JP5371240B2 - 配線の作製方法 - Google Patents

配線の作製方法 Download PDF

Info

Publication number
JP5371240B2
JP5371240B2 JP2007331511A JP2007331511A JP5371240B2 JP 5371240 B2 JP5371240 B2 JP 5371240B2 JP 2007331511 A JP2007331511 A JP 2007331511A JP 2007331511 A JP2007331511 A JP 2007331511A JP 5371240 B2 JP5371240 B2 JP 5371240B2
Authority
JP
Japan
Prior art keywords
droplet
graphic
wiring
region
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007331511A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008193061A5 (https=
JP2008193061A (ja
Inventor
厳 藤井
絵里香 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP2007331511A priority Critical patent/JP5371240B2/ja
Publication of JP2008193061A publication Critical patent/JP2008193061A/ja
Publication of JP2008193061A5 publication Critical patent/JP2008193061A5/ja
Application granted granted Critical
Publication of JP5371240B2 publication Critical patent/JP5371240B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP2007331511A 2006-12-27 2007-12-25 配線の作製方法 Expired - Fee Related JP5371240B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007331511A JP5371240B2 (ja) 2006-12-27 2007-12-25 配線の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006351985 2006-12-27
JP2006351985 2006-12-27
JP2007331511A JP5371240B2 (ja) 2006-12-27 2007-12-25 配線の作製方法

Publications (3)

Publication Number Publication Date
JP2008193061A JP2008193061A (ja) 2008-08-21
JP2008193061A5 JP2008193061A5 (https=) 2011-02-10
JP5371240B2 true JP5371240B2 (ja) 2013-12-18

Family

ID=39584555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007331511A Expired - Fee Related JP5371240B2 (ja) 2006-12-27 2007-12-25 配線の作製方法

Country Status (3)

Country Link
US (1) US7827521B2 (https=)
JP (1) JP5371240B2 (https=)
KR (1) KR101449969B1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5095650B2 (ja) * 2008-09-30 2012-12-12 シャープ株式会社 膜パターンとその膜パターン形成方法、及び導電膜配線、並びに電気光学装置
TW201214577A (en) * 2010-09-20 2012-04-01 E Ink Holdings Inc Manufacture method of thin-film transistor
CN102456573A (zh) * 2010-10-22 2012-05-16 元太科技工业股份有限公司 薄膜晶体管的制造方法
JP2012114157A (ja) * 2010-11-22 2012-06-14 Toshiba Corp ドロップレシピ作成方法およびデータベース作成方法
CN102117840B (zh) * 2010-12-15 2012-04-25 杭州杭鑫电子工业有限公司 一种多重金属扩散快恢复二极管及其制备方法
JP5711585B2 (ja) * 2011-03-30 2015-05-07 株式会社アドテックエンジニアリング 薄膜トランジスタの製造装置およびその製造方法、ならびにプログラム
US9349922B2 (en) * 2014-08-25 2016-05-24 Boe Technology Group Co., Ltd. Mask, mask group, manufacturing method of pixels and pixel structure
US11474441B2 (en) * 2020-06-25 2022-10-18 Canon Kabushiki Kaisha Systems and methods for generating drop patterns

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3507366B2 (ja) 1999-07-19 2004-03-15 キヤノン株式会社 記録装置および記録装置の画像データ処理方法
JP3507415B2 (ja) 2000-07-17 2004-03-15 キヤノン株式会社 記録装置および記録方法
US6890050B2 (en) * 2002-08-20 2005-05-10 Palo Alto Research Center Incorporated Method for the printing of homogeneous electronic material with a multi-ejector print head
JP2005012179A (ja) 2003-05-16 2005-01-13 Seiko Epson Corp 薄膜パターン形成方法、デバイスとその製造方法及び電気光学装置並びに電子機器、アクティブマトリクス基板の製造方法
JP4461756B2 (ja) * 2003-09-29 2010-05-12 セイコーエプソン株式会社 印刷装置、印刷方法、および印刷用プログラム
JP2005203434A (ja) * 2004-01-13 2005-07-28 Fuji Photo Film Co Ltd パターン形成方法
US20050166411A1 (en) * 2004-01-22 2005-08-04 Scorvo Sean K. Fishing system
US20050196710A1 (en) * 2004-03-04 2005-09-08 Semiconductor Energy Laboratory Co., Ltd. Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television apparatus
JP4700484B2 (ja) * 2004-12-17 2011-06-15 株式会社半導体エネルギー研究所 半導体装置の作製方法
US7687326B2 (en) * 2004-12-17 2010-03-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US7756600B2 (en) 2005-09-22 2010-07-13 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
JP5100070B2 (ja) * 2005-09-22 2012-12-19 株式会社半導体エネルギー研究所 半導体装置の作製方法

Also Published As

Publication number Publication date
US7827521B2 (en) 2010-11-02
JP2008193061A (ja) 2008-08-21
KR101449969B1 (ko) 2014-10-14
US20080160649A1 (en) 2008-07-03
KR20080061316A (ko) 2008-07-02

Similar Documents

Publication Publication Date Title
JP5371240B2 (ja) 配線の作製方法
KR101174071B1 (ko) 전자기기, 반도체장치 및 그의 제작방법
JP5463382B2 (ja) 半導体装置及びその作製方法
US7915058B2 (en) Substrate having pattern and method for manufacturing the same, and semiconductor device and method for manufacturing the same
JP5094019B2 (ja) 半導体装置の作製方法
US7756600B2 (en) Method for manufacturing semiconductor device
JP5100070B2 (ja) 半導体装置の作製方法
JP2008053582A (ja) 電子装置の製造方法
JP2006245544A (ja) パターン付基板及びその形成方法、並びに半導体装置及びその作製方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101221

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20101221

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130228

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130312

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130329

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130910

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130917

R150 Certificate of patent or registration of utility model

Ref document number: 5371240

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees