JP5309568B2 - Electro-optical device and electronic apparatus - Google Patents

Description

  The present invention relates to a technical field of an electro-optical device such as a liquid crystal device, and an electronic apparatus such as a liquid crystal projector including the electro-optical device.

  In this type of electro-optical device, a pair of substrates are bonded to each other in a sealing region around a pixel region in which a plurality of pixel portions are formed, and a liquid crystal is sandwiched as an electro-optical material between the pair of substrates. . In order to control the thickness of the liquid crystal (cell gap) between the pair of substrates, a gap material is provided at least in the seal region, and the distance between the pair of substrates (inter-substrate gap) is controlled.

  In order to perform color display in each of the plurality of pixel portions arranged in the pixel region, a colored layer is provided in the pixel region on at least one of the pair of substrates. In this case, a step is generated in the layer where the colored layer is arranged between the pixel region and the seal region where the colored layer is not provided, and the gap between the substrates is different. According to Patent Document 1, in order to avoid such a situation, a colored layer is formed in the seal region. According to Patent Document 2, a blue colored layer is partially formed in the seal region, and the seal material is photocured by irradiating the seal region with light through the colored layer.

Japanese Patent Laid-Open No. 5-34682 JP 2007-41625 A

  Here, in the configuration disclosed in Patent Document 1, when a pair of substrates are bonded together with a photocurable sealing material, the sealing material is irradiated with light without arranging a colored layer in the sealing region. It is necessary to secure an area. Further, according to the configuration disclosed in Patent Document 2, in the layer where the colored layer is disposed, a step is generated in the seal region between the portion where the colored layer is disposed and the portion where the colored layer is not disposed. There arises a problem that the gap between the substrates is different in each part. Here, a flattening film may be formed on the upper layer side of the colored layer so as to alleviate the steps of the lower layer side. However, the colored layer has a relatively large thickness in order to exert its original function, and even if a planarizing film is formed on the upper layer side, the colored layer is formed on the surface of the planarizing film in the seal region. There is a step due to the presence or absence of. As a result, it is difficult to control the gap between the substrates due to the step generated in the seal region.

  The present invention has been made in view of, for example, the above-described problems and the like, and an electro-optical device capable of easily controlling a gap between substrates in a seal region and an electronic apparatus including such an electro-optical device. The issue is to provide.

For the electro-optical device of the present invention to solve the above problems, a pair of substrates, includes a gap material for controlling the gap between the pair of substrates, and the sealing material bonding together the pair of substrates, the sealing material And a plurality of colored layers having different colors and the same layer as the plurality of colored layers intersecting the first side and the first side of one of the pair of substrates. A plurality of dummy colored layers arranged along the second side and formed so as to overlap the sealing material, and at least a part of the dummy coloring layer is provided inside the sealing material, and the first side of the one substrate and Peripheral circuits provided along the second side, and the plurality of dummy colored layers extend from the position overlapping the seal material to the inside of the seal material so as to overlap the peripheral circuit. It is .

  According to the electro-optical device of the present invention, a pair of substrates are bonded to each other with a sealing material in a sealing region, and for example, liquid crystal is sealed as an electro-optical material between these substrates. In addition, a gap material is dispersed or mixed in the sealing material, and the gap between the pair of substrates is controlled by the gap material, whereby the cell gap (the thickness of the liquid crystal) is adjusted.

  In the electro-optical device of the present invention, light corresponding to any one of, for example, three colors of red (R), green (G), and blue (B) is typically used as a plurality of colors in each of a plurality of pixels. A colored layer is provided in a pixel region (that is, a pixel array region or an image display region in which a plurality of pixels are arranged) on at least one of the pair of substrates so that light can be emitted as light contributing to display. It is done. For example, a plurality of colored layers are provided for each color of R, G, and B as a plurality of colors in the pixel region on the substrate.

  On the other hand, a plurality of dummy colored layers are provided in at least the seal region of the peripheral region on the substrate provided with the colored layer in this way. Each of the plurality of dummy colored layers is formed in the same layer as this colored layer, simulating at least one of the plurality of colored layers. More specifically, for at least one of the plurality of colored layers, for example, the plurality of dummy colored layers are made of the same material in addition to or instead of having the same film thickness as the colored layer. Each is formed.

  Therefore, in the layer where the colored layer is arranged on the substrate, the level difference between the seal region where the colored layer is not formed and the pixel region where the colored layer is formed is compared with the case where the dummy colored layer is not formed in the sealed region. Can be made smaller. As a result, the gap between the substrates can be brought close to the same value in the seal region and the pixel region, and ideally the same. Therefore, it is not necessary to make the diameter of the gap material included in the sealing material different from the inter-substrate gap in the pixel region, and it becomes possible to prevent the control of the cell gap from becoming complicated.

  In addition, between a pair of board | substrates, a liquid crystal is enclosed between a pair of board | substrates in the inner peripheral side from the sealing area | region in which a sealing material is formed. The dummy colored layer may be formed so as to extend from the seal region to a portion located on the inner peripheral side of the seal region in the peripheral region. With this configuration, a step based on the presence or absence of the dummy coloring layer is generated in a part of the peripheral region where the liquid crystal is sealed, and the situation where the seal region and the inter-substrate gap are different can be prevented.

  Further, the plurality of dummy colored layers are arranged in the seal region at intervals. Therefore, each of the arranged dummy colored layers has a gap between the adjacent dummy colored layers, and the sealing material can be easily irradiated by irradiating the sealing material with light through the gap. Can be photocured.

  In one aspect of the electro-optical device of the present invention, an insulating film formed at least in the seal region is provided on the upper layer side of the plurality of dummy colored layers on the at least one substrate, and the plurality of dummy colored layers include: Each of the plurality of dummy colored layers on the upper layer side surface of the insulating film and the step generated based on each of the intervals are formed and the intervals are adjusted.

  According to this aspect, the insulating film is formed on the upper layer side of the plurality of dummy pixel regions, and on the upper layer side surface of the insulating film, the surface portion at the position corresponding to the dummy colored layer and the dummy adjacent to each other The level difference between the surface portions corresponding to the gaps between the colored layers is smaller than the level difference between the dummy colored layer in the layer where the dummy colored layer is located and the gap between the adjacent dummy colored layers. The dummy colored layer is formed and the interval between the dummy colored layers adjacent to each other is adjusted so that this step is relaxed on the surface of the insulating film. Therefore, on the surface of the insulating film, it is possible to prevent a relatively large step from occurring in accordance with the step generated between the dummy colored layer in the layer where the dummy colored layer is located and the gap between the adjacent dummy colored layers. Can be flattened.

  Therefore, by disposing the gap material on the insulating film flattened in this way, the inter-substrate gap in the seal region can be controlled more easily. Therefore, according to this aspect, the cell gap can be easily and accurately controlled by the gap material included in the sealing material. As a result, high-definition display can be performed while preventing display defects such as display unevenness, and the electro-optical device can be downsized.

  In the aspect including the above-described insulating film, the insulating film is continuously formed by embedding the plurality of colored layers and the plurality of dummy colored layers from the pixel region to the seal region.

  According to this aspect, in the pixel region, the insulating film is formed by embedding the step formed on the surface of the layer on which the colored layer is disposed, and thus the step can be relaxed on the surface of the insulating film. . Therefore, in the plurality of colored layers, for example, the thickness of the colored layer is different for each color of R, G, and B, so that a step generated between the colored layers can be reduced by forming an insulating film.

  On the other hand, in the sealing region, as described above, the dummy colored layer is formed and the interval between the adjacent dummy colored layers is adjusted so that the step in the layer where the dummy colored layer is located is reduced on the surface of the insulating film. Is done. Therefore, in the layer where the dummy colored layer is located, the step formed between the dummy colored layer and the gap between the adjacent dummy colored layers is buried on the upper layer side so that the insulating film continuously from the pixel region. By being formed, the surface of the insulating film can be relaxed.

  Therefore, according to this aspect, the insulating film is continuously formed from the seal region to the pixel region, and the gap material is disposed on the insulating film, whereby the inter-substrate gap is increased between the seal region and the pixel region. It can be made closer to the same value, and the control of the gap between the substrates in the seal region can be performed more easily.

  In another aspect of the electro-optical device according to the aspect of the invention, the plurality of dummy colored layers may include all the arrangement areas of the plurality of dummy colored layers and all the areas of the gaps related to the intervals with respect to the area of the seal region. Are formed so that the ratio of each of them becomes about 50%.

  According to this aspect, by adjusting the arrangement area of each of the plurality of dummy colored layers and the gap between the adjacent dummy colored layers, the dummy in the layer where the dummy colored layer is located on the surface of the insulating film It is possible to alleviate the level difference between the colored layer and the gap between the dummy colored layers adjacent to each other.

  In this aspect, the arrangement areas of the plurality of dummy colored layers may be the same or different from each other. The same applies to the interval between the dummy coloring layers adjacent to each other.

  In another aspect of the electro-optical device of the present invention, the dummy colored layer is formed so that a ratio between the film thickness of the dummy colored layer and the interval is 1: 1.

  According to this aspect, by adjusting the ratio between the thickness of each dummy colored layer and the interval between the dummy colored layers adjacent to each other, for example, on the surface of the insulating film formed on the upper side of the dummy colored layer It is possible to alleviate the level difference between the dummy colored layer and the gap between the adjacent dummy colored layers in the layer where the dummy colored layer is located.

  In another aspect of the electro-optical device according to the aspect of the invention, the dummy colored layer includes a vertical conduction member formed in a vertical conduction portion for conducting electrical conduction between the pair of substrates around the pixel region. Is also formed in the vertical conduction part.

  According to this aspect, during operation of the electro-optical device, electrical conduction is made in the vertical conduction portion, whereby a predetermined voltage is applied to the liquid crystal sandwiched between the pair of substrates. By forming the dummy colored layer also in the vertical conduction part, the gap between the substrates in the vertical conduction part can be made closer to the same value as the gap between the substrates in the pixel area, similarly to the seal area. Therefore, it is not necessary to make the diameter of the vertical conductive material different from the inter-substrate gap in the pixel region, and the cell gap can be controlled with higher accuracy.

  In order to solve the above-described problems, an electronic apparatus according to the present invention includes the above-described electro-optical device according to the present invention (including various aspects thereof).

  According to the electronic apparatus of the present invention, since the electro-optical device of the present invention described above is included, a projection display device, a mobile phone, an electronic notebook, a word processor, and a viewfinder that can perform high-quality display. Various electronic devices such as a video tape recorder, a workstation, a videophone, a POS terminal, and a touch panel can be realized.

  Such an operation and other advantages of the present invention will become apparent from the best mode for carrying out the invention described below.

  Embodiments of an electro-optical device and an electronic apparatus according to the present invention will be described below with reference to the drawings. In this embodiment, as an example of the electro-optical device, a TFT active matrix driving type liquid crystal device with a built-in driving circuit is taken as an example.

  First, the overall configuration of the liquid crystal device according to the present embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view of the liquid crystal device as viewed from the counter substrate side together with the components formed on the TFT array substrate, and FIG. 2 is a cross-sectional view taken along the line H-H ′ in FIG. 1. is there.

  1 and 2, the liquid crystal device according to the present embodiment includes a TFT array substrate 10 and a counter substrate 20 which are arranged to face each other. The TFT array substrate 10 is a transparent substrate such as a quartz substrate, a glass substrate, or a silicon substrate. The counter substrate 20 is also a transparent substrate made of the same material as the TFT array substrate 10, for example. A liquid crystal layer 50 is sealed between the TFT array substrate 10 and the counter substrate 20, and the TFT array substrate 10 and the counter substrate 20 are sealed in a seal region 52a located around the image display region 10a. The materials 52 are bonded to each other. The image display area 10a is an area where light contributing to display is emitted and image display can be performed, and is an example of the “pixel area” according to the present invention. Here, the “pixel region” is a frame region where the frame light-shielding film 53 is disposed, and at least partially, when a dummy pixel that does not contribute to display but is formed to imitate a pixel is disposed, In some cases, the frame area may be at least partially included from the image display area 10a.

  The sealing material 52 is made of, for example, an ultraviolet curable resin, a thermosetting resin, or the like for bonding the two substrates, and is applied on the TFT array substrate 10 in the manufacturing process and then cured by ultraviolet irradiation, heating, or the like. It is. Further, for example, in the sealing material 52, a gap material 56 such as a glass fiber or a glass bead for dispersing the distance (inter-substrate gap) between the TFT array substrate 10 and the counter substrate 20 to a predetermined value is dispersed. The liquid crystal device according to this embodiment is small and suitable for performing enlarged display for a light valve of a projector.

  A light-shielding frame light-shielding film 53 that defines the frame area of the image display area 10a is provided on the counter substrate 20 side in parallel with the inside of the seal area 52a in which the sealing material 52 is disposed. However, part or all of the frame light shielding film 53 may be provided as a built-in light shielding film on the TFT array substrate 10 side.

  In the peripheral circuit region arranged in the peripheral region on the TFT array substrate 10, the data line driving circuit 101, the sampling circuit 7, the scanning line driving circuit 104, and the external circuit connection terminal 102 are formed.

  A data line driving circuit 101 and an external circuit connection terminal 102 are provided along one side of the TFT array substrate 10 on the outer peripheral side of the seal region 52a. In addition, the sampling circuit 7 is arranged in a region located inside the seal region 52 a so as to be covered with the frame light shielding film 53 along one side of the image display region 10 a along one side of the TFT array substrate 10. The scanning line driving circuit 104 is provided along two sides adjacent to one side of the TFT array substrate 10 so as to be covered with the frame light shielding film 53. Further, in order to electrically connect the two scanning line driving circuits 104 provided on both sides of the image display region 10a in this way, the TFT array substrate 10 is covered with the frame light shielding film 53 along the remaining side. A plurality of wirings 105 are provided.

  In the peripheral region on the TFT array substrate 10, vertical conduction portions 106 a for conducting electrical conduction between the TFT array substrate 10 and the counter substrate 20 are provided for the four corner portions of the counter substrate 20. .

  In FIG. 2, on the TFT array substrate 10, a laminated structure in which pixel switching TFTs as drive elements, wiring lines such as scanning lines and data lines are formed is formed. In the image display area 10a, pixel electrodes 9a are provided in a matrix form on the upper layers of wiring such as pixel switching TFTs (Thin Film Transistors), scanning lines, data lines, etc. with an insulating film 14 interposed therebetween. An alignment film (not shown in FIG. 2) is formed on the pixel electrode 9a. In the present embodiment, the pixel switching element may be constituted by various transistors, TFD, or the like in addition to the TFT.

  On the other hand, a light shielding film 23 is formed on the surface of the counter substrate 20 facing the TFT array substrate 10. The light shielding film 23 is formed of, for example, a light shielding metal film or the like, and is patterned, for example, in a lattice shape in the image display region 10a on the counter substrate 20. Then, on the light shielding film 23 (below the light shielding film 23 in FIG. 2), the counter electrode 21 made of a transparent material such as ITO is formed in a solid shape, for example, in opposition to the plurality of pixel electrodes 9 a via the insulating film 24. Further, an alignment film (not shown in FIG. 2) is formed on the counter electrode 21 (below the counter electrode 21 in FIG. 2).

  The liquid crystal layer 50 is made of, for example, a liquid crystal in which one or several types of nematic liquid crystals are mixed, and takes a predetermined alignment state between the pair of alignment films. A liquid crystal storage capacitor is formed between the pixel electrode 9 a and the counter electrode 21 by applying a voltage to each of the liquid crystal devices during driving.

  Although not shown here, on the TFT array substrate 10, in addition to the data line driving circuit 101 and the scanning line driving circuit 104, a plurality of data lines are precharged at a predetermined voltage level prior to the image signal. A precharge circuit to be supplied, an inspection circuit for inspecting the quality, defects, etc. of the liquid crystal device during manufacture or at the time of shipment may be formed.

  Next, the configuration of the counter substrate will be described in more detail with reference to FIGS. FIG. 3 is a partially enlarged plan view schematically showing an arrangement relationship of main components on the counter substrate side in a portion surrounded by a dotted line A0 in FIG. 1, and FIG. 4 is a sectional view taken along line AA ′ of FIG. FIG. 5 is a cross-sectional view showing a configuration of a cross-sectional portion corresponding to FIG. 4 for a configuration of a comparative example. FIG. 6 is a cross-sectional view illustrating a configuration of a cross-sectional portion along the line B-B ′ in FIG. 3. In FIGS. 3 to 6, the scale of each layer / member is different for each layer / member to have a size recognizable on the drawing. This is the same for the corresponding drawings described later. In FIGS. 4 and 6, focusing on the counter substrate side, the main configuration is illustrated, and the detailed configuration on the TFT array substrate side is not illustrated, and the description thereof may be omitted.

  3 to 6, the counter substrate 20 is bonded to the TFT array substrate 10 by the sealing material 52 disposed in the sealing region 52 a. 4 and 6, the gap between the counter substrate 20 and the TFT array substrate 10 is controlled by the gap material 56 disposed in the seal region 52a, so that the cell gap is adjusted.

  In each of the plurality of pixels in FIG. 3 or FIG. 4, typically, for example, light corresponding to any one of three colors of red (R), green (G), and blue (B) contributes to the display. The colored layer Cf is provided in the image display region 10a on the counter substrate 20 so that the light can be emitted as the light to be emitted. In this case, a plurality of colored layers Cf are provided for each color of R, G, and B on the counter substrate 20.

  Here, a voltage corresponding to the potential difference between the pixel electrode 9 a and the counter electrode 21 is applied to the liquid crystal 50 during the operation of the liquid crystal device. The liquid crystal 50 modulates light and enables gradation display by changing the orientation and order of the molecular assembly according to the applied voltage level. In each pixel, light that has passed through the liquid crystal 50 through the colored layer Cf is emitted as light that contributes to display, so that color display can be performed in the image display region 10a. Each pixel is provided with a driving element such as a pixel switching TFT, whereby an image signal is supplied to the pixel electrode 9a at a predetermined timing, thereby enabling active matrix driving.

  On the other hand, in FIGS. 3 and 4, a plurality of dummy colored layers dCf are provided in the seal region 52 a on the counter substrate 20. The plurality of dummy colored layers dCf are formed by simulating at least one colored layer Cf among the plurality of colored layers Cf in the image display region 10a. More specifically, each of the plurality of dummy colored layers dCf is formed in the same layer as the colored layer Cf by simulating the colored layer Cf of any one of R, G, and B colors. Therefore, each of the plurality of dummy colored layers dCf has the same film thickness as the colored layer Cf of any one of the colors R, G, and B, and in addition to or instead of the same material, It is formed. Even if the plurality of dummy colored layers dCf are arranged in the seal region 52a outside the image display region 10a and have the same configuration as the colored layer Cf, they do not function in the same manner as the colored layer Cf.

  4 and 6, a colored layer Cf is formed on the light shielding film 23 in the image display region 10a on the side of the counter substrate 20 facing the TFT array substrate 20, and a seal is formed in the same layer as the colored layer Cf. A dummy colored layer dCf is formed in the region 52a. The colored layer Cf and the dummy colored layer dCf are embedded, and an insulating film 24 is formed on the upper side, and the counter electrode 21 and the alignment film 22 are formed on the insulating film 24 as described with reference to FIG. The In FIG. 4, the alignment film 16 is formed on the plurality of pixel electrodes 9 a in the image display region 10 a on the side of the TFT array substrate 10 facing the counter substrate 20.

  As shown in FIG. 3 or FIG. 6, the plurality of dummy colored layers dCf are arranged in the seal region 52a with an interval dp. For each of the plurality of dummy colored layers dCf, in addition to the configuration such as the film thickness and the arrangement area in the seal region 52a, the interval dp between the adjacent dummy colored layers dCf in the array is adjusted as follows. In FIG. 6, an insulating film 24 as an example of the “insulating film” according to the present invention is formed on the upper side of the plurality of dummy colored layers dCf in the seal region 52 a so as to cover them. On the surface of the insulating film 24, a step due to a height difference between a surface portion at a position corresponding to the dummy colored layer dCf and a surface portion at a position corresponding to the gap between the adjacent dummy colored layers dCf is a difference in height of the dummy colored layer dCf. The dummy colored layer dCf is formed so that the level difference between the dummy colored layer dCf in the positioned layer and the gap between the adjacent dummy colored layers dCf is smaller than the level difference, and the level difference is relaxed on the surface of the insulating film 24. And the distance dp between the dummy colored layers dCf is adjusted.

  For this reason, in the present embodiment, with respect to the arrangement area of the seal region 52a on the counter substrate 20, all the arrangement areas of the plurality of dummy colored layers dCf and all the gaps due to the distance dp between the adjacent dummy colored layers dCf. It is preferable that each of the arrangement areas is formed so as to have a ratio of about 50%. In addition, in FIG. 6, it is preferable that the ratio of the film thickness h0 of the dummy colored layer dCf to the distance dp between the dummy colored layers dCf is 1: 1. In this case, the arrangement areas of the plurality of dummy colored layers dCf and the gap dp between the dummy colored layers dCf may be the same or different from each other. Further, the plurality of dummy colored layers dCf may be regularly arranged so that each interval dp has a predetermined value, or is formed as an irregular arrangement so that a different value is obtained for each interval dp. May be.

  In FIG. 4, in the image display region 10 a, a difference in level between the colored layers Cf may occur due to, for example, the different thicknesses of the colored layers Cf for each color of R, G, and B in the plurality of colored layers Cf. . As described above, also in the image display region 10a, the insulating film 24 is formed by embedding the plurality of colored layers Cf, so that a step generated on the surface of the layer where the colored layers Cf are arranged is also buried. Therefore, this step can be relaxed on the surface of the insulating film 24.

  On the other hand, in the seal region 52a, the distance dp between the dummy colored layers dCf is adjusted in addition to the configuration of the dummy colored layer dCf as described above, so that the dummy colored layer dCf is located in the layer where the dummy colored layer dCf is located. And an insulating film 24 is continuously formed from the image display region 10a by filling the step formed between the adjacent dummy colored layer dCf and on the upper layer side, thereby forming an insulating film. 24 can be relaxed on the surface. Therefore, in the insulating film 24, a continuously flattened surface can be formed from the image display region 10a to the seal region 52a.

  Here, regarding the comparative example shown in FIG. 5, focusing on the differences from the present embodiment, since the dummy colored layer dCf is not formed in the seal region 52 a, the colored layer Cf is disposed on the counter substrate 20. In the layer, a step is generated between the seal area 52a and the image display area 10a based on the presence or absence of the colored layer Cf. As a result, since the inter-substrate gap in the seal region 52a is different from the inter-substrate gap d0 in the image display region 10a, the diameter r1 of the gap material 56 is also different from the inter-substrate gap d0 in the image display region 10a. . In this case, in order to control the cell gap, it is necessary to adjust the diameter r1 of the gap member 56 with respect to the inter-substrate gap d0 in the image display region 10a, and the control of the cell gap may be complicated.

  On the other hand, in the present embodiment, in FIG. 4, in the layer where the colored layer Cf is arranged on the counter substrate 20, a step generated between the seal region 52a where the colored layer Cf is not formed and the image display region 10a is sealed. By arranging the dummy colored layer dCf in the region 52a, it is possible to make it smaller than the configuration shown in FIG. As a result, the gap between the substrates can be brought close to the same value in the seal region 52a and the image display region 10a, and can be ideally the same. Therefore, it is not necessary to make the gap material diameter r0 in the seal region 52a different from the inter-substrate gap d0 in the image display region 10a. Further, since the surface of the insulating film 24 can be continuously flattened from the image display region 10a to the seal region 52a, the gap material 56 is disposed on the insulating film 24 thus flattened. Thus, it is possible to more easily control the gap between the substrates in the seal region 52a. Therefore, it becomes possible to prevent the control of the cell gap from becoming complicated.

  Further, in FIG. 6, a plurality of dummy colored layers dCf have gaps between adjacent dummy colored layers dCf, and the seal material 52 is indicated by, for example, an arrow P0 in FIG. By irradiating light according to the traveling direction, the sealing material 52 can be easily photocured.

  Therefore, in the present embodiment as described above, the cell gap can be easily and accurately controlled by the gap material 56 disposed in the seal region 52a. As a result, it is possible to prevent display defects such as display unevenness without arranging a gap material in the image display region 10a, so that high-definition display can be performed and the liquid crystal device can be downsized. Become.

  As shown in FIG. 3, the plurality of dummy colored layers dCf are not limited to the configuration in which the plurality of dummy colored layers dCf are arranged in a stripe shape, but may be configured in a checkered pattern, for example.

  Next, a modification of the present embodiment will be described. In this modification, in addition to or instead of the counter substrate 20 side, a colored layer is formed on the TFT array substrate 10 side, and a dummy colored layer is disposed.

  FIG. 7 is a partial enlarged plan view schematically showing an arrangement relationship of main components on the TFT array substrate side in a portion surrounded by a dotted line B0 in FIG. 1, and FIG. It is sectional drawing which shows the structure of the cross-sectional part which follows CC 'line. 7 and 8, focusing on the TFT array substrate side, the main configuration is illustrated, and the detailed configuration on the counter substrate side is not illustrated, and the description thereof may be omitted.

  7 or 8, on the TFT array substrate 10, as in FIGS. 3 to 6, a colored layer Cf is provided in the image display area 10a, and a plurality of dummy colored layers dCf are spaced in the seal area 52a. Are arranged.

  Here, in FIG. 8, in the image display region 10a on the TFT array substrate 10, various wirings 6a and TFTs 30a are formed in a laminated structure, and a colored layer Cf is formed on the upper layer side from these, An insulating film 14 is formed by embedding the colored layer Cf, and a pixel electrode 9 a is formed on the insulating film 14.

  In FIG. 7, the peripheral region on the TFT array substrate 10 includes the seal region 52a as described with reference to FIG. 1, and the periphery where the data line driving circuit 101, the scanning line driving circuit 104, etc. are provided. A circuit region 110 is formed. In FIG. 8, also in the peripheral circuit region 110, various wirings 60a and TFTs 30b forming the scanning line driving circuit 104 and the like are formed in the laminated structure. The dummy colored layer dCf is formed in the same layer as the colored layer Cf in the stacked structure in the seal region 52a. The insulating film 14 is continuously formed from the image display region 10a to the seal region 52a by embedding the colored layer Cf and the dummy colored layer dCf.

  As shown in FIG. 7 or FIG. 8, the dummy colored layer dCf may extend from the seal region 52a to a part of the peripheral circuit region 110 located inside the seal region 52a.

  Here, the liquid crystal 50 is sealed between the counter substrate 20 and the TFT array substrate 10 inside the sealing region 52a where the sealing material 52 is formed. Therefore, as described above, by extending the dummy colored layer dCf to the inside of the seal region 52a, in the peripheral circuit region 110, a part where the seal region 52a is disposed and another part inside the seal region 52a. In FIG. 5, it is possible to prevent a situation in which the step difference based on the presence or absence of the dummy colored layer dCf is generated and the gap between the substrates is different. As a result, the cell gap can be controlled more easily and accurately. Such a configuration of the dummy colored layer dCf can also be applied to the configuration on the counter substrate 20 side as described with reference to FIGS.

  Therefore, also in this modification, it is possible to obtain the same effect as the case where the dummy colored layer dCf is provided on the counter substrate 20 side as already described.

  Next, another modified example of the present embodiment will be described. In addition to the dummy colored layer dCf being disposed in the seal region 52a as described above, the dummy colored layer dCf may also be disposed in the vertical conduction portion 106a.

  FIG. 9 is a partially enlarged plan view schematically showing the main configuration focusing on the vertical conduction portion, and FIG. 10 is a cross-sectional view showing the configuration of the cross-sectional portion along the line FF ′ in FIG. .

  As described with reference to FIG. 1, the vertical conduction portions 106 a are arranged at the corner portions of the seal region 52 a corresponding to the four corner portions of the counter substrate 20, for example. As shown in FIG. 10, in the vertical conduction portion 106 a, the vertical conduction terminal 106 is disposed on the TFT array substrate 10 side, and the vertical conduction member 57 is disposed between the TFT array substrate 10 and the counter substrate 20. In the vertical conduction part 106 a, the vertical conduction terminal 106 and the counter electrode 21 formed on the counter substrate 20 side, for example, in a solid shape up to the vertical conduction part 106 a, are electrically connected via the vertical conduction member 57.

  The dummy colored layer dCf is a pattern corresponding to the planar shape of the vertical conduction part 106a on the counter substrate 20 in the vertical conduction part 106a as shown in FIG. 9, for example, and is at least one colored layer Cf among the plurality of colored layers Cf. Is formed in the same layer as the colored layer Cf. In FIG. 10, the dummy colored layer dCf is embedded in the vertical conduction portion 106 a, the insulating film 24 is formed on the upper layer side, and the counter electrode 21 is formed on the insulating film 24.

  Therefore, also in the vertical conduction part 106a, similarly to the seal area 52a, the inter-substrate gap in the vertical conduction part 106a can be made close to the same value as the inter-substrate gap in the image display area 10a. Accordingly, the diameter r0 of the vertical conduction member 57 is set to be approximately the same as that of the gap member 56 (see FIG. 4) in the seal region 52a, and it is not necessary to make it different from the inter-substrate gap in the image display region 10a. Can be controlled.

  Note that the dummy colored layer dCf may be disposed on the TFT array substrate 10 side in addition to or in place of the counter substrate 20 side as well as the seal region 52a in the vertical conduction portion 106a.

  Next, the case where the liquid crystal device which is the above-described electro-optical device is applied to various electronic devices will be described. FIG. 11 is a plan view showing a configuration example of the projector. Hereinafter, a projector using the liquid crystal device as a light valve will be described.

  As shown in FIG. 11, a lamp unit 1102 including a white light source such as a halogen lamp is provided inside the projector 1100. The projection light emitted from the lamp unit 1102 is separated into three primary colors of RGB by four mirrors 1106 and two dichroic mirrors 1108 arranged in the light guide 1104, and serves as a light valve corresponding to each primary color. The light enters the liquid crystal panels 1110R, 1110B, and 1110G.

  The configurations of the liquid crystal panels 1110R, 1110B, and 1110G are the same as those of the liquid crystal device described above, and are driven by R, G, and B primary color signals supplied from the image signal processing circuit. The light modulated by these liquid crystal panels enters the dichroic prism 1112 from three directions. In the dichroic prism 1112, R and B light is refracted at 90 degrees, while G light travels straight. Therefore, as a result of the synthesis of the images of the respective colors, a color image is projected onto the screen or the like via the projection lens 1114.

  In addition to the electronic device described with reference to FIG. 11, a mobile personal computer, a mobile phone, a liquid crystal television, a viewfinder type, a monitor direct view type video tape recorder, a car navigation device, a pager, and an electronic notebook , Calculators, word processors, workstations, videophones, POS terminals, devices with touch panels, and the like. Needless to say, the present invention can be applied to these various electronic devices.

  In addition to the liquid crystal devices described in the above embodiments, the present invention can be applied to a reflective liquid crystal device (LCOS) or the like.

  The present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the spirit or idea of the invention that can be read from the claims and the entire specification, and an electro-optical device with such a change, In addition, an electronic apparatus including the electro-optical device is also included in the technical scope of the present invention.

1 is a schematic plan view of a liquid crystal device according to an embodiment. It is the HH 'sectional view taken on the line of FIG. FIG. 2 is a partial enlarged plan view schematically showing an arrangement relationship of main components on the counter substrate side in a portion surrounded by a dotted line A0 in FIG. It is sectional drawing which shows the structure of the cross-sectional part which follows the A-A 'line of FIG. It is sectional drawing which shows the structure of the cross-sectional part corresponding to FIG. 4 about the structure of a comparative example. It is sectional drawing which shows the structure of the cross-sectional part which follows the B-B 'line | wire of FIG. FIG. 2 is a partially enlarged plan view schematically showing an arrangement relationship of main components on the TFT array substrate side in a portion surrounded by a dotted line B0 in FIG. It is sectional drawing which shows the structure of the cross-sectional part which follows the C-C 'line of FIG. It is a partial enlarged plan view which pays attention to an up-and-down conduction part and shows roughly the main composition. It is sectional drawing which shows the structure of the cross-sectional part which follows the F-F 'line | wire in FIG. It is a top view which shows the structure of the projector which is an example of the electronic device to which a liquid crystal device is applied.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 ... TFT array substrate, 10a ... Image display area, 20 ... Counter substrate, 52a ... Seal area, 52 ... Seal material, 56 ... Gap material, Cf ... Colored layer, dCf ... Dummy colored layer

Claims (7)

A pair of substrates;
A seal member the comprises a gap material for controlling the gap between the pair of substrates, bonding the pair of substrates to each other,
A plurality of colored layers formed in the pixel region inside the sealing material and having different colors;
A plurality of layers formed on the same layer as the plurality of colored layers along a first side of one of the pair of substrates and a second side intersecting the first side so as to overlap the sealing material. A dummy colored layer of
A peripheral circuit provided at least partially inside the sealing material and provided along the first side and the second side of the one substrate, respectively.
The electro-optical device, wherein the plurality of dummy colored layers extend from the position overlapping the sealing material to the inside of the sealing material so as to overlap the peripheral circuit . Wherein the upper layer side than the plurality of dummy colored layer comprises a formed insulating film so as to overlap with at least the sealing material,
Claim 1, wherein the upper surface of the insulating film, so step formed on the basis of the thickness of the plurality of dummy colored layer is relaxed, the interval of the plurality of dummy colored layers, characterized in that it is adjusted The electro-optical device according to 1. 3. The electro-optic according to claim 2, wherein the insulating film is continuously formed by embedding the plurality of colored layers and the plurality of dummy colored layers in a region overlapping the sealing material from the pixel region. apparatus. Each of the plurality of dummy colored layers has a total area of the plurality of dummy colored layers and a total area of the gaps related to the interval between the plurality of dummy colored layers with respect to the area of the region where the sealing material is provided . 4. The electro-optical device according to claim 1, wherein the electro-optical device is formed to have a ratio of about 50%. 5. 5. The electro-optical device according to claim 1, wherein a ratio between a thickness of the dummy colored layer and a distance between the plurality of dummy colored layers is 1: 1. apparatus. In the periphery of the pixel region, a vertical conduction member formed in a vertical conduction part for performing electrical conduction between the pair of substrates,
The dummy colored layer, an electro-optical device according to any one of claims 1 5, characterized in that formed in the vertical conducting portion.   An electronic apparatus comprising the electro-optical device according to claim 1.

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