JP5326187B2 - Gas processing apparatus provided with gas pretreatment apparatus and cleaning method - Google Patents

Gas processing apparatus provided with gas pretreatment apparatus and cleaning method Download PDF

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JP5326187B2
JP5326187B2 JP2006097069A JP2006097069A JP5326187B2 JP 5326187 B2 JP5326187 B2 JP 5326187B2 JP 2006097069 A JP2006097069 A JP 2006097069A JP 2006097069 A JP2006097069 A JP 2006097069A JP 5326187 B2 JP5326187 B2 JP 5326187B2
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清也 日名
孝明 増井
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Kurita Water Industries Ltd
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Description

本発明は、ガス処理のガス前処理装置に関する。より詳しくは、含硫黄原子化合物を含有する被処理ガスの前処理を行い、該含有硫黄原子化合物を除去するガス前処理装置、並びにガス前処理装置の洗浄方法に関する。   The present invention relates to a gas pretreatment apparatus for gas treatment. More specifically, the present invention relates to a gas pretreatment device that performs pretreatment of a gas to be treated containing a sulfur-containing atomic compound and removes the contained sulfur atom compound, and a cleaning method for the gas pretreatment device.

バイオガス中やコークス炉ガス等の燃料ガス中等には含硫黄原子化合物(硫黄原子を含む化合物)が多く含まれているが、含硫黄原子化合物には毒性や強烈な悪臭を有するものが多い。このような含硫黄原子化合物として、硫化水素(HS)、メチルメルカプタン(CHSH)、硫化メチル((CHS)、二硫化メチル((CH)等が挙げられる。そして、前記含硫黄原子化合物が含まれた粗ガスは、その毒性や強烈な悪臭等のため、工場設備の腐食や化学プラントでの触媒毒や大気汚染・水質汚濁等の環境問題等をひきおこす原因になっている。 Biogas, fuel gas such as coke oven gas, and the like contain a large amount of sulfur-containing atomic compounds (compounds containing sulfur atoms), but many sulfur-containing atomic compounds have toxicity and a strong odor. Examples of such sulfur-containing atomic compounds include hydrogen sulfide (H 2 S), methyl mercaptan (CH 3 SH), methyl sulfide ((CH 3 ) 2 S), methyl disulfide ((CH 3 ) 2 S 2 ), and the like. Can be mentioned. The crude gas containing the sulfur-containing atomic compound is a cause of environmental problems such as corrosion of factory equipment, catalyst poisons in chemical plants, air pollution and water pollution due to its toxicity and strong odor. It has become.

そこで、このような物質を処理する方法として、微生物が有害物質を分解する作用を利用した生物分解による方法がある(特許文献1参照)。例えば、前記含硫黄原子化合物である硫化水素(HS)に対し、微生物としてThiobacillus属の細菌等を加えることで式(3)の生物反応が進行する。式(3)の反応は、式(1)と式(2)の二段階反応で進行する反応であり、通常の低濃度の硫化水素を処理する場合であれば式(1)と式(2)が同程度の速度で進行し、最終的には硫化水素は水溶性である硫酸(HSO)になるので、そのまま洗浄液に溶解させて反応系から取り除くこともできる。そして、このような反応に基づき前記微生物を充填層に充填した生物脱臭装置が利用されている。なお、前記微生物によってその生物活性となるpH域が異なっており、生物脱臭装置内で使用する用水はそのpH域を維持することが重要となる。 Therefore, as a method for treating such a substance, there is a method based on biodegradation utilizing the action of microorganisms decomposing harmful substances (see Patent Document 1). For example, the biological reaction of Formula (3) proceeds by adding bacteria of the genus Thiobacillus as a microorganism to hydrogen sulfide (H 2 S), which is the sulfur-containing atomic compound. The reaction of the formula (3) is a reaction that proceeds by a two-stage reaction of the formula (1) and the formula (2). When processing a normal low-concentration hydrogen sulfide, the formula (1) and the formula (2) are used. ) Proceeds at the same rate, and eventually hydrogen sulfide becomes water-soluble sulfuric acid (H 2 SO 4 ), so it can be dissolved in the washing solution as it is and removed from the reaction system. And the biological deodorization apparatus which packed the said microorganisms into the packed bed based on such reaction is utilized. In addition, the pH range which becomes the biological activity differs with the said microorganisms, It is important for the water used in a biological deodorizing apparatus to maintain the pH range.

一方、高濃度の硫化水素を微生物により生物処理する場合には、式(1)の反応が式(2)の反応に比べて過剰に進行するため、固体である硫黄(S)が生物処理塔の充填層内に多量に析出してしまう。そして、硫黄は非水溶性のため、前記生物脱臭装置内の充填剤内に残留して目詰まりを引き起こす。このような問題は、メルカプタンや硫化メチル等の他の含硫黄原子化合物を生物処理する場合でも同様に生じる。これに対して、特許文献1の図3には、生物反応を利用して伸縮性を有した担体に微生物を担持させた脱臭装置等が開示されている。伸縮性を有した微生物担体を用いることで、これに付着した硫黄や被処理ガス中の塵埃等を水洗により充填剤内から洗い落とすことで前記問題を解決しようしたものである。
特開2003−311121号公報。
On the other hand, when biological treatment of high-concentration hydrogen sulfide is performed by microorganisms, the reaction of formula (1) proceeds excessively compared to the reaction of formula (2), so that solid sulfur (S) is converted into a biological treatment tower. A large amount is deposited in the packed bed. And since sulfur is insoluble in water, it remains in the filler in the biological deodorization apparatus and causes clogging. Such a problem similarly occurs when other sulfur-containing atomic compounds such as mercaptans and methyl sulfide are biologically treated. On the other hand, FIG. 3 of Patent Document 1 discloses a deodorizing device in which a microorganism is supported on a carrier having elasticity using a biological reaction. By using a microbial carrier having elasticity, the above problem is solved by washing off sulfur adhering to the carrier or dust in the gas to be treated from the inside of the filler by washing with water.
Japanese Patent Application Laid-Open No. 2003-311121.

しかしながら、前記生物脱臭装置であっても次のような点で問題が生じてしまう。析出した硫黄分子は非水溶性であり、これを全て洗い落とすには多量の洗浄液を必要とすること、多量の洗浄液で微生物担体を洗浄するため前記微生物までが担体から洗い落とされてしまうこと、多量の洗浄液により装置内の用水が希釈されて酸性度が均一になるため前記微生物の種類によっては活性が低下してしまうこと等によって微生物の分解脱臭能力が低下するという問題である。   However, even the biological deodorization apparatus has problems in the following points. The precipitated sulfur molecules are water-insoluble, and a large amount of washing solution is required to wash out all of them, and the microorganism carrier is washed away from the carrier because a large amount of washing solution is used to wash the microorganism carrier. Since the water in the apparatus is diluted with this cleaning solution and the acidity becomes uniform, the ability to decompose and deodorize microorganisms decreases due to the decrease in activity depending on the type of the microorganisms.

そこで、本発明は、これらの技術的課題を解決し得る前記生物脱臭装置等の前処理を行うガス前処理装置、特に被処理ガスに含有された含硫黄原子化合物を処理するガス前処理装置を提供することを主目的とする。   Therefore, the present invention provides a gas pretreatment device that performs pretreatment such as the biological deodorization device that can solve these technical problems, particularly a gas pretreatment device that treats a sulfur-containing atomic compound contained in a gas to be treated. The main purpose is to provide.

本発明は、含硫黄原子化合物を含有する被処理ガスから該含硫黄原子化合物を除去するガス前処理装置と、その後続に前記被処理ガスから含硫黄原子化合物を除去するガス本処理として用いる生物処理塔を連結した装置であって、
前記被処理ガスを流通させる処理塔を有し、該処理塔の内部に、
前記被処理ガスを上方流で接触させる微生物担体と、
前記微生物担体に対して上方から散水する散水部と、
前記微生物担体を洗浄液で浸漬させる浸漬手段と、
前記微生物担体に対して下方から送風する送風部と、を有し、
前記微生物担体に対して上方から散水する散水液は、散水に使用された散水液を再び使用することと、
前記送風部で前記微生物担体に下方から送風するに際して、前記浸漬手段にて前記処理塔内の洗浄液の液面の水位を上昇下降させて変位させながら、この充填層の微生物担体を気液洗浄することを特徴とするガス前処理装置を備えるガス処理装置を提供する。
The present invention relates to a gas pretreatment device that removes a sulfur-containing atomic compound from a gas to be treated containing a sulfur-containing atomic compound, and a living body used as a gas main treatment that subsequently removes the sulfur-containing atomic compound from the gas to be treated. An apparatus that connects processing towers,
It has a processing tower for circulating the gas to be processed, and inside the processing tower,
A microbial carrier for contacting the gas to be treated in an upward flow;
A watering part for watering the microorganism carrier from above;
Immersion means for immersing the microbial carrier with a cleaning liquid;
A blowing section for blowing air from below to the microbial carrier,
The sprinkling liquid sprayed from above on the microorganism carrier is to use again the sprinkling liquid used for sprinkling ;
When the microbial carrier is blown from below by the blowing unit, the microbial carrier in the packed bed is gas-liquid washed while the level of the washing liquid in the treatment tower is raised and lowered by the immersion means and displaced. There is provided a gas treatment device comprising the gas pretreatment device characterized by the above.

本発明に備える前処理装置により、少なくとも、前記被処理ガスに含有される含硫黄原子化合物の濃度を一定の濃度以下にまで前処理することで、後続の本処理塔内の処理能力低下を防止でき、効率よくガス処理を行うことができる。また、循環式散水として散水液をガス前処理装置内で循環させることで節水に寄与するとともに、担体への微生物付着効率を高めることができる。
By the pretreatment apparatus provided for the present invention, at least the concentration of the sulfur-containing atomic compound contained in the gas to be treated is pretreated to a certain concentration or less, thereby preventing a reduction in processing capacity in the subsequent main treatment tower. Gas treatment can be performed efficiently. Further, by circulating the water spray in the gas pretreatment device as a circulating water spray, it contributes to water saving and can improve the efficiency of attaching microorganisms to the carrier.

また、本発明では、前記微生物担体を、粒径5〜40mmの充填剤に担持させるガス処理装置を提供できる。これにより、被処理ガスを通気させる際の充填剤の圧力損失を少なくするとともに取り扱いを容易にすることができる。   Moreover, in this invention, the gas processing apparatus which carries the said microorganisms carrier on the filler with a particle size of 5-40 mm can be provided. As a result, the pressure loss of the filler when the gas to be treated is vented can be reduced and the handling can be facilitated.

更に、本発明では、被処理ガスの流量を、LV(線速度:Liner Velocity)=500〜3000m/hr、SV(空間速度:Space Velocity)=1000〜3000/hrで通気させるガス処理装置を提供できる。これにより、微生物担体に被処理ガスをより効果的に接触させて、より効率的に生物処理させることができる。   Furthermore, in the present invention, a gas processing apparatus is provided in which the flow rate of the gas to be processed is vented at LV (Linear Velocity) = 500 to 3000 m / hr and SV (Space Velocity) = 1000 to 3000 / hr. it can. Thereby, a to-be-processed gas can be made to contact a microorganisms carrier more effectively, and biological treatment can be carried out more efficiently.

本発明に備える前処理装置により、前記送風部で前記微生物担体に送風するに際して、前記送風部で前記微生物担体に下方から送風するに際して、前記浸漬手段にて前記処理塔内の洗浄液の液面の水位を上昇下降させて変位させながら、この充填層の微生物担体を気液洗浄することができる。これにより、洗浄液の液面で気泡が炸裂しながら前記洗浄液の液面が変動することで、これに接する前記微生物担体全体に対して満遍なく洗浄効果を発揮することができる。
In the pretreatment device provided in the present invention, when air is blown to the microbial carrier by the blower, when the blower is blown from below to the microbial carrier, the surface of the cleaning liquid in the treatment tower is immersed by the dipping means. while displacing raises lowering the water level, the microbial support of the packed bed as possible out to the gas-liquid cleaning. Thereby, the liquid level of the cleaning liquid fluctuates while bubbles burst at the liquid level of the cleaning liquid, so that the cleaning effect can be exhibited evenly over the entire microbial carrier in contact therewith.

そして、本発明では、含硫黄原子化合物を含有する被処理ガスを流通させる処理塔を有し、
該処理塔の内部に、前記被処理ガスを上方流で接触させる微生物担体と、
前記微生物担体に対して上方から散水する散水部と、
前記微生物担体を洗浄液で浸漬させる浸漬手段と、
前記微生物担体に対して下方から送風する送風部と、を備えた前記被処理ガスから該含硫黄原子化合物を除去するガス前処理装置と、その後続に前記被処理ガスから含硫黄原子化合物を除去するガス本処理として用いる生物処理塔を連結した装置におけるガス前処理装置の洗浄方法であって、
前記微生物担体に対して上方から散水する散水液は、散水に使用された散水液を再び使用することと、
前記送風部で前記微生物担体に下方から送風するに際して、前記浸漬手段にて前記処理塔内の洗浄液の液面の水位を上昇下降させて変位させながら、この充填層の微生物担体を気液洗浄することを特徴とするガス前処理装置の洗浄方法を提供することができる。
この洗浄方法により、析出する硫黄や塵埃等による前記微生物担体の目詰まりを防止で
きるとともに、効率よくガス処理を行うことができる。
And in this invention, it has a processing tower which distribute | circulates the to-be-processed gas containing a sulfur-containing atomic compound,
A microbial carrier for bringing the gas to be treated into contact with the inside of the treatment tower in an upward flow;
A watering part for watering the microorganism carrier from above;
Immersion means for immersing the microbial carrier with a cleaning liquid;
A gas pretreatment device that removes the sulfur-containing atomic compound from the gas to be treated, and a fan that blows air from below to the microorganism carrier; and subsequently removes the sulfur-containing atomic compound from the gas to be treated. A cleaning method for a gas pretreatment device in an apparatus connected to a biological treatment tower used as a main gas treatment,
The sprinkling liquid sprayed from above on the microorganism carrier is to use again the sprinkling liquid used for sprinkling;
When the microbial carrier is blown from below by the blowing unit, the microbial carrier in the packed bed is gas-liquid washed while the level of the washing liquid in the treatment tower is raised and lowered by the immersion means and displaced. It is possible to provide a cleaning method for a gas pretreatment device.
By this cleaning method, clogging of the microbial carrier due to precipitated sulfur, dust and the like can be prevented and gas treatment can be performed efficiently.

本発明に係るガス処理装置によれば、含硫黄原子化合物を含有する被処理ガスを微生物担体により処理する際に、析出した硫黄や被処理ガス中の塵埃等を効果的に取り除くことで前記微生物担体の目詰まりを防止して被処理ガスを効率的に処理することができる。   According to the gas treatment device of the present invention, when the gas to be treated containing the sulfur-containing atomic compound is treated with the microorganism carrier, the microorganisms are effectively removed by removing the precipitated sulfur and the dust in the gas to be treated. The target gas can be efficiently processed by preventing clogging of the carrier.

以下、本発明を実施するための好適な形態について、添付図面を参照しながら説明する。なお、図面に示された実施形態は本発明の好適な実施形態を例示したものであり、これにより本発明が狭く解釈されることはない。   DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments for carrying out the invention will be described with reference to the accompanying drawings. Note that the embodiments shown in the drawings illustrate preferred embodiments of the present invention, and the present invention is not construed narrowly.

図1は、本発明に係るガス前処理装置の第1実施形態と、その後続に本処理として用いる通常の生物処理塔を連結した装置の簡略図である。なお、説明の便宜上、以下に使用する全ての図面は装置の構成を簡略化して示している。図1に示された符号1は、循環式散水の高濃度硫化水素除去用ガス前処理装置を示している。符号1´は、本処理として用いる通常の生物脱臭装置を示している。   FIG. 1 is a simplified diagram of a first embodiment of a gas pretreatment apparatus according to the present invention and an apparatus in which a normal biological treatment tower used as the main treatment is connected thereafter. For convenience of explanation, all drawings used below show a simplified configuration of the apparatus. The code | symbol 1 shown by FIG. 1 has shown the gas pre-processing apparatus for the high concentration hydrogen sulfide removal of circulation type watering. Reference numeral 1 ′ indicates a normal biological deodorization apparatus used as the main process.

まず、本実施形態に係る装置の主な構成について示す。前処理塔11は、微生物担体が充填された充填層11aと、上方から前記充填層11aへ散水する散水部11bと、前記充填層11aを浸漬する洗浄液を前処理塔11内に送水する給水口11cと、前記充填層11aに対して下方から送風する洗浄空気管11dとを備えている。そして、前記前処理塔11には循環水槽121と用水槽122の2槽が繋がっており、前記散水部11bは、前記循環水槽121から散水ポンプ13により汲み上げて充填層11aの上方から散水するものである。また、前記微生物担体の浸漬手段として、前記用水槽122の用水を洗浄ポンプ14により給水口11cから前処理塔11の下部へ給水して、充填層11aを浸漬させるものである。更に、前記洗浄空気管11dは、ブロワ15から空気を送り込んで充填層11aの下方から空気を噴出して充填層11aに付着した硫黄や塵埃等を剥離洗浄するものである。   First, the main configuration of the apparatus according to the present embodiment will be described. The pretreatment tower 11 includes a packed bed 11a filled with a microbial carrier, a sprinkling portion 11b for spraying the packed bed 11a from above, and a water supply port for feeding a cleaning solution for immersing the packed bed 11a into the pretreatment tower 11. 11c and a cleaning air pipe 11d for blowing air from below to the packed bed 11a. The pretreatment tower 11 is connected with two tanks, a circulating water tank 121 and a water tank 122, and the sprinkling part 11b is pumped from the circulating water tank 121 by a watering pump 13 and sprays water from above the packed bed 11a. It is. Moreover, as the immersing means for the microorganism carrier, the water in the water tank 122 is supplied to the lower part of the pretreatment tower 11 from the water supply port 11c by the washing pump 14, and the packed bed 11a is immersed. Further, the cleaning air pipe 11d is configured to send air from the blower 15 and eject air from the lower side of the packed bed 11a to separate and clean sulfur, dust and the like attached to the packed bed 11a.

