JP5217881B2 - Microwave processing equipment - Google Patents

Microwave processing equipment Download PDF

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JP5217881B2
JP5217881B2 JP2008263809A JP2008263809A JP5217881B2 JP 5217881 B2 JP5217881 B2 JP 5217881B2 JP 2008263809 A JP2008263809 A JP 2008263809A JP 2008263809 A JP2008263809 A JP 2008263809A JP 5217881 B2 JP5217881 B2 JP 5217881B2
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unit
power
power feeding
microwave
units
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JP2010092794A (en
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義治 大森
等隆 信江
健治 安井
誠 三原
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/70Feed lines
    • H05B6/705Feed lines using microwave tuning
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/66Circuits
    • H05B6/68Circuits for monitoring or control
    • H05B6/686Circuits comprising a signal generator and power amplifier, e.g. using solid state oscillators
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2206/00Aspects relating to heating by electric, magnetic, or electromagnetic fields covered by group H05B6/00
    • H05B2206/04Heating using microwaves
    • H05B2206/044Microwave heating devices provided with two or more magnetrons or microwave sources of other kind

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Constitution Of High-Frequency Heating (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Control Of High-Frequency Heating Circuits (AREA)

Description

本発明は、半導体素子を用いて構成したマイクロ波発生部を備えたマイクロ波処理装置に関するものである。   The present invention relates to a microwave processing apparatus including a microwave generation unit configured using a semiconductor element.

従来のこの種のマイクロ波処理装置は、一般には直方体形状の加熱室で構成され、一つあるいは複数の給電部を備えている。複数の給電部の構成としては、給電部を加熱室の上壁面と底壁面に設け、専用のマイクロ波発生部からそれぞれの給電部にマイクロ波を供給したものがある。   A conventional microwave processing apparatus of this type is generally composed of a rectangular parallelepiped heating chamber and includes one or a plurality of power feeding units. As a structure of a some electric power feeding part, there exists a thing which provided the electric power feeding part in the upper wall surface and bottom wall surface of a heating chamber, and supplied the microwave to each electric power feeding part from the microwave generation part for exclusive use.

また、被加熱物の加熱の均一化を促進することを狙いとして加熱室を6面以上の多面体に形成し、各壁面の一部あるいは全部の面から給電部である放射アンテナを加熱室内に突出して配置したものがある(例えば、特許文献1参照)。そして、互いの放射アンテナを異なる面に配したことで、互いの干渉を防止できるとしている。さらには、放射アンテナがそれぞれ異なる方向を向いているので、放射された電波は加熱室内のあらゆる方向に伝播し、壁面にて反射して散乱するため、加熱室内で電波は均一に分布するとしている。   In addition, with the aim of promoting uniform heating of the object to be heated, the heating chamber is formed in a polyhedron having six or more faces, and a radiation antenna as a power feeding portion protrudes from a part or all of each wall surface into the heating chamber. (See, for example, Patent Document 1). And, it is said that mutual interference can be prevented by arranging the radiation antennas on different surfaces. Furthermore, since the radiating antennas are directed in different directions, the radiated radio waves propagate in all directions in the heating chamber and are reflected and scattered by the wall surface, so that the radio waves are uniformly distributed in the heating chamber. .

また、固体発振器が接続された各アンテナのうち、少なくとも2個のアンテナを加熱室の同一壁面に配置させるものがある(例えば、特許文献2参照)。そして、アンテナの設置数を増やすことにより加熱むらが少なくなり、均一加熱ができかつアンテナ相互の向き関係により反射波の影響をも無くす点が記載されている。   Further, among each antenna connected to a solid-state oscillator, there is an antenna in which at least two antennas are arranged on the same wall surface of a heating chamber (see, for example, Patent Document 2). Further, it is described that heating unevenness is reduced by increasing the number of installed antennas, uniform heating can be performed, and the influence of reflected waves is eliminated due to the orientation relationship between the antennas.

また、位相器を備えたものとして、半導体発振部と、発振部の出力を複数に分割する分配部と、分配された出力をそれぞれ増幅する複数の増幅部と、増幅部の出力を合成する合成部とを有し、分配部と増幅部との間に位相器を設けたものがある(例えば、特許文献3参照)。そして、位相器はダイオードのオンオフ特性によりマイクロ波の通過線路長を切
り替える構成としている。また、合成部は、90度および180度ハイブリッドを用いることで、合成部の出力電力を2つにすることができ、位相器を制御することで2出力の電力比を変化させたり、2出力間の位相を同相あるいは逆相にしたりできるとしている。
Also, with a phase shifter, a semiconductor oscillating unit, a distributing unit that divides the output of the oscillating unit into a plurality of components, a plurality of amplifying units that respectively amplify the distributed outputs, and a synthesis that combines the outputs of the amplifying units And a phase shifter is provided between the distribution unit and the amplification unit (see, for example, Patent Document 3). The phase shifter is configured to switch the microwave pass line length according to the on / off characteristics of the diode. Further, the combining unit can use two 90-degree and 180-degree hybrids, so that the output power of the combining unit can be made two. By controlling the phase shifter, the power ratio of two outputs can be changed, or two outputs The phase between them can be in phase or out of phase.

また、この種のマイクロ波処理装置は、一般には電子レンジに代表されるようにマイクロ波発生部にマグネトロンと称される真空管を用いている。
特開昭52−19342号公報 実開昭52−16654号公報 特開昭56−132793号公報
In addition, this type of microwave processing apparatus generally uses a vacuum tube called a magnetron in a microwave generation section as represented by a microwave oven.
JP-A-52-19342 Japanese Utility Model Publication No. 52-16654 JP 56-132793 A

しかしながら、前記従来の複数給電部は、各給電部間の干渉を回避させるように配置させたものであり、それぞれの給電部から放射されたマイクロ波は、放射方向がそれぞれ異なっているが、加熱室壁面での反射に伴う散乱およびその散乱したマイクロ波が、壁面にぶつかってさらに散乱という繰返しにより広範囲の散乱になるので、他の放射アンテナから放射されたマイクロ波からの干渉を防止することは不可能である。   However, the conventional multiple power feeding units are arranged so as to avoid interference between the power feeding units, and the microwaves radiated from the respective power feeding units have different radiation directions but are heated. Scattering due to reflection on the wall surface of the room and the scattered microwaves are scattered over a wide range by repeated scattering and colliding with the wall surface, preventing interference from microwaves radiated from other radiation antennas Impossible.

また、加熱室の同一壁面に、複数のアンテナを配置させるものにあっては、単純にアンテナ数を複数設けたものとの差異が明確でなく、同一壁面に設けることの効果の内容開示がなく、実現の可能性のみ記載されている。   In addition, in the case where a plurality of antennas are arranged on the same wall surface of the heating chamber, the difference from simply providing a plurality of antennas is not clear, and there is no disclosure of the contents of the effect of providing the same wall surface. Only the possibility of realization is described.

さらに、位相器を備えたものにおいては、合成部の2つの出力から放射されるマイクロ波は、位相器によって位相を変化させることで、2つの放射アンテナからの放射電力比や位相差を任意にかつ瞬時に変化させることは可能だけれども、その放射によってマイクロ波が供給される加熱室内に収納された様々な形状・種類・量の異なる被加熱物を所望の状態に加熱することは難しいという課題を有していた。   In addition, in the case of a device equipped with a phase shifter, the microwaves radiated from the two outputs of the combining unit can change the radiated power ratio and phase difference from the two radiating antennas by changing the phase by the phase shifter. Although it is possible to change it instantaneously, it is difficult to heat the objects to be heated in various shapes, types and quantities stored in the heating chamber to which microwaves are supplied by the radiation to the desired state. Had.

本発明は、上記従来の課題を解決するもので、複数の給電部それぞれから放射されるマイクロ波を最適に相互干渉させることで、様々な形状・種類・量の異なる被加熱物を所望の状態に加熱するマイクロ波処理装置を提供することを目的とする。   The present invention solves the above-described conventional problems, and optimally interfers microwaves radiated from each of a plurality of power supply units, thereby allowing various shapes, types, and amounts of objects to be heated to be in a desired state. An object of the present invention is to provide a microwave processing apparatus that heats the heat.

前記従来の課題を解決するために、本発明のマイクロ波処理装置は、被加熱物を収容する加熱室と、発振部と、前記発振部の出力を複数に分配して出力する電力分配部と、前記電力分配部の少なくともひとつの出力位相を可変する位相可変部と、前記電力分配部および/または前記位相可変部の出力をそれぞれ電力増幅する増幅部と、前記増幅部の出力を前記加熱室に供給する給電部と、それぞれの前記給電部から前記増幅部方向に反射するマイクロ波電力を検出する電力検出部と、前記発振部の発振周波数と前記位相可変部の位相量を制御する制御部とを備え、前記給電部は、前記加熱室の底壁面に4ヶ所以上の偶数ヶ所に配置され、1つの軸上の点に対し略対称に2つの前記給電部の組合せを複数設け、前記給電部の組合せを構成する2つの前記給電部間を結ぶ線が前記複数の給電部の組合せにおいて交差するように配置され、前記給電部の組合せは前記加熱室へ放射するマイクロ波電界の励振方向が一致するように配置され、前記制御部は、前記給電部から供給するマイクロ波の位相を、前記複数の給電部の組合せ間で、相対的に制御する構成としたものであり、略対称に配置した複数の給電部の組合せから放射した小電力のマイクロ波が強く相互干渉して、さらに指向性の強い大電力のマイクロ波電力の分布を加熱室内に発生させ、加熱室内に収納する被加熱物を効率よく加熱し、相対的に位相を制御したマイクロ波間の相互干渉で発生する、強い指向性のマイクロ波電力の分布は、位相差により分布位置を移動できるので、様々な形状・種類・量の異なる被加熱物を最適に加熱する装置を提供できる
In order to solve the above-described conventional problems, a microwave processing apparatus of the present invention includes a heating chamber that accommodates an object to be heated , an oscillation unit, and a power distribution unit that distributes and outputs the output of the oscillation unit to a plurality of units. A phase variable unit that varies at least one output phase of the power distribution unit, an amplification unit that amplifies the power of the output of the power distribution unit and / or the phase variable unit, and an output of the amplification unit as the heating chamber A power supply unit that supplies power to the power supply unit, a power detection unit that detects microwave power reflected from each of the power supply units in the direction of the amplification unit, and a control unit that controls the oscillation frequency of the oscillation unit and the phase amount of the phase variable unit The power feeding section is arranged at an even number of four or more places on the bottom wall surface of the heating chamber, and a plurality of combinations of the two power feeding sections are provided approximately symmetrically with respect to a point on one axis, 2 constituting a combination of parts The lines connecting the two power feeding sections are arranged so as to intersect each other in the combination of the plurality of power feeding sections, and the combination of the power feeding sections is arranged so that the excitation directions of the microwave electric field radiated to the heating chamber match. The control unit is configured to relatively control the phase of the microwave supplied from the power feeding unit between the combinations of the plurality of power feeding units, and a combination of a plurality of power feeding units arranged substantially symmetrically. radiation was low power microwaves strongly interference from further distribution of microwave power high directivity high power is generated in the heating chamber, the object to be heated is efficiently heated to be stored in the heating chamber, the relative The distribution of microwave power with strong directivity generated by mutual interference between microwaves whose phases are controlled in phase can be moved by the phase difference, so it is best to use heated objects of various shapes, types, and quantities. Possible to provide a device for heating.

本発明のマイクロ波処理装置は、複数の給電部それぞれから略対称な放射特性でマイクロ波を加熱室内に放射して、最適に相互干渉させることで、さまざまな形状・種類・量の異なる被加熱物を所望の状態に加熱するマイクロ波処理装置を提供することができる。   The microwave processing apparatus of the present invention radiates microwaves from a plurality of power feeding sections with substantially symmetrical radiation characteristics into a heating chamber and optimally interferes with each other, thereby allowing various shapes, types, and amounts of heated objects to be heated. A microwave processing apparatus for heating an object to a desired state can be provided.

