JP5261953B2 - Color filter polishing apparatus and manufacturing method thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter polishing device having little used amount of polishing cloth and little dispersion of polishing amount in a short time and its manufacturing method, when polishing the surface of the color filter by the polishing cloth, more particularly, regarding the color filter polishing device for flattening the surface of the color filter and its manufacturing method. <P>SOLUTION: This color filter polishing device flattens the surface of the color filter 6 by turning the surface of the color filter 6 to be polished upward, horizontally carrying the color filter 6 and rotating a polishing head 3 constituted of a rectangular polishing plate for inline polishing and the polishing cloth by bringing the polishing head 3 into contact with the surface of the color filter 6 in a polishing part. The surface of the polishing plate for inline polishing is formed into a projected difference in level or a projected curved surface shape in relation to the color filter 6. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

  The present invention relates to a color filter polishing apparatus for flattening the surface of a color filter and a method for manufacturing the same. More specifically, the present invention relates to a color filter polishing apparatus that uses a small amount of polishing cloth when the surface of the color filter is polished with a polishing cloth, and has a small amount of variation in polishing amount, and a method for manufacturing the same.

  Conventionally, a color filter used in a liquid crystal display device has a black matrix and colored pixels formed on a glass substrate. For example, a large number of rectangular colored pixels each having a side of about several hundred μm are arranged on a 14-inch diagonal screen.

  The black matrix is light-shielding and has openings arranged in a matrix, and the colored pixels have, for example, red, green, and blue filter functions.

  Also, the black matrix determines the position of the colored pixels of the color filter, makes the size uniform, and shields unwanted light when used in a display device, so that the image on the display device is not uneven. It has a function to make a uniform image with improved contrast.

In this black matrix, a metal such as chromium (Cr), chromium oxide (CrO _x ) or a metal compound as a black matrix material is formed into a thin film on a glass substrate, and on the formed thin film, for example, Then, an etching resist pattern is formed using a positive photoresist.

Next, etching and stripping of the etching resist pattern are performed on the exposed portion of the formed metal thin film to form a black matrix made of a metal thin film such as Cr or CrO _x .

  In addition, for the formation of the colored pixels, on the glass substrate formed in the black matrix, for example, a coating film is provided using a negative photoresist in which pigments and other pigments are dispersed, and exposure to the coating film is performed. A method of forming colored pixels by development is used.

  Further, in a color filter using a resin as a black matrix material, a black matrix and colored pixels are formed on a glass substrate in the same manner as the color filter described above.

  This black matrix is formed on a glass substrate by, for example, a photolithography method using a black photosensitive resin for forming a black matrix. A black matrix formed using a resin is referred to as a resin black matrix.

  The resin black matrix suppresses internal reflection in a liquid crystal display device that occurs when a metal such as chromium is used as a black matrix when a high-brightness backlight is used, such as a television.

For this reason, when a low-reflection resin black matrix is desired, or for example, when used in an IPS (In Plane Switching) method, a high insulating property is used to suppress electric field disturbance in a liquid crystal display device. This was used when a resin black matrix was required.

  However, the black matrix is gradually shifting from a black matrix using a metal such as chromium to a resin black matrix.

  In addition, when a large number of color filters are manufactured, a color filter corresponding to a single liquid crystal display device is manufactured in a state of being impressed on a large glass substrate. For example, a 14-inch diagonal color filter is attached to four large-sized glass substrates of about 550 mm × 650 mm, or a 17-inch diagonal color filter is applied to four large-sized glass substrates of about 650 mm × 850 mm. To manufacture.

  A large-sized glass substrate used for mass production by imposing a color filter is increased in size from about 650 mm × 850 mm to about 900 mm × 1100 mm, for example.

  With the increase in size, the resin black matrix formed by photolithography using a black photosensitive resin rather than the black matrix using a metal such as chromium as a black matrix material and forming a thin film with a vacuum apparatus. The price is more advantageous, and the transition to resin black matrix is gradually progressing. There is also a tendency to avoid using metals such as chromium in consideration of the environment.

  The resin black matrix cannot obtain a high concentration in a thin film having a film thickness of about 100 nm to 200 nm, such as a black matrix using a metal such as chromium, and has a thickness of about 0.5 to 5.0 μm, for example. Thus, the necessary high concentration is obtained.

  Further, when the thickness of the resin black matrix is increased to, for example, about 1.0 μm, the colored pixel formed by overlapping the peripheral portion on the resin black matrix becomes a protrusion on the resin black matrix. .

  This protrusion makes the surface of the color filter uneven, and deteriorates the flatness. When a color filter having such protrusions and having a deteriorated surface flatness is used in a liquid crystal display device, the alignment of liquid crystal molecules is disturbed by the influence of the protrusions, and display quality such as display unevenness is deteriorated.

  For example, when a colored pixel having a thickness of about 0.5 to 5.0 μm is formed on a resin black matrix having a thickness of about 0.5 to 5.0 μm, the height (A) of the protrusion is 0.5. ˜5.0 μm. In the case of a black matrix using a metal, since the film thickness is about 100 to 200 nm, such protrusions are few.

  In order to remove such protrusions on the surface of the color filter or to reduce the height of the protrusions to such an extent that the alignment of the liquid crystal molecules is not affected, for example, polishing on the surface of the color filter is performed.

  In this method, a color filter is placed and fixed on a circular table of a flat plate polishing machine, and a polishing pad surface bonded to a surface plate is brought into pressure contact with the color filter surface. Then, while rotating the circular table, the polishing liquid is dropped and the circular surface plate is swung to remove the protrusions on the surface of the color filter.

Further, in order to make the surface of the color filter smooth, the coloring is roughened by a wrapping film by using a suspension obtained by dissolving fine particles such as alumina having a particle diameter of 0.06 to 1 μm in a liquid such as water. A color filter having an ink coating that is extremely smooth and having improved transparency and a method for producing the same (see, for example, Patent Document 1) are known.

  However, if the polishing process to the color filter surface is a separate line from the process of forming the colored pixels, the glass substrate on which the colored pixels are formed is temporarily stored in a rack in actual work. Transport to the polishing process in the state.

  Then, each piece is taken out from the rack and placed on a flat plate polishing machine to perform polishing work. This causes a loss of equipment stoppage due to the movement of the glass substrate, and the productivity of the polishing work is not good.

  In addition, since the thickness of the glass substrate is about 0.7 mm, even in a glass substrate of the current size, for example, bending occurs. Therefore, care must be taken in handling the glass substrate. In the future, as glass substrates are further increased in size, handling them will be dangerous, and safety measures are required.

  Further, when polishing and removing the protrusions of the color filter having protrusions, or when removing photoresist residues and aggregates, an apparatus in which a device for forming colored pixels and a polishing apparatus are connected is used.

  Further, in a glass substrate of the current size, the productivity of the polishing operation is improved, and the color filter polishing method for improving the safety and productivity of a larger-sized glass substrate (see, for example, Patent Document 2). ) Is also known.

  In this polishing method, the color filter surface to be polished is directed upward, the color filter is horizontally conveyed, and the polishing liquid is supplied to the color filter surface by a polishing liquid supply unit provided in front of the polishing unit. The surface of the color filter is flattened by rotating the rectangular polishing head in contact with the color filter surface.

  By the way, the color filter horizontally transported to the polishing section rotates a rectangular polishing head 100 comprising a rigid plate 101 and an elastic body 102 as shown in FIG. 6 in contact with the color filter surface. At this time, there is a problem that damage such as scratches occurs on the color filter surface at the outer peripheral edge (edge) of the tip of the polishing head, resulting in poor quality and variations in the polishing amount.

  Therefore, an elastic body 103 or the like as shown in FIG. 7 is attached to the central portion of the rigid plate 101 of the rectangular polishing head 200, and the entire lower surface of the rigid plate is covered so as to cover the elastic body 103 or the like. A method of preventing damage such as scratches on the color filter surface by providing an elastic body 102 on the surface is performed. However, there is a problem that labor and cost increase.

Prior art documents are shown below.
JP-A-7-151911 JP 2005-288649 A

  The present invention has been made in view of the above-described conventional problems, and the problem is that a resin black matrix and colored pixels are sequentially formed on a glass substrate, and a protrusion is provided on an end of the resin black matrix. When polishing and removing the protrusions of the color filter, a device that connects the device for forming colored pixels and the polishing device is used, and the current size glass substrate prevents the quality of polishing work and saves time and effort. In addition, the present invention provides a color filter polishing apparatus and a method for manufacturing the same that do not increase the material cost and do not cause variations in the polishing amount.

In order to solve the above problems, the invention according to claim 1 of the present invention provides:
The color filter surface is flattened by horizontally transporting the color filter with the color filter surface to be polished facing upward and rotating the polishing head consisting of a rectangular inline polishing polishing plate and polishing cloth in contact with the color filter surface in the polishing section. A color filter polishing apparatus,
It is a color filter polishing apparatus characterized by the surface of the in-line polishing polishing plate is formed in a convex curved shape with respect to the color filter.

Next, the invention according to claim 2 of the present invention is as follows.
A color filter manufacturing method for polishing a color filter using the color filter polishing apparatus according to claim 1.

  Since the color filter polishing apparatus of the present invention has the above configuration, the time for changing the polishing cloth can be shortened. Furthermore, the amount of polishing cloth used can be reduced.

  Further, the polishing rate can be improved by polishing the color filter using the color filter polishing apparatus of the present invention.

  Further, by polishing the color filter using the color filter polishing apparatus of the present invention, variation in the polishing amount of the color filter can be reduced.

  The color filter polishing apparatus of the present invention will be described in detail below along the embodiments with reference to the drawings.

  FIG. 1A is a schematic diagram showing an outline of an embodiment of a color filter polishing apparatus according to the present invention. (B) is sectional drawing in the AA 'line of Fig.1 (a).

  As shown in FIGS. 1A and 1B, the polishing unit 20 of the color filter polishing apparatus is provided with a rectangular polishing head 3. The polishing head 3 is integrally connected to a shaft 4 for rotating the polishing head 3 at an upper portion thereof.

  Moreover, the roll conveyor 5 which conveys a glass substrate is provided through the grinding | polishing part 20 from the left front process (process which forms a colored pixel) to the right back process (water washing process) in the figure. Yes. Although not shown in the figure, the lower surface plate is a porous surface plate on which the glass substrate 6 can be easily attached and detached, and serves as a support for the polishing head 3.

  The glass substrate (color filter) 6 is conveyed by the roll conveyor 5 from the left front process, as indicated by a white thick arrow. Then, in the polishing unit 20, the polishing head 3 contacts and rotates on the surface of the glass substrate (color filter) 6, the surface of the color filter 6 is flattened, and further conveyed to the right rear process (water washing process). The

As described above, in the color filter polishing apparatus used in this embodiment, the colored pixel forming apparatus and the color filter polishing apparatus, which are the previous processes, are connected, and the color filter polishing apparatus and the water washing apparatus, which is the subsequent processes, are connected. Has been. For this reason, the productivity of the polishing operation is improved. Moreover, the danger in handling the glass substrate (color filter) 6, which is expected when the glass substrate (color filter) 6 is further increased in size, is avoided.

  Further, since the color filter polishing apparatus used in this embodiment uses a rectangular polishing head 3 as the polishing head 3, the polishing head 3 and the glass substrate (color filter) 6 are compared with the circular surface plate. This has the effect of uniforming the rubbing distance in the plane. As a result, polishing is performed uniformly in the surface, and local overpolishing does not occur.

  Moreover, the manufacturing method of the color filter by this invention is a manufacturing method for grinding | polishing of a resin film like the colored pixel formed on the glass substrate. As a method other than polishing the surface of the color filter 6, for example, a manufacturing method that can be applied well to a PDP substrate in which a resin rib is formed on a glass substrate or a decorative substrate in which a resin pattern is formed on a glass substrate. is there.

  Further, the speed at which the color filter 6 of this embodiment is horizontally conveyed to the color filter polishing apparatus by the roll conveyor is about 0.1 to 20.0 m / min, and the polishing head 3 is applied to the glass substrate (color filter) 6. The contact rotation speed is about 5 to 1000 rpm.

  Next, FIG. 2 is a schematic view showing an outline of another embodiment of the color filter polishing apparatus according to the present invention.

As shown in FIG. 2, the glass substrate (color filter) 6 is conveyed by the roll conveyor 7 from the left front process (process for forming colored pixels) in the drawing. Then, the polishing unit 30 is placed and transported on the transport belt conveyor 8.

  Water is supplied onto the conveyor belt conveyor 8 by a water supply nozzle 9. Then, due to the interfacial tension of water on the conveyor belt conveyor 8, the glass substrate (color filter) 6 is fixed on the conveyor belt conveyor 8 and conveyed to the polishing unit 30.

  The polishing unit 30 is flattened on the lower surface plate 10 via the conveyor belt conveyor 8 by the contact rotation of the polishing head 3. And it is conveyed by the roll conveyor 7 to the right back process (water washing process).

  Further, the color filter polishing apparatus of the present embodiment shown in FIG. 2 is a color filter polishing apparatus that is suitably applied when the glass substrate is small in size and light in weight, or when the polishing contact pressure is high. .

  Next, FIG. 3 is an enlarged perspective view of a portion B in FIG. As described above, the color filter 6 conveyed from the previous process by the roll conveyor 5 is the polishing unit 20, and the rectangular polishing head 3 contacts and rotates to flatten the surface. The rectangular polishing head 3 is provided with a drive unit 11 via a shaft 4 at the center in the upper part for rotating the polishing head 3.

  The rectangular polishing head 3 is formed of an in-line polishing polishing plate 2 and a polishing cloth 1. The polishing cloth 1 is stuck below the in-line polishing polishing plate 2.

The surface shape on which the polishing cloth 1 is adhered below the in-line polishing polishing plate 2 is the shape of a convex step 12 with respect to the color filter 6 conveyed horizontally as shown in FIG. 4 or as shown in FIG. A curved surface shape 13 is formed.

  For this reason, when the polishing head 3 rotates in contact with the surface of the color filter 6, damage such as scratches does not occur on the surface of the color filter 6 at the outer peripheral edge (edge portion) of the tip of the polishing head 3. In addition, the polishing rate can be improved. Furthermore, variation in the polishing amount of the color filter 6 surface can be reduced.

  Further, it is not necessary to stick a polishing cloth 1 or the like for forming a convex step 12 below the polishing head 3 as shown in FIG. For this reason, it does not take time.

  Furthermore, in the method shown in FIG. 7, since the polishing cloth is attached to the entire lower surface of the polishing head 3 so as to cover the attached polishing cloth, the amount of the polishing cloth 1 used is increased. However, as shown in FIG. 4, by forming a convex step 12 below the in-line polishing polishing plate 2, the amount of use of the polishing cloth or the like can be reduced.

  Further, by forming the lower part of the inline polishing polishing plate 2 into a curved shape as shown in FIG. 5, when the polishing cloth 1 is adhered, the inline polishing polishing plate 2 surface and the polishing cloth 1 surface are interposed. It can be smoothly stuck without leaving bubbles such as air. A more stable and uniform smooth surface can be applied.

  The abrasive cloth 1 has a viscoelasticity of about 0.8 to 2.0 mm, for example, a foam type in which a foam layer is laminated on a base layer, or a nonwoven cloth type abrasive cloth 1 in which a fiber layer is laminated on a base layer. Can also be used.

  Further, as a non-woven fabric, a suede in which a polyurethane felt is coated on a base material in which polyester felt is impregnated and a foamed layer is grown in the polyurethane and then an opening is provided on the surface portion thereof can be used.

  The suede has a stable function of polishing because clogging is less likely to occur, and is preferable for managing the polishing amount.

  Further, when the above-described polishing head 3 rotates in contact with the glass substrate (color filter) 6 surface to flatten the color filter 6 surface, the glass substrate (color filter) 6 surface is not shown in the drawing. Known abrasive particles, abrasives, liquids, etc. are used.

  For example, alumina, zirconia, cerium, manganese dioxide, silicon carbide, silica or the like having an average primary particle diameter of 0.01 to 1.0 μm is used as the abrasive particles, and is not particularly limited.

  The color filter polishing apparatus and the manufacturing method thereof of the present invention are not only excellent as a color filter surface polishing apparatus, but also a PDP substrate in which a rib is formed on a glass substrate as described above, or a resin on a glass substrate. It is a wonderful invention that can be used for the production of decorative boards and the like on which patterns are formed.

(A) is schematic which shows the outline of one Example of the color filter grinding | polishing apparatus by this invention, (b) is sectional drawing in the AA 'line of Fig.1 (a). It is the schematic which shows the outline of one Example of the color filter polishing apparatus other by this invention. It is an expansion perspective view of B section of Drawing 1 (a). It is explanatory drawing explaining one implementation shape of the side surface of FIG. It is explanatory drawing explaining other one implementation shape of the side surface of FIG. It is explanatory drawing explaining the polishing head of the conventional color filter polishing apparatus. It is another explanatory drawing explaining the polish head of the conventional color filter polish device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Polishing cloth 2 ... Polishing plate for in-line polishing 3 ... Polishing head 4 ... Shaft 5 ... Roll conveyor 6 ... Glass substrate (color filter)
DESCRIPTION OF SYMBOLS 7 ... Roll conveyor 8 ... Conveyor belt conveyor 9 ... Water supply nozzle 10 ... Bottom board 11 ... Drive part 12 ... Convex-shaped level | step 13 ... Curved surface shape 20 ... Polishing part 30 ... Polishing part

Claims (2)

The color filter surface is transported horizontally with the color filter surface to be polished facing up, and the color filter surface is flattened by rotating the polishing head consisting of a rectangular inline polishing polishing plate and polishing cloth in contact with the color filter surface in the polishing section. A color filter polishing apparatus,
The color filter polishing apparatus wherein a surface of the in-line polishing polishing plate is formed in a convex curved shape with respect to the color filter.   A color filter manufacturing method for polishing a color filter using the color filter polishing apparatus according to claim 1.

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