次に、高濃度硫化水素を含有した被処理ガス(以下、「原臭」という。)の流れについて示す。原臭は、原臭ダクト16を経て前処理塔11へと送り込まれて前処理された後に、後続の生物脱臭装置1´で本処理される。原臭ダクト16では、前処理塔11内の洗浄時に洗浄水が逆流して戻ってこないように、原臭ダクト16は浸漬洗浄時の水位よりも高い位置まで立ち上げてから前処理塔11へ流入させるように設計することが望ましい(図1参照)。そして、原臭中の硫化水素濃度が低濃度である場合等では、バイパスダクト17を経由させて直接、生物脱臭装置1´に送り込んで本処理することもできる。前記バイパスダクト17は前処理塔11をバイパスするダクトであり、必ずしも設けなくてもよい。しかし、前記バイパスダクト17を設けることで、前処理塔11で洗浄中であっても、バイパスダクト17を経由させて生物脱臭装置1´でガス処理を継続できることや、2塔以上の前処理塔11を連結させた場合に1塔の本処理塔で洗浄を行いつつ、他の本処理塔でガス処理を行うこと等も可能となる。なお、本発明では、原臭の通気方向について前処理塔内を上方流に通気させることに限定するものではなく、前記微生物担体に接触するように通気できればよい。   Next, the flow of the gas to be treated (hereinafter referred to as “original odor”) containing high-concentration hydrogen sulfide will be described. The original odor is sent to the pretreatment tower 11 via the original odor duct 16 and pretreated, and then subjected to the main treatment by the subsequent biological deodorization apparatus 1 '. In the original odor duct 16, the original odor duct 16 is raised to a position higher than the water level at the time of immersion cleaning and then returned to the pretreatment tower 11 so that the washing water does not flow back and return during washing in the pretreatment tower 11. It is desirable to design it to flow in (see FIG. 1). Then, when the concentration of hydrogen sulfide in the original odor is low, the main treatment can be performed by sending the raw odor directly to the biological deodorization apparatus 1 ′ via the bypass duct 17. The bypass duct 17 is a duct that bypasses the pretreatment tower 11 and is not necessarily provided. However, by providing the bypass duct 17, the gas treatment can be continued in the biological deodorization apparatus 1 ′ via the bypass duct 17 even when the pretreatment tower 11 is being cleaned, and two or more pretreatment towers are used. When 11 is connected, it is possible to perform gas treatment in another main processing tower while washing in one main processing tower. In addition, in this invention, it does not limit to ventilating the inside of a pre-processing tower | column upwardly about the ventilation direction of an original odor, What is necessary is just to be able to ventilate so that the said microorganisms carrier may be contacted.

前処理塔11内の充填層11aは、微生物が馴着され、生育及び担持し易い担体を充填したものである。本発明で用いる微生物は、処理する含硫黄原子化合物に応じて適宜選択することができる。例えば、本実施形態のように硫化水素を処理したい場合は、Thiobacillus属の細菌を主体に生育し、メチルメルカプタン等の他の含硫黄原子化合物を処理した場合であればHyphomicrobium属やThiobacillus属等の細菌を主体に生育すればよい。なお、これらの細菌微生物に応じて生物活性となる好適なpH域が異なり、例えば、本実施形態では前記Thiobacillus属の細菌を用いるが、その好適なpH域は1.0〜3.5程度である。特に、微生物による生物反応では強酸である硫酸が生成するため(式(3)参照)、本発明に係る処理装置内の循環水系等では好適なpH域を維持するように適宜制御することが重要である。pH値を制御する方法については特に限定されないが、例えば、pH測定計18で測定したpH値に応じて、散水ドレン19から洗浄液を排水したり、循環水槽121への補給水を用水槽122から連続的又は間欠的に補充して希釈したりすることや、酸性やアルカリ性の添加剤を循環水系へ適宜添加することで制御する方法等が挙げられる。   The packed bed 11a in the pretreatment tower 11 is filled with a carrier to which microorganisms are accustomed and easy to grow and carry. The microorganism used in the present invention can be appropriately selected according to the sulfur-containing atomic compound to be treated. For example, when it is desired to treat hydrogen sulfide as in this embodiment, it grows mainly from bacteria of the genus Thiobacillus, and when treated with other sulfur-containing atomic compounds such as methyl mercaptan, the genus Hyphomicrobium or the genus Thiobacillus What is necessary is just to grow mainly in bacteria. In addition, although the suitable pH range which becomes biological activity differs according to these bacterial microorganisms, for example, in this embodiment, the bacteria of the said Thiobacillus genus are used, The suitable pH range is about 1.0-3.5. is there. In particular, since sulfuric acid, which is a strong acid, is produced in a biological reaction by microorganisms (see formula (3)), it is important to appropriately control so as to maintain a suitable pH range in a circulating water system or the like in the treatment apparatus according to the present invention. It is. The method for controlling the pH value is not particularly limited. For example, according to the pH value measured by the pH meter 18, the cleaning liquid is drained from the watering drain 19, or makeup water to the circulating water tank 121 is supplied from the water tank 122. For example, a method of replenishing and diluting continuously or intermittently, a method of controlling by appropriately adding an acidic or alkaline additive to the circulating water system, and the like can be mentioned.

また、充填層11aに充填される微生物を担持させる担体について特に限定されないが、好適には、水に浸漬した場合に浮上しないこと、空気洗浄により磨耗しないこと等の性質を備える担体が望ましい。そして、担体の大きさについても特に限定はされないが、好適には、粒径が5〜40mm、更に好ましくは15〜25mmである。このような担体の大きさとすることで、原臭を通気させる際の充填層11aの圧力損失を低減できるとともに、取り扱いも容易となるためである。このような担体の一例として、合成樹脂やセラミックからなる多孔質の担体等が挙げられる。   Further, the carrier for supporting the microorganism filled in the packed bed 11a is not particularly limited, but preferably a carrier having properties such as not floating when immersed in water and not being worn by air washing is desirable. The size of the carrier is not particularly limited, but preferably the particle size is 5 to 40 mm, more preferably 15 to 25 mm. This is because by setting the size of the carrier as described above, the pressure loss of the packed bed 11a when the original odor is passed can be reduced, and the handling becomes easy. An example of such a carrier is a porous carrier made of synthetic resin or ceramic.

前記微生物担体の前記浸漬手段は、該用水槽122に接続された洗浄ポンプ14により前記給水口11cから前処理塔11内部の下部へ洗浄液を給水し、充填層11aの下方から浸漬するものであるが、本発明では、浸漬手段として洗浄液を下方から給水することに限定するものではない。例えば、上方からの散水に用いた散水液を洗浄液として利用することもできる。   The immersing means for the microbial carrier is to supply the cleaning liquid from the water supply port 11c to the lower part inside the pretreatment tower 11 by the cleaning pump 14 connected to the water tank 122, and immerse it from below the packed bed 11a. However, the present invention is not limited to supplying the cleaning liquid from below as the dipping means. For example, a water spray used for water spraying from above can be used as a cleaning liquid.

そして、前処理塔11内の散水部11bは、充填層11a内の微生物が乾燥して死滅しないためや、該微生物の生物反応によって生成する硫酸(又は亜硫酸やチオ硫酸)等を充填層から洗い流すために散水するものである。更に、前記充填層11aの上方から散水した水は前処理塔11下部へと流れていくが、電磁弁等によって循環水槽121へ送水したり、そのまま散水ドレン19へ送水して外部へ排水することもできる。また、散水ドレン等に担体トラップ20を設けることで充填層11aから剥がれ落ちた担体等を回収することもできる。そして、循環水槽121へ送水された散水は再び散水ポンプ13によって散水部11bで散水に用いられる(循環式散水)。本実施形態のように低pH域が生物活性となる微生物を用いる場合には、前記循環式散水とすることで生物反応により生成する硫酸(HSO)等も系内で循環するためpH値の維持に好適であることや(式(3)参照)、系外からの給水に含まれるカルシウムや鉄分等のスケール成分が装置内で析出し難いため装置の配管詰まりが生じにくいこと等の利点がある。しかし、本発明では、本実施形態のような循環式散水に限定するものではなく、一度散水に使用された水をそのまま排水する一過式散水であってもよい。 The watering part 11b in the pretreatment tower 11 is used to wash away sulfuric acid (or sulfurous acid or thiosulfuric acid) generated by the biological reaction of the microorganism from the packed bed because the microorganisms in the packed bed 11a are not dried and killed. It is intended to sprinkle water. Further, the water sprayed from above the packed bed 11a flows to the lower part of the pretreatment tower 11, but is sent to the circulating water tank 121 by a solenoid valve or the like, or is directly sent to the water spray drain 19 to be discharged outside. You can also. Further, by providing the carrier trap 20 in the watering drain or the like, it is possible to collect the carrier and the like that have been peeled off from the packed bed 11a. And the sprinkling water sent to the circulating water tank 121 is again used for sprinkling by the sprinkling pump 13 in the sprinkling part 11b (circulating watering). In the case of using a microorganism whose biological activity is low in the low pH range as in this embodiment, sulfuric acid (H 2 SO 4 ) and the like produced by a biological reaction is circulated in the system by using the circulating water sprinkler. It is suitable for maintaining the value (see formula (3)), scale components such as calcium and iron contained in water supplied from outside the system are not easily deposited in the device, and the piping of the device is not easily clogged. There are advantages. However, in this invention, it is not limited to the circulation type watering like this embodiment, The transient watering which drains the water once used for watering as it is may be sufficient.

前処理塔11内の給水口11cから洗浄液を給水して微生物担体を浸漬させる浸漬手段と、前記微生物担体へ送風する送風部11dは、充填層11aに付着した硫黄や塵埃等の目詰まり物質を除去するために洗浄液に浸漬された充填層11aを下方から曝気することにより気液洗浄を行うものである。例えば、洗浄ポンプ13により洗浄用水を給水口11cから前処理塔内に給水して、前記微生物担体の充填層11aを浸漬させる。続いて、装置内の下方向からブロワ15により空気を微生物担体へ送風することで前記微生物担体を曝気して目詰まり物質を剥離する。なお、前記洗浄空気は、洗浄する充填層11bに均一に流れるように、前処理塔11の下方から流入させればよく、その方法は特に限定されないが、例えば、直径1mm〜5mm程度の穴を開けた洗浄空気管や送風盤や送風用チューブ等を前処理塔11の下部全体に配置することができる(図1参照)。また、本発明では、洗浄用の空気を送風する手段はブロワに限定するものではなく、例えば、コンプレッサー等によって送風することもできる。   The dipping means for supplying the cleaning liquid from the water supply port 11c in the pretreatment tower 11 and immersing the microbial carrier, and the blower unit 11d for blowing air to the microbial carrier include clogging substances such as sulfur and dust adhering to the packed bed 11a. Gas-liquid cleaning is performed by aerating the filling layer 11a immersed in the cleaning liquid from below to remove it. For example, cleaning water is supplied from the water supply port 11c into the pretreatment tower by the cleaning pump 13, and the packed bed 11a of the microorganism carrier is immersed therein. Subsequently, air is blown from the lower side of the apparatus to the microbial carrier by the blower 15 to aerate the microbial carrier to remove the clogging substance. The cleaning air may be introduced from below the pretreatment tower 11 so as to uniformly flow into the packed bed 11b to be cleaned, and the method is not particularly limited. For example, holes having a diameter of about 1 mm to 5 mm are formed. An opened cleaning air pipe, blower board, blower tube, and the like can be arranged in the entire lower portion of the pretreatment tower 11 (see FIG. 1). In the present invention, the means for blowing cleaning air is not limited to the blower, and for example, it can be blown by a compressor or the like.

更に、本発明では、前記気液洗浄の手順について、前処理塔内の洗浄液が満水になってから気液洗浄を開始すること等に限定するものではない。好適には前記微生物担体に送風するに際して、前記処理塔内の洗浄液の水位を変位させながら送風することがより好適である。気液洗浄では前記気液洗浄は洗浄液の液面で散気による気泡が炸裂することで微生物担体の洗浄効果を増大させることができるが、洗浄液の給水中や排水中等であれば液面は上昇又は下降しているので充填層に満遍なく前記気泡が炸裂することになるからである。例えば、本実施形態では、洗浄液を給水しながら、あるいは一旦満水とした後に排水しながら空気洗浄することがより好適である。また、図示はしないが、充填層が処理塔内で上下動する機能を付与しておけば、洗浄液の水位が一定の場合でも、前記充填層を上下動させながら気液洗浄することもできる。   Furthermore, in the present invention, the gas-liquid cleaning procedure is not limited to starting the gas-liquid cleaning after the cleaning liquid in the pretreatment tower is full. Preferably, when blowing air to the microorganism carrier, it is more preferable to blow air while displacing the water level of the cleaning liquid in the processing tower. In the gas-liquid cleaning, the gas-liquid cleaning can increase the cleaning effect of the microorganism carrier by bursting air bubbles on the surface of the cleaning liquid, but the liquid level will rise if the cleaning liquid is being supplied or drained. Alternatively, since the air bubbles are descending, the bubbles burst in the packed bed evenly. For example, in the present embodiment, it is more preferable to perform air cleaning while supplying the cleaning liquid or once draining the water after the water is full. Although not shown, if the packed bed is given a function of moving up and down in the processing tower, gas-liquid cleaning can be performed while moving the packed bed up and down even when the water level of the cleaning liquid is constant.

また、循環している前記洗浄液に硫黄や塵埃等が多く含まれている場合には散水ドレン19により系外へ排水し、新たに用水槽122から循環水槽121へと給水することもできる。あるいは、通常運転時の散水ドレン水を貯留しておいて、該散水ドレン水を洗浄時の給水に再利用することもできる。これにより、洗浄時に前処理塔11内の充填層11aに保持された脱臭微生物が完全に剥がれおちてそのまま排水されてしまうことが防止できる。なお、前記用水槽122の水は、前処理塔11内の洗浄用と、循環水槽121への補給用との両方に使用することができるが、必要に応じて、洗浄用水槽と補給用水槽とに分離して設置してもよい。また、本発明では、処理塔からどのように外部へ排水するかについて特に限定されないが、好適には、貯留されている汚染水を偏りなく排水できるようなトラフ構造にすることが望ましい。   Further, when the circulating cleaning liquid contains a large amount of sulfur, dust, etc., it can be drained out of the system by the watering drain 19 and newly supplied from the water tank 122 to the circulating water tank 121. Or the water spray drain water at the time of a normal driving | operation can be stored, and this water spray drain water can also be reused for the water supply at the time of washing | cleaning. Thereby, it can prevent that the deodorizing microorganisms hold | maintained at the packed bed 11a in the pretreatment tower 11 at the time of washing | cleaning completely fall off, and are drained as it is. The water in the water tank 122 can be used both for cleaning in the pretreatment tower 11 and for supplying water to the circulating water tank 121. If necessary, the water tank for cleaning and the water tank for supplying water are used. You may install separately. In the present invention, the drainage from the processing tower to the outside is not particularly limited, but preferably a trough structure that can drain the stored contaminated water evenly is desirable.

なお、本発明では、前記気液洗浄の実施頻度についても限定するものではない。本発明に係るガス処理装置の規模や使用環境等に応じて異なるが、例えば、1回/週〜1回/年程度で定期的に行ってもよい。あるいは、処理塔内の通気圧力損失を定期的に測定して、圧力損失値が一定値(例えば、1kPa等)に達した場合に気液洗浄してもよい。   In the present invention, the frequency of the gas-liquid cleaning is not limited. For example, the gas treatment apparatus according to the present invention may be performed periodically, for example, once a week to once a year, although it varies depending on the scale, usage environment, and the like. Alternatively, the aeration pressure loss in the processing tower may be measured periodically, and gas-liquid cleaning may be performed when the pressure loss value reaches a certain value (for example, 1 kPa).

本発明に係るガス前処理装置では、原臭に含有されている高濃度の含硫黄原子化合物を一定の濃度以下にまで軽減させる前処理を行うことができる。そして、前処理された原臭に残存する含硫黄原子化合物を後続の本処理装置(生物処理塔1´)で完全に処理することができる。原臭に含有される含硫黄原子化合物の含有濃度については特に限定するものではないが、好適には、50ppm(容量比)以上、更に望ましくは100ppm(容量比)以上であり、1000ppm(容量比)以下であることが望ましい。50ppm(容量比)以下の濃度であれば通常の生物脱臭塔だけで処理可能な濃度であり、1000ppm(容量比)以上の濃度であれば本発明に係る前処理塔11を大型化したり、前処理として他の装置を連結したりする必要があるからである。   In the gas pretreatment apparatus according to the present invention, it is possible to perform a pretreatment for reducing the high-concentration sulfur-containing atomic compound contained in the original odor to a certain concentration or less. Then, the sulfur-containing atomic compound remaining in the pretreated raw odor can be completely treated by the subsequent treatment apparatus (biological treatment tower 1 ′). The content concentration of the sulfur-containing atomic compound contained in the original odor is not particularly limited, but is preferably 50 ppm (volume ratio) or more, more preferably 100 ppm (volume ratio) or more, and 1000 ppm (volume ratio). It is desirable that If the concentration is 50 ppm (volume ratio) or less, the concentration can be treated only with a normal biological deodorization tower. If the concentration is 1000 ppm (volume ratio) or more, the pretreatment tower 11 according to the present invention can be enlarged, This is because it is necessary to connect other devices as processing.

