is preferred. If the acid value is too high, a large number of functional groups derived from the polymer are adsorbed or present on the surface of the nanoparticle, so that the number of sintering points decreases, and there is a possibility of inhibiting the sintering between the nanoparticles. The acid value can be selected from the range of, for example, 1 mgKOH / g or more (for example, about 2 to 1500 mgKOH / g), particularly 10 mgKOH / g or more (for example, about 12 to 900 mgKOH / g). In particular, when the polymer dispersant (B2) having an acid group (particularly a carboxyl group) is a compound having a hydrophilic unit and a hydrophobic unit, the acid value is 1 mgKOH / g or more (for example, 2 to 100 mgKOH / g), preferably 3 mgKOH / g or more (for example, about 4 to 90 mgKOH / g), more preferably 5 mgKOH / g or more (for example, about 6 to 80 mgKOH / g), particularly 7 mgKOH / g or more (for example, 8 to 70 mgKOH). / G) or about 3 to 50 mg KOH / g (for example, 5 to 30 mg KOH / g). In the polymer dispersant (B2) having an acid group, the amine value may be 0 (or almost 0).
なお、高分子分散剤において、上記のような官能基の位置は、特に限定されず、主鎖であってもよく、側鎖であってもよく、主鎖および側鎖に位置していてもよい。このような官能基は、例えば、親水性モノマー又は親水性ユニット由来の官能基(例えば、ヒドロキシル基など)であってもよく、官能基を有する共重合性モノマー(例えば、無水マレイン酸など)の共重合によりポリマー中に導入することもできる。 In the polymer dispersant, the position of the functional group as described above is not particularly limited, and may be a main chain, a side chain, or a main chain and a side chain. Good. Such a functional group may be, for example, a hydrophilic monomer or a functional group derived from a hydrophilic unit (for example, a hydroxyl group), or a copolymerizable monomer having a functional group (for example, maleic anhydride). It can also be introduced into the polymer by copolymerization.
高分子分散剤(B2)は単独で使用してもよく、2種以上を併用してもよい。 The polymer dispersant (B2) may be used alone or in combination of two or more.
なお、高分子分散剤として、特開平11−80647号公報に記載の高分子分散剤(高分子量顔料分散剤)を使用してもよい。 As the polymer dispersant, a polymer dispersant (high molecular weight pigment dispersant) described in JP-A No. 11-80647 may be used.
また、高分子分散剤は、合成して用いてもよく、市販品を用いてもよい。以下に、市販の高分子分散剤(又は少なくとも両親媒性の分散剤で構成された分散剤)を具体的に例示すると、ソルスパース13240、ソルスパース13940、ソルスパース32550、ソルスパース31845、ソルスパース24000、ソルスパース26000、ソルスパース27000、ソルスパース28000、ソルスパース41090などのソルスパースシリーズ[アビシア(株)製];ディスパービック160、ディスパービック161、ディスパービック162、ディスパービック163、ディスパービック164、ディスパービック166、ディスパービック170、ディスパービック180、ディスパービック182、ディスパービック184、ディスパービック190、ディスパービック191、ディスパービック192、ディスパービック193、ディスパービック194、ディスパービック2001、ディスパービック2010、ディスパービック2050、ディスパービック2090、ディスパービック2091などのディスパービックシリーズ[ビックケミー(株)製];EFKA−46、EFKA−47、EFKA−48、EFKA−49、EFKA−1501、EFKA−1502、EFKA−4540、EFKA−4550、ポリマー100、ポリマー120、ポリマー150、ポリマー400、ポリマー401、ポリマー402、ポリマー403、ポリマー450、ポリマー451、ポリマー452、ポリマー453[EFKAケミカル(株)製];アジスパーPB711、アジスパーPAl11、アジスパーPB811、アジスパーPB821、アジスパーPW911などのアジスパーシリーズ[味の素(株)製];フローレンDOPA−158、フローレンDOPA−22、フローレンDOPA−17、フローレンTG−700、フローレンTG−720W、フローレン−730W、フローレン−740W、フローレン−745Wなどのフローレンシリーズ[共栄社化学(株)製];ジョンクリル678、ジョンクリル679、ジョンクリル62などのジョンクリルシリーズ[ジョンソンポリマー(株)製]などが挙げられる。 The polymer dispersant may be synthesized and used, or a commercially available product may be used. Specific examples of commercially available polymer dispersants (or dispersants composed of at least an amphiphilic dispersant) include Solsperse 13240, Solsperse 13940, Solsperse 32550, Solsperse 31845, Solsperse 24000, Solsperse 26000, Solsperse series such as Solsperse 27000, Solsperse 28000, Solsperse 41090 [manufactured by Avicia Co., Ltd.]; Dispersic 160, Dispersic 161, Dispersic 162, Dispersic 163, Dispersic 164, Dispersic 166, Dispersic 170, Dispers Big 180, Dispersic 182, Dispersic 184, Dispersic 190, Dispersic 191, Dispersic 92, Dispersic 193, Dispersic 194, Dispersic 2001, Dispersic 2010, Dispersic 2050, Dispersic 2090, Dispersic 2091, etc. Dispersic series [manufactured by BYK Chemie Corp.]; EFKA-46, EFKA-47, EFKA-48, EFKA-49, EFKA-1501, EFKA-1502, EFKA-4540, EFKA-4550, polymer 100, polymer 120, polymer 150, polymer 400, polymer 401, polymer 402, polymer 403, polymer 450, polymer 451 , Polymer 452, polymer 453 [manufactured by EFKA Chemical Co., Ltd.]; Ajisper PB711, Azisper PAl11, Azisper PB811, Ajisper P 821, Ajisper series such as Ajisper PW911 [manufactured by Ajinomoto Co., Inc.]; Floren DOPA-158, Floren DOPA-22, Floren DOPA-17, Floren TG-700, Floren TG-720W, Floren-730W, Floren-740W, Florene series such as Floren-745W [manufactured by Kyoeisha Chemical Co., Ltd.]; John Kuryl series such as John Kuril 678, John Kuryl 679, and John Kuryl 62 [Johnson Polymer Co., Ltd.].
これらのうち、代表的な酸基を有する高分子分散剤には、ポリ(メタ)アクリル酸類[又はポリアクリル酸系樹脂、例えば、ポリ(メタ)アクリル酸、(メタ)アクリル酸と共重合性単量体(例えば、(メタ)アクリレート、無水マレイン酸など)との共重合体などの(メタ)アクリル酸を主成分とするポリマー、これらの塩(例えば、ポリアクリル酸ナトリウムなどのアルカリ金属塩など)など]、ディスパービック190、ディスパービック194などが挙げられる。また、代表的な塩基性基(アミノ基)を有する高分子分散剤には、ポリアルキレンイミン(ポリエチレンイミンなど)、ポリビニルピロリドン、ポリアリルアミン、ポリエーテルポリアミン(ポリオキシエチレンポリアミンなど)などが挙げられる。 Among these, polymer dispersants having typical acid groups include poly (meth) acrylic acids [or polyacrylic resins such as poly (meth) acrylic acid and (meth) acrylic acid. Polymers mainly composed of (meth) acrylic acid, such as copolymers with monomers (for example, (meth) acrylate, maleic anhydride, etc.), and salts thereof (for example, alkali metal salts such as sodium polyacrylate) Etc.), Dispersic 190, Dispersic 194 and the like. Examples of the polymer dispersant having a typical basic group (amino group) include polyalkyleneimine (polyethyleneimine etc.), polyvinylpyrrolidone, polyallylamine, polyether polyamine (polyoxyethylene polyamine etc.) and the like. .
高分子分散剤(B2)の数平均分子量は、1000〜1000000(例えば、1200〜800000)の範囲から選択でき、例えば、1500〜500000(例えば、1500〜100000)、好ましくは2000〜80000(例えば、2000〜60000)、さらに好ましくは3000〜50000(例えば、5000〜30000)、特に7000〜20000程度であってもよい。 The number average molecular weight of the polymer dispersant (B2) can be selected from the range of 1000 to 1000000 (for example, 1200 to 800000), for example, 1500 to 500000 (for example, 1500 to 100000), preferably 2000 to 80000 (for example, 2000 to 60000), more preferably 3000 to 50000 (for example, 5000 to 30000), particularly about 7000 to 20000.