第1の発明は、被加熱物を収容する加熱室と、発振部と、前記発振部の出力を複数に分配して出力する電力分配部と、前記電力分配部の少なくともひとつの出力位相を可変する位相可変部と、前記電力分配部および/または前記位相可変部の出力をそれぞれ電力増幅する増幅部と、前記増幅部の出力を前記加熱室に供給する給電部と、それぞれの前記給電部から前記増幅部方向に反射するマイクロ波電力を検出する電力検出部と、前記発振部の発振周波数と前記位相可変部の位相量を制御する制御部とを備え、前記給電部は、前記加熱室の底壁面に4ヶ所以上の偶数ヶ所に配置され、1つの軸上の点に対し略対称に2つの前記給電部の組合せを複数設け、前記給電部の組合せを構成する2つの前記給電部間を結ぶ線が前記複数の給電部の組合せにおいて交差するように配置され、前記給電部の組合せは前記加熱室へ放射するマイクロ波電界の励振方向が一致するように配置され、前記制御部は、前記給電部から供給するマイクロ波の位相を、前記複数の給電部の組合せ間で、相対的に制御する構成としたものであり、略対称に配置した複数の給電部の組合せから放射した小電力のマイクロ波が強く相互干渉して、さらに指向性の強い大電力のマイクロ波電力の分布を加熱室内に発生させ、加熱室内に収納する被加熱物を効率よく加熱し、相対的に位相を制御したマイクロ波間の相互干渉で発生する、強い指向性のマイクロ波電力の分布は、位相差により分布位置を移動できるので、様々な形状・種類・量の異なる被加熱物を最適に加熱することができる。 A first aspect of the invention is a heating chamber that accommodates an object to be heated, an oscillation unit, a power distribution unit that distributes and outputs the output of the oscillation unit, and at least one output phase of the power distribution unit is variable. A phase variable unit that performs power amplification of the output of the power distribution unit and / or the phase variable unit, a power supply unit that supplies the output of the amplification unit to the heating chamber, and a power supply unit A power detection unit that detects microwave power reflected in the direction of the amplification unit; and a control unit that controls an oscillation frequency of the oscillation unit and a phase amount of the phase variable unit . A plurality of combinations of the two power feeding portions are arranged in an even number of four or more places on the bottom wall surface, and are approximately symmetrical with respect to a point on one axis, and between the two power feeding portions constituting the combination of the power feeding portions. A connecting line is a combination of the plurality of power feeding sections. The combination of the power feeding units is arranged so that the excitation directions of the microwave electric fields radiated to the heating chamber coincide with each other, and the control unit is configured to control the phase of the microwaves supplied from the power feeding unit. Is configured to relatively control between the combination of the plurality of power supply units , the low-power microwaves radiated from the combination of the plurality of power supply units arranged substantially symmetrically strongly interfere with each other, In addition , a highly directional microwave power distribution with high directivity is generated in the heating chamber, the object to be heated stored in the heating chamber is efficiently heated, and is generated by mutual interference between microwaves whose phases are controlled relatively. distribution of strong directivity of the microwave power, as it can move the distribution position by the phase difference, it is possible to heat various shapes, types and quantity of different object to be heated optimally.

第2の発明は、特に、第1の発明の略対称配置された給電部組合せの対称の中心点は、加熱室の被加熱物設置水平面の略中心を通る垂直軸上に設けた構成としたものであり、給電部配置中心と被加熱物設置面中心を一致させることで、放射したマイクロ波の相互干渉により、被加熱物設置面中心に強い指向性のマイクロ波電力の分布を発生することができ、被加熱物設置面の中央に設置される被加熱物に効率的に吸収させることで、様々な形状・種類・量の異なる被加熱物を高効率に加熱することができる。   The second aspect of the invention is particularly configured such that the symmetrical center point of the substantially symmetrically arranged feeding unit combination of the first aspect is provided on a vertical axis passing through the substantial center of the heated object installation horizontal plane of the heating chamber. By making the power supply unit arrangement center and the heated object installation surface center coincide, a strong directional microwave power distribution is generated at the heated object installation surface center due to the mutual interference of the emitted microwaves. It is possible to efficiently heat the object to be heated of various shapes, types, and amounts by efficiently absorbing the object to be heated installed in the center of the object to be heated installation surface.

第3の発明は、特に、第1または2の発明の略対称配置された給電部組合せの対称の中心点が存在する1つの軸上に中心を持つ1つの正多角形の頂点位置全てに給電部を配置した構成としたものであり、略対称配置中心点から各給電部までの距離が等しく、中心点に対して均等な方向に給電部が配置され、中心点に対する給電部の位置の影響を相互補完でき、放射したマイクロ波の相互干渉により、より強い指向性のマイクロ波電力の分布を発生し、加熱室に放射したマイクロ波を被加熱物に効率的に吸収させることができ、様々な形状・種類・量の異なる被加熱物を高効率に加熱することができる。   In particular, the third invention feeds power to all vertex positions of one regular polygon centered on one axis where the symmetrical center point of the substantially symmetrically arranged feeding portion combination of the first or second invention exists. The distance from the central point of the substantially symmetrical arrangement to each power supply unit is equal, the power supply unit is arranged in an equal direction with respect to the center point, and the influence of the position of the power supply unit with respect to the center point The mutual interference of the radiated microwaves can generate a stronger directional microwave power distribution, and the microwaves radiated into the heating chamber can be efficiently absorbed by the object to be heated. It is possible to efficiently heat objects to be heated having different shapes, types and amounts.

第4の発明は、特に、第1の発明の複数の給電部は、略対称配置の中心点から2分の1波長以下の位置に配置した構成としたものであり、複数の給電部から放射したマイクロ波の相互干渉を強くし、さらに強い指向性のマイクロ波電力の分布を発生し、加熱室に放射したマイクロ波を効率的に被加熱物に吸収させることができ、様々な形状・種類・量の異なる被加熱物を高効率に加熱することができる。   In the fourth invention, in particular, the plurality of power feeding units according to the first invention are arranged at a position of a half wavelength or less from the center point of the substantially symmetrical arrangement, and radiation from the plurality of power feeding units. Intense mutual interference between the generated microwaves, generate a more directional microwave power distribution, and efficiently absorb the microwaves radiated into the heating chamber in various shapes and types -Heated objects with different amounts can be heated with high efficiency.

第5の発明は、特に、第1から3のいずれか1つの発明の略対称配置された給電部組合せの対称の中心点が存在する1つの軸上に中心を持つ複数の正多角形の頂点位置全てに給電部を配置した構成としたものであり、それぞれの正多角形頂点に配置した給電部組合せ
から放射したマイクロ波の相互干渉により、発生する強い指向性のマイクロ波電力の分布を重ね合わせたり、複数ヶ所に分散させたり、加熱室に放射したマイクロ波を被加熱物に効率的に吸収させることができ、様々な形状・種類・量の異なる被加熱物を高効率に加熱することができる。
In particular, the fifth aspect of the invention relates to a plurality of regular polygon vertices having a center on one axis on which a symmetrical center point of the substantially symmetrically arranged feeding portion combination of any one of the first to third aspects of the invention exists. The power feeding unit is arranged at all positions, and the distribution of the strong directional microwave power generated by the mutual interference of the microwaves radiated from the feeding unit combination arranged at each vertex of the regular polygon is superimposed. Heating objects with different shapes, types, and quantities can be efficiently heated by combining them, dispersing them at multiple locations, and efficiently absorbing microwaves radiated into the heating chamber. Can do.

