JP5402934B2 - Silicone monomer, its production method and use - Google Patents
Silicone monomer, its production method and use Download PDFInfo
- Publication number
- JP5402934B2 JP5402934B2 JP2010526778A JP2010526778A JP5402934B2 JP 5402934 B2 JP5402934 B2 JP 5402934B2 JP 2010526778 A JP2010526778 A JP 2010526778A JP 2010526778 A JP2010526778 A JP 2010526778A JP 5402934 B2 JP5402934 B2 JP 5402934B2
- Authority
- JP
- Japan
- Prior art keywords
- formula
- group
- represented
- mass
- silicone monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000178 monomer Substances 0.000 title claims description 70
- 229920001296 polysiloxane Polymers 0.000 title claims description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000203 mixture Substances 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 238000006116 polymerization reaction Methods 0.000 claims description 18
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- 125000003700 epoxy group Chemical group 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- RITDWOLPOPICQM-UHFFFAOYSA-N CC(C(OCCC(COP([O-])(O)=O)[N+](C)(C)C)=O)=C Chemical compound CC(C(OCCC(COP([O-])(O)=O)[N+](C)(C)C)=O)=C RITDWOLPOPICQM-UHFFFAOYSA-N 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 33
- -1 polishes Substances 0.000 description 27
- 150000001875 compounds Chemical class 0.000 description 20
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 18
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- 239000007788 liquid Substances 0.000 description 14
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 239000002994 raw material Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 5
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 5
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 125000004185 ester group Chemical group 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 238000004128 high performance liquid chromatography Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 5
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- BYXKJWZJPAGNAD-UHFFFAOYSA-N (1,2-dihydroxy-6-silylhexan-3-yl) 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)OC(C(O)CO)CCC[SiH3] BYXKJWZJPAGNAD-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 229920001515 polyalkylene glycol Polymers 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 125000005654 1,2-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([*:2])C([H])([*:1])C1([H])[H] 0.000 description 2
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- KANZWHBYRHQMKZ-UHFFFAOYSA-N 2-ethenylpyrazine Chemical compound C=CC1=CN=CC=N1 KANZWHBYRHQMKZ-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- BESKSSIEODQWBP-UHFFFAOYSA-N 3-tris(trimethylsilyloxy)silylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C BESKSSIEODQWBP-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 2
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000003480 eluent Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 2
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 2
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical class C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 1
- 125000005655 1,3-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([*:2])C1([H])[H] 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- RESPXSHDJQUNTN-UHFFFAOYSA-N 1-piperidin-1-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCCCC1 RESPXSHDJQUNTN-UHFFFAOYSA-N 0.000 description 1
- WLPAQAXAZQUXBG-UHFFFAOYSA-N 1-pyrrolidin-1-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCCC1 WLPAQAXAZQUXBG-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- LBNDGEZENJUBCO-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethyl]butanedioic acid Chemical compound CC(=C)C(=O)OCCC(C(O)=O)CC(O)=O LBNDGEZENJUBCO-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DWTKNKBWDQHROK-UHFFFAOYSA-N 3-[2-(2-methylprop-2-enoyloxy)ethyl]phthalic acid Chemical compound CC(=C)C(=O)OCCC1=CC=CC(C(O)=O)=C1C(O)=O DWTKNKBWDQHROK-UHFFFAOYSA-N 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000000751 azo group Chemical class [*]N=N[*] 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 239000000490 cosmetic additive Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- ZLLVQELIBCDLLZ-UHFFFAOYSA-N dimethyl-(2-phenylethenyl)-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C)C=CC1=CC=CC=C1 ZLLVQELIBCDLLZ-UHFFFAOYSA-N 0.000 description 1
- 238000002330 electrospray ionisation mass spectrometry Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 231100000040 eye damage Toxicity 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 239000000017 hydrogel Substances 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Chemical class 0.000 description 1
- 239000002184 metal Chemical class 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- YHOSNAAUPKDRMI-UHFFFAOYSA-N n,n-di(propan-2-yl)prop-2-enamide Chemical compound CC(C)N(C(C)C)C(=O)C=C YHOSNAAUPKDRMI-UHFFFAOYSA-N 0.000 description 1
- DLJMSHXCPBXOKX-UHFFFAOYSA-N n,n-dibutylprop-2-enamide Chemical compound CCCCN(C(=O)C=C)CCCC DLJMSHXCPBXOKX-UHFFFAOYSA-N 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
- RKSYJNCKPUDQET-UHFFFAOYSA-N n,n-dipropylprop-2-enamide Chemical compound CCCN(CCC)C(=O)C=C RKSYJNCKPUDQET-UHFFFAOYSA-N 0.000 description 1
- PNLUGRYDUHRLOF-UHFFFAOYSA-N n-ethenyl-n-methylacetamide Chemical compound C=CN(C)C(C)=O PNLUGRYDUHRLOF-UHFFFAOYSA-N 0.000 description 1
- RQAKESSLMFZVMC-UHFFFAOYSA-N n-ethenylacetamide Chemical compound CC(=O)NC=C RQAKESSLMFZVMC-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229950004354 phosphorylcholine Drugs 0.000 description 1
- PYJNAPOPMIJKJZ-UHFFFAOYSA-N phosphorylcholine chloride Chemical compound [Cl-].C[N+](C)(C)CCOP(O)(O)=O PYJNAPOPMIJKJZ-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F30/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F30/08—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
- G02B1/043—Contact lenses
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本発明は、親水性モノマーと相溶する新規なシリコーンモノマー、その製造方法及び該モノマーを利用した重合性組成物に関する。 The present invention relates to a novel silicone monomer that is compatible with a hydrophilic monomer, a method for producing the same, and a polymerizable composition using the monomer.
シリコーンは離型剤、繊維処理剤、潤滑剤、艶出し剤、撥水剤、化粧品添加剤など、さまざまな用途で使用されている。近年、眼用レンズの目に対する負担を軽減する目的でレンズ用原料にシリコーンモノマーが使用されている(特許文献1、2)。このようにレンズ用原料にシリコーンを配合する場合、レンズ表面が疎水性になり、眼障害が懸念されるため、レンズ表面を親水化する必要がある。
従来から、表面を親水化させたレンズ等の重合物を得る方法としては、親水性モノマーをシリコーンモノマーと相溶化させ、共重合物を得る方法が知られている。親水性モノマーと相溶可能なシリコーンモノマーとして、例えば、メチルジ(トリメチルシロキシ)シリルプロピルグリセロールメタクリレート(SiGMAと略す)(特許文献3、4)が知られており、N,N−ジメチルアクリルアミドなどの親水性モノマーと相溶化させることで表面を親水化させることができる。
SiGMAは、2−メタクリロイルオキシエチル−2−トリメチルアンモニオエチルホスフェート(MPCと略す)など、より親水性の高いモノマーとの相溶性が十分とは言えず、中には、高容量のシリコーンモノマーを含有させることができない問題がある(特許文献5)。
そのため、重合物表面に十分な親水性を付与するために、プラズマ処理などの新たな表面親水化技術も開発されている(特許文献6、7)。Silicones are used in various applications such as mold release agents, fiber treatment agents, lubricants, polishes, water repellents, cosmetic additives and the like. In recent years, silicone monomers have been used as lens raw materials for the purpose of reducing the burden on the eyes of ophthalmic lenses (Patent Documents 1 and 2). As described above, when silicone is added to the lens raw material, the lens surface becomes hydrophobic and there is a concern about eye damage. Therefore, it is necessary to make the lens surface hydrophilic.
