JP5286885B2 - Observation device and laser processing device - Google Patents

Description

  The present invention relates to an observation apparatus that can clearly specify the shape of a transparent or translucent substrate sucked and fixed on a transparent stage in an observation image.

  A method for forming a starting point for division by irradiating a pulse laser on a transparent or translucent substrate such as sapphire (hereinafter referred to as a “transparent substrate”) with a device pattern is known. Yes (see, for example, Patent Document 1).

  Further, there are cases where it is necessary to accurately specify an arbitrary position on the transparent substrate, such as when the transparent substrate is to be divided at a predetermined position by the apparatus disclosed in Patent Document 1. In such a case, it is general to specify the position using the contour shape and contour position of the transparent substrate, or the position and shape of the opaque portion formed on the transparent substrate as a clue.

  Such position specification is performed by placing a transparent substrate on an observation stage, and such a stage needs to have two functions.

  For one thing, it is necessary to provide the observation stage with a function of sucking and fixing the transparent substrate so that the transparent substrate is not shifted during the position specification.

  Second, it is necessary to make the observation stage transparent in preparation for observation with various optical systems so that various transparent substrates can be observed universally. By making it transparent, illumination from the lower side of the substrate adsorbed and fixed to the observation stage is possible, and transmission illumination type observation in which light transmitted through the observation stage and the transparent substrate is observed becomes possible. Further, by making the observation stage transparent, it is possible to observe from the lower surface side of the substrate that is attracted and fixed to the observation stage.

  By making the observation stage transparent in this way, for example, transmission illumination is possible, and an opaque portion in the substrate can be clearly observed with good contrast. In addition, for example, when an opaque layer such as a metal layer is partially formed on the substrate, the opaque layer blocks or reflects light when viewed from above the substrate. Even if it is difficult to observe the pattern located under the opaque layer due to interference, etc., it is possible to observe through the observation stage from below the observation stage, and the pattern is located below the opaque layer. However, it becomes possible to observe clearly.

International Publication No. 2006/062017

  Examples of the action of observing the substrate sucked and fixed to the observation stage as described above include microscopic observation (hereinafter referred to as “micro observation”) for observing a fine pattern formed on the transparent substrate, There is an external form observation (hereinafter referred to as “macro observation”) that specifies a contour shape.

  For example, when irradiating a pulsed laser as described above, the contour shape of the transparent substrate must be accurately identified in advance by macro observation so that the pulsed laser does not protrude beyond the substrate unnecessarily. Is done. In addition, a circuit pattern serving as a clue to finely positioning the substrate by micro observation is performed so that a pulse laser is irradiated to a predetermined portion in the substrate at an accurate position.

  When specifying the contour shape of the transparent substrate to be observed in the present invention by macro observation, according to the difference between the reflectance of the transparent substrate and the reflectance of the surface of the stage (the mounting surface of the transparent substrate), The contrast generated in the observed image gives an image of the transparent substrate. Therefore, in order to accurately specify the contour of the transparent substrate, it is necessary to obtain such contrast clearly.

  On the other hand, when using a stage made of a transparent member, the wall surface part of the suction pipe provided by drilling the inside of the stage by machining so that the transparent substrate can be sucked and fixed (becomes a rough uneven surface). In this case, irregular reflection occurs, and the resulting reflection image is superimposed on the image of the transparent substrate, so that the outline shape and device pattern of the transparent substrate may become unclear.

  If the positional relationship between the suction pipe and the transparent substrate placed on the stage is always constant, the reflected image of the suction pipe can be removed relatively easily by image processing the observation image. However, if the transparent substrate to be observed has a different shape or orientation in the horizontal plane, such image processing is not practical.

  The present invention has been made in view of the above problems, and an object thereof is to provide an observation apparatus that can clearly specify the shape of a transparent substrate sucked and fixed to a transparent stage in an observation image.

In order to solve the above-mentioned problems, the invention of claim 1 is an observation device for observing a transparent substrate, which is made of a transparent member and provided with an intake passage for sucking and fixing the transparent substrate. A stage, an illumination light source that irradiates illumination light to an observation surface of the transparent substrate placed on the surface of the stage, and an observation unit that observes the transparent substrate from the observation surface side The air intake passage is subjected to irregular reflection suppression processing for suppressing irregular reflection of the illumination light irradiated from the illumination light source.
A second aspect of the present invention is the observation apparatus according to the first aspect, wherein the irregular reflection suppressing process is performed only on the intake passage .

A third aspect of the present invention is the observation apparatus according to the first or second aspect , wherein the irregular reflection suppressing process is a process of applying a low-lightness color paint that absorbs the illumination light to a wall surface of the intake passage. It is characterized by being.

The invention of claim 4, claims 1 A viewing device according to claim 3, the rear surface of the stage, the anti-reflection film is formed, characterized in that.

The invention according to claim 5 is the observation apparatus according to claim 1 or 2 , wherein the irregular reflection suppressing process is a process of smoothing a wall surface of the intake passage.

The invention of claim 6 is the observation apparatus according to any one of claims 1 to 5 , wherein a suction pipe as the intake passage is provided inside the stage. To do.

A seventh aspect of the present invention is the observation apparatus according to any one of the first to fifth aspects, wherein a groove as the intake passage is provided on the surface of the stage.

The invention according to claim 8 is the observation apparatus according to claim 1 or 2 , wherein the intake passage is provided on the surface of the stage as a bottom surface parallel to the surface of the stage and perpendicular to the surface of the stage. It is characterized in that a groove portion consisting of three surfaces in which the bottom surface and the side surface are in contact with each other at right angles is provided, and an antireflection film is formed on the bottom surface of the groove portion.

A ninth aspect of the invention is the observation apparatus according to any one of the first to eighth aspects, wherein the illumination light source is a coaxial illumination light source that emits coaxial illumination light, and an oblique illumination that irradiates oblique illumination light. A light source, and capable of selectively or superimposing the coaxial illumination light and the oblique illumination light on the transparent substrate placed on the surface of the stage.
A tenth aspect of the present invention is the observation apparatus according to any one of the first to ninth aspects, wherein the stage is movably provided by a predetermined moving mechanism.

According to an eleventh aspect of the present invention, the laser processing apparatus includes the observation apparatus according to the tenth aspect as observation means for the workpiece, and irradiation of irradiating the transparent substrate sucked and fixed to the stage with laser light. A state in which the observation position of the transparent substrate can be moved by moving the stage while the transparent substrate is sucked and fixed, and the transparent substrate is sucked and fixed to the stage The transparent substrate is processed by the laser light by moving the stage while irradiating the laser light from the irradiation source .

According to the first to tenth aspects of the present invention, even if the observation device that includes the stage made of the transparent member and sucks and fixes the observation target uses the transparent substrate as the observation target, irregular reflection from the intake passage Therefore, the contour shape of the transparent substrate can be accurately identified without performing special image processing for removing the image of the intake passage on the observation image obtained by the observation means.

In particular, according to the invention of claim 3 , since the illumination light is absorbed in the intake passage, the image of the intake passage is removed from the observation image obtained by the observation means even when the transparent substrate is the observation target. Therefore, the contour shape of the transparent substrate can be specified with high accuracy without performing special image processing.

In particular, according to the invention of claim 4, since the antireflection film is formed on the back surface of the stage, the image of the portion where the intake passage is not formed on the back surface of the stage is the image of the intake passage subjected to the irregular reflection suppression process. The difference in shading between the observation image and the image is reduced. For this reason, even if the object to be observed is a transparent substrate that does not have a diffusing layer or a reflective layer, in the image that is seen through the substrate, the image of the portion where the intake passage is formed on the stage is like a dark line It is not clearly visible, and the contour shape of the transparent substrate can be specified with high accuracy.

According to the eleventh aspect of the invention, since the contour shape of the transparent substrate is specified with high accuracy, the processing position for processing the transparent substrate can be determined with high accuracy.