第6の発明は、特に、第1から3のいずれか1つの発明の略対称配置された給電部組合せの対称の中心点が存在する1つの軸上に、中心を持つ正多角形の頂点位置全てに配置した給電部と、略対称配置と異なる位置に配置した給電部を混在させる構成としたものであり、正多角形頂点に配置した給電部組合せから放射したマイクロ波の相互干渉により、発生する強い指向性のマイクロ波電力の分布を、ずれた位置に配置した複数の給電部から放射するマイクロ波電力で補完することで、マイクロ波電力の分布を容易に制御でき、様々な形状・種類・量の異なる被加熱物を高効率に加熱することができる。   The sixth aspect of the invention is, in particular, the position of the vertex of a regular polygon having a center on one axis where the symmetrical center point of the substantially symmetrically arranged feeding unit combination of any one of the first to third aspects exists. It is configured to mix power feeding parts arranged at all and power feeding parts arranged at positions different from the substantially symmetrical arrangement, and is generated by mutual interference of microwaves radiated from power feeding part combinations arranged at regular polygon vertices. The microwave power distribution can be easily controlled by complementing the strong directional microwave power distribution with the microwave power radiated from multiple power supply units arranged at different positions. -Heated objects with different amounts can be heated with high efficiency.

7の発明は、特に、第1の発明の略対称に配置された組合せの給電部から加熱室へ放射するマイクロ波の放射方向は、給電部組合せ間を結ぶ線に垂直な面に対し、略対称とする構成としたものであり、略対称に配置した組合せの給電部間の相互干渉を強くし、発生するマイクロ波電力の分布の制御を効果的にし、加熱室に放射したマイクロ波を効率的に被加熱物に吸収させることができ、様々な形状・種類・量の異なる被加熱物を高効率に加熱することができる。 In the seventh aspect of the invention, in particular, the radiation direction of the microwave radiated from the power supply unit of the combination arranged substantially symmetrically of the first invention to the heating chamber is perpendicular to the plane connecting the power supply unit combinations, It is configured to be substantially symmetrical, strengthening the mutual interference between the power feeding parts of the combination arranged substantially symmetrically, effectively controlling the distribution of the generated microwave power, and the microwave radiated to the heating chamber The object to be heated can be efficiently absorbed, and the object to be heated of various shapes, types, and amounts can be heated with high efficiency.

8の発明は、特に、第1の発明の略対称に配置した給電部組合せ毎に、給電部組合せの略対称配置中心点が存在する1つの軸方向にずらして配置させる構成としたものであり、加熱室底壁面の凹凸などで給電部を同一面内に配置できない場合、給電部組合せ毎に配置をずらせば位置の違いによる影響を最小限にでき、加熱室に放射したマイクロ波を効率的に被加熱物に吸収させることができ、様々な形状・種類・量の異なる被加熱物を高効率に加熱することができる。 In the eighth aspect of the invention, in particular, for each of the power feeding unit combinations arranged substantially symmetrically according to the first invention, the power feeding unit combinations are arranged so as to be shifted in one axial direction where the substantially symmetrical center point of the power feeding unit combination exists. Yes, if the power feeding unit cannot be arranged in the same plane due to unevenness on the bottom wall surface of the heating chamber, the influence of the position can be minimized by shifting the arrangement for each power feeding unit combination, and the microwave radiated into the heating chamber can be efficiently used Therefore, the object to be heated can be absorbed efficiently, and the object to be heated of various shapes, types and amounts can be heated with high efficiency.

9の発明は、特に、第1から8のいずれか1つの発明の制御部は、略対称に配置した給電部の複数の組合せに対し、同時に同じ位相差で制御する構成としたものであり、相対的位相を制御する給電部の組合せを複数選択し同時に制御することで、マイクロ波電力の分布位置を移動させる方向をより詳細に操作でき、さまざまな形状・種類・量の異なる被加熱物を最適に加熱することができる。 In the ninth invention, in particular, the control unit according to any one of the first to eighth inventions is configured to simultaneously control a plurality of combinations of power feeding units arranged substantially symmetrically with the same phase difference. By selecting and controlling multiple combinations of power feeding units that control the relative phase, the direction of moving the distribution position of the microwave power can be manipulated in more detail, and the object to be heated in various shapes, types, and quantities Can be optimally heated.

10の発明は、特に、第1から8のいずれか1つの発明の制御部は、略対称に配置した給電部の複数の組合せに対し、それぞれ異なる位相差で制御をする構成としたものであり、相対的位相を制御する給電部の組合せを複数選択し同時に異なる位相差で制御することで、マイクロ波電力の分布位置を移動させる方向をより広範囲に操作でき、さまざまな形状・種類・量の異なる被加熱物を最適に加熱することができる。 In the tenth invention, in particular, the control unit according to any one of the first to eighth inventions is configured to control a plurality of combinations of power feeding units arranged substantially symmetrically with different phase differences. Yes, by selecting multiple combinations of power feeding units that control the relative phase and simultaneously controlling with different phase differences, the direction of moving the distribution position of the microwave power can be operated in a wider range, and various shapes, types, and quantities Can be heated optimally.

以下、本発明の実施の形態について、図面を参照しながら説明する。なお、この実施の形態によって本発明が限定されるものではない。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the present invention is not limited to the embodiments.

(実施の形態1)
図1は、本発明の第1の実施形態におけるマイクロ波処理装置の構成図である。
(Embodiment 1)
FIG. 1 is a configuration diagram of a microwave processing apparatus according to the first embodiment of the present invention.