Conventionally, as a method of obtaining a polymer such as a lens having a hydrophilic surface, a method of obtaining a copolymer by compatibilizing a hydrophilic monomer with a silicone monomer is known. As a silicone monomer compatible with the hydrophilic monomer, for example, methyldi (trimethylsiloxy) silylpropylglycerol methacrylate (abbreviated as SiGMA) (Patent Documents 3 and 4) is known, and hydrophilic such as N, N-dimethylacrylamide is known. The surface can be hydrophilized by compatibilizing with the functional monomer.
SiGMA is not sufficiently compatible with more hydrophilic monomers such as 2-methacryloyloxyethyl-2-trimethylammonioethyl phosphate (abbreviated as MPC). There is a problem that it cannot be contained (Patent Document 5).
Therefore, a new surface hydrophilization technique such as plasma treatment has been developed in order to impart sufficient hydrophilicity to the polymer surface (Patent Documents 6 and 7).
本発明の課題は、MPC等の親水性モノマーを従来より広範囲の混合組成において相溶化させ、均一に共重合させることができ、高い親水性とシリコーンモノマーが有する性能とを十分発揮させることが可能な共重合物の製造に有用なシリコーンモノマー、その製造方法及び重合用組成物を提供することにある。 The object of the present invention is to make hydrophilic monomers such as MPC compatible with a wider range of mixed compositions and to uniformly copolymerize them, and to fully demonstrate the high hydrophilicity and the performance of silicone monomers Another object of the present invention is to provide a silicone monomer useful for the production of such a copolymer, a method for producing the same, and a composition for polymerization.
本発明者らは、上記課題を解決するために鋭意検討した。これまでのシリコーンモノマーは、分子内に水酸基を有することにより、親水性モノマーを相溶化し易くできることが知られている。しかし、その水酸基間でシリコーン相中に強い水素結合が形成されるため、親水性モノマーへの配向が十分でなく、親水性モノマーを十分量配合することが困難であった。そこで、シリコーンモノマーの分子構造において、水素結合性の強い水酸基の近傍に水素結合性の弱い親水基であるエステル基を2〜4、好ましくは3個含有させることにより、驚くべきことに従来親水性モノマーと相溶させるために用いられてきたシリコーンモノマーと比較して、MPCなどの親水性モノマーとシリコーンモノマーの相溶性を著しく向上させることが可能であることを見出し、更に、そのような構造のシリコーンモノマーの製造に成功し本発明を完成した。 The present inventors diligently studied to solve the above problems. It is known that conventional silicone monomers can easily compatibilize hydrophilic monomers by having a hydroxyl group in the molecule. However, since a strong hydrogen bond is formed in the silicone phase between the hydroxyl groups, the orientation to the hydrophilic monomer is not sufficient, and it is difficult to blend a sufficient amount of the hydrophilic monomer. In view of this, in the molecular structure of the silicone monomer, it is surprising that conventional hydrophilicity is obtained by containing 2 to 4, preferably 3 ester groups which are hydrophilic groups having weak hydrogen bonding properties in the vicinity of hydroxyl groups having strong hydrogen bonding properties. It has been found that the compatibility of hydrophilic monomers such as MPC and silicone monomers can be significantly improved compared to silicone monomers that have been used for compatibility with monomers. The present invention was completed by successfully producing a silicone monomer.
本発明によれば、式(1)で表されるシリコーンモノマーが提供される。
また本発明によれば、式(3)で表されるカルボン酸と式(4)で表されるエポキシ基含有シロキサンとを反応させることを特徴とする上記式(1)で表されるシリコーンモノマーの製造方法が提供される。According to the present invention, a silicone monomer represented by the formula (1) is provided.
Further, according to the present invention, the silicone monomer represented by the above formula (1) is produced by reacting the carboxylic acid represented by the formula (3) with the epoxy group-containing siloxane represented by the formula (4). A manufacturing method is provided.
更に本発明によれば、上記式(1)で表されるシリコーンモノマーと、MPCとを含む重合用組成物が提供される。
Furthermore, according to the present invention, there is provided a polymerization composition comprising a silicone monomer represented by the above formula (1) and MPC.
本発明のシリコーンモノマーは、上記式(1)で表される構造を有するので、MPCなどの親水性モノマーを広範囲の混合組成において相溶化させることができる。このため、本発明のシリコーンモノマーと親水性モノマーとを含む重合用組成物は、広範囲の組成において均一に共重合させることができ、高い親水性とシリコーンモノマーが有する性能とを十分発揮させた、透明性に優れた共重合物を得ることができる。 Since the silicone monomer of the present invention has a structure represented by the above formula (1), hydrophilic monomers such as MPC can be compatibilized in a wide range of mixed compositions. For this reason, the composition for polymerization comprising the silicone monomer and the hydrophilic monomer of the present invention can be uniformly copolymerized in a wide range of compositions, and sufficiently exerted the high hydrophilicity and the performance of the silicone monomer. A copolymer having excellent transparency can be obtained.
以下、本発明の実施の形態を詳細に説明する。
本発明のシリコーンモノマーは、上記式(1)で表される。
式(1)中、Rは水素原子またはメチル基を表す。Xはエステル基を1又は2有していて良い炭素数1〜12の有機基を表す。Xとしては、原料の入手が容易であることから好ましくは式(2)又は式(5a)〜(5c)で示される基を挙げることができる。Hereinafter, embodiments of the present invention will be described in detail.
The silicone monomer of the present invention is represented by the above formula (1).
In formula (1), R represents a hydrogen atom or a methyl group. X represents an organic group having 1 to 12 carbon atoms which may have 1 or 2 ester groups. X is preferably a group represented by the formula (2) or the formulas (5a) to (5c) because the raw materials are easily available.
式(2)中のZにおいて、炭素数1〜6の二価の炭化水素基としては、例えば、メチレン基、エチレン基、n−プロピレン基、n−ブチレン基、n−へキシレン基が挙げられ、好ましくは安定性、原料入手性の面からエチレン基が挙げられる。
炭素数6〜10の二価の環状炭化水素基としては、例えば、1,2−シクロヘキシレン基、1,3−シクロヘキシレン基、1,4−シクロヘキシレン基、1,2−フェニレン基、1,3−フェニレン基、1,4−フェニレン基、1,2−ナフタレン基、1,3−ナフタレン基、1,4−ナフタレン基、1,5−ナフタレン基、1,6−ナフタレン基、1,7−ナフタレン基、1,8−ナフタレン基、2,3−ナフタレン基、2,6−ナフタレン基が挙げられ、好ましくは入手性の理由から1,2−シクロヘキシレン基、1,2−フェニレン基が挙げられる。In Z in the formula (2), examples of the divalent hydrocarbon group having 1 to 6 carbon atoms include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, and an n-hexylene group. Preferably, an ethylene group is used from the viewpoint of stability and availability of raw materials.
Examples of the divalent cyclic hydrocarbon group having 6 to 10 carbon atoms include 1,2-cyclohexylene group, 1,3-cyclohexylene group, 1,4-cyclohexylene group, 1,2-phenylene group, 1 , 3-phenylene group, 1,4-phenylene group, 1,2-naphthalene group, 1,3-naphthalene group, 1,4-naphthalene group, 1,5-naphthalene group, 1,6-naphthalene group, 1, Examples include 7-naphthalene group, 1,8-naphthalene group, 2,3-naphthalene group, and 2,6-naphthalene group, and preferably 1,2-cyclohexylene group and 1,2-phenylene group for reasons of availability. Is mentioned.
