JP5316575B2 - Shielding film, manufacturing method thereof, and use - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide: a light shielding film useful as a light-shielding member for various optical apparatus, such as a camera, a video camera, a copying machine and a developing machine, and excellent in a light shielding property without reflection from a punched edge surface; a manufacturing method thereof; and applications thereof. <P>SOLUTION: A light shielding film with a thickness of 25 &mu;m or less contains a resin component (A), a black pigment (B), and an amorphous silica (C) with a mean particle diameter of 3-10 &mu;m. The content of the black pigment (B) is 3-20 parts by weight to 100 parts by weight of the resin component, and the content of the amorphous silica (C) is 15-40 parts by weight. Irregularities are formed on a surface thereof, and irregularities with surface roughness (arithmetic mean height Ra) of 1 &mu;m or more are formed on an edge surface thereof punching the periphery. <P>COPYRIGHT: (C)2013,JPO&amp;INPIT

Description

  The present invention relates to a light-shielding film, a method for producing the same, and uses, and more specifically, is useful as a light-shielding member for various optical devices such as cameras, video cameras, copying machines, phenomenon machines, etc. The present invention relates to an excellent light-shielding film, a production method thereof, and an application.

  In recent years, cameras have been reduced in size, and digital cameras have become widespread due to the development of digital technology. The digital cameras have become thinner and more compact, and some mobile phones have camera functions added. In addition, video cameras are becoming smaller and lighter, and in the same way as digital cameras, in addition to miniaturization, higher performance is being promoted.

  In recent years, mobile phones with photographing functions, that is, camera-equipped mobile phones, have been equipped with small mechanical shutters in the lens units so that high-quality images can be taken with high pixels, as with digital cameras. A fixed aperture is also inserted into the lens unit of the mobile phone. The mechanical shutter incorporated in the mobile phone is required to operate with less power than a general digital camera. For this reason, the weight reduction of the shutter blade is particularly strongly required. Furthermore, recently, the assembly of camera modules for camera-equipped mobile phones is required to perform various components such as lenses, fixed diaphragms, shutters, and image sensors such as CMOS and CCD in the reflow process in order to reduce manufacturing costs. ing.

  In addition, the inner peripheral end face of the fixed aperture and the end face of the shutter blade are located on the optical path of the light, so if unnecessary light in the lens unit is reflected by the end face, it enters the image sensor and causes imaging defects such as flare and ghost. Happens. In order to prevent this imaging failure, there is a need for a fixed aperture and shutter blades that have been subjected to an antireflection treatment on the inner peripheral end surface. For this reason, the shutter blades and fixed diaphragm used for this purpose are required to have low reflectivity and blackness on the surface and the punched end face.

  Furthermore, digital cameras and camera-equipped mobile phones are becoming smaller and thinner, and components to be mounted, particularly camera modules, are required to be smaller and thinner. In particular, there is a strong demand for a fixed diaphragm and shutter blades, which are components of a lens unit in a camera module, to have a thickness of 25 μm or less.

In accordance with these required characteristics, a light shielding plate coated with black lubricant on a thin metal plate is used. However, in order to manufacture the light shielding plate, a process of blackening the processed end face after processing the thin metal plate into a predetermined shape is necessarily required, resulting in an increase in manufacturing cost. In addition, it cannot meet the demands for miniaturization and weight reduction.
Therefore, a light shielding film using a synthetic resin film has been proposed. For example, Patent Document 1 has a light shielding layer containing a binder resin, a black pigment having an average particle diameter of 1 μm or less, spherical silicone particles having an average particle diameter of 0.5 to 5 μm, and silica particles having an average particle diameter of 1 to 10 μm. A light shielding film has been proposed. However, this patent document discusses the blocking phenomenon on the film surface, but does not mention end face reflection. Moreover, since the base film is used, there is a problem of end face reflection of the film.
Patent Document 2 proposes a light shielding film made of an organic resin and a black material. However, this patent document also does not mention end surface reflection. Furthermore, since it is described that it is not preferable to add fine particles other than black fine particles to form unevenness on the film surface, the surface reflection is not sufficiently improved.

In addition, the present applicant uses a resin film base material having a heat resistance of 155 ° C. or higher and blended with a black pigment, and a crystalline metal carbide film (MeC) is formed as a light shielding film on one side or both sides thereof. Proposed a heat-resistant light-shielding film (see Patent Document 4). As a result, it can be used for applications that require sufficient surface reflectivity and heat resistance. However, the end face reflection was still not sufficient.
Furthermore, since the above resin film base material is easily charged by static electricity, dust, dust, and the like are likely to adhere to it, and a light-shielding film manufactured using the resin film base material may cause a problem.

For such a resin film-based substrate, a diaphragm and blade material that can reduce the occurrence of flares and ghosts that affect the imaging quality by using surface treatment and shape improvements using a metal plate have been proposed. Yes.
For example, in Patent Document 3, an opening is formed by etching using a metal plate such as stainless steel or phosphor bronze, and a light-absorbing paint is applied to suppress reflection on the surface including the end face of the opening, or gloss is applied. Diaphragm diaphragms that have been erased have been proposed. In this patent document, a post-process called surface treatment is required to reduce reflection at the end face, so that the manufacturing process of the diaphragm plate is complicated and increased, resulting in an increase in manufacturing cost.
As described above, at present, a light-shielding film that can easily suppress the reflection of the punched end face and can be thinned has not been obtained, and its appearance has been eagerly desired.

JP 2008-241767 A Special table 2010-534342 gazette JP 2006-72151 A JP 2010-96842 A

  In view of the above problems, an object of the present invention is to provide a light-shielding film having a low reflection surface and an excellent light-shielding property, a method for producing the same, and an application.