また、本発明では、原臭の対象については特に限定されないが、好適には、硫化水素やメチルメルカプタン等のような下水処理場やし尿処理場で発生する臭気成分を含有する気体であり、このような処理場で発生する原臭のTOC濃度(全有機炭素濃度:Total Organic Carbon)が50ppm以下、更に望ましくは10ppm以下である気体である。なお、このような濃度であれば、生物脱臭装置において有機成分を微生物が栄養として取り入れたことによる汚泥成分が発生せず、該汚泥成分が前記微生物担体に付着して処理装置が閉塞する問題は生じない。   Further, in the present invention, the target of the original odor is not particularly limited, but is preferably a gas containing an odor component generated in a sewage treatment plant or human waste treatment plant such as hydrogen sulfide or methyl mercaptan. The TOC concentration (total organic carbon concentration) of the original odor generated in such a treatment plant is 50 ppm or less, more desirably 10 ppm or less. In such a concentration, the biological deodorization apparatus does not generate a sludge component due to the microorganisms taking in organic components as nutrients, and the sludge component adheres to the microbial carrier and the treatment device is blocked. Does not occur.

そして、後続の本処理装置は特に限定されないが、生物脱臭塔であることが望ましい。該生物脱臭塔には、高濃度の含硫黄原子化合物を含有する原臭を直接通気させた場合には該生物処理塔の内部に多量の硫黄が析出する問題があるからである。従って、このような生物脱臭塔の前処理として本発明に係るガス前処理装置を用いることで、硫黄や塵埃による目詰まりを防止して原臭の継続的処理、安定化、処理装置の故障防止等に寄与できる。   And although this subsequent processing apparatus is not specifically limited, It is desirable that it is a biological deodorization tower. This is because the biological deodorization tower has a problem that a large amount of sulfur is deposited inside the biological treatment tower when an original odor containing a high concentration of sulfur-containing atomic compound is directly ventilated. Therefore, by using the gas pretreatment device according to the present invention as pretreatment of such a biological deodorization tower, clogging due to sulfur and dust is prevented, and the original odor is continuously treated and stabilized, and the failure of the treatment device is prevented. Can contribute.

図2は、本発明に係るガス処理装置の第2実施形態の簡略図である。図2に示された符号2は、一過式散水の高濃度硫化水素除去用ガス前処理装置を示している。   FIG. 2 is a simplified diagram of a second embodiment of a gas processing apparatus according to the present invention. The code | symbol 2 shown by FIG. 2 has shown the gas pre-processing apparatus for the high concentration hydrogen sulfide removal of a transient watering.

まず、本実施形態に係る装置の主な構成について示す。前処理塔21は、微生物担体が充填された充填層21aと、上方から前記充填層21aへ散水する散水管21bと、前記充填層21aを浸漬する洗浄液を前処理塔内に送水する洗浄液管21cと、前記充填層21aに対して下方から送風する洗浄空気管21dとからなっている。前記散水管21bは、用水槽22から散水ポンプ23により汲み上げて充填層21aの上方から散水するものである。また、前記微生物担体の浸漬手段は、用水槽22の用水を洗浄ポンプ24によって洗浄液管21cから洗浄液を供給して充填層21aを浸漬するものである。更に、ブロワ24によって洗浄空気管21dから空気を噴出して充填層21aに付着した硫黄や塵埃等を剥離洗浄するものである。以下、本発明に係る第1実施形態と相違する点を強調して説明する。   First, the main configuration of the apparatus according to the present embodiment will be described. The pretreatment tower 21 includes a packed bed 21a filled with a microorganism carrier, a water spray pipe 21b for spraying water from above into the packed bed 21a, and a cleaning liquid pipe 21c for feeding a cleaning liquid for immersing the packed bed 21a into the pretreatment tower. And a cleaning air pipe 21d for blowing air from below to the packed bed 21a. The watering pipe 21b is pumped from the water tank 22 by a watering pump 23 and sprays water from above the packed bed 21a. The microbial carrier immersing means immerses the filling layer 21a by supplying cleaning water from the cleaning liquid pipe 21c to the water in the water tank 22 by the cleaning pump 24. Further, the blower 24 ejects air from the cleaning air pipe 21d to peel and clean the sulfur, dust and the like adhering to the packed bed 21a. Hereinafter, points different from the first embodiment according to the present invention will be described with emphasis.

前処理塔21内の散水部21bは、用水槽22の用水を散水用水として使用して、散水後はこれをそのまま排水ドレン29から排出する一過式散水である。なお、本実施形態では、用水槽22の用水を用いているが、別途散水用水の貯留槽を設けてもよい。更に、本発明では用水槽22への補給水について特に限定するものではない。例えば、他の排水処理設備の二次処理水、砂ろ過水、工業用水等のような中水を補給水とすることもできる。ところが、前述のように、これらの水には配管詰まりの原因となるスケール成分が多く含まれる場合がある。しかし、これら中水へのスケール防止剤の添加や装置内配管への磁気処理等の適切な処理を行えば、本発明に係るガス処理装置で有効に使用することができる。   The watering part 21 b in the pretreatment tower 21 is a transient watering that uses the water in the water tank 22 as watering water and discharges it directly from the drainage drain 29 after watering. In addition, in this embodiment, although the water for the water tank 22 is used, you may provide the water storage water storage tank separately. Furthermore, in the present invention, there is no particular limitation on the makeup water supplied to the water tank 22. For example, secondary water from other wastewater treatment facilities, sand filtered water, industrial water and the like can be used as makeup water. However, as described above, there are cases where these waters contain a lot of scale components that cause clogging of piping. However, if an appropriate treatment such as addition of a scale inhibitor to the intermediate water or magnetic treatment to the piping in the apparatus is performed, the gas treatment apparatus according to the present invention can be used effectively.

また、本発明のガス処理装置により、含硫黄原子化合物のなかでも硫化メチルや二硫化メチル等を処理したい場合には、本実施形態のような一過式散水のガス処理装置が好適である。硫化メチルや二硫化メチルのような、硫化水素やメルカプタン以外の含硫黄原子化合物を分解するThiobacillus属等の細菌は、中性付近のpH値で活性となるものが多いからである。即ち、前記細菌に対する散水を循環系散水(図1参照)で行えば、自らの生物反応により生成する硫酸(HSO)等の酸性物質も系内で循環するため、系内のpH値が低くなりすぎてしまう(式(2)等参照)。なお、本実施形態に係るガス処理装置2では、排水ドレン29中に設けたpH測定計28で測定して、その値に応じて用水槽22からの給水や、散水用水への中和剤の投与等を行うことで好適なpH値に維持・制御することができる。 In addition, when it is desired to treat methyl sulfide, methyl disulfide, or the like among sulfur-containing atomic compounds by the gas treatment apparatus of the present invention, the gas treatment apparatus for transient watering as in this embodiment is suitable. This is because many bacteria such as Thiobacillus that degrade sulfur-containing atomic compounds other than hydrogen sulfide and mercaptans, such as methyl sulfide and methyl disulfide, are active at pH values near neutral. That is, if water is sprayed on the bacteria by circulating water (see FIG. 1), acidic substances such as sulfuric acid (H 2 SO 4 ) produced by its own biological reaction also circulate in the system. Becomes too low (see equation (2), etc.). In addition, in the gas treatment apparatus 2 which concerns on this embodiment, it measures with the pH measuring meter 28 provided in the drainage drain 29, According to the value, the water supply from the water tank 22 or the neutralizing agent to the water for watering It can be maintained and controlled at a suitable pH value by administration and the like.

図3は、本発明に係るガス処理装置の第3実施形態の簡略図である。図3に示された符号3は、前処理用の充填層と、本処理用の充填層とを処理塔内に備えた一過式散水の高濃度硫化水素除去用ガス処理装置を示している。   FIG. 3 is a simplified diagram of a third embodiment of a gas processing apparatus according to the present invention. The code | symbol 3 shown by FIG. 3 has shown the gas treatment apparatus for the high concentration hydrogen sulfide removal of the temporary watering provided with the packed bed for pre-processing, and the packed bed for this processing in the processing tower. .