<Laser processing equipment>
FIG. 1 is a schematic diagram schematically showing a configuration of a laser processing apparatus 50 including observation means having a function as an observation apparatus according to an embodiment of the present invention. In addition, in FIG. 1, although the to-be-processed object 10 which is a process target (observation object) has illustrated the case where it is affixed on the transparent substrate protection sheet 4, the adhesion of the transparent substrate protection sheet 4 is not essential. . In addition, the operations of the following parts of the laser processing apparatus 50 (laser light irradiation, stage movement, illumination light irradiation, arithmetic processing for determining a processing position, etc.) are all performed by a predetermined computer or the like (not shown). It shall be controlled by the control means.

  The laser processing apparatus 50 mainly includes a front surface observation unit 50A, a back surface observation unit 50B, and a stage 7 that is made of a transparent member such as quartz and on which the workpiece 10 is placed. The front surface observation unit 50A is an observation unit that observes the object to be processed 10 placed on the stage 7 from the side irradiated with the laser light (referred to as the front surface), and the back surface observation unit 50B includes the object to be processed. Reference numeral 10 denotes an observation unit that observes through the stage 7 from the side where it is placed on the stage 7 (referred to as the back side). The stage 7 is movable in the horizontal direction between the front surface observation unit 50A and the back surface observation unit 50B by the moving mechanism 7m. Details of the stage 7 will be described later.

  The moving mechanism 7m moves the stage 7 in a predetermined XY 2-axis direction within a horizontal plane by the action of a driving unit (not shown). Thereby, the movement of the stage 7 between the front surface observation unit 50A and the back surface observation unit 50B, the movement of the observation position in each observation unit, and the movement of the laser light irradiation position are realized. That is, in the laser processing apparatus 50, the stage 7 is moved by the moving mechanism 7m, so that the front side observation by the front surface observation unit 50A and the back side observation by the back surface observation unit 50B can be switched. ing. Thereby, the optimal observation according to the material and state of the to-be-processed object 10 can be performed flexibly and rapidly. As for the moving mechanism 7m, it is more preferable for alignment and the like that the rotation (θ rotation) in the horizontal plane around the predetermined rotation axis can be performed independently of the horizontal drive.

  In the surface observation unit 50A, the epi-illumination light L5 emitted from the epi-illumination light source S5 is reflected by a half mirror 52 provided in a lens barrel (not shown) (with the stage 7 positioned on the surface observation unit 50A). ) The object 10 is irradiated. The surface observation unit 50A includes surface observation means 16 including a CCD camera 16a provided above the half mirror 52 (above the lens barrel) and a monitor 16b connected to the CCD camera 16a. The bright field image of the object to be processed 10 can be observed in real time in a state where the illumination light L5 is irradiated. In the present embodiment, the surface observation unit 50A and the stage 7 correspond to main components of the observation apparatus according to the present invention.

  The surface observation unit 50A is also configured to be able to irradiate a laser beam onto the object 10 placed on the stage 7. That is, the surface observation unit 50 </ b> A is also a laser beam irradiation unit in the laser processing apparatus 50. This is realized, for example, by configuring the laser irradiation system and the observation optical system coaxially. More specifically, the surface observation unit 50A can be realized by having the same configuration as the basic configuration of the laser processing apparatus disclosed in Patent Document 1.

  More specifically, in the surface observation unit 50A, the laser light LB is emitted from the laser light source SL, reflected by a half mirror 51 provided in a lens barrel (not shown), and then the laser light LB is subjected to surface observation. By condensing with the condensing lens 18 so as to be focused on the part to be processed of the object to be processed placed on the stage 7 in a state where the stage 7 is positioned on the part 50A, and irradiating the object 10 to be processed, It is possible to realize processing of the object 10 to be processed, for example, formation of a melt-modified region as a starting point of division, ablation, and the like.

  When the processing position is determined based on the observation image obtained in the surface observation unit 50A, it is possible to continue processing by irradiation with the laser beam LB based on the determined content.