式(2)で表される基のより具体的な例としては、式(6a)〜(6e)で表される基が挙げられ、好ましくは原料が入手し易いことから式(6b)、式(6d)で表される基が挙げられる。
式(1)中、nは0〜3の整数を表す。好ましくは安定性が高いことから、n=2又は3である。
式(1)中、Y1〜Y9はそれぞれが互いに独立に水素原子、炭素数1〜6のアルキル基、炭素数6〜10のアリール基を表す。
炭素数1〜6のアルキル基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、シクロヘキシル基が挙げられる。
炭素数6〜10のアリール基としては、例えば、フェニル基、ベンジル基、フェニルエチル基、ナフチル基が挙げられる。前記Y1〜Y9として最も好ましいのは原料の入手が容易であることから、メチル基である。In formula (1), n represents an integer of 0 to 3. Preferably, n = 2 or 3 because of high stability.
In formula (1), Y 1 to Y 9 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or an aryl group having 6 to 10 carbon atoms.
Examples of the alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, and a cyclohexyl group.
Examples of the aryl group having 6 to 10 carbon atoms include a phenyl group, a benzyl group, a phenylethyl group, and a naphthyl group. Most preferred as Y 1 to Y 9 is a methyl group because the raw materials are easily available.
式(1)中、a、b及びcはそれぞれが互いに独立に0〜3、好ましくは0〜2の整数を表す。ただしa+b+c≧1である。好ましいa、b及びcの組み合わせは、原料の入手が容易であることから、a=b=c=1、a=b=1かつc=0、およびa=1かつb=c=0である。 In the formula (1), a, b and c each independently represent an integer of 0 to 3, preferably 0 to 2. However, a + b + c ≧ 1. Preferred a, b and c combinations are a = b = c = 1, a = b = 1 and c = 0, and a = 1 and b = c = 0 because the raw materials are easily available .
式(1)で示されるシリコーンモノマーとしては、例えば、式(7a)〜(7d)に示される構造のシリコーンモノマーが好ましく挙げられる。これらのうち、最も好ましいものは親水性モノマーとの相溶性に特に優れ、かつ他のシリコーンモノマーとも容易に溶解させることができる式(7a)で表される化合物が挙げられる。 Preferred examples of the silicone monomer represented by the formula (1) include silicone monomers having structures represented by the formulas (7a) to (7d). Among these, the most preferable one is a compound represented by the formula (7a) which is particularly excellent in compatibility with a hydrophilic monomer and can be easily dissolved with other silicone monomers.
式(1)で表されるシリコーンモノマーの好ましい製造方法としては、例えば、上記式(3)で表されるカルボン酸と、上記式(4)で表されるエポキシ基含有シロキサンとを反応させる方法が挙げられ、得られる生成物は、分離精製を行うことで所望のシリコーンモノマーを得ることができる。
上記式(3)中のX、R、上記式(4)中のY1〜Y9、n、a、b及びcは、上記式(1)に対応するものであり、上述の好ましい例及び具体例が挙げられる。As a preferable method for producing the silicone monomer represented by the formula (1), for example, a method of reacting the carboxylic acid represented by the above formula (3) with the epoxy group-containing siloxane represented by the above formula (4). The desired silicone monomer can be obtained by separating and purifying the resulting product.
X and R in the above formula (3), Y 1 to Y 9 , n, a, b and c in the above formula (4) correspond to the above formula (1). Specific examples are given.
式(3)で表されるカルボン酸としては市販のものが使用できるが、好ましくは、親水性モノマーとの相溶性が無いか、低い他のシリコーンモノマーや、親水性モノマーのそれぞれに対する相溶性が高いという理由から、エステル基を3個含む式(5)で表されるカルボン酸が挙げられる。 A commercially available carboxylic acid represented by the formula (3) can be used. Preferably, the carboxylic acid is not compatible with a hydrophilic monomer or has a low compatibility with other silicone monomers and hydrophilic monomers. For the reason that it is high, a carboxylic acid represented by the formula (5) containing three ester groups can be mentioned.
式(5)で表されるカルボン酸の最も好ましい例としては、原料の入手が容易であることから、例えば、2−メタクリロイルオキシエチルコハク酸、2−メタクリロイルオキシエチルフタル酸、2−メタクリロイルオキシエチルヘキサヒドロフタル酸が挙げられる。 Most preferred examples of the carboxylic acid represented by the formula (5) include, for example, 2-methacryloyloxyethyl succinic acid, 2-methacryloyloxyethyl phthalic acid, 2-methacryloyloxyethyl, because the raw materials are easily available. Hexahydrophthalic acid is mentioned.
上記式(4)で表されるエポキシ基含有シロキサンとしては市販のものが使用できるが、原料を入手し易いことから式(8a)〜(8c)で示されるものが好ましく挙げられ、中でも式(8b)で示されるものが更に好ましい。 As the epoxy group-containing siloxane represented by the above formula (4), commercially available ones can be used. However, since the raw materials are easily available, those represented by the formulas (8a) to (8c) are preferably exemplified. More preferred are those shown in 8b).
式(3)で表されるカルボン酸と、式(4)で表されるエポキシ基含有シロキサンとの反応は、例えば、無溶媒で、又は非プロトン性溶媒中で行うことができる。反応温度は、通常70〜150℃、好ましくは副分解反応が起こり難い70〜100℃、反応時間は、通常6時間〜48時間、好ましくは12〜24時間である。 The reaction of the carboxylic acid represented by the formula (3) and the epoxy group-containing siloxane represented by the formula (4) can be performed, for example, without a solvent or in an aprotic solvent. The reaction temperature is usually 70 to 150 ° C., preferably 70 to 100 ° C. at which side decomposition reaction hardly occurs, and the reaction time is usually 6 to 48 hours, preferably 12 to 24 hours.
前記反応には、反応を促進するために触媒を用いることができる。該触媒としては、例えば、水酸化カリウム、ナトリウムエトキシド、1,8−ジアザビシクロ[5,4,0]ウンデカ−7−エン、トリメチルベンジルアンモニウムクロライド、トリメチルベンジルアンモニウムクロライド、トリエチルアミンが挙げられる。特に好ましい触媒としては、求核性が低いことから1,8−ジアザビシクロ[5,4,0]ウンデカ−7−エン、トリエチルアミン、ナトリウムエトキシドが挙げられる。
触媒の使用量は、式(3)で表されるカルボン酸に対して、好ましくは0.03〜0.24モル比である。In the reaction, a catalyst can be used to accelerate the reaction. Examples of the catalyst include potassium hydroxide, sodium ethoxide, 1,8-diazabicyclo [5,4,0] undec-7-ene, trimethylbenzylammonium chloride, trimethylbenzylammonium chloride, and triethylamine. Particularly preferred catalysts include 1,8-diazabicyclo [5,4,0] undec-7-ene, triethylamine and sodium ethoxide because of their low nucleophilicity.
The amount of the catalyst used is preferably 0.03 to 0.24 molar ratio with respect to the carboxylic acid represented by the formula (3).