  The inventors of the present invention conducted intensive research to solve the above problems, and in a light-shielding film containing a black pigment and amorphous silica in a resin film substrate, the average particle diameter was 3 to 10 μm as amorphous silica. By using a specific amount in the raw material resin of the resin film base material, it was found that unevenness was uniformly formed on the end face during punching, thereby suppressing end face reflection, and the present invention was completed.

That is, according to the first invention of the present invention, the resin component (A) contains a black pigment (B) and amorphous silica (C) having an average particle diameter of 3 to 10 μm, and has a thickness of 25 μm or less. The content of the black pigment (B) is 3 to 20 parts by weight with respect to 100 parts by weight of the resin component, the content of the amorphous silica (C) is 15 to 40 parts by weight, and the surface is uneven. There is provided a light shielding film which is formed and has a punched exposed end face, and the end face has irregularities having a surface roughness (arithmetic average height Ra) of 1 μm or more.

According to a second invention of the present invention, in the first invention, the light shielding film has a surface roughness (arithmetic average height Ra) of 0.2 to 0.7 μm. Is provided.
According to a third aspect of the present invention, in the first or second aspect, the average regular reflectance at a wavelength of 380 to 780 nm is 0.4% or less, and the average optical density is 4 or more. A light shielding film is provided.
According to the fourth invention of the present invention, in the first invention, the resin component (A) is polyamideimide, polyimide, polyphenylene sulfide, aramid, polyetheretherketone, polyester, polystyrene, polycarbonate, polyetherether. There is provided a light-shielding film characterized by being one or more kinds of resins selected from ketones or polyether sulfones.
According to the fifth aspect of the present invention, in the first aspect, the black pigment (B) is carbon black, and the content thereof is 3 to 20 parts by weight with respect to 100 parts by weight of the resin component. Is provided.
According to the sixth invention of the present invention, in the first invention, the black pigment (B) is conductive carbon black, and the content thereof is 5 to 20 parts by weight with respect to 100 parts by weight of the resin component. A light-shielding film is provided.
According to a seventh aspect of the present invention, there is provided the light shielding film according to the sixth aspect, wherein the surface resistance of the light shielding film is 1 × 10 ¹⁰ Ω / □ or less.

On the other hand, according to the eighth invention of the present invention, in any one of the first to seventh inventions, the black pigment (B) is 20 parts by weight or less and the average particle size is 100 parts by weight of the resin component (A). After adding and mixing 15 to 40 parts by weight of 3 to 10 μm of amorphous silica (C), and then coating the resulting slurry on a support so that the thickness after heating and drying is 25 μm or less, There is provided a method for producing a light-shielding film, which is dried by heating, and subsequently, if necessary, sand mat processing is performed on both surfaces to form irregularities.

According to the ninth aspect of the present invention, there is provided a diaphragm obtained by punching the light-shielding film according to any one of the first to seventh aspects, and the end face of the obtained diaphragm has low reflectivity. A diaphragm characterized by this is provided.
Furthermore, according to the tenth aspect of the present invention, there is provided a blade material obtained by punching one of the first to seventh light shielding films, and the end surface of the obtained blade material has low reflectivity. A blade member characterized by this is provided.

  The light shielding film of the present invention is useful as a light shielding member for various optical devices such as a camera, a video camera, a copying machine, and a phenomenon machine because the surface and the punched end surface have low reflectivity and excellent light shielding properties. In the present invention, since the black pigment and the specific amorphous silica are contained, the end surface is uniformly uneven at the time of punching, so that the end surface reflection is lowered and the performance enhancement of the optical device can be promoted. In addition, since a specific amount of black pigment or amorphous silica is added and the amorphous silica has a specific particle size, the total thickness of the film is 25 μm or less, making it possible to meet the demands for thinner and smaller optical equipment. It becomes. Furthermore, by using conductive carbon black as the black pigment, the dust used on the film surface and debris generated during punching are less likely to adhere to the mold used for press processing in the light-shielding film punching process. Thus, no burrs are generated, and a stable optical member can be provided. The light-shielding film of the present invention does not require a step of blackening the processed end face after processing into a predetermined shape, such as a light-shielding plate coated with black lubrication on a conventional metal thin plate, and because there are fewer manufacturing steps, The light shielding member can be manufactured at low cost.

  Hereinafter, the light-shielding film of the present invention, its production method, and applications will be described.

1. Light-shielding film The light-shielding film of the present invention is a light-shielding film having a thickness of 25 μm or less in which a resin component (A) contains a black pigment (B) and amorphous silica (C) having an average particle diameter of 3 to 10 μm. The content of the pigment (B) is 3 to 20 parts by weight with respect to 100 parts by weight of the resin component, the content of the amorphous silica (C) is 15 to 40 parts by weight, and irregularities are formed on the surface, and The light-shielding film has a punched exposed end face, and the end face has irregularities having a surface roughness (arithmetic average height Ra) of 1 μm or more.

  In the light-shielding film of the present invention, the resin film substrate (A) contains a black pigment (B) and amorphous silica (C) having an average particle diameter of 3 to 10 μm. The thickness of the light shielding film must be 25 μm or less. If it is thicker than 25 μm, the required characteristics for reducing the thickness and size of the light shielding film cannot be satisfied. Moreover, it is preferable that the surface roughness (arithmetic average height Ra) of a light shielding film is 0.2-0.7 micrometer. Here, the arithmetic average height is also called arithmetic average roughness, and the reference length is extracted from the roughness curve in the direction of the average line, and the absolute value of the deviation from the average line of the extracted portion to the measurement curve is summed. The average value.