まず、本実施形態に係る主な構成について示す。処理塔31は、微生物担体が充填された前処理充填層31aと、本処理充填層31a´と、処理塔の上方から前記充填層31a、31a´へ散水する散水管31bと、前記前処理充填層31aを浸漬する洗浄液を処理塔内に送水する洗浄用洗浄液管31cと、前記前処理充填層31aを下方から送風する洗浄空気管31dとからなっている。そして、本実施形態に係るガス処理装置は、前処理充填層31aの微生物担体によって一段階処理を行い、その上方に設けられた本処理充填層31a´で二段階処理を行う一体型ガス処理装置である。具体的には、原臭に含有される含硫黄原子化合物の濃度を前処理充填層31aで低濃度にまで処理し、本処理充填層31a´で残存する含硫黄原子化合物等を完全に処理するものである。また、少なくとも前処理充填層31aでは、洗浄液管31cからの洗浄液と洗浄空気管31dからの送風により洗浄が可能である。以下、本発明に係る第1実施形態及び第2実施形態と相違する点を強調して説明する。   First, a main configuration according to the present embodiment will be described. The treatment tower 31 includes a pretreatment packed bed 31a filled with a microorganism carrier, a main treatment packed bed 31a ′, a water spray pipe 31b for spraying the packed beds 31a and 31a ′ from above the treatment tower, and the pretreatment filling. A cleaning liquid pipe 31c for feeding a cleaning liquid for immersing the layer 31a into the processing tower and a cleaning air pipe 31d for blowing the pretreatment packed bed 31a from below are provided. And the gas processing apparatus which concerns on this embodiment performs the one-step process with the microorganisms carrier of the pre-processing packed bed 31a, and the integrated gas processing apparatus which performs a two-stage process with this processing packed bed 31a 'provided thereabove It is. Specifically, the concentration of the sulfur-containing atomic compound contained in the original odor is processed to a low concentration in the pretreatment packed bed 31a, and the remaining sulfur-containing atomic compound and the like are completely processed in the treated packed bed 31a ′. Is. Further, at least the pretreatment packed bed 31a can be cleaned by the cleaning liquid from the cleaning liquid pipe 31c and the blown air from the cleaning air pipe 31d. Hereinafter, points different from the first embodiment and the second embodiment according to the present invention will be described with emphasis.

なお、本発明では、充填層の数について2連に限定するものではない。図示はしないが、例えば、処理塔内に3連の充填層を設け最下部と中間の充填層には硫化水素を分解する微生物を充填し、最上部の充填層にはアンモニア等を分解する微生物を担持させておくこともできる。そして、前記処理塔へ高濃度硫化水素とアンモニア等の含硫黄原子化合物とが含有された原臭を上向流に通気させる。これにより、本処理塔の最下部の充填層では高濃度硫化水素を前処理し、その次の充填層では低濃度になった硫化水素の本処理を行い、その次の充填層ではアンモニア等の含窒素化合物の処理もできる処理塔とすることができる。即ち、本発明では、ガス処理塔の内部に、前記原臭に接触させる微生物担体が充填された充填層を二以上有するガス処理装置とすることもできる。このような充填層の一体化により、設置コストや維持コストを抑えた簡易的なガス処理装置として利用できるし、含硫黄原子化合物以外の有毒ガスも混合している原臭を同一塔内で処理することもできる。   In the present invention, the number of packed beds is not limited to two. Although not shown, for example, a triple packed bed is provided in the processing tower, and the bottom and middle packed beds are filled with microorganisms that decompose hydrogen sulfide, and the upper packed bed is a microorganism that decomposes ammonia and the like. Can also be supported. Then, an original odor containing high-concentration hydrogen sulfide and a sulfur-containing atomic compound such as ammonia is passed through the treatment tower in an upward flow. As a result, the high-concentration hydrogen sulfide is pretreated in the bottom packed bed of the treatment tower, the low-concentration hydrogen sulfide is pretreated in the next packed bed, and ammonia and the like are treated in the next packed bed. It can be set as the processing tower which can also process a nitrogen-containing compound. That is, in the present invention, a gas processing apparatus having two or more packed beds filled with a microbial carrier to be brought into contact with the original odor can be provided inside the gas processing tower. By integrating such a packed bed, it can be used as a simple gas treatment device with reduced installation and maintenance costs, and the raw odor mixed with toxic gases other than sulfur-containing atomic compounds is treated in the same tower. You can also

前記散水部31bは、前処理充填層31aと本処理充填層31a´の上方にそれぞれ設けられているが、本発明では散水部を複数箇所に設けることに限定するものではない。即ち、散水部を本処理充填層31a´の上方にのみ設ける簡易的なガス処理装置とすることも可能である。これによって、本処理充填層31a´への散水を行うことで、必然的に本処理充填層31a´の下部に設けられた前処理充填層31aへの散水も同時に行うことができるからである。   The water sprinkling part 31b is provided above the pretreatment filling layer 31a and the main treatment filling layer 31a ′, but the present invention is not limited to providing the watering parts at a plurality of locations. That is, it is also possible to provide a simple gas treatment device in which the water sprinkling part is provided only above the treatment packed bed 31a ′. This is because by spraying the main treatment packed bed 31a ′, it is inevitably possible to simultaneously spray the pretreatment packed bed 31a provided below the main processing packed bed 31a ′.

次に、原臭の流れについて示す。原臭は、原臭ダクト36を経て本処理塔31の下部へ送りこまれて前処理充填層31aにて前処理された後に、本処理充填層31a´にて本処理されて排気される。また、硫化水素が低濃度の場合等には、バイパスダクト371を経て本処理充填層31a´へ直接送り込んで本処理だけを行うこともできる。あるいは、本処理すらも行わずにバイパスダクト372を経て排気することもできる。従って、図示はしないが、原臭ダクトの入り口にガス検知装置や分析装置を設置し、原臭の種類や濃度といった分析結果に応じて各ダクトの開閉弁と連動させる自動制御とすることも可能である。   Next, the flow of the original odor is shown. The original odor is sent to the lower part of the main processing tower 31 through the original odor duct 36 and pretreated in the pretreatment packed bed 31a, and then main processed in the main treatment packed bed 31a ′ and exhausted. Further, when hydrogen sulfide has a low concentration or the like, it is possible to perform only the main processing by directly sending it to the main processing packed bed 31a ′ via the bypass duct 371. Alternatively, the exhaust can be performed through the bypass duct 372 without even performing this process. Therefore, although not shown, a gas detector and analyzer can be installed at the entrance of the original odor duct, and automatic control linked to the open / close valve of each duct according to the analysis result such as the type and concentration of the original odor is possible. It is.

ここで、本発明の効果を確かめることを目的に実験を行った。具体的には、本発明に係る高濃度硫化水素除去用ガス処理装置に関して、硫化水素除去能力、循環水の効果、微生物担体の洗浄効果、処理効果の持続性、担体の粒径の影響、LVの影響、SVの影響について検証することを目的として実験を行った。   Here, an experiment was conducted for the purpose of confirming the effect of the present invention. Specifically, regarding the gas treatment apparatus for removing high-concentration hydrogen sulfide according to the present invention, the ability to remove hydrogen sulfide, the effect of circulating water, the washing effect of the microorganism carrier, the sustainability of the treatment effect, the influence of the particle size of the carrier, LV An experiment was conducted for the purpose of verifying the influence of the SV and the influence of the SV.

実験1の手法・条件は次のようにして行った。本発明に係る高濃度硫化水素除去用ガス前処理装置(以下、「前処理装置」という。)の後続に従来の生物脱臭装置(以下、「本処理装置」という。)を連結したガス処理装置を使用した。そして、RUN1とRUN2の処理装置を用いて実験を行った(表1参照)。具体的には、本発明に係る前処理装置として、循環式散水の前処理装置(RUN1、図1参照)と一過式散水の前処理装置(RUN2、図2参照)とを使用し、比較検討した。また、本実験では、高濃度硫化水素を含有した混合ガスを原臭として使用した。該原臭の流量は、硫化水素濃度が平均値120ppm、最大値520ppm、最小値0ppmを維持するようにして各前処理装置へ供給した。   The method and conditions of Experiment 1 were as follows. A gas treatment apparatus in which a conventional biological deodorization apparatus (hereinafter referred to as “the present treatment apparatus”) is connected to a gas pretreatment apparatus for removing high-concentration hydrogen sulfide (hereinafter referred to as “pretreatment apparatus”) according to the present invention. It was used. And it experimented using the processing apparatus of RUN1 and RUN2 (refer Table 1). Specifically, as a pretreatment device according to the present invention, a circulating watering pretreatment device (RUN1, see FIG. 1) and a transient watering pretreatment device (RUN2, see FIG. 2) are used for comparison. investigated. In this experiment, a mixed gas containing high-concentration hydrogen sulfide was used as the original odor. The flow rate of the original odor was supplied to each pretreatment apparatus so that the hydrogen sulfide concentration was maintained at an average value of 120 ppm, a maximum value of 520 ppm, and a minimum value of 0 ppm.

また、RUN1、RUN2の前処理は表2に示す条件で行い、本処理は表3に示す条件で行った。   Further, pre-processing of RUN1 and RUN2 was performed under the conditions shown in Table 2, and this processing was performed under the conditions shown in Table 3.

<硫化水素除去能力> <Hydrogen sulfide removal capability>

本発明に係る前処理装置において硫化水素除去能力について次の評価手順によって検討した。RUN1、RUN2において前処理が終了した後の被処理ガスを採取して硫化水素濃度を測定し、その平均値を求めた。なお、硫化水素の除去率は数1の数式によって評価した。   In the pretreatment apparatus according to the present invention, the hydrogen sulfide removal capability was examined by the following evaluation procedure. The gas to be treated after the pretreatment in RUN1 and RUN2 was collected, the hydrogen sulfide concentration was measured, and the average value was obtained. In addition, the removal rate of hydrogen sulfide was evaluated by the numerical formula of Formula 1.

その結果、RUN1では前処理後の硫化水素濃度平均値が24ppm(除去率80%)、RUN2では前処理後の硫化水素濃度平均値が21ppm(除去率83%)となった。従って、本発明に係る前処理装置を用いることでRUN1、RUN2ともに高い硫化水素除去能を有することが示された。   As a result, the hydrogen sulfide concentration average value after pretreatment was 24 ppm (removal rate 80%) in RUN1, and the hydrogen sulfide concentration average value after pretreatment was 21 ppm (removal rate 83%) in RUN2. Therefore, it was shown that both RUN1 and RUN2 have high hydrogen sulfide removal ability by using the pretreatment apparatus according to the present invention.

<循環水の効果>   <Effect of circulating water>

本発明に係る前処理装置において循環式散水とした場合の循環水の効果について次の評価手順によって検討した。RUN1とRUN2において稼動開始から23日目と29日目の各前処理装置の圧力損失値をそれぞれ測定して、この期間の圧力損失の上昇値について比較した。また、RUN1とRUN2とでは、被処理ガスのLVが異なるため期間中の硫黄付加当たりの圧力損失を求めてそれぞれ比較した。その結果を表4に示す。その結果、本発明における循環水の効果によって、23日〜29日間の圧力損失の上昇が約1/4〜1/5に軽減できることが確認された(表4;RUN1:0.03mmAq/m/g−S参照、RUN2:0.13mmAq/m/g−S)。なお、循環水を利用しているRUN1において前処理装置の内壁面を目視で観察したところ、該内壁面への硫黄の付着が抑制されることも確認された。従って、本発明に係る前処理装置では循環式散水とすることで、担体への生物付着効率を高めるとともに、充填層の圧量損失の上昇を抑えるともに、脱臭塔壁面への硫黄の付着も抑えられることが示された。   In the pretreatment apparatus according to the present invention, the effect of circulating water in the case of circulating watering was examined by the following evaluation procedure. In RUN1 and RUN2, the pressure loss values of the respective pretreatment devices on the 23rd and 29th days from the start of operation were measured, and the pressure loss increase values during this period were compared. In addition, RUN1 and RUN2 have different LVs of the gas to be processed, and therefore, pressure loss per sulfur addition during the period was obtained and compared. The results are shown in Table 4. As a result, it was confirmed that the increase in pressure loss from 23 to 29 days can be reduced to about 1/4 to 1/5 by the effect of circulating water in the present invention (Table 4; RUN1: 0.03 mmAq / m / m). g-S, RUN 2: 0.13 mmAq / m / g-S). In addition, when the inner wall surface of the pretreatment device was visually observed in RUN 1 using circulating water, it was also confirmed that the adhesion of sulfur to the inner wall surface was suppressed. Therefore, in the pretreatment apparatus according to the present invention, the circulation watering is used to increase the efficiency of biological adhesion to the carrier, to suppress the increase in the pressure loss of the packed bed, and to suppress the adhesion of sulfur to the wall of the deodorization tower. It was shown that

<微生物担体の洗浄効果>   <Cleaning effect of microbial carrier>

循環水を利用しているRUN1について、気液洗浄によって前処理装置の充填層に付着した硫黄を取り除いた際の微生物担体の洗浄効果を評価した。まず、担体新品時の圧力損失を測定した後に、1週間運転させた後の圧力損失を測定した。そして、使用した充填層を処理塔内部で洗浄水と洗浄空気とで気液洗浄して、洗浄後の圧力損失を測定した。その結果を表5に示す。この結果より、圧力損失は担体新品時(表5;120mmAq/m)程度にまで回復することが示され(表5;90mmAq/m)、気液洗浄は析出した硫黄等を十分に有効であることが確認できた。   About RUN1 which uses circulating water, the washing | cleaning effect of the microorganisms carrier at the time of removing the sulfur adhering to the packed bed of a pretreatment apparatus by gas-liquid washing was evaluated. First, after measuring the pressure loss when the carrier was new, the pressure loss after operating for one week was measured. The used packed bed was gas-liquid washed with washing water and washing air inside the processing tower, and the pressure loss after washing was measured. The results are shown in Table 5. From this result, it is shown that the pressure loss is recovered to about the time of the new carrier (Table 5; 120 mmAq / m) (Table 5; 90 mmAq / m), and the gas-liquid cleaning is sufficiently effective for the precipitated sulfur and the like. I was able to confirm.

<処理効果の持続性>   <Durability of treatment effect>

RUN1、RUN2の条件でそれぞれ6ヶ月間継続使用して、6ヶ月使用した各装置によって処理された本処理後のガスの硫化水素濃度を測定した。その結果、RUN1、RUN2ともに6ヶ月継続使用しても、処理後の硫化水素平均濃度は0.1ppmであった。この結果より、本発明に係る前処理装置を微生物脱臭塔に連結することで、前処理装置や本処理装置の充填層の目詰まりの問題もなく、継続して高い除去効果(処理効果)を発揮できることが確認された。   The hydrogen sulfide concentration of the gas after the main treatment processed by each apparatus used for 6 months was measured by continuously using each for 6 months under the conditions of RUN1 and RUN2. As a result, even if RUN1 and RUN2 were used continuously for 6 months, the average hydrogen sulfide concentration after treatment was 0.1 ppm. From this result, by connecting the pretreatment apparatus according to the present invention to the microbial deodorization tower, there is no problem of clogging of the packed bed of the pretreatment apparatus or the present treatment apparatus, and a high removal effect (treatment effect) is continuously obtained. It was confirmed that it can be demonstrated.

<担体の粒径の影響>   <Influence of carrier particle size>

図1に記載の循環式散水方式の前処理装置を用いて、担体の粒径を変えただけで他の条件は表2と同じ条件(但し、洗浄は行わずに2週間通気後には新しい担体と交換した。)で硫化水素の除去性能を確認するための実験を行った。なお、被処理ガスの硫化水素は、その濃度が130ppmを一定に保つように人工的に調整したものを使用した。2週間通気(微生物馴養)後の各担体粒径の硫化水素の除去率の結果を表6に示す。   The other conditions were the same as in Table 2 except that the particle size of the carrier was changed using the circulating watering type pretreatment device shown in FIG. 1 (however, a new carrier was introduced after aeration for 2 weeks without washing). In order to confirm the removal performance of hydrogen sulfide, an experiment was conducted. The hydrogen sulfide used as the gas to be treated was artificially adjusted so that its concentration was kept constant at 130 ppm. Table 6 shows the results of the removal rate of hydrogen sulfide of each carrier particle size after aeration (microbe acclimatization) for 2 weeks.

表6に示したとおり、担体の粒径が5〜40mmの範囲では80%以上の硫化水素の除去率であり、担体の粒径が5〜40mmの範囲では高い硫化水素の除去性能を有することが示された。そして、これよりも大きい粒径では除去性能が悪化する傾向にあることが示された。   As shown in Table 6, the removal rate of hydrogen sulfide is 80% or more when the particle size of the support is 5 to 40 mm, and the removal performance of hydrogen sulfide is high when the support particle size is 5 to 40 mm. It has been shown. And it was shown that the removal performance tends to deteriorate at a particle size larger than this.