反応に際しては、カルボン酸等が重合しないように重合禁止剤を用いるのが好ましい。重合禁止剤としては、例えば、ヒドロキノンモノメチルエーテル、1,4−ジヒドロキシベンゼン、4−メトキシフェノールが挙げられ、反応終了後、塩基洗浄により容易に除去することが可能な点から1,4−ジヒドロキシベンゼンまたは4−メトキシフェノールの使用が好ましい。
重合禁止剤の使用量は、反応液中に通常100〜1000ppm程度である。In the reaction, it is preferable to use a polymerization inhibitor so that carboxylic acid or the like is not polymerized. Examples of the polymerization inhibitor include hydroquinone monomethyl ether, 1,4-dihydroxybenzene, and 4-methoxyphenol, and 1,4-dihydroxybenzene can be easily removed by base washing after the completion of the reaction. Or the use of 4-methoxyphenol is preferred.
The amount of the polymerization inhibitor used is usually about 100 to 1000 ppm in the reaction solution.
反応において、式(3)で表されるカルボン酸と、式(4)で表されるエポキシ基含有シロキサンとの仕込み割合は、反応系中の該エポキシ基含有シロキサンを99%以上反応させるために、該エポキシ基含有シロキサン1モルに対して、前記カルボン酸を1.5〜3モルの割合になるようにすることが好ましい。 In the reaction, the charge ratio of the carboxylic acid represented by the formula (3) and the epoxy group-containing siloxane represented by the formula (4) is such that the epoxy group-containing siloxane in the reaction system is reacted by 99% or more. The carboxylic acid is preferably in a ratio of 1.5 to 3 moles with respect to 1 mole of the epoxy group-containing siloxane.
反応後に得られるシリコーンモノマーは、高沸点で重合性を有する液体であり、再結晶や蒸留操作の利用が困難であるため、洗浄により精製することが好ましい。
該洗浄は、例えば、得られた反応液をn−ヘキサンに溶解し、洗浄液として、水酸化ナトリウム水溶液や、有機塩基のアセトニトリル溶液で行うことができる。該有機塩基としては、例えば、トリエチルアミン、アンモニア、トリエタノールアミン、ジエタノールアミン、エタノールアミンが挙げられる。
前記n−ヘキサンの使用量は、精製時の油相と水相の分離が容易であることから、反応液の容量の約9倍程度であることが望ましい。また、前記洗浄液の使用量は、通常n−ヘキサンと同容量程度である。The silicone monomer obtained after the reaction is a liquid having a high boiling point and polymerizability, and it is difficult to use it for recrystallization or distillation operation.
The washing can be performed, for example, by dissolving the obtained reaction solution in n-hexane and using a sodium hydroxide aqueous solution or an organic base acetonitrile solution as the washing solution. Examples of the organic base include triethylamine, ammonia, triethanolamine, diethanolamine, and ethanolamine.
The amount of n-hexane used is preferably about 9 times the volume of the reaction solution because the oil phase and the aqueous phase can be easily separated during purification. Moreover, the usage-amount of the said washing | cleaning liquid is about the same volume as n-hexane normally.
このような洗浄により、反応終了後に残存する過剰の前記カルボン酸を除去することができる。該カルボン酸は、洗浄液中に、塩基との塩として洗浄液(下相)中に抽出されるため、分液ロートを使用して、洗浄液を除去し、洗浄液が塩基性になるまでこの洗浄を繰り返すことが好ましい。
一方、n−ヘキサン相には少量の塩基が混入するため、さらに水又は食塩水で洗浄し、アルカリを除去することが好ましい。この操作は、洗浄後の食塩水が中性になるまで繰り返すことが望ましい。By such washing, excess carboxylic acid remaining after the reaction can be removed. Since the carboxylic acid is extracted into the cleaning liquid as a salt with the base in the cleaning liquid (lower phase), the cleaning liquid is removed using a separatory funnel, and this cleaning is repeated until the cleaning liquid becomes basic. It is preferable.
On the other hand, since a small amount of base is mixed in the n-hexane phase, it is preferable to further wash with water or saline to remove the alkali. This operation is desirably repeated until the washed saline becomes neutral.
上記洗浄後、無水流酸ナトリウム等の脱水剤を使用して、反応液中に含まれる少量の水を脱水し、ろ過後、例えば、エバポレーターを使用してn−ヘキサンを留去することにより、所望のシリコーンモノマーが得られる。
n−ヘキサンの留去は、約60℃以下で行い、真空ポンプを用いて5〜10mmHgに減圧して約1時間吸引する操作により行うことが好ましい。After the washing, using a dehydrating agent such as anhydrous sodium sulfate, dehydrating a small amount of water contained in the reaction solution, and after filtration, for example, by distilling off n-hexane using an evaporator, The desired silicone monomer is obtained.
The distillation of n-hexane is preferably performed at about 60 ° C. or less, and is performed by an operation of reducing the pressure to 5 to 10 mmHg using a vacuum pump and suctioning for about 1 hour.
上記精製後の生成物は、通常、目的の式(1)で示されるシリコーンモノマーと、式(1')で示されるシリコーンモノマーとの混合物として得られる。
該混合物は、後述する本発明の重合用組成物にそのまま用いることができるが、混合物中の式(1)で示されるシリコーンモノマーと式(1')で示されるシリコーンモノマーとの含有割合は、質量比で通常2/1〜8/1、好ましくは3/1〜5/1である。式(1)で示されるシリコーンモノマーの割合が2/1未満では、親水性モノマーの相溶化能が低下する恐れがある。 The mixture can be used as it is for the polymerization composition of the present invention described later, but the content ratio of the silicone monomer represented by the formula (1) and the silicone monomer represented by the formula (1 ′) in the mixture is: The mass ratio is usually 2/1 to 8/1, preferably 3/1 to 5/1. When the ratio of the silicone monomer represented by the formula (1) is less than 2/1, the compatibilizing ability of the hydrophilic monomer may be lowered.
本発明のシリコーンモノマーは、例えば、レンズ用材料として用いることができる。特に、本発明のシリコーンモノマーは、MPC等の高い親水性を示すモノマーと相溶化するために、例えば、本発明のシリコーンモノマーと、MPCとを含む本発明の重合用組成物とすることができる。 The silicone monomer of the present invention can be used, for example, as a lens material. In particular, since the silicone monomer of the present invention is compatible with a highly hydrophilic monomer such as MPC, for example, the polymerization composition of the present invention containing the silicone monomer of the present invention and MPC can be used. .
本発明の重合用組成物において、MPCの含有割合は、本発明のシリコーンモノマーもしくは、本発明のシリコーンモノマーと上記式(1')で示されるシリコーンモノマーとの混合物100質量部に対して、通常10〜70質量部、好ましくは20〜50質量部である。MPCの含有割合が10質量部より少ないと、得られる重合物の表面の親水性が低下する恐れがあり、70質量部より多いと、得られる重合物の酸素透過率が低下する恐れがある。
本発明の重合用組成物には、必要により他の共重合性モノマーを含有させることができる。他の共重合性モノマーの含有割合は、本発明のシリコーンモノマー100質量部に対して、通常0〜150質量部、好ましくは0〜100質量部である。In the polymerization composition of the present invention, the content of MPC is usually based on 100 parts by mass of the silicone monomer of the present invention or a mixture of the silicone monomer of the present invention and the silicone monomer represented by the above formula (1 ′). It is 10-70 mass parts, Preferably it is 20-50 mass parts. If the MPC content is less than 10 parts by mass, the hydrophilicity of the surface of the resulting polymer may be reduced, and if it is more than 70 parts by mass, the oxygen permeability of the resulting polymer may be reduced.