  If the surface roughness is less than 0.2 μm, the average regular reflectance of the film surface becomes higher than 0.4%, which is not preferable. Further, when the surface roughness exceeds 0.7 μm, the regular reflectance of the film surface can be lowered, but the film may be wrinkled during sand mat processing, and a light-shielding film can be stably produced. It is not possible and not preferable. The light-shielding film of the present invention has irregularities formed on the end face when the light-shielding film is punched, and the surface roughness (arithmetic average height Ra) of the end face must be 1 μm or more. If the thickness is less than 1 μm, the unevenness of the end face is small, so that the reflection on the end face cannot be sufficiently suppressed.

  In the light-shielding film of the present invention, the resin component (A) contains a specific amount of black pigment (B) and amorphous silica (C) having an average particle diameter of 3 to 10 μm, and has a predetermined thickness and surface unevenness. In addition, since the surface roughness (arithmetic average height Ra) of 1 μm or more is formed on the end face when the periphery is punched, the average regular reflectance at a wavelength of 380 to 780 nm required for optical applications is 0. .4% or less, and the average optical density is 4 or more.

<Resin component (A)>
In the light-shielding film of the present invention, the type of the resin component is not particularly limited, but those that can be obtained at low cost and those that are easy to handle are preferable. Among them, one or more resins selected from polyamideimide, polyimide, polyphenylene sulfide, aramid, polyetheretherketone, polyester, polystyrene, polycarbonate, polyetheretherketone or polyethersulfone are preferable. Examples of the polyester include polyethylene terephthalate, polytrimethylene terephthalate, polyethylene naphthalate, and polybutylene naphthalate. Particularly, polyethylene terephthalate and polyethylene naphthalate are easily available and preferable.
In order to facilitate handling, the resin component is added with a solvent to obtain an appropriate viscosity, and then a black pigment and amorphous silica particles are added to the resin component to prepare a black resin solution for use in the production of a light-shielding film.

<Black pigment (B)>
In the light-shielding film of the present invention, the black pigment is not limited by type, but for example, one or more selected from carbon black, aniline black, titanium black, inorganic pigment hematite, or perylene black. Black pigments can be used.

  The content of the black pigment must be 3 to 20 parts by weight with respect to 100 parts by weight of the resin component contained in the light shielding film. If it is less than 3 parts by weight, complete light-shielding properties cannot be obtained, the reflection of the surface and end face becomes high, and sufficient optical properties cannot be obtained. Here, it is preferable that the average optical density in wavelength 380-780 nm of the obtained light shielding film is 4 or more. On the other hand, when the content of the black pigment exceeds 20 parts by weight, the viscosity of the film becomes high, and surface defects due to aggregation of silica particles are likely to occur, so that a light shielding film cannot be produced. In addition, it is preferable that content of a black pigment is 3-10 weight part. This is because the heat resistance may be slightly inferior when the content of the black pigment is increased.

  In the present invention, the black pigment is preferably carbon black, and particularly preferably conductive carbon black. When conductive carbon black is used, the resulting light-shielding film has conductivity, so that the light-shielding film is suppressed from being charged by static electricity, and there is an effect that dust or dust does not adhere. As the conductive carbon black used here, commercially available carbon black can be used, and examples thereof include Tokai Carbon (Toka Black # 5500).

The light-shielding film of the present invention is not limited by the surface resistance, but is preferably 1 × 10 ¹⁰ Ω / □ or less, and more preferably 1 × 10 ⁹ Ω / □ or less. The surface resistance value of the light-shielding film varies depending on the type of black pigment to be blended, but when conductive carbon black is used, the surface resistance is easily set to 1 × 10 ¹⁰ Ω / □ or less. If the surface resistance is 1 × 10 ¹⁰ Ω / □ or less, a sufficient antistatic effect can be obtained, and it is generated when the dust or stamping on the film surface is stuck to the mold used for press processing in the light-shielding film punching process. As a result, it becomes difficult for the residue to adhere to the product, and burrs are not generated in the punched product, and a stable optical member can be provided.
Moreover, it is preferable that it is 5-20 weight part with respect to 100 weight part of resin components, and, as for content of electroconductive carbon black, it is more preferable that it is 5-10 weight part. When the content of the conductive carbon black is small and less than 5 parts by weight, a sufficient antistatic effect may not be obtained. Incidentally, when the content of the conductive carbon black is 3 parts by weight, the surface resistance is about 8 × 10 ¹¹ Ω / □, and it is difficult to obtain the antistatic effect. On the other hand, as the conductive carbon black content increases, the antistatic effect increases. However, if it exceeds 10 parts by weight, the heat resistance may be slightly inferior, and if it exceeds 20 parts by weight, the viscosity of the film increases, and silica particles Surface defects due to agglomeration tend to occur, making it difficult to produce a light-shielding film.

<Amorphous silica (C)>
In the light-shielding film of the present invention, the silica blended in the resin component is amorphous silica having an average particle diameter of 3 to 10 μm. The term “indefinite shape” as used herein means that the particle shape is not spherical but has a cornered irregular shape. If the shape of the silica particles is spherical, it will be agglomerated and biased to one side of the film. The reflection of the end face is not sufficiently low. Further, in the case of spherical silica, since the spherical silica particles are more likely to aggregate when the content is increased, a smoother end face can be easily formed.

Further, the average particle diameter of the amorphous silica must be 3 to 10 μm. When the average particle diameter of the amorphous silica is less than 3 μm, the surface roughness of the film surface becomes small and the reflection on the film surface becomes high. Furthermore, the surface roughness (arithmetic average height Ra) of the film end face is also less than 1 μm, and the reflection of the end face is not low reflection. Conversely, if the average particle diameter exceeds 10 μm, the silica particles are larger than the film thickness of 25 μm, so that appearance defects such as pinholes are formed on the film, and the light shielding property cannot be ensured, and the light shielding member cannot be provided. In addition, the average particle diameter said here says what was measured by the laser diffraction and the scattering method.
Such amorphous silica is produced by a precipitation method, a gel method, or the like. Even spherical silica having a particle size larger than the above may be pulverized to a predetermined size and sieved to obtain the above average particle size. As a commercial item, the product made from Fuji Silysia (Silo Hovic) etc. are mentioned, for example, It can use preferably.