<LVの影響>   <Influence of LV>

図1に記載の循環式散水方式の前処理装置を用いて、担体の充填厚さを変えると共に,SV=1500/hrを一定に保つようにLVを変化させ、他の条件は表2と同じ条件(但し、洗浄は行わずに2週間通気後には新しい担体と交換した。)で、硫化水素の除去性能を確認するための実験を行った。なお、被処理ガスの硫化水素は、その濃度が130ppmを一定に保つように人工的に調整したものを使用した。2週間通気(微生物馴養)後の硫化水素の各通気LVでの硫化水素の除去率の結果を表7に示す。   Using the circulating watering type pretreatment device shown in FIG. 1, while changing the filling thickness of the carrier and changing LV so as to keep SV = 1500 / hr constant, other conditions are the same as in Table 2 An experiment was conducted to confirm the removal performance of hydrogen sulfide under the conditions (however, the washing was not performed and replaced with a new support after aeration for 2 weeks). The hydrogen sulfide used as the gas to be treated was artificially adjusted so that its concentration was kept constant at 130 ppm. Table 7 shows the results of the removal rate of hydrogen sulfide in each aeration LV of hydrogen sulfide after aeration (acclimation of microorganisms) for 2 weeks.

表7から、LVが3000m/h以下であれば硫化水素は80%程度まで除去可能であることが示された。なお、LVが小さすぎると装置が大型化する傾向にあり、そのような点も考慮するとLVは500〜3000m/hとなるよう設計することが好ましい。   Table 7 shows that hydrogen sulfide can be removed up to about 80% when LV is 3000 m / h or less. In addition, when LV is too small, there exists a tendency for an apparatus to enlarge, Considering such a point, it is preferable to design so that LV may be 500-3000 m / h.

<SVの影響>   <Influence of SV>

図1に記載の循環式散水方式の前処理装置を用いて、通気速度を変えることでSVを変化させ、他の条件は表2と同じ条件(但し、洗浄は行わずに2週間通気後には新しい担体と交換した。)で硫化水素の除去性能を確認するための実験を行った。なお、被処理ガスの硫化水素は、その濃度が130ppmを一定に保つように人工的に調整したものを使用した。2週間通気(微生物馴養)後の硫化水素の各通気SVでの硫化水素の除去率の結果を表8に示す。   Using the circulating watering type pretreatment device shown in FIG. 1, the SV was changed by changing the aeration rate, and other conditions were the same as those in Table 2 (however, after washing for 2 weeks without a wash) An experiment was conducted to confirm the removal performance of hydrogen sulfide. The hydrogen sulfide used as the gas to be treated was artificially adjusted so that its concentration was kept constant at 130 ppm. Table 8 shows the result of the removal rate of hydrogen sulfide in each aeration SV of hydrogen sulfide after aeration (microbe acclimatization) for 2 weeks.

表8から、通気SVが3000/h以下であれば硫化水素は80%程度まで除去可能であることが示された。なお、通気SVが小さすぎると装置が大型化する傾向にあり、そのような点も考慮するとSVは1000〜3000/hとなるよう設計することが好ましい。   Table 8 shows that hydrogen sulfide can be removed up to about 80% when the aeration SV is 3000 / h or less. In addition, when ventilation | gas_flowing SV is too small, there exists a tendency for an apparatus to enlarge, Considering such a point, it is preferable to design so that SV may be 1000-3000 / h.

本発明は、微生物担体を用いたガス前処理装置に利用できる。特に、含硫黄原子化合物を含有する被処理ガスから前記含硫黄原子化合物等を効果的に除去することができる。   The present invention can be used for a gas pretreatment apparatus using a microorganism carrier. In particular, the sulfur-containing atomic compound and the like can be effectively removed from the gas to be treated containing the sulfur-containing atomic compound.

本発明に係るガス前処理装置の第1実施形態と、その後続に通常の生物処理装置を連結した装置の簡略図である。1 is a simplified diagram of a first embodiment of a gas pretreatment apparatus according to the present invention and an apparatus in which a normal biological treatment apparatus is connected thereafter. FIG. 本発明に係るガス前処理装置の第2実施形態の簡略図である。It is a simplification figure of 2nd Embodiment of the gas pretreatment apparatus which concerns on this invention. 本発明に係るガス前処理装置の第3実施形態の簡略図である。It is a simplification figure of 3rd Embodiment of the gas pretreatment apparatus which concerns on this invention.

符号の説明Explanation of symbols

1,2,3 高濃度硫化水素除去用ガス前処理装置
11,21,31 前処理塔
121 循環水槽
122,22,32 用水槽
13,23,33 散水ポンプ
14,24,34 洗浄ポンプ
15,25,35 ブロワ
1,2,3 High concentration hydrogen sulfide removal gas pretreatment device 11,21,31 Pretreatment tower 121 Circulating water tank 122,22,32 Water tank 13,23,33 Sprinkling pump 14,24,34 Cleaning pump 15,25 , 35 Blower

Claims (4)

含硫黄原子化合物を含有する被処理ガスから該含硫黄原子化合物を除去するガス前処理装置と、その後続に前記被処理ガスから含硫黄原子化合物を除去するガス本処理として用いる生物処理塔を連結した装置であって、
前記被処理ガスを流通させる処理塔を有し、該処理塔の内部に、
前記被処理ガスを上方流で接触させる微生物担体と、
前記微生物担体に対して上方から散水する散水部と、
前記微生物担体を洗浄液で浸漬させる浸漬手段と、
前記微生物担体に対して下方から送風する送風部と、を有し、
前記微生物担体に対して上方から散水する散水液は、散水に使用された散水液を再び使用することと、
前記送風部で前記微生物担体に下方から送風するに際して、前記浸漬手段にて前記処理塔内の洗浄液の液面の水位を上昇下降させて変位させながら、この充填層の微生物担体を気液洗浄することを特徴とするガス前処理装置を備えるガス処理装置。
A gas pretreatment device for removing the sulfur-containing atomic compound from the gas to be treated containing the sulfur-containing atomic compound, and a biological treatment tower used as a gas main treatment for removing the sulfur-containing atomic compound from the gas to be treated are connected thereafter. Device,
It has a processing tower for circulating the gas to be processed, and inside the processing tower,
A microbial carrier for contacting the gas to be treated in an upward flow;
A watering part for watering the microorganism carrier from above;
Immersion means for immersing the microbial carrier with a cleaning liquid;
A blowing section for blowing air from below to the microbial carrier,
The sprinkling liquid sprayed from above on the microorganism carrier is to use again the sprinkling liquid used for sprinkling ;
When the microbial carrier is blown from below by the blowing unit, the microbial carrier in the packed bed is gas-liquid washed while the level of the washing liquid in the treatment tower is raised and lowered by the immersion means and displaced. A gas processing apparatus comprising the gas pre-processing apparatus.
前記微生物担体は、粒径5〜40mmの充填剤に微生物が担持されていることを特徴とする請求項1記載のガス処理装置。   2. The gas processing apparatus according to claim 1, wherein the microorganism carrier has microorganisms supported on a filler having a particle diameter of 5 to 40 mm. 前記被処理ガスの流量が、LV=500〜3000m/hr、SV=1000〜3000/hrであることを特徴とする請求項1又は2記載のガス処理装置。   The gas processing apparatus according to claim 1, wherein the flow rate of the gas to be processed is LV = 500 to 3000 m / hr and SV = 1000 to 3000 / hr. 含硫黄原子化合物を含有する被処理ガスを流通させる処理塔を有し、
該処理塔の内部に、前記被処理ガスを上方流で接触させる微生物担体と、
前記微生物担体に対して上方から散水する散水部と、
前記微生物担体を洗浄液で浸漬させる浸漬手段と、
前記微生物担体に対して下方から送風する送風部と、を備えた前記被処理ガスから該含硫黄原子化合物を除去するガス前処理装置と、その後続に前記被処理ガスから含硫黄原子化合物を除去するガス本処理として用いる生物処理塔を連結した装置におけるガス前処理装置の洗浄方法であって、
前記微生物担体に対して上方から散水する散水液は、散水に使用された散水液を再び使用することと、
前記送風部で前記微生物担体に下方から送風するに際して、前記浸漬手段にて前記処理塔内の洗浄液の液面の水位を上昇下降させて変位させながら、この充填層の微生物担体を気液洗浄することを特徴とするガス前処理装置の洗浄方法。
Having a treatment tower for circulating a gas to be treated containing a sulfur-containing atomic compound;
A microbial carrier for bringing the gas to be treated into contact with the inside of the treatment tower in an upward flow;
A watering part for watering the microorganism carrier from above;
Immersion means for immersing the microbial carrier with a cleaning liquid;
A gas pretreatment device that removes the sulfur-containing atomic compound from the gas to be treated, and a fan that blows air from below to the microorganism carrier; and subsequently removes the sulfur-containing atomic compound from the gas to be treated. A cleaning method for a gas pretreatment device in an apparatus connected to a biological treatment tower used as a main gas treatment,
The sprinkling liquid sprayed from above on the microorganism carrier is to use again the sprinkling liquid used for sprinkling;
When the microbial carrier is blown from below by the blowing unit, the microbial carrier in the packed bed is gas-liquid washed while the level of the washing liquid in the treatment tower is raised and lowered by the immersion means and displaced. A method for cleaning a gas pretreatment device.
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