図1において、マイクロ波発生部は半導体素子を用いて構成した発振部1a、1c、発振部1a、1cの出力を2分配する電力分配部2a、2c、電力分配部2a、2cそれぞれの出力を増幅する半導体素子を用いて構成した増幅部4a〜4d、増幅部4a〜4dによって増幅されたマイクロ波出力を加熱室内に放射する給電部5a〜5d、および電力分配部2a、2cと増幅部4a〜4dを接続するマイクロ波伝播路に挿入され入出力に任意
の位相差を発生させる位相可変部3a〜3d、増幅部4a〜4dと給電部5a〜5dを接続するマイクロ波伝播路に挿入され、給電部5a〜5dから増幅部4a〜4d方向に反射するマイクロ波反射電力を検出する電力検出部6a〜6d、電力検出部6a〜6dによって検出される反射電力に応じて発振部1a、1cの発振周波数と位相可変部3a〜3dの位相量を制御する制御部7とで構成している。
In FIG. 1, the microwave generation unit includes oscillation units 1 a and 1 c configured using semiconductor elements, power distribution units 2 a and 2 c that distribute the outputs of the oscillation units 1 a and 1 c, and outputs of the power distribution units 2 a and 2 c. Amplifying units 4a to 4d configured using semiconductor elements to be amplified, power feeding units 5a to 5d for radiating microwave outputs amplified by the amplifying units 4a to 4d into the heating chamber, and power distribution units 2a and 2c and amplifying unit 4a Are inserted into the microwave propagation path that connects the power supply sections 5a to 5d and the phase variable sections 3a to 3d that are inserted into the microwave propagation path that connects to 4d and generates an arbitrary phase difference between the input and output. According to the reflected power detected by the power detectors 6a to 6d and the power detectors 6a to 6d for detecting the microwave reflected power reflected from the power feeders 5a to 5d in the direction of the amplifiers 4a to 4d. Fubu 1a, are constituted by a control unit 7 for controlling the phase of the oscillation frequency and the phase variable parts 3a~3d of 1c.

また、本発明のマイクロ波処理装置は、被加熱物9を収納する略直方体構造からなる加熱室8を有し、加熱室8は金属材料からなる壁面および被加熱物9を収納するために開閉する開閉扉(図示していない)と、被加熱物9を載置する載置台12にて、供給されるマイクロ波を内部に閉じ込めるように構成している。そして、発振部1a、1cで発生したマイクロ波出力が伝播され、加熱室8内に放射供給する4ヶ所の給電部5a〜5dは全て加熱室8を構成する壁面の底壁面に配置されている。   In addition, the microwave processing apparatus of the present invention has a heating chamber 8 having a substantially rectangular parallelepiped structure for storing the object 9 to be heated, and the heating chamber 8 is opened and closed to store the wall surface and the object 9 to be heated. The microwave to be supplied is confined in the opening / closing door (not shown) and the mounting table 12 on which the object to be heated 9 is mounted. Then, the microwave output generated in the oscillation units 1 a and 1 c is propagated, and the four power supply units 5 a to 5 d that radiate and supply the heating chamber 8 are all arranged on the bottom wall surface of the wall that constitutes the heating chamber 8. .

増幅部4a〜4dは、低誘電損失材料から構成した誘電体基板の片面に形成した導電体パターンにて回路を構成し、各増幅部4a〜4dの増幅素子である半導体素子を良好に動作させるべく各半導体素子の入力側と出力側にそれぞれ整合回路を配している。電力分配部2a、2cは、例えばウィルキンソン型分配器のような出力間に位相差を生じない同相分配器であってもよいし、ブランチライン型やラットレース型のような出力間に位相差を生じる分配器であっても構わない。   The amplifying units 4a to 4d constitute a circuit with a conductor pattern formed on one surface of a dielectric substrate made of a low dielectric loss material, and operate the semiconductor elements that are the amplifying elements of the amplifying units 4a to 4d satisfactorily. Therefore, matching circuits are arranged on the input side and output side of each semiconductor element. The power distribution units 2a and 2c may be in-phase distributors that do not cause a phase difference between outputs such as a Wilkinson distributor, or may have a phase difference between outputs such as a branch line type or a rat race type. It may be the resulting distributor.

この電力分配部2a、2cによって、各々の出力には発振部1a、1cから入力されたマイクロ波電力の略1/2の電力が伝播される。位相可変部3a〜3dは、印加電圧に応じて容量が変化する容量可変素子を用いて構成し、各々の位相可変範囲は、0度から略180度の範囲としている。これによって位相可変部3a〜3dより出力されるマイクロ波電力の位相差は、0度から±180度の範囲を制御することができる。   By the power distribution units 2a and 2c, approximately 1/2 of the microwave power input from the oscillation units 1a and 1c is propagated to the respective outputs. The phase variable units 3a to 3d are configured using a variable capacitance element whose capacitance changes according to the applied voltage, and each phase variable range is a range from 0 degrees to about 180 degrees. As a result, the phase difference of the microwave power output from the phase variable units 3a to 3d can be controlled in the range of 0 degrees to ± 180 degrees.

電力検出部6a〜6dは、給電部5a〜5dから増幅部4a〜4d方向に反射するマイクロ波、いわゆる反射波の電力を抽出するものであり、電力結合度を例えば約40dBとし、反射電力の約1/10000の電力量を抽出する。この電力信号は、それぞれ検波ダイオード(図示していない)で整流化しコンデンサ(図示していない)で平滑処理し、その出力信号を制御部7に入力させている。   The power detection units 6a to 6d extract microwaves reflected from the power supply units 5a to 5d in the direction of the amplification units 4a to 4d, so-called reflected wave power. The power coupling degree is, for example, about 40 dB, and the reflected power About 1/10000 of the amount of power is extracted. The power signals are rectified by a detection diode (not shown), smoothed by a capacitor (not shown), and the output signal is input to the control unit 7.

制御部7は、使用者が直接入力する被加熱物9の加熱条件、あるいは加熱中に被加熱物9の加熱状態から得られる加熱情報と、電力検出部6a〜6dの検出情報とに基づいて、マイクロ波発生部の構成要素である発振部1a、1cと増幅部4a〜4dのそれぞれに供給する駆動電力の制御や位相可変部3a〜3dに供給する電圧を制御し、加熱室8内に収納された被加熱物9を最適に加熱する。   The control part 7 is based on the heating information of the to-be-heated object 9 which a user inputs directly, or the heating information obtained from the heating state of the to-be-heated object 9 during heating, and the detection information of the electric power detection parts 6a-6d. In the heating chamber 8, the driving power supplied to the oscillation units 1a and 1c and the amplification units 4a to 4d, which are constituent elements of the microwave generation unit, and the voltage supplied to the phase variable units 3a to 3d are controlled. The stored object 9 is heated optimally.

以上のように構成されたマイクロ波処理装置について、以下その動作、作用を説明する。   About the microwave processing apparatus comprised as mentioned above, the operation | movement and an effect | action are demonstrated below.