  The content of the amorphous silica must be 15 to 40 parts by weight with respect to 100 parts by weight of the resin component. When the silica content is less than 15 parts by weight, the irregularities on the film surface are reduced, and the average regular reflectance of the light shielding film is increased. Further, the surface roughness of the end surface is less than 1 μm, and the unevenness of the end surface is reduced, so that the reflection of the end surface is increased. On the other hand, if the silica content exceeds 40 parts by weight, the amount of silica increases with respect to the resin component of the light shielding film, so that pinholes and the like are formed in the film, and a light shielding member cannot be provided.

2. Manufacturing method of light-shielding film The light-shielding film of the present invention is not limited by the manufacturing method, but is manufactured, for example, by the following procedure.

First, a solvent is added to the resin component to form a resin solution, black pigment and amorphous silica particles are added thereto, and mixed using a roller mill to prepare a black resin solution. That is, 3 to 20 parts by weight of black pigment (B) and 15 to 40 parts by weight of amorphous silica (C) having an average particle diameter of 3 to 10 μm are added to and mixed with 100 parts by weight of resin component (A).
The solvent used is only required to dissolve the resin. For example, various alcohols, ether solvents such as tetrahydrofuran and diglyme, amide solvents such as N-methyl-2-pyrrolidone and N, N′-dimethylacetamide, and ketones such as cyclohexane and methyl ethyl ketone. An organic solvent such as a system solvent or γ-butyrolactone or tetramethylurea can be used. Two or more organic solvents may be mixed and used.
In the present invention, since black pigments and amorphous silica particles are uniformly dispersed in a resin solution in which a solvent is added to the resin component, a coating containing black pigments, amorphous silica particles, etc. on the surface of the resin substrate as in the past. Unlike the case of applying the working liquid, the black pigment and the amorphous silica particles are not unevenly distributed on the film, and the thickness of the film can be reduced. Therefore, not only the reflection of the punched end face but also the film surface can be reduced, and a remarkable effect can be expected that the use for downsizing and thinning is expanded.

  Next, the produced black resin solution is applied to the support so that the film thickness after heat drying is 25 μm. As the coating method, for example, blade coating, bar coating, roll coating, gravure coating or the like can be used. The black resin solution applied to the support is solidified at room temperature in the air and peeled off from the support. As the support, polyethylene terephthalate (PET), polycarbonate (PC) film or the like is used.

  Thereafter, the peeled black resin film is heated at 100 to 200 ° C. for 0.5 to 2 hours, and further heated and dried at 200 to 300 ° C. For example, when the resin component is polyamideimide, the peeled black resin film is heated at 150 ° C. for 1 hour, and further heated and dried at 250 ° C. to produce a light shielding film.

In the present invention, as described above, the slurry is coated on the support so as to have a thickness of 25 μm or less, then dried by heating, and then, if necessary, both surfaces are subjected to sand mat processing to form irregularities. it can. The light-shielding film is in a state where irregularities are formed on one side of the surface because the resin component is a base material and contains amorphous silica particles, but the surface processing step further forms irregularities on both surfaces. Is done. As the method, there are methods such as etching and corona discharge treatment. Among them, sandblasting is preferable.
Here, the sand blasting is a processing method in which inorganic fine particles such as silica sand are used for the shot material, and the film after the mat treatment is dried after washing to remove the shot material. The size of the unevenness depends on the film conveyance speed, the number of times of conveyance and the type, size, and injection pressure of the shot material during the sandblasting process, and therefore the conditions are set so that the desired unevenness is obtained. The surface roughness (arithmetic average height Ra) of the light-shielding film is preferably 0.2 to 0.7 μm.

3. Use of light-shielding film As mentioned above, the light-shielding film of the present invention has the characteristics that the average regular reflectance at a wavelength of 380 to 780 nm is 0.4% or less and the average optical density is 4 or more. Therefore, it can be used as a digital camera, a mobile phone with a camera, a fixed aperture of a digital video camera, and a mechanical shutter blade.

  The light shielding film of the present invention is punched into a specific shape as it is and processed into a digital camera, a camera-equipped mobile phone, a fixed aperture of a digital video camera, and a mechanical shutter blade. The processed end face after punching is located on the optical path of the light in the lens unit, but the processed end face after punching has irregularities, so that when the light enters the end face, reflection at the end face is suppressed. In addition, it is possible to block light incident on an image sensor such as a CCD or CMOS, and to prevent imaging failure due to ghost or flare. Further, since the film thickness is suppressed to 25 μm or less, when used for a camera-equipped mobile phone, a significant reduction in thickness and size can be realized.

  Next, the present invention will be specifically described with reference to examples. The present invention is not limited to these examples. In addition, evaluation of the obtained light shielding film was performed with the following method.

(Specular reflectance and parallel light transmittance of shading film)
The specular reflectance and parallel light transmittance at a wavelength of 380 to 780 nm of the obtained light shielding film were measured with a spectrophotometer (V-570 manufactured by JASCO Corporation). From the measured parallel light transmittance (T), an optical density (denoted as OD) was calculated according to the following formula.
OD = log (100 / T)
The regular reflectance of light from the light shielding film refers to the reflectance of light reflected from the surface at an angle equal to the incident angle of incident light according to the law of reflection. The incident angle was measured at 5 °. Further, the parallel light transmittance means a parallel component of the light beam transmitted through the light shielding film, and is represented by the following formula.
T (%) = (I / I ₀ ) × 100
Here, T is the parallel light transmittance expressed as a percentage, I ₀ is the intensity of the parallel irradiated light incident on the sample, and I is the transmitted light intensity of the component parallel to the irradiated light among the light transmitted through the sample. .
By calculating the arithmetic average of the regular reflectance and the optical density at the obtained wavelength of 380 to 780 nm, the average regular reflectance and the average optical density at the wavelength of 380 to 780 nm were obtained.
For the end face reflection, the produced film was punched out by press working, and the obtained punched end face was observed with a metal microscope (manufactured by Nikon: ME600). As for the surface roughness (arithmetic average height Ra) of the end face, the entire width in the thickness direction of the film was measured with an optical profiler (manufactured by Zygo: NewView 6200).
(Appearance of film)
The produced light-shielding film was visually checked for appearance of surface defects such as wrinkles and pinholes.
(Conductivity of film)
The surface resistance of the produced light shielding film was measured using the resistivity meter (Mitsubishi Chemical make: MCP-HT260). The surface resistance of the film is evaluated as good if it is 1 × 10 ¹⁰ Ω / □ or less.

Example 1
First, a resin solution prepared by dissolving polyamideimide with N-methyl-2-pyrrolidone, carbon black having an average particle diameter of 1 μm, and amorphous silica having an average particle diameter of 5 μm are prepared, and then a solid 100 of the polyamideimide resin solution is prepared. 5 parts by weight of carbon black and 30 parts by weight of amorphous silica were added to parts by weight and mixed using a roller mill to prepare a black polyamideimide resin solution.
Then, using a blade coater, the prepared black polyamideimide resin solution was coated on a polyethylene terephthalate (PET) film as a support so that the film thickness after heating and drying was 25 μm, and was hardened in the atmosphere at room temperature. It was. Subsequently, after the hardened black polyamideimide resin was peeled off from the support, it was heated at 150 ° C. for 1 hour and further dried by heating at 250 ° C. to produce a black polyamideimide film.
Next, on both surfaces of the black polyamideimide film, No. 7 cinnabar sand was used as a shot material, and first, 20 kg / m ² of cinnabar sand was shot while conveying the film at a speed of 5 m / min on one side of the black polyamideimide film. , Washed with water for 3 minutes, and dried at 80 ° C. for 2 minutes. Next, the black polyamideimide film treated on one side was turned upside down, the same matting treatment was performed, the surface unevenness was processed to form the surface unevenness with an arithmetic average height Ra of 0.4 μm, and a light shielding film was obtained. .
The appearance of the produced light-shielding film was good with no surface defects such as wrinkles and pinholes. The light-shielding film after forming irregularities on the surface has an average regular reflectance at a wavelength of 380 to 780 nm of 0.2%, an average optical density of 4 or more, low reflection, and complete light-shielding properties. It was good. The surface resistance was 9.9 × 10 ¹² Ω / □ or more (measurement limit). The results are shown in Table 1.
When the produced light-shielding film was punched out by press working and the degree of reflection of the obtained punched end face was observed with a metal microscope, the reflection and gloss at the end face were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the arithmetic average height Ra of the end face was measured with an optical profiler, it was 1.1 μm.

(Example 2)
Instead of carbon black as the black pigment in Example 1, the average particle size and content of amorphous silica and black pigment were the same as in Example 1 except that titanium black having an average particle size of 0.1 μm was used. A light shielding film was prepared.
The produced light-shielding film has an average regular reflectance of 0.2% and an average optical density of 4 or more at a wavelength of 380 to 780 nm, has low reflection and complete light-shielding properties, and has a good appearance with no surface defects. It was. The surface resistance was 9.9 × 10 ¹² Ω / □ or more (measurement limit). The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

(Example 3)
In Example 1, the content of silica, the average particle size and the type of carbon black, and the average particle size are the same as in Example 1 except that 3 parts by weight of carbon black is added to 100 parts by weight of the solid material of the polyamideimide resin solution. A light-shielding film was produced in the same manner as in 1.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.4%, an average optical density of 4 or more, and had complete light shielding properties. The appearance was also good with no surface defects. The surface resistance was 9.9 × 10 ¹² Ω / □ or more (measurement limit). The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

Example 4
In Example 1, the content of silica, the average particle size and the type of carbon black, and the average particle size are the same as in Example 1 except that 20 parts by weight of carbon black is added to 100 parts by weight of the solid material of the polyamideimide resin solution. A light-shielding film was produced in the same manner as in 1.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.2% and an average optical density of 4 or more, and had complete light shielding properties. The appearance was also good with no surface defects. The surface resistance was 9.9 × 10 ¹² Ω / □ or more (measurement limit). The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

(Example 5)
In Example 1, the type and average particle diameter of silica, the type and content of carbon black, except that the content of amorphous silica was 15 parts by weight with respect to 100 parts by weight of the solid material of the polyamideimide resin solution, A light-shielding film was prepared in the same manner as in Example 1 for the average particle size.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.3%, an average optical density of 4 or more, and had a complete light shielding property. The appearance was also good with no surface defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.0 μm.

(Example 6)
In Example 1, the type and average particle diameter of silica, the type and content of carbon black, except that the content of amorphous silica was 40 parts by weight with respect to 100 parts by weight of the solid material of the polyamideimide resin solution, A light-shielding film was prepared in the same manner as in Example 1 for the average particle size.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.2% and an average optical density of 4 or more, and had complete light shielding properties. The appearance was also good with no surface defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. The surface roughness of the end face measured with an optical profiler was 1.3 μm.

(Example 7)
A light-shielding film was produced in the same manner as in Example 1 except that the average particle size of the irregular-shaped silica in Example 1 was changed to 3 μm, and the type of silica, the type and content of carbon black, and the average particle size.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.4%, an average optical density of 4 or more, and had complete light shielding properties. The appearance was also good with no surface defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.0 μm.

(Example 8)
A light-shielding film was produced in the same manner as in Example 1 except that the average particle size of the irregular-shaped silica in Example 1 was changed to 10 μm, and the type of silica, the type and content of carbon black, and the average particle size.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.2% and an average optical density of 4 or more, and had complete light shielding properties. The appearance was also good with no surface defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.3 μm.

Example 9
A light shielding film was produced in the same manner as in Example 1 except that the arithmetic average height Ra of the light shielding film was 0.2 μm by sand mat processing.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.3%, an average optical density of 4 or more, and had a complete light shielding property. The appearance was also good with no surface defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

(Example 10)
A light-shielding film was produced in the same manner as in Example 1 except that the arithmetic average height Ra of the light-shielding film was 0.7 μm by sand mat processing.
The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.2% and an average optical density of 4 or more, and had complete light shielding properties. The appearance was also good with no surface defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

(Comparative Example 1)
The silica content, average particle size and type of carbon black, content, and average particle size were the same as in Example 1 except that spherical silica was used instead of amorphous silica. Produced.
The surface of the produced light shielding film had no defects and was good, but the average regular reflectance at a wavelength of 380 to 780 nm was 1.5% and was highly reflective. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face was highly reflective and glossy. As a result of examining the end surface with a scanning electron microscope (SEM), it was observed that the end surface was partially smooth. When the surface roughness of the end face was measured with an optical profiler, the arithmetic average height Ra was 0.6 μm.
Therefore, the light shielding film of Comparative Example 1 having high regular reflectance on the film surface and reflection at the punched end surface and insufficient light shielding properties cannot be used as a light shielding member for optical devices such as cameras and video cameras.

(Comparative Example 2)
A light-shielding film was produced in the same manner as in Example 1 except that the average particle size of the amorphous silica was changed to 2 μm, and the type of silica, the type and content of carbon black, and the average particle size.
The surface of the produced light-shielding film had no defects and was good, but the average regular reflectance at a wavelength of 380 to 780 nm was 0.6% and was highly reflective. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face was highly reflective and glossy. As a result of examining the end surface with a scanning electron microscope (SEM), it was observed that the unevenness of the end surface was smaller than that of the example. When the surface roughness of the end face was measured with an optical profiler, the arithmetic average height Ra was 0.6 μm.
Therefore, the light shielding film of Comparative Example 2 having high regular reflectance on the film surface and reflection at the punched end face and insufficient light shielding properties cannot be used as a light shielding member for optical devices such as cameras and video cameras.

(Comparative Example 3)
A light-shielding film was produced in the same manner as in Example 1 except that the average particle size of the amorphous silica was changed to 15 μm, and the type of silica, the type and content of carbon black, and the average particle size.
The produced light shielding film had an average optical density of 4 or more at a wavelength of 380 to 780 nm, a complete light shielding property, and an average regular reflectance of 0.2% and low reflection. However, it was found that pinholes and wrinkles were generated on the surface of the produced light shielding film and could not be provided as a light shielding film. The results are shown in Table 1.

(Comparative Example 4)
A light-shielding film was produced in the same manner as in Example 1 except that the content of the amorphous silica was 10 parts by weight, and the type of silica and the average particle size, the type of carbon black, the content, and the average particle size.
The surface of the produced light-shielding film had no defects and was good, but the average regular reflectance at a wavelength of 380 to 780 nm was 1.5% and was highly reflective. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face was highly reflective and glossy. As a result of examining the end surface with a scanning electron microscope (SEM), it was observed that the unevenness of the end surface was smaller than that of the example. When the surface roughness of the end face was measured with an optical profiler, the arithmetic average height Ra was 0.7 μm.
Therefore, the light shielding film of Comparative Example 4 having high regular reflectance on the film surface and reflection at the punched end face and insufficient light shielding properties cannot be used as a light shielding member for optical devices such as cameras and video cameras.

(Comparative Example 5)
A light-shielding film was prepared in the same manner as in Example 1 except that the amorphous silica content was changed to 45 parts by weight, and the silica type and average particle size, carbon black type, content, and average particle size.
The produced light shielding film had an average optical density of 4 or more at a wavelength of 380 to 780 nm, and had complete light shielding properties. Further, the average regular reflectance was 0.2%, which was low reflection. However, it was found that pinholes and wrinkles were generated on the surface of the produced light shielding film and could not be provided as a light shielding film. The results are shown in Table 1.

(Comparative Example 6)
A light-shielding film was prepared in the same manner as in Example 1 except that the content of carbon black in the black pigment was changed to 2 parts by weight, and the type of silica, average particle size, content and type of carbon black, and average particle size. .
The surface of the produced light-shielding film had no defects and was good, but the average optical density at a wavelength of 380 to 780 nm was 3, and complete light-shielding properties were not obtained. The average regular reflectance was 0.6%, which was higher than that of Example 1. The surface resistance was 9.9 × 10 ¹² Ω / □ or more (measurement limit). The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face was highly reflective and glossy. As a result of examining the end surface with a scanning electron microscope (SEM), it was observed that the unevenness of the end surface was smaller than that of the example. When the surface roughness of the end face was measured with an optical profiler, the arithmetic average height Ra was 0.9 μm.
Therefore, the light shielding film of Comparative Example 6 having high regular reflectance on the film surface and reflection at the punched end face and insufficient light shielding properties cannot be used as a light shielding member for optical devices such as cameras and video cameras.

(Comparative Example 7)
A light-shielding film was prepared in the same manner as in Example 1 except that the content of carbon black in the black pigment was changed to 25 parts by weight, and the type of silica, average particle size, content and type of carbon black, and average particle size. .
The average regular reflectance at a wavelength of 380 to 780 nm of the produced light shielding film was as low as 0.2%. Further, the average optical density was 4 or more, and it had complete light shielding properties. However, it was found that wrinkles were generated on the surface of the produced light shielding film, and it could not be provided as a light shielding film. The surface resistance was 9.9 × 10 ¹² Ω / □ or more (measurement limit). The results are shown in Table 1.

(Comparative Example 8)
A light-shielding film was produced in the same manner as in Example 1 except that the thickness of the film was changed to 30 μm, and the type of silica, average particle size, content and type of carbon black, and average particle size. The produced light shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.2% and an average optical density of 4 or more, and had low reflection and complete light shielding properties. The results are shown in Table 1.
When the produced light-shielding film was punched out by press working and the degree of reflection of the obtained punched end face was observed with a metal microscope, the reflection and gloss at the end face were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface height Ra of the end face was measured with an optical profiler, the arithmetic average roughness was 1.1 μm.
However, since the thickness of the light-shielding film of Comparative Example 8 is larger than that of Example 1, it cannot be used for a camera-equipped mobile phone, which is particularly demanded for reduction in thickness and size from the market.

(Example 11)
A light-shielding film was prepared in the same manner as in Example 1 except that polyimide was used as the resin, and the kind, average particle diameter, and content of amorphous silica and carbon black were the same.
The produced light-shielding film had an average regular reflectance at a wavelength of 380 to 780 nm of 0.2%, an average optical density of 4 or more, had a complete light-shielding property, and had good appearance and no surface defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the reflection and gloss on the end face were weak and good. As a result of examining the end face with an SEM (scanning electron microscope), fine irregularities were uniformly observed on the end face, and reflection and gloss of the end face were reduced by the formation of the fine irregularities. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

(Example 12)
In Example 1, except that the raw material of the resin film was changed from polyamideimide resin to polyethylene naphthalate resin, the solvent for dissolving the raw material, the type of black pigment, the average particle size and content, the average particle size of amorphous silica and A light-shielding film was produced in the same manner as in Example 1 in terms of content, film thickness, and sand matting. Moreover, in film production, the drying temperature after peeling from a support body was implemented at 150 degreeC.
The produced light shielding film of Example 12 had the same average regular reflectance and average optical density at wavelengths of 380 to 780 nm as those of Example 1, and had low reflection and complete light shielding properties. The surface was good with no defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.3 μm.

(Example 13)
In Example 1, except that the raw material of the resin film was changed from the polyamideimide resin to the polyether sulfone resin, the solvent for dissolving the raw material, the type of the black pigment, the average particle size and content, the average particle size of the amorphous silica A light-shielding film was produced in the same manner as in Example 1, except for the content, film thickness, and sand matting. Moreover, in film production, the drying temperature after peeling from a support body was implemented at 150 degreeC.
The produced light shielding film of Example 13 had the same average regular reflectance and average optical density at a wavelength of 380 to 780 nm as those of Example 1, and had low reflection and complete light shielding properties. The surface was good with no defects. The results are shown in Table 1. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.2 μm.

(Example 14)
The average particle diameter and content of the amorphous silica were the same as in Example 1 except that conductive carbon black having an average particle diameter of 1 μm was used instead of carbon black as the black pigment in Example 1. A film was prepared.
The produced electroconductive light-shielding film has an average regular reflectance at a wavelength of 380 to 780 nm of 0.2%, an average optical density of 4 or more, low reflection, complete light-shielding properties, and good appearance with no surface defects. Met. The results are shown in Table 1. The surface resistance was 2.5 × 10 ⁹ Ω / □. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

(Example 15)
A conductive light-shielding film was produced in the same manner as in Example 14 except that the content of the conductive carbon black in Example 14 was 10 parts by weight, and the average particle diameter and content of the amorphous silica were the same.
The produced electroconductive light-shielding film has an average regular reflectance at a wavelength of 380 to 780 nm of 0.2%, an average optical density of 4 or more, low reflection, complete light-shielding properties, and good appearance with no surface defects. Met. The results are shown in Table 1. The surface resistance was 2 × 10 ⁵ Ω / □. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.

(Example 16)
A conductive light-shielding film was produced in the same manner as in Example 14 except that the average particle diameter and content of amorphous silica were changed to 20 parts by weight in Example 14.
The produced electroconductive light-shielding film has an average regular reflectance at a wavelength of 380 to 780 nm of 0.2%, an average optical density of 4 or more, low reflection, complete light-shielding properties, and good appearance with no surface defects. Met. The results are shown in Table 1. The surface resistance was 5 × 10 ⁴ Ω / □. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.1 μm.
Since the content of conductive carbon black was as high as 20 parts by weight, the heat resistance was slightly reduced as compared with Example 15, but it was not a problem in practical use.

(Example 17)
The conductive light shielding film is the same as in Example 14 except that the average particle diameter and content of conductive carbon black and the average particle diameter of amorphous silica are the same as in Example 14, except that the content of amorphous silica in Example 14 is 15 parts by weight. Was made.
The produced electroconductive light-shielding film has an average regular reflectance at a wavelength of 380 to 780 nm of 0.3%, an average optical density of 4 or more, low reflection and complete light-shielding properties, and good appearance with no surface defects. Met. The results are shown in Table 1. The surface resistance was 2.5 × 10 ⁹ Ω / □. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.0 μm.

(Example 18)
The conductive light-shielding film was the same as in Example 14 except that the average particle size and content of conductive carbon black and the average particle size of amorphous silica were the same except that the content of amorphous silica in Example 14 was 40 parts by weight. Was made.
The produced electroconductive light-shielding film has an average regular reflectance at a wavelength of 380 to 780 nm of 0.2%, an average optical density of 4 or more, low reflection, complete light-shielding properties, and good appearance with no surface defects. Met. The results are shown in Table 1. The surface resistance was 2.5 × 10 ⁹ Ω / □. When the produced light-shielding film was punched and the degree of reflection was observed with a metal microscope on the end face, the end face reflection and gloss were weak and good. As a result of examining the end face with a scanning electron microscope (SEM), fine unevenness was observed uniformly on the end face, and the reflection and gloss of the end face were reduced by the formation of the fine unevenness. When the surface roughness of the end face was measured with an optical profiler, it was 1.3 μm.

"Evaluation"
From Table 1 showing the above results, Examples 1 to 10 specify black pigment (B) and amorphous silica (C) having an average particle diameter of 3 to 10 μm in the polyamideimide of the resin component (A) of the present invention. An amount of the light-shielding film having irregularities on the surface, with irregularities having a specific thickness and surface roughness (arithmetic average height Ra) of 1 μm or more when the light-shielding film is punched out Therefore, the surface and end face are low in reflection and excellent in light shielding properties. In addition, although the resin components of Examples 11 to 13 are different from those of Examples 1 to 10, since both have heat resistance, similarly, a light-shielding film having a low reflection surface and an excellent light-shielding property is obtained. It has been. Further, in Examples 14 to 18, by using conductive carbon black as the black pigment, the surface resistance becomes 1 × 10 ¹⁰ Ω / □ or less while maintaining the above-described characteristics of the light-shielding film, and has conductivity. Therefore, a conductive light-shielding film that can suppress the adhesion of dust and dirt has been obtained.

  On the other hand, in Comparative Examples 1 to 8, since the obtained light-shielding film does not satisfy the requirements of the present invention, the reflectivity and light-shielding properties of the surface and the end face are reduced, or the appearance is poor or the workability is reduced. Decreased. That is, in Comparative Example 1, since spherical silica was used, the regular reflectance of the film surface and the reflection of the punched end surface were high, and the light shielding property was insufficient. Further, in Comparative Examples 2 and 3, the average particle diameter of the silica is comparative. In Comparative Examples 4 and 5, the silica content is not satisfied. In Comparative Examples 6 and 7, the black pigment content does not satisfy the requirements of the present invention. Therefore, the regular reflectance of the film surface and the reflection of the punched end surface are high, and the light shielding property is insufficient, or pinholes and wrinkles are generated on the surface. Furthermore, in Comparative Example 8, since the film thickness was thinner than the requirement of the present invention, it cannot be used for a camera-equipped mobile phone with a reduced thickness.

  The light-shielding film of the present invention includes shutter blades or diaphragm blades such as lens shutters of digital cameras and digital video cameras, fixed diaphragms in lens units of mobile phones with cameras and in-vehicle monitors, and aperture devices for adjusting the light quantity of projectors (auto iris). It is also used as an optical equipment part such as a diaphragm blade or a heat-resistant light-shielding tape.

Claims (11)

A light-shielding film having a thickness of 25 μm or less, wherein the resin component (A) contains black pigment (B) and amorphous silica (C) having an average particle size of 3 to 10 μm,
The content of the black pigment (B) is 3 to 20 parts by weight with respect to 100 parts by weight of the resin component, the content of the amorphous silica (C) is 15 to 40 parts by weight, and irregularities are formed on the surface. The light-shielding film has a punched exposed end face, and the end face has irregularities having a surface roughness (arithmetic average height Ra) of 1 μm or more.   The surface roughness (arithmetic average height Ra) of the said light shielding film is 0.2-0.7 micrometer, The light shielding film of Claim 1 characterized by the above-mentioned.   3. The light-shielding film according to claim 1, wherein an average regular reflectance at a wavelength of 380 to 780 nm is 0.4% or less and an average optical density is 4 or more.   The resin component (A) is at least one resin selected from polyamideimide, polyimide, polyphenylene sulfide, aramid, polyetheretherketone, polyester, polystyrene, polycarbonate, polyetheretherketone, or polyethersulfone. The light-shielding film according to claim 1, wherein   The light-shielding film according to claim 1, wherein the black pigment (B) is carbon black and the content thereof is 3 to 20 parts by weight with respect to 100 parts by weight of the resin component.   The said black pigment (B) is electroconductive carbon black, The content is 5-20 weight part with respect to 100 weight part of resin components, The light shielding film of Claim 5 characterized by the above-mentioned. The light shielding film according to claim 6, wherein a surface resistance of the light shielding film is 1 × 10 ¹⁰ Ω / □ or less. Add and mix 20 parts by weight or less of black pigment (B) and 15 to 40 parts by weight of amorphous silica (C) having an average particle diameter of 3 to 10 μm with respect to 100 parts by weight of resin component (A). The obtained slurry is coated on a support so that the thickness after heating and drying is 25 μm or less, and then dried by heating, and then, if necessary, both surfaces are subjected to sand mat processing to form irregularities. The manufacturing method of the light shielding film in any one of Claims 1-7.   9. The method for producing a light-shielding film according to claim 8, wherein 5 to 20 parts by weight of conductive carbon black is added and mixed as a black pigment (B) with respect to 100 parts by weight of the resin component (A).   A diaphragm obtained by punching the light-shielding film according to any one of claims 1 to 7, wherein an end face of the obtained diaphragm is low reflective.   A blade material obtained by punching the light-shielding film according to any one of claims 1 to 7, wherein an end surface of the obtained blade material has low reflectivity.