The polymerization composition of the present invention can contain other copolymerizable monomers as necessary. The content of the other copolymerizable monomer is usually 0 to 150 parts by mass, preferably 0 to 100 parts by mass with respect to 100 parts by mass of the silicone monomer of the present invention.
他の共重合モノマーは、共重合可能であれば何ら制限はなく、(メタ)アクリロイル基、スチリル基、アリル基、ビニル基および他の共重合可能な炭素−炭素不飽和結合を有するモノマーを使用することができる。 Other copolymerizable monomers are not limited as long as they can be copolymerized, and monomers having (meth) acryloyl group, styryl group, allyl group, vinyl group and other copolymerizable carbon-carbon unsaturated bonds are used. can do.
他の共重合モノマーとしては、例えば、(メタ)アクリル酸、イタコン酸、クロトン酸、桂皮酸、ビニル安息香酸、ホスホリルコリン(メタ)アクリレート、メチル(メタ)アクリレート、エチル(メタ)アクリレート等のアルキル(メタ)アクリレート類;ポリアルキレングリコールモノ(メタ)アクリレート、ポリアルキレングリコールモノアルキルエーテル(メタ)アクリレート、ポリアルキレングリコールビス(メタ)アクリレート、トリメチロールプロパントリス(メタ)アクリレート、ペンタエリスリトールテトラキス(メタ)アクリレート、両末端に炭素−炭素不飽和結合を有するシロキサンマクロマー等の多官能(メタ)アクリレート類;トリフルオロエチル(メタ)アクリレート、ヘキサフルオロイソプロピル(メタ)アクリレート等のハロゲン化アルキル(メタ)アクリレート類;2−ヒドロキシエチル(メタ)アクリレート、2,3−ジヒドロキシプロピル(メタ)アクリレート、グリセロール(メタ)アクリレート等の水酸基を有するヒドロキシアルキル(メタ)アクリレート類;N,N−ジメチルアクリルアミド、N,N−ジエチルアクリルアミド、N,N−ジ−n−プロピルアクリルアミド、N,N−ジイソプロピルアクリルアミド、N,N−ジn−ブチルアクリルアミド、N−アクリロイルモルホリン、N−アクリロイルピペリジン、N−アクリロイルピロリジン、N−メチル(メタ)アクリルアミド等の(メタ)アクリルアミド類;スチレン、α−メチルスチレン、ビニルピリジン等の芳香族ビニルモノマー;マレイミド類;N−ビニルピロリドン、N−ビニルカプロラクタム、N−ビニルオキサゾリドン、1−ビニルイミダゾール、N−ビニルカルバゾール、ビニルピリジン、ビニルピラジン等のヘテロ環ビニルモノマー;N−ビニルホルムアミド、N−ビニルアセトアミド、N−メチル−N−ビニルアセトアミド等のN−ビニルカルボキサミド類;酢酸ビニル等のビニルエステル類;3−[トリス(トリメチルシロキシ)シリル]プロピル(メタ)アクリレート、3−[ビス(トリメチルシロキシ)メチルシリル]プロピル(メタ)アクリレート、3−[(トリメチルシロキシ)ジメチルシリル]プロピル(メタ)アクリレート、3−[トリス(トリメチルシロキシ)シリル]プロピル(メタ)アクリルアミド、3−[ビス(トリメチルシロキシ)メチルシリル]プロピル(メタ)アクリルアミド、3−[(トリメチルシロキシ)ジメチルシリル]プロピル(メタ)アクリルアミド、[トリス(トリメチルシロキシ)シリル]メチル(メタ)アクリレート、[ビス(トリメチルシロキシ)メチルシリル]メチル(メタ)アクリレート、[(トリメチルシロキシ)ジメチルシリル]メチル(メタ)アクリレート、[トリス(トリメチルシロキシ)シリル]メチル(メタ)アクリルアミド、[ビス(トリメチルシロキシ)メチルシリル]メチル(メタ)アクリルアミド、[(トリメチルシロキシ)ジメチルシリル]メチル(メタ)アクリルアミド、[トリス(トリメチルシロキシ)シリル]スチレン、[ビス(トリメチルシロキシ)メチルシリル]スチレン、[(トリメチルシロキシ)ジメチルシリル]スチレン、N−〔3−[トリス(トリメチルシロキシ)シリル]プロピル〕カルバミン酸ビニル、N−〔3−[ビス(トリメチルシロキシ)メチルシリル]プロピル〕カルバミン酸ビニル、N−〔3−[(トリメチルシロキシ)ジメチルシリル]プロピル〕カルバミン酸ビニル等のシロキサン含有モノマーが挙げられ、好ましくは共重合性が良いことから(メタ)アクリレート類が挙げられる。 Other copolymer monomers include, for example, alkyl (meth) acrylic acid, itaconic acid, crotonic acid, cinnamic acid, vinyl benzoic acid, phosphorylcholine (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate and the like ( (Meth) acrylates; polyalkylene glycol mono (meth) acrylate, polyalkylene glycol monoalkyl ether (meth) acrylate, polyalkylene glycol bis (meth) acrylate, trimethylolpropane tris (meth) acrylate, pentaerythritol tetrakis (meth) acrylate Polyfunctional (meth) acrylates such as siloxane macromers having carbon-carbon unsaturated bonds at both ends; alkyl halides such as trifluoroethyl (meth) acrylate and hexafluoroisopropyl (meth) acrylate (meth) ) Acrylates; hydroxyalkyl (meth) acrylates having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2,3-dihydroxypropyl (meth) acrylate, glycerol (meth) acrylate; N, N-dimethylacrylamide, N , N-diethylacrylamide, N, N-di-n-propylacrylamide, N, N-diisopropylacrylamide, N, N-din-butylacrylamide, N-acryloylmorpholine, N-acryloylpiperidine, N-acryloylpyrrolidine, N (Meth) acrylamides such as methyl (meth) acrylamide; Aromatic vinyl monomers such as styrene, α-methylstyrene and vinylpyridine; Maleimides; N-vinylpyrrolidone, N-vinylcaprolactam, N-vinyloxazolidone Heterocyclic vinyl monomers such as 1-vinylimidazole, N-vinylcarbazole, vinylpyridine, and vinylpyrazine; N-vinylcarboxamides such as N-vinylformamide, N-vinylacetamide, and N-methyl-N-vinylacetamide; vinyl acetate Vinyl esters such as 3- [tris (trimethylsiloxy) silyl] propyl (meth) acrylate, 3- [bis (trimethylsiloxy) methylsilyl] propyl (meth) acrylate, 3-[(trimethylsiloxy) dimethylsilyl] propyl ( Meth) acrylate, 3- [tris (trimethylsiloxy) silyl] propyl (meth) acrylamide, 3- [bis (trimethylsiloxy) methylsilyl] propyl (meth) acrylamide, 3-[(trimethylsiloxy) dimethylsilyl] propyl (meth) Acrylic net [Tris (trimethylsiloxy) silyl] methyl (meth) acrylate, [bis (trimethylsiloxy) methylsilyl] methyl (meth) acrylate, [(trimethylsiloxy) dimethylsilyl] methyl (meth) acrylate, [tris (trimethylsiloxy) Silyl] methyl (meth) acrylamide, [bis (trimethylsiloxy) methylsilyl] methyl (meth) acrylamide, [(trimethylsiloxy) dimethylsilyl] methyl (meth) acrylamide, [tris (trimethylsiloxy) silyl] styrene, [bis (trimethyl) Siloxy) methylsilyl] styrene, [(trimethylsiloxy) dimethylsilyl] styrene, N- [3- [tris (trimethylsiloxy) silyl] propyl] vinyl carbamate, N- [3- [bis (trimethylsiloxy) methylsilyl] propyl] Cal Examples thereof include siloxane-containing monomers such as vinyl bamate and N- [3-[(trimethylsiloxy) dimethylsilyl] propyl] carbamate, and (meth) acrylates are preferable because they have good copolymerizability.