まず被加熱物9を加熱室8に収納し、その加熱条件を操作部(図示していない)から入力し、加熱開始キーを押す。加熱開始信号を受けた制御部7の制御出力信号によりマイクロ波発生部が動作を開始する。制御手段7は、駆動電源(図示していない)を動作させて発振部1a、1cに電力を供給する。この時、発振部1a、1cの初期の発振周波数は、例えば2400MHzに設定する電圧信号を供給し、発振が開始する。発振部1a、1cを動作させると、その出力は電力分配部2a、2cにて各々略1/2分配され、4つのマイクロ波電力信号となる。以降、駆動電源を制御して増幅部4a〜4dを動作させる。   First, the object to be heated 9 is stored in the heating chamber 8, the heating condition is input from an operation unit (not shown), and the heating start key is pressed. In response to the control output signal of the control unit 7 that has received the heating start signal, the microwave generation unit starts its operation. The control means 7 operates a drive power supply (not shown) to supply power to the oscillation units 1a and 1c. At this time, the initial oscillation frequency of the oscillation units 1a and 1c is supplied with a voltage signal set to 2400 MHz, for example, and oscillation starts. When the oscillating units 1a and 1c are operated, their outputs are distributed approximately ½ each by the power distributing units 2a and 2c, resulting in four microwave power signals. Thereafter, the drive power supply is controlled to operate the amplification units 4a to 4d.

そして、それぞれのマイクロ波電力信号は、並列動作する増幅部4a〜4d、電力検出
部6a〜6dを経て、給電部5a〜5dにそれぞれ出力され、加熱室8内に放射される。加熱室8内に供給されるマイクロ波電力が、被加熱物9に100%吸収されると、加熱室8からの反射電力は0Wになるが、被加熱物9の種類・形状・量により、加熱室8のインピーダンスが変わり、マイクロ波電力供給側との整合ずれなどにより、給電部5a〜5dから増幅部4a〜4d方向に伝播するマイクロ波反射電力が生じる。
The microwave power signals are output to the power feeding units 5 a to 5 d through the amplification units 4 a to 4 d and the power detection units 6 a to 6 d that operate in parallel, and are radiated into the heating chamber 8. When 100% of the microwave power supplied into the heating chamber 8 is absorbed by the object 9 to be heated, the reflected power from the heating chamber 8 becomes 0 W, but depending on the type, shape and amount of the object 9 to be heated, The impedance of the heating chamber 8 changes, and microwave reflected power propagating from the power supply units 5a to 5d in the direction of the amplification units 4a to 4d is generated due to misalignment with the microwave power supply side.

電力検出器6a〜6dは、このマイクロ波反射電力を検出し、その反射電力量に比例した検出信号を制御部7に送る。制御部7は、反射電力が最も小さくなる発振周波数と位相差の条件で、発振部1a、1cおよび位相可変部3a〜3dを制御するとともに、入力された加熱条件に対応した出力が得られるように発振出力を制御する。制御部7の制御に応じた発振周波数のマイクロ波は、増幅部4a〜4dで、制御に応じた電力となり、それぞれの給電部5a〜5dに制御に応じた位相差で供給され、さらに加熱室8内に放射される。   The power detectors 6 a to 6 d detect the microwave reflected power and send a detection signal proportional to the reflected power amount to the control unit 7. The control unit 7 controls the oscillation units 1a and 1c and the phase variable units 3a to 3d under the conditions of the oscillation frequency and the phase difference at which the reflected power is minimized so that an output corresponding to the input heating condition can be obtained. To control the oscillation output. The microwaves having the oscillation frequency according to the control of the control unit 7 become power according to the control in the amplification units 4a to 4d, and are supplied to the respective power feeding units 5a to 5d with a phase difference corresponding to the control. 8 is emitted.

次に、給電部の配置とマイクロ波電力の分布の関係について説明する。   Next, the relationship between the arrangement of the power feeding unit and the distribution of the microwave power will be described.

図2は、本発明の第1の実施形態におけるマイクロ波処理装置の斜視図である。   FIG. 2 is a perspective view of the microwave processing apparatus according to the first embodiment of the present invention.

図2において、加熱室8の載置台12下側の底壁面に、4ヶ所の給電部5a〜5dが、正四角形配置14の頂点全てに配置され、給電部5a、5bおよび給電部5c、5dが、加熱室中心軸13上の中心点10に対して、2分の1波長以下の距離で、略対称な位置となっている。更に、給電部5a、5bのマイクロ波放射方向は、給電部5a、5bの組合せ間を結ぶ直線に垂直な面に対し略対称で、放射マイクロ波電界の励振方向11aが同じ向きとなるよう設置され、給電部5a、5bからのマイクロ波は、加熱室中心軸13に対して、略対称な放射特性となる。略対称な放射特性の給電部5a、5bそれぞれから放射された小電力のマイクロ波が、相互干渉して合成した大電力になり、指向性の強いマイクロ波分布を加熱室内に発生させる。   In FIG. 2, four power feeding parts 5 a to 5 d are arranged on all the vertices of the regular square arrangement 14 on the bottom wall surface of the heating chamber 8 below the mounting table 12, and the power feeding parts 5 a and 5 b and the power feeding parts 5 c and 5 d. However, it is substantially symmetrical with respect to the center point 10 on the heating chamber central axis 13 at a distance of a half wavelength or less. Further, the microwave radiation directions of the power feeding units 5a and 5b are substantially symmetrical with respect to a plane perpendicular to the straight line connecting the combinations of the power feeding units 5a and 5b, and the excitation direction 11a of the radiation microwave electric field is set to be the same direction. Then, the microwaves from the power feeding units 5 a and 5 b have substantially symmetric radiation characteristics with respect to the heating chamber central axis 13. The low-power microwaves radiated from the power supply units 5a and 5b having substantially symmetric radiation characteristics become high power synthesized by mutual interference, and a microwave distribution with strong directivity is generated in the heating chamber.

給電部5a、5b間の相対的位相をずらすと、給電部5a、5bそれぞれから放射されたマイクロ波の相互干渉位置が給電部5a、5bを結ぶ線方向に変動し、強いマイクロ波分布の位置を操作することができる。給電部5c、5dも同様にマイクロ波放射方向が略対称で、励振方向11cが同じ向きとなるよう設置され、略対称な放射特性となり、相互干渉により発生するマイクロ波分布の位置を相対的位相制御で操作することができる。   When the relative phase between the power feeding parts 5a and 5b is shifted, the mutual interference position of the microwaves radiated from the power feeding parts 5a and 5b fluctuates in the line direction connecting the power feeding parts 5a and 5b, and the position of the strong microwave distribution Can be operated. Similarly, the power feeding units 5c and 5d are installed so that the microwave radiation directions are substantially symmetric and the excitation directions 11c are the same direction, so that they have substantially symmetric radiation characteristics, and the positions of the microwave distributions generated by mutual interference are relative phase. Can be operated by control.

4ヶ所の給電部5a〜5d全てを合成したマイクロ波分布は、励振方向11a、11cの向きにより特性が決まる。励振方向11a、11cが直交している場合、給電部5a、5bの相互干渉で発生したマイクロ波分布と給電部5c、5dの相互干渉で発生したマイクロ波分布は、相互の干渉がほとんど無く、給電部5a、5bおよび給電部5c、5dそれぞれのマイクロ波分布を単純に重ね合わせた加熱が行なわれる。励振方向11a、11cが直交しない場合は、その角度の直角からのずれに見合った相互干渉が起こり、給電部5a、5bおよび給電部5c、5dそれぞれのマイクロ波分布が合成され、より指向性の強いマイクロ波分布を加熱室8内に発生させる。   The characteristics of the microwave distribution obtained by synthesizing all the four power feeding units 5a to 5d are determined by the directions of the excitation directions 11a and 11c. When the excitation directions 11a and 11c are orthogonal to each other, the microwave distribution generated by the mutual interference of the power feeding units 5a and 5b and the microwave distribution generated by the mutual interference of the power feeding units 5c and 5d have almost no mutual interference. Heating is performed by simply superimposing the microwave distributions of the power feeding units 5a and 5b and the power feeding units 5c and 5d. When the excitation directions 11a and 11c are not orthogonal to each other, mutual interference corresponding to the deviation of the angle from the right angle occurs, and the microwave distributions of the power feeding units 5a and 5b and the power feeding units 5c and 5d are combined, and more directivity is achieved. A strong microwave distribution is generated in the heating chamber 8.

以上説明のように、給電部5a〜5dが正四角形配置14の頂点に配置され、給電部5a、5bおよび給電部5c、5dのそれぞれの組合せ内では、周波数および出力値をほぼ一致させ、略対称な放射特性にしているので、給電部5a、5bおよび給電部5c、5dのそれぞれの組合せ内での相対的位相を同時に同じ制御および異なる制御を行うことにより、マイクロ波分布の位置を操作でき、両者のマイクロ波分布を重ね合わせまたは合成して、強いマイクロ波分布の位置を2次元方向へ広範囲に操作することができる。このように動作することで、強いマイクロ波分布の操作ができ、加熱室8に放射したマイクロ波を
効率的に被加熱物9に吸収させることができ、様々な形状・種類・量の異なる被加熱物9を高効率で最適に加熱することができる。
As described above, the power feeding units 5a to 5d are arranged at the apexes of the regular tetragonal arrangement 14, and the frequency and the output value are substantially matched in each combination of the power feeding units 5a and 5b and the power feeding units 5c and 5d. Since the radiation characteristics are symmetric, the position of the microwave distribution can be manipulated by performing the same control and different control simultaneously on the relative phase in each combination of the power feeding units 5a and 5b and the power feeding units 5c and 5d. By superposing or synthesizing both microwave distributions, the position of the strong microwave distribution can be manipulated over a wide range in a two-dimensional direction. By operating in this way, it is possible to operate a strong microwave distribution, the microwave radiated into the heating chamber 8 can be efficiently absorbed by the article 9 to be heated, and various shapes, types and amounts of objects to be covered are different. The heated object 9 can be optimally heated with high efficiency.

本実施の形態では4ヶ所給電の構成を示しているが、本実施の形態に拘束されるものではなく、給電部5a〜5dを増やしたり、正多角形配置数を増やしたりした場合も同様にそれぞれの励振方向角度に見合った相互干渉が起こり、マイクロ波分布を合成または単純に重ね合わせたマイクロ波分布を加熱室8内に発生させることができ、同様に相対的位相制御をすることで、発生するマイクロ波分布の位置を操作することができる。加熱室8底壁面の凹凸形状などにより、給電部5a〜5dを同一面内に配置できない場合は、略対称配置した給電部5a、5bおよび給電部5c、5d毎に配置中心軸の方向にずらして再配置することで、位置の違いによる影響を最小限にできる。   In this embodiment, the configuration of power supply at four points is shown. However, the present embodiment is not limited to this embodiment, and the same applies when the number of power supply units 5a to 5d is increased or the number of regular polygons is increased. Mutual interference corresponding to each excitation direction angle occurs, a microwave distribution obtained by synthesizing or simply superimposing the microwave distributions can be generated in the heating chamber 8, and similarly by performing relative phase control, The position of the generated microwave distribution can be manipulated. When the power feeding parts 5a to 5d cannot be arranged in the same plane due to the uneven shape of the bottom wall surface of the heating chamber 8, the power feeding parts 5a and 5b and the power feeding parts 5c and 5d arranged substantially symmetrically are shifted in the direction of the arrangement center axis. By rearranging them, the influence of the difference in position can be minimized.

以上のように、本発明にかかるマイクロ波処理装置は、偶数ヶ所でかつ4ヶ所以上の給電部全てを加熱室の底壁面に略対称に配置し、略対称配置給電部間の位相差制御によりマイクロ波分布を操作できるので、電子レンジで代表されるような誘電加熱を利用した加熱装置や生ゴミ処理機、あるいは半導体製造装置であるプラズマ電源のマイクロ波電源などの用途にも適用できる。   As described above, the microwave processing apparatus according to the present invention arranges all the power feeding units at even locations and at least four locations substantially symmetrically on the bottom wall surface of the heating chamber, and controls the phase difference between the substantially symmetrically arranged power feeding units. Since the microwave distribution can be manipulated, the present invention can be applied to uses such as a heating device using a dielectric heating such as a microwave oven, a garbage processing machine, or a microwave power source of a plasma power source as a semiconductor manufacturing apparatus.

本発明の実施の形態1におけるマイクロ波処理装置の構成図Configuration diagram of microwave processing apparatus according to Embodiment 1 of the present invention 本発明の実施の形態1におけるマイクロ波処理装置の斜視図The perspective view of the microwave processing apparatus in Embodiment 1 of this invention

1a、1c 発振部
2a、2c 電力分配部
3a〜3d 位相可変部
4a〜4d 増幅部
5a〜5d 給電部
6a〜6d 電力検出部
7 制御部
8 加熱室
9 被加熱物
10 中心点
11a、11c 励振方向
12 載置台
13 加熱室中心軸
14 正四角形配置
DESCRIPTION OF SYMBOLS 1a, 1c Oscillation part 2a, 2c Power distribution part 3a-3d Phase variable part 4a-4d Amplification part 5a-5d Power supply part 6a-6d Power detection part 7 Control part 8 Heating chamber 9 Heated object 10 Center point 11a, 11c Excitation Direction 12 Mounting table 13 Heating chamber central axis 14 Regular square arrangement

Claims (10)

被加熱物を収容する加熱室と、発振部と、前記発振部の出力を複数に分配して出力する電力分配部と、前記電力分配部の少なくともひとつの出力位相を可変する位相可変部と、前記電力分配部および/または前記位相可変部の出力をそれぞれ電力増幅する増幅部と、前記増幅部の出力を前記加熱室に供給する給電部と、それぞれの前記給電部から前記増幅部方向に反射するマイクロ波電力を検出する電力検出部と、前記発振部の発振周波数と前記位相可変部の位相量を制御する制御部とを備え、
前記給電部は、前記加熱室の底壁面に4ヶ所以上の偶数ヶ所に配置され、1つの軸上の点に対し略対称に2つの前記給電部の組合せを複数設け、前記給電部の組合せを構成する2つの前記給電部間を結ぶ線が前記複数の給電部の組合せにおいて交差するように配置され、前記給電部の組合せは前記加熱室へ放射するマイクロ波電界の励振方向が一致するように配置され、
前記制御部は、前記給電部から供給するマイクロ波の位相を、前記複数の給電部の組合せ間で、相対的に制御する構成としたマイクロ波処理装置。
A heating chamber that accommodates an object to be heated; an oscillation unit; a power distribution unit that distributes and outputs the output of the oscillation unit; and a phase variable unit that varies at least one output phase of the power distribution unit; An amplifying unit that amplifies the output of each of the power distribution unit and / or the phase variable unit, a feeding unit that supplies the output of the amplifying unit to the heating chamber, and a reflection from each feeding unit toward the amplifying unit A power detection unit for detecting the microwave power, and a control unit for controlling the oscillation frequency of the oscillation unit and the phase amount of the phase variable unit,
The power feeding unit is arranged at an even number of four or more places on the bottom wall surface of the heating chamber, and a plurality of combinations of the two power feeding units are provided approximately symmetrically with respect to a point on one axis. The lines connecting the two power supply units constituting the crossing are arranged so as to intersect each other in the combination of the plurality of power supply units, and the combination of the power supply units matches the excitation direction of the microwave electric field radiated to the heating chamber. Arranged,
The microwave processing apparatus configured to relatively control the phase of the microwave supplied from the power feeding unit between combinations of the plurality of power feeding units.
略対称配置された給電部組合せの対称の中心点は、加熱室の被加熱物設置水平面の略中心を通る垂直軸上に設けた請求項1に記載のマイクロ波処理装置。 The microwave processing apparatus according to claim 1, wherein the symmetrical center point of the power feeding unit combinations arranged substantially symmetrically is provided on a vertical axis passing through a substantially center of a heated object installation horizontal plane of the heating chamber. 略対称配置された給電部組合せの対称の中心点が存在する1つの軸上に中心を持つ1つの正多角形の頂点位置全てに前記給電部を配置した構成とした請求項1または2に記載のマイクロ波処理装置。 3. The power supply unit according to claim 1, wherein the power supply units are arranged at all vertex positions of one regular polygon having a center on one axis where a symmetrical center point of a combination of power supply units arranged substantially symmetrically exists. Microwave processing equipment. 複数の給電部は、略対称配置中心点から2分の1波長以下の位置に配置した請求項1に記載のマイクロ波処理装置。 The microwave processing apparatus according to claim 1, wherein the plurality of power feeding units are arranged at a position of a half wavelength or less from a substantially symmetrical arrangement center point. 略対称配置された給電部組合せの対称の中心点が存在する1つの軸上に中心を持つ複数の正多角形の頂点位置全てに前記給電部を配置した構成とした請求項1から3のいずれか1項に記載のマイクロ波処理装置。 4. The power feeding unit according to any one of claims 1 to 3, wherein the power feeding units are arranged at all vertex positions of a plurality of regular polygons having a center on one axis where a symmetrical center point of a combination of power feeding units arranged substantially symmetrically exists. The microwave processing apparatus of Claim 1. 略対称配置された給電部組合せの対称の中心点が存在する1つの軸上に中心を持つ正多角
形の頂点位置全てに配置した給電部と、前記略対称配置と異なる位置に配置した前記給電部を混在させる構成とした請求項1から3のいずれか1項に記載のマイクロ波処理装置。
A power supply unit arranged at all vertex positions of a regular polygon having a center on one axis where a symmetrical center point of a combination of power supply units arranged substantially symmetrically exists, and the power supply arranged at a position different from the substantially symmetrical arrangement The microwave processing apparatus of any one of Claim 1 to 3 made into the structure which mixes a part.
略対称に配置された組合せの給電部から記加熱室へ放射するマイクロ波の放射方向は、前記給電部組合せ間を結ぶ直線に垂直な面に対し、略対称とする構成とした請求項1に記載のマイクロ波処理装置。 The radiation direction of the microwave radiated to the heating chamber from the power feeding unit of the combination arranged substantially symmetrically is configured to be substantially symmetrical with respect to a plane perpendicular to a straight line connecting the power feeding unit combinations. The microwave processing apparatus as described. 略対称に配置した前記給電部組合せ毎に、前記給電部組合せの略対称配置中心点が存在する1つの軸方向にずらして配置させる構成とした請求項1に記載のマイクロ波処理装置。 The microwave processing device according to claim 1, wherein each of the power feeding unit combinations arranged substantially symmetrically is arranged to be shifted in one axial direction in which a substantially symmetrical arrangement center point of the power feeding unit combination exists. 制御部は、略対称に配置した前記給電部の複数の組合せに対し、同時に同じ位相差で制御する構成とした請求項1から8のいずれか1項に記載のマイクロ波処理装置。 The microwave processing apparatus according to any one of claims 1 to 8, wherein the control unit is configured to simultaneously control a plurality of combinations of the power feeding units arranged substantially symmetrically with the same phase difference. 制御部は、略対称に配置した給電部の複数の組合せに対し、それぞれ異なる位相差で制御をする構成とした請求項1から8のいずれか1項に記載のマイクロ波処理装置。
The microwave processing apparatus according to any one of claims 1 to 8, wherein the control unit is configured to control a plurality of combinations of power feeding units arranged substantially symmetrically with different phase differences.
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