金属コロイド粒子において、保護コロイド(B)(有機化合物(B1)および高分子分散剤(B2)の総量)の割合は、固形分換算で、金属ナノ粒子(A)100質量部に対して、例えば、0.1〜100質量部(例えば、0.5〜80質量部)、好ましくは1.0〜60質量部(例えば、1.5〜50質量部)、さらに好ましくは2〜40質量部(例えば、3〜30質量部)、特に4〜25質量部(例えば、5〜20質量部)程度であってもよく、通常10〜50質量部程度であってもよい。特に、本発明の金属コロイド粒子において、保護コロイド(B)の割合は、金属ナノ粒子(A)100質量部に対して、0.5〜20質量部(例えば、0.8〜18質量部)、好ましくは1〜15質量部、さらに好ましくは1.2〜12質量部(例えば、1.5〜10質量部)程度であってもよい。本発明では、前記特定の組み合わせにより保護コロイドを構成するので、上記のような比較的少ない量の保護コロイドであっても、粗大粒子の少ない金属ナノ粒子とすることができる。 In the metal colloid particles, the ratio of the protective colloid (B) (total amount of the organic compound (B1) and the polymer dispersant (B2)) is, for example, in terms of solid content, with respect to 100 parts by mass of the metal nanoparticles (A). 0.1-100 parts by mass (for example, 0.5-80 parts by mass), preferably 1.0-60 parts by mass (for example, 1.5-50 parts by mass), more preferably 2-40 parts by mass ( For example, it may be about 3 to 30 parts by mass), particularly about 4 to 25 parts by mass (for example, 5 to 20 parts by mass), and usually about 10 to 50 parts by mass. In particular, in the metal colloid particles of the present invention, the proportion of the protective colloid (B) is 0.5 to 20 parts by mass (for example, 0.8 to 18 parts by mass) with respect to 100 parts by mass of the metal nanoparticles (A). 1 to 15 parts by mass, preferably 1.2 to 12 parts by mass (for example, 1.5 to 10 parts by mass). In the present invention, since the protective colloid is constituted by the specific combination, even a relatively small amount of the protective colloid as described above can be formed into metal nanoparticles with few coarse particles.
なお、金属コロイド粒子において、有機化合物(B1)の割合は、固形分換算で、例えば、金属ナノ粒子(A)100質量部に対して、例えば、0.05〜70質量部(例えば、0.1〜50質量部)、好ましくは0.5〜40質量部(例えば、1〜30質量部)、さらに好ましくは2〜20質量部(例えば、3〜15質量部)程度であってもよい。特に、本発明の金属コロイド粒子において、有機化合物(B1)の割合は、金属ナノ粒子(A)100質量部に対して、0.05〜10質量部(例えば、0.1〜8質量部)、好ましくは0.12〜7質量部(例えば、0.15〜5質量部)、さらに好ましくは0.18〜4質量部(例えば、0.2〜3質量部)程度であってもよい。 In the metal colloidal particles, the ratio of the organic compound (B1) is, for example, 0.05 to 70 parts by mass (for example, 0.8%) with respect to 100 parts by mass of the metal nanoparticles (A) in terms of solid content. 1 to 50 parts by mass), preferably 0.5 to 40 parts by mass (for example, 1 to 30 parts by mass), and more preferably about 2 to 20 parts by mass (for example, 3 to 15 parts by mass). In particular, in the metal colloid particles of the present invention, the proportion of the organic compound (B1) is 0.05 to 10 parts by mass (for example, 0.1 to 8 parts by mass) with respect to 100 parts by mass of the metal nanoparticles (A). The amount may be preferably about 0.12 to 7 parts by mass (for example, 0.15 to 5 parts by mass), more preferably about 0.18 to 4 parts by mass (for example, 0.2 to 3 parts by mass).
また、金属コロイド粒子において、高分子分散剤(B2)の割合は、固形分換算で、例えば、金属ナノ粒子(A)100質量部に対して、例えば、0.01〜50質量部(例えば、0.05〜30質量部)、好ましくは0.1〜30質量部(例えば、0.5〜20質量部)、さらに好ましくは1〜15質量部(例えば、2〜10質量部)程度であってもよい。特に、本発明の金属コロイド粒子において、高分子分散剤(B2)の割合は、金属ナノ粒子(A)100質量部に対して、0.05〜15質量部(例えば、0.1〜12質量部)、好ましくは0.12〜10質量部(例えば、0.15〜8質量部)、さらに好ましくは0.18〜7質量部(例えば、0.2〜6質量部)程度であってもよい。 In the metal colloid particles, the ratio of the polymer dispersant (B2) is, for example, 0.01 to 50 parts by mass (for example, with respect to 100 parts by mass of the metal nanoparticles (A) in terms of solid content). 0.05 to 30 parts by mass), preferably 0.1 to 30 parts by mass (for example, 0.5 to 20 parts by mass), more preferably about 1 to 15 parts by mass (for example, 2 to 10 parts by mass). May be. In particular, in the metal colloid particles of the present invention, the ratio of the polymer dispersant (B2) is 0.05 to 15 parts by mass (for example, 0.1 to 12 parts by mass with respect to 100 parts by mass of the metal nanoparticles (A)). Part), preferably 0.12 to 10 parts by mass (for example, 0.15 to 8 parts by mass), more preferably about 0.18 to 7 parts by mass (for example, 0.2 to 6 parts by mass). Good.
さらに、金属コロイド粒子において、有機化合物(B1)と高分子分散剤(B2)との割合(溶媒などを含む場合は固形分の割合)は、前者/後者(質量比)=99/1〜1/99(例えば、95/5〜5/95)、好ましくは85/15〜10/90(例えば、75/25〜15/85)、さらに好ましくは70/30〜20/80(例えば、60/40〜25/75)、特に55/45〜30/70(例えば、50/50〜35/65)程度であってもよい。特に、金属コロイド粒子において、有機化合物(B1)と高分子分散剤(B2)との割合は、前者/後者(質量比)=97/3〜1/99(例えば、96/4〜1/99)、好ましくは95/5〜2/98(例えば、93/7〜2/98)、さらに好ましくは92/8〜3/97(例えば、90/10〜3/97)、通常87/13〜3/97(例えば、86/14〜4/96)程度であってもよい。 Furthermore, in the metal colloidal particles, the ratio of the organic compound (B1) to the polymer dispersant (B2) (the ratio of the solid content when a solvent is included) is the former / the latter (mass ratio) = 99/1 to 1. / 99 (for example, 95/5 to 5/95), preferably 85/15 to 10/90 (for example, 75/25 to 15/85), more preferably 70/30 to 20/80 (for example, 60 / 40-25 / 75), especially 55 / 45-30 / 70 (for example, 50 / 50-35 / 65). In particular, in the metal colloid particles, the ratio of the organic compound (B1) and the polymer dispersant (B2) is the former / the latter (mass ratio) = 97/3 to 1/99 (for example, 96/4 to 1/99). ), Preferably 95/5 to 2/98 (e.g. 93/7 to 2/98), more preferably 92/8 to 3/97 (e.g. 90/10 to 3/97), usually 87/13 to It may be about 3/97 (for example, 86/14 to 4/96).
なお、本発明の金属コロイド粒子は、保護コロイドとして少なくとも前記保護コロイド(B)を含んでいればよく、他の保護コロイド成分を含んでいてもよい。他の保護コロイド成分は、無機化合物であってもよいが、通常、有機化合物である。 In addition, the metal colloid particle of this invention should just contain the said protective colloid (B) at least as a protective colloid, and may contain the other protective colloid component. The other protective colloid component may be an inorganic compound, but is usually an organic compound.
他の保護コロイド成分としては、例えば、酸素原子含有有機化合物{例えば、アルコール類[例えば、アルカノール類(ヘキサノール、オクタノール、デカノール、ドデカノール、オクタデカノールなどのC6−20アルカンモノオール)、シクロアルカノール類(シクロヘキサノールなど)、アラルキルアルコール類、多価アルコール類など]、ケトン類[例えば、アルカノン類、シクロアルカノン類、ジケトン類(アセチルアセトンなどのβ−ジケトン類)など]、エステル類(例えば、脂肪酸エステル類、グリコールエーテルエステル類など)、アルデヒド類(カプリルアルデヒド、ラウリルアルデヒド、パルミトアルデヒド、ステアリルアルデヒドなどのC6−20脂肪族アルデヒド)など}、硫黄原子含有有機化合物[例えば、スルホキシド類、スルホン酸類(例えば、アルカンスルホン酸、ベンゼンスルホン酸、トルエンスルホン酸などのアレーンスルホン酸など)など]などが挙げられる。これらの他の保護コロイドは、単独で又は2種以上組み合わせてもよい。 Other protective colloid components include, for example, oxygen atom-containing organic compounds {eg, alcohols [eg, alkanols (C 6-20 alkane monools such as hexanol, octanol, decanol, dodecanol, octadecanol, etc.), cycloalkanol] (Such as cyclohexanol), aralkyl alcohols, polyhydric alcohols, etc.], ketones [eg alkanones, cycloalkanones, diketones (β-diketones such as acetylacetone)], esters (eg, Fatty acid esters, glycol ether esters, etc.), aldehydes (C 6-20 aliphatic aldehydes such as caprylaldehyde, lauryl aldehyde, palmitoaldehyde, stearyl aldehyde, etc.)}, organic compounds containing sulfur atoms [for example, Sulfoxides, sulfonic acids (eg, arene sulfonic acids such as alkane sulfonic acid, benzene sulfonic acid, toluene sulfonic acid, etc.)] and the like. These other protective colloids may be used alone or in combination of two or more.
他の保護コロイドの割合は、前記保護コロイド(B)100質量部に対して、例えば、0.1〜100質量部、好ましくは0.5〜50質量部、さらに好ましくは1〜30質量部程度であってもよい。 The ratio of the other protective colloid is, for example, 0.1 to 100 parts by mass, preferably 0.5 to 50 parts by mass, and more preferably about 1 to 30 parts by mass with respect to 100 parts by mass of the protective colloid (B). It may be.
なお、金属コロイド粒子中の有機化合物(B1)、高分子分散剤(B2)などの割合は、慣用の方法、例えば、熱分析(例えば、熱質量/示差熱同時分析など)により、測定することができる。 The ratio of the organic compound (B1), the polymer dispersant (B2), etc. in the metal colloidal particles should be measured by a conventional method, for example, thermal analysis (for example, thermal mass / differential thermal simultaneous analysis, etc.). Can do.
(分散媒)
分散媒としては、前記金属コロイド粒子(又は金属ナノ粒子)との組み合わせにより、ペースト(ペースト状分散液)において十分な粘度を生じさせる溶媒であれば特に限定されず、汎用の溶媒が使用できる。なお、溶媒は、新たに混合してもよく、少なくとも後述の金属コロイド粒子の製造において使用する溶媒で構成してもよく、これらを組み合わせてもよい。
(Dispersion medium)
The dispersion medium is not particularly limited as long as it is a solvent that generates sufficient viscosity in the paste (paste-like dispersion) by combining with the metal colloid particles (or metal nanoparticles), and a general-purpose solvent can be used. In addition, a solvent may be newly mixed, may be comprised with the solvent used in manufacture of the below-mentioned metal colloid particle, and may combine these.
溶媒としては、前記金属コロイド粒子を分散可能な限り特に限定されず、保護コロイドの種類に応じて、極性溶媒(水溶性溶媒)であっても、疎水性溶媒(非水溶性溶媒)であってもよい。 The solvent is not particularly limited as long as the metal colloid particles can be dispersed. Depending on the type of protective colloid, the solvent may be a polar solvent (water-soluble solvent) or a hydrophobic solvent (water-insoluble solvent). Also good.
極性溶媒には、例えば、水、アルコール類(メタノール、エタノール、プロパノール、イソプロパノール、ブタノールなどのC1−4アルカノールなど)、脂肪族多価アルコール類(エチレングリコール、プロピレングリコール、ジエチレングリコール、トリエチレングリコール、ポリエチレングリコール、グリセリンなど)、アミド類(ホルムアミド、アセトアミドなどのアシルアミド類、N−メチルホルムアミド、N−メチルアセトアミド,N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミドなどのN−モノ又はN,N−ジC1−4アシルアミド類など)、ケトン類(アセトンなど)、エーテル類(ジオキサン、テトラヒドロフランなど)、有機カルボン酸類(酢酸など)、セロソルブ類(メチルセロソルブ、エチルセロソルブなどのC1−4アルキルセロソルブ類など)、セロソルブアセテート類(エチルセロソルブアセテートなどのC1−4アルキルセロソルブアセテート類など)、カルビトール類(メチルカルビトール、エチルカルビトール、プロピルカルビトール、ブチルカルビトールなどのC1−4アルキルカルビトール類など)、ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、ジクロロエタンなどのハロゲン化炭化水素類など)などが例示できる。これらの極性溶媒は、単独で又は二種以上組み合わせて使用できる。なお、これらの極性溶媒の極性パラメータは、通常、後述の極性パラメータの範囲内にある場合が多い。 Examples of the polar solvent include water, alcohols (C 1-4 alkanols such as methanol, ethanol, propanol, isopropanol, and butanol), aliphatic polyhydric alcohols (ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, Polyethylene glycol, glycerol, etc.), amides (formamide, acylamides such as acetamide, N-methylformamide, N-methylacetamide, N, N-dimethylformamide, N-mono or N, N, such as N, N-dimethylacetamide - di C 1-4 acyl amides, etc.), ketones (such as acetone), ethers (dioxane, tetrahydrofuran, etc.), organic carboxylic acids (such as acetic acid), cellosolves (methyl cellosolve, Echirusero Such as C 1-4 alkyl cellosolve such as lube), such as C 1-4 alkyl cellosolve acetates such as cellosolve acetates (ethyl cellosolve acetate), carbitol (methyl carbitol, ethyl carbitol, propyl carbitol, butyl C 1-4 alkyl carbitols such as carbitol), halogenated hydrocarbon solvents (halogenated hydrocarbons such as methylene chloride, chloroform, dichloroethane, etc.) and the like. These polar solvents can be used alone or in combination of two or more. The polar parameters of these polar solvents are usually in the range of the polar parameters described later in many cases.
疎水性溶媒としては、例えば、炭化水素類(ヘキサン、トリメチルペンタン、オクタン、デカン、ドデカン、テトラデカンなどの脂肪族炭化水素類;シクロヘキサンなどの脂環式炭化水素類;トルエン、キシレンなどの芳香族炭化水素類;ジクロロメタン、トリクロロエタンなどのハロゲン化炭化水素類など)、エステル類(酢酸メチル、酢酸エチルなど)、ケトン類(メチルエチルケトン、メチルイソブチルケトンなど)、エーテル類(ジエチルエーテル、ジプロピルエーテルなど)などが例示できる。これらの疎水性溶媒は、単独で又は二種以上組み合わせて使用できる。 Examples of the hydrophobic solvent include hydrocarbons (aliphatic hydrocarbons such as hexane, trimethylpentane, octane, decane, dodecane, and tetradecane; alicyclic hydrocarbons such as cyclohexane; aromatic carbonization such as toluene and xylene. Hydrogens: halogenated hydrocarbons such as dichloromethane and trichloroethane), esters (such as methyl acetate and ethyl acetate), ketones (such as methyl ethyl ketone and methyl isobutyl ketone), ethers (such as diethyl ether and dipropyl ether) Can be illustrated. These hydrophobic solvents can be used alone or in combination of two or more.
分散媒は、少なくとも極性溶媒(特に非芳香族系極性溶媒又は脂肪族系極性溶媒)で構成するのが好ましい。このような溶媒の極性パラメータ(Snyderによる極性パラメータ)は、例えば、2.8〜11、好ましくは3〜10.5、さらに好ましくは3.1〜10.2程度であってもよい。 The dispersion medium is preferably composed of at least a polar solvent (particularly a non-aromatic polar solvent or an aliphatic polar solvent). The polarity parameter (polarity parameter by Snyder) of such a solvent may be, for example, 2.8 to 11, preferably 3 to 10.5, and more preferably about 3.1 to 10.2.
また、本発明では、溶媒としては、環境の負荷が少なく、取り扱いが簡便である点から、水及び/又はアルコール類などの水溶性溶媒が好ましく、ペーストに対して粘性を付与し、接合剤としての作業性を向上できる点から、エチレングリコールやグリセリンなどの脂肪族多価アルコールが特に好ましい。 In the present invention, the solvent is preferably a water-soluble solvent such as water and / or alcohols because it has a low environmental burden and is easy to handle, and imparts viscosity to the paste as a bonding agent. In particular, aliphatic polyhydric alcohols such as ethylene glycol and glycerin are preferable.
このような分散媒及び金属コロイド粒子を含むペースト中において、金属コロイド粒子(又は金属ナノ粒子(A))は、分散媒に対して高い分散性を有し、長期間に亘り高い分散安定性を示す。ぺースト中の金属ナノ粒子(A)の濃度は、例えば、30〜95質量%、好ましくは50〜93質量%、さらに好ましくは70〜90質量%(特に80〜90質量%)程度であってもよい。 In the paste containing such a dispersion medium and metal colloid particles, the metal colloid particles (or metal nanoparticles (A)) have a high dispersibility with respect to the dispersion medium and have a high dispersion stability over a long period of time. Show. The concentration of the metal nanoparticles (A) in the paste is, for example, about 30 to 95% by mass, preferably 50 to 93% by mass, more preferably 70 to 90% by mass (particularly 80 to 90% by mass). Also good.
このようなペーストで構成された接合剤は、高濃度で金属ナノ粒子(A)を含んでいても、沈降などを生じることなく長期安定性(保存安定性)に優れている。そのため、例えば、ペーストを長期間保存後、無機素材の層間で均一な焼結膜を形成でき、無機素材の接合力を向上できる。 The bonding agent composed of such a paste is excellent in long-term stability (storage stability) without causing sedimentation or the like even if it contains the metal nanoparticles (A) at a high concentration. Therefore, for example, after the paste is stored for a long period of time, a uniform sintered film can be formed between the layers of the inorganic material, and the bonding strength of the inorganic material can be improved.
なお、ペースト中において、保護コロイドで被覆された金属ナノ粒子(A)もナノメーターサイズであり、その平均粒子径(平均一次粒子径)などは、前記と同様の範囲から選択できる。 In the paste, the metal nanoparticles (A) coated with the protective colloid are also nanometer-sized, and the average particle size (average primary particle size) can be selected from the same range as described above.
本発明の無機素材用接合剤には、用途に応じて、慣用の添加剤、例えば、バインダー樹脂(ポリビニルアルコール、ポリエチレングリコールなどの親水性高分子など)、着色剤(染顔料など)、色相改良剤、染料定着剤、光沢付与剤、金属腐食防止剤、安定剤(酸化防止剤、紫外線吸収剤など)、界面活性剤又は分散剤(アニオン性界面活性剤、カチオン性界面活性剤、ノニオン性界面活性剤、両性界面活性剤など)、分散安定化剤、増粘剤又は粘度調整剤、保湿剤、チクソトロピー性賦与剤、レベリング剤、消泡剤、殺菌剤、充填剤などが含まれていてもよい。これらの添加剤は、単独で又は二種以上組み合わせて使用できる。 In the bonding agent for inorganic materials according to the present invention, conventional additives such as binder resins (such as hydrophilic polymers such as polyvinyl alcohol and polyethylene glycol), colorants (such as dyes and pigments), and hue improvements are used depending on the application. Agent, dye fixing agent, gloss imparting agent, metal corrosion inhibitor, stabilizer (antioxidant, UV absorber, etc.), surfactant or dispersant (anionic surfactant, cationic surfactant, nonionic interface) Active agents, amphoteric surfactants, etc.), dispersion stabilizers, thickeners or viscosity modifiers, moisturizers, thixotropic agents, leveling agents, antifoaming agents, bactericides, fillers, etc. Good. These additives can be used alone or in combination of two or more.
なお、ペーストの(ペーストを構成する)固形分全体に対する金属ナノ粒子(A)の固形分濃度(又は金属コロイド粒子における金属ナノ粒子(A)の濃度)は、例えば、50質量%以上(例えば、55〜99.5質量%)、好ましくは60質量%以上(例えば、70〜99質量%)、さらに好ましくは80質量%以上(例えば、85〜98.5質量%)、通常90〜99質量%程度であってもよい。 In addition, the solid content concentration of metal nanoparticles (A) (or the concentration of metal nanoparticles (A) in metal colloid particles) with respect to the entire solid content of the paste (which constitutes the paste) is, for example, 50% by mass or more (for example, 55-99.5% by mass), preferably 60% by mass or more (eg, 70-99% by mass), more preferably 80% by mass or more (eg, 85-98.5% by mass), usually 90-99% by mass. It may be a degree.
[無機素材用接合剤の製造方法]
本発明の無機素材用接合剤において、金属コロイド粒子は、慣用の方法、例えば、前記金属ナノ粒子(A)に対応する金属化合物を、保護コロイド(B)(および必要に応じて前記他の保護コロイド)および還元剤の存在下、溶媒中で還元することにより調製できる。
[Method for producing bonding agent for inorganic material]
In the bonding agent for inorganic materials according to the present invention, the metal colloid particles are obtained by a conventional method, for example, by applying a metal compound corresponding to the metal nanoparticles (A) to the protective colloid (B) (and the other protection if necessary). Colloid) and a reducing agent in the presence of a reducing agent.
前記金属ナノ粒子(A)に対応する金属化合物は、例えば、金属酸化物、金属水酸化物、金属硫化物、金属ハロゲン化物、金属酸塩[金属無機酸塩(硫酸塩、硝酸塩、過塩素酸塩などのオキソ酸塩など)、金属有機酸塩(酢酸塩など)など]などであってもよい。なお、金属塩の形態は、単塩、複塩又は錯塩のいずれであってもよく、多量体(例えば、2量体)などであってもよい。これらの金属化合物は単独で又は二種以上組み合わせて使用できる。これらの金属化合物のうち、金属ハロゲン化物、金属酸塩[金属無機酸塩(硫酸塩、硝酸塩、過塩素酸塩などのオキソ酸塩など)、金属有機酸塩(酢酸塩など)など]などを使用する場合が多い。なお、これらの金属化合物は、溶媒に溶解又は分散させて(例えば、水溶液などの水系溶媒の溶液の形態で)用いてもよい。 The metal compound corresponding to the metal nanoparticles (A) includes, for example, metal oxide, metal hydroxide, metal sulfide, metal halide, metal acid salt [metal inorganic acid salt (sulfate, nitrate, perchloric acid). Oxo acid salts such as salts), metal organic acid salts (such as acetates), and the like]. In addition, the form of the metal salt may be any of a single salt, a double salt, or a complex salt, and may be a multimer (for example, a dimer). These metal compounds can be used alone or in combination of two or more. Among these metal compounds, metal halides, metal acid salts [metal inorganic acid salts (such as sulfates, nitrates, perchlorates, etc.), metal organic acid salts (such as acetates), etc.] Often used. These metal compounds may be used by dissolving or dispersing in a solvent (for example, in the form of a solution of an aqueous solvent such as an aqueous solution).
還元剤としては、慣用の成分、例えば、水素化ホウ素ナトリウム類(水素化ホウ素ナトリウム、シアノ水素化ホウ素ナトリウム、水素化トリエチルホウ素ナトリウムなど)、水素化アルミニウムリチウム、次亜リン酸又はその塩(ナトリウム塩など)、ボラン類(ジボラン、ジメチルアミンボランなど)、ヒドラジン、ホルマリン、アミン類、アルコール類(前記例示のアルコール類、例えば、エチレングリコールなど)、フェノール性水酸基を有するカルボン酸(例えば、タンニン酸)などが例示できる。 Examples of the reducing agent include conventional components such as sodium borohydride (sodium borohydride, sodium cyanoborohydride, sodium triethylborohydride, etc.), lithium aluminum hydride, hypophosphorous acid or a salt thereof (sodium). Salts), boranes (diborane, dimethylamine borane, etc.), hydrazine, formalin, amines, alcohols (the alcohols exemplified above, such as ethylene glycol), carboxylic acids having a phenolic hydroxyl group (eg, tannic acid) And the like.
アミン類としては、脂肪族アミン類(例えば、プロピルアミン、ブチルアミン、ヘキシルアミン、ジエチルアミン、ジプロピルアミン、ジメチルエチルアミン、ジエチルメチルアミン、トリエチルアミン、エチレンジアミン、N,N,N′,N′−テトラメチルエチレンジアミン、1,3−ジアミノプロパン、N,N,N′,N′−テトラメチル−1,3−ジアミノプロパンなどのアルカンアミン;トリエチレンテトラミン、テトラエチレンペンタミンなどのポリアルキレンポリアミンなど)、脂環式アミン類(例えば、ピペリジン、N−メチルピペリジン、ピペラジン、N,N′−ジメチルピペラジン、ピロリジン、N−メチルピロリジン、モルホリンなど)、芳香族アミン類(例えば、アニリン、N−メチルアニリン、N,N−ジメチルアニリン、トルイジン、アニシジン、フェネチジンなど)、芳香脂肪族アミン類(例えば、ベンジルアミン、N−メチルベンジルアミン、N,N−ジメチルベンジルアミン、フェネチルアミン、キシリレンジアミン、N,N,N′,N′−テトラメチルキシリレンジアミンなどのアラルキルアミン)、アルコールアミン類[特にアルカノールアミン類、例えば、メチルアミノエタノール、ジメチルアミノエタノール(2−(ジメチルアミノ)エタノール)、エタノールアミン、ジエタノールアミン、トリエタノールアミン、メチルジエタノールアミン、プロパノールアミン、2−(3−アミノプロピルアミノ)エタノール、ブタノールアミン、ヘキサノールアミン、ジメチルアミノプロパノールなどのC2−10アルカノールアミン、好ましくはC2−6アルカノールアミン]が挙げることができる。 Examples of amines include aliphatic amines (for example, propylamine, butylamine, hexylamine, diethylamine, dipropylamine, dimethylethylamine, diethylmethylamine, triethylamine, ethylenediamine, N, N, N ′, N′-tetramethylethylenediamine). 1,3-diaminopropane, alkaneamines such as N, N, N ′, N′-tetramethyl-1,3-diaminopropane; polyalkylene polyamines such as triethylenetetramine and tetraethylenepentamine), and alicyclic rings Formula amines (eg piperidine, N-methylpiperidine, piperazine, N, N′-dimethylpiperazine, pyrrolidine, N-methylpyrrolidine, morpholine, etc.), aromatic amines (eg aniline, N-methylaniline, N, N-dimethyl Nilin, toluidine, anisidine, phenetidine, etc.), araliphatic amines (for example, benzylamine, N-methylbenzylamine, N, N-dimethylbenzylamine, phenethylamine, xylylenediamine, N, N, N ′, N ′ Aralkylamines such as tetramethylxylylenediamine), alcohol amines [especially alkanolamines such as methylaminoethanol, dimethylaminoethanol (2- (dimethylamino) ethanol), ethanolamine, diethanolamine, triethanolamine, methyl diethanolamine, propanolamine, 2- (3-aminopropyl amino) ethanol, butanol amine, hexanol amine, C 2-10 alkanol amines such as dimethylamino propanol, preferably May be mentioned is C 2-6 alkanolamine.
これらのうち、水素化ホウ素ナトリウム、第3級アミン(例えば、2−(ジメチルアミノ)エタノール、N−メチルジエタノールアミンなどの第3級アルカノールアミン)、エチレングリコール、タンニン酸などを好適に使用できる。また、安全性などの点で、アミン類、特に、アルカノールアミン類などのアルコールアミン類が好ましい。アルカノールアミン類は、通常、水溶性である場合が多く、水又は水系溶媒を溶媒とする場合には、好適である。 Among these, sodium borohydride, tertiary amine (for example, tertiary alkanolamine such as 2- (dimethylamino) ethanol and N-methyldiethanolamine), ethylene glycol, tannic acid and the like can be preferably used. In view of safety, amines, particularly alcohol amines such as alkanolamines are preferred. Alkanolamines are usually water-soluble in many cases, and are suitable when water or an aqueous solvent is used as a solvent.
これらの還元剤は単独で又は二種以上組み合わせて使用できる。 These reducing agents can be used alone or in combination of two or more.
還元剤の使用量は、金属原子換算で前記金属化合物1当量(又は1モル)に対して、1〜30モル(例えば、1.2〜20モル)、好ましくは1.5〜15モル、さらに好ましくは2〜10モル程度であってもよく、通常1〜5モル程度であってもよい。 The amount of the reducing agent used is 1 to 30 mol (for example, 1.2 to 20 mol), preferably 1.5 to 15 mol, based on 1 equivalent (or 1 mol) of the metal compound in terms of metal atom. Preferably, it may be about 2 to 10 mol, and usually about 1 to 5 mol.
還元反応は、慣用の方法、例えば、温度10〜75℃(例えば、15〜50℃、好ましくは20〜35℃)程度で行うことができる。反応系の雰囲気は、空気、不活性ガス(窒素ガスなど)であってもよく、還元性ガス(水素ガスなど)を含む雰囲気であってもよい。また、反応は、通常、攪拌下(又は攪拌しながら)で行ってもよい。 The reduction reaction can be performed by a conventional method, for example, at a temperature of about 10 to 75 ° C. (for example, about 15 to 50 ° C., preferably about 20 to 35 ° C.). The atmosphere of the reaction system may be air, an inert gas (such as nitrogen gas), or an atmosphere containing a reducing gas (such as hydrogen gas). Moreover, you may perform reaction under stirring (or stirring) normally.
なお、反応溶媒は、前記と同様の溶媒(例えば、水など)を使用できる。反応溶媒は、前記ペーストを構成する前記溶媒を用いてもよく、前記ペーストを構成する溶媒とは異なる溶媒を用いてもよい。具体的には、反応溶媒は、保護コロイドの種類に応じて、前記極性溶媒及び疎水性溶媒の中から選択でき、通常、保護コロイドが水溶性化合物である場合には、水などの極性溶媒を用いることが多い。極性溶媒は反応系に添加される成分、例えば、還元剤などの溶媒に由来してもよい。一方、保護コロイドが非水溶性化合物である場合には、脂肪族炭化水素類(トリメチルペンタンなど)などの疎水性溶媒を用いることが多く、必要により、疎水性溶媒と極性溶媒(例えば、エタノール、イソプロパノールなどのアルコール類、アセトンなどのケトン類、ジオキサン、テトラヒドロフランなどの環状エーテル類、ジメチルアセトアミドなどのアミド類など)との混合溶媒を用いてもよい。 In addition, the solvent (for example, water etc.) similar to the above can be used for the reaction solvent. As the reaction solvent, the solvent constituting the paste may be used, or a solvent different from the solvent constituting the paste may be used. Specifically, the reaction solvent can be selected from the polar solvent and the hydrophobic solvent according to the type of the protective colloid. Usually, when the protective colloid is a water-soluble compound, a polar solvent such as water is used. Often used. The polar solvent may be derived from a component added to the reaction system, for example, a solvent such as a reducing agent. On the other hand, when the protective colloid is a water-insoluble compound, a hydrophobic solvent such as aliphatic hydrocarbons (such as trimethylpentane) is often used, and if necessary, a hydrophobic solvent and a polar solvent (for example, ethanol, Alcohols such as isopropanol, ketones such as acetone, cyclic ethers such as dioxane and tetrahydrofuran, and amides such as dimethylacetamide) may be used.
また、これらの反応溶媒のうち、環境保全性及び簡便性などの観点から、少なくとも水を含む極性溶媒であってもよい。さらに、用途に応じて、溶媒の蒸発を抑制するなどの点から、水にアルコール類(特に、エチレングリコールやグリセリンなどの脂肪族多価アルコール)を組み合わせてもよい。アルコール類の割合は、水100質量部に対して、例えば、0.1〜50質量部、好ましくは1〜30質量部、さらに好ましくは3〜20質量部(特に5〜15質量部)程度であってもよい。 Of these reaction solvents, a polar solvent containing at least water may be used from the viewpoints of environmental conservation and simplicity. Furthermore, alcohols (particularly, aliphatic polyhydric alcohols such as ethylene glycol and glycerin) may be combined with water from the viewpoint of suppressing evaporation of the solvent, depending on the application. The proportion of alcohol is, for example, about 0.1 to 50 parts by mass, preferably 1 to 30 parts by mass, and more preferably about 3 to 20 parts by mass (particularly 5 to 15 parts by mass) with respect to 100 parts by mass of water. There may be.
反応溶媒中の前記金属化合物の濃度は、金属の質量換算で、例えば、5質量%以上(例えば、6〜50質量%)、好ましくは8質量%以上(例えば、9〜40質量%)、さらに好ましくは10質量%以上(例えば、12〜30質量%)、通常5〜30質量%程度の高濃度であってもよい。本発明では、このような高濃度で反応させても、粗大粒子の生成をおさえつつ効率よく金属ナノ粒子を得ることができる。 The concentration of the metal compound in the reaction solvent is, for example, 5% by mass or more (for example, 6 to 50% by mass), preferably 8% by mass or more (for example, 9 to 40% by mass), in terms of metal mass. Preferably, the concentration may be as high as 10% by mass or more (for example, 12 to 30% by mass), usually about 5 to 30% by mass. In the present invention, even when the reaction is performed at such a high concentration, metal nanoparticles can be obtained efficiently while suppressing the generation of coarse particles.
なお、反応溶媒の種類などに応じて反応系のpHを調製してもよい。 The pH of the reaction system may be adjusted according to the type of reaction solvent.
pH調整は、慣用の方法、例えば、酸(塩酸、硫酸、硝酸、リン酸などの無機酸、酢酸などの有機酸)、アルカリ[水酸化ナトリウム、アンモニアなどの無機塩基、アミン類(例えば、アルキルアミン、アルカノールアミンなどの第三級アミン類などの有機塩基)などの塩基類]を用いて行うことができる。 The pH is adjusted by a conventional method, for example, an acid (an inorganic acid such as hydrochloric acid, sulfuric acid, nitric acid or phosphoric acid, an organic acid such as acetic acid), an alkali [an inorganic base such as sodium hydroxide or ammonia, or an amine (for example, an alkyl). Bases such as organic bases such as tertiary amines such as amines and alkanolamines].
還元反応の終了後、反応混合液を濃縮し、慣用の方法(例えば、遠心分離、メンブレンフィルタ、限外ろ過などのろ過処理など)で精製することにより、溶媒に対して分散性を有する金属コロイド粒子を調製することができる。なお、本発明では、前記特定の組み合わせにより保護コロイドを構成するので、前記のように、比較的少ない量の保護コロイドであっても、粗大粒子の少ない金属ナノ粒子とすることができ、精製しなくても金属コロイド粒子を調製できる。また、得られた金属コロイド粒子及び溶媒を含む分散液をそのまま又は濃縮して前記ペーストとしてもよく、得られた金属コロイド粒子及び溶媒を含む分散液から反応に使用した溶媒を除去し、新たな異種の溶媒(必要により他の添加剤)を加えて新たにペーストを調製してもよい。また、ペーストに、さらに新たな同種又は異種の溶媒や添加剤を加えてもよい。 After completion of the reduction reaction, the reaction mixture is concentrated and purified by conventional methods (for example, centrifugation, membrane filter, ultrafiltration, etc.), so that the metal colloid has dispersibility in the solvent. Particles can be prepared. In the present invention, since the protective colloid is constituted by the specific combination, as described above, even with a relatively small amount of protective colloid, it is possible to obtain a metal nanoparticle with few coarse particles. Without it, metal colloidal particles can be prepared. Further, the obtained dispersion liquid containing the metal colloid particles and the solvent may be used as it is or concentrated to form the paste. The solvent used in the reaction is removed from the obtained dispersion liquid containing the metal colloid particles and the solvent to obtain a new paste. A different type of solvent (other additives as required) may be added to prepare a new paste. Further, a new same or different solvent or additive may be added to the paste.
[無機素材の接合体及び接合方法]
前記製造方法で得られた接合剤は、無機素材を接合するために用いられる。本発明の無機素材の接合体は、無機素材(C1)と無機素材(C2)との間に、本発明の無機素材用接合剤を介在させて、前記無機素材用接合剤を焼結することにより得ることができる。
[Inorganic material bonded body and bonding method]
The bonding agent obtained by the manufacturing method is used for bonding inorganic materials. The inorganic material bonded body of the present invention is obtained by sintering the inorganic material bonding agent by interposing the inorganic material bonding agent of the present invention between the inorganic material (C1) and the inorganic material (C2). Can be obtained.
無機素材としては、ガラスや炭素材などの無機素材であってもよいが、ペーストが金属ナノ粒子で構成されているため、接合力を向上する点からは、少なくとも接合面が金属を含む(又は接合面に金属が存在する)素材(特に接合面の略全面が金属で構成されている素材)が好ましい。金属としては、金属ナノ粒子(A)の項で例示された金属単体、合金、金属化合物などが挙げられる。これらのうち、金属単体又は合金が好ましく、金属ナノ粒子を構成する金属単体と、無機素材の接合面を構成する金属単体(又は合金を構成する各金属単体)との組み合わせとしては、単純立方格子構造(sc)、面心立方格子構造(fcc)、体心立方格子構造(bcc)、六方最密(充填)構造(hcp)などの結晶構造に応じて選択してもよく、異なる結晶構造の組み合わせであってもよいが、同一の結晶構造の組み合わせ(例えば、fcc同士、bcc同士など)が好ましい。また、格子定数も近似しているのが好ましく、前記接合面を構成する金属単体の格子定数が、金属ナノ粒子を構成する金属単体の格子定数に対して0.8〜1.2倍(特に0.86〜1.17倍)程度であってもよい。両者の格子定数がこのような範囲に調整されると、相互の結晶格子が整合されるため、界面で良好な金属結合が形成されると推定される。また、前記接合面を構成する金属単体の原子半径は、金属ナノ粒子を構成する金属単体の原子半径に対して、0.8〜1.2倍(0.85〜1.15倍)程度であってもよい。両者の原子半径がこのような範囲に調整されると、相互の原子の溶解度が大きいため、界面で溶け合い易くなる。例えば、金属ナノ粒子が銀(fcc、格子定数a:3.614Å(オングストローム)、原子半径:1.442Å)で構成されている場合、前記接合面を構成する金属としては、少なくとも銀や金(fcc、格子定数a:4.078Å、原子半径:1.439Å)などの貴金属(特に周期表第1B族金属)、銅(fcc、格子定数a:3.614Å、原子半径:1.276Å)、ニッケル(fcc、格子定数a:3.524Å、原子半径:1.244Å)などを含む金属(金属単体及び金属合金)、特に貴金属単体(例えば、金、パラジウム(fcc、格子定数a:3.89Å、原子半径:1.373Å)単体など)であるのが好ましい。すなわち、基板が、窒化アルミニウム(AlN)や酸化アルミニウム(Al2O3)などの金属化合物や非金属で構成されている場合には、接合面を金属単体又は金属合金で表面処理するのが好ましい。表面処理の方法としては、貴金属を含む金属によるスパッタリングやメッキなどが挙げられる。無機素材の接合面が金属を含む場合、金属ナノ粒子を構成する金属と無機素材に含まれる金属とは異なっていてもよいが、同一又は同族の金属であるのが好ましい。 As the inorganic material, an inorganic material such as glass or carbon material may be used. However, since the paste is composed of metal nanoparticles, at least the bonding surface contains a metal from the point of improving the bonding force (or A material in which metal is present on the bonding surface (particularly a material in which substantially the entire bonding surface is made of metal) is preferable. Examples of the metal include simple metals, alloys, and metal compounds exemplified in the section of metal nanoparticles (A). Of these, a simple metal or an alloy is preferable, and a simple cubic lattice is used as a combination of a simple metal constituting the metal nanoparticle and a simple metal constituting the bonding surface of the inorganic material (or each simple metal constituting the alloy). The structure (sc), the face-centered cubic lattice structure (fcc), the body-centered cubic lattice structure (bcc), the hexagonal close-packed (filled) structure (hcp), etc. A combination of the same crystal structures (for example, fcc, bcc, etc.) is preferable. The lattice constant is also preferably approximated, and the lattice constant of the single metal constituting the joint surface is 0.8 to 1.2 times the lattice constant of the single metal constituting the metal nanoparticle (particularly It may be about 0.86 to 1.17 times. When the lattice constants of both are adjusted to such a range, the mutual crystal lattices are matched, so that it is presumed that a good metal bond is formed at the interface. In addition, the atomic radius of the simple metal constituting the bonding surface is about 0.8 to 1.2 times (0.85 to 1.15 times) the atomic radius of the simple metal constituting the metal nanoparticle. There may be. When the atomic radii of both are adjusted to such a range, the mutual solubility of the atoms is large, so that they are easily dissolved at the interface. For example, when the metal nanoparticles are composed of silver (fcc, lattice constant a: 3.614 Å (angstrom), atomic radius: 1.442 Å), the metal constituting the joint surface is at least silver or gold ( fcc, lattice constant a: 4.078 Å, atomic radius: 1.439 な ど) and other noble metals (particularly Group 1B metal of the periodic table), copper (fcc, lattice constant a: 3.614 Å, atomic radius: 1.276 Å), Metals (metal simple substance and metal alloy) containing nickel (fcc, lattice constant a: 3.524Å, atomic radius: 1.244Å), etc., especially noble metal simple substance (for example, gold, palladium (fcc, lattice constant a: 3.89Å) , Atomic radius: 1.373Å) simple substance). That is, when the substrate is made of a metal compound such as aluminum nitride (AlN) or aluminum oxide (Al 2 O 3 ) or a nonmetal, it is preferable to treat the bonding surface with a single metal or a metal alloy. . Examples of the surface treatment include sputtering and plating with a metal containing a noble metal. When the joint surface of the inorganic material includes a metal, the metal constituting the metal nanoparticle may be different from the metal included in the inorganic material, but is preferably the same or a similar metal.
接合する無機素材(C1)と無機素材(C2)とは、異種の材料であってもよく、同種の材料であってもよい。 The inorganic material (C1) and the inorganic material (C2) to be joined may be different materials or the same kind of materials.
無機素材の形状は、特に限定されないが、例えば、接合する素材同士の接触面積が大きくなる形状、例えば、接合面が平面である形状(通常、板又はシート状、フィルム状、箔状)などであってもよく、ワイヤー状又は線状であってもよい。 The shape of the inorganic material is not particularly limited. For example, the shape in which the contact area between the materials to be joined increases, for example, the shape in which the joining surface is flat (usually a plate or sheet shape, a film shape, a foil shape), etc. It may be wire-like or linear.
無機素材用接合剤の塗布量(乾燥前の塗布量)は、接合する無機素材の用途や大きさに応じて適宜選択できるが、強固に接合する点から、例えば、10〜100mg/cm2、好ましくは20〜80mg/cm2、さらに好ましくは30〜70mg/cm2程度である。 The coating amount of the bonding agent for inorganic material (coating amount before drying) can be appropriately selected according to the use and size of the inorganic material to be bonded. From the point of strong bonding, for example, 10 to 100 mg / cm 2 , Preferably it is 20-80 mg / cm < 2 >, More preferably, it is about 30-70 mg / cm < 2 >.
塗布方法としては、特に限定されず、慣用の方法、例えば、コーターを用いる方法、スプレーコーティング、ディッピングなどが利用できる。 The application method is not particularly limited, and conventional methods such as a method using a coater, spray coating, dipping, and the like can be used.
接合剤を焼結するための焼成温度は、例えば、150〜500℃、好ましくは200〜450℃、さらに好ましくは250〜400℃(特に300〜380℃)程度であってもよい。また、焼成する前に、例えば、80〜200℃(特に100〜150℃)程度の温度で予備加熱してもよい。焼成の際には加圧してもよく、例えば、1〜500g/cm2、好ましくは3〜300g/cm2、さらに好ましくは5〜100g/cm2(特に10〜50g/cm2)程度の荷重を付与した状態で焼成してもよい。本発明では、このような比較的低温及び低圧で焼成しても、無機素材を強固に接合できる。なお、焼成は、空気中で行ってもよく、窒素ガスやアルゴンガスなどの不活性ガス中で行ってもよい。 The firing temperature for sintering the bonding agent may be, for example, about 150 to 500 ° C, preferably about 200 to 450 ° C, and more preferably about 250 to 400 ° C (particularly 300 to 380 ° C). Moreover, before baking, you may preheat at the temperature of about 80-200 degreeC (especially 100-150 degreeC), for example. The firing may be pressurized, for example, a load of about 1 to 500 g / cm 2 , preferably 3 to 300 g / cm 2 , more preferably 5 to 100 g / cm 2 (particularly 10 to 50 g / cm 2 ). You may bake in the state which provided. In the present invention, the inorganic material can be firmly joined even when firing at such a relatively low temperature and low pressure. The firing may be performed in air or in an inert gas such as nitrogen gas or argon gas.
焼成処理時間(加熱時間)は、焼成温度などに応じて、例えば、1分〜10時間、好ましくは20分〜5時間、さらに好ましくは30分〜3時間程度であってもよい。 The firing time (heating time) may be, for example, 1 minute to 10 hours, preferably 20 minutes to 5 hours, more preferably about 30 minutes to 3 hours, depending on the firing temperature and the like.
焼成後の無機素材の層間に形成される焼結膜(金属膜)の厚みは、用途に応じて、1μm〜1cm程度の範囲から適宜選択できるが、例えば、5〜300μm、好ましくは10〜200μm、さらに好ましくは30〜100μm程度である。 Although the thickness of the sintered film (metal film) formed between the layers of the inorganic material after firing can be appropriately selected from the range of about 1 μm to 1 cm depending on the application, for example, 5 to 300 μm, preferably 10 to 200 μm, More preferably, it is about 30-100 micrometers.
以下に、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらの実施例によって限定されるものではない。 Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
実施例1
(金属コロイド粒子の合成)
硝酸銀66.8g、カルボキシル基を有する有機化合物(B1)として酢酸(和光純薬工業(株)製、沸点118℃、炭素数2)10g、および高分子分散剤(B2)としてポリアクリル酸(和光純薬工業(株)製、重合度5000、酸価780mgKOH/g)3.0gを、イオン交換水1000gに投入し、激しく撹拌した。これに2−ジメチルアミノエタノール(和光純薬工業(株)製)100gを加えたのち、70℃で2時間加熱撹拌した。この反応物を高速遠心分離器((株)コクサン(Kokusan)製、H−200 SERIES)を用い、7000rpm、1時間遠心分離し、銀ナノ粒子が保護コロイドにより保護された銀コロイド粒子(一次粒子径1〜100nm、個数平均粒子径20nm)が凝集した沈殿物を回収した。銀コロイド粒子に含まれる保護コロイド(分散剤)(B)の量をTG−DTAで測定(1分間に10℃の速さで30℃から550℃まで昇温した時の質量減少から算出)したところ5.3質量%であり、(B1)/(B2)(質量比)は25/75であった。なお、(B1)/(B2)の比は、まず(B1)量を30℃から200℃までの質量減少から算出し、(B2)を式[(B)−(B1)]から算出し、これらの値(B1)(B2)から求めた。
Example 1
(Synthesis of colloidal metal particles)
66.8 g of silver nitrate, 10 g of acetic acid (manufactured by Wako Pure Chemical Industries, Ltd., boiling point 118 ° C., carbon number 2) as the organic compound (B1) having a carboxyl group, and polyacrylic acid (Japanese sum) as the polymer dispersant (B2) Kogure Pharmaceutical Co., Ltd., degree of polymerization 5000, acid value 780 mg KOH / g) 3.0 g was charged into ion-exchanged water 1000 g and vigorously stirred. To this was added 100 g of 2-dimethylaminoethanol (manufactured by Wako Pure Chemical Industries, Ltd.), followed by heating and stirring at 70 ° C. for 2 hours. This reaction product was centrifuged at 7000 rpm for 1 hour using a high-speed centrifuge (manufactured by Kokusan Co., Ltd., H-200 SERIES), and silver colloid particles (primary particles) in which silver nanoparticles were protected by a protective colloid. The precipitate in which the diameter was 1 to 100 nm and the number average particle diameter was 20 nm was collected. The amount of protective colloid (dispersant) (B) contained in the silver colloid particles was measured by TG-DTA (calculated from the mass decrease when the temperature was raised from 30 ° C. to 550 ° C. at a rate of 10 ° C. per minute). However, it was 5.3 mass%, and (B1) / (B2) (mass ratio) was 25/75. The ratio of (B1) / (B2) is calculated by first calculating the amount of (B1) from the mass decrease from 30 ° C. to 200 ° C., and calculating (B2) from the formula [(B)-(B1)] It calculated | required from these values (B1) (B2).
(金基板の接合)
得られた銀コロイド粒子に、エチレングリコール(極性パラメータ6.9)を加えて銀濃度85重量%の接合用ペーストを作製した。この接合用ペーストを、金基板(1×1cm)の上に50mg塗布した後、金が表面にスパッタされた窒化アルミ基板(窒化アルミニウム基板上にチタン、白金、金の順でスパッタされた基板(以下、同様)、0.4×0.4cm)で接合用ペーストを挟んだ。窒化アルミ基板に対して、20gの分銅を載せ、荷重をかけた後、室温から350℃まで20℃/分の速度で昇温した後、350℃を1時間保持して焼成した。形成された銀膜の厚み50μmであった。
(Bonding of gold substrates)
Ethylene glycol (polarity parameter 6.9) was added to the obtained silver colloidal particles to prepare a joining paste having a silver concentration of 85% by weight. After 50 mg of this bonding paste was applied onto a gold substrate (1 × 1 cm), an aluminum nitride substrate with gold sputtered on its surface (a substrate sputtered in the order of titanium, platinum, and gold on the aluminum nitride substrate ( The same applies to the following, and 0.4 × 0.4 cm). A 20 g weight was placed on the aluminum nitride substrate, a load was applied, the temperature was raised from room temperature to 350 ° C. at a rate of 20 ° C./min, and then firing was performed while maintaining 350 ° C. for 1 hour. The formed silver film had a thickness of 50 μm.
(剪断強度の測定)
接合された基板について、大面積の基板(金基板)を固定し、これに接着した窒化アルミ基板に端子を接触させた状態で移動させ、小面積の基板が剥離するときの接合力を剪断力として測定した。この接合力を測定する試験機は、デイジ(株)製、万能型ボンドテスター シリーズである。この基板の剪断強度は15MPaであった。
(Measurement of shear strength)
For a bonded substrate, a large-area substrate (gold substrate) is fixed, and the terminal is brought into contact with the aluminum nitride substrate adhered thereto, and the bonding force when the small-area substrate peels is shearing force. As measured. A testing machine for measuring the bonding force is a universal bond tester series manufactured by Daisy Corporation. The shear strength of this substrate was 15 MPa.
実施例2
金属コロイド粒子の合成において、カルボキシル基を有する有機化合物(B1)として酢酸の代わりにプロピオン酸(和光純薬工業(株)製、沸点141℃、炭素数3)を用いる以外は実施例1と同様にして、基板を接合して、剪断強度を測定した結果、13MPaであった。なお、保護コロイド(B)の量は5.8質量%であり、(B1)/(B2)(質量比)は20/80であった。
Example 2
In the synthesis of metal colloidal particles, the same as in Example 1 except that propionic acid (manufactured by Wako Pure Chemical Industries, Ltd., boiling point 141 ° C., carbon number 3) is used as the organic compound (B1) having a carboxyl group instead of acetic acid. As a result of joining the substrates and measuring the shear strength, the result was 13 MPa. In addition, the quantity of the protective colloid (B) was 5.8 mass%, and (B1) / (B2) (mass ratio) was 20/80.
実施例3
金属コロイド粒子の合成において、カルボキシル基を有する有機化合物(B1)として酢酸の代わりにコール酸(和光純薬工業(株)製、分解温度198℃)を用いる以外は実施例1と同様にして、基板を接合して、剪断強度を測定した結果、10MPaであった。なお、保護コロイド(B)の量は8.2質量%であり、(B1)/(B2)(質量比)は28/72であった。
Example 3
In the synthesis of metal colloidal particles, in the same manner as in Example 1 except that cholic acid (manufactured by Wako Pure Chemical Industries, Ltd., decomposition temperature 198 ° C.) was used instead of acetic acid as the organic compound (B1) having a carboxyl group, The substrates were joined and the shear strength was measured and found to be 10 MPa. The amount of protective colloid (B) was 8.2% by mass, and (B1) / (B2) (mass ratio) was 28/72.
実施例4
金属コロイド粒子の合成において、高分子分散剤(B2)としてディスパービック190(ビックケミー社製、親水性ユニットであるポリエチレンオキサイド鎖と疎水性ユニットであるアルキル基とを有する両親媒性分散剤、酸価10mgKOH/g、水60%含有)7.2gを用いる以外は実施例2と同様にして、基板を接合して、剪断強度を測定した結果、20MPaであった。なお、保護コロイド(B)の量は5.5質量%であり、(B1)/(B2)(質量比)は18/82であった。遠心分離前の反応物の保存安定性を確認したところ、室温保存であっても、数百nm以上の大粒子の生成は認められなかった。
Example 4
In the synthesis of metal colloidal particles, Dispersic 190 (manufactured by Big Chemie, amphiphilic dispersant having a polyethylene oxide chain which is a hydrophilic unit and an alkyl group which is a hydrophobic unit, as the polymer dispersant (B2), acid value The substrate was bonded and the shear strength was measured in the same manner as in Example 2 except that 7.2 g (10 mg KOH / g, containing 60% water) was used. As a result, the shear strength was 20 MPa. The amount of protective colloid (B) was 5.5% by mass, and (B1) / (B2) (mass ratio) was 18/82. When the storage stability of the reaction product before centrifugation was confirmed, generation of large particles of several hundred nm or more was not recognized even at room temperature storage.
実施例5
金属コロイド粒子の合成において、カルボキシル基を有する有機化合物(B1)としてプロピオン酸の代わりにギ酸(和光純薬工業(株)製、沸点100.7℃、炭素数1)を用いる以外は実施例4と同様にして、基板を接合して、剪断強度を測定した結果、22MPaであった。なお、保護コロイド(B)の量は4.3質量%であり、(B1)/(B2)(質量比)は15/85であった。遠心分離前の反応物の保存安定性を確認したところ、室温保存であっても、数百nm以上の大粒子の生成は認められなかった。
Example 5
Example 4 except that formic acid (manufactured by Wako Pure Chemical Industries, Ltd., boiling point 100.7 ° C., carbon number 1) was used in place of propionic acid as the organic compound (B1) having a carboxyl group in the synthesis of metal colloidal particles. In the same manner as described above, the substrates were joined and the shear strength was measured. The amount of protective colloid (B) was 4.3% by mass, and (B1) / (B2) (mass ratio) was 15/85. When the storage stability of the reaction product before centrifugation was confirmed, generation of large particles of several hundred nm or more was not recognized even at room temperature storage.
実施例6
金属コロイド粒子の合成において、カルボキシル基を有する有機化合物(B1)としてプロピオン酸の代わりにコール酸を用いる以外は実施例4と同様にして、基板を接合して、剪断強度を測定した結果、15MPaであった。なお、保護コロイド(B)の量は7.3質量%であり、(B1)/(B2)(質量比)は28/72であった。遠心分離前の反応物の保存安定性を確認したところ、室温保存であっても、数百nm以上の大粒子の生成は認められなかった。
Example 6
In the synthesis of metal colloidal particles, the substrate was joined and the shear strength was measured in the same manner as in Example 4 except that cholic acid was used instead of propionic acid as the organic compound (B1) having a carboxyl group. Met. The amount of protective colloid (B) was 7.3% by mass, and (B1) / (B2) (mass ratio) was 28/72. When the storage stability of the reaction product before centrifugation was confirmed, generation of large particles of several hundred nm or more was not recognized even at room temperature storage.
実施例7
金属コロイド粒子の合成において、カルボキシル基を有する有機化合物(B1)としてプロピオン酸の代わりに酢酸を用い、ディスパービック190の使用量を2.12gとする以外は実施例4と同様にして、基板を接合して、剪断強度を測定した結果、30MPaであった。なお、保護コロイド(B)の量は2.4質量%であり、(B1)/(B2)(質量比)は35/65であった。遠心分離前の反応物の保存安定性を確認したところ、室温保存であっても、数百nm以上の大粒子の生成は認められなかった。
Example 7
In the synthesis of metal colloidal particles, a substrate was prepared in the same manner as in Example 4 except that acetic acid was used instead of propionic acid as the organic compound (B1) having a carboxyl group, and the amount of Dispersic 190 used was 2.12 g. As a result of bonding and measuring the shear strength, it was 30 MPa. The amount of protective colloid (B) was 2.4% by mass, and (B1) / (B2) (mass ratio) was 35/65. When the storage stability of the reaction product before centrifugation was confirmed, generation of large particles of several hundred nm or more was not recognized even at room temperature storage.
実施例8
実施例7で作製した接合用ペーストを、パラジウム基板(1×1cm)の上に10mg塗布した後、金が表面にスパッタされた窒化アルミニウム基板(0.2×0.2cm)で接合用ペーストを挟んだ。荷重をかけずに室温から350℃まで20℃/分の速度で昇温した後、350℃を14分間保持して焼成した。形成された銀膜の厚み30μmであった。基板を接合して、剪断強度を測定した結果、25MPaであった。
Example 8
After applying 10 mg of the bonding paste prepared in Example 7 on a palladium substrate (1 × 1 cm), the bonding paste was applied on an aluminum nitride substrate (0.2 × 0.2 cm) with gold sputtered on the surface. I caught it. The sample was heated from room temperature to 350 ° C. at a rate of 20 ° C./min without applying a load, and then calcined by maintaining 350 ° C. for 14 minutes. The formed silver film had a thickness of 30 μm. As a result of joining the substrates and measuring the shear strength, it was 25 MPa.
実施例9
実施例7で作製した接合用ペーストを、無酸素銅基板(1×1cm)の上に0.6mg塗布した後、無酸素銅基板(0.2×0.2cm)で接合用ペーストを挟んだ。荷重をかけずに室温から350℃まで20℃/分の速度で昇温した後、350℃を14分間保持して焼成した。形成された銀膜の厚み15μmであった。基板を接合して、剪断強度を測定した結果、15MPaであった。
Example 9
After 0.6 mg of the bonding paste prepared in Example 7 was applied on an oxygen-free copper substrate (1 × 1 cm), the bonding paste was sandwiched between the oxygen-free copper substrate (0.2 × 0.2 cm). . The sample was heated from room temperature to 350 ° C. at a rate of 20 ° C./min without applying a load, and then calcined by maintaining 350 ° C. for 14 minutes. The formed silver film had a thickness of 15 μm. As a result of joining the substrates and measuring the shear strength, it was 15 MPa.
実施例10
実施例7で作製した接合用ペーストを、銅にニッケルを電気メッキした基板(1×1cm)の上に0.6mg塗布した後、銅にニッケルを電気メッキした基板(0.25×0.25cm)で接合用ペーストを挟んだ。荷重をかけずに室温から350℃まで20℃/分の速度で昇温した後、350℃を14分間保持して焼成した。形成された銀膜の厚み15μmであった。基板を接合して、剪断強度を測定した結果、7MPaであった。
Example 10
After 0.6 mg of the bonding paste prepared in Example 7 was applied on a copper electroplated nickel substrate (1 × 1 cm), the copper electroplated nickel substrate (0.25 × 0.25 cm). ) Sandwiched the bonding paste. The sample was heated from room temperature to 350 ° C. at a rate of 20 ° C./min without applying a load, and then calcined by maintaining 350 ° C. for 14 minutes. The formed silver film had a thickness of 15 μm. As a result of joining the substrates and measuring the shear strength, it was 7 MPa.
比較例1
硝酸銀2.5g、分散剤(保護コロイド)(B)として、オクチルアミン4.9g、プロピオン酸3.1gをトリメチルペンタン1リットルに投入し、撹拌混合して溶解した。この混合溶液に、0.03モル/リットルの水素化ホウ素ナトリウムを含むプロパノール溶液1.0リットルを1時間かけて滴下し、銀を還元した。さらに、3時間撹拌して黒色の液体を得た。得られた黒色の液体をエバポレータによって濃縮した後、この濃縮液にメタノール2.0リットルを加えて褐色の沈殿物を生成させた後、吸引ろ過により沈殿物を回収した。生成した沈殿物をトリメチルペンタンに再分散させ、ろ過した後、乾燥させて、銀ナノ粒子を黒色の固体として得た。得られた銀ナノ粒子のコア部の個数平均粒子径は4nmであり、分散剤(B)の量は15.5質量%であった。この銀ナノ粒子をテトラデカンに分散させ、銀濃度60質量%のペーストを作製し、室温で1週間放置し、保存安定性を確認したところ、ナノ粒子が焼結して数百nm以上の大粒子まで成長している様子が観察でき、経時安定性に劣っていた。
Comparative Example 1
As a silver nitrate (2.5 g) and a dispersant (protective colloid) (B), 4.9 g of octylamine and 3.1 g of propionic acid were added to 1 liter of trimethylpentane, and stirred and mixed to dissolve. To this mixed solution, 1.0 liter of a propanol solution containing 0.03 mol / liter sodium borohydride was added dropwise over 1 hour to reduce silver. Furthermore, it stirred for 3 hours and obtained the black liquid. After the obtained black liquid was concentrated by an evaporator, 2.0 liters of methanol was added to the concentrated liquid to form a brown precipitate, and then the precipitate was collected by suction filtration. The produced precipitate was redispersed in trimethylpentane, filtered, and dried to obtain silver nanoparticles as a black solid. The number average particle size of the core part of the obtained silver nanoparticles was 4 nm, and the amount of the dispersant (B) was 15.5% by mass. The silver nanoparticles were dispersed in tetradecane to prepare a paste having a silver concentration of 60% by mass, and left at room temperature for 1 week to confirm the storage stability. As a result, the nanoparticles were sintered and large particles of several hundred nm or more were sintered. It was possible to observe the growth up to 2 hours, and the stability over time was poor.
本発明の無機素材用接合剤は、金属素材などの無機素材同士、例えば、金属板などの無機基板などを強固に接合可能な接合剤として利用できる。 The bonding agent for inorganic materials of the present invention can be used as a bonding agent capable of firmly bonding inorganic materials such as metal materials, for example, inorganic substrates such as metal plates.
Claims (7)
前記金属コロイド粒子が、金属ナノ粒子(A)と、この金属ナノ粒子(A)を分散させるための保護コロイド(B)とで構成され、
前記保護コロイド(B)が、カルボキシル基を有する有機化合物(B1)と、高分子分散剤(B2)とで構成され、
前記有機化合物(B1)が、C 1−3 脂肪族モノカルボン酸及び多環式脂肪族ヒドロキシカルボン酸からなる群より選択された少なくとも1種であり、かつ
前記高分子分散剤(B2)が、遊離のカルボキシル基を有する高分子分散剤である無機素材用接合剤。 A bonding agent for inorganic materials composed of metal colloid particles and a paste containing a dispersion medium of the metal colloid particles,
The metal colloid particles are composed of metal nanoparticles (A) and protective colloids (B) for dispersing the metal nanoparticles (A) ,
Before Symbol protective colloid (B) is an organic compound having a carboxyl group and (B1), is constructed out with polymer dispersing agent (B2),
The organic compound (B1) is at least one selected from the group consisting of C 1-3 aliphatic monocarboxylic acids and polycyclic aliphatic hydroxycarboxylic acids, and
The polymer dispersing agent (B2) is a polymer dispersant der Ru inorganic material for bonding agent having a free carboxyl group.
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