JP5304518B2

JP5304518B2 - Liquid crystal display panel and manufacturing method thereof

Info

Publication number: JP5304518B2
Application number: JP2009177686A
Authority: JP
Inventors: 幹男馬場
Original assignee: Casio Computer Co Ltd
Current assignee: Casio Computer Co Ltd
Priority date: 2009-07-30
Filing date: 2009-07-30
Publication date: 2013-10-02
Anticipated expiration: 2029-07-30
Also published as: JP2011033688A

Description

本発明は、液晶表示パネル及びその製造方法に関する。 The present invention relates to a liquid crystal display panel and a method for manufacturing the same.

従来、液晶表示装置の液晶表示パネルを製造する方式として、例えばＯＤＦ（ＯｎｅＤｒｏｐＦｉｌｌ）方式が知られている。ＯＤＦ方式においては、各種配線及び薄膜トランジスタが形成されたＴＦＴ基板をＣＦ基板と貼り合わせる際に、予めＴＦＴ基板に光硬化型のシール剤により形成した液晶封止領域中に液晶を滴下してから真空中で貼り合わせる。貼り合わせ後に大気圧に戻し、シール剤に囲まれた内側の領域と外側の領域との間の気圧差を利用してＴＦＴ基板とＣＦ基板とによってシール剤を押し広げてから、シール剤に対して紫外線を照射することにシール剤を硬化させている。
ここで、ＣＦ基板の周縁部に遮光膜としてのブラックマトリクスが形成されていて、ＴＦＴ基板においてブラックマトリクスに対向する部分に配線が形成されている場合がある。この場合、ＣＦ基板にはブラックマトリクスが形成されているためＴＦＴ基板側から紫外線を照射する必要があるが、シール剤のうち、紫外線の光源とシール剤との間にＴＦＴ基板の配線が介在する領域ではシール剤を硬化できない。 Conventionally, for example, an ODF (One Drop Fill) method is known as a method for manufacturing a liquid crystal display panel of a liquid crystal display device. In the ODF method, when a TFT substrate on which various wirings and thin film transistors are formed is bonded to a CF substrate, a liquid crystal is dropped into a liquid crystal sealing region that is previously formed on the TFT substrate with a photo-curing sealant, and then vacuum is applied. Paste inside. After bonding, the pressure is returned to atmospheric pressure, the pressure difference between the inner region and the outer region surrounded by the sealing agent is used to spread the sealing agent between the TFT substrate and the CF substrate, and then the sealing agent is applied. The sealant is cured by irradiating with ultraviolet rays.
Here, there is a case where a black matrix as a light shielding film is formed on the peripheral portion of the CF substrate, and wiring is formed on a portion of the TFT substrate facing the black matrix. In this case, since a black matrix is formed on the CF substrate, it is necessary to irradiate ultraviolet rays from the TFT substrate side, but among the sealing agents, the wiring of the TFT substrate is interposed between the ultraviolet light source and the sealing agent. The sealant cannot be cured in the region.

これを防止すべく、近年においては、貼り合わせた基板の表面に対して紫外線を斜め方向から入射させることで、基板間で多重反射を生じさせて、シール剤のうち、紫外線の光源とシール剤との間にＴＦＴ基板の配線やブラックマトリクスが介在する領域においても、シール剤を硬化させる液晶表示パネルの製造方法が考えられている（例えば特許文献１参照）。 In order to prevent this, in recent years, ultraviolet rays are incident on the surfaces of the bonded substrates from an oblique direction to cause multiple reflections between the substrates, and among the sealing agents, an ultraviolet light source and a sealing agent. A method of manufacturing a liquid crystal display panel in which a sealing agent is cured also in a region where a wiring of a TFT substrate and a black matrix are interposed between the two is considered (for example, see Patent Document 1).

特開２００４−４５６３号公報JP 2004-4563 A

特許文献１に記載される製造方法では、貼り合わせ基板の表面に対して斜め方向に入射させた紫外線を表面が平坦な遮光膜や金属配線で何度か反射させてシール剤に紫外線を照射している。シール剤のうち特に液晶に隣接する領域に対しては可能な限り紫外線の強度を減衰させてから紫外線を照射することにより、液晶側に紫外線が漏れて液晶の汚染が発生しないようにしている。特許文献１に記載の発明では、上述のように多重反射され強度が減衰した紫外線を利用しているため、光源から出射されるときの紫外線の強度は必然的に高く設定されることになる。このように紫外線の強度が高く設定されていると、液晶封止領域内に直接入射した紫外線が直接または各基板の表面で反射して高強度のまま液晶に達してしまい、液晶を汚染してしまう可能性が高くなってしまう。
本発明の課題は、紫外線を大きくすることなくシール剤を硬化することができ、ひいてはシール剤を硬化する時に紫外線が直接または反射して高強度のまま液晶に到達し、液晶を汚染する可能性を高めることなく、シール剤を硬化することのできる液晶表示パネル及びその製造方法を提供することである。 In the manufacturing method described in Patent Document 1, ultraviolet light incident in an oblique direction with respect to the surface of the bonded substrate is reflected several times by a light shielding film or metal wiring with a flat surface, and the sealing agent is irradiated with ultraviolet light. ing. In particular, a region adjacent to the liquid crystal in the sealant is irradiated with the ultraviolet ray after the intensity of the ultraviolet ray is attenuated as much as possible to prevent the ultraviolet ray from leaking to the liquid crystal side and causing the contamination of the liquid crystal. Since the invention described in Patent Document 1 uses ultraviolet light that has been multiple-reflected and attenuated as described above, the intensity of the ultraviolet light emitted from the light source is inevitably set high. When the intensity of the ultraviolet rays is set to be high in this way, the ultraviolet rays that are directly incident on the liquid crystal sealing region are reflected directly or on the surface of each substrate and reach the liquid crystal with high intensity, which contaminates the liquid crystal. The possibility that it will end up increases.
The problem of the present invention is that the sealing agent can be cured without increasing the ultraviolet ray, and as a result, when the sealing agent is cured, there is a possibility that the ultraviolet ray directly or reflects and reaches the liquid crystal with high intensity and contaminates the liquid crystal. It is providing the liquid crystal display panel which can harden | cure a sealing agent, and its manufacturing method, without raising.

以上の課題を解決するため、本発明の一の態様によれば、
第一の透明基板と、
前記第一の透明基板との間に液晶層と該液晶層を取り囲むシール剤とが介在された状態で前記第一の透明基板に重ね合わされた第二の透明基板と、
前記第一の透明基板と前記シール剤との間に介在された配線と、
前記第二の透明基板と前記シール剤との間に前記配線と重なった状態で介在され、前記第一の透明基板に対して前記第二の透明基板が配置された側とは反対側から入射される光を乱反射する乱反射層、
前記第二の透明基板と前記乱反射層との間に前記シール剤と重なった状態で介在された光を遮断する遮光膜と、を備え、
前記乱反射層のうち該乱反射層に対して前記液晶層が配置された側の端部は、前記遮光膜のうち該遮光膜に対して前記液晶層が配置された側の端部よりも、前記液晶表示パネルの表示領域からの距離が離れていることを特徴とする液晶表示パネルが提供される。 In order to solve the above problems, according to one aspect of the present invention,
A first transparent substrate;
A second transparent substrate superimposed on the first transparent substrate with a liquid crystal layer and a sealing agent surrounding the liquid crystal layer interposed between the first transparent substrate,
Wiring interposed between the first transparent substrate and the sealant;
It is interposed between the second transparent substrate and the sealing agent so as to overlap the wiring, and is incident on the first transparent substrate from the side opposite to the side on which the second transparent substrate is disposed. Diffuse reflection layer that diffuses reflected light ,
A light shielding film that blocks light interposed between the second transparent substrate and the irregular reflection layer in a state of overlapping with the sealant ,
The end of the irregular reflection layer on the side where the liquid crystal layer is disposed with respect to the irregular reflection layer is more than the end of the light shielding film on the side where the liquid crystal layer is disposed with respect to the light shielding film. There is provided a liquid crystal display panel characterized in that the distance from the display area of the liquid crystal display panel is increased.

上記液晶表示パネルにおいて、好ましくは、前記乱反射層は前記シール剤の全体と重なっている。
上記液晶表示パネルにおいて、好ましくは、前記液晶層と重なる領域から前記シール剤と重なる領域にかけて、前記乱反射層が連続的に形成されている。
上記液晶表示パネルにおいて、好ましくは、前記遮光膜は前記シール剤の全体と重なっている。
上記液晶表示パネルにおいて、好ましくは、前記液晶層と重なる領域から前記シール剤と重なる領域にかけて、前記遮光膜が連続的に形成されている。
上記液晶表示パネルにおいて、好ましくは、前記液晶層と重なる領域から前記第二の透明基板の端部にかけて、前記遮光膜が形成されている。
上記液晶表示パネルにおいて、好ましくは、前記乱反射層のうち前記第一の透明基板と対向する対向面に金属膜が成膜されている。
上記液晶表示パネルにおいて、好ましくは、前記第一の透明基板と前記液晶層との間に介在した状態で前記液晶表示パネルの表示領域内に形成された画素電極をさらに有し、
前記画素電極に接続された薄膜トランジスタを駆動する駆動回路が搭載される駆動回路搭載領域が、前記第一の透明基板のうち前記第二の透明基板から突出した突出部に形成され、
前記配線は、前記薄膜トランジスタに接続された走査線または信号線と、前記駆動回路搭載領域に形成されたゲート端子またはデータ端子とを接続する引き回し配線である。 In the liquid crystal display panel, preferably, the irregular reflection layer overlaps the entire sealing agent.
In the liquid crystal display panel, preferably, the irregular reflection layer is continuously formed from a region overlapping with the liquid crystal layer to a region overlapping with the sealant .
In the liquid crystal display panel, preferably, the light shielding film overlaps the entire sealing agent.
In the liquid crystal display panel, preferably, the light shielding film is continuously formed from a region overlapping with the liquid crystal layer to a region overlapping with the sealant.
In the liquid crystal display panel, preferably, the light shielding film is formed from a region overlapping with the liquid crystal layer to an end of the second transparent substrate.
In the liquid crystal display panel, preferably, a metal film is formed on a surface of the irregular reflection layer facing the first transparent substrate.
Preferably, the liquid crystal display panel further includes a pixel electrode formed in a display region of the liquid crystal display panel in a state of being interposed between the first transparent substrate and the liquid crystal layer,
A drive circuit mounting region in which a drive circuit for driving a thin film transistor connected to the pixel electrode is mounted is formed in a protruding portion protruding from the second transparent substrate of the first transparent substrate,
The wiring is a lead wiring that connects a scanning line or a signal line connected to the thin film transistor to a gate terminal or a data terminal formed in the driving circuit mounting region.

また、本発明の他の態様によれば、
完成された複数の液晶表示パネルを形成することができる面積を有し、一の面上における前記複数の液晶表示パネルの各表示領域内に画素電極が形成され、前記各表示領域の外側に配線が形成された第一の基板を準備する第１基板準備工程と、
完成された複数の液晶表示パネルを形成することができる面積を有し、一の面上における前記複数の液晶表示パネルの各表示領域内にカラーフィルタ層が形成され、光を遮断する遮光膜と該遮光膜上に配置され光を乱反射する乱反射層が前記各表示領域の外側に形成された第二の基板を準備する第２基板準備工程と、
前記第一の基板上及び該第一の基板の前記各配線上、または、前記第二の基板上及び該第二の基板の前記各乱反射層上のいずれか一方に、前記各表示領域を取り囲んで光硬化型のシール剤を形成するシール剤形成工程と、
前記第一の基板または前記第二の基板における前記各シール剤に囲まれた領域に液晶を配置する液晶配置工程と、
前記各シール剤を前記第一の基板の前記各配線および前記第二の基板の前記各乱反射層と重ねた状態で、前記第一の基板と前記第二の基板とを貼り合わせる貼り合わせ工程と、
前記第一の基板に対して前記第二の基板が配置された側とは反対側から前記各シール剤に向けて光を照射する光照射工程とを含み、
前記第二基板準備工程は、前記各遮光膜のうち該各遮光膜に対して該各遮光膜に対応する表示領域が配置された側の端部よりも、前記各遮光膜上に配置された前記乱反射層のうち該各乱反射層に対して前記各遮光膜に対応する表示領域が配置された側の端部の方が、前記各遮光膜に対応する表示領域から離れた状態となるように、前記各乱反射層を形成する乱反射層形成工程をさらに含むことを特徴とする液晶表示パネルの製造方法が提供される。 According to another aspect of the invention,
A pixel electrode is formed in each display region of the plurality of liquid crystal display panels on one surface and has an area where a plurality of completed liquid crystal display panels can be formed, and wiring is provided outside the display regions. A first substrate preparation step of preparing a first substrate on which is formed;
A light-shielding film having an area capable of forming a plurality of completed liquid crystal display panels, a color filter layer being formed in each display region of the plurality of liquid crystal display panels on one surface, and blocking light; A second substrate preparing step of preparing a second substrate in which an irregular reflection layer disposed on the light-shielding film and irregularly reflecting light is formed outside each display region;
The display areas are surrounded on either the first substrate and the wirings of the first substrate, or on the second substrate and the irregular reflection layers of the second substrate. A sealing agent forming step of forming a photo-curable sealing agent with,
A liquid crystal disposing step of disposing liquid crystal in a region surrounded by each sealing agent in the first substrate or the second substrate;
A bonding step of bonding the first substrate and the second substrate in a state in which the respective sealing agents are overlapped with the respective wirings of the first substrate and the respective irregular reflection layers of the second substrate; ,
The saw including a light irradiating step of irradiating light toward the opposite side to the respective sealant from the first side to the second substrate is disposed against the substrate,
The second substrate preparation step is arranged on each light shielding film with respect to each light shielding film from the end on the side where the display region corresponding to each light shielding film is arranged. The end of the irregular reflection layer on the side where the display region corresponding to each light shielding film is arranged with respect to each irregular reflection layer is in a state of being separated from the display region corresponding to each light shielding film. There is provided a method for manufacturing a liquid crystal display panel, further comprising an irregular reflection layer forming step of forming the irregular reflection layers .

上記液晶表示パネルの製造方法において、好ましくは、前記第二基板準備工程は、前記各遮光膜のうち該各遮光膜に対して該各遮光膜に対応する表示領域が配置された側の端部よりも、前記各遮光膜上に配置された前記乱反射層のうち該各乱反射層に対して前記各遮光膜に対応する表示領域が配置された側の端部の方が、前記各遮光膜に対応する表示領域から離れた状態となるように、前記各乱反射層を形成する乱反射層形成工程をさらに含む。
上記液晶表示パネルの製造方法において、好ましくは、前記各遮光膜は前記第二の基板の平坦な面上に形成されていて、
前記乱反射層形成工程は、前記各遮光膜上に感光性樹脂を塗布し、次いで、露光および現像処理により前記各遮光膜上に多数の微小な凹凸を形成し、次いで、前記多数の微小な凹凸上に金属膜を成膜することを含む。
上記液晶表示パネルの製造方法において、好ましくは、前記各遮光膜は前記第二の基板の凹凸を有する面上に形成されていて、
前記乱反射層形成工程は、前記各遮光膜上に金属膜を成膜することを含む。
上記液晶表示パネルの製造方法において、好ましくは、前記第二の基板の表面に対してフッ酸溶液を用いてフロスト加工することにより、前記第二の基板の前記凹凸を有する面を形成することを含む。
上記液晶表示パネルの製造方法において、好ましくは、前記金属膜を成膜後、露光および現像処理により前記金属膜の一部を除去して前記各乱反射層を形成することを含む。
上記液晶表示パネルの製造方法において、好ましくは、前記貼り合わせ工程は、前記各シール剤の全体を前記第二の基板の前記各乱反射膜と重ねた状態で、前記第二の基板と前記第一の基板とを貼り合わせることを含み、
前記光照射工程は、前記第一の基板に対して前記第二の基板が配置された側とは反対側に配置された光源から前記シール剤に向けて照射された光を前記乱反射層で乱反射させて、前記各シール剤のうち前記光源との間に前記各配線が介在された部分に照射させることを含む。
上記液晶表示パネルの製造方法において、好ましくは、前記光照射工程は、前記各シール剤に向けて光を照射する前に、前記第一の基板に対して前記第二の基板が配置された側とは反対側に、前記第一の基板のうち前記各表示領域をなす領域を覆い、前記光源からの光を遮断するマスクを配置することを含む。
上記液晶表示パネルの製造方法において、好ましくは、前記光照射工程の後に、前記第一の基板と前記第二の基板とを貼り合わせた液晶表示パネル形成用構成体を切断して個片化する個片化工程をさらに含む。 In the method for manufacturing a liquid crystal display panel, preferably, the second substrate preparation step includes an end portion on a side where a display region corresponding to each light shielding film is disposed with respect to each light shielding film among the light shielding films. Rather than the diffuse reflection layer disposed on each light shielding film, the end on the side where the display region corresponding to each light shielding film is disposed with respect to each diffuse reflection layer is located on each light shielding film. It further includes a diffused reflection layer forming step of forming each diffused reflection layer so as to be separated from the corresponding display area.
In the liquid crystal display panel manufacturing method, preferably, each light shielding film is formed on a flat surface of the second substrate,
In the irregular reflection layer forming step, a photosensitive resin is applied on each of the light shielding films, and then a number of minute irregularities are formed on each of the light shielding films by exposure and development, and then the number of minute irregularities is formed. Forming a metal film thereon.
In the liquid crystal display panel manufacturing method, preferably, each light shielding film is formed on a surface having irregularities of the second substrate,
The irregular reflection layer forming step includes forming a metal film on each light shielding film.
In the manufacturing method of the liquid crystal display panel, preferably, the surface of the second substrate having the unevenness is formed by frosting the surface of the second substrate using a hydrofluoric acid solution. Including.
Preferably, the method for manufacturing a liquid crystal display panel includes forming each of the irregular reflection layers by removing a part of the metal film by exposure and development after forming the metal film.
In the method for manufacturing a liquid crystal display panel, preferably, the bonding step includes the second substrate and the first substrate in a state where the entire sealing agent is overlapped with the irregular reflection films on the second substrate. Including bonding to the substrate of
In the light irradiation step, the light irradiated toward the sealant from the light source disposed on the side opposite to the side on which the second substrate is disposed with respect to the first substrate is irregularly reflected by the irregular reflection layer. And irradiating a portion of each of the sealing agents where the wirings are interposed between the light sources.
In the method for manufacturing a liquid crystal display panel, preferably, the light irradiation step is a side where the second substrate is disposed with respect to the first substrate before irradiating the light toward the respective sealing agents. And a mask for covering the areas forming the respective display areas of the first substrate and blocking light from the light source.
In the liquid crystal display panel manufacturing method, preferably, after the light irradiation step, the liquid crystal display panel forming structure in which the first substrate and the second substrate are bonded together is cut into individual pieces. It further includes an individualization step.

また、本発明の他の態様によれば、
完成された少なくとも１つの液晶表示パネルを形成することができる面積を有し、一の面上における前記少なくとも１つの液晶表示パネルの表示領域内に画素電極が形成され、前記表示領域の外側に配線が形成された第一の基板を準備する第１基板準備工程と、
完成された少なくとも１つの液晶表示パネルを形成することができる面積を有し、一の面上における前記少なくとも１つの液晶表示パネルの表示領域内にカラーフィルタ層が形成され、光を遮断する遮光膜と該遮光膜上に配置され光を乱反射する乱反射層が前記表示領域の外側に形成された第二の基板を準備する第２基板準備工程と、
前記第一の基板上及び該第一の基板の前記配線上、または、前記第二の基板上及び該第二の基板の前記乱反射層上のいずれか一方に、前記表示領域を取り囲んで光硬化型のシール剤を形成するシール剤形成工程と、
前記第一の基板または前記第二の基板における前記シール剤に囲まれた領域に液晶を配置する液晶配置工程と、
前記シール剤を前記第一の基板の前記配線および前記第二の基板の前記乱反射層と重ねた状態で、前記第一の基板と前記第二の基板とを貼り合わせる貼り合わせ工程と、
前記第一の基板に対して前記第二の基板が配置された側とは反対側から前記シール剤に向けて光を照射する光照射工程とを含み、
前記第二基板準備工程は、前記各遮光膜のうち該各遮光膜に対して該各遮光膜に対応する表示領域が配置された側の端部よりも、前記各遮光膜上に配置された前記乱反射層のうち該各乱反射層に対して前記各遮光膜に対応する表示領域が配置された側の端部の方が、前記各遮光膜に対応する表示領域から離れた状態となるように、前記各乱反射層を形成する乱反射層形成工程をさらに含むことを特徴とする液晶表示パネルの製造方法が提供される。 According to another aspect of the invention,
A pixel electrode is formed in a display area of the at least one liquid crystal display panel on one surface and has an area where a completed at least one liquid crystal display panel can be formed, and wiring is provided outside the display area. A first substrate preparation step of preparing a first substrate on which is formed;
A light-shielding film having an area capable of forming a completed at least one liquid crystal display panel, and having a color filter layer formed in a display area of the at least one liquid crystal display panel on one surface to block light A second substrate preparing step of preparing a second substrate disposed on the light-shielding film and having a diffused reflection layer for irregularly reflecting light formed outside the display region;
Photocuring surrounding the display area on either the first substrate and the wiring of the first substrate, or on the second substrate and on the irregular reflection layer of the second substrate. A sealing agent forming step for forming a mold sealing agent;
A liquid crystal disposing step of disposing a liquid crystal in a region surrounded by the sealant in the first substrate or the second substrate;
A bonding step of bonding the first substrate and the second substrate in a state where the sealing agent is overlapped with the wiring of the first substrate and the irregular reflection layer of the second substrate;
The saw including a light irradiating step of irradiating light toward the opposite side to the sealant from the first side to the second substrate is disposed against the substrate,
The second substrate preparation step is arranged on each light shielding film with respect to each light shielding film from the end on the side where the display region corresponding to each light shielding film is arranged. The end of the irregular reflection layer on the side where the display region corresponding to each light shielding film is arranged with respect to each irregular reflection layer is in a state of being separated from the display region corresponding to each light shielding film. There is provided a method for manufacturing a liquid crystal display panel, further comprising an irregular reflection layer forming step of forming the irregular reflection layers .

本発明によれば、紫外線の強度を大きくすることなくシール剤を硬化することができ、ひいてはシール剤を硬化する時に紫外線が直接または反射して高強度のまま液晶に到達し、液晶を汚染する可能性を高めることなく、シール剤を硬化することができる。 According to the present invention, the sealing agent can be cured without increasing the intensity of the ultraviolet rays. As a result, when the sealing agent is cured, the ultraviolet rays are directly or reflected to reach the liquid crystal with high intensity and contaminate the liquid crystal. The sealant can be cured without increasing the possibility.

本実施形態の液晶表示パネルに備わる液晶表示パネルの概略構成を示す斜視図である。It is a perspective view which shows schematic structure of the liquid crystal display panel with which the liquid crystal display panel of this embodiment is equipped. 図１におけるII−II切断線から見た液晶表示パネルの断面図である。It is sectional drawing of the liquid crystal display panel seen from the II-II cutting line in FIG. 本実施形態の液晶表示パネルのＴＦＴ基板上に形成された回路の一部を示す平面図である。It is a top view which shows a part of circuit formed on the TFT substrate of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造工程図である。It is a manufacturing-process figure of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法の一工程を示す説明図である。It is explanatory drawing which shows 1 process of the manufacturing method of the liquid crystal display panel of this embodiment. 本実施形態の液晶表示パネルの製造方法における光照射工程での紫外線の光路を示す説明図である。It is explanatory drawing which shows the optical path of the ultraviolet-ray in the light irradiation process in the manufacturing method of the liquid crystal display panel of this embodiment. 比較例としての乱反射膜のない液晶表示パネルの製造方法における光照射工程での紫外線の光路を示す説明図である。It is explanatory drawing which shows the optical path of the ultraviolet-ray in the light irradiation process in the manufacturing method of the liquid crystal display panel without an irregular reflection film as a comparative example.

以下に、本発明を実施するための最良の形態について図面を用いて説明する。ただし、以下に述べる実施形態には、本発明を実施するために技術的に好ましい種々の限定が付されているが、発明の範囲を以下の実施形態及び図示例に限定するものではない。 The best mode for carrying out the present invention will be described below with reference to the drawings. However, although various technically preferable limitations for implementing the present invention are given to the embodiments described below, the scope of the invention is not limited to the following embodiments and illustrated examples.

まず、本実施形態の液晶表示パネルの製造方法により形成された液晶表示パネルについて説明する。図１は、液晶表示パネル１の概略構成を示す斜視図である。図２は、図１におけるII−II切断線から見た断面図である。図３はＴＦＴ基板１０上に形成された回路の一部を示す平面図である。図１〜図３に示すように、液晶表示パネル１は、第一の透明基板としてのガラス基板１１を有するＴＦＴ基板１０、第二の透明基板としてのガラス基板２１を有するＣＦ基板２０、そしてＴＦＴ基板１０とＣＦ基板２０との間に介在されたシール剤３０を有する。ＴＦＴ基板１０は、４辺のうち少なくとも一辺においてＣＦ基板２０から突出した突出部１０ａを有する形状をなしており、この突出部１０ａに駆動回路６０が搭載されている。シール剤３０は、ＣＦ基板２０の外周縁に沿って枠状に形成され、シール剤３０、ＴＦＴ基板１０及びＣＦ基板２０により形成された空間内に液晶層４０が封入されている。 First, the liquid crystal display panel formed by the liquid crystal display panel manufacturing method of the present embodiment will be described. FIG. 1 is a perspective view showing a schematic configuration of the liquid crystal display panel 1. 2 is a cross-sectional view taken along the line II-II in FIG. FIG. 3 is a plan view showing a part of a circuit formed on the TFT substrate 10. As shown in FIGS. 1 to 3, a liquid crystal display panel 1 includes a TFT substrate 10 having a glass substrate 11 as a first transparent substrate, a CF substrate 20 having a glass substrate 21 as a second transparent substrate, and a TFT. A sealant 30 is interposed between the substrate 10 and the CF substrate 20. The TFT substrate 10 has a shape having a protruding portion 10a protruding from the CF substrate 20 on at least one of the four sides, and a drive circuit 60 is mounted on the protruding portion 10a. The sealing agent 30 is formed in a frame shape along the outer peripheral edge of the CF substrate 20, and the liquid crystal layer 40 is sealed in a space formed by the sealing agent 30, the TFT substrate 10, and the CF substrate 20.

この液晶表示パネル１は、薄膜トランジスタ（ＴＦＴ）をアクティブ素子としたアクティブマトリックス液晶素子である。ガラス基板１１におけるＣＦ基板２０との対向面（ＴＦＴ基板１０の内面）１２における液晶表示パネル１の表示領域Ｇ内には、行及び列方向にマトリクス状に配列させて形成されて画素を形成する複数の画素電極３３と、複数の画素電極３３にそれぞれ対応させて配置され、対応する画素電極３３に接続された複数の薄膜トランジスタ３４と、各行の複数の薄膜トランジスタ３４にそれぞれゲート信号を供給する複数の走査線３５と、各列の複数の薄膜トランジスタ３４にそれぞれデータ信号を供給する複数の信号線３６とが設けられている。また、ガラス基板１１におけるＣＦ基板２０との対向面（ＴＦＴ基板１０の内面）１２における液晶表示パネル１の表示領域Ｇの外側には、複数の走査線３５または複数の信号線３６のうちいずれか１つにそれぞれ接続された複数の引き回し配線１３が形成されている。複数の引き回し配線１３のうち複数の走査線３５に接続された一部の引き回し配線１３の各端部が、突出部１０ａのうち駆動回路６０が搭載される駆動回路搭載領域３９に配置されてゲート端子３７を形成し、複数の引き回し配線１３のうち信号線３６に接続された他の一部の引き回し配線１３の各端部が、突出部１０ａの駆動回路搭載領域３９に配置されてデータ端子３８を形成している。そして、複数の引き回し配線１３はそれぞれ、その全体または一部がシール剤３０と重ねて形成されている。尚、図２において、複数の引き回し配線１３上に形成された保護膜は図示を省略している。 The liquid crystal display panel 1 is an active matrix liquid crystal element using a thin film transistor (TFT) as an active element. In the display region G of the liquid crystal display panel 1 on the surface 12 (the inner surface of the TFT substrate 10) of the glass substrate 11 facing the CF substrate 20, pixels are formed by being arranged in a matrix in the row and column directions. A plurality of pixel electrodes 33, a plurality of thin film transistors 34 arranged corresponding to the plurality of pixel electrodes 33, respectively, and a plurality of thin film transistors 34 connected to the corresponding pixel electrodes 33, and a plurality of thin film transistors 34 in each row A scanning line 35 and a plurality of signal lines 36 for supplying data signals to the plurality of thin film transistors 34 in each column are provided. In addition, any one of a plurality of scanning lines 35 or a plurality of signal lines 36 is provided outside the display region G of the liquid crystal display panel 1 on the surface 12 of the glass substrate 11 facing the CF substrate 20 (inner surface of the TFT substrate 10). A plurality of lead wirings 13 connected to each other are formed. Each end portion of a part of the wiring lines 13 connected to the plurality of scanning lines 35 among the plurality of wiring lines 13 is arranged in the driving circuit mounting region 39 in which the driving circuit 60 is mounted in the protruding portion 10a. A terminal 37 is formed, and each end portion of the other part of the routing wiring 13 connected to the signal line 36 among the plurality of routing wirings 13 is arranged in the drive circuit mounting area 39 of the protruding portion 10a to be the data terminal 38. Is forming. Each of the plurality of routing wires 13 is formed so that the whole or a part thereof overlaps with the sealant 30. In FIG. 2, the protective film formed on the plurality of routing wirings 13 is not shown.

一方、ガラス基板２１におけるＴＦＴ基板１０との対向面（ＣＦ基板２０の内面）２２には、複数の画素電極３３の配列領域全体に対向させて形成された対向電極（不図示）と、複数の画素電極３３と対向電極とが互いに対向する領域からなる複数の画素にそれぞれ対応させて形成された赤、緑、青の３色のカラーフィルタ層（不図示）とが設けられている。そして、ガラス基板２１の対向面２２の外周縁部には、ＴＦＴ基板１０に対してＣＦ基板２０が配置された側とは反対側に配置されるバックライトから液晶表示パネル１に向けて照射される光を遮断する枠状の遮光膜２３が、表示領域Ｇを取り囲んで形成されている。この遮光膜２３はガラス基板２１の対向面２２上にシール剤３０と重ねて、液晶層４０と重なる領域からＣＦ基板２０の外側の端部２４にかけて連続的に形成されている。 On the other hand, the opposing surface (inner surface of the CF substrate 20) 22 of the glass substrate 21 with respect to the TFT substrate 10 has opposing electrodes (not shown) formed so as to oppose the entire array region of the plurality of pixel electrodes 33, and a plurality of There are provided color filter layers (not shown) of three colors of red, green, and blue, which are formed so as to correspond to a plurality of pixels each having a region in which the pixel electrode 33 and the counter electrode face each other. Then, the outer peripheral edge portion of the facing surface 22 of the glass substrate 21 is irradiated toward the liquid crystal display panel 1 from a backlight disposed on the opposite side of the TFT substrate 10 from the side on which the CF substrate 20 is disposed. A frame-shaped light-shielding film 23 that shields light is formed so as to surround the display region G. The light shielding film 23 is continuously formed on the opposing surface 22 of the glass substrate 21 so as to overlap the sealing agent 30 and from the region overlapping the liquid crystal layer 40 to the outer end 24 of the CF substrate 20.

また、ＴＦＴ基板１０およびＣＦ基板２０の内面にはそれぞれ、電極を覆う配向膜（不図示）が形成されており、この配向膜により液晶４０の液晶分子は初期配向状態に保持され配向されている。そして、突出部１０ａの駆動回路搭載領域３９に搭載された駆動回路６０は、ゲート端子３７を介して複数の走査線３５に順次ゲート信号を印加し、データ端子３８を介して複数の信号線３６にデータ信号を印加するものである。さらに、突出部１０ａの端部には、図示しない外部回路からのドライバ制御信号を駆動回路６０に供給する配線フィルム（不図示）が接続されている。
ここで、液晶表示パネル１において、液晶層４０が配置されて、複数の薄膜トランジスタ３４が形成され且つ遮光膜２３によって取り囲まれた領域のうち、当該領域の外周縁部を除く領域が液晶表示パネル１の表示領域Ｇとされる。 In addition, an alignment film (not shown) that covers the electrodes is formed on the inner surfaces of the TFT substrate 10 and the CF substrate 20, respectively, and the liquid crystal molecules of the liquid crystal 40 are held in the initial alignment state and aligned by the alignment film. . Then, the drive circuit 60 mounted on the drive circuit mounting region 39 of the protruding portion 10 a sequentially applies gate signals to the plurality of scanning lines 35 via the gate terminals 37 and the plurality of signal lines 36 via the data terminals 38. A data signal is applied to. Further, a wiring film (not shown) for supplying a driver control signal from an external circuit (not shown) to the drive circuit 60 is connected to the end of the protruding portion 10a.
Here, in the liquid crystal display panel 1, the region excluding the outer peripheral edge portion of the region where the liquid crystal layer 40 is disposed, the plurality of thin film transistors 34 is formed, and is surrounded by the light shielding film 23 is the liquid crystal display panel 1. Display area G.

遮光膜２３におけるＴＦＴ基板１０に対向する対向面のうち、遮光膜２３に対して表示領域Ｇが配置された側の縁部を除く領域、即ち枠状の遮光膜２３の内周縁部に、入射した光を乱反射する乱反射層５０が形成されている。即ち、遮光膜２３のうち該遮光膜２３に対して液晶層４０および表示領域Ｇが配置された側の端部よりも、遮光膜２３上に配置された乱反射層５０のうち該乱反射層５０に対して液晶層４０および表示領域Ｇが配置された側の端部の方が、表示領域Ｇから離れた状態となっている。また、この乱反射層５０は、遮光膜２３の対向面上にシール剤３０の全体と重ねて液晶層４０と重なる領域からＣＦ基板２０の外側の端部２４にかけて連続的に形成されている。 Of the light-shielding film 23 facing the TFT substrate 10, the light is incident on a region excluding the edge on the side where the display region G is disposed with respect to the light-shielding film 23, that is, the inner peripheral edge of the frame-shaped light-shielding film 23 An irregular reflection layer 50 for irregularly reflecting the reflected light is formed. That is, the irregular reflection layer 50 of the irregular reflection layer 50 disposed on the light shielding film 23 rather than the end of the light shielding film 23 on the side where the liquid crystal layer 40 and the display region G are disposed with respect to the light shielding film 23. On the other hand, the end on the side where the liquid crystal layer 40 and the display area G are arranged is in a state of being separated from the display area G. Further, the irregular reflection layer 50 is continuously formed on the opposing surface of the light shielding film 23 from the region overlapping the liquid crystal layer 40 over the entire sealing agent 30 to the end 24 on the outer side of the CF substrate 20.

乱反射層５０は、例えばアルミニウムや白金等の金属からなる金属膜であり、そのＴＦＴ基板１０に対向する表面５１に微小な凹凸５１が多数形成されている。この乱反射層５０によって、ＴＦＴ基板１０側から遮光膜２３に向けて照射される光が乱反射される。乱反射層５０は少なくとも複数の引き回し配線１３の全てに重ねて設けられている。 The irregular reflection layer 50 is a metal film made of a metal such as aluminum or platinum, for example, and a large number of minute irregularities 51 are formed on the surface 51 facing the TFT substrate 10. By the irregular reflection layer 50, the light irradiated from the TFT substrate 10 side toward the light shielding film 23 is irregularly reflected. The irregular reflection layer 50 is provided so as to overlap at least all of the plurality of routing wires 13.

次に、液晶表示パネルの製造方法について、図４に示す液晶表示パネル１の製造工程図を参照して説明する。また、図５〜図１２は、液晶表示パネルの製造方法の各工程を模式的に示す説明図である。なお、図５〜図１２において、ＴＦＴ基板１０の画素電極３３、薄膜トランジスタ３４及び配向膜と、ＣＦ基板２０のカラーフィルタ層及び配向膜との図示を省略している。 Next, a manufacturing method of the liquid crystal display panel will be described with reference to a manufacturing process diagram of the liquid crystal display panel 1 shown in FIG. 5-12 is explanatory drawing which shows typically each process of the manufacturing method of a liquid crystal display panel. 5 to 12, illustration of the pixel electrode 33, the thin film transistor 34, and the alignment film of the TFT substrate 10, and the color filter layer and the alignment film of the CF substrate 20 are omitted.

まず、図５に示すように、完成された複数の液晶表示パネル１を形成することができる面積を有するＴＦＴ基板１０Ａを準備する（第１基板準備工程Ｓ１）。ＴＦＴ基板１０Ａには、完成された複数の液晶表示パネル１を形成することができる面積を有するガラス基板１１Ａの対向面１２Ａ上における、複数の液晶表示パネル１の各表示領域Ｇ内に複数の画素電極３３、複数の薄膜トランジスタ３４及び配向膜が形成され、複数の液晶表示パネル１の各表示領域Ｇの外側に複数の引き回し配線１３が形成されている。 First, as shown in FIG. 5, a TFT substrate 10A having an area capable of forming a plurality of completed liquid crystal display panels 1 is prepared (first substrate preparation step S1). The TFT substrate 10A has a plurality of pixels in each display region G of the plurality of liquid crystal display panels 1 on the facing surface 12A of the glass substrate 11A having an area where a plurality of completed liquid crystal display panels 1 can be formed. An electrode 33, a plurality of thin film transistors 34, and an alignment film are formed, and a plurality of lead wirings 13 are formed outside each display region G of the plurality of liquid crystal display panels 1.

その後、図６に示すように、ＴＦＴ基板１０Ａの複数の引き回し配線１３上及びガラス基板１１Ａの対向面１２Ａ上に、複数の液晶表示パネル１の各表示領域Ｇを取り囲んで、閉じた枠状の光硬化型の複数のシール剤３０と、全てのシール剤３０を取り囲む閉じた枠状の光硬化型の外周シール剤３１とを形成する（シール剤形成工程Ｓ２）。なお、シール剤３０としては紫外線硬化型のシール剤が用いられている。
次いで、図７に示すように、ガラス基板１１Ａの対向面１２Ａ上における複数のシール剤３０に囲まれた各領域に液晶４１を滴下して配置する（液晶配置工程Ｓ３）。 Thereafter, as shown in FIG. 6, a closed frame-like shape surrounding each display region G of the plurality of liquid crystal display panels 1 on the plurality of routing wirings 13 of the TFT substrate 10A and the opposing surface 12A of the glass substrate 11A. A plurality of photo-curing sealing agents 30 and a closed frame-shaped photo-curing outer peripheral sealing agent 31 surrounding all the sealing agents 30 are formed (sealing agent forming step S2). As the sealing agent 30, an ultraviolet curable sealing agent is used.
Next, as shown in FIG. 7, the liquid crystal 41 is dropped and arranged in each region surrounded by the plurality of sealing agents 30 on the facing surface 12A of the glass substrate 11A (liquid crystal arranging step S3).

そして、図８に示すように、完成された複数の液晶表示パネル１を形成することができる面積を有するＣＦ基板２０Ａを準備する（第２基板準備工程Ｓ４）。ＣＦ基板２０Ａには、完成された複数の液晶表示パネル１を形成することができる面積を有するガラス基板２１Ａの対向面２２Ａ上における、複数の液晶表示パネル１の各表示領域Ｇ内にカラーフィルタ層と配向膜とが形成され、複数の液晶表示パネル１の各表示領域Ｇの外側に複数の遮光膜２３が形成されている。尚、ＣＦ基板２０Ａのガラス基板２１Ａ上には各色のカラーフィルタ層の間に配置するように遮光膜が形成されており、この遮光膜と複数の液晶表示パネル１の各表示領域Ｇ外に形成された複数の遮光膜２３とが同時に形成される。 Then, as shown in FIG. 8, a CF substrate 20A having an area capable of forming a plurality of completed liquid crystal display panels 1 is prepared (second substrate preparation step S4). The CF substrate 20A has a color filter layer in each display region G of the plurality of liquid crystal display panels 1 on the facing surface 22A of the glass substrate 21A having an area where a plurality of completed liquid crystal display panels 1 can be formed. And a plurality of light shielding films 23 are formed outside the display regions G of the plurality of liquid crystal display panels 1. A light shielding film is formed on the glass substrate 21A of the CF substrate 20A so as to be disposed between the color filter layers of the respective colors. The light shielding film and the liquid crystal display panel 1 are formed outside the display areas G. The plurality of light shielding films 23 thus formed are formed at the same time.

その後、図９に示すように、ＣＦ基板２０Ａの複数の遮光膜２３上に、内周縁部が各遮光膜２３の内周縁部よりも外側に配置された閉じた枠状の乱反射層５０を形成する（乱反射層形成工程Ｓ５）。この際、ＣＦ基板２０Ａの平坦な面上に形成された平坦な遮光膜２３上に感光性樹脂を塗布後、露光および現像処理により遮光膜２３上に多数の微小な凹凸５１を形成する。その後、これらの微小な凹凸５１上にアルミニウムや白金等の金属からなる金属膜をメッキ処理により成膜する。その後、露光および現像処理により金属膜の一部を除去して、遮光膜２３におけるＴＦＴ基板１０に対向する対向面のうち、遮光膜２３に対して表示領域Ｇが配置された側の縁部を除く領域に、閉じた枠状となるように乱反射層５０を形成する。即ち、各遮光膜２３のうち該各遮光膜２３に対して該各遮光膜２３に対応する表示領域Ｇが配置された側の端部よりも、各遮光膜２３上に配置された乱反射層５０のうち該各乱反射層５０に対して各遮光膜２３に対応する表示領域Ｇが配置された側の端部の方が、各遮光膜２３に対応する表示領域Ｇから離れた状態となるように、各乱反射層５０を形成する。 After that, as shown in FIG. 9, a closed frame-shaped irregular reflection layer 50 is formed on the plurality of light shielding films 23 of the CF substrate 20 A so that the inner peripheral edge portion is disposed outside the inner peripheral edge portion of each light shielding film 23. (Random reflection layer forming step S5). At this time, a photosensitive resin is applied on the flat light shielding film 23 formed on the flat surface of the CF substrate 20A, and then a large number of minute irregularities 51 are formed on the light shielding film 23 by exposure and development processing. Thereafter, a metal film made of a metal such as aluminum or platinum is formed on these minute irregularities 51 by plating. Thereafter, a part of the metal film is removed by exposure and development processing, and the edge of the light shielding film 23 on the side where the display region G is disposed with respect to the light shielding film 23 is opposed to the surface facing the TFT substrate 10. The irregular reflection layer 50 is formed in the excluded region so as to have a closed frame shape. That is, the irregular reflection layer 50 disposed on each light shielding film 23 from the end of each light shielding film 23 on the side where the display region G corresponding to each light shielding film 23 is disposed with respect to each light shielding film 23. Of these, the end on the side where the display regions G corresponding to the respective light shielding films 23 are arranged with respect to the respective irregular reflection layers 50 is separated from the display regions G corresponding to the respective light shielding films 23. Each diffused reflection layer 50 is formed.

その後、図１０に示すように、ＴＦＴ基板１０ＡとＣＦ基板２０Ａとを、ＴＦＴ基板１０Ａの対向面１２ＡとＣＦ基板２０Ａの対向面２２Ａとを対向させた状態で配置後、位置合わせして、図１１に示すように、ＣＦ基板２０ＡをＴＦＴ基板１０Ａに貼り合わせて液晶表示パネル形成用構成体７０Ａを形成する（貼り合わせ工程Ｓ６）。この際、ＴＦＴ基板１０Ａの全ての複数の引き回し配線１３および複数のシール剤３０の全体が、ＣＦ基板２０Ａの乱反射層５０と重なるように、両ガラス基板１１Ａ，２１Ａを位置合わせする。 Thereafter, as shown in FIG. 10, the TFT substrate 10A and the CF substrate 20A are arranged with the opposing surface 12A of the TFT substrate 10A and the opposing surface 22A of the CF substrate 20A facing each other, and then aligned. 11, the CF substrate 20A is bonded to the TFT substrate 10A to form a liquid crystal display panel forming structure 70A (bonding step S6). At this time, the glass substrates 11A and 21A are aligned so that all of the plurality of routing wirings 13 and the plurality of sealing agents 30 of the TFT substrate 10A overlap with the irregular reflection layer 50 of the CF substrate 20A.

貼り合わせ後には、図１２に示すように、ＴＦＴ基板１０Ａのガラス基板１１Ａのうち各表示領域Ｇをなす領域を少なくとも覆うように、ガラス基板１１Ａの裏面１４Ａに、光を遮断するマスク１１０を貼付する。その後、紫外線を照射する光源１００を、ＴＦＴ基板１０Ａのガラス基板１１Ａに対して、ＣＦ基板２０Ａのガラス基板２１Ａが配置された側とは反対側に配置し、液晶表示パネル形成用構成体７０Ａに紫外線を照射することにより、光源１００から出射した紫外線がＴＦＴ基板１０のガラス基板１１を通過してシール剤３０及び外周シール剤３１に到達し、シール剤３０及び外周シール剤３１が硬化される（光照射工程Ｓ７）。この際、ＴＦＴ基板１０Ａのガラス基板１１Ａのうち各表示領域Ｇをなす領域と、光源１００との間にマスク１１０が配置されるので、光源１００からの紫外線が直接各液晶層４０に入射することを防止できる。これにより各液晶層４０の汚染が発生しない。また、マスク１１０は、光源１００からの出射光を遮断する光遮断部を複数有し、各光遮断部は少なくとも各表示領域Ｇの全体と重なり、各光遮断部の外周縁部が各表示領域Ｇに重なる領域から各遮光膜２３に重なる領域にかけて連続的に形成されているので、各液晶層４０のうち各表示領域Ｇと重ねて配置された部分に紫外線が斜め方向から直接各液晶層４０に入射してしまうことも防止される。 After the bonding, as shown in FIG. 12, a mask 110 for blocking light is applied to the back surface 14A of the glass substrate 11A so as to cover at least the regions forming the display regions G of the glass substrate 11A of the TFT substrate 10A. To do. Thereafter, the light source 100 for irradiating ultraviolet rays is disposed on the opposite side of the glass substrate 11A of the TFT substrate 10A from the side on which the glass substrate 21A of the CF substrate 20A is disposed, and the liquid crystal display panel forming component 70A is disposed. By irradiating the ultraviolet rays, the ultraviolet rays emitted from the light source 100 pass through the glass substrate 11 of the TFT substrate 10 and reach the sealing agent 30 and the outer peripheral sealing agent 31, and the sealing agent 30 and the outer peripheral sealing agent 31 are cured ( Light irradiation step S7). At this time, since the mask 110 is disposed between the light source 100 and the region forming each display region G in the glass substrate 11A of the TFT substrate 10A, the ultraviolet rays from the light source 100 are directly incident on the liquid crystal layers 40. Can be prevented. Thereby, contamination of each liquid crystal layer 40 does not occur. The mask 110 has a plurality of light blocking portions that block light emitted from the light source 100, each light blocking portion overlaps at least the entire display region G, and the outer peripheral edge of each light blocking portion is each display region. Since it is continuously formed from the region overlapping G to the region overlapping each light-shielding film 23, the ultraviolet rays are directly applied from the oblique direction to each liquid crystal layer 40 in the portion of each liquid crystal layer 40 that overlaps with each display region G. It is also possible to prevent the incident light.

ここで、シール剤３０のうち複数の引き回し配線１３と重ねて配置され、且つ光源１００との間に複数の引き回し配線１３が介在された部分では、光源１００から出射した紫外線が各引き回し配線１３により遮断されてしまうため、光源１００から照射された紫外線が直接到達しない。従って、例えば図１４に示す比較例のように、乱反射層５０のない液晶表示パネル２００においては、光源１００からの出射光は反射されないか、またはわずかに反射されたとしてもに遮光膜２３に対して実質的に直角の方向に反射されてしまうため、シール剤３０が複数の引き回し配線１３と重ならずに硬化する部分（図１４におけるＰ１部分）と、シール剤３０が複数の引き回し配線１３と重なるため硬化しない部分（図１４におけるＰ２部分）とが混在することになる。 Here, in the portion of the sealant 30 that is disposed so as to overlap with the plurality of routing wirings 13 and the plurality of routing wirings 13 are interposed between the light sources 100, the ultraviolet rays emitted from the light sources 100 are caused by the respective routing wirings 13. Since it will be interrupted | blocked, the ultraviolet-ray irradiated from the light source 100 will not reach | attain directly. Therefore, for example, as in the comparative example shown in FIG. 14, in the liquid crystal display panel 200 without the irregular reflection layer 50, the light emitted from the light source 100 is not reflected or is slightly reflected against the light shielding film 23. Therefore, the sealant 30 is cured without overlapping with the plurality of routing wirings 13 (P1 portion in FIG. 14), and the sealing agent 30 is connected with the plurality of routing wirings 13. Since they overlap, a portion that does not harden (P2 portion in FIG. 14) is mixed.

一方、本実施形態の液晶表示パネル１のように、遮光膜２３に乱反射層５０が積層された液晶表示パネル１においては、図１３に示すように、複数の引き回し配線１３の間隙から遮光膜２３に向けて入射した紫外線が乱反射層５０によって乱反射されて、シール剤３０のうち光源１００との間に複数の引き回し配線１３が介在された部分にも紫外線を到達させることができる。これにより、シール剤３０のうち光源１００との間に複数の引き回し配線１３が介在された部分も硬化させることができる。 On the other hand, in the liquid crystal display panel 1 in which the irregular reflection layer 50 is laminated on the light shielding film 23 as in the liquid crystal display panel 1 of the present embodiment, as shown in FIG. The ultraviolet rays incident on the surface of the sealing agent 30 are irregularly reflected by the irregular reflection layer 50, so that the ultraviolet rays can reach a portion of the sealant 30 where the plurality of lead wires 13 are interposed between the light source 100 and the sealing agent 30. As a result, the portion of the sealing agent 30 where the plurality of lead wires 13 are interposed between the light source 100 and the light source 100 can also be cured.

この場合、光源１００から出射した紫外線を、乱反射層５０や複数の引き回し配線１３において複数回反射させることなく、乱反射層５０で１回だけ反射させることで、シール剤３０のうち光源１００との間に複数の引き回し配線１３が介在された部分に紫外線を到達させることができるので、紫外線の強度を大きくすることなくシール剤３０を硬化することができ、ひいてはシール剤３０を硬化する時に紫外線が直接または反射して高強度のまま液晶層４０に到達し、液晶層４０を汚染する可能性を高めることなく、シール剤３０を硬化することができる。 In this case, the ultraviolet ray emitted from the light source 100 is reflected only once by the irregular reflection layer 50 without being reflected by the irregular reflection layer 50 or the plurality of routing wirings 13 a plurality of times, so In addition, since the ultraviolet ray can reach the portion where the plurality of routing wirings 13 are interposed, the sealing agent 30 can be cured without increasing the intensity of the ultraviolet ray, and the ultraviolet ray is directly applied when the sealing agent 30 is cured. Alternatively, the sealing agent 30 can be cured without increasing the possibility of being reflected and reaching the liquid crystal layer 40 with high strength and contaminating the liquid crystal layer 40.

その後、液晶表示パネル形成用構成体７０ＡのＴＦＴ基板１０ＡおよびＣＦ基板２０Ａをガラスカッターなどの切断手段によって切断して個片化することにより、図１に示す液晶表示パネル１が複数個同時に完成される（個片化工程Ｓ８）。この個片化工程において、ＴＦＴ基板１０が、４辺のうち少なくとも一辺においてＣＦ基板２０から突出した突出部１０ａを有する形状となるように切断を行う。その後、この突出部１０ａに駆動回路６０が搭載される。 Thereafter, the TFT substrate 10A and the CF substrate 20A of the liquid crystal display panel forming structure 70A are cut into pieces by cutting means such as a glass cutter, whereby a plurality of liquid crystal display panels 1 shown in FIG. 1 are completed simultaneously. (Dividing step S8). In the individualization step, the TFT substrate 10 is cut so as to have a shape having a protruding portion 10a protruding from the CF substrate 20 on at least one side of the four sides. Thereafter, the drive circuit 60 is mounted on the protruding portion 10a.

以上のように、本実施形態によれば、紫外線の強度を抑制したとしても、均一にシール剤３０を硬化させることができる。
また、光源から出射される際の紫外線の強度を大きくすることなくシール剤３０を硬化することができ、ひいてはシール剤を硬化する時に紫外線が直接または反射して高強度のまま液晶に到達し、液晶を汚染する可能性を高めることなく、シール剤３０を硬化することができる。
さらに、遮光膜２３の対向面のうち、遮光膜２３に対して表示領域Ｇが配置された側の縁部を除く領域に乱反射層５０が設けられているので、乱反射層５０が遮光膜２３の対向面のうち、遮光膜２３に対して表示領域Ｇが配置された側の縁部にまで形成されている場合と比べて、乱反射層５０で反射した紫外線が表示領域Ｇ内の液晶層に到達する可能性を低減することができる。 As described above, according to the present embodiment, the sealing agent 30 can be uniformly cured even if the intensity of ultraviolet rays is suppressed.
Further, the sealing agent 30 can be cured without increasing the intensity of the ultraviolet rays emitted from the light source, and as a result, when the sealing agent is cured, the ultraviolet rays are directly or reflected to reach the liquid crystal with high intensity, The sealing agent 30 can be cured without increasing the possibility of contaminating the liquid crystal.
Furthermore, since the irregular reflection layer 50 is provided in a region other than the edge portion on the side where the display region G is disposed with respect to the light shielding film 23 on the opposing surface of the light shielding film 23, the irregular reflection layer 50 is provided on the light shielding film 23. Compared with the case where the opposite surface is formed up to the edge on the side where the display region G is disposed with respect to the light shielding film 23, the ultraviolet rays reflected by the irregular reflection layer 50 reach the liquid crystal layer in the display region G. The possibility of doing so can be reduced.

また、ＣＦ基板２０のガラス基板２１における液晶層４０と重なる領域から、シール剤３０と重なる領域にかけて遮光膜２３及び乱反射層５０が形成されているので、液晶層４０側から入射した紫外線を乱反射させて、シール剤３０に到達させることも可能である。 Further, since the light shielding film 23 and the irregular reflection layer 50 are formed from the region overlapping the liquid crystal layer 40 in the glass substrate 21 of the CF substrate 20 to the region overlapping the sealing agent 30, ultraviolet rays incident from the liquid crystal layer 40 side are diffusely reflected. Thus, it is possible to reach the sealant 30.

そして、ＣＦ基板２０のガラス基板２１における液晶層４０と重なる領域から、ガラス基板２１の外側の端部２４にかけて遮光膜２３が形成されているので、ＴＦＴ基板１０に対してＣＦ基板２０が配置された側とは反対側に配置されるバックライトから液晶表示パネル１に向けて照射される光を遮断して、バックライトからの光漏れを防止することができる。 And since the light shielding film 23 is formed from the area | region which overlaps with the liquid crystal layer 40 in the glass substrate 21 of the CF substrate 20 to the edge part 24 of the outer side of the glass substrate 21, the CF substrate 20 is arrange | positioned with respect to the TFT substrate 10. The light irradiated toward the liquid crystal display panel 1 from the backlight disposed on the opposite side to the light-shielding side can be blocked to prevent light leakage from the backlight.

なお、本発明は上記実施形態に限らず適宜変更可能である。
例えば、上述の実施形態ではシール剤形成工程Ｓ２において、複数のシール剤３０をＴＦＴ基板１０Ａのガラス基板１１Ａに形成し、液晶配置工程Ｓ３において、ガラス基板１１Ａの対向面１２Ａ上における複数のシール剤３０に囲まれた各領域に液晶４１を滴下して配置したが、複数のシール剤をＣＦ基板２０Ａのガラス基板２１Ａに形成し、ガラス基板２１Ａの対向面２２Ａ上における複数のシール剤に囲まれた各領域に液晶４１を滴下して配置してもよい。この場合、ＣＦ基板２０Ａの複数の乱反射層５０上及びガラス基板２１Ａの対向面２２Ａ上に、複数の液晶表示パネル１の各表示領域Ｇを取り囲んで、閉じた枠状の光硬化型の複数のシール剤３０と、全てのシール剤３０を取り囲む閉じた枠状の光硬化型の外周シール剤３１とを形成することとなる。
また、以下の方法により乱反射層５０を形成してもよい。即ち、第２基板準備工程の前に、まず、乱反射層５０を形成するＣＦ基板２０Ａの対向面２２Ａのうち少なくとも乱反射層５０を形成する領域に対して、フッ酸溶液を用いたフロスト加工を行い、対向面２２Ａに多数の微小な凹凸が形成されたＣＦ基板２０Ａを準備する。そのＣＦ基板２０Ａの各表示領域Ｇ内にカラーフィルタ層と配向膜とを形成し、更に遮光膜２３を形成する。多数の微小な凹凸に対応する領域では、遮光膜２３の表面が微小な凹凸を有する形状に形成される。その後、遮光膜２３の微小な凹凸上にアルミニウムや白金等の金属からなる金属膜をメッキ処理により成膜する。その後、露光および現像処理により金属膜の一部を除去して、内周縁部が各遮光膜２３の内周縁部よりも外側に配置された閉じた枠状となるように乱反射層５０を形成するようにしてもよい。 Note that the present invention is not limited to the above embodiment, and can be modified as appropriate.
For example, in the above-described embodiment, the plurality of sealing agents 30 are formed on the glass substrate 11A of the TFT substrate 10A in the sealing agent forming step S2, and the plurality of sealing agents on the facing surface 12A of the glass substrate 11A in the liquid crystal arranging step S3. The liquid crystal 41 is dropped and arranged in each region surrounded by 30, but a plurality of sealing agents are formed on the glass substrate 21 A of the CF substrate 20 A and surrounded by the plurality of sealing agents on the facing surface 22 A of the glass substrate 21 A. Alternatively, the liquid crystal 41 may be dropped and disposed in each region. In this case, a plurality of closed frame-like photo-curing types surrounding each display region G of the plurality of liquid crystal display panels 1 on the plurality of irregular reflection layers 50 of the CF substrate 20A and the facing surface 22A of the glass substrate 21A. The sealing agent 30 and the closed frame-shaped photo-curing type outer peripheral sealing agent 31 surrounding all the sealing agents 30 are formed.
Further, the irregular reflection layer 50 may be formed by the following method. That is, before the second substrate preparation step, first, frost processing using a hydrofluoric acid solution is performed on at least the region where the irregular reflection layer 50 is formed in the facing surface 22A of the CF substrate 20A on which the irregular reflection layer 50 is formed. A CF substrate 20A having a large number of minute irregularities formed on the facing surface 22A is prepared. A color filter layer and an alignment film are formed in each display region G of the CF substrate 20A, and a light shielding film 23 is further formed. In a region corresponding to a large number of minute irregularities, the surface of the light shielding film 23 is formed in a shape having minute irregularities. Thereafter, a metal film made of a metal such as aluminum or platinum is formed on the minute unevenness of the light shielding film 23 by plating. Thereafter, a part of the metal film is removed by exposure and development processing, and the irregular reflection layer 50 is formed so that the inner peripheral edge becomes a closed frame shape arranged outside the inner peripheral edge of each light shielding film 23. You may do it.

１液晶表示パネル
１０，１０ＡＴＦＴ基板（第一の基板）
１０ａ突出部
１１，１１Ａガラス基板（第一の透明基板）
１２，１２Ａ対向面（一の面）
１３引き回し配線（配線）
２０，２０ＡＣＦ基板（第二の基板）
２１，２１Ａガラス基板（第二の透明基板）
２２，２２Ａ対向面（一の面）
２３遮光膜
２４端部
３０シール剤
３３画素電極
４０液晶層
４１液晶
５０乱反射層
５１表面
１００光源
１１０マスク
Ｇ表示領域 1 Liquid crystal display panel 10, 10A TFT substrate (first substrate)
10a Protruding part 11, 11A Glass substrate (first transparent substrate)
12, 12A Opposite surface (one surface)
13 Lead wiring (wiring)
20, 20A CF substrate (second substrate)
21,21A glass substrate (second transparent substrate)
22,22A Opposite surface (one surface)
23 light shielding film 24 edge 30 sealing agent 33 pixel electrode 40 liquid crystal layer 41 liquid crystal 50 diffuse reflection layer 51 surface 100 light source 110 mask G display area

Claims

A first transparent substrate;
A second transparent substrate superimposed on the first transparent substrate with a liquid crystal layer and a sealing agent surrounding the liquid crystal layer interposed between the first transparent substrate,
Wiring interposed between the first transparent substrate and the sealant;
It is interposed between the second transparent substrate and the sealing agent so as to overlap the wiring, and is incident on the first transparent substrate from the side opposite to the side on which the second transparent substrate is disposed. A diffuse reflection layer that diffuses reflected light ,
A light shielding film that blocks light interposed between the second transparent substrate and the irregular reflection layer in a state of overlapping with the sealant ,
The end of the irregular reflection layer on the side where the liquid crystal layer is disposed with respect to the irregular reflection layer is more than the end of the light shielding film on the side where the liquid crystal layer is disposed with respect to the light shielding film. A liquid crystal display panel characterized in that the distance from the display area of the liquid crystal display panel is long.

The liquid crystal display panel according to claim 1,
The liquid crystal display panel, wherein the irregular reflection layer overlaps with the whole of the sealing agent.

The liquid crystal display panel according to claim 1 or 2,
The liquid crystal display panel, wherein the irregular reflection layer is continuously formed from a region overlapping with the liquid crystal layer to a region overlapping with the sealant.

In the liquid crystal display panel as described in any one of Claims 1-3 ,
The liquid crystal display panel according to claim 1, wherein the light shielding film overlaps the entire sealing agent.

In the liquid crystal display panel as described in any one of Claims 1-4 ,
The liquid crystal display panel, wherein the light shielding film is continuously formed from a region overlapping with the liquid crystal layer to a region overlapping with the sealant.

In the liquid crystal display panel as described in any one of Claims 1-5 ,
The liquid crystal display panel, wherein the light shielding film is formed from a region overlapping with the liquid crystal layer to an end of the second transparent substrate.

In the liquid crystal display panel as described in any one of Claims 1-6 ,
A liquid crystal display panel, wherein a metal film is formed on a surface of the irregular reflection layer facing the first transparent substrate.

In the liquid crystal display panel as described in any one of Claims 1-7,
A pixel electrode formed in a display region of the liquid crystal display panel in a state of being interposed between the first transparent substrate and the liquid crystal layer;
A drive circuit mounting region in which a drive circuit for driving a thin film transistor connected to the pixel electrode is mounted is formed in a protruding portion protruding from the second transparent substrate of the first transparent substrate,
The liquid crystal display panel, wherein the wiring is a lead wiring that connects a scanning line or a signal line connected to the thin film transistor and a gate terminal or a data terminal formed in the driving circuit mounting region.

A pixel electrode is formed in each display region of the plurality of liquid crystal display panels on one surface and has an area where a plurality of completed liquid crystal display panels can be formed, and wiring is provided outside the display regions. A first substrate preparation step of preparing a first substrate on which is formed;
A light-shielding film having an area capable of forming a plurality of completed liquid crystal display panels, a color filter layer being formed in each display region of the plurality of liquid crystal display panels on one surface, and blocking light; A second substrate preparing step of preparing a second substrate in which an irregular reflection layer disposed on the light-shielding film and irregularly reflecting light is formed outside each display region;
The display areas are surrounded on either the first substrate and the wirings of the first substrate, or on the second substrate and the irregular reflection layers of the second substrate. A sealing agent forming step of forming a photo-curable sealing agent with,
A liquid crystal disposing step of disposing liquid crystal in a region surrounded by each sealing agent in the first substrate or the second substrate;
A bonding step of bonding the first substrate and the second substrate in a state in which the respective sealing agents are overlapped with the respective wirings of the first substrate and the respective irregular reflection layers of the second substrate; ,
The saw including a light irradiating step of irradiating light toward the opposite side to the respective sealant from the first side to the second substrate is disposed against the substrate,
The second substrate preparation step is arranged on each light shielding film with respect to each light shielding film from the end on the side where the display region corresponding to each light shielding film is arranged. The end of the irregular reflection layer on the side where the display region corresponding to each light shielding film is arranged with respect to each irregular reflection layer is in a state of being separated from the display region corresponding to each light shielding film. The method for producing a liquid crystal display panel further comprising a step of forming an irregular reflection layer for forming each of the irregular reflection layers .

In the manufacturing method of the liquid crystal display panel of Claim 9 ,
Each of the light shielding films is formed on a flat surface of the second substrate,
In the irregular reflection layer forming step, a photosensitive resin is applied on each of the light shielding films, and then a number of minute irregularities are formed on each of the light shielding films by exposure and development, and then the number of minute irregularities is formed. A method for producing a liquid crystal display panel, comprising: forming a metal film thereon.

In the manufacturing method of the liquid crystal display panel of Claim 9 ,
Each of the light shielding films is formed on a surface having irregularities of the second substrate,
The method of manufacturing a liquid crystal display panel, wherein the irregular reflection layer forming step includes forming a metal film on each of the light shielding films.

In the manufacturing method of the liquid crystal display panel of Claim 11 ,
A method of manufacturing a liquid crystal display panel, comprising: forming a surface having the irregularities of the second substrate by frosting the surface of the second substrate using a hydrofluoric acid solution. .

In the manufacturing method of the liquid crystal display panel as described in any one of Claims 10-12 ,
A method of manufacturing a liquid crystal display panel, comprising: forming the metal film by removing a part of the metal film by exposure and development after forming the metal film;

In the manufacturing method of the liquid crystal display panel as described in any one of Claims 9-13 ,
The laminating step includes laminating the second substrate and the first substrate in a state where the whole of each sealing agent is overlapped with the respective irregular reflection films of the second substrate,
In the light irradiation step, the light irradiated toward the sealant from the light source disposed on the side opposite to the side on which the second substrate is disposed with respect to the first substrate is irregularly reflected by the irregular reflection layer. And a method of manufacturing a liquid crystal display panel, comprising: irradiating a portion of each of the sealing agents where the wirings are interposed between the light sources.

In the manufacturing method of the liquid crystal display panel as described in any one of Claims 9-14 ,
In the light irradiation step, before irradiating light toward each of the sealing agents, the first substrate is placed on the side opposite to the side where the second substrate is disposed. A method of manufacturing a liquid crystal display panel, comprising: disposing a mask that covers a region forming each display region and blocks light from the light source.

In the manufacturing method of the liquid crystal display panel as described in any one of Claims 9-15 ,
After the light irradiation step, the method further includes an individualization step of cutting and dividing the liquid crystal display panel forming structure in which the first substrate and the second substrate are bonded together. A method for manufacturing a liquid crystal display panel.

A pixel electrode is formed in a display area of the at least one liquid crystal display panel on one surface and has an area where a completed at least one liquid crystal display panel can be formed, and wiring is provided outside the display area. A first substrate preparation step of preparing a first substrate on which is formed;
A light-shielding film having an area capable of forming a completed at least one liquid crystal display panel, and having a color filter layer formed in a display area of the at least one liquid crystal display panel on one surface to block light A second substrate preparing step of preparing a second substrate disposed on the light-shielding film and having a diffused reflection layer for irregularly reflecting light formed outside the display region;
Photocuring surrounding the display area on either the first substrate and the wiring of the first substrate, or on the second substrate and on the irregular reflection layer of the second substrate. A sealing agent forming step for forming a mold sealing agent;
A liquid crystal disposing step of disposing a liquid crystal in a region surrounded by the sealant in the first substrate or the second substrate;
A bonding step of bonding the first substrate and the second substrate in a state where the sealing agent is overlapped with the wiring of the first substrate and the irregular reflection layer of the second substrate;
The saw including a light irradiating step of irradiating light toward the opposite side to the sealant from the first side to the second substrate is disposed against the substrate,
The second substrate preparation step is arranged on each light shielding film with respect to each light shielding film from the end on the side where the display region corresponding to each light shielding film is arranged. The end of the irregular reflection layer on the side where the display region corresponding to each light shielding film is arranged with respect to each irregular reflection layer is in a state of being separated from the display region corresponding to each light shielding film. The method for producing a liquid crystal display panel further comprising a step of forming an irregular reflection layer for forming each of the irregular reflection layers .