JP5256680B2 - 電鋳法における形状転写導電層の形成方法 - Google Patents
電鋳法における形状転写導電層の形成方法 Download PDFInfo
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- JP5256680B2 JP5256680B2 JP2007260639A JP2007260639A JP5256680B2 JP 5256680 B2 JP5256680 B2 JP 5256680B2 JP 2007260639 A JP2007260639 A JP 2007260639A JP 2007260639 A JP2007260639 A JP 2007260639A JP 5256680 B2 JP5256680 B2 JP 5256680B2
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- conductive layer
- master mold
- electroforming
- forming
- shape transfer
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 67
- 238000012546 transfer Methods 0.000 title claims description 37
- 238000005323 electroforming Methods 0.000 title claims description 22
- 239000002184 metal Substances 0.000 claims description 44
- 229910052751 metal Inorganic materials 0.000 claims description 44
- 238000007740 vapor deposition Methods 0.000 claims description 14
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 13
- 238000005240 physical vapour deposition Methods 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 229910001080 W alloy Inorganic materials 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 29
- 239000010408 film Substances 0.000 description 20
- 238000004070 electrodeposition Methods 0.000 description 17
- 230000003746 surface roughness Effects 0.000 description 15
- 239000010419 fine particle Substances 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 238000005566 electron beam evaporation Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000010949 copper Substances 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- 230000010363 phase shift Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000313 electron-beam-induced deposition Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000000089 atomic force micrograph Methods 0.000 description 2
- 238000001017 electron-beam sputter deposition Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910020515 Co—W Inorganic materials 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003296 Ni-Mo Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- DDTIGTPWGISMKL-UHFFFAOYSA-N molybdenum nickel Chemical compound [Ni].[Mo] DDTIGTPWGISMKL-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Physical Vapour Deposition (AREA)
Description
2 真空チャンバー
3 アークプラズマガン
4 電子ビーム蒸着源
5 銅製ルツボ
6 蒸着原料
7 アンカー金属
8 導電層
9 電鋳層
10 メッシュ板
10A 周囲領域
10B 中央領域
11 メッシュ板
M マスター型
T 転写部品
Claims (7)
- マスター型の表面に導電層、電鋳層、適宜裏打ち材を順次積層し、マスター型の表面と導電層の界面で剥離して、マスター型の形状を転写する電鋳法において、マスター型の表面にアークプラズマ法によってアンカー金属を離散的に付着させ、その後、アンカー金属とは異なる金属を物理的蒸着法によって蒸着して導電層を形成してなる電鋳法における形状転写導電層の形成方法。
- 前記、物理的蒸着法が、電子ビーム蒸着法又はスパッタリング法である請求項1記載の電鋳法における形状転写導電層の形成方法。
- 前記アンカー金属がCrである請求項1又は2記載の電鋳法における形状転写導電層の形成方法。
- 前記導電層がPt又はNi又はCuであり、前記電鋳層がNi又はCu又はNi−W合金である請求項1〜3何れかに記載の電鋳法における形状転写導電層の形成方法。
- Cr密度(×1010(atoms/cm2))が6000〜15000である請求項3記載の電鋳法における形状転写導電層の形成方法。
- Cr密度(×1010(atoms/cm2))が7500〜12000である請求項3記載の電鋳法における形状転写導電層の形成方法。
- 前記マスター型がSi単結晶又はガラスである請求項1〜6何れかに記載の電鋳法における形状転写導電層の形成方法。
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JP2007260639A JP5256680B2 (ja) | 2007-10-04 | 2007-10-04 | 電鋳法における形状転写導電層の形成方法 |
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JP2007260639A JP5256680B2 (ja) | 2007-10-04 | 2007-10-04 | 電鋳法における形状転写導電層の形成方法 |
Publications (2)
Publication Number | Publication Date |
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JP2009091600A JP2009091600A (ja) | 2009-04-30 |
JP5256680B2 true JP5256680B2 (ja) | 2013-08-07 |
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CN103290436B (zh) * | 2013-05-24 | 2015-08-05 | 燕山大学 | 一种高熔点合金喷射电沉积快速制模方法 |
CN110894617A (zh) * | 2018-09-13 | 2020-03-20 | 深圳市永达锐国际科技有限公司 | 3d铂金电铸工艺方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0780186B2 (ja) * | 1985-03-26 | 1995-08-30 | ソニー株式会社 | 成型金型作成用原板及び該原板を使用した金型作成方法 |
JP4776033B2 (ja) * | 2006-07-05 | 2011-09-21 | 柿原工業株式会社 | スパッタリングによる樹脂導電化を利用した装飾めっき品の製造方法 |
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