本発明の重合用組成物を重合する際は、重合をし易くするために過酸化物やアゾ化合物に代表される熱重合開始剤や、光重合開始剤を用いることが好ましい。
熱重合を行う場合は、所望の反応温度に対して最適な分解特性を有するものを選択して使用することができる。一般的には10時間半減期温度が40〜120℃のアゾ系開始剤又は過酸化物系開始剤が好適である。
光重合開始剤としては、例えば、カルボニル化合物、過酸化物、アゾ化合物、硫黄化合物、ハロゲン化合物又は金属塩が挙げられる。
これらの重合開始剤は単独又は混合して用いられ、その使用量は、重合用組成物100質量部に対して、およそ1質量部以下である。
本発明の重合用組成物は、シリコーンハイドロゲルコンタクトレンズなどの原料として好適に用いることができる。When polymerizing the polymerization composition of the present invention, it is preferable to use a thermal polymerization initiator typified by a peroxide or an azo compound or a photopolymerization initiator in order to facilitate the polymerization.
In the case of performing thermal polymerization, one having an optimum decomposition characteristic for a desired reaction temperature can be selected and used. In general, an azo initiator or a peroxide initiator having a 10-hour half-life temperature of 40 to 120 ° C. is suitable.
Examples of the photopolymerization initiator include carbonyl compounds, peroxides, azo compounds, sulfur compounds, halogen compounds, and metal salts.
These polymerization initiators are used alone or in combination, and the amount used is approximately 1 part by mass or less with respect to 100 parts by mass of the polymerization composition.
The composition for polymerization of the present invention can be suitably used as a raw material for silicone hydrogel contact lenses and the like.
以下、実施例により、本発明を具体的に説明する。
本実施例における各種測定は、以下に示す方法で行った。
〔測定方法〕
(1)プロトン核磁気共鳴スペクトル
日本電子社製のAL400型を用いて測定した。溶媒にクロロホルム−dを使用し、クロロホルムのピークを内部標準(7.26ppm)とした。
(2)高速液体クロマトグラフィー
高速液体クロマトグラフィーシステム(東ソー社製 LC−8020)を使用した。高速液体クロマトグラフィーカラムからの流出液はUV検出器とRI検出器を用いて検出した。アセトニトリル90体積%と0.05M酢酸アンモニウム水溶液10体積%を混合した液を溶離液とし、サンプルは0.5体積%の濃度でこの溶離液へ溶解し、分析に供した。高速液体クロマトグラフィー条件は下記のとおりである。
C18(オクタデシル化シリカ)カラム(15mm×4.6mm)。
(3)質量分析
Q−micro(Waters社製、ESIイオン化法)を用い、サンプルをメタノール中へ溶解させて分析を行なった。
(4)赤外線吸収スペクトル分析
FT/IR−6100(日本分光社製)を用い、ポリエチレンフィルムへサンプルを吸収させて測定を行なった。Hereinafter, the present invention will be described specifically by way of examples.
Various measurements in this example were performed by the following methods.
〔Measuring method〕
(1) Proton nuclear magnetic resonance spectrum The proton nuclear magnetic resonance spectrum was measured using AL400 type manufactured by JEOL. Chloroform-d was used as the solvent, and the peak of chloroform was used as an internal standard (7.26 ppm).
(2) High performance liquid chromatography A high performance liquid chromatography system (LC-8020 manufactured by Tosoh Corporation) was used. The effluent from the high performance liquid chromatography column was detected using a UV detector and an RI detector. A mixture of 90% by volume of acetonitrile and 10% by volume of 0.05M ammonium acetate aqueous solution was used as an eluent, and a sample was dissolved in this eluent at a concentration of 0.5% by volume and subjected to analysis. The high performance liquid chromatography conditions are as follows.
C 18 (octadecylated silica) column (15 mm × 4.6 mm).
(3) Mass spectrometry Using Q-micro (Waters, ESI ionization method), the sample was dissolved in methanol for analysis.
(4) Infrared absorption spectrum analysis Using FT / IR-6100 (manufactured by JASCO Corp.), the sample was absorbed into a polyethylene film and measured.
実施例1
冷却管、撹拌装置および滴下ロートを備えた300ml三ツ口フラスコに、前記式(8b)で示される化合物(信越化学工業社製)36.6g、1,4−ジヒドロキシベンゼン0.07g及びトリエチルアミン0.66gを入れ、ここへ窒素雰囲気下、室温で撹拌しながら式(9)で示される化合物(共栄社化学社製)50.0gを約30分間かけて滴下した。Example 1
In a 300 ml three-necked flask equipped with a condenser, a stirrer, and a dropping funnel, 36.6 g of the compound represented by the above formula (8b) (manufactured by Shin-Etsu Chemical Co., Ltd.), 0.07 g of 1,4-dihydroxybenzene and 0.66 g of triethylamine Then, 50.0 g of a compound represented by the formula (9) (manufactured by Kyoeisha Chemical Co., Ltd.) was added dropwise over about 30 minutes while stirring at room temperature under a nitrogen atmosphere.
滴下終了後撹拌しながら85℃で24時間反応を行った。一晩放置した後、ヘキサン170mlを加えて室温で2時間撹拌した。析出物をろ過で除き、ヘキサン溶液を5質量%炭酸水素ナトリウムで数回洗浄後、さらに飽和食塩水で中性になるまで洗浄した。無水硫酸ナトリウムを加えて脱水を行った後、硫酸マグネシウムを濾過で除き、ロータリーバキュームエバポレーターによって溶媒を留去した。さらに減圧下60℃で4時間かけて揮発成分を除去し、無色透明液体50.0gを得た。得られた液体をシリカゲルカラムクロマトグラフィー法(展開溶媒;ヘキサン/酢酸エチル=1/1(v/v))により分離精製し、無色透明液体を得た。
得られた液体を、プロトン核磁気共鳴スペクトルにより測定し分析した結果、6.1ppm付近(1H)、5.8ppm付近(1H)および1.9ppm付近(3H)にメタアクリロイル基由来のピーク、4.4ppm付近(4H)にO−CH2−CH2−O由来のピーク、2.6ppm付近(4H)にC(=O)−CH2−CH2−C=O由来のピーク、1.6ppm付近(2H)にC−CH2−C由来のピーク、0.5ppm付近(2H)に−CH2−Si由来のピーク、0ppm付近(21H)にSi−CH3由来のピークなどが観測された。3.7〜3.9ppm及び5.0ppm付近には式(10)の化合物に特徴的なピークが観測された。また4.0〜4.2ppm付近に式(7a)で表される化合物に由来するピークが確認された。この面積比から、式(7a)で示されるシリコーンモノマーと式(10)で示される化合物の質量比約4/1混合物であることがわかった。Reaction was performed at 85 degreeC for 24 hours, stirring after completion | finish of dripping. After leaving overnight, 170 ml of hexane was added and stirred at room temperature for 2 hours. The precipitate was removed by filtration, and the hexane solution was washed several times with 5% by mass sodium bicarbonate and further washed with saturated brine until neutral. After anhydrous sodium sulfate was added for dehydration, magnesium sulfate was removed by filtration, and the solvent was distilled off by a rotary vacuum evaporator. Further, volatile components were removed at 60 ° C. under reduced pressure for 4 hours to obtain 50.0 g of a colorless transparent liquid. The obtained liquid was separated and purified by silica gel column chromatography (developing solvent; hexane / ethyl acetate = 1/1 (v / v)) to obtain a colorless transparent liquid.
As a result of measuring and analyzing the obtained liquid by proton nuclear magnetic resonance spectrum, peaks derived from methacryloyl groups were observed at around 6.1 ppm (1H), 5.8 ppm (1H), and 1.9 ppm (3H). A peak derived from O—CH 2 —CH 2 —O around 4 ppm (4H), a peak derived from C (═O) —CH 2 —CH 2 —C═O around 1.6 ppm (4H), 1.6 ppm A peak derived from C—CH 2 —C was observed in the vicinity (2H), a peak derived from —CH 2 —Si was observed in the vicinity of 0.5 ppm (2H), and a peak derived from Si—CH 3 was observed in the vicinity of 0 ppm (21H). . Peaks characteristic of the compound of formula (10) were observed in the vicinity of 3.7 to 3.9 ppm and 5.0 ppm. Further, a peak derived from the compound represented by the formula (7a) was confirmed in the vicinity of 4.0 to 4.2 ppm. From this area ratio, it was found that the mass ratio of the silicone monomer represented by the formula (7a) and the compound represented by the formula (10) was about 4/1.
さらに、赤外線吸収スペクトル分析を行なった結果、水酸基に由来するピークが3510cm-1に、二重結合に由来するピークが1640cm-1に、メタクリルエステル結合に由来するピークが1730cm-1に、コハク酸エステルに由来するピークが1740cm-1に、Si−O−Si結合に由来するピークが1040cm-1に、メチル基に由来するピークが2960cm-1、1410cm-1、1300cm-1に、シロキサンに結合しているメチル基に由来するピークが845cm-1に検出された。また、910cm-1のエポキシ基に由来するピーク、1715cm-1のカルボン酸に由来するピークは検出されなかった。
次に高速液体クロマトグラフィーで分析したところ、単一ピークが観測された。純度は約90%であった。またESI−質量分析を行なったところ、2つの化合物の分子量はどちらも566であった。Further, as a result of infrared absorption spectrum analysis, a peak derived from a hydroxyl group was 3510 cm −1 , a peak derived from a double bond was 1640 cm −1 , a peak derived from a methacrylic ester bond was 1730 cm −1 , and succinic acid the peak 1740 cm -1 derived from an ester, the peak 1040 cm -1 derived from Si-O-Si bond, peak 2960 cm -1 derived from a methyl group, 1410 cm -1, the 1300 cm -1, attached to the siloxane A peak derived from a methyl group was detected at 845 cm −1 . Furthermore, peaks derived from the epoxy group of the 910 cm -1, a peak derived from a carboxylic acid of 1715 cm -1 was detected.
Next, when analyzed by high performance liquid chromatography, a single peak was observed. The purity was about 90%. When ESI-mass spectrometry was performed, the molecular weights of the two compounds were both 566.
実施例2
冷却管、撹拌装置および滴下ロートを備えた300ml三ツ口フラスコに、上記式(8b)で示される化合物(信越化学工業社製)36.6g、1,4−ジヒドロキシベンゼン0.07g、トリエチルアミン0.66g及び式(11)で表される化合物(共栄社化学社製)61.8gを入れ、攪拌しながら溶解させた。その後撹拌しながら85℃で24時間反応を行った。Example 2
In a 300 ml three-necked flask equipped with a condenser, a stirrer and a dropping funnel, 36.6 g of the compound represented by the above formula (8b) (manufactured by Shin-Etsu Chemical Co., Ltd.), 0.07 g of 1,4-dihydroxybenzene, 0.66 g of triethylamine And 61.8 g of a compound represented by the formula (11) (manufactured by Kyoeisha Chemical Co., Ltd.) was added and dissolved while stirring. Thereafter, the reaction was carried out at 85 ° C. for 24 hours with stirring.
一晩放置した後、ヘキサン170mlを加えて室温で2時間撹拌した。析出物をろ過で除き、ヘキサン溶液を2質量%のトリエチルアミンを溶解させたアセトニトリル溶液で数回洗浄した。無水硫酸マグネシウムを加えてヘキサン相から脱水を行った後、硫酸マグネシウムを濾過で除き、ロータリーバキュームエバポレーターによって溶媒を留去した。さらに減圧下60℃で4時間かけて揮発成分を除去し、無色透明液体35.0gを得た。得られた液体をシリカゲルカラムクロマトグラフィー法(展開溶媒;ヘキサン/酢酸エチル=2/1(v/v))により分離精製し、無色透明液体を得た。
得られた液体のプロトン核磁気共鳴スペクトルを測定し分析した結果、6.1ppm付近(1H)、5.6ppm付近(1H)および1.9ppm付近(3H)にメタアクリロイル基由来のピーク、4.2ppm付近(4H)にO−CH2−CH2−O由来のピーク、2.6ppm付近(4H)にC(=O)−CH2−CH2−C=O由来のピーク、1.5から1.9ppm付近(10H)にC−CH2−C由来のピーク、0.5ppm付近(2H)に−CH2−Si由来のピーク、0ppm付近(21H)にSi−CH3由来のピークなどが観測された。また3.9〜4.1ppm付近に式(7b)で表される化合物に由来するピークが、また3.6〜3.7ppmに式(12)で表される化合物に由来するピークが確認された。この面積比から、式(7b)の化合物と下記式で表される化合物の約4/1混合物であることがわかった。
また質量分析によると2つの化合物の分子量はどちらも620であった。After leaving overnight, 170 ml of hexane was added and stirred at room temperature for 2 hours. The precipitate was removed by filtration, and the hexane solution was washed several times with an acetonitrile solution in which 2% by mass of triethylamine was dissolved. After anhydrous magnesium sulfate was added and dehydration was performed from the hexane phase, magnesium sulfate was removed by filtration, and the solvent was distilled off by a rotary vacuum evaporator. Furthermore, volatile components were removed at 60 ° C. under reduced pressure for 4 hours to obtain 35.0 g of a colorless transparent liquid. The obtained liquid was separated and purified by silica gel column chromatography (developing solvent; hexane / ethyl acetate = 2/1 (v / v)) to obtain a colorless transparent liquid.
As a result of measuring and analyzing the proton nuclear magnetic resonance spectrum of the obtained liquid, a peak derived from a methacryloyl group was observed at around 6.1 ppm (1H), around 5.6 ppm (1H), and around 1.9 ppm (3H). A peak derived from O—CH 2 —CH 2 —O around 2 ppm (4H), a peak derived from C (═O) —CH 2 —CH 2 —C═O around 2.6 ppm (4H), from 1.5 A peak derived from C—CH 2 —C around 1.9 ppm (10H), a peak derived from —CH 2 —Si around 0.5 ppm (2H), a peak derived from Si—CH 3 around 0 ppm (21H), and the like. Observed. In addition, a peak derived from the compound represented by the formula (7b) was confirmed near 3.9 to 4.1 ppm, and a peak derived from the compound represented by the formula (12) was confirmed from 3.6 to 3.7 ppm. It was. From this area ratio, it was found that the mixture was an about 4/1 mixture of the compound of formula (7b) and the compound represented by the following formula.
According to mass spectrometry, the molecular weights of the two compounds were both 620.
実施例3
実施例1で得た式(7a)で示される化合物及び式(10)で示される化合物の約4/1混合物37.0質量部、トリス(トリメチルシロキシ)シリルプロピルメタクリレート37.5質量部、MPC 15質量部、エタノール10質量部、アゾビスイソブチロニトリル0.5質量部を混合し、相溶させた後、100℃で5時間放置することにより重合した。重合後は、透明固体が得られた。Example 3
37.0 parts by mass of a compound represented by the formula (7a) and a compound represented by the formula (10) obtained in Example 1, 37.0 parts by mass, 37.5 parts by mass of tris (trimethylsiloxy) silylpropyl methacrylate, MPC 15 parts by mass, 10 parts by mass of ethanol and 0.5 parts by mass of azobisisobutyronitrile were mixed and dissolved, and then allowed to stand at 100 ° C. for 5 hours for polymerization. After the polymerization, a transparent solid was obtained.
比較例1
メチルジ(トリメチルシロキシ)シリルプロピルグリセロールメタクリレート(SiGMA)37.0質量部、トリス(トリメチルシロキシ)シリルプロピルメタクリレート37.5質量部、MPC15質量部、エタノール10質量部、アゾビスイソブチロニトリル0.5質量部を混合し、相溶させた後、100℃で5時間放置することにより重合した。重合後は、白濁固体が得られた。Comparative Example 1
Methyldi (trimethylsiloxy) silylpropylglycerol methacrylate (SiGMA) 37.0 parts by mass, tris (trimethylsiloxy) silylpropyl methacrylate 37.5 parts by mass, MPC 15 parts by mass, ethanol 10 parts by mass, azobisisobutyronitrile 0.5 After mixing a mass part and making it compatible, it superposed | polymerized by leaving to stand at 100 degreeC for 5 hours. After the polymerization, a cloudy solid was obtained.
実施例4
実施例1で得た式(7a)で示される化合物及び式(10)で示される化合物の約4/1混合物60.0質量部と、エタノール10質量部に溶解させたMPC 40質量部を混合、攪拌したところ、相溶した。Example 4
60.0 parts by mass of the compound represented by the formula (7a) and the compound represented by the formula (10) obtained in Example 1 and 40 parts by mass of MPC dissolved in 10 parts by mass of ethanol were mixed. When they were stirred, they were compatible.
実施例5
実施例1で得た式(7a)で示される化合物及び式(10)で示される化合物の約4/1混合物60.0質量部と、エタノール8質量部、MPC 20質量部を混合、攪拌したところ、相溶した。Example 5
60.0 parts by mass of the compound represented by the formula (7a) obtained in Example 1 and the compound represented by the formula (10), 60.0 parts by mass, 8 parts by mass of ethanol, and 20 parts by mass of MPC were mixed and stirred. However, it was compatible.
比較例2
メチルジ(トリメチルシロキシ)シリルプロピルグリセロールメタクリレート(SiGMA)60.0質量部と、エタノール8質量部、MPC 20質量部を混合、攪拌したところ、沈殿物が見られた。Comparative Example 2
When 60.0 parts by mass of methyldi (trimethylsiloxy) silylpropylglycerol methacrylate (SiGMA), 8 parts by mass of ethanol and 20 parts by mass of MPC were mixed and stirred, a precipitate was observed.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010526778A JP5402934B2 (en) | 2008-08-28 | 2009-08-28 | Silicone monomer, its production method and use |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008219845 | 2008-08-28 | ||
JP2008219845 | 2008-08-28 | ||
PCT/JP2009/065036 WO2010024372A1 (en) | 2008-08-28 | 2009-08-28 | Silicone monomer and manufacturing method and usage thereof |
JP2010526778A JP5402934B2 (en) | 2008-08-28 | 2009-08-28 | Silicone monomer, its production method and use |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2010024372A1 JPWO2010024372A1 (en) | 2012-01-26 |
JP5402934B2 true JP5402934B2 (en) | 2014-01-29 |
Family
ID=41721535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010526778A Expired - Fee Related JP5402934B2 (en) | 2008-08-28 | 2009-08-28 | Silicone monomer, its production method and use |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5402934B2 (en) |
WO (1) | WO2010024372A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8481608B2 (en) | 2009-01-19 | 2013-07-09 | Nof Corporation | Silicone monomer |
JP5392186B2 (en) * | 2010-05-31 | 2014-01-22 | 日油株式会社 | Phosphorylcholine group-containing (meth) acrylate |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5455455A (en) * | 1977-10-12 | 1979-05-02 | Toyo Contact Lens Co Ltd | Contact lens |
JPS5515110A (en) * | 1978-07-15 | 1980-02-02 | Toyo Contact Lens Co Ltd | Contact lens |
JPS5622325A (en) * | 1979-07-31 | 1981-03-02 | Shin Etsu Chem Co Ltd | Production of polymerizable organopolysiloxane |
-
2009
- 2009-08-28 WO PCT/JP2009/065036 patent/WO2010024372A1/en active Application Filing
- 2009-08-28 JP JP2010526778A patent/JP5402934B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5455455A (en) * | 1977-10-12 | 1979-05-02 | Toyo Contact Lens Co Ltd | Contact lens |
JPS5515110A (en) * | 1978-07-15 | 1980-02-02 | Toyo Contact Lens Co Ltd | Contact lens |
JPS5622325A (en) * | 1979-07-31 | 1981-03-02 | Shin Etsu Chem Co Ltd | Production of polymerizable organopolysiloxane |
Also Published As
Publication number | Publication date |
---|---|
WO2010024372A1 (en) | 2010-03-04 |
JPWO2010024372A1 (en) | 2012-01-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5699931B2 (en) | Silicone monomer | |
WO2018190158A1 (en) | Polysiloxane monomer and method for producing same | |
EP3663302A1 (en) | Siloxane compound and production method for same | |
JP4882136B2 (en) | Monomer, polymer and ophthalmic lens using the same | |
JP5972090B2 (en) | Method for producing high purity (meth) acryl silicone compound | |
JP2007186709A (en) | Monomer for ophthalmic lens, polymer for ophthalmic lens, and contact lens | |
JP4144088B2 (en) | Contact lens polymer and contact lens using the same | |
JP5402934B2 (en) | Silicone monomer, its production method and use | |
JP4123648B2 (en) | Polymer and ophthalmic lens using the same | |
US8481608B2 (en) | Silicone monomer | |
JP2021088689A (en) | Siloxane compound and method for producing the same | |
JP2012017285A (en) | Silicone monomer, method of producing the same, monomer composition and polymer | |
CN113906037B (en) | Siloxane and preparation method thereof | |
EP2955208B1 (en) | Silicone compound and a use thereof | |
JP3982114B2 (en) | Monomers for ophthalmic lenses, polymers for ophthalmic lenses, and contact lenses using the same | |
JP7108558B2 (en) | Method for producing (meth)acrylic silicone compound | |
JP5526845B2 (en) | Silicone monomer | |
US11407862B2 (en) | Silicone and a method for preparing the same | |
JP5387822B2 (en) | Silicone monomer | |
JP4882137B2 (en) | Ophthalmic lens | |
WO2013098966A1 (en) | Silicone monomer and method for producing same | |
WO2023062933A1 (en) | Polysiloxane compound and method for producing same | |
JP2012007181A (en) | Monomer, polymer, and ophthalmic lens using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130723 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130829 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20131001 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131014 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |