JP5325236B2 - 偏光する光屈折性ガラス - Google Patents
偏光する光屈折性ガラス Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims description 192
- 239000000203 mixture Substances 0.000 claims description 84
- 229910052709 silver Inorganic materials 0.000 claims description 53
- 238000010438 heat treatment Methods 0.000 claims description 29
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 27
- 229910052794 bromium Inorganic materials 0.000 claims description 27
- 229910052801 chlorine Inorganic materials 0.000 claims description 27
- 239000004332 silver Substances 0.000 claims description 26
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 25
- 229910052796 boron Inorganic materials 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 17
- 229910052708 sodium Inorganic materials 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 15
- -1 silver halide Chemical class 0.000 claims description 15
- 230000005855 radiation Effects 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- 230000009467 reduction Effects 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims description 5
- 230000000694 effects Effects 0.000 description 22
- 239000000460 chlorine Substances 0.000 description 18
- 230000010287 polarization Effects 0.000 description 18
- 239000011734 sodium Substances 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 13
- 239000013078 crystal Substances 0.000 description 12
- 239000010410 layer Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 239000002245 particle Substances 0.000 description 10
- 239000012298 atmosphere Substances 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 239000003607 modifier Substances 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- 230000005684 electric field Effects 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000000835 fiber Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000013307 optical fiber Substances 0.000 description 5
- 229910052684 Cerium Inorganic materials 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 3
- 230000007123 defense Effects 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- 150000004677 hydrates Chemical class 0.000 description 3
- 150000004679 hydroxides Chemical class 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 150000002823 nitrates Chemical class 0.000 description 3
- 239000006089 photosensitive glass Substances 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- 238000000411 transmission spectrum Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 239000006066 glass batch Substances 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000007540 photo-reduction reaction Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 238000007507 annealing of glass Methods 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- PLZFHNWCKKPCMI-UHFFFAOYSA-N cadmium copper Chemical compound [Cu].[Cd] PLZFHNWCKKPCMI-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical class [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/04—Re-forming tubes or rods
- C03B23/047—Re-forming tubes or rods by drawing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/04—Compositions for glass with special properties for photosensitive glass
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
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- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Thermal Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
- Polarising Elements (AREA)
Description
ハロゲン化銀を含有する光屈折性と偏光性の両方の特徴を有することが可能なガラス組成物を提供し(特性は処理の完了後まで顕在化しない)、
前記ガラス組成物をリドローに適した形状に成形し、
前記成形したガラスを、575〜725℃の温度で1〜4時間、第1の加熱処理に供して、ガラス中にハロゲン化銀粒子を形成し、
105Pa・s(106ポアズ)より大きいガラス粘度および、24130kPa(3500psi)より大きい力を印加し、銀粒子を引き伸ばすのに十分な引張り速度を可能にするガラスドロー温度でリドローし、
前記リドローしたガラスを、190〜360nmで1分〜7時間、紫外線放射に曝露することにより、前記ガラス上に光屈折性の曝露を行い、
前記光屈折性曝露したガラスを400〜500℃の範囲の温度で1〜4時間、第2の加熱処理に供し、
前記ガラスの水素還元を、390〜430℃の温度で1〜6時間行い、それによって、偏光性かつ光屈折性のガラスの素子または物品であるガラス物品を形成する、
各工程を有してなり、ここで前記物品は少なくとも1つの偏光ガラス層を有する。1つの実施の形態では、前記第2の加熱処理は、450〜500℃の範囲の温度で1〜4時間行う。少なくとも1つの偏光層の厚さは40μm以下である。偏光層の厚さは、還元時間、水素ガス圧力、またはその両方を増大させることによって増大させることができる。
銀およびフッ素以外のハロゲンの供給源を含むガラスバッチを溶融し、ガラス本体を形成するか、または溶融物から形成し;
前記ガラス本体をガラスの歪み点よりも高い温度で加熱処理して、500〜2000オングストローム(Å)の大きさを有するハロゲン化物の結晶を生成し;
前記ハロゲン化物の結晶を含有するガラス本体を、ガラス徐冷点よりも高い温度における応力下で引き伸ばし、前記結晶を引き伸ばし、かつ配向させ;
前記引き伸ばされた本体を250℃〜500℃の温度で還元性雰囲気に曝露して、少なくとも2:1の縦横比を有する金属粒子を含む前記本体上に、還元された表面層を成長させる。
R=(M−A)÷B
として定義される。
Claims (5)
- 光屈折性かつ偏光性のガラス組成物であって、実質的に、重量パーセントで:
(a)70〜73%のSiO2、13〜18%のB2O3、7〜10%のNa2O、2〜4%のAl2O3、0.005〜0.1%のCuO、<0.4%のCl、0.1〜0.5%のAg、および0.1〜0.3%のBrからなり、前記ガラスが0.3〜0.65の範囲のR値を有する組成物;および
(b)70〜73%のSiO2、13〜18%のB2O3、7〜10%のNa2O、2〜4%のAl2O3、0.005〜0.1%のCuO、<0.4%のCl、0.1〜0.5%のAg、>0〜<0.3%のアルカリ土類金属酸化物、および0.1〜0.3%のBrからなり、前記ガラスが0.3〜0.65の範囲のR値を有する組成物;
の群から選択され、
前記選択された組成物が、偏光性かつ光屈折性である物品または素子の製造に適している、組成物。 - 組成物(a)であって、実質的に、重量パーセントで:
(i)71.1±0.5%のSiO2、14.7±0.5%のB2O3、9.3±0.5%のNa2O、3±0.5%のAl2O3、0.005〜0.1%のCuO、<0.4%のCl、0.33±0.05%のAg、および0.1〜0.3%のBrからなり、前記ガラスが0.35〜0.60の範囲のR値を有する組成物;
(ii)71±1%のSiO2、15.5〜17.5%のB2O3、7〜9%のNa2O、3±0.5%のAl2O3、0.01±0.005%のCuO、<0.4%のCl、0.33±0.05%のAgおよび0.1〜0.3%のBrからなり、前記ガラスが0.35〜0.60の範囲のR値を有する組成物;
(iii)71.7±0.5%のSiO2、15.8〜17.2%のB2O3、7.2〜8.5%のNa2O、3±0.5%のAl2O3、0.01±0.005%のCuO、<0.4%のCl、0.33±0.05%のAg、および0.1〜0.3%のBrからなり、前記ガラスが0.35〜0.60の範囲のR値を有する組成物;
からなる群より選択されることを特徴とする請求項1記載の光屈折性かつ偏光性のガラス組成物。 - 組成物(b)であって、実質的に、重量パーセントで:
(i)71±1%のSiO2、15.5〜17.5%のB2O3、7〜9%のNa2O、3±0.5%のAl2O3、0.01±0.005%のCuO、<0.4%のCl、0.33±0.05%のAg、>0〜<0.3%CaOおよび0.1〜0.3%のBrからなり、前記組成物が0.35〜0.60の範囲のR値を有する;
(ii)71.7±0.5%のSiO2、15.8〜17.2%のB2O3、7.2〜8.5%のNa2O、3±0.5%のAl2O3、0.01±0.005%のCuO、<0.4%のCl、0.33±0.05%のAg、>0〜<0.3%のCaOおよび0.1〜0.3%のBrからなり、前記組成物が0.35〜0.60の範囲のR値を有する;
組成物からなる群より選択されることを特徴とする請求項1記載の光屈折性かつ偏光性のガラス組成物。 - 光屈折性かつ偏光性のガラス物品または素子を生産する方法であって、
光屈折性かつ偏光性の両方の特徴を有することができるガラス組成物を提供し、
前記ガラス組成物をリドローに適した形状へと成形し、
前記成形したガラスを、575〜725℃の範囲の温度で1〜4時間、第1の加熱処理に供し、ガラス中にハロゲン化銀粒子を形成し、
前記ガラスを、105Pa・s(106ポアズ)よりも大きいガラス粘度および24130kPa(3500psi)よりも大きい力を印加するのに十分な引張り速度を可能にするドロー温度でリドローして、前記ハロゲン化銀粒子を引き伸ばし、
前記リドローしたガラスを、190〜360nmの範囲で1分〜7時間、紫外線放射に曝露することによって、前記ガラス上に光屈折性の曝露を行い、
前記光屈折的に曝露したガラスを、400〜500℃の範囲の温度で1〜4時間、第2の加熱処理に供し、
前記ガラスの水素還元を、390〜450℃の範囲の温度で1〜6時間行い、それによって、偏光性かつ光屈折性のガラス物品を形成する、
各工程を有してなり、
前記水素還元した偏光層の厚さが40μm以下である、方法。 - 光屈折性かつ偏光性の両方の特徴を有するガラス組成物を提供する工程が、実質的に、重量パーセントで:
(a)70〜73%のSiO2、13〜18%のB2O3、7〜10%のNa2O、2〜4%のAl2O3、0.005〜0.1%のCuO、<0.4%のCl、0.1〜0.5%のAg、および0.1〜0.3%のBrからなり、0.3〜0.65の範囲のR値を有する組成物、
(b)71.1±0.5%のSiO2、14.7±0.5%のB2O3、9.3±0.5%のNa2O、3±0.5%のAl2O3、0.005〜0.1%のCuO、<0.4%のCl、0.33±0.05%のAg、および0.1〜0.3%のBrからなり、0.35〜0.6の範囲のR値を有する組成物、
(c)70〜73%のSiO2、13〜18%のB2O3、8〜10%のNa2O、2〜4%のAl2O3、0.005〜0.1%のCuO、<0.4%のCl、0.1〜0.5%のAg、>0〜<0.3アルカリ土類金属酸化物、および0.1〜0.3%のBrからなり、0.3〜0.65の範囲のR値を有する組成物、
(d)71±1%のSiO2、15.5〜17.5%のB2O3、7〜9%のNa2O、3±0.5%のAl2O3、0.01±0.005%のCuO、<0.4%のCl、0.33±0.05%のAg、>0〜<0.3 CaO酸化物および0.1〜0.3%のBrからなり、0.35〜0.6の範囲のR値を有する組成物、
(e)71.7±0.5%のSiO2、15.8〜17.2%のB2O3、7.2〜8.5%のNa2O、3±0.5%のAl2O3、0.01±0.005%のCuO、<0.4%のCl、0.33±0.05%のAg、>0〜<0.3 CaO酸化物、および0.1〜0.3%のBrからなり、0.35〜0.6の範囲のR値を有する組成物、
からなる群より選択されるガラス組成物を提供することを特徴とする請求項4記載の方法。
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US12/011,736 US20090190214A1 (en) | 2008-01-29 | 2008-01-29 | Polarizing photorefractive glass |
US12/011,736 | 2008-01-29 | ||
US12/337,920 | 2008-12-18 | ||
US12/337,920 US20090190215A1 (en) | 2008-01-29 | 2008-12-18 | Polarizing photorefractive glass |
US12/355,004 US8179595B2 (en) | 2008-01-29 | 2009-01-16 | Polarizing photorefractive glass |
US12/355,004 | 2009-01-16 | ||
PCT/US2009/000451 WO2009097097A1 (en) | 2008-01-29 | 2009-01-23 | Polarizing photoreactive glass |
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