  It should be noted that the processing position can be determined using a GUI realized by a control means (not shown) while the operator of the laser processing apparatus 50 can visually recognize the image captured by the CCD camera 16a displayed on the monitor 16b. It is preferable to be made. That is, it is preferable that a predetermined instruction input for determining the machining position by the operator is given by the GUI, and the machining position is determined by the control means performing a predetermined calculation process based on the input content.

  The back surface observation unit 50B is configured to receive the coaxial transmitted illumination light L1 from the coaxial illumination light source S1 from above the stage 7 with respect to the target object 10 placed on the stage 7 in a state where the stage 7 is positioned on the back surface observation unit 50B. While the irradiation and the irradiation of the oblique light transmission illumination light L2 from the oblique illumination light source S2 are performed in a superimposed manner, the object to be processed 10 can be observed by the back surface observation means 6 from the lower side of the stage 7.

  Further, in the back surface observation unit 50B, a CCD camera 6a provided below the stage 7, more preferably below a half mirror 9 described below (below the lens barrel), and a monitor 6b connected to the CCD camera 6a. The back surface observation means 6 containing these is provided. Note that the monitor 6b and the monitor 16b provided in the surface observation means 16 may be the same.

  Preferably, the surface observation unit 50A may include the oblique illumination light source S6 so that the object 10 on the stage 7 can be irradiated with the oblique illumination light L6. When the oblique illumination light L6 is irradiated, the surface observation means 16 can obtain a dark field image to be observed. By appropriately switching the epi-illumination light L5 and the oblique illumination light L6 according to the material and surface state of the object to be processed 10, or by simultaneously irradiating the oblique illumination light L5 and the oblique illumination light L6 A suitable observation image can be obtained regardless of the above.

  Below the stage 7, the coaxial illumination light L 3 emitted from the coaxial illumination light source S 3 is reflected by a half mirror 9 provided in a lens barrel (not shown) and collected by a condenser lens 8. Thus, the workpiece 10 may be irradiated via the stage 7. More preferably, the oblique illumination light source S4 may be provided below the stage 7 so that the oblique illumination light L4 can be irradiated to the object 10 through the stage 7. In these coaxial illumination light source S3 and oblique illumination light source S4, for example, there is an opaque metal layer on the surface side of the object to be processed, and observation from the surface side by the surface observation unit 50A is difficult due to reflection from the metal layer. In such a case, it can be suitably used when the back surface side of the object to be processed 10 is observed by the back surface observation unit 50B.

<Details of stage>
FIG. 2 is a diagram schematically showing a state in which the stage 7 is viewed from the upper surface (mounting surface of the workpiece 10) side. Note that FIG. 2 shows only a range substantially the same as the field of view of the observation images in FIGS. 4 and 5 described later. FIG. 3 is a schematic cross-sectional view showing a state in which the object 10 to which the transparent substrate protective sheet 4 is attached is placed on the stage 7 with the transparent substrate protective sheet 4 side facing the stage 7 side. It is. FIG. 3 illustrates a case where the diffusion layer 10a is formed on a part of the object to be processed. In the present embodiment, the diffusion layer refers to a material layer provided on the object to be processed 10 and having a function of diffusing observation illumination light. In FIG. 3, the diffusion layer 10 a is formed on the lower surface of the object 10 to be processed, but may be formed on the upper surface.

  As described above, the stage 7 is formed of a transparent member such as quartz, and the suction pipe 12 serving as an intake passage for sucking and fixing the workpiece 10 is provided therein. The suction pipe 12 is provided, for example, by drilling a predetermined position of the stage 7 by machining.

  In a state where the workpiece 10 is placed on the stage 7, the suction pipe 12 is sucked by the suction means 11 (FIG. 1) such as a suction pump, and the stage 7 placement surface side of the suction pipe 12. By applying a negative pressure F to the suction hole 12a provided at the tip, the object to be processed 10 (and the transparent substrate protection sheet 4) is fixed to the stage 7.

  In addition, in the present embodiment, a low-lightness color paint that absorbs the epi-illumination light L5 and the oblique illumination light L6 is applied to the wall surface 12b of the suction pipe 12. This is provided in the above-described manner, thereby suppressing the irregular reflection of the epi-illumination light L5 and the oblique illumination light L6 from the wall surface 12b, which is a rough uneven surface, toward the surface observation unit 50A. It is done for the purpose of doing. That is, the application of the paint corresponds to a diffused reflection suppressing process for suppressing diffused reflection of illumination light. As the paint, it is most preferable to use a substantially black paint, but dark blue, dark green, and dark brown paints can also be used as long as the effect of suppressing irregular reflection can be obtained. The paint can be applied to the suction pipe 12 by, for example, pouring the paint into the suction pipe 12 and then removing the excess paint. Alternatively, a paint may be applied by inserting a torsion brush into the suction pipe 12.

Preferably, an antireflection film 13 may be provided on the back surface 7 a of the stage 7. When the antireflection film 13 is provided, irregular reflection of the incident illumination light L5 and the oblique illumination light L6 from the back surface 7a of the stage 7 toward the surface observation unit 50A is suppressed. The antireflection film 13 is formed by forming a few layers of antireflection films made of, for example, MgF ₂ , ZrO ₂ , CeF _2, etc., using a technique such as vacuum deposition, like several layers of antireflection films used for optical lenses and the like. Can do.

  FIGS. 4 and 5 illustrate the effect of the surface observation section 50A under various conditions, illustrating the effects of applying the paint to the suction pipe 12 and forming the antireflection film 13 on the back surface 7a of the stage 7. FIG. 4 is a diagram showing an observation image of a body 10. FIG. 4 shows a result when a transparent substrate (sapphire in this case) is used as the object to be processed 10. On the other hand, in FIG. 5, a diffusion layer 10a (formed by rough polishing of one surface of sapphire) as illustrated in FIG. 3 is provided on the entire surface of the transparent substrate on the stage 7 side. The case shows the results about things. Each observation image is obtained after both incident illumination light L5 and oblique illumination light L6 are given as illumination light.

  4 (a) and 5 (a) are observations when neither application of paint to the wall surface 12b of the suction pipe 12 nor formation of the antireflection film 13 is performed for comparison. It is a statue. In any observation image, the suction pipe 12 provided inside the stage 7 is clearly observed with higher brightness than other portions of the stage 7. This is due to irregular reflection of illumination light from the suction pipe 12. In particular, in FIG. 4 (a), the contrast between the transparent substrate and its surroundings is weak and the outline shape is slightly difficult to understand, and the image of the suction pipe 12 is superimposed on the image of the transparent substrate. The latter image is clearly observed. On the other hand, in the case of FIG. 5A, the shape of the transparent substrate is clearer than that of FIG. 4A, but the image of the suction pipe 12 is superimposed on the image of the transparent substrate. Observed. In such a case, it becomes difficult to accurately specify the contour shape of the transparent substrate based on the contrast in the observation image.

  On the other hand, FIG. 4B and FIG. 5B are observation images when only the black paint is applied to the wall surface 12b of the suction pipe 12. In these observation images, the irregular reflection from the wall surface 12 b is suppressed by the application of the paint, but the reflected light from the back surface 7 a of the stage 7 is present, so that the suction pipe 12 is more than the other part of the stage 7. The image is low in brightness (black). As a result, unlike the case of FIGS. 4A and 5A, the image of the suction pipe 12 is not noticeable. In the case of FIG. 4B, it is recognized that the image of the suction pipe 12 is superimposed on the image of the transparent substrate, but the outline shape of the transparent substrate is clearer than that of FIG. It has become. On the other hand, in the case of FIG. 5B, the outline shape of the transparent substrate is clear, and an image of the suction pipe that passes through the transparent substrate is not recognized. That is, it can be seen that the outline shape of the transparent substrate can be easily recognized by applying a low-lightness paint to the wall surface 12b.

  Further, FIG. 4C and FIG. 5C are observations when the antireflection film 13 is also formed on the back surface 7a of the stage 7 in addition to the application of the black paint to the suction pipe 12. It is a statue. In these observation images, the irregular reflection from the back surface 7a of the stage 7 is suppressed, so that the image of the suction pipe 12 is not confirmed at all, and only the transparent substrate is observed.

  That is, from the results shown in FIG. 4 and FIG. 5, the reflection of illumination light on the wall surface 12 b is suppressed by applying a low-lightness color paint to the wall surface 12 b of the suction pipe 12. It can be seen that even when the substrate is a transparent substrate, the contour shape of the transparent substrate can be accurately identified without being affected by the image of the suction pipe. In addition, it can be seen that when the antireflection film 13 is provided on the back surface 7a of the stage 7, the contour shape of the transparent substrate 10 becomes clearer. The latter aspect can be said to be more effective when specifying the contour shape of a transparent substrate that does not have a diffusion layer or a reflection layer.

  Although FIG. 5 shows the result for the transparent substrate provided with the diffusion layer 10a, the same result is obtained even when a layer that reflects the illumination light with a high reflectance is formed instead. Is obtained. Moreover, as shown in FIG. 3, when the location where the diffusion layer 10a exists and the location where it does not exist are mixed in the transparent substrate, the result shown in FIG. 4 or FIG. 5 is obtained at each location. .

  As described above, according to the present embodiment, in an observation apparatus including a stage that is transparent and configured to suck and fix an object to be processed, a low-lightness paint is applied to the suction pipe of the stage. By applying, the contour shape of the transparent substrate can be accurately obtained without performing special image processing to remove the image of the suction pipe even when the object to be processed is a transparent substrate. Can be identified well. When an antireflection film is provided on the back surface of the stage, the contour shape can be specified more clearly. As a result, improvement in processing accuracy in the laser processing apparatus is realized.

<Modification>
In the above-described embodiment, a description is given on the assumption that a part of the laser processing apparatus functions as the observation apparatus of the present invention. However, this is not an essential aspect, and is described in the above-described embodiment. If it is an apparatus which has a stage and the component which concerns on to-be-processed object, the effect of this invention can be acquired.

  Further, in the above-described embodiment, by performing a process of applying a paint to the wall surface of the suction pipe, which is a rough uneven surface as the irregular reflection suppression process, the irregular reflection from the wall surface is suppressed, and the contour shape of the transparent substrate However, the mode for obtaining such an effect is not limited to this.

  For example, as the irregular reflection suppression process, a smoothing process may be performed so that the wall surface of the suction pipe has such smoothness as to cause substantially no irregular reflection as described above. In such a case, since transparency is ensured also on the wall surface, it is possible to suppress an image due to irregular reflection from the wall surface from being superimposed on the observation image without applying the low-lightness paint as described above.

  FIG. 6 is a diagram showing a stage 14 having a structure different from that of the stage 7 according to the above-described embodiment. In the above-described embodiment, the suction pipe 12 is provided inside the stage 7. Instead, the stage 14 is provided with a plurality of grooves 15 on the surface 14 a thereof. A plurality of suction holes 15 a are discretely provided at the bottom of the groove 15. In the stage 14, the groove 15 and the suction hole 15a function as an intake passage. In a state where the object to be processed is placed so as to block the groove 15 on the surface of the stage 14, a negative pressure is applied to the groove 15 through the suction hole 15 a by suction by the suction means 11, thereby Fixed. If the process of applying the low-lightness paint or the smoothing process as described above is performed on the wall surface of the groove part 15 of the stage 14 as the irregular reflection suppressing process, the irregular reflection from the groove part 15 is suppressed, and the contour of the transparent substrate The effect that it becomes easy to specify the shape is obtained. 6 illustrates the groove portion 15 having a square cross-sectional view, but the same effect can be obtained even when the groove portion has a V-shaped or round shape in cross-section instead. Alternatively, as shown in FIG. 6, the groove portion has a bottom surface parallel to the surface of the stage 7 and a side surface perpendicular to the surface of the stage 7, and the bottom surface and the side surface have three surfaces in contact with each other at a right angle. The same effect can be obtained when the antireflection film is formed on the bottom surface as the irregular reflection suppressing process.

  In the above-described embodiment, a transparent sapphire substrate is suitable as the object 10 to be observed by the observation apparatus according to the present invention. In addition, for example, quartz, glass, transparent plastic, or other transparent material is used. A substrate made of any material may be used.

It is a schematic diagram which shows roughly the structure of the laser processing apparatus 50 which has a function as an observation apparatus which concerns on embodiment of this invention. It is a figure which shows typically the state which looked at the stage 7 from the upper surface side. It is a cross-sectional schematic diagram which shows the state which mounted the to-be-processed object 10 which affixed the transparent substrate protective sheet 4 on the stage 7 with the transparent substrate protective sheet 4 side turned to the stage 7 side. It is a figure which shows the observation image of the to-be-processed object 10 in the surface observation part 50A on various conditions. It is a figure which shows the observation image of the to-be-processed object 10 in the surface observation part 50A on various conditions. It is a figure which shows the stage 14 which concerns on a modification.

Explanation of symbols

DESCRIPTION OF SYMBOLS 4 Transparent substrate protective sheet 6 Back surface observation means 7, 14 Stage 7a (Back of stage 7) 7m Moving mechanism 10 Object 10a Diffusion layer 11 Suction means 12 Suction piping 12a Suction hole 12b Wall surface 13 Antireflection film 15 Groove 15a Suction Hole 16 Surface observation means 50 Laser processing apparatus 50A Surface observation part 50B Back surface observation part

Claims (11)

An observation device for observing a transparent substrate,
A stage made of a transparent member and provided with an intake passage for sucking and fixing the transparent substrate;
An illumination light source that irradiates illumination light to the observation surface of the transparent substrate placed on the surface of the stage;
An observation means for observing the transparent substrate from the side of the observation surface;
With
The air intake passage is subjected to irregular reflection suppression processing for suppressing irregular reflection of the illumination light irradiated from the illumination light source.
An observation apparatus characterized by that. The observation device according to claim 1,
The irregular reflection suppression process is performed only on the intake passage.
An observation apparatus characterized by that. The observation device according to claim 1 or 2,
The irregular reflection suppression process is a process of applying a low brightness color paint that absorbs the illumination light to the wall surface of the intake passage.
An observation apparatus characterized by that. The observation device according to any one of claims 1 to 3 ,
An antireflection film is formed on the back surface of the stage,
An observation apparatus characterized by that. The observation device according to claim 1 or 2 ,
The irregular reflection suppression process is a process of smoothing the wall surface of the intake passage.
An observation apparatus characterized by that. An observation apparatus according to any one of claims 1 to 5 ,
A suction pipe as the intake passage is provided inside the stage.
An observation apparatus characterized by that. An observation apparatus according to any one of claims 1 to 5 ,
A groove as the intake passage is provided on the surface of the stage.
An observation apparatus characterized by that. The observation device according to claim 1 or 2 ,
On the surface of the stage, as the intake passage, a groove portion consisting of a bottom surface parallel to the surface of the stage and a side surface perpendicular to the surface of the stage, wherein the bottom surface and the side surface are in contact with each other at a right angle. An antireflection film is formed on the bottom surface of the groove,
An observation apparatus characterized by that. An observation apparatus according to any one of claims 1 to 8 ,
As the illumination light source,
A coaxial illumination light source that emits coaxial illumination light;
An oblique illumination light source for irradiating oblique illumination light;
With
The coaxial illumination light and the oblique illumination light can be selectively or superimposedly applied to the transparent substrate placed on the surface of the stage.
An observation apparatus characterized by that. An observation apparatus according to any one of claims 1 to 9,
The stage is provided to be movable by a predetermined moving mechanism,
An observation apparatus characterized by that. While equipped with the observation device according to claim 10 as an observation means of the transparent substrate,
An irradiation source for irradiating the transparent substrate sucked and fixed to the stage with laser light;
By moving the stage with the transparent substrate being sucked and fixed, the observation position of the transparent substrate can be moved,
The transparent substrate is processed with the laser light by moving the stage while irradiating the laser light from the irradiation source in a state where the transparent substrate is sucked and fixed to the stage.
Laser processing equipment